JP6696876B2 - Syngas purification method and apparatus - Google Patents

Description

  The present invention relates to a purification treatment method and apparatus for removing impurities in synthesis gas (syngas), and more particularly to a purification treatment method and apparatus suitable for waste-derived synthesis gas.

A gasification method by thermal decomposition is known as a method for treating industrial waste and general waste (see Patent Document 1, etc.). According to this method, by thermally decomposing waste, a synthesis gas containing CO and H ₂ as main components can be obtained. Syngas can be used for various purposes.

  For example, in Patent Document 2, synthetic gas is introduced into a culture tank to produce valuable substances such as ethanol by microbial fermentation. The synthesis gas contains a small amount of impurities such as BTEX (benzene, toluene, ethylbenzene, xylene), particulate matter, tar, etc. These may be harmful to microorganisms, so they may be harmful in the pretreatment process. It is described to be removed.

JP 2004-195400 A JP, 2014-050406, A ([0102])

BTEX in the synthesis gas can be removed by a pressure swing adsorption (PSA) method, a temperature swing adsorption (TSA) method, or an activated carbon adsorption method.
On the other hand, according to the research conducted by the inventors, in the synthesis gas derived from waste, phase-transparent impurities (such as naphthalene, 1-naphthol, and 2-naphthol) capable of undergoing a phase transition between a gas phase and a solid phase ( , Or a sublimable substance). This type of phase-transition impurities is solidified depending on temperature and pressure conditions even if it is initially in a gas phase when it is generated in a waste treatment facility. The phase-transition impurities in the solid phase may adhere to the surface of the PSA or TSA adsorbent or activated carbon to cover the active sites. Then, the adsorption capacity is diminished. The same may be said of solid-liquid impurities such as soot and tar in the synthesis gas.
Further, according to the knowledge of the inventors, the waste-derived synthesis gas may contain nitrogen oxides (NOx) and sulfur oxides (SOx), which are typical environmental pollutants. Not only that, but it may adversely affect the synthesis gas utilization process.
The present invention has been made based on such a situation, and in adsorbing gaseous impurities such as BTEX in the synthesis gas by removing impurities that may hinder its adsorption ability, The purpose is to maintain the capacity for a long time, and more preferably to remove NOx and SOx in the synthesis gas.

In order to solve the above problems, the method of the present invention is a purification treatment method for removing impurities in synthesis gas,
A step of adsorbing a gaseous impurity by bringing the synthesis gas into contact with an adsorbent capable of adsorbing a gaseous impurity;
A pretreatment step performed before the gaseous impurity adsorption step,
And the pretreatment step,
A solvent contacting step of contacting the synthesis gas with an aqueous solvent and / or an oily solvent,
At least one of a step of removing the phase-transparent substance by cooling the synthesis gas to a solid-phase temperature of the phase-transparent substance and passing the phase-transparent substance through a capturing portion for the phase-transparent substance is characterized.

Water-soluble impurities such as NOx and SOx in the synthesis gas can be removed by contact with an aqueous solvent in the solvent contacting step of the pretreatment, and phase-transparent substances such as naphthalene and solid-liquid impurities such as soot and tar. Can be removed to some extent. Further, by contacting with an oily solvent, phase-transparent substances such as naphthalene and solid-liquid impurities such as soot and tar in the synthesis gas can be removed, and also gaseous impurities such as BTEX can be removed. Further, by the step of removing the phase-transparent substance, the phase-transparent substance such as naphthalene in the synthesis gas can be solid-phased, and the solid-phased phase-transparent substance can be captured and removed by the phase-transparent substance capturing part. Further, solid-liquid impurities such as soot and tar can also be removed to some extent in the phase-transition substance-trapping portion.
This removes the phase-transparent substances such as naphthalene in the synthesis gas, and the solid-liquid impurities such as soot and tar, and then introduces the synthesis gas into the gaseous impurity adsorbing portion such as PSA for adsorption. It is possible to suppress or prevent the solidified substance of the phase change material and the solid-liquid impurities such as soot and tar from adhering to the surface of the agent. Therefore, the adsorption capability of the adsorbent can be maintained for a long period of time in the gaseous impurity adsorbing section, and the gaseous impurity such as BTEX in the synthesis gas can be sufficiently removed. As a result, the syngas can be sufficiently purified, and the usability of the syngas can be improved.
In addition, "removal" means removing at least a part of the substance to be removed from the synthesis gas (reducing the concentration), and is not limited to completely removing the substance to be removed from the synthesis gas.

In the pretreatment step, it is preferable that the synthesis gas after the solvent contact step is subjected to the phase transition substance removing step.
The temperature of the synthesis gas can be lowered to some extent by the solvent contacting step, and then introduced into the phase transition substance removing step. Therefore, it is possible to reduce the load on the cooling unit in the step of removing the phase change substance.

It is preferable that the solvent contacting step includes an aqueous solvent contacting step of contacting the synthesis gas with an aqueous solvent, and an oily solvent contacting step of contacting the synthesis gas after the aqueous solvent contacting step with the oily solvent.
The step of contacting with an aqueous solvent can remove water-soluble impurities such as NOx and SOx in the synthesis gas, as well as phase-transparent substances such as naphthalene and solid-liquid impurities such as soot and tar to some extent. Therefore, in the step of contacting with the oily solvent, the remaining phase change substance, soot, tar, etc. may be removed. Therefore, it is possible to delay the wear and pollution rate of the oily solvent and reduce the replacement frequency of the oily solvent. Usually, the oily solvent is more expensive than an aqueous solvent such as water, so that the running cost can be reduced by reducing the frequency of replacement of the oily solvent.

The synthesis gas after the step of adsorbing gaseous impurities may be supplied to a liquid medium containing gas-utilizing microorganisms. By a fermentation reaction of gas-utilizing microorganisms in a liquid medium, valuable substances such as ethanol (C ₂ H ₅ OH) can be produced from CO, H _{2 and the} like in the synthesis gas. By removing the impurities in the synthesis gas in the pretreatment step and the gaseous impurity adsorption step, it is possible to prevent the activity of the gas-utilizing microorganism from being adversely affected.

The device of the present invention is a purification treatment device for removing impurities in synthesis gas,
A gaseous impurity adsorbing section comprising an adsorbent capable of adsorbing a gaseous impurity, wherein the synthesis gas is in contact with the adsorbent,
A pretreatment unit arranged in the preceding stage of the gaseous impurity adsorption unit,
And the pretreatment unit,
An aqueous solvent contacting portion for contacting the synthesis gas with an aqueous solvent,
An oily solvent contact part for contacting the synthesis gas with an oily solvent,
A cooling unit for cooling the synthesis gas to a solid phase temperature of the phase-transition substance, and a phase-transition substance removal unit having a phase-transition substance trapping unit through which the synthesis gas after cooling is passed;
It is characterized by including.
Thereby, any of the aqueous solvent contacting step, the oily solvent contacting step, and the phase change substance removing step can be performed, and the impurities in the synthesis gas can be reliably removed.

  According to the present invention, when the gaseous impurities such as BTEX in the synthesis gas are subjected to the adsorption treatment, by removing the impurities that can hinder the adsorption ability, the adsorption ability can be maintained for a long time. .

FIG. 1 is a configuration diagram showing an outline of a synthesis gas processing system according to an embodiment of the present invention.

An embodiment of the present invention will be described below with reference to the drawings.
As shown in FIG. 1, the synthesis gas treatment system 1 includes a waste-derived synthesis gas generation unit 2, a synthesis gas purification treatment device 3, and a synthesis gas utilization unit 6. Synthesis gas is generated in the synthesis gas generation unit 2. The synthesis gas generation unit 2 in the embodiment of the present invention is a waste treatment facility. Examples of waste include municipal waste, tires, biomass, wood chips, plastic waste, and the like. The waste may be general waste. In a melting furnace of a waste treatment facility, waste is burned by high concentration oxygen gas and decomposed to a low molecular level. Finally, synthesis gas is produced. The temperature of the synthesis gas at the time of generation or at the time of delivery from the synthesis gas generation unit 2 is higher than normal temperature, for example, about 30 ° C to several hundreds of ° C.

Synthesis gas comprises _CO, and H 2, CO ₂ as the main component. Further, the synthesis gas contains, as impurities, gaseous impurities such as BTEX, HCN, NOx, SOx, and acetylene, as well as solid or liquid impurities such as soot and tar, and phase transition impurities. The phase-transition impurities are mostly in the gas phase at the time of delivery from the synthesis gas generation part 2, but may undergo phase transition in the transportation process to the synthesis gas utilization part 6 to partly or entirely become a solid phase. Impurity (excluding water). For example, examples of the phase-transition impurities include sublimable substances such as naphthalene, 1-naphthol, and 2-naphthol.
Further, the synthesis gas contains almost saturated water (H ₂ O).

  A synthesis gas purification processing device 3 is provided between the waste-derived synthesis gas generation section 2 and the synthesis gas utilization section 6. The syngas purification treatment device 3 includes a pretreatment unit 4 and a gaseous impurity adsorption unit 50. The pretreatment unit 4 is arranged in front of the gaseous impurity adsorption unit 50.

  The pretreatment unit 4 includes a solvent contacting unit 10, a phase transition substance removing unit 20, a water removing unit 30, and a solid-liquid capturing unit 40. The solvent contact part 10 has a water scrubber 11 (aqueous solvent contact part) and an oil scrubber 12 (oil solvent contact part). The phase-transition substance removing unit 20 has a chiller 21 (cooling unit) and a phase-transition substance capturing unit 22. The water scrubber 11, the oil scrubber 12, the chiller 21, and the phase are arranged from the waste-derived synthesis gas generation unit 2 side along the synthesis gas supply line that connects the waste-derived synthesis gas generation unit 2 and the synthesis gas utilization unit 6. The transferable substance capturing unit 22, the moisture removing unit 30, the solid-liquid capturing unit 40, and the gaseous impurity adsorption unit 50 are arranged in this order.

  The water scrubber 11 includes an upper spray nozzle 11b, a bottom solvent reservoir 11d, and a solvent passage 11c. Water is stored as the aqueous solvent 11a in the solvent storage section 11d. The solvent passage 11c extends from the solvent storage portion 11d to the spray nozzle 11b. Further, a syngas introduction port 11e is provided below the water scrubber 11. A synthetic gas outlet port 11 f is provided above the water scrubber 11.

The oil scrubber 12 includes an upper spray nozzle 12b, a bottom solvent reservoir 12d, and a solvent passage 12c. The solvent passage 12c extends from the solvent storage portion 12d to the spray nozzle 12b. The oily solvent 12a is stored in the solvent storage portion 12d. Examples of components of the oily solvent 12a include paraffinic solvents. A normal paraffin organic solvent such as normal pentane or normal hexane may be used from the viewpoints of solubility in organic chlorine compounds (PCB and the like), entrainment in organic chlorine compounds during volatilization, low viscosity, cost and the like. ..
Further, a synthesis gas introduction port 12e is provided below the oil scrubber 12. A syngas outlet port 12 f is provided above the oil scrubber 12.
In addition, a filter or a cooling function may be provided in the circulation passage in order to improve the collection efficiency here or to extend the service life of the oil.

  The chiller 21 has a cooling pipe 23. Preferably, the chiller 21 is composed of a multi-tube heat exchanger including a plurality of cooling tubes 23. From the viewpoint of ease of cleaning and the like, each cooling pipe 23 is preferably configured by a straight pipe. Moreover, the plurality of cooling pipes 23 are arranged in parallel with each other. A drain passage 25 extends from the bottom of the chiller 21.

The inside of the cooling pipe 23 serves as a flow path for the synthesis gas, and the space between the cooling pipes 23 within the chiller 21 serves as a refrigerant passage 24 for the refrigerant 21a. As the refrigerant 21a, for example, ethylene glycol is used, but it is not limited to this.
The inside of the cooling pipe 23 may be a flow path for the refrigerant 21a, and the space between the cooling pipes 23 may be a flow path for the synthesis gas.

  The cooling target temperature in the chiller 21 is set to such an extent that a phase transition of a phase transition substance such as naphthalene (for example, sublimation solidification of naphthalene) can sufficiently occur. Preferably, the cooling target temperature of the chiller 21 is around room temperature. Specifically, it is about 10 ° C to 30 ° C, more preferably about 20 ° C.

  The phase-transition substance capturing unit 22 has a phase-transition substance capturing filter 22f. The material of the filter 22f may be metal, resin, fiber, ceramic, or a combination thereof. The filter 22f may be composed of a multi-layer mesh.

  The water removing unit 30 is composed of, for example, a heat exchanger (chiller). Hereinafter, the water removing unit 30 will be appropriately referred to as a "chiller 30". Preferably, the chiller 30 is a multi-tube heat exchanger including a plurality of cooling tubes 33. Each cooling pipe 33 is preferably a straight pipe from the viewpoint of ease of cleaning and the like. In addition, the plurality of cooling pipes 33 are arranged in parallel with each other. A drain passage 35 extends from the bottom of the chiller 30.

The inside of the cooling pipe 33 serves as a flow path for the synthesis gas, and the space between the cooling pipes 33 within the chiller 30 serves as the refrigerant passage 34 for the refrigerant 30a. As the refrigerant 30a, for example, ethylene glycol is used, but it is not limited to this.
The inside of the cooling pipe 33 may be a flow path for the refrigerant 30a, and the space between the cooling pipes 33 may be a flow path for the synthesis gas.

  The cooling target temperature of the chiller 30 is set within a range in which the water in the synthesis gas can be sufficiently condensed (liquefied) and is not frozen. The target cooling temperature of the chiller 30 is preferably 0 ° C. or higher and room temperature or lower, specifically about 0 ° C. to 10 ° C., and more preferably about 2 ° C.

  When the two chillers 21 and 30 are compared, the chiller 21 has a higher cooling target temperature than the chiller 30. Further, the cooling pipe 23 of the chiller 21 has a larger diameter and larger conductance than the cooling pipe 33 of the chiller 30.

  The solid-liquid capturing section 40 has a solid-liquid capturing filter 42. The material of the solid-liquid capture filter 42 may be metal, resin, fiber, ceramic, or a combination thereof. The solid-liquid capture filter 42 may be composed of a multi-layer mesh.

  When the phase-transparent substance capturing unit 22 and the solid-liquid capturing unit 40 are compared with each other, the filter 22f of the phase-transparent substance capturing unit 22 has coarser eyes than the filter 42 of the solid-liquid capturing unit 40 and is more likely to pass particles. When both the phase-transition substance trapping filter 22f and the solid-liquid trapping filter 42 are configured by a multi-layer mesh, the number of mesh layers of the phase-transition substance trapping filter 22f is preferably the number of mesh layers of the solid-liquid trapping filter 42. Is 1/3 to 1/20, more preferably 1/10 or less.

The gaseous impurity adsorption unit 50 is composed of a pressure swing adsorption (PSA) device. Hereinafter, the gaseous impurity adsorbing section 50 will be appropriately referred to as "PSA apparatus 50". The gaseous impurity adsorption unit 50 includes a plurality (only two are shown in the drawing) of adsorption towers 51. An adsorbent 52 is housed in each adsorption tower 51. Examples of the adsorbent 52 include zeolite and silica gel.
The adsorbent of the gaseous impurity adsorption unit 50 may be composed of activated carbon.
In addition, the gaseous impurity adsorption unit may be configured by a temperature swing adsorption (TSA) device.

  Although not shown in detail, the synthesis gas utilization unit 6 includes a reaction tank. Anaerobic gas-assimilating microorganisms are cultured in a liquid medium in a reaction tank. Alternatively, it may be filled with a metal catalyst as described later. As the gas-utilizing microorganism, for example, the anaerobic bacteria disclosed in the above-mentioned Patent Document 2, International Publication No. 2011/087380, US Patent US2013 / 0065282 and the like can be used.

The syngas processing system 1 operates as follows.
<Syngas production process>
In the waste-derived synthesis gas generation unit 2, the waste gas is burned to generate synthesis gas. The temperature of the synthesis gas at the time of generation is higher than room temperature.

<Pretreatment process>
The synthesis gas is sent from the waste-derived synthesis gas generation unit 2 to the pretreatment unit 4 and is subjected to the pretreatment process.
<Solvent contact step>
In the pretreatment section 4, the synthesis gas is first sent to the solvent contact section 10 and introduced into the water scrubber 11.
<Aqueous solvent contact step>
In the water scrubber 11, water 11a (aqueous solvent) is sprayed into the water scrubber 11 from the spray nozzle 11b. Moreover, the synthesis gas is introduced into the water scrubber 11 from the introduction port 11e and rises. In the water scrubber 11, the sprayed water 11a and the synthesis gas are in contact with each other while forming a counterflow. By this contact, water-soluble impurities such as NOx, SOx, HCN, and acetylene in the synthesis gas can be dissolved in the spray water 11a and sufficiently removed (concentration reduction), and phase-transparent substances such as naphthalene in the synthesis gas. Also, solid-liquid impurities such as soot and tar can be removed to some extent (concentration reduction).
The temperature of the synthesis gas is lowered by the contact with the spray water 11a.

<Oil solvent contact step>
Subsequently, the synthesis gas is sent to the oil scrubber 12.
In the oil scrubber 12, the oil solvent 12a is sprayed into the oil scrubber 12 from the spray nozzle 12b. Moreover, the synthesis gas is introduced into the oil scrubber 12 from the introduction port 12e and rises. In the oil scrubber 12, the dispersed oily solvent 12a and the synthesis gas are in contact with each other while forming a counterflow. By this contact, phase-transparent substances such as naphthalene in the synthesis gas, tar, BTEX, etc. can be sufficiently removed (concentration reduced), and soot, acetylene, etc. can be removed to some extent (concentration reduced).
The temperature of the synthesis gas is further lowered by contact with the oily solvent 12a.
As described above, the solvent-contacting portion 10 can also remove to some extent the phase-transparent substances such as naphthalene, and the solid-liquid impurities such as soot and tar. , Tar, etc. may be removed. Therefore, it is possible to delay the wear and pollution of the oily solvent 12a and reduce the replacement frequency of the oily solvent 12a. Since the oily solvent 12a is usually more expensive than the aqueous solvent 11a such as water, the running cost can be reduced by reducing the replacement frequency of the oily solvent 12a.

<Phase-transition substance removal process>
Then, the synthesis gas is sent to the phase-transition-substance removing unit 20.
<Cooling process (solidifying process of phase-transition material)>
In the phase-transition-substance removing unit 20, the synthesis gas is first introduced into the chiller 21. In the chiller 21, the synthetic gas is passed through the cooling pipe 23 and the refrigerant 21 a is passed through the refrigerant passage 24, so that heat exchange is performed. The flow of the synthetic gas (downward arrow in the pipe 23) and the flow of the refrigerant 21a form counter flows. The flow of the synthesis gas and the flow of the refrigerant 21a may be parallel to each other.
By the heat exchange, the synthesis gas is cooled to, for example, about room temperature. By cooling, the phase-transition substance such as naphthalene in the synthesis gas is sublimated (solidified) from gas to solid. Since the temperature of the synthesis gas is lowered to some extent in the solvent contact part 10 and then introduced into the phase-transition substance removing part 20, the load of the chiller 21 can be reduced. The cooling pipe 23 has a relatively large diameter, and the cooling pipe 23 By relatively increasing the conductance of the cooling pipe 23, it is possible to prevent the cooling pipe 23 from being clogged with the solidified substance of the phase change material such as naphthalene.
Cooling causes some of the water in the synthesis gas to condense. The condensed water is discharged from the drain passage 25.

<Phase transition substance trapping step>
The cooled synthesis gas is sent to the phase-transition substance trap 22 and passed through the filter 22f. As a result, the solidified substance of the phase-transition material such as naphthalene in the synthesis gas can be captured by the filter 22f. As a result, it is possible to remove the phase transition substance such as naphthalene from the synthesis gas. Further, the filter 22f can also remove solid-liquid impurities such as soot and tar to some extent.
By making the filter 22f relatively coarse, it is possible to prevent the filter 22f from being clogged with the captured impurities and condensed water, and to reduce the frequency of replacement of the filter 22f.

<Water condensation step>
Subsequently, the synthesis gas is sent to the chiller 30. In the chiller 30, the synthetic gas is passed through the cooling pipe 33 and the refrigerant 30 a is passed through the refrigerant passage 34, so that heat exchange is performed. The flow of the synthetic gas (downward arrow in the pipe 33) and the flow of the refrigerant 30a constitute counter flows. The flow of the synthesis gas and the flow of the refrigerant 30a may be parallel to each other.
The heat exchange cools the synthesis gas to a temperature lower than that of the chiller 21, and preferably cools it to near zero. By reducing the diameter of the cooling pipe 33, the cooling efficiency of the synthesis gas can be improved. Thereby, the water content in the synthesis gas can be sufficiently condensed. Preferably, the water content of the synthesis gas can be made almost zero.
In advance, solidified liquids such as naphthalene and solid-liquid impurities such as soot and tar are removed by the solvent contacting unit 10 and the phase-transition-substance removing unit 20, and then the water condensing step is performed to block the cooling pipe 33. Can be suppressed.
The water condensed in the chiller 30 is discharged from the drain passage 35.

<Solid-liquid capture step>
Subsequently, the synthesis gas is sent to the solid-liquid capturing section 40 and passed through the solid-liquid capturing filter 42. The solid-liquid trapping filter 42 traps solid-liquid impurities such as soot and tar in the synthesis gas for further removal.
Clogging of the solid-liquid trapping filter 42 can be suppressed by previously removing water in the synthesis gas with the chiller 30 and then performing the solid-liquid trapping step.
Furthermore, in the solvent contact portion 10 and the phase-transition substance removing portion 20, after the phase-transition substance such as naphthalene is removed in advance, and the solid-liquid trapping step is performed, the clogging of the solid-liquid trapping filter 42 is further improved. It can be surely suppressed.
The solidified substance of the phase-transition substance such as naphthalene that has passed through the phase-transition substance removal unit 20 can be captured by the solid-liquid capturing unit 40.

<Gaseous impurity adsorption step>
Subsequently, the synthesis gas is sent to the PSA device 50. By supplying the synthesis gas under pressure to a part of the adsorption tower 51 of the PSA device 50, gaseous impurities such as BTEX in the synthesis gas are adsorbed by the adsorbent 52 of the part of the adsorption tower 51. To be done. Examples of the gaseous impurities to be adsorbed include BTEX, HCN, acetylene, NOx, SOx, and the like.
At this time, in the other adsorption tower 51 of the PSA device 50, the gaseous impurities are desorbed and discharged by reducing the pressure under the flow of the desorption gas. As a result, the adsorption capacity of the adsorbent 52 is restored.
The pressure adsorption operation and the pressure reduction desorption operation are alternately repeated for the plurality of adsorption towers 51. Thereby, gaseous impurities such as BTEX in the synthesis gas can be sufficiently removed.
According to the syngas purification treatment apparatus 3, the pretreatment unit 4 sufficiently removes the phase change substance such as naphthalene and the solid-liquid impurities such as soot and tar in the syngas, and then the syngas is converted into PSA. By introducing the adsorbent 52 into the device 50, it is possible to suppress or prevent the solidified substance of the phase change material and the solid-liquid impurities such as soot and tar from adhering to the surface of the adsorbent 52. As a result, it is possible to suppress or prevent the active sites of the adsorbent 52 from being covered with the solidified phase transition substance or the solid-liquid impurities. As a result, the adsorption capacity of the adsorbent 52 can be maintained for a long period of time, and the PSA device 50 can reliably remove gaseous impurities such as BTEX in the synthesis gas.
As a result, the syngas can be sufficiently purified.
The gaseous impurity adsorption step may be performed by the TSA (temperature swing) method. The TSA method is a method in which adsorption / desorption is performed by changing the temperature, and although the details thereof are omitted, the same effect as the PSA method can be expected.

<Syngas utilization process>
Then, the synthesis gas is introduced into the synthesis gas utilization section 6. In the syngas utilization unit 6, for example, the gas-utilizing microorganism in the medium ingests CO and H _{2 and the} like of the syngas to fermentably produce valuable substances such as ethanol.
By removing phase-transparent substances such as naphthalene, solid-liquid impurities such as soot and tar, and gaseous impurities such as BTEX, NOx, SOx, HCN, and acetylene in the synthesis gas in advance, gas utilization It is possible to stably cultivate sex microorganisms.
A part of the culture solution is sent to a distillation column (not shown) and distilled. This allows ethanol to be extracted.

The present invention is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present invention.
For example, the order of each step of the pretreatment may be appropriately changed. An aqueous solvent contacting step may be performed after the oily solvent contacting step. A solvent contacting step may be performed after the phase transition substance removing step. The phase change material removal step may be performed between the aqueous solvent contact step and the oily solvent contact step.
In the pretreatment section 4, the oily solvent contacting section 12 may be arranged in the preceding stage of the aqueous solvent contacting section 11. The phase-transition-substance removing unit 20 may be arranged before the solvent contacting unit 10. The phase-transparent substance removing section 20 may be arranged between the aqueous solvent contact section 11 and the oily solvent contact section 12.
Depending on the composition of the synthesis gas, the aqueous solvent contacting step may be omitted in the pretreatment step. Alternatively, the oily solvent contact step may be omitted. Alternatively, the step of removing the phase change substance may be omitted. At least one of the step of contacting with an aqueous solvent, the step of contacting with an oily solvent, and the step of removing a phase change substance may be carried out.
The water scrubber 11 may be omitted in the pretreatment unit 4. Alternatively, the oil scrubber 12 may be omitted. Alternatively, the phase change material removing unit 20 may be omitted. It suffices if at least one of the water scrubber 11, the oil scrubber 12, and the phase-transition-substance removing unit 20 is provided.
In the solvent contact section 10, by providing a spray nozzle 11b for the aqueous solvent 11a and a spray nozzle 12b for the oily solvent 12a in one scrubber tank, the aqueous solvent contacting step and the oily solvent contacting step are combined in one scrubber tank. It may be executed in parallel.
In the solvent contact section 10, by spraying a mixture of the aqueous solvent 11a and the oily solvent 12a into one scrubber tank, the aqueous solvent contacting step and the oily solvent contacting step are performed simultaneously in one scrubber tank. Good.
The aqueous solvent 11a is not limited to water and may be alcohol or the like.
The phase-transparent impurities are not limited to sublimable substances such as naphthalene, 1-naphthol, and 2-naphthol that become a solid phase without passing through a liquid phase from a gas phase, and become a solid phase through a liquid phase from a gas phase. May be
In the synthesis gas utilization step, the valuable gas such as ethanol may be synthesized by bringing the synthesis gas into contact with the metal catalyst and performing a chemical reaction. Typical examples of the metal catalyst include molybdenum-based materials. When synthetic gas is used for this chemical reaction, the substance to be removed is slightly different from the fermentation reaction by the gas-utilizing microorganism, but the required steps are the same. Additional steps are needed to enhance desulfurization.
The valuable material for production purpose is not limited to ethanol, and may be acetic acid, methanol, or the like.
The synthesis gas utilization unit 6 may generate valuable substances such as ethanol by bringing the synthesis gas into contact with the metal catalyst.
The synthesis gas generation unit is not limited to the waste treatment facility, and may be a steel mill, a coal power plant, or the like. The synthesis gas may be a by-product gas (converter furnace, blast furnace gas, etc.) of a steel mill.

  INDUSTRIAL APPLICABILITY The present invention can be applied to, for example, an ethanol production system for synthesizing ethanol from synthesis gas generated by incineration of industrial waste.

1 Synthesis Gas Processing System 2 Waste-Derived Synthesis Gas Generation Section 3 Synthesis Gas Purification Processing Device 4 Pretreatment Section 10 Solvent Contact Section 11 Water Scrubber (Aqueous Solvent Contact Section)
11a Water (aqueous solvent)
11b Spray nozzle 11c Solvent path 11d Solvent reservoir 11e Inlet port 11f Outlet port 12 Oil scrubber (oil solvent contact part)
12a Oily solvent 12b Dispersion nozzle 12c Solvent path 12d Solvent reservoir 12e Inlet port 12f Outlet port 20 Phase change substance removing unit 21a Refrigerant 21 Chiller (cooling unit)
22 Phase Change Material Capture Section 22f Phase Change Material Capture Filter 23 Cooling Pipe 24 Refrigerant Path 25 Drain Path 30 Chiller (Moisture Removal Section)
30a Refrigerant 33 Cooling pipe 34 Refrigerant path 35 Drain path 40 Solid-liquid trapping part 42 Solid-liquid trapping filter 50 Gaseous impurity adsorption part 51 Adsorption tower 52 Adsorbent 6 Synthetic gas utilization part

Claims (3)

A purification treatment method for removing impurities in synthesis gas,
A step of adsorbing a gaseous impurity by bringing the synthesis gas into contact with an adsorbent capable of adsorbing a gaseous impurity;
A pretreatment step performed before the gaseous impurity adsorption step,
And the pretreatment step,
A solvent contacting step of contacting the synthesis gas with an aqueous solvent and an oily solvent,
Cooling the synthetic gas after the solvent contacting step and passing the phase-transparent substance through a phase-transparent substance capturing part , wherein the synthetic gas is naphthalene, 1-naphthol, 2-naphthol as the phase-transparent substance. A method for purifying a syngas , comprising a sublimable substance selected from the above, and setting a cooling target temperature in the step of removing the phase change substance to a temperature at which the sublimable substance is sublimated and solidified . The synthesis gas purification treatment method according to claim 1 , wherein the synthesis gas after the step of adsorbing gaseous impurities is supplied to a liquid medium containing gas-utilizing microorganisms. A purification treatment device for removing impurities in synthesis gas,
A gaseous impurity adsorbing section comprising an adsorbent capable of adsorbing a gaseous impurity, wherein the synthesis gas is brought into contact with the adsorbent,
A pretreatment unit arranged in the preceding stage of the gaseous impurity adsorption unit,
And the pretreatment unit,
An aqueous solvent contacting portion for contacting the synthesis gas with an aqueous solvent,
An oily solvent contact part for contacting the synthesis gas with an oily solvent,
A cooling unit that cools the synthesis gas after passing through the aqueous solvent contacting unit and the oily solvent contacting unit , and a phase-transferring substance removing unit having a phase-transferring substance capturing unit through which the cooled synthesis gas passes .
Only containing the synthesis gas comprises naphthalene, 1-naphthol, a sublimable substance selected from 2-naphthol as a phase transition material, target cooling temperature in the cooling section, the sublimable material is sublimated solidified A synthetic gas purification processing device, which is characterized in that the temperature is set to a certain temperature .

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