JP6626709B2 - ITO conductive film and paint for forming the ITO conductive film - Google Patents

ITO conductive film and paint for forming the ITO conductive film Download PDF

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JP6626709B2
JP6626709B2 JP2015251538A JP2015251538A JP6626709B2 JP 6626709 B2 JP6626709 B2 JP 6626709B2 JP 2015251538 A JP2015251538 A JP 2015251538A JP 2015251538 A JP2015251538 A JP 2015251538A JP 6626709 B2 JP6626709 B2 JP 6626709B2
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真也 白石
真也 白石
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Mitsubishi Materials Electronic Chemicals Co Ltd
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Jemco Inc
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Description

本発明は、LCD(Liquid Crystal Display)やPDP(Plasma Display Panel)、有機EL(ElectroLuminescence)、タッチパネル等の表示装置に用いられる透明電極を構成するITO導電膜及びこのITO導電膜を形成するための塗料に関するものである。本明細書において、ITOとはインジウム錫酸化物(Indium Tin Oxide)をいう。   The present invention is an LCD (Liquid Crystal Display) or PDP (Plasma Display Panel), an organic EL (ElectroLuminescence), an ITO conductive film constituting a transparent electrode used in a display device such as a touch panel, and for forming this ITO conductive film It relates to paint. In the present specification, ITO refers to indium tin oxide (Indium Tin Oxide).

従来、この種のITO導電膜は、基材シート表面にITO導電膜形成用塗料をコーティングし、乾燥して形成されている。この基材シート表面に形成されたITO導電膜を巻き取る場合、或いはITO導電膜を基材シートとともに一対のカレンダロールの間を通して加圧する場合には、ITO導電膜表面が巻取り状態の基材シートの裏面又はカレンダロールへの密着防止のために、またITO導電膜表面が基材シート裏面又はカレンダロールによる汚染又は傷付き防止のために、巻き取る前又はカレンダ処理する前に離型処理された保護フィルム又はカバーフィルムをITO導電膜表面に積層している。そしてITO導電膜を使用するとき又は加圧した後に、保護フィルム又はカバーフィルムをITO導電膜の表面から剥離している(例えば、特許文献1参照。)。前者の保護フィルムは、例えば、基材シートを上面にしてITO導電膜を携帯電話のディスプレイ表面に貼着する場合に、貼着直前で剥離される保護フィルムである。   Conventionally, this type of ITO conductive film is formed by coating a coating material for forming an ITO conductive film on the surface of a base material sheet and drying it. When winding the ITO conductive film formed on the surface of the substrate sheet, or when pressing the ITO conductive film together with the substrate sheet through a pair of calender rolls, the substrate with the surface of the ITO conductive film wound up In order to prevent adhesion to the back surface of the sheet or the calendar roll, and to prevent contamination or damage of the ITO conductive film surface from the back surface of the base sheet or the calendar roll, a release treatment is performed before winding or calendering. Protective film or cover film is laminated on the surface of the ITO conductive film. Then, when using the ITO conductive film or after pressing, the protective film or the cover film is peeled off from the surface of the ITO conductive film (for example, see Patent Document 1). The former protective film is, for example, a protective film that is peeled off immediately before application when the ITO conductive film is attached to the display surface of a mobile phone with the base sheet facing upward.

上記離型処理された保護フィルム又はカバーフィルムは、通常、ポリエステルフィルム等の基材フィルムの表面にシリコーン系樹脂や、非シリコーン系樹脂である長鎖アルキル基含有化合物やオレフィン系樹脂などの膜表面調整剤(離型剤)からなる層が形成されている(例えば、特許文献2参照。)。   The protective film or cover film subjected to the release treatment is usually formed on the surface of a base film such as a polyester film by a silicone resin or a film surface of a non-silicone resin such as a long-chain alkyl group-containing compound or an olefin resin. A layer made of an adjusting agent (release agent) is formed (for example, see Patent Document 2).

特開2015−162325号公報(段落[0040]〜[0042]、図1(b))JP 2015-162325 A (paragraphs [0040] to [0042], FIG. 1B) 特開2007−203588号公報(段落[0002]、[0006])JP 2007-203588 A (paragraphs [0002] and [0006])

しかしながら、特許文献2に記載された保護フィルム又はカバーフィルムをITO導電膜表面に積層した後、この保護フィルム又はカバーフィルムを剥離する際に、ITO導電膜の表面層の一部が剥がれる問題があった。また基材フィルム表面の膜表面調整剤(剥離剤)のシリコーン樹脂がITO導電膜中に移行し、ITO導電膜の導電性と透明性を劣化させる問題点があった。   However, after laminating the protective film or cover film described in Patent Document 2 on the surface of the ITO conductive film, when the protective film or cover film is peeled off, there is a problem that a part of the surface layer of the ITO conductive film is peeled off. Was. In addition, there is a problem that the silicone resin as a film surface conditioner (release agent) on the surface of the base film migrates into the ITO conductive film, and deteriorates the conductivity and transparency of the ITO conductive film.

本発明の第1の目的は、ITO導電膜表面の保護フィルムを剥離してITO導電膜を使用するときに、ITO導電膜の表面層が剥がれない、ITO導電膜及びこのITO導電膜を形成するための塗料を提供することにある。本発明の第2の目的は、良好な導電性と透明性を兼ね備えた、ITO導電膜及びこのITO導電膜を形成するための塗料を提供することにある。   A first object of the present invention is to form an ITO conductive film and a method of forming the ITO conductive film, wherein a surface layer of the ITO conductive film is not peeled off when the protective film on the surface of the ITO conductive film is peeled and the ITO conductive film is used. It is to provide a paint for. A second object of the present invention is to provide an ITO conductive film having both good conductivity and transparency, and a paint for forming the ITO conductive film.

本発明の第1の観点は、ITO粒子がバインダ樹脂中に均一に分散してなるITO導電膜において、前記ITO導電膜100質量%中、前記ITO粒子を70〜90質量%、膜表面調整剤として下記式(1)で表される両性型含窒素フッ素系化合物を3質量%以下それぞれ含み、前記ITO粒子が40〜65m/gのBET法による比表面積と37以下のL値を有することを特徴とする。 According to a first aspect of the present invention, in an ITO conductive film in which ITO particles are uniformly dispersed in a binder resin, 70 to 90% by mass of the ITO particles in 100% by mass of the ITO conductive film, The ITO particles have a specific surface area of 40 to 65 m 2 / g by a BET method and an L value of 37 or less, each containing 3% by mass or less of an amphoteric nitrogen-containing fluorine-based compound represented by the following formula (1). It is characterized by.

Figure 0006626709
Figure 0006626709

但し、式(1)中、Rf、Rfは、それぞれ同一又は互いに異なる、炭素数1〜6であって直鎖状又は分岐状のペルフルオロアルキル基である。また、Rfは、炭素数1〜6であって、直鎖状又は分岐状のペルフルオロアルキレン基である。Rは、2価の有機基である連結基であり、Xは、両性型の親水性賦与基である。 However, in the formula (1), Rf 1 and Rf 2 are the same or different, each having 1 to 6 carbon atoms and being a linear or branched perfluoroalkyl group. Rf 3 is a linear or branched perfluoroalkylene group having 1 to 6 carbon atoms. R is a linking group that is a divalent organic group, and X is an amphoteric type hydrophilicity-imparting group.

本発明の第2の観点は、ITO粒子とバインダ樹脂と溶媒とを含むITO導電膜形成用塗料において、前記塗料100質量%中、前記ITO粒子を3〜45質量%、膜表面調整剤として上記式(1)で表される両性型含窒素フッ素系化合物を0.3質量%以下それぞれ含み、前記塗料の固形分100質量%中、前記ITO粒子以外の成分を10〜30質量%含み、前記前記ITO粒子が40〜65m/gのBET法による比表面積と37以下のL値を有することを特徴とする。 According to a second aspect of the present invention, there is provided a coating for forming an ITO conductive film containing ITO particles, a binder resin, and a solvent. 0.3% by mass or less each of the amphoteric nitrogen-containing fluorine-based compound represented by the formula (1), and 10% to 30% by mass of components other than the ITO particles in 100% by mass of the solid content of the paint, The ITO particles have a specific surface area according to a BET method of 40 to 65 m 2 / g and an L value of 37 or less.

本発明の第1の観点のITO導電膜では、ITO粒子がバインダ樹脂中に均一に分散してなり、かつ膜表面調整剤として特定の両性型含窒素フッ素系化合物を3質量%以下の割合で含むため、ITO導電膜表面から保護フィルムを剥離するときに、ITO導電膜の表面層が剥がれることがない。また両性型含窒素フッ素系化合物は、導電性があるためITO導電膜の導電性を低下させず、また両性イオンのためITO粒子の表面電荷と作用しにくい。この結果、ITO粒子を凝集させずITO導電膜の透明性を低下させない。更にITO導電膜が所定の比表面積とL値を有するITO粒子を70〜90質量%含むため、良好な導電性と透明性を兼ね備えることができる。   In the ITO conductive film according to the first aspect of the present invention, ITO particles are uniformly dispersed in a binder resin, and a specific amphoteric nitrogen-containing fluorine-based compound is used as a film surface modifier at a ratio of 3% by mass or less. Therefore, when the protective film is peeled off from the surface of the ITO conductive film, the surface layer of the ITO conductive film does not peel off. Further, since the amphoteric nitrogen-containing fluorine-based compound is conductive, it does not lower the conductivity of the ITO conductive film, and because of the amphoteric ions, it hardly acts on the surface charge of the ITO particles. As a result, the ITO particles are not aggregated and the transparency of the ITO conductive film is not reduced. Furthermore, since the ITO conductive film contains 70 to 90% by mass of ITO particles having a predetermined specific surface area and an L value, it is possible to have both good conductivity and transparency.

本発明の第2の観点のITO導電膜形成用塗料では、塗料中に含まれた膜表面調整剤としての両性型含窒素フッ素系化合物は、塗膜の乾燥時にその低い表面張力により、塗膜の表層部に析出する。このため、この塗料により形成したITO導電膜表面に離型剤層付き保護フィルムを積層した後で、この表面から保護フィルムを剥離するときに、この保護フィルムがITO導電膜表面からの剥がれ易く、かつ両性型含窒素フッ素系化合物を0.3質量%以下含んでもこの化合物は上述した特性を有するため、ITO導電膜の導電性と透明性に悪影響を及ぼさない。更にITO導電膜形成用塗料が所定の比表面積とL値を有するITO粒子を3〜45質量%含むため、ITO導電膜にしたときに、良好な導電性と透明性を兼ね備えることができる。また塗料固形分中、バインダ樹脂を含むITO粒子以外の成分を10〜30質量%含むことにより、ITO導電膜の基材への密着性に優れる。   In the paint for forming an ITO conductive film according to the second aspect of the present invention, the amphoteric nitrogen-containing fluorine-containing compound as a film surface conditioner contained in the paint contains a low surface tension during drying of the coating film. Precipitates on the surface layer of. For this reason, after laminating a protective film with a release agent layer on the surface of the ITO conductive film formed by this paint, when the protective film is peeled off from the surface, the protective film is easily peeled off from the surface of the ITO conductive film, Even when the amphoteric nitrogen-containing fluorine-containing compound is contained in an amount of 0.3% by mass or less, the compound has the above-described characteristics, and thus does not adversely affect the conductivity and transparency of the ITO conductive film. Furthermore, since the coating material for forming an ITO conductive film contains 3 to 45% by mass of ITO particles having a predetermined specific surface area and an L value, when the ITO conductive film is formed, it can have both good conductivity and transparency. Further, by containing 10 to 30% by mass of components other than the ITO particles containing the binder resin in the solid content of the paint, the adhesion of the ITO conductive film to the substrate is excellent.

次に本発明を実施するための形態を説明する。   Next, an embodiment for carrying out the present invention will be described.

〔ITO導電膜形成用塗料〕
本実施の形態のITO導電膜形成用塗料は、ITO粒子とバインダ樹脂と溶媒とに加えて、膜表面調整剤として両性型含窒素フッ素系化合物を前記塗料100質量%中、0.3質量%以下更に含む。塗料100質量%中、ITO粒子を3〜45質量%含み、塗料の固形分100質量%中、ITO粒子以外の成分を10〜30質量%含む。膜表面調整剤として両性型含窒素フッ素系化合物を含有させるのは、両性型の含窒素フッ素系化合物は、導電性があるためITO導電膜の導電性を低下させず、またITO粒子の表面電荷と作用しにくいためITO粒子を凝集させずITO導電膜の透明性を低下させないからである。一方、カチオン型及びアニオン型の含窒素フッ素系化合物は、カチオンイオン及びアニオンイオンがITO粒子の表面電荷と作用し易いためITO粒子が凝集し易く、ITO導電膜の透明性を低下させる。
[Coating for forming ITO conductive film]
The coating material for forming an ITO conductive film according to the present embodiment contains 0.3% by mass of an amphoteric nitrogen-containing fluorine-based compound as a film surface conditioner in 100% by mass of the coating material in addition to the ITO particles, the binder resin, and the solvent. The following is further included. 100% by mass of the paint contains 3 to 45% by mass of ITO particles, and 100% by mass of the solid content of the paint contains 10 to 30% by mass of components other than the ITO particles. The amphoteric nitrogen-containing fluorine-based compound is contained as a film surface conditioner because the amphoteric nitrogen-containing fluorine-based compound does not lower the conductivity of the ITO conductive film because it has conductivity, and the surface charge of the ITO particles. This is because they do not readily act and do not agglomerate the ITO particles and do not lower the transparency of the ITO conductive film. On the other hand, in the cationic and anionic nitrogen-containing fluorine-based compounds, since the cation ion and the anion ion easily act on the surface charge of the ITO particles, the ITO particles are easily aggregated, and the transparency of the ITO conductive film is reduced.

塗料中のITO粒子は、40〜65m/gのBET法による比表面積と37以下のL値を有する。BET法による比表面積が40m/g未満であると、所望の表面抵抗率を有するITO導電膜にしたときのヘーズが高くなり膜の透明性が低くなる。ヘーズを低くするためにITO粒子の膜中の含有量を減少させると、膜の所望の表面抵抗率が得られず、膜の導電性が悪くなる。本来であれば、BET値が高いと、粒子が小さくなるため、透明性並びにヘーズの低減を図ることが可能であるけれども、BET法による比表面積が65m/gを超えると、所定の分散剤の添加量で樹脂にITO粒子を混合した場合、このITO粒子の樹脂への分散が不十分となり、かえって塗膜のヘーズが悪くなる。このことを回避しようとしてヘーズを低減する目的で、65m/gを超えたITO粒子を用いた場合、このITO粒子を樹脂に分散するための分散剤量を増やす必要が生じる。分散剤を増加すると、膜の導電性が悪くなり、かつ基材への密着性が悪化する等の問題が発生する。このため、ITO粒子のBET法による比表面積の上限値は65m/gにする。また所望の表面抵抗率を得るためにこのITO粒子の膜中の含有量を増大させると、ITO導電膜形成用塗料を基材上に塗布したときにITO導電膜の基材への密着性が悪くなる。 The ITO particles in the paint have a specific surface area by the BET method of 40 to 65 m 2 / g and an L value of 37 or less. If the specific surface area by the BET method is less than 40 m 2 / g, the haze of an ITO conductive film having a desired surface resistivity increases, and the transparency of the film decreases. If the content of the ITO particles in the film is reduced to reduce the haze, the desired surface resistivity of the film cannot be obtained, and the conductivity of the film deteriorates. Originally, when the BET value is high, the particles become small, so that transparency and haze can be reduced. However, when the specific surface area by the BET method exceeds 65 m 2 / g, a predetermined dispersing agent is used. When the ITO particles are mixed with the resin in the amount of (1), the dispersion of the ITO particles in the resin becomes insufficient, and the haze of the coating film deteriorates. When ITO particles exceeding 65 m 2 / g are used to reduce haze in order to avoid this, it is necessary to increase the amount of a dispersant for dispersing the ITO particles in the resin. When the amount of the dispersing agent is increased, problems such as deterioration of the conductivity of the film and deterioration of the adhesion to the substrate occur. Therefore, the upper limit of the specific surface area of the ITO particles by the BET method is set to 65 m 2 / g. When the content of the ITO particles in the film is increased in order to obtain a desired surface resistivity, the adhesion of the ITO conductive film to the substrate when the paint for forming the ITO conductive film is applied on the substrate is increased. become worse.

またITO粒子のL値が37を超えると、このITOの還元が不十分であるため、膜の表面抵抗率が高くなり膜の導電性が悪くなる。また粒子も大きくなるため、膜のヘーズが高くなり膜の透明性が低くなる。   When the L value of the ITO particles exceeds 37, the reduction of the ITO is insufficient, so that the surface resistivity of the film increases and the conductivity of the film deteriorates. Further, since the size of the particles increases, the haze of the film increases and the transparency of the film decreases.

塗料中のバインダ樹脂は、ITO導電膜中、10〜35質量%含むことが好ましい。このバインダ樹脂は、特に限定されないが、エチルセルロースとテルペンフェノール樹脂を用いる場合は、エチルセルロースとテルペンフェノール樹脂の質量比は、エチルセルロース:テルペンフェノール樹脂=10〜80:90〜20であることがITO導電膜の基材への密着性を高める観点から好ましい。テルペンフェノール樹脂を例示すれば、アリゾナケミカル社製SylvaliteTP7042(軟化点:145℃),荒川化学工業社製タマノル803L(軟化点:140〜160℃)、901(軟化点:120〜135℃)、ヤスハラケミカル社製YSポリスターT160(軟化点:160℃),145(軟化点:145℃),T130(軟化点:130℃),U130(軟化点:130℃),S145(軟化点:145℃),G150(軟化点:150℃),K140(軟化点:140℃),TH130(軟化点:130℃)等が挙げられる。   The binder resin in the paint preferably contains 10 to 35% by mass in the ITO conductive film. The binder resin is not particularly limited, but when ethyl cellulose and terpene phenol resin are used, the mass ratio of ethyl cellulose to terpene phenol resin is such that ethyl cellulose: terpene phenol resin = 10-80: 90-20. This is preferable from the viewpoint of increasing the adhesion of the polymer to the substrate. Examples of the terpene phenol resin include Sylvalite TP7042 (softening point: 145 ° C) manufactured by Arizona Chemical Co., Ltd., Tamanol 803L (softening point: 140 to 160 ° C), 901 (softening point: 120 to 135 ° C) manufactured by Arakawa Chemical Industries, and Yashara Chemical. YS Polystar T160 (softening point: 160 ° C), 145 (softening point: 145 ° C), T130 (softening point: 130 ° C), U130 (softening point: 130 ° C), S145 (softening point: 145 ° C), G150 (Softening point: 150 ° C.), K140 (softening point: 140 ° C.), TH130 (softening point: 130 ° C.) and the like.

ITO導電膜形成用塗料は、前述したようにITO粒子とバインダ樹脂と両性型含窒素フッ素系化合物と溶媒とを混合して調製される。この塗料には分散剤を混合してもよい。分散剤を混合することにより、塗膜にしたときの透明性が更に向上する。この塗料は、塗料100質量%中、ITO粒子を3〜45質量%、好ましくは4〜40質量%含む。またその固形分100質量%中、ITO粒子以外の成分を10〜30質量%、好ましくは15〜25質量%含むように調製される。更にこの塗料は、塗料100質量%中、両性型含窒素フッ素系化合物を0.3質量%以下、好ましくは0.01〜0.2質量%更に含むように調製される。   As described above, the paint for forming an ITO conductive film is prepared by mixing ITO particles, a binder resin, an amphoteric nitrogen-containing fluorine-based compound, and a solvent. A dispersant may be mixed in the paint. By mixing the dispersant, the transparency of the coating film is further improved. This paint contains 3 to 45% by mass, preferably 4 to 40% by mass of ITO particles in 100% by mass of the paint. Further, it is prepared so as to contain 10 to 30% by mass, preferably 15 to 25% by mass, of components other than ITO particles in 100% by mass of the solid content. Further, this paint is prepared so as to further contain 0.3% by mass or less, preferably 0.01 to 0.2% by mass, of the amphoteric nitrogen-containing fluorine-based compound in 100% by mass of the paint.

塗料中のITO粒子の含有量が3質量%未満では、この塗料から作られたITO導電膜の導電性が高くならない。またこの含有量が45質量%を超えると、塗料が増粘するなど経時安定性が悪くなる。しかもバインダ樹脂が相対的に不足し、ITO粒子の粒子間の接着力が低下し、ITO導電膜の表面抵抗率が悪化する。   When the content of the ITO particles in the paint is less than 3% by mass, the conductivity of the ITO conductive film made from the paint does not increase. On the other hand, if the content exceeds 45% by mass, the stability with time, such as thickening of the paint, is deteriorated. Moreover, the binder resin is relatively short, the adhesion between the ITO particles is reduced, and the surface resistivity of the ITO conductive film is deteriorated.

また塗料の固形分中のITO粒子以外の成分含有量が10質量%未満では、ITO導電膜の基材に対する密着性が十分に得られない。またこの含有量が30質量%を超えると、ITO導電膜の表面抵抗率が悪くなり、導電性が低下する。   If the content of components other than the ITO particles in the solid content of the paint is less than 10% by mass, sufficient adhesion of the ITO conductive film to the substrate cannot be obtained. On the other hand, if the content exceeds 30% by mass, the surface resistivity of the ITO conductive film deteriorates, and the conductivity decreases.

更に塗料中の両性型含窒素フッ素系化合物の含有量が0.3質量%を超えると、塗料が増粘するなど経時安定性が悪化し、ITO導電膜の表面抵抗率及び導電性が低下する。   Further, when the content of the amphoteric nitrogen-containing fluorine-based compound in the coating exceeds 0.3% by mass, the coating is thickened, the temporal stability is deteriorated, and the surface resistivity and the conductivity of the ITO conductive film are reduced. .

本実施の形態の膜表面調整剤としての含窒素フッ素系化合物は、下記式(1)で示される両性型である。   The nitrogen-containing fluorine-based compound as a film surface conditioner of the present embodiment is an amphoteric type represented by the following formula (1).

Figure 0006626709
Figure 0006626709

上記式(1)中、Rf、Rfは、それぞれ同一又は互いに異なる、炭素数1〜6であって直鎖状又は分岐状のペルフルオロアルキル基である。また、Rfは、炭素数1〜6であって、直鎖状又は分岐状のペルフルオロアルキレン基である。上記Rf、Rfの各炭素数は好ましくは2〜5である。 In the above formula (1), Rf 1 and Rf 2 are the same or different, each having 1 to 6 carbon atoms and being a linear or branched perfluoroalkyl group. Rf 3 is a linear or branched perfluoroalkylene group having 1 to 6 carbon atoms. Each of Rf 1 and Rf 2 preferably has 2 to 5 carbon atoms.

また上記式(1)中、Rは、2価の有機基である連結基である。前記Rは、直鎖状又は分岐状の有機基であってもよい。また、前記Rは、分子鎖中にエーテル結合、エステル結合、アミド結合及びウレタン結合から選択される1種以上の結合を含んでいてもよいし、含まなくてもよい。   In the above formula (1), R is a linking group that is a divalent organic group. R may be a linear or branched organic group. R may or may not include one or more bonds selected from an ether bond, an ester bond, an amide bond, and a urethane bond in the molecular chain.

また上記式(1)中、Xは、カルボベタイン型、スルホベタイン型、アミンオキシド型及びホスホベタイン型のうち、いずれかの末端を有する両性型の親水性賦与基である、本実施の形態の含窒素フッ素系化合物は両性型であるため、親水性付与基Xは、末端に、カルボベタイン型の「−N(CHCO 」、スルホベタイン型の「−N(CHSO 」、アミンオキシド型の「−N」又はホスホベタイン型の「−OPO (CH10」(nは1〜10、好ましくは1〜5の整数、R及びRは水素原子又は炭素数1〜10、好ましくは1〜5のアルキル基、R10は水素原子又は炭素数1〜10、好ましくは1〜5のアルキル基又は炭素数1〜10、好ましくは1〜5のアルキレン基)を有する。 In the above formula (1), X is an amphoteric type hydrophilicity-imparting group having any one of terminals of a carbobetaine type, a sulfobetaine type, an amine oxide type and a phosphobetaine type. Since the nitrogen-containing fluorine-based compound is of the amphoteric type, the hydrophilicity-imparting group X has a carbobetaine-type “-N + R 8 R 9 (CH 2 ) n CO 2 ” and a sulfobetaine-type “-” at the terminal. n + R 8 R 9 (CH 2) n SO 3 - ", of the amine oxide type" -N + R 8 R 9 O - "or phosphobetaine type" -OPO 3 - (CH 2) n n + R 8 R 9 R 10 ”(n is an integer of 1 to 10, preferably 1 to 5, R 8 and R 9 are a hydrogen atom or an alkyl group having 1 to 10, preferably 1 to 5 carbon atoms, R 10 is a hydrogen atom or Alkyl having 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms Or an alkylene group having 1 to 10, preferably 1 to 5 carbon atoms).

上記式(1)で表される両性型含窒素フッ素系化合物としては、次の式(2)で表されるカルボベタイン型化合物、式(3)〜(5)で表されるスルホベタイン型化合物、式(6)で表されるアミンオキシド型化合物、及び式(7)で表されるホスホベタイン型化合物が例示される。   Examples of the amphoteric nitrogen-containing fluorine-based compound represented by the above formula (1) include a carbobetaine-type compound represented by the following formula (2) and a sulfobetaine-type compound represented by the following formulas (3) to (5) , An amine oxide type compound represented by the formula (6), and a phosphobetaine type compound represented by the formula (7).

・式(2)で表されるカルボベタイン型化合物   -Carbobetaine type compound represented by the formula (2)

Figure 0006626709
Figure 0006626709

・式(3)で表されるスルホベタイン型化合物   ・ Sulfobetaine type compound represented by formula (3)

Figure 0006626709
Figure 0006626709

・式(4)で表されるスルホベタイン型化合物   ・ Sulfobetaine type compound represented by formula (4)

Figure 0006626709
Figure 0006626709

・式(5)で表されるスルホベタイン型化合物   ・ Sulfobetaine type compound represented by formula (5)

Figure 0006626709
Figure 0006626709

・式(6)で表されるアミンオキシド型化合物   -Amine oxide type compound represented by the formula (6)

Figure 0006626709
Figure 0006626709

・式(7)で表されるホスホベタイン型化合物   -Phosphobetaine type compound represented by the formula (7)

Figure 0006626709
Figure 0006626709

なお、含窒素フッ素系化合物には、両性型以外に、次の式(8)で表されるアニオン型含窒素フッ素系化合物及び式(9)で表されるカチオン型含窒素フッ素系化合物が存在する。   In addition to the amphoteric type, the nitrogen-containing fluorine-based compound includes an anionic nitrogen-containing fluorine-containing compound represented by the following formula (8) and a cationic nitrogen-containing fluorine-containing compound represented by the following formula (9). I do.

・式(8)で表されるアニオン型化合物   ・ Anionic compound represented by formula (8)

Figure 0006626709
Figure 0006626709

・式(9)で表されるカチオン型化合物   ・ Cation type compound represented by formula (9)

Figure 0006626709
Figure 0006626709

塗料中の溶媒は特に限定されないが、この溶媒としては3−メトキシ−3−メチル−1−ブタノール(以下、MMBという。)が主として用いられる。3−メトキシ−3−メチル−1−ブタノールは、比較的高沸点でありながら、水溶性であるため、水混合溶媒として利用することも可能で、ITO粒子を分散することが容易であり、塗膜の光学特性向上を図ることが可能である。塗料における溶媒は、速乾性を求められるため、沸点の低い、2−ブタノン、4−メチル−2−ペンタノン、エタノール、2−プロパノール、1−ブタノール、トルエン、メタノール、1-プロパノール、酢酸エチル、酢酸ブチル、アセトン、2,4−ペンタンジオン、キシレン等と3−メトキシ−3−メチル−1−ブタノールを組み合わせて用いることが好ましい。溶媒の含有量は、塗料100質量%中、45〜95質量%であることが好ましい。   Although the solvent in the paint is not particularly limited, 3-methoxy-3-methyl-1-butanol (hereinafter, referred to as MMB) is mainly used as the solvent. 3-methoxy-3-methyl-1-butanol has a relatively high boiling point and is water-soluble, so that it can be used as a mixed solvent of water, and it is easy to disperse the ITO particles. It is possible to improve the optical characteristics of the film. Since the solvent in the coating is required to dry quickly, 2-butanone, 4-methyl-2-pentanone, ethanol, 2-propanol, 1-butanol, toluene, methanol, 1-propanol, ethyl acetate, acetic acid having a low boiling point are used. It is preferable to use butyl, acetone, 2,4-pentanedione, xylene, or the like in combination with 3-methoxy-3-methyl-1-butanol. The content of the solvent is preferably 45 to 95% by mass in 100% by mass of the coating material.

塗料中の分散剤は、ITO粒子100質量部に対して1〜10質量部含まれることが好ましい。この分散剤の例としては、顔料を安定して微粒子分散できるものであれば、任意の顔料用分散剤を用いることができる。具体的には、ポリオキシエチレンスチレン化フェニルエーテル硫酸アンモニウム、ポリオキシアルキレンデシルエーテル硫酸ナトリウム、ポリオキシエチレントリデシルエーテル硫酸ナトリウム、ポリオキシエチレンイソデシルエーテル硫酸アンモニウム、ポリオキシエチレンラウリルエーテル硫酸ナトリウム、ポリオキシエチレンラウリルエーテル硫酸アンモニウム、ポリオキシエチレンアルキルエーテル硫酸ナトリウム、ポリオキシエチレンオレイルセチルエーテル硫酸アンモニウム、ポリオキシエチレンオレイルセチルエーテル硫酸ナトリウム等のアルキルエーテル硫酸塩、アルキル硫酸エステル塩、アルキルベンゼンスルホン酸塩、アルキルフタレンスルフォン酸塩、ポリオキシエチレンアルキルエーテルリン酸エステル、ポリオキシエチレンアルキルエーテルリン酸エステル、ポリオキシエチレンラウリルエーテルリン酸エステル、ポリオキシエチレンアルキルエーテルリン酸塩、ポリオキシエチレントリデシルエーテルリン酸エステル、ポリオキシエチレンスチレン化フェニルエーテルリン酸エステル等のアルキルリン酸エステル塩、ポリオキシエチレンアルキルエーテル酢酸塩、ポリオキシエチレンラウリルエーテル酢酸ナトリウム等のアルキルエーテル酢酸塩、ラウリルスルホコハク酸二ナトリウムポリオキシエチレンアルキルスルホコハク酸二ナトリウム、ポリオキシエチレンスルホコハク酸ラウリル二ナトリウム、ポリオキシエチレンアルキルスルホコハク酸塩等のアルキルコハク酸塩、ポリカルボン酸型高分子等の陰イオン性界面活性剤、アミンオキサイド等の陽イオン性界面活性剤、オキシエチレンブロックコポリマー、ポリオキシエチレンアルキルアミド等の非イオン性界面活性剤などの界面活性剤が挙げられる。分散剤の含有量が1質量部未満では、ITO導電膜形成用塗料の分散が不十分となり、塗膜の透明性が不十分になりやすい。また10質量部を超えると、ITO導電膜の導電性と塗膜の密着性に悪影響を及ぼしやすい。   The dispersant in the paint is preferably contained in an amount of 1 to 10 parts by mass based on 100 parts by mass of the ITO particles. As an example of the dispersant, any dispersant for a pigment can be used as long as the pigment can be stably dispersed in fine particles. Specifically, ammonium polyoxyethylene styrenated phenyl ether sulfate, sodium polyoxyalkylene decyl ether sulfate, sodium polyoxyethylene tridecyl ether sulfate, ammonium polyoxyethylene isodecyl ether sulfate, sodium polyoxyethylene lauryl ether sulfate, polyoxyethylene Alkyl ether sulfates such as ammonium lauryl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, ammonium polyoxyethylene oleyl cetyl ether sulfate, sodium polyoxyethylene oleyl cetyl ether sulfate, alkyl sulfate ester salts, alkyl benzene sulfonate, alkyl phthalene sulfonic acid Salt, polyoxyethylene alkyl ether phosphate, polyoxy Alkyl phosphates such as ethylene alkyl ether phosphate, polyoxyethylene lauryl ether phosphate, polyoxyethylene alkyl ether phosphate, polyoxyethylene tridecyl ether phosphate, polyoxyethylene styrenated phenyl ether phosphate, etc. Ester salts, polyoxyethylene alkyl ether acetates, alkyl ether acetates such as sodium polyoxyethylene lauryl ether acetate, disodium lauryl sulfosuccinate, disodium polyoxyethylene alkyl sulfosuccinate, disodium lauryl polyoxyethylene sulfosuccinate, polyoxy Alkyl succinates such as ethylene alkyl sulfosuccinates, anionic surfactants such as polycarboxylic acid type polymers, amine oxides Cationic surfactants, polyoxyethylene block copolymers, surfactants, such as non-ionic surfactants such as polyoxyethylene alkyl amides. When the content of the dispersant is less than 1 part by mass, the dispersion of the coating material for forming the ITO conductive film becomes insufficient, and the transparency of the coating film tends to be insufficient. If it exceeds 10 parts by mass, the conductivity of the ITO conductive film and the adhesion of the coating film are likely to be adversely affected.

〔ITO導電膜〕
本実施の形態のITO導電膜は、ITO粒子がバインダ樹脂中に均一に分散してなり、かつ膜表面調整剤として両性型含窒素フッ素系化合物を含む。このITO導電膜は、ITO導電膜中、ITO粒子を70〜90質量%含み、ITO粒子が40〜65m/gのBET法による比表面積と37以下のL値を有し、バインダ樹脂を含み、両性型含窒素フッ素系化合物を3質量%以下、好ましくは0.1〜2質量%含む。
[ITO conductive film]
The ITO conductive film of the present embodiment has ITO particles uniformly dispersed in a binder resin and contains an amphoteric nitrogen-containing fluorine-based compound as a film surface modifier. This ITO conductive film contains 70 to 90% by mass of ITO particles in the ITO conductive film, the ITO particles have a specific surface area by a BET method of 40 to 65 m 2 / g, an L value of 37 or less, and a binder resin. And 3% by mass or less, preferably 0.1 to 2% by mass of an amphoteric nitrogen-containing fluorine-based compound.

ITO導電膜中のITO粒子の含有量が70質量%未満では、ITO導電膜の導電性が向上しない。この含有量が90質量%を超えると、バインダ樹脂が相対的に不足し、ITO粒子の粒子間の接着力が低下し、ITO導電膜の表面抵抗率が悪化する。ITO導電膜中のITO粒子のBET法による比表面積とL値の各数値範囲の臨界的意義は塗料中のこれらの各数値範囲の臨界的意義と同じである。ITO導電膜中の両性型含窒素フッ素系化合物が3質量%を超えると、ITO導電膜の表面抵抗率及び導電性が低下する。   When the content of the ITO particles in the ITO conductive film is less than 70% by mass, the conductivity of the ITO conductive film is not improved. If this content exceeds 90% by mass, the binder resin becomes relatively insufficient, the adhesion between the ITO particles decreases, and the surface resistivity of the ITO conductive film deteriorates. The critical significance of each numerical range of the specific surface area and the L value of the ITO particles in the ITO conductive film by the BET method is the same as the critical significance of each of these numerical ranges in the paint. If the amphoteric nitrogen-containing fluorine-based compound in the ITO conductive film exceeds 3% by mass, the surface resistivity and the conductivity of the ITO conductive film are reduced.

本実施の形態のITO導電膜は、例えば、基材であるポリエチレンテレフタレート(PET)、ポリブチレンテレフタレート、ポリエチレンナフタレート等のポリエステルフィルム上に、上記ITO導電膜形成用塗料を、スクリーン印刷法、バーコート法、ダイコート法、ドクターブレード、スピン法等により塗布した後に、60〜130℃の温度で乾燥させることにより、形成される。   The ITO conductive film of the present embodiment is obtained by, for example, applying the above-mentioned paint for forming an ITO conductive film on a polyester film such as polyethylene terephthalate (PET), polybutylene terephthalate, or polyethylene naphthalate by a screen printing method or a bar. It is formed by applying by a coating method, a die coating method, a doctor blade, a spinning method or the like, and then drying at a temperature of 60 to 130 ° C.

次に本発明の実施例を比較例とともに詳しく説明する。   Next, examples of the present invention will be described in detail together with comparative examples.

<実施例1>
43m/gのBET法による比表面積と30のL値を有するITO粒子(三菱マテリアル製P2−ITO)を準備し、このITO粒子100gを、ポリオキシエチレンアルキルエーテルリン酸エステル系の分散剤5gと溶媒のMMB145gの混合液に添加し、ビーズミル分散機にて、分散することにより、ITO分散液を得た。ITO分散液中のITO粒子の粒子径は、堀場製作所製LB−550にて測定したところ、50nmであった。得られたITO分散液10.38gとエチルセルロース0.19g、テルペンフェノール樹脂0.44gをMMBとメチルイソブチルケトン(MIBK)を1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.007g(塗料中の含有量が0.014質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 1>
ITO particles (P2-ITO manufactured by Mitsubishi Materials Corporation) having a specific surface area of 43 m 2 / g by a BET method and an L value of 30 are prepared, and 100 g of the ITO particles is mixed with 5 g of a polyoxyethylene alkyl ether phosphate ester dispersant. The mixture was added to a mixture of 145 g of MMB and a solvent, and dispersed by a bead mill disperser to obtain an ITO dispersion. The particle size of the ITO particles in the ITO dispersion was 50 nm as measured by LB-550 manufactured by Horiba, Ltd. 10.38 g of the obtained ITO dispersion, 0.19 g of ethyl cellulose, and 0.44 g of a terpene phenol resin were mixed with 38.78 g of a solvent in which MMB and methyl isobutyl ketone (MIBK) were mixed at a ratio of 1: 2. Finally, 0.007 g (the content in the coating material is 0.014% by mass) of a sulfobetaine type compound of the amphoteric nitrogen-containing fluorine compound represented by the above formula (3) is added and mixed as a film surface conditioner, and ITO is mixed. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例2>
膜表面調整剤として実施例1と同じ上記式(3)に示されるスルホベタイン型化合物を0.008g(塗料中の含有量が0.016質量%)添加し混合した。これ以外は、実施例1と同様にしてITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 2>
As a film surface conditioner, 0.008 g of the sulfobetaine compound represented by the above formula (3) as in Example 1 (content in the coating material: 0.016% by mass) was added and mixed. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 1. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例3>
膜表面調整剤として実施例1と同じ上記式(3)に示されるスルホベタイン型化合物を塗料中の含有量が0.013g(塗料中の含有量が0.025質量%)添加し混合した。これ以外は、実施例1と同様にしてITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 3>
The same sulfobetaine type compound represented by the above formula (3) as in Example 1 was added as a film surface conditioner in the coating material in an amount of 0.013 g (0.025% by mass in the coating material) and mixed. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 1. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例4>
膜表面調整剤として上記式(5)に示されるスルホベタイン型化合物を0.008g(塗料中の含有量が0.016質量%)添加し混合した。これ以外は、実施例1と同様にしてITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 4>
0.008 g (content in the coating material: 0.016% by mass) of a sulfobetaine type compound represented by the above formula (5) was added and mixed as a film surface conditioner. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 1. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例5>
膜表面調整剤として上記式(4)に示されるスルホベタイン型化合物を0.008g(塗料中の含有量が0.016質量%)添加し混合した。これ以外は、実施例1と同様にしてITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 5>
As a film surface conditioner, 0.008 g of the sulfobetaine type compound represented by the above formula (4) (the content in the coating material was 0.016% by mass) was added and mixed. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 1. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例6>
膜表面調整剤として上記式(2)に示されるカルボベタイン型化合物を0.008g(塗料中の含有量が0.016質量%)添加し混合した。これ以外は、実施例1と同様にしてITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 6>
As a film surface conditioner, 0.008 g of the carbobetaine type compound represented by the above formula (2) (the content in the coating material was 0.016% by mass) was added and mixed. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 1. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例7>
実施例1で得られたITO分散液10.38gとエチルセルロース0.16g、テルペンフェノール樹脂0.38gをMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.100g(塗料中の含有量が0.200質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 7>
10.38 g of the ITO dispersion obtained in Example 1, 0.16 g of ethyl cellulose, and 0.38 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.100 g of sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine compound represented by the above formula (3) as a film surface conditioner (the content in the paint is 0.200% by mass) is added and mixed, and ITO is added. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例8>
膜表面調整剤として上記式(6)に示されるアミンオキシド型化合物を0.008g(塗料中の含有量が0.016質量%)添加し混合した。これ以外は、実施例1と同様にしてITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
Example 8
0.008 g (content in the coating material: 0.016% by mass) of the amine oxide type compound represented by the above formula (6) was added and mixed as a film surface conditioner. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 1. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例9>
膜表面調整剤として上記式(7)に示されるホスホベタイン型化合物を0.008g(塗料中の含有量が0.016質量%)添加し混合した。これ以外は、実施例1と同様にしてITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 9>
As a film surface conditioner, 0.008 g of the phosphobetaine type compound represented by the above formula (7) (the content in the coating material was 0.016% by mass) was added and mixed. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 1. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例10>
実施例1で得られたITO分散液10.38gとエチルセルロース0.15g、テルペンフェノール樹脂0.34gをMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.150g(塗料中の含有量が0.300質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 10>
10.38 g of the ITO dispersion obtained in Example 1, 0.15 g of ethyl cellulose, and 0.34 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.150 g of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine compound represented by the above formula (3) represented by the above formula (3) (the content in the paint is 0.300% by mass) is added and mixed as a film surface modifier, and ITO is added. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例11>
40m/gのBET法による比表面積と37のL値を有するITO粒子を準備し、このITO粒子100gを、ポリオキシエチレンアルキルエーテルリン酸エステル系の分散剤5gと溶媒のMMB95gの混合液に添加し、ビーズミル分散機にて、分散することにより、ITO分散液を得た。ITO分散液中のITO粒子の粒子径は、堀場製作所製LB−550にて測定したところ、58nmであった。得られたITO分散液44.82gとアクリル樹脂(大阪有機化学工業製ビスコート802)3.38g、光重合開始剤(BASF社製イルガキュア184)0.27gをMMBとMIBKを1:2の比率で混合した溶媒0.59gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.150g(塗料中の含有量が0.081質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は44.8質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 11>
ITO particles having a specific surface area by the BET method of 40 m 2 / g and an L value of 37 are prepared, and 100 g of the ITO particles is mixed with a mixed solution of 5 g of a polyoxyethylene alkyl ether phosphate ester dispersant and 95 g of a solvent MMB. The resulting mixture was dispersed by a bead mill disperser to obtain an ITO dispersion. The particle size of the ITO particles in the ITO dispersion was 58 nm as measured by LB-550 manufactured by Horiba, Ltd. 44.82 g of the obtained ITO dispersion, 3.38 g of an acrylic resin (Viscoat 802 manufactured by Osaka Organic Chemical Industry), and 0.27 g of a photopolymerization initiator (Irgacure 184 manufactured by BASF) were mixed with MMB and MIBK at a ratio of 1: 2. It was mixed with 0.59 g of the mixed solvent. Finally, 0.150 g of a sulfobetaine compound of the amphoteric nitrogen-containing fluorine compound represented by the above formula (3) (the content in the coating material is 0.081% by mass) was added and mixed as a film surface conditioner, and ITO was mixed. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 44.8% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例12>
65m/gのBET法による比表面積と22のL値を有するITO粒子を準備し、このITO粒子100gを、ポリオキシエチレンアルキルエーテルリン酸エステル系の分散剤5gと溶媒のMMB145gの混合液に添加し、ビーズミル分散機にて、分散することにより、ITO分散液を得た。ITO分散液中のITO粒子の粒子径は、堀場製作所製LB−550にて測定したところ、48nmであった。得られたITO分散液4.15gとエポキシ樹脂(吉村油化学社製ユカレジンNE−002)0.40g、硬化剤(吉村油化学社製ユカレジンH−40)0.05gを溶媒として、MMB10.00gと水35.51g混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.003g(塗料中の含有量が0.006質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は3.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Example 12>
ITO particles having a specific surface area of 65 m 2 / g by the BET method and an L value of 22 are prepared, and 100 g of the ITO particles is mixed with a mixed solution of 5 g of a polyoxyethylene alkyl ether phosphate ester-based dispersant and 145 g of a solvent MMB. The resulting mixture was dispersed by a bead mill disperser to obtain an ITO dispersion. The particle diameter of the ITO particles in the ITO dispersion was 48 nm as measured by LB-550 manufactured by Horiba, Ltd. Using 4.15 g of the obtained ITO dispersion liquid, 0.40 g of an epoxy resin (Yukaresin NE-002, manufactured by Yoshimura Oil Chemical Co., Ltd.) and 0.05 g of a curing agent (Yukaresin H-40, manufactured by Yoshimura Oil Chemical Co., Ltd.) as a solvent, 10.00 g of MMB was used. And 35.51 g of water were mixed. Finally, 0.003 g (the content in the coating material is 0.006% by mass) of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine-containing compound represented by the above formula (3) is added and mixed as a film surface modifier, and ITO is mixed. A paint for forming a conductive film was prepared. The content of the ITO particles in this paint was 3.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<実施例13>
実施例1で得られたITO分散液26.25gとウレタン樹脂(第一工業製薬社製スーパーフレックス170)11.98gを溶媒のMMB3.00gと水8.23gを混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.023g(塗料中の含有量が0.045質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は21.0質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、30質量%であった。
<Example 13>
26.25 g of the ITO dispersion obtained in Example 1, 11.98 g of a urethane resin (Daiichi Kogyo Seiyaku Co., Ltd., Superflex 170) were mixed with 3.00 g of MMB as a solvent and 8.23 g of water. Finally, 0.023 g of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine compound represented by the above formula (3) (the content in the coating material is 0.045% by mass) is added and mixed as a film surface conditioner, and ITO is mixed. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 21.0% by mass, and the content of components other than the ITO particles in the solid content of the paint was 30% by mass.

<実施例14>
43m/gのBET法による比表面積と30のL値を有するITO粒子(三菱マテリアル製P2−ITO)を準備し、このITO粒子100gを、ポリオキシエチレンアルキルエーテルリン酸エステル系の分散剤5gと溶媒のトルエン70g、MMB75gの混合液に添加し、ビーズミル分散機にて、分散することにより、ITO分散液を得た。ITO分散液中のITO粒子の粒子径は、堀場製作所製LB−550にて測定したところ、49nmであった。得られたITO分散液16.88gとポリヒドロキシポリオレフィンポリマー(三菱化学製ポリテールH)0.40gを溶媒のトルエン32.38gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.011g(塗料中の含有量が0.023質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は13.5質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、10質量%であった。
<Example 14>
ITO particles (P2-ITO manufactured by Mitsubishi Materials Corporation) having a specific surface area of 43 m 2 / g by a BET method and an L value of 30 are prepared, and 100 g of the ITO particles is mixed with 5 g of a polyoxyethylene alkyl ether phosphate ester dispersant. The mixture was added to a mixture of 70 g of toluene and 75 g of MMB as a solvent, and dispersed by a bead mill disperser to obtain an ITO dispersion. The particle size of the ITO particles in the ITO dispersion was 49 nm as measured by LB-550 manufactured by Horiba, Ltd. 16.88 g of the obtained ITO dispersion and 0.40 g of polyhydroxy polyolefin polymer (Polytail H manufactured by Mitsubishi Chemical) were mixed with 32.38 g of toluene as a solvent. Finally, 0.011 g of a sulfobetaine-type amphoteric nitrogen-containing fluorine-containing compound represented by the above formula (3) represented by the above formula (3) is added as a film surface conditioner (the content in the coating material is 0.023% by mass), and the mixture is mixed with ITO. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 13.5% by mass, and the content of components other than the ITO particles in the solid content of the paint was 10% by mass.

<比較例1>
膜表面調整剤を添加混合せずに、ITO導電膜形成用塗料を調製した。実施例1で得られたITO分散液10.38gとエチルセルロース0.19g、テルペンフェノール樹脂0.45gをMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合し、ITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Comparative Example 1>
A coating for forming an ITO conductive film was prepared without adding and mixing a film surface conditioner. 10.38 g of the ITO dispersion obtained in Example 1, 0.19 g of ethyl cellulose, and 0.45 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2 to form an ITO conductive film. Paint was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<比較例2>
実施例1で得られたITO分散液10.38gとエチルセルロース0.19g、テルペンフェノール樹脂0.44gをMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤としてポリエステル変性シリコーン系樹表面調整剤(商品名:BYK−313、ビックケミー社製)を0.013g(塗料中の含有量が0.025質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Comparative Example 2>
10.38 g of the ITO dispersion obtained in Example 1, 0.19 g of ethyl cellulose, and 0.44 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.013 g (content in the coating material: 0.025% by mass) of a polyester-modified silicone-based tree surface modifier (BYK-313, manufactured by BYK-Chemie) was added and mixed as a film surface modifier. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<比較例3>
実施例1で得られたITO分散液10.38gとエチルセルロース0.18g、テルペンフェノール樹脂0.41gを溶媒のMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤としてポリエステル変性シリコーン系樹表面調整剤(商品名:BYK−313、ビックケミー社製)を0.050g(塗料中の含有量が0.100質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Comparative Example 3>
10.38 g of the ITO dispersion obtained in Example 1, 0.18 g of ethyl cellulose, and 0.41 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK as solvents in a ratio of 1: 2. Finally, 0.050 g (content of 0.100% by mass in the paint) of a polyester-modified silicone-based tree surface modifier (BYK-313, manufactured by BYK-Chemie) was added and mixed as a film surface modifier. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<比較例4>
膜表面調整剤として上記式(9)に示されるカチオン型含窒素フッ素系化合物を塗料中の含有量が0.025質量%になるように添加し混合した。これ以外は、実施例9と同様にしてITO導電膜形成用塗料を調製した。
<Comparative Example 4>
A cationic nitrogen-containing fluorine-containing compound represented by the above formula (9) was added and mixed as a film surface conditioner so that the content in the coating material was 0.025% by mass. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 9.

<比較例5>
膜表面調整剤として上記式(8)に示されるアニオン型含窒素フッ素系化合物を塗料中の含有量が0.025質量%になるように添加し混合した。これ以外は、実施例9と同様にしてITO導電膜形成用塗料を調製した。
<Comparative Example 5>
An anionic nitrogen-containing fluorine-containing compound represented by the above formula (8) was added and mixed as a film surface conditioner such that the content in the coating material was 0.025% by mass. Except for this, the paint for forming an ITO conductive film was prepared in the same manner as in Example 9.

<比較例6>
70m/gのBET法による比表面積と55のL値を有するITO粒子を準備し、このITO粒子100gを、ポリオキシエチレンアルキルエーテルリン酸エステル系の分散剤5gと溶媒のMMB145gの混合液に添加し、ビーズミル分散機にて、分散することにより、ITO分散液を得た。ITO分散液中のITO粒子の粒子径は、堀場製作所製LB−550にて測定したところ、150nmであった。得られたITO分散液10.38gとエチルセルロース0.19g、テルペンフェノール樹脂0.44gをMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.010g(塗料中の含有量が0.020質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Comparative Example 6>
ITO particles having a BET specific surface area of 70 m 2 / g and an L value of 55 are prepared, and 100 g of the ITO particles is added to a mixed solution of 5 g of a polyoxyethylene alkyl ether phosphate ester-based dispersant and 145 g of a solvent MMB. The resulting mixture was dispersed by a bead mill disperser to obtain an ITO dispersion. The particle size of the ITO particles in the ITO dispersion was 150 nm as measured by LB-550 manufactured by Horiba, Ltd. 10.38 g of the obtained ITO dispersion, 0.19 g of ethyl cellulose, and 0.44 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.010 g of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine compound represented by the above formula (3) (the content in the coating material is 0.020% by mass) is added and mixed as a film surface conditioner, and ITO is mixed. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<比較例7>
35m/gのBET法による比表面積と36のL値を有するITO粒子を準備し、このITO粒子100gを、ポリオキシエチレンアルキルエーテルリン酸エステル系の分散剤5gと溶媒のMMB145gの混合液に添加し、ビーズミル分散機にて、分散することにより、ITO分散液を得た。ITO分散液中のITO粒子の粒子径は、堀場製作所製LB−550にて測定したところ、70nmであった。得られたITO分散液10.38gとエチルセルロース0.19g、テルペンフェノール樹脂0.44gをMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.010g(塗料中の含有量が0.020質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Comparative Example 7>
ITO particles having a specific surface area by the BET method of 35 m 2 / g and an L value of 36 are prepared, and 100 g of the ITO particles is added to a mixed solution of 5 g of a polyoxyethylene alkyl ether phosphate ester dispersant and 145 g of a solvent MMB. The resulting mixture was dispersed by a bead mill disperser to obtain an ITO dispersion. The particle size of the ITO particles in the ITO dispersion was 70 nm as measured by LB-550 manufactured by Horiba, Ltd. 10.38 g of the obtained ITO dispersion, 0.19 g of ethyl cellulose, and 0.44 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.010 g of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine-containing compound represented by the above formula (3) (the content in the coating material is 0.020% by mass) is added and mixed as a film surface conditioner, and ITO is mixed. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<比較例8>
実施例1で得られたITO分散液2.50gとエチルセルロース0.13g、テルペンフェノール樹脂0.30gをMMBとMIBKを1:2の比率で混合した溶媒47.02gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.003g(塗料中の含有量が0.006質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は2.0質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、33質量%であった。
<Comparative Example 8>
2.50 g of the ITO dispersion obtained in Example 1, 0.13 g of ethyl cellulose, and 0.30 g of a terpene phenol resin were mixed with 47.02 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.003 g (the content in the coating material is 0.006% by mass) of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine-containing compound represented by the above formula (3) is added and mixed as a film surface modifier, and ITO is mixed. A paint for forming a conductive film was prepared. The content of the ITO particles in this paint was 2.0% by mass, and the content of components other than the ITO particles in the solid content of the paint was 33% by mass.

<比較例9>
実施例11で得られたITO分散液47.00gとエチルセルロース0.32g、テルペンフェノール樹脂0.74gをMMBとMIBKを1:2の比率で混合した溶媒0.96gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.051g(塗料中の含有量が0.102質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は47.0質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、8質量%であった。
<Comparative Example 9>
47.00 g of the ITO dispersion obtained in Example 11, 0.32 g of ethyl cellulose, and 0.74 g of a terpene phenol resin were mixed with 0.96 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.051 g of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine compound represented by the above formula (3) represented by the above formula (3) (the content in the coating material is 0.102% by mass) is added and mixed as a film surface conditioner. A paint for forming a conductive film was prepared. The content of the ITO particles in this paint was 47.0% by mass, and the content of components other than the ITO particles in the solid content of the paint was 8% by mass.

<比較例10>
実施例1で得られたITO分散液10.38gとエチルセルロース0.14g、テルペンフェノール樹脂0.33gをMMBとMIBKを1:2の比率で混合した溶媒38.78gと混合した。最後に膜表面調整剤として上記式(3)に示される両性型含窒素フッ素系化合物のスルホベタイン型化合物を0.175g(塗料中の含有量が0.350質量%)添加し混合してITO導電膜形成用塗料を調製した。この塗料中のITO粒子の含有量は8.3質量%であり、塗料固形分中、ITO粒子以外の成分含有量は、17質量%であった。
<Comparative Example 10>
10.38 g of the ITO dispersion obtained in Example 1, 0.14 g of ethyl cellulose, and 0.33 g of a terpene phenol resin were mixed with 38.78 g of a solvent obtained by mixing MMB and MIBK at a ratio of 1: 2. Finally, 0.175 g of a sulfobetaine type compound of the amphoteric type nitrogen-containing fluorine compound represented by the above formula (3) as a film surface conditioner (the content in the coating material is 0.350% by mass) was added and mixed, followed by ITO. A paint for forming a conductive film was prepared. The content of the ITO particles in the paint was 8.3% by mass, and the content of components other than the ITO particles in the solid content of the paint was 17% by mass.

<比較試験及び評価>
実施例1〜14及び比較例1〜10で得られたITO導電膜形成用塗料を、バーコーター(安田精機製作所製、型番No.5)を用いて、厚さ1.1mm、たて100mm、よこ100mmのガラス基材と厚さ0.1mm、たて100mm、よこ100mmのポリエチレンテレフタレート(PET)のフィルム基材上にそれぞれ乾燥後の厚さが0.5μmとなるように塗布した。塗布後、実施例11、12及び14以外の実施例、比較例では、大気雰囲気下、80℃で3分間乾燥することにより、21種類のITO導電膜を得た。実施例11では、バーコーターで塗布後、大気雰囲気下、80℃で3分乾燥し、240mJ/cm(90mW/cm)の紫外線を照射してITO導電膜を得た。実施例12及び実施例14では、大気雰囲気下、110℃で30分間乾燥することによりITO導電膜を得た。
<Comparison test and evaluation>
Using a bar coater (manufactured by Yasuda Seiki Seisakusho, model No. 5), the coating material for forming an ITO conductive film obtained in Examples 1 to 14 and Comparative Examples 1 to 10 was 1.1 mm thick, 100 mm long, The film was coated on a 100 mm wide glass substrate and a 0.1 mm thick, 100 mm long, 100 mm wide polyethylene terephthalate (PET) film base material such that the thickness after drying was 0.5 μm. After the application, in Examples other than Examples 11, 12 and 14, and Comparative Examples, 21 types of ITO conductive films were obtained by drying at 80 ° C. for 3 minutes in an air atmosphere. In Example 11, after coating with a bar coater, the coating was dried at 80 ° C. for 3 minutes in an air atmosphere, and irradiated with 240 mJ / cm 2 (90 mW / cm 2 ) ultraviolet rays to obtain an ITO conductive film. In Examples 12 and 14, an ITO conductive film was obtained by drying at 110 ° C. for 30 minutes in an air atmosphere.

ガラス基材に成膜した24種類のITO導電膜については、以下に示す方法で、ITO導電膜中の両性型含窒素フッ素系化合物及びITO粒子の各含有量を測定した。またその透明性を全光線透過率とヘーズを測定することにより、また導電性をその表面抵抗率を測定することにより評価した。PETフィルムに成膜した24種類のITO導電膜については、以下に示す方法で保護フィルムの剥離試験を行った。実施例1〜14及び比較例1〜10の各ITO導電膜形成用塗料の製造条件等を表1に、上記測定結果、試験結果を表2にそれぞれ示す。なお、表1中、膜表面調整剤の種類として、例えば「式(2)」と記載したものは、「式(2)に示される化合物」を意味する。表1中のECは、エチルセルロース、TPは、テルペンフェノール樹脂を意味する。   For the 24 types of ITO conductive films formed on the glass substrate, the contents of the amphoteric nitrogen-containing fluorine-based compound and the ITO particles in the ITO conductive film were measured by the following method. The transparency was evaluated by measuring the total light transmittance and haze, and the conductivity was evaluated by measuring the surface resistivity. About 24 types of ITO conductive films formed on the PET film, the peeling test of the protective film was performed by the following method. Table 1 shows the production conditions and the like of the coating materials for forming the ITO conductive films of Examples 1 to 14 and Comparative Examples 1 to 10, and Table 2 shows the above measurement results and test results. In Table 1, as a type of the film surface conditioner, for example, the one described as “Formula (2)” means “the compound represented by Formula (2)”. In Table 1, EC means ethyl cellulose, and TP means terpene phenol resin.

(1) ITO導電膜中の両性型含窒素フッ素系化合物及びITO粒子の各含有量
得られたITO導電膜をアセトンにて溶解することで、膜成分を回収した。回収した液中のフッ素濃度を、ICP発光分析法により定量し、化合物式から、両性型含窒素フッ素系化合物濃度(質量%)を算出した。また得られたITO導電膜を酸にて溶解することで、膜成分を回収した。回収した液中のインジウム濃度を、ICP発光分析法により定量し、化合物式から、ITO粒子濃度(質量%)を算出した。
(1) Content of Amphoteric Nitrogen-Containing Fluorine Compound and ITO Particles in ITO Conductive Film The obtained ITO conductive film was dissolved in acetone to recover the film components. The fluorine concentration in the collected liquid was quantified by ICP emission spectrometry, and the concentration (% by mass) of the amphoteric nitrogen-containing fluorine-based compound was calculated from the compound formula. The film component was recovered by dissolving the obtained ITO conductive film with an acid. The indium concentration in the collected liquid was quantified by ICP emission spectrometry, and the ITO particle concentration (% by mass) was calculated from the compound formula.

(2) ITO導電塗料中の両性型含窒素フッ素系化合物及びITO粒子の各含有量
塗料の重量を測定後、乾燥させ、乾燥後の固形分を算出した。また得られた固形分をアセトンにて溶解し、溶解した液中のフッ素濃度を、ICP発光分析法により定量し、化合物式及び固形分濃度から、ITO導電塗料中の両性型含窒素フッ素系化合物濃度(質量%)を算出した。また得られた固形分を酸にて溶解し、溶解した液中のインジウム濃度を、ICP発光分析法により定量し、化合物式及び固形分濃度から、ITO導電塗料中のITO粒子濃度(質量%)を算出した。
(2) Content of Amphoteric Nitrogen-Containing Fluorine Compound and ITO Particles in ITO Conductive Paint The paint was measured, dried, and the solid content after drying was calculated. Further, the obtained solid content was dissolved in acetone, and the fluorine concentration in the dissolved solution was quantified by ICP emission spectrometry. From the compound formula and the solid content concentration, the amphoteric nitrogen-containing fluorine-based compound in the ITO conductive paint was determined. The concentration (% by mass) was calculated. Further, the obtained solid content was dissolved in an acid, and the indium concentration in the dissolved solution was quantified by ICP emission spectrometry. Based on the compound formula and the solid content concentration, the concentration of ITO particles (% by mass) in the ITO conductive paint was determined. Was calculated.

(3) 透明性(全光線透過率とヘーズ)
ヘーズメータ(スガ試験機製、型番HZ-2)を用いて、ガラス基材に成膜したITO導電膜を全光線透過率とヘーズを求め、ITO導電膜の透明性を測定した。なお、表1に記載された全光線透過率は、ガラス基材込みの数値であり、ガラス基材のみの全光線透過率は90.3%であり、同じくヘーズは0.04%であった。
(3) Transparency (total light transmittance and haze)
Using a haze meter (manufactured by Suga Test Instruments, model number HZ-2), the total light transmittance and haze of the ITO conductive film formed on the glass substrate were determined, and the transparency of the ITO conductive film was measured. In addition, the total light transmittance described in Table 1 is a numerical value including the glass base material, the total light transmittance of the glass base material alone was 90.3%, and the haze was also 0.04%. .

(4) 導電性(表面抵抗率)
三菱化学アナリテック製ハイレスタ(型番:MCP−HT450)を用いて、ガラス基材に成膜し、成膜2時間後のITO導電膜の表面抵抗率を加圧電圧10Vで測定した。
(4) Conductivity (surface resistivity)
A film was formed on a glass substrate using a Hiresta (model number: MCP-HT450) manufactured by Mitsubishi Chemical Analytech, and the surface resistivity of the ITO conductive film 2 hours after the film formation was measured at a pressing voltage of 10 V.

(5) 保護フィルムの剥離試験
PETフィルムに成膜したITO導電膜の表面に、シリコーン系離型剤層が対向するように、シリコーン系離型剤層付き保護フィルムを積層し、この保護フィルムの上面をハンドローラーで10mm/sの速度で往復させ加圧した。これにより保護フィルムをITO導電膜表面に均一に貼合せた。24時間後に保護フィルムを静かにITO導電膜表面から剥がした。保護フィルムを剥離した後のITO導電膜の表面を目視にて観察した後、光学顕微鏡により50倍の倍率で更に詳細にITO導電膜の表面を観察した。ITO導電膜の剥離箇所が全く無かった場合を「良好」、一部剥離が有った場合を「不良」とした。
(5) Peeling test of protective film A protective film with a silicone-based release agent layer was laminated on the surface of the ITO conductive film formed on the PET film such that the silicone-based release agent layer was opposed to the surface of the ITO conductive film. The upper surface was reciprocated with a hand roller at a speed of 10 mm / s and pressed. Thus, the protective film was uniformly bonded to the surface of the ITO conductive film. After 24 hours, the protective film was gently peeled off the surface of the ITO conductive film. After visually observing the surface of the ITO conductive film after peeling off the protective film, the surface of the ITO conductive film was observed in more detail at a magnification of 50 times with an optical microscope. The case where there was no peeling portion of the ITO conductive film was “good”, and the case where there was partial peeling was “poor”.

Figure 0006626709
Figure 0006626709

Figure 0006626709
Figure 0006626709

表2から明らかなように、比較例1では、膜表面調整剤を塗料中に全く含まないため、保護フィルムの剥離試験でITO導電膜の剥離が見られ「不良」であった。   As is clear from Table 2, in Comparative Example 1, since the film surface conditioner was not contained in the coating material at all, the ITO conductive film was peeled off in the peeling test of the protective film, which was "bad".

また膜表面調整剤としてポリエステル変性シリコーン系化合物を塗料中に0.025質量%含んだ比較例2では、保護フィルムの剥離試験でITO導電膜の剥離防止効果に乏しく「不良」と判定されたことに加え、表面抵抗率が15.0MΩ/□と高かった。   Further, in Comparative Example 2, in which 0.025% by mass of the polyester-modified silicone compound was contained in the coating material as a film surface conditioner, the effect of preventing the ITO conductive film from peeling was poor in the peeling test of the protective film, and the film was determined to be “defective”. And the surface resistivity was as high as 15.0 MΩ / □.

同じくポリエステル変性シリコーン系化合物を塗料中に0.100質量%含んだ比較例3では、ITO導電膜の剥離防止効果が発現し「良好」と判定されたが、表面抵抗率が85.0MΩ/□と極めて高かった。   Similarly, in Comparative Example 3, in which the polyester-modified silicone-based compound was contained in the paint at 0.100% by mass, the effect of preventing the ITO conductive film from peeling was exhibited, and the result was determined to be “good”, but the surface resistivity was 85.0 MΩ / □. It was extremely high.

膜表面調整剤としてカチオン型含窒素フッ素系化合物を塗料中に0.025質量%含んだ比較例4では、ITO粒子がフッ素化合物と凝集し、保護フィルムの剥離試験でITO導電膜の剥離防止効果に乏しく「不良」と判定されたことに加え、全光線透過率が85.5%と低く、ヘーズも4.0%と高かった。   In Comparative Example 4, in which the coating composition contained 0.025% by mass of the cationic nitrogen-containing fluorine-containing compound as a film surface conditioner, the ITO particles aggregated with the fluorine compound, and the peeling test of the protective film prevented the ITO conductive film from peeling. In addition to being poor and judged to be "poor", the total light transmittance was as low as 85.5% and the haze was as high as 4.0%.

また膜表面調整剤としてアニオン型含窒素フッ素系化合物を塗料中に0.025質量%含んだ比較例5でも、ITO粒子がフッ素化合物と凝集し、保護フィルムの剥離試験でITO導電膜の剥離防止効果に乏しく「不良」と判定されたことに加え、表面抵抗率が10.0MΩ/□と高く、全光線透過率が86.6%と低く、ヘーズも3.5%と高かった。   Also, in Comparative Example 5 in which 0.025% by mass of an anionic nitrogen-containing fluorine-based compound was contained in the paint as a film surface conditioner, the ITO particles aggregated with the fluorine compound, and the peeling test of the protective film prevented the ITO conductive film from peeling. In addition to the poor effect, it was determined to be "bad", and the surface resistivity was as high as 10.0 MΩ / □, the total light transmittance was as low as 86.6%, and the haze was as high as 3.5%.

比表面積が70m/g、L値40のITO粒子を用いた比較例6は、表面抵抗率が12.0MΩ/□と高く、全光線透過率が85.3%と低く、ヘーズも10.5%と高かった。 Comparative Example 6 using ITO particles having a specific surface area of 70 m 2 / g and an L value of 40 has a high surface resistivity of 12.0 MΩ / □, a low total light transmittance of 85.3%, and a haze of 10. It was as high as 5%.

比表面積が35m/g、L値36のITO粒子を用いた比較例7は、全光線透過率が86.3%と低く、ヘーズも2.3%と高かった。 In Comparative Example 7 using ITO particles having a specific surface area of 35 m 2 / g and an L value of 36, the total light transmittance was as low as 86.3% and the haze was as high as 2.3%.

膜中のITO含有量が68.0質量%で、塗料中のITO含有量が2.0質量%の比較例8は、薄膜であるため、剥離防止効果に乏しく「不良」と判定されたことに加え、表面抵抗率が5.3MΩ/□と高かった。   Comparative Example 8, in which the ITO content in the film was 68.0% by mass and the ITO content in the paint was 2.0% by mass, was poor in peeling prevention effect because it was a thin film, and was determined to be "poor." In addition, the surface resistivity was as high as 5.3 MΩ / □.

塗料中のITO粒子の含有量が47.0質量%、塗料の固形分中のITO粒子以外の成分が8質量%であって、膜中のITO粒子の含有量が92質量%である比較例9は、樹脂成分が不足していることから、剥離防止効果に乏しく「不良」と判定されたことに加え、全光線透過率が86.8%と低く、ヘーズは2.9%と高かった。   Comparative example in which the content of the ITO particles in the paint is 47.0% by mass, the component other than the ITO particles in the solid content of the paint is 8% by mass, and the content of the ITO particles in the film is 92% by mass. No. 9 lacked the resin component and thus was judged to be "defective" because of a poor peel prevention effect. In addition, the total light transmittance was as low as 86.8% and the haze was as high as 2.9%. .

塗膜中の両性型含窒素フッ素系化合物を3.50質量%含んだ比較例10は、表面抵抗率が3.5MΩ/□と高く、ヘーズも2.5%と高かった。   Comparative Example 10 containing 3.50% by mass of the amphoteric nitrogen-containing fluorine-based compound in the coating film had a high surface resistivity of 3.5 MΩ / □ and a high haze of 2.5%.

これに対して、膜表面調整剤として両性型含窒素フッ素系化合物を含む塗料で成膜された実施例1〜14で得られたITO導電膜は、保護フィルムの剥離試験についてすべて「良好」であり、表面抵抗率は3.0MΩ/□以下と低く、全光線透過率は87.8%以上で高く、ヘーズも2.0%以下と低かった。   On the other hand, the ITO conductive films obtained in Examples 1 to 14 which were formed with a paint containing an amphoteric nitrogen-containing fluorine-based compound as a film surface conditioner were all “good” in the peeling test of the protective film. The surface resistivity was as low as 3.0 MΩ / □ or less, the total light transmittance was as high as 87.8% or more, and the haze was as low as 2.0% or less.

本発明のITO導電膜は、保護フィルム又はカバーフィルムを導電膜表面に積層した後で、上記フィルムを剥がす分野のITO導電膜に用いられる。   The ITO conductive film of the present invention is used as an ITO conductive film in the field of peeling the film after laminating a protective film or a cover film on the conductive film surface.

Claims (2)

ITO粒子がバインダ樹脂中に均一に分散してなるITO導電膜において、
前記ITO導電膜100質量%中、前記ITO粒子を70〜90質量%、膜表面調整剤として下記式(1)で表される両性型含窒素フッ素系化合物を3質量%以下それぞれ含み、前記ITO粒子が40〜65m/gのBET法による比表面積と37以下のL値を有することを特徴とするITO導電膜。
Figure 0006626709
但し、式(1)中、Rf、Rfは、それぞれ同一又は互いに異なる、炭素数1〜6であって直鎖状又は分岐状のペルフルオロアルキル基である。また、Rfは、炭素数1〜6であって、直鎖状又は分岐状のペルフルオロアルキレン基である。Rは、2価の有機基である連結基であり、Xは、両性型の親水性賦与基である。
In an ITO conductive film in which ITO particles are uniformly dispersed in a binder resin,
The ITO conductive film of 100% by mass contains 70 to 90% by mass of the ITO particles and 3% by mass or less of an amphoteric nitrogen-containing fluorine-based compound represented by the following formula (1) as a film surface conditioner. An ITO conductive film, wherein the particles have a specific surface area by a BET method of 40 to 65 m 2 / g and an L value of 37 or less.
Figure 0006626709
However, in the formula (1), Rf 1 and Rf 2 are the same or different, each having 1 to 6 carbon atoms and being a linear or branched perfluoroalkyl group. Rf 3 is a linear or branched perfluoroalkylene group having 1 to 6 carbon atoms. R is a linking group that is a divalent organic group, and X is an amphoteric type hydrophilicity-imparting group.
ITO粒子とバインダ樹脂と溶媒とを含むITO導電膜形成用塗料において、
前記塗料100質量%中、前記ITO粒子を3〜45質量%、膜表面調整剤として下記式(1)で表される両性型含窒素フッ素系化合物を0.3質量%以下それぞれ含み、前記塗料の固形分100質量%中、前記ITO粒子以外の成分を10〜30質量%含み、前記前記ITO粒子が40〜65m/gのBET法による比表面積と37以下のL値を有することを特徴とするITO導電膜形成用塗料。
Figure 0006626709
但し、式(1)中、Rf、Rfは、それぞれ同一又は互いに異なる、炭素数1〜6であって直鎖状又は分岐状のペルフルオロアルキル基である。また、Rfは、炭素数1〜6であって、直鎖状又は分岐状のペルフルオロアルキレン基である。Rは、2価の有機基である連結基であり、Xは、両性型の親水性賦与基である。
In an ITO conductive film forming paint containing ITO particles, a binder resin and a solvent,
100% by mass of the coating material contains 3 to 45% by mass of the ITO particles, and 0.3% by mass or less of a nitrogen-containing fluorine-containing compound represented by the following formula (1) as a film surface conditioner. In the solid content of 100% by mass, a component other than the ITO particles is contained in an amount of 10 to 30% by mass, and the ITO particles have a specific surface area according to a BET method of 40 to 65 m 2 / g and an L value of 37 or less. Paint for forming an ITO conductive film.
Figure 0006626709
However, in the formula (1), Rf 1 and Rf 2 are the same or different, each having 1 to 6 carbon atoms and being a linear or branched perfluoroalkyl group. Rf 3 is a linear or branched perfluoroalkylene group having 1 to 6 carbon atoms. R is a linking group that is a divalent organic group, and X is an amphoteric type hydrophilicity-imparting group.
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