JP6592343B2 - Imprint apparatus and article manufacturing method - Google Patents

Description

  The present invention relates to an imprint apparatus and an article manufacturing method.

  The imprint technique is a technique for molding an imprint material supplied on a substrate, and has been proposed as one of techniques for manufacturing articles such as semiconductor devices and magnetic storage media. The imprint apparatus supplies an imprint material onto a substrate, and forms a pattern on the substrate by curing the imprint material in a state where a mold is in contact with the imprint material.

  In the imprint apparatus, a die-by-die method is used as a method for aligning the shot area of the substrate and the mold. In the die-by-die method, the relative position between the mark formed on the shot area of the substrate and the mark formed on the mold is detected for each shot area, and based on the result, the relative position between the shot area and the mold and the shape of the mold are determined. This is a method of correcting for each shot area.

  Patent Document 1 describes that a relative position between an alignment mark on a wafer and an alignment mark on a mold (mold) is measured with an alignment scope, and the relative position between the wafer and the mold is corrected based on the result. .

JP 2013-219331 A

  In the conventional imprint apparatus, the alignment between the shot area of the substrate and the mold is controlled on the assumption that the mark can be correctly detected. However, there are cases where the mark cannot be detected correctly, such as when the mark shape is detected as having a shape greatly deviating from the designed mark. If the mark cannot be detected correctly, the relative position between the shot area and the mold may be erroneously detected, so that the operation of the imprint apparatus may stop or imprint failure such as an overlay error may occur. The occurrence of such a defect can lead to a decrease in productivity.

  For example, the imprint material is cured in a state where the imprint material protrudes from the shot area that has already been imprinted to the shot area to be imprinted, and the imprint material covers the mark of the shot area to be imprinted. is there. In such a situation, an unintended optical image can be formed on the imaging surface of the alignment scope by reflection of light on the surface of the imprint material cured in the protruding state. In such a case, since the optical image formed on the imaging surface does not become a faithful optical image of the mark, it will be difficult to detect the mark correctly. Due to such a cause, the imprint apparatus may erroneously detect the mark position, and imprint failure may occur. Once the imprint material has been squeezed out, unless the cause is solved, the same squeeze out occurs repeatedly, which can cause a large amount of imprint defects. In addition, there may be a defect in the mark in the shot area of the substrate to be imprinted. In the imprint apparatus, imprinting is performed on a plurality of shot areas on a substrate using the same mold under the same conditions. Therefore, if a mark in one shot area has a defect, it is the same in other shot areas. There is a high possibility that a defect is also present in the mark arranged at the position.

  The present invention has been made based on the above findings by the inventor, and an object thereof is to provide an advantageous technique for correctly detecting a mark, for example.

  One aspect of the present invention relates to an imprint apparatus for bringing an imprint material on a substrate into contact with a mold and curing the imprint material, and the imprint apparatus includes: a shot area to be imprinted on the substrate; A drive unit that drives at least one of the substrate and the mold so that a relative position with respect to the mold is adjusted, and a detection unit that detects a selected mark among a plurality of marks included in the shot area to be imprinted And a control unit that controls the driving unit so that the shot area to be imprinted and the mold are aligned, and before the mold contacts the imprint material among the plurality of marks, A mark that should be prohibited from being detected by the detection unit in order to align the shot area to be imprinted with the mold is set as a prohibition mark. A console for allowing a user to input information to be performed, and before the mold contacts the imprint material, the detection unit should detect the shot area to be imprinted and the mold A detection target mark is selected from the plurality of marks excluding the prohibition mark based on the information, and the control unit is based on information output from the detection unit regarding the detection target mark. The drive unit is controlled so that the shot area to be imprinted and the mold are aligned.

  According to the present invention, for example, a technique advantageous for correctly detecting a mark is provided.

The figure which shows typically the structure of the imprint apparatus of one Embodiment of this invention. The figure which shows operation | movement of one Embodiment of this invention. The figure which shows the structure of the control system of 1st Embodiment of this invention. The figure which illustrates a user interface screen. The figure which illustrates a user interface screen. The figure which illustrates the user interface screen of 1st Embodiment of this invention. The figure which illustrates the user interface screen of 1st Embodiment of this invention. The figure which shows the structure of the control system of 2nd Embodiment of this invention. The figure which illustrates the user interface screen of 2nd Embodiment of this invention. The figure which shows the structure of the control system of 3rd Embodiment of this invention. The figure which illustrates the user interface screen of 3rd Embodiment of this invention. The figure which illustrates the hardware constitutions of a console.

  Hereinafter, the present invention will be described through exemplary embodiments thereof with reference to the accompanying drawings.

  FIG. 1 schematically shows the configuration of the imprint apparatus IMP according to the first embodiment of the present invention. The imprint apparatus IMP transfers the pattern 9 of the mold 3 to the imprint material on the substrate 2 by bringing the imprint material on the substrate 2 into contact with the mold 3 and curing the imprint material. An imprint material is a curable composition that cures when given energy to cure it. The imprint material may mean a cured state or an uncured state. As the energy for curing, for example, electromagnetic waves, heat, or the like can be used. The electromagnetic wave can be, for example, light (for example, infrared rays, visible rays, ultraviolet rays) having a wavelength selected from a range of 10 nm to 1 mm. The curable composition is typically a composition that is cured by light irradiation or by heating. Among these, the photocurable composition that is cured by light can contain at least a polymerizable compound and a photopolymerization initiator. Further, the photocurable composition may additionally contain a non-polymerizable compound or a solvent. The non-polymerizable compound may be at least one selected from the group of, for example, a sensitizer, a hydrogen donor, an internal release agent, a surfactant, an antioxidant, and a polymer component.

  In this specification and the accompanying drawings, directions are shown in an XYZ coordinate system in which a direction parallel to the surface of the substrate 2 is an XY plane. In the XYZ coordinate system, the directions parallel to the X, Y, and Z axes are the X, Y, and Z directions, respectively, and rotation around the X axis, rotation around the Y axis, and rotation around the Z axis are θX and θY, respectively. , ΘZ. The control or drive related to the X axis, Y axis, and Z axis means control or drive related to the direction parallel to the X axis, the direction parallel to the Y axis, and the direction parallel to the Z axis, respectively. The control or drive related to the θX axis, θY axis, and θZ axis relates to rotation around an axis parallel to the X axis, rotation around an axis parallel to the Y axis, and rotation around an axis parallel to the Z axis. Means control or drive.

  The imprint apparatus IMP includes a substrate driving unit 1 that drives the substrate 2 and a mold driving unit 4 that drives the mold 3. The substrate driving unit 1 includes a substrate holding unit (substrate stage) that holds the substrate 2 and a substrate driving mechanism that drives the substrate holding unit. The mold driving unit 4 includes a mold holding unit that holds the mold 3 and a mold driving mechanism that drives the mold holding unit. The substrate driving unit 1 and the mold driving unit 4 are arranged so that the relative position between the substrate 2 (more specifically, the shot area to be imprinted on the substrate 2) and the mold 3 is adjusted. A drive unit DRVU that drives one side is configured. In one example, the substrate driving unit 1 drives the substrate 2 about the plurality of axes by driving the substrate holding unit about a plurality of axes (for example, three axes of the X axis, the Y axis, and the θZ axis) by the substrate driving mechanism. To do. The mold driving unit 4 drives the mold holding unit about a plurality of axes (for example, six axes of X axis, Y axis, Z axis, θX axis, θY axis, and θZ axis) by a mold driving mechanism. 3 is driven about the plurality of axes. The drive unit DRVU adjusts the relative position between the substrate 2 and the mold 3 with respect to the X axis, Y axis, θX axis, θY axis, and θZ axis, and also adjusts the relative position between the substrate 2 and the mold 3 with respect to the Z axis. . The adjustment of the relative position between the substrate 2 and the mold 3 with respect to the Z-axis includes operations of contact and separation between the imprint material on the substrate 2 and the mold 3. The mold driving unit DRVU may include a deformation mechanism that deforms the mold 3 according to the shape of the shot region of the substrate 2.

  In addition, the imprint apparatus IMP may include a detection unit 5, a curing unit 8, a supply unit 11, a control unit CNT, and a console 10. The detection unit 5 can also be called an alignment scope. The substrate 2 has a plurality of marks (substrate side marks) 6, and the mold 3 can also have a plurality of marks (mold side marks) 7. The detection unit 5 is configured to acquire information (for example, an image) indicating a relative position between the mark 6 on the substrate 2 and the mark 7 on the mold 3 by detection and output the information. For example, the detection unit 5 may detect the mark 6 on the substrate 2 and the mark 7 on the mold 3 at the same time, or may detect them separately. When the detection unit 5 detects the mark 6 on the substrate 2 and the mark 7 on the mold 3 at the same time, the detection unit 5 may detect the mark 6 and the mark 7 while being separated from each other in the field of view. In addition, an optical image (for example, moire) formed by the marks 7 may be detected. When the detection unit 5 acquires information indicating the relative position between the mark 6 on the substrate 2 and the mark 7 on the mold 3, as described later, a plurality of marks 6 included in the shot area to be imprinted on the substrate 2 are recorded. The control unit CNT can control the selected mark 6 to be detected. At this time, the mark 7 of the mold 3 may be detected simultaneously with the mark 6 of the substrate 2 or they may be detected separately. The curing unit 8 supplies energy for curing the imprint material to the imprint material, thereby curing the imprint material. The supply unit 11 supplies an imprint material onto the substrate 2.

  The control unit CNT controls the drive unit DRVU (the substrate drive unit 1 and the mold drive unit 4), the detection unit 5, the curing unit 8, the supply unit 11, and the console 10. For example, the control unit CNT controls the drive unit DRVU so that the shot area to be imprinted on the substrate 2 and the mold 3 are aligned. The substrate 2 has one or a plurality of shot regions. The shot area may be defined so as to include a scribe line or may be defined so as not to include a scribe line. According to the former definition, the shot region may include one or a plurality of chip regions that are finally used as a device such as a semiconductor device, and a scribe line that partitions the chip region or is adjacent to the chip region. . According to the latter definition, the shot area is an area defined by a scribe line, and includes one or a plurality of chip areas. The control unit CNT is, for example, PLD (abbreviation of programmable logic device) such as FPGA (abbreviation of field programmable gate array), or ASIC (abbreviation of application specific integrated circuit). It can be constituted by a computer or a combination of all or part of them.

  The console 10 is connected to the control unit CNT via the communication path CL, takes in information such as conditions relating to imprint processing input by the user, and transmits the information to the control unit CNT via the communication path CL. The communication path CL may be any communication path. For example, the communication path CL may be a communication path that directly connects the control unit CNT and the console 10. Alternatively, the communication path CL may be a communication path that connects the control unit CNT and the console 10 via a network such as a LAN (Local Area Network) or a WAN (Wide Area Network). The console 10 can be, for example, a computer including an input device (for example, a keyboard) and a display. The user interface screen described below is an image displayed on the display constituting the console 10. The console 10 can take in coordinate information indicating the position of the substrate-side mark 6 and mark type information indicating the mark type in accordance with an input from the user. Further, the console 10 receives coordinate information indicating the position of the mold side mark 7 and mark type information indicating the mark type, and information on the amount of energy (for example, light amount) for curing generated by the curing unit 8 in accordance with an input from the user. Can take in. The coordinates indicating the position of the substrate side mark 6 in the shot area may be coordinates indicating a relative position with respect to the shot area, or may be coordinates indicating a position on the substrate. The console 10 is prohibited from being detected by the detection unit 5 in order to align the shot area and the mold 3 before the mold 3 contacts the imprint material among the plurality of marks in the shot area to be imprinted. Let the user set the mark that should be prohibited. Specifically, the console 10 can cause the user to input information for setting the prohibition mark. Some of the functions of the console 10 may be provided in the control unit CNT.

  An operation example of the imprint apparatus IMP of the first embodiment will be described with reference to FIG. This operation is controlled by the control unit CNT. In step S <b> 101, the control unit CNT uses the detection unit 5 to perform alignment (positioning) between the substrate holding unit (substrate stage) of the substrate driving unit 1 and the mold 3. At this time, the mold 3 is conveyed to the mold driving unit 4 of the imprint apparatus IMP by a mold conveying system (not shown) and is held by the mold holding unit of the mold driving unit 4. Further, the mark detected by the detection unit 5 may be, for example, a reference mark provided on the substrate holding unit or a mark provided on a dedicated substrate placed on the substrate holding unit. .

  In step S102, the substrate 2 is loaded (transferred) to the substrate holding unit of the substrate driving unit 1 by the substrate transfer robot (not shown) and held by the substrate holding unit. In step S103, the control unit CNT performs pre-contact alignment. The alignment before contact is alignment (positioning) performed before the mold 3 is brought into contact with the imprint material supplied onto the substrate 2 by the supply unit 11. The pre-contact alignment may include pre-alignment performed only once when the substrate is loaded and alignment performed for each shot region. In the pre-alignment, the substrate 2 is moved under an off-axis scope (not shown), and the position of the substrate 2 is measured by the off-axis scope. The pre-alignment is a measurement performed with accuracy (for example, about 1 μm to 2 μm) such that the mark provided in the shot region of the substrate 2 is within the visual field of the detection unit 5 in the alignment for each shot region. The alignment for each shot region in the pre-contact alignment is performed by using the detection unit 5 for the relative position between the shot region of the substrate 2 and the mold 3 in order to reduce the correction drive amount in the post-contact alignment in step S107 described later. Includes measurement. The measurement result in the alignment for each shot area is used to drive the substrate 2 by the substrate driving unit 1 so that the shot area to be imprinted is placed under the mold 3 in step S105. That is, the pre-contact alignment is completed in step S105. The selection of marks in the pre-contact alignment will be described later.

  In step S104, the control unit CNT causes the substrate driving unit 1 to drive the substrate 2 so that the shot area to be imprinted on the substrate 2 is located below the supply unit 11, and between the substrate 2 and the mold 3 A gas supply unit (not shown) is controlled so that the purge gas is supplied to the space. As the purge gas, a gas that does not inhibit the curing of the imprint material, for example, a gas including at least one of helium gas, nitrogen gas, and a condensable gas (for example, pentafluoropropane (PFP)) may be used.

  In step S105, the control unit CNT controls the supply unit 11 so that the imprint material is supplied to the shot area to be imprinted, and then the shot area to be imprinted is positioned below the mold 3. The substrate drive unit 1 drives the substrate 2. The driving amount at this time is determined according to the result measured in step S103 as described above. In step S106, the control unit CNT causes the mold driving unit 4 to drive the mold 3 so that the mold 3 (the pattern 9) contacts the imprint material on the imprint target shot area of the substrate 2. In step S107, the control unit CNT makes the mark 6 of the shot region and the mark 7 of the die 3 by the detection unit 5 in a state where the mold 3 (pattern 9) is in contact with the imprint material on the shot region of the substrate 2. While detecting, the shot region and the mold 3 are aligned. Since this alignment is performed for each shot region (die) of the substrate 2, it is called die-by-die alignment. Further, since this alignment is the alignment after the mold 3 comes into contact with the imprint material, it is called post-contact alignment.

  In step S108, the control unit CNT uses the energy (for example, light) for curing the imprint material in a state where the imprint material on the shot area to be imprinted on the substrate 2 and the pattern 9 of the mold 3 are in contact with each other. Is controlled so as to be given. As a result, the imprint material is cured to form a pattern. In step S109, the control unit CNT causes the mold driving unit 4 to drive the mold 3 so that the mold 3 is separated from the cured imprint material. In step S110, the control unit CNT determines whether imprinting (pattern formation) for all designated shot areas of the substrate 2 has been completed. The control unit CNT proceeds to step S111 when imprinting for all the designated shot areas is completed, and returns to step S103 otherwise. In step S111, the substrate 2 is unloaded (conveyed) from the substrate holding unit of the substrate driving unit 1. In step S112, the control unit CNT determines whether imprinting (pattern formation) for all the substrates 2 in the lot has been completed. If imprinting for all the substrates 2 in the lot has been completed, If not, the process returns to step S102.

  FIG. 3 illustrates a configuration of a control system including the console 10 and the control unit CNT. The console 10 can also be understood as a component of the mark selection unit MSP that selects the mark 6 to be detected by the detection unit 5 among the plurality of marks 6 in the shot area to be imprinted.

  The console 10 includes a mark information input unit 101 and a prohibited area setting unit 102. In this example, the console 10 includes a pre-contact mark selection unit 103 and a post-contact mark selection unit 104. However, at least one of the pre-contact mark selection unit 103 and the post-contact mark selection unit 104 may be incorporated in the control unit CNT. In addition, a part of at least one of hardware and software that realizes the function of the mark information input unit 101 may be provided by the control unit CNT. In addition, a part of at least one of hardware and software realizing the function of the prohibited area setting unit 102 may be provided by the control unit CNT.

  The mark information input unit 101 allows the user to input the mark type of the mark (substrate side mark) 6 arranged on the substrate 2, the coordinates indicating the design position of the mark 6, and the offset of the mark 6 from the design position. Take them in. The prohibited area setting unit 102 inputs information (prohibited area information) for setting, as a prohibited area, an area where a mark to be excluded from the selection target among the plurality of marks 6 in each shot area of the substrate 2 is set. And set the prohibited area accordingly. The pre-contact mark selection unit 103 selects a pre-contact from a plurality of marks 6 in each shot area of the substrate 2 based on the information captured by the mark information input unit 101 and the prohibited area set by the prohibited area setting unit 102. A mark used in alignment (step S103) is selected. The post-contact mark selection unit 104 selects the mark 6 to be used in the post-contact alignment (step S107) from the plurality of marks 6 in each shot area of the substrate 2 based on the information captured by the mark information input unit 101. .

  In the above example, by setting the prohibition area, the prohibition mark that should be prohibited from being detected by the detection unit 5 in the pre-contact alignment is indirectly set, but the console 10 sets the prohibition mark directly. It may be configured as follows. The information for setting the prohibition mark is information for directly specifying the prohibition mark.

  FIG. 12 illustrates a hardware configuration of the console 10. The console 10 may include, for example, a memory 1100, a CPU 1110, a display 1130, an input device 1140, and a communication device 1150. The memory 1100 stores modules 1101, 1102, 1103, and 1104. A module 1101 is a program module that causes the console 10 to function as the mark information input unit 101. The module 1102 is a program module that causes the console 10 to function as the prohibited area setting unit 102. A module 1103 is a program module that causes the console 10 to function as the pre-contact mark selection unit 103. The module 1104 is a program module that causes the console 10 to function as the post-contact mark selection unit 104. The CPU operates the console 10 as the mark information input unit 101, the prohibited area setting unit 102, the pre-contact mark selection unit 103, and the post-contact mark selection unit 104 based on the modules 1101 to 1104 stored in the memory 1100. The display 1130 provides a user interface screen to the user. The input device 1140 is a device that captures information input by a user, and may include, for example, a keyboard, a pointing device, a touch panel, and the like. The communication device 1150 is a device for communicating with the control unit CNT.

Selection of the mark 6 by the pre-contact mark selection unit 103 can be performed by the following method. The mark 6 selected by the pre-contact mark selection unit 103 is used in measurement for pre-contact alignment in step S103.
(Process 1)
The pre-contact mark selection unit 103 extracts all the marks 6 input by the mark information input unit 101 for the shot area to be imprinted.
(Process 2)
Based on the prohibited area set by the prohibited area setting unit 102, the pre-contact mark selection unit 103 prohibits the detection unit 5 from detecting all the marks 6 extracted in step 1 in the pre-contact alignment. Extract marks except forbidden marks to be done.
(Process 3)
The pre-contact mark selection unit 103 extracts a detection target mark to be detected by the detection unit 5 in the pre-contact alignment from the marks extracted in step 2. In this extraction, for example, a preset number of marks can be selected such that the mutual distance is the largest. The larger the number of marks, the smaller the error, but if the number is too large, the time required for measurement will increase according to the number of the marks. The number that can be set can be set by the user. The console 10 can have a function of allowing the user to set the number of such marks.

  The same number of marks is set for the rectangular shot area where the pattern 9 of the mold 3 is transferred over the entire area and the missing shot area where the pattern 9 of the mold 3 is transferred only for a part of the area. Alternatively, a different number may be set. The selection of the mark 6 in the steps 1 to 3 may be made in common for all shot areas of the substrate 2 or may be made for each shot area. Further, the processing of the mark information input unit 101 and the prohibited region setting unit 102 may be performed in common for all shot regions of the substrate 2 or may be performed for each shot region.

  The prohibited area set by the prohibited area setting unit 102 is an area of the imprint target shot area that is hardened in a state where the imprint material protrudes from the shot area that has already been imprinted (hereinafter referred to as “eating”). Out area). In the protruding area, the cured imprint material may cover the mark of the shot area to be imprinted. In such a situation, an unintended optical image can be formed on the imaging surface of the imaging device of the detection unit 5 by reflection of light on the surface of the imprint material cured in the protruding state, and thus the detection unit 5 It will be difficult to detect the mark correctly. However, when the inventor newly supplies the imprint material to the shot area having the protrusion area and further contacts the mold 3 with the imprint material, the mark of the protrusion area is detected by the detection unit 5. It was discovered that it can be detected correctly. Therefore, in the alignment before contact, it is possible to set a prohibition mark that prohibits use, and to measure the relative position between the shot area to be imprinted and the mold 3 using a mark selected from marks other than the prohibition mark. is there. As a result, it is possible to prevent or reduce erroneous detection of the relative position between the shot area to be imprinted and the mold 3. On the other hand, in the post-contact alignment, even the mark in the protruding area can be correctly detected by the detection unit 5, and therefore it is not necessary to limit the mark to be used by setting the prohibition mark.

Hereinafter, selection of the mark 6 by the post-contact mark selection unit 104 will be described. The mark 6 used in the post-contact alignment is selected from a plurality of marks 6 in the shot area to be imprinted regardless of the prohibition mark prohibited from being used in the pre-contact alignment. The mark 6 selected by the post-contact mark selection unit 104 is used in measurement for post-contact alignment in step S107. The selection of the mark 6 by the post-contact mark selection unit 104 can be performed by the following method.
(Step 11)
The post-contact mark selection unit 104 extracts all the marks 6 input by the mark information input unit 101 for the shot area to be imprinted.
(Step 12)
The post-contact mark selection unit 104 extracts a detection target mark to be detected by the detection unit 5 in the post-contact alignment from the marks extracted in step 11. In this extraction, for example, a preset number of marks can be selected such that the mutual distance is the largest. The larger the number of marks, the smaller the error, but if the number is too large, the time required for measurement will increase according to the number of the marks. The number that can be set can be set by the user. The console 10 can have a function of allowing the user to set the number of such marks.

  Information indicating the mark 6 selected by the pre-contact mark selection unit 103 and the post-contact mark selection unit 104 is transmitted to the control unit CNT via the communication path CL.

  FIG. 4 illustrates a user interface screen provided by the mark information input unit 101. In this example, a plurality of marks are provided in one shot area, and they are identified as Mark1 to Mark100. Each mark has a mark type (Pattern), an X coordinate (X (mm)), a Y coordinate (Y (mm)), an X axis offset (OffsetX (mm)), and a Y axis offset (OffsetY (mm). )) Can be set. The X coordinate and the Y coordinate indicate the position of the designed mark, and the offset indicates the offset from the designed coordinate.

  FIG. 5 illustrates a user interface screen configured by combining an image of one shot area 120 and a mark position index 70 indicating the position of the mark 6. The position of the mark 6 is determined by information set using the user interface screen illustrated in FIG. 6 and 7 illustrate user interface screens in which the prohibited area 13 set by the prohibited area setting unit 102 is combined with the user interface screen shown in FIG. The prohibited area setting unit 102 has a function of setting or changing the prohibited area 13 in accordance with a user operation. The prohibited area 13 is an area outside the dotted line, and the dotted line indicates the inner edge of the prohibited area 13. The marks in the prohibited area 13 are marks that are excluded from marks used in the alignment before contact (that is, prohibited marks).

  Here, in the example shown in FIGS. 5-7, the shot area 120 is defined as an area partitioned by a scribe line. In the example shown in FIG. 6, the inner edge of the forbidden area 13 is arranged inside the shot area 120. In this example, the protrusion area covers the mark arranged on the outermost periphery of the shot area 120. In the example shown in FIG. 7, the inner edge of the prohibited area 13 is arranged outside the shot area 120, that is, on the scribe line. The forbidden area 13 is not limited to a rectangular shape, and can be an arbitrary shape. The prohibited area setting unit 102 may be configured to be able to set the prohibited area 13 by a free curve, for example.

  It is preferable that the protruding area where the imprint material protrudes does not exist. However, the occurrence of protrusion is caused by the distribution of the imprint material supplied onto the substrate 2 by the supply unit 11, the vibration of the substrate 2, and the mold when the mold 3 is brought into contact with the uncured imprint material on the substrate 2. 3 may depend on speed, acceleration, and the like. In general, if priority is given to throughput, protrusion is likely to occur. The first embodiment is advantageous for a request for reducing imprint defects while giving priority to throughput.

  As described above, according to the first embodiment, it is possible to prevent or reduce the occurrence of imprint failure due to the fact that marks cannot be detected correctly.

  Hereinafter, a second embodiment of the present invention will be described. Matters not mentioned in the second embodiment can follow the first embodiment. FIG. 8 illustrates the configuration of a control system configured by the console 10 and the control unit CNT in the second embodiment of the present invention. The console 10 can also be understood as a component of the mark selection unit MSP that selects the mark 6 to be detected by the detection unit 5 among the plurality of marks 6 in the shot area to be imprinted.

  The console 10 includes a mark information input unit 101, a layout input unit 105, and an imprint order input unit 106. In this example, the console 10 includes a pre-contact mark selection unit 103 ′ and a post-contact mark selection unit 104. However, at least one of the pre-contact mark selection unit 103 ′ and the post-contact mark selection unit 104 may be incorporated in the control unit CNT. In addition, a part of at least one of hardware and software that realizes the function of the mark information input unit 101 may be provided by the control unit CNT. In addition, a part of at least one of hardware and software realizing the function of the prohibited area setting unit 102 may be provided by the control unit CNT.

  As in the first embodiment, the mark information input unit 101 includes a mark type of the mark (substrate side mark) 6 arranged on the substrate 2, coordinates indicating the design position of the mark 6, and a design position of the mark 6. Let the user enter the offset from and capture them. The layout input unit 105 causes the user to input information indicating the shot layout and captures it. The imprint order input unit 106 causes the user to input information indicating the order of imprints for a plurality of shot areas constituting the shot layout captured by the layout input unit 105, and captures the information. The pre-contact mark selection unit 103 ′ makes contact from a plurality of marks 6 in each shot area of the substrate 2 based on the information captured by the mark information input unit 101 and the information captured by the imprint order input unit 106. A mark to be used in the previous alignment (step S103) is selected. The post-contact mark selection unit 104 selects a mark 6 to be used in post-contact alignment (step 107) from a plurality of marks 6 in each shot area of the substrate 2 based on the information captured by the mark information input unit 101. . Information indicating the mark 6 selected by the pre-contact mark selection unit 103 ′ and the post-contact mark selection unit 104 is transmitted to the control unit CNT via the communication path CL. The console 10 can be configured by incorporating program modules for configuring the components 101, 105, 106, 103 ', and 104 into the memory 1100 shown in FIG.

  FIG. 9 illustrates a user interface screen provided to the user by the layout input unit 105 and the imprint order input unit 106. For example, the layout input unit 105 can determine the shot layout based on information indicating the size of the shot area, the number of rows and the number of columns of the shot area array, which are input by the user. FIG. 9 shows a shot layout and a line 20 indicating the edge of the substrate 2. Each rectangular area in FIG. 9 represents a shot area. For example, the imprint order input unit 106 determines an imprint order for a plurality of shot areas constituting a shot layout in accordance with an input from the user. In one example, the user assigns an imprint order to all shot areas constituting the shot layout. In another example, when the user designates a shot area to be imprinted first, the imprint order input unit 106 automatically determines the order of imprint that provides the optimum throughput. In FIG. 9, the numbers given to each shot area indicate the order of imprinting. The shot area 121 is a shot area that is imprinted first, and the shot area 122 is a shot area that is imprinted seventh.

The selection of the mark 6 by the pre-contact mark selection unit 103 ′ can be performed by the following method. The mark 6 selected by the pre-contact mark selection unit 103 ′ is used in measurement for pre-contact alignment in step S103.
(Step 21)
The pre-contact mark selection unit 103 ′ extracts all the marks 6 input by the mark information input unit 101 for the shot area to be imprinted.
(Step 22)
The pre-contact mark selection unit 103 ′ determines whether the shot area adjacent to the imprint target shot area is an imprinted shot area that has already been imprinted, and the imprint order input unit 106 inputs the imprint order. Judgment based on. When the shot area adjacent to the imprint target shot area is an imprinted shot area, the pre-contact mark selection unit 103 ′ has the imprinted shot area adjacent to which side of the imprint target shot area. Judge whether to do.

For example, in FIG. 9, when the shot area 122 is an imprint target, shot areas whose imprint order is No. 2, No. 6, No. 8, and No. 13 are shot areas adjacent to the shot area 122. Among these, the imprinted shot area is a shot area whose imprint order is No. 2 and No. 6. Normally, the maximum number of shot areas adjacent to the imprint target shot area is four, but there may be a shot layout in which there are five or more shot areas adjacent to the imprint target shot area. In some cases, a shot area arranged in an oblique direction to the imprint target shot area should be regarded as an adjacent shot area.
(Step 23)
The pre-contact mark selection unit 103 ′ selects a mark (excluded) near the imprinted shot area determined to be adjacent to the imprint target shot area in step 22 from the marks extracted in step 21 for the imprint target shot area. Extract marks except (mark). Here, the close mark may be a mark existing within a preset distance from the imprinted shot area. The distance may be set by the user with respect to the console 10, or a default distance may be adopted.
(Step 24)
The pre-contact mark selection unit 103 ′ extracts a detection target mark to be detected by the detection unit 5 in the pre-contact alignment from the marks extracted in step 23. In this extraction, for example, a preset number of marks can be selected such that the mutual distance is the largest. The larger the number of marks, the smaller the error, but if the number is too large, the time required for measurement will increase according to the number of the marks. The number that can be set can be set by the user. The console 10 can have a function of allowing the user to set the number of such marks.

  The same number of marks is set for the rectangular shot area where the pattern 9 of the mold 3 is transferred over the entire area and the missing shot area where the pattern 9 of the mold 3 is transferred only for a part of the area. Alternatively, a different number may be set. The selection of the mark 6 in the steps 1 to 3 may be made in common for all shot areas of the substrate 2 or may be made for each shot area. Further, the processing of the mark information input unit 101 and the prohibited region setting unit 102 may be performed in common for all shot regions of the substrate 2 or may be performed for each shot region.

  As described above, the pre-contact mark selection unit 103 ′ performs the pre-contact alignment from the marks excluding the exclusion mark adjacent to the shot area that has already been imprinted among all the marks 6 in the male shot area to be imprinted. Therefore, a mark to be detected by the detection unit 5 is selected. The exclusion mark corresponds to a mark existing in the protrusion area in the first embodiment. According to the second embodiment, the mark in the protruding area is automatically excluded from the detection target by the detection unit 5 by the pre-contact mark selection unit 103 ′ according to the shot layout and the imprint order.

  The third embodiment of the present invention will be described below. Matters not mentioned in the third embodiment can follow the first and second embodiments. The third embodiment has a side surface as a combination of the first embodiment and the second embodiment. FIG. 10 illustrates a configuration of a control system including the console 10 and the control unit CNT in the third embodiment of the present invention. The console 10 can also be understood as a component of the mark selection unit MSP that selects the mark 6 to be detected by the detection unit 5 among the plurality of marks 6 in the shot area to be imprinted.

  The console 10 includes a mark information input unit 101, a prohibited area setting unit 102 ′, a layout input unit 105, and an imprint order input unit 106. In this example, the console 10 includes a pre-contact mark selection unit 103 ″ and a post-contact mark selection unit 104. However, at least one of the pre-contact mark selection unit 103 ″ and the post-contact mark selection unit 104 is a control unit. It may be incorporated into the CNT. In addition, a part of at least one of hardware and software that realizes the function of the mark information input unit 101 may be provided by the control unit CNT. In addition, a part of at least one of hardware and software realizing the function of the prohibited area setting unit 102 may be provided by the control unit CNT.

  As in the first embodiment, the mark information input unit 101 includes a mark type of the mark (substrate side mark) 6 arranged on the substrate 2, coordinates indicating the design position of the mark 6, and a design position of the mark 6. Let the user enter the offset from and capture them. The layout input unit 105 causes the user to input information indicating the shot layout and captures it. The imprint order input unit 106 causes the user to input information indicating the order of imprints for a plurality of shot areas constituting the shot layout captured by the layout input unit 105, and captures the information.

  The prohibited area setting unit 102 'is different from the prohibited area setting unit 102 of the first embodiment. The prohibited area setting unit 102 ′ provides the user with information (prohibited area information) for setting, as a prohibited area, an area where a mark to be excluded from the selection target among the plurality of marks 6 in each shot area of the substrate 2 is arranged. It is the same as the prohibited area setting unit 102 of the first embodiment in that it is input and set. On the other hand, the prohibited area setting unit 102 ′ according to the third embodiment prohibits a plurality of partial areas in the area where the plurality of marks 6 are arranged in the shot area to be imprinted in accordance with an operation by the user. The user can be set as a region candidate.

  The console 10 may be configured by incorporating program modules for configuring the components 101, 102 ', 105, 106, 103', and 104 into the memory 1100 shown in FIG.

  FIG. 11 illustrates a user interface screen configured by combining an image of one shot area 120 and a mark position index 70 indicating the position of the mark 6. The position of the mark 6 is determined by information set using the user interface screen illustrated in FIG. FIG. 11 shows a plurality of prohibited area candidates 13U, 13D, 13L, and 13R set by the prohibited area setting unit 102 '. The prohibited area setting unit 102 'has a function of setting or changing the prohibited area candidates 13U, 13D, 13L, and 13R in accordance with a user operation.

  The pre-contact mark selection unit 103 ″ uses a plurality of marks 6 in each shot region of the substrate 2 based on the information captured by the input units 101 and 106 and the prohibited region candidate set by the prohibited region setting unit 102 ′. A mark to be used in the alignment before contact (step S103) is selected, and the post-contact mark selection unit 104 is based on the information captured by the input unit 101, after the contact from the plurality of marks 6 in each shot area of the substrate 2. The mark 6 used in the alignment (step 107) is selected.

The selection of the mark 6 by the pre-contact mark selection unit 103 '' can be performed by the following method. The mark 6 selected by the pre-contact mark selection unit 103 is used in measurement for alignment before contact in step S103. The
(Step 31)
The pre-contact mark selection unit 103 ″ extracts all the marks 6 input by the mark information input unit 101 for the shot area to be imprinted.
(Step 32)
The pre-contact mark selection unit 103 ″ determines whether or not the shot area adjacent to the imprint target shot area is an imprinted shot area that has already been imprinted, by the imprint order input unit 106. If the shot area adjacent to the imprint target shot area is an imprinted shot area, the pre-contact mark selection unit 103 performs imprinting on which side of the imprint target shot area. It is determined whether the completed shot areas are adjacent.

  For example, in FIG. 9, when the shot area 122 is an imprint target, shot areas whose imprint order is No. 2, No. 6, No. 8, and No. 13 are shot areas adjacent to the shot area 122. Among these, the imprinted shot area is a shot area whose imprint order is No. 2 and No. 6. Normally, the maximum number of shot areas adjacent to the shot area to be imprinted is 4, but there may be a shot layout in which there are 5 or more shot areas. In some cases, a shot area arranged in an oblique direction to the imprint target shot area should be regarded as an adjacent shot area.

The pre-contact mark selection unit 103 ″ determines whether or not there is a forbidden area candidate set for a side adjacent to the imprinted shot area among the four sides of the imprint target shot area. If there is an area candidate, it is set as a prohibited area, for example, in the example of Fig. 9, the shot areas with the second and sixth imprint order are imprinted shot areas, and the prohibited area candidates 13U and 13L Is set as a prohibited area.
(Step 33)
The pre-contact mark selection unit 103 ″ removes the prohibition mark that should be prohibited from being used in the pre-contact alignment from all the marks 6 extracted in the step 31 based on the prohibition area set in the step 32. Extract marks.
(Step 34)
The pre-contact mark selection unit 103 ″ extracts detection target marks to be detected by the detection unit 5 in the pre-contact alignment from the marks extracted in step 33. In this extraction, for example, a predetermined number of marks are extracted. Marks can be selected so that the distance between them is the largest.The larger the number of marks, the smaller the error, but if there are too many marks, the time required for measurement will increase according to the number, so the required accuracy of the processing target In consideration of the above, the minimum number can be set by the user so that the accuracy satisfying the product standard can be obtained, and the console 10 can have a function of allowing the user to set the number of such marks.

  As described above, the pre-contact mark selection unit 103 ″ sets a prohibited region candidate adjacent to a shot region that has already been imprinted among all the marks 6 input by the mark information input unit 101 as a prohibited region. Then, the pre-contact mark selection unit 103 ″ specifies a mark existing in the prohibited area as a prohibited mark, and selects a mark to be detected by the detection unit from the plurality of marks 6 excluding the prohibited mark.

  In the example shown in FIG. 11, four prohibited area candidates can be set, but the prohibited area setting unit 102 ′ may be configured to be able to set prohibited area candidates other than 4. For example, in a shot layout in which there are five or more shot areas adjacent to the imprint target shot area, it is advantageous to enable setting of five or more prohibited area candidates. The forbidden area candidate is not limited to a rectangular shape, and can be an arbitrary shape. The prohibited area setting unit 102 ′ may be configured to be able to set a prohibited area candidate using a free curve, for example.

(Device manufacturing method)
A method for manufacturing a device (semiconductor integrated circuit element, liquid crystal display element, etc.) as an article includes a step of forming a pattern on a substrate (wafer, glass plate, film-like substrate) using the above-described imprint apparatus. Furthermore, the manufacturing method may include a step of etching the substrate on which the pattern is formed. In the case of manufacturing other articles such as patterned media (recording media) and optical elements, the manufacturing method may include other processes for processing a substrate on which a pattern is formed instead of etching. The article manufacturing method of this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

IMP: imprint apparatus, 2: substrate, 3: mold, 4: mold drive unit, 5: detection unit, 6: substrate side mark, 7: mold side mark, 8: curing unit, 9: pattern, 10: console, CNT: control unit, CL: communication path, DRVU: drive unit

Claims (9)

An imprint apparatus for bringing an imprint material on a substrate into contact with a mold and curing the imprint material,
A drive unit that drives at least one of the substrate and the mold so that a relative position between the shot area to be imprinted on the substrate and the mold is adjusted;
A detection unit for detecting a mark selected from a plurality of marks included in the shot area to be imprinted;
A control unit that controls the drive unit so that the shot area to be imprinted and the mold are aligned;
Among the plurality of marks, marks that should be prohibited from being detected by the detection unit in order to align the shot area to be imprinted with the mold before the mold contacts the imprint material. A console for allowing the user to input information for setting as a prohibition mark,
Based on the information, the detection target marks to be detected by the detection unit to align the shot area to be imprinted with the mold before the mold contacts the imprint material are based on the information. The mark is selected from marks other than the prohibition mark,
The control unit controls the driving unit so that the shot area to be imprinted and the mold are aligned based on information output from the detection unit with respect to the detection target mark;
An imprint apparatus characterized by that. Of the plurality of marks, the mark to be detected by the detection unit in order to align the shot area to be imprinted with the mold after the mold contacts the imprint material is independent of the prohibition mark. Selected from the plurality of marks,
The imprint apparatus according to claim 1. The console causes the user to set a partial area in the area where the plurality of marks are arranged as a prohibited area,
Among the plurality of marks, a mark present in the prohibited area is specified as the prohibited mark.
The imprint apparatus according to claim 1, wherein the imprint apparatus according to claim 1. The console causes the user to set a plurality of partial areas in the area where the plurality of marks are arranged as a plurality of prohibited area candidates,
A prohibited area candidate adjacent to a shot area that has already been imprinted among the plurality of prohibited area candidates is set as a prohibited area, and a mark existing in the prohibited area is specified as the prohibited mark.
The imprint apparatus according to claim 1, wherein the imprint apparatus according to claim 1. The console allows a user to set the order of imprinting for a plurality of shot areas on the substrate,
It is determined based on the order whether the shot area adjacent to the shot area to be imprinted is a shot area that has already been imprinted.
The imprint apparatus according to claim 4. An imprint apparatus for bringing an imprint material on a substrate into contact with a mold and curing the imprint material,
A drive unit that drives at least one of the substrate and the mold so that a relative position between the shot area to be imprinted on the substrate and the mold is adjusted;
A detection unit for detecting a mark selected from a plurality of marks included in the shot area to be imprinted;
A control unit that controls the drive unit so that the shot area to be imprinted and the mold are aligned;
A mark selection unit for selecting a mark to be detected by the detection unit among the plurality of marks,
The mark selection unit is configured to detect marks to be detected by the detection unit in order to align the shot area to be imprinted with the mold before the mold contacts the imprint material. Select from the marks excluding the exclusion mark that is close to the shot area that has already been imprinted.
An imprint apparatus characterized by that. The mark selection unit allows the user to set the order in which imprinting is performed on a plurality of shot areas of the substrate,
The mark selection unit determines, based on the order, whether a shot area adjacent to the shot area to be imprinted is the shot area that has already been imprinted.
The imprint apparatus according to claim 6. The mark selection unit causes the user to set a plurality of partial areas in the area where the plurality of marks are arranged as a plurality of prohibited area candidates,
The mark selection unit identifies a prohibited area candidate adjacent to the shot area that has already been imprinted among the plurality of prohibited area candidates as a prohibited area, and identifies a mark existing in the prohibited area as the exclusion mark.
The imprint apparatus according to claim 6 or 7, wherein Forming a pattern on a substrate using the imprint apparatus according to any one of claims 1 to 8,
Processing the substrate on which the pattern is formed;
An article manufacturing method comprising:

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