JP6541201B2 - Method of manufacturing capacitive touch panel - Google Patents

Description

  The present invention relates to a method of manufacturing a capacitive touch panel.

  The capacitive touch panel disposed overlapping the display area of the display device has an x-direction electrode extending in the x-direction and juxtaposed in the y-direction on the substrate and an x-direction extending in the y-direction. The y-direction electrodes arranged in parallel are formed to be insulated.

  When a capacitive touch panel configured in this way is touched with a finger or the like, the capacitance change occurs in the electrode at that point, and the x direction electrode y that the capacitance change occurs due to the external control circuit (controller) The x, y coordinates are calculated by detecting the direction electrode, and the information is reflected on the display device.

  In addition, by forming the substrate, the x-direction electrode, the y-direction electrode, and the like of the light-transmissive material, the capacitive touch panel enables the display region of the display device to be viewed through the capacitive touch panel, It corresponds to the x, y coordinates in the display area of the device.

  Such a technique is disclosed, for example, in Patent Document 1 below.

US Patent US005844506A

  However, in the above-described capacitive touch panel, the substrate is a glass substrate, and each of the x-direction electrode and the y-direction electrode is, for example, a transparent conductive film (for example, ITO: Indium Tin Oxide) formed by sputtering. It is patterned by selective etching. Therefore, it is inevitable to adopt a vacuum process for forming a transparent conductive film on a substrate, which complicates the operation and increases the manufacturing cost.

  In addition, since sputtering is used to form the transparent conductive film on the substrate, for example, the process temperature is relatively high, and a heat-resistant glass substrate has to be used as the substrate, and it is highly resistant to impact. It has been difficult to realize a bendable capacitive touch panel.

  Furthermore, the transparent conductive film such as ITO is made of metal oxide, and the light refractive index thereof and the light refractive index of the insulating film interposed between the x-direction electrode and the y-direction electrode are relatively different. It is inevitable. For this reason, there is a disadvantage that the patterns of the x-direction electrode and the y-direction electrode can be easily viewed.

  An object of the present invention is to provide a method of manufacturing a capacitive touch panel having a configuration that can be easily manufactured.

  Another object of the present invention is to provide a manufacturing method of a capacitive touch panel which is strong in impact resistance and can be bent.

  Another object of the present invention is to provide a method of manufacturing a capacitive touch panel in which the pattern of the electrode is difficult to see.

  In the capacitive touch panel according to the present invention, the x-direction electrode and the y-direction electrode are formed of a transparent polymer material formed by coating.

  The configuration of the present invention can be, for example, as follows.

(1) The method of manufacturing a capacitive touch panel according to the present invention
An insulating substrate made of resin,
A plurality of first electrodes formed of a transparent conductive film formed on the insulating substrate;
An insulating film formed on the plurality of first electrodes;
A plurality of second electrodes formed of a transparent conductive film formed on the insulating film and intersecting the first electrode;
A method of manufacturing a capacitive touch panel comprising: a protective film formed on the plurality of second electrodes;
Applying a photosensitive polymer material to the insulating substrate in the atmosphere and patterning it by photolithography to form the first electrode;
Applying a liquid photosensitive polymer material on the insulating substrate including the first electrode in the atmosphere and patterning it by photolithography to form the insulating film;
A photosensitive polymer material is applied on the insulating film in the atmosphere and patterned by photolithography to form the second electrode.

  (2) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that, in (1), the refractive indices of the first electrode and the insulating film are substantially the same.

  (3) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that in (1), the refractive indexes of the protective film, the first electrode, and the second electrode are substantially the same. Do.

  (4) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that, in (1), the refractive indexes of the protective film, the first electrode, and the second electrode are substantially the same. Do.

  (5) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that in (1), the protective film is made of a SiO-based material or an organic resin-based material.

  (6) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that in (5), the protective film is made of a photosensitive material.

  (7) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that in (5), the protective film is made of a material that can be applied by screen printing or an inkjet method.

(8) The method of manufacturing a capacitive touch panel according to the present invention
An insulating substrate made of resin,
A plurality of first electrodes formed on the insulating substrate;
An insulating film formed on the plurality of first electrodes;
A plurality of second electrodes formed on the insulating film and intersecting the first electrode;
In a method of manufacturing a capacitive touch panel, comprising: a protective film formed on the plurality of second electrodes;
Applying a photosensitive polymer material to the insulating substrate in the atmosphere and patterning it by photolithography to form the first electrode so as to have a pad portion with a broadened line width;
Applying a liquid photosensitive polymer material on the insulating substrate including the first electrode in the atmosphere and patterning it by photolithography to form the insulating film;
A step of applying a photosensitive polymer material on the insulating film in the atmosphere and patterning it by photolithography to form the second electrode so as to have a pad portion with a broadened line width. I assume.

  (9) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that, in (8), the first electrode and the insulating film have substantially the same refractive index.

  (10) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that, in (8), the refractive indices of the second electrode and the insulating film are substantially the same.

  (11) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that, in (8), the refractive indexes of the protective film, the first electrode, and the second electrode are substantially the same. Do.

  (12) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that in (8), the protective film is made of an organic resin material.

  (13) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that in (12), the protective film is made of a photosensitive material.

(14) The method of manufacturing a capacitive touch panel according to the present invention is characterized in that in (12), the protective film is made of a material that can be applied by screen printing or an inkjet method.
(15) In the method of manufacturing a capacitive touch panel according to the present invention, in (1), the step of forming the first electrode, the step of forming the insulating film, and the step of forming the second electrode Is characterized by being performed at a process temperature of 200.degree. C. or less.
(16) In the method of manufacturing a capacitive touch panel according to the present invention, in (8), the step of forming the first electrode, the step of forming the insulating film, and the step of forming the second electrode Is characterized by being performed at a process temperature of 200.degree. C. or less.

  The configuration described above is merely an example, and the present invention can be appropriately modified without departing from the technical concept. Further, examples of the configuration of the present invention other than the above-described configurations will be apparent from the description throughout the present specification or the drawings.

  According to the method of manufacturing a capacitive touch panel configured as described above, the structure can be easily manufactured. In addition, impact resistance can be made strong and bendable. In addition, the pattern of the electrode can be configured so as not to be visible.

  Other effects of the present invention will be apparent from the entire description of the specification.

It is sectional drawing which shows one Example of the electrostatic capacitance type touch panel of this invention, and corresponds to the cross section in the II line of FIG. It is a top view of one example of an electric capacity type touch panel of the present invention. It is a structural view showing an example of a material used for an electrode of a capacitive touch panel of the present invention. It is a circuit diagram showing an example of a touch panel controller connected to a capacitive touch panel of the present invention. It is a figure which shows the timing of the signal of the touch-panel controller shown in FIG. It is a perspective exploded view which shows the Example of the screen input type display apparatus of this invention. It is a block diagram which shows the state which connected the screen input type display apparatus of this invention with the mobile apparatus. It is sectional drawing which shows the other Example of the electrostatic capacitance type touch panel of this invention. It is a perspective exploded view which shows the other Example of the screen input type display apparatus of this invention. It is an explanatory view showing an example of apparatus to which a screen input type display device of the present invention is applied.

  Embodiments of the present invention will be described with reference to the drawings. In each of the drawings and the embodiments, the same or similar components are denoted by the same reference numerals and the description thereof will be omitted.

Example 1
(Capacitive touch panel)
FIG. 2 is a plan view showing Example 1 of the capacitive touch panel (hereinafter sometimes referred to simply as touch panel) of the present invention. FIG. 1 is a cross-sectional view taken along the line II in FIG.

  In FIG. 2, for example, there is a rectangular substrate SUB. The substrate SUB is, for example, disposed so as to overlap the liquid crystal display panel, and is formed corresponding to the size of the liquid crystal display panel. The substrate SUB is made of, for example, glass or resin.

  For example, a plurality of y-direction electrodes YP are formed on the surface of the substrate SUB. The y-direction electrode YP is formed extending in the y-direction in the drawing and juxtaposed in the x-direction. The y-direction electrode YP is formed in a pattern in which portions having small line widths and portions having large line widths are alternately arranged in the extending direction. In the y-direction electrode YP, the portion with a small line width has a short line length, and the portion with a large line width has a large line length. The portion where the line width of y-direction electrode YP is large (this portion may be referred to as pad portion PDy) has, for example, a rhombus shape, and is connected to the portion where the line width is small in the pair of diagonal portions. ing. The pad portions PDy of the y-direction electrode YP are arranged in parallel in the x direction in the drawing together with the pad portions PDy of the other y-direction electrodes YP arranged in parallel. Here, the y-direction electrode YP is formed of a transparent conductive film, and the material is formed of a polymeric material formed by coating. The above-described pattern can be formed by applying the polymer material on the surface of the substrate SUB and performing selective etching by a photolithography technique. In this case, by using a photosensitive material as the polymer material, it is possible to form the above-described pattern by photolithography technology alone (omission of selective etching). As the polymer material, for example, polypyrrole, polyaniline, polyacetylene, polythiophene, polyphenylene vinylene, polyferylene sulfide, poly p-phenylene and polyheterocyclic vinylene can be used. As a typical polymer material, for example, the one represented by the structural formula in FIG. 3 and substituted polythiophene called PEDOT, poly (3,4-ethylenedioxythiophene) can be used. The photosensitive polymer material can be formed by adding a photopolymerization initiator and a binder: polyfunctional acrylic monomer to the above-mentioned polymer material. Then, by adding an insulating material to be formed by application to the above-described polymer material, it is possible to form a transparent conductive film with a predetermined pattern using, for example, screen printing or inkjet. That is, the transparent conductive film of a predetermined pattern can be formed without using the photolithography technique. In the y-direction electrode YP configured in this way, the sheet resistance is smaller than 1000 (Ω / □), the light transmittance is 90% or more at a thickness of 400 to 700 nm, and the light refractive index is smaller than 2.0. That is confirmed.

  The y-direction electrodes YP are drawn out, for example, as wires WLy with a small line width from the lower end in the figure, for example, and connected to a connector CN mounted on the lower right of the substrate SUB, for example.

  An insulating film IN is formed on the surface of the substrate SUB so as to cover the y-direction electrode YP. The insulating film IN functions as an interlayer insulating film in which an x-direction electrode XP described later formed on the upper surface is insulated from the y-direction electrode YP. Here, the insulating film IN is formed of a SiO-based material formed by application or an organic resin-based material formed by application as the material. As a SiO-based material formed by coating, SOG (Spin on Glass: liquid in which silica (SiO 2) is dissolved in a solvent) can be used. These materials are usually in a liquid state and can be formed on the surface of the substrate SUB by coating. By adding photosensitivity to the insulating film IN, pattern processing can be performed only by the photolithography technology, and the etching process can be made unnecessary. Further, by using an organic resin material applied and formed as the insulating film IN, the insulating film IN can be formed with a predetermined pattern by using, for example, screen printing or inkjet. That is, the insulating film IN can be formed in a predetermined pattern without using a photolithography technique. In the insulating film IN thus configured, its heat resistance is preferably greater than 150 ° C., its dielectric constant is preferably 3 to 4 at 1 MHz, the resolution of the pattern is preferably about 5 μm or less, and the visible light transmittance is 90 It is desirable to be greater than%. Further, the optical refractive index is preferably 1.2 to 2.0.

  For example, a plurality of x-direction electrodes XP are formed on the surface of insulating film IN. The x-direction electrode XP is formed extending in the x direction in the drawing and juxtaposed in the y direction. The x-direction electrode XP is formed in the same pattern as the y-direction electrode YP. That is, in the extension direction of the x-direction electrode XP, it is formed in a pattern in which portions with small line widths and portions with large line widths are alternately arranged. In the x-direction electrode XP, the portion with a small line width has a short line length, and the portion with a large line width has a large line length. The portion where the line width of the x-direction electrode XP is large (this portion may be referred to as the pad portion PDx) has a rhombus shape, and the pair of diagonal portions is connected to the portion where the line width is small. There is. Each pad portion PDx of the x-direction electrode YP is arranged in parallel in the y direction in the drawing together with the pad portion PDx of another x-direction electrode XP arranged in parallel. When viewed in a plan view, each pad portion PDx of the x-direction electrode XP is arranged in a region surrounded by the four adjacent pad portions PDy of the y-direction electrode YP without being overlapped with them. It has become. This relationship also applies to each pad portion PDy of the y-direction electrode YP, and these pad portions PDy are arranged without overlapping them in a region surrounded by four adjacent pad portions PDx of the x-direction electrode XP. It has become so. The y-direction electrode YP and the x-direction electrode X are designed to be overlapped due to intersection in a portion where their line width is small.

  Here, the x-direction electrode XP is formed of a transparent conductive film, and the material thereof is formed of a polymer material formed by coating, as in the y-direction electrode YP. In this case, the material of the x-direction electrode XP does not have to be the same as the material of the y-direction electrode YP, but it is selected from the above-described materials of the y-direction electrode YP.

  Each of the x-direction electrodes XP is, for example, drawn out from the end on the right side in the drawing by a wire WLx having a small line width, and is connected to the connector CN.

  A protective film PS is formed on the surface of the substrate SUB so as to cover the x-direction electrode XP. The protective film PS is provided to protect the x-direction electrode XP from external injury. Here, the protective film PS is formed of, as the material thereof, a SiO-based material formed by application or an organic resin-based material formed by application similarly to the insulating film IN, and the insulating film IN It is formed by the same manufacture. In this case, the material of the protective film PS is not necessarily the same as the material of the insulating film IN, but is selected from the respective materials of the above-described materials of the insulating film IN.

  The capacitive touch panel configured in this manner can form the y-direction electrode YP, the insulating film IN, the x-direction electrode XP, and the protective film PS on the surface of the substrate SUB using a material applied in the air. . This is extremely easy to perform compared to the conventional method in which the y-direction electrode YP and the x-direction electrode XP are formed by, for example, ITO (Indium Tin Oxide) formed by evaporation in a vacuum atmosphere. The cost can be reduced significantly. In this case, the material layer can be processed (patterned) only by photolithography without using selective etching. In this case, the operation can be further facilitated and the manufacturing cost can be significantly reduced. . Furthermore, the material layer can be formed, for example, by printing, etc. In this case, since the patterning can be performed without using the photolithography technology, the operation can be further facilitated and the manufacturing cost can be significantly reduced. .

  The capacitance type touch panel configured in this way can suppress the process temperature to a low temperature of 200 ° C. or less in the formation of the y-direction electrode YP, the insulating film IN, the x-direction electrode XP, and the protective film PS. Therefore, as the substrate SUB, a resin film, or a metal thin film or the like whose surface has been subjected to insulation processing can also be used. Therefore, it is possible to obtain a touch panel which is strong in impact resistance or can be bent and used.

  The capacitive touch panel configured in this way is made of a polymer material formed by applying the y-direction electrode YP and the x-direction electrode XP, and the polymer material formed by applying this is optically The characteristics can be controlled, for example, the refractive index can be made substantially equal to the refractive index of the insulating film IN or the protective film PS. For this reason, it is possible to obtain an effect of making it difficult to visually check the patterns of the y-direction electrode YP and the x-direction electrode XP when viewed in a plan view.

  Since the capacitive touch panel configured in this way is made of a polymer material formed by applying the y-direction electrode YP and the x-direction electrode XP, a conventional touch panel made of, for example, ITO or the like is used. Since it has excellent elasticity as compared with the above, it is possible to obtain a material which is resistant to mechanical abrasion and excellent in impact resistance. Similarly, it is made of a material formed by applying the insulating film IN and the protective film PS, and has excellent elasticity as compared with the conventional one formed by, for example, CVD (Chemical Vapor Deposition) or the like. It is resistant to mechanical abrasion and can be excellent in impact resistance.

<Touch panel controller>
FIG. 4 is a circuit diagram showing an example of the configuration of the touch panel controller 3 connected to the touch panel 100 and used.

  In FIG. 4, the touch panel controller 3 includes, for example, an integration circuit 30 connected to the touch panel 100, an AD converter 40 connected to the integration circuit 30, and an arithmetic processing circuit 50 connected to the AD converter 40. It consists of The integration circuit 30 is configured such that an integration capacitance (Cc) 32 and a reset switch 33 are connected in parallel between the input and output terminals of the operational amplifier 31. The input terminal of the operational amplifier 31 is a node A connected to, for example, the x-direction electrode XP of the touch panel 100, and a current source I is connected to the node A. The charge generated by the terminal capacitance Cp and the finger contact capacitance Cf of the touch panel 100 is accumulated in the integral capacitance (Cc) 32. The output voltage of the output terminal (node B) of the operational amplifier 32 is determined by the ratio of the integration capacitance (Cc) 32 to (Cp + Cf). The reset switch 33 is controlled by a clock signal Vrst whose on / off state is a predetermined cycle, and the detection time is controlled. After the output from the integration circuit 30 is digitized through the AD converter 40, the arithmetic processing circuit 50 calculates the x coordinate of the finger in contact with the touch panel 100. Such a configuration is the same as in the circuit connected to the y-direction electrode YP of the touch panel 100, and the y coordinate of the finger in contact with the touch panel 100 is calculated.

  In the configuration described above, instead of the AD converter 40, a circuit that converts an AD converter into time may be applied. Further, the touch panel controller 3 may have a configuration other than the configuration shown in FIG. 4, and in short, it may be configured to be able to detect a change in capacitance or charge.

  FIG. 5 is a timing chart showing an operation sequence of the integration circuit 30. As shown in FIG. (A) shows the clock signal Vrst for turning on the reset switch 33, (b) shows the voltage at the node B, (c) shows the output from the AD converter 40, (d) shows the touch panel 100 with a finger touching (In the figure, TC when in contact and NT when not in contact are shown). The clock signal Vrst is output at times T0, T1, T2 and T3, and indicates a non-contact state between T0 and T1, a contact between T1 and T2, and a non-contact state between T2 and T3. The voltage of node A (see FIG. 4) is determined, for example, by the time when current source I is charged to terminal capacitance Cp of x-direction electrode XP, for example, when the finger is not in contact. It is determined by the time for charging the terminal capacitance Cp and the capacitance Cf at the time of contact. Further, the voltage of the node B (see FIG. 4) becomes the ground level when it is turned on by the clock signal Vrst of the reset switch 22. Here, the voltage of the node B at time T2 when the finger contacts is represented by V (T2), and the voltage of the node B at time T1 when the finger is non-contact is represented by V (T1). The difference D is represented by a signal component and represented by the following equation (1).

V (T2) -V (T1) = ItCc / Cp-ItCc / (Cf + Cp)
= Cf / Cp / (Cf + Cp) Cc ... (1)
Here, Cp: terminal capacitance, Cf: capacitance at finger contact, I: current value of current source I, Cc: integral capacitance of the integrating circuit 30.

(Display device equipped with touch panel)
FIG. 6 is an exploded perspective view showing an embodiment of a display device provided with the touch panel 100 described above, that is, a screen input type display device.

  For example, a liquid crystal display panel PNL is used as the display device. The liquid crystal display panel PNL constitutes an envelope of the liquid crystal display panel PNL by the TFT substrate SUB1 and the counter substrate SUB2 which sandwich the liquid crystal LC. In this case, the TFT substrate and the counter substrate SUB2 may be a glass substrate or a substrate made of resin. A plurality of pixels arranged in a matrix are formed on the surface of the TFT substrate SUB1 on the liquid crystal LC side, and these pixels are independently driven by thin film transistors (not shown) formed adjacent thereto. ing. A flexible substrate FPC is connected to the TFT substrate SUB1, and signals are independently supplied to the respective pixels through the flexible substrate FPC. The lower polarizing plate POL1 is disposed on the surface of the TFT substrate SUB1 opposite to the liquid crystal LC, and the upper polarizing plate POL2 is disposed on the surface opposite to the liquid crystal LC of the counter substrate SUB2 so that the behavior of the liquid crystal LC in each pixel can be visualized. It has become. In addition, since each pixel of the liquid crystal display panel PNL is a non-light emitting element that controls the light transmission amount, the backlight BL is disposed on the surface of the liquid crystal display panel PNL opposite to the viewer.

The touch panel 100 is disposed on the surface of the liquid crystal display panel PNL on the viewer side, and the display area of the liquid crystal display panel PNL can be viewed through the touch panel 100. In the touch panel 100, the x-direction electrode XP and the y-direction electrode YP are formed on the surface of the substrate SUB opposite to the liquid crystal display device PNL, for example, and the x-direction electrode XP and the y-direction electrode YP are formed on the surface of the touch panel 100. A protective plate PB made of, for example, acrylic is disposed on the side. The touch panel 100 is bonded to the liquid crystal display panel PNL via an adhesive layer ADL.
FIG. 7 is a diagram showing a configuration in which the liquid crystal display module LDM is configured by the liquid crystal display panel PNL, the liquid crystal drive circuit DR, the touch panel 100, and the touch panel controller 3 described above and connected to the mobile device MM. The mobile device MM includes a processor CPU, and communication between the processor CPU and the touch controller 3 is performed by SPI, I2C, etc. Communication between the processor CPU and the liquid crystal display driver DR is performed via an RGB interface or CPU interface It is supposed to be done. As a result, initial setting data such as activation, sampling frequency, detection resolution and the like is transmitted from the mobile device MM to the liquid crystal display module LDM. Then, detection data (x, y coordinate data, presence / absence of finger touch, etc.) is transmitted from the liquid crystal display module LDM to the mobile device MM, and based on the position information detected by the touch panel 100, the processor CPU in the mobile device MM. , And added to the display information of the liquid crystal display device PNL.

Example 2
FIG. 8 is a cross-sectional view showing another embodiment of the touch panel according to the present invention. FIG. 8 corresponds to FIG.

  8, the y-direction electrode YP is formed on one surface (upper surface in the drawing) with respect to the substrate SUB, while the x-direction electrode XP is different from the substrate SUB in FIG. It is to be formed on the other side (the lower side in the figure). Thus, the substrate SUB functions as an interlayer insulating film of the y-direction electrode YP and the x-direction electrode XP. From a plan view, the y-direction electrode YP and the x-direction electrode XP viewed through the substrate SUB have the same positional relationship as shown in FIG. A protective film PS (indicated by symbol PS (1) in the figure) is formed on one surface of the substrate SUB so as to cover the y-direction electrode YP, and the other surface of the substrate SUB also covers the x-direction electrode XP. A protective film PS (indicated by a symbol PS (2) in the drawing) is formed. Even in this case, the respective materials of the y-direction electrode YP, the x-direction electrode XP, and the protective films PS (1) and PS (2) are made of the materials described in the first embodiment. .

Example 3
FIG. 9 is an exploded perspective view showing another embodiment of the display device of the present invention. FIG. 9 corresponds to FIG.

  In FIG. 9, the configuration different from that in FIG. 6 is that the x-direction electrode XP and the y-direction electrode YP of the touch panel 100 are formed on the surface of the substrate SUB on the liquid crystal display device PNL side. The adhesion of the touch panel 100 to the liquid crystal display device PNL is performed via the adhesive layer ADL on the surface on which the x electrode XP and the y direction electrode YP are formed. In such a configuration, the substrate SUB can also protect the x-direction electrode XP and the y-direction electrode YP, so that the touch panel 100 can be made thinner.

Example 4
FIGS. 10A and 10B are diagrams showing an example of equipment to which the screen input type display device according to the present invention is applied. FIG. 10A shows a PDA, and a liquid crystal display panel PNL in which the touch panel 100 is disposed on the viewer side is incorporated in the display unit AR. FIG. 10B shows a mobile phone, and a liquid crystal display panel PNL in which the touch panel 100 is disposed on the viewer side is incorporated in the display unit AR. Of course, the apparatus to which the screen input type display device according to the present invention is applied is not limited to the one described above.

Example 5
In the above-described embodiment, the liquid crystal display panel is shown as an example of the display device, but another display device such as an organic EL device may be used.

SUB, SUB1, SUB2: substrate, YP: y-direction electrode, PDy: pad portion (y-direction electrode), XP: x-direction electrode, PDx: pad portion (x-direction electrode), WLy: wiring ( y direction electrode), WLx ... (x direction electrode), CN ... connector, IN ... insulating film, PS, PS (1), PS (2) ... protective film, PB ... protective plate, ADL ... Adhesive layer, POL1 ... Lower polarizing plate, POL2 ... Upper polarizing plate, LC ... Liquid crystal, FPC ... Flexible substrate, PNL ... Liquid crystal display panel, BL ... Backlight, LDM ... Liquid crystal display module, MM ...... Mobile device, DR: Liquid crystal drive circuit, 3: Touch panel controller, 30: Integration circuit, 31: Operational amplifier, 33: Reset switch, 40: AD converter, 50: Arithmetic processing time , 100 ...... electrostatic capacity type touch panel.

Claims (16)

An insulating substrate made of resin,
A plurality of first electrodes formed of a transparent conductive film formed on the insulating substrate;
An insulating film formed on the plurality of first electrodes;
A plurality of second electrodes formed of a transparent conductive film formed on the insulating film and intersecting the first electrode;
A method of manufacturing a capacitive touch panel comprising: a protective film formed on the plurality of second electrodes;
Applying a photosensitive polymer material to the insulating substrate in the atmosphere and patterning it by photolithography to form the first electrode;
Applying a liquid photosensitive polymer material on the insulating substrate including the first electrode in the atmosphere and patterning it by photolithography to form the insulating film;
A method of manufacturing a capacitive touch panel, comprising the steps of: applying a photosensitive polymer material on the insulating film in the atmosphere; patterning it by photolithography; and forming the second electrode. . The refractive index of a said 1st electrode and the said insulating film is substantially the same. The manufacturing method of the electrostatic capacitance type touch panel of Claim 1 characterized by the above-mentioned. The refractive index of the said protective film, a said 1st electrode, and a said 2nd electrode is substantially the same. The manufacturing method of the electrostatic capacitance type touch panel of Claim 1 characterized by the above-mentioned. The refractive index of the said protective film, a said 1st electrode, and a said 2nd electrode is substantially the same. The manufacturing method of the electrostatic capacitance type touch panel of Claim 1 characterized by the above-mentioned. The method of manufacturing a capacitive touch panel according to claim 1, wherein the protective film is made of an organic resin-based material. The said protective film is comprised with the material which has photosensitivity. The manufacturing method of the electrostatic capacitance type touch panel of Claim 5 characterized by the above-mentioned. The method for manufacturing a capacitive touch panel according to claim 5, wherein the protective film can be applied by screen printing or an inkjet method. An insulating substrate made of resin,
A plurality of first electrodes formed on the insulating substrate;
An insulating film formed on the plurality of first electrodes;
A plurality of second electrodes formed on the insulating film and intersecting the first electrode;
In a method of manufacturing a capacitive touch panel, comprising: a protective film formed on the plurality of second electrodes;
Applying a photosensitive polymer material to the insulating substrate in the atmosphere and patterning it by photolithography to form the first electrode so as to have a pad portion with a broadened line width;
Applying a liquid photosensitive polymer material on the insulating substrate including the first electrode in the atmosphere and patterning it by photolithography to form the insulating film;
A step of applying a photosensitive polymer material on the insulating film in the atmosphere and patterning it by photolithography to form the second electrode so as to have a pad portion with a broadened line width. Method of manufacturing a capacitive touch panel. The method according to claim 8, wherein the first electrode and the insulating film have substantially the same refractive index. 9. The method of manufacturing a capacitive touch panel according to claim 8, wherein refractive indexes of the second electrode and the insulating film are substantially the same. 9. The method of manufacturing a capacitive touch panel according to claim 8, wherein refractive indexes of the protective film, the first electrode, and the second electrode are substantially the same. The said protective film is comprised with the organic resin type material. The manufacturing method of the electrostatic capacitance type touch panel of Claim 8 characterized by the above-mentioned. The method for manufacturing a capacitive touch panel according to claim 12, wherein the protective film is made of a photosensitive material. The method of manufacturing a capacitive touch panel according to claim 12, wherein the protective film is applied by screen printing or an inkjet method.   The process of forming the first electrode, the process of forming the insulating film, and the process of forming the second electrode are performed at a process temperature of 200 ° C. or less. Manufacturing method of a capacitive touch panel.   9. The method according to claim 8, wherein the step of forming the first electrode, the step of forming the insulating film, and the step of forming the second electrode are performed at a process temperature of 200 ° C. or less. Manufacturing method of a capacitive touch panel.

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