JP6540840B2 - Optical element for face protection - Google Patents

Description

  The present technology relates to an optical element for protecting the face that protects the face from flying objects to the face while securing a necessary view, and more particularly to an optical element for protecting the face with enhanced visible light transmittance.

  Conventionally, a face shield used for surgery and the like has a structure in which a transparent plastic film is attached to a face mask as an eye shield (Patent Document 1).

  However, in general, a transparent flexible plastic film has a refractive index of 1.3 or more, and light reflection occurs at the interface with air. For example, polyethylene terephthalate described in Patent Document 1 has a refractive index of 1.58, and a reflectance of 5.05% at the interface with air, and considering the reflection on each of the front and back sides of the film, 10.7. As much as 1% of reflected light is generated. A very strong surgical lighting system is used in the operating room where surgery is performed, and such a lighting system has an illuminance of 140,000 lux or more, and the intensity of reflected light is also strong.

  On the other hand, for such a high-intensity surgical illumination system, it has been proposed to coat a surface of a transparent or translucent substrate with a composition that imparts anti-reflection and anti-fogging properties (Patent Document 2). .

  Patent Document 2 shows that the film coated with the composition for imparting the antireflective property and the antifogging property described in the same publication has a light transmittance of 11 to 11.2% higher than that of the uncoated film. It is done. However, the transmittance of this coated film is 97.0% at 550 nm, and a reflected light close to 3% is still generated, which causes glare during use.

Japanese Patent Application Laid-Open No. 7-178117 Unexamined-Japanese-Patent No. 2010-202881

  The object of the present invention is to provide a transparent face protecting optical element having less reflected light and having an antifogging performance even under a very strong illumination system such as a surgical operating room and a face protector using the optical element. It is to provide.

  In order to solve the above-mentioned subject, the first technology is a face protecting optical element in which a plurality of structures are provided on both sides of a flexible transparent substrate at a pitch equal to or less than the wavelength of visible light. is there.

  The second technique is a face protector in which the above-described optical element is detachably attached to a jig or fixed to a face mask.

  In the optical element of the present invention, a plurality of structures are provided on both sides of the transparent substrate at a pitch equal to or less than the wavelength of visible light. Therefore, according to the present invention, it is possible to provide a transparent face protecting optical member with less reflected light even under a very high intensity illumination system.

  In addition, since the surface of the optical element of the present invention is hydrophilic, the water contained in the exhaled breath is instantly smoothed to prevent fogging. Therefore, according to the present invention, it is possible to provide an optical member for face protection that is less likely to be fogged and has high transparency.

  Therefore, according to the face protector using the optical element of the present invention, it is possible that it is caused by dazzling or fogging due to reflected light in applications of protecting the face when flying objects to the face occur, such as at the time of surgery or dental treatment. It can provide an environment without poor visibility.

FIG. 1 is a cross-sectional view showing a configuration example of a face protecting optical element according to an embodiment of the present invention. FIG. 2 is a perspective view (A) showing an example of the surface shape of the optical element, and a plan view (B) showing an example of the arrangement of a plurality of structures formed on the surface of the optical element. FIG. 3 is a plan view of a face protector according to an embodiment of the present invention. FIG. 4 is a perspective view of the face protector of one embodiment of the present invention worn on the face. FIG. 5 is a perspective view (A) showing an example of the configuration of a roll master, a plan view (B) showing an enlarged part of the roll master shown in A, and tracks T1, T3,. It is sectional drawing (C) in. FIG. 6 is a schematic view showing an example of the configuration of a roll master exposure apparatus for producing a roll master. FIG. 7 is a process diagram for describing an example of a method of manufacturing the optical element for protecting a face according to the embodiment of the present invention. FIG. 8 is a process diagram for explaining an example of a method of manufacturing the optical element for protecting a face according to the embodiment of the present invention. FIG. 9 is a process diagram for describing an example of a method for manufacturing a face protection member according to an embodiment of the present invention. FIG. 10 is a plan view and a sectional view showing a first modified example of the face protecting optical element according to the embodiment of the present invention. FIG. 11 is a plan view showing a second modified example of the face protecting optical element according to the embodiment of the present invention. 12A and 12B are an external view (A) showing a third modified example of the optical element for protecting a face according to the embodiment of the present invention, and a cross-sectional view (B) along the A-A line shown in A. FIG.

  Embodiments of the present invention will be described in detail.

[1. Overview]
The present inventors diligently studied to solve the above-mentioned problems. As a result, it has been conceived to form fine and precise asperities (moth eyes; eyebrows) on both sides of the transparent substrate for protecting the face as a means for expressing the antireflective function.

  In general, when the surface of the optical element is provided with a periodic uneven shape, diffraction occurs when light is transmitted therethrough, and the linear component of the transmitted light is significantly reduced. However, when the pitch of the concavo-convex shape is shorter than the wavelength of light to be transmitted, diffraction does not occur, and an effective antireflection effect can be obtained for light of a wavelength corresponding to the pitch or depth of the concavo-convex shape. it can. What has various shapes, such as a bell shape and an elliptical frustum shape, is proposed as a moth-eye structure which forms such uneven | corrugated shape. The planar shape of these structures has a curve such as a circle or an ellipse.

  In the optical element for face protection of the present invention, since fine and precise irregularities are respectively formed on both surfaces, reflection at the interface between the optical element and air can be effectively suppressed. In addition, as a forming material of this optical element, there is an ultraviolet curable resin or the like.

  As a result of further studies on a face protecting optical element having a moth-eye structure on the surface, the present inventor has found that the following problem occurs. That is, when the surface of the optical element for protecting the face is provided with fine and precise asperities using an ultraviolet curing resin, the surface becomes hydrophobic and becomes extremely cloudy due to exhalation. Although various methods have been proposed for making the film hard to cloud by such a method of forming a coating film having hydrophilicity on the surface, the formation of the coating film causes fine and dense irregularities to be buried, resulting in reflection. The prevention effect is lost. Accordingly, as a result of further investigations to prevent the occurrence of such problems, the present inventor has used an ultraviolet-curable resin having hydrophilicity to provide a configuration and means for providing fine and precise asperities on both sides of a transparent substrate. It came to find.

[2. Configuration of Optical Element for Face Protection]
FIG. 1 is a cross-sectional view showing a configuration example of a face protecting optical element according to an embodiment of the present invention. As shown in the figure, the face protecting optical element 1 has a fine uneven structure (hereinafter referred to as "moth eye structure" as appropriate) having an antireflection function on both the front and back sides.

(2.1 Optical element)
The optical element 1 is a moth-eye film having an antireflection function on the facing surface (first surface) and the back surface (second surface).

  The surface of the optical element 1 is an uneven surface provided with the structures 12 at a pitch equal to or less than the wavelength of visible light. By providing such an uneven surface on both the front and back sides of the optical element 1, it is possible to provide the optical element 1 with an optical adjustment function with excellent visibility. Therefore, the face protector excellent in visibility can be realized. Here, the optical adjustment function indicates an optical adjustment function of transmission characteristics and reflection characteristics. The optical element 1 has, for example, transparency to visible light, and the refractive index n thereof is preferably in the range of 1.40 to 2.00, more preferably 1.43 to 2.00. It is preferably inside. Moreover, it is preferable that the transmittance | permeability with respect to the light of wavelength 550nm is 98.5% or more.

  A of FIG. 2 is a perspective view showing an example of the surface shape of the optical element 1. The optical element 1 includes, for example, a base 11 having a front surface and a rear surface, and a plurality of structures 12 provided on the surface of the base 11 via a base layer 13. The plurality of structures 12 are arranged in a plurality of rows on the surface of the base 11. The uneven surface on the surface side of the base 11 is formed by the plurality of structures 12 arranged in this manner. The structure 12 has, for example, a convex or concave shape with respect to the surface of the substrate 11. In A of FIG. 2, an example is shown in which the structure 12 has a convex shape with respect to the surface of the base 11. In general, the structure 12 and the base 11 are separately molded or integrally formed, and the base layer 13 is provided as needed when the structure 12 and the base 11 are separately molded.

  The base layer 13 has transparency and is formed by curing the same energy ray-curable resin composition as that of the structure 12 or the like.

  The refractive index of the structure 12 is preferably the same as or substantially the same as the refractive index of the substrate 11. This is because internal reflection can be suppressed and contrast can be improved.

  When the structure 12 and the base 11 are separately formed, an adhesive layer (not shown) is provided on the outermost layer of the base 11 to bond the base 11 and the base layer 13 together. It can be used as a transparent base material in the optical element 1.

(2.2 Substrate)
The substrate 11 preferably has a refractive index equivalent to that of the structure 12 and has transparency. The base 11 may be formed by laminating transparent members. Examples of the material of the substrate 11 include plastic materials having transparency, and materials having glass as a main component, but the material is not particularly limited to these materials.

  As the glass, for example, soda lime glass, lead glass, hard glass, quartz glass, liquid crystal glass, etc. (see “Basic Handbook of Chemical Handbook”, P.I-537, edited by The Chemical Society of Japan) are used. As the plastic material, polymethyl methacrylate, methyl methacrylate and other alkyl (from the viewpoint of optical properties such as transparency, refractive index, and dispersion, and further various properties such as impact resistance, heat resistance, and durability) (Meth) acrylic resins such as copolymers with vinyl monomers such as meta) acrylate and styrene; polycarbonate resins such as polycarbonate and diethylene glycol bisallyl carbonate (CR-39); (brominated) bisphenol A type Thermosetting (meth) acrylic resins such as homopolymers or copolymers of (meth) acrylates, polymers and copolymers of (brominated) bisphenol A mono (meth) acrylate urethane-modified monomers; polyesters, especially polyethylene terephthalate , Polyethylene naphtha And unsaturated polyesters, acrylonitrile-styrene copolymers, polyvinyl chloride, polyurethanes, epoxy resins, polyarylates, polyether sulfones, polyether ketones, cycloolefin polymers (trade names: arton, zeonoa), cycloolefin copolymers, etc. Is preferred. In addition, it is also possible to use an aramid-based resin in consideration of heat resistance. Here, (meth) acrylate means acrylate or methacrylate. In addition, (meth) acrylic resin means acrylic resin or methacrylic resin.

  When the structure 12 and the substrate 11 are separately molded, and a plastic material is used as the substrate 11, a subbing layer is provided as a surface treatment to further improve the surface energy, coatability, planarity, etc. of the plastic surface. It is also good. Examples of the undercoat layer include organoalkoxy metal compounds, polyesters, acrylic-modified polyesters, polyurethanes, and the like. In addition, in order to obtain the same effect as providing the undercoat layer, the surface of the substrate 11 may be subjected to corona discharge treatment, UV irradiation treatment or the like.

  When the structure 12 and the base 11 are separately molded, and the base 11 is a plastic film, for example, the base 11 is formed by stretching the above-mentioned resin or diluting it in a solvent and forming a film and drying It can be obtained by The thickness of the substrate 11 is preferably selected according to the application of the optical laminate 1 and is, for example, about 10 μm to 500 μm, preferably about 50 μm to 500 μm, and more preferably about 50 μm to 300 μm. When it is 10 μm or more, the protection performance against flying objects is improved. On the other hand, if it is 500 μm or less, the weight can be reduced, and since it can be deformed into a curved surface shape by having flexibility, the wearing feeling as a protective member is improved.

  Examples of the shape of the substrate 11 include, for example, a film shape and a plate shape, but the shape is not particularly limited. Here, the film is defined as including a sheet.

(2.3 Structure)
B of FIG. 2 is a plan view showing an example of the arrangement of a plurality of structures 12 provided on the surface of the base 11. As shown in B of FIG. 2, the plurality of structures 12 are two-dimensionally arrayed on the surface of the base 11. It is preferable that the structures 12 be periodically two-dimensionally arranged at a short average arrangement pitch equal to or less than the wavelength band of light for the purpose of reducing reflection or improving transmission.

  Each of the plurality of structures 12 has an arrangement form in which a plurality of rows of tracks T1, T2, T3,... (Hereinafter collectively referred to as "track T") are formed on the surface of the base 11. In the present technology, a track refers to a portion in which a plurality of structures 12 are connected in a line. As the shape of the track T, a linear shape, an arc shape or the like can be used, and the track T of these shapes may be wobbled (serpent). By causing the track T to wobble as described above, the occurrence of unevenness in appearance can be suppressed.

  In the case where the track T is wobbled, it is preferable that the wobble of each track T on the base 11 be synchronized. That is, the wobble is preferably a synchronized wobble. By synchronizing the wobbles in this manner, it is possible to maintain the unit cell shape of the hexagonal lattice or quasi-hexagonal lattice and keep the filling factor high. Examples of the waveform of the wobbled track T may include a sine wave, a triangular wave, and the like. The waveform of the wobbled track T is not limited to a periodic waveform, and may be a non-periodic waveform. The wobble amplitude of the wobbled track T is selected to be, for example, about 10 nm to 1 μm.

  The structures 12 are arranged, for example, at a position shifted by half a pitch between two adjacent tracks T. Specifically, the structure of the other track (e.g., T2) is located at an intermediate position (half pitch offset position) of the structures 12 arranged in one track (e.g., T1) between two adjacent tracks T. 12 are arranged. As a result, as shown in FIG. 2B, a hexagonal lattice pattern or a quasi-hexagonal lattice pattern is formed in which the center of the structure 12 is located at each point of a1 to a7 between adjacent three rows of tracks (T1 to T3) The structures 12 are arranged to do so.

  Here, the hexagonal lattice means a regular hexagonal lattice. A quasi-hexagonal lattice, unlike a regular hexagonal lattice, refers to a distorted regular hexagonal lattice. For example, when the structures 12 are disposed on a straight line, the quasi-hexagonal lattice means a hexagonal lattice in which a regular hexagonal lattice is stretched and distorted in a linear arrangement direction (track direction). . When the structures 12 are arranged in an arc, the quasi-hexagonal lattice means a hexagonal lattice obtained by distorting a regular hexagonal lattice into an arc or a regular hexagonal lattice in the arrangement direction (track direction). It refers to a hexagonal lattice that is stretched and distorted, and is distorted in an arc shape. When the structures 12 are arranged in a meandering manner, the quasi-hexagonal lattice means a hexagonal lattice obtained by distorting a regular hexagonal lattice by the meandering arrangement of the structures 12 or an arrangement direction of a regular hexagonal lattice ( It refers to a hexagonal lattice stretched and distorted in the track direction and distorted by the meandering arrangement of the structures 12.

  When the structures 12 are arranged to form a quasi-hexagonal lattice pattern, as shown in B of FIG. 2, the arrangement pitch P1 (for example, a1 to a2) of the structures 12 in the same track (for example, T1). Distance) is the arrangement pitch of the structures 12 between two adjacent tracks (for example, T1 and T2), that is, the arrangement pitch P2 (for example, a1 to a7) of the structures 12 in the ± θ direction with respect to the extension direction of the tracks. And a2 to a7) is preferable. By arranging the structures 12 in this manner, the packing density of the structures 12 can be further improved.

  Specific examples of the shape of the structure 12 include, for example, a cone shape, a column shape, a needle shape, a hemisphere shape, a semi-elliptical shape, and a polygonal shape, but are not limited to these shapes. Other shapes may be adopted. The pyramidal shape includes, for example, a pyramidal shape with a pointed top, a pyramidal shape with a flat top, and a pyramidal shape with a convex or concave curved surface at the top, but is limited to these shapes is not. Examples of the pyramidal shape having a convex curved surface at the top include a quadratic surface such as a paraboloid shape. Further, the conical pyramidal surface may be curved in a concave or convex shape. When a roll master is manufactured using a roll master exposure apparatus (see FIG. 6) described later, an elliptical cone having a convex curved surface at the top, or an elliptical frustum with a flat top, as the shape of the structure 12 It is preferable to adopt a shape, and to make the major axis direction of the ovals forming the bottom of the shape coincide with the extending direction of the tracks T. Here, the shape of an ellipse, a sphere, an ellipsoid, etc. is not only the shape of a perfect ellipse, a sphere, an ellipsoid, etc. defined mathematically, but also an ellipse, a sphere, an ellipsoid, etc. with some distortion. The shape of is also included. The plane shape is not limited to an ellipse, and may be a circle.

  From the viewpoint of improving the optical adjustment function, it is preferable to have a pyramidal shape in which the inclination of the top is gentle and gradually steep from the center to the bottom. Further, from the viewpoint of improving the optical adjustment function, it is preferable that the central portion has a conical shape whose inclination is steeper than that of the bottom and the top, or a conical shape with a flat top. In the case where the structure 12 has an elliptical cone shape or an elliptical frustum shape, it is preferable that the long axis direction of the bottom surface be parallel to the extending direction of the track.

  The structure 12 preferably has a curved surface portion 15 at the periphery of the bottom, the height of which gradually decreases in the direction from the top to the bottom. This is because the optical element 1 can be easily peeled off from the master or the like in the manufacturing process of the optical element 1. Although the curved surface portion 15 may be provided only in a part of the peripheral portion of the structure 12, it is preferable to provide the curved surface portion 15 in the entire peripheral portion of the structure 12 from the viewpoint of improving the peeling characteristics.

  It is preferable to provide the protrusion 14 in part or all of the periphery of the structure 12. This is because, even when the filling rate of the structure 12 is low, the reflectance can be suppressed to a low level. The protrusions 14 are preferably provided between the adjacent structures 12 from the viewpoint of ease of molding. In addition, part or all of the surface of the structure 12 may be roughened to form fine irregularities. Specifically, for example, surfaces between adjacent structures 12 may be roughened to form fine irregularities. In addition, minute holes may be formed on the surface of the structure 12, for example, at the top.

  Although each structure 12 has the same size, shape and height in FIG. 1 and FIG. 2, the structure of the structure 12 is not limited to this, and A structure 12 having a size, shape and height greater than or equal to species may be formed.

  The height H1 of the structures 12 in the track extending direction (X direction) is preferably smaller than the height H2 of the structures 12 in the track arrangement direction (Y direction). That is, it is preferable that the heights H1 and H2 of the structure 12 satisfy the relationship of H1 <H2. If the structures 12 are arranged to satisfy the relationship of H1 ≧ H2, the arrangement pitch P1 in the track extending direction needs to be increased, and the filling factor of the structures 12 in the track extending direction is reduced. is there. When the filling rate is reduced as described above, the optical adjustment function is reduced.

  The heights H1 and H2 of the structures 12 are not necessarily the same, and the structures 12 may be configured to have a certain height distribution. By providing the structure 12 having the height distribution, the wavelength dependency of the optical adjustment function can be reduced. Therefore, the optical element 1 having an excellent optical adjustment function can be realized.

  Here, the height distribution means that the structures 12 having two or more heights are provided on the surface of the base 11. For example, a structure 12 having a reference height and a structure 12 having a height different from that of the structure 12 may be provided on the surface of the base 11. In this case, the structures 12 having a height different from the reference are, for example, periodically or non-periodically (randomly) provided on the surface of the substrate 11. As the direction of the periodicity, for example, the extending direction of the track, the row direction and the like can be mentioned.

  The aspect ratio (height or depth H / arrangement pitch P) of the structures 12 provided on the surface of the substrate 11 is preferably 0.66 to 1.96, more preferably 0.76 to 1.96. It is. Low reflection characteristics can be improved when the aspect ratio is 0.66 or more. On the other hand, releasability etc. can be improved as an aspect ratio is 1.96 or less.

  Here, the height of the structure 12 is the height in the inter-track direction (Y direction). Usually, the height H1 in the track extending direction (X direction) of the structure 12 is smaller than the height in the inter-track direction (Y direction), and the height H in the portion other than the track extending direction of the structure 12 is Since the height in the direction between tracks is substantially the same, in the present invention, the height of the structure 12 is represented by the height in the direction between tracks unless otherwise noted. However, when the structure 12 is a recess, the height H of the structure 12 is the depth H of the structure 12.

Further, the arrangement pitch P is an average arrangement pitch defined by the following equation.
Average arrangement pitch P = (P1 + P2 + P2) / 3
However, P1: arrangement pitch of structures in the track extension direction (track extension direction cycle), P2: arrangement pitch of structures between adjacent tracks.
Note that the arrangement direction θ of the structures between the tracks with respect to the extension direction of the tracks is
θ = 60 ° -δ
Is preferably 0 ° <δ ≦ 11 °, more preferably 3 ° ≦ δ ≦ 6 °.

  The arrangement pitch P1 of the extension direction of the tracks of the structures 12 and the arrangement pitch P2 of the structures between the tracks are preferably equal to or less than the wavelength band of light for the purpose of the optical adjustment function. The wavelength band of light for the purpose of the optical adjustment function is, for example, a wavelength band of ultraviolet light, a wavelength band of visible light, or a wavelength band of infrared light. Here, the wavelength band of ultraviolet light refers to the wavelength band of 10 nm to 360 nm, the wavelength band of visible light refers to the wavelength band of 360 nm to 830 nm, and the wavelength band of infrared light refers to the wavelength band of 830 nm to 1 mm.

  The height H of the structure 12 is preferably in the range of 180 nm to 300 nm, more preferably 190 nm to 300 nm, and still more preferably 190 nm to 230 nm. The low reflection characteristic can be improved as the height H of the structure 12 is 180 nm or more. On the other hand, releasability etc. can be improved as height H of structure 12 is 300 nm or less.

  When the arrangement of the structures 12 forms a hexagonal lattice pattern or a quasi-hexagonal lattice pattern, the arrangement pitch of the structures 12 in the track extension direction is P1, and the arrangement pitch of the structures 12 between adjacent tracks is P2. It is preferable that the ratio P1 / P2 satisfy the relationship of 1.00 ≦ P1 / P2 ≦ 1.1. By setting the value in such a numerical range, the filling factor of the structure 12 having an elliptical cone shape or an elliptical truncated cone shape can be improved, so that the optical adjustment function can be improved.

  The filling ratio of the structures 12 on the surface of the substrate 11 is in the range of 65% or more, preferably 73% or more, and more preferably 86% or more, with the upper limit being 100%. By setting the filling rate in such a range, the anti-reflection characteristics can be improved. In order to improve the filling rate, it is preferable to apply distortion to the structure 12 by joining the lower portions of the adjacent structures 12 or adjusting the ellipticity of the bottom surface of the structure 12 or the like.

Here, the filling factor (average filling factor) of the structure 12 is a value obtained as follows.
First, the surface of the conductive optical element 1 is photographed in a top view using a scanning electron microscope (SEM: Scanning Electron Microscope). Next, unit lattices Uc are randomly selected from the photographed SEM photograph, and the arrangement pitch P1 of the unit lattices Uc and the track pitch Tp are measured (see B in FIG. 2). Also, the area S of the bottom surface of the structure 12 located at the center of the unit lattice Uc is measured by image processing. Next, using the measured arrangement pitch P1, the track pitch Tp, and the area S of the bottom surface, the filling factor is determined according to the following equation.
Filling rate = (S (hex.) / S (unit)) × 100
However, the unit cell area when the arrangement of the structures 12 is a hexagonal lattice pattern or a quasi-hexagonal lattice pattern: S (unit) = P1 × 2Tp
Area of bottom of structure 12 present in unit cell: S (hex.) = 2S

  The above-described process of calculating the filling rate is performed on ten unit lattices randomly selected from the photographed SEM photograph. Then, the measured values are simply averaged (arithmetic average) to obtain the average rate of the filling rate, and this is taken as the filling rate of the structures 12 on the substrate surface.

  The filling factor when the structures 12 overlap or when there are substructures such as the protrusions 14 between the structures 12 is a portion corresponding to a height of 5% with respect to the height of the structures 12 The filling rate can be determined by a method of determining the area ratio with

  It is preferable that the structures 12 are connected such that the lower portions thereof overlap each other. Specifically, it is preferable that lower portions of some or all of the structures 12 in an adjacent relationship overlap with each other, and preferably overlap in the track direction, the θ direction, or in both directions. By overlapping the lower portions of the structures 12 in this manner, the filling rate of the structures 12 can be improved. It is preferable that the structures 12 overlap with each other in a portion of 1⁄4 or less of the maximum value of the wavelength of light in the use environment. This is because an excellent optical adjustment function can be obtained.

  The ratio ((2r / P1) × 100) of the diameter 2r of the bottom surface of the structure to the arrangement pitch P1 is preferably 85% or more, more preferably 90% or more, and still more preferably 95% or more. With such a range, the filling rate of the structure 12 can be improved, and the optical adjustment function can be improved. If the ratio ((2r / P1) × 100) becomes large and the overlap of the structures 12 becomes too large, the optical adjustment function tends to deteriorate. Therefore, the ratio ((2r / P1) × 100) is such that the structures 12 are joined at a portion of 1/4 or less of the maximum value of the wavelength band of light under use environment with the optical path length considering the refractive index. It is preferable to set the upper limit value of. Here, the arrangement pitch P1 is the arrangement pitch of the structures 12 in the track extending direction (X direction), and the diameter 2r is the diameter of the bottom surface of the structures 12 in the track extending direction (X direction). When the bottom of the structure 12 is circular, the diameter 2r is the diameter, and when the bottom of the structure 12 is elliptical, the diameter 2r is the long diameter.

  When the structure 12 forms a quasi-hexagonal lattice pattern, the ellipticity e of the bottom surface of the structure 12 is preferably 100% <e <150% or less. By setting this range, the filling rate of the structure 12 can be improved, and an excellent optical adjustment function can be obtained.

The thickness of the substrate 11 is appropriately selected in accordance with the application of the optical element 1, and it is preferable to impart flexibility or rigidity in accordance with the application.
Although the structures 12 are provided on both sides of the substrate, their heights may be within the above-mentioned range, and the two sides do not necessarily have to be the same.
Therefore, the height of the structure provided on one side of the substrate 11 is Ha, the thickness of the transparent base is T, and the other side of the transparent base (the side opposite to the side on which the structure of height Ha is provided) It is preferable to set it as Ha: T: Hb = 18-30: 1000-50000: 18-30, when the height of the structure provided in these is set to Hb.

  In the optical element of the present invention, a transparent member composed of the base layer 13 and the structure 12 provided on one side thereof is bonded to both sides of another transparent member having the same refractive index with an adhesive. included. In this case, the thickness of the transparent substrate in the optical element is obtained by removing the thickness of the front and back structures from the thickness of the entire laminate formed by bonding. In this embodiment, the pressure-sensitive adhesive also has the same refractive index as that of the structure 12 or the substrate.

  Since the optical element of the present invention is intended for use in surgery and the like, the optical element of the present invention can be detachably attached to an attachment jig of an optical element such as a goggle type or a face mask type, or By adhering to the face mask, a face protector can be obtained. The invention also encompasses such face protectors.

FIG. 3 is a plan view of an embodiment of the face protector 70 in which the optical element 1 of the present invention is fixed to the face mask 71, and FIG. 4 is a perspective view of the face protector 70 worn on the face. .
The face mask 71 covers the wearer's nose, mouth and part of the chin, and is held on the face by a string 72 or the like. As the face mask 71, any medical face mask can be used, and for example, one having air permeability and having a multi-layer structure to prevent the invasion of bacteria can be used.

  On the other hand, the optical element 1 is fixed to the face mask 71 at the bonding areas 74a and 74b as an eye shield 73 which prevents the liquid and the scattering object from flying in the eyes of the wearer without blocking the visibility of the wearer. .

  The eye shield 73 has a sufficiently large width with respect to the width of the face mask 71, and has a size capable of widely covering the periphery of the wearer's eyes. In addition, the eye shield 73 has a recess 75 at the center of the lower side. When the face protector 70 is worn on the face, the presence of the recess 75 causes the eye shield 73 to bend around the nose of the wearer, and the eye shield 73 becomes a curved surface along the face.

  The bonding regions 74a and 74b are provided at the left and right ends of the face mask 71 and at the side portions of the nose when worn. As a method of fixing the eye shield 73 and the face mask 71 in the bonding areas 74a and 74b, ultrasonic welding, thermal bonding, mechanical bonding such as wrinkles, and the like can be mentioned. The size of the bonding regions 74 a and 74 b may be, for example, 3 to 15 mm in width and 5 to 30 mm in length as long as the eye shield 73 can be fixed. As a result, it becomes unnecessary to hold the eye shield 73 against the face with the string 72, and the face protector 70 can be easily attached and detached.

  In the present invention, the optical element 1 of the present invention used as the eye shield 73 may be detachably attached to the face mask 71.

[3. Configuration of master]
FIG. 5A is a perspective view showing an example of the configuration of a roll master for producing the optical element 1 having the above-described configuration. B of the figure is a top view which expands and represents a part of roll original disc shown to A of the figure. C of the same figure is a sectional view in track T1, T3, ... of B of the same figure. More specifically, the roll master 31 is a master for forming the plurality of structures 12 on the surface of the base described above. The roll master 31 has, for example, a cylindrical or cylindrical shape, and the cylindrical surface or the cylindrical surface is a molding surface for molding the plurality of structures 12 on the substrate surface. For example, a plurality of structures 32 are two-dimensionally arranged on this molding surface. The structure 32 has, for example, a concave or convex shape with respect to the molding surface. In addition, in C of FIG. 5, the example which has a concave with respect to the molding surface is shown. For example, glass can be used as the material of the roll master 31, but the material is not particularly limited.

  The plurality of structures 32 disposed on the forming surface of the roll master 31 and the plurality of structures 12 disposed on the surface of the base 11 described above are in an inverted concavo-convex relationship. That is, the shape, arrangement, arrangement pitch, and the like of the structures 32 of the roll master 31 are the same as those of the structures 12 of the base 11.

[4. Configuration of exposure apparatus]
FIG. 6 is a schematic view showing an example of the configuration of a roll master exposure apparatus for producing a roll master. This roll master exposure apparatus is configured based on an optical disc recording apparatus.

  The laser light source 41 is a light source for exposing a resist deposited on the surface of a roll master 31 as a recording medium, and oscillates a recording laser beam 34 having a wavelength λ = 266 nm, for example. The laser beam 34 emitted from the laser light source 41 goes straight as the parallel beam and enters the electro-optical element (EOM: Electro Optical Modulator) 42. The laser beam 34 transmitted through the electro-optical element 42 is reflected by the mirror 43 and guided to the modulation optical system 45.

  The mirror 43 is configured of a polarization beam splitter, and has a function of reflecting one polarization component and transmitting the other polarization component. The polarization component transmitted through the mirror 43 is received by the photodiode 44, and the electro-optical element 42 is controlled based on the light reception signal to perform phase modulation of the laser light 34.

In the modulation optical system 45, the laser light 34 is condensed by the condenser lens 46 onto an acousto-optic element (AOM: Acousto-Optic Modulator) 47 made of glass (SiO ₂ ) or the like. The laser beam 34 is intensity-modulated and diverged by the acousto-optical element 47 and then collimated by the lens 48. The laser beam 34 emitted from the modulation optical system 45 is reflected by the mirror 51 and guided horizontally and in parallel on the movable optical table 52.

  The moving optical table 52 includes a beam expander 53 and an objective lens 54. The laser beam 34 guided to the moving optical table 52 is shaped into a desired beam shape by the beam expander 53, and then irradiated to the resist layer on the roll master 31 through the objective lens 54. The roll master 31 is mounted on a turntable 56 connected to a spindle motor 55. Then, while the roll master 31 is rotated and the laser light 34 is moved in the height direction of the roll master 31, the laser light 34 is intermittently applied to the resist layer to perform the exposure process of the resist layer. The formed latent image becomes substantially elliptical with the major axis in the circumferential direction. The movement of the laser beam 34 is performed by the movement of the movable optical table 52 in the direction of the arrow R.

  The exposure apparatus includes a control mechanism 57 for forming a latent image corresponding to the two-dimensional pattern of the hexagonal lattice or quasi-hexagonal lattice shown in FIGS. 2B and 5B on the resist layer. The control mechanism 57 includes a formatter 49 and a driver 50. The formatter 49 includes a polarity reversing unit, and this polarity reversing unit controls the irradiation timing of the laser beam 34 to the resist layer. The driver 50 receives the output of the polarity inverting unit and controls the acousto-optic element 47.

  In this roll master exposure apparatus, the polarity inversion formatter signal and the rotation controller are synchronized for each track so that the two-dimensional pattern is spatially linked, and a signal is generated and intensity modulated by the acousto-optic element 47. A hexagonal lattice or quasi-hexagonal lattice pattern can be recorded by patterning at a constant angular velocity (CAV) and an appropriate number of rotations, an appropriate modulation frequency, and an appropriate feed pitch.

[5. Method of Manufacturing Optical Element for Face Protection]
7 to 9 are process diagrams for explaining an example of a method of manufacturing the optical element for protecting a face according to the first embodiment of the present technology.

(5.1 Resist film formation process)
First, as shown in FIG. 7A, a cylindrical or cylindrical roll master 31 is prepared. The roll master 31 is, for example, a glass master. Next, as shown in FIG. B, a resist layer 33 is formed on the surface of the roll master 31. As a material of the resist layer 33, for example, either an organic resist or an inorganic resist may be used. As the organic resist, for example, a novolak resist or a chemically amplified resist can be used. Further, as the inorganic resist, for example, a metal compound can be used.

(5.2 Exposure process)
Next, as shown in FIG. 7C, the resist layer 33 formed on the surface of the roll master 31 is irradiated with a laser beam (exposure beam) 34. Specifically, the roll master 31 is placed on the turntable 56 of the roll master exposure apparatus shown in FIG. 6, and the roll master 31 is rotated, and the laser beam (exposure beam) 34 is applied to the resist layer 33. At this time, the resist 34 is intermittently applied while moving the laser beam 34 in the height direction of the roll master 31 (a direction parallel to the central axis of the cylindrical or cylindrical roll master 31). The layer 33 is exposed over the entire surface. Thereby, a latent image 35 corresponding to the locus of the laser beam 34 is formed over the entire surface of the resist layer 33 at, for example, a pitch approximately equal to the visible light wavelength.

  The latent images 35 are arranged, for example, to form a plurality of rows of tracks on the surface of the roll master, and form a hexagonal lattice pattern or a quasi-hexagonal lattice pattern. The latent image 35 is, for example, an elliptical shape having a long axis direction in the track extending direction.

(5.3 Development process)
Next, for example, while rotating the roll master 31, a developer is dropped on the resist layer 33 to develop the resist layer 33. As a result, as shown in A of FIG. 8, a plurality of openings are formed in the resist layer 33. When the resist layer 33 is formed of a positive resist, the exposed portion exposed by the laser beam 34 has a higher dissolution rate in the developer compared to the non-exposed portion, as shown in A of FIG. A pattern corresponding to the latent image (exposed portion) 16 is formed on the resist layer 33. The pattern of the openings is, for example, a predetermined lattice pattern such as a hexagonal lattice pattern or a quasi-hexagonal lattice pattern.

(5.4 Etching process)
Next, the surface of the roll master 31 is etched using the pattern (resist pattern) of the resist layer 33 formed on the roll master 31 as a mask. As a result, as shown in FIG. 8B, for example, it is possible to obtain an elliptical cone-shaped or elliptical truncated cone-shaped recess, that is, a structure 32 having a long axis direction in the track extension direction. For example, dry etching or wet etching can be used as the etching. At this time, by alternately performing the etching process and the ashing process, for example, a pattern of the pyramidal structure 32 can be formed. Thus, the target roll master 31 is obtained.

(5.5 Transfer step 1)
Next, as shown in C of FIG. 8, the master roll 31 and the transfer material 36 coated on the substrate 11 are brought into close contact with each other, and then energy rays such as ultraviolet rays are irradiated to the transfer material 36 from the energy ray source 37. After the transfer material 36 is cured, the substrate 11 integrated with the cured transfer material 36 is peeled off. Thereby, as shown to A of FIG. 9, optical element 1 'in which several structure 12 was formed in the surface of the base | substrate 11 is obtained. Under the present circumstances, you may make it further form the base layer 13 between the structure 12 and the base | substrate 11 as needed.

  The energy ray source 37 may cure the transfer material 36, such as electron beam, ultraviolet ray, infrared ray, laser beam, visible ray, ionizing radiation (X-ray, α-ray, β-ray, γ-ray etc.), microwave, high frequency etc. It is not particularly limited as long as it can emit energy beam of

  The cured product of the transfer material 36 has hydrophilicity. The transfer material 36 preferably contains one or more functional groups having hydrophilicity. Examples of such a functional group having hydrophilicity include a hydroxyl group, a carboxyl group, and a carbonyl group.

  As the energy ray curable resin composition for forming the transfer material 36, it is preferable to use an ultraviolet curable resin composition. The energy ray-curable resin composition may contain a filler, a functional additive, and the like as needed.

  The ultraviolet curable resin composition contains, for example, an acrylate and an initiator. The ultraviolet curable resin composition contains, for example, a monofunctional monomer, a bifunctional monomer, a polyfunctional monomer, etc. Specifically, the following materials are singly or in combination.

Examples of monofunctional monomers include carboxylic acids (acrylic acid), hydroxys (2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate), alkyl or alicyclic monomers (isobutyl acrylate, t- Butyl acrylate, isooctyl acrylate, lauryl acrylate, stearyl acrylate, isobonyl acrylate, cyclohexyl acrylate) and other functional monomers (2-methoxyethyl acrylate, methoxy ethylene glycol acrylate, 2-ethoxyethyl acrylate, tetrahydrofurfuryl acrylate, benzyl acrylate , Ethyl carbitol acrylate, phenoxyethyl acrylate, N, N-dimethylaminoethyl acrylate N, N-dimethylaminopropyl acrylamide, N, N-dimethyl acrylamide, acryloyl morpholine, N-isopropyl acrylamide, N, N-diethyl acrylamide, N-vinyl pyrrolidone, 2- (perfluorooctyl) ethyl acrylate, 3- Perfluorohexyl 2-hydroxypropyl acrylate, 3-perfluorooctyl 2-hydroxypropyl acrylate, 2- (perfluorodecyl) ethyl acrylate, 2- (perfluoro-3-methylbutyl) ethyl acrylate) 2,4,6- Tribromophenol acrylate, 2,4,6-tribromophenol methacrylate, 2- (2,4,6-tribromophenoxy) ethyl acrylate), 2-ethylhexyl acrylate, etc. Rukoto can.
Examples of difunctional monomers include tri (propylene glycol) diacrylate, trimethylolpropane diallyl ether, urethane acrylate and the like.

  Examples of polyfunctional monomers include trimethylolpropane triacrylate, dipentaerythritol penta and hexaacrylate, and ditrimethylolpropane tetraacrylate.

  Among them, as preferable resin compositions constituting the transfer material 36, 2-hydroxyethyl acrylate, acrylic morpholine, glycerol acrylate, polyether acrylate, N-vinyl formamide, N-vinyl pyrrolidone, N-vinyl caprolactone, ethoxy Diethylene glycol acrylate, methoxytriethylene glycol acrylate, polyethylene glycol acrylate, EO modified trimethylolpropane triacrylate, EO modified bisphenol A diacrylate, aliphatic urethane oligomers, polyester oligomers and the like can be mentioned.

  As the initiator, for example, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, etc. It can be mentioned.

As the filler, for example, any of inorganic fine particles and organic fine particles can be used. Examples of the inorganic fine particles include metal oxide particles such as _{SiO 2, TiO 2, ZrO 2} , SnO 2, Al 2 O 3.

  As a functional additive, a leveling agent, a surface conditioner, an antifoamer etc. can be mentioned, for example. The material of the substrate 11 is, for example, methyl methacrylate (co) polymer, polycarbonate, styrene (co) polymer, methyl methacrylate-styrene copolymer, cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, polyester, polyamide, Polyimide, polyethersulfone, polysulfone, polypropylene, polymethylpentene, polyvinyl chloride, polyvinyl acetal, polyether ketone, polyurethane, glass and the like.

(5.6 Transfer step 2)
Next, as shown in FIG. 9B, after the roll master 31 and the transfer material 36 applied on the surface on the opposite side of the substrate 11 having the structure formed on one side are brought into close contact with each other, The energy ray is irradiated from the energy ray source 37 to the transfer material 36 to cure the transfer material 36, and the substrate 11 integrated with the cured transfer material 36 is peeled off. Thereby, as shown to C of FIG. 9, the optical element 1 in which the several structure 12 was formed in both surfaces of the base | substrate 11 is obtained. At this time, an adhesive may be provided between the structure 12 and the base 11 as necessary.

  The resin composition used as the transfer material 36 in the transfer step 2 can be the same as the transfer step 1 described above.

(5.7 Shape formation process)
The optical element 1 obtained above can be used as a face protection shield material by cutting into a predetermined size.

[effect]
The optical element 1 obtained in this way has the structure 12 which expresses an anti-reflective function on both surfaces of a transparent base material. In addition, the surface of this optical element is hydrophilic, and the moisture contained in the exhalation is smoothed instantly to prevent fogging. Accordingly, it is possible to provide a highly transparent face protection member that is less likely to be fogged.

[6. Modified example]
(First modification)
As shown in FIG. 10, a plurality of structures 12 provided on the surface of the optical element 1 may form a tetragonal lattice pattern or a quasi-tetragonal lattice pattern between adjacent tracks T. Similarly, the plurality of structures 12 provided on the back surface of the optical element 1 may form a tetragonal lattice pattern or a quasi-tetragonal lattice pattern between adjacent three rows of tracks T.

  Here, the tetragonal lattice means a square lattice shape. A quasi-square lattice refers to a distorted square-shaped lattice, unlike a square-shaped lattice. For example, when the structures 12 are arranged on a straight line, the quasi-quartile lattice means a square lattice in which a square grid is stretched and distorted in a linear array direction (track direction). . In the case where the structures 12 are arranged in an arc, the quasi-tetragonal lattice means a tetragonal lattice obtained by distorting a square lattice in an arc shape, or a square lattice in the arrangement direction (track direction). It refers to a square grid that is distorted by stretching and distorted into arcs. In the case where the structures 12 are arranged in a serpentine manner, the quasi-tetragonal lattice means a tetragonal lattice obtained by distorting a square lattice shape by the serpentine arrangement of the structure 12 or an arrangement direction of the square lattice shape ( It refers to a tetragonal lattice stretched and distorted in the track direction and distorted by the serpentine arrangement of the structures 12.

  When the structures 12 are arranged in a tetragonal lattice pattern or a quasi-tetragonal lattice pattern, the arrangement pitch P1 of the structures 12 in the same track is longer than the arrangement pitch P2 of the structures 12 between two adjacent tracks. Is preferred. Further, assuming that the arrangement pitch of the structures 12 in the same track is P1 and the arrangement pitch of the structures 12 between two adjacent tracks is P2, P1 / P2 is 1.4 <P1 / P2 ≦ 1.5. It is preferable to satisfy the relationship. By setting the value in such a numerical range, the filling factor of the structure 12 having an elliptical cone shape or an elliptical truncated cone shape can be improved, so that the optical adjustment function can be improved. Also, the height or depth of the structure 12 in the 45 ° direction or about 45 ° direction with respect to the track is preferably smaller than the height or depth of the structure 12 in the track extension direction.

  The height H3 of the arrangement direction (θ direction) of the structures 12 oblique to the extension direction of the track is preferably smaller than the height H1 of the structure 12 in the extension direction of the track. That is, it is preferable that the heights H1 and H3 of the structure 12 satisfy the relationship of H1> H3.

  In the first modification, the same effects as those of the above-described first embodiment can be obtained.

(Second modification)
As shown in FIG. 11, a plurality of structures 12 may be two-dimensionally arrayed randomly (irregularly) on the surface of the optical element 1. At least one of the shape, size, and height of the structure 12 may be randomly changed.

  As a method of producing a master for producing the optical element 1 having the above-mentioned structure 12, for example, a method of anodizing the surface of a metal substrate such as an aluminum substrate can be used. It is not limited.

  In the second modification, since the plurality of structures 12 are two-dimensionally arranged at random, the occurrence of unevenness in appearance can be suppressed.

(Third modification)
As shown in A of FIG. 12, the optical element 1 may have a band-like shape as a whole. With such a shape, the optical element 1 can be easily manufactured by a roll-to-roll process. Moreover, handling can be made easy by winding the optical element 1 in roll shape etc. and making it an original fabric.

  When the above-described configuration is adopted as the configuration of the optical element 1, as shown in B of FIG. 12, the protective layer 6 for protecting the structure 12 is formed on the outermost surface of the optical element 1 via the adhesive layer 2. Further provision is preferred. Even when the optical element 1 is wound to be a raw fabric, damage to the structure 12 can be suppressed, and a decrease in the optical adjustment function can be suppressed. The protective layer 6 and the adhesive layer 2 are removed when the optical element 1 is used.

  Hereinafter, the present technology will be specifically described by way of examples, but the present technology is not limited to only these examples.

Example 1
First, several drops of a UV curable resin having a hydrophilic group were dropped on a master having a moth-eye shape, covered with a polyolefin film as a transparent substrate, and spread over the entire master by a roller. Here, as a UV curing resin having a hydrophilic group, a mixture of urethane acrylate (EBECRYL9270 manufactured by Daicel-Cytec Co., Ltd.) and methoxypolyethylene glycol monomethacrylate (SR550 manufactured by Sartomer Co., Ltd.) at a weight ratio of 7: 3 is used. A mixture containing 3% by weight of photoinitiator Irgacure 184 (Ciba Specialty Chemicals) was used.

  Thereafter, ultraviolet light was irradiated at 1000 mJ from the polyolefin film side for 1 minute to cure the resin, and then the resin was released from the master to obtain an optical element. In the same manner, the moth-eye shape was also transferred from the master onto the opposite side of the polyolefin film to obtain an optical element having an uneven shape on both sides.

(Comparative example 1)
First, several drops of a UV curable resin having no hydrophilic group were dropped on a master having a moth-eye shape, covered with a polyolefin film as a transparent substrate, and spread over the entire master by a roller. Thereafter, ultraviolet light was irradiated from the polyolefin film side to cure the resin, and then the resin was released from the master to obtain an optical element. In the same manner, the moth-eye shape was also transferred from the master onto the opposite side of the polyolefin film to obtain an optical element having an uneven shape on both sides. Thereafter, a corona treatment was applied as a surface treatment to the uneven surface of the produced optical element. As a result, an optical element having hydrophilic surfaces and having uneven surfaces on both sides was obtained.

(Comparative example 2)
In the same manner as Comparative Example 1 except that plasma treatment was performed as surface treatment, an optical element having hydrophilic surfaces and having uneven surfaces on both sides was obtained.

(Comparative example 3)
In the same manner as in Comparative Example 1 except that the UV / ozone treatment was applied as the surface treatment, an optical element having hydrophilic surfaces and having uneven surfaces on both sides was obtained.

(Comparative example 4)
An optical element having uneven surfaces on both sides was obtained in the same manner as in Comparative Example 1 except that the step of surface treatment was omitted.

(Comparative example 5)
In the same manner as in Comparative Example 1 except that a hydrophilization treatment was performed as the surface treatment, an optical element having hydrophilic surfaces and having uneven surfaces on both sides was obtained. The hydrophilization treatment was performed by applying a surfactant to the uneven surface of the optical element by dipping and drying.

(Evaluation of transmittance)
The transmittances of the optical elements of Example 1 and Comparative Examples 1 to 5 were evaluated using an evaluation apparatus (V-550) of JASCO. Among the evaluation results, the transmittance at a wavelength of 550 nm is shown in Table 1.

(result)
Almost no difference was observed between the transmittance of Example 1 and the transmittances of Comparative Examples 1 to 4. In Comparative Example 5, a decrease in transmittance was confirmed.

(Evaluation of contact angle)
The contact angles of pure water on the uneven surfaces of the optical elements of Example 1 and Comparative Examples 1 to 5 were measured. The measurement of the contact angle was performed twice, one hour after the sample preparation and 12 days after the sample preparation. Each treated surface was a measurement surface, and the average value of five measurements was taken as the measurement value. In addition, the measurement of the contact angle was performed using CA-V type | mold by Kyowa Interface Science. In both of the above two measurements, those having a contact angle of 40 ° or less were judged to be good.

(Result) In the measurement of 1 hour after preparation of the sample, good results were obtained in Example 1 and Comparative Examples 1 to 3 and 5. In the measurement after 12 days of sample preparation, only good results were obtained in Example 1 and Comparative Example 5.

(Evaluation of antifogging properties)
The haze was assessed by blowing the film directly while maintaining the film about 2.5 cm from the mouth. Cloudiness was evaluated twice, one hour after sample preparation (initial cloudiness) and 12 days after sample preparation. Initial haze was measured subjectively by the relative ability to blow through the film and then look through the film as "excellent", "good" and "bad". The following numerical ratings were used for evaluation after 12 days. "X" means that the coated film becomes cloudy like an uncoated film, "o" means that the coated film becomes slightly hazy after blowing back three consecutive times, and "o" is, It means that the coated film does not cloud even after blowing 5 times directly. The results are shown in Table 1.

(Result) In the measurement of 1 hour after preparation of the sample, excellent and good results were obtained in Example 1 and Comparative Examples 1 to 3 and 5. In the measurement after 12 days of sample preparation, the result of Example 1 was ◎, and the result of Comparative Example 5 was ○.
From the above results, only Example 1 showed good results for all of transparency, hydrophilicity and antifogging properties.

  As mentioned above, although an embodiment and an example of this art were explained concretely, this art is not limited to an above-mentioned embodiment and an example, and various modification based on the technical idea of this art is possible It is.

  For example, the configurations, methods, processes, shapes, materials, numerical values, and the like described in the above-described embodiments and examples are merely examples, and different configurations, methods, processes, shapes, materials, numerical values, and the like may be used as necessary. May be used.

  Furthermore, the configurations, methods, processes, shapes, materials, numerical values, and the like of the embodiments and examples described above can be combined with one another without departing from the spirit of the present technology.

DESCRIPTION OF SYMBOLS 1 ... Optical element 11 ... Base 12 ... Structure 13 ... Base layer 14 ... Protrusion part 15 ... Curved surface part 16 ... Latent image 31 ... Roll original disc 32 .. -Structure 33-Resist layer 34-Laser light 35-Latent image 36-Transfer material 37-Energy source 41-Laser light source 42-Electro-optical element 43- -Mirror 44-Photodiode 45-Modulation optical system 46-Condensing lens 47-Acousto-optical element 48-Lens 49-Formatter 50-Driver 51-Mirror 52 ... Moving optical table 53 ... Beam expander 54 ... Objective lens 55 ... Spindle motor 56 ... Turn table 57 ... Control mechanism 70 ... Face protector 71 ... Face mask 7 ... string 73 ... eye shield 74a, 74b ··· dent junction area 75 ...

Claims (5)

A face protector comprising a face protecting optical element in which a plurality of structures are provided on both sides of a flexible transparent substrate at a pitch equal to or less than the wavelength of visible light,
The structure is formed of a cured resin having a hydrophilic functional group,
The surface of the face protecting optical element is hydrophilic,
The face protecting optical element exhibits a light transmittance of 98.5% or more (wavelength 550 nm),
The face protecting optical element has a recess in the center of the lower side of the face protecting optical element,
When the height of the structure provided on one side of the transparent substrate is Ha, the thickness of the transparent substrate is T, and the height of the structure provided on the other side of the transparent substrate is Hb, Ha: T: Hb = 18~30: 1000~50000: 18~30 der is,
The face protecting optical element covers the periphery of the wearer's eyes,
The face protecting optical element is fixedly or removably attached to a face mask covering a portion of the wearer's nose, mouth and jaws, and
The face protecting optical element has an antireflective property and an antifogging property . Cured resin of the structure, face protection according to claim 1 which is a cured product of the ultraviolet-curing resin. Face protection according to claim 1 or 2 refractive index of the structure and the transparent substrate are substantially equal. Face protection according to any one of claims 1 to 3 water contact angle of the surface of the face protection optical element is less than 40 degrees. Face protection according to claim 1, wherein the transparent substrate is formed by bonding a plurality of transparent members.

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