JP6532223B2 - Method of manufacturing intermediate product of quartz crystal vibrating element - Google Patents

Description

  The present invention relates to a quartz crystal vibrating element and the like used for electronic devices and the like.

  A quartz oscillator or a quartz oscillator is mounted as one of the electronic components in an electronic device such as a computer, a mobile phone, or a small information device. The quartz oscillator or quartz oscillator is used as a reference signal source or a clock signal source. And, a quartz oscillator and a quartz oscillator are included in the quartz oscillator. As an example of the quartz crystal vibrating element, a tuning-fork type bent quartz crystal vibrating element (hereinafter referred to as a "vibrating element") is picked up.

  Patent Literatures 1 and 2 disclose a vibrating element in which a slit-like protrusion is provided on the crotch of two vibrating arms. The slits play a role of preventing a short circuit of the electrode film when the electrode film is formed on the vibrating arm by the lift-off method. This vibrating element is referred to as a vibrating element in Related Art 1. FIG. 8 is a plan view showing a vibrating element of Related Art 1. FIG. The following description will be made based on this drawing.

  The vibrating element 80 of this related art 1 is provided so as to protrude from the base 81, the two vibrating arms 82a and 82b extending in the same direction from the base 81, and the base 81 between the vibrating arms 82a and 82b. The projection 83 is provided with a slit 84 which is bored from the inner side to the outer edge of the projection 83 in the same direction as the extending direction 801 of the vibrating arms 82a and 82b. Grooves 85a and 85b are formed in the vibrating arms 82a and 82b, respectively. The base 81, the vibrating arms 82a and 82b, and the projection 83 constitute a quartz vibrating piece 86. The vibrating element 80 includes pad electrodes 91a and 91b, excitation electrodes 92a and 92b, frequency adjusting metal films 93a and 93b, wiring patterns 94a and 94b, and the like, in addition to the crystal vibrating piece 86.

  A slit 84 is provided on the tip end side of the protrusion 83 along the extending direction 801. The slit 84 penetrates in the thickness direction of the protrusion 83 and has a width W and a length L. When the slits 84 form the excitation electrodes 92a and 92b on the vibrating arms 82a and 82b by the lift-off method, the excitation electrodes 92a on the inner side of the vibrating arm 82a and the excitation electrodes 92b on the inner side of the vibrating arm 82b. Act to separate The "inside" referred to here refers to the two opposing sides.

  Next, in order to explain the action of the slit 84, a method of manufacturing the vibrating element 80 will be briefly described.

  First, a corrosion resistant film (not shown) is formed on the front and back of a quartz wafer (not shown) by sputtering. Subsequently, a photosensitive resist (positive type) is formed on the corrosion resistant film on the front and back of the quartz wafer, and the photosensitive resist is patterned (exposed, developed, dried) so that the corrosion resistant coating of tuning fork shape is left on both sides. Remove corrosion resistant film other than tuning fork shape by etching.

  Subsequently, a photosensitive resist (positive type) is again patterned on the corrosion resistant film on the front and back to determine the shape of the electrode. The quartz portion to be the slit 84 is directly covered with the photosensitive resist without the corrosion resistant film.

  Subsequently, the exposed quartz portion is removed by wet etching. At this time, the shape of the slit 84 and the outer shape of the quartz crystal vibrating piece 86 are simultaneously formed. That is, the base 81, the vibrating arms 82a and 82b, and the projection 83 are formed with the photosensitive resist left. The photosensitive resist covering the projection 83 is left across the slit 84, and the slit 84 is formed by under-etching from under the photosensitive resist.

  Subsequently, the corrosion resistant film exposed on the front and back surfaces of the quartz crystal vibrating piece 86 is removed by etching. This gives a quartz surface.

  Subsequently, an electrode film (not shown) is formed on the entire surface of the quartz-crystal vibrating piece 86 in a state in which the photosensitive resist is left by sputtering. At this time, an electrode film is formed only on the photosensitive resist and on the outer surface of the projection 83 by the photosensitive resist covering the front and back across the slit 84 in the projection 83, and the electrode film is formed in the slit 84. Is not formed. This is because the slit 84 is designed to have a width W and a length L so that the electrode material does not enter.

  Subsequently, the photosensitive resist formed on the front and back of the quartz crystal vibrating piece 86 and the electrode film formed thereon are peeled off. This is realized by immersing them in a solution for dissolving the photosensitive resist. At this time, since the photosensitive resist which straddles the slit 84 is also removed, the inside of the excitation electrode 92a and the vibrating arm 82b on the inner side surface of the vibrating arm 82a connected via the electrode film on the photosensitive resist is removed. The side excitation electrode 92b is in a disconnected state. This electrode formation method is a lift-off method.

  Finally, the corrosion resistant film remaining under the photosensitive resist is removed by etching.

  Since the electrodes are formed on the quartz crystal vibrating piece 86 in this manner, the excitation electrode 92a on the inner side surface of the vibrating arm 82a and the excitation electrode 92b on the inner side surface of the vibrating arm 82b are slit 84 even using the lift-off method. It can be cut off with

  To summarize the above, it is as follows. When a positive resist is used for lift-off, light is applied to the inner side surfaces of the two vibrating arms 82a and 82b to form excitation electrodes 92a and 92b, and the resist film is removed. At this time, it is desirable to leave a resist film on the crotch which is the root of the inner side surface of the two vibrating arms 82a and 82b. This is because when the electrode film is formed in the crotch, the excitation electrodes 92a and 92b on the inner side surfaces of the two vibrating arms 82a and 82b are short-circuited in the crotch. However, unlike the front and back surfaces of the quartz crystal vibrating piece 86, since the light shielding portion of the photomask does not contact the side surface of the quartz crystal vibrating piece 86, light should not be applied to the crotch comprising the side surface of the quartz crystal vibrating piece 86. difficult. In other words, the light for forming the excitation electrodes 92a and 92b also strikes the crotch. Therefore, by providing a slit 84 having a size that does not allow the electrode material to enter into the crotch part, the excitation electrode 92a, 92b is not short-circuited in the crotch part, so the slit 84 is formed by under etching. Needs special ideas.

  Further, an intermediate product of the vibrating element 81 includes, for example, a plurality of vibrating elements 81 and a frame processed by wet etching from a single crystal wafer, and becomes an object of commerce independently in this state (for example, Patent Document 3) reference).

JP, 2011-151567, A JP, 2014-023134, A JP 2014-011552 A

  However, the vibration element 80 of the related art 1 has the following problems.

  Since stress is likely to be concentrated on the slits 84 present in the base 81, the strength of the vibrating element 80 is reduced and it is likely to be broken. In addition, when the base 81 of the vibrating element 80 is suctioned by vacuum tweezers, air is leaked from the slit 84 and the suction power is reduced.

  In the related art 1, in order to cope with these problems, a part of the base 81 is protruded in the extending direction 801 to form a triangular protrusion 84, and the slit 84 is formed here. That is, it is a device to try to move the slit 84 to the outside of the base 81 as much as possible.

  However, such a device can not catch up with the progress of miniaturization of the vibrating element 80, and is already at the limit. This is because the width W and the length L of the slits 84 are required to be constant or more even if the vibrating element 80 is made smaller, so the ratio of the area occupied by the slits 84 becomes relatively large.

  Therefore, an object of the present invention is to provide a vibrating element or the like that can solve various problems caused by the slits even when the electrodes are formed by the lift-off method.

The vibration element according to the present invention is
The base,
Two vibrating arms extending from the base in the same direction,
Excitation electrodes formed on these vibrating arms;
An electrode separation surface which electrically separates the excitation electrode, which is formed of a broken surface or an etching surface of quartz formed on the base between the two vibrating arms;
Is provided.

  According to the present invention, since the slit can be made unnecessary by providing the electrode separation surface which electrically separates the excitation electrode at the base between the two vibrating arms, when forming the electrode by the lift-off method But we can solve various problems caused by slits.

FIG. 2 is a plan view showing the vibration element of Embodiment 1; It is the II-II sectional view taken on the line in FIG. It is sectional drawing which showed each manufacturing process about the II-II line cross section in FIG. 1, and the III-III line cross section, and is FIG. 3 [1], FIG. 3 [2], FIG. 3 [3], FIG. The process proceeds in the order of It is sectional drawing which showed each manufacturing process about the II-II line cross section in FIG. 1, and the III-III line cross section, and FIG. 4 [5], FIG. 4 [6], FIG. 4 [7], FIG. The process proceeds in the order of It is the top view which showed each manufacturing process about a part in FIG. 1, and a process advances in order of FIG. 5 [A], FIG. 5 [B], and FIG. 5 [C]. FIG. 7 is a plan view showing an intermediate product of embodiment 2; FIG. 7A is a plan view showing a modification of the intermediate product of Embodiment 2, and FIG. 7 [A] is a modification 1 and FIG. 7 [B] is a modification 2. It is a top view which shows the vibration element of related technology 1. FIG.

  Hereinafter, a mode for carrying out the present invention (hereinafter referred to as "embodiment") will be described with reference to the attached drawings. Note that the shapes depicted in the drawings are drawn so as to be easily understood by those skilled in the art, and thus do not necessarily match the actual dimensions and ratios.

  An embodiment of a vibration element and a method of manufacturing the same according to the present invention will be described as a first embodiment. FIG. 1 is a plan view showing the vibration element of the first embodiment. FIG. 2 is a cross-sectional view taken along line II-II in FIG. Hereinafter, it demonstrates based on these drawings.

  The vibrating element 10 according to the first embodiment includes a base 11, two vibrating arms 12a and 12b extending in the same direction from the base 11, and excitation electrodes 22a and 22b formed on the vibrating arms 12a and 12b. And an electrode separation surface 14 which is formed of a quartz cut-off surface or an etching surface formed on the base 11 between the vibrating arms 12a and 12b and which electrically separates the excitation electrodes 22a and 22b. In the first embodiment, a part of the base 11 is formed in a triangular shape so as to protrude from the space between the vibrating arms 12 a and 12 b to form the protrusion 13, and the electrode separation surface 14 is formed at the tip of the protrusion 13. There is.

  Grooves 15a and 15b are formed in the vibrating arms 12a and 12b, respectively. The base 11 (including the protrusion 13; the same applies hereinafter) and the vibrating arms 12 a and 12 b constitute a quartz-crystal vibrating piece 16. The vibrating element 10 includes pad electrodes 21a and 21b, frequency adjusting metal films 23a and 23b, wiring patterns 24a and 24b, and the like, in addition to the crystal vibrating piece 16 and the excitation electrodes 22a and 22b.

  The excitation electrodes 22a and 22b have different polarities. The electrode separation surface 14 electrically separates the excitation electrode 22a formed on one of the two opposing surfaces of the two vibrating arms 12a and 12b from the excitation electrode 22b formed on the other. The pad electrode 21a is electrically connected to the excitation electrode 22a, and the pad electrode 21b is electrically connected to the excitation electrode 22b.

  Next, the configuration of the vibration element 10 will be described in more detail.

  The base 11 is a flat plate substantially rectangular in plan view. The quartz crystal vibrating piece 16 has a tuning fork shape in which the base portion 11 and the vibrating arms 12a and 12b are integrated, and is manufactured by a film forming technique, a photolithography technique, and a chemical etching technique.

  The vibrating arms 12 a and 12 b both extend in the extending direction 101. Grooves 15a and 15b may be provided in the longitudinal direction of the vibrating arms 12a and 12b, respectively. The grooves 15a and 15b are, for example, two each on the front and back of the vibrating arm 12a and two each on the front and back of the vibrating arm 12b, from the boundary with the base 11 to the tip of the vibrating arms 12a and 12b. The vibrating arms 12a and 12b are provided in parallel with the length direction of the vibrating arms 12a and 12b with a predetermined length. Although the grooves 15a and 15b are provided two each on the front and back of the vibrating arm 12a and two each on the front and back of the vibrating arm 12b in the first embodiment, the number of the grooves is not limited. For example, one may be provided on each of the front and back surfaces of the vibrating arm 12a and one on each of the front and back surfaces of the vibrating arm 12b, or only one of the front and back may be provided.

  Excitation electrodes 22a are provided on both sides of the vibrating arm portion 12a so that flat surfaces facing each other across the quartz crystal have the same polarity, and excitation is performed between the two groove portions 15a inside the groove portions 15a on the front and back surfaces. An electrode 22b is provided. Similarly, in the vibrating arm portion 12b, the excitation electrodes 22b are provided on both side surfaces so that flat surfaces facing each other across the quartz crystal have the same polarity, and the inside and the two groove portions 15b of the groove portions 15b An excitation electrode 22a is provided between the two. Therefore, in the vibrating arm 12a, the excitation electrode 22a provided on both sides and the excitation electrode 22b provided in the groove 15a have different poles, and in the vibrating arm 12b, the excitation electrode 22b provided on both sides And the excitation electrode 22a provided in the groove 15b have different polarities.

  The base 11 is provided with pad electrodes 21a and 21b, and wiring patterns 24a and 24b for electrically connecting the pad electrodes 21a and 21b and the excitation electrodes 22a and 22b. The pad electrode 21a, the excitation electrode 22a, the frequency adjustment metal film 23a, and the wiring pattern 24a are electrically connected to each other. The pad electrode 21b, the excitation electrode 22b, the frequency adjustment metal film 23b, and the wiring pattern 24b are also electrically connected to one another.

  The pad electrodes 21a and 21b, the excitation electrodes 22a and 22b, the frequency adjusting metal films 23a and 23b, and the wiring patterns 24a and 24b are formed of the same metal film by a lift-off method, and for example, a Pd or Au layer is formed on the Ti layer. It has a laminated structure provided.

  The electrode separation surface 14 is a quartz crystal surface exposed from the front surface to the rear surface in the thickness direction of the protrusion 13, and specifically, it is formed of a quartz cut surface or an etching surface. When the excitation electrodes 22a and 22b are formed on the vibrating arms 12a and 12b by the lift-off method, the electrode separation surface 14 is formed on the inner surfaces of the exciting electrodes 22a of the vibrating arm 12a and the inner surfaces of the vibrating arms 12b. It plays the role of separating the excitation electrode 22b. In addition, the surface in which processing, such as grinding | polishing, was given to the surface to cut off is included in a "folding surface" here.

  Next, the operation of the vibration element 10 will be described. When vibrating the tuning fork type vibrating element 10, an alternating voltage is applied to the pad electrodes 21a and 21b. When an electric state after application is instantaneously captured, the excitation electrode 22b provided in the groove 15a on the front and back of the vibrating arm 12a becomes a positive potential, and the excitation electrode 22a provided on both sides of the vibrating arm 12a is The potential is negative and an electric field is generated from positive to negative. At this time, the excitation electrode 22a provided in the groove 15b on the front and back of the vibrating arm 12b has a negative potential, and the excitation electrode 22b provided on both sides of the vibrating arm 12b has a positive potential, and is generated in the vibrating arm 12a. The polarity is opposite to the polarity, and an electric field is generated from positive to negative. By the electric field generated by this alternating voltage, a stretching phenomenon occurs in the vibrating arms 12a and 12b, and a flexural vibration mode of a predetermined resonance frequency is obtained.

  Next, a method of manufacturing the vibration element 10 will be described. 3 and 4 are cross-sectional views showing each manufacturing process for the II-II line cross section and III-III line cross section in FIG. 1, and FIG. 5 is a plan view showing each manufacturing process for a part in FIG. It is. Hereinafter, description will be made based on FIGS. 1 to 5.

  The left half of each of FIGS. 3 and 4 shows the vibrating arm 12a side of the II-II line cross section in FIG. 1, and the right half of each shows the III-III line cross section in FIG. FIG. 5 shows the projection 13 and the extension 17 in FIG. The manufacturing method of Embodiment 1 includes the following first to eighth steps.

  In the first step shown in FIG. 3 [1], the corrosion resistant film 32 is formed on the quartz substrate 31 and patterned. For example, a corrosion resistant film 32 such as Cr or Cr + Au is formed on the front and back of the quartz substrate 31 by sputtering. Then, a photosensitive resist (positive type) is formed on the corrosion resistant film 32, and the photosensitive resist is patterned (exposed, developed, dried) so that the corrosion resistant corrosion resistant film 32 remains on the front and back of the quartz substrate 31; The corrosion resistant film 32 having a shape other than the tuning fork is removed by etching, and the remaining photosensitive resist is removed.

  In the second step shown in FIG. 3 [2], a resist pattern 33 is formed on the corrosion resistant film 32. For example, in order to determine the shape of the electrode on the corrosion resistant film 32 on the front and back of the quartz substrate 31, a photosensitive resist (positive type) is patterned.

  In the third step shown in FIG. 3 [3] and FIG. 5 [A], the quartz crystal vibrating reed 16 and the extension 17 are removed by removing the exposed portion of the quartz substrate 31 not covered with the corrosion resistant film 32 by wet etching. Form. The extension 17 is extended from the base 11 (protrusion 13) between the two vibrating arms 12a and 12b to between the two vibrating arms 12a and 12b, as shown by imaginary lines in FIG. It is That is, in the third step, with the resist pattern 33 remaining, the base 11, the vibrating arms 12a and 12b, and the extension 17 are formed. The etching solution for quartz crystal used here is a solution containing hydrofluoric acid as a main component.

  When the grooves 15a and 15b are provided in the vibrating arms 12a and 12b, the grooves 15a and 15b may be formed simultaneously with the shape of the quartz crystal vibrating piece 16 in the third step. However, when the grooves 15a and 15b are provided on the front and back surfaces of the vibrating arms 12a and 12b, it is preferable to form an etching suppression pattern in the grooves 15a and 15b in order to avoid penetration of the grooves 15a and 15b.

  In the fourth step shown in FIG. 3 [4], the corrosion resistant film 32 not covered with the resist pattern 33 is removed. That is, the corrosion resistant film 32 exposed on the front and back surfaces of the quartz crystal vibrating piece 16 is removed by etching to obtain a quartz surface.

  In the fifth step shown in FIG. 4 [5], the electrode film 34 is formed on the exposed portion of the quartz-crystal vibrating piece 16 not covered with the resist pattern 33 and on the resist pattern 33. For example, the electrode film 34 is formed on the entire surface of the quartz-crystal vibrating piece 16 by sputtering. Note that instead of sputtering, a film formation method such as evaporation may be used.

  In the sixth step shown in FIGS. 4 [6] and 5 [B], the electrode film 34 formed on the resist pattern 33 is removed together with the resist pattern 33. That is, the resist pattern 33 formed on the front and back of the quartz crystal vibrating piece 16 and the electrode film 34 formed thereon are peeled off. This can be easily removed by immersing them in a solution (for example, acetone) for dissolving the photosensitive resist. However, the corrosion resistant film 32 under the resist pattern 33 remains. The electrode film forming method in the sixth step is called a lift-off method.

  In the seventh step shown in FIG. 4 [7], the corrosion resistant film 32 exposed by the removal of the resist pattern 33 is removed. That is, the corrosion resistant film 32 remaining to the end is removed by etching.

  In the eighth step shown in FIG. 4 [8] and FIG. 5 [C], the electrode separation surface 14 is formed by breaking the extension portion 17 from the quartz crystal vibrating piece 16. The electrode separation surface 14 includes excitation electrodes 22a and 22b opposed inside the vibrating arms 12a and 12b, that is, the excitation electrode 22a on the inner side of the vibrating arm 12a and the excitation electrode 22b on the inner side of the vibrating arm 12b. Electrically separate. In the third step, a cut may be made in the boundary between the extension 17 and the projection 13 so as to be a desired electrode separation surface 14 so as to be easily broken.

  In the eighth step, the electrode separation surface 14 is formed by removing the extension 17 from the quartz crystal vibrating piece 16 by etching instead of breaking the extension 17 from the quartz crystal vibrating piece 16. Good. For example, the resist film covers all except the extension 17, and the extension 17 not covered with the resist film is removed by wet etching of quartz. At this time, it is sufficient to expose at least a portion to be the electrode separation surface 14 instead of exposing the entire extension portion 17 (without covering with the resist film).

  The vibrating element 10 is connected to the frame 18 via the connecting portion 19. The vibrating element 10 is broken off from the connecting portion 19, whereby the pad electrodes 21a and 21b are electrically separated. Also, the vibrating element 10 is separated from the frame 18 at the connection portion 19 and mounted in a package.

  Next, the operation and effects of the vibration element 10 of the first embodiment will be described. According to the vibration element 10, since the base 11 between the two vibrating arms 12a and 12b is provided with the electrode separation surface 14 for electrically separating the excitation electrodes 22a and 22b, the slit can be made unnecessary. Even when the electrode is formed by the lift-off method, various problems caused by the slit can be solved. For example, since there is no slit in the base 11, damage to the vibration element 10 due to stress concentration on the slit can be prevented. In addition, when the base 81 is suctioned by vacuum tweezers, it is possible to prevent a decrease in suction force due to air leaking from the slit.

  Next, an embodiment of an intermediate product of a vibrating element according to the present invention will be described as a second embodiment. FIG. 6 is a plan view showing an intermediate product of the second embodiment. Hereinafter, description will be made based on FIG.

  The intermediate product 40 of the second embodiment includes a plurality of vibration elements 10, a frame 41, and a plurality of connection portions 42 that connect the plurality of vibration elements 10 to the frame 41. The connecting portion 42 is extended from the base 11 between the two vibrating arms 12 a and 12 b to the frame 41 between the two vibrating arms 12 a and 12 b. The electrode separation surface 14 is formed by breaking the vibrating element 10 from the connection portion 42.

  In the second embodiment, the extension in the first embodiment extends to the frame 41 and is integrated with the frame 41 to form a connecting portion 42. The intermediate product 40 further includes a frame protrusion 43 and a slit 44. The frame protrusion 43 is provided so as to protrude from the frame 41 so as to face the side of the base 11 where the vibrating arms 12 a and 12 b do not exist. And by the base 11 and the flame | frame protrusion part 43 opposing, the slit 44 is formed among them. Similar to the slits in Related Art 1, the slits 44 serve to electrically separate the electrodes. However, since the slit 44 does not finally remain in the base 11, the above-mentioned problems caused by the slit 44 do not occur. Note that a cut may be made in the boundary between the connection portion 42 and the base 11 so as to be a desired electrode separation surface 14 so as to be easily broken.

  The intermediate products 40 are independently subject to commerce in this state. Each vibration element 10 is separated from the frame 41 one by one at the connection portion 42 and mounted in a package.

  According to the intermediate product 40 of the second embodiment, the step of forming the electrode separation surface 14 by breaking the vibrating element 10 from the connecting portion 42 corresponds to the step of breaking the vibrating element from the connecting portion in related art 1 Do. Therefore, the number of steps of the second embodiment is the same as the number of steps of the related art 1. Therefore, according to the second embodiment, the above-mentioned problems caused by the slits can be solved without increasing the number of steps. Other configurations, operations, and effects of the second embodiment are the same as those of the first and second embodiments.

  Next, a first modification of the second embodiment will be described. FIG. 7A is a plan view showing Modification Example 1 of the intermediate product of Embodiment 2. FIG. Hereinafter, it demonstrates based on FIG. 7 [A].

  In the intermediate product 50 of the first modification, the frame protrusion and the slit in the second embodiment are replaced with another connection portion 51. The connection portion 51 functions to electrically separate the electrodes on the side of the base 11 where the vibrating arms 12 a and 12 b are not provided.

  According to the intermediate product 50 of the first modification, the step of breaking the vibrating element 10 from the connection portion 51 and the step of forming the electrode separation surface 14 by breaking the vibrating element 10 from the connection portion 42 are related art 1 Corresponds to a process of breaking the vibration element from the connection portion in the above. Therefore, the number of processes of the second modification is the same as the number of processes of the related art 1. Therefore, according to the first modification, as in the second embodiment, the above-mentioned problems caused by the slits can be solved without increasing the number of steps. Other configurations, operations, and effects of the first modification are the same as those of the first and second embodiments.

  Next, a second modification of the second embodiment will be described. FIG. 7B is a plan view showing Modification Example 2 of the intermediate product of Embodiment 2. Hereinafter, it demonstrates based on FIG. 7 [B].

  The intermediate product 60 of the second modification includes a plurality of vibration elements 10 ′, a frame 41, and a plurality of connection portions 51 that connect the plurality of vibration elements 10 ′ to the frame 41. The intermediate product 60 is formed between the base portion 11 and the frame extension portion 61 extending from the frame 41 between the two vibrating arms 12 a and 12 b and facing the base portion 11. The slit 62 is further provided. The electrode separation surface 14 is formed of an etching surface on the base 11 side of the slit 62.

  In the vibrating element 10 ′, the protrusion in the vibrating element of the first embodiment is replaced with the slit 62. However, since the slit 62 does not finally remain in the base 11, the above-mentioned problems caused by the slit 62 do not occur.

  According to the intermediate product 60 of the second modification, the slits 62 are simultaneously formed in the etching process of the quartz crystal forming the quartz vibrating reed. Therefore, the number of processes of the second modification is the same as the number of processes of the related art 1. Therefore, according to the second modification, as in the second embodiment, the above-described problems caused by the slits can be solved without increasing the number of steps. Other configurations, operations, and effects of the second modification are the same as those of the first and second embodiments and the first modification.

  As mentioned above, although this invention was demonstrated with reference to said each embodiment, this invention is not limited to said each embodiment. Various changes that can be understood by those skilled in the art can be made to the configuration and details of the present invention. Further, the present invention also includes a combination of some or all of the configurations of the above-described embodiments, as appropriate.

First Embodiment
DESCRIPTION OF REFERENCE NUMERALS 10 vibration element 101 extending direction 11 base 12a, 12b vibrating arm 13 protrusion 14 electrode separation surface 15a, 15b groove 16 crystal vibrating piece 17 extension 18 frame 19 connection portion 21a, 21b pad electrode 22a, 22b excitation electrode 22c metal Film 23a, 23b Frequency adjustment metal film 24a, 24b Wiring pattern 31 Crystal substrate 32 Corrosion resistant film 33 Resist pattern 34 Electrode film <Embodiment 2>
40 Intermediate Product 41 Frame 42 Connection 43 Frame Projection 44 Slit <Modification 1>
50 Intermediate Product 51 Connection Part <Modified Example 2>
10 'Vibration element 60 Intermediate product 61 Frame extension part 62 Slit <Related technology 1>
DESCRIPTION OF SYMBOLS 80 Vibratory element 801 Extension direction 81 Base 82a, 82b Vibrating arm 83 Protrusion 84 Slit 85a, 85b Groove 86 Crystal vibrating piece 91a, 91b Pad electrode 92a, 92b Excitation electrode 93a, 93b Metal film for frequency adjustment 94a, 94b Wiring Pattern L Slit Length W Slit Width

Claims (2)

A base, two vibrating arms extending from the base in the same direction, and a plurality of quartz vibrating elements having excitation electrodes formed on the vibrating arms;
A frame that connects the plurality of quartz crystal vibrating elements via a connecting portion;
And a frame protrusion which protrudes from the frame and is opposed to the side of the base without the vibrating arm via a slit.
The connecting portion is provided between the two vibrating arms from the frame to the base,
The slit penetrates entirely in the thickness direction of the frame protrusion, and is designed to have a dimension such that the electrode material does not enter when forming the electrode film.
A method of manufacturing an intermediate product of a quartz crystal element, comprising:
A first step of forming a resist film on a quartz substrate and patterning the film;
Forming a resist pattern on the corrosion resistant film;
By removing the exposed portion of the quartz substrate which is not covered with the corrosion resistant film by wet etching, a quartz-crystal vibrating piece consisting of the base and the vibrating arm, the frame, the connecting portion, the frame protrusion and the slit The third step of forming
A fourth step of removing the corrosion resistant film not covered with the resist pattern;
A fifth step of forming the electrode film on the resist on the exposed portions of the quartz crystal resonator element is not covered by the pattern and the resist pattern,
A sixth step of removing the electrode film formed on the resist pattern together with the resist pattern;
A seventh step of removing the corrosion resistant film exposed by removing the resist pattern ;
A method of manufacturing an intermediate product of a quartz crystal vibrating element , comprising: A base, two vibrating arms extending from the base in the same direction, and a plurality of quartz vibrating elements having excitation electrodes formed on the vibrating arms;
A frame that connects the plurality of quartz crystal vibrating elements via a connecting portion;
A frame extension extending from the frame between the two vibrating arms and facing the base via the slit;
The connection portion is provided from the frame to the side of the base on which the vibrating arm portion is absent,
The slit penetrates entirely in the thickness direction of the frame extension, and is designed to have a dimension such that the electrode material does not enter when forming the electrode film.
A method of manufacturing an intermediate product of a quartz crystal element, comprising:
A first step of forming a resist film on a quartz substrate and patterning the film;
Forming a resist pattern on the corrosion resistant film;
By removing the exposed portion of the quartz substrate which is not covered with the corrosion resistant film by wet etching, a quartz crystal vibrating piece consisting of the base and the vibrating arm, the frame, the connecting portion, the frame extension and the slit The third step of forming
A fourth step of removing the corrosion resistant film not covered with the resist pattern;
A fifth step of forming the electrode film on the resist on the exposed portions of the quartz crystal resonator element is not covered by the pattern and the resist pattern,
A sixth step of removing the electrode film formed on the resist pattern together with the resist pattern;
A seventh step of removing the corrosion resistant film exposed by removing the resist pattern ;
A method of manufacturing an intermediate product of a quartz crystal vibrating element , comprising:

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