JP6515618B2 - Imprint mold and imprint method using the same - Google Patents

Description

  The present invention relates to an imprint method, in particular, an imprint mold capable of forming a pattern with high accuracy by a nanoimprint method, and an imprint method using such an imprint mold.

  In recent years, a pattern forming technology using an imprint method has attracted attention as a fine pattern forming technology to replace the photolithography technology. The imprinting method is a pattern forming technology in which a fine structure is transferred at the same magnification by transferring the uneven structure to a resin material to be molded using a mold member (mold) having a fine uneven structure. For example, in the imprint method using a photocurable resist as a resin material to be molded, droplets of the photocurable resist are supplied to the surface of the transferred body, and a mold having a desired uneven structure and the transferred body are specified. The photocurable resist is filled in the concavo-convex structure by bringing the photocurable resist into proximity, and in this state, light is irradiated from the mold side to cure the photocurable resist to form a resist layer, and then the mold is removed from the resist layer By pulling away from each other, a resist pattern (concave-convex pattern) having a concavo-convex structure in which the concavities and convexities included in the mold are reversed is formed on the transfer-receiving material. And a pattern structure body can be formed in a transferred body by etching a transferred body using this resist pattern as an etching mask. Such an imprint method is used, for example, for forming a periodic line / space pattern such as a memory cell in the formation of an integrated circuit (Patent Document 1).

  Further, with the miniaturization of patterns of semiconductor devices and the like in recent years, the miniaturization of contact holes and the densification of arrangement progress, and there is a problem that it is difficult to form the contact holes by photolithography. Further, even in the case of photolithography using extreme ultraviolet (EUV) light, the time required for exposure is long, and there is a problem that the throughput is lowered. For this reason, formation of the contact hole by the imprint method is considered. For example, a resist layer is formed in advance on the surface of a transfer target, and a portion of the convex portion of the concavo-convex structure provided in the mold is inserted into the resist layer, the resist layer is cured in this state, and then the mold is separated. Thus, a resist pattern having concave portions corresponding to the convex portions provided in the mold is formed on the transferred object. And the method of forming a contact hole is examined by etching a to-be-transferred body by using this resist pattern as an etching mask (patent document 2).

JP 2012-68450 A JP, 2013-69921, A

However, in the imprint method, the resist pattern formed on the transfer target using the mold is shrunk due to the curing step at the time of formation, and the shape of the concave portion corresponding to the convex portion provided in the mold can not be maintained with high accuracy There was a problem that.
In addition, a residual film is present at the bottom of the concave portion of the resist pattern formed using the mold, and the pattern shape of the concave portion is changed before and after etching for removing the residual film. In some cases, the formation of a resist pattern having an accurate uneven structure in which the In the imprint method in which the resist layer is pierced up to the middle of the convex portion of the concavo-convex structure provided in the mold, the residual film becomes thick, so the problem caused by the residual film as described above becomes more remarkable.

Such shrinkage of the resist pattern and change in pattern shape due to etching for removing the remaining film are problematic when applying the imprint method to, for example, contact hole formation of a semiconductor device, electrode pattern formation, fine wiring formation, etc. Become. That is, when etching the transfer target using the resist pattern as an etching mask, the distance between the contact holes, the distance control between the electrode patterns, or the control of the distance between the contact holes due to thinning or distortion of the resist existing between adjacent recesses in the resist pattern. It becomes difficult to perform fine wiring formation with high accuracy. In particular, the narrowing of the resist present between the adjacent recesses is remarkable in the central portion of the resist, and therefore, when the resist present between the recesses disappears in the central portion during the etching, the desired pattern of There is a problem that electrical independence is lost and a short circuit occurs.
The present invention has been made in view of the above situation, and provides an imprint mold for forming a pattern of a desired shape with high accuracy, and an imprint method using such an imprint mold. The purpose is to

In order to achieve such an object, the imprint mold of the present invention has at least a substrate, and a plurality of projections located in a concavo-convex structure region set in one plane of the substrate, When an opposing distance between a side wall surface of one convex portion and a side wall surface of the other convex portion opposed to the side wall surface, which is an adjacent convex portion, is a distance in a plane parallel to the plane, In the opposing region where the side wall surfaces of the convex portions in the positional relationship are formed so as to face each other, the opposing distance has a minimum. And the convex part at least one of the convex parts in the positional relationship has a recess in the central part of the opposing area, and the positional relation The sizes of the opposing side wall surfaces of the convex portions at the Both were configured such that there are the concave portion on the side wall surface of the small the projecting portion of the side wall surface.
As another aspect of the present invention, the depth and / or the width of the recess is also present in the side wall surface of the convex portion having a large side wall surface and the recess is present in the side wall surface of the convex portion having a small side wall surface. And it was set as the structure which the depth and / or width of the said recessed part which exists in the side wall surface of the said convex part with a large side wall surface differ.
The imprint mold according to the present invention has at least a substrate and a plurality of projections located in a concavo-convex structure region set in one plane of the substrate, and is an adjacent projection, which is one of the projections. When the opposing distance from the side wall surface of the projecting portion to the side wall surface of the other projecting portion opposing the side wall surface is a distance in a plane parallel to the plane, the minimum value of the opposing distance is 50 nm or less In an opposing area in which the side walls of the convex sections having the positional relation are formed so as to face each other, the central area of the opposing area is a portion where the opposing distance is minimum. In the convex part which exists in the part except for, and in the convex part which has the above-mentioned positional relationship, the part where the above-mentioned opposing distance becomes the minimum is a field except the range to 10 nm from the both ends of the width direction of the above-mentioned opposing area It was configured as it exists.
The imprint mold according to the present invention has at least a substrate and a plurality of projections located in a concavo-convex structure region set in one plane of the substrate, and is an adjacent projection, which is one of the projections. When the opposing distance from the side wall surface of the projecting portion to the side wall surface of the other projecting portion opposing the side wall surface is a distance in a plane parallel to the plane, the minimum value of the opposing distance is 50 nm or less In an opposing area in which the side walls of the convex sections having the positional relation are formed so as to face each other, the central area of the opposing area is a portion where the opposing distance is minimum. When the cross-sectional shape of the convex portion is rectangular in the convex portion which is present in the portion except for the above, the cross-sectional shape has a roundness such that each side protrudes outward, or The configuration is such that the roundness of the corners is large
As another aspect of the present invention, the corner rounding is configured such that the range in which the rounding exists exceeds 10 nm from the intersection point of the extrapolation lines of two sides forming the corner in the cross-sectional shape .
The imprint mold according to the present invention has at least a substrate and a plurality of projections located in a concavo-convex structure region set in one plane of the substrate, and is an adjacent projection, which is one of the projections. When the opposing distance from the side wall surface of the projecting portion to the side wall surface of the other projecting portion opposing the side wall surface is a distance in a plane parallel to the plane, the minimum value of the opposing distance is 50 nm or less In an opposing area in which the side walls of the convex sections having the positional relation are formed so as to face each other, the central area of the opposing area is a portion where the opposing distance is minimum. And at least one of the convex portions of the convex portion in the positional relationship has a convex portion having a width smaller than the width of the convex portion on the side wall surface not facing the other convex portion. It was configured to be continuous.

As another aspect of the present invention, the facing distance is configured to be maximum at a central portion of the facing region.
As another aspect of the present invention, in the convex portion in the positional relationship, the length in the width direction of the opposing region is in a range of 1 to 10 times the minimum value.
As another aspect of the present invention, at least one convex portion of the convex portions in the positional relationship is configured to have a recessed portion in a central portion of the facing area, and the convex portions in the positional relationship The recess has a different size, and the recess is present at least on the side wall of the protrusion having a small side wall, and the recess is also formed on the side wall of the protrusion having a large side wall. And the depth and / or width of the recess present in the side wall surface of the protrusion having a small side wall surface, and the depth and the width of the recess present in the side wall surface of the protrusion having the large side wall surface And / or configured to have different widths.

  In the imprint method of the present invention, the step of forming a resin material layer to be molded on a desired surface of a transfer target, and the middle of the convex portion of any of the above imprint molds is applied to the resin material layer to be molded. The step of pressing and curing the to-be-molded resin material layer in the relevant state to form a resin layer, and separating the resin layer and the imprint mold, the resin layer having a concave portion corresponding to the convex portion included in the mold And a step of positioning on a transfer receiving body.

Further, in the imprint method of the present invention, the step of forming a resin material layer to be molded on a desired surface of a material to be transferred, and the resin material to be molded to the middle of the convex portion of any of the above imprint molds. A desired region of the to-be-molded resin material layer is pressed into the layer, and the step of forming the resin layer by semi-curing the to-be-molded resin material layer in the relevant state, and separating the resin layer and the imprint mold. Then, the resin layer is cured to position the resin layer having the concave portion corresponding to the convex portion provided on the mold on the transfer target body.
Further, the imprint method of the present invention comprises at least a base material and a plurality of convex parts located in a concavo-convex structure region set in one plane of the base material, and is an adjacent convex part, When the opposing distance from the side wall surface of one protrusion to the side wall surface of the other protrusion opposite to the side wall surface is a distance in a plane parallel to the plane, the minimum value of the opposing distance is 50 nm or less In the opposing area where the side wall surfaces of the convex sections in the positional relationship face each other and the convex sections are in the positional relationship of What is claimed is: 1. An imprint method using an imprint mold present in a portion excluding a central portion, comprising the steps of: forming a to-be-molded resin material layer on a desired surface of an object to be transferred; Push the resin resin material layer up to the middle The step of semi-curing the resin material layer to be molded in the state to form a resin layer, and the step of separating the resin layer and the imprint mold are repeated on a desired region of the resin material layer to be molded, Thereafter, the resin layer is cured, and the resin layer having a concave portion corresponding to the convex portion included in the mold is positioned on the transfer target body.

The imprint mold of the present invention is capable of pattern formation in which the distance between adjacent recess patterns is controlled with high accuracy.
The imprint method of the present invention can form a pattern with good dimensional accuracy.

FIG. 1 is a side view for explaining an embodiment of the imprint mold of the present invention. FIG. 2 is a side view showing an example of adjacent convex portions in the imprint mold of the present invention. FIG. 3 is a plan view showing an example of adjacent convex portions in the imprint mold of the present invention. FIG. 4 is a perspective view showing an example of adjacent convex portions in the imprint mold of the present invention. FIG. 5 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. FIG. 6 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. FIG. 7 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. FIG. 8 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. FIG. 9 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. FIG. 10 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. FIG. 11 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. FIG. 12 is a process diagram for describing an embodiment of the imprint method of the present invention. FIG. 13 is a perspective view showing a recess formed by the imprint method. FIG. 14 is a view for explaining the measurement position of the width of the partition portion existing between the concave portions formed in the base material in the embodiment.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
The drawings are schematic or conceptual, and the dimensions of the respective members, the ratio of the sizes among the members, and the like are not necessarily the same as the actual ones, and are the same members or the like. Even in some cases, the dimensions and ratios may differ depending on the drawings.

[Imprint mold]
FIG. 1 is a side view for explaining an embodiment of the imprint mold of the present invention. In FIG. 1, the imprint mold 11 of the present invention has a base material 12 of a so-called mesa structure provided with a convex structure 14 on the surface 13 a of a support 13, and the flat surface 14 a of the convex structure 14 is uneven. The structure area A is set, and the plurality of convex portions 21 are located in the uneven structure area A. The ratio of the sizes of the base 12 and the projections 21 in FIG. 1, the number of the projections 21, the position, and the like are for convenience. Further, the convex structure portion 14 may have a convex structure in which the peripheral edge of the surface 14 a is two or more steps with respect to the region outside the convex structure portion 14. Furthermore, the base 12 may have other shapes such as a flat plate shape instead of the mesa structure.
The base 12 of the imprint mold 11 may be made of, for example, quartz glass, silica glass, calcium fluoride, magnesium fluoride, glass such as acrylic glass, sapphire, or gallium nitride if light transmission is required. Furthermore, resins such as polycarbonate, polystyrene, acryl, polypropylene and the like, or arbitrary laminates of these can be used. In addition, when light permeability is not required for the substrate 12, in addition to the above-mentioned materials, for example, metals such as silicon, nickel, titanium, aluminum and the like, alloys thereof, oxides, nitrides thereof or Any laminate material can be used.

The thickness of the substrate 12 can be set in consideration of the protruding height of the convex structure portion 14, the strength of the substrate 12, the handling aptitude, etc. For example, the thickness can be appropriately set in the range of about 300 μm to 10 mm. .
Such an imprint mold 11 has an opposing distance from the side wall surface of one convex portion 21 to the side wall surface of the other convex portion 21 opposite to the side wall surface. When the distance in the plane parallel to the plane 14a is set, the convex portion 21 having the positional relationship in which the minimum value of the facing distance is 50 nm or less is provided. If the minimum value of the facing distance is 50 nm or less, it becomes difficult to form a highly accurate pattern by photolithography. In addition, even in the case where a resist pattern having concave portions adjacent to each other is transferred and formed using imprinting using a conventional imprint mold provided with adjacent convex portions having an opposing distance of 50 nm or less, the resist pattern is interposed. During etching, adjacent patterns are connected to each other, and dimensional control between patterns becomes difficult. For this reason, the imprint mold of the present invention, which has a convex portion in a positional relationship in which the minimum value of the facing distance is 50 nm or less, and exhibits the effects described later, is extremely useful. On the other hand, the lower limit of the minimum value of the facing distance is not particularly limited. For example, when the imprint mold 11 is used to form a contact hole, adjacent patterns are separated when the minimum value of the facing distance is less than 8 nm. Even if transfer formation can be performed, there is a concern that electrical shorting may occur due to the effect of the tunnel effect, and in such a case, the lower limit of the minimum value of the facing distance can be 8 nm.

2 is a side view showing an example of the convex portion 21 in a positional relationship in which the minimum value of the facing distance is 50 nm or less, FIG. 3 is a plan view, and FIG. 4 is a perspective view. In FIG. 2 to FIG. 4, one convex portion of the pair of opposing convex portions 21 is shown as 21A, and the other convex portion is shown as 21B. In FIGS. 2 to 4, a pair of adjacent convex portions 21A and 21B is a square having the same size in cross section in a plane parallel to the plane 14a on which the convex portions 21 are disposed. The side wall surface 22a of the convex portion 21A and the side wall surface 22b of the convex portion 21B face each other. The opposing distance L from the side wall surface 22a of the convex portion 21A to the side wall surface 22b of the convex portion 21B is, as shown in FIG. 2, an arbitrary surface P (shown by a two-dot chain line) parallel to the plane 14a. When set, it is the distance from side wall surface 22a to side wall surface 22b in the direction in which side wall surface 22a and side wall surface 22b face each other in this plane P (the direction indicated by arrow a in FIGS. 2 and 3). .
An opposing region 27 is formed between the opposing side wall surface 22a and the opposing side wall surface 22b in the pair of the convex portion 21A and the convex portion 21B which are adjacent and opposed to each other. The length M of the width direction (the direction indicated by the arrow b in FIG. 3) of the facing region 27 is the same as the dimension of the facing convex portion 21A and the convex portion 21B in the arrow b direction in the illustrated example. In FIG. 3, the opposing area 27 is shown with halftone dots.

Further, the side wall surface 22a of the convex portion 21A and the side wall surface 22b of the convex portion 21B are respectively located at the central portion of the facing region 27 and along the direction from the top portion to the bottom portion (plane 14a side) of the convex portions 21A and 21B. The recess 24a and the recess 24b are located.
The facing distance L described above has a maximum value Lmax at a portion where the recess 24 a and the recess 24 b located at the center of the facing region 27 face each other. Further, the facing area L has a minimum value Lmin near the side end of the facing area 27. Thus, in the imprint mold of the present invention, a portion where the opposing distance L between the side wall surface 22a and the side wall surface 22b is the minimum value Lmin may be present at a position excluding the central portion of the opposing region 27.
When the length M in the width direction (direction indicated by the arrow b) of the facing region 27 is in the range of 1 to 10 times the minimum value Lmin of the facing distance L, the recess portion 24a and the recess portion 24b are With this formation, etching in the opposite region can be performed more stably.
The height (vertical distance from the flat surface 14a of the convex structure 14 to the top) of such a convex portion 21 can be set in the range of about 20 to 200 nm, preferably 50 to 150 nm.

  Here, using the imprint mold of the present invention provided with convex portions adjacent via minute opposing regions, a resist pattern formed by imprinting is formed with concave portions corresponding to the convex portions to partition the concave portions. Thus, the width of the existing resist becomes large at the central portion. In the example shown in FIG. 3, the end of the opposing region 27 coincides with the corner of the convex portion 21A and the convex portion 21B, and becomes the corner of the concave portion of the resist pattern transferred and formed using the imprint mold 11. In general, in etching through a resist pattern, the corners are less likely to be etched than in the central portion, so that there is a difference in etching rate between the corner and the central portion. Therefore, the resist existing between the recesses of the resist pattern has a faster progress of thinning due to etching at the central portion than at the end (the corner of the recess of the resist pattern), and thus, when a conventional imprint mold is used The central portion of the resist existing so as to partition the concave portions disappears during the etching to connect adjacent concave patterns, or the central portion of the resist becomes thinner, making it difficult to control the dimension between the patterns. However, in the present invention, as shown in FIG. 3, since the recess 24 a and the recess 24 b exist in the facing area 27 where patterns of minute areas face each other, the resist corresponding to the facing area 27 The width in the central portion is larger than the corner) of the concave portion of the pattern. For this reason, in the resist existing to divide the concave portions of the resist pattern, even if there is a difference in the progress of thinning of the resist due to the difference in the etching rate, the central portion of the resist is suppressed from being thinner than the end portion. The width of the resist can be made more uniform, which makes it possible to etch the dimension between the patterns more uniformly.

  The depth of the recess 24a located on the side wall surface 22a of the protrusion 21A and the depth of the recess 24b located on the side wall surface 22b of the protrusion 21B (the direction in which the side wall 22a and the side wall 22b oppose each other) , The width (the width of the recessed portion in the direction of the arrow b which is the width direction of the facing region 27), and the position can be set as appropriate. For example, the depth of the recesses 24a and 24b is determined by the difference in etching rate between the edge (the corner of the recess of the resist pattern) and the center of the resist formed to correspond to the opposing region 27 by imprinting. It can be set according to the difference in the progress of thinning, and can be appropriately set in the range of 0.05 times to 0.2 times the minimum value Lmin of the facing distance L. In addition, the width of the recessed portions 24a and 24b is the thinning of the resist due to the difference in etching rate between the end (the corner of the recess of the resist pattern) and the center of the resist formed to correspond to the facing region 27 by imprinting. Setting in the range of 0.3 times to 0.7 times the length M of the facing area 27 in the width direction (direction indicated by the arrow b) of the facing area 27. be able to. Furthermore, the width and position of the recessed portions 24a and 24b are such that the portions where the facing distance L is the minimum value Lmin exist in the region excluding the range from the both ends in the width direction of the facing region 27 to 10 nm near the central portion May be set. By appropriately setting the portion where the facing distance L is the minimum value Lmin in this manner, the dimension between the patterns can be controlled more uniformly in the etching through the resist pattern transferred and formed using the imprint mold 11 can do.

In the illustrated example, the side wall surface of the convex portion 21 is perpendicular to the plane 14 a of the convex structure 14, but the convex portion 21 is tapered such that the top is smaller than the bottom (the plane 14 a side) It may be shaped. In this case, the setting position of "the plane P parallel to the plane 14a" described above is a direction from the top to the bottom of the protrusion 21 and within the desired range from the top, for example, the protrusion 21 It may be at any position within the depth of penetration into the molding resin material layer. The same applies to the following embodiments.
Further, in the above-described example, the opposing distance L is the maximum value Lmax at the portion where the recess 24a and the recess 24b located at the central part of the opposing region 27 are opposed, but the present invention is limited thereto It is not a thing. For example, in the case where each side of the square cross section of the convex portion 21A and the convex portion 21B in a plane parallel to the plane 14a has a roundness such that each side of the square cross section protrudes outward, or the roundness of the corner of the square cross section is large, The opposing distance L between the side wall surface 22 a and the side wall surface 22 b adjacent to and facing each other may have a maximum value Lmax at the side end portion in the width direction of the opposing region 27. The imprint mold of the present invention may be an imprint mold provided with a convex portion having such a shape, and the portion where the opposing distance L between the side wall surface 22a and the side wall surface 22b is the minimum value Lmin is the opposing region. It may be at a position excluding the central part. The case where the roundness of the corner is large means the case where the range where the roundness exists exceeds 10 nm from the intersection of the extrapolation lines of the two sides forming the corner in the cross-sectional shape. The same applies to the following.

FIG. 5 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. In this FIG. 5, the convex part 31 which has a positional relationship in which the minimum value of opposing distance becomes 50 nm or less is shown, and one convex part is shown as 31A and the other convex part is shown as 31B. In FIG. 5, the adjacent convex portion 31A and the convex portion 31B have a square cross-sectional shape in a plane parallel to the plane (the plane 14a in FIG. 2) on which the convex portion 31 is disposed. The cross-sectional shape of the facing convex portion 31B is larger than the cross-sectional shape of the convex portion 31A, and the side wall surface 32a of the convex portion 31A is a part of the side wall surface 32b of the convex portion 31B. Are facing each other. The facing distance L from the side wall surface 32a of the convex portion 31A to the side wall surface 32b of the convex portion 31B is a plane on which the convex portion 31A and the convex portion 31B are disposed as in the example shown in FIG. Then, when an arbitrary plane parallel to the plane 14a) is set, from the side wall surface 32a in the direction in which the side wall surface 32a and the side wall surface 32b oppose each other in this plane (direction shown by arrow a in FIG. 5) It is the distance to the wall surface 32b.
As described above, in the pair of the convex portion 31A and the convex portion 31B which are adjacent and opposed to each other, an opposed region 37 is formed between the opposed side wall surface 32a and the side wall surface 32b. The length M of the opposing region 37 in the width direction (the direction indicated by the arrow b in FIG. 5) is the same as the dimension of the convex portion 31A in the direction of the arrow b. In FIG. 5, the opposing area 37 is shown with halftone dots.

Further, the side wall surface 32a of the convex portion 31A having a smaller side wall surface as compared to the convex portion 31B is located at the central portion of the opposed region 37 and is a concave portion along the direction from the top to the bottom of the convex portion 31A. 34a is located.
The facing distance L described above has the maximum value Lmax at the recess 34 a located at the center of the facing region 37. In addition, the facing distance L is a minimum value Lmin from the central portion of the facing region 37 toward the side end. As described above, in the imprint mold of the present invention, a portion where the opposing distance L between the sidewall surface 32 a and the sidewall surface 32 b is the minimum value Lmin may be present at a position excluding the central portion of the opposing region 37.
The length M of the facing area 37 in the width direction (the direction indicated by the arrow b) is preferably in the range of 1 to 10 times the minimum value Lmin of the facing distance L.
The height of such a convex portion 31 can be set in the range of about 20 to 200 nm, preferably 50 to 150 nm.
In the example shown in FIG. 5, the facing distance L is the maximum value Lmax at the recess 34a located at the center of the facing region 37, but the present invention is not limited to this. For example, in the case where each side of the square cross section of the convex portion 31A has a roundness such that each side of the convex portion 31A protrudes outward in any plane parallel to the plane in which the convex portion 31A is disposed, or When the roundness is large, the opposing distance L between the adjacently facing side wall surface 32a and the side wall surface 32b may have the maximum value Lmax at the side end portion in the width direction of the facing region 37.

  In the example shown in FIG. 5, the end of the opposing region 37 matches the corner of the convex portion 31A, and becomes the corner of the recess of the resist pattern to be transferred and formed using this imprint mold. On the other hand, the corner of the convex portion 31 B is located at a position distant from the end of the facing area 37. As described above, in the etching through the resist pattern, the etching usually proceeds more slowly in the corners than in the central portion, so that the etching rate differs between the corner and the central portion. However, when the concave portion of the resist pattern corresponding to the convex portion 31A and the concave portion of the resist pattern corresponding to the convex portion 31B are compared, the concave portion corresponding to the convex portion 31A where the corner is positioned closer to the central portion is etched It is susceptible to the corner at times. Therefore, by providing the recess 34a in the direction of the convex portion 31A, it is prevented that the central portion of the resist existing to partition between the recesses disappears during the etching and the adjacent recess patterns are connected with each other. Further, the central portion of the resist is suppressed from being thinner than the end portion. Thereby, the width of the resist can be made more uniform, and etching can be performed so that the dimension between the patterns becomes more uniform.

  Further, as shown in FIG. 6, the side wall surface 32b of the convex portion 31B, which has a larger side wall surface compared to the convex portion 31A, is located at the center of the opposing region 37 and from the top to the bottom of the convex portion 31B. The recess 34 b may be located along the direction. In this example, the opposing distance L is the maximum value Lmax at the portion where the recess 34a and the recess 34b located in the central portion of the opposing region 37 are opposed, and the opposing distance L from the central portion of the opposing region 37 to the side edge L is the minimum value Lmin. Therefore, a portion where the opposing distance L between the side wall surface 32 a and the side wall surface 32 b is the minimum value Lmin exists at a position excluding the central portion of the opposing region 37.

  As described above, the depth (the degree of recess in the direction of arrow a) and the width (direction of arrow b) of the recess 34a located on the side wall surface 32a of the protrusion 31A and the recess 34b located on the side wall surface 32b of the protrusion 31B The width and width of the recess 34a may be set appropriately, and the depth and / or width of the recess 34a and the depth and / or width of the recess 34b may be the same, and As shown in 6, it may be different. For example, the depth of the recesses 34a and 34b is determined by the difference in etching rate between the edge of the resist corresponding to the facing region 37 (the corner of the recess of the resist pattern corresponding to the protrusion 31A) and the central portion. It can be set according to the difference in progress, and can be set appropriately in the range of 0.05 times to 0.2 times the minimum value Lmin of the facing distance L. Further, the width of the recessed portions 34a and 34b is the progress of the thinning of the resist due to the difference in the etching rate between the end of the resist corresponding to the facing region 37 (the corner of the recess of the resist pattern corresponding to the convex 31A) and the central portion. Setting in a range of 0.3 to 0.7 times the length M of the opposing region 37 in the width direction (direction indicated by the arrow b). it can. Furthermore, the width of the recess 34a and the recess 34b is such that the region where the opposing distance L is the minimum value Lmin exists in the region excluding the range from the both ends in the width direction of the opposing region 37 to 10 nm near the central portion. You may set the position. By appropriately setting the portion where the facing distance L is the minimum value Lmin in this manner, the dimension between the patterns can be controlled more uniformly in the etching through the resist pattern transferred and formed using the imprint mold 11 can do.

In the example shown in FIG. 6, the end of the opposing area 37 coincides with the corner of the convex portion 31A, and becomes the corner of the recess of the resist pattern to be transferred and formed using this imprint mold. On the other hand, the corner of the convex portion 31 B is located at a position distant from the end of the facing area 37. As described above, when etching is performed via the resist pattern, the etching usually proceeds more slowly in the corners than in the central portion, so that the etching rate differs between the corner and the central portion. However, when the concave portion of the resist pattern corresponding to the convex portion 31A and the concave portion of the resist pattern corresponding to the convex portion 31B are compared, the concave portion corresponding to the convex portion 31A where the corner is positioned closer to the central portion is etched It is susceptible to the corner at times. For this reason, the concave portion 34a located in the convex portion 31A has a large depth, and the concave portion 34b located in the convex portion 31B has a shallow depth but a long width. By providing the recessed portions 34a and 34b in this manner, it is possible to prevent the central portions of the resist existing to partition between the recessed portions from disappearing during the etching to connect adjacent recessed portion patterns. In addition, the convex portion 31A in a plane parallel to the plane (the plane 14a in FIG. 2) on which the convex portion 31A having the opposed region 37 and the side wall length of the convex portion 31B are disposed. By setting the depths and widths of the concave portions 34a and 34b in accordance with the area of the cross-sectional shape of the convex portion 31B, the uniformity of the dimensions can also be improved.
The depths and widths of the recessed portions 34 a and 34 b can be set using the result of imprint transfer in advance.

FIG. 7 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. In FIG. 7, three convex portions 41 in a positional relationship in which the minimum value of the facing distance is 50 nm or less are shown, and the respective convex portions are indicated as 41A, 41B, and 41C. In FIG. 7, the convex portions 41A, 41B and 41C are regular octagons having the same size in cross section in a plane parallel to the plane (the plane 14a in FIG. 2) in which the convex portions 41 are disposed. The protrusion 41B is adjacent to the protrusion 41A and the protrusion 41C.
The side wall surface 42a of the convex portion 41A faces the side wall surface 42b of the convex portion 41B in the pair of the convex portion 41A and the convex portion 41B adjacent to each other. Further, in the pair of adjacent convex portions 41B and 41C, the side wall surface 42b 'of the convex portion 41B faces the side wall surface 42c of the convex portion 41C. Further, as described above, the opposing area 47 is formed between the opposing side wall surface 42a and the side wall surface 42b, and the opposing area 47 'is formed between the side wall surface 42b' and the side wall surface 42c. Here, the a direction and the a ′ direction are the directions in which two side wall surfaces face each other, and the b direction and the b ′ direction are the width direction of the facing region.

The opposing distance L from the side wall surface 42a of the convex portion 41A to the side wall surface 42b of the convex portion 41B is parallel to the plane on which the convex portion 41A and the convex portion 41B are disposed, as in the example shown in FIG. When an arbitrary surface is set, it is the distance from side wall surface 42a to side wall surface 42b in the direction in which side wall surface 42a and side wall surface 42b face each other (direction indicated by arrow a in FIG. 7) in this surface. . Similarly, the facing distance L from the side wall surface 42b 'of the convex portion 41B to the side wall surface 42c of the convex portion 41C is also set to an arbitrary surface parallel to the plane on which the convex portion 41B and the convex portion 41C are disposed. Sometimes, it is the distance from the side wall surface 42b 'to the side wall surface 42c in the direction in which the side wall surface 42b' and the side wall surface 42c face in this plane (the direction shown by the arrow a 'in FIG. 7).
The length M of the opposing region 47 in the width direction (direction shown by the arrow b in FIG. 7) and the length M 'of the opposing region 47' in the width direction (direction shown by the arrow b 'in FIG. 7) This corresponds to the length of one side of the regular octagonal cross-sectional shape. In general, the facing area 47 and the facing area 47 'have a space of the same shape and size. In FIG. 7, the opposite areas 47 and 47 'are shown with halftone dots.
In FIG. 7, the b direction (width direction) of the facing region 47 and the a ′ direction (facing direction) of the facing region 47 ′ coincide, and the a direction (facing direction) of the facing region 47 and the facing region 47 ′ b 'direction (width direction) matches.

The side wall surface 42a of the convex portion 41A and the side wall surface 42b of the convex portion 41B are respectively located in the central portion of the facing region 47 and along the direction from the top to the bottom of the convex portions 41A and 41B. 44a, the recess 44b is located. Further, the side wall surface 42b 'of the convex portion 41B and the side wall surface 42c of the convex portion 41C are respectively located in the central portion of the facing region 47' and are recessed along the direction from the top to the bottom of the convex portions 41B and 41C. The portion 44b 'and the recess 44c are located.
The opposing distance L between a pair of adjacent convex portions 41A and 41B has a maximum value Lmax at a portion where the concave portion 44a and the concave portion 44b located at the center of the opposing area 47 are opposed, and the side end of the opposing area 47 The minimum value Lmin has been reached. Further, the opposing distance L between a pair of adjacent convex portions 41B and convex portions 41C is a maximum value Lmax at a portion where the concave portion 44b 'and the concave portion 44c positioned at the central portion of the opposing area 47' The minimum value Lmin is obtained near the side edge of 47 '. Therefore, a portion where the opposing distance L between the side wall surface 42a and the side wall surface 42b is the minimum value Lmin exists at a position excluding the central portion of the opposing region 47, and the opposing distance L between the side wall surface 42b 'and the side wall surface 42c is the minimum. The part having the value Lmin is present at a position excluding the central part of the facing area 47 '.
The length M in the width direction of the facing region 47 and the length M ′ in the width direction of the facing region 47 ′ are preferably in the range of 1 to 10 times the minimum value Lmin of the facing distance L.
The height of such a convex portion 41 can be set in the range of about 20 to 200 nm, preferably 50 to 150 nm.

In the example shown in FIG. 7, the opposing distance L is the maximum value Lmax at the portion where the recess 44 a and the recess 44 b located at the center of the opposing region 47 are opposed, and the center of the opposing region 47 ′ Although the opposing distance L is the maximum value Lmax at the part where the recess 44b 'and the recess 44c located in the part are opposed, the present invention is not limited to this. For example, in the case where each side of the above-mentioned regular octagonal cross-sectional shape has a roundness that protrudes outward, or in the case where the corner of the regular octagonal cross-section has a large roundness, adjacent and opposing side wall surfaces 42a The facing distance L between the side wall surface 42b and the facing distance L between the side wall surface 42b 'and the side wall surface 42c may have the maximum value Lmax at the side end portion in the width direction of the facing region 47, 47'.
As described above, the recess 44a located on the side wall 42a of the protrusion 41A, the recesses 44b and 44b 'located on the side walls 42b and 42b' of the protrusion 41B, and the recess located on the side wall 42c of the protrusion 41C. The depth and width of the portion 44c can be set as appropriate. For example, the depths of the recessed portions 44a, 44b, 44b 'and 44c are etching at the end portion of the resist corresponding to the facing regions 47 and 47' (the corner of the recess of the resist pattern corresponding to the protruding portion 41) and the central portion It can be set according to the difference in the progress of resist thinning due to the difference in speed, and can be appropriately set in the range of 0.05 times to 0.2 times the minimum value Lmin of the facing distance L. In addition, the widths of the recessed portions 44a, 44b, 44b 'and 44c are the etching rates of the end portions of the resist corresponding to the opposing regions 47 and 47' (the corners of the recessed portions of the resist pattern corresponding to the convex portions 41) It can be set according to the area where the difference in the progress of resist thinning occurs due to the difference, and in the range of 0.3 times to 0.7 times the length M, M 'of the width direction of the opposing area 47, 47'. It can be set appropriately. Furthermore, the recessed portion 44a, so that the region where the facing distance L is the minimum value Lmin exists in the region excluding the range from the both ends in the width direction of the facing region 47 and the facing region 47 'to 10 nm near the central portion. The widths and positions of 44b, 44b 'and 44c may be set.

In the example shown in FIG. 7, the end portions of the opposing regions 47, 47 'coincide with the corners of the convex portion 41, and become the corners of the concave portion of the resist pattern to be transferred and formed using this imprint mold. The angle of the corner of the convex portion 41 is 135 ° because the sectional shape of the convex portion 41 is a regular octagon, and the angle of the corner of the convex portion as shown in FIG. 3, FIG. 5, and FIG. Compared to the case where the angle is designed at 90 °, the influence of the corner at the time of etching is small. For this reason, the depth and width of the recess provided in the protrusion may be adjusted in accordance with the angle of the corner of the protrusion.
In the example shown in FIG. 7, in the convex portion 41B, the side wall surfaces 42b and 42b 'facing the side wall surfaces of the other convex portions 41A and 41C are disposed with one side wall surface of the convex portion 41B interposed therebetween. However, two or more side wall surfaces may be interposed.

FIG. 8 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. In FIG. 8, three convex portions 51 in a positional relationship in which the minimum value of the facing distance is 50 nm or less are shown, and the respective convex portions are shown as 51A, 51B, and 51C. In FIG. 8, the convex portions 51A, 51B, and 51C are rectangles having the same size in cross section in a plane parallel to the plane (the plane 14a in FIG. 2) in which the convex portions 51 are disposed. The portion 51B is adjacent to the convex portion 51A and the convex portion 51C.
The adjacent convex portion 51A and the convex portion 51B are a part of the side wall surface 52a of the convex portion 51A corresponding to the long side of the rectangular cross section and the side wall surface 52b of the convex portion 51B corresponding to the long side of the rectangular cross section. It is opposite to a part. Further, in the adjacent convex portion 51B and the convex portion 51C, a portion of the side wall surface 52b 'of the convex portion 51B corresponding to the long side of the rectangular cross section corresponds to the side of the convex portion 51C corresponding to the long side of the rectangular cross section. It faces a part of the wall surface 52c. As described above, the convex portions 51A, 51B, and 51C are shifted at a fixed distance in the long side direction of the rectangular cross section.
The facing distance L from the side wall surface 52a of the convex portion 51A to the side wall surface 52b of the convex portion 51B is, as in the example shown in FIG. 2, a plane on which the convex portion 51A and the convex portion 51B are disposed. When an arbitrary parallel surface is set, the distance from side wall surface 52a to side wall surface 52b in the direction in which side wall surface 52a and side wall surface 52b face each other in the plane (the direction shown by arrow a in FIG. 8) It is. Similarly, the facing distance L from the side wall surface 52b 'of the convex portion 51B to the side wall surface 52c of the convex portion 51C is also set to an arbitrary surface parallel to the plane on which the convex portion 51B and the convex portion 51C are disposed. Sometimes, it is the distance from the side wall surface 52b 'to the side wall surface 52c in the direction in which the side wall surface 52b' and the side wall surface 52c face each other in the plane (the direction shown by arrow a in FIG. 8).

As described above, the opposing area 57 is formed between the opposing side wall surface 52a and the side wall surface 52b, and the opposing area 57 'is formed between the side wall surface 52b' and the side wall surface 52c. The length M of the opposing region 57 in the width direction (direction shown by the arrow b in FIG. 8) and the length M 'of the opposing region 57' in the width direction (direction shown by the arrow b in FIG. 8) The amount of displacement between the convex portion 51A and the convex portion 51B in the long side direction, and the amount of displacement between the convex portion 51B and the convex portion 51C. Usually, the opposing area 57 and the opposing area 57 'form a space of the same shape and size. In FIG. 8, the opposing areas 57 and 57 'are shown with halftone dots.
The side wall surface 52a of the convex portion 51A and the side wall surface 52b of the convex portion 51B are respectively located in the central portion of the facing region 57 and along the direction from the top to the bottom of the convex portions 51A and 51B. 54a, the recess 54b is located. Further, the side wall surface 52b 'of the convex portion 51B and the side wall surface 52c of the convex portion 51C are respectively located at the central portion of the facing region 57' and are recessed along the direction from the top to the bottom of the convex portions 51B and 51C. The portion 54b 'and the recess 54c are located.

The opposing distance L between a pair of adjacent convex portions 51A and convex portions 51B is a maximum value Lmax at a portion where the concave portion 54a and the concave portion 54b located at the center of the opposing area 57 are opposed, and the side end of the opposing area 57 The minimum value Lmin has been reached. In addition, the opposing distance L between a pair of adjacent convex portions 51B and convex portions 51C is also the maximum value Lmax at the portion where the concave portion 54b 'and the concave portion 54c located at the central portion of the opposing area 57' The minimum value Lmin is obtained near the side edge of 57 '. Therefore, a portion where the opposing distance L between the side wall surface 52a and the side wall surface 52b is the minimum value Lmin exists at a position excluding the central portion of the opposing region 57, and the opposing distance L between the side wall surface 52b 'and the side wall surface 52c is the minimum. The part having the value Lmin is present at a position excluding the central part of the facing area 57 '.
The length M in the width direction of the facing area 57 and the length M ′ in the width direction of the facing area 57 ′ are preferably in the range of 1 to 10 times the minimum value Lmin of the facing distance L.
The height of such a convex portion 51 can be set in the range of about 20 to 200 nm, preferably 50 to 150 nm.
In the example shown in FIG. 8, the opposing distance L is the maximum value Lmax at the portion where the recess 54a and the recess 54b located at the center of the opposing region 57 are opposed, and the center of the opposing region 57 'is Although the opposing distance L is the maximum value Lmax at the part where the recessed part 54b 'and the recessed part 54c located in the part are opposed, the present invention is not limited to this. For example, in the case where each side of the above-mentioned rectangular cross-sectional shape has a roundness that protrudes outward, or when the roundness of the corner of the rectangular cross-section is large, adjacent side wall surface 52a and side wall surface 52b The opposing distance L between them and the opposing distance L between the side wall surface 52b 'and the side wall surface 52c may have the maximum value Lmax at the lateral end of the opposing regions 57 and 57' in the width direction.

  As described above, the recess 54a located on the side wall surface 52a of the protrusion 51A, the recess 54b, 54b 'located on the side wall surfaces 52b and 52b' of the protrusion 51B, and the recess located on the side wall surface 52c of the protrusion 51C. The depth and width of the portion 54c can be set appropriately. For example, the depths of the recessed portions 54a, 54b, 54b 'and 54c are the end portions of the resist corresponding to the facing regions 57 and 57' (the convex portion 51 It can be set according to the difference in the progress of resist thinning due to the difference in etching rate between the corner of the recess of the corresponding resist pattern and the central portion, and 0.05 times to 0. 0 times the minimum value Lmin of the facing distance L. It can be appropriately set in the double range. In addition, the width of the recessed portions 54a, 54b, 54b 'and 54c is the etching speed of the end portion of the resist corresponding to the opposing regions 57 and 57' (the corner of the recessed portion of the resist pattern corresponding to the convex portion 51) and the central portion. It can be set according to the area where the difference in the progress of resist thinning occurs due to the difference, and within the range of 0.3 times to 0.7 times the length M, M 'of the width direction of the opposing areas 57, 57'. It can be set appropriately. Furthermore, portions where the opposing distance L is the minimum value Lmin exist in the region excluding the range from the both ends of the opposing region 57 and the opposing region 57 'in the width direction (direction of arrow b in the drawing) to 10 nm near the central portion. Thus, the widths and positions of the recesses 54a, 54b, 54b 'and 54c may be set.

FIG. 9 is a plan view of a projection in another embodiment of the imprint mold of the present invention, and is a view corresponding to FIG. In FIG. 9, nine convex portions 61 in a positional relationship in which the minimum value of the facing distance is 50 nm or less are shown, and the respective convex portions are indicated as 61A to 61I. In FIG. 9, each of the convex portions 61A to 61I is a square having the same cross-sectional shape in a plane parallel to the plane (the plane 14a in FIG. 2) on which the convex portions 61 are disposed. And the convex part 61A of illustration is adjacent to the convex part 61B, the convex part 61C, the convex part 61D, and the convex part 51E in four sides of the square cross section.
In this example, since the state of a pair of adjacent convex portions is common, the convex portions 61A and the convex portions 61B will be described below as an example. A part of the side wall surface 62a of the convex portion 61A faces the side wall surface 62b of the convex portion 61B in the adjacent pair of the convex portion 61A and the convex portion 61B.

The facing distance L from the side wall surface 62a of the convex portion 61A to the side wall surface 62b of the convex portion 61B is a plane in which the convex portion 61A and the convex portion 61B are disposed as in the example shown in FIG. From the side wall surface 62a to the side wall surface 62b in the direction in which the side wall surface 62a and the side wall surface 62b face each other in the plane (a direction shown by an arrow a in FIG. 9). It is a distance.
As described above, an opposing region 67 is formed between the opposing side wall surface 62a and the opposing side wall surface 62b. The length M of the opposing region 67 in the width direction (the direction indicated by the arrow b in FIG. 9) is the same as the length of one side of the square cross section of the convex portions 61A, 61B. In FIG. 9, the opposing area 67 is shown with halftone dots.
The side wall surface 62a of the convex portion 61A and the side wall surface 62b of the convex portion 61B are respectively located in the central portion of the facing region 67 and along the direction from the top to the bottom of the convex portions 61A and 61B. 64a, the recess 64b is located.
The opposing distance L between a pair of adjacent convex portions 61A and convex portions 61B is a maximum value Lmax at a portion where the concave portion 64a and the concave portion 64b located in the central portion of the opposing area 67 are opposed. The minimum value Lmin has been reached. Therefore, a portion where the opposing distance L between the side wall surface 62a and the side wall surface 62b is the minimum value Lmin exists at a position excluding the central portion of the opposing region 67.
The length M in the width direction of the facing region 67 is preferably in the range of 1 to 10 times the minimum value Lmin of the facing distance L.
The height of such a convex portion 61 can be set in the range of about 20 to 200 nm, preferably 50 to 150 nm.

In the example shown in FIG. 9, the opposing distance L is the maximum value Lmax at the portion where the recess 64a and the recess 64b located at the central part of the opposing region 67 oppose each other. It is not limited to For example, in the case where each side of the above-described square cross-sectional shape has a roundness that protrudes outward, or when the corner of the square cross-section has a large roundness, adjacent side wall surface 62a and side wall surface 62b The opposing distance L between the light source and the light emitting device may be the maximum value Lmax at the side end of the opposing region 67 in the width direction.
As described above, the depth and width of the recess 64a located on the side wall surface 62a of the protrusion 61A and the recess 64b located on the side wall surface 62b of the protrusion 61B can be set as appropriate. For example, the depth of the recessed portions 64a and 64b is determined by the difference in etching rate between the end of the resist corresponding to the facing region 67 (the corner of the recess of the resist pattern corresponding to the convex 61) and the central portion. It can be set according to the difference in progress, and can be set appropriately in the range of 0.05 times to 0.2 times the minimum value Lmin of the facing distance L. Further, the width of the recessed portions 64a and 64b is determined by the progress of the thinning of the resist due to the difference in etching rate between the end of the resist corresponding to the facing region 67 (the corner of the recess of the resist pattern corresponding to the convex 61) and the central portion. It can set according to the field which a difference produces, and can set suitably in 0.3 times-0.7 times the length M of the cross direction of countering field 67 widthwise. Furthermore, the recessed portion is formed such that the portion where the facing distance L is the minimum value Lmin exists in the region excluding the range from the both ends in the width direction (the arrow b direction in the drawing) of the facing region 67 to 10 nm near the central portion. The width and position of the recess 64 b may be set.

The aspect in which the plurality of convex portions in the positional relationship in which the minimum value of the facing distance is 50 nm or less is adjacent to each other in the same state is not limited to the example shown in FIG. For example, as shown in FIG. 7, the convex portions having a regular octagonal cross-sectional shape may be adjacent to other convex portions every other side of the regular octagon.
The above-described imprint mold is an example in which the cross-sectional shape of the plurality of convex portions in a positional relationship in which the minimum value of the facing distance is 50 nm or less is square, rectangular, or octagonal. There is no particular restriction on
In the imprint mold of the present invention, the arrangement of the plurality of convex portions located in the concavo-convex structure region A is not particularly limited. For example, a hole pattern to be formed such as a position of a contact hole in wiring design of a semiconductor device The arrangement can be set appropriately according to

Further, in the imprint mold of the present invention, at least one of the convex portions having a positional relationship in which the minimum value of the facing distance is 50 nm or less is formed on the side wall surface not facing the other convex portion. It may have the linear convex part of width narrower than width continuously. FIG. 10 is a plan view of the convex portion of such an imprint mold and is a view corresponding to FIG. In FIG. 10, the convex portions 71 are in a positional relationship in which the minimum value of the facing distance is 50 nm or less, and one convex portion is indicated as 71A and the other convex portion is indicated as 71B. In FIG. 10, the side wall surface 72a of the convex portion 71A is opposed to a part of the side wall surface 72b of the convex portion 71B in the adjacent pair of the convex portion 71A and the convex portion 71B. Further, in the convex portion 71A, a linear convex portion 75A having a width smaller than the width of the convex portion 71A is continued to the side wall surface 72a ′ different from the side wall surface 72a facing the convex portion 71B. Similarly, in the convex portion 71B, a linear convex portion 75B having a width smaller than the width of the convex portion 71B is continued to the side wall surface 72b 'different from the side wall surface 72b facing the convex portion 71A.
The facing distance L from the side wall surface 72a of the convex portion 71A to the side wall surface 72b of the convex portion 71B is a plane on which the convex portion 71A and the convex portion 71B are disposed as in the example shown in FIG. Then, when an arbitrary plane parallel to the plane 14a) is set, from the side wall surface 72a in the direction in which the side wall surface 72a and the side wall surface 72b face each other in the plane (the direction shown by arrow a in FIG. 10). It is the distance to the wall surface 72b.

As described above, in the pair of the convex portion 71A and the convex portion 71B which are adjacent and opposed to each other, an opposed region 77 is formed between the opposed side wall surface 72a and the side wall surface 72b. The length M of the opposing region 77 in the width direction (the direction indicated by the arrow b in FIG. 10) is the same as the dimension in the arrow b direction of the convex portions 71A and 71B in the illustrated example. In FIG. 10, the opposite area 67 is shown with halftone dots.
In the side wall surface 72a of the convex portion 71A and the side wall surface 72b of the convex portion 71B, the concave portion 74a is located at the central portion of the facing region 77 and along the direction from the top to the bottom of the convex portions 71A and 71B. , The recess 74b is located.
The facing distance L described above has a maximum value Lmax at a portion where the recess 74 a and the recess 74 b located at the center of the facing region 77 face each other. In addition, the facing region L has a minimum value Lmin from the central portion of the facing region 77 toward the side edge. Therefore, a portion where the opposing distance L between the side wall surface 72a and the side wall surface 72b is the minimum value Lmin exists at a position excluding the central portion of the opposing region 77. Then, as in the above embodiment, the portion where the opposing distance L is the minimum value Lmin may be present in the region excluding the range from 10 nm to the central portion from both ends in the width direction of the opposing region 77 .
The length M of the facing area 77 in the width direction (the direction indicated by the arrow b) is preferably in the range of 1 to 10 times the minimum value Lmin of the facing distance L.

Further, the width of the narrow linear protrusion 75A continuous with the side wall surface 72a 'of the convex portion 71A and the narrow linear protrusion 75B continuous with the side wall surface 72b' of the convex portion 71B is appropriately determined. It can be set.
The height of the convex portion 71 and the linear convex portion 75 can be set in the range of about 20 to 200 nm, preferably 50 to 150 nm.
The positions and directions of the narrow linear protrusion 75A continuous to the convex 71A and the narrow linear protrusion 75B continuous to the convex 71B, and the shapes of the convex 71A and the convex 71B are shown in FIG. It is not limited to the examples shown. For example, an aspect as shown in FIG. 11 (A) to FIG. 11 (C) can be appropriately set.

  In such an imprint mold according to the present invention, the minimum value of the facing distance between the side walls is opposite to each other between the protrusions 21 where the minimum value of the facing distance between the side walls of the adjacent protrusions 21 is 50 nm or less. It exists in the part except the central part of the opposite area which there is. Therefore, in the resin layer formed by the imprint using the imprint mold of the present invention, the concave portion corresponding to the adjacent convex portion having such a minute opposing region is formed, and the resin exists to partition the concave portions. The width of the layer is large at the center. As a result, the resin layer remaining on the bottom of the recess formed in the resin layer, so-called etching in removal of the remaining film, and etching of the transferred body through the resin layer, narrows the central portion of the resin layer that divides adjacent recesses. Disappearance is prevented, and the distance between the recess patterns can be controlled with high accuracy.

The embodiment of the above-mentioned imprint mold is an illustration, and the present invention is not limited to the embodiment.
Moreover, formation of the recessed part with which the imprint mold of this invention is equipped can be performed by the method mentioned below.
For example, a recess can be drawn using an electron beam drawing apparatus, and the recess can be formed by development etching. In the case where the resist is developed after electron beam drawing, unlike the imprint, there is no remaining resist film, so that it is possible to form a recess even in the subsequent etching.
In addition, the facing area of the imprint mold is partially cut by a device such as an electron beam correction device, an FIB (focused ion beam) correction device, or an AFM (atomic force microscope) to form a recess. Can be formed. This method is useful when the number of depressions to be provided is small.
In addition, in the case of producing an imprint mold by imprint transfer using a master mold, a convex portion corresponding to the concave portion is formed on the master mold by electron beam drawing or the like, and under the condition that the resist residual film is adjusted using an inkjet or the like. Imprint transfer can be performed to form a recess.

The setting of the depth and width of the recess formed by the method as described above can be adjusted using the result of imprint transfer in advance. For example, the shape of a resist pattern formed by imprinting, or the shape etched to a transferred object through the resist pattern is observed, and the degree of thinning of the resist present to partition the recesses is measured, and the results are shown The depth and width of the recess may be determined based on the base.
Moreover, the imprint mold of this invention may be provided with the adjacent convex part of several types of aspect. For example, in an imprint mold provided with adjacent convex parts in the aspect as shown in FIG. 3, the adjacent convex parts may be provided in a manner different from the aspect shown in FIG. The same applies to each imprint mold provided with the adjacent convex portions in the aspect as shown in FIGS. 5 to 7. As described above, in the case where the plurality of types of adjacent convex portions are provided, it is preferable to set the depth, width, and the like of the concave portion in accordance with the shape of the convex portion for each of the aspects.

[Imprinting method]
Next, the imprint method of the present invention will be described.
FIG. 12 is a process diagram for describing one embodiment of the imprint method of the present invention, and shows an example using the above-described imprint mold 11 of the present invention.
In the imprint method of the present invention, first, the resin material layer 121 to be molded is formed on a desired surface of the transferred object 111 (FIG. 12A). Examples of resin materials to be used include resins such as photocurable resins, thermosetting resins, and thermoplastic resins. The method for forming the resin material layer 121 is not particularly limited, and for example, the resin material to be molded can be supplied onto the material to be transferred 111 and formed by spin coating. The thickness of the to-be-molded resin material layer 121 is the etching resistance of the resin layer 122 formed by curing the to-be-molded resin material layer 121 as described later, that is, the etching mask at the time of etching the transferred object 111 It can set suitably in consideration of a function, for example, can set in about 30-200 nm.

  Next, the resin resin layer 121 is pushed into the middle of the convex portion 21 of the imprint mold 11 of the present invention (FIG. 12 (B)). The amount of pressing of the convex portion 21 into the resin material layer 121 to be molded can be set in consideration of the thickness of the resin material layer 121 to be molded, the height of the convex portion 21 and the like. In the case where the thickness of the convex portion 21 is 80 nm and the height of the convex portion 21 is 80 nm, the amount of indentation can be set to about 50 nm. Further, when the convex portion 21 has a tapered shape that makes it easier to use from the top to the bottom (the plane 14a side), the opening size of the recess formed in the resin layer 122 is a desired size It can be set to be pushed to the following position.

  Next, the resin material layer 121 is cured to form the resin layer 122 in a state in which the resin material layer 121 is pressed in the middle of the convex portion 21 into the resin material layer 121, and the resin layer 122 and the imprint mold 11 are separated. A resin layer 122 having a concave portion 123 formed of a space corresponding to the convex portion 21 provided in the print mold 11 is formed on the transferred object 111 (FIG. 12C). FIG. 13 shows a convex portion 21 having a positional relationship in which the minimum value of the facing distance is 50 nm or less among the concave portions 123 formed in this manner (a convex portion 21A and a convex portion 21B shown in FIGS. The surface of the resin layer 122 is indicated by hatching. In FIG. 13, in the concave portion 123, the concave portion 123A corresponding to the convex portion 21A and the concave portion 123B corresponding to the convex portion 21B are adjacent to each other. Such a resin layer 122 present between the concave portion 123A and the concave portion 123B is a facing area 27 (see FIG. 2) in the imprint mold 11 that is located between the convex portion 21A and the convex portion 21B adjacent to each other. It has become the partition part 127 which has a shape corresponding to (refer FIG. 4). Therefore, the minimum value of the width of the partition portion 127 in the direction from the concave portion 123A to the concave portion 123B (the direction indicated by the arrow a in FIG. 13) is approximately 50 nm or less. The central portion in the lengthwise direction of the partition portion 127 (the direction indicated by the arrow b in FIG. 13) is a concave portion 24a provided on the side wall surface 22a with the convex portion 21A of the imprint mold 11 and the side wall surface 22b. The width is the widest corresponding to the recess 24b provided.

  When the resin material to be molded is photocurable and the imprint mold 11 can transmit irradiation light for curing the resin material layer 121 described above, the imprint mold 11 side is used. It can be irradiated with light. In addition, when the transfer target 111 can transmit light, light may be irradiated from the transfer target 111 side, and light may be irradiated from both the imprint mold 11 side and the transfer target 111 side. You may go. When the resin material to be molded is thermosetting or thermoplastic, the material to be transferred can be subjected to a heat treatment or a cooling (cooling) treatment, respectively.

The recessed part 112 is formed in the to-be-transferred body 111 by etching the to-be-transferred body 111 through the resin layer 122 formed as mentioned above (FIG. 12 (D)). In the etching of the transferred body 111 through the resin layer 122, the thickness of the resin layer remaining at the bottom of the recess 123 formed in the resin layer 122, that is, the so-called residual film is large. Therefore, the etching through the resin layer 122 The time to reach the transfer body 111 becomes long. However, in the present invention, the recess 112 can be formed with high accuracy. That is, although thinning by etching proceeds most in the central portion in the longitudinal direction of the partition portion 127 of the resin layer 122, as described above, the central portion in the longitudinal direction of the partition portion 127 of the resin layer 122 has the largest width. Since the width is large, thinning and disappearance of the central portion of the partition portion 127 can be prevented, and therefore, the distance between the concave portions 112 formed in the transferred object 111 can be controlled with high accuracy.
Note that a base material provided with a hard mask material layer may be used as the material to be transferred 111. In this case, the hard mask material layer can be etched through the resin layer 122 to form a hard mask, and the transfer target body 111 can be etched through the hard mask.
Such an imprint method of the present invention can perform etching of a transferred object through a resin layer in which the distance between the recess patterns is controlled with high accuracy. For example, the distance control between contact holes, between the electrode patterns Distance control or fine wiring formation can be performed with high accuracy.

  The embodiment of the above-mentioned imprint method is an illustration, and the present invention is not limited to the embodiment. For example, in the case where a hole pattern is formed on the material to be transferred 111 in a multifaceted manner, the imprint mold 11 can be used to perform imprinting by the step & repeat method. Under the present circumstances, even if it makes it harden in the state which pushed in the middle of convex part 21 of imprint mold 11 to resin material layer 121 as mentioned above for every process of each imprint, and resin layer 122 is formed. Alternatively, in each imprint process, the resin layer 122 may be formed in a semi-cured state, and finally, the resin layer 122 may be completely cured.

Next, the present invention will be described in more detail by way of examples.
Example 1
(Production of imprint mold)
As a base material for imprint mold, a quartz glass substrate (152 mm square, thickness 6.35 mm) of a mesa structure having a convex structure portion of 26 mm × 33 mm at a center and a height of 30 μm was prepared. A chromium thin film (5 nm in thickness) was formed on the surface of the quartz glass substrate on the side where the convex structure portion is located by sputtering to form a hard mask material layer. This base material was mounted on and held by the substrate holding unit of the imprint apparatus so that the surface having the convex structure portion became the upper surface horizontally.
Next, droplets of the photocurable resin composition as a resin material to be molded were supplied onto the hard mask material layer of the convex structure portion of the base material by an inkjet method.
Next, a master mold manufactured using an electron beam lithography method was brought close to the above base material, and droplets were developed between the master mold and the base material to form a photocurable resin layer.

Next, parallel light (ultraviolet light having a peak wavelength of 365 nm) was irradiated on the master mold side from the illumination optical system of the imprint apparatus under the condition of 200 mJ / cm ² . Thereby, the photocurable resin layer was cured to form a resin layer.
Next, the resin layer and the master mold were separated, and a resin layer having a convex portion corresponding to the concave portion of the master mold was formed on the substrate. In this resin layer, the thickness of the portion where the convex portion did not exist, that is, the thickness of the remaining film was 10 nm, which was thin.
Then, the hard mask material layer was dry etched using this resin layer as an etching mask to form a chromium hard mask. Thereafter, using the hard mask as an etching mask, a plurality of projections are formed in the concavo-convex structure area of the base material by dry etching to produce an imprint mold.

  The imprint mold produced in this manner has a convex portion in a positional relationship in which the minimum value of the facing distance is 50 nm or less as shown in FIGS. The protrusions having such a positional relationship will be described with reference to the protrusions 21A and 21B shown in FIG. 3. The length M of the facing region 27 is 50 nm, and the recess located in the central portion of the facing region 27 is The depth of the portion 24a and the recess 24b (the degree of recess in the direction of arrow a in FIG. 3) is 2 nm, and the width of the recess 24a and the recess 24b (the length of the recess in the direction of arrow b in FIG. 3) is 15 nm. The minimum value Lmin of the facing distance L was 15 nm, and the maximum value Lmax of the facing distance L was 19 nm. The dimensions of the convex portion 21A in the arrow a direction and the arrow b direction are 50 nm, and the dimensions of the convex portion 21B in the arrow a direction and the arrow b direction are 50 nm. The height of the convex portion 21A and the convex portion 21B is 80 nm. The The dimension measurement of such an imprint mold was performed using AFM (atomic force microscope). The same applies to the following examples and comparative examples.

(Pattern formation)
A quartz glass substrate (152 mm square, 6.35 mm thick) was prepared as a transfer target, and a chromium thin film (5 nm thick) was formed on one surface by sputtering to form a hard mask material layer.
Next, a photocurable resin composition was supplied as a molding resin material on the hard mask material layer of the transfer target, and a molding resin material layer (thickness 80 nm) was formed by spin coating (FIG. 12 (FIG. See A). The transfer target was mounted on and held by the substrate holding portion of the imprint apparatus so that the surface having the resin material layer to be molded became the upper surface horizontally.
Next, the imprint mold produced as described above is brought close to the transferred object, and the convex part of the imprint mold is pushed 50 nm into the resin material layer to be molded, and in this state parallel light (peak The mold side was irradiated with ultraviolet light having a wavelength of 365 nm under the condition of 200 mJ / cm ² . Thereby, the to-be-molded resin material layer was hardened and it was set as the resin layer (refer FIG. 12 (B)).

Next, the resin layer and the imprint mold were separated, and the resin layer having a concave portion consisting of a space corresponding to the convex portion included in the imprint mold was positioned on the transfer target (see FIG. 12C). Among the recesses formed in the resin layer, adjacent recesses formed to correspond to the convex portions in the positional relationship having the fine opposing distance as described above have a partition portion positioned between the concave portions. It had a shape as shown in FIG. In addition, the thickness of the resin layer located at the bottom of the recess, that is, the residual film was 30 nm, which was significantly thicker than the residual film thickness of the resin layer at the time of production of the imprint mold using the master mold.
Next, the hard mask material layer was dry etched using the resin layer formed as described above as an etching mask to form a chromium hard mask. Furthermore, using the hard mask as an etching mask, a plurality of concave portions were formed in the concavo-convex structure region of the transferred body by dry etching (see FIG. 12D).

  Among the recesses formed in the quartz glass substrate which is the transferred object in this manner, the adjacent recesses corresponding to the protrusions having the positional relationship having the fine opposing distance as described above are located between the recesses The width of the partition of the quartz glass substrate was measured. That is, as shown in FIG. 14, five measurement sites (five dots P1 to P5 indicated by dashed lines in FIG. 14) divide the partition 117 located between the recess 112A and the recess 112B into six equal parts. ) Were set, and the width of the partition 117 at each of these measurement sites was measured. Such measurement is performed for 10 sets of adjacent recesses, the average value, the maximum value, and the minimum value of the width of the partition portion 117 are obtained, and the value of (maximum value-minimum value) / average value is calculated to obtain the following table. Shown in 1. In addition, the measurement of the width | variety of the partition part 117 was performed using AFM (atomic force microscope). The same applies to the following examples and comparative examples.

Comparative Example 1
As the imprint mold, one in which the recess 24a and the recess 24b in the imprint mold in Example 1 were not provided was manufactured. That is, an imprint mold was manufactured in which the length M of the facing region 27 was 50 nm and the facing distance L was 15 nm.
In the same manner as in Example 1 except that this imprint mold was used, a plurality of recesses were formed in the uneven structure region of the base material.
With respect to the concave portions thus formed in the quartz glass substrate, the average value, the maximum value, and the minimum value of the widths of the partition portions are obtained in the same manner as in Example 1, and the value of (maximum value-minimum value) / average value is calculated. The results are shown in Table 1 below.

Example 2
(Production of imprint mold)
In the same manner as in Example 1, an imprint mold having a convex portion in which the minimum value of the facing distance is 50 nm or less as shown in FIG. 6 was produced. The convex portions having such a positional relationship will be described with reference to the convex portions 31A and 31B shown in FIG. 6. The length M of the facing region 37 is 50 nm, and the depth of the concave portions 34a of the convex portions 31A. (The degree of recess in the direction of arrow a in FIG. 6) is 2 nm, the width (length of the recess in the direction of arrow b in FIG. 6) is 15 nm, the depth of recess 34b in convex 31B is 1 nm, the width is 35 nm, The minimum value Lmin of the facing distance L was 16 nm, and the maximum value Lmax of the facing distance L was 19 nm. The dimensions of the convex portion 31A in the arrow a direction and the arrow b direction are 50 nm, the dimensions of the convex portion 31B in the arrow a direction and the arrow b direction are 100 nm, and the height of the convex portion 31A and the convex portion 31B is 80 nm. The

(Pattern formation)
A plurality of recesses were formed in the concavo-convex structure region of the quartz glass substrate in the same manner as in Example 1 using the above-described imprint mold.
With respect to the concave portions thus formed in the quartz glass substrate, the average value, the maximum value, and the minimum value of the widths of the partition portions are obtained in the same manner as in Example 1, and the value of (maximum value-minimum value) / average value is calculated. The results are shown in Table 1 below.

Comparative Example 2
As the imprint mold, one in which the recess 34a and the recess 34b in the imprint mold in Example 2 were not provided was manufactured. That is, an imprint mold was manufactured in which the length M of the facing region 37 was 50 nm and the facing distance L was 16 nm.
A plurality of recesses were formed in the uneven structure region of the quartz glass substrate in the same manner as in Example 2 except that this imprint mold was used.
With respect to the concave portions thus formed in the quartz glass substrate, the average value, the maximum value, and the minimum value of the widths of the partition portions are obtained in the same manner as in Example 1, and the value of (maximum value-minimum value) / average value is calculated. The results are shown in Table 1 below.

[Example 3]
(Production of imprint mold)
In the same manner as in Example 1, an imprint mold having a convex portion in which the minimum value of the facing distance is 50 nm or less, as shown in FIG. 7, was produced. The convex portions having such a positional relationship will be described with reference to the convex portions 41A and the convex portions 41B shown in FIG. 7. The length M of the facing region 47 is 50 nm, and the depth of the concave portions 44a of the convex portions 41A. The extent of the recess in the direction of arrow a in FIG. 7 is 1.5 nm, the width (the length of the recess in the direction of arrow b in FIG. 7) is 20 nm, and the depth of the recess 44b of the protrusion 41B is 1.5 nm. The width was 20 nm, the minimum value Lmin of the facing distance L was 17 nm, and the maximum value Lmax of the facing distance L was 20 nm. The dimensions of the convex portion 41A and the convex portion 41B in the arrow a direction and the arrow b direction are 120 nm, and the height of the convex portion 41A and the convex portion 41B is 80 nm.

(Pattern formation)
A plurality of recesses were formed in the concavo-convex structure region of the quartz glass substrate in the same manner as in Example 1 using the above-described imprint mold.
With respect to the concave portions thus formed in the quartz glass substrate, the average value, the maximum value, and the minimum value of the widths of the partition portions are obtained in the same manner as in Example 1, and the value of (maximum value-minimum value) / average value is calculated. The results are shown in Table 1 below.

Comparative Example 3
As the imprint mold, one in which the recess 44a and the recess 44b in the imprint mold in Example 3 were not provided was manufactured. That is, an imprint mold was produced in which the length M of the facing region 47 was 50 nm and the facing distance L was 17 nm.
A plurality of recesses were formed in the uneven structure region of the quartz glass substrate in the same manner as in Example 3 except that this imprint mold was used.
With respect to the concave portions thus formed in the quartz glass substrate, the average value, the maximum value, and the minimum value of the widths of the partition portions are obtained in the same manner as in Example 1, and the value of (maximum value-minimum value) / average value is calculated. The results are shown in Table 1 below.

表１に示されるように、実施例１〜実施例３では、隣接する凹部間に位置する基材の仕切り部が比較例１〜比較例３に比べより一定の幅で存在する。比較例１〜比較例３では、仕切り部の幅のばらつきが見られ、一部では仕切り部の消失が確認された。このことから、実施例１〜実施例３では、インプリントモールドを用いて形成した樹脂層の凹部間に位置する仕切り部の消失が防止され、仕切り部の寸法のばらつきも低減していることが確認された。

As shown in Table 1, in Examples 1 to 3, the partitioning portion of the base material located between the adjacent concave portions exists with a more constant width as compared with Comparative Examples 1 to 3. In Comparative Example 1 to Comparative Example 3, variation in the width of the partition portion was observed, and disappearance of the partition portion was confirmed in part. From this, in Examples 1 to 3, it is possible to prevent the disappearance of the partition portion located between the concave portions of the resin layer formed using the imprint mold and to reduce the variation in the dimension of the partition portion. confirmed.

  The present invention can be applied to various microfabrication processes using imprinting methods, and is useful, for example, for forming contact holes in semiconductor memories, producing biochips, forming hole patterns for optical elements, magnetic recording media, etc. .

DESCRIPTION OF SYMBOLS 11 ... Imprint mold 12 ... Base material 21, 21, 21B, 31, 31A, 31B, 41, 41A, 41B, 41C, 51, 51A, 51B, 51C, 61, 61A, 61B, 61C, 61D, 61E, 61F , 61G, 61H, 61I, 71, 71A, 71B ... convex portions 22a, 22b, 32a, 32b, 42a, 42b, 42b ', 42c, 52a, 52b, 52b', 52c, 62a, 62b, 72a, 72a ', Side walls 24a, 24b, 34a, 34b, 44a, 44b, 44b, 44c, 54a, 54b, 54b, 54c, 64a, 64b, 74a, 74b ... recessed portions 27, 37, 47, 47 ', 57, 57', 67, 77 ... facing area 75, 75A, 75B ... narrow width convex portion A ... uneven structure area

Claims (13)

At least a substrate, and a plurality of projections located in a concavo-convex structure area set in one plane of the substrate;
When an opposing distance between a side wall surface of one convex portion and a side wall surface of the other convex portion opposed to the side wall surface, which is an adjacent convex portion, is a distance in a plane parallel to the plane, Having a convex portion in which the minimum value of the facing distance is 50 nm or less,
In the facing region in which the side wall surfaces of the convex portions in the positional relationship are formed to face each other, the portion where the facing distance is minimum exists at a portion excluding the central portion of the facing region ,
At least one convex portion of the convex portions in the positional relationship has a concave portion at a central portion of the facing area,
An imprint mold characterized in that the concave portion is present on the side wall surface of the convex portion having at least a small side wall surface, the sizes of the opposing side wall surfaces of the convex portions in the positional relationship being different . At least a substrate, and a plurality of projections located in a concavo-convex structure area set in one plane of the substrate;
When an opposing distance between a side wall surface of one convex portion and a side wall surface of the other convex portion opposed to the side wall surface, which is an adjacent convex portion, is a distance in a plane parallel to the plane, Having a convex portion in which the minimum value of the facing distance is 50 nm or less,
In the facing region in which the side wall surfaces of the convex portions in the positional relationship are formed to face each other, the portion where the facing distance is minimum exists at a portion excluding the central portion of the facing region,
In the convex portion in the positional relationship, portions where the facing distance is minimum exist in a region excluding a range from 10 nm on both sides from the both ends in the width direction of the facing region toward the central portion. Print mold. At least a substrate, and a plurality of projections located in a concavo-convex structure area set in one plane of the substrate;
When an opposing distance between a side wall surface of one convex portion and a side wall surface of the other convex portion opposed to the side wall surface, which is an adjacent convex portion, is a distance in a plane parallel to the plane, Having a convex portion in which the minimum value of the facing distance is 50 nm or less,
In the facing region in which the side wall surfaces of the convex portions in the positional relationship are formed to face each other, the portion where the facing distance is minimum exists at a portion excluding the central portion of the facing region,
In the convex portion in the positional relationship, when the cross-sectional shape of the convex portion is rectangular, the cross-sectional shape has a roundness such that each side protrudes outward, or a large roundness of the corner portion An imprint mold characterized by being 4. The imprint according to claim 3 , wherein the roundness of the corner is a range in which the roundness is more than 10 nm from the intersection of extrapolations of two sides forming the corner in the cross-sectional shape. mold. At least a substrate, and a plurality of projections located in a concavo-convex structure area set in one plane of the substrate;
When an opposing distance between a side wall surface of one convex portion and a side wall surface of the other convex portion opposed to the side wall surface, which is an adjacent convex portion, is a distance in a plane parallel to the plane, Having a convex portion in which the minimum value of the facing distance is 50 nm or less,
In the facing region in which the side wall surfaces of the convex portions in the positional relationship are formed to face each other, the portion where the facing distance is minimum exists at a portion excluding the central portion of the facing region,
At least one of the convex portions in the positional relationship is characterized in that a convex portion having a width smaller than the width of the convex portion is continued to a side wall surface not facing the other convex portion. Imprint mold. The imprint mold according to any one of claims 1 to 5, wherein the facing distance is maximum at a central portion of the facing region. In the convex portion in the positional relationship, the length in the width direction of the facing region, to one of the claims 1 to 6, characterized in that a 1 to 10 times the range of the minimum value Imprint mold as described. The imprint mold according to any one of claims 2 to 5 , wherein at least one of the convex portions in the positional relationship has a concave portion at a central portion of the facing region. 9. The imprint according to claim 8 , wherein the concave portion is present in the side wall surface of the convex portion having a small side wall surface, and the size of the opposing side wall surface of the convex portion in the positional relationship is different. mold. The concave portion is also present on the side wall surface of the convex portion having the large side wall surface, and the depth and / or width of the concave portion existing on the side wall surface of the convex portion having the small side wall surface The imprint mold according to claim 1 or 9 , wherein depths and / or widths of the depressions present in the side wall surface of the portion are different. Forming a to-be-molded resin material layer on a desired surface of a transfer target;
A portion of a convex portion of the imprint mold according to any one of claims 1 to 10 is pushed into the to-be-molded resin material layer, and the to-be-molded resin material layer is cured in this state to form a resin layer Process,
And separating the resin layer and the imprint mold, and positioning a resin layer having a concave portion corresponding to a convex portion of the mold on the transfer target body. It has at least a base material and a plurality of convex parts located in a concavo-convex structure region set in one plane of the base material, and is an adjacent convex part, and the side from the side wall surface of one convex part The convex portion has a positional relationship in which the minimum value of the opposing distance is 50 nm or less, where the opposing distance to the side wall surface of the other projecting portion opposing the wall surface is a distance in a plane parallel to the plane. In the facing region where the side wall surfaces of the convex portions in the positional relationship are formed facing each other, the portion where the facing distance is the smallest is a portion located at a portion excluding the central portion of the facing region. An imprint method using a print mold, wherein
Forming a to-be-molded resin material layer on a desired surface of a transfer target;
Push the halfway of the convex portion of the imprint mold to the object to be molded resin material layer, a step of the in the state is semi-cured to be molded resin material forming the resin layer,
The step of separating the resin layer and the imprint mold is repeated on a desired region of the resin material layer to be molded, and then the resin layer is cured to have a concave portion corresponding to the convex portion of the mold. An imprint method comprising: positioning a resin layer on the transfer target body. Forming a to-be-molded resin material layer on a desired surface of a transfer target;
A portion of a convex portion of the imprint mold according to any one of claims 1 to 10 is pushed into the to-be-molded resin material layer, and the to-be-molded resin material layer is semi-cured in this state to form a resin layer The process to
The step of separating the resin layer and the imprint mold is repeated on a desired region of the resin material layer to be molded, and then the resin layer is cured to have a concave portion corresponding to the convex portion of the mold. An imprint method comprising: positioning a resin layer on the transfer target body.

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