JP6503675B2 - Charge transporting varnish, charge transporting thin film and organic electroluminescent device - Google Patents
Charge transporting varnish, charge transporting thin film and organic electroluminescent device Download PDFInfo
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- JP6503675B2 JP6503675B2 JP2014200366A JP2014200366A JP6503675B2 JP 6503675 B2 JP6503675 B2 JP 6503675B2 JP 2014200366 A JP2014200366 A JP 2014200366A JP 2014200366 A JP2014200366 A JP 2014200366A JP 6503675 B2 JP6503675 B2 JP 6503675B2
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- 239000002966 varnish Substances 0.000 title claims description 70
- 239000010409 thin film Substances 0.000 title claims description 47
- 125000004432 carbon atom Chemical group C* 0.000 claims description 104
- -1 silane compound Chemical class 0.000 claims description 94
- 125000000217 alkyl group Chemical group 0.000 claims description 51
- 125000005843 halogen group Chemical group 0.000 claims description 48
- 238000000034 method Methods 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 32
- 125000003118 aryl group Chemical group 0.000 claims description 30
- 239000000126 substance Substances 0.000 claims description 28
- 239000002019 doping agent Substances 0.000 claims description 26
- 229910052731 fluorine Inorganic materials 0.000 claims description 26
- 125000003342 alkenyl group Chemical group 0.000 claims description 24
- 125000001153 fluoro group Chemical group F* 0.000 claims description 24
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 24
- 150000003577 thiophenes Chemical class 0.000 claims description 21
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 20
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 20
- 239000003960 organic solvent Substances 0.000 claims description 18
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 16
- 125000003172 aldehyde group Chemical group 0.000 claims description 15
- 125000000304 alkynyl group Chemical group 0.000 claims description 15
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 15
- 229910000077 silane Inorganic materials 0.000 claims description 14
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 13
- 239000011964 heteropoly acid Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 9
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 4
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims description 3
- 125000006736 (C6-C20) aryl group Chemical group 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 description 45
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 43
- 239000002253 acid Substances 0.000 description 16
- 238000002347 injection Methods 0.000 description 15
- 239000007924 injection Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 239000002904 solvent Substances 0.000 description 14
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 12
- 239000007983 Tris buffer Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000010408 film Substances 0.000 description 9
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000007789 sealing Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical class C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000001072 heteroaryl group Chemical group 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- IXHWGNYCZPISET-UHFFFAOYSA-N 2-[4-(dicyanomethylidene)-2,3,5,6-tetrafluorocyclohexa-2,5-dien-1-ylidene]propanedinitrile Chemical compound FC1=C(F)C(=C(C#N)C#N)C(F)=C(F)C1=C(C#N)C#N IXHWGNYCZPISET-UHFFFAOYSA-N 0.000 description 5
- 125000003277 amino group Chemical group 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000005525 hole transport Effects 0.000 description 5
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 5
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 5
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- PRPINYUDVPFIRX-UHFFFAOYSA-N 1-naphthaleneacetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CC=CC2=C1 PRPINYUDVPFIRX-UHFFFAOYSA-N 0.000 description 4
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 4
- FSEXLNMNADBYJU-UHFFFAOYSA-N 2-phenylquinoline Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2)C2=N1 FSEXLNMNADBYJU-UHFFFAOYSA-N 0.000 description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 4
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 125000004986 diarylamino group Chemical group 0.000 description 4
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 4
- 150000004715 keto acids Chemical class 0.000 description 4
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 description 4
- DHRLEVQXOMLTIM-UHFFFAOYSA-N phosphoric acid;trioxomolybdenum Chemical compound O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.OP(O)(O)=O DHRLEVQXOMLTIM-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000002861 polymer material Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 125000003107 substituted aryl group Chemical group 0.000 description 4
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 3
- RICKKZXCGCSLIU-UHFFFAOYSA-N 2-[2-[carboxymethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]ethyl-[[3-hydroxy-5-(hydroxymethyl)-2-methylpyridin-4-yl]methyl]amino]acetic acid Chemical compound CC1=NC=C(CO)C(CN(CCN(CC(O)=O)CC=2C(=C(C)N=CC=2CO)O)CC(O)=O)=C1O RICKKZXCGCSLIU-UHFFFAOYSA-N 0.000 description 3
- POXIZPBFFUKMEQ-UHFFFAOYSA-N 2-cyanoethenylideneazanide Chemical group [N-]=C=[C+]C#N POXIZPBFFUKMEQ-UHFFFAOYSA-N 0.000 description 3
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 150000001448 anilines Chemical class 0.000 description 3
- 239000010405 anode material Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- YGUFXEJWPRRAEK-UHFFFAOYSA-N dodecyl(triethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OCC)(OCC)OCC YGUFXEJWPRRAEK-UHFFFAOYSA-N 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229920000123 polythiophene Polymers 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 229930192474 thiophene Natural products 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ONUFSRWQCKNVSL-UHFFFAOYSA-N 1,2,3,4,5-pentafluoro-6-(2,3,4,5,6-pentafluorophenyl)benzene Chemical group FC1=C(F)C(F)=C(F)C(F)=C1C1=C(F)C(F)=C(F)C(F)=C1F ONUFSRWQCKNVSL-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- WFQFDAGQJUVDKP-UHFFFAOYSA-N 2,8-ditert-butyl-5,11-bis(4-tert-butylphenyl)-6,12-diphenyltetracene Chemical compound C1=CC(C(C)(C)C)=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC(=CC=C2C(C=2C=CC(=CC=2)C(C)(C)C)=C11)C(C)(C)C)=C(C=CC(=C2)C(C)(C)C)C2=C1C1=CC=CC=C1 WFQFDAGQJUVDKP-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- QIYSYNQRYMNDQI-UHFFFAOYSA-N 5-methyl-1-phenylcyclohexa-2,4-diene-1-carboxamide Chemical compound C1(=CC=CC=C1)C1(C(=O)N)CC(=CC=C1)C QIYSYNQRYMNDQI-UHFFFAOYSA-N 0.000 description 2
- VFUDMQLBKNMONU-UHFFFAOYSA-N 9-[4-(4-carbazol-9-ylphenyl)phenyl]carbazole Chemical group C12=CC=CC=C2C2=CC=CC=C2N1C1=CC=C(C=2C=CC(=CC=2)N2C3=CC=CC=C3C3=CC=CC=C32)C=C1 VFUDMQLBKNMONU-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000005362 aryl sulfone group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000013065 commercial product Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
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- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 125000004663 dialkyl amino group Chemical group 0.000 description 2
- DIJRHOZMLZRNLM-UHFFFAOYSA-N dimethoxy-methyl-(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](C)(OC)CCC(F)(F)F DIJRHOZMLZRNLM-UHFFFAOYSA-N 0.000 description 2
- HASCQPSFPAKVEK-UHFFFAOYSA-N dimethyl(phenyl)phosphine Chemical compound CP(C)C1=CC=CC=C1 HASCQPSFPAKVEK-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 125000002541 furyl group Chemical group 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- YERGTYJYQCLVDM-UHFFFAOYSA-N iridium(3+);2-(4-methylphenyl)pyridine Chemical compound [Ir+3].C1=CC(C)=CC=C1C1=CC=CC=N1.C1=CC(C)=CC=C1C1=CC=CC=N1.C1=CC(C)=CC=C1C1=CC=CC=N1 YERGTYJYQCLVDM-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- MQZFZDIZKWNWFX-UHFFFAOYSA-N osmium(2+) Chemical compound [Os+2] MQZFZDIZKWNWFX-UHFFFAOYSA-N 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 2
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- ZRQAIBMAFLMIND-UHFFFAOYSA-N triethoxy(thiophen-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CS1 ZRQAIBMAFLMIND-UHFFFAOYSA-N 0.000 description 1
- CUVIJHAPWYUQIV-UHFFFAOYSA-N triethoxy-[3-(1,1,1,2,3,3,3-heptafluoropropan-2-yloxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOC(F)(C(F)(F)F)C(F)(F)F CUVIJHAPWYUQIV-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- XSVXWCZFSFKRDO-UHFFFAOYSA-N triphenyl-(3-triphenylsilylphenyl)silane Chemical compound C1=CC=CC=C1[Si](C=1C=C(C=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 XSVXWCZFSFKRDO-UHFFFAOYSA-N 0.000 description 1
- DETFWTCLAIIJRZ-UHFFFAOYSA-N triphenyl-(4-triphenylsilylphenyl)silane Chemical compound C1=CC=CC=C1[Si](C=1C=CC(=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 DETFWTCLAIIJRZ-UHFFFAOYSA-N 0.000 description 1
- HITRWHKLCHWBNZ-UHFFFAOYSA-N triphenyl-[4-(9-phenylfluoren-9-yl)phenyl]silane Chemical compound C1=CC=CC=C1C1(C=2C=CC(=CC=2)[Si](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)C2=CC=CC=C2C2=CC=CC=C21 HITRWHKLCHWBNZ-UHFFFAOYSA-N 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
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- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
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- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
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- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
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Description
本発明は、電荷輸送性ワニス、電荷輸送性薄膜及び有機エレクトロルミネッセンス(以下、有機ELという。)素子に関する。 The present invention relates to a charge transporting varnish, a charge transporting thin film and an organic electroluminescent (hereinafter referred to as organic EL) device.
有機EL素子には、発光層や電荷注入層として、有機化合物からなる電荷輸送性薄膜が用いられる。特に、正孔注入層は、陽極と、正孔輸送層あるいは発光層との電荷の授受を担い、有機EL素子の低電圧駆動及び高輝度を達成するために重要な機能を果たす。 For the organic EL element, a charge transporting thin film made of an organic compound is used as a light emitting layer or a charge injection layer. In particular, the hole injection layer is responsible for charge transfer between the anode and the hole transport layer or the light emitting layer, and plays an important function to achieve low voltage drive and high luminance of the organic EL element.
正孔注入層の形成方法は、蒸着法に代表されるドライプロセスとスピンコート法に代表されるウェットプロセスとに大別され、これら各プロセスを比べると、ウェットプロセスの方が大面積に平坦性の高い薄膜を効率的に製造できる。それゆえ、有機ELディスプレイの大面積化が進められている現在、ウェットプロセスで形成可能な正孔注入層が望まれている。 The formation method of the hole injection layer is roughly divided into a dry process represented by a vapor deposition method and a wet process represented by a spin coating method, and comparing these processes, the wet process has a larger area and flatness. Thin films can be produced efficiently. Therefore, as the area of the organic EL display is increased, a hole injection layer that can be formed by a wet process is desired at present.
このような事情に鑑み、本発明者らは、各種ウェットプロセスに適用可能であるとともに、有機EL素子の正孔注入層に適用した場合に優れたEL素子特性を実現できる薄膜を与える電荷輸送性材料や、それに用いる有機溶媒に対する溶解性の良好な化合物を開発してきている(例えば特許文献1〜4参照)。 In view of such circumstances, the present inventors are applicable to various wet processes and charge transportability giving a thin film which can realize excellent EL element characteristics when applied to a hole injection layer of an organic EL element. Compounds having good solubility in materials and organic solvents used therefor have been developed (see, for example, Patent Documents 1 to 4).
本発明は、これまでに開発してきた上記特許文献の技術と同様に、有機EL素子の正孔注入層に適用した場合に優れた特性を実現できる薄膜を与える電荷輸送性ワニスを提供することを目的とする。 The present invention is to provide a charge transportable varnish which gives a thin film which can realize excellent properties when applied to a hole injection layer of an organic EL element, like the technology of the above-mentioned patent documents developed so far. To aim.
本発明者らは、上記目的を達成するために鋭意検討を重ねた結果、所定のチオフェン誘導体からなる電荷輸送性物質と、ドーパントと、有機溶媒とを含むワニスから得られる薄膜が高い電荷輸送性を有し、当該薄膜を有機EL素子の正孔注入層に適用した場合に、優れた輝度特性及び優れた耐久性を実現できることを見出し、本発明を完成させた。 As a result of intensive studies to achieve the above object, the present inventors have found that a thin film obtained from a varnish comprising a charge transportable substance comprising a predetermined thiophene derivative, a dopant, and an organic solvent is highly charge transportable. In the case where the thin film is applied to a hole injection layer of an organic EL device, the present invention has been accomplished, as a result of the finding that excellent luminance characteristics and excellent durability can be realized.
すなわち、本発明は、下記電荷輸送性ワニス、電荷輸送性薄膜及び有機EL素子を提供する。
1.式(1)で表されるチオフェン誘導体からなる電荷輸送性物質と、ヘテロポリ酸を含むドーパントと、有機溶媒と、有機シラン化合物及び下記式(6)で表されるテトラシアノキノジメタン化合物から選ばれる少なくとも1種とを含み、上記有機シラン化合物が、ジアルコキシシラン化合物、トリアルコキシシラン化合物又はテトラアルコキシシラン化合物を含むことを特徴とする電荷輸送性ワニス。
Y1〜Y8は、それぞれ独立に、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基又はZ2で置換されていてもよい炭素数6〜20のアリール基を表し、
Z1は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基又はZ3で置換されていてもよい炭素数6〜20のアリール基を表し、
Z2は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基、Z3で置換されていてもよい炭素数1〜20のアルキル基、Z3で置換されていてもよい炭素数2〜20のアルケニル基又はZ3で置換されていてもよい炭素数2〜20のアルキニル基を表し、
Z3は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基又はカルボン酸基を表し、
n1〜n3は、それぞれ独立に2〜10の整数を表す。)
2.式(1)で表されるチオフェン誘導体からなる電荷輸送性物質と、ヘテロポリ酸を含むドーパントと、有機溶媒と、有機シラン化合物とを含み、上記有機シラン化合物が、ジアルコキシシラン化合物、トリアルコキシシラン化合物又はテトラアルコキシシラン化合物を含む1の電荷輸送性ワニス。
3.上記R 101 〜R 104 が、フッ素原子である1の電荷輸送性ワニス。
4.上記有機シラン化合物が、ジアルコキシシラン又はトリアルコキシシランを含む1〜3のいずれかの電荷輸送性ワニス。
5.1〜4のいずれかの電荷輸送性ワニスを用いて作製される電荷輸送性薄膜。
6.5の電荷輸送性薄膜を有する有機エレクトロルミネッセンス素子。
7.上記電荷輸送性薄膜が、正孔注入層又は正孔輸送層である6の有機エレクトロルミネッセンス素子。
8.1〜4のいずれかの電荷輸送性ワニスを基材上に塗布して焼成することを特徴とする電荷輸送性薄膜の製造方法。
9.5の電荷輸送性薄膜を用いることを特徴とする有機エレクトロルミネッセンス素子の製造方法。
10.1〜4のいずれかの電荷輸送性ワニスを基材上に塗布する工程と、200℃未満の温度で焼成する工程と、を含む電荷輸送性薄膜の製造方法。
That is, the present invention provides the following charge transporting varnish, charge transporting thin film and organic EL device.
1. It is selected from a charge transportable substance comprising a thiophene derivative represented by the formula (1), a dopant containing a heteropoly acid , an organic solvent, an organic silane compound and a tetracyanoquinodimethane compound represented by the following formula (6) at least one and only containing said organic silane compound is a dialkoxy silane compound, a charge-transporting varnish which comprises a trialkoxysilane compound or tetraalkoxysilane compound.
Y 1 to Y 8 each independently represent an alkyl group having carbon atoms which may be have 1-20 substituted with Z 1, alkenyl group which may C2-20 optionally substituted by Z 1, in Z 1 Represents a C2-C20 alkynyl group which may be substituted or a C6-C20 aryl group which may be substituted by Z 2 ,
Z 1 represents a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a sulfonic acid group, a carboxylic acid group, or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 3 ;
Z 2 is a halogen atom, a nitro group, a cyano group, an aldehyde group, hydroxy group, thiol group, sulfonic acid group, a carboxylic acid group, an alkyl group of Z 3 carbon atoms which may be substituted with 1 to 20, Z 3 And an alkenyl group of 2 to 20 carbon atoms which may be substituted or an alkynyl group of 2 to 20 carbon atoms which may be substituted by Z 3 ;
Z 3 represents a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a sulfonic acid group or a carboxylic acid group,
n 1 to n 3 each independently represent an integer of 2 to 10. )
2. A charge transportable substance comprising a thiophene derivative represented by the formula (1), a dopant containing a heteropolyacid, an organic solvent, and an organic silane compound, wherein the organic silane compound is a dialkoxysilane compound, a trialkoxysilane A charge transporting varnish according to 1 which comprises a compound or a tetraalkoxysilane compound.
3. The charge transporting varnish according to 1, wherein each of R 101 to R 104 is a fluorine atom.
4. The charge transporting varnish according to any one of 1 to 3, wherein the organosilane compound comprises dialkoxysilane or trialkoxysilane.
The charge transportable thin film produced using the charge transportable varnish in any one of 5.1-4.
The organic electroluminescent element which has a charge transportable thin film of 6.5.
7. 7. The organic electroluminescent device according to 6, wherein the charge transporting thin film is a hole injection layer or a hole transport layer.
8. A method for producing a charge transporting thin film, comprising applying the charge transporting varnish of any one of 1 to 4 onto a substrate and baking it.
9. 5. A method of manufacturing an organic electroluminescent device, comprising using the charge transporting thin film of 5 .
10. A method for producing a charge transporting thin film, comprising the steps of: applying the charge transporting varnish of any one of 1 to 4 onto a substrate; and baking it at a temperature less than 200 ° C.
本発明で用いるチオフェン誘導体は有機溶媒に溶けやすく、これをドーパントとともに有機溶媒へ溶解させて容易に電荷輸送性ワニスを調製することができる。
本発明の電荷輸送性ワニスから作製した薄膜は高い電荷輸送性を示すため、有機EL素子をはじめとした電子デバイス用薄膜として好適に用いることができる。特に、この薄膜を有機EL素子の正孔注入層に適用することで、輝度特性と耐久性に優れた有機EL素子を得ることができる。
更に、本発明の電荷輸送性ワニスは有機シラン化合物やテトラシアノキノジメタン化合物を含むことによって、従来のものよりも低温で焼成することができ、その場合でも作製した薄膜が高平坦性及び高電荷輸送性を有する。
また、本発明の電荷輸送性ワニスは、スピンコート法やスリットコート法等、大面積に成膜可能な各種ウェットプロセスを用いた場合でも電荷輸送性に優れた薄膜を再現性よく製造できるため、近年の有機EL素子の分野における進展にも十分対応できる。
そして、本発明の電荷輸送性ワニスから得られる薄膜は、帯電防止膜や有機薄膜太陽電池の陽極バッファ層等としても使用できる。
The thiophene derivative used in the present invention is easily soluble in an organic solvent, and it can be dissolved in an organic solvent together with a dopant to easily prepare a charge transporting varnish.
The thin film produced from the charge-transporting varnish of the present invention exhibits high charge-transporting properties, and thus can be suitably used as a thin film for an electronic device including an organic EL element. In particular, by applying this thin film to the hole injection layer of the organic EL element, an organic EL element excellent in luminance characteristics and durability can be obtained.
Furthermore, the charge transporting varnish of the present invention can be fired at a lower temperature than conventional ones by containing an organosilane compound or a tetracyanoquinodimethane compound, and even in such a case, the thin film produced is highly flat and high. It has charge transportability.
Further, the charge transporting varnish of the present invention can reproducibly produce a thin film having excellent charge transporting properties even when various wet processes capable of forming a film on a large area, such as spin coating method and slit coating method, are used. It can sufficiently cope with the recent progress in the field of organic EL elements.
The thin film obtained from the charge transporting varnish of the present invention can also be used as an antistatic film, an anode buffer layer of an organic thin film solar cell, or the like.
[電荷輸送性物質]
本発明の電荷輸送性ワニスは、下記式(1)で表されるチオフェン誘導体からなる電荷輸送性物質を含む。
[Charge transportable substance]
The charge transporting varnish of the present invention comprises a charge transporting substance comprising a thiophene derivative represented by the following formula (1).
なお、本発明において、電荷輸送性とは、導電性と同義であり、正孔輸送性と同義である。電荷輸送性物質は、それ自体に電荷輸送性があるものでもよく、電子受容性物質と共に用いた際に電荷輸送性があるものでもよい。電荷輸送性ワニスは、それ自体に電荷輸送性があるものでもよく、それにより得られる固形膜が電荷輸送性を有するものでもよい。 In the present invention, charge transportability is synonymous with conductivity, and is synonymous with hole transportability. The charge transporting substance may be one having a charge transporting property itself, or may be one having a charge transporting property when used together with an electron accepting substance. The charge transporting varnish may itself be charge transporting, and the solid film obtained thereby may be charge transporting.
R1〜R21は、それぞれ独立に、水素原子、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、カルボン酸基、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基、Z2で置換されていてもよい炭素数6〜20のアリール基、−C(O)Y1基、−OY2基、−SY3基、−C(O)OY4基、−OC(O)Y5基、−C(O)NHY6基又は−C(O)NY7Y8基を表す。 Each of R 1 to R 21 independently represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a carboxylic acid group, a carbon number of 1 to 20 optionally substituted by Z 1 alkyl group, Z 1 in an optionally substituted alkenyl group having 2 to 20 carbon atoms, an alkynyl group which may C2-20 optionally substituted by Z 1, the carbon may be substituted with Z 2 Aryl groups of 6 to 20, —C (O) Y 1 group, —OY 2 group, —SY 3 group, —C (O) OY 4 group, —OC (O) Y 5 group, —C (O) group Represents a NHY 6 group or a -C (O) NY 7 Y 8 group.
Y1〜Y8は、それぞれ独立に、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基又はZ2で置換されていてもよい炭素数6〜20のアリール基を表す。 Y 1 to Y 8 each independently represent an alkyl group having carbon atoms which may be have 1-20 substituted with Z 1, alkenyl group which may C2-20 optionally substituted by Z 1, in Z 1 This represents an alkynyl group having 2 to 20 carbon atoms which may be substituted, or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 2 .
Z1は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基又はZ3で置換されていてもよい炭素数6〜20のアリール基を表す。 Z 1 represents a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a sulfonic acid group, a carboxylic acid group, or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 3 .
Z2は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基、Z3で置換されていてもよい炭素数1〜20のアルキル基、Z3で置換されていてもよい炭素数2〜20のアルケニル基又はZ3で置換されていてもよい炭素数2〜20のアルキニル基を表す。 Z 2 is a halogen atom, a nitro group, a cyano group, an aldehyde group, hydroxy group, thiol group, sulfonic acid group, a carboxylic acid group, an alkyl group of Z 3 carbon atoms which may be substituted with 1 to 20, Z 3 And an alkenyl group of 2 to 20 carbon atoms which may be substituted or an alkynyl group of 2 to 20 carbon atoms which may be substituted by Z 3 .
Z3は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基又はカルボン酸基を表す。 Z 3 represents a halogen atom, a nitro group, a cyano group, an aldehyde group, hydroxy group, thiol group, a sulfonic acid group or carboxylic acid group.
n1〜n3は、それぞれ独立に2〜10の整数を表す。 n 1 to n 3 each independently represent an integer of 2 to 10.
ハロゲン原子としては、フッ素、塩素、臭素、ヨウ素原子等が挙げられる。 As a halogen atom, a fluorine, chlorine, a bromine, an iodine atom etc. are mentioned.
炭素数1〜20のアルキル基としては、直鎖状、分岐鎖状、環状のいずれでもよく、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、s−ブチル基、t−ブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基等の炭素数1〜20の直鎖又は分岐状アルキル基;シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、シクロノニル基、シクロデシル基、ビシクロブチル基、ビシクロペンチル基、ビシクロヘキシル基、ビシクロヘプチル基、ビシクロオクチル基、ビシクロノニル基、ビシクロデシル基等の炭素数3〜20の環状アルキル基などが挙げられる。 The alkyl group having 1 to 20 carbon atoms may be linear, branched, or cyclic, and examples thereof include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl and s. -C1-C20 linear or branched, such as -butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl and n-decyl Alkyl group; cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group, cyclononyl group, cyclodecyl group, bicyclobutyl group, bicyclopentyl group, bicyclohexyl group, bicycloheptyl group, bicyclooctyl group And a cyclic alkyl group having 3 to 20 carbon atoms such as bicyclononyl group and bicyclodecyl group.
炭素数2〜20のアルケニル基の具体例としては、エテニル基、n−1−プロペニル基、n−2−プロペニル基、1−メチルエテニル基、n−1−ブテニル基、n−2−ブテニル基、n−3−ブテニル基、2−メチル−1−プロペニル基、2−メチル−2−プロペニル基、1−エチルエテニル基、1−メチル−1−プロペニル基、1−メチル−2−プロペニル基、n−1−ペンテニル基、n−1−デセニル基、n−1−エイコセニル基等が挙げられる。 Specific examples of the alkenyl group having 2 to 20 carbon atoms include ethenyl group, n-1-propenyl group, n-2-propenyl group, 1-methylethenyl group, n-1-butenyl group, n-2-butenyl group, n-3-butenyl group, 2-methyl-1-propenyl group, 2-methyl-2-propenyl group, 1-ethylethenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, n- 1-pentenyl group, n-1-decenyl group, n-1-eicosenyl group etc. are mentioned.
炭素数2〜20のアルキニル基の具体例としては、エチニル基、n−1−プロピニル基、n−2−プロピニル基、n−1−ブチニル基、n−2−ブチニル基、n−3−ブチニル基、1−メチル−2−プロピニル基、n−1−ペンチニル基、n−2−ペンチニル基、n−3−ペンチニル基、n−4−ペンチニル基、1−メチル−n−ブチニル基、2−メチル−n−ブチニル基、3−メチル−n−ブチニル基、1,1−ジメチル−n−プロピニル基、n−1−ヘキシニル基、n−1−デシニル基、n−1−ペンタデシニル基、n−1−エイコシニル基等が挙げられる。 Specific examples of the alkynyl group having 2 to 20 carbon atoms include ethynyl group, n-1-propynyl group, n-2-propynyl group, n-1-butynyl group, n-2-butynyl group, n-3-butynyl group Group, 1-methyl-2-propynyl group, n-1-pentynyl group, n-2-pentynyl group, n-3-pentynyl group, n-4-pentynyl group, 1-methyl-n-butynyl group, 2- Methyl-n-butynyl group, 3-methyl-n-butynyl group, 1,1-dimethyl-n-propynyl group, n-1-hexynyl group, n-1-decynyl group, n-1-pentadecynyl group, n- 1-eicosinyl group etc. are mentioned.
炭素数6〜20のアリール基の具体例としては、フェニル基、1−ナフチル基、2−ナフチル基、1−アントリル基、2−アントリル基、9−アントリル基、1−フェナントリル基、2−フェナントリル基、3−フェナントリル基、4−フェナントリル基、9−フェナントリル基等が挙げられる。 Specific examples of the aryl group having 6 to 20 carbon atoms include phenyl group, 1-naphthyl group, 2-naphthyl group, 1-anthryl group, 2-anthryl group, 9-anthryl group, 1-phenanthryl group, 2-phenanthryl group Groups, 3-phenanthryl group, 4-phenanthryl group, 9-phenanthryl group and the like.
R1〜R21としては、水素原子又はZ1で置換されていてもよい炭素数1〜20のアルキル基が好ましく、水素原子が最適である。 As R 1 to R 21 , a hydrogen atom or an alkyl group having 1 to 20 carbon atoms which may be substituted with Z 1 is preferable, and a hydrogen atom is optimal.
なお、R1〜R21及びY1〜Y8がアルキル基、アルケニル基、アルキニル基又はアリール基である場合、Z1としては、ハロゲン原子又はZ3で置換されていてもよい炭素数6〜20のアリール基が好ましく、Z3で置換されていてもよいフェニル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。
Z2としては、ハロゲン原子又はZ3で置換されていてもよい炭素数1〜20のアルキル基が好ましく、Z3で置換されていてもよい炭素数1〜10のアルキル基がより好ましく、Z3で置換されていてもよい炭素数1〜8のアルキル基がより一層好ましく、Z3で置換されていてもよい炭素数1〜6のアルキル基が更に好ましく、存在しないこと(すなわち、非置換であること)が最適である。
Z3は、ハロゲン原子が好ましく、フッ素がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。
When R 1 to R 21 and Y 1 to Y 8 are an alkyl group, an alkenyl group, an alkynyl group or an aryl group, as Z 1 , a carbon atom having 6 to 6 carbon atoms which may be substituted by a halogen atom or Z 3 20 aryl groups are preferred, and more preferred is a phenyl group which may be substituted by Z 3 and optimally absent (ie unsubstituted).
The Z 2, a halogen atom or an alkyl group Z 3 carbon atoms which may be substituted with 1 to 20, more preferably an alkyl group having 1 to 10 carbon atoms optionally substituted by Z 3, Z more preferably more alkyl group which may C1-8 be substituted with 3, more preferably an alkyl group having carbon atoms which may be have 1-6 substituted with Z 3, that does not exist (i.e., unsubstituted ) Is the best.
Z 3 is preferably a halogen atom, more preferably fluorine, and most preferably absent (ie, unsubstituted).
以下、式(1)で表されるチオフェン誘導体の具体例を挙げるが、これらに限定されない。 Hereinafter, although the specific example of the thiophene derivative represented by Formula (1) is given, it is not limited to these.
[チオフェン誘導体の製造方法]
本発明で用いるチオフェン誘導体は、例えば、Tetrahedron Letters, 2010, 51(50), pp. 6673-6676、特開2003−167972号公報等に記載の方法に従って合成することができるが、これらの方法に限定されない。
[Method for producing thiophene derivative]
The thiophene derivative used in the present invention can be synthesized, for example, according to the method described in Tetrahedron Letters, 2010, 51 (50), pp. 6673-6676, JP-A No. 2003-167972, etc. It is not limited.
具体的には、例えば、トリフェニルアミン又はその誘導体及びチオフェン又はその誘導体を出発原料として、熊田カップリング、右田・小杉・スティルカップリング、根岸カップリング、鈴木・宮浦カップリング、檜山カップリング等のカップリング反応によって合成することができる。 Specifically, for example, triphenylamine or a derivative thereof and thiophene or a derivative thereof as a starting material, Kumada coupling, Akita-Kosugi-Stil coupling, Negishi coupling, Suzuki-Miyaura coupling, Hayama coupling, etc. It can be synthesized by coupling reaction.
一例を挙げると、式(2)で表されるトリフェニルアミン又はその誘導体をハロゲン化又はスタニル化等し、これとクロスカップリング反応をさせるために、式(3)〜(5)で表されるチオフェン誘導体をスタニル化等又はハロゲン化し、カップリング反応をさせればよい。
この場合、式(3)〜(5)で表されるチオフェン又はその誘導体の仕込み比は、通常、式(2)で表されるトリフェニルアミン又はその誘導体に対し、それぞれ0.5〜1.5当量程度であるが、0.9〜1.3当量程度が好適である。 In this case, the preparation ratio of the thiophene or its derivative represented by the formulas (3) to (5) is generally 0.5 to 1 to the triphenylamine or its derivative represented by the formula (2). Although it is about 5 equivalent, about 0.9 to 1.3 equivalent is suitable.
なお、式(2)〜(5)で表される化合物としては、市販品を使用してもよく、公知の方法で合成してもよい。 In addition, as a compound represented by Formula (2)-(5), a commercial item may be used and you may synthesize | combine by a well-known method.
[ドーパント]
本発明の電荷輸送性ワニスは、ドーパントを含む。ドーパントとしては、特に限定されるものではなく、有機系のドーパント、無機系のドーパントのいずれも用いることができる。
[Dopant]
The charge transporting varnish of the present invention contains a dopant. The dopant is not particularly limited, and either an organic dopant or an inorganic dopant can be used.
中でも、最も好ましい態様としては、本発明の電荷輸送性ワニスは、ドーパントとしてヘテロポリ酸を含み、それゆえ、インジウム錫酸化物(ITO)、インジウム亜鉛酸化物(IZO)に代表される透明電極からの高正孔受容能のみならず、アルミニウムに代表される金属陽極からの高正孔受容能を示す電荷輸送性に優れた薄膜を得ることができる。 Among them, in the most preferred embodiment, the charge transporting varnish of the present invention contains a heteropoly acid as a dopant, and therefore, from a transparent electrode represented by indium tin oxide (ITO) and indium zinc oxide (IZO). It is possible to obtain not only high hole accepting ability but also a thin film excellent in charge transportability showing high hole accepting ability from a metal anode represented by aluminum.
ヘテロポリ酸とは、代表的に式(A1)で示されるKeggin型あるいは式(A2)で示されるDawson型の化学構造で示される、ヘテロ原子が分子の中心に位置する構造を有し、バナジウム(V)、モリブデン(Mo)、タングステン(W)等のオキソ酸であるイソポリ酸と、異種元素のオキソ酸とが縮合してなるポリ酸である。このような異種元素のオキソ酸としては、主にケイ素(Si)、リン(P)、ヒ素(As)のオキソ酸が挙げられる。 Heteropoly acids have a structure in which the hetero atom is located at the center of the molecule, represented by the chemical structure of the Keggin type represented by the formula (A1) or the Dawson type represented by the formula (A2). V) A polyacid formed by condensation of an isopolyacid which is an oxo acid such as molybdenum (Mo) or tungsten (W) and an oxo acid of a different element. Such oxo acids of different elements mainly include oxo acids of silicon (Si), phosphorus (P) and arsenic (As).
ヘテロポリ酸の具体例としては、リンモリブデン酸、ケイモリブデン酸、リンタングステン酸、ケイタングステン酸、リンタングストモリブデン酸等が挙げられる。これらは1種単独で又は2種以上組み合わせて用いてもよい。なお、本発明で用いるヘテロポリ酸は、市販品として入手可能であり、また、公知の方法により合成することもできる。 Specific examples of heteropoly acids include phosphomolybdic acid, silicomolybdic acid, phosphotungstic acid, silicotungstic acid, lintungstomolybdic acid and the like. These may be used alone or in combination of two or more. The heteropoly acid used in the present invention is commercially available, and can be synthesized by a known method.
特に、ドーパントが1種類のヘテロポリ酸からなる場合、その1種類のヘテロポリ酸はリンタングステン酸又はリンモリブデン酸であることが好ましく、リンタングステン酸であることがより好ましい。また、ドーパントが2種類以上のヘテロポリ酸からなる場合、その2種類以上のヘテロポリ酸のうち少なくとも1つはリンタングステン酸又はリンモリブデン酸であることが好ましく、リンタングステン酸であることがより好ましい。 In particular, when the dopant consists of one type of heteropolyacid, the one type of heteropolyacid is preferably phosphotungstic acid or phosphomolybdic acid, and more preferably phosphotungstic acid. When the dopant consists of two or more heteropoly acids, at least one of the two or more hetero poly acids is preferably phosphotungstic acid or phosphomolybdic acid, and more preferably phosphotungstic acid.
なお、ヘテロポリ酸は、元素分析等の定量分析において、一般式で示される構造から元素の数が多いもの又は少ないものであっても、それが市販品として入手したもの、あるいは、公知の合成方法にしたがって適切に合成したものである限り、本発明において用いることができる。 In addition, heteropoly acids are obtained as commercial products even if the number of elements is large or small from the structure represented by the general formula in quantitative analysis such as elemental analysis, or a known synthesis method It can be used in the present invention as long as it is appropriately synthesized according to
すなわち、例えば、一般的にリンタングステン酸は化学式H3(PW12O40)・nH2Oで、リンモリブデン酸は化学式H3(PMo12O40)・nH2Oでそれぞれ表されるが、定量分析において、この式中のP(リン)、O(酸素)又はW(タングステン)若しくはMo(モリブデン)の数が多いもの又は少ないものであっても、それが市販品として入手したもの、あるいは公知の合成方法にしたがって適切に合成したものである限り、本発明において用いることができる。この場合、本発明に規定されるヘテロポリ酸の質量とは、合成物や市販品中における純粋なリンタングステン酸の質量(リンタングステン酸含量)ではなく、市販品として入手可能な形態及び公知の合成法にて単離可能な形態において、水和水やその他の不純物等を含んだ状態での全質量を意味する。 That is, for example, phosphotungstic acid is generally represented by the chemical formula H 3 (PW 12 O 40 ) .nH 2 O, and phosphomolybdic acid is represented by the chemical formula H 3 (PMo 12 O 40 ) .nH 2 O, respectively. In quantitative analysis, even if the number of P (phosphorus), O (oxygen) or W (tungsten) or Mo (molybdenum) in this formula is large or small, it is obtained as a commercial product, or It can be used in the present invention as long as it is appropriately synthesized according to known synthetic methods. In this case, the mass of the heteropoly acid defined in the present invention is not the mass (phosphotungstic acid content) of pure phosphotungstic acid in a synthetic or commercial product, but a commercially available form and known synthesis In the form which can be isolated by the method, it means the total mass in the state including hydration water and other impurities.
本発明の電荷輸送性ワニスに含まれるヘテロポリ酸は、質量比で、電荷輸送性物質1に対して1.0〜70.0程度とすることができるが、好ましくは2.0〜60.0程度、より好ましくは2.5〜55.0程度、より一層好ましくは2.5〜25.0程度である。 The heteropoly acid contained in the charge transporting varnish of the present invention can have a mass ratio of about 1.0 to 70.0 with respect to the charge transporting substance 1, but is preferably 2.0 to 60.0. The degree is more preferably about 2.5 to 55.0, and still more preferably about 2.5 to 25.0.
[有機溶媒]
電荷輸送性ワニスを調製する際に用いられる有機溶媒としては、電荷輸送性物質及びドーパントを良好に溶解し得る高溶解性溶媒を用いることができる。
このような高溶解性溶媒としては、例えば、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン、1,3−ジメチル−2−イミダゾリジノン等の有機溶媒を用いることができる。これらの溶媒は1種単独で、又は2種以上混合して用いることができ、その使用量は、ワニスに使用する溶媒全体に対して5〜100質量%とすることができる。
なお、電荷輸送性物質及びドーパントは、いずれも上記溶媒に完全に溶解していることが好ましい。
[Organic solvent]
As the organic solvent used in preparing the charge transporting varnish, a high solubility solvent which can dissolve the charge transporting substance and the dopant well can be used.
As such a high solubility solvent, for example, an organic solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone and the like may be used. it can. These solvents may be used alone or in combination of two or more, and the amount thereof may be 5 to 100% by mass with respect to the entire solvent used for the varnish.
The charge transporting substance and the dopant are preferably completely dissolved in the solvent.
また、本発明においては、ワニスに、25℃で10〜200mPa・s、特に35〜150mPa・sの粘度を有し、常圧(大気圧)で沸点50〜300℃、特に150〜250℃の高粘度有機溶媒を少なくとも1種類含有させることで、ワニスの粘度の調整が容易になり、その結果、平坦性の高い薄膜を再現性よく与える、用いる塗布方法に応じたワニス調製が可能となる。
高粘度有機溶媒としては、特に限定されるものではなく、例えば、シクロヘキサノール、エチレングリコール、エチレングリコールジグリシジルエーテル、1,3−オクチレングリコール、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、トリプロピレングリコール、1,3−ブタンジオール、2,3−ブタンジオール、1,4−ブタンジオール、プロピレングリコール、へキシレングリコール等が挙げられる。これらの溶媒は単独で用いてもよく、2種以上混合して用いてもよい。
本発明のワニスに用いられる溶媒全体に対する高粘度有機溶媒の添加割合は、固体が析出しない範囲内であることが好ましく、固体が析出しない限りにおいて、添加割合は、5〜80質量%が好ましい。
Further, in the present invention, the varnish has a viscosity of 10 to 200 mPa · s, particularly 35 to 150 mPa · s at 25 ° C., and a boiling point of 50 to 300 ° C., particularly 150 to 250 ° C. at normal pressure (atmospheric pressure). By including at least one high-viscosity organic solvent, adjustment of the viscosity of the varnish becomes easy, and as a result, it becomes possible to prepare a varnish according to the application method to be used, giving a thin film with high flatness with good reproducibility.
The high viscosity organic solvent is not particularly limited. For example, cyclohexanol, ethylene glycol, ethylene glycol diglycidyl ether, 1,3-octylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol 1,3-butanediol, 2,3-butanediol, 1,4-butanediol, propylene glycol, hexylene glycol and the like. These solvents may be used alone or in combination of two or more.
It is preferable that the addition ratio of the high viscosity organic solvent with respect to the whole solvent used for the varnish of this invention is in the range which a solid does not precipitate, and as long as a solid does not precipitate, 5-80 mass% is preferable.
更に、基板に対する濡れ性の向上、溶媒の表面張力の調整、極性の調整、沸点の調整等の目的で、その他の溶媒を、ワニスに使用する溶媒全体に対して1〜90質量%、好ましくは1〜50質量%の割合で混合することもできる。
このような溶媒としては、例えば、エチレングリコールモノブチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、プロピレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート、ジプロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテル、ジアセトンアルコール、γ−ブチロラクトン、エチルラクテート、n−ヘキシルアセテート、ジエチレングリコールモノメチルエーテル等が挙げられるが、これらに限定されるものではない。これらの溶媒は1種単独で又は2種以上混合して用いることができる。
Furthermore, for the purpose of improving the wettability to the substrate, adjusting the surface tension of the solvent, adjusting the polarity, adjusting the boiling point, and the like, the other solvent is preferably 1 to 90% by mass, preferably the entire solvent used in the varnish. It can also be mixed in a proportion of 1 to 50% by mass.
As such solvent, for example, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol Monoethyl ether, diacetone alcohol, γ-butyrolactone, ethyl lactate, n-hexyl acetate, diethylene glycol monomethyl ether and the like can be mentioned, but it is not limited thereto. These solvents may be used alone or in combination of two or more.
本発明のワニスの粘度は、作製する薄膜の厚み等や固形分濃度に応じて適宜設定されるものではあるが、通常、25℃で1〜50mPa・sである。
また、本発明における電荷輸送性ワニスの固形分濃度は、ワニスの粘度及び表面張力等や、作製する薄膜の厚み等を勘案して適宜設定されるものではあるが、通常、0.1〜10.0質量%程度であり、ワニスの塗布性を向上させることを考慮すると、好ましくは0.5〜5.0質量%程度、より好ましくは1.0〜3.0質量%程度である。
Although the viscosity of the varnish of this invention is suitably set according to the thickness etc. and solid content concentration of the thin film to produce, it is 1-50 mPa * s normally at 25 degreeC.
The solid content concentration of the charge transporting varnish in the present invention is appropriately set in consideration of the viscosity and surface tension of the varnish, the thickness of the thin film to be produced, etc. It is about 0% by mass, and preferably about 0.5 to 5.0% by mass, and more preferably about 1.0 to 3.0% by mass, in consideration of improving the coatability of the varnish.
[有機シラン化合物]
本発明の電荷輸送性ワニスは、有機シラン化合物を含むことが好ましい。有機シラン化合物としては、ジアルコキシシラン化合物、トリアルコキシシラン化合物又はテトラアルコキシシラン化合物が挙げられる。これらは1種単独で又は2種以上組み合わせて用いてもよい。
[Organosilane compound]
The charge transporting varnish of the present invention preferably contains an organic silane compound. Examples of the organic silane compound include dialkoxysilane compounds, trialkoxysilane compounds and tetraalkoxysilane compounds. These may be used alone or in combination of two or more.
とりわけ、有機シラン化合物は、ジアルコキシシラン化合物及びトリアルコキシシラン化合物から選ばれる1種を含むことが好ましく、トリアルコキシシラン化合物を含むことがより好ましい。 In particular, the organosilane compound preferably contains one selected from dialkoxysilane compounds and trialkoxysilane compounds, and more preferably contains a trialkoxysilane compound.
ジアルコキシシラン化合物、トリアルコキシシラン化合物及びテトラアルコキシシラン化合物としては、例えば、式(B1)〜(B3)で示されるものが挙げられる。
SiR'2(OR)2 (B1)
SiR'(OR)3 (B2)
Si(OR)4 (B3)
Examples of the dialkoxysilane compound, the trialkoxysilane compound and the tetraalkoxysilane compound include those represented by formulas (B1) to (B3).
SiR ' 2 (OR) 2 (B1)
SiR '(OR) 3 (B2)
Si (OR) 4 (B3)
式中、Rは、それぞれ独立に、Z101で置換されていてもよい炭素数1〜20のアルキル基、Z101で置換されていてもよい炭素数2〜20のアルケニル基、Z101で置換されていてもよい炭素数2〜20のアルキニル基、Z102で置換されていてもよい炭素数6〜20のアリール基又はZ102で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。R'は、それぞれ独立に、Z103で置換されていてもよい炭素数1〜20のアルキル基、Z103で置換されていてもよい炭素数2〜20のアルケニル基、Z103で置換されていてもよい炭素数2〜20のアルキニル基、Z104で置換されていてもよい炭素数6〜20のアリール基又はZ104で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。 In the formula, R is a substituted each independently, Z 101 with an optionally substituted alkyl group having 1 to 20 carbon atoms, an alkenyl group which may C2-20 optionally substituted by Z 101, with Z 101 is an alkynyl group having a carbon number of 2 to 20 even if, heteroaryl aryl or Z 102 good 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 102 Represents R 'is independently, Z 103 alkyl group carbon atoms which may be have 1 to 20 substituted by an alkenyl group which may C2-20 optionally substituted by Z 103, substituted by Z 103 an alkynyl group having 2 to 20 carbon atoms also represents a heteroaryl group the aryl group or Z 104 good 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 104 .
Z101は、ハロゲン原子、Z105で置換されていてもよい炭素数6〜20のアリール基又はZ105で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。
Z102は、ハロゲン原子、Z105で置換されていてもよい炭素数1〜20のアルキル基、Z105で置換されていてもよい炭素数2〜20のアルケニル基又はZ105で置換されていてもよい炭素数2〜20のアルキニル基を表す。
Z 101 represents a halogen atom, the heteroaryl group of the aryl group or Z 105 good 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 105.
Z 102 is a halogen atom, optionally substituted alkenyl group, or Z 105 of is an alkyl group having 1 to 20 carbon atoms also be good 2-20 carbon atoms substituted with Z 105 substituted with Z 105 It also represents an alkynyl group having 2 to 20 carbon atoms.
Z103は、ハロゲン原子、Z105で置換されていてもよい炭素数6〜20のアリール基、Z105で置換されていてもよい炭素数2〜20のヘテロアリール基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基(−NHCONH2)、チオール基、イソシアネート基(−NCO)、アミノ基、−NHY101基又は−NY102Y103基を表す。
Z104は、ハロゲン原子、Z105で置換されていてもよい炭素数1〜20のアルキル基、Z105で置換されていてもよい炭素数2〜20のアルケニル基、Z105で置換されていてもよい炭素数2〜20のアルキニル基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基(−NHCONH2)、チオール基、イソシアネート基(−NCO)、アミノ基、−NHY101基又は−NY102Y103基を表す。
Z 103 is a halogen atom, Z 105 with an optionally substituted aryl group having 6 to 20 carbon atoms, a heteroaryl group which may C2-20 optionally substituted by Z 105, epoxycyclohexyl group, a glycidoxy group represents a methacryloxy group, an acryloxy group, a ureido group (-NHCONH 2), thiol group, isocyanate group (-NCO), amino group, -NHY 101 group or -NY 102 Y 103 groups.
Z 104 is a halogen atom, Z 105 alkyl group carbon atoms which may be have 1 to 20 substituted by an alkenyl group which may C2-20 optionally substituted by Z 105, be substituted with Z 105 Alkynyl group having 2 to 20 carbon atoms, epoxycyclohexyl group, glycidoxy group, methacryloxy group, acryloxy group, ureido group (-NHCONH 2 ), thiol group, isocyanate group (-NCO), amino group, -NHY 101 group or -Represents a NY 102 Y 103 group.
Y101〜Y103は、それぞれ独立に、Z105で置換されていてもよい炭素数1〜20のアルキル基、Z105で置換されていてもよい炭素数2〜20のアルケニル基、Z105で置換されていてもよい炭素数2〜20のアルキニル基、Z105で置換されていてもよい炭素数6〜20のアリール基又はZ105で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。
Z105は、ハロゲン原子、アミノ基、ニトロ基、シアノ基又はチオール基を表す。
Y 101 to Y 103 each independently represent an alkyl group having carbon atoms which may be have 1-20 substituted with Z 105, alkenyl group which may C2-20 optionally substituted by Z 105, with Z 105 an optionally substituted alkynyl group having 2 to 20 carbon atoms, heteroaryl aryl or Z 105 good 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 105 Represents a group.
Z 105 represents a halogen atom, an amino group, a nitro group, a cyano group or a thiol group.
式(B1)〜(B3)におけるハロゲン原子、炭素数1〜20のアルキル基、炭素数2〜20のアルケニル基、炭素数2〜20のアルキニル基及び炭素数6〜20のアリール基としては、上記と同様のものが挙げられる。 As a halogen atom, a C1-C20 alkyl group, a C2-C20 alkenyl group, a C2-C20 alkynyl group and a C6-C20 aryl group in the formulas (B1) to (B3), The same as above can be mentioned.
Rとしては、Z101で置換されていてもよい炭素数1〜20のアルキル基、Z101で置換されていてもよい炭素数2〜20のアルケニル基又はZ102で置換されていてもよい炭素数6〜20のアリール基が好ましく、Z101で置換されていてもよい炭素数1〜6のアルキル基、Z101で置換されていてもよい炭素数2〜6のアルケニル基又はZ102で置換されていてもよいフェニル基がより好ましく、Z101で置換されていてもよい炭素数1〜4のアルキル基又はZ102で置換されていてもよいフェニル基がより一層好ましく、Z101で置換されていてもよいメチル基又はエチル基が更に好ましい。 The R, which may be substituted with an alkyl group, an alkenyl group, or Z 102 good 2 to 20 carbon atoms optionally substituted by Z 101 of carbon atoms which may be have 1-20 substituted with Z 101 carbon preferably an aryl group having 6 to 20, substituted with an alkyl group, an alkenyl group, or Z 102 2-6 carbon atoms which may be substituted with Z 101 of carbon atoms which may be have 1-6 substituted with Z 101 more preferably a phenyl group which is, more preferably more even a phenyl group substituted with an alkyl group or Z 102 of 1 to 4 carbon atoms which may be substituted with Z 101, is substituted with Z 101 More preferably, they may be methyl or ethyl.
また、R'としては、Z103で置換されていてもよい炭素数1〜20のアルキル基又はZ104で置換されていてもよい炭素数6〜20のアリール基が好ましく、Z103で置換されていてもよい炭素数1〜10のアルキル基又はZ104で置換されていてもよい炭素数6〜14のアリール基がより好ましく、Z103で置換されていてもよい炭素数1〜6のアルキル基又はZ104で置換されていてもよい炭素数6〜10のアリール基がより一層好ましく、Z103で置換されていてもよい炭素数1〜4のアルキル基又はZ104で置換されていてもよいフェニル基が更に好ましい。 As R ′, an alkyl group having 1 to 20 carbon atoms which may be substituted with Z 103 or an aryl group having 6 to 20 carbons which may be substituted with Z 104 is preferable, and R ′ is substituted with Z 103 An alkyl group of 1 to 10 carbon atoms which may be substituted or an aryl group of 6 to 14 carbon atoms which may be substituted by Z 104 is more preferable, and an alkyl of 1 to 6 carbon atoms which may be substituted by Z 103 Still more preferably, the aryl group having 6 to 10 carbon atoms which may be substituted with a group or Z 104 , and even if substituted with an alkyl group having 1 to 4 carbon atoms which may be substituted with Z 103 or Z 104 More preferred are phenyl groups.
なお、複数のRは全て同一でも異なっていてもよく、複数のR'も全て同一でも異なっていてもよい。 The plurality of R's may be all the same or different, and the plurality of R's may be all the same or different.
Z101としては、ハロゲン原子又はZ105で置換されていてもよい炭素数6〜20のアリール基が好ましく、フッ素原子又はZ105で置換されていてもよいフェニル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。 As Z 101 , a halogen atom or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 105 is preferable, and a fluorine atom or a phenyl group which may be substituted with Z 105 is more preferable, and is absent ( That is, non-substitution is optimal.
また、Z102としては、ハロゲン原子又はZ105で置換されていてもよい炭素数6〜20のアルキル基が好ましく、フッ素原子又はZ105で置換されていてもよい炭素数1〜10のアルキル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。 As the Z 102, a halogen atom or Z is preferably an alkyl group which may having 6 to 20 carbon atoms optionally substituted by 105, a fluorine atom or Z 105 of carbon atoms which may be have 1 to 10 substituted by an alkyl group Is more preferred, and absent (i.e., unsubstituted) is optimal.
一方、Z103としては、ハロゲン原子、Z105で置換されていてもよいフェニル基、Z105で置換されていてもよいフラニル基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基、チオール基、イソシアネート基、アミノ基、Z105で置換されていてもよいフェニルアミノ基又はZ104で置換されていてもよいジフェニルアミノ基が好ましく、ハロゲン原子がより好ましく、フッ素原子又は存在しないこと(すなわち、非置換であること)がより一層好ましい。 On the other hand, the Z 103, a halogen atom, Z 105 phenyl group which may be substituted by, may furanyl group optionally substituted by Z 105, epoxycyclohexyl group, a glycidoxy group, a methacryloxy group, an acryloxy group, a ureido group, A thiol group, an isocyanate group, an amino group, a phenylamino group optionally substituted by Z 105 , or a diphenylamino group optionally substituted by Z 104 is preferable, a halogen atom is more preferable, and a fluorine atom or absence thereof ( That is, unsubstituted) is even more preferable.
また、Z104としては、ハロゲン原子、Z105で置換されていてもよい炭素数1〜20のアルキル基、Z105で置換されていてもよいフラニル基、エポキシシクロヘキシル基、グリシドキシ基、メタクリロキシ基、アクリロキシ基、ウレイド基、チオール基、イソシアネート基、アミノ基、Z105で置換されていてもよいフェニルアミノ基又はZ105で置換されていてもよいジフェニルアミノ基が好ましく、ハロゲン原子がより好ましく、フッ素原子又は存在しないこと(すなわち、非置換であること)がより一層好ましい。 As the Z 104, a halogen atom, Z 105 carbon atoms which may be substituted with 1 to 20 alkyl group, which may be furanyl substituted with Z 105, epoxycyclohexyl group, a glycidoxy group, a methacryloxy group, An acryloxy group, a ureido group, a thiol group, an isocyanate group, an amino group, a phenylamino group optionally substituted by Z 105 , or a diphenylamino group optionally substituted by Z 105 is preferable, a halogen atom is more preferable, and fluorine is preferable. Even more preferred are atoms or absence (ie, unsubstituted).
そして、Z105としては、ハロゲン原子が好ましく、フッ素原子又は存在しないこと(すなわち、非置換であること)がより好ましい。 And, as Z 105 , a halogen atom is preferable, and a fluorine atom or absence (that is, being unsubstituted) is more preferable.
以下、本発明で使用可能な有機シラン化合物の具体例を挙げるが、これらに限定されるものではない。
ジアルコキシシラン化合物の具体例としては、ジメチルジメトキシシラン、ジメチルジエトキシシラン、メチルエチルジメトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、メチルプロピルジメトキシシラン、メチルプロピルジエトキシシラン、ジイソプロピルジメトキシシラン、フェニルメチルジメトキシシラン、ビニルメチルジメトキシシラン、3−グリシドキシプロピルメチルジメトキシシシラン、3−グリシドキシプロピルメチルジエトキシシシラン、3−(3,4−エポキシシクロヘキシル)エチルメチルジメトキシシラン、3−メタクリロキシプロピルメチルジメトキシシラン、3−メタクリロキシプロピルメチルジエトキシシラン、3−メルカプトプロピルメチルジメトキシシラン、3−アミノプロピルメチルジエトキシシラン、N−(2−アミノエチル)アミノプロピルメチルジメトキシシラン、3,3,3−トリフルオロプロピルメチルジメトキシシラン等が挙げられる。
Hereinafter, although the specific example of the organic silane compound which can be used by this invention is given, it is not limited to these.
Specific examples of the dialkoxysilane compound include dimethyldimethoxysilane, dimethyldiethoxysilane, methylethyldimethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, methylpropyldimethoxysilane, methylpropyldiethoxysilane, diisopropyldimethoxysilane, phenylmethylsilane Dimethoxysilane, vinylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3- (3,4-epoxycyclohexyl) ethylmethyldimethoxysilane, 3-methacryloxy Propylmethyldimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-aminopropylmethyone Diethoxy silane, N- (2- aminoethyl) aminopropyl methyl dimethoxy silane, 3,3,3-trifluoropropyl methyl dimethoxy silane, and the like.
トリアルコキシシラン化合物の具体例としては、メチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、ブチルトリメトキシシラン、ブチルトリエトキシシラン、ペンチルトリメトキシシラン、ペンチルトリエトキシシラン、ヘプチルトリメトキシシラン、ヘプチルトリエトキシシラン、オクチルトリメトキシシラン、オクチルトリエトキシシラン、ドデシルトリメトキシシラン、ドデシルトリエトキシシラン、ヘキサデシルトリメトキシシラン、ヘキサデシルトリエトキシシラン、オクタデシルトリメトキシシラン、オクタデシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、3−メタクリロキシプロピルトリメトキシシラン、3−メタクリロキシプロピルトリエトキシシラン、トリエトキシ(4−(トリフルオロメチル)フェニル)シラン、ドデシルトリエトキシシラン、3,3,3−トリフルオロプロピルトリメトキシシラン、(トリエトキシシリル)シクロヘキサン、パーフルオロオクチルエチルトリエトキシシラン、トリエトキシフルオロシラン、トリデカフルオロ−1,1,2,2−テトラヒドロオクチルトリエトキシシラン、ペンタフルオロフェニルトリメトキシシラン、ペンタフルオロフェニルトリエトキシシラン、3−(ヘプタフルオロイソプロポキシ)プロピルトリエトキシシラン、ヘプタデカフルオロ−1,1,2,2−テトラヒドロデシルトリエトキシシラン、トリエトキシ−2−チエニルシラン、3−(トリエトキシシリル)フラン等が挙げられる。 Specific examples of trialkoxysilane compounds include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, butyltrimethoxysilane, butyltriethoxysilane, Pentyltrimethoxysilane, pentyltriethoxysilane, heptyltrimethoxysilane, heptyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxy Silane, octadecyltrimethoxysilane, octadecyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, biphenyl Trimethoxysilane, vinyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-methacryloxypropyl Trimethoxysilane, 3-methacryloxypropyltriethoxysilane, triethoxy (4- (trifluoromethyl) phenyl) silane, dodecyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, (triethoxysilyl) cyclohexane Perfluorooctylethyltriethoxysilane, triethoxyfluorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane, pentafluorophenyltrimethoxysilane, pentafluro Orophenyltriethoxysilane, 3- (heptafluoroisopropoxy) propyltriethoxysilane, heptadecafluoro-1,1,2,2-tetrahydrodecyltriethoxysilane, triethoxy-2-thienylsilane, 3- (triethoxysilyl) And the like.
テトラアルコキシシラン化合物の具体例としては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン等が挙げられる。 Specific examples of the tetraalkoxysilane compound include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane and the like.
これらの中でも、3,3,3−トリフルオロプロピルメチルジメトキシシラン、トリエトキシ(4−(トリフルオロメチル)フェニル)シラン、3,3,3−トリフルオロプロピルトリメトキシシラン、パーフルオロオクチルエチルトリエトキシシラン、ペンタフルオロフェニルトリメトキシシラン、ペンタフルオロフェニルトリエトキシシラン等が好ましい。 Among these, 3,3,3-trifluoropropylmethyldimethoxysilane, triethoxy (4- (trifluoromethyl) phenyl) silane, 3,3,3-trifluoropropyltrimethoxysilane, perfluorooctylethyltriethoxysilane , Pentafluorophenyltrimethoxysilane, pentafluorophenyltriethoxysilane, etc. are preferable.
本発明の電荷輸送性ワニスにおける有機シラン化合物の含有量は、電荷輸送性物質及びドーパントの総質量に対して、通常0.1〜50質量%程度であるが、得られる薄膜の電荷輸送性の低下を抑制し、かつ、正孔輸送層や発光層といった陽極とは反対側に正孔注入層に接するように積層される層への正孔注入能を高めることを考慮すると、好ましくは0.5〜40質量%程度、より好ましくは0.8〜30質量%程度、より一層好ましくは1〜20質量%程度である。 The content of the organosilane compound in the charge transporting varnish of the present invention is usually about 0.1 to 50% by mass with respect to the total mass of the charge transporting substance and the dopant, but the charge transporting property of the obtained thin film In consideration of suppressing the decrease and enhancing the hole injecting ability to a layer such as the hole transporting layer or the light emitting layer, which is laminated to be in contact with the hole injecting layer on the opposite side to the anode, it is preferably 0. It is about 5 to 40% by mass, more preferably about 0.8 to 30% by mass, and still more preferably about 1 to 20% by mass.
[テトラシアノキノジメタン化合物]
本発明の電荷輸送性ワニスは、式(6)で表されるテトラシアノキノジメタン化合物を含むことが好ましい。テトラシアノキノジメタン化合物を含むことで、得られる薄膜を有機EL素子の正孔注入層として用いた場合に、その輝度等の特性が更に向上する。また、ワニスを低温焼成した場合においても、高平坦性及び高電荷輸送性の薄膜を再現性よく製造できる。
The charge transporting varnish of the present invention preferably contains the tetracyanoquinodimethane compound represented by the formula (6). When the thin film obtained is used as a positive hole injection layer of an organic EL element by containing a tetracyano quinodimethane compound, characteristics, such as the brightness | luminance, further improve. In addition, even when the varnish is fired at a low temperature, a thin film with high flatness and high charge transportability can be produced with good reproducibility.
式中、R101〜R104は、それぞれ独立に、水素原子又はハロゲン原子を表すが、少なくとも1つはハロゲン原子である。ハロゲン原子としては上記と同じものが挙げられ、フッ素原子又は塩素原子が好ましく、フッ素原子がより好ましい。また、R101〜R104の少なくとも2つがハロゲン原子であることが好ましく、少なくとも3つがハロゲン原子であることがより好ましく、全てがハロゲン原子であることが最も好ましい。 Wherein, R 101 to R 104 each independently represent a hydrogen atom or a halogen atom, at least one is a halogen atom. As a halogen atom, the same thing as the above is mentioned, A fluorine atom or a chlorine atom is preferable, and a fluorine atom is more preferable. In addition, at least two of R 101 to R 104 are preferably halogen atoms, more preferably at least three are halogen atoms, and most preferably all are halogen atoms.
テトラシアノキノジメタン化合物として具体的には、テトラフルオロテトラシアノキノジメタン(F4TCNQ)、テトラクロロテトラシアノキノジメタン、2−フルオロテトラシアノキノジメタン、2−クロロテトラシアノキノジメタン、2,5−ジフルオロテトラシアノキノジメタン、2,5−ジクロロテトラシアノキノジメタン等が挙げられる。テトラシアノキノジメタン化合物として特に好ましくは、F4TCNQである。 Specific examples of the tetracyanoquinodimethane compound include tetrafluorotetracyanoquinodimethane (F4TCNQ), tetrachlorotetracyanoquinodimethane, 2-fluorotetracyanoquinodimethane, 2-chlorotetracyanoquinodimethane, 2 Examples include 5-difluorotetracyanoquinodimethane, 2,5-dichlorotetracyanoquinodimethane and the like. Particularly preferred as the tetracyanoquinodimethane compound is F4TCNQ.
本発明の電荷輸送性ワニスにおけるテトラシアノキノジメタン化合物の含有量は、チオフェン誘導体に対して、好ましくは0.0001〜1当量、より好ましくは0.001〜0.5当量、更に好ましくは0.01〜0.2当量である。 The content of the tetracyanoquinodimethane compound in the charge transporting varnish of the present invention is preferably 0.0001 to 1 equivalent, more preferably 0.001 to 0.5 equivalent, still more preferably 0 with respect to the thiophene derivative. .01 to 0.2 equivalents.
[その他の成分]
本発明の電荷輸送性ワニスは、上述したチオフェン誘導体のほかに、本発明の効果を妨げない限り、その他の電荷輸送性物質を含んでもよい。また、本発明の電荷輸送性ワニスは、ドーパントとして、上述したヘテロポリ酸の代わりに、その他の物質を含んでもよい。
[Other ingredients]
The charge transporting varnish of the present invention may contain, in addition to the thiophene derivative described above, other charge transporting substances as long as the effects of the present invention are not impaired. In addition, the charge transporting varnish of the present invention may contain other substance as a dopant instead of the above-mentioned heteropoly acid.
その他の電荷輸送性物質としては、例えば、特開2002−151272号公報記載のオリゴアニリン誘導体、国際公開第2004/105446号記載のオリゴアニリン化合物、国際公開第2005/043962号記載の1,4−ジチイン環を有する化合物、国際公開第2008/032617号記載のオリゴアニリン化合物、国際公開第2008/032616号記載のオリゴアニリン化合物、国際公開第2013/042623号記載のアリールジアミン化合物等が挙げられる。 As other charge transporting substances, for example, oligoaniline derivatives described in JP-A-2002-151272, oligoaniline compounds described in WO 2004/105446, 1,4- described in WO 2005/043962 Examples thereof include compounds having a dithiin ring, oligoaniline compounds described in WO 2008/032617, oligoaniline compounds described in WO 2008/032616, aryl diamine compounds described in WO 2013/042623, and the like.
とりわけ、その他の電荷輸送性物質としては、アニリン誘導体が好ましく、有機溶媒への溶解性を考慮すると、その分子量は、好ましく4,000以下、より好ましくは3,000以下、より一層好ましくは2,000以下である。 Among other charge transport materials, aniline derivatives are preferred, and in view of solubility in organic solvents, their molecular weight is preferably 4,000 or less, more preferably 3,000 or less, and even more preferably 2, It is less than 000.
本発明において、その他の電荷輸送性物質として好適に用い得るアニリン誘導体としては、例えば、式(7)で表されるものが挙げられる。
B1は、単結合、−NH−、−CH2−、−S−又は−O−を表すが、単結合又は−NH−が好ましい。 B 1 represents a single bond, -NH-, -CH 2- , -S- or -O-, preferably a single bond or -NH-.
R201〜R206は、それぞれ独立に、水素原子、ハロゲン原子、Z201で置換されていてもよい炭素数1〜20のアルキル基、Z201で置換されていてもよい炭素数2〜20のアルケニル基、Z201で置換されていてもよい炭素数2〜20のアルキニル基、Z202で置換されていてもよい炭素数6〜20のアリール基、Z202で置換されていてもよい炭素数2〜20のヘテロアリール基、−OY201基、−SY202基、−NHY203、−NY204Y205基、又は−NHC(O)Y206基を表す。Y201〜Y206は、それぞれ独立に、Z201で置換されていてもよい炭素数1〜20のアルキル基、Z201で置換されていてもよい炭素数2〜20のアルケニル基、Z201で置換されていてもよい炭素数2〜20のアルキニル基、Z202で置換されていてもよい炭素数6〜20のアリール基又はZ202で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。このようなハロゲン原子、アルキル基、アルケニル基、アルケニル基、アリール基及びヘテロアリール基の具体例としては、上記と同様のものが挙げられる。 R 201 to R 206 are each independently a hydrogen atom, a halogen atom, an alkyl group having carbon atoms which may be have 1-20 substituted with Z 201, which may be 2-20 carbons substituted with Z 201 alkenyl group, an alkynyl group which may C2-20 optionally substituted by Z 201, which may be substituted aryl group having 6 to 20 carbon atoms in Z 202, carbon atoms, which may be substituted with Z 202 2-20 heteroaryl group, -OY 201 group, -SY 202 group, -NHY 203, representing the -NY 204 Y 205 groups, or -NHC (O) Y 206 groups. Y 201 to Y 206 each independently represent an alkyl group having carbon atoms which may be have 1-20 substituted with Z 201, alkenyl group which may C2-20 optionally substituted by Z 201, with Z 201 an optionally substituted alkynyl group having 2 to 20 carbon atoms, heteroaryl aryl or Z 202 good 2 to 20 carbon atoms optionally substituted by from 6 to 20 carbon atoms which may be substituted with Z 202 Represents a group. As specific examples of such a halogen atom, an alkyl group, an alkenyl group, an alkenyl group, an aryl group and a heteroaryl group, the same as described above can be mentioned.
Z201は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基、Z203で置換されていてもよい炭素数6〜20のアリール基又はZ203で置換されていてもよい炭素数2〜20のヘテロアリール基を表す。
Z202は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基、Z203で置換されていてもよい炭素数1〜20のアルキル基、Z203で置換されていてもよい炭素数2〜20のアルケニル基又はZ203で置換されていてもよい炭素数2〜20のアルキニル基を表す。
Z203は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基又はカルボン酸基を表す。
Z 201 is a halogen atom, a nitro group, a cyano group, an aldehyde group, hydroxy group, thiol group, sulfonic acid group, a carboxylic acid group, an aryl group, or Z 203 of carbon atoms which may be have 6-20 substituted with Z 203 And a heteroaryl group having 2 to 20 carbon atoms which may be substituted with
Z 202 is a halogen atom, a nitro group, a cyano group, an aldehyde group, hydroxy group, thiol group, sulfonic acid group, a carboxylic acid group, an alkyl group having carbon atoms which may be have 1-20 substituted with Z 203, Z 203 And an alkenyl group of 2 to 20 carbon atoms which may be substituted or an alkynyl group of 2 to 20 carbon atoms which may be substituted by Z 203 .
Z 203 represents a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a sulfonic acid group or a carboxylic acid group.
R201〜R204としては、水素原子、ハロゲン原子、Z201で置換されていてもよい炭素数1〜20のアルキル基、Z202で置換されていてもよい炭素数6〜20のアリール基、Z201で置換されていてもよい炭素数1〜20のアルコキシ基(すなわち、Y201がZ201で置換されていてもよい炭素数1〜20のアルキル基である−OY201基)が好ましく、水素原子、フッ素原子、Z201で置換されていてもよい炭素数1〜10のアルキル基、Z202で置換されていてもよい炭素数6〜14のアリール基、Z201で置換されていてもよい炭素数1〜10のアルコキシ基がより好ましく、水素原子、フッ素原子、Z201で置換されていてもよい炭素数1〜6のアルキル基、Z202で置換されていてもよい6〜10のアリール基、Z201で置換されていてもよい炭素数1〜6のアルコキシ基がより一層好ましく、水素原子、フッ素原子、Z201で置換されていてもよい炭素数1〜6のアルキル基、Z201で置換されていてもよい炭素数1〜6のアルコキシ基が更に好ましく、水素原子が最適である。 R 201 to R 204 each represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms which may be substituted with Z 201 , an aryl group having 6 to 20 carbon atoms which may be substituted with Z 202 , The alkoxy group having 1 to 20 carbon atoms which may be substituted with Z 201 (ie, -OY 201 group which is an alkyl group having 1 to 20 carbon atoms which Y 201 may be substituted with Z 201 ) is preferable, hydrogen atom, a fluorine atom, an alkyl group having carbon atoms which may be have 1 to 10 substituted by Z 201, which may be substituted aryl group having 6 to 14 carbon atoms in Z 202, which may be substituted with Z 201 An alkoxy group having 1 to 10 carbon atoms is more preferable, and a hydrogen atom, a fluorine atom, an alkyl group having 1 to 6 carbon atoms optionally substituted by Z 201 , and 6 to 10 optionally substituted by Z 202 aryl group, optionally carbon substituted with Z 201 More preferably more an alkoxy group having 1 to 6, a hydrogen atom, a fluorine atom, an optionally substituted alkyl group having 1 to 6 carbon atoms in Z 201, Z 201 carbon atoms which may be substituted with 1-6 More preferred is an alkoxy group, with a hydrogen atom being most preferred.
一方、R205及びR206としては、水素原子、ハロゲン原子、各々のアルキル基がZ201で置換されていてもよい炭素数1〜20のアルキル基であるジアルキルアミノ基(すなわち、Y204及びY205がZ201で置換されていてもよい炭素数1〜20のアルキル基である−NY204Y205基)、又は各々のアリール基がZ202で置換されていてもよい炭素数6〜20のアリール基であるジアリールアミノ基(すなわち、Y204及びY205がZ201で置換されていてもよい炭素数6〜20のアリール基である−NY204Y205基)が好ましく、水素原子、フッ素原子、各々のアルキル基がZ201で置換されていてもよい炭素数1〜20のアルキル基であるジアルキルアミノ基、又は各々のアリール基がZ202で置換されていてもよい炭素数6〜20のアリール基であるジアリールアミノ基がより好ましく、水素原子、各々のアリール基がZ202で置換されていてもよい炭素数6〜20のアリール基であるジアリールアミノ基がより一層好ましく、同時に水素原子又は各々のアリール基がZ202で置換されていてもよい炭素数6〜20のアリール基であるジアリールアミノ基が更に好ましい。 On the other hand, as R 205 and R 206 , a dialkylamino group which is a hydrogen atom, a halogen atom, or an alkyl group having 1 to 20 carbon atoms in which each alkyl group may be substituted with Z 201 (ie, Y 204 and Y And C 205 -C 20 alkyl group optionally substituted with Z 201 -NY 204 Y 205 group), or each aryl group optionally substituted with Z 202- C 6-20 carbon atoms The aryl group is preferably a diarylamino group (ie, Y 204 and Y 205 are aryl groups having 6 to 20 carbon atoms which may be substituted with Z 201 -NY 204 Y 205 group), and a hydrogen atom or a fluorine atom And a dialkylamino group in which each alkyl group is an alkyl group having 1 to 20 carbon atoms which may be substituted by Z 201 , or each aryl group is optionally substituted by Z 202 . It is an aryl group More preferably a diarylamino group, a hydrogen atom, more preferably a diarylamino group substituted aryl group having 6 to 20 carbon atoms which may in each aryl group Z 202, at the same time hydrogen atoms or each aryl group Further preferred is a diarylamino group which is an aryl group having 6 to 20 carbon atoms which may be substituted with Z 202 .
式(7)において、p及びqは、それぞれ独立に0以上の整数を表し、2≦p+q≦20を満たすが、好ましくは2≦p+q≦8、より好ましくは2≦p+q≦6、より一層好ましくは2≦p+q≦4を満たす。 In the formula (7), p and q each independently represent an integer of 0 or more and satisfy 2 ≦ p + q ≦ 20, preferably 2 ≦ p + q ≦ 8, more preferably 2 ≦ p + q ≦ 6, and still more preferably Satisfies 2 ≦ p + q ≦ 4.
特に、R201〜R206及びY201〜Y206において、Z201は、Z202で置換されていてもよい炭素数6〜20のアリール基が好ましく、Z202で置換されていてもよいフェニル基がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。
また、Z202は、Z201で置換されていてもよい炭素数1〜20のアルキル基が好ましく、Z201で置換されていてもよい炭素数1〜10のアルキル基がより好ましく、Z201で置換されていてもよい炭素数1〜8のアルキル基がより一層好ましく、Z201で置換されていてもよい炭素数1〜6のアルキル基が更に好ましく、存在しないこと(すなわち、非置換であること)が最適である。
Z203は、ハロゲン原子が好ましく、フッ素がより好ましく、存在しないこと(すなわち、非置換であること)が最適である。
In particular, the R 201 to R 206 and Y 201 ~Y 206, Z 201 is an aryl group having 6 to 20 carbon atoms are preferable optionally substituted by Z 202, a phenyl group which may be substituted with Z 202 Is more preferred, and absent (i.e., unsubstituted) is optimal.
Further, Z 202 is preferably an alkyl group having 1 to 20 carbon atoms that may be substituted with Z 201, more preferably an alkyl group having 1 to 10 carbon atoms optionally substituted by Z 201, with Z 201 The alkyl group having 1 to 8 carbon atoms which may be substituted is more preferable, and the alkyl group having 1 to 6 carbon atoms which may be substituted by Z 201 is more preferable and absent (that is, it is unsubstituted) ) Is the best.
Z 203 is preferably a halogen atom, more preferably fluorine, and most preferably absent (ie, unsubstituted).
以下、本発明において、その他の電荷輸送性物質として好適なアニリン誘導体の具体例を挙げるが、これらに限定されない。
一方、ドーパントとなるその他の物質としては、例えば、ベンゼンスルホン酸、トシル酸、p−スチレンスルホン酸、2−ナフタレンスルホン酸、4−ヒドロキシベンゼンスルホン酸、5−スルホサリチル酸、p−ドデシルベンゼンスルホン酸、ジヘキシルベンゼンスルホン酸、2,5−ジヘキシルベンゼンスルホン酸、ジブチルナフタレンスルホン酸、6,7−ジブチル−2−ナフタレンスルホン酸、ドデシルナフタレンスルホン酸、3−ドデシル−2−ナフタレンスルホン酸、ヘキシルナフタレンスルホン酸、4−ヘキシル−1−ナフタレンスルホン酸、オクチルナフタレンスルホン酸、2−オクチル−1−ナフタレンスルホン酸、ヘキシルナフタレンスルホン酸、7−へキシル−1−ナフタレンスルホン酸、6−ヘキシル−2−ナフタレンスルホン酸、ジノニルナフタレンスルホン酸、2,7−ジノニル−4−ナフタレンスルホン酸、ジノニルナフタレンジスルホン酸、2,7−ジノニル−4,5−ナフタレンジスルホン酸、国際公開第2005/000832号に記載されている1,4−ベンゾジオキサンジスルホン酸化合物、国際公開第2006/025342号に記載されているアリールスルホン酸化合物、国際公開第2009/096352号に記載されているアリールスルホン酸化合物、ポリスチレンスルホン酸等のアリールスルホン化合物;10−カンファースルホン酸等の非アリールスルホン化合物;7,7,8,8−テトラシアノキノジメタン(TCNQ)、2,3−ジクロロ−5,6−ジシアノ−1,4−ベンゾキノン(DDQ)等の有機酸化剤が挙げられる。 On the other hand, as other substances to be dopants, for example, benzenesulfonic acid, tosyl acid, p-styrenesulfonic acid, 2-naphthalenesulfonic acid, 4-hydroxybenzenesulfonic acid, 5-sulfosalicylic acid, p-dodecylbenzenesulfonic acid , Dihexylbenzenesulfonic acid, 2,5-dihexylbenzenesulfonic acid, dibutylnaphthalenesulfonic acid, 6,7-dibutyl-2-naphthalenesulfonic acid, dodecylnaphthalenesulfonic acid, 3-dodecyl-2-naphthalenesulfonic acid, hexylnaphthalene sulfone Acid, 4-hexyl-1-naphthalenesulfonic acid, octylnaphthalenesulfonic acid, 2-octyl-1-naphthalenesulfonic acid, hexylnaphthalenesulfonic acid, 7-hexyl-1-naphthalenesulfonic acid, 6-hexyl-2-naphthalate Sulfonic acid, dinonylnaphthalenesulfonic acid, 2,7-dinonyl-4-naphthalenesulfonic acid, dinonylnaphthalenedisulfonic acid, 2,7-dinonyl-4,5-naphthalenedisulfonic acid, as described in WO 2005/000832 1,4-benzodioxane disulfonic acid compounds, aryl sulfonic acid compounds described in WO 2006/025342, aryl sulfonic acid compounds described in WO 2009/096352, polystyrene sulfonic acid Aryl sulfone compounds such as 10; and non-aryl sulfone compounds such as 10-camphorsulfonic acid; 7,7,8,8-tetracyanoquinodimethane (TCNQ), 2,3-dichloro-5,6-dicyano-1,4. -Organic oxidizing agents such as benzoquinone (DDQ) can be mentioned.
これらの中でも、ドーパントとなるその他の物質としては、アリールスルホン酸化合物が好ましく、有機溶媒への溶解性を考慮すると、その分子量は、好ましく3,000以下、より好ましくは2,000以下、より一層好ましくは1,000以下である。 Among these, as other substances to be dopants, arylsulfonic acid compounds are preferable, and in view of solubility in organic solvents, their molecular weight is preferably 3,000 or less, more preferably 2,000 or less, or more Preferably it is 1,000 or less.
本発明において、ドーパントとして好適に用い得るアリールスルホン酸化合物としては、例えば、式(8)又は(9)で表されるものが挙げられる。
式(8)中、A1は−O−又は−S−を表すが、−O−が好ましい。A2はナフタレン環又はアントラセン環を表すが、ナフタレン環が好ましい。A3は2〜4価のパーフルオロビフェニル基を表し、jはA1とA3との結合数を示し、2≦j≦4を満たす整数であるが、A3が2価のパーフルオロビフェニル基、好ましくはパーフルオロビフェニル−4,4−ジイルであり、かつ、jが2であることが好ましい。mはA2に結合するスルホン酸基数を表し、1≦m≦4を満たす整数であるが、2が好適である。 Wherein (8), A 1 represents an -O- or -S-, -O- is preferable. A 2 represents a naphthalene ring or an anthracene ring, preferably a naphthalene ring. A 3 represents a divalent to tetravalent perfluorobiphenyl group, j represents the number of bonds between A 1 and A 3, is an integer satisfying 2 ≦ j ≦ 4, A 3 is a divalent perfluoro biphenyl It is preferred that it is a group, preferably perfluorobiphenyl-4,4-diyl, and j is 2. m represents the number of sulfonic acid groups bound to A 2 and is an integer satisfying 1 ≦ m ≦ 4, but 2 is preferable.
式(9)中、A4〜A8は、それぞれ独立に水素原子、ハロゲン原子、シアノ基、炭素数1〜20のアルキル基、炭素数1〜20のハロゲン化アルキル基又は炭素数2〜20のハロゲン化アルケニル基を表すが、A4〜A8のうち少なくとも3つはハロゲン原子である。kはナフタレン環に結合するスルホン酸基数を表し、1≦k≦4を満たす整数であるが、2〜4が好ましく、2がより好ましい。 In formula (9), A 4 to A 8 each independently represent a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 20 carbon atoms, or 2 to 20 carbon atoms And at least three of A 4 to A 8 are halogen atoms. k represents the number of sulfonic acid groups bonded to the naphthalene ring, and is an integer satisfying 1 ≦ k ≦ 4, preferably 2 to 4, and more preferably 2.
炭素数1〜20のハロゲン化アルキル基としては、トリフルオロメチル基、2,2,2−トリフルオロエチル基、1,1,2,2,2−ペンタフルオロエチル基、3,3,3−トリフルオロプロピル基、2,2,3,3,3−ペンタフルオロプロピル基、1,1,2,2,3,3,3−ヘプタフルオロプロピル基、4,4,4−トリフルオロブチル基、3,3,4,4,4−ペンタフルオロブチル基、2,2,3,3,4,4,4−ヘプタフルオロブチル基、1,1,2,2,3,3,4,4,4−ノナフルオロブチル基等が挙げられる。炭素数2〜20のハロゲン化アルケニル基としては、パーフルオロビニル基、1−パーフルオロプロペニル基、パーフルオロアリル基、パーフルオロブテニル基等が挙げられる。 As the halogenated alkyl group having 1 to 20 carbon atoms, a trifluoromethyl group, a 2,2,2-trifluoroethyl group, a 1,1,2,2,2-pentafluoroethyl group, a 3,3,3- Trifluoropropyl group, 2,2,3,3,3-pentafluoropropyl group, 1,1,2,2,3,3,3-heptafluoropropyl group, 4,4,4-trifluorobutyl group, 3,3,4,4,4-pentafluorobutyl group, 2,2,3,3,4,4,4-heptafluorobutyl group, 1,1,2,2,3,3,4,4,4 4-nonafluorobutyl group etc. are mentioned. As a C2-C20 halogenated alkenyl group, a perfluoro vinyl group, 1-perfluoro propenyl group, perfluoro allyl group, perfluoro butenyl group etc. are mentioned.
ハロゲン原子、炭素数1〜20のアルキル基の例としては上記と同様のものが挙げられるが、ハロゲン原子としては、フッ素原子が好ましい。 Although the thing similar to the above is mentioned as an example of a halogen atom and a C1-C20 alkyl group, As a halogen atom, a fluorine atom is preferable.
これらの中でも、A4〜A8は、水素原子、ハロゲン原子、シアノ基、炭素数1〜10のアルキル基、炭素数1〜10のハロゲン化アルキル基又は炭素数2〜10のハロゲン化アルケニル基であり、かつA4〜A8のうち少なくとも3つはフッ素原子であることが好ましく、水素原子、フッ素原子、シアノ基、炭素数1〜5のアルキル基、炭素数1〜5のフッ化アルキル基又は炭素数2〜5のフッ化アルケニル基であり、かつA4〜A8のうち少なくとも3つはフッ素原子であることがより好ましく、水素原子、フッ素原子、シアノ基、炭素数1〜5のパーフルオロアルキル基又は炭素数1〜5のパーフルオロアルケニル基であり、かつA4、A5及びA8がフッ素原子であることより一層好ましい。 Among these, A 4 to A 8 are a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, or a halogenated alkenyl group having 2 to 10 carbon atoms And at least three of A 4 to A 8 are preferably a fluorine atom, and a hydrogen atom, a fluorine atom, a cyano group, an alkyl group of 1 to 5 carbon atoms, a fluorinated alkyl of 1 to 5 carbon atoms Group or a fluorinated alkenyl group having 2 to 5 carbon atoms, and at least three of A 4 to A 8 are more preferably a fluorine atom, and a hydrogen atom, a fluorine atom, a cyano group, 1 to 5 carbon atoms It is more preferable that A 4 , A 5 and A 8 are a fluorine atom.
なお、パーフルオロアルキル基とは、アルキル基の水素原子全てがフッ素原子に置換された基であり、パーフルオロアルケニル基とは、アルケニル基の水素原子全てがフッ素原子に置換された基である。 The perfluoroalkyl group is a group in which all hydrogen atoms in the alkyl group are substituted by fluorine atoms, and the perfluoroalkenyl group is a group in which all hydrogen atoms in the alkenyl group are substituted by fluorine atoms.
本発明におけるドーパントとして好適なアリールスルホン酸化合物の具体例を挙げるが、これらに限定されない。
[電荷輸送性材料]
本発明の電荷輸送性材料は、式(1)で表されるチオフェン誘導体からなる電荷輸送性物質と、ドーパントとを含む。このような電荷輸送性材料は、有機溶媒への良好な溶解性を示し、上述のとおりに、当該電荷輸送性材料を有機溶媒に溶解させることで、容易に電荷輸送性ワニスを製造することができる。
[Charge transportable material]
The charge transportable material of the present invention comprises a charge transportable material comprising a thiophene derivative represented by the formula (1) and a dopant. Such a charge transporting material exhibits good solubility in an organic solvent, and as described above, it is possible to easily produce a charge transporting varnish by dissolving the charge transporting material in an organic solvent. it can.
[電荷輸送性薄膜]
本発明の電荷輸送性ワニスを基材上に塗布して焼成することで、基材上に電荷輸送性薄膜を形成させることができる。
[Charge transportable thin film]
By applying the charge transporting varnish of the present invention on a substrate and baking it, a charge transporting thin film can be formed on the substrate.
ワニスの塗布方法としては、特に限定されるものではなく、ディップ法、スピンコート法、転写印刷法、ロールコート法、刷毛塗り、インクジェット法、スプレー法等が挙げられ、塗布方法に応じてワニスの粘度及び表面張力を調節することが好ましい。 The method for applying the varnish is not particularly limited, and dip method, spin coating method, transfer printing method, roll coating method, brush coating, ink jet method, spray method etc. may be mentioned, and depending on the coating method It is preferred to adjust the viscosity and surface tension.
また、本発明のワニスを用いる場合、焼成雰囲気も特に限定されるものではなく、大気雰囲気だけでなく、窒素等の不活性ガスや真空中でも均一な成膜面及び高い電荷輸送性を有する薄膜を得ることができる。 When the varnish of the present invention is used, the firing atmosphere is also not particularly limited, and a thin film having a uniform film-forming surface and high charge transportability not only in the air but also in an inert gas such as nitrogen or vacuum. You can get it.
焼成温度は、得られる薄膜の用途、得られる薄膜に付与する電荷輸送性の程度等を勘案して、100〜260℃程度の範囲内で適宜設定されるものではあるが、得られる薄膜を有機EL素子の正孔注入層として用いる場合、140〜250℃程度が好ましく、145〜240℃程度がより好ましい。 The baking temperature is appropriately set in the range of about 100 to 260 ° C. in consideration of the use of the obtained thin film, the degree of charge transportability to be imparted to the obtained thin film, etc. When using as a positive hole injection layer of EL element, about 140-250 degreeC is preferable, and about 145-240 degreeC is more preferable.
本発明のワニスの特徴の一つに、200℃未満の低温で焼成可能であるという特徴があり、そのような焼成条件下で作製した薄膜でも、高平坦性及び高電荷輸送性を有する。 One of the features of the varnish of the present invention is that it can be fired at a low temperature of less than 200 ° C. Even a thin film produced under such firing conditions has high flatness and high charge transportability.
なお、焼成の際、より高い均一成膜性を発現させたり、基材上で反応を進行させたりする目的で、2段階以上の温度変化をつけてもよい。加熱は、例えば、ホットプレートやオーブン等適当な機器を用いて行えばよい。 In addition, at the time of baking, in order to express a higher uniform film formability or to advance a reaction on a base material, two or more temperature changes may be applied. Heating may be performed using a suitable device such as a hot plate or an oven, for example.
電荷輸送性薄膜の膜厚は、特に限定されないが、有機EL素子の正孔注入層として用いる場合、5〜200nmが好ましい。膜厚を変化させる方法としては、ワニス中の固形分濃度を変化させたり、塗布時の基板上の溶液量を変化させたりする等の方法がある。 The thickness of the charge transporting thin film is not particularly limited, but is preferably 5 to 200 nm when used as a hole injecting layer of an organic EL element. As a method of changing the film thickness, there are methods such as changing the solid content concentration in the varnish or changing the amount of solution on the substrate at the time of application.
[有機EL素子]
本発明の電荷輸送性ワニスを用いてOLED素子を作製する場合の使用材料や、作製方法としては、下記のようなものが挙げられるが、これらに限定されない。
[Organic EL element]
Examples of materials used for producing an OLED element using the charge transporting varnish of the present invention and methods for producing the same include, but are not limited to, the following.
使用する電極基板は、洗剤、アルコール、純水等による液体洗浄を予め行って浄化しておくことが好ましく、例えば、陽極基板では使用直前にUVオゾン処理、酸素−プラズマ処理等の表面処理を行うことが好ましい。ただし陽極材料が有機物を主成分とする場合、表面処理を行わなくともよい。 The electrode substrate to be used is preferably cleaned in advance by liquid cleaning with detergent, alcohol, pure water, etc. For example, in the case of an anode substrate, surface treatment such as UV ozone treatment or oxygen-plasma treatment is performed immediately before use. Is preferred. However, when the anode material contains an organic substance as a main component, the surface treatment may not be performed.
本発明の電荷輸送性ワニスから得られる薄膜からなる正孔注入層を有するOLED素子の作製方法の例は、以下のとおりである。 An example of a method for producing an OLED element having a hole injection layer comprising a thin film obtained from the charge transporting varnish of the present invention is as follows.
上記の方法により、陽極基板上に本発明の電荷輸送性ワニスを塗布して焼成し、電極上に正孔注入層を作製する。これを真空蒸着装置内に導入し、正孔輸送層、発光層、電子輸送層、電子輸送層/ホールブロック層、電子注入層、陰極金属を順次蒸着してOLED素子とする。なお、必要に応じて、発光層と正孔輸送層との間に電子ブロック層を設けてよい。 The charge transporting varnish of the present invention is applied onto the anode substrate and baked by the above method to prepare a hole injecting layer on the electrode. This is introduced into a vacuum deposition apparatus, and a hole transport layer, a light emitting layer, an electron transport layer, an electron transport layer / hole block layer, an electron injection layer, and a cathode metal are sequentially deposited to obtain an OLED element. If necessary, an electron blocking layer may be provided between the light emitting layer and the hole transporting layer.
陽極材料としては、インジウム錫酸化物(ITO)、インジウム亜鉛酸化物(IZO)に代表される透明電極や、アルミニウムに代表される金属やこれらの合金等から構成される金属陽極が挙げられ、平坦化処理を行ったものが好ましい。高電荷輸送性を有するポリチオフェン誘導体やポリアニリン誘導体を用いることもできる。 Examples of the anode material include a transparent electrode represented by indium tin oxide (ITO) and indium zinc oxide (IZO), a metal anode represented by a metal represented by aluminum, an alloy thereof, etc. It is preferable to carry out the chemical treatment. A polythiophene derivative or polyaniline derivative having high charge transportability can also be used.
なお、金属陽極を構成するその他の金属としては、スカンジウム、チタン、バナジウム、クロム、マンガン、鉄、コバルト、ニッケル、銅、亜鉛、ガリウム、イットリウム、ジルコニウム、ニオブ、モリブデン、ルテニウム、ロジウム、パラジウム、カドミウム、インジウム、スカンジウム、ランタン、セリウム、プラセオジム、ネオジム、プロメチウム、サマリウム、ユウロピウム、ガドリニウム、テルビウム、ジスプロシウム、ホルミウム、エルビウム、ツリウム、イッテルビウム、ハフニウム、タリウム、タングステン、レニウム、オスミウム、イリジウム、プラチナ、金、チタン、鉛、ビスマスやこれらの合金等が挙げられるが、これらに限定されない。 Other metals that constitute the metal anode include scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, yttrium, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, cadmium , Indium, scandium, lanthanum, cerium, praseodymium, neomethium, promethium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium, hafnium, thallium, tungsten, rhenium, osmium, iridium, platinum, gold, titanium And lead, bismuth and alloys thereof, but not limited thereto.
正孔輸送層を形成する材料としては、(トリフェニルアミン)ダイマー誘導体、[(トリフェニルアミン)ダイマー]スピロダイマー、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−ベンジジン(α−NPD)、N,N'−ビス(ナフタレン−2−イル)−N,N'−ビス(フェニル)−ベンジジン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−ベンジジン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−9,9−スピロビフルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−9,9−スピロビフルオレン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−9,9−ジメチル−フルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−9,9−ジメチル−フルオレン、N,N'−ビス(3−メチルフェニル)−N,N'−ビス(フェニル)−9,9−ジフェニル−フルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−9,9−ジフェニル−フルオレン、N,N'−ビス(ナフタレン−1−イル)−N,N'−ビス(フェニル)−2,2'−ジメチルベンジジン、2,2',7,7'−テトラキス(N,N−ジフェニルアミノ)−9,9−スピロビフルオレン、9,9−ビス[4−(N,N−ビス−ビフェニル−4−イル−アミノ)フェニル]−9H−フルオレン、9,9−ビス[4−(N,N−ビス−ナフタレン−2−イル−アミノ)フェニル]−9H−フルオレン、9,9−ビス[4−(N−ナフタレン−1−イル−N−フェニルアミノ)−フェニル]−9H−フルオレン、2,2',7,7'−テトラキス[N−ナフタレニル(フェニル)−アミノ]−9,9−スピロビフルオレン、N,N'−ビス(フェナントレン−9−イル)−N,N'−ビス(フェニル)−ベンジジン、2,2'−ビス[N,N−ビス(ビフェニル−4−イル)アミノ]−9,9−スピロビフルオレン、2,2'−ビス(N,N−ジフェニルアミノ)−9,9−スピロビフルオレン、ジ−[4−(N,N−ジ(p−トリル)アミノ)−フェニル]シクロヘキサン、2,2',7,7'−テトラ(N,N−ジ(p−トリル)アミノ)−9,9−スピロビフルオレン、N,N,N',N'−テトラ−ナフタレン−2−イル−ベンジジン、N,N,N',N'−テトラ−(3−メチルフェニル)−3,3'−ジメチルベンジジン、N,N'−ジ(ナフタレニル)−N,N'−ジ(ナフタレン−2−イル)−ベンジジン、N,N,N',N'−テトラ(ナフタレニル)−ベンジジン、N,N'−ジ(ナフタレン−2−イル)−N,N'−ジフェニルベンジジン−1,4−ジアミン、N1,N4−ジフェニル−N1,N4−ジ(m−トリル)ベンゼン−1,4−ジアミン、N2,N2,N6,N6−テトラフェニルナフタレン−2,6−ジアミン、トリス(4−(キノリン−8−イル)フェニル)アミン、2,2'−ビス(3−(N,N−ジ(p−トリル)アミノ)フェニル)ビフェニル、4,4',4''−トリス[3−メチルフェニル(フェニル)アミノ]トリフェニルアミン(m−MTDATA)、4,4',4''−トリス[1−ナフチル(フェニル)アミノ]トリフェニルアミン(1−TNATA)等のトリアリールアミン類、5,5''−ビス−{4−[ビス(4−メチルフェニル)アミノ]フェニル}−2,2':5',2''−ターチオフェン(BMA−3T)等のオリゴチオフェン類等が挙げられる。 As materials for forming the hole transport layer, (triphenylamine) dimer derivative, [(triphenylamine) dimer] spiro dimer, N, N'-bis (naphthalen-1-yl) -N, N'-bis (Phenyl) -benzidine (α-NPD), N, N′-bis (naphthalen-2-yl) -N, N′-bis (phenyl) -benzidine, N, N′-bis (3-methylphenyl)- N, N'-bis (phenyl) -benzidine, N, N'-bis (3-methylphenyl) -N, N'-bis (phenyl) -9,9-spirobifluorene, N, N'-bis ( Naphthalen-1-yl) -N, N′-bis (phenyl) -9,9-spirobifluorene, N, N′-bis (3-methylphenyl) -N, N′-bis (phenyl) -9, 9-Dimethyl-fluorene, N, N'-bis (naphthalen-1-yl) -N, N'-bis (phenyl) -9,9-dimethyl-fluorene N, N'-bis (3-methylphenyl) -N, N'-bis (phenyl) -9,9-diphenyl-fluorene, N, N'-bis (naphthalen-1-yl) -N, N ' -Bis (phenyl) -9,9-diphenyl-fluorene, N, N'-bis (naphthalen-1-yl) -N, N'-bis (phenyl) -2,2'-dimethylbenzidine, 2,2 ' , 7,7'-Tetrakis (N, N-diphenylamino) -9,9-spirobifluorene, 9,9-bis [4- (N, N-bis-biphenyl-4-yl-amino) phenyl]- 9H-fluorene, 9,9-bis [4- (N, N-bis-naphthalen-2-yl-amino) phenyl] -9H-fluorene, 9,9-bis [4- (N-naphthalen-1-yl) -N-phenylamino) -phenyl] -9H-fluorene, 2,2 ', 7,7'-tetrakis [N-naphthalenyl (phenyl) -amino] -9,9 Spirobifluorene, N, N'-bis (phenanthrene-9-yl) -N, N'-bis (phenyl) -benzidine, 2,2'-bis [N, N-bis (biphenyl-4-yl) amino ] -9,9-spirobifluorene, 2,2'-bis (N, N-diphenylamino) -9,9-spirobifluorene, di- [4- (N, N-di (p-tolyl) amino] ) -Phenyl] cyclohexane, 2,2 ′, 7,7′-tetra (N, N-di (p-tolyl) amino) -9,9-spirobifluorene, N, N, N ′, N′-tetra -Naphthalen-2-yl-benzidine, N, N, N ', N'-tetra- (3-methylphenyl) -3,3'-dimethylbenzidine, N, N'-di (naphthalenyl) -N, N' -Di (naphthalen-2-yl) -benzidine, N, N, N ', N'-tetra (naphthalenyl) -benzidine, N, N'-di (naphthalen-2-yl) -N, N'-diphenyl Benzidine-1,4-diamine, N 1 , N 4 -diphenyl-N 1 , N 4 -di (m-tolyl) benzene-1,4-diamine, N 2 , N 2 , N 6 , N 6 -tetraphenyl Naphthalene-2,6-diamine, tris (4- (quinolin-8-yl) phenyl) amine, 2,2'-bis (3- (N, N-di (p-tolyl) amino) phenyl) biphenyl, 4 4,4 ′, 4 ′ ′-Tris [3-methylphenyl (phenyl) amino] triphenylamine (m-MTDATA), 4,4 ′, 4 ′ ′-tris [1-naphthyl (phenyl) amino] triphenylamine Triarylamines such as (1-TNATA), 5,5 ′ ′-bis- {4- [bis (4-methylphenyl) amino] phenyl} -2,2 ′: 5 ′, 2 ′ ′-terthiophene Oligothiophenes, such as (BMA-3T), etc. are mentioned.
発光層を形成する材料としては、トリス(8−キノリノラート)アルミニウム(III)(Alq3)、ビス(8−キノリノラート)亜鉛(II)(Znq2)、ビス(2−メチル−8−キノリノラート)−4−(p−フェニルフェノラート)アルミニウム(III)(BAlq)、4,4'−ビス(2,2−ジフェニルビニル)ビフェニル、9,10−ジ(ナフタレン−2−イル)アントラセン、2−t−ブチル−9,10−ジ(ナフタレン−2−イル)アントラセン、2,7−ビス[9,9−ジ(4−メチルフェニル)−フルオレン−2−イル]−9,9−ジ(4−メチルフェニル)フルオレン、2−メチル−9,10−ビス(ナフタレン−2−イル)アントラセン、2−(9,9−スピロビフルオレン−2−イル)−9,9−スピロビフルオレン、2,7−ビス(9,9−スピロビフルオレン−2−イル)−9,9−スピロビフルオレン、2−[9,9−ジ(4−メチルフェニル)−フルオレン−2−イル]−9,9−ジ(4−メチルフェニル)フルオレン、2,2'−ジピレニル−9,9−スピロビフルオレン、1,3,5−トリス(ピレン−1−イル)ベンゼン、9,9−ビス[4−(ピレニル)フェニル]−9H−フルオレン、2,2'−ビ(9,10−ジフェニルアントラセン)、2,7−ジピレニル−9,9−スピロビフルオレン、1,4−ジ(ピレン−1−イル)ベンゼン、1,3−ジ(ピレン−1−イル)ベンゼン、6,13−ジ(ビフェニル−4−イル)ペンタセン、3,9−ジ(ナフタレン−2−イル)ペリレン、3,10−ジ(ナフタレン−2−イル)ペリレン、トリス[4−(ピレニル)−フェニル]アミン、10,10'−ジ(ビフェニル−4−イル)−9,9'−ビアントラセン、N,N'−ジ(ナフタレン−1−イル)−N,N'−ジフェニル−[1,1':4',1'':4'',1'''−クォーターフェニル]−4,4'''−ジアミン、4,4'−ジ[10−(ナフタレン−1−イル)アントラセン−9−イル]ビフェニル、ジベンゾ{[f,f']−4,4',7,7'−テトラフェニル}ジインデノ[1,2,3−cd:1',2',3'−lm]ペリレン、1−(7−(9,9'−ビアントラセン−10−イル)−9,9−ジメチル−9H−フルオレン−2−イル)ピレン、1−(7−(9,9'−ビアントラセン−10−イル)−9,9−ジヘキシル−9H−フルオレン−2−イル)ピレン、1,3−ビス(カルバゾール−9−イル)ベンゼン、1,3,5−トリス(カルバゾール−9−イル)ベンゼン、4,4',4''−トリス(カルバゾール−9−イル)トリフェニルアミン、4,4'−ビス(カルバゾール−9−イル)ビフェニル(CBP)、4,4'−ビス(カルバゾール−9−イル)−2,2'−ジメチルビフェニル、2,7−ビス(カルバゾール−9−イル)−9,9−ジメチルフルオレン、2,2',7,7'−テトラキス(カルバゾール−9−イル)−9,9−スピロビフルオレン、2,7−ビス(カルバゾール−9−イル)−9,9−ジ(p−トリル)フルオレン、9,9−ビス[4−(カルバゾール−9−イル)−フェニル]フルオレン、2,7−ビス(カルバゾール−9−イル)−9,9−スピロビフルオレン、1,4−ビス(トリフェニルシリル)ベンゼン、1,3−ビス(トリフェニルシリル)ベンゼン、ビス(4−N,N−ジエチルアミノ−2−メチルフェニル)−4−メチルフェニルメタン、2,7−ビス(カルバゾール−9−イル)−9,9−ジオクチルフルオレン、4,4''−ジ(トリフェニルシリル)−p−ターフェニル、4,4'−ジ(トリフェニルシリル)ビフェニル、9−(4−t−ブチルフェニル)−3,6−ビス(トリフェニルシリル)−9H−カルバゾール、9−(4−t−ブチルフェニル)−3,6−ジトリチル−9H−カルバゾール、9−(4−t−ブチルフェニル)−3,6−ビス(9−(4−メトキシフェニル)−9H−フルオレン−9−イル)−9H−カルバゾール、2,6−ビス(3−(9H−カルバゾール−9−イル)フェニル)ピリジン、トリフェニル(4−(9−フェニル−9H−フルオレン−9−イル)フェニル)シラン、9,9−ジメチル−N,N−ジフェニル−7−(4−(1−フェニル−1H−ベンゾ[d]イミダゾール−2−イル)フェニル)−9H−フルオレン−2−アミン、3,5−ビス(3−(9H−カルバゾール−9−イル)フェニル)ピリジン、9,9−スピロビフルオレン−2−イル−ジフェニル−ホスフィンオキサイド、9,9'−(5−(トリフェニルシリル)−1,3−フェニレン)ビス(9H−カルバゾール)、3−(2,7−ビス(ジフェニルホスホリル)−9−フェニル−9H−フルオレン−9−イル)−9−フェニル−9H−カルバゾール、4,4,8,8,12,12−ヘキサ(p−トリル)−4H−8H−12H−12C−アザジベンゾ[cd,mn]ピレン、4,7−ジ(9H−カルバゾール−9−イル)−1,10−フェナントロリン、2,2'−ビス(4−(カルバゾール−9−イル)フェニル)ビフェニル、2,8−ビス(ジフェニルホスホリル)ジベンゾ[b,d]チオフェン、ビス(2−メチルフェニル)ジフェニルシラン、ビス[3,5−ジ(9H−カルバゾール−9−イル)フェニル]ジフェニルシラン、3,6−ビス(カルバゾール−9−イル)−9−(2−エチル−ヘキシル)−9H−カルバゾール、3−(ジフェニルホスホリル)−9−(4−(ジフェニルホスホリル)フェニル)−9H−カルバゾール、3,6−ビス[(3,5−ジフェニル)フェニル]−9−フェニルカルバゾール等が挙げられ、発光性ドーパントと共蒸着することによって、発光層を形成してもよい。 As a material for forming the light emitting layer, tris (8-quinolinolato) aluminum (III) (Alq 3), bis (8-quinolinolato) zinc (II) (Znq 2), bis (2-methyl-8-quinolinolato) - 4- (p-phenylphenolate) aluminum (III) (BAlq), 4,4′-bis (2,2-diphenylvinyl) biphenyl, 9,10-di (naphthalen-2-yl) anthracene, 2-t -Butyl-9,10-di (naphthalen-2-yl) anthracene, 2,7-bis [9,9-di (4-methylphenyl) -fluoren-2-yl] -9,9-di (4-) Methylphenyl) fluorene, 2-methyl-9,10-bis (naphthalen-2-yl) anthracene, 2- (9,9-spirobifluoren-2-yl) -9,9-spirobifluorene, 2,7 -Bis (9,9-spirobifluoren-2-yl) -9,9 Spirobifluorene, 2- [9,9-di (4-methylphenyl) -fluoren-2-yl] -9,9-di (4-methylphenyl) fluorene, 2,2'-dipyrenyl-9,9- Spirobifluorene, 1,3,5-tris (pyren-1-yl) benzene, 9,9-bis [4- (pyrenyl) phenyl] -9H-fluorene, 2,2′-bi (9,10-diphenyl) Anthracene), 2,7-dipyrenyl-9,9-spirobifluorene, 1,4-di (pyren-1-yl) benzene, 1,3-di (pyren-1-yl) benzene, 6,13-di (Biphenyl-4-yl) pentacene, 3,9-di (naphthalen-2-yl) perylene, 3,10-di (naphthalen-2-yl) perylene, tris [4- (pyrenyl) -phenyl] amine, 10 10'-di (biphenyl-4-yl) -9,9'-bianthracene, N, N'-di (naphthalene 1-yl) -N, N′-diphenyl- [1,1 ′: 4 ′, 1 ′ ′: 4 ′ ′, 1 ′ ′ ′-quaternaryphenyl] -4,4 ′ ′ ′-diamine, 4,4 '-Di [10- (naphthalen-1-yl) anthracene-9-yl] biphenyl, dibenzo {[f, f']-4,4 ', 7,7'-tetraphenyl} diindeno [1,2,3 -Cd: 1 ', 2', 3'-Im] perylene, 1- (7- (9, 9'-bianthracene-10-yl) -9, 9-dimethyl-9H-fluoren-2-yl) pyrene 1- (7- (9,9'-bianthracene-10-yl) -9,9-dihexyl-9H-fluoren-2-yl) pyrene, 1,3-bis (carbazol-9-yl) benzene, 1,3,5-tris (carbazol-9-yl) benzene, 4,4 ′, 4 ′ ′-tris (carbazol-9-yl) triphenylamine, 4,4′-bis (carbazol-9-yl) Biphenyl (CBP) 4,4'-bis (carbazol-9-yl) -2,2'-dimethylbiphenyl, 2,7-bis (carbazol-9-yl) -9,9-dimethylfluorene, 2,2 ', 7,7 '-Tetrakis (carbazol-9-yl) -9,9-spirobifluorene, 2,7-bis (carbazol-9-yl) -9,9-di (p-tolyl) fluorene, 9,9-bis [ 4- (Carbazol-9-yl) -phenyl] fluorene, 2,7-bis (carbazol-9-yl) -9,9-spirobifluorene, 1,4-bis (triphenylsilyl) benzene, 1,3 -Bis (triphenylsilyl) benzene, bis (4-N, N-diethylamino-2-methylphenyl) -4-methylphenylmethane, 2,7-bis (carbazol-9-yl) -9,9-dioctylfluorene 4,4 ′ ′-di (triphenylsilyl) -p-terphenyl 4,4'-di (triphenylsilyl) biphenyl, 9- (4-t-butylphenyl) -3,6-bis (triphenylsilyl) -9H-carbazole, 9- (4-t-butylphenyl)- 3,6-ditrityl-9H-carbazole, 9- (4-t-butylphenyl) -3,6-bis (9- (4-methoxyphenyl) -9H-fluoren-9-yl) -9H-carbazole, 2 , 6-Bis (3- (9H-carbazol-9-yl) phenyl) pyridine, triphenyl (4- (9-phenyl-9H-fluoren-9-yl) phenyl) silane, 9,9-dimethyl-N, N-diphenyl-7- (4- (1-phenyl-1H-benzo [d] imidazol-2-yl) phenyl) -9H-fluoren-2-amine, 3,5-bis (3- (9H-carbazole-) 9-yl) phenyl) pyridine, 9,9-spirobifluo Ren-2-yl-diphenyl-phosphine oxide, 9,9 '-(5- (triphenylsilyl) -1,3-phenylene) bis (9H-carbazole), 3- (2,7-bis (diphenylphosphoryl) -9-phenyl-9H-fluoren-9-yl) -9-phenyl-9H-carbazole, 4,4,8,8,12,12-hexa (p-tolyl) -4H-8H-12H-12C-azadibenzo [cd, mn] pyrene, 4,7-di (9H-carbazol-9-yl) -1,10-phenanthroline, 2,2'-bis (4- (carbazol-9-yl) phenyl) biphenyl, 2,2,- 8-Bis (diphenylphosphoryl) dibenzo [b, d] thiophene, bis (2-methylphenyl) diphenylsilane, bis [3,5-di (9H-carbazol-9-yl) phenyl] diphenylsilane, 3,6- Bis (carbazole-9-a) B) -9- (2-ethyl-hexyl) -9H-carbazole, 3- (diphenylphosphoryl) -9- (4- (diphenylphosphoryl) phenyl) -9H-carbazole, 3,6-bis [(3,5) -Diphenyl) phenyl] -9-phenylcarbazole etc. may be mentioned, You may form a light emitting layer by co-evaporating with a luminescent dopant.
発光性ドーパントとしては、3−(2−ベンゾチアゾリル)−7−(ジエチルアミノ)クマリン、2,3,6,7−テトラヒドロ−1,1,7,7−テトラメチル−1H,5H,11H−10−(2−ベンゾチアゾリル)キノリジノ[9,9a,1gh]クマリン、キナクリドン、N,N'−ジメチル−キナクリドン、トリス(2−フェニルピリジン)イリジウム(III)(Ir(ppy)3)、ビス(2−フェニルピリジン)(アセチルアセトネート)イリジウム(III)(Ir(ppy)2(acac))、トリス[2−(p−トリル)ピリジン]イリジウム(III)(Ir(mppy)3)、9,10−ビス[N,N−ジ(p−トリル)アミノ]アントラセン、9,10−ビス[フェニル(m−トリル)アミノ]アントラセン、ビス[2−(2−ヒドロキシフェニル)ベンゾチアゾラト]亜鉛(II)、N10,N10,N10,N10−テトラ(p−トリル)−9,9'−ビアントラセン−10,10'−ジアミン、N10,N10,N10,N10−テトラフェニル−9,9'−ビアントラセン−10,10'−ジアミン、N10,N10−ジフェニル−N10,N10−ジナフタレニル−9,9'−ビアントラセン−10,10'−ジアミン、4,4'−ビス(9−エチル−3−カルバゾビニレン)−1,1'−ビフェニル、ペリレン、2,5,8,11−テトラ−t−ブチルペリレン、1,4−ビス[2−(3−N−エチルカルバゾリル)ビニル]ベンゼン、4,4'−ビス[4−(ジ−p−トリルアミノ)スチリル]ビフェニル、4−(ジ−p−トリルアミノ)−4'−[(ジ−p−トリルアミノ)スチリル]スチルベン、ビス[3,5−ジフルオロ−2−(2−ピリジル)フェニル−(2−カルボキシピリジル)]イリジウム(III)、4,4'−ビス[4−(ジフェニルアミノ)スチリル]ビフェニル、ビス(2,4−ジフルオロフェニルピリジナト)テトラキス(1−ピラゾリル)ボレートイリジウム(III)、N,N'−ビス(ナフタレン−2−イル)−N,N'−ビス(フェニル)−トリス(9,9−ジメチルフルオレニレン)、2,7−ビス{2−[フェニル(m−トリル)アミノ]−9,9−ジメチル−フルオレン−7−イル}−9,9−ジメチル−フルオレン、N−(4−((E)−2−(6((E)−4−(ジフェニルアミノ)スチリル)ナフタレン−2−イル)ビニル)フェニル)−N−フェニルベンゼンアミン、fac−イリジウム(III)トリス(1−フェニル−3−メチルベンズイミダゾリン−2−イリデン−C,C2)、mer−イリジウム(III)トリス(1−フェニル−3−メチルベンズイミダゾリン−2−イリデン−C,C2)、2,7−ビス[4−(ジフェニルアミノ)スチリル]−9,9−スピロビフルオレン、6−メチル−2−(4−(9−(4−(6−メチルベンゾ[d]チアゾール−2−イル)フェニル)アントラセン−10−イル)フェニル)ベンゾ[d]チアゾール、1,4−ジ[4−(N,N−ジフェニル)アミノ]スチリルベンゼン、1,4−ビス(4−(9H−カルバゾール−9−イル)スチリル)ベンゼン、(E)−6−(4−(ジフェニルアミノ)スチリル)−N,N−ジフェニルナフタレン−2−アミン、ビス(2,4−ジフルオロフェニルピリジナト)(5−(ピリジン−2−イル)−1H−テトラゾレート)イリジウム(III)、ビス(3−トリフルオロメチル−5−(2−ピリジル)ピラゾール)((2,4−ジフルオロベンジル)ジフェニルホスフィネート)イリジウム(III)、ビス(3−トリフルオロメチル−5−(2−ピリジル)ピラゾレート)(ベンジルジフェニルホスフィネート)イリジウム(III)、ビス(1−(2,4−ジフルオロベンジル)−3−メチルベンズイミダゾリウム)(3−(トリフルオロメチル)−5−(2−ピリジル)−1,2,4−トリアゾレート)イリジウム(III)、ビス(3−トリフルオロメチル−5−(2−ピリジル)ピラゾレート)(4',6'−ジフルオロフェニルピリジネート)イリジウム(III)、ビス(4',6'−ジフルオロフェニルピリジナト)(3,5−ビス(トリフルオロメチル)−2−(2'−ピリジル)ピロレート)イリジウム(III)、ビス(4',6'−ジフルオロフェニルピリジナト)(3−(トリフルオロメチル)−5−(2−ピリジル)−1,2,4−トリアゾレート)イリジウム(III)、(Z)−6−メシチル−N−(6−メシチルキノリン−2(1H)−イリデン)キノリン−2−アミン−BF2、(E)−2−(2−(4−(ジメチルアミノ)スチリル)−6−メチル−4H−ピラン−4−イリデン)マロノニトリル、4−(ジシアノメチレン)−2−メチル−6−ジュロリジル−9−エニル−4H−ピラン、4−(ジシアノメチレン)−2−メチル−6−(1,1,7,7−テトラメチルジュロリジル−9−エニル)−4H−ピラン、4−(ジシアノメチレン)−2−t−ブチル−6−(1,1,7,7−テトラメチルジュロリジン−4−イル−ビニル)−4H−ピラン、トリス(ジベンゾイルメタン)フェナントロリンユーロピウム(III)、5,6,11,12−テトラフェニルナフタセン、ビス(2−ベンゾ[b]チオフェン−2−イル−ピリジン)(アセチルアセトネート)イリジウム(III)、トリス(1−フェニルイソキノリン)イリジウム(III)、ビス(1−フェニルイソキノリン)(アセチルアセトネート)イリジウム(III)、ビス[1−(9,9−ジメチル−9H−フルオレン−2−イル)−イソキノリン](アセチルアセトネート)イリジウム(III)、ビス[2−(9,9−ジメチル−9H−フルオレン−2−イル)キノリン](アセチルアセトネート)イリジウム(III)、トリス[4,4'−ジ−t−ブチル−(2,2')−ビピリジン]ルテニウム(III)・ビス(ヘキサフルオロホスフェート)、トリス(2−フェニルキノリン)イリジウム(III)、ビス(2−フェニルキノリン)(アセチルアセトネート)イリジウム(III)、2,8−ジ−t−ブチル−5,11−ビス(4−t−ブチルフェニル)−6,12−ジフェニルテトラセン、ビス(2−フェニルベンゾチアゾラト)(アセチルアセトネート)イリジウム(III)、5,10,15,20−テトラフェニルテトラベンゾポルフィリン白金、オスミウム(II)ビス(3−トリフルオロメチル−5−(2−ピリジン)−ピラゾレート)ジメチルフェニルホスフィン、オスミウム(II)ビス(3−(トリフルオロメチル)−5−(4−t−ブチルピリジル)−1,2,4−トリアゾレート)ジフェニルメチルホスフィン、オスミウム(II)ビス(3−(トリフルオロメチル)−5−(2−ピリジル)−1,2,4−トリアゾール)ジメチルフェニルホスフィン、オスミウム(II)ビス(3−(トリフルオロメチル)−5−(4−t−ブチルピリジル)−1,2,4−トリアゾレート)ジメチルフェニルホスフィン、ビス[2−(4−n−ヘキシルフェニル)キノリン](アセチルアセトネート)イリジウム(III)、トリス[2−(4−n−ヘキシルフェニル)キノリン]イリジウム(III)、トリス[2−フェニル−4−メチルキノリン]イリジウム(III)、ビス(2−フェニルキノリン)(2−(3−メチルフェニル)ピリジネート)イリジウム(III)、ビス(2−(9,9−ジエチル−フルオレン−2−イル)−1−フェニル−1H−ベンゾ[d]イミダゾラト)(アセチルアセトネート)イリジウム(III)、ビス(2−フェニルピリジン)(3−(ピリジン−2−イル)−2H−クロメン−2−オネート)イリジウム(III)、ビス(2−フェニルキノリン)(2,2,6,6−テトラメチルヘプタン−3,5−ジオネート)イリジウム(III)、ビス(フェニルイソキノリン)(2,2,6,6−テトラメチルヘプタン−3,5−ジオネート)イリジウム(III)、イリジウム(III)ビス(4−フェニルチエノ[3,2−c]ピリジナト−N,C2)アセチルアセトネート、(E)−2−(2−t−ブチル−6−(2−(2,6,6−トリメチル−2,4,5,6−テトラヒドロ−1H−ピローロ[3,2,1−ij]キノリン−8−イル)ビニル)−4H−ピラン−4−イリデン)マロノニトリル、ビス(3−トリフルオロメチル−5−(1−イソキノリル)ピラゾレート)(メチルジフェニルホスフィン)ルテニウム、ビス[(4−n−ヘキシルフェニル)イソキノリン](アセチルアセトネート)イリジウム(III)、白金(II)オクタエチルポルフィン、ビス(2−メチルジベンゾ[f,h]キノキサリン)(アセチルアセトネート)イリジウム(III)、トリス[(4−n−ヘキシルフェニル)キソキノリン]イリジウム(III)等が挙げられる。 As a light emitting dopant, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 2,3,6,7-tetrahydro-1,1,7,7-tetramethyl-1H, 5H, 11H-10- (2-benzothiazolyl) quinolizino [9,9a, 1gh] coumarin, quinacridone, N, N'-dimethyl-quinacridone, tris (2-phenylpyridine) iridium (III) (Ir (ppy) 3 ), bis (2-phenyl) Pyridine) (acetylacetonate) iridium (III) (Ir (ppy) 2 (acac)), tris [2- (p- tolyl) pyridine] iridium (III) (Ir (mppy) 3 ), 9, 10- bis [N, N-di (p-tolyl) amino] anthracene, 9,10-bis [phenyl (m-tolyl) amino] anthracene, bis [2- (2-hydroxyphenyl) benzothiazolato] zinc (II), N 10 , N 10 , N 10 , N 10 -tetra (p-tolyl) -9,9'-bian Anthracene -10,10'- diamine, N 10, N 10, N 10, N 10 - tetraphenyl-9,9'-bi anthracene -10,10'- diamine, N 10, N 10 - diphenyl -N 10, N 10 -Dinaphthalenyl-9,9′-bianthracene-10,10′-diamine, 4,4′-bis (9-ethyl-3-carbazovinylene) -1,1′-biphenyl, perylene, 2,5,8 , 11-tetra-t-butylperylene, 1,4-bis [2- (3-N-ethylcarbazolyl) vinyl] benzene, 4,4'-bis [4- (di-p-tolylamino) styryl] Biphenyl, 4- (di-p-tolylamino) -4 '-[(di-p-tolylamino) styryl] stilbene, bis [3,5-difluoro-2- (2-pyridyl) phenyl- (2-carboxypyridyl) Iridium (III), 4,4′-bis [4- (diphenylamino) styryl] biphenyl, Scan (2,4-difluorophenyl pyridinato) tetrakis (1-pyrazolyl) borate iridium (III), N, N '-bis (naphthalen-2-yl)-N, N'-bis (phenyl)-tris ( 9,9-Dimethylfluorenylene), 2,7-bis {2- [phenyl (m-tolyl) amino] -9,9-dimethyl-fluoren-7-yl} -9,9-dimethyl-fluorene, N -(4-((E) -2- (6 ((E) -4- (diphenylamino) styryl) naphthalen-2-yl) vinyl) phenyl) -N-phenylbenzenamine, fac-iridium (III) tris (1-phenyl-3-methylbenzamide 2-ylidene -C, C 2), mer- iridium (III) tris (1-phenyl-3-methylbenzamide 2-ylidene -C, C 2), 2 , 7-Bis [4- (diphenylamino) styryl] -9,9-spirobi Fluorene, 6-methyl-2- (4- (9- (4- (6-methylbenzo [d] thiazol-2-yl) phenyl) anthracene-10-yl) phenyl) benzo [d] thiazole, 1,4- Di [4- (N, N-diphenyl) amino] styrylbenzene, 1,4-bis (4- (9H-carbazol-9-yl) styryl) benzene, (E) -6- (4- (diphenylamino) Styryl) -N, N-diphenylnaphthalen-2-amine, bis (2,4-difluorophenylpyridinato) (5- (pyridin-2-yl) -1H-tetrazolate) iridium (III), bis (3-) Trifluoromethyl-5- (2-pyridyl) pyrazole) ((2,4-difluorobenzyl) diphenylphosphinate) iridium (III), bis (3-trifluoromethyl-5- (2-pyridyl) pyrazolate) (benzyl) Diphenyl phosphinate) Lysium (III), bis (1- (2,4-difluorobenzyl) -3-methylbenzimidazolium) (3- (trifluoromethyl) -5- (2-pyridyl) -1,2,4-triazolate) Iridium (III), bis (3-trifluoromethyl-5- (2-pyridyl) pyrazolate) (4 ', 6'-difluorophenylpyridinate) iridium (III), bis (4', 6'-difluorophenyl) Pyridinato) (3,5-bis (trifluoromethyl) -2- (2′-pyridyl) pyrrolate) iridium (III), bis (4 ′, 6′-difluorophenylpyridinato) (3- (triyl) Fluoromethyl) -5- (2-pyridyl) -1,2,4-triazolate) iridium (III), (Z) -6-mesityl-N- (6-mesitylquinoline-2 (1H) -ylidene) quinoline 2-amine -BF 2, (E) -2- ( 2- (4- ( dimethylamino) styryl) -6- Tyl-4H-pyran-4-ylidene) malononitrile, 4- (dicyanomethylene) -2-methyl-6-durolidyl-9-enyl-4H-pyran, 4- (dicyanomethylene) -2-methyl-6- (1 1,1,7,7-Tetramethyldurolidyl-9-enyl) -4H-pyran, 4- (dicyanomethylene) -2-t-butyl-6- (1,1,7,7-tetramethyldurolizine -4-yl-vinyl) -4H-pyran, tris (dibenzoylmethane) phenanthroline europium (III), 5,6,11,12-tetraphenylnaphthacene, bis (2-benzo [b] thiophen-2-yl -Pyridine) (acetylacetonate) iridium (III), tris (1-phenylisoquinoline) iridium (III), bis (1-phenylisoquinoline) (acetylacetonate) iridium (III), bis [1- (9, 9) - Ethyl-9H-fluoren-2-yl) -isoquinoline] (acetylacetonate) iridium (III), bis [2- (9, 9-dimethyl-9H-fluoren-2-yl) quinoline] (acetylacetonate) iridium (III), tris [4,4'-di-t-butyl- (2,2 ')-bipyridine] ruthenium (III) .bis (hexafluorophosphate), tris (2-phenylquinoline) iridium (III), Bis (2-phenylquinoline) (acetylacetonate) iridium (III), 2,8-di-t-butyl-5,11-bis (4-t-butylphenyl) -6,12-diphenyltetracene, bis ( 2-phenylbenzothiazolato) (acetylacetonate) iridium (III), 5, 10, 15, 20-tetraphenyltetrabenzoporphyrin platinum, osmium (II) bis (3-trifluoromethyl-5- (2-) Pyridine )-Pyrazolate) dimethyl phenyl phosphine, osmium (II) bis (3- (trifluoromethyl) -5- (4- t-butyl pyridyl)-1, 2, 4- triazolate) diphenyl methyl phosphine, osmium (II) bis (3- (trifluoromethyl) -5- (2-pyridyl) -1,2,4-triazole) dimethylphenyl phosphine, osmium (II) bis (3- (trifluoromethyl) -5- (4-t-) Butyl pyridyl) -1,2,4-triazolate) dimethylphenyl phosphine, bis [2- (4-n-hexylphenyl) quinoline] (acetylacetonate) iridium (III), tris [2- (4-n-hexyl) Phenyl) quinoline] iridium (III), tris [2-phenyl-4-methylquinoline] iridium (III), bis (2-phenylquinoline) (2- (3-methylphenyl) pyridinate) iridium (III), bis (2- (9,9-diethyl-fluoren-2-yl) -1-phenyl-1H-benzo [d] imidazolate) (acetylacetonate) iridium (III), bis (2-phenyl) Pyridine) (3- (pyridin-2-yl) -2H-chromen-2-onate) iridium (III), bis (2-phenylquinoline) (2,2,6,6-tetramethylheptane-3,5-) (Geonate) iridium (III), bis (phenylisoquinoline) (2,2,6,6-tetramethylheptane-3,5-dionate) iridium (III), iridium (III) bis (4-phenylthieno [3,2 -c] pyridinato -N, C 2) acetylacetonate, (E) -2- (2- t- butyl-6- (2- (2,6,6-trimethyl-2,4,5,6-tetrahydro -1H-Pyrrolo [3,2,1-ij] quinolin-8-yl) vinyl) -4H-pyran-4-ylide ) Malononitrile, bis (3-trifluoromethyl-5- (1-isoquinolyl) pyrazolate) (methyldiphenylphosphine) ruthenium, bis [(4-n-hexylphenyl) isoquinoline] (acetylacetonate) iridium (III), platinum (II) Octaethylporphine, bis (2-methyldibenzo [f, h] quinoxaline) (acetylacetonate) iridium (III), tris [(4-n-hexylphenyl) xoquinoline] iridium (III) and the like. .
電子輸送層/ホールブロック層を形成する材料としては、8−ヒドロキシキノリノレート−リチウム、2,2',2''−(1,3,5−ベンジントリル)−トリス(1−フェニル−1−H−ベンズイミダゾール)、2−(4−ビフェニル)5−(4−t−ブチルフェニル)−1,3,4−オキサジアゾール、2,9−ジメチル−4,7−ジフェニル−1,10−フェナントロリン、4,7−ジフェニル−1,10−フェナントロリン、ビス(2−メチル−8−キノリノレート)−4−(フェニルフェノラト)アルミニウム、1,3−ビス[2−(2,2'−ビピリジン−6−イル)−1,3,4−オキサジアゾ−5−イル]ベンゼン、6,6'−ビス[5−(ビフェニル−4−イル)−1,3,4−オキサジアゾ−2−イル]−2,2'−ビピリジン、3−(4−ビフェニル)−4−フェニル−5−t−ブチルフェニル−1,2,4−トリアゾール、4−(ナフタレン−1−イル)−3,5−ジフェニル−4H−1,2,4−トリアゾール、2,9−ビス(ナフタレン−2−イル)−4,7−ジフェニル−1,10−フェナントロリン、2,7−ビス[2−(2,2'−ビピリジン−6−イル)−1,3,4−オキサジアゾ−5−イル]−9,9−ジメチルフルオレン、1,3−ビス[2−(4−t−ブチルフェニル)−1,3,4−オキサジアゾ−5−イル]ベンゼン、トリス(2,4,6−トリメチル−3−(ピリジン−3−イル)フェニル)ボラン、1−メチル−2−(4−(ナフタレン−2−イル)フェニル)−1H−イミダゾ[4,5f][1,10]フェナントロリン、2−(ナフタレン−2−イル)−4,7−ジフェニル−1,10−フェナントロリン、フェニル−ジピレニルホスフィンオキサイド、3,3',5,5'−テトラ[(m−ピリジル)−フェン−3−イル]ビフェニル、1,3,5−トリス[(3−ピリジル)−フェン−3−イル]ベンゼン、4,4'−ビス(4,6−ジフェニル−1,3,5−トリアジン−2−イル)ビフェニル、1,3−ビス[3,5−ジ(ピリジン−3−イル)フェニル]ベンゼン、ビス(10−ヒドロキシベンゾ[h]キノリナト)ベリリウム、ジフェニルビス(4−(ピリジン−3−イル)フェニル)シラン、3,5−ジ(ピレン−1−イル)ピリジン等が挙げられる。 As materials for forming the electron transport layer / hole block layer, 8-hydroxyquinolinolate-lithium, 2,2 ′, 2 ′ ′-(1,3,5-benzenthryl) -tris (1-phenyl-1) -H-benzimidazole), 2- (4-biphenyl) 5- (4-t-butylphenyl) -1,3,4-oxadiazole, 2,9-dimethyl-4,7-diphenyl-1,10 -Phenanthroline, 4,7-diphenyl-1,10-phenanthroline, bis (2-methyl-8-quinolinolate) -4- (phenylphenolato) aluminum, 1,3-bis [2- (2,2'-bipyridine) -6-yl) -1,3,4-oxadiazo-5-yl] benzene, 6,6'-bis [5- (biphenyl-4-yl) -1,3,4-oxadiazo-2-yl]- 2,2'-bipyridine, 3- (4-biphenyl) -4-phenyl-5-t-butyl Phenyl-1,2,4-triazole, 4- (naphthalen-1-yl) -3,5-diphenyl-4H-1,2,4-triazole, 2,9-bis (naphthalen-2-yl) -4 , 7-diphenyl-1,10-phenanthroline, 2,7-bis [2- (2,2'-bipyridin-6-yl) -1,3,4-oxadiazo-5-yl] -9,9-dimethyl Fluorene, 1,3-bis [2- (4-t-butylphenyl) -1,3,4-oxadiazo-5-yl] benzene, tris (2,4,6-trimethyl-3- (pyridine-3-) Yl) phenyl) borane, 1-methyl-2- (4- (naphthalen-2-yl) phenyl) -1H-imidazo [4,5f] [1,10] phenanthroline, 2- (naphthalen-2-yl)- 4,7-Diphenyl-1,10-phenanthroline, phenyl-dipyrenyl phosphine oxide, 3,3 ' 5,5'-Tetra [(m-pyridyl) -phen-3-yl] biphenyl, 1,3,5-tris [(3-pyridyl) -phen-3-yl] benzene, 4,4'-bis (4,6-Diphenyl-1,3,5-triazin-2-yl) biphenyl, 1,3-bis [3,5-di (pyridin-3-yl) phenyl] benzene, bis (10-hydroxybenzo [ h] Quinolinato) beryllium, diphenylbis (4- (pyridin-3-yl) phenyl) silane, 3,5-di (pyren-1-yl) pyridine and the like.
電子注入層を形成する材料としては、酸化リチウム(Li2O)、酸化マグネシウム(MgO)、アルミナ(Al2O3)、フッ化リチウム(LiF)、フッ化ナトリウム(NaF)、フッ化マグネシウム(MgF2)、フッ化セシウム(CsF)、フッ化ストロンチウム(SrF2)、三酸化モリブデン(MoO3)、アルミニウム、Li(acac)、酢酸リチウム、安息香酸リチウム等が挙げられる。 As materials for forming the electron injection layer, lithium oxide (Li 2 O), magnesium oxide (MgO), alumina (Al 2 O 3 ), lithium fluoride (LiF), sodium fluoride (NaF), magnesium fluoride ( MgF 2 ), cesium fluoride (CsF), strontium fluoride (SrF 2 ), molybdenum trioxide (MoO 3 ), aluminum, Li (acac), lithium acetate, lithium benzoate and the like can be mentioned.
陰極材料としては、アルミニウム、マグネシウム−銀合金、アルミニウム−リチウム合金、リチウム、ナトリウム、カリウム、セシウム等が挙げられる。 As a cathode material, aluminum, magnesium-silver alloy, aluminum-lithium alloy, lithium, sodium, potassium, cesium etc. are mentioned.
電子ブロック層を形成する材料としては、トリス(フェニルピラゾール)イリジウム等が挙げられる。 Examples of the material for forming the electron blocking layer include tris (phenylpyrazole) iridium and the like.
本発明の電荷輸送性ワニスを用いたPLED素子の作製方法は、特に限定されないが、以下の方法が挙げられる。 Although the manufacturing method of the PLED element using the charge transportable varnish of this invention is not specifically limited, The following method is mentioned.
上記OLED素子作製において、正孔輸送層、発光層、電子輸送層、電子注入層の真空蒸着操作を行う代わりに、正孔輸送性高分子層、発光性高分子層を順次形成することによって本発明の電荷輸送性ワニスによって形成される電荷輸送性薄膜を有するPLED素子を作製することができる。 In the above-described OLED element production, instead of performing vacuum deposition of the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer, the hole transportable polymer layer and the light emitting polymer layer are sequentially formed. A PLED device having a charge transporting thin film formed by the charge transporting varnish of the invention can be produced.
具体的には、陽極基板上に本発明の電荷輸送性ワニスを塗布して上記の方法により正孔注入層を作製し、その上に正孔輸送性高分子層、発光性高分子層を順次形成し、更に陰極電極を蒸着してPLED素子とする。 Specifically, the charge transporting varnish of the present invention is coated on an anode substrate to prepare a hole injecting layer by the above method, and a hole transporting polymer layer and a light emitting polymer layer are sequentially formed thereon. Then, a cathode electrode is vapor deposited to form a PLED element.
使用する陰極及び陽極材料としては、上記OLED素子作製時と同様のものが使用でき、同様の洗浄処理、表面処理を行うことができる。 As a cathode and an anode material to be used, the same thing as the time of the said OLED element preparation can be used, and the same washing process and surface treatment can be performed.
正孔輸送性高分子層及び発光性高分子層の形成法としては、正孔輸送性高分子材料若しくは発光性高分子材料、又はこれらにドーパントを加えた材料に溶媒を加えて溶解するか、均一に分散し、正孔注入層又は正孔輸送性高分子層の上に塗布した後、それぞれ焼成することで成膜する方法が挙げられる。 As a method of forming the hole transporting polymer layer and the light emitting polymer layer, it is possible to add a solvent to a hole transporting polymer material, a light emitting polymer material, or a material obtained by adding a dopant thereto, A method of forming a film by uniformly dispersing and applying it on the hole injecting layer or the hole transporting polymer layer and then baking each of them may be mentioned.
正孔輸送性高分子材料としては、ポリ[(9,9−ジヘキシルフルオレニル−2,7−ジイル)−co−(N,N'−ビス{p−ブチルフェニル}−1,4−ジアミノフェニレン)]、ポリ[(9,9−ジオクチルフルオレニル−2,7−ジイル)−co−(N,N'−ビス{p−ブチルフェニル}−1,1'−ビフェニレン−4,4−ジアミン)]、ポリ[(9,9−ビス{1'−ペンテン−5'−イル}フルオレニル−2,7−ジイル)−co−(N,N'−ビス{p−ブチルフェニル}−1,4−ジアミノフェニレン)]、ポリ[N,N'−ビス(4−ブチルフェニル)−N,N'−ビス(フェニル)−ベンジジン]−エンドキャップド ウィズ ポリシルセスキオキサン、ポリ[(9,9−ジジオクチルフルオレニル−2,7−ジイル)−co−(4,4'−(N−(p−ブチルフェニル))ジフェニルアミン)]等が挙げられる。 As a hole transportable polymer material, poly [(9,9-dihexylfluorenyl-2,7-diyl) -co- (N, N'-bis {p-butylphenyl} -1,4-diamino] Phenylene)], poly [(9,9-dioctylfluorenyl-2,7-diyl) -co- (N, N'-bis {p-butylphenyl} -1,1'-biphenylene-4,4- Diamine)], poly [(9,9-bis {1'-pentene-5'-yl} fluorenyl-2,7-diyl) -co- (N, N'-bis {p-butylphenyl} -1, 4-diaminophenylene)], poly [N, N′-bis (4-butylphenyl) -N, N′-bis (phenyl) -benzidine] -end-capped with polysilsesquioxane, poly [(9,9) 9-didioctyl fluorenyl-2,7-diyl) -co- (4,4 '-(N- (p-butylphenyl)) diphenylamine)] etc. is mentioned.
発光性高分子材料としては、ポリ(9,9−ジアルキルフルオレン)(PDAF)等のポリフルオレン誘導体、ポリ(2−メトキシ−5−(2'−エチルヘキソキシ)−1,4−フェニレンビニレン)(MEH−PPV)等のポリフェニレンビニレン誘導体、ポリ(3−アルキルチオフェン)(PAT)等のポリチオフェン誘導体、ポリビニルカルバゾール(PVCz)等が挙げられる。 As the light emitting polymer material, polyfluorene derivatives such as poly (9,9-dialkylfluorene) (PDAF), poly (2-methoxy-5- (2′-ethylhexoxy) -1,4-phenylenevinylene) (MEH And polythiophene vinylene derivatives such as -PPV), polythiophene derivatives such as poly (3-alkylthiophene) (PAT), and polyvinylcarbazole (PVCz).
溶媒としては、トルエン、キシレン、クロロホルム等を挙げることができる。溶解又は均一分散法としては攪拌、加熱攪拌、超音波分散等の方法が挙げられる。 Examples of the solvent include toluene, xylene, chloroform and the like. As the dissolution or uniform dispersion method, methods such as stirring, heating and stirring, ultrasonic dispersion and the like can be mentioned.
塗布方法としては、特に限定されるものではなく、インクジェット法、スプレー法、ディップ法、スピンコート法、転写印刷法、ロールコート法、刷毛塗り等が挙げられる。なお、塗布は、窒素、アルゴン等の不活性ガス下で行うことが好ましい。 The coating method is not particularly limited, and examples thereof include an inkjet method, a spray method, a dip method, a spin coating method, a transfer printing method, a roll coating method, and a brush coating. The application is preferably performed under an inert gas such as nitrogen or argon.
焼成方法としては、不活性ガス下又は真空中、オーブン又はホットプレートで加熱する方法が挙げられる。 As a baking method, a method of heating with an oven or a hot plate under an inert gas or in vacuum is mentioned.
以下、合成例及び実施例を挙げて本発明をより具体的に説明するが、本発明は下記の実施例に限定されるものではない。なお、使用した装置は以下のとおりである。
(1)基板洗浄:長州産業(株)製 基板洗浄装置(減圧プラズマ方式)
(2)ワニスの塗布:ミカサ(株)製 スピンコーターMS-A100
(3)膜厚測定:(株)小坂研究所製 微細形状測定機サーフコーダET-4000
(4)EL素子の作製:長州産業(株)製 多機能蒸着装置システムC-E2L1G1-N
(5)EL素子の輝度等の測定:(有)テック・ワールド製 I-V-L測定システム
(6)EL素子の寿命測定(耐久性試験):(株)イーエッチシー製 有機EL輝度寿命評価システムPEL-105S
(7)NMR測定:日本電子(株)製 JNM-ECX300 FT NMR SYSTEM
(8)MS測定:ブルカー(株)製 autoflex III smartbem
Hereinafter, the present invention will be more specifically described by way of synthesis examples and examples, but the present invention is not limited to the following examples. In addition, the used apparatus is as follows.
(1) Substrate cleaning: substrate cleaning apparatus (reduced pressure plasma system) manufactured by Choshu Sangyo Co., Ltd.
(2) Application of varnish: Spin coater MS-A100 manufactured by Mikasa Co., Ltd.
(3) Film thickness measurement: manufactured by Kosaka Research Institute, Ltd. Fine shape measuring apparatus Surf coder ET-4000
(4) Fabrication of EL element: Multifunctional deposition system C-E2L1G1-N manufactured by Choshu Sangyo Co., Ltd.
(5) Measurement of luminance, etc. of EL element: IVL measurement system (6) manufactured by Tech World Co., Ltd. (6) Life measurement of EL element (durability test): Organic EL luminance life evaluation system PEL-manufactured by E-Hoc. 105S
(7) NMR measurement: JNM-ECX300 FT NMR SYSTEM manufactured by JEOL Ltd.
(8) MS measurement: Bruker Co. autoflex III smartbem
[合成例1]チオフェン誘導体1(式(1−1))の合成
[1]5−トリブチルスタニル−2,2'−ビチオフェンの合成
2,2'−ビチオフェン(東京化成工業(株)製)4.0gを反応容器に入れ、窒素置換をした後、テトラヒドロフラン120mLを入れ、−78℃に冷却した。−78℃に保ちながらn−ブチルリチウムのn−ヘキサン溶液(濃度1.64mol/L)14.7mLを滴下し、30分攪拌した。更にそこへ、トリ−n−ブチルクロロスタナン7.8mL(d 1.20)を滴下し、10分攪拌した後、室温まで昇温させ攪拌した。6時間後に反応液を濃縮し、得られた残渣にn−ヘキサン50mLを加え、ろ過により不溶物を除去した(ケーキ洗浄:n−ヘキサン30mL)。得られたろ液を濃縮・乾燥し、5−トリブチルスタニル−2,2'−ビチオフェンを含む暗赤色のオイルを12.64g得た。なお、精製はこれ以上行わず、本工程の収率を100%(理論収量:10.96g)として、純度を算出し(10.96/12.64×100=86.7%)、次工程の原料として使用した。 In a reaction vessel, 4.0 g of 2,2′-bithiophene (manufactured by Tokyo Chemical Industry Co., Ltd.) was placed, and after nitrogen substitution, 120 mL of tetrahydrofuran was placed and cooled to −78 ° C. 14.7 mL of n-hexane solution (concentration 1.64 mol / L) of n-butyllithium was dripped maintaining at -78 degreeC, and it stirred for 30 minutes. Furthermore, tri-n-butyl chlorostannane 7.8mL (d 1.20) was dripped there, and after stirring for 10 minutes, it heated up to room temperature and stirred. After 6 hours, the reaction solution was concentrated, 50 mL of n-hexane was added to the obtained residue, and the insoluble matter was removed by filtration (cake washing: n-hexane 30 mL). The obtained filtrate was concentrated and dried to obtain 12.64 g of a dark red oil containing 5-tributylstannyl-2,2'-bithiophene. In addition, purification is not performed any more and the yield is calculated to be 100% (theoretical yield: 10.96 g) in this step to calculate the purity (10.96 / 12.64 × 100 = 86.7%), and the next step Used as a raw material for
[2]チオフェン誘導体1の合成
トリブチルフェニルアミン(東京化成工業(株)製)2.0g及びPd(PPh3)4 0.24gを反応容器に入れ、窒素置換した後、別途予め調製した、[1]で合成した5−トリブチルスタニル−2,2'−ビチオフェン7.8g(純度86.7%)のジメチルホルムアミド(DMF)溶液100mLを加えた。110℃で2.5時間攪拌した後、反応液を1.5Lのメタノールで再沈殿させた。スラリーを室温にて15時間攪拌した後、ろ過を行い、得られたろ物にトルエン90mL、エタノール10mL及び活性炭0.75gを加え還流条件下1時間攪拌した。熱時ろ過を行い、得られたろ液を攪拌しながら0℃まで冷却し、0℃で2時間攪拌を続けた。スラリーをろ過し、ろ物を乾燥(80℃、2時間)し、目的とするチオフェン誘導体1を1.4g得た(収率47%)。1H−NMR及びTOF−MSの測定結果を以下に示す。
1H-NMR (300MHz, CDCl3) δ[ppm]:7.51(d, J=8.4Hz, 6H), 7.13-7.22(m, 18H), 7.01-7.04(m, 3H).
MALDI-TOF-MS m/Z found:737.29 ([M]+ calcd:737.05)
After placing 2.0 g of tributylphenylamine (manufactured by Tokyo Chemical Industry Co., Ltd.) and 0.24 g of Pd (PPh 3 ) 4 in a reaction vessel and carrying out nitrogen substitution, separately prepared in advance, 5-tributyl synthesized in [1] 100 mL of a dimethylformamide (DMF) solution of 7.8 g of stanyl-2,2'-bithiophene (purity 86.7%) was added. After stirring at 110 ° C. for 2.5 hours, the reaction solution was reprecipitated with 1.5 L of methanol. After the slurry was stirred at room temperature for 15 hours, filtration was performed, and 90 mL of toluene, 10 mL of ethanol and 0.75 g of activated carbon were added to the obtained filtrate, and stirred under reflux conditions for 1 hour. Hot filtration was performed, and the obtained filtrate was cooled to 0 ° C. with stirring, and stirring was continued at 0 ° C. for 2 hours. The slurry was filtered, and the filtrate was dried (80 ° C., 2 hours) to obtain 1.4 g of the target thiophene derivative 1 (yield 47%). The measurement results of 1 H-NMR and TOF-MS are shown below.
1 H-NMR (300 MHz, CDCl 3 ) δ [ppm]: 7.51 (d, J = 8.4 Hz, 6 H), 7.13-7.22 (m, 18 H), 7.01-7.04 (m, 3 H).
MALDI-TOF-MS m / Z found: 737.29 ([M] + calcd: 737.05)
[実施例1−1]
チオフェン誘導体1 0.077g及びリンタングステン酸(PTA、関東化学(株)製)0.387gを、N,N−ジメチルアセトアミド7.5gに溶解させた。得られた溶液にジエチレングリコールジメチルエーテル7.5gを加えて攪拌し、そこへペンタフルオロフェニルトリエトキシシラン0.014gを加えて攪拌し、電荷輸送性ワニスを調製した。
Example 1-1
0.077 g of thiophene derivative 1 and 0.387 g of phosphotungstic acid (PTA, manufactured by Kanto Chemical Co., Ltd.) were dissolved in 7.5 g of N, N-dimethylacetamide. 7.5 g of diethylene glycol dimethyl ether was added to the obtained solution and stirred, 0.014 g of pentafluorophenyltriethoxysilane was added thereto, and the mixture was stirred to prepare a charge transporting varnish.
[実施例1−2及び1−3]
チオフェン誘導体1及びPTAの使用量を、それぞれ0.042g及び0.422g(実施例1−2)、0.022g及び0.353g(実施例1−3)とした以外は、実施例1−1と同様の方法で電荷輸送性ワニスを調製した。
[Examples 1-2 and 1-3]
Example 1-1 except that the amounts of the thiophene derivative 1 and PTA used were 0.042 g and 0.422 g (Example 1-2), 0.022 g and 0.353 g (Example 1-3), respectively. The charge transporting varnish was prepared in the same manner as in the above.
[実施例1−4]
チオフェン誘導体1 0.062g及びPTA0.309gを、1,3−ジメチル−2−イミダゾリジノン3.6gに溶解させた。得られた溶液に1,3−ブタンジオール2.4g及びジエチレングリコールジメチルエーテル6.0gを加えて攪拌し、そこへF4TCNQ(東京化成工業(株)製)0.026gを加えて攪拌し、電荷輸送性ワニスを調製した。
Example 1-4
0.062 g of the thiophene derivative 1 and 0.309 g of PTA were dissolved in 3.6 g of 1,3-dimethyl-2-imidazolidinone. To the obtained solution, 2.4 g of 1,3-butanediol and 6.0 g of diethylene glycol dimethyl ether are added and stirred, to which 0.026 g of F4TCNQ (manufactured by Tokyo Chemical Industry Co., Ltd.) is added and stirred, and charge transportability is obtained. A varnish was prepared.
[実施例1−5]
チオフェン誘導体1及びPTAの使用量を、0.034g及び0.337gとした以外は、実施例1−4と同様の方法で電荷輸送性ワニスを調製した。
[Example 1-5]
The charge transporting varnish was prepared in the same manner as in Example 1-4 except that the amounts of the thiophene derivative 1 and PTA used were 0.034 g and 0.337 g.
[実施例1−6]
チオフェン誘導体1 0.052g及びPTA0.258gを、1,3−ジメチル−2−イミダゾリジノン3gに溶解させた。得られた溶液に1,3−ブタンジオール3g及びジエチレングリコールジメチルエーテル4gを加えて攪拌し、そこへF4TCNQ0.031gを加えて攪拌し、電荷輸送性ワニスを調製した。
[Example 1-6]
0.052 g of the thiophene derivative 1 and 0.258 g of PTA were dissolved in 3 g of 1,3-dimethyl-2-imidazolidinone. To the resulting solution was added 3 g of 1,3-butanediol and 4 g of diethylene glycol dimethyl ether, and the mixture was stirred, and then 0.031 g of F4TCNQ was added thereto and stirred to prepare a charge transporting varnish.
[実施例2−1]
実施例1−1で得られたワニスを、スピンコーターを用いてITO基板に塗布した後、50℃で5分間乾燥し、更に、大気雰囲気下、150℃で10分間焼成し、ITO基板上に30nmの均一な薄膜を形成した。ITO基板として、インジウム錫酸化物(ITO)が表面上に膜厚150nmでパターニングされた25mm×25mm×0.7tのガラス基板を用い、使用前にO2プラズマ洗浄装置(150W、30秒間)によって表面上の不純物を除却した。
次いで、薄膜を形成したITO基板に対し、蒸着装置(真空度1.0×10-5Pa)を用いてN,N'−ジ(1−ナフチル)−N,N'−ジフェニルベンジジン(α−NPD)、トリス(8−キノリノラート)アルミニウム(III)(Alq3)、フッ化リチウム、及びアルミニウムの薄膜を順次積層し、有機EL素子を得た。この際、蒸着レートは、α−NPD、Alq3及びアルミニウムについては0.2nm/秒、フッ化リチウムについては0.02nm/秒の条件でそれぞれ行い、膜厚は、それぞれ30nm、40nm、0.5nm及び120nmとした。
なお、空気中の酸素、水等の影響による特性劣化を防止するため、有機EL素子は封止基板により封止した後、その特性を評価した。封止は、以下の手順で行った。
酸素濃度2ppm以下、露点−85℃以下の窒素雰囲気中で、有機EL素子を封止基板の間に収め、封止基板を接着材(ナガセケムテックス(株)製、XNR5516Z-B1)により貼り合わせた。この際、捕水剤(ダイニック(株)製、HD-071010W-40)を有機EL素子と共に封止基板内に収めた。
貼り合わせた封止基板に対し、UV光を照射(波長:365nm、照射量:6,000mJ/cm2)した後、80℃で1時間、アニーリング処理して接着材を硬化させた。
Example 2-1
The varnish obtained in Example 1-1 is applied to an ITO substrate using a spin coater, dried at 50 ° C. for 5 minutes, and further fired at 150 ° C. for 10 minutes in the air atmosphere to obtain an ITO substrate. A uniform thin film of 30 nm was formed. A 25 mm × 25 mm × 0.7 t glass substrate patterned with indium tin oxide (ITO) on the surface with a film thickness of 150 nm is used as an ITO substrate by an O 2 plasma cleaning device (150 W, 30 seconds) before use The impurities on the surface were removed.
Next, N, N'-di (1-naphthyl) -N, N'-diphenylbenzidine (.alpha.-) is formed on a thin film formed ITO substrate using a vapor deposition apparatus (vacuum degree 1.0.times.10.sup.- 5 Pa). Thin films of NPD), tris (8-quinolinolato) aluminum (III) (Alq 3 ), lithium fluoride and aluminum were sequentially laminated to obtain an organic EL device. At this time, the deposition rate is 0.2 nm / sec for α-NPD, Alq 3 and aluminum, and 0.02 nm / sec for lithium fluoride, and the film thickness is 30 nm, 40 nm, 0. It was 5 nm and 120 nm.
In addition, in order to prevent the characteristic degradation by the influence of oxygen in the air, water, etc., after sealing the organic EL element with a sealing substrate, the characteristic was evaluated. Sealing was performed in the following procedure.
The organic EL element is housed between the sealing substrate in a nitrogen atmosphere with an oxygen concentration of 2 ppm or less and a dew point of -85 ° C. or less, and the sealing substrate is bonded with an adhesive (XNR5516Z-B1, manufactured by Nagase ChemteX Co., Ltd.) The At this time, a water-capturing agent (HD-071010W-40, manufactured by Dynik Co., Ltd.) was placed in the sealing substrate together with the organic EL element.
The sealing substrate thus bonded was irradiated with UV light (wavelength: 365 nm, irradiation amount: 6,000 mJ / cm 2 ), and then annealed at 80 ° C. for 1 hour to cure the adhesive.
[実施例2−2〜2−6]
実施例1−1で得られたワニスの代わりに、実施例1−2〜1−6で得られたワニスを用いた以外は、実施例2−1と同様の方法で有機EL素子を作製した。
[Examples 2-2 to 2-6]
An organic EL device was manufactured in the same manner as in Example 2-1 except that the varnish obtained in Examples 1-2 to 1-6 was used instead of the varnish obtained in Example 1-1. .
各素子の駆動電圧5Vにおける電流密度及び輝度を測定した。結果を表1に示す。 The current density and luminance at a drive voltage of 5 V of each element were measured. The results are shown in Table 1.
表1に示したように、本発明のワニスによって、優れた輝度特性を有する有機EL素子を実現することができた。 As shown in Table 1, the varnish of the present invention could realize an organic EL element having excellent luminance characteristics.
実施例2−1〜2−6で作製した素子の耐久性試験を行った。輝度の半減期(初期輝度5,000cd/m2)を表2に示す。 The durability test of the element produced by Example 2-1 to 2-6 was done. The half life of the luminance (initial luminance 5,000 cd / m 2 ) is shown in Table 2.
表2に示したように、本発明のワニスによって、優れた耐久性を有する有機EL素子を実現することができた。 As shown in Table 2, the varnish of the present invention was able to realize an organic EL device having excellent durability.
Claims (10)
Y1〜Y8は、それぞれ独立に、Z1で置換されていてもよい炭素数1〜20のアルキル基、Z1で置換されていてもよい炭素数2〜20のアルケニル基、Z1で置換されていてもよい炭素数2〜20のアルキニル基又はZ2で置換されていてもよい炭素数6〜20のアリール基を表し、
Z1は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基又はZ3で置換されていてもよい炭素数6〜20のアリール基を表し、
Z2は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基、カルボン酸基、Z3で置換されていてもよい炭素数1〜20のアルキル基、Z3で置換されていてもよい炭素数2〜20のアルケニル基又はZ3で置換されていてもよい炭素数2〜20のアルキニル基を表し、
Z3は、ハロゲン原子、ニトロ基、シアノ基、アルデヒド基、ヒドロキシ基、チオール基、スルホン酸基又はカルボン酸基を表し、
n1〜n3は、それぞれ独立に2〜10の整数を表す。)
Y 1 to Y 8 each independently represent an alkyl group having carbon atoms which may be have 1-20 substituted with Z 1, alkenyl group which may C2-20 optionally substituted by Z 1, in Z 1 Represents a C2-C20 alkynyl group which may be substituted or a C6-C20 aryl group which may be substituted by Z 2 ,
Z 1 represents a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a sulfonic acid group, a carboxylic acid group, or an aryl group having 6 to 20 carbon atoms which may be substituted with Z 3 ;
Z 2 is a halogen atom, a nitro group, a cyano group, an aldehyde group, hydroxy group, thiol group, sulfonic acid group, a carboxylic acid group, an alkyl group of Z 3 carbon atoms which may be substituted with 1 to 20, Z 3 And an alkenyl group of 2 to 20 carbon atoms which may be substituted or an alkynyl group of 2 to 20 carbon atoms which may be substituted by Z 3 ;
Z 3 represents a halogen atom, a nitro group, a cyano group, an aldehyde group, a hydroxy group, a thiol group, a sulfonic acid group or a carboxylic acid group,
n 1 to n 3 each independently represent an integer of 2 to 10. )
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