JP6498343B2 - Imprint apparatus, imprint method, article manufacturing method, molding apparatus, and molding method. - Google Patents

Description

  The present invention relates to an imprint apparatus, an imprint method, an article manufacturing method, a molding apparatus, and a molding method.

  The imprint apparatus places an imprint material on a pattern formation region of a member by a dispenser, contacts the pattern region of the mold with the imprint material, and cures the imprint material, thereby imprint material on the member. A pattern made of a cured product is formed. A mold can also be referred to as a mold, template or master. If there is an abnormality in the dispenser, the imprint material is not correctly arranged in the pattern formation region of the member, so that a pattern having a defect can be formed.

  Patent Document 1 describes that, after an imprint material is supplied onto a substrate by a dispenser, the observation unit observes the imprint material through a mold to determine whether or not the imprint material is missing. Yes. If no abnormality is found as a result of this determination, the process proceeds to a process of bringing the mold into contact with the imprint material on the substrate and curing it.

JP 2016-111335 A

  An object of this invention is to provide the advantageous technique for detecting abnormality of a dispenser.

  One aspect of the present invention is that the imprint material is cured by curing the imprint material in a state where the imprint material on the pattern formation region where the pattern is to be formed on the member is in contact with the pattern region of the mold. In the imprint apparatus for forming a pattern, the imprint apparatus includes a dispenser that disposes an imprint material in the pattern formation region and a non-pattern formation region outside the pattern formation region in the member, A detection unit that detects the non-pattern formation region in a state where the imprint material is arranged by the dispenser on the pattern formation region and the non-pattern formation region, and based on a detection result of the non-pattern formation region by the detection unit And a controller that performs processing for determining abnormality of the dispenser.

  According to the present invention, an advantageous technique for detecting an abnormality of a dispenser is provided.

The figure which shows the structure of the imprint apparatus of 1st Embodiment. The figure which shows typically the image imaged by the imaging part, when there is no abnormality in a dispenser. The figure which shows typically the image imaged by the imaging part when there is abnormality in a dispenser. The figure which shows typically the result (b) which processed the image (a) imaged by the imaging part when there is abnormality in a dispenser, and this image. The figure which shows typically the image imaged by the imaging part. The figure which illustrates the imprint material arrange | positioned according to a 2nd map. FIG. 3 is a diagram illustrating an operation of the imprint apparatus according to the first embodiment. The figure which shows a part of structure of the imprint apparatus of 2nd Embodiment. The figure explaining operation | movement of the imprint apparatus of 2nd Embodiment. The figure explaining the article | item manufacturing method. The figure which illustrates the vicinity of the pattern formation area of a member.

  Hereinafter, the present invention will be described through exemplary embodiments thereof with reference to the accompanying drawings.

  FIG. 1 shows a configuration of an imprint apparatus 100 according to the first embodiment of the present invention. The imprint apparatus 100 of 1st Embodiment is comprised so that the pattern of the master mold as the type | mold 102 may be transferred to the blank mold as the member 103 of pattern formation object, and a replica mold may be formed. However, as will be described later, the imprint apparatus of the present invention is not limited to such an application example, and the pattern of the mold 102 is transferred to a substrate such as a semiconductor substrate as the member 103 to be patterned. May be configured.

  The imprint apparatus 100 cures the imprint material in a state where the imprint material on the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 are in contact with each other, so that the imprint apparatus 100 A pattern is formed. The member 103 includes a base portion 201 and a mesa portion 202 protruding from the base portion 201, and the surface of the mesa portion 202 constitutes a single pattern formation region 203. The member 103 has a non-pattern formation region 204 outside the pattern formation region 203 (outside the mesa portion 202). The non-pattern forming region 204 does not contact the pattern region 213 of the mold 102. The mold 102 includes a base portion 211 and a mesa portion 212 protruding from the base portion 211, and the surface of the mesa portion 212 forms a pattern region 213. In the pattern region 213, a pattern to be transferred to the pattern formation region 203 of the member 103 is formed. The mold 102 has a non-pattern region 214 outside the pattern region 213 (outside the mesa portion 212).

  As the imprint material, a curable composition (which may be referred to as an uncured resin) that cures when energy for curing is applied is used. As the energy for curing, electromagnetic waves, heat, or the like can be used. The electromagnetic wave can be, for example, light having a wavelength selected from a range of 10 nm to 1 mm, for example, infrared rays, visible rays, ultraviolet rays, and the like. The curable composition may be a composition that is cured by light irradiation or by heating. Among these, the photocurable composition that is cured by light irradiation contains at least a polymerizable compound and a photopolymerization initiator, and may further contain a non-polymerizable compound or a solvent as necessary. The non-polymerizable compound is at least one selected from the group consisting of a sensitizer, a hydrogen donor, an internal release agent, a surfactant, an antioxidant, and a polymer component. The imprint material can be disposed on the substrate in the form of droplets or in the form of islands or films formed by connecting a plurality of droplets. The viscosity of the imprint material (viscosity at 25 ° C.) can be, for example, 1 mPa · s or more and 100 mPa · s or less.

  In this specification and the accompanying drawings, directions are shown in an XYZ coordinate system in which a direction parallel to the surface of the pattern formation region 203 of the member 103 is an XY plane. In the XYZ coordinate system, the directions parallel to the X, Y, and Z axes are the X, Y, and Z directions, respectively, and rotation around the X axis, rotation around the Y axis, and rotation around the Z axis are θX and θY, respectively. , ΘZ. The control or drive related to the X axis, Y axis, and Z axis means control or drive related to the direction parallel to the X axis, the direction parallel to the Y axis, and the direction parallel to the Z axis, respectively. The control or drive related to the θX axis, θY axis, and θZ axis relates to rotation around an axis parallel to the X axis, rotation around an axis parallel to the Y axis, and rotation around an axis parallel to the Z axis. Means control or drive. The position is information that can be specified based on the coordinates of the X axis, the Y axis, and the Z axis, and the posture is information that can be specified by the values of the θX axis, the θY axis, and the θZ axis. Positioning means controlling position and / or attitude. The alignment can include control of the position and / or attitude of at least one of the member 103 and the mold 102.

  The imprint apparatus 100 can include a member driving mechanism 120 that holds and drives the member 103. The member driving mechanism 120 can include a stage 104 having a chuck 114 that holds the member 103, a support 113 that supports the stage 104, and a driving mechanism 115 that drives the member 103 by driving the stage 104. The imprint apparatus 100 can also include a mold drive mechanism 101 that holds and drives the mold 102. The member drive mechanism 120 and the mold drive mechanism 101 constitute a relative drive mechanism 150 that drives at least one of the member 103 and the mold 102 so that the relative position between the member 103 and the mold 102 is adjusted.

  The adjustment of the relative position by the relative drive mechanism 150 includes a drive for contacting the mold 102 to the imprint material on the member 103 and separating the mold 102 from the cured imprint material (cured material pattern). sell. The member driving mechanism 120 has the member 103 as a plurality of axes (for example, three axes of X axis, Y axis, and θZ axis, preferably six axes of X axis, Y axis, Z axis, θX axis, θY axis, and θZ axis). ). The mold driving mechanism 101 includes a mold 102 having a plurality of axes (for example, three axes of Z axis, θX axis, and θY axis, preferably six axes of X axis, Y axis, Z axis, θX axis, θY axis, and θZ axis). ).

  In addition, the imprint apparatus 100 can include a dispenser 106, an off-axis alignment scope 107, a curing unit 105, an imaging unit 109, an imaging light source 110, an on-axis alignment scope 111, a gas supply unit 125, a control unit 130, and the like. The dispenser 106 can be configured or controlled to dispose the imprint material in the pattern formation region 203 and the non-pattern formation region 204 in the surface of the member 103.

  For example, the dispenser 106 is configured so that the imprint material is arranged in the pattern formation region 203 and the non-pattern formation region 204 in a state where the member 103 is continuously scanned in a predetermined direction by the member driving mechanism 120. Is discharged. The off-axis alignment scope 107 is an alignment scope for detecting the position of the alignment mark on the member 103 without using the mold 102. The curing unit 105 cures the imprint material by irradiating the imprint material disposed on the member 103 with energy for curing (for example, light such as ultraviolet rays). The imaging unit 109 (observation unit, detection unit) images (observes and detects) the pattern formation region 203 and the non-pattern formation region 204 through the mold 102.

  The imaging light source 110 illuminates the member 103 with light having a wavelength that does not cure the imprint material for imaging by the imaging unit 109. Examples of the wavelength include visible light and infrared light. The imaging unit 109 includes a two-dimensional image sensor such as a CCD image sensor or a CMOS image sensor. When using infrared light, imaging can be performed using a near-infrared camera equipped with an InGaAs device having sensitivity to infrared light. The imprint material can include a material that absorbs light in the near-infrared region. In such a case, the presence or absence of the imprint material can be detected as a light-dark difference. An image sensor (polarization camera) in which a polarizing plate is disposed in front of the image sensor can also be used. Since the polarization camera can detect polarized light in a certain direction scattered by the test object, it is possible to prevent stray light from being received. The on-axis alignment scope 111 detects the relative position between the alignment mark on the member 103 and the alignment mark on the mold 102, or detects the position of the alignment mark on the member 103 and the reference mark on the reference plate 112.

  The gas supply unit 125 is disposed around the mold 102 and supplies a purge gas to the periphery of the mold 102. As the purge gas, a gas that does not inhibit the curing of the imprint material, for example, a gas including at least one of helium gas, nitrogen gas, and a condensable gas (for example, pentafluoropropane (PFP)) may be used. The control unit 130 is, for example, a PLD (abbreviation of Programmable Logic Device) such as FPGA (abbreviation of Field Programmable Gate Array), or an ASIC (abbreviation of Application Specific Integrated Computer, or an abbreviation of a computer program integrated with a computer). Or a combination of all or part of them.

  Although not shown, the imprint apparatus 100 can include a deformation mechanism that deforms the member 103 into a convex shape toward the mold 102 by applying pressure to the back surface of the member 103. Further, the imprint apparatus 100 can include a deformation mechanism that deforms the mold 102 into a convex shape toward the member 103 by applying pressure to the back surface of the mold 102. By providing these deformation mechanisms, the imprint material on the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 can be first brought into contact at the center. Thereafter, by gradually reducing the deformation amount of the member 103 and the mold 102, the contact area between the imprint material and the pattern area 213 of the mold 102 can be gradually enlarged.

  Hereinafter, the operation of the imprint apparatus 100 according to the first embodiment will be exemplarily described. Operations described below can be controlled by the control unit 130. First, the mold 102 (master mold) is attached to the mold drive mechanism 101. Next, the relative position between the alignment mark of the mold 102 and the reference mark of the reference plate 112 is detected using the on-axis alignment scope 111.

  Next, the member 103 (blank mold) is conveyed to the chuck 114 of the stage 104 of the member driving mechanism 120 and is held by the chuck 114. Next, the position of the alignment mark on the member 103 and the position of the reference mark on the reference plate 112 are detected using the off-axis alignment scope 107, and the relative position between the member 103 (pattern forming region 203) and the reference mark is detected. Is detected. Thereby, the relative position between the member 103 (pattern forming region 203) and the mold 102 is obtained. Next, based on the relative position between the member 103 (pattern formation region 203) and the mold 102, the member drive mechanism 120 positions the member 103 so that the alignment mark of the member 103 enters the field of view of the on-axis alignment scope 111. . Next, the relative position between the alignment mark of the member 103 and the alignment mark of the mold 102 (the relative position of the pattern formation area 203 of the member 103 and the pattern area 213 of the mold 102) is detected using the on-axis alignment scope 111. The Based on this relative position, the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 can be aligned.

  Next, the imprint material is disposed in the pattern formation region 203 and the non-pattern formation region 204 of the member 103 by the dispenser 106. Here, the dispenser 106 imprints into the pattern formation region 203 and the non-pattern formation region 204 by, for example, discharging the imprint material while the member 103 is continuously scanned in the predetermined direction by the member driving mechanism 120. Place the print material.

  Next, the member drive mechanism 120 and the mold drive mechanism 101 are controlled so that the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 are aligned. At this time, the relative position between the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 is detected again using the on-axis alignment scope 111, and the pattern formation region 203 and the pattern region 213 are detected based on the relative position. And may be aligned. Alternatively, detection of the relative position by the on-axis alignment scope 111 before the imprint material is arranged in the pattern formation region 203 and the non-pattern formation region 204 by the dispenser 106 may be omitted. The imprint apparatus 100 may include a shape correction mechanism, and the shape of the pattern region 213 may be corrected by the shape correction mechanism.

  Next, an imprint process for forming a pattern in the pattern formation region 203 of the member 103 and a defect detection process are executed. The imprint process may include a contact process, a filling process, a curing process, and a separation process. The contact step is a step of bringing the imprint material on the pattern formation region 203 of the member 103 into contact with the pattern region 213 of the mold 102, and can be performed by the control unit 130 operating the relative drive mechanism 150. The filling step is a step of filling the imprint material in the concave portion of the pattern region 213 of the mold 102. The curing process can be performed by the control unit 130 controlling the curing unit 105 so that the curing unit 105 irradiates the imprint material on the pattern formation region 203 and the non-pattern formation region 204 with energy for curing. The separation step is a step of separating the cured product (pattern) of the imprint material on the pattern formation region of the member 103 and the pattern region 213 of the mold 102. The separation process can be performed by the control unit 130 operating the relative drive mechanism 150. Further, the imprint material on the non-pattern forming region 204 may be cured after the separation step.

  The defect detection process can be executed by the control unit 130 based on an image captured by the imaging unit 109 (a detection result detected by the imaging unit 109). The defect detection process can include a defect detection process for detecting an unfilled defect and an abnormality detection process for detecting an abnormality of the dispenser 106. In this case, the imaging unit 109 can be configured to image (detect) both the pattern formation region 203 and the non-pattern formation region 204. However, the abnormality detection process may be only a process of detecting an abnormality of the dispenser 106. In this case, the imaging unit 109 images only the non-pattern formation area 204 of the pattern formation area 203 and the non-pattern formation area 204. Can be configured to.

  The defect detection process for detecting an unfilled defect can be understood as a process for detecting an abnormality in the process of forming a pattern in the pattern formation region 203. The unfilled defect is that the imprint material is not filled in the pattern region 213 (recessed portion) of the mold 102 due to, for example, a foreign substance attached to the member 103 or the mold 102, chemical contamination of the member 103 or the mold 102, air bubbles being taken in, Is. The abnormality of the dispenser 106 that can be detected in the abnormality detection process can be, for example, a state where the imprint material is not discharged from the nozzle of the dispenser 106 or a state where an appropriate amount of the imprint material is not discharged from the nozzle of the dispenser 106.

  When the surface of the member 103 is lyophobic, the imprint material arranged in the pattern formation region 203 of the member 103 maintains the droplet shape, so that it is easy to identify individual imprint materials. . Therefore, when the surface of the member 103 has lyophobic properties, the pattern formation region 203 of the member 103 is imaged by the imaging unit 109, and an abnormality of the dispenser 106 is detected by processing the image obtained by the imaging. sell.

  However, in order to improve the filling property of the imprint material into the pattern region 213 (concave portion) of the mold 102, the pattern forming region 203 of the member 103 can be treated to be lyophilic. When the pattern formation region 203 is lyophilic, the imprint material supplied to the pattern formation region 203 spreads on the pattern formation region 203, forms an imprint material film with the surrounding imprint material, and cannot be identified. become. Therefore, when the pattern formation region 203 of the member 103 is lyophilic, it is difficult to identify the imprint material arranged in the pattern formation region 203 of the member 103. Therefore, when the pattern formation region 203 of the member 103 is lyophilic, it is difficult to detect an abnormality of the dispenser 106 by processing an image obtained by imaging the pattern formation region 203 of the member 103 by the imaging unit 109.

  Thus, in the first embodiment, the imprint material is arranged in the non-pattern forming region 204 of the member 103 by the dispenser 106, and the non-pattern forming region 204 is imaged by the imaging unit 109. Then, the control unit 130 performs a process for determining the abnormality of the dispenser 106 based on the image of the non-pattern formation region 204 imaged by the imaging unit 109. The process for determining the abnormality of the dispenser 106 may include an abnormality detection process for detecting an abnormality of the dispenser 106 based on the image of the non-pattern formation region 204 imaged by the imaging unit 109. The abnormality detection process may include a process of detecting a nozzle that cannot discharge the imprint material among the plurality of nozzles of the dispenser 106. Alternatively, the abnormality detection process may include a process of detecting a nozzle having an abnormal discharge amount of the imprint material among the plurality of nozzles of the dispenser 106.

  Here, it is easier to detect an abnormality of the dispenser 106 depending on the presence or absence of the imprint material when the non-pattern forming region 204 is lyophobic, but the non-pattern forming region 204 may be lyophilic. The reason for this can be explained as follows.

  Since the imprint material on the pattern formation region 203 has a small gap between the pattern formation region 203 and the pattern region 213 facing the imprint material 203, the imprint material has a relatively high vapor pressure and is relatively difficult to volatilize. Further, the imprint material on the pattern formation region 203 hardly volatilizes after the pattern region 213 of the mold 102 comes into contact therewith. On the other hand, since the imprint material on the non-pattern forming region 204 has a large gap between the non-pattern forming region 204 and the non-pattern region 214 opposed thereto, the vapor pressure of the imprint material is relatively low. It is easy to volatilize. In addition, even after the pattern region 213 of the mold 102 contacts the imprint material on the pattern formation region 203, the imprint material on the non-pattern formation region 204 is exposed to the surrounding atmosphere (for example, purge gas). It is relatively easy to volatilize. Therefore, even if the imprint material forms a film immediately after the pattern formation region 203 has lyophilicity and the imprint material is supplied onto the pattern formation region 203, the imprint material is formed after that. Imprint materials can be reduced by partial volatilization. This makes it possible to identify the presence or amount of the imprint material. Here, the relative vapor pressure is an expression for comparing the vapor pressure in the space above the pattern formation region 203 and the vapor pressure in the space above the non-pattern formation region 204. The relative volatility is an expression that compares the volatility in the space above the pattern formation region 203 and the volatility in the space above the non-pattern formation region 204.

  2A to 2F schematically show transitions of images captured by the imaging unit 109 when there is no abnormality in the dispenser 106. The imaging unit 109 images the pattern formation region 203 and the non-pattern formation region 204. In FIG. 2A, the imprint materials IM and IM ′ are arranged in the pattern formation region 203 and the non-pattern formation region 204 of the member 103 by the dispenser 106, and immediately after the pattern formation region 203 is positioned under the mold 102. The state is shown schematically.

  The dispenser 106 arranges the imprint material IM in the pattern formation region 203 of the member 103 according to the first map MP1, and the imprint material IM ′ in the non-pattern formation region 204 according to the second map MP2 different from the first map MP1. It can be controlled to arrange. For example, the second map MP <b> 2 can be created so that the imprint material IM ′ is discharged from all the nozzles of the dispenser 106. Further, the second map MP2 can be created so that individual imprint materials IM 'applied by the dispenser 106 to the non-pattern forming region 204 in the droplet state can be individually identified.

  The dispenser 106 uses the second map so that the imprint material IM ′ is arranged in the non-pattern formation region 204 using all of the plurality of nozzles for arranging the imprint material IM in the pattern formation region 203 according to the first map MP1. It can be controlled according to MP2. Thereby, it can be grasped that a defect occurs in the process of arranging the imprint material IM in the pattern formation region 203.

  In FIG. 2B, the member 103 and the mold 102 are each deformed into a convex shape by the deformation mechanism, and the imprint material IM on the pattern formation region 203 and the central portion of the pattern region 213 are formed by the relative drive mechanism 150. The contact state is schematically shown. An interference fringe (Newton ring) appears in the center of the image. FIG. 2C schematically shows a state in which the imprint material IM on the pattern formation region 203 of the member 103 and the entire pattern region 213 of the mold 102 are in contact with each other. Here, the distance between the member 103 and the mold 102 can be reduced by the relative drive mechanism 150 while relaxing the deformation of the member 103 and the mold 102 by the deformation mechanism. As a result, the imprint material IM on the pattern formation region 203 can be brought into contact with the entire area of the pattern region 213. In the state shown in FIG. 2C, bubbles called microbubbles may exist in the imprint material IM on the pattern formation region 203.

  FIG. 2D schematically shows a state immediately before the imprint material IM is filled in the recesses of the pattern region 213 of the mold 102 and the imprint material is cured. FIG. 2E schematically shows a state in which the imprint material is irradiated with curing energy (here, light such as ultraviolet rays) in order to cure the imprint material IM. FIG. 2F schematically shows a state where the cured product of the imprint material IM and the pattern region 213 of the mold 102 are separated by increasing the distance between the member 103 and the mold 102 by the relative drive mechanism 150. Has been.

  In the example of FIG. 2, in the states (a) to (c), the imprint material IM ′ on the non-pattern formation region 204 is not observed as an isolated droplet. This is because the imprint material IM ′ forms a continuous film on the non-pattern forming region 204. However, the imprint material IM ′ on the non-pattern forming region 204 is volatilized gradually and the volume is reduced, so that the droplets are separated from each other, and can be identified in the state (d). . Further, when the states (e) and (f) are reached, the distinction can be made more clearly.

FIGS. 3A to 3F schematically show transitions of images captured by the imaging unit 109 when the dispenser 106 has an abnormality (nozzle that cannot eject the imprint material). 3A to 3F are images captured at timings corresponding to FIGS. 2A to 2F, respectively. In FIG. 3A, the imprint materials IM and IM ′ are arranged in the pattern formation region 203 and the non-pattern formation region 204 of the member 103 by the dispenser 106, and immediately after the pattern formation region 203 is positioned under the mold 102. The state is shown schematically.
In FIG. 3B, the member 103 and the mold 102 are each deformed into a convex shape by the deformation mechanism, and the imprint material IM on the pattern formation region 203 and the central portion of the pattern region 213 are formed by the relative drive mechanism 150. The contact state is schematically shown. An interference fringe (Newton ring) appears in the center of the image. FIG. 3C schematically shows a state in which the imprint material IM on the pattern formation region 203 of the member 103 and the entire pattern region 213 of the mold 102 are in contact with each other. In the state shown in FIG. 3C, a discharge abnormality 250 due to an abnormality (nozzle that cannot discharge the imprint material) in the dispenser 106 appears slightly.

  FIG. 3D schematically shows a state immediately before the imprint material IM has been filled after the filling of the imprint material IM into the concave portion of the pattern region 213 of the mold 102 is completed. In the state shown in FIG. 3D, the ejection abnormality 250 due to the abnormality (nozzle that cannot eject the imprint material) in the dispenser 106 clearly appears. FIG. 3 (e) schematically shows a state in which the imprint material is irradiated with curing energy (in this case, light such as ultraviolet rays) in order to cure the imprint material IM. Even in the state shown in FIG. 3 (e), the ejection abnormality 250 due to the abnormality (nozzle that cannot eject the imprint material) in the dispenser 106 clearly appears. FIG. 3F schematically shows a state where the cured product of the imprint material IM and the pattern region 213 of the mold 102 are separated by increasing the distance between the member 103 and the mold 102 by the relative drive mechanism 150. Has been. In the state shown in FIG. 3F, the ejection abnormality 250 appears due to the abnormality (nozzle that cannot eject the imprint material) in the dispenser 106.

  Considering the above, the control unit 130 detects an abnormality based on the image of the non-pattern formation region 204 imaged by the imaging unit 109 in a state where the entire area of the pattern region 213 is in contact with the imprint material IM on the pattern formation region 203. A detection process can be executed. Alternatively, the control unit 130 is based on the image of the non-pattern forming region 204 captured by the imaging unit 109 after the entire area of the pattern region 213 is in contact with the imprint material IM and before the imprint material IM is cured. An abnormality detection process can be executed. Alternatively, the control unit 130 can execute the abnormality detection process based on the image of the non-pattern formation region 204 captured by the imaging unit 109 during the period in which the imprint material IM on the pattern formation region 203 is cured.

  Alternatively, the control unit 130 controls the non-pattern forming region 204 captured by the image capturing unit 109 during a period in which the cured imprint material IM on the pattern forming region 203 and the pattern region 213 are driven. An abnormality detection process can be executed based on the image. Alternatively, the control unit 130 may separate the member 103 and the mold 102 in the X and Y directions (in other words, the direction parallel to the pattern formation region 203) after the cured imprint material IM and the pattern region 213 are separated. The abnormality detection process can be executed based on the image of the non-pattern formation region 204 imaged by the imaging unit 109 before the relative position is changed.

  As illustrated in FIG. 4A, the plurality of nozzles (portions indicated by white circles) of the dispenser 106 can be arranged along the Y direction. For example, the control unit 130 integrates the luminance in the image of the non-pattern formation region 204 in the image 300 captured by the imaging unit 109 with respect to the X direction, and obtains a result as illustrated in FIG. Here, the X direction is the scanning direction of the member 103 when the dispenser 106 arranges the imprint material. In FIG. 4B, the horizontal axis represents the position in the Y direction, and the vertical axis represents the integrated value obtained by integrating the brightness (Brightness) in the image of the non-pattern forming region 204 in the X direction. The control unit 130 can identify the position where the imprint material IM ′ is not disposed (position in the Y direction), that is, the nozzle that cannot eject the imprint material, by comparing the integral value with the threshold value T. .

  According to the first embodiment, the imprint material IM ′ is arranged in the non-pattern forming area 204 outside the pattern forming area 203, and the abnormality of the dispenser 106 is detected based on the image of the non-pattern forming area 204. Therefore, in the first embodiment, the abnormality of the dispenser 106 can be detected with a smaller load (calculation load such as image processing) than the method of detecting the abnormality of the dispenser 106 based on the entire image of the pattern formation region 203. . Further, according to the first embodiment, the abnormality detection process can be executed in parallel with the imprint process, so that a decrease in throughput due to the execution of the abnormality detection process can be suppressed.

  By adopting an imaging unit with high resolution as the imaging unit 109, a plurality of imprint materials IM 'in a droplet state can be individually identified. Thereby, the characteristic of each nozzle of the dispenser 106 can be evaluated individually. In the example shown in FIG. 5, the nozzle 501 of the dispenser 106 is a nozzle that can eject the imprint material IM ′, but disposes the imprint material IM ′ at a position shifted from the target position. Here, in FIG. 5, the dotted line indicates the target position. The control unit 130 can specify the nozzle 501 based on the image captured by the imaging unit 109.

  As illustrated in FIG. 6, even when the individual imprint material IM ′ supplied by the dispenser 106 spreads in the non-patterned region 204 of the member 103, the individual imprint material IM ′ can be identified. A second map MP2 in which 'is placed can be used. In this case, there is no need to wait for the individual imprint material IM 'to be identified by the volatilization of the imprint material IM'. That is, immediately after being supplied to the non-pattern forming region 204 of the member 103 by the dispenser 106, an abnormality detection process for detecting an abnormality of the dispenser 106 can be executed.

  FIG. 7 shows an example of the operation of the imprint apparatus 100 according to the first embodiment. This operation is controlled by the control unit 130. First, in step S <b> 701, the member 103 is conveyed onto the chuck 114 of the stage 104 and is held by the chuck 114. In step S702, the relative position between the member 103 and the mold 102 is detected. In step S <b> 103, an imprint material is placed in the pattern formation region 203 and the non-pattern formation region of the member 103 by the dispenser 106.

  In step S704, an imprint process is executed. As described above, the imprint process may include a contact process, a filling process, a curing process, and a separation process. In parallel with step S704, step S705 and step S706 may be performed. In step S705, the image forming unit 109 images the pattern formation region 203 and the non-pattern formation region 204. In step S706, the image captured in step S705 or an image obtained by processing the image is displayed on a display (not shown).

  Further, subsequent to step S705, steps S707 to S710 can be performed in parallel with step S704. The control unit 130 has a function of setting whether to execute the defect detection process. In step S707, the control unit 130 determines whether or not the defect detection process is set to be executed. If the defect detection process is set to be executed, the control unit 130 proceeds to step S708; Proceed to step S711. In step S <b> 708, the control unit 130 executes processing for detecting an unfilled defect based on the image of the pattern formation region 203. If an unfilled defect is detected, the process proceeds to step S712. If not detected, the process proceeds to step S711.

  The control unit 130 has a function of setting whether to execute the abnormality detection process. In step S709, it is determined whether or not an abnormality detection process for detecting an abnormality of the dispenser 106 is set. If the abnormality detection process is set to be executed, the process proceeds to step S710, and so on. If not, the process proceeds to step S711. In step S710, the control unit 130 executes an abnormality detection process for detecting an abnormality of the dispenser 106 based on the image of the non-pattern formation region 204. And when abnormality of the dispenser 106 is detected, it progresses to process S713, and when it is not detected, it progresses to process S711. In addition, process S711 is performed after completion | finish of process S704 currently performed in parallel.

  The control unit 130 has a function of setting whether to execute a recovery process for recovering a nozzle having an abnormality in the dispenser 106. In step S713, the control unit 130 determines whether or not the recovery process is set to be executed. If the recovery process is set to be executed, the process proceeds to step S715; otherwise, the process S718 is set. Proceed to In step S715, a recovery process is executed. The recovery process may include, for example, an operation of sucking the lower surface by a suction mechanism (not shown) in order to recover from an abnormality due to overflow of the imprint material on the lower surface of the dispenser 106 (the surface where the nozzle outlet is disposed). . Alternatively, the recovery process may include an operation of extruding the imprint material by applying a positive pressure from the inside of the dispenser 106 to the nozzle in order to recover from an abnormality caused by clogging of the nozzle.

  In step S716, the control unit 130 determines whether the dispenser 106 has recovered from the abnormal state. This determination can be made, for example, by observing the nozzle with a camera (not shown), observing the discharge with a discharge observation device (not shown), or the like. In step S716, if it is determined that the dispenser 106 has recovered from the abnormal state, the process proceeds to step S717, and the production is continued. Otherwise, the process proceeds to step S712. In step S712, the member 103 is unloaded, in step S720 it is notified that an abnormality has occurred, and in step S721 production is stopped.

  In step S718, the control unit 130 determines based on the first map MP1 whether or not the nozzle having an abnormality is a nozzle that is used to dispose the imprint material in the pattern formation region 203. If the abnormal nozzle is a nozzle used to dispose the imprint material in the pattern formation region 203, the process proceeds to step S712, and if not, the process proceeds to step S719. The latter means that there is no problem for forming a pattern in the pattern formation region 203 although there is a nozzle having an abnormality. In step S719, the control unit 130 notifies that there is an abnormality in the nozzle of the dispenser 106 and that production is continued.

  In step S711, the member 103 is unloaded, and in step S722, it is determined whether or not to continue production. If it is continued, the process returns to step S701, and if finished, the production is normally completed in step S723. Is notified and production is terminated in step S724.

  As a process for determining the abnormality of the dispenser 106, the imprint apparatus 100 can execute a process of displaying an image for determination on the display and allowing the operator to determine whether or not the dispenser 106 is abnormal in step S706. . Further, the imprint apparatus 100 may include a production stop switch for stopping production based on an operator's judgment. In step S725, the control unit 130 determines whether or not the production stop switch is turned on (that is, whether or not production stop is instructed). If turned on, the process proceeds to step S726. In step S726, the control unit 130 advances the sequence to a safe stop state. For example, if the imprint material on the pattern formation region 203 is not cured, the control unit 130 cures the imprint material, and after the cured imprint material and the mold 102 are separated, the member 103 is unloaded. As such, the imprint material is cured. In step S727, the member 103 is unloaded, and in step S728, it is notified that production is centered. In step S721, production is stopped.

  The imprint apparatus according to the second embodiment of the present invention will be described below with reference to FIGS. Note that matters not mentioned in the second embodiment can follow the first embodiment. The imprint apparatus according to the second embodiment is configured to transfer the pattern of the mold M to a member S such as a semiconductor substrate as a pattern formation target member. Although omitted in FIG. 8, the imprint apparatus according to the second embodiment may have the same configuration as the imprint apparatus 100 according to the first embodiment.

  The mold M can be, for example, a replica mold configured by transferring a master mold pattern as the mold 102 to a blank mold as the member 103 by the imprint apparatus 100 according to the first embodiment. The member S has a plurality of pattern formation regions 801 (shot regions). In the second embodiment, the non-pattern formation region 802 may be a scribe line region between a plurality of pattern formation regions 801.

  In the second embodiment, the dispenser 106 disposes imprint materials IM and IM ′ in the pattern formation region 801 and the non-pattern formation region 802 outside the pattern formation region 801 on the surface of the member S, respectively. The imaging unit 109 images the non-pattern forming region 802 in a state where the imprint material IM ′ is disposed by the dispenser 106 on the non-pattern forming region 802. The control unit 130 performs a process for determining an abnormality of the dispenser 106 based on the image of the non-pattern formation region 802 imaged by the imaging unit 109. Next, an imprint apparatus according to the third embodiment will be described. Note that matters not mentioned in the third embodiment can follow the first or second embodiment. In the present embodiment, the on-axis alignment scope 111 that detects the marks on the member 103, the mold 102, and the reference plate 112 detects the imprint material ejected by the dispenser 106. The on-axis alignment scope 111 emits illumination light from a direction oblique to the optical axis, illuminates a test object such as the mold 102 or the member 103, and is reflected toward the optical axis by the test object. Light is detected by a light receiving element. As described above, the on-axis alignment scope 111 (detector) measures the test object by dark field illumination (dark field observation).

  Hereinafter, the operation of the imprint apparatus according to the third embodiment will be exemplarily described. Operations described below can be controlled by the control unit 130. First, based on the approximate relative position between the member 103 and the mold 102, the member drive mechanism 120 positions the member 103 so that the alignment mark 34 of the member 103 enters the field of view of the on-axis alignment scope 111. The imprint apparatus is provided with four on-axis alignment scopes 111.

  FIG. 11 is a plan view illustrating the pattern formation region 203 of the member 103 and its vicinity (periphery). As shown in FIG. 11, alignment marks 34 (34 a, 34 b, 34 c, 34 d) are provided at the four corners outside the pattern formation region 203 of the member 103. The mold 102 is also provided with an alignment mark at a position corresponding to the alignment mark 34. One on-axis alignment scope 111 is configured to detect one alignment mark 34.

  Next, the relative position between the alignment mark 34 of the member 103 and the alignment mark of the mold 102 is detected using the on-axis alignment scope 111. Based on this relative position, the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 can be aligned.

  Next, the member 103 is moved by the member driving mechanism 120 so that the member 103 is positioned under the dispenser 106. Then, the imprint material 30 is disposed on the member 103 by the dispenser 106. Here, the dispenser 106 arranges the imprint material by, for example, discharging the imprint material in a state where the member 103 is continuously scanned in a predetermined direction by the member driving mechanism 120. In the present embodiment, in addition to the pattern formation region 203 and the non-pattern formation region 204 in which the imprint material is arranged in the first embodiment, a third region 33 (33a, 33b, 33c, The imprint material 30 is also arranged in 33d). As shown in FIG. 11, the third region 33 includes third regions 33 a, 33 b, 33 c, and 33 d provided at the four corners outside the pattern formation region 203 and adjacent to the alignment mark 34. Similar to the non-pattern formation region 204, the third region 33 is a region where a pattern is not formed, and is a region smaller than the visual field that can be detected by the on-axis alignment scope 111. The control unit 130 acquires first data (map) indicating a position where the imprint material is to be arranged in an area including the pattern formation area 203 and the non-pattern formation area 204. Then, the control unit 130 creates third data in which second data indicating the position where the imprint material is to be arranged in the third region 33 is added to the first data. And the control part 130 controls discharge of the dispenser 106 so that the imprint material may be arrange | positioned based on 3rd data.

  As shown in FIG. 11, the imprint material is also arranged in the third regions 33 a and 33 c so as to form the same arrangement as the imprint material arranged in the uppermost row of the non-pattern formation region 204. The imprint material is also arranged in the third regions 33b and 33d so as to form the same arrangement as the imprint material arranged in the lowermost row of the non-pattern formation region 204. When the arrangement of the discharge ports of the dispenser 106 is two rows, the upper row of the non-pattern formation region 204 and the lower row of the non-pattern formation region 204 are set so that the discharge port rows for discharging the imprint material are different. Can be done. In this case, it is possible to detect a discharge abnormality in the first row of the discharge ports of the dispenser 106 by inspecting the third regions 33b and 33d, and to inspect the discharge ports of the dispenser 106 by inspecting the third regions 33a and 33c. The ejection abnormality in the second row can be detected. In FIG. 11, the imprint material arranged in the pattern formation region 203 is omitted.

  Next, the member driving mechanism 120 is controlled so that the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 are aligned based on the data obtained when the alignment is performed first. The on-axis alignment scope 111 is configured to be movable, and is provided with a drive unit that moves the on-axis alignment scope 111. Before the pattern formation region 203 of the member 103 and the pattern region 213 of the mold 102 are aligned, the on-axis alignment scope 111 has a field of view within the third region 33 from the position when the alignment mark 34 is detected. Moved to enter.

  Next, the third region 33 of the member 103 is imaged by the on-axis alignment scope 111, and the state of the imprint material arranged in the third region 33 is observed. Since the on-axis alignment scope 111 is dark field illumination, the light illuminated by the on-axis alignment scope 111 and reflected and scattered by the imprint material is detected by an image sensor. The control unit 130 determines whether or not the imprint material is normally arranged based on the detected light, that is, the dispenser discharge abnormality. For example, the total light amount detected by the on-axis alignment scope 111 when there is no abnormality in the dispenser 106 and the imprint material is normally arranged in the third region 33 is used as the reference value. Then, the abnormality determination can be performed by comparing the total light amount actually detected by the on-axis alignment scope 111 with the reference value. Further, when there is no abnormality in the dispenser 106 and the imprint material is normally arranged in the third region 33, an image picked up by the on-axis alignment scope 111 is used as a reference image, and a discharge abnormality is determined by comparing with the reference image. May be.

  In addition, the non-pattern formation region 204 can be imaged in parallel by the imaging unit 109. The control unit 130 can perform processing for determining an abnormality of the dispenser 106 based on the images of the non-pattern formation region 204 and the third region 33 imaged by the imaging unit 109. Since the imaging unit 109 performs measurement by bright field illumination (bright field observation), the measurement can be performed by a method different from the dark field observation by the on-axis alignment scope 111, and different measurement results can be obtained. . Accordingly, it is possible to comprehensively determine the abnormality of the dispenser 106 by executing the bright field observation by the imaging unit 109 and the dark field observation by the on-axis alignment scope 111 in parallel.

  In the case of the alignment scope, an abnormality of the imprint material can be detected in the detection visual field before the imprint material arranged on the pattern formation region 203 of the mold 102 and the member 103 contacts. If an abnormality is detected, the imprint material is exposed to the curing light without contacting the mold 102 and the imprint material, and then the member 103 is unloaded. The reason why the exposure is performed before unloading is that the imprint material is not hardened and the imprint material volatilizes or scatters when the member is unloaded to contaminate the apparatus.

  The imaging of the non-pattern forming area 204 by the imaging unit 109 may be executed only when execution is selected by providing a column for selecting whether or not to execute in the user interface of the imprint apparatus. The user interface is provided with a column for selecting whether or not to execute the placement of the imprint material in the third area 33 by the dispenser 106 and the imaging of the third area 33 by the on-axis alignment scope 111, and the execution is selected. It may be executed only when it is done.

  The pattern of the cured product formed using the imprint apparatus is used permanently on at least a part of various articles or temporarily used when manufacturing various articles. The article is an electric circuit element, an optical element, a MEMS, a recording element, a sensor, or a mold manufactured in the first embodiment. Examples of the electric circuit elements include volatile or nonvolatile semiconductor memories such as DRAM, SRAM, flash memory, and MRAM, and semiconductor elements such as LSI, CCD, image sensor, and FPGA. Examples of the mold include an imprint mold.

  The pattern of the cured product is used as it is as a constituent member of at least a part of the article or temporarily used as a resist mask. After etching or ion implantation or the like is performed in the substrate processing step, the resist mask is removed.

  Next, an article manufacturing method will be described. As shown in FIG. 10A, a substrate 1z such as a silicon wafer on which a workpiece 2z such as an insulator is formed is prepared, and subsequently, the substrate 1z is formed on the surface of the workpiece 2z by an inkjet method or the like. A printing material 3z is applied. Here, a state is shown in which the imprint material 3z in the form of a plurality of droplets is applied on the substrate.

  As shown in FIG. 10B, the imprint mold 4z is made to face the imprint material 3z on the substrate with the side on which the concavo-convex pattern is formed facing. As shown in FIG. 10C, the substrate 1 provided with the imprint material 3z is brought into contact with the mold 4z, and pressure is applied. The imprint material 3z is filled in a gap between the mold 4z and the workpiece 2z. In this state, when light is irradiated as energy for curing through the mold 4z, the imprint material 3z is cured.

  As shown in FIG. 10D, after the imprint material 3z is cured, when the mold 4z and the substrate 1z are separated, a pattern of a cured product of the imprint material 3z is formed on the substrate 1z. This cured product pattern has a shape in which the concave portion of the mold corresponds to the convex portion of the cured product, and the concave portion of the mold corresponds to the convex portion of the cured product, that is, the concave / convex pattern of the die 4z is transferred to the imprint material 3z. It will be done.

  As shown in FIG. 10 (e), when etching is performed using the pattern of the cured product as an etching resistant mask, a portion of the surface of the workpiece 2z where there is no cured product or remains thin is removed, and the grooves 5z and Become. As shown in FIG. 10F, when the pattern of the cured product is removed, an article in which the groove 5z is formed on the surface of the workpiece 2z can be obtained. Although the cured product pattern is removed here, it may be used as, for example, a film for interlayer insulation contained in a semiconductor element or the like, that is, a constituent member of an article without being removed after processing.

  In the above embodiment, an imprint apparatus using a mold on which a pattern is formed has been described. However, this is only an exemplary embodiment of the present invention. The present invention relates to a flattening apparatus for flattening a composition by using a mold on a flat plate having no unevenness, bringing the mold into contact with a composition on a substrate, molding the composition, and curing the composition. (Forming device) is also applicable.

100: imprint apparatus 101: mold drive mechanism 102: mold 103: member 104: stage 105: curing unit 106: dispenser 109: imaging unit 130: control unit 203: pattern formation region 204 : Non-pattern forming area

Claims (31)

An imprint apparatus for forming a pattern of the imprint material by curing the imprint material in a state where the imprint material on the pattern formation region where the pattern is to be formed on the member is in contact with the pattern region of the mold There,
A dispenser that disposes an imprint material in the pattern formation region and a non-pattern formation region outside the pattern formation region in the member,
A detection unit that detects the non-pattern forming region in a state where an imprint material is disposed by the dispenser on the pattern forming region and the non-pattern forming region;
A control unit that performs processing for determining abnormality of the dispenser based on a detection result of the non-pattern forming region by the detection unit;
An imprint apparatus comprising: The dispenser arranges an imprint material in the pattern formation region according to a first map, and arranges an imprint material in the non-pattern formation region according to a second map different from the first map.
The imprint apparatus according to claim 1. The dispenser uses all of the plurality of nozzles for arranging the imprint material in the pattern formation region, and arranges the imprint material in the non-pattern formation region.
The imprint apparatus according to claim 1, wherein the imprint apparatus according to claim 1. The dispenser arranges the imprint material in the pattern formation region and the non-pattern formation region by discharging the imprint material in a state where the member is continuously scanned in a predetermined direction.
The imprint apparatus according to any one of claims 1 to 3, wherein: The process for determining the abnormality includes an abnormality detection process for detecting an abnormality of the dispenser based on a detection result of the non-pattern forming region by the detection unit.
The imprint apparatus according to claim 1, wherein the apparatus is an imprint apparatus. The abnormality detection process includes a process of detecting a nozzle that cannot discharge an imprint material among a plurality of nozzles of the dispenser.
The imprint apparatus according to claim 5. The abnormality detection process includes a process of detecting a nozzle having an abnormal discharge amount of the imprint material among the plurality of nozzles of the dispenser.
The imprint apparatus according to claim 5. The control unit performs the abnormality detection process based on a detection result of the non-pattern formation region detected by the detection unit in a state where the imprint material on the pattern formation region and the pattern region are in contact with each other. ,
The imprint apparatus according to claim 5. The control unit is detected by the detection unit after the imprint material on the pattern formation region is in contact with the entire area of the pattern region and before the imprint material on the pattern formation region is cured. The abnormality detection process is executed based on the detection result of the non-pattern formation region.
The imprint apparatus according to claim 5. The control unit performs the abnormality detection process based on a detection result of the non-pattern formation region detected by the detection unit during a period in which the imprint material on the pattern formation region is cured.
The imprint apparatus according to claim 5. The control unit detects the detection result of the non-pattern formation region detected by the detection unit during a period in which the hardened imprint material on the pattern formation region is driven to separate the pattern region. Performing the abnormality detection process based on
The imprint apparatus according to claim 5. The control unit changes a relative position between the member and the mold with respect to a direction parallel to the pattern formation region after the hardened imprint material on the pattern formation region is separated from the pattern region. Performing the abnormality detection process based on the detection result of the non-pattern formation region detected by the detection unit before being performed,
The imprint apparatus according to claim 5. The process for determining the abnormality includes a process of causing the display to display a detection result of the non-pattern forming region detected by the detection unit, and causing an operator to determine whether there is an abnormality in the dispenser.
The imprint apparatus according to any one of claims 1 to 12. The detection unit images the non-pattern forming region in a state where an imprint material is arranged by the dispenser on the pattern forming region and the non-pattern forming region,
The said control part performs the process for judging abnormality of the said dispenser based on the image of the said non-pattern formation area imaged by the said detection part, The any one of Claims 1 thru | or 13 characterized by the above-mentioned. The imprint apparatus described. The detection unit images the pattern formation region in addition to the non-pattern formation region,
The control unit detects an abnormality in the process of forming a pattern in the pattern formation region based on the image of the non-pattern formation region and the image of the pattern formation region captured by the detection unit;
The imprint apparatus according to claim 14. The member has a base and a mesa protruding from the base, and the surface of the mesa forms a single pattern forming region.
The imprint apparatus according to claim 1, wherein the imprint apparatus is any one of claims 1 to 15. The member includes a base and a mesa protruding from the base, and the base includes the non-pattern forming region.
The imprint apparatus according to claim 1, wherein the imprint apparatus is any one of claims 1 to 15. The imprint apparatus according to any one of claims 1 to 17, wherein the non-pattern forming region is a region in which an imprint material on the non-pattern forming region does not contact the mold. The member has a plurality of pattern formation regions including the pattern formation region, and the non-pattern formation region is a scribe line region between the plurality of pattern formation regions.
The imprint apparatus according to claim 1, wherein the imprint apparatus is any one of claims 1 to 15. The controller executes a process of recovering the function of the dispenser when an abnormality of the dispenser is detected.
The imprint apparatus according to claim 1, wherein the imprint apparatus is any one of claims 1 to 19. If the imprint material on the pattern formation region is not cured when an instruction to stop production is given, the imprint material is cured, and after the cured imprint material and the mold are separated, the member Is carried out,
The imprint apparatus according to any one of claims 1 to 20, wherein The control unit has a function of setting whether to execute the process for detecting an abnormality of the dispenser,
The imprint apparatus according to any one of claims 1 to 21, wherein the imprint apparatus is any one of the above. The detection unit detects the non-pattern formation region through the mold.
The imprint apparatus according to any one of claims 1 to 22, wherein the apparatus is an imprint apparatus. The detector includes a detector that detects the alignment mark of the mold and the alignment mark of the member,
The detector detects the non-patterned region;
24. The imprint apparatus according to claim 1, wherein the control unit performs the process based on a detection result of the non-pattern formation region detected by the detector. The detector is
An imaging unit that images the non-pattern forming region in a state where an imprint material is arranged by the dispenser on the pattern forming region and the non-pattern forming region;
A detector for detecting the alignment mark of the mold and the alignment mark of the member,
The imprint apparatus according to any one of claims 1 to 24, wherein an area where the detector detects and the non-pattern forming area where the imaging unit captures an image are different from each other.   26. The imprint apparatus according to claim 25, wherein the detector images by dark field observation, and the imaging unit images by bright field observation.   When the detector detects the non-pattern forming area and detects an abnormality of the dispenser before bringing the imprint material in the pattern forming area into contact with the mold, the imprint material in the pattern forming area and the mold The imprint apparatus according to any one of claims 24 to 26, wherein the imprint material is cured without contacting the mold. Forming a pattern on a member using the imprint apparatus according to any one of claims 1 to 27;
A step of processing the member on which the pattern is formed in the step;
An article manufacturing method comprising manufacturing an article from the member that has been subjected to the treatment. An imprint method for forming a pattern of the imprint material by curing the imprint material in a state where the imprint material on the pattern formation region on which a pattern is to be formed on the member is in contact with the pattern region of the mold. There,
A step of disposing an imprint material by a dispenser in the pattern formation region and the non-pattern formation region outside the pattern formation region in the member;
Detecting the non-pattern forming region in a state where an imprint material is disposed by the dispenser on the pattern forming region and the non-pattern forming region;
Performing a process for determining abnormality of the dispenser based on a detection result of the non-pattern forming region;
The imprint method characterized by including. A molding apparatus that molds the composition by curing the composition in a state in which the composition on the member is in contact with the mold and separating the composition from the mold,
A dispenser for discharging the composition onto the member;
A detection unit for detecting a composition disposed on the member by the dispenser;
A controller that determines abnormality of the dispenser based on a detection result by the detector;
The dispenser arranges the composition in a first region where the discharged composition contacts the mold and the second region which does not contact the mold in the processing, among the members,
The detection unit detects the second region when the composition of the first region is in contact with the mold in the processing,
The said control part judges abnormality of the said dispenser based on the detection result of the said 2nd area | region by the said detection part, The shaping | molding apparatus characterized by the above-mentioned. A molding method for molding the composition by curing the composition in a state in which the composition on the member is in contact with the mold and separating the composition from the mold,
When the composition is discharged onto the member using a dispenser, the composition is applied to the first region where the discharged composition contacts the mold and the second region which does not contact the mold in the processing. Arranging, and
Performing a process for determining abnormality of the dispenser based on a result of detecting the composition of the second area when the composition of the first area is in contact with the mold in the process. A molding method characterized by the above.