JP6438541B2 - Method for providing an abrasive product surface, and abrasive product - Google Patents

Description

  The present invention relates to the field of abrasive products, the use of abrasive products, and methods of obtaining abrasive products.

  The abrasive product is used to treat an object surface. The object surface may include various materials such as wood, metal, or polymer. Processing generally involves removing material from the object surface to obtain desired object surface properties, such as smoothness or roughness, or specific structure. Depending on the various materials or applications, various conditions may be set for the abrasive product to function properly.

  Depending on the purpose, the abrasive product may have different properties. Depending on the object surface and material to be polished, the conditions of the polishing product may be set. In general, it is desirable for an abrasive product to have conformability and flexibility adapted to provide smooth and uniform polishing results on the object surface. At the same time, the abrasive product should be efficient and long lasting. In addition, some use of abrasive products may impose special conditions to be confirmed.

  It is an object of the present invention to provide an improved method for obtaining an abrasive product having improved properties. A further object of the present invention is to provide an abrasive product having such improved properties. The improved properties can be used in various applications to obtain better polishing quality. The improved properties can further extend the product life cycle.

  A plurality of polishing regions supported by the backing layer may be provided on the surface of the polishing product, and each polishing region may be surrounded by interconnected channel portions. The channel portion may be arranged to have dimensions and patterns so that the abrasive product includes improved flexibility, and the polished material may be efficiently moved from the abrasive product surface. The channel portion may have an increased level and volume, improving the water washing of the abrasive product surface and the efficient movement of the separated material and reducing the risk of clogging. The abrasive product may further provide simultaneously providing flexibility to conform to the object surface and durability to withstand use in mechanical and / or manual polishing.

A method for obtaining such an abrasive product may include providing a backing layer and forming a plurality of polishing regions supported by the backing layer, each polishing region having a cross dimension having a transverse dimension. The channel portion may be surrounded by connected channel portions, the channel portion including a first channel portion having a first transverse dimension and a second channel portion having a second transverse dimension that is greater than the first transverse dimension. Further, the method for obtaining an abrasive product may include providing a backing layer and forming a repeating unit of the polishing region in the backing layer, wherein the opposing repeating unit boundaries are congruently curved. And may form complementary pairs and be combined in a pre-emptying manner with repeating units. Advantageously, the provided abrasive product may include a surface that allows unidirectional polishing.

  The flexibility of the abrasive product is further improved by providing a backing layer that includes surface height deviations, such as recessed and raised areas, that can be used to adhere to the abrasive layer including the abrasive region on the backing layer. May be. The polishing region may also be provided on a substantially flat backing layer, and the surface deviation is formed by a polishing layer that includes a plurality of polishing regions surrounded by interconnected channel portions.

  Objects and embodiments of the invention are further described in the independent and dependent claims of the present application.

The figures are schematic and not perspective views.
The figure is for illustrative purposes.
In the drawings and specification, symbols Sx, Sy, and Sz indicate orthogonal coordinate axis directions perpendicular to each other.
An example of a product structure for polish is shown. The schematic example of the product structure for grinding | polishing which can be attached to a grinding | polishing apparatus is shown. The schematic example of the backing layer containing a different functional layer is shown. 4a and 4b show a schematic example of a polishing layer structure. The schematic example of the backing layer containing a hollow area | region is shown. The schematic example of a functional layer structure containing a hollow area is shown. The schematic example of the grinding | polishing layer joined to the backing layer containing a hollow area is shown. The schematic example of CC cross section of the product for grinding | polishing is shown. A schematic example of the above-described polishing product is shown. 1 shows a schematic example of a polishing product surface including a polishing region and a channel portion. The schematic example of the channel part containing a curved part is shown. The schematic example of the 2nd channel part which has a linear length is shown. 1 shows a schematic example of a network of interconnected channel sections. A schematic example of a basic pattern on the surface of an abrasive product is shown. A schematic example of an opening is shown. Figures 16a-16f represent non-limiting examples of deforming geometric shapes and provide a basic pattern on the surface of an abrasive product. FIGS. 17a-17e show non-limiting examples for providing a basic pattern on the abrasive product surface without geometric deformation. FIGS. 18a-18g show another non-limiting example of deforming the geometry, providing a basic pattern on the abrasive product surface. Figures 19a to 19e show non-limiting examples of basic pattern networks including corners. FIGS. 20a-20f show other non-limiting examples that provide a network that includes a base group and a base pattern on the abrasive product surface. Figures 21a-21e show a further non-limiting example and provide a network comprising a base group and a base pattern on the abrasive product surface. A further non-limiting example is provided and provides a network that includes basic groups and basic patterns on the abrasive product surface.

  Abrasive products may be used in a variety of applications, such as the automotive industry, ships, construction and construction sites, and composites industries, to name a few examples. It may further include various materials such as bodies, plastics, minerals, or various coatings such as paint or paint. Removal of materials having different properties and behaviors may require different properties derived from the abrasive product. Common polishing methods may include, for example, grinding, polishing, buffing, honing, cutting, drilling, sharpening, lapping, or sanding. The shape of the object that needs to be polished may vary. When the object surface shape is not flat and includes a height deviation, it is desirable that the abrasive product be flexible. Flexible abrasive products are better applied to the shape of the object surface to be polished. A typical disadvantage of hard abrasive products is that some of the abrasive products are pressed more strongly against the object surface than others, resulting in uneven quality, in other words, some places are polished The others are not very polished or not polished at all. Advantageously, the strength, shear stress, impact stress and modulus of elasticity of the adhesive product should be designed to meet the application requirements. The abrasive product may be used, for example, in wet or dry conditions, depending on the purpose.

  In the specification, the term “channel” refers to a recessed region adjacent to a polishing region. The channel includes a width and a length and a height. The term “channel portion” refers to the shortest surface distance between two branch points or between channel intersections between two polishing regions and is denoted as “channel portion length”. The channel portion has a substantially constant width and height along the channel portion length.

  FIG. 1 shows a schematic example of an abrasive product 100 having a surface 110 having abrasive properties. The polishing product 100 includes a backing layer 101 having a first surface 107 and a second surface 108, and a polishing layer 111 bonded to one surface of the backing layer 101. The polishing layer may be bonded to the first surface 107 or the second surface 108 of the backing layer 101, or both surfaces. The abrasive product 100 may include an optional support layer 121 having a front surface and a rear surface. The front surface of the support layer 121 may be bonded to the second surface 108 of the backing layer 101 by, for example, lamination or adhesion.

  FIG. 2 shows a schematic example of the support layer 121 having front and rear surfaces. The front surface of the support layer 121 may be bonded to the second surface 108 of the backing layer 101. The support layer 121 may include an adhesion improving layer 126 and a foam layer 123. The adhesion improving layer 126 may be, for example, a polymer film laminated to a backing layer, or a stick-on system such as Velcro, or a grip attachment. Adhesion improving layer 126 may alternatively or additionally include a pressure sensitive adhesive layer that bonds to second surface 108 of backing layer 101. Alternatively or additionally, the adhesion improving layer 126 may include a friction coating. If the second surface 108 does not include the abrasive layer 111, friction coating may be used to increase the surface friction of the second surface 108 of the abrasive product 100. For example, the product 100 may include a friction coating applied to the second surface 108 of the backing layer 101. Advantageously, the friction coating may comprise a friction increasing material in a dot-like shape. For example, the friction-increasing material may be arranged on a two-dimensional array of dots with areas where there is no friction increasing material around the dots. An equal amount of friction coating applied as an array or dot is a wet abrasive product, for example by dripping from a screen printer, engraving roller, electrostatic coating unit or metering belt or in a dot-like shape by a vibratory device. It has been empirically observed that it can provide improved friction at 100. When the foam layer 123 faces the backing layer 101 directly, an additional grip layer 122 may be attached to the surface that does not face the backing layer 101. The backing layer 101 may include an opening 226 that extends through the backing layer 101 in the direction Sz.

  The apparatus 300 may include an abrasive product 100. The support layer 121 may be used to attach the abrasive product 100 to the apparatus 300, which may be a tool used for polishing. The support layer 121 may be used to attach the apparatus 300 or a tool used for polishing to the polishing product 100. Alternatively, the support layer 121 may be used to remove the abrasive product 100 from the apparatus 300 or tool used for polishing. This allows the abrasive product 100 to be easily replaced with another tool or device that includes a surface 301 for attaching the abrasive product 100. The apparatus may include attachment means that can be shared with the abrasive product 100. The shared means may be, for example, the adhesion improving layer 301 having a rear surface and a front surface. The adhesion improving layer 301 may include a mechanical adhesion system 302 such as a hook or velor such as a Velcro system, a vinyl layer or a pressure sensitive adhesive layer. The apparatus 300 may include, for example, means for linear mechanical polishing or rotary mechanical polishing. Apparatus 300 may include means for vibration such as a shaft including surface 301 and a support pad.

  FIG. 3 shows a schematic example of the backing layer 101 structure. The backing layer 101 may be manufactured to provide functionality. Functionality may be introduced by manufacturing a backing layer 101 that includes one or more functional layers 102, 103, 104, 104, 105, 106, 107, 108 having a first surface and a second surface. Unlike the first functional layer, the first surface of the first functional layer 102, 103, 104, 104, 105, 106, 107, 108 may be bonded to the first or second surface of the second functional layer. . The functional layers 102, 103, 104, 104, 105, 106, 107, 108 may be joined by, for example, lamination or coextrusion. For example, the abrasive product 100 may include a first functional layer 102 bonded to the second functional layer 103 or the third functional layer 104. Accordingly, the backing layer 101 may include one or more bonding layers, such as 2, 3, 4, 5, 6, or 7 bonding layers. The functional layer may be formed by the same method as the backing layer 101. Some of the functional layers may have the same chemical composition. Moreover, the chemical composition of each functional layer may vary. Furthermore, the thickness of each functional layer may be the same or may be different from each other. The functional layers 102, 103, 104, 104, 105, 106, 107, 108 include, for example, an embossed layer, an antistatic layer, an ultraviolet or radical (UV / EB) blocking layer, an adhesion improving layer, an anti-slip layer, a reinforcing layer, Alternatively, a layer having a different function such as a packed layer may be included. The number of functional layers may be the same, that is, the backing layer 101 comprises two or more functional layers 102, 103, 104, 104, 105, 106, 107, 108 having the same chemical composition and / or thickness. May be included. One functional layer may include one or more functions. Examples of different functional layers 102, 103, 104, 104, 105, 106, 107, 108 that may be part of the backing layer 101 are shown below. Examples 1-9 may be used alone or in combination. In particular, the functional layers 102, 103, 104, 104, 105, 106, 107, 108 may be combined with other functional layers 102, 103, 104, 104, 105, 106, 107, 108.

  Example 1 The functional layers 102, 103, 104, 104, 105, 106, 107, 108 may be a foam layer 123. The foam layer 123 may include, for example, polyester, polypropylene, polystyrene, or polyethylene. The foam layer 123 may include a porous structure provided by a gaseous material or foam additive. For example, the foam layer 123 may be formed with the aid of a suitable gas such as carbon dioxide. The additive may also expand or release the gaseous compound when heating is used to form the pores.

  Example 2 The functional layers 102, 103, 104, 104, 105, 106, 107, 108 may include an embossing promoting layer. The embossing promotion layer may include a thermoplastic material such as, for example, polyvinyl alcohol, polyvinyl chloride (PVC), polypropylene (PP), or polyethylene (PE). The embossed layer may be used, for example, to provide a top surface 107 having a surface height deviation.

  Example 3 The functional layers 102, 103, 104, 104, 105, 106, 107, and 108 may include an antistatic layer. The backing layer 101 is designed with the antistatic functional layers 102, 103, 104, 104, 105, 106, 107, 108 taken into account, resulting in good charging performance, damaging the product or igniting solvent vapor. You may avoid sparks that cause them to stick, avoid sticking sheets, or avoid dusting. Materials that may be used to dissipate charge and minimize charge include polymeric additives, salts, conductive polymers, fibers and particles, or fillers, surfactants, charge control agents, carbon nanotubes , Carbon black, or mica.

  Example 4 The backing layer 101 includes UV / EB blocking functional layers 102, 103, 104, 104, 105, 106, 107, 108, and the decomposition effect from radicals such as light, ultraviolet light, and / or free radical compounds. Protect material from. Examples of UV / EB stabilizer compounds suitable for UV / EB blocking layers are benzophenone, benzotriazole, salicylate, acrylonitrile, various derivatives of hindered amine-like 2,2,6,6-tetramethylpiperidine, or Other polymers containing aromatic rings in their structure, or pigments such as carbon black or titanium oxide. UV / EV stabilizers are very effective at low concentrations.

  Example 5 The functional layers 102, 103, 104, 104, 105, 106, 107, 108 may include an adhesion improving layer 126 such as an adhesion improving layer. Since polypropylene is a non-reactive polymer, it is difficult to bond to various resins. Functional groups may be introduced by various substrate treatments to improve binding. Surface treatment includes corona discharge, plasma etching, flame treatment, grafting of an adhesive layer onto the polypropylene backbone in the melt during extrusion. The adhesion-improving layer may be an acid copolymer, sodium ionomer, zinc ionomer, or other metal ionomer such as Surlyn ionomer, low or high density polyethylene, ethylene vinyl acetate (EVA copolymer), ethylene acrylate ester copolymer (EBA copolymer) such as butyl acrylate. ), Methyl acrylate (EMA copolymer), and 2-ethylhexyl acetate (2HEA), random ethylene ethylene vinyl acetate terpolymer, vinyl acetate, maleic anhydride terpolymer, acrylic ester type (methyl, ethyl, or butyl acrylate) ) May include one or a combination of ethylene acrylic ester terpolymers containing different combinations. In other words, the functional layer (102, 103, 104, 104, 105, 106, 107, 108) is composed of high density ethylene copolymer, low density ethylene copolymer, ethylene-butyl acrylate (EBA) copolymer, ethylene vinyl acetate (EVA) copolymer. , Ethylene methyl acrylate (EMA) copolymer, ethylene butyl acrylate (EBA) copolymer, 2-ethylhexyl acrylate (2EHA) copolymer, ethylene acrylate ester terpolymer whose acrylate type is methyl, ethyl or butyl acrylate, acrylate ester An adhesion enhancing compound selected from the group consisting of ethylene vinyl acetate terpolymers of the type methyl, ethyl or butyl acrylate may be included.

  Example 6 The functional layers 102, 103, 104, 104, 105, 106, 107, 108 may include an anti-slip layer. The backing material may be designed in consideration of the anti-slip functional layers 102, 103, 104, 104, 105, 106, 107, and 108 to improve the coefficient of friction. The functional layer is formed by any soft sticky elastic coating or / and by any filler dispersed in a suitable binder material and applied in a separate process on the backing material as a uniform or structured coating. May be. Optimal fillers can also be introduced into the melt during the extrusion process. Aluminum oxide, fumed silica-like particles, calcium carbonate, and silicon dioxide are examples of materials that may be used for anti-slip purposes.

  Example 7 Reinforcing layer (reinforcing filler): This functional layer may contribute to optimizing the mechanical properties of the product 100 in a dedicated application. Various types of fillers can be used for this purpose, for example materials that increase mechanical strength. Examples of fillers include glass fibers, graphite fibers, aramid fibers, carbon fibers, nanocellulose, carbon nanotubes, calcium carbonate, talc, kaolin, and mica. Different fillers can be used alone or in combination. The filler may be used to change the mechanical properties of the functional layers 102, 103, 104, 104, 105, 106, 107, 108, or the backing layer 101. However, the filler may be further used to alter various properties such as electrical properties such as thermal expansion, optical properties, thermal stability, anti-slip properties, or antistatic properties.

  Example 8 Punching improvement layer: Examples of materials used in this functional layer are polycarbonate, acrylic, urethane, epoxy.

  Example 9 Laminate or “Fixed” System Layer: This layer may be formed by any polymer containing groups that react with other chemicals that have thermal or adhesive-like properties. In particular, the compounds mentioned in the adhesion-improving layer may be used for lamination to adhere the two bonding layers together. Lamination may be used as an advantageous method for attaching functional layers 102, 103, 104, 104, 105, 106, 107, 108 together.

  4a and 4b show a schematic example of the structure of the polishing layer 111. FIG. The polishing layer 111 includes a polishing material for polishing the object surface. The polishing layer 111 may include a polishing region 118 surrounded by interconnected channel portions 221, 222. The polishing region includes a polishing material.

  Polishing product 100 represents an item that may be used for polishing. The abrasive product 100 may be formed from an abrasive sheet. The polishing sheet may include a plurality of polishing products 100. The abrasive product 100 may be formed from an abrasive sheet by any known method. An exemplary method for forming an abrasive product from an abrasive sheet is by stamping. The abrasive product 100 may be advantageously formed from an abrasive sheet by using laser technology to obtain an abrasive product 100 having a desired shape. The abrasive product 100 may also be manufactured such that a molded product is used to obtain the shape of the abrasive product 100.

Surface 110 typically includes an abrasive material such as abrasive particles 113 bonded to resin 112. Typical materials used as the abrasive particles 113 are hard minerals that may be synthetic or naturally occurring.
An exemplary list of materials used as abrasive particles 113 is
-Cubic boron nitride,
-Boron carbide,
-Aluminum oxide,
-Iron oxide,
-Cerium oxide,
-Silicon carbide,
-Containing zirconia alumina, and-diamond.

  Further, the abrasive particles 113 may include ceramic particles or artificial particles.

  The resin 112 shown as a coating may be a mixture, and the abrasive particles 113 are mixed with the resin 112. FIG. 4 a shows an example of a mixture shown as a polishing slurry, which may be deposited on the backing layer 101 and cured by heat or radiation to form the polishing layer 111. FIG. 4b shows an example of another method for obtaining the polishing layer 111, where the polishing layer 111 may be coated, and the abrasive particles 113 are applied to the coating layer comprising the resin 112, such as by gravity or electrostatic coating. Placed and subsequently fixed by a second size coat 114 layer equal to or different from the covering layer comprising the resin 112. These two methods are different from each other, and the polishing slurry includes abrasive particles 113 in multiple layers, while the coating layer is such that the sharp ends of the abrasive particles are oriented in a substantially opposite direction from the backing layer 101. Substantially comprising only a single layer of abrasive particles 113 oriented in an advantageous manner. The abrasive layer may further include a size coat 114 to improve the adhesion of a single layer of abrasive particles 113. Further, the supercoat 115 may be applied to the upper surface of the size coat 114 and may shield the abrasive particles 113. A single layer of abrasive particles may be made to be robust. In other words, the adhesion of abrasive particles on the backing layer 101 may be strong. The stable polishing layer 111 may enable more precise polishing. When using a slurry containing abrasive particles, the formation of the abrasive region generally includes multiple layers of abrasive material. When used, the abrasive material begins to erode and begins to wear away, separating the abrasive particles from the abrasive material and revealing new abrasive particles from below. The separated abrasive material may move freely on the object surface, for example, laminated on either the object surface or the polishing layer, resulting in a non-planar pattern on the object surface. This can be observed as a wound. By using a polishing layer 111 that includes a substantially single layer of resin 112 and abrasive particles 113 that may include orientation, the polishing procedure may be better controlled. Since the illustration is not to scale, the polishing layer 111 may have a substantially flat surface.

  The abrasive product 100 includes a backing layer 101. The backing layer 101 may include a first surface and a second surface. The backing layer 101 may comprise a variety of materials such as paper, cloth, or polymer. The backing layer may include injection molded articles such as metals, polymers, or composites. The backing layer 101 may be a sheet or a film. The film may be in the form of a film web on a roller. Further, the backing layer 101 may be an injection molded product. The abrasive product may be joined to an apparatus used for mechanical polishing. In particular, the abrasive product may be attached to and removed from a support, for example.

  The characteristics of the backing layer 101 may be selected based on the application. A hard object surface material may require a durable hard abrasive product 100, while an object surface having a surface deviation or shape may require a more compatible abrasive product. Wetting the material being polished prevents the particles from becoming suspended dust. Airborne dust is harmful and can cause health problems. Wet polishing uses a fluid, such as water or a liquid containing water, to reduce dust formation. Wet may be used for abrasive products where moisture is not an obstacle. In the wet process, the abrasive product and the surface may be wetted by the liquid. The liquid may be water, an aqueous liquid, an organic solvent, a polar or nonpolar solvent, or any combination thereof. The use of liquid allows the object surface and polishing surface 110 to be washed with water. Water may be used to bind abrasive material separated from the object surface, represented as shavings. Wet polishing works by washing the space between the object surface and the abrasive product surface 110 with water and moving the material to be polished. To make wet polishing effective, the space between the object surface and the polishing product surface 110 holds a sufficient amount of water so that the surface is polished and the polished material or shavings are moved. Should do. If the polished material accumulates between the surfaces, the efficiency of polishing decreases.

  In general, paper, cloth, or polymer film may be used as the backing layer 101 material. However, for wet polishing, paper as the backing layer 101 material presents difficulties. The backing layer 101 material needs to be waterproofed for polishing with water. The paper may be specially processed for such purposes. However, specially treated paper is an expensive material. In addition, the properties of the paper material can vary between different production batches or even in the same batch, causing difficulties in the production quality of the abrasive product 100. A further problem is that the properties of the paper material frequently change during the manufacture of abrasive products. The paper can be impregnated on both sides and protectively coated, but the coating need not be completely waterproofed. Furthermore, the surface of the paper may not be completely flat. When the product is immersed in water, the paper may swell more than the covering layer and the product may be curved. In particular, the paper may be conditioned to correct the curvature after coating, but may be curved again, for example when the humidity changes. The advantage of polymers such as polypropylene is that they are less curved or can be adjusted by heat. Compared to paper, the polymer film is stable after conditioning.

  A polymer material may be more suitable as a material for the backing layer 101. The advantage of the polymer material is that the polymer can be shaped and processed to the desired shape and thickness. Further, the backing layer 101 may be modified to include the desired properties by selecting an advantageous polymeric material. The backing layer 101 determines the basic characteristics of the abrasive product 100. Advantageously, the backing layer 101 should be flexible to fit the object surface and at the same time should be strong to withstand use in mechanical and / or manual polishing. In this respect, the robustness represents the tensile strength and bending rigidity or elongation strength of the backing layer 101.

  Advantageously, the backing layer 101 may comprise a thermoplastic polymer. The thermoplastic polymer may be processed into layers by methods known to those skilled in the art such as extrusion, coextrusion or injection molding, or lamination. Since the thermoplastic polymer may be formed and have the correct composition and is easily molded and processed, it is advantageous to provide the backing layer 101 continuously with uniform quality. The thermoplastic polymer may be melted and processed into the backing layer 101. Further, the thermoplastic polymer may be selected to include a combination of elastic and plastic properties suitable for use in the manufactured abrasive product. When providing a backing layer 101 comprising a thermoplastic polymer, the thickness of the backing layer 101 can be selected. The thickness of the layer has an effect on the flexibility of the product. In particular, backing layers that include the same thickness but different polymers may have different properties such as flexibility.

Polyester or polyolefin may be used as the backing layer 101 for the abrasive product 100. Both of these thermoplastic polymers are readily commercially available and can be processed into sheets or films having the desired thickness. Furthermore, both of these thermoplastic polymers are essentially impermeable to water. Examples of polyesters and polyolefins suitable for the backing layer 101 material include polyethylene terephthalate (PET), and polyethylene (PE), polypropylene (PP), polymethylpentane (PMP), or polybutene-1 (PB-1). It is a thermoplastic polyolefin. The melting temperature and tensile strength of these polymers are listed in Table 1 below.

  The abrasive product 100 may be used as an attachable and removable article. An abrasive product 100 comprising a backing layer 101 made by extrusion, coextrusion, or die casting typically includes a thickness in the range of 50 micrometers to 5 millimeters. Advantageously, the backing layer 101 can be adapted to a plurality of directions Sx, Sy and Sz. In order to provide the desired flexibility to the backing layer 101, the thickness of the backing layer 101 may advantageously be in the range of 70 to 250 micrometers. More advantageously, the thickness of the backing layer 101 is 90 micrometers or more, or 200 micrometers or less.

  As can be seen from Table 1, polyesters generally have a higher melting point in the range of 250 ° C. to 270 ° C. than polyolefins. Furthermore, polyester has high rigidity. Thermoplastic polyesters such as polyethylene terephthalate (PET) have very high tensile strength. The backing layer 101 having the same thickness and containing polyester is less flexible than the backing layer 101 containing polyolefin such as polypropylene. In particular, the abrasive product 100 may need to be curved in multiple directions, such as toward the first surface 107 and / or the second surface 108 of the backing layer 101. In such situations, higher flexibility is advantageous. Advantageously, the backing layer 101 comprises a polymer having both elastic and plastic properties and is compatible with other layers that join the backing layer 101. Among polyolefins, polypropylene includes desirable properties such as suitable processing temperatures above 120 ° C. The polypropylene may include a propylene homopolymer or a propylene copolymer. In the present application, polypropylene represents an alkene polymer, which may be a polypropylene homopolymer, propylene and ethylene, or alternatively a random copolymer of propylene and alkene, propylene and ethylene, or alternatively a block copolymer of propylene and alkene. Good. Propylene copolymers with alkenes up to C8 may be used. Among them, preferred alkenes are C2 to C4 alkenes, and polypropylene is most preferred due to recyclability. Polyethylene and polypropylene are also available in high purity grades that are free of residues that interfere with the manufacturing process.

  The backing layer 101 may be a single layer containing only polypropylene. Polypropylene may be a polymer mixture, comprising polypropylene as a major component and a small amount of other polymer components. For example, the polymer mixture may contain small amounts of non-polymeric additives such as plasticizers or softeners. When the backing layer 101 is a multi-layer structure, the composition of the different layers should at least partially match each other. The backing layer 101 may include a propylene homopolymer. The backing layer may also contain a propylene copolymer. Propylene copolymers may be used, for example, to reduce the stiffness of the backing layer. This may increase the flexibility of the abrasive product 100. In a multi-layer structure, the backing layer 101 may comprise at least 20%, preferably at least 50%, more preferably at least 60%, or at least 70% polypropylene. The backing layer 101 may include one or more functional layers 102, 103, 104, 104, 105, 106, 107, 108, each layer having a different composition. The functional layers 102, 103, 104, 104, 105, 106, 107, 108 may include polypropylene such as 40% to 100%, for example. Alternatively, the functional layers 102, 103, 104, 104, 105, 106, 107, 108 may comprise less than 100% polypropylene, such as in the range of 5% to 99%. The backing layer 101 may include a multi-layer structure, and at least one functional layer 102, 103, 104, 104, 105, 106, 107, 108 does not include polypropylene. The proportion of polypropylene in each layer such as the backing layer 101 or functional layers 102, 103, 104, 104, 105, 106, 107, 108 is a weight percent based on the total polymer weight of the backing layer 101. For example, the backing layer 101 may comprise between 40% and 100% of the total polymer weight of the backing layer 101, preferably at least 50% polypropylene. The flexibility of the backing layer 101 may be selected by selecting functional layers 102, 103, 104, 104, 105, 106, 107, 108 that include different characteristics.

  The abrasive product 100 may include a backing layer 101 having a first surface 107 and a second surface 108, with the abrasive layer 111 bonded to one surface of the backing layer 101 comprising polypropylene. The backing layer 101 comprising polypropylene has a relatively low surface tension. Corona, plasma, or flame treatment may be used to promote adhesion of the polishing layer 111 to the backing layer 101. Alternatively, the adhesion enhancing layer may be used as the top layer of the backing layer 101 that includes a plurality of functional layers 102, 103, 104, 105, 106, 107, 108. The plurality of functional layer structures may include one or more layers, such as two or more layers. Methods involving corona, plasma, or flame treatment increase the surface tension of the surface to be treated and may be performed on one or both sides of the backing layer 107,108. Alternatively, the adhesion enhancing layer may be provided on one side, or one or more sides, of the backing layer 107, 108. Corona, plasma, or flame treatment may also be used on the surface of the adhesion enhancing layer. To further improve the adhesion of the adhesive layer 111 to the backing layer 101. The polishing layer 111 includes a resin 112 and abrasive particles 113. The resin 112 is used to bond abrasive particles to the surface 110 of the abrasive product 100. Polypropylene has a relatively low melting temperature below 200 ° C. and may begin to soften at temperatures above 100 ° C., depending on the polypropylene structure used. The relatively low melting point of polypropylene may have an effect on the method of curing the polishing layer 111 bonded to the backing layer 101. Advantageously, radiation curing is used to cure the polishing layer 111. The polishing layer 111 may be attached to the backing layer 101 and may include functional layers 102, 103, 104, 105, 106, 107, and 108. The functional layer bonded to the polishing layer 111 may include an adhesion improving surface. The adhesion enhancing surface may comprise a compound such as an acrylate copolymer or ethylene-butyl acrylate (EBA). Further, the adhesion enhancing surface may be ethylene vinyl acetate (EVA), ethylene methyl acetate (EMA), ethylene butyl acetate (EBA). Or high density ethylene copolymers, such as 2-ethylhexyl acrylate (2EHA) copolymers, or low density ethylene copolymers. Further, the adhesion enhancing surface may comprise an ethylene copolymer, such as an ethylene acrylic ester terpolymer, and the acrylic ester type may be methyl, ethyl, or butyl acrylate. Further, the adhesion enhancing surface may comprise an ethylene copolymer such as an ethylene vinyl acetate terpolymer comprising random ethylene, vinyl acetate, and maleic anhydride. In particular, the above examples of adhesion enhancing compounds may be used with surfaces comprising polypropylene, which generally have low surface tension. The ethylene vinyl acetate EVA can be aligned and react with other functional polymers to produce chemical bonds that can increase adhesion, heat resistance, or long-term degradation. In particular, adhesion may be further improved by providing glycidyl methacrylate (GMA) or maleic anhydride (MAH) groups to ethylene vinyl acetate EVA. Acrylic esters may be used to reduce the crystallinity of the backing layer polymer and can widen the working window of the adhesion enhancing compound. Further, the acrylic ester may improve the mechanical properties of the polishing layer 111 or the backing layer 101. Therefore, the adhesive layer 111 or the backing layer 101 has a high density ethylene copolymer, a low density ethylene copolymer, an ethylene-butyl acrylate (EBA) copolymer, an ethylene vinyl acetate (EVA) copolymer, an ethylene methyl acrylate (EMA) copolymer, an ethylene butyl acrylate ( EBA) copolymer, 2-ethylhexyl acrylate (2EHA) copolymer, ethylene acrylate ester terpolymer whose acrylate type is methyl, ethyl or butyl acrylate, ethylene vinyl whose acrylate type is methyl, ethyl or butyl acrylate Others such as acetate terpolymers, or acid copolymers, sodium ionomers, zinc ionomers, or Surlyn ionomers It includes an adhesive enhancing compounds selected from the group consisting of metal ionomers may. The compound may further provide thermal stability. Maleic anhydride may be used to increase adhesion to polar materials. In addition, maleic anhydride may be used as a cross-linking agent to create chemical bonds on a base surface such as a fiber, polymer, or nonwoven material.

  Conventionally, the polishing product 100 including the backing layer 101 is bent after the polishing layer 111 is formed. Bending is required for adhesion and typically results in shrinkage of the abrasive product 100. In particular, this is difficult to solve when paper or fabric containing fibers is used as the backing layer 101 material. Coating the backing layer 101 comprising paper with a slurry containing the resin 112 typically results in paper impregnated with the resin 112 to at least some extent. The resin 112 used for the polishing layer 111 may not stay completely on the first surface 107 or the second surface 108 of the backing layer 101, but may be partially absorbed by the fibers. When the resin 112 is cured, the formed polishing layer 111 may be cured and contracted. The abrasive product 100 is therefore more brittle and can be easily cracked. Furthermore, the shrinkage deforms the abrasive product 100, making it more difficult to handle and use. All woven and non-woven materials such as paper and fabric have similar disadvantages at least to some extent when the adhesive is impregnated into the fibers. An abrasive product 100 having a backing layer 101 comprising paper or cloth needs to be pre-treated and may promote and improve polishing. In particular, the abrasive product 100, including waterproofed paper, has a surface 110 of the abrasive product when the adhesive is cured, which needs to be soaked for several hours before performing an operation that requires precise polishing. May form a hard skin. The shrinkage causes the abrasive product 100 to bend and bend further and subsequently stretched in multiple angles and directions to restore at least a portion of the flexibility of the backing layer 101 and restore the abrasive product 100 shape. There is. The abrasive product 100 may be bent by stretching it in a direction Sx over a plurality of shrink-bending rolls or bars in various directions to divide the abrasive layer 111 into small pieces. This elongation returns the polishing layer 110 to a substantially flat shape and improves the flexibility of the polishing sheet 100. However, the shrink bending operation only improves the flexibility of the polishing layer 110 with respect to the second surface 108 of the backing layer 101 that does not include the polishing layer 111. Further, shrink bending does not improve the curvature of the polishing sheet relative to the polishing layer 111. Further, shrink bending is an extra operation, increasing production costs and reducing the strength of the backing layer 101 and the abrasive product 100. Polypropylene films with small abrasive areas surrounded by channels can provide an alternative to shrink bending by having flexibility in more than one direction. The polishing region may be separated by channels.

  In addition, the flexibility and elasticity of polypropylene films provide separate small island-like parts of the hard abrasive coating and move relative to each other. This may provide an abrasive product 100 that simultaneously combines an abrasive layer 111 having a stable bond and a durable coating with a flexible backing layer 101. Such a product 100 may better maintain the advantageous properties of the components in the construct.

By selecting a polypropylene material for the backing layer 101 and optimizing the manufacturing method of the backing layer, the flexibility of the abrasive product is improved. Furthermore, the polypropylene material of the backing layer 101 eliminates the need for pretreatment of the material by impregnation. Further, the backing layer 101 material may be selected and manufactured to provide functionality to the backing layer in one or more directions. The backing layer 101 may be formed by, for example, extrusion, coextrusion, or injection molding in order to obtain a desired thickness for the layer 101. Coextrusion may be used to join one or more layers and has the effect of forming a more stable adhesion of the joining layer compared to the lamination process. Coextrusion provides sufficient adhesion between the two layer surfaces without an additional intermediate tie layer. Advantageously, the backing layer may be formed by die casting to reduce the orientation of the backing layer 101 in both the longitudinal and lateral directions. In die casting, the elongation of the formed backing layer is minimal, resulting in a backing layer having substantially symmetrical strength and minimal shrinkage in both the longitudinal and lateral directions. This has the advantage of obtaining an abrasive product having a unidirectional backing layer, allowing the abrasive layer to be designed to the abrasive surface 111 more freely. Advantageously, the backing layer 101 may include a substantially symmetrical tensile strength in the longitudinal and transverse directions in the range of 1600 to 5000 N / mm ² . More advantageously, in abrasive products comprising a polypropylene backing layer, the tensile strength may be in the range of 800 to 1000 N / cm ² . Advantageously, the backing layer 101 may include a substantially symmetrical bending strength in the longitudinal and transverse directions in the range of 50 to 300 Nm. More advantageously, in an abrasive product 100 comprising a polypropylene backing layer 101, the elongation may be in the range of 15 to 125 Nm. The methods used to measure bending strength and film tensile strength and elongation are described below. The values obtained from these tests are shown in Table 2. Tensile properties (tensile strength and bending strength or film elongation at break) may be measured according to international standard ISO 527-3 using a measuring device such as, for example, Lloyd LRX 2K5 tester. Table 2 shows the mechanical property values for PET and PP films of different thicknesses.

  The bending strength of the material was determined by measuring the bending force in mN when the material was bent exactly 15 degrees in a Lorentzen & Wettre bending tester. The tested material should be conditioned in the application chamber (23 ± 2 ° C.) at least 3 hours prior to testing. Before the test, a test piece having an average thickness of 40 × 40 mm was measured. The test was repeated twice with two different samples and the bending force was measured in mN. Results were shown as the average of two measurements.

  These values of flexural strength and tensile strength have been empirically shown to be favorable for obtaining a polypropylene backing layer 101 that includes both elastic and plastic properties that provide flexibility and conformity for the bend. . Further, the rigidity of the abrasive product 100 is suitable for both mechanical and manual polishing, and the abrasive product 100 can be damaged without damaging the backing layer 101 by good adhesion of the abrasive layer 111 to the backing layer 101 or The polishing layer 111 may be bent in a plurality of directions Sx, Sy, and Sz without destroying the polishing layer 111. Selection of a suitable polymeric material, such as polypropylene for the backing layer 101, allows for the manufacture of abrasive products that are more flexible in multiple directions, reducing the need for subsequent shrinkage. For example, an abrasive product 100 comprising a polypropylene backing layer 100 may be folded multiple times for manual polishing applications without visible creases.

  5, FIG. 6, and FIG. 7 show schematic examples of cross sections of the abrasive product 100. FIG. The first surface 107 (FIGS. 5 and 6) or the surface 110 (FIG. 7) of the abrasive product 100 may include a surface height deviation in the direction Sz.

5 and 6 show schematic examples of the cross-sectional structure of the backing layer 101. FIG. The backing layer 101 may include recessed regions 201, 202, 203 having depths r1, r2, r3, as shown in FIG. An opening 226 may be provided on the recessed areas 201, 202, 203. Advantageously, the opening 226 is located when the distance h _op of the opening extending through the backing layer 101 in a direction Sz substantially perpendicular to the surface 107 is bonded to the recessed area 203. Provided to be the shortest distance. In other words, the opening 226 may be advantageously provided to fit into the recessed region 203 having the deepest depth r3. The flexibility of the backing layer 101 may be further improved by providing the backing layer 101 that includes the recessed regions 201, 202, 203.

  As shown in FIG. 6, the backing layer 101 may be provided such that a substantially flat functional layer 102 is joined to the uppermost functional layer 103 that includes a surface height deviation in the direction Sz. Such a surface height deviation can be obtained for the uppermost functional layer 103, for example, by molding, by using an engraving cylinder, or by calendering in the opposite pattern. The functional layer 103 is bonded to the substantially flat functional layer 102 so that recessed regions 201, 202, and 203 having depths r1, r2, and r3 are provided on the surface of the first surface 107 of the backing layer 101. , Coated or cured. Further, a raised region 206 surrounded by the recessed regions 201, 202, 203 may be provided in a similar manner.

As shown in FIG. 7, the raised region 206 may be used to deposit the polishing layer 111 including the polishing region 118 on the backing layer 101. The polishing region 118 may be located on the raised region 206. In addition or alternatively, the polishing regions 118 may inherently rise to the extent of their thickness h ₁₁₈ . The polishing region 118 may be limited by channel portions 221, 222, 223 that substantially coincide with the recessed regions 201, 202, 203. The channel portions 221, 222, 223 or the recessed regions 201, 202, 203 may include stepped boundaries. For example, channel portions 221, 222, and 223 having different heights h1, h2, and h3 may have different widths w1 and w2. Accordingly, the channel portions 221, 222, 223 may include different transverse dimensions td1, td2. The first channel portion 201 may have a first transverse dimension td1, and the second channel portion 202 may have a second transverse dimension td2. The second transverse dimension td2 may be larger than the first transverse dimension td1. The transverse dimensions td1 and td2 that are different between the first channel portion 221 and the second channel portion 222 may be lengths L1 and L2, widths w1 and w2, and heights h1, h2, and h3. The lengths L1, L2, widths w1, w2, and heights h1, h2, h3 are substantially perpendicular to each other. The transverse dimension may be substantially constant throughout the channel portions 221, 222. The channel portions 221, 222 and / or the recessed areas 201, 202 can be embossed or used in many ways such as using a cylinder roll with etching, or methods like calendering, gravure, or intaglio printing or pressing. May be formed on the backing layer 101. A rotation method may be advantageous. This is because the recessed area may repeatedly form a pattern or may be engraved in cylindrical rollers. The flexibility of the backing layer 101 may be further improved by selecting the first transverse dimension td1 of the first channel portion 221. Advantageously, the backing layer 101 is a recessed area, such as the first channel portion 221 that is extruded, die cast or injection molded and has a first transverse dimension td1 to improve the flexibility of the abrasive product 100. Including a recessed region disposed in The first channel part 221 includes a smaller width than the second channel part 222. Thus, the first channel portion 221 allows a larger total area of the polishing region 118 on the polishing product surface 110. In other words, the first channel portion 221 and the pattern formed by the first channel portion 221 may be used to divide the polishing layer 111 into polishing regions 118 with appropriate dimensions. The first channel portion 221 may thus function as a hinge, improving the flexibility of the backing layer 101 without excessively reducing the total area of the polishing region 118. Further, the first channel portion 221 that divides the polishing layer 111 into the polishing region 118 reduces the bending of the polishing product 100. This is because the first channel portion 221 may include an adhesive. Thus, when curing occurs in small separation areas, any shrinkage of the coating, including resin 112 and / or dimension coating 114, is effectively reduced. The combination of the flexible backing layer 101 and the first channel portion 221 may be used to obtain the polishing product 100 that does not require shrinkage bending after the polishing layer 111 containing the resin 112 is cured.

The examples shown to provide a method for obtaining the abrasive product 100 are:
Providing a backing layer 101; and forming a plurality of polishing regions 118 supported by the backing layer 101, each polishing region 118 being connected by interconnected channel portions 221, 222 having transverse dimensions td1, td2. Surrounded, the channel portions 221 and 222 include a first channel portion 221 having a first transverse dimension td1 and a second channel portion 222 having a second transverse dimension td2 larger than the first transverse dimension td1.

  In particular, the transverse dimensions td1, td2 may be widths w1, w2, and the second channel portion 222 may be arranged to move the polished material away from the surface 110. Further, the abrasive product 100 may include a polypropylene backing layer 101 and an abrasive layer 111 having a discontinuous coating such that a small abrasive region 118 is surrounded by non-abrasive channel portions 201,202. A flexible backing layer 101 with a non-continuous abrasive coating allows the product surface 110 to function similarly to scales. Although each polishing region is hard, the elastic properties of the backing layer 101 provide flexibility to the polishing region and move relative to each other at least to some extent.

  When the abrasive product 100 is used, clogging may occur that represents abrasive material that accumulates on the surface 110 of the abrasive product 100. Clogging can cause uneven polishing quality and / or reduced cutting speed. Water may be used to flush the object surface and the polishing surface 110. Advantageously, the object surface and the abrasive product surface 110 may be washed with water in a continuous manner to maintain good polishing quality. The water wash should provide enough water to move the abrasive material mixed in the water. Further, water should be provided and retained in an amount sufficient to continuously wash the polished material. When the mixture of water and polished material, represented as shavings, is not sufficiently removed, the polished material can become clogged. When the polished material is mixed with the shavings, the viscosity of the shavings can increase due to insufficient water washing. This in turn increases the friction and can cause the surface 110 of the abrasive product to be pulled against the object surface. To reduce entrainment, the abrasive product surface 110 may include channel portions 221, 222. A method of reducing clogging is to provide an abrasive product 100 having a surface 110 that includes channels that move shavings and water to rinse the surface 110. In particular, the abrasive product surface 110 may provide including a first channel portion 221 to reduce entrainment and a second channel portion 222 to move the polished material. An opening 226 may be provided for moving air and liquid through the abrasive product to and from the polishing surface 110 in the direction Sz. The openings may be joined to channel portions 221, 222 that provide a means for reducing clogging and retraction.

  FIG. 8 is an example of a cross-sectional view of the polishing product 100. The broken line shown by CC in FIG. 8 shows the CC cross section of the surface 110 shown in FIG. The abrasive product 100 may include a backing layer 101 and an abrasive layer 111 as shown in FIG. Optionally, the abrasive product 100 may include an opening 226 and a foam layer 123. Openings 226 extending through the backing layer 101 and the polishing layer 111 may be used to move the polished material through the backing layer 101 in a controlled manner. The foam layer 123 may be bonded to the second surface 108 of the backing layer 101, for example, by lamination. The foam layer 123 may be used to provide good attraction for the abrasive product 100. Furthermore, the foam layer 120 can provide a more stable and uniform pressure throughout the abrasive product surface 110 when the abrasive product surface 110 is pressed against the object surface. Further, the foam layer 120 may include a porous structure that allows the layer 123 to adsorb or move liquid. Along with the opening 226, the foam layer 123 may be used to move water and shavings off the surface. When the product is used, the pressure used to hold the product 100 against the object surface may vary. In particular, product 100 including foam layer 123 and opening 226 may be arranged in a manner similar to a pump, with foam layer 123 passing through opening 226 to surface 110 and from surface 110 to water. , Thereby washing the surface 110 of the abrasive product 100 with water. The combination of foam layer 123 and opening 226 may thus be used for cleaning and cooling the surface 110. The arrangement may provide a way to keep the product surface 110 clean when the diameter of the opening 226 is selected such that free abrasive particles are transferred with the water. The performance of the pump operation may be controlled by selecting the thickness of the foam layer 123. The foam layer 123 can hold various amounts of liquid depending on the thickness of the foam layer 123. By increasing the thickness, the foam layer 123 can absorb more liquid than the structure of the polishing surface 110.

  FIG. 9 shows the surface 110 of the abrasive product 100. The surface 110 includes a channel and separates a plurality of polishing regions 118. The channel may be divided into channel portions such as the first channel portion 221 and the second channel portion 222. The first channel part 221 may have a first transverse dimension td1, and the second channel part 222 may have a second transverse dimension td2. The first transverse dimension td1 may be a width w1 and a length L1 as shown in FIG. 10, or may be a height h1 as shown in FIG. The second transverse dimension td2 may have a width w2, a length L2, as shown in FIG. 10, or a height h2 as shown in FIG. In particular, the first channel part 221 includes the first channel volumes 10A and 10B, the second channel part 222 includes the second channel volumes 20A and 20B, and the volume is the width w1, w2, of each of the channel parts 221 and 222. It may be determined from the lengths L1, L2, and the heights h1, h2. Since the larger transverse area carries the material and fluid better, advantageously, the transverse dimensions td1, td2 are two-dimensional areas defined as the heights h1, h2 × widths w1, w2 of the channel portions 221, 222. May be. For example, the height h2 × width w2 of the channel portion 222 is defined as the transverse dimension td2, and may be larger than the height h1 × width w1 of the channel portion 221 defined as the transverse dimension td1. The channel portions 221 and 222 may preferably include a curved portion. In particular, the second channel portion 222 including the curved portion advantageously retains water on the polishing surface 110. When the surface 110 includes a network of interconnected channel portions 221, 222 that includes a curved portion, water movement in a single direction is limited by the branched and bent channel portions 221, 222. In this regard, the channel portions 221, 222 bends represent non-linear extensions of the channel portions 221, 222 along the lengths L1, L2 of the channel portions 221, 222, such as arched or curved. The curved portion may also be a corner such as a short linear length interconnected at the corner. For example, the first channel volumes 10A and 10B may be joined together at a corner where adjacent first channel portions 221 interconnected at a corner together form a longer first channel portion 221 that includes the corner. Can be envisaged. FIG. 11 shows an example of a first channel portion 221 that separates the polishing region 118, and the first channel portion 221 is bent in an arch shape and includes a curved portion. Alternatively, the channel portions 221 and 222 may be linear, but have a maximum linear length L5 and are shown in FIG.

  The limited straight length of the channel portions 221, 222 reduces the risk of interference fringes. When the vibration device 300 including the polishing product 100 is freely rotated and the end of the polishing product 100 is strongly pressed and held at the same point, interference fringes can occur. The vibrating abrasive product 100 then begins to act like a shaft and makes a regressive movement in the pressed peripheral region. When the regressive motion coincides with the direction of the straight channel portions 221, 222, stripes can be formed on the object surface. The risk of interference may be reduced by providing channel portions 221, 222 that include non-linear or bent shapes. Advantageously, the second channel portion 222 is less than 2.5 times the amplitude of the polishing apparatus 300 compatible with the polishing product 100, for example less than 2.5 times 2.5 mm, or 2 mm. It includes a maximum straight line length L5 of less than 5 times or less than 2.5 times of 8 mm. In other words, the amplitude of the device 300 may be, for example, 2.5 mm, 5 mm, or 8 mm. The vibration may be in any direction. By having a linear length that is less than 2.5 times the amplitude of the device 300, the risk of interference may be reduced.

  Advantageously, the channel portions 221, 222 are disposed on the surface 110 of the abrasive product 100 in a manner that provides flexibility and conformability. At the same time, efficient water washing and water retention of the polished material is desired. This may be obtained by providing a backing layer 101 and forming a plurality of polishing regions 118 supported by the backing layer 101, each polishing region 118 having a mutual dimension td1, td2. Surrounded by connected channel portions 221 and 222, the channel portions 221 and 222 have a first channel portion 221 having a first transverse dimension td1 and a second transverse dimension td2 larger than the first transverse dimension td1. A channel portion 222 and disposed to move the polished material away from the surface 110. The backing layer 101 may include one or more functional layers 102, 103, 104, 104, 105, 106, 107, 108 formed by die casting, extrusion, coextrusion, or injection molding. Advantageously, the backing layer 101 may comprise a propylene homopolymer or copolymer. The backing layer 101 may comprise recessed areas 201 and 202 for moving water or polished material. The recessed areas 201 and 202 and the raised areas 206 are formed by continuously forming a structure on the flat functional layer 102, 103, 104, 104, 105, 106, 107, 108, and engraving a roller structure or calendering. It may be obtained by filling the coated film with a coating medium, contacting the filled engraved surface with a flat functional layer 102, 103, 104, 104, 105, 106, 107, 108 and curing the coating. Advantageously, the coating may be cured at the same time that the flat functional layers 102, 103, 104, 104, 105, 106, 107, 108 are brought into contact with the filled engraved surface. Alternatively, the desired structure of the recessed areas 201, 202 and the raised areas 206 on the surface 110 may cover the backing layer 101 by screen printing. The positions of the recessed regions 201 and 202 on the backing layer 101 may be arranged so as to substantially coincide with the position of the second channel portion 222. By having at least a part of the recessed regions 201 and 202 below the second channel part 222, the volume of the second channel part 222 can be increased. Although the first channel portions 221 are advantageous for flexibility, they may not be sufficient alone to wash the surface 110 with water. The second channel portion 222 may be arranged to suspend water, transfer a mixture of water and polished material, and cool the abrasive product surface 110. In particular, the abrasive product surface 110 may include a network of interconnected channel portions 221, 222 that defines a basic pattern. A non-limiting example of such a network that includes the repetitive network pattern RNP2 is shown in FIG. 13, where the interconnected second channel portions 222 form a hexagonal repetitive pattern RP4. A non-limiting example of the repetitive pattern RP4 is shown in FIG. 14, where the first channel part 221 is connected to the hexagon formed by the second channel part 222 to define a network of interconnected channel parts 221, 222. To do.

In order to avoid entrainment and to obtain a good relationship between abrasive cutting speed and efficient rinsing, the proportion of the abrasive product surface 110 is within the range of 40-80% of the surface 110 area. A polishing region 118 may also be included. Alternatively, at least 20% of the surface 110 area does not include the polishing region 118, allowing the formation of a network of channel portions 221, 222 between the polishing regions 118. When more than 50% of the surface 110 area does not include the polishing region 118, the polishing effect can be reduced to an insufficient level. Further, if the abrasive product surface 110 is more than half and does not include the abrasive layer 111, the abrasive product may wear faster than desired. In other words, the total area of the channel portions 221, 222 is advantageously in the range of 20% to 60% of the total area of the abrasive product 100. Most advantageously, the total area of the channel portions 221, 222 is in the range of 40% to 50% of the total area of the abrasive product 100. When designing the polishing surface 110, the use of the polishing product 100 using the polishing apparatus 300 should be considered. A typical amplitude of the polishing apparatus 300 using the polishing product 100 is 2.5 mm, 5 mm, or 8 mm. The amplitude serves to define an appropriate range between the polishing area dimension and the transverse dimension of the channel portions 221 and 222. Furthermore, the channel portions 221 and 222 including the linear lengths L1 and L2 or the widths w1 and w2 that are equal to or larger than the amplitude of the polishing apparatus 300 increase the risk of direct interference. In other words, the device may begin to resonate or function as an axis, damaging the object surface or causing scratches on the polished object surface. In order to avoid this, the transverse dimensions td1, td2, advantageously the lengths L1, L2 or the widths w1, w2 of the channel portions 221, 222 are preferably greater than the amplitude of the polishing apparatus 300 using the polishing product 100. It should be small, for example less than 2.5 mm, or less than 5 mm, or less than 8 mm. In particular, the second channel portion 222 includes a maximum linear length L5 that is preferably 2.5 times smaller than the amplitude of the polishing apparatus 300 using the polishing product 100. Furthermore, the use of the surface 110 containing the network NT1 allows the interconnected channel portions 221 and 222 to define the repeat unit and the distance that the polished material must travel before reaching the channel portions 221 and 222. Decrease. For the same reason, the surface area of each polishing region 118 should also be considered to reduce linear interference. The surface area of the polishing region may be in the range of 0.5 to 75 square millimeters (mm ² ). Advantageously, when the particle size is in the range of 3-40 micrometers, the area of the polishing region 118 is 0.5-35 square millimeters such that the overall length of the polishing region 118 is in the range of 2-6 millimeters. It may be within the range of (mm ² ). In other words, advantageously, the polishing region 118 surface comprises a distance in the range of 2-6 millimeters. Advantageously, when the particle size is in the range of 30-300 micrometers, the area of the polishing region 118 may be in the range of 15-75 square millimeters (mm ² ).

  The abrasive product 100 is not easily drawn into the object surface and can retain sufficient water for accurate and high quality polishing results, and can be used with similar polishing results in any surface direction. It is desirable to be able to do it. In other words, the abrasive product 100 advantageously includes a surface 110 that allows unidirectional polishing. This allows the use of abrasive products without any preferential surface orientation. Care should be taken in designing the surface 100 structure to reduce the non-polished areas extending along the surface 110 in the linear direction. For example, if the channel portions 221, 222 continue linearly without branching or intersecting along the plurality of polishing regions 118, a portion of the object surface may be less polished or not polished at all and appear to be raised Can result in uneven polishing results. Further, such linear channel portions 221 and 222 cannot hold water as in the curved portion. Further, in order to improve rinsing of the polishing surface 110 and movement of the polished material, each increased level of the channel portions 221, 222 may include a total volume that is at least greater than the previous level. As used herein, the total volume represents the total transverse surface area of the channel portions 221, 222 defined by two transverse dimensions td1, td2 in which at least one is Sz. For example, the total volume of the second channel unit 222 is at least equal to or greater than the total volume of the first channel unit 221. This improves the liquid flow characteristics of the channel portions 221, 222. This is because each increased level of the channel section can accept the volume of liquid contained in the previous channel section level.

  The polishing area 118 may be provided by a coating using a kiss roll or engraving roll. By suitably selecting the coating weight, the polished material including the resin 112 and the abrasive particles 113 can be limited to the raised surface 206 only. A suitable coating weight is defined such that the abrasive material is retained in the raised area during curing. When the flat backing layer 101 is used, the polishing product surface 110 and the polishing region 118 including the channel portions 221 and 222 may be formed by a number of methods such as calendering, gravure printing, or intaglio printing or pressing. Good. A rotation method may be advantageous. This is because the channel portions 221 and 222 may form a repeating unit, and may be implemented by a cylindrical roll as a mirror image, for example. Advantageously, the abrasive product surface 110 includes channel portions 221, 222, and the abrasive region 118 may be formed by a screen printing device. Screen printing may be used to form a single layer or an abrasive slurry layer. Screen printing may be used to provide various types of shapes or patterns on the surface 110. The shape may include text, numbers, or figures. For example, the pattern may include product information such as name, number, barcode, particle size, logo, or any combination thereof. The name, number, barcode, particle size, logo, or any combination thereof, represented as an “information pattern” may be divided into pieces by the channel portions 221, 222. Dividing the information pattern into small pieces according to the channel portions 221 and 222 improves the effect of the information pattern in the same manner as the other polishing regions 118 surrounded by the channel portions 221 and 222. Further, screen printing may be used to provide a surface 110 that includes repeating units. Alternatively, screen printing allows printing of the polishing layer 111 that includes a polishing region 118 having a self-similar shape. The screen printing method allows a simple way to produce a pattern that can fit into the recessed area 201 provided on the backing layer 101.

  Alternatively, methods such as ink jet printing may be used to apply the resin 112. Inkjet printing may be used such that the resin 112 is printed only on the raised areas 206. Advantageously, inkjet printing may be used to match the position of the polishing region 118 on the raised region 206. In addition, inkjet printing provides a method for obtaining a raised region 206 that includes an abrasive region 118, and the channels 221, 222 may be left free of adhesive 113. In addition, inkjet printing provides a method for obtaining a polished area 118 on the product surface 110, leaving the recessed areas 201, 202 free of adhesive 113. Furthermore, inkjet printing may be used to print the resin 112 across the entire surface 110, and the recessed areas 201, 202 may remain unfilled. Advantageously, electrostatic coating of the abrasive particles 113 may be performed after ink jet printing. In electrostatic coating, the main abrasive particles 113 are deposited where the tension field is highest. In the surface 10 including the height deviation, generally the highest tension field is on the raised region 206.

  A recessed area 201 that conforms to the second channel portion 222 may be provided on the backing layer 101. The position of the recessed region 201 on the backing layer 101 may substantially coincide with the position of the second channel portion 222 on the polishing layer 111, and the volume of the channel portions 221 and 222, particularly the second channel portion 222. Increase the volume of each increase level of the channel part. In other words, the polishing layer 111 can be deposited as the polishing region 118 on the raised region 206 so as not to fill the recessed region 201 provided in the channel portions 221 and 222 on the backing layer 101. The polishing layer 111 bonded to the backing layer 101 can include a first channel portion 221, a second channel portion 222, and a plurality of polishing regions 118. This is a convenient method for increasing the heights h1 and h2 of the channel portions 221 and 222. An alternative way to increase the heights h1 and h2 of the channel portions 221 and 222 would be to provide a deeper recessed area 201 in the backing layer 101. However, the strength of the backing layer 101 is reduced by the recessed area 201, and the increased depth may require the backing layer 101 to have an increased thickness. This can also lead to additional materials used for the backing layer 101 and increase the manufacturing cost of the abrasive product 100.

  An opening 226 is provided in the recessed region 201 of the backing layer 101 that conforms to the location of the channel portions 221, 222 to improve the removal of the washed or polished material. FIG. 15 shows an example of the opening 226 including the length L3 and the width w3. Advantageously, the diameter of the opening 226 is large enough to allow liquid and gas to pass through. Further, the polished material and water may thus be moved through the abrasive product 100 from the central portion of the abrasive product surface 110 in the direction Sz. Advantageously, the surface 110 of the abrasive product 100 may include an opening 226 extending through the backing layer 101 and the abrasive layer 111 to move the polished material. The opening may include a maximum opening width w3 equal to the second channel width w2 and a maximum opening length L3 equal to the maximum length L5 of the second channel portion 222. Alternatively, the opening 220 may include an opening width w3 that is equal to or smaller than the width of the recessed area 116 and a maximum opening length L3 that is 10 times the width of the recessed areas 202 and 203. The opening 226 may be circular so that the diameter of the opening is the opening width w3, and the width w3 may be equal to the opening length L3. Advantageously, the opening diameter is less than the amplitude of the polishing apparatus 300. The opening 226 may be advantageously positioned to facilitate movement of gas, liquid, polished material, or dust from the abrasive product surface 110 through the abrasive product 100. The opening 226 may be provided, for example, when cutting an abrasive product from an abrasive sheet or web. The opening 226 may include a length L3 arranged perpendicular to the lengths L1 and L2 of the channel portions 221 and 222. The opening 226 may be provided such that some channel portions are covered by the opening 226. However, an opening is not required for each repeating unit. The opening 226 may be perforated in the product 100. The perforation of the opening 226 may be made either before or after the polishing layer 111 is coated. Perforations such as punching or die cutting may be made by laser light. Laser light is an accurate way of providing the opening 226. Advantageously, the laser light is used to burn the opening having the desired length L3 and width w3 and to adapt the position of the opening 226 to the position of the channel portions 221, 222 and the recessed regions 202, 203. May be. Advantageously, the opening 226 at least partially affects the channel portions 221 and 222 to improve water washing or liquid removal. Preferably, the location of the openings 226 can be adapted to the pattern of the surface 110.

  The polishing product surface may include repeating units of the polishing region 118, and opposing repeating unit boundaries may have congruent curves, form complementary pairs, and be combined with repeating units in a preemptive manner. The expression “repeating unit of polishing region 118” represents a repeating unit that may include polishing region 118, and polishing region 118 may be surrounded by channel portions 221 and 222. Advantageously, the polishing region 118 has a congruent shape to obtain channel portions 221, 222 that include a substantially constant width. The repeating unit may vary. Advantageously, the repeating units on the abrasive product surface 110 comprise self-similar or congruent shapes. The repeating unit may include a polishing region 118 separated from another repeating unit by the channel portions 221 and 222. The repeating unit may be provided by a design pattern including a congruent or self-similar shape, for example. As used herein, congruence refers to figures or objects having the same shape and dimensions. When the basic geometric shape is not symmetric, a mirror image of the shape may be used as well. The mirror image of the shape is congruent with the original shape. The two congruent shapes can be changed from each other by isometric operations such as a combination of transition, rotation, and inversion. Self-similar shapes represent shapes that have the same shape but different dimensions. A fractal may be a self-similar pattern that is exactly the same on every scale, or nearly identical on different scales. The mosaic shape represents the shape produced by the mosaic, and a two-dimensional surface can be created using repeating geometric shapes without overlap and voids. Mosaics and fractals are advantageous in the design of abrasive product surfaces 110 that include repeating units, and linear interference is avoided.

  Abrasive product surface 110 comprising repeating units that can be combined in a preemptive manner can be provided from a basic geometric shape. A repeat unit boundary represents a contact line between two joined repeat units. In other words, the boundary is a boundary line between two repeating units. The basic geometric shape may be substantially all kinds of geometric shapes including straight sides and corners, such as triangles, squares, crosses, or hexagons. Advantageously, the geometric shape may comprise an even number of sides such that each side has a pair comprising the same length. The basic geometric shape with corners may be deformed to obtain a congruent or similar shape, including a bend. The expression “preempty style” refers to a plurality of repeating units including congruent shapes that provide a plurality of repeating units that can be combined with each other such that the surface 110 is completely covered by the plurality of repeating units.

  FIGS. 16a-16f show non-limiting examples of abrasive product surfaces 110 that may be provided in the abrasive product. It is advantageous to make the polishing region 118 and the channel portions 221, 222 by using a shape shown as a repeating unit RU1 that can be combined in a preemptive manner to fill the entire surface 110 of the polishing product 100. The repeating unit RU1 may include a polishing region 118 that is separated from other repeating units RU1 by the channel portions 221 and 222. An abrasive product surface 110 comprising repeating units RU1 that can be combined in a preemptive manner may be provided from the basic geometry SH1, which is the example shown in FIG. 16a. The basic geometric shape SH1 may be deformed as shown in FIGS. 16a and 16b, and the hexagonal shape SH1 including an even number of sides A11, A12 having matching straight lengths arches the sides A11, A12. It is deformed by bending it. The sides A11 and A12 are bent in an arch shape by a pairing method as shown in FIG. 16b, and each pair of the sides A11 and A12 having a matching linear length is deformed in a similar manner. The pair of first sides A12 are bent outwardly in an arch shape, but the same pair of second sides A11 are bent inwardly in the mirror image of the first side. This allows the total area of the geometric shape 226 to remain the same, providing a pair of two sides A11, A12 that include congruent curvatures. The basic geometric shape SH1 does not have to be symmetrical. However, advantageously, the basic geometric shape SH1 includes an even number of sides A11, A12 forming a pair. Further, the two sides forming the pair may be deformed to obtain congruent lines that have matching linear lengths and are complementary to each other. FIG. 16c shows a repeating unit RU1 that forms a deformed geometric shape SH1, the space 220 of the channel portions 221, 222 may be provided by engraving. Engraving is advantageously performed from the boundary towards the center of the deformed geometric shape SH1, such that a substantially constant width is removed from the outer periphery of the deformed geometric shape SH1. This results in a first region REG1 in the middle of the deformed geometry SH1 and may be used to provide a polishing region 118. The second region shown as the space 220 is joined to the channel portions 221 and 222 by joining a plurality of repeating units RU1 that deform the geometric shape SH1 in a preemptive manner that does not leave gaps between the plurality of repeating units RU1. May be used to form The repeating unit RU1 including the first region REG1 forms the polishing region 118 and the space 220, and forms the channel portions 221 and 222 surrounding the polishing region 118, as shown in FIG. 16c. 16d and 16e, a plurality of repeating units RU1 are joined to each other so that no gap is left between the repeating units RU1 so that the boundary lines of the repeating units RU1 face each other, and the formation of channel portions 221 and 222 is shown. . The plurality of repeating units RU1 bonded to each other may be shown as repeating patterns RP1 and RP2. The repeating pattern may be coupled to the repeating network pattern RNP1.

  Alternative methods for providing the channel portions 221, 222 and the polishing region 118 may be used. FIGS. 17 a-17 e show non-limiting examples of abrasive product surfaces 110 that can provide an abrasive product 100. An alternative method for providing the channel portions 221 and 222 and the polishing region 118 is a reduction method, and the first region in the center of the deformed basic geometric shape SH2 has a deformed basic geometry. It may be obtained by reducing the geometric shape SH2, and the original reduced and deformed basic geometric shape SH2 is concentric. However, engraving is advantageous to provide channel portions 221, 222 that include substantially constant channel widths w1, w2. The deformed basic geometric shape SH2 may be self-similar to the polishing region 118 inside the deformed basic geometric shape SH1. The first region in the center of the deformed basic geometric shape SH2 may include a polishing region 118. Non-limiting exemplary lists of basic geometric shapes suitable for deformation include hexagons, squares, and diamonds. Advantageously, the abrasive product surface 110 includes repeating units RU2 of the polishing region 118, and opposing repeating unit RU2 boundaries have congruent curves, form complementary pairs, and are combined in a preemptive manner. Repeat patterns RP3 and RP4 are formed. The repeating patterns RP3 and RP4 can form the repeating network pattern RNP2 as shown in FIG. 17e. Since the shape of the repeating unit RU2 or the repeating patterns RP3 and RP4 can change, the shape of the formed repeating network pattern RNP2 can also change. Advantageously, the repeat unit RU2 or abrasive product surface 110 comprises a self-similar or congruent shape. This allows a plurality of repeating units RU2 to be arranged in a preemptive manner that fills the entire surface 110 of the abrasive product 100, as shown in FIG. 17e. A repeating unit RU2 containing a periodic shape, a self-similar shape, a fractal pattern or a mosaic pattern may be used for this purpose. An example of the network of the repetitive network pattern RNP1 including a curved portion is illustrated in FIG. 16f and is also an example of a network including a mosaic pattern.

  In particular, the repeating patterns RP1, RP2 may include different amounts of the repeating unit RU1, and the repeating network pattern RNP1 may provide various patterns as shown in FIGS. 16d, 16e, and 16f. Further, the repetitive pattern RP2 may be a group of the repetitive network pattern RNP1, and the peripheral space 220 of the repetitive pattern RP2 may be made wide to form the wide channel 222 in the repetitive network pattern RNP1.

  Figures 17a to 17e show a non-limiting example of another basic geometric shape SH2 that includes an even number of sides A13, A14, the straight line length being no deformation of the basic geometric shape SH2. May be combined in a preemptive manner providing the repeat unit RU2. In FIG. 17a, the rhombus is used as the basic geometric shape SH2. As shown in FIG. 17b, the rhombus engraving may be performed in a manner similar to other basic geometric shapes, with the rhombus so that a substantially constant width is removed from the perimeter of the rhombus. It is advantageously carried out from the boundary line towards the center of the. In a manner similar to the sculpture shown in FIG. 16c, the rhombus sculpture may also be used to provide a first region REG1 in the center of the rhombus and provide a polishing region 118 and an outer periphery, the outer periphery being a space 220. The channel region 221 and 222 may be formed surrounding the first region REG1. Thus, the formed repeat unit RU2 may be joined in a preemptive manner to other congruent repeat units RU2, forming a repeat pattern RP3, RP4 containing hexagons, as shown in FIGS. 17c and 17d. May be. A repetitive network pattern RNP2 including a self-similar shape to the repetitive pattern RP4 can be formed as shown in FIG. 17e by continuously filling the abrasive product surface 110 with the recurring unit RU2 in a preemptive manner. Good. Finally, a network including the repetitive network pattern RNP2 may be formed as shown in FIG. 17e. In particular, the repetitive pattern RP4 and the repetitive network pattern RNP2 may have the same hexagonal shape on different scales, and the channel portions 221 and 222 may include volumes that increase on different scales. This is an advantageous method for obtaining an abrasive product surface 110 having repeating units and a repeating network pattern including self-similar shapes on different scales.

  FIGS. 18a-18g show another non-limiting example, where the basic geometry SH3 including an even number of sides A1, A2, B1, B2 with matching linear lengths is preempted. In combination, the repeating unit RU3 may be provided. In FIG. 18a, the rhombus is used as the basic geometric shape SH3. The rhombus includes four sides A1, A2, B1, and B2, with A1 and B1 forming a first pair, and A2 and B2 forming a second pair of sides. In other words, the length of A1 is equal to the length of B1, and the length of A2 is equal to the length of B2. Each side A1, A2, B1, and B2 may have the same length. Figures 18b and 18c show how A1, A2, B1 and B2 are deformed by bending them in an arcuate manner in a mating manner. For each pair, the first side A1, A2 of the pair is bent outwardly in an arch shape, while the second pair B1, B2 of the same pair is bent inwardly by a mirror image of the first side A1, A2. This makes it possible to leave the total area of the basic geometric shape SH3 unchanged and to provide a pair of two sides A1, B1 and A2, B2 including congruent curves. To do. For geometries that include four or more sides, the above procedure may be repeated for each pair of sides that fits a straight line length. As shown in FIG. 18c, the above procedure results in a deformed basic geometric shape SH3 that includes a bend. Advantageously, each pair is bent arcuately by the same amount, resulting in each side A1, A2, B1 and B2 containing congruent shapes. Thus, as shown in FIGS. 18d and 18e, the repeating unit RU3 provided by the rhombus variant may be joined in a preemptive manner to other congruent repeating units RU3, as shown in FIG. 18e. Repeat pattern RP5 is formed. Other repetitive patterns RP6 and / or repetitive network patterns RNP3 may be formed as shown in FIGS. 18f and 18g by continuously filling the abrasive product surface 110 with recurring units RU3 in a preemptive manner. . Finally, as shown in FIG. 9f, a network of repeated network patterns RNP3 may be formed. Interestingly, the shape of the repeating pattern RP5 is similar to the repeating unit RU1 shown in FIG. 16c. In particular, when the repeating pattern RP5 and the repeating unit RU1 have the same dimensions, they have a congruent shape and can be joined together in a preemptive manner. This results in a network like the RNP3 shown in FIG. 18g, but with differently shaped channel portions 221, 222 in the network.

  A non-limiting example of a repeating network pattern RNP4 that includes corners is shown in FIGS. 19a-19e and is also an example of a network that includes a fractal-like pattern. In this example, the cross shape may be used as the basic geometric shape SH4 to obtain the repeating unit RU4. The basic geometric shape SH4 and the repeating unit RU4 may include the same shape. The basic geometric shape SH4 is similar to the repeating pattern RP7 and the repeating network pattern RNP4. In this case, the network is formed by combining repeating patterns RP8 in a preemptive manner. In particular, the repeating pattern RP8 is formed from five joined units of the repeating pattern RP7. Each of the repeating patterns RP7 is formed from five joined repeating units RU4, and shows the fractal nature of the network including the repeating units RU4. Other examples of the network of the repetitive network pattern RNP2 including corners are shown in FIGS. 13 and 14 and are also examples of networks including fractal nature. The repetitive network pattern RNP2 includes a hexagonal repetitive pattern RP4, which can be found on a similar scale within the repetitive pattern RP4. Corners can be considered herein as specific examples of bends to avoid linear interference.

  Figures 20a to 20f show a further non-limiting example, where a square with an even number of sides with matching straight lengths is used as the basic geometric shape SH5, in a preemptive manner, a repetitive network It may be deformed and joined into a congruent shape including pattern RNP5, and further includes repeating unit RU5 and repeating patterns RP9 and RP10.

  Figures 21a-21e show a further non-limiting example, where a symmetric hexagon containing an even number of sides with a matching straight length is used as the basic geometric shape SH6, preemptive style The congruent shapes are joined together to provide a network including the repeating unit RU6, the repeating pattern RP12, and the repeating pattern RP11. The repetitive network pattern RNP6 includes a similar shape on a smaller scale within the repetitive pattern RP12. Further, the repeated network pattern RNP6 may be joined in a congruent shape.

  FIG. 22 shows a further non-limiting example, where an asymmetric hexagon containing an even number of sides is used as the basic geometric shape SH7. The sides may be deformed by bending them in an arcuate manner in a pairing manner similar to that described in the examples shown in FIGS. 18a-18g to obtain repeat unit RU7. The repetitive network pattern RNP7 includes a repetitive pattern RP14. Repeat pattern RP14 may include 2, 3, or more repeat patterns RP13 joined together in a preemptive manner.

  The examples described in FIGS. 16 to 22 may be used as embodiments. Further, the above example is a method for obtaining the polishing product 100, which includes providing the backing layer 101 and repeating the RU 1, RU 2, RU 3, RU 4, RU 5, RU 6, and RU 7 in the polishing region 118. Forming opposing units, the opposing repeating units RU1, RU2, RU3, RU4, RU5, RU6, and RU7 boundaries have congruent curvatures, form complementary pairs, and preempt In combination with the repeating units RU1, RU2, RU3, RU4, RU5, RU6, RU7.

  Advantageously, squares or squares such as rhombuses, symmetrical hexagons or symmetrical crosses may be used as the basic geometric shapes SH1, SH2, SH3, SH4, SH5, SH6. Well, the repeating units RU1, RU2, RU3, RU4, RU5, RU6 are obtained without changing the shape. However, the geometric shapes SH1, SH2, SH3, SH4, SH5, SH6, and SH7 may be modified. Repeat units RU1, RU2, RU3, RU4, RU5, RU6, RU7 may be joined to congruent repeat units RU1, RU2, RU3, RU4, RU5, RU6, RU7, combined together in a preemptive manner, curved A network of repetitive patterns RP1, RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, RP14 is provided. In particular, the same shape can be obtained by dividing the outer periphery of the circle into even-numbered lengths to be deformed using, for example, a circular shape as the geometric shape. The repeating unit shapes RU1, RU2, RU3, RU4, RU5, RU6, and RU7 may be obtained in a plurality of ways. Sculpture allows the formation of channels that can be joined together. The self-similar shape further provides a convenient method of forming channel portions 221 and 222 including different widths w1 and w2, such as the first channel width w1 and the second channel width w2. Furthermore, substantially constant widths w1, w2 of the channel portions 221, 222 may thus be obtained. By providing the backing layer 101 with the recessed areas 201, 202, 203 that conform to the polishing product surface 110 pattern, the wide second channel portion 222 may be made deeper and the second channel portion 202 has a volume. Bring about an increase. The design of the channel portion having an increased level and volume may be advantageous for efficiently moving the free abrasive particles 113 separated from the polishing layer 111. When such separate abrasive particles 113 are not removed, they can cause scratches on the object surface. In particular, the increased volume fraction of the channel portions 221, 222 can efficiently remove abrasive material, whereas the non-linear elongation of the channel portions 221, 222 provides an improved water retention method used in wet polishing. provide. In general, the network NT1 of the interconnected channel portions 221 and 222 defines the repetitive patterns RP1, RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, RP14. May be. The repeating units RU1, RU2, RU3, RU4, RU5, RU6, and RU7 are congruent by the substantially constant widths w1 and w2 of the channel portions 221 and 222, but the engraving of the space 220 is the repeating unit and the repeating pattern RP1. , RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, and RP14. This provides a convenient way to obtain both the first channel portion 221 and the second channel portion 222. The width w2 of the channel part 222 at a greater level or scale of fractality separates the repeated patterns RP1, RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, RP14 from each other. It may be enlarged by positioning. However, when using a mosaic shape that is not symmetrical and includes curved portions, the sculpture of the space 220 is designed as the largest pattern surrounded by the channel portion 222, the repeated patterns RP1, RP2, RP3, RP4. It may be implemented by engraving the inside of RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, RP14. Accordingly, the widths w1 and w2 along the channel portions 221 and 222 may vary within a range of 0 to 30% of the average width of the channel portions 221 and 222.

  It will be apparent to those skilled in the art that modifications and variations of the product according to the present invention can be understood. The figure is a schematic diagram. The specific examples described above with reference to the accompanying drawings are merely examples, and are not intended to limit the scope of the invention as defined by the appended claims.

Numbered Items 2.1 Abrasive product 100 comprising a surface 110 having a plurality of polishing regions 118 supported by a backing layer 101, each polishing region 118 interconnected having transverse dimensions td1, td2. Surrounded by channel portions 221, 222,
The channel parts 221 and 222 include a first channel part 221 having a first transverse dimension td1 and a second channel part 222 having a second transverse dimension td2 larger than the first transverse dimension td1. Polishing product 100.

  2.2 Abrasive product 100 according to item 1, comprising two or more channel portions 201, 202 levels that increase in transverse dimension.

  2.3 The polishing product 100 according to item 1 or 2, wherein the transverse dimensions td1 and td2 are substantially constant over the entire channel portions 201 and 202.

  2.4 The polishing product 100 according to any one of items 1 to 3, wherein the transverse dimensions td1, td2 are height h1, h2 × width w1, w2.

  2.5 The backing layer 101 includes a first channel portion 221 that is extruded, die cast, or injection molded and has a first transverse dimension td1 arranged to improve the flexibility of the abrasive product 100. The polishing product 100 according to any one of items 1 to 4 to be performed.

  2.6 The polishing product 100 according to any one of items 1 to 5, wherein the second channel portion 222 includes a curved portion in order to avoid linear interference.

  2.7 The second channel portion 222 is less than 2.5 times the amplitude of the polishing apparatus 300 compatible with the polishing product 100, for example, less than 2.5 times 2.5 mm and 2.5 times 5 mm. The polishing product 100 according to any one of items 1 to 6, including a maximum linear length L5 of less than or less than 2.5 times 8 mm.

  2.8 The polishing product 100 according to any one of items 1 to 7, wherein the second channel section 222 defines a network NT1 of the interconnected channel sections 221 and 222.

  2.9 Network NT1 of interconnected channel sections 221 and 222 shall define repetitive patterns RP1, RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, RP14. Item 10. The polishing product 100 according to Item 8, wherein

2.10 A polishing product surface 110 comprising repeating units RU1, RU2, RU3, RU4, RU5, RU6, RU7 in the polishing region 118,
Opposing repeating units RU1, RU2, RU3, RU4, RU5, RU6, and RU7 boundary lines have congruent curved portions and form a complementary pair. The repeating units RU1, RU2, RU3, RU4, RU5, RU6, and RU7 Polishing product surface 110, characterized in that they are combined in a preemptive manner.

  2.11 Item 10 wherein a plurality of repeating units RU1, RU2, RU3, RU4, RU5, RU6, and RU7 are arranged in a preempty manner to fill the entire surface 110 of the abrasive product 100. Polishing product surface 110.

  2.12 Polishing product surface 110 according to item 10 or 11, characterized in that the repeating units RU1, RU2, RU3, RU4, RU5, RU6, RU7 comprise a self-similar or congruent shape.

2.13 area of polishing region 118 is in the range of 0.5~75mm ^2, item total area of the channel portion, characterized in that it is in the range of 20-50% of the total area of the abrasive product 100 The polishing product 100 according to 1.

  2.14 The polishing product 100 according to item 1 or 10, wherein the polishing region 118 has a congruent shape.

  2.15 The polishing product 100 according to Item 10, wherein the polishing layer 111 bonded to the backing layer 101 includes a first channel portion 221, a second channel portion 222, and a plurality of polishing regions 118.

  2.16 Polishing product 100 according to item 1 or 10, characterized in that recessed regions 201, 202, 203 matching the second channel part 222 are provided on the backing layer 101.

  2.17 The positions of the recessed regions 201, 202, and 203 in the backing layer 101 substantially match the position of the second channel portion 222 on the polishing layer 111, and the volume of the second channel portion 202 is increased. Item 15. A polishing product according to Item 16.

  2.18 Polishing layer 111 having an opening 226 extending through the backing layer 101, a maximum opening width w3 equal to the second channel width w2, and an opening length L3 equal to the maximum length L5 of the second channel portion 222; 11. The polishing product 100 according to item 1 or 10, characterized by comprising:

  2.19 Item 2, wherein the second channel portion 222 is arranged to suspend the water, transfer the mixture of water and the polished material, and cool the polishing product surface 110. Polishing product 100.

  2.20 Polishing product 100 according to item 1, comprising a flexible polishing product.

  2.21 Abrasive product 100 according to any one of items 1 to 20, comprising a foam layer 123 attached to the backing layer 101 and moving gas or liquid.

  2.22 The opening 226 contacts the foam layer 123 and moves gas, liquid, or polished material from between the foam layer and the abrasive product surface 110. Polishing product 100.

  2.23 An apparatus 300 including the polishing product 100 according to any one of items 1 to 22.

  2.24 Use of the abrasive product 100 according to any one of items 1 to 22, characterized in that the polished material is moved together with a fluid containing water.

  2.25 Use of the abrasive product 100 according to any one of items 1 to 22 in an apparatus 300 for mechanical polishing.

2.26 A method for obtaining an abrasive product comprising:
Providing a backing layer 101;
-Forming a plurality of polishing regions 118 supported by the backing layer 101;
Each polishing region 118 is surrounded by interconnected channel portions 221, 222 having transverse dimensions td 1, td 2, the channel portions 221, 222 having a first channel portion 221 having a first transverse dimension td 1 and a first transverse dimension. and a second channel portion 222 having a second transverse dimension td2 that is greater than td1.

2.27 The method for obtaining the abrasive product 100 is:
Providing a backing layer 101;
-Forming repeating units RU1, RU2, RU3, RU4, RU5, RU6, RU7 in the polishing region 118 of the backing layer 101;
Opposing repeating units RU1, RU2, RU3, RU4, RU5, RU6, and RU7 have boundaries that form congruent pairs and form complementary pairs, and the repeating units RU1, RU2, RU3, RU4, RU5, RU6, and RU7. Characterized by combining them in a preempty manner.

  2.28 The backing layer 101 includes one or more functional layers 102, 103, 104, 104, 105, 106, 107, 108 formed by die casting, extrusion, co-extrusion, or injection molding. The method according to 26 or 27.

  2.29 The method according to item 26 or 27, further comprising increasing the surface tension of the backing layer 101 by corona treatment.

  2.30. The method according to any one of items 26-29, further comprising applying a friction coating to the second surface 108 of the backing layer 101.

  2.31 The item of any one of items 26-30, further comprising providing a backing layer 101 having recessed regions 201, 202, 203 for moving water or polished material. Method.

  2.32 further including adjusting the position of the recessed regions 201, 202, 203 in the backing layer 101 substantially matching the position of the second channel portion 222, and increasing the volume of the second channel portion 222. 32. A method according to any one of the items 26-31 characterized.

  2.33 further includes forming an opening 226 extending through the backing layer 101, the opening 226 being located in the recessed area 201, 202, 203 and having an opening width w 3 that is equal to or less than the width of the recessed area and the second channel part. 33. A method according to any one of items 26 to 32, comprising a maximum opening length L3 equal to a maximum length L5 of 202.

  2.34 Items 26-33 wherein the backing layer 101 comprises polypropylene homopolymer, polypropylene and ethylene, or a random copolymer of polypropylene and alkene, polypropylene and ethylene, or alternatively a block copolymer of propylene and alkene. The method according to any one of the above.

  2.35 functional layers 102, 103, 104, 104, 105, 106, 107, 108 are high density ethylene copolymer, low density ethylene copolymer, ethylene-butyl acrylate EBA copolymer, ethylene vinyl acetate EVA copolymer, ethylene methyl acrylate EMA copolymer. , Ethylene butyl acrylate EBA copolymer, 2-ethylhexyl acrylate 2EHA copolymer, ethylene acrylic ester terpolymer with acrylic ester type methyl, ethyl, butyl acrylate, ethylene vinyl acetate ter with acrylic ester type methyl, ethyl, or butyl acrylate 35. A method according to any one of items 28 to 34, comprising an adhesion enhancing compound selected from the group consisting of polymers.

  2.36. A method according to any one of items 26-35, further comprising providing a backing layer 101 having a raised region 206.

  2.37 A method according to item 36, wherein the raised region 206 is provided by calendering the surface of the backing layer 101.

  2.38 The method of item 36, wherein the raised region 206 is provided by applying an abrasive coating to the backing layer 101.

  2.39 A method according to item 36, wherein the raised region 206 is provided by calendering the surface of the backing layer 101 and applying an abrasive coating on the calendered backing layer 101 surface. .

  2.40 Abrasive product 100 obtained according to any one of items 26-39.

  4.1 A polishing product 100 including a polishing layer 111 bonded to one surface of a backing layer 101, wherein the backing layer 101 is at least one of functional layers 102, 103, 104, 104, 105, 106, 107, 108. A polishing product 100 comprising two.

  4.2 A polishing product 100 including a backing layer 101 having a first surface 107 and a second surface 108, wherein the polishing layer 111 is bonded to one surface of the backing layer 101 including polypropylene. Polishing product 100.

  4.3 Polishing according to item 2, characterized in that the polypropylene is a polypropylene homopolymer, propylene and ethylene, or a random copolymer of propylene and alkene, propylene and ethylene, or alternatively a block copolymer of propylene and alkene Product 100.

  4.4 The polishing product 100 according to item 2 or 3, wherein the backing layer 101 includes one or more functional layers 102, 103, 104, 104, 105, 106, 107, 108.

  4.5 As described in any one of items 1 to 4, characterized in that it has functional layers 102, 103, 104, 104, 105, 106, 107, 108 comprising copolymers of ethylene containing carboxyl functionality. Polishing product 100.

  4.6 High density ethylene copolymer, low density ethylene copolymer, ethylene-butyl acrylate EBA copolymer, ethylene vinyl acetate EVA copolymer, ethylene methyl acrylate EMA copolymer, ethylene butyl acrylate EBA copolymer, 2-ethylhexyl acrylate 2EHA copolymer, acrylic ester type Characterized in that it comprises an adhesion enhancing compound selected from the group consisting of ethylene acrylate terpolymers that are methyl, ethyl, or butyl acrylate, ethylene vinyl acetate terpolymers where the acrylate type is methyl, ethyl, or butyl acrylate The polishing product 100 according to any one of items 1 to 5.

  4.7 Polishing product 100 according to item 6, characterized in that the adhesion-improving compound is an acid copolymer, sodium ionomer, zinc ionomer or other metal ionomer such as Surlyn ionomer.

  4.8 The polishing product 100 according to any one of items 1 to 7, wherein the backing layer 101 is formed by extrusion, coextrusion, injection molding, or lamination.

  4.9 The polishing product 100 according to any one of items 1 to 8, wherein the backing layer 101 is formed by die casting and reduces the orientation of the backing layer 101 in the longitudinal direction or the lateral direction. .

4.10 Any one of items 1-9, wherein the backing layer 101 comprises a substantially symmetrical tensile strength in the range of 1600-5000 N / mm ^{2 in} both the longitudinal and transverse directions. The abrasive product 100 described.

  4.11 Polishing according to any one of items 1 to 10, characterized in that the backing layer 101 comprises a substantially symmetrical bending strength in the range of 50 to 300 Nm in both the longitudinal and transverse directions. Product 100.

  4.12 The polishing product 100 according to any one of items 1 to 11, wherein the backing layer 101 comprises polypropylene in the range of 20 to 100% of the total polymer weight of the backing layer 101.

  4.13 The abrasive product 100 according to any one of items 1 to 12, wherein the abrasive layer 111 comprises a substantially single layer of abrasive particles 113.

  4.14 The polishing product 100 according to any one of items 1 to 13, wherein the backing layer 101 is waterproofed.

  4.15 In any one of items 1-14, the backing layer 101 includes recessed areas 201, 202, 203 for moving water or polished material from the polishing product surface 110. Polishing product 100.

  4.16 The polishing layer 111 according to any one of items 1 to 15, wherein the polishing layer 111 includes channel portions 221 and 222 for moving water or the polished material from the surface 110 of the polishing product 100. Polishing product 100.

  4.17 Openings 226 that extend through the backing layer 101 and are located on the recessed areas 201, 202, 203, including an opening diameter that is smaller than the amplitude of the polishing apparatus 300. The abrasive product 100 according to any one of 16.

  4.18 Polishing product 100 according to any one of items 1 to 17, which includes a foam layer 123 attached to the backing layer 101 and moves gas or liquid.

  4.19 Abrasive product 100 including an opening 226 extending through backing layer 101, wherein opening 226 has been gas, liquid, or polished between foam layer 123 and abrasive product surface 110. Item 19. Abrasive product 100 according to item 18, characterized in that it is in contact with the foam layer 123 to move the material.

  4.20 An apparatus 300 including the abrasive product 100 according to any one of items 1 to 19.

  4.21 Use of the abrasive product 100 according to any one of items 1 to 19, characterized in that the polished material is moved together with a fluid containing water.

  4.22 Use of the abrasive product 100 according to any one of items 1 to 19 in an apparatus 300 for mechanical polishing.

4.23 providing a backing layer 101 that includes one or more functional layers 102, 103, 104, 104, 105, 106, 107, 108;
Bonding the polishing layer to one surface of the backing layer 101. A method for obtaining an abrasive product 100, comprising:

  24. A method according to item 23, wherein the backing layer 101 is formed by extrusion, coextrusion, injection molding, or lamination.

  4.25. A method according to item 23 or 24, wherein the functional layer 102, 103, 104, 104, 105, 106, 107, 108 comprises a copolymer of ethylene containing carboxyl functionality.

  4.26 The method according to any one of items 23 to 25, further comprising increasing the surface tension of the backing layer 101 by corona, plasma or flame treatment.

  4.27. A method according to any one of items 23 to 26, further comprising applying a friction coating to the second surface 108 of the backing layer 101.

  4.28. Any one of items 23-27, further comprising providing a backing layer 101 having recessed areas 201, 202, 203 for moving water or polished material. Method.

  4.29 Items 23-28 wherein the backing layer 101 comprises polypropylene homopolymer, propylene and ethylene, or a random copolymer of propylene and alkene, propylene and ethylene, or alternatively a block copolymer of propylene and alkene. The method according to any one of the above.

  4.30 Functional layers 102, 103, 104, 104, 105, 106, 107, 108 are high density ethylene copolymer, low density ethylene copolymer, ethylene-butyl acrylate EBA copolymer, ethylene vinyl acetate EVA copolymer, ethylene methyl acrylate EMA copolymer. , Ethylene butyl acrylate EBA copolymer, 2-ethylhexyl acrylate 2EHA copolymer, ethylene acrylate ester terpolymer whose ester type is methyl, ethyl or butyl acrylate, ethylene vinyl acetate whose acrylate type is methyl, ethyl or butyl acrylate 30. A method according to any one of items 23 to 29, comprising an adhesion enhancing compound selected from the group consisting of terpolymers.

5.1 An abrasive product (100) comprising a surface (110) comprising abrasive particles adjacent to a resin (112) and having a plurality of abrasive regions (118) supported by a backing layer (101), each comprising: The polishing region (118) is surrounded by interconnected channel portions (221, 222), the channel portions (221, 222) having a substantially constant transverse dimension along the length of the channel portion ( td1, td2), and the transverse dimension (td1, td2) is height (h1, h2) × width (w1, w2),
The channel portions (221, 222) include a first channel portion (221) having a substantially constant first channel width (w1) and a second channel having a substantially constant second channel width (w2). A polishing product (100), wherein the channel portions (221, 222) have different widths (w1, w2) so as to include a portion (222).

  5.2 Abrasive product (100) comprising two or more levels of channel portions (201, 202) having continuously increasing transverse dimensions.

  5.3 Abrasive product (100) characterized in that the transverse dimension (td1, td2) is substantially constant over the entire channel portion (201, 202).

  5.4 Polishing product (100) characterized in that the length of the channel portion represents the shortest distance between two branch points or intersections of the channel between two polishing regions.

  5.5 The backing layer (101) is extruded, die cast, or injection molded and has a first channel portion (td1) having a first transverse dimension (td1) arranged to improve the flexibility of the abrasive product (100). 221). A polishing product (100) comprising:

  5.6 Polishing product (100) characterized in that the second channel part (222) includes a curved part to avoid linear interference.

  5.7 The second channel portion (222) is less than 2.5 times the amplitude of a polishing apparatus (300) compatible with the polishing product (100), for example, less than 2.5 times 2.5 mm, A polishing product (100) comprising a maximum linear length L5 of less than 2.5 times 5 mm or less than 2.5 times 8 mm.

  5.8 The polishing product (100), wherein the second channel part (222) defines a network (NT1) of interconnected channel parts (221, 222).

  5.9 The network (NT1) of the interconnected channel portions (221, 222) has a repetitive pattern RP1, RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, RP14. A polishing product (100) characterized in that

5.10 Abrasive product surface (110) comprising repeating units (RU1, RU2, RU3, RU4, RU5, RU6, RU7) of polishing regions (118) surrounded by channel portions (221, 222),
Opposite repeating unit (RU1, RU2, RU3, RU4, RU5, RU6, RU7) boundaries have congruent curved portions, form complementary pairs, and repeat units (RU1, RU2, RU3, RU4, RU5) RU6, RU7) are combined in a preemptive manner, the channel part (221, 222) includes a first channel part (221) having a substantially constant first channel width (w1) and a length of the channel part. And a second channel portion (222) having a substantially constant second channel width (w2) along a surface of the abrasive product (110).

  5.11 A plurality of repeating units (RU1, RU2, RU3, RU4, RU5, RU6, RU7) are arranged in a preempty manner to fill the entire surface (110) of the abrasive product (100). Product surface for polishing (110).

  5.12 Polishing Product Surface (110) characterized in that the repeating units (RU1, RU2, RU3, RU4, RU5, RU6, RU7) comprise self-similar or congruent shapes.

Area of 5.13 polishing region (118) is in the range of 0.5~75mm ^2, and wherein the total area of the channel portion is in the range of 20-50% of the total area of the abrasive product 100 Polishing product (100).

  5.14 Polishing product (100), wherein the polishing region (118) has a congruent shape.

  5.15 The polishing layer (111) bonded to the backing layer (101) includes a first channel portion (221), a second channel portion (222), and a plurality of polishing regions (118). Product (100).

  5.16 Polishing product (100), characterized in that recessed regions (201, 202, 203) matching the second channel part (222) are provided on the backing layer (101).

  5.17 The positions of the recessed regions (201, 202, 203) in the backing layer (101) substantially coincide with the positions of the second channel portions (222) on the polishing layer (111), and the second channel portions ( A product for polishing (100), characterized by increasing the volume of 202).

  5.18 Opening (226) extending through backing layer (101), maximum opening width (w3) equal to second channel width (w2) and maximum length (L5) of second channel portion (222) A polishing product (100), comprising a polishing layer (111) having an equal opening length (L3).

  5.19 The second channel portion (222) is arranged to suspend the water, transfer the mixture of water and polished material, and cool the abrasive product surface (110). Polishing product (100).

  5.20 Abrasive product (100) comprising a foam layer (123) attached to a backing layer (101) and moving gas or liquid.

  The 5.21 opening (226) contacts the foam layer (123) and moves gas, liquid, or polished material between the foam layer and the abrasive product surface (110). Polishing product (100).

  5.22 An apparatus (300) comprising the abrasive product (100) according to any one of 5.1 to 5.21 described above.

  5.23 Use of an abrasive product (100) to move the polished material with a fluid containing water.

  5.24 Use of abrasive product (100) in apparatus (300) for mechanical polishing.

5.25 A method for obtaining a polishing product comprising:
Providing a backing layer (101);
Comprising abrasive particles adjacent to the resin (112) and forming a plurality of abrasive regions (118) supported by the backing layer (101);
Each polishing region (118) is surrounded by interconnected channel portions (221, 222), which are substantially constant transverse dimensions (td1, td2) along the channel portions. The transverse dimensions (td1, td2) are height (h1, h2) × width (w1, w2), and the channel portions (221, 222) have a substantially constant first channel width ( The channel portions (221, 222) have different widths to include a first channel portion (221) having w1) and a second channel portion (222) having a substantially constant second channel width (w2). (W1, w2).

5.26 The method for obtaining the abrasive product (100) is:
Providing a backing layer (101);
-Forming repeating units (RU1, RU2, RU3, RU4, RU5, RU6, RU7) of the polishing region (118) surrounded by the channel portions (221, 222) in the backing layer (101),
Opposing repeating unit (RU1, RU2, RU3, RU4, RU5, RU6, RU7) boundaries have congruent curves, form complementary pairs, and repeat units (RU1, RU2, RU3, RU3) in a preemptive manner. RU4, RU5, RU6, RU7), the channel part (221, 222) has a first channel part (221) having a substantially constant first channel width (w1) and a length of the channel part. And a second channel portion (222) having a substantially constant second channel width (w2) along.

  5.27 The backing layer (101) includes one or more functional layers (102, 103, 104, 104, 105, 106, 107, 108) formed by die casting, extrusion, coextrusion, or injection molding. Feature method.

  5.28. A method further comprising increasing the surface tension of the backing layer (101) by corona treatment, plasma treatment, or flame treatment.

  5.29. The method further comprising applying a friction coating to the second side (108) of the backing layer (101).

  5.30. A method further comprising providing a backing layer (101) having recessed areas (201, 202, 203) for moving water or polished material.

  5.31 Adjusting the position of the recessed regions (201, 202, 203) in the backing layer (101) substantially corresponding to the position of the second channel portion (222), the volume of the second channel portion (222) is adjusted. The method further comprising increasing.

  5.32 further comprising forming an opening (226) extending through the backing layer (101), wherein the opening (226) is located in the recessed area (201, 202, 203) and is less than or equal to the width of the recessed area A method comprising: an opening width (w3) and a maximum opening length (L3) equal to a maximum length (L5) of the second channel portion (202).

  5.33 The method wherein the backing layer (101) comprises polypropylene homopolymer, polypropylene and ethylene, or a random copolymer of polypropylene and alkene, polypropylene and ethylene, or alternatively a block copolymer of propylene and alkene.

  5.34 functional layers (102, 103, 104, 104, 105, 106, 107, 108) are high density ethylene copolymer, low density ethylene copolymer, ethylene-butyl acrylate (EBA) copolymer, ethylene vinyl acetate (EVA) copolymer , Ethylene methyl acrylate (EMA) copolymer, ethylene butyl acrylate (EBA) copolymer, 2-ethylhexyl acrylate 2 (EHA) copolymer, ethylene acrylic ester terpolymer whose acrylic ester type is methyl, ethyl, butyl acrylate, acrylic ester type A method comprising an adhesion enhancing compound selected from the group consisting of ethylene vinyl acetate terpolymers that are methyl, ethyl, or butyl acrylate.

  5.35. The method further comprising providing a backing layer (101) having a raised region (206).

  5.36 The raised region (206) is provided by calendering the surface of the backing layer (101).

  5.37 Method wherein the raised region (206) is provided by applying an abrasive coating to the backing layer (101).

  5.38 The raised region (206) is provided by calendering the surface of the backing layer (101) and applying an abrasive coating on the calendered backing layer (101) surface. Method.

  Polishing product (100) obtained according to any of the above 5.25 to 5.38.

Claims (31)

A flexible abrasive product (100) comprising a surface (110) comprising abrasive particles adjacent to a resin (112) and having a plurality of abrasive regions (118) supported by a backing layer (101), each abrasive Region (118) is surrounded by interconnected channel portions (221, 222), which have substantially constant transverse dimensions (td1) along the length of the channel portions. , Td2), and the transverse dimension (td1, td2) is height (h1, h2) × width (w1, w2),
The channel portions (221, 222) include a first channel portion (221) having a substantially constant first channel width (w1) and a second channel having a substantially constant second channel width (w2). The channel portions (221, 222) have different widths (w1, w2) to include the portion (222),
The flexible polishing product (100), wherein the second channel portion (222) includes a curved portion to avoid linear interference. See contains two or more channel portions (221, 222), transverse dimensions of each channel portion, the abrasive product (100) according to claim 1, characterized in that gradually increases from the first channel section.   3. Abrasive product (100) according to claim 1 or 2, characterized in that the transverse dimension (td1, td2) is substantially constant over the entire channel part (221, 222).   The length of the channel portion represents the shortest distance between two branch points or intersections of a channel between two polishing regions. Product (100).   The backing layer (101) is extruded, die cast, or injection molded and includes a first channel portion (221) having a first transverse dimension (td1) arranged to improve the flexibility of the abrasive product (100). The polishing product (100) according to any one of claims 1 to 4, characterized by comprising. The polishing product according to any one of claims 1 to 5 , wherein the second channel part (222) defines a network (NT1) of interconnected channel parts (221, 222). (100). The network (NT1) of the interconnected channel portions (221, 222) defines the repetitive patterns RP1, RP2, RP3, RP4, RP5, RP6, RP7, RP8, RP9, RP10, RP11, RP12, RP13, RP14. A polishing product (100) according to claim 6 characterized in that. Area of the polishing region (118) is in the range of 0.5~75mm ^2, the total area of the channel portion, characterized in that in the range of 20-50% of the total area of the abrasive product (100) The abrasive product (100) according to claim 1.   A polishing product (100) according to claim 1, characterized in that a recessed area (201, 202, 203) adapted to the second channel part (222) is provided on the backing layer (101). The positions of the depression regions (201, 202, 203) in the backing layer (101) substantially coincide with the positions of the second channel portions (222) on the polishing layer (111), and the second channel portions (202) The polishing product according to claim 9 , wherein the volume is increased.   An opening (226) extending through the backing layer (101), a maximum opening width (w3) equal to the second channel width (w2), and an opening length equal to the maximum length (L5) of the second channel part (222) A polishing product (100) according to claim 1, comprising a polishing layer (111) having a thickness (L3).   The second channel portion (222) is arranged to suspend water, transfer a mixture of water and polished material, and cool the abrasive product surface (110). A polishing product (100) according to 1. The polishing product (100) according to any one of claims 1 to 12 , characterized in that it comprises a foam layer (123) attached to the backing layer (101) and moves gas or liquid. The opening (226) contacts the foam layer (123) and moves gas, liquid, or polished material from between the foam layer and the abrasive product surface (110). Item 14. A polishing product (100) according to Item 13 . Device characterized in that it comprises a product (100) for polishing according to any one of claims 1-14 (300). Use of the abrasive product (100) according to any one of claims 1 to 14 , wherein the polished material is moved by a fluid comprising water. Use of the abrasive product (100) according to any one of claims 1 to 14 in an apparatus (300) for mechanical polishing. A method for obtaining a flexible abrasive product,
Providing a backing layer (101);
Comprising abrasive particles adjacent to the resin (112) and forming a plurality of abrasive regions (118) supported by the backing layer (101);
Each polishing region (118) is surrounded by interconnected channel portions (221, 222), which are substantially constant transverse dimensions (td1, td2) along the channel portions. The transverse dimensions (td1, td2) are height (h1, h2) × width (w1, w2), and the channel portions (221, 222) have a substantially constant first channel width ( The channel portions (221, 222) have different widths to include a first channel portion (221) having w1) and a second channel portion (222) having a substantially constant second channel width (w2). (W1, w2). The backing layer (101) includes one or more functional layers (102, 103, 104, 104, 105, 106, 107, 108) formed by die casting, extrusion, co-extrusion, or injection molding. The method of claim 18 . 20. A method according to claim 18 or 19 , further comprising increasing the surface tension of the backing layer (101) by corona treatment, plasma treatment or flame treatment. 21. A method according to any one of claims 18 to 20 , further comprising applying a friction coating to the second surface (108) of the backing layer (101). 22. The method according to any one of claims 18 to 21 , further comprising providing a backing layer (101) having a recessed region (201, 202, 203) for moving water or polished material. The method described. Adjusting the position of the recessed regions (201, 202, 203) in the backing layer (101), which substantially matches the position of the second channel portion (222), and increasing the volume of the second channel portion (222). The method according to any one of claims 18 to 22 , further comprising: The method further includes forming an opening (226) extending through the backing layer (101), the opening (226) being located in the recessed area (201, 202, 203) and having an opening width ( 24. A method according to any one of claims 18 to 23 , comprising w3) and a maximum opening length (L3) equal to the maximum length (L5) of the second channel part (202). Backing layer (101), polypropylene homopolymer, polypropylene and ethylene or polypropylene and alkene random copolymer, polypropylene and ethylene or alternatively of claims 18 to 24, characterized in that it comprises a block copolymer of propylene and an alkene, The method according to any one of the above. The functional layer (102, 103, 104, 104, 105, 106, 107, 108) is composed of high density ethylene copolymer, low density ethylene copolymer, ethylene-butyl acrylate (EBA) copolymer, ethylene vinyl acetate (EVA) copolymer, ethylene methyl. Acrylate (EMA) copolymer, ethylene butyl acrylate (EBA) copolymer, 2-ethylhexyl acrylate (2EHA) copolymer, ethylene acrylic ester terpolymer whose acrylic ester type is methyl, ethyl or butyl acrylate, acrylic acid ester type is methyl, ethyl , or claim 18-25 noise, which comprises an adhesive enhancing compound selected from the group consisting of ethylene vinyl acetate terpolymer butyl acrylate The method according to any one of claims. 27. A method according to any one of claims 18 to 26 , further comprising providing a backing layer (101) having a raised region (206). 28. Method according to claim 27 , characterized in that the raised area (206) is provided by calendering the surface of the backing layer (101). 28. The method of claim 27 , wherein the raised area (206) is provided by applying an abrasive coating to the backing layer (101). Raised areas (206), according to claim 27 in which the surface of the backing layer (101) and calendered, characterized in that it is provided by applying an abrasive coating calendered backing layer (101) on the surface The method described in 1. Abrasive product obtainable according to any one of claims 18-30 (100).