JP6386370B2 - Laminated structure, photocurable composition, and method for producing laminated structure - Google Patents

Description

  The present invention relates to a laminated structure, a photocurable composition, and a method for producing the laminated structure.

  Adhesives are widely used in daily production of household materials and in the production of materials and components related in the fields of optics, electricity, electronics, medicine, etc., and are lacking in making structures. It is a material that cannot be done. The adhesives are classified according to the curing method: solvent volatile type, moisture curable type, heat curable type, hardener mixed type, anaerobic curable type, light irradiation curable type, heat melting type, pressure sensitive type, rewet type, etc. Can do. Among them, a widely used adhesive is a light irradiation curable adhesive that cures a photocurable composition with ultraviolet rays. Light-curing type adhesives have the limitation that the light-irradiated surface must transmit light, but usually they do not require heating or application of high pressure, so they are highly adaptable to the process, In addition, many compounds can be synthesized as photo-curable compounds, and they are widely used for a wide range of applications according to various substrates.

  However, the light irradiation curable adhesive has an unavoidable problem of curing shrinkage at the time of photocuring, which may cause warping of the bonded structure and generation of distortion, peeling, cracking, optical distortion, and the like. In many cases, it is known that curing shrinkage occurs when a monomer is converted into a polymer, and the monomer is shrunk by being bonded via a covalent bond through a polymerization chain (for example, Non-Patent Document 1). .

  As an attempt to reduce curing shrinkage when using a photocurable compound as an adhesive, a method of reducing the concentration of a polymerizable group, a method of adding a non-reactive compound (Patent Document 1, Patent Document 2), a curing rate A method for lowering the pH, a method using a ring-opening polymerizable compound, and the like have been studied.

For example, regarding a method for reducing the concentration of a polymerizable group, Patent Document 3 discloses that a photocurable composition containing a (meth) acrylic ester has a structure having an adhesive as a material when the acrylic equivalent is less than 280. It is disclosed that since the influence of curing shrinkage appears remarkably, the structure is warped, and when it is larger than 280, the influence accompanying the curing shrinkage can be kept low.
However, since this method lowers the concentration of the polymerizable group itself, it takes time to cure, leaving a problem from the viewpoint of process efficiency.

  In addition, as a method of adding a non-reactive compound, a method of adding an inorganic material containing metal fine particles and a filler and a method of adding an organic material containing a polymer and an oligomer are known. However, inorganic materials have problems such as the opaqueness of structures and the smoothness of the cured product (adhesive layer) surface due to the aggregation of fine metal particles, and their use is limited to some applications such as paint. In the case of organic materials, there is a case where the material design is narrow due to the problem of solubility with the photo-curable monomer or the compatibility between the cured product and the additive, resulting in cracks, cracks, etc. after curing. Depending on the case, the transparency or adhesion of the cured product or the structure containing them may be reduced.

  Further, the method of reducing the curing rate is a method of suppressing the shrinkage of the curing by suppressing the amount of polymerization heat generated during curing and reducing the stress shrinkage accompanying the cooling after curing. Even if it is suppressed, the cure shrinkage cannot be essentially reduced to zero, and it must be cured under mild conditions, which may deteriorate the productivity when mounted in a process.

  With respect to a method using a ring-opening polymerizable compound, it is conventionally known that the curing shrinkage of a monomer having an epoxy group of a cationic curing material is relatively small. However, generally, an epoxy-based cured product is brittle. For example, when used as an adhesive, if the cured structure is deformed, the structure may be cracked or cracked. Recently, a material having a cationically cured oxetanyl group that compensates for the brittleness of an epoxy-based cured product and suppresses curing shrinkage has been developed (Patent Document 4), but may be required depending on the field in which the structure is used. However, the warping and distortion of the structure have not been solved sufficiently.

T.A. Takata Prog. Polym. Sci. Vol.18,839,1993

JP-A-2-53850 JP 2002-30105 A JP 2010-157295 A JP 2005-120192 A

In the present invention, an adhesive layer for bonding two substrates composed of an inorganic material and / or an organic material is difficult to cure and shrink in the photo-curing process, thereby suppressing a dimensional change as a whole. The object is to provide a structure.
In addition, it is an object of the present invention to provide a photocurable composition that suppresses dimensional change, has good accuracy as a thickness, and adheres a substrate.

  The present invention is shown below.

(1) A first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, the first base material, and the second base material A laminated structure comprising an adhesive layer to be bonded,
The adhesive layer comprises a photocurable compound (A), a photocuring initiator (B), a fluorine-containing polymer (C) having a structural unit represented by the following general formula (1), and a solvent that is not photocured by itself ( D), the mass ratio (A) / (C) is in the range of 95/5 to 5/95, and the mass ratio [(A) + (C)] / (D) is 80/20 to A laminated structure formed by curing a photocurable composition that is 5/95.

（式（１）中、Ｒ^１〜Ｒ^４は、フッ素、フッ素を含有する炭素数１〜１０のアルキル基、フッ素を含有する炭素数１〜１０のアルコキシ基、またはフッ素を含有する炭素数２〜１０のアルコキシアルキル基のいずれかである。Ｒ^１〜Ｒ^４は互いに同一であっても異なっていてもよい。Ｒ^１〜Ｒ^４は互いに結合して環構造を形成していてもよく、ＸはＣＨ_２またはＯから選ばれる。）

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.)

(2) A first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, the first base material, and the second base material A laminated structure comprising an adhesive layer to be bonded,
The adhesive layer contains a photocurable compound (A), a photocuring initiator (B), and a fluorine-containing polymer (C) having a structural unit represented by the following general formula (1), and a mass ratio (A ) / (C) is a laminated structure formed by curing a photocurable composition having a range of 95/5 to 25/75.

（式（１）中、Ｒ^１〜Ｒ^４は、フッ素、フッ素を含有する炭素数１〜１０のアルキル基、フッ素を含有する炭素数１〜１０のアルコキシ基、またはフッ素を含有する炭素数２〜１０のアルコキシアルキル基のいずれかである。Ｒ^１〜Ｒ^４は互いに同一であっても異なっていてもよい。Ｒ^１〜Ｒ^４は互いに結合して環構造を形成していてもよく、ＸはＣＨ_２またはＯから選ばれる。）

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.)

(3) The laminated structure according to (1) or (2),
The first substrate is a film having an uneven structure on the surface, and the back surface of the film is in contact with the adhesive layer.

(4) The laminated structure according to (1) or (2), wherein the photocurable compound (A) is a cationically polymerizable ring-opening polymerizable compound.

(5) A photocurable compound (A), a photocuring initiator (B), a fluorine-containing polymer (C) having a structural unit represented by the following general formula (1), and a solvent (D) that does not photocure itself And the mass ratio (A) / (C) is in the range of 95/5 to 5/95, and the mass ratio [(A) + (C)] / (D) is 80/20 to 5 / A photocurable composition that is 95.

（式（１）中、Ｒ^１〜Ｒ^４は、フッ素、フッ素を含有する炭素数１〜１０のアルキル基、フッ素を含有する炭素数１〜１０のアルコキシ基、またはフッ素を含有する炭素数２〜１０のアルコキシアルキル基のいずれかである。Ｒ^１〜Ｒ^４は互いに同一であっても異なっていてもよい。Ｒ^１〜Ｒ^４は互いに結合して環構造を形成していてもよく、ＸはＣＨ_２またはＯから選ばれる。）

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.)

(6) Contains a photocurable compound (A), a photocuring initiator (B), and a fluorine-containing polymer (C) having a structural unit represented by the following general formula (1), and a mass ratio (A) / (C) The photocurable composition whose range is 95/5-25/75.

（式（１）中、Ｒ^１〜Ｒ^４は、フッ素、フッ素を含有する炭素数１〜１０のアルキル基、フッ素を含有する炭素数１〜１０のアルコキシ基、またはフッ素を含有する炭素数２〜１０のアルコキシアルキル基のいずれかである。Ｒ^１〜Ｒ^４は互いに同一であっても異なっていてもよい。Ｒ^１〜Ｒ^４は互いに結合して環構造を形成していてもよく、ＸはＣＨ_２またはＯから選ばれる。）

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.)

(7) The photocurable composition according to (6), which does not substantially contain a solvent (D) that is not photocured.

(8) The photocurable composition according to any one of (5) to (7), wherein the photocurable compound (A) is a cationically polymerizable ring-opening polymerizable compound.

(9) The photocurable composition according to any one of (5) to (7), wherein the light transmittance at 300 nm during light irradiation is 50% / μm or more.

(10) The photocurable composition according to any one of (5) to (7), wherein the shrinkage after photocuring is 0 to 4%.

(11) A first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, the first base material, and the second base material A method for manufacturing a laminated structure including an adhesive layer to be bonded,
At least one of the first base material and the second base material provided in the laminated structure is a light-transmitting base material,
The manufacturing method of the laminated structure is as follows:
An application step of applying the photocurable composition according to (5) to at least one surface of the first substrate and the second substrate;
Heating the substrate coated with the photocurable composition to evaporate the solvent;
A laminating step of bonding the first base material and the second base material through the surface coated with the photocurable composition;
A light irradiation step of irradiating light through the substrate having the light transmission property;
The manufacturing method of a laminated structure characterized by including.

(12) A first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, the first base material, and the second base material A method for manufacturing a laminated structure including an adhesive layer to be bonded,
At least one of the first base material and the second base material provided in the laminated structure is a light-transmitting base material,
The manufacturing method of the laminated structure is as follows:
An application step of applying the photocurable composition according to (6) or (7) to at least one surface of the first substrate and the second substrate;
A laminating step of bonding the first base material and the second base material through the surface coated with the photocurable composition;
A light irradiation step of irradiating light through the substrate having the light transmission property;
The manufacturing method of a laminated structure characterized by including.

In the present invention, since the adhesive layer in the laminated structure is formed using a photocurable composition comprising a photocurable compound, a photocuring initiator, and a specific fluorine-containing polymer, photocuring in the photocuring process. The curing shrinkage of the adhesive composition can be suppressed. Therefore, the dimensional change as the whole laminated structure can be suppressed.
In addition, according to the present invention, it is possible to provide a photocurable composition that does not cause curing shrinkage of the photocuring process, suppresses a dimensional change of the laminated structure that has been adhered, and can adhere a substrate with high thickness accuracy. it can. By using this, a laminated structure of a film having a concavo-convex structure or a smooth film can be stably provided.

It is a schematic cross section of the laminated structure according to the embodiment.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings as appropriate. In the present specification, “to” represents the following unless otherwise specified.

[Laminated structure]
First, the laminated structure according to the present embodiment will be described with reference to FIG.
The laminated structure 100 of the present embodiment includes a first base material 11 and a second base material 12, and an adhesive layer 13 that bonds these base materials.

The first base material 11 and the second base material 12 are each composed of an inorganic material or an organic material.
Examples of the inorganic material include inorganic materials such as glass, quartz, aluminum, nickel, iron, copper, silver, gold, stainless steel, germanium, titanium, silicon, alumina, and semiconductor.
Examples of organic materials include polyimide, polyamide, polyester, polycarbonate, polyphenylene ether, polyphenylene sulfide, polyacrylate, polymethacrylate, polyarylate, epoxy resin, silicone resin, polyolefin, polycyclic olefin, cellulose resin, and fluorine resin. And organic materials such as Moreover, the molded object which consists of a fluorine-containing polymer mentioned later or a photocurable composition is also employable as a base material.
Furthermore, these substrates are subjected to easy adhesion treatment by physical or chemical surface treatments such as corona treatment, plasma treatment, UV treatment, primer treatment, etching treatment for the purpose of improving adhesion. Also good.
In addition, the laminated structure 100 of this embodiment irradiates light through the base material in any one of the 1st base material 11 or the 2nd base material 12, and cures the photocurable composition mentioned later. Thus, the adhesive layer 12 is formed.
Therefore, a light-transmitting substrate is usually used as either the first substrate 11 or the second substrate 12.

In addition, in FIG. 1, although the laminated structure 100 which consists only of three layers of the 1st base material 11, the 2nd base material 12, and the contact bonding layer 13 was illustrated, in this invention, layers other than this are provided. You can also.
For example, the photocurable composition mentioned later can be apply | coated to the upper surface of the 1st base material 11, and another base material can be provided on the application layer of this photocurable resin composition, and the number of lamination | stacking can also be increased.
The photocurable composition may be applied to one substrate or both substrates, and the same or different adhesives may be used when applying to both substrates. The base material for increasing the number of layers may be the same or different from that used in the laminated structure 100 of this embodiment.
The structure laminated by such a method is not limited as long as either one of the base materials transmits light and a photocuring reaction occurs, and the same or different materials can be used regardless of whether the materials are inorganic or organic. May be used in combination.

Moreover, the laminated structure 100 of this embodiment is good also as a structure which uses the film which has an uneven | corrugated structure on the surface as the 1st base material 11, and the back surface contacts the contact bonding layer 13. FIG.
Alternatively, a film having an uneven structure on both surfaces of the first base material 11 and the second base material 12 may be used, and a surface having an uneven structure may be in contact with the adhesive layer 13.
The size of the concavo-convex structure is obtained by shaping a pattern of 40 nm to 5000 μm, and the shape is not particularly limited. Here, the concavo-convex structure may be formed by various methods such as screen printing, embossing, submicron imprint, and nanoimprint.
In particular, when forming a concavo-convex structure by an imprint method, a resin such as a photocurable resin, a thermoplastic resin, or a polymer varnish is applied to various patterns of a mold made of quartz, silicon, nickel, resist, etc. The concavo-convex structure is formed by a method suitable for each. A film having this concavo-convex structure on the surface can be bonded to the second substrate 12 with a photocurable composition to be described later to form a laminated structure 100. The first substrate 11 and the second substrate The laminated structure 100 can also be formed by adhering a film having an uneven structure on both surfaces.

[Photocurable composition]
Specifically, the following types of compositions can be used as the photocurable composition of the present embodiment.
(1) A photocurable compound (A), a photocuring initiator (B), a specific fluorine-containing polymer (C), and a solvent (D) that is not photocured by itself, and a mass ratio (A) / (C ) Is in the range of 95/5 to 5/95, and the mass ratio [(A) + (C)] / (D) is 80/20 to 5/95. .
(2) A photocurable compound (A), a photocuring initiator (B) and a specific fluorine-containing polymer (C) are contained, and the mass ratio (A) / (C) is 95/5 to 25/75. A photocurable composition that is substantially free of solvents that are in the range and preferably not photocured themselves.

Usually, the warp and distortion of the substrate that occur when a laminated structure is produced using the photocurable composition as an adhesive layer are caused by curing shrinkage of the photocurable compound during light irradiation curing.
Specifically, in a radical polymerization type photocurable composition in which a monomer having a reactive double bond is cured by light irradiation, the degree of cure shrinkage is large, and the volume change rate before and after cure is 10 as an index of shrinkage. % Cure shrinkage occurs. Therefore, a photo-curable composition of a cationic polymerization system of an epoxy or oxetane compound in which a curing reaction proceeds by ring-opening polymerization of an oxygen-containing cyclic site is used. When such a photo-curable composition is used Even in the case of an epoxy compound that cures by a three-membered ring-opening reaction, the cure shrinkage is less than 10%, and in the case of an oxetane compound that cures by a four-membered ring-opening reaction, it is 5%. Degree.

On the other hand, in the photocurable composition of this embodiment, the shrinkage rate after photocuring can be controlled to 0 to 4% by appropriately adjusting the composition.
Moreover, the shrinkage | contraction rate after hardening can be 0 to 3% preferably by adjusting a mixing | blending appropriately, More preferably, it can be 0 to 1%.
That is, due to an unprecedented low shrinkage rate, a laminated structure that has been warped and distorted in the past can be provided as a laminated structure without warping and distorted.

Furthermore, the photocurable composition of this embodiment contains a photocurable compound (A), a photocuring initiator (B) and a specific fluorine-containing polymer (C), and a mass ratio (A) / ( A solventless photocurable composition having C) in the range of 95/5 to 25/75 may be used.
Thereby, in the manufacturing method of the laminated structure mentioned later, a drying process is not required, a process can be simplified and the laminated structure which controlled the shrinkage rate after photocuring to 0 to 4% can be obtained.
Moreover, the shrinkage | contraction rate after hardening can be 0 to 3% preferably by adjusting a mixing | blending appropriately, More preferably, it can be 0 to 1%.

Moreover, the photocurable composition of this embodiment is excellent in light transmittance, and the light transmittance of 300 nm at the time of light irradiation per 1 μm thickness can be 50% / μm or more. Furthermore, the light transmittance at 300 nm of the photocurable composition upon light irradiation per 1 μm thickness is more preferably 60% / μm or more, and further preferably 70% / μm or more.
This “% / μm” is the transmittance per 1 μm thickness of the adhesive layer at a wavelength of 300 nm when irradiated with light.

The mass ratio (A) / (C) of the photocurable compound (A) and the fluorine-containing polymer (C) is 95 when the photocurable composition in this embodiment contains a solvent (D) that does not cure itself. / 5 to 5/95, preferably 90/10 to 10/90, and more preferably 85/15 to 10/90. Moreover, mass ratio [(A) + (C)] / (D) is 80 / 20-5 / 95, it is preferable that it is 75 / 25-5 / 95, and it is 70 / 30-5 / 95. It is more preferable. By setting to such a range, the shrinkage rate after curing can be effectively reduced, and the light transmittance can be improved.
Further, when the solvent (D) is not contained, the photocurable composition in the present embodiment has a mass ratio (A) / (C) of the photocurable compound (A) to the fluorine-containing polymer (C) of 95 / It is 5-25 / 75, it is preferable that it is 92 / 8-28 / 72, and it is more preferable that it is 90 / 10-30 / 70. By setting to such a range, the same effect as the case where the photocurable composition containing the solvent which does not cure itself is used can be obtained.

  Specifically, the photocurable compound (A), the photocuring initiator (B) and the fluorine-containing polymer (C) contained in the photocurable composition of the present embodiment are shown below.

<Photocurable compound (A)>
The photocurable compound (A) can be appropriately selected from known photocurable compounds. However, the photocurable compound (A) can be appropriately selected from the suppression of deformation of the base material caused by curing shrinkage after curing, and the phase with the fluorine-containing polymer (C). From the viewpoint of solubility, a ring-opening polymerizable compound capable of cationic polymerization is preferably selected.

  The ring-opening polymerizable compound capable of cationic polymerization may have one reactive group or a plurality of reactive groups in one molecule. Moreover, you may use for a photocurable compound (A), mixing the compound of a different reactive group number in arbitrary ratios. With these, in the form after light irradiation curing when the photocurable composition of the present embodiment is used as an adhesive, the light transmission is good, the laminated structure is not warped, distortion is not caused, and the dimensional accuracy is strong and strong. The substrate can be glued.

  Among the photocurable compounds (A), examples of the ring-opening polymerizable compound capable of cationic polymerization include, for example, cyclohexene epoxide, dicyclopentadiene oxide, limonene dioxide, 4-vinylcyclohexene dioxide, and 3,4-epoxycyclohexylmethyl. -3 ′, 4′-epoxycyclohexanecarboxylate, di (3,4-epoxycyclohexyl) adipate, (3,4-epoxycyclohexyl) methyl alcohol, (3,4-epoxy-6-methylcyclohexyl) methyl-3, 4-epoxy-6-methylcyclohexanecarboxylate, ethylene-1,2-di (3,4-epoxycyclohexanecarboxylic acid) ester, 1-tert-butoxy-2,3-epoxypropane, (3,4-epoxycyclohexyl) ) Ethylt Methoxysilane, phenyl glycidyl ether, dicyclohexyl-3,3'-diepoxide, 1,7-octadiene diepoxide, bisphenol A type epoxy resin, halogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, o-, m- P-cresol novolak type epoxy resin, phenol novolak type epoxy resin, polyglycidyl ether of polyhydric alcohol, 3,4-epoxycyclohexenylmethyl-3 ', 4'-epoxycyclohexenecarboxylate, or water Examples thereof include epoxy compounds such as glycidyl ether of bisphenol A added. Further, 3-methyl-3- (butoxymethyl) oxetane, 3-methyl-3- (pentyloxymethyl) oxetane, 3-methyl-3- (hexyloxymethyl) oxetane, 3-methyl-3- (2-ethyl) Hexyloxymethyl) oxetane, 3-methyl-3- (octyloxymethyl) oxetane, 3-methyl-3- (decanyloxymethyl) oxetane, 3-methyl-3- (dodecanyloxymethyl) oxetane, 3-methyl -3- (phenoxymethyl) oxetane, 3-ethyl-3- (butoxymethyl) oxetane, 3-ethyl-3- (pentyloxymethyl) oxetane, 3-ethyl-3- (hexyloxymethyl) oxetane, 3-ethyl -3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3- (octyloxymethyl) oxeta 3-ethyl-3- (decanyloxymethyl) oxetane, 3-ethyl-3- (dodecanyloxymethyl) oxetane, 3- (cyclohexyloxymethyl) oxetane, 3-methyl-3- (cyclohexyloxymethyl) oxetane 3-ethyl-3- (cyclohexyloxymethyl) oxetane, 3-ethyl-3- (phenoxymethyl) oxetane, 3,3-dimethyloxetane, 3-hydroxymethyloxetane, 3-methyl-3-hydroxymethyloxetane, 3 -Ethyl-3-hydroxymethyloxetane, 3-ethyl-3-phenoxymethyloxetane, 3-n-propyl-3-hydroxymethyloxetane, 3-isopropyl-3-hydroxymethyloxetane, 3-n-butyl-3-hydroxy Methyl oxetane, 3-isobutyl- -Hydroxymethyloxetane, 3-sec-butyl-3-hydroxymethyloxetane, 3-tert-butyl-3-hydroxymethyloxetane, 3-ethyl-3- (2-ethylhexyl) oxetane, 3-ethyl-3- (hexyl) Examples of compounds having two or more oxetanyl groups include bis (3-ethyl-3-oxetanylmethyl) ether, 1,2-bis [(3-ethyl-3-oxetanylmethoxy)] ethane, , 3-bis [(3-ethyl-3-oxetanylmethoxy)] propane, 1,3-bis [(3-ethyl-3-oxetanylmethoxy)]-2,2-dimethyl-propane, 1,4-bis ( 3-ethyl-3-oxetanylmethoxy) butane, 1,6-bis (3-ethyl-3-oxetanylmethoxy) ) Hexane, 1,4-bis [(3-methyl-3-oxetanyl) methoxy] benzene, 1,3-bis [(3-methyl-3-oxetanyl) methoxy] benzene, 1,4-bis {[(3 -Methyl-3-oxetanyl) methoxy] methyl} benzene, 1,4-bis {[(3-methyl-3-oxetanyl) methoxy] methyl} cyclohexane, 4,4'-bis {[(3-methyl-3- Oxetanyl) methoxy] methyl} biphenyl, 4,4′-bis {[(3-methyl-3-oxetanyl) methoxy] methyl} bicyclohexane, 2,3-bis [(3-methyl-3-oxetanyl) methoxy] bicyclo [2.2.1] heptane, 2,5-bis [(3-methyl-3-oxetanyl) methoxy] bicyclo [2.2.1] heptane, 2,6-bis [(3-methyl Ru-3-oxetanyl) methoxy] bicyclo [2.2.1] heptane, 1,4-bis [(3-ethyl-3-oxetanyl) methoxy] benzene, 1,3-bis [(3-ethyl-3- Oxetanyl) methoxy] benzene, 1,4-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} benzene, 1,4-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} cyclohexane, 4,4′-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} biphenyl, 4,4′-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} bicyclohexane, 2,3 -Bis [(3-ethyl-3-oxetanyl) methoxy] bicyclo [2.2.1] heptane, 2,5-bis [(3-ethyl-3-oxetanyl) methoxy] bisi B [2.2.1] heptane, 2,6-bis [(3-ethyl-3-oxetanyl) methoxy] bicyclo [2.2.1] heptane, 3-ethyl-3 {[(3-ethyloxetane- And oxetane compounds such as 3-yl) methoxy] methyl} oxetane. These may be used alone or in combination of two or more.

<Photocuring initiator (B)>
Examples of the photocuring initiator (photopolymerization initiator) (B) include a photocationic initiator that generates cations by light irradiation. It is preferable that the usage-amount of a photocuring initiator (B) is 0.05 mass part or more with respect to 100 mass parts of photocurable compounds (A), and it is more preferable that it is 0.1-10 mass parts. .

  Among the photocuring initiators (B), examples of the photocationic initiator that generates cations by light irradiation include compounds that initiate cationic polymerization of the above-described cationically polymerizable ring-opening polymerizable compound by light irradiation. However, for example, a compound that reacts with light and releases a Lewis acid is preferable, such as an onium salt with an anion paired with an onium cation.

  Specific examples of the onium cation include diphenyliodonium, 4-methoxydiphenyliodonium, bis (4-methylphenyl) iodonium, bis (4-tert-butylphenyl) iodonium, bis (dodecylphenyl) iodonium, triphenylsulfonium, diphenyl -4-thiophenoxyphenylsulfonium, bis [4- (diphenylsulfonio) -phenyl] sulfide, bis [4- (di (4- (2-hydroxyethyl) phenyl) sulfonio) -phenyl] sulfide, η5-2 , 4- (cyclopentagenyl) [1,2,3,4,5,6-η- (methylethyl) benzene] -iron (1+) and the like. These cations may be used alone or in combination of two or more.

  On the other hand, specific examples of anions include tetrafluoroborate, hexafluorophosphate, hexafluoroantimonate, hexafluoroarsenate, hexachloroantimonate, tetra (fluorophenyl) borate, tetra (difluorophenyl) borate, tetra (trifluoro). Phenyl) borate, tetra (tetrafluorophenyl) borate, tetra (pentafluorophenyl) borate, tetra (perfluorophenyl) borate, tetra (trifluoromethylphenyl) borate, tetra (di (trifluoromethyl) phenyl) borate and the like It is done. Moreover, these anions may be used independently or may be used in combination of 2 or more types. Furthermore, an acid generator such as perchlorate ion, trifluoromethanesulfonate ion, toluenesulfonate ion, trinitrotoluenesulfonate ion, or the like may be used in combination.

  Furthermore, specific examples of the photocation initiator preferably used include, for example, Irgacure 250 (manufactured by Ciba Specialty Chemicals), Irgacure 290 (manufactured by BASF), Irgacure 784 (Ciba Specialty Chemicals). Esacure 1064 (Lamberti), WPI-124 (Wako Pure Chemical Industries), CYRAURE UVI 6990 (Union Carbide Japan), CPI-100P (San Apro), PHOTO INITIATOR 2074 (Solvay) Japan)), Adeka optomer SP-172 (Asahi Denka), Adeka optomer SP-170 (Asahi Denka), Adeka optomer SP-152 (Asahi Denka), Adeka optomer SP-150 (Made by Asahi Denka Co., Ltd.). These photocationic initiators may be used alone or in combination of two or more.

  The photocurable compound (A) and the photocuring initiator (B) can be used as a photocurable mixture containing them. Such a mixture can be obtained by dissolving the photocuring initiator (B) in the photocurable compound (A), and both the photocurable compound (A) and the photocuring initiator (B) are organic. It can also be obtained by dissolving in a solvent. Furthermore, other known components as a third component as required, for example, anti-aging agents, leveling agents, wettability improvers, surfactants, modifiers such as plasticizers, ultraviolet absorbers, preservatives, antibacterial agents You may add stabilizers, such as an agent, a photosensitizer, a silane coupling agent.

<Fluorine-containing polymer (C)>
The fluorine-containing polymer contains a structural unit represented by the following general formula (1). In this embodiment, by using a photocurable composition containing this fluorine-containing polymer in a specific ratio as an adhesive, it is possible to suppress the occurrence of warpage and distortion and to produce a laminated structure with high dimensional accuracy. it can.

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.)

In the general formula (1), R ^{1 to} R ⁴ are fluorine, fluoromethyl group, difluoromethyl group, trifluoromethyl group, trifluoroethyl group, pentafluoroethyl group, heptafluoropropyl group, hexafluoroisopropyl group, heptafluoro. Some or all of the hydrogen atoms in the alkyl group such as isopropyl group, hexafluoro-2-methylisopropyl group, perfluoro-2-methylisopropyl group, n-perfluorobutyl group, n-perfluoropentyl group, and perfluorocyclopentyl group are substituted with fluorine. A fluorine-containing alkyl group having 1 to 10 carbon atoms such as an alkyl group; a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, a trifluoroethoxy group, a pentafluoroethoxy group, a heptafluoropropoxy group, a hexafoxy group; Oroisopropoxy group, heptafluoroisopropoxy group, hexafluoro-2-methylisopropoxy group, perfluoro-2-methylisopropoxy group, n-perfluorobutoxy group, n-perfluoropentoxy group, perfluorocyclopentoxy group, etc. A C1-C10 alkoxy group containing fluorine, such as an alkoxy group in which part or all of the hydrogen of the alkoxy group is substituted with fluorine; or a fluoromethoxymethyl group, difluoromethoxymethyl group, trifluoromethoxymethyl group, Fluoroethoxymethyl group, pentafluoroethoxymethyl group, heptafluoropropoxymethyl group, hexafluoroisopropoxymethyl group, heptafluoroisopropoxymethyl group, hexafluoro-2-methylisopropoxymethyl group, per Alkoxy in which some or all of the hydrogens of alkoxyalkyl groups such as uro-2-methylisopropoxymethyl, n-perfluorobutoxymethyl, n-perfluoropentoxymethyl, and perfluorocyclopentoxymethyl are substituted with fluorine Examples thereof include C2-C10 alkoxyalkyl groups containing fluorine such as alkyl groups.
R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, or a ring such as perfluorocycloalkyl or perfluorocycloether via oxygen may be formed.

The fluorine-containing polymer may have only one type of structural unit represented by the general formula (1), and any one of R ^{1 to} R ⁴ contains different types of structural units. Also good.
Furthermore, X in the general formula (1) in the fluorine-containing polymer of the present embodiment is selected from —CH ₂ — or —O—, and each of them may be contained alone. In addition, in the case where X in the general formula (1) is —CH ₂ — or —O— alone or each of them, a structural unit of a type in which any one of R ^{1 to} R ⁴ is different. May be included.

  Specific examples of the fluorine-containing polymer containing the structural unit represented by the general formula (1) include poly (1,1,2-trifluoro-2-trifluoromethyl-3,5-cyclopentyleneethylene). , Poly (1,2-difluoro-1,2-bis (trifluoromethyl) -3,5-cyclopentyleneethylene), poly (1,1,2,2,3,3,3a, 6a-octafluoro Cyclopentyl-4,6-cyclopentyleneethylene), poly (1,1,2,2,3,3,4,4,3a, 7a-decafluorocyclohexyl-5,7-cyclopentyleneethylene), poly ( 1,1,2-trifluoro-2-perfluorobutyl-3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-trifluoromethyl-2-perfluorobutyl-3,5-cyclope Tyleneethylene), poly (1-fluoro-1-perfluoroethyl-2,2-bis (trifluoromethyl))-3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-perfluoropropanyl) -2-trifluoromethyl) -3,5-cyclopentyleneethylene), poly (1,1,2-trifluoro-2-perfluoropentyl-3,5-cyclopentyleneethylene), poly (1,2- Difluoro-1-trifluoromethyl-2-perfluorobutyl-3,5-cyclopentyleneethylene), poly (1,1,2-trifluoro-2-perfluorohexyl-3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-trifluoromethyl-2-perfluoropentyl-3,5-cyclopentyleneethylene), poly (1,1,3,3,3a, 6a-hexafluorofuranyl-3,5-cyclopentyleneethylene), poly (1,1,2-trifluoro-2-trifluoromethoxy-3,5-cyclo Pentyleneethylene), poly (1,2-difluoro-1,2-bis (trifluoromethoxy) -3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-trifluoromethoxy-2-) Perfluoroethoxy-3,5-cyclopentyleneethylene), poly (1,1,2-trifluoro-2-perfluorobutoxy-3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-tri) Fluoromethoxy-2-perfluorobutoxy-3,5-cyclopentyleneethylene), poly (1-fluoro-1-perfluoroethoxy-2,2-bis (tri Fluoromethoxy) -3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-perfluoropropoxy-2-trifluoromethoxy-3,5-cyclopentyleneethylene), poly (1,1,2 -Trifluoro-2-perfluoropentoxy-3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-trifluoromethoxy-2-perfluorobutoxy-3,5-cyclopentyleneethylene), poly (1,1,2-trifluoro-2-perfluorohexoxy-3,5-cyclopentyleneethylene), poly (1,2-difluoro-1-trifluoromethoxy-2-perfluoropentyl-3,5-cyclo Pentyleneethylene), poly (1,2-difluoro-1-trifluoromethoxy-2- (2 ′, 2 ′, 2′-trif) Oloethoxy) -3,5-cyclopentyleneethylene), poly (1,1,2-trifluoro-2- (2 ′, 2 ′, 3 ′, 3 ′, 4 ′, 4 ′, 4′-heptafluoro) Butoxy) -3,5-cyclopentyleneethylene), poly (1-fluoro-1- (2 ′, 2 ′, 2 ′, -trifluoroethoxy) -2,2-bis (trifluoromethoxy))-3 , 5-cyclopentyleneethylene), poly (1,1,2-trifluoro-2- (1 ′, 1 ′, 1′-trifluoro-iso-propoxy) -3,5-cyclopentyleneethylene), Poly (1,2-difluoro-1-trifluoromethoxy-2- (2 ′, 2 ′, 3 ′, 3 ′, 4 ′, 4 ′, 4′-heptafluorobutoxy) -3,5-cyclopentylene Ethylene), poly (1,1,2-trifluoro-2- (2 ′, 2 ′, 3 ′, 3 ′, 4 ′, 4 ′) 5 '5' 6 ', 6', 6'-undecafluoro-het carboxymethyl) -3,5-cyclopentylene ethylene), and the like.

Furthermore, derivatives of poly (4-oxa-3,5-cyclopentylene ethylene) in which R ^{1 to} R ⁴ in the general formula (1) are the same and X is —O— are included. The light transmittance of the resulting film has a total light transmittance of 94% to 99%.

  The molecular weight of the fluorine-containing polymer (C) is, for example, from 3,000 to 3,000 in terms of polystyrene-converted weight average molecular weight (Mw) measured by gel permeation chromatography (GPC) at a sample concentration of 3.0 to 9.0 mg / ml. 100,000 is preferable, and 5,000 to 30,000 is more preferable. By setting the weight average molecular weight (Mw) to the above lower limit or more, the photocurable composition of the present embodiment was used as an adhesive, and the photocurable composition was cured by light irradiation to produce a laminated structure. In this case, the adhesive layer is not cracked, and a laminated structure in a good state can be obtained. Moreover, by making a weight average molecular weight (Mw) below the said upper limit, the solubility of the outstanding polymer at the time of preparing photocurable composition can be expressed, a gel etc. do not arise, but after light irradiation hardening as an adhesive agent The interface with the base material can be kept uniform, and a laminated structure with high film thickness accuracy can be obtained.

The molecular weight distribution (Mw / Mn), which is the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn), is preferably 1.3 to 5.0, and is preferably 1.5 to 4.5. More preferably, it is more preferably 1.7 to 4.0. By setting the molecular weight distribution (Mw / Mn) to the above lower limit value or more, the toughness of the adhesive layer of the laminated structure using the photocurable composition of the present embodiment as an adhesive is improved, resulting from external stress. Generation of cracks and cracks can be effectively suppressed. On the other hand, by setting the molecular weight distribution (Mw / Mn) to the upper limit or less, bleeding out of low molecular weight components such as an oligomer of the adhesive layer after light irradiation curing is suppressed, and the interface between the substrate and the adhesive layer is made uniform. Therefore, a laminated structure with high film thickness accuracy can be manufactured.
That is, by setting the weight average molecular weight (Mw) and the molecular weight distribution (Mw / Mn) in the above ranges, the photocurable composition of the present embodiment is suitably used as an adhesive for adhering the substrates. be able to.

  The glass transition temperature of the fluorine-containing polymer (C) by differential scanning calorimetry is preferably 50 to 250 ° C, more preferably 80 to 200 ° C, and still more preferably 90 to 180 ° C. When the glass transition temperature is in the above range, heat generation during light irradiation curing and sagging of the adhesive layer due to radiant heat from the light source can be prevented, and the shape can be maintained under the usage environment. The adhesive composition can be suitably used as an adhesive that bonds the substrates.

  Unlike the fully fluorinated polymer, the partially fluorinated polymer of the general formula (1) of the present invention has a structure in which the main chain is a partially fluorinated polymer having a hydrocarbon and a fluorine atom in a side chain. Due to its large polarity, it dissolves well in polar solvents such as commercially available ethers and ketones, which are solvents for polymer synthesis, and also has excellent solubility in polar compounds such as photocurable compounds. While exhibiting excellent adhesion to a substrate composed of an inorganic material or an organic material.

[Method for producing fluorine-containing polymer (C)]
In the fluorine-containing polymer (C), the monomer represented by the following general formula (2) is subjected to chain transfer polymerization using a ring-opening metathesis polymerization catalyst, and the olefin portion (double bond portion) of the main chain of the resulting polymer is hydrogenated. Can be synthesized.

(In the formula (2), R ^{1 to} R ⁴ and X have the same meanings as the above-described formula (1).)

In addition, if it is a range which does not impair the effect of this invention, monomers other than the monomer represented by General formula (2) may be included.
Here, in synthesizing the fluorine-containing polymer of the present embodiment, the monomer represented by the general formula (2) is preferably used in an amount of 90% by weight or more, and 95% by weight or more of the whole compound contributing to the polymerization. It is more preferable to use 98% by weight or more.

  The fluorine-containing polymer (C) represented by the general formula (1) of the present embodiment is a fluorine-containing polymer in which the main chain double bond is hydrogenated after ring-opening metathesis polymerization of the monomer represented by the general formula (2). It is a polymer. In the ring-opening metathesis polymerization, a Schrock catalyst is preferably used, and a Grubbs catalyst may be used. In particular, the polymerization catalyst activity for polar monomers is enhanced, and an industrially excellent production method can be realized. These ring-opening metathesis polymerization catalysts may be used alone or in combination of two or more. A ring-opening metathesis polymerization catalyst comprising a combination of a classic organic transition metal complex, transition metal halide or transition metal oxide and a Lewis acid as a cocatalyst can also be used.

  Further, when performing ring-opening metathesis polymerization, an olefin or a diene can be used as a chain transfer agent in order to control the molecular weight and its distribution. As an olefin, alpha-olefins, such as ethylene, propylene, 1-butene, 1-pentene, 1-hexene, 1-octene, or these fluorine-containing olefins can be used, for example. Examples thereof include silicon-containing olefins such as vinyltrimethylsilane, allyltrimethylsilane, allyltriethylsilane, and allyltriisopropylsilane, and fluorine and silicon-containing olefins thereof. Examples of the diene include nonconjugated dienes such as 1,4-pentadiene, 1,5-hexadiene, 1,6-heptadiene, and fluorine-containing nonconjugated dienes. These olefins, fluorine-containing olefins or dienes may be used alone or in combination of two or more.

  In addition, the ring-opening metathesis polymerization of the monomer may be solventless or may use a solvent. Particularly, the solvent to be used includes ethers such as tetrahydrofuran, diethyl ether, dibutyl ether, dimethoxyethane or dioxane, ethyl acetate, acetic acid. Esters such as propyl or butyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene or ethylbenzene, aliphatic hydrocarbons such as pentane, hexane or heptane, fats such as cyclopentane, cyclohexane, methylcyclohexane, dimethylcyclohexane or decalin Aromatic hydrocarbons, methylene dichloride, dichloroethane, dichloroethylene, tetrachloroethane, halogenated hydrocarbons such as chlorobenzene or trichlorobenzene, fluorobenzene, difluro Fluorine-containing aromatic hydrocarbons such as rhobenzene, hexafluorobenzene, trifluoromethylbenzene, metaxylene hexafluoride, fluorine-containing aliphatic hydrocarbons such as perfluorohexane, fluorine-containing aliphatic cyclic hydrocarbons such as perfluorocyclodecalin, or Examples include fluorine-containing ethers such as perfluoro-2-butyltetrahydrofuran. These may be used alone or in combination of two or more.

  In the ring-opening metathesis polymerization of the monomer, the concentration of the monomer with respect to the monomer solution is preferably 5 to 100% by mass, and preferably 10 to 60% by mass, depending on the reactivity of the monomer and solubility in the polymerization solvent. It is more preferable. Moreover, it is preferable that reaction temperature is -30-150 degreeC, and it is more preferable that it is 30-100 degreeC. The reaction time is preferably 10 minutes to 120 hours, more preferably 30 minutes to 48 hours. Furthermore, the reaction can be stopped with an aldehyde such as butyraldehyde, a ketone such as acetone, an alcohol such as methanol, or a quenching agent such as water, to obtain a polymer solution.

  The catalyst for hydrogenating the double bond part of the main chain of the polymer obtained by ring-opening metathesis polymerization can be either a homogeneous metal complex catalyst or a heterogeneous metal supported catalyst as long as it can be hydrogenated. There may be. Examples of homogeneous metal complex catalysts include chlorotris (triphenylphosphine) rhodium, dichlorotris (triphenylphosphine) osmium, dichlorohydridobis (triphenylphosphine) iridium, dichlorotris (triphenylphosphine) ruthenium, dichlorotetrakis (triphenyl) Phosphine) ruthenium, chlorohydridocarbonyltris (triphenylphosphine) ruthenium, dichlorotris (trimethylphosphine) ruthenium and the like, and examples of heterogeneous metal-supported catalysts include palladium on activated carbon, palladium on alumina, and rhodium on activated carbon. , Alumina-supported rhodium, activated carbon-supported ruthenium, alumina-supported ruthenium, and the like. These hydrogenation catalysts may be used alone or in combination of two or more.

  The solvent used for hydrogenation is not particularly limited as long as it dissolves the polymer and the solvent itself is not hydrogenated. For example, ethers such as tetrahydrofuran, diethyl ether, dibutyl ether, dimethoxyethane, ethyl acetate, etc. , Esters such as propyl acetate or butyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene, aliphatic hydrocarbons such as pentane, hexane, heptane, cyclopentane, cyclohexane, methylcyclohexane, dimethylcyclohexane, decalin, etc. Aliphatic cyclic hydrocarbons, methylene dichloride, chloroform, dichloroethane, dichloroethylene, tetrachloroethane, chlorobenzene, trichlorobenzene and other halogenated hydrocarbons, fluorobenzene, difluro Fluorine-containing aromatic hydrocarbons such as rhobenzene, hexafluorobenzene, trifluoromethylbenzene, metaxylene hexafluoride, fluorine-containing aliphatic hydrocarbons such as perfluorohexane, fluorine-containing aliphatic cyclic hydrocarbons such as perfluorocyclodecalin, perfluoro And fluorine-containing ethers such as 2-butyltetrahydrofuran. These may be used alone or in combination of two or more.

  In the hydrogenation reaction of the olefin portion of the main chain, the hydrogen pressure is preferably normal pressure to 10 MPa, more preferably 0.5 to 8 MPa, and particularly preferably 2 to 5 MPa. Moreover, it is preferable that reaction temperature is the temperature of 0-200 degreeC, It is more preferable that it is room temperature-150 degreeC, It is especially preferable that it is 50-100 degreeC. The mode of carrying out the hydrogenation reaction is not particularly limited. For example, there are a method in which the catalyst is dispersed or dissolved in a solvent, a method in which the catalyst is packed in a column and the polymer solution is circulated as a stationary phase, and the like. Can be mentioned.

  Furthermore, the hydrogenation treatment of the olefin portion of the main chain can be carried out by polymerizing the polymer solution before the hydrogenation treatment in a poor solvent and isolating the polymer, then dissolving it in the solvent again and performing the hydrogenation treatment. The hydrogenation treatment may be performed with the above hydrogenation catalyst without isolating the polymer from the solution, and there is no particular limitation.

  Moreover, it is preferable that the hydrogenation rate of the olefin part of a polymer is 50% or more, It is more preferable that it is 70 to 100%, It is especially preferable that it is 90 to 100%. By setting the hydrogenation rate to the above lower limit value or more, in the olefin part, it is possible to suppress deterioration due to light absorption and oxidation due to heating during molding, and to have good adhesion to the substrate. can do.

  The method for obtaining the polymer from the polymer solution after hydrogenation, especially when a solid catalyst such as activated carbon-supported palladium or alumina-supported palladium is preferably used is not particularly limited. For example, filtration, centrifugation, decantation, etc. The polymer is obtained by the method, the reaction solution is discharged into a poor solvent under stirring, the polymer is precipitated by a method such as steam stripping in which steam is blown into the reaction solution, or the solvent is evaporated from the reaction solution by heating or the like. The method of removing etc. are mentioned.

  In addition, when the hydrogenation reaction is performed using a heterogeneous metal-supported catalyst, the polymer can be obtained by the above-described method after the synthesis solution is filtered to separate the metal-supported catalyst. In addition, a catalyst component having a large particle diameter is preliminarily settled in a polymer solution by a method such as decantation or stretch separation, a supernatant is collected, a solution obtained by roughly removing the catalyst component is filtered, and a polymer is obtained by the method described above. May be. In particular, it is suitable to microfilter the catalyst component, and the opening of the filter is preferably 10 μm to 0.05 μm, particularly preferably 10 μm to 0.10 μm, and more preferably 5 μm to 0.10 μm. It is.

  In this embodiment, the fluorine-containing polymer (C) is recovered from the polymer solution after hydrogenation, and then dissolved again in a solvent, mixed with the photocurable compound (A), and directly as a photocurable composition. The photocured composition can be dissolved in the curable compound (A), and the hydrogenated polymer solution can be directly mixed with the photocurable compound (A) without recovering the fluorine-containing polymer (C). It is good also as a sex composition. The method for recovering the fluorine-containing polymer (C) from the polymer solution after hydrogenation is not particularly limited. For example, a method of discharging the reaction solution into a poor solvent under stirring, a steam stroking steam into the reaction solution, and the like. Examples thereof include a method of precipitating a polymer by a method such as a ripping method and recovering the polymer by a method such as filtration, centrifugation, decantation, or a method of evaporating and removing a solvent from a reaction solution by heating. Moreover, well-known various additives, such as a ultraviolet absorber, antioxidant, a flame retardant, an antistatic agent, and a leveling agent, can be mix | blended with the polymer collect | recovered in the range which does not impair the objective of this invention.

  In order to prepare an adhesive varnish, the above-mentioned fluorine-containing polymer (C) can also be dissolved in a solvent. For example, fluorine-containing aromatic hydrocarbons such as metaxylene hexafluoride, benzotrifluoride, fluorobenzene, difluorobenzene, hexafluorobenzene, trifluoromethylbenzene, bis (trifluoromethyl) benzene, metaxylene hexafluoride, Fluorine-containing aliphatic hydrocarbons such as perfluorohexane and perfluorooctane, fluorine-containing aliphatic cyclic hydrocarbons such as perfluorocyclodecalin, fluorine-containing ethers such as perfluoro-2-butyltetrahydrofuran, halogens such as chloroform, chlorobenzene, and trichlorobenzene Hydrocarbon, tetrahydrofuran, dibutyl ether, 1,2-dimethoxyethane, dioxane, propylene glycol monomethyl ether, dipropylene glycol monomethyl Ethers, ethers such as propylene glycol monomethyl ether acetate, esters such as ethyl acetate, propyl acetate and butyl acetate, or ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, methanol, ethanol, isopropyl alcohol, 2-methoxyethanol And alcohols such as 3-methoxypropanol. Among these, it can be selected in consideration of solubility and film-forming property, and may be the same as or different from the organic solvent for dissolving the fluorine-containing polymer (C), or may be used alone or in combination of two or more kinds.

In particular, when preparing the photocurable composition of the present invention by adding the photocurable compound (A) and the photocuring initiator (B) to the fluorine-containing polymer (C) solution, from the viewpoint of film forming properties. A solvent having a boiling point of 70 ° C. or higher under atmospheric pressure is preferred.
By using a solvent having such a boiling point, the evaporation rate can be controlled to an appropriate rate, and the thickness of the adhesive layer can be easily controlled within a desired range. Thereby, the adhesive strength after light irradiation hardening can be raised.

  The concentration at which the fluorine-containing polymer (C) is dissolved is preferably 1.0 to 99.0% by mass, more preferably 5.0 to 90.0% by mass, and 10.0 to 80.0%. It is especially preferable that it is mass%. The concentration may be selected considering the solubility of the polymer, the adaptability to the filtration process, and the process adaptability to prepare the photocurable composition.

<Solvent that does not cure itself (D)>
In the photocurable composition of this embodiment, the solvent (D) which does not self-harden is contained as needed.
As this solvent, it is preferable to select a solvent capable of dissolving the fluorine-containing polymer (C). Further, the solvent used in the reaction for producing the fluorine-containing polymer (C) may be used as it is, or may be concentrated for viscosity adjustment.
As specific examples of the solvent, the same type of solvent as that used for preparing the adhesive varnish is used, which may be the same or different, and may be used alone or in combination of two or more types. Good.

[Method for Preparing Photocurable Composition]
In this embodiment, as a method of mixing the photocurable compound (A), the photocuring initiator (B), and the fluorine-containing polymer (C), the photocurable compound (A) is added to the above-mentioned fluorine-containing polymer (C) solution. ) And the photocuring initiator (B) may be added and mixed, or the fluorine-containing polymer (C) may be directly dissolved and mixed in the photocurable compound (A). Furthermore, various known additives such as an ultraviolet absorber, an antioxidant, a flame retardant, an antistatic agent, and a leveling agent can be blended in the photocurable composition within a range not impairing the object of the present invention. .

  The resin component concentration of the photocurable composition obtained by mixing the photocurable compound (A), the photocuring initiator (B), and the fluorine-containing polymer (C) is preferably 0.5 to 99.5% by mass. 1 to 99% by mass is more preferable, and 2 to 98% by mass is particularly preferable. The resin component concentration can be appropriately adjusted in consideration of adaptability to the solution filtration process, coating properties, and the thickness of the adhesive layer.

  The prepared photocurable composition can be filtered through a filter. This is particularly preferred when it is necessary to reduce foreign matter or the like from the photocurable composition for that purpose. By filtration, contact failure between adhesive base materials can be prevented, and a laminated structure can be stably obtained.

  The opening of the filtration filter used here is preferably 10 μm to 0.05 μm, particularly preferably 10 μm to 0.1 μm, and further preferably 5 μm to 0.1 μm. The filtration process may be a multi-stage process in which the polymer solution is sent from a filter with a large pore size to a small filter, or a single process in which the photocurable composition is sent directly to a filter with a small pore size. The material of the filter may be made of an organic material such as Teflon (registered trademark), polypropylene (PP), polyethersulfone (PES), or cellulose, or may be made of an inorganic material such as glass fiber or metal. It can be suitably selected from the characteristics of the composition and process adaptability.

  Moreover, as a method of sending the photocurable composition to the filter, a method using a pressure difference or a method of sending the photocurable composition to the filter by mechanical driving via a screw or the like may be used. Further, the filtration temperature is selected within the range considering the filter performance, the stability of the photocurable compound, the viscosity of the photocurable composition, and the solubility of the polymer, and is preferably room temperature to 200 ° C. It is more preferable that it is 150 degreeC, and it is especially preferable that it is room temperature-100 degreeC.

[Manufacturing method of laminated structure]
Then, the manufacturing method of the laminated structure concerning this embodiment is demonstrated.
The manufacturing method of the laminated structure of the present embodiment includes a first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, and the first base material. And a bonding layer that adheres the second base material, wherein the first base material provided in the laminated structure and the second base material are at least one of the first base material and the second base material. Either one is characterized in that it is a base material having a light transmittance required for light irradiation curing of the photocurable compound.
Moreover, the manufacturing method of the said laminated structure is the application | coating process which apply | coats said photocurable composition to the surface of at least any one among a 1st base material and a said 2nd base material, and the said photocuring. A laminating step of bonding the first base material and the second base material through a surface coated with a conductive composition, and a light irradiation step of irradiating light through the light-transmitting base material It is characterized by including these.

  What is necessary is just to select suitably the 1st base material 11 and the 2nd base material 12 which can be used for the manufacturing method of the laminated structure of this embodiment from the above-mentioned base materials. However, at least one of the first base material 11 and the second base material 12 is a light-transmitting base material.

(Coating process)
The method for the coating process in the method for producing a laminated structure of the present embodiment is not particularly limited. For example, the above-mentioned photocurable composition is applied to a table coat, spin coat, dip coat, die coat, spray coat, bar. The method of apply | coating to a base material by a coat | court, a roll coat, curtain flow coat etc. is mentioned.

  Furthermore, when the photocurable composition applied to the base material contains an organic solvent that is not photocured by itself, the coated base material may be heated by a method such as a heat plate, a heating furnace, or hot air. It is used by removing the organic solvent by heating using a combined process. Although this heating temperature depends on the substrate, it is usually preferably room temperature to 250 ° C, more preferably 40 to 220 ° C, and particularly preferably 60 to 200 ° C. These temperatures can be selected in consideration of the stability of the photocurable compound, the characteristics of the photocurable composition, the thickness of the coating layer (adhesive layer), and the heat resistance of the substrate. Furthermore, the heating time is usually 1 second to 2 hours, preferably 30 seconds to 1 hour, and more preferably 30 seconds to 10 minutes. Each temperature and time may be dried under two or more multi-stage conditions, and the time for drying the coating film may be selected from conditions that take into consideration the boiling point of the solvent, the thickness of the adhesive layer, and process requirements. it can. By these, a coating layer is formed on a base material.

  The thickness of the coating layer is preferably 0.1 μm to 50 μm, more preferably 0.5 μm to 30 μm, and further preferably 1 μm to 10 μm. If the thickness is necessary to firmly bond the substrates, the process It is preferably selected in consideration of adaptability. In addition to the adhesive function, for example, the thickness may be set in accordance with the purpose of providing a function such as a refractive index adjustment for optical use and a gas barrier for providing environmental stability.

(Lamination process)
The lamination process in the manufacturing method of the laminated structure of this embodiment is performed by bonding the 1st base material 11 and the 2nd base material 12 through the surface which apply | coated the photocurable composition. As a method, for example, a method of pressing a roller, a method of pressing both sides by applying pressure from above and below, and using a difference in peripheral speed of a feed roll by placing another substrate while feeding a substrate on which a coating layer is formed For example, a method of pressing and the like can be used, and the method is suitably selected in consideration of the form of the laminated structure and process adaptability. Two or more methods may be used in combination, or heating may be used in combination.

(Light irradiation process)
The light irradiation process in the manufacturing method of the laminated structure of this embodiment is performed by irradiating light through the base material which has a light transmittance.
At this time, you may pressurize the photocurable composition which exists between the base materials comprised from an inorganic material or / and an organic material as needed. As a light source in this light irradiation process, light having a wavelength of 400 nm or less, for example, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a light emitting diode, a chemical lamp, a black light lamp, a microwave excited mercury lamp and a metal halide lamp, i Line, g-line, KrF excimer laser light, ArF excimer laser light can be used.

The irradiation intensity to the photocurable composition is controlled for each target product and is not particularly limited. For example, the light irradiation intensity in the light wavelength region effective for activation of the photocuring initiator (which varies depending on the photocuring initiator, but usually 200 to 420 nm is used) is 0.1 to 100 mW / cm ^2. Is preferred. By setting the irradiation intensity to the composition to 0.1 mW / cm ² or more, the curing time can be shortened, and by setting the irradiation intensity to 100 mW / cm ² or less, the photocurable composition and its cured product, and the substrate Curing can be carried out without degrading.

The light irradiation time is controlled for each target product and is not particularly limited, but is represented by the product of the light irradiation intensity and the light irradiation time in the light wavelength region. The integrated light quantity with respect to the composition can usually be set to ²⁰ to 1000 mJ / cm ² . More preferably from 50~1000mJ / cm ^2, particularly preferably 100~1000mJ / cm ^2.
By setting the integrated light quantity with respect to the photocurable composition within the above range, the cured product can be stably cured without causing deterioration or discoloration.
Further, light irradiation may be performed while heating at the time of light irradiation, or heating may be performed after the light irradiation.
The heating temperature at the time of light irradiation or after light irradiation is usually room temperature or higher, preferably 30 to 100 ° C, more preferably 50 to 100 ° C.

  It should be noted that the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention.

  EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited at all by these examples.

  First, the physical properties of the polymer obtained in this example, the performance of the photocurable composition, and the like were analyzed and evaluated based on the following items.

[Weight average molecular weight (Mw), molecular weight distribution (Mw / Mn)]
Using gel permeation chromatography (GPC) under the following conditions, the weight average molecular weight (Mw) and the number average molecular weight (Mn) of the polymer dissolved in tetrahydrofuran (THF) were measured according to polystyrene standards under the following conditions. The molecular weight was calibrated and measured. Detector: RI-2031 and 875-UV manufactured by JASCO, Series connection column: Shodex K-806M, 804, 803, 802.5, column temperature: 40 ° C., flow rate: 1.0 ml / min, sample concentration: 3. 0 mg / ml

[Polymer hydrogenation rate]
The hydrogenated ring-opening metathesis polymer powder was dissolved in deuterated chloroform or deuterated tetrahydrofuran, and a 270 MHz- ¹ H-NMR spectrum was measured using a nuclear magnetic resonance apparatus manufactured by JEOL Ltd. The hydrogenation rate was calculated from the integrated value of the signal derived from hydrogen bonded to the double bond carbon of the main chain at δ = 4.5 to 7.0 ppm.

[Glass-transition temperature]
Using a DSC-50 manufactured by Shimadzu Corporation, the measurement sample was heated and measured at a heating rate of 10 ° C./min in a nitrogen atmosphere.

[Measurement of light transmittance of photocurable composition]
The light transmittance of the photocurable composition was determined by measuring the transmittance at a wavelength of 300 nm using a spectrophotometer UV3100S manufactured by Shimadzu Corporation, and evaluating the transmittance per 1 μm from the measured value of the liquid film height.

[Evaluation method of shrinkage]
The area before bonding of the base material is A1, and the area viewed from the normal direction of the base material after UV radiation curing and bonding is A2 (the normal direction even when the curl is deformed or the like) The shrinkage rate was calculated by the following mathematical formula.
Shrinkage rate (%) = (A1-A2) / A1 × 100

[Film adhesion test]
In accordance with JIS K 5600 5-6 “Cross-cut method”, a cellophane tape made by Nichiban Co., Ltd. is applied to a film in which one side of the laminated film is cut into a grid of 2 mm × 2 mm and peeled off. Then, the number of remaining films was counted and evaluated.

[Production Example 1] Synthesis of polymer 1 5,5,6-trifluoro-6- (trifluoromethyl) bicyclo [2.2.1] hept-2-ene (100 g) and 1-hexene (0.268 g) in tetrahydrofuran ^solution was added a tetrahydrofuran solution of _{Mo (N-2,6-Pr i} 2 C 6 H 3) (CHCMe 2 Ph) (OBu t) 2 (50mg), a ring-opening metathesis polymerization at 70 ° C. went. The olefin part of the obtained polymer was subjected to hydrogenation reaction at 120 ° C. with palladium alumina (5 g) to obtain poly (1,1,2-trifluoro-2-trifluoromethyl-3,5-cyclopentylene ethylene). A tetrahydrofuran solution was obtained.
The solution was added to methanol, and the white polymer was filtered and dried to obtain 99 g of polymer 1 of a fluorine-containing polymer (C). The hydrogenation rate was 100%, the weight average molecular weight (Mw) was 83000, the molecular weight distribution (Mw / Mn) was 1.73, and the glass transition temperature was 109 ° C.

[Example 1]
3-ethyl-3 {[(3-ethyloxetane-3-yl) methoxy] as a photocurable compound (A) was added to 100 g of a methyl isobutyl ketone solution in which the polymer 1 synthesized in Production Example 1 was dissolved at a concentration of 30% by mass. 7.5 g [(A) / (C) = 20/80] of a mixture of methyl} oxetane and 1,7-octadiene diepoxide at a mass ratio of 9/1, and (Adekaopt) as a photocuring initiator (B) Marp SP-172 (manufactured by Asahi Denka Co., Ltd.) was prepared, and a photocurable composition 1 was prepared by pressure-filtering with a filter having a pore size of 1 μm and then filtering with a 0.1 μm filter. . The light transmittance at 300 nm of the photocurable composition 1 produced with a liquid film height of 30 μm was 92.7% / μm.
Next, a PET film having a thickness of 100 μm (Lumirror, manufactured by Toray Industries, Inc.) as a substrate was cut into a size of 10 cm × 10 cm, and the entire surface of the film was coated with the photocurable composition 1 using a bar coater. Thereafter, the PET film was heated at 50 ° C. for 1 minute, allowed to cool, and then a 75 μm thick acrylic film (Acryprene, manufactured by Mitsubishi Rayon Co., Ltd.) cut out in a size of 10 cm × 10 cm was applied to the coated surface of the photocurable composition 1 Using a Laminator SE650UV made by Climb Products, applying a pressure of 0.3 MPa, scanning the roller over the entire surface of the substrate and pressing it uniformly, UV of the high-intensity light emitting diode (365 nm) from the back of the PET film The photocurable composition 1 was cured by irradiating light with an integrated light amount of 200 mJ / cm ² to produce a laminated structure in which a PET film and an acrylic film were bonded. The thickness of the adhesive layer is a value obtained by measuring and averaging the thickness of any 10 locations of the laminated structure using Digimicro MH-15M + TC-101 manufactured by NIKON, and subtracting the total value of the thicknesses of the base materials from the average value. Was obtained as an adhesive layer of the laminated structure. Its thickness was 3.1 μm. The adhesion tested by the cross-cut method was 100/100, indicating good adhesion, and the shrinkage rate was 0.2%.

[Example 2]
As a photocurable compound (A), a mixture of 3-ethyl-3 {[((3-ethyloxetane-3-yl) methoxy] methyl} oxetane and 1,7-octadiene diepoxide in a mass ratio of 9/1 was used. A photocurable composition 2 [(A) / (C) = 90/10] in which the polymer 1 was dissolved with a solvent was prepared. The light transmittance at 300 nm of the photocurable composition 2 produced at a liquid film height of 22.1 μm was 78.4% / μm.
Subsequently, the laminated structure which adhere | attached PET film and the acrylic film by the method similar to Example 1 except having used the photocurable composition 2 as an adhesive agent was produced. The thickness of the adhesive layer measured in the same manner as in Example 1 was 1.7 μm, the adhesiveness tested by the cross-cut method was 100/100, showing good adhesiveness, and the shrinkage rate was 0.5%.

[Example 3]
The same method as in Production Example 1, except that the type of fluorine-containing monomer was changed to 5,6-difluoro-5-pentafluoroethyl-6-trifluoromethylbicyclo [2.2.1] hept-2-ene Yielded 98 g of polymer 2. Next, polymer 2 was dissolved in methyl ethyl ketone at a concentration of 30% by mass, and the same method as in Example 1 except that the ratio of the photocurable compound to polymer 2 was changed to (A) / (C) = 10/90. A photocurable composition 3 was prepared. The light transmittance at 300 nm of the photocurable composition 3 produced at a liquid film height of 40.2 μm was 93.6% / μm.
Subsequently, the laminated structure which adhere | attached PET film and the acrylic film by the method similar to Example 1 except having used the photocurable composition 3 for the adhesive agent was produced. The thickness of the adhesive layer was 4.1 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.4%.

[Example 4]
The same as in Production Example 1 except that the type of the fluorine-containing monomer was changed to 5,6-difluoro-5,6-bistrifluoromethyl-7-oxa-bicyclo [2.2.1] hept-2-ene. 99 g of polymer 3 were obtained by the method. Next, polymer 3 was dissolved in methyl ethyl ketone at a concentration of 30% by mass, and the same method as in Example 1 except that the ratio of the photocurable compound to polymer 3 was changed to (A) / (C) = 40/60. A photocurable composition 4 was prepared. The light transmittance at 300 nm of the photocurable composition 4 produced at a liquid film height of 19.8 μm was 90.2% / μm.
Subsequently, the laminated structure which adhere | attached PET film and the acrylic film by the method similar to Example 1 except having used the photocurable composition 4 for the adhesive agent was produced. The thickness of the adhesive layer was 0.8 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.3%.

[Example 5]
The kind of the photocurable compound (A) is changed to a mixture of 3-ethyl-3- (hexyloxymethyl) oxetane and 1,7-octadiene diepoxide in a mass ratio of 9/1, and the photocuring initiator (B) is added to CPI. A photocurable composition 5 [(A) / (C) = 20/80] was prepared in the same manner as in Example 1 except that it was changed to -100P (manufactured by San Apro). The light transmittance at 300 nm of the photocurable composition 5 produced at a liquid film height of 22.4 μm was 92.6% / μm.
Subsequently, the laminated structure which adhere | attached PET film and the acrylic film by the method similar to Example 1 except having used the photocurable composition 5 for the adhesive agent was produced. The thickness of the adhesive layer was 2.5 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.4%.

[Example 6]
The kind of the photocurable compound (A) is changed to a mixture of 1,4-bis [{(3-ethyl-3-oxetanyl) methoxy} methyl] benzene and 1,7-octadiene diepoxide in a mass ratio of 9/1. A photocurable composition 6 [(A) / (C) = 20/80] was prepared in the same manner as in Example 1 except that the photocuring initiator (B) was changed to Irgacure 290 (BASF). . The light transmittance at 300 nm of the photocurable composition 6 produced with a liquid film height of 30.1 μm was 92.4% / μm.
Subsequently, the laminated structure which adhere | attached PET film and the acrylic film by the method similar to Example 1 except having used the photocurable composition 6 for the adhesive agent was produced. The thickness of the adhesive layer was 3.4 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.2%.

[Example 7]
The type of the photocurable compound (A) was changed to a mass ratio of 3-ethyl-3 {[(3-ethyloxetane-3-yl) methoxy] methyl} oxetane and 1-tert-butoxy-2,3-epoxypropane of 9 / A photocurable composition 7 [(A) / (C) = 20/80] was prepared in the same manner as in Example 1 except that the mixture was changed to the mixture of No. 1. The light transmittance at 300 nm of the photocurable composition 7 produced at a liquid film height of 25.9 μm was 92.6% / μm.
Subsequently, the laminated structure which adhere | attached PET film and the acrylic film by the method similar to Example 1 except having used the photocurable composition 7 for the adhesive agent was produced. The thickness of the adhesive layer was 2.7 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.3%.

[Example 8]
A film having a thickness of 30 μm formed from the polymer 1 synthesized in Production Example 1 was used as a substrate, and the photocurable composition solvent of Example 1 was changed to cyclohexanone as an adhesive to obtain a photocurable composition 8. Produced a laminated structure in which a PET film and a polymer 1 film were bonded in the same manner as in Example 1. The thickness of the adhesive layer was 3.5 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.2%.

[Example 9]
The photocurable composition 1 prepared in Example 1 was coated on the entire surface of quartz glass having a thickness of 3 mm and a size of 10 cm × 10 cm as a substrate. Thereafter, the quartz glass was heated at 90 ° C. for 1 minute, allowed to cool, and then a 75 μm thick acrylic film (Acryprene, manufactured by Mitsubishi Rayon Co., Ltd.) cut out in a size of 10 cm × 10 cm was applied to the coated surface of the photocurable composition 1 A laminated structure in which the quartz glass and the acrylic film were bonded together was irradiated with UV from the back surface of the quartz glass in the same manner as in Example 1. The thickness of the adhesive layer was 1.5 μm, the adhesion tested by the cross-cut method was 100/100, indicating good adhesion, and the shrinkage rate was 0%.

[Example 10]
The photocurable composition 1 prepared in Example 1 was coated on the entire surface of an aluminum sheet having a thickness of 800 μm and a size of 10 cm × 10 cm as a base material. Thereafter, the aluminum sheet was heated at 90 ° C. for 1 minute, allowed to cool, and then a 100 μm-thick PET film (Lumirror, manufactured by Toray Industries, Inc.) cut into a size of 10 cm × 10 cm was applied to the coated surface of the photocurable composition 1. The laminated structure which mounted and irradiated UV from the back surface of PET film by the method similar to Example 1, and bonded the aluminum sheet and PET film was produced. The thickness of the adhesive layer was 2.4 μm, the adhesiveness tested by the cross-cut method was 100/100, showing good adhesiveness, and the shrinkage rate was 0%.

[Example 11]
The polymer 1 synthesized in Production Example 1 at a concentration of 35% by mass is formed on the pattern surface of a nickel mold having a size of 10 cm × 10 cm and a line and space shape having a line width of 200 nm, a space width of 100 nm, a pitch of 300 nm, and a height of 200 nm. The dissolved methyl isobutyl ketone solution was placed and coated on the entire surface with a bar coater, and the nickel mold was heated at 120 ° C. for 2 hours.
Next, the entire surface of the PET film was coated with the photocurable composition 1 prepared in Example 1 using a bar coater on a 100 μm thick PET film (Lumirror, manufactured by Toray Industries, Inc.) cut into a size of 10 cm × 10 cm as a base material. . Thereafter, the PET film was heated at 90 ° C. for 1 minute, allowed to cool, and then the photocurable composition of the PET film was formed on the back surface of the polymer 1 film having a concavo-convex structure laminated in contact with the heated nickel mold. The coated surface of the product 1 is placed in contact with each other, irradiated with UV from the back surface of the PET film in the same manner as in Example 1, and the nickel mold and the polymer 1 film are peeled off, so that the line width is 100 nm, the space width is 200 nm, A laminated structure having a shape of a line and space pattern having a pitch of 300 nm and a height of 200 nm was produced. The thickness of the adhesive layer was 3.3 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.2%.

[Example 12]
The photocurable composition was prepared in the same manner as in Example 1 except that the composition ratio of the photocurable compound (A) and the polymer 1 synthesized in Production Example 1 was changed to (A) / (C) = 40/60. 9 was prepared. Next, in a quartz mold having four types of microlens array patterns having a size of 20 cm × 20 cm, the photocurable composition 9 is applied to a quartz mold having a pattern size of 10 μm, 15 μm, 20 μm, and 25 μm and a height of 10 μm. Was coated on the entire surface with a bar coater, heated at 120 ° C., cooled, and then irradiated with 200 mJ / cm ² of UV light in an integrated light amount. Thereby, the layer comprised from the film which shape | cured the uneven structure which hardened the photocurable composition 9 on the quartz mold was formed.
Next, using the photocurable composition 1 as an adhesive in the same manner as in Example 11, the back surface of the film formed with the uneven structure before peeling and the PET film were bonded, and then the quartz mold was peeled off. A structure in which a film formed with a reverse pattern having four types of microlens array patterns having a size of 20 cm × 20 cm was laminated. The thickness of the adhesive layer was 4.6 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.2%.

[Example 13]
Using two molds having the same size and shape as the quartz mold described in Example 12, layers similar to Example 12 were respectively formed from films formed with the concavo-convex structure of the photocurable composition 9. Two formed quartz molds were produced. (These are all in a state before peeling, and a base material on which a concavo-convex structure of the curable composition 9 is formed on a quartz mold coated with an adhesive is denoted by I, and a base material covered on the adhesive layer is denoted by II. )
Next, the entire surface of the substrate I was coated with the photocurable composition 2 prepared in Example 2 with a bar coater. Thereafter, the base material II is placed on the adhesive layer of the base material I and adhered in the same manner as in Example 1, and 200 mJ / cm ² of UV light is irradiated from the back surface of the quartz mold of the base material I with a cumulative amount of light. I and substrate II were adhered. The quartz mold of each of the base material I and the base material II was peeled off to prepare a laminated structure in which a reversal pattern having a microlens array pattern on both sides was formed. The thickness of the adhesive layer was 1.1 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.1%.

[Example 14]
A film having a thickness of 50 μm and a size of 10 cm × 10 cm prepared from the polymer 1 synthesized in Production Example 1 was placed on the pattern surface of the nickel mold used in Example 11, heated to 130 ° C., and heated and melt-bonded at a pressure of 10 MPa. And cooled to room temperature.
Thereby, the layer comprised from the film which shape | molded the line & space shape was formed on the nickel mold.
Next, using the photocurable composition 1 as an adhesive in the same manner as in Example 11, the back surface of the film formed with the uneven structure before peeling and the PET film were bonded, and then the quartz mold was peeled off. A laminated structure in which a line & space pattern shape having a line width of 100 nm, a pitch of 300 nm, and a height of 200 nm was formed was produced. The thickness of the adhesive layer was 3.8 μm, the adhesion tested by the cross-cut method was 100/100, showing good adhesion, and the shrinkage rate was 0.4%.

[Example 15] Environmental stability test After the laminated structures prepared in Examples 1, 3, and 5 were placed in a constant temperature and humidity oven and exposed to conditions of 60 ° C and 95% (humidity) for 2000 hours, Appearance inspection and adhesion evaluation were performed. All three types of laminated structures were free from turbidity, deformation, cracking of the adhesive layer, and the adhesion by the cross-cut method was 100/100, and good adhesion was maintained.

[Comparative Example 1]
0.4 g of photocationic initiator (Adekaoptomer SP-172, manufactured by Asahi Denka Co., Ltd.) as the photocuring initiator (B) and 1,4-bis [{(3-ethyl- A mixture of 3-oxetanyl) methoxy} methyl] benzene and 1,7-octadiene diepoxide in a mass ratio of 9/1 was prepared, and a photocurable composition 10 [(A) / (C) = 100/0] did. The photocurable composition 10 prepared at a liquid film height of 23.5 μm has a light transmittance of 300 nm of 42.1% / μm, and the photocurable composition 10 cured by UV irradiation is brittle and cracked. The shape as a film could not be maintained.

[Comparative Example 2]
A laminate structure in which a PET film and an acrylic film are bonded in the same manner as in Example 2 using the photocurable composition 10 of Comparative Example 1 has an adhesive layer thickness of 3.8 μm. Cracks were observed in the part, the adhesion tested by the cross-cut method was 80/100, partly peeled, and the shrinkage rate was 4.2%.

[Comparative Example 3]
Photocurable composition 11 in which 0.3 g of 2-methoxyethanol solution in which photoradical curing initiator (Esacure KTO46, manufactured by Lamberti Co., Ltd.) is dissolved at a concentration of 50% by mass is added to 5 g of methyl 2-methyl-2-propenoate. Was prepared. The light curable composition 11 produced with a liquid film height of 4.3 μm has a light transmittance of 300 nm of 20.3% / μm. Then, the PET film and the acrylic film are bonded in the same manner as in Example 2. A laminated structure was prepared. The thickness of the adhesive layer was 4.0 μm, and the adhesiveness tested by the cross-cut method was 77/100, and a part was peeled off. The laminated structure was warped on the acrylic film side, and the shrinkage rate was 13.5%.

  A photocurable composition containing a fluorine-containing polymer (C) having a specific structure, a photocurable compound (A) and a photocuring initiator (B) according to the present invention is used as an adhesive for bonding substrates. Thus, it becomes possible to produce a laminated structure free from warping and distortion without causing curing shrinkage of the photocurable composition. In addition, the photocurable composition has high transparency and can be applied to applications that require light transmission, and can be applied to various related members such as information, electronics, optics, and medicine.

11 First base material 12 Second base material 13 Adhesive layer 100 Laminated structure

Claims (10)

A first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, and adhesion for bonding the first base material and the second base material A laminated structure comprising layers,
The adhesive layer contains a photocurable compound (A), a photocuring initiator (B), and a fluorine-containing polymer (C) having a structural unit represented by the following general formula (1), and a mass ratio (A ) / (C) is a laminated structure formed by curing a photocurable composition having a range of 95/5 to 25/75 ,
The laminated structure in which the said photocurable compound (A) contains an epoxy compound and an oxetane compound .

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.) The laminated structure according to claim 1 ,
The first substrate is a film having an uneven structure on the surface, and the back surface of the film is in contact with the adhesive layer. The laminated structure according to claim 1, wherein the photocurable compound (A) is a cationically polymerizable ring-opening polymerizable compound. It contains a photocurable compound (A), a photocuring initiator (B), a fluorine-containing polymer (C) having a structural unit represented by the following general formula (1), and a solvent (D) that itself does not photocure. And the mass ratio (A) / (C) is in the range of 95/5 to 5/95, and the mass ratio [(A) + (C)] / (D) is 80/20 to 5/95. a photocurable composition,
The photocurable composition in which the photocurable compound (A) contains an epoxy compound and an oxetane compound .

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.) Contains a photocurable compound (A), a photocuring initiator (B), and a fluorine-containing polymer (C) having a structural unit represented by the following general formula (1), and a mass ratio (A) / (C) Is a photocurable composition in the range of 95/5 to 25/75 ,
The photocurable composition in which the photocurable compound (A) contains an epoxy compound and an oxetane compound .

(In Formula (1), R ^{1 to} R ⁴ are fluorine, a C 1-10 alkyl group containing fluorine, a C 1-10 alkoxy group containing fluorine, or a carbon number 2 containing fluorine. Or R ^{1 to} R ⁴ may be the same or different from each other, R ^{1 to} R ⁴ may be bonded to each other to form a ring structure, X is selected from CH ₂ or O.) 6. The photocurable composition according to claim 5 , which is substantially free of a solvent (D) that does not photocure itself. The photocurable composition according to any one of claims 4 to 6 , wherein the photocurable compound (A) is a cationically polymerizable ring-opening polymerizable compound. The photocurable composition according to any one of claims 4 to 6 , wherein the light transmittance at 300 nm during light irradiation is 50% / µm or more. A first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, and adhesion for bonding the first base material and the second base material A method for producing a laminated structure comprising a layer,
At least one of the first base material and the second base material provided in the laminated structure is a light-transmitting base material,
The manufacturing method of the laminated structure is as follows:
The application | coating process which apply | coats the photocurable composition of Claim 4 to the surface of at least any one among a said 1st base material and a said 2nd base material,
Heating the substrate coated with the photocurable composition to evaporate the solvent;
A laminating step of bonding the first base material and the second base material through the surface coated with the photocurable composition;
A light irradiation step of irradiating light through the substrate having the light transmission property;
The manufacturing method of a laminated structure characterized by including. A first base material composed of an inorganic material or an organic material, a second base material composed of an inorganic material or an organic material, and adhesion for bonding the first base material and the second base material A method for producing a laminated structure comprising a layer,
At least one of the first base material and the second base material provided in the laminated structure is a light-transmitting base material,
The manufacturing method of the laminated structure is as follows:
The application | coating process which apply | coats the photocurable composition of Claim 5 or 6 to the surface of at least any one among a said 1st base material and a said 2nd base material,
A laminating step of bonding the first base material and the second base material through the surface coated with the photocurable composition;
A light irradiation step of irradiating light through the substrate having the light transmission property;
The manufacturing method of a laminated structure characterized by including.

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