JP6354605B2 - X-ray analyzer - Google Patents

X-ray analyzer Download PDF

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JP6354605B2
JP6354605B2 JP2015010258A JP2015010258A JP6354605B2 JP 6354605 B2 JP6354605 B2 JP 6354605B2 JP 2015010258 A JP2015010258 A JP 2015010258A JP 2015010258 A JP2015010258 A JP 2015010258A JP 6354605 B2 JP6354605 B2 JP 6354605B2
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ray analyzer
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JP2016133480A (en
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隆雄 丸井
隆雄 丸井
哲弥 米田
哲弥 米田
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Shimadzu Corp
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Description

本発明は、試料の結晶構造に関する情報を取得するＸ線分析装置に関する。   The present invention relates to an X-ray analyzer that acquires information related to a crystal structure of a sample.

薄膜Ｘ線分析装置（Ｘ線回折装置）は、薄膜試料の表面中における所定照射領域に、平行化された（疑似平行な）特性Ｘ線を浅い角度で照射し、所定照射領域を中心として検出部を回転させることにより、特性Ｘ線により回折されて様々な角度に放出されるＸ線の強度を検出することによって、その薄膜試料の結晶構造に関する情報（Ｘ線回折プロファイル）を取得するものである（例えば、特許文献１参照）。   Thin-film X-ray analyzer (X-ray diffractometer) irradiates parallel (pseudo-parallel) characteristic X-rays at a shallow angle to a predetermined irradiation area in the surface of a thin film sample, and detects the predetermined irradiation area as the center. By rotating the part, the information about the crystal structure of the thin film sample (X-ray diffraction profile) is obtained by detecting the intensity of X-rays diffracted by characteristic X-rays and emitted at various angles. Yes (see, for example, Patent Document 1).

図３は、従来の薄膜Ｘ線分析装置の一例を示す概略構成図である。なお、紙面に水平な一方向をＸ方向とし、紙面に水平でＸ方向と垂直な方向をＹ方向とし、Ｘ方向とＹ方向とに垂直な方向をＺ方向とする。
薄膜Ｘ線分析装置１０１は、Ｘ線源部１０と、検出部２０と、試料固定機構１３０と、検出部２０を回転移動させる検出部移動機構４０と、薄膜Ｘ線分析装置１０１全体の制御を行うコンピュータ１５０とを備える。 FIG. 3 is a schematic configuration diagram showing an example of a conventional thin film X-ray analyzer. One direction horizontal to the paper surface is defined as the X direction, a direction horizontal to the paper surface and perpendicular to the X direction is defined as the Y direction, and a direction perpendicular to the X direction and the Y direction is defined as the Z direction.
The thin film X-ray analyzer 101 controls the X-ray source unit 10, the detector 20, the sample fixing mechanism 130, the detector moving mechanism 40 that rotates the detector 20, and the thin film X-ray analyzer 101 as a whole. And a computer 150 for performing.

図４は試料固定機構１３０の一例を示す図であって、図４（ａ）は平面図、図４（ｂ）は断面図である。
試料固定機構１３０は、薄膜試料Ｓが上面に載置される試験台１３１と、吸引ポンプ１３２とを有する。
試験台１３１は、例えば、直径８０ｍｍ、厚さ１０ｍｍの円板体であり、その上面には直径６０ｍｍ、幅２ｍｍ、深さ１ｍｍの円環形状の第一吸引溝１３１ａと、直径３０ｍｍ、幅２ｍｍ、深さ１ｍｍの円環形状の第二吸引溝１３１ｂとが形成されている。また、第一吸引溝１３１ａの底面の一部と下面とを連結するように上下方向に貫通した流路となる直径２ｍｍの円管形状の第一吸引口１３１ｃと、第二吸引溝１３１ｂの底面の一部と下面とを連結するように上下方向に貫通した流路となる直径２ｍｍの円管形状の第二吸引口１３１ｄとが形成されている。 4A and 4B are diagrams illustrating an example of the sample fixing mechanism 130, in which FIG. 4A is a plan view and FIG. 4B is a cross-sectional view.
The sample fixing mechanism 130 includes a test stand 131 on which the thin film sample S is placed on the upper surface, and a suction pump 132.
The test stand 131 is, for example, a disc having a diameter of 80 mm and a thickness of 10 mm, and an annular first suction groove 131a having a diameter of 60 mm, a width of 2 mm, and a depth of 1 mm, and a diameter of 30 mm and a width of 2 mm. An annular second suction groove 131b having a depth of 1 mm is formed. In addition, a circular pipe-shaped first suction port 131c having a diameter of 2 mm and a bottom surface of the second suction groove 131b that forms a flow path penetrating in the vertical direction so as to connect a part of the bottom surface of the first suction groove 131a and the lower surface. A circular tube-shaped second suction port 131d having a diameter of 2 mm is formed as a flow path penetrating in the vertical direction so as to connect a part of the first and lower surfaces.

吸引ポンプ１３２は、第一吸引口１３１ｃと第二吸引口１３１ｄとに接続されている。これにより、試験台１３１の上面に薄膜試料Ｓを載置、すなわち図４（ａ）に示すように第一吸引溝１３１ａの上方全面と第二吸引溝１３１ｂの上方全面に薄膜試料Ｓが配置された後、吸引ポンプ１３２で空気を吸引すると、第一吸引溝１３１ａ内と第二吸引溝１３１ｂ内とが略真空となり、その結果、薄膜試料Ｓが試験台１３１の上面に固定される。   The suction pump 132 is connected to the first suction port 131c and the second suction port 131d. As a result, the thin film sample S is placed on the upper surface of the test bench 131, that is, as shown in FIG. 4A, the thin film sample S is disposed on the entire upper surface of the first suction groove 131a and the entire upper surface of the second suction groove 131b. After that, when air is sucked by the suction pump 132, the inside of the first suction groove 131a and the second suction groove 131b are substantially vacuumed, and as a result, the thin film sample S is fixed to the upper surface of the test table 131.

Ｘ線源部１０は、図示は省略するが、Ｘ線管（例えば、ラインフォーカスのＸ線管球）を備え、Ｘ線管の内部には陽極であるターゲットと陰極であるフィラメントとが配置されている。これにより、ターゲットとフィラメントとの間に高電圧を印加することで、フィラメントから放射された熱電子をターゲットに衝突させて、ターゲットで発生した特性Ｘ線を出射するようになっている。そして、Ｘ線源部１０は、試験台１３１に対してＸ線の入射角度が例えば３°となるように固定されており、疑似平行な特性Ｘ線が薄膜試料Ｓの上面中の所定照射領域（例えば１９ｍｍ×１５ｍｍの長方形状）に照射されるようになっている。   Although not shown, the X-ray source unit 10 includes an X-ray tube (for example, a line-focus X-ray tube), and an anode target and a cathode filament are arranged inside the X-ray tube. ing. Thereby, by applying a high voltage between the target and the filament, the thermoelectrons emitted from the filament collide with the target and emit characteristic X-rays generated at the target. The X-ray source unit 10 is fixed so that the incident angle of X-rays is 3 °, for example, with respect to the test table 131, and the quasi-parallel characteristic X-rays are in a predetermined irradiation region in the upper surface of the thin film sample S. (For example, a rectangular shape of 19 mm × 15 mm) is irradiated.

検出部２０は、ソーラースリット２１と、１個（１ｃｈ）の検出素子からなるＸ線検出器２２とを備える。これにより、検出素子からＸ線強度Ｉがコンピュータ１５０に出力されるようになっている。
そして、検出部２０は、検出部移動機構４０によって試験台１３１上面の中心を通るＹ方向を回転軸として回転させられるようになっている。つまり、検出部２０は試験台１３１上面に対する角度αが変化するように配置されている。これにより、試験台１３１に載置された薄膜試料Ｓから様々な角度αｎに放出されるＸ線強度Ｉｎが検出されることで、その薄膜試料Ｓの結晶構造に関する情報（Ｘ線回折プロファイル）が得られるようになっている。 The detection unit 20 includes a solar slit 21 and an X-ray detector 22 including one (1ch) detection element. Thereby, the X-ray intensity I is output from the detection element to the computer 150.
The detection unit 20 can be rotated by the detection unit moving mechanism 40 with the Y direction passing through the center of the top surface of the test table 131 as a rotation axis. That is, the detector 20 is arranged so that the angle α with respect to the upper surface of the test bench 131 changes. Thus, various angles α released into n X-ray intensity I n that is detected, the information (X-ray diffraction profile for the crystal structure of the film sample S of a thin film sample S placed on the test stand 131 ) Can be obtained.

このような薄膜Ｘ線分析装置１０１を用いて測定を行う際には、まず、測定者（ユーザ）が薄膜試料Ｓを試験台１３１の上面に載置する。次に、吸引ポンプ１３２で空気を吸引して薄膜試料Ｓを試験台１３１の上面に貼り付ける。次に、Ｘ線源部１０のＸ線管から出射された特性Ｘ線を薄膜試料Ｓ上面中の所定照射領域に照射する。そして、第一の配置角度α１に配置された検出部２０において、Ｘ線検出器２２の１個（１ｃｈ）の検出素子がＸ線強度Ｉ１を検出する。その後、同様に検出部２０が検出部移動機構４０によって第二の配置角度α２に配置され、１個（１ｃｈ）の検出素子がＸ線強度Ｉ２を検出する。このようにして、検出部２０が検出部移動機構４０によって様々な配置角度αｎに配置されるごとに、Ｘ線検出器２２の１個（１ｃｈ）の検出素子がＸ線強度Ｉｎを検出していく。 When performing measurement using such a thin film X-ray analyzer 101, first, a measurer (user) places the thin film sample S on the upper surface of the test table 131. Next, the thin film sample S is attached to the upper surface of the test bench 131 by sucking air with the suction pump 132. Next, characteristic X-rays emitted from the X-ray tube of the X-ray source unit 10 are irradiated to a predetermined irradiation region in the upper surface of the thin film sample S. Then, the detection unit 20 arranged in the first arrangement angle alpha 1, the detection elements of a single X-ray detector 22 (1ch) detects X-ray intensity I 1. Thereafter, the same detection unit 20 is arranged by the detection unit moving mechanism 40 in the second arrangement angle alpha 2, the detection device 1 (1ch) detects X-ray intensity I 2. In this way, each time the detection unit 20 are arranged in various arrangement angle alpha n by the detecting unit moving mechanism 40, the detection elements of a single X-ray detector 22 (1ch) is detecting X-ray intensity I n I will do it.

特開平１０−１８５８４４号公報Japanese Patent Laid-Open No. 10-185844

しかしながら、上述したような薄膜Ｘ線分析装置１０１では、薄膜試料Ｓを試験台１３１の上面へ載置する際に、薄膜試料Ｓのサイズが小さすぎる、すなわち第一吸引溝１３１ａの上方全面や第二吸引溝１３１ｂの上方全面に薄膜試料Ｓが配置されないときには、吸引ポンプ１３２で吸引しても第一吸引溝１３１ａ内や第二吸引溝１３１ｂ内が真空とならず、薄膜試料Ｓがうまく固定されないという問題点があった。   However, in the thin film X-ray analyzer 101 as described above, when the thin film sample S is placed on the upper surface of the test bench 131, the size of the thin film sample S is too small, that is, the entire upper surface of the first suction groove 131a or the second When the thin film sample S is not disposed on the entire upper surface of the second suction groove 131b, the first suction groove 131a and the second suction groove 131b are not evacuated even if suction is performed by the suction pump 132, and the thin film sample S is not fixed well. There was a problem.

また、薄膜試料Ｓが薄すぎるときには、吸引ポンプ１３２での吸引時に薄膜試料Ｓが第一吸引溝１３１ａや第二吸引溝１３１ｂの内部に引き込まれ、薄膜試料Ｓが波状、すなわち薄膜試料Ｓの上面が撓むという問題点もあった。
さらに、薄膜試料Ｓのサイズが大きすぎるときには、薄膜試料Ｓの四隅部等が曲がることがあった。
そこで、本発明は、薄膜試料の大きさや薄さに関係なく薄膜試料を試験台の上面にしっかり固定することができるＸ線分析装置を提供することを目的とする。 When the thin film sample S is too thin, the thin film sample S is drawn into the first suction groove 131a and the second suction groove 131b during suction by the suction pump 132, and the thin film sample S is wavy, that is, the upper surface of the thin film sample S. There was also a problem of bending.
Further, when the size of the thin film sample S is too large, the four corners of the thin film sample S may be bent.
Therefore, an object of the present invention is to provide an X-ray analyzer that can firmly fix a thin film sample to the upper surface of a test table regardless of the size and thinness of the thin film sample.

上記課題を解決するためになされた本発明のＸ線分析装置は、試料が上面に載置される試験台を有する試料固定機構と、前記試料の所定照射領域に特性Ｘ線を照射するＸ線源部と、前記試料の所定照射領域から反射されたＸ線強度を検出する検出部とを備えるＸ線分析装置であって、前記試料固定機構は、前記試料の上面に空気を吹き付ける吹付機構を有するようにしている。   An X-ray analyzer of the present invention made to solve the above-described problems includes a sample fixing mechanism having a test stand on which a sample is placed on an upper surface, and X-rays that irradiate a predetermined irradiation region of the sample with characteristic X-rays. An X-ray analysis apparatus comprising a source unit and a detection unit that detects an X-ray intensity reflected from a predetermined irradiation region of the sample, wherein the sample fixing mechanism includes a spraying mechanism that blows air onto an upper surface of the sample To have.

ここで、「所定照射領域」とは、Ｘ線源部によって決定されるものであり、設計者や測定者（ユーザ）等によって任意に決められる。   Here, the “predetermined irradiation region” is determined by the X-ray source unit, and is arbitrarily determined by a designer, a measurer (user), or the like.

本発明のＸ線分析装置によれば、例えば、まず、ユーザが薄膜試料を試験台の上面に載置する。次に、薄膜試料の上面に空気を吹き付けて薄膜試料を試験台の上面に固定する。そして、Ｘ線源部から出射された特性Ｘ線を薄膜試料上面中の所定照射領域に照射し、検出部がＸ線強度を検出する。   According to the X-ray analysis apparatus of the present invention, for example, first, a user places a thin film sample on the upper surface of a test bench. Next, air is blown onto the upper surface of the thin film sample to fix the thin film sample to the upper surface of the test table. And the characteristic X-ray radiate | emitted from the X-ray source part is irradiated to the predetermined irradiation area | region in a thin film sample upper surface, and a detection part detects X-ray intensity.

以上のように、本発明のＸ線分析装置によれば、薄膜試料のサイズに関係なく薄膜試料を試験台の上面にしっかり固定することができる。また、試験台上には吸引口や吸引溝がないため、薄膜試料が波打ったり曲がったりするようなことがない。   As described above, according to the X-ray analyzer of the present invention, the thin film sample can be firmly fixed to the upper surface of the test table regardless of the size of the thin film sample. Further, since there is no suction port or suction groove on the test bench, the thin film sample does not wavy or bend.

（他の課題を解決するための手段および効果）
また、本発明のＸ線分析装置は、前記吹付機構は、前記試料の上面の中央部に空気を吹き付ける吹付口を有するようにしてもよい。 (Means and effects for solving other problems)
In the X-ray analysis apparatus of the present invention, the spray mechanism may have a spray port for spraying air on a central portion of the upper surface of the sample.

本発明の実施形態に係る薄膜Ｘ線分析装置の一例を示す概略構成図。1 is a schematic configuration diagram showing an example of a thin film X-ray analyzer according to an embodiment of the present invention. 本発明の実施形態に係る試料固定機構の一例を示す図。The figure which shows an example of the sample fixing mechanism which concerns on embodiment of this invention. 従来の薄膜Ｘ線分析装置の一例を示す概略構成図。The schematic block diagram which shows an example of the conventional thin film X-ray analyzer. 従来の薄膜Ｘ線分析装置に係る試料固定機構の一例を示す図。The figure which shows an example of the sample fixing mechanism which concerns on the conventional thin film X-ray analyzer.

以下、本発明の実施形態について図面を用いて説明する。なお、本発明は、以下に説明するような実施形態に限定されるものではなく、本発明の趣旨を逸脱しない領域で種々の態様が含まれることはいうまでもない。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the present invention is not limited to the embodiments described below, and it is needless to say that various aspects are included in a region that does not depart from the spirit of the present invention.

図１は、本発明の実施形態に係る薄膜Ｘ線分析装置の一例を示す概略構成図である。なお、上述した薄膜Ｘ線分析装置１０１と同様のものについては同じ符号を付している。
薄膜Ｘ線分析装置１は、Ｘ線源部１０と、検出部２０と、試料固定機構３０と、検出部２０を回転移動させる検出部移動機構４０と、薄膜Ｘ線分析装置１全体の制御を行うコンピュータ５０とを備える。 FIG. 1 is a schematic configuration diagram showing an example of a thin film X-ray analyzer according to an embodiment of the present invention. In addition, the same code | symbol is attached | subjected about the thing similar to the thin film X-ray analyzer 101 mentioned above.
The thin film X-ray analyzer 1 controls the X-ray source unit 10, the detector 20, the sample fixing mechanism 30, the detector moving mechanism 40 that rotates the detector 20, and the thin film X-ray analyzer 1 as a whole. And a computer 50 for performing.

図２は試料固定機構３０の一例を示す図であって、図２（ａ）は試験台３１の一例を示す平面図であり、図２（ｂ）は試料固定機構３０全体の構成例を示す断面図である。
試料固定機構３０は、薄膜試料Ｓが上面に載置される試験台３１と、排出ポンプ３２と、吹付機構３３とを有する。
試験台３１は、例えば、直径６０ｍｍ、厚さ１０ｍｍの円板体である。つまり、その上面には吸引口や吸引溝は形成されておらず、図２（ａ）に示すように平面となっている。 FIG. 2 is a diagram illustrating an example of the sample fixing mechanism 30, FIG. 2A is a plan view illustrating an example of the test table 31, and FIG. 2B illustrates a configuration example of the entire sample fixing mechanism 30. It is sectional drawing.
The sample fixing mechanism 30 includes a test table 31 on which the thin film sample S is placed on the upper surface, a discharge pump 32, and a spraying mechanism 33.
The test stand 31 is, for example, a disc having a diameter of 60 mm and a thickness of 10 mm. That is, no suction port or suction groove is formed on the upper surface, and it is a flat surface as shown in FIG.

吹付機構３３は、例えば上下方向（Ｚ方向）に貫通した直径ｒ１（例えば３ｍｍ）の流路を有する円管体であり、その末端部が直径ｒ２（例えば２５ｍｍ）の吹付口３３ａとなっている。また、吹付機構３３の下端部には、中心から外周方向に突出する突出部３３ｂが形成されており、吹付機構３３の流路は下方に向けて末広がりのテーパ形状（例えば角度θ３０°）となっている。そして、吹付機構３３の底面は、試験台３１の上面から上方（Ｚ方向）に距離ｈ（例えば５ｍｍ）離隔した位置に配置されるとともに、吹付機構３３の中心軸Ｌは、試験台３１の中心と一致するように配置されている。
なお、直径ｒ１、ｒ２や角度θは、所定照射領域に基づいて設計者等によって任意に決定され、また、距離ｈは、所定照射領域に基づいて設計者や測定者（ユーザ）等によって任意に決定される。 The spray mechanism 33 is, for example, a circular pipe body having a flow path having a diameter r 1 (for example, 3 mm) penetrating in the vertical direction (Z direction), and a terminal portion thereof is a spray port 33a having a diameter r 2 (for example, 25 mm). ing. In addition, a projecting portion 33b is formed at the lower end portion of the spray mechanism 33 so as to project from the center in the outer peripheral direction, and the flow path of the spray mechanism 33 has a tapered shape (for example, an angle θ30 °) that spreads downward. ing. The bottom surface of the spray mechanism 33 is disposed at a position spaced apart from the top surface of the test table 31 by a distance h (for example, 5 mm), and the central axis L of the spray mechanism 33 is the center of the test table 31. Are arranged to match.
The diameters r 1 , r 2 and the angle θ are arbitrarily determined by a designer or the like based on a predetermined irradiation area, and the distance h is determined by a designer or a measurer (user) based on the predetermined irradiation area. Determined arbitrarily.

排出ポンプ３２は、吹付機構３３の上端部に接続されている。これにより、試験台３１の上面に薄膜試料Ｓを載置、すなわち吹付口３３ａの下方に薄膜試料Ｓが配置された後、図２（ｂ）に示すように排出ポンプ３２が薄膜試料Ｓ上面の中央部に上方から空気を吹き付け、空気が周方向に流通することで、薄膜試料Ｓが試験台３１の上面に固定される。   The discharge pump 32 is connected to the upper end portion of the spray mechanism 33. Thus, after the thin film sample S is placed on the upper surface of the test table 31, that is, after the thin film sample S is disposed below the spray port 33a, the discharge pump 32 is placed on the upper surface of the thin film sample S as shown in FIG. The thin film sample S is fixed to the upper surface of the test bench 31 by blowing air from above to the center and circulating the air in the circumferential direction.

このような薄膜Ｘ線分析装置１を用いて測定を行う際には、まず、測定者（ユーザ）が薄膜試料Ｓを試験台３１の上面に載置する。次に、薄膜試料Ｓ上面の中央部に吹付口３３ａから空気を吹き付け、吹付機構３３の突出部３３ｂの下面と薄膜試料Ｓの上面との間に空気を流通させて薄膜試料Ｓを試験台３１の上面に固定する。次に、Ｘ線源部１０のＸ線管から出射された特性Ｘ線を薄膜試料Ｓ上面中の所定照射領域に照射する。そして、第一の配置角度α１に配置された検出部２０において、Ｘ線検出器２２の１個（１ｃｈ）の検出素子がＸ線強度Ｉ１を検出する。その後、検出部２０が検出部移動機構４０によって第二の配置角度α２に配置され、１個（１ｃｈ）の検出素子がＸ線強度Ｉ２を検出する。このようにして、検出部２０が検出部移動機構４０によって様々な配置角度αｎに配置されるごとに、Ｘ線検出器２２の１個（１ｃｈ）の検出素子がＸ線強度Ｉｎを検出していく。 When performing measurement using such a thin film X-ray analyzer 1, first, a measurer (user) places the thin film sample S on the upper surface of the test table 31. Next, air is blown from the spray port 33a to the center of the upper surface of the thin film sample S, and air is circulated between the lower surface of the projecting portion 33b of the spray mechanism 33 and the upper surface of the thin film sample S, and the thin film sample S is placed on the test table 31. Fasten to the top of the. Next, characteristic X-rays emitted from the X-ray tube of the X-ray source unit 10 are irradiated to a predetermined irradiation region in the upper surface of the thin film sample S. Then, the detection unit 20 arranged in the first arrangement angle alpha 1, the detection elements of a single X-ray detector 22 (1ch) detects X-ray intensity I 1. Thereafter, the detection unit 20 is arranged by the detection unit moving mechanism 40 in the second arrangement angle alpha 2, the detection device 1 (1ch) detects X-ray intensity I 2. In this way, each time the detection unit 20 are arranged in various arrangement angle alpha n by the detecting unit moving mechanism 40, the detection elements of a single X-ray detector 22 (1ch) is detecting X-ray intensity I n I will do it.

以上のように、本発明の薄膜Ｘ線分析装置１によれば、薄膜試料Ｓのサイズに関係なく薄膜試料Ｓを試験台３１の上面にしっかり固定することができる。また、試験台３１上には吸引口や吸引溝がないため、薄膜試料Ｓが波打ったり曲がったりすることもない。   As described above, according to the thin film X-ray analyzer 1 of the present invention, the thin film sample S can be firmly fixed to the upper surface of the test table 31 regardless of the size of the thin film sample S. Further, since there is no suction port or suction groove on the test bench 31, the thin film sample S will not be waved or bent.

＜他の実施形態＞
（１）上述した薄膜Ｘ線分析装置１では、吹付機構３３として１個の吹付口３３ａを有する構成を示したが、複数個の吹付口を有する構成としてもよい。 <Other embodiments>
(1) In the thin film X-ray analyzer 1 described above, the structure having one spraying port 33a as the spraying mechanism 33 is shown, but a structure having a plurality of spraying ports may be used.

（２）また、上述した実施形態では薄膜Ｘ線分析装置１に適用した際の構成を示したが、これに代えて蛍光Ｘ線分析装置やＸ線吸収スペクトル測定装置としてもよい。 (2) Moreover, although the structure at the time of applying to the thin film X-ray analyzer 1 was shown in embodiment mentioned above, it is good also as a fluorescent X-ray analyzer and an X-ray absorption spectrum measuring device instead of this.

本発明は、試料中に含まれる元素の情報を取得するＸ線分析装置等に利用することができる。   The present invention can be used for an X-ray analyzer or the like that acquires information on elements contained in a sample.

１ 薄膜Ｘ線分析装置
１０ Ｘ線源部
２０ 検出部
３０ 試料固定機構
３１ 試験台
３３ 吹付機構
４０ 検出部移動機構 DESCRIPTION OF SYMBOLS 1 Thin film X-ray-analysis apparatus 10 X-ray source part 20 Detection part 30 Sample fixing mechanism 31 Test stand 33 Spraying mechanism 40 Detection part moving mechanism

Claims (2)

試料が上面に載置される試験台を有する試料固定機構と、
前記試料の所定照射領域に特性Ｘ線を照射するＸ線源部と、
前記試料の所定照射領域から反射されたＸ線強度を検出する検出部とを備えるＸ線分析装置であって、
前記試料固定機構は、前記試料の上面に空気を吹き付ける吹付機構を有することを特徴とするＸ線分析装置。 A sample fixing mechanism having a test table on which the sample is placed on the upper surface;
An X-ray source unit that irradiates a predetermined irradiation region of the sample with characteristic X-rays;
An X-ray analyzer comprising: a detection unit that detects an X-ray intensity reflected from a predetermined irradiation region of the sample;
The X-ray analyzer according to claim 1, wherein the sample fixing mechanism has a spraying mechanism that blows air onto an upper surface of the sample. 前記吹付機構は、前記試料の上面の中央部に空気を吹き付ける吹付口を有することを特徴とする請求項１に記載のＸ線分析装置。   The X-ray analyzer according to claim 1, wherein the spray mechanism has a spray port for spraying air to a central portion of the upper surface of the sample.
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