JP6338007B1 - Flux and solder paste - Google Patents
Flux and solder paste Download PDFInfo
- Publication number
- JP6338007B1 JP6338007B1 JP2017212941A JP2017212941A JP6338007B1 JP 6338007 B1 JP6338007 B1 JP 6338007B1 JP 2017212941 A JP2017212941 A JP 2017212941A JP 2017212941 A JP2017212941 A JP 2017212941A JP 6338007 B1 JP6338007 B1 JP 6338007B1
- Authority
- JP
- Japan
- Prior art keywords
- acid
- hydrogenated
- dimer
- flux
- trimer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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- 230000004907 flux Effects 0.000 title claims abstract description 69
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 44
- 239000000539 dimer Substances 0.000 claims abstract description 92
- 239000013638 trimer Substances 0.000 claims abstract description 82
- 150000004985 diamines Chemical class 0.000 claims abstract description 28
- 239000012190 activator Substances 0.000 claims abstract description 12
- 150000001412 amines Chemical class 0.000 claims description 75
- 239000007795 chemical reaction product Substances 0.000 claims description 47
- 239000002253 acid Substances 0.000 claims description 37
- CFQZKFWQLAHGSL-FNTYJUCDSA-N (3e,5e,7e,9e,11e,13e,15e,17e)-18-[(3e,5e,7e,9e,11e,13e,15e,17e)-18-[(3e,5e,7e,9e,11e,13e,15e)-octadeca-3,5,7,9,11,13,15,17-octaenoyl]oxyoctadeca-3,5,7,9,11,13,15,17-octaenoyl]oxyoctadeca-3,5,7,9,11,13,15,17-octaenoic acid Chemical compound OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\OC(=O)C\C=C\C=C\C=C\C=C\C=C\C=C\C=C\C=C CFQZKFWQLAHGSL-FNTYJUCDSA-N 0.000 claims description 23
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 claims description 21
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 claims description 21
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 claims description 21
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims description 18
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims description 18
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 claims description 18
- 239000005642 Oleic acid Substances 0.000 claims description 18
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims description 18
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 claims description 18
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 14
- 150000007524 organic acids Chemical class 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 11
- OYHQOLUKZRVURQ-HZJYTTRNSA-N Linoleic acid Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(O)=O OYHQOLUKZRVURQ-HZJYTTRNSA-N 0.000 claims description 10
- 235000020778 linoleic acid Nutrition 0.000 claims description 10
- OYHQOLUKZRVURQ-IXWMQOLASA-N linoleic acid Natural products CCCCC\C=C/C\C=C\CCCCCCCC(O)=O OYHQOLUKZRVURQ-IXWMQOLASA-N 0.000 claims description 10
- 239000013008 thixotropic agent Substances 0.000 claims description 9
- 150000002896 organic halogen compounds Chemical class 0.000 claims description 8
- 239000003963 antioxidant agent Substances 0.000 claims description 7
- 239000002518 antifoaming agent Substances 0.000 claims description 6
- 230000003078 antioxidant effect Effects 0.000 claims description 6
- 230000001629 suppression Effects 0.000 description 47
- 238000001556 precipitation Methods 0.000 description 34
- 230000000694 effects Effects 0.000 description 33
- 238000005476 soldering Methods 0.000 description 15
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 11
- 239000000047 product Substances 0.000 description 11
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 10
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 229960004488 linolenic acid Drugs 0.000 description 10
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 10
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- -1 2-ethylhexyl Chemical group 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000376 reactant Substances 0.000 description 5
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000004678 hydrides Chemical class 0.000 description 3
- FTQWRYSLUYAIRQ-UHFFFAOYSA-N n-[(octadecanoylamino)methyl]octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NCNC(=O)CCCCCCCCCCCCCCCCC FTQWRYSLUYAIRQ-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 150000004671 saturated fatty acids Chemical class 0.000 description 3
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 3
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 3
- 238000012795 verification Methods 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- YZAZXIUFBCPZGB-QZOPMXJLSA-N (z)-octadec-9-enoic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O.CCCCCCCC\C=C/CCCCCCCC(O)=O YZAZXIUFBCPZGB-QZOPMXJLSA-N 0.000 description 2
- ULQISTXYYBZJSJ-UHFFFAOYSA-N 12-hydroxyoctadecanoic acid Chemical compound CCCCCCC(O)CCCCCCCCCCC(O)=O ULQISTXYYBZJSJ-UHFFFAOYSA-N 0.000 description 2
- GLDQAMYCGOIJDV-UHFFFAOYSA-N 2,3-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1O GLDQAMYCGOIJDV-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- IJFXRHURBJZNAO-UHFFFAOYSA-N 3-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 2
- XQXPVVBIMDBYFF-UHFFFAOYSA-N 4-hydroxyphenylacetic acid Chemical compound OC(=O)CC1=CC=C(O)C=C1 XQXPVVBIMDBYFF-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- 229910017944 Ag—Cu Inorganic materials 0.000 description 2
- QEVGZEDELICMKH-UHFFFAOYSA-N Diglycolic acid Chemical compound OC(=O)COCC(O)=O QEVGZEDELICMKH-UHFFFAOYSA-N 0.000 description 2
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
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- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- WJJMNDUMQPNECX-UHFFFAOYSA-N dipicolinic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- CBFCDTFDPHXCNY-UHFFFAOYSA-N icosane Chemical compound CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 description 2
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- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
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Landscapes
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Abstract
【課題】活性剤成分を難揮発性としたフラックス及びフラックスを用いたソルダペーストを提供する。【解決手段】フラックスは、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンのいずれか、あるいは、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を含む。【選択図】無しProvided are a flux in which an activator component is hardly volatile, and a solder paste using the flux. The flux includes dimer diamine, trimer triamine, hydrogenated dimer diamine, or hydrogenated trimer triamine, or two or more of dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine. [Selection figure] None
Description
本発明は、はんだ付けに用いられるフラックス及びこのフラックスを用いたソルダペーストに関する。 The present invention relates to a flux used for soldering and a solder paste using the flux.
一般的に、はんだ付けに用いられるフラックスは、はんだ及びはんだ付けの対象となる接合対象物の金属表面に存在する金属酸化物を化学的に除去し、両者の境界で金属元素の移動を可能にする効能を持つ。このため、フラックスを使用してはんだ付けを行うことで、はんだと接合対象物の金属表面との間に金属間化合物が形成できるようになり、強固な接合が得られる。 In general, the flux used for soldering chemically removes metal oxides present on the metal surface of the solder and the object to be soldered, and enables movement of metal elements at the boundary between the two. Has the effect of For this reason, by performing soldering using a flux, an intermetallic compound can be formed between the solder and the metal surface of the object to be joined, and a strong joint can be obtained.
ソルダペーストは、はんだ合金の粉末とフラックスとを混合させて得られた複合材料である。ソルダペーストを使用したはんだ付けは、基板の電極等のはんだ付け部にソルダペーストが印刷され、ソルダペーストが印刷されたはんだ付け部に部品が搭載され、リフロー炉と称される加熱炉で基板を加熱してはんだを溶融させて、はんだ付けが行われる。 The solder paste is a composite material obtained by mixing a solder alloy powder and a flux. Soldering using solder paste is performed by printing the solder paste on the soldering part such as the electrodes of the board, mounting the parts on the soldering part printed with the solder paste, and then using a heating furnace called a reflow furnace to mount the board. Soldering is performed by melting the solder by heating.
フラックスは、固形の成分と、固形の成分を溶かす溶剤等で構成されているが、はんだ付け時の加熱でフラックス中の溶剤成分等が揮発する。 The flux is composed of a solid component and a solvent that dissolves the solid component, and the solvent component in the flux is volatilized by heating during soldering.
はんだ付け時の加熱でフラックス中の溶剤成分等が揮発すると、気体のフラックスヒュームが発生し、このフラックスヒュームがリフロー炉内の壁面や冷却ゾーン等の加熱時より温度が低くなっている場所に付着して液状化する。 When the solvent component in the flux volatilizes due to heating during soldering, gaseous flux fume is generated, and this flux fume adheres to places where the temperature is lower than that during heating, such as the walls in the reflow furnace and the cooling zone. To liquefy.
このように、リフロー炉内にフラックスが揮発した成分が付着して液状化すると、リフロー炉内を搬送される製品に滴下する虞があるため、定期的な清掃作業が必要となる。そこで、溶剤の揮発を抑制したフラックスが提案されている(例えば、特許文献1参照)。 As described above, when the component in which the flux is volatilized adheres to the reflow furnace and becomes liquefied, there is a possibility of dripping onto the product conveyed in the reflow furnace, so that a regular cleaning operation is required. Therefore, a flux that suppresses volatilization of the solvent has been proposed (see, for example, Patent Document 1).
フラックス中の溶剤成分は、適宜揮発性を調製可能であり、加えてリフロー炉内部の金属成分へのダメージは比較的少ない。これに対し、フラックス中の活性剤成分は、はんだ表面の酸化膜を除去する活性を有するとともに、リフロー炉内部等の金属表面への活性も有するため、溶剤の揮発を抑制したフラックスを使用しても、リフロー炉の洗浄頻度が多くなる。 The solvent component in the flux can be appropriately adjusted in volatility, and in addition, the damage to the metal component inside the reflow furnace is relatively small. On the other hand, the activator component in the flux has an activity to remove the oxide film on the solder surface and also has an activity on the metal surface such as the inside of the reflow furnace. However, the cleaning frequency of the reflow furnace increases.
本発明は、このような課題を解決するためなされたもので、活性剤成分を難揮発性としたフラックス及びフラックスを用いたソルダペーストを提供することを目的とする。 The present invention has been made to solve such problems, and an object of the present invention is to provide a flux in which an activator component is hardly volatile and a solder paste using the flux.
ダイマー酸を変性させた反応物であるダイマージアミン、トリマー酸を変性させた反応物であるトリマートリアミンは、はんだ表面及び電極を構成する金属表面への活性を有し、かつ、はんだ付けで想定される温度域での難揮発性を有することを見出した。 Dimer amine, which is a reaction product obtained by modifying dimer acid, and trimer triamine, which is a reaction product obtained by modifying trimer acid, has activity on the solder surface and the metal surface constituting the electrode, and is assumed in soldering. It was found to have low volatility in a certain temperature range.
そこで、本発明は、ダイマージアミン、トリマートリアミン、ダイマージアミンに水素を添加した水添物である水添ダイマージアミンまたはトリマートリアミンに水素を添加した水添物である水添トリマートリアミンのいずれか、あるいは、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を含むフラックスである。 Therefore, the present invention is dimerized amine, trimer triamine, hydrogenated dimerized amine obtained by adding hydrogen to dimer amine, or hydrogenated trimer triamine which is hydrogenated product obtained by adding hydrogen to trimer triamine, or , Dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine.
本発明のフラックスは、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンのいずれか、あるいは、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を、合計で0.5wt%以上20wt%以下で含むことが好ましい。 The flux of the present invention includes dimer diamine, trimer triamine, hydrogenated dimer diamine or hydrogenated trimer triamine, or dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine in total. It is preferable to include 0.5 wt% or more and 20 wt% or less.
また、ダイマージアミンは、オレイン酸とリノール酸の反応物であるダイマー酸を変性させた反応物であり、トリマートリアミンは、オレイン酸とリノール酸の反応物であるトリマー酸を変性させた反応物であることが好ましい。 Dimeramine is a reaction product obtained by modifying dimer acid, which is a reaction product of oleic acid and linoleic acid. Trimer triamine is a reaction product obtained by modifying trimer acid, which is a reaction product of oleic acid and linoleic acid. Preferably there is.
更に、本発明のフラックスは、ロジンを30wt%以上60wt%以下、溶剤を29wt%以上60wt%以下で含むことが好ましい。また、活性剤としてさらに有機酸を0wt%以上15wt%以下、有機ハロゲン化合物を0wt%以上5wt%以下、アミンハロゲン化水素酸塩を0wt%以上5wt%以下、他のアミンを0wt%以上10wt%以下で含むことが好ましい。さらにチキソ剤を0wt%以上10wt%以下で含むことが好ましい。また、任意の添加剤としてさらに酸化防止剤を0wt%以上5wt%以下、消泡剤を0wt%以上5wt%以下で含むことが好ましい。 Furthermore, the flux of the present invention preferably contains rosin in an amount of 30 wt% to 60 wt% and a solvent in an amount of 29 wt% to 60 wt%. Further, as an activator, an organic acid is further added in an amount of 0 wt% to 15 wt%, an organic halogen compound is 0 wt% to 5 wt%, an amine hydrohalide is 0 wt% to 5 wt%, and other amines are 0 wt% to 10 wt%. It is preferable to include below. Furthermore, it is preferable to contain a thixotropic agent at 0 wt% or more and 10 wt% or less. Moreover, it is preferable to contain antioxidant 0 to 5 wt% and an antifoamer 0 to 5 wt% as optional additives.
また、本発明は、上述したフラックスと、金属粉を含むソルダペーストである。 Moreover, this invention is the solder paste containing the flux mentioned above and metal powder.
本発明では、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンのいずれか、あるいは、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を含むことで、熱負荷の大きい条件下でも、フラックス中の活性剤成分の揮発が抑制され、リフロー炉の内部に付着することを抑制することができる。よって、リフロー炉の洗浄頻度を低く抑えることができる。 In the present invention, either dimer amine, trimer triamine, hydrogenated dimer amine or hydrogenated trimer triamine, or two or more of dimer amine, trimer triamine, hydrogenated dimer amine, and hydrogenated trimer triamine are used. Even under a heavy load condition, volatilization of the activator component in the flux can be suppressed and adhesion to the inside of the reflow furnace can be suppressed. Therefore, the cleaning frequency of the reflow furnace can be kept low.
<本実施の形態のフラックスの一例>
本実施の形態のフラックスは、ダイマー酸を変性させた反応物であるダイマージアミン、トリマー酸を変性させた反応物であるトリマートリアミン、ダイマージアミンに水素を添加した水添物である水添ダイマージアミンまたはトリマートリアミンに水素を添加した水添物である水添トリマートリアミンのいずれか、あるいは、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を含む。
<Example of flux of this embodiment>
The flux of the present embodiment includes dimer amine, which is a reaction product obtained by modifying dimer acid, trimer triamine, which is a reaction product obtained by modifying trimer acid, and hydrogenated dimer amine, which is a hydrogenation product obtained by adding hydrogen to dimer amine. Alternatively, any of hydrogenated trimer triamines, which are hydrogenated products obtained by adding hydrogen to trimer triamine, or two or more of dimer amine, trimer triamine, hydrogenated dimer amine, and hydrogenated trimer triamine are included.
本実施の形態のダイマージアミンの原料となるダイマー酸は、オレイン酸とリノール酸の反応物で、炭素数が36の2量体である。また、本実施の形態トリマートリアミンの原料となるトリマー酸は、オレイン酸とリノール酸の反応物で、炭素数が54の3量体である。オレイン酸とリノール酸の反応物であるダイマー酸を変性させた反応物である本実施の形態のダイマージアミン及びオレイン酸とリノール酸の反応物であるトリマー酸を変性させた反応物である本実施の形態のトリマートリアミンは、はんだ付けで想定される温度域での難揮発性を有し、はんだ付け時に活性剤として機能する。 The dimer acid used as the raw material for the dimerized amine of the present embodiment is a reaction product of oleic acid and linoleic acid, and is a dimer having 36 carbon atoms. The trimer acid used as the raw material for the trimer triamine of the present embodiment is a reaction product of oleic acid and linoleic acid, and is a trimer having 54 carbon atoms. The present embodiment, which is a reaction product obtained by modifying dimer amine, which is a reaction product obtained by modifying dimer acid, which is a reaction product of oleic acid and linoleic acid, and a trimer acid, which is a reaction product of oleic acid and linoleic acid. The trimmertriamine in the form of has a low volatility in the temperature range assumed for soldering and functions as an activator during soldering.
ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの添加量が少ないと、揮発性の高い他の活性剤成分を添加する必要があり、難揮発性の効果が得られない。そこで、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンのいずれか、あるいは、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を、合計で0.5wt%以上20wt%以下含む。 When the addition amount of dimer amine, trimer triamine, hydrogenated dimer amine and hydrogenated trimer triamine is small, it is necessary to add another highly volatile activator component, and the hardly volatile effect cannot be obtained. Therefore, dimeramine, trimer triamine, hydrogenated dimer amine or hydrogenated trimer triamine, or two or more of dimer amine, trimer triamine, hydrogenated dimer amine and hydrogenated trimer triamine, in a total amount of 0.5 wt%. More than 20wt% is included.
また、本実施の形態のフラックスは、ロジンを30wt%以上60wt%以下、有機酸を0wt%以上15wt%以下、より好ましくは、有機酸を0wt%以上10wt%以下、他のアミンを0wt%以上10wt%以下、有機ハロゲン化合物を0wt%以上5wt%以下、アミンハロゲン化水素酸塩を0wt%以上5wt%以下、溶剤を29wt%以上60wt%以下、チキソ剤を0wt%以上10wt%以下含む。更に、本実施の形態のフラックスは、酸化防止剤を0wt%以上5wt%以下、消泡剤を0wt%以上5wt%以下含む。なお、着色剤をさらに含んでも良い。 In addition, the flux of the present embodiment includes rosin of 30 wt% or more and 60 wt% or less, organic acid of 0 wt% or more and 15 wt% or less, more preferably organic acid of 0 wt% or more and 10 wt% or less, and other amines of 0 wt% or more. 10 wt% or less, organic halogen compound 0 wt% or more and 5 wt% or less, amine hydrohalide salt 0 wt% or more and 5 wt% or less, solvent 29 wt% or more and 60 wt% or less, and thixotropic agent 0 wt% or more and 10 wt% or less. Further, the flux of the present embodiment contains 0 wt% or more and 5 wt% or less of the antioxidant and 0 wt% or more and 5 wt% or less of the antifoaming agent. A colorant may be further included.
ロジンとしては、例えば、ガムロジン、ウッドロジン及びトール油ロジン等の原料ロジン、並びに該原料ロジンから得られる誘導体が挙げられる。該誘導体としては、例えば、精製ロジン、水添ロジン、不均化ロジン、重合ロジン、酸変性ロジン、フェノール変性ロジン及びα,β不飽和カルボン酸変性物(アクリル化ロジン、マレイン化ロジン、フマル化ロジン等)、並びに該重合ロジンの精製物、水素化物及び不均化物、並びに該α,β不飽和カルボン酸変性物の精製物、水素化物及び不均化物等が挙げられ、これらの1種または2種以上を使用することができる。 Examples of the rosin include raw material rosins such as gum rosin, wood rosin and tall oil rosin, and derivatives obtained from the raw rosin. Examples of the derivatives include purified rosin, hydrogenated rosin, disproportionated rosin, polymerized rosin, acid-modified rosin, phenol-modified rosin, and α, β-unsaturated carboxylic acid-modified products (acrylated rosin, maleated rosin, fumarized). Rosin, etc.), and purified, hydride and disproportionate of the polymerized rosin, and purified, hydride and disproportionate of the modified α, β unsaturated carboxylic acid, etc. Two or more types can be used.
有機酸としては、グルタル酸、アジピン酸、アゼライン酸、エイコサン二酸、クエン酸、グリコール酸、コハク酸、サリチル酸、ジグリコール酸、ジピコリン酸、ジブチルアニリンジグリコール酸、スベリン酸、セバシン酸、チオグリコール酸、テレフタル酸、ドデカン二酸、パラヒドロキシフェニル酢酸、ピコリン酸、フェニルコハク酸、フタル酸、フマル酸、マレイン酸、マロン酸、ラウリン酸、安息香酸、酒石酸、イソシアヌル酸トリス(2−カルボキシエチル)、グリシン、1,3−シクロヘキサンジカルボン酸、2,2−ビス(ヒドロキシメチル)プロピオン酸、2,2−ビス(ヒドロキシメチル)ブタン酸、2,3−ジヒドロキシ安息香酸、2,4−ジエチルグルタル酸、2−キノリンカルボン酸、3−ヒドロキシ安息香酸、リンゴ酸、p−アニス酸、ステアリン酸、12−ヒドロキシステアリン酸、オレイン酸、リノール酸、リノレン酸等が挙げられる。 Organic acids include glutaric acid, adipic acid, azelaic acid, eicosane diacid, citric acid, glycolic acid, succinic acid, salicylic acid, diglycolic acid, dipicolinic acid, dibutylaniline diglycolic acid, suberic acid, sebacic acid, thioglycol Acid, terephthalic acid, dodecanedioic acid, parahydroxyphenylacetic acid, picolinic acid, phenylsuccinic acid, phthalic acid, fumaric acid, maleic acid, malonic acid, lauric acid, benzoic acid, tartaric acid, tris (2-carboxyethyl) isocyanurate Glycine, 1,3-cyclohexanedicarboxylic acid, 2,2-bis (hydroxymethyl) propionic acid, 2,2-bis (hydroxymethyl) butanoic acid, 2,3-dihydroxybenzoic acid, 2,4-diethylglutaric acid 2-quinolinecarboxylic acid, 3-hydroxybenzoic acid, malic acid, - anisic acid, stearic acid, 12-hydroxystearic acid, oleic acid, linoleic acid, and linolenic acid.
また、有機酸としては、ダイマー酸、トリマー酸、ダイマー酸に水素を添加した水添物である水添ダイマー酸、トリマー酸に水素を添加した水添物である水添トリマー酸が挙げられる。 Examples of the organic acid include dimer acid, trimer acid, hydrogenated dimer acid which is a hydrogenated product obtained by adding hydrogen to dimer acid, and hydrogenated trimer acid which is a hydrogenated product obtained by adding hydrogen to trimer acid.
例えば、オレイン酸とリノール酸の反応物であるダイマー酸、オレイン酸とリノール酸の反応物であるトリマー酸、アクリル酸の反応物であるダイマー酸、アクリル酸の反応物であるトリマー酸、メタクリル酸の反応物であるダイマー酸、メタクリル酸の反応物であるトリマー酸、アクリル酸とメタクリル酸の反応物であるダイマー酸、アクリル酸とメタクリル酸の反応物であるトリマー酸、オレイン酸の反応物であるダイマー酸、オレイン酸の反応物であるトリマー酸、リノール酸の反応物であるダイマー酸、リノール酸の反応物であるトリマー酸、 リノレン酸の反応物であるダイマー酸、リノレン酸の反応物であるトリマー酸、アクリル酸とオレイン酸の反応物であるダイマー酸、アクリル酸とオレイン酸の反応物であるトリマー酸、アクリル酸とリノール酸の反応物であるダイマー酸、アクリル酸とリノール酸の反応物であるトリマー酸、アクリル酸とリノレン酸の反応物であるダイマー酸、アクリル酸とリノレン酸の反応物であるトリマー酸、メタクリル酸とオレイン酸の反応物であるダイマー酸、メタクリル酸とオレイン酸の反応物であるトリマー酸、メタクリル酸とリノール酸の反応物であるダイマー酸、メタクリル酸とリノール酸の反応物であるトリマー酸、メタクリル酸とリノレン酸の反応物であるダイマー酸、メタクリル酸とリノレン酸の反応物であるトリマー酸、オレイン酸とリノレン酸の反応物であるダイマー酸、オレイン酸とリノレン酸の反応物であるトリマー酸、リノール酸とリノレン酸の反応物であるダイマー酸、リノール酸とリノレン酸の反応物であるトリマー酸、上述した各ダイマー酸の水添物である水添ダイマー酸、上述した各トリマー酸の水添物である水添トリマー酸等が挙げられる。 For example, dimer acid which is a reaction product of oleic acid and linoleic acid, trimer acid which is a reaction product of oleic acid and linoleic acid, dimer acid which is a reaction product of acrylic acid, trimer acid which is a reaction product of acrylic acid, methacrylic acid Dimer acid, which is a reaction product of dimer acid, trimer acid which is a reaction product of methacrylic acid, dimer acid which is a reaction product of acrylic acid and methacrylic acid, trimer acid which is a reaction product of acrylic acid and methacrylic acid, and a reaction product of oleic acid Dimer acid, oleic acid reactant, trimer acid, linoleic acid reactant dimer acid, linoleic acid reactant trimer acid, linolenic acid reactant dimer acid, linolenic acid reactant A trimer acid, a dimer acid that is a reaction product of acrylic acid and oleic acid, a trimer acid that is a reaction product of acrylic acid and oleic acid, Dimer acid, which is a reaction product of crylic acid and linoleic acid, trimer acid, which is a reaction product of acrylic acid and linoleic acid, dimer acid which is a reaction product of acrylic acid and linolenic acid, and trimer which is a reaction product of acrylic acid and linolenic acid Dimer acid that is a reaction product of acid, methacrylic acid and oleic acid, trimer acid that is a reaction product of methacrylic acid and oleic acid, dimer acid that is a reaction product of methacrylic acid and linoleic acid, and a reaction product of methacrylic acid and linoleic acid Dimer acid, which is a reaction product of some trimer acid, methacrylic acid and linolenic acid, Trimer acid which is a reaction product of methacrylic acid and linolenic acid, Dimer acid which is a reaction product of oleic acid and linolenic acid, Reaction of oleic acid and linolenic acid Trimer acid that is a product, dimer acid that is a reaction product of linoleic acid and linolenic acid, and a reaction product of linoleic acid and linolenic acid Specific trimer acids, hydrogenated dimer acids that are hydrogenated products of the dimer acids described above, hydrogenated trimer acids that are the hydrogenated products of the trimer acids described above, and the like can be given.
他のアミンとしては、モノエタノールアミン、ジフェニルグアニジン、エチルアミン、トリエチルアミン、エチレンジアミン、トリエチレンテトラミン、2−メチルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、1,2−ジメチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、1−ベンジル−2−メチルイミダゾール、1−ベンジル−2−フェニルイミダゾール、1−シアノエチル−2−メチルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、1−シアノエチル−2−エチル−4−メチルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾリウムトリメリテイト、1−シアノエチル−2−フェニルイミダゾリウムトリメリテイト、2,4−ジアミノ−6−[2′−メチルイミダゾリル−(1′)]−エチル−s−トリアジン、2,4−ジアミノ−6−[2′−ウンデシルイミダゾリル−(1′)]−エチル−s−トリアジン、2,4−ジアミノ−6−[2′−エチル−4′−メチルイミダゾリル−(1′)]−エチル−s−トリアジン、2,4−ジアミノ−6−[2′−メチルイミダゾリル−(1′)]−エチル−s−トリアジンイソシアヌル酸付加物、2−フェニルイミダゾールイソシアヌル酸付加物、2−フェニル−4,5−ジヒドロキシメチルイミダゾール、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、2,3−ジヒドロ−1H−ピロロ[1,2−a]ベンズイミダゾール、1−ドデシル−2−メチル−3−ベンジルイミダゾリウムクロライド、2−メチルイミダゾリン、2−フェニルイミダゾリン、2,4−ジアミノ−6−ビニル−s−トリアジン、2,4−ジアミノ−6−ビニル−s−トリアジンイソシアヌル酸付加物、2,4−ジアミノ−6−メタクリロイルオキシエチル−s−トリアジン、エポキシ−イミダゾールアダクト、2−メチルベンゾイミダゾール、2−オクチルベンゾイミダゾール、2−ペンチルベンゾイミダゾール、2−(1−エチルペンチル)ベンゾイミダゾール、2−ノニルベンゾイミダゾール、2−(4−チアゾリル)ベンゾイミダゾール、ベンゾイミダゾール、2−(2′−ヒドロキシ−5′−メチルフェニル)ベンゾトリアゾール、2−(2′−ヒドロキシ−3′−tert−ブチル−5′−メチルフェニル)−5−クロロベンゾトリアゾール、2−(2′−ヒドロキシ−3′,5′−ジ−tert−アミルフェニル)ベンゾトリアゾール、2−(2′−ヒドロキシ−5′−tert−オクチルフェニル)ベンゾトリアゾール、2,2′−メチレンビス[6−(2H−ベンゾトリアゾール−2−イル)−4−tert−オクチルフェノール]、6−(2−ベンゾトリアゾリル)−4−tert−オクチル−6′−tert−ブチル−4′−メチル−2,2′−メチレンビスフェノール、1,2,3−ベンゾトリアゾール、1−[N,N−ビス(2−エチルヘキシル)アミノメチル]ベンゾトリアゾール、カルボキシベンゾトリアゾール、1−[N,N−ビス(2−エチルヘキシル)アミノメチル]メチルベンゾトリアゾール、2,2′−[[(メチル−1H−ベンゾトリアゾール−1−イル)メチル]イミノ]ビスエタノール、1−(1′,2′−ジカルボキシエチル)ベンゾトリアゾール、1−(2,3−ジカルボキシプロピル)ベンゾトリアゾール、1−[(2−エチルヘキシルアミノ)メチル]ベンゾトリアゾール、2,6−ビス[(1H−ベンゾトリアゾール−1−イル)メチル]−4−メチルフェノール、5−メチルベンゾトリアゾール、5−フェニルテトラゾール等が挙げられる。 Other amines include monoethanolamine, diphenylguanidine, ethylamine, triethylamine, ethylenediamine, triethylenetetramine, 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl -4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl 2-undecylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimer Tate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6- [2'-methylimidazolyl- (1 ')]-ethyl-s-triazine, 2,4-diamino-6 [2'-Undecylimidazolyl- (1 ')]-ethyl-s-triazine, 2,4-diamino-6- [2'-ethyl-4'-methylimidazolyl- (1')]-ethyl-s- Triazine, 2,4-diamino-6- [2'-methylimidazolyl- (1 ')]-ethyl-s-triazine isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl-4,5- Dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydro-1H-pyrrolo [1,2-a] benzimi Sol, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazoline, 2-phenylimidazoline, 2,4-diamino-6-vinyl-s-triazine, 2,4-diamino-6-vinyl -S-triazine isocyanuric acid adduct, 2,4-diamino-6-methacryloyloxyethyl-s-triazine, epoxy-imidazole adduct, 2-methylbenzimidazole, 2-octylbenzimidazole, 2-pentylbenzimidazole, 2- (1-ethylpentyl) benzimidazole, 2-nonylbenzimidazole, 2- (4-thiazolyl) benzimidazole, benzimidazole, 2- (2'-hydroxy-5'-methylphenyl) benzotriazole, 2- (2 ' -Hydroxy-3'-ter t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, 2- (2'-hydroxy-3 ', 5'-di-tert-amylphenyl) benzotriazole, 2- (2'-hydroxy-5) '-Tert-octylphenyl) benzotriazole, 2,2'-methylenebis [6- (2H-benzotriazol-2-yl) -4-tert-octylphenol], 6- (2-benzotriazolyl) -4- tert-octyl-6'-tert-butyl-4'-methyl-2,2'-methylenebisphenol, 1,2,3-benzotriazole, 1- [N, N-bis (2-ethylhexyl) aminomethyl] benzo Triazole, carboxybenzotriazole, 1- [N, N-bis (2-ethylhexyl) aminomethyl] methylbenzoto Azole, 2,2 ′-[[(methyl-1H-benzotriazol-1-yl) methyl] imino] bisethanol, 1- (1 ′, 2′-dicarboxyethyl) benzotriazole, 1- (2,3 -Dicarboxypropyl) benzotriazole, 1-[(2-ethylhexylamino) methyl] benzotriazole, 2,6-bis [(1H-benzotriazol-1-yl) methyl] -4-methylphenol, 5-methylbenzo Examples include triazole and 5-phenyltetrazole.
有機ハロゲン化合物としては、trans−2,3−ジブロモ−1,4−ブテンジオール、トリアリルイソシアヌレート6臭化物、1−ブロモ−2−ブタノール、1−ブロモ−2−プロパノール、3−ブロモ−1−プロパノール、3−ブロモ−1,2−プロパンジオール、1,4−ジブロモ−2−ブタノール、1,3−ジブロモ−2−プロパノール、2,3−ジブロモ−1−プロパノール、2,3−ジブロモ−1,4−ブタンジオール、2,3−ジブロモ−2−ブテン−1,4−ジオール等が挙げられる。 Examples of the organic halogen compound include trans-2,3-dibromo-1,4-butenediol, triallyl isocyanurate hexabromide, 1-bromo-2-butanol, 1-bromo-2-propanol, 3-bromo-1- Propanol, 3-bromo-1,2-propanediol, 1,4-dibromo-2-butanol, 1,3-dibromo-2-propanol, 2,3-dibromo-1-propanol, 2,3-dibromo-1 , 4-butanediol, 2,3-dibromo-2-butene-1,4-diol, and the like.
アミンハロゲン化水素酸塩は、アミンとハロゲン化水素を反応させた化合物であり、アニリン塩化水素、アニリン臭化水素等が挙げられる。アミンハロゲン化水素酸塩のアミンとしては、上述したアミンを用いることができ、エチルアミン、エチレンジアミン、トリエチルアミン、メチルイミダゾール、2−エチル−4−メチルイミダゾール等が挙げられ、ハロゲン化水素としては、塩素、臭素、ヨウ素、フッ素の水素化物(塩化水素、臭化水素、ヨウ化水素、フッ化水素)が挙げられる。また、アミンハロゲン化水素酸塩に代えて、あるいはアミンハロゲン化水素酸塩と合わせてホウフッ化物を含んでも良く、ホウフッ化物としてホウフッ化水素酸等が挙げられる。 An amine hydrohalide is a compound obtained by reacting an amine with a hydrogen halide, and examples thereof include aniline hydrogen chloride and aniline hydrogen bromide. As the amine of the amine hydrohalide, the above-described amines can be used, and examples include ethylamine, ethylenediamine, triethylamine, methylimidazole, 2-ethyl-4-methylimidazole, and the like. Examples include hydrides of bromine, iodine, and fluorine (hydrogen chloride, hydrogen bromide, hydrogen iodide, hydrogen fluoride). Further, a borofluoride may be included instead of the amine hydrohalide or together with the amine hydrohalide, and examples of the borofluoride include borohydrofluoric acid.
溶剤としては、水、アルコール系溶剤、グリコールエーテル系溶剤、テルピネオール類等が挙げられる。アルコール系溶剤としてはイソプロピルアルコール、1,2−ブタンジオール、イソボルニルシクロヘキサノール、2,4−ジエチル−1,5−ペンタンジオール、2,2−ジメチル−1,3−プロパンジオール、2,5−ジメチル−2,5−ヘキサンジオール、2,5−ジメチル−3−ヘキシン−2,5−ジオール、2,3−ジメチル−2,3−ブタンジオール、1,1,1−トリス(ヒドロキシメチル)エタン、2−エチル−2−ヒドロキシメチル−1,3−プロパンジオール、2,2′−オキシビス(メチレン)ビス(2−エチル−1,3−プロパンジオール)、2,2−ビス(ヒドロキシメチル)−1,3−プロパンジオール、1,2,6−トリヒドロキシヘキサン、ビス[2,2,2−トリス(ヒドロキシメチル)エチル]エーテル、1−エチニル−1−シクロヘキサノール、1,4−シクロヘキサンジオール、1,4−シクロヘキサンジメタノール、エリトリトール、トレイトール、グアヤコールグリセロールエーテル、3,6−ジメチル−4−オクチン−3,6−ジオール、2,4,7,9−テトラメチル−5−デシン−4,7−ジオール等が挙げられる。グリコールエーテル系溶剤としては、ヘキシルジグリコール、ジエチレングリコールモノ−2−エチルヘキシルエーテル、エチレングリコールモノフェニルエーテル、2−メチルペンタン−2,4−ジオール、ジエチレングリコールモノヘキシルエーテル、ジエチレングリコールジブチルエーテル、トリエチレングリコールモノブチルエーテル等が挙げられる。 Examples of the solvent include water, alcohol solvents, glycol ether solvents, terpineols and the like. As alcohol solvents, isopropyl alcohol, 1,2-butanediol, isobornylcyclohexanol, 2,4-diethyl-1,5-pentanediol, 2,2-dimethyl-1,3-propanediol, 2,5 -Dimethyl-2,5-hexanediol, 2,5-dimethyl-3-hexyne-2,5-diol, 2,3-dimethyl-2,3-butanediol, 1,1,1-tris (hydroxymethyl) Ethane, 2-ethyl-2-hydroxymethyl-1,3-propanediol, 2,2'-oxybis (methylene) bis (2-ethyl-1,3-propanediol), 2,2-bis (hydroxymethyl) -1,3-propanediol, 1,2,6-trihydroxyhexane, bis [2,2,2-tris (hydroxymethyl) ethyl] ate 1-ethynyl-1-cyclohexanol, 1,4-cyclohexanediol, 1,4-cyclohexanedimethanol, erythritol, threitol, guaiacol glycerol ether, 3,6-dimethyl-4-octyne-3,6-diol, 2,4,7,9-tetramethyl-5-decyne-4,7-diol and the like. Glycol ether solvents include hexyl diglycol, diethylene glycol mono-2-ethylhexyl ether, ethylene glycol monophenyl ether, 2-methylpentane-2,4-diol, diethylene glycol monohexyl ether, diethylene glycol dibutyl ether, triethylene glycol monobutyl ether Etc.
チキソ剤としては、ワックス系チキソ剤、アマイド系チキソ剤が挙げられる。ワックス系チキソ剤としては例えばヒマシ硬化油等が挙げられる。アマイド系チキソ剤としてはラウリン酸アマイド、パルミチン酸アマイド、ステアリン酸アマイド、ベヘン酸アマイド、ヒドロキシステアリン酸アマイド、飽和脂肪酸アマイド、オレイン酸アマイド、エルカ酸アマイド、不飽和脂肪酸アマイド、p−トルエンメタンアマイド、芳香族アマイド、メチレンビスステアリン酸アマイド、エチレンビスラウリン酸アマイド、エチレンビスヒドロキシステアリン酸アマイド、飽和脂肪酸ビスアマイド、メチレンビスオレイン酸アマイド、不飽和脂肪酸ビスアマイド、m−キシリレンビスステアリン酸アマイド、芳香族ビスアマイド、飽和脂肪酸ポリアマイド、不飽和脂肪酸ポリアマイド、芳香族ポリアマイド、置換アマイド、メチロールステアリン酸アマイド、メチロールアマイド、脂肪酸エステルアマイド等が挙げられる。酸化防止剤としては、ヒンダードフェノール系酸化防止剤等が挙げられる。また、消泡剤としては、アクリルポリマー、ビニルエーテルポリマー、ブタジエンポリマー、シリコーン等が挙げられる。 Examples of thixotropic agents include wax-based thixotropic agents and amide-based thixotropic agents. Examples of the wax-based thixotropic agent include castor oil. As the amide thixotropic agent, lauric acid amide, palmitic acid amide, stearic acid amide, behenic acid amide, hydroxystearic acid amide, saturated fatty acid amide, oleic acid amide, erucic acid amide, unsaturated fatty acid amide, p-toluene methane amide, Aromatic amide, methylene bis stearic acid amide, ethylene bis lauric acid amide, ethylene bishydroxystearic acid amide, saturated fatty acid bis amide, methylene bis oleic acid amide, unsaturated fatty acid bis amide, m-xylylene bis stearic acid amide, aromatic bis amide , Saturated fatty acid polyamide, unsaturated fatty acid polyamide, aromatic polyamide, substituted amide, methylol stearate amide, methylol amide, fatty acid ester Amide, and the like. Examples of the antioxidant include hindered phenol antioxidants. Examples of the antifoaming agent include acrylic polymers, vinyl ether polymers, butadiene polymers, and silicones.
<本実施の形態のソルダペーストの一例>
本実施の形態のソルダペーストは、上述したフラックスと、金属粉を含む。金属粉は、Pbを含まないはんだであることが好ましく、Sn単体、または、Sn−Ag系、Sn−Cu系、Sn−Ag−Cu系、Sn−Bi系、Sn-In系等、あるいは、これらの合金にSb、Bi、In、Cu、Zn、As、Ag、Cd、Fe、Ni、Co、Au、Ge、P等を添加したはんだの粉体で構成される。
<Example of solder paste of this embodiment>
The solder paste of the present embodiment includes the above-described flux and metal powder. The metal powder is preferably a solder containing no Pb, Sn alone, or Sn—Ag, Sn—Cu, Sn—Ag—Cu, Sn—Bi, Sn—In, etc. These alloys are composed of solder powder obtained by adding Sb, Bi, In, Cu, Zn, As, Ag, Cd, Fe, Ni, Co, Au, Ge, P or the like to these alloys.
<本実施の形態のフラックス及びソルダペーストの作用効果例>
ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を含むフラックス、及び、このフラックスを用いたソルダペーストでは、フラックス中のダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンが、はんだ付けで想定される温度域での耐熱性を有する。これにより、熱負荷の大きいリフロー条件下でも、フラックス中の活性剤成分であるダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの揮発が抑制され、リフロー炉の内部に付着することを抑制することができる。
<Examples of effects of flux and solder paste of this embodiment>
In a flux containing two or more of dimer amine, trimer triamine, hydrogenated dimer amine and hydrogenated trimer triamine, and a solder paste using this flux, dimer amine, trimer triamine, hydrogenated dimer amine and hydrogenated in the flux Trimmer triamine has heat resistance in the temperature range assumed for soldering. This suppresses the volatilization of dimeramine amine, trimer triamine, hydrogenated dimer amine, and hydrogenated trimer triamine, which are activator components in the flux, even under reflow conditions with a large heat load, and adheres to the inside of the reflow furnace. Can be suppressed.
よって、リフロー炉の洗浄頻度を低く抑えることができる。なお、ダイマージアミン、トリマートリアミン、水添ダイマージアミン、水添トリマートリアミンを含むフラックス残渣は、洗浄により除去することが可能で、洗浄用フラックスに適用可能である。 Therefore, the cleaning frequency of the reflow furnace can be kept low. The flux residue containing dimer diamine, trimer triamine, hydrogenated dimer diamine, and hydrogenated trimer triamine can be removed by washing and can be applied to a washing flux.
また、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を含むフラックスを用いたソルダペーストでは、粘度を低く抑えることができ、かつ、ダマ、析出の発生を抑えることができるので、ソルダペーストの良好な印刷性を得ることができる。 In addition, the solder paste using a flux containing two or more of dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine can suppress the viscosity to a low level and suppress the occurrence of lumps and precipitation. Therefore, good printability of the solder paste can be obtained.
更に、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンは、リフロー条件下での揮発が抑制され、リフロー終了までフラックス中に存在するため、リフロー中に揮発・分解して活性を失うこともない。よって、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンは、はんだ付け時に活性剤として機能し、はんだが良好に濡れ広がり、はんだの濡れ不良の発生を抑制することができる。 Furthermore, dimeramine amine, trimer triamine, hydrogenated dimer amine and hydrogenated trimer triamine are suppressed in volatilization under reflow conditions and are present in the flux until the end of reflow. There is nothing. Therefore, dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine function as an activator during soldering, so that the solder can be well spread and the occurrence of poor solder wetting can be suppressed.
以下の表1、表2に示す組成で実施例と比較例のフラックスを調合し、このフラックスを使用してソルダペーストを調合して、難揮発性、粘度及びダマ・析出について検証した。なお、表1、表2における組成率は、フラックスの全量を100とした場合のwt(重量)%である。 The fluxes of Examples and Comparative Examples were prepared with the compositions shown in Tables 1 and 2 below, and solder pastes were prepared using this flux, and verified for poor volatility, viscosity, and lumps / precipitation. The composition ratios in Tables 1 and 2 are wt (weight)% when the total amount of flux is 100.
ソルダペーストは、フラックスが11wt%、金属粉が89wt%である。また、ソルダペースト中の金属粉は、Agが3.0wt%、Cuが0.5wt%、残部がSnであるSn−Ag−Cu系のはんだ合金であり、金属粉の粒径の平均はφ20μmである。 The solder paste has a flux of 11 wt% and metal powder of 89 wt%. Further, the metal powder in the solder paste is a Sn—Ag—Cu solder alloy in which Ag is 3.0 wt%, Cu is 0.5 wt%, and the balance is Sn, and the average particle size of the metal powder is φ20 μm. It is.
<難揮発性の評価>
(1)検証方法
難揮発性の評価は、TG法(サーマルグラビメトリ法)による試験(JIS K 0129)を行った。TG法による試験は、各実施例及び各比較例に記載のフラックスをアルミパンに10mg詰めて、ULVAC社製、TGD9600を用いて25℃から250℃ピーク、昇温速度1℃/secにて加熱した。
<Evaluation of poor volatility>
(1) Verification method Evaluation of difficult volatility was carried out by a test (JIS K 0129) by a TG method (thermal gravimeter method). In the test by the TG method, 10 mg of the flux described in each example and each comparative example was packed in an aluminum pan, and heated at 25 to 250 ° C. peak at a temperature increase rate of 1 ° C./sec using a TGD9600 manufactured by ULVAC. did.
(2)判定基準
〇:重量の減損率−フラックス中の溶剤含有量≦15%
×:重量の減損率−フラックス中の溶剤含有量>15%
(2) Criteria ◯: Weight loss rate−solvent content in flux ≦ 15%
×: Weight loss rate—solvent content in flux> 15%
<粘度の評価>
(1)検証方法
粘度の評価は、各実施例及び各比較例に記載のフラックスと上述した金属粉を混合させたソルダペーストの粘度を、株式会社マルコム製、PCU−205を用いて測定した。試験条件は、JIS Z 3284−3に準拠した。
<Evaluation of viscosity>
(1) Verification method Viscosity was evaluated by measuring the viscosity of a solder paste in which the flux described in each example and each comparative example was mixed with the above-described metal powder using PCU-205 manufactured by Malcolm Corporation. Test conditions were based on JIS Z 3284-3.
(2)判定基準
〇:粘度が350Pa*s以下
×:粘度が350Pa*s超
(2) Criteria ◯: Viscosity is 350 Pa * s or less x: Viscosity exceeds 350 Pa * s
<ダマ・析出の評価>
(1)検証方法
ダマ・析出の評価試験は、各実施例及び各比較例に記載のフラックスと上述した金属粉を混合させたソルダペーストを、JIS Z 3284−3に記載の所定のパターンでソルダペーストの印刷部が形成されたステンレス製のマスクを使用して、縦50mm×横50mm×厚さ0.5mmのBare−Cu板に印刷し、目視によりダマ、析出の有無を確認した。
<Evaluation of lumps and precipitation>
(1) Verification method The evaluation test of lumps / precipitation was performed by using a solder paste in which the flux described in each example and each comparative example and the above-described metal powder were mixed in a predetermined pattern described in JIS Z 3284-3. Using a stainless steel mask on which a paste printing section was formed, printing was performed on a Bare-Cu plate having a length of 50 mm, a width of 50 mm, and a thickness of 0.5 mm, and the presence or absence of lumps and precipitation was confirmed visually.
(2)判定基準
〇:ダマ、析出の何れも確認されなかった
×:ダマ、析出のどちらかまたは両方が確認された
(2) Criteria ◯: Neither lumps or precipitation was confirmed ×: Either lumps, deposition or both were confirmed
なお、上述したダマ・析出の評価試験でBare−Cu板に印刷した各実施例のソルダペーストを使用して、はんだの濡れ広がりの評価試験を行った。 In addition, the solder paste of each Example printed on the Bare-Cu plate in the above-described dama / precipitation evaluation test was used to perform an evaluation test of solder wetting and spreading.
上述したマスクに設けられた印刷部は四角形の開口で、大きさは3.0mm×1.5mmとなっている。印刷部は、同じ大きさの複数の開口が間隔を異ならせて並び、開口の間隔は0.2−0.3−0.4−0.5−0.6−0.7−0.8−0.9−1.0−1.1−1.2mmとなっている。 The printing portion provided on the above-described mask has a rectangular opening and has a size of 3.0 mm × 1.5 mm. In the printing unit, a plurality of openings having the same size are arranged at different intervals, and the interval between the openings is 0.2-0.3-0.4-0.5-0.6-0.7-0.8. It is -0.9-1.0-1.1-1.2mm.
ソルダペーストの印刷後、マスクを取り除き、リフロー前に、並列する印刷部の最小間隔である0.2mmの箇所でソルダペーストが接触していないことを確認し、リフローを行う。リフローの条件は、N2雰囲気下に190℃で120secの予備加熱を行った後、昇温速度を1℃/secとして190℃から260℃まで温度を上昇させて本加熱を行う。 After the solder paste is printed, the mask is removed, and before reflow, it is confirmed that the solder paste is not in contact at a position of 0.2 mm, which is the minimum interval between the printing parts arranged in parallel, and reflow is performed. The reflow condition is that after preheating at 190 ° C. for 120 seconds in an N 2 atmosphere, the temperature is increased from 190 ° C. to 260 ° C. at a rate of temperature increase of 1 ° C./sec.
以上のはんだの濡れ広がりの評価の結果、各実施例のフラックスを使用したソルダペーストでは、はんだが良好に濡れ広がった。 As a result of the evaluation of the solder spread, the solder paste spreads well in the solder paste using the flux of each example.
本発明では、実施例1〜実施例4に示すように、オレイン酸とリノール酸の反応物であるダイマー酸を変性させた反応物であるダイマージアミン、オレイン酸とリノール酸の反応物であるトリマー酸を変性させた反応物であるトリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンのいずれかを5wt%含むフラックスでは、難揮発性、粘度上昇の抑制及びダマ・析出の抑制に対して十分な効果が得られた。なお、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を合計で5wt%含むことでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制に対して十分な効果が得られた。 In the present invention, as shown in Examples 1 to 4, dimer amine, which is a reaction product obtained by modifying dimer acid, which is a reaction product of oleic acid and linoleic acid, and trimer, which is a reaction product of oleic acid and linoleic acid. A flux containing 5 wt% of any of the trimer triamine, hydrogenated dimer amine, or hydrogenated trimer triamine, which is a modified product of the acid, is sufficient for low volatility, suppression of viscosity increase, and suppression of lumps and precipitation. The effect was obtained. Including 5% by weight of dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine in total 5% by weight is sufficient for suppressing volatility, suppressing viscosity increase, and suppressing dams and precipitation. was gotten.
また、実施例5に示すように、ダイマージアミンを10wt%含むフラックスでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制に対して十分な効果が得られた。 In addition, as shown in Example 5, even with a flux containing 10 wt% dimer diamine, sufficient effects were obtained with respect to poor volatility, suppression of increase in viscosity, and suppression of lumps and precipitation.
これに対し、比較例1及び比較例2に示すように、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンの何れも含まず、分子量の小さいアミンを含むフラックスでは、粘度上昇を抑制する効果は得られるが、難揮発性及びダマ・析出の抑制に対して十分な効果が得られなかった。 On the other hand, as shown in Comparative Example 1 and Comparative Example 2, the flux containing no dimeramine, trimer triamine, hydrogenated dimer amine, or hydrogenated trimer triamine, and containing a low molecular weight amine suppresses viscosity increase. However, it was not possible to obtain a sufficient effect for suppressing volatility and suppressing lumps and precipitation.
また、比較例3及び比較例4に示すように、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンの何れも含まず、分子量の大きいアミンを含むフラックスでは、分子量の増加に伴い難揮発性の効果が得られる傾向がみられるが、粘度上昇の抑制及びダマ・析出の抑制に対して十分な効果が得られなかった。 Further, as shown in Comparative Example 3 and Comparative Example 4, a flux containing an amine having a large molecular weight without any of dimer amine, trimer triamine, hydrogenated dimer amine, or hydrogenated trimer triamine is difficult as the molecular weight increases. Although there is a tendency to obtain a volatile effect, a sufficient effect was not obtained with respect to the suppression of viscosity increase and the suppression of lumps and precipitation.
更に、比較例5に示すように、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンの何れも含まず、分子量の小さいアミンの添加量を増やしたフラックスでは、アミンの添加量の増加に伴い、粘度上昇の抑制及びダマ・析出の抑制に対しては効果が得られるが、難揮発性に対して十分な効果が得られなかった。 Furthermore, as shown in Comparative Example 5, in the flux that does not contain any of dimer amine, trimer triamine, hydrogenated dimer amine, or hydrogenated trimer triamine and increases the amount of amine with a small molecular weight, the amount of amine added increases. As a result, an effect was obtained for the suppression of the increase in viscosity and the suppression of lumps and precipitation, but a sufficient effect on the hardly volatile property was not obtained.
更に、比較例6に示すように、ダイマージアミン、トリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンの何れも含まず、他のアミンを含まないフラックスでは、粘度上昇の抑制及びダマ・析出の抑制に対しては効果が得られるが、難揮発性に対して十分な効果が得られなかった。 Furthermore, as shown in Comparative Example 6, in fluxes that do not contain any of dimer amine, trimer triamine, hydrogenated dimer amine, or hydrogenated trimer triamine, and do not contain other amines, suppression of viscosity increase and suppression of lumps and precipitation. Although an effect was obtained, a sufficient effect on hardly volatile was not obtained.
また、本発明で規定された範囲内でロジンを含むことで、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られ、実施例6〜実施例8に示すように、ロジンの種類を変える、また、複数種類のロジンを組み合せた場合でも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。 In addition, by including rosin within the range defined by the present invention, the effects of low volatility, suppression of viscosity increase and suppression of lumps and precipitation are obtained. As shown in Examples 6 to 8, rosin Even when various types of rosins were combined, the effects of low volatility, suppression of viscosity increase, and suppression of lumps and precipitation were obtained.
更に、実施例9に示すように、ダイマージアミンを20wt%含むことで、有機酸を含まなくても、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。これに対し、本発明で規定された範囲内で有機酸を含むことで、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られ、実施例10〜実施例12に示すように、有機酸の種類を変える、また、有機酸の添加量を変えた場合でも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。 Furthermore, as shown in Example 9, by containing 20 wt% of dimer diamine, the effects of low volatility, suppression of viscosity increase, and suppression of lumps / precipitation were obtained even without including an organic acid. On the other hand, by including the organic acid within the range defined by the present invention, the effects of hardly volatility, suppression of increase in viscosity, and suppression of lumps and precipitation are obtained, as shown in Examples 10 to 12. In addition, even when the type of the organic acid was changed and the addition amount of the organic acid was changed, the effects of low volatility, suppression of viscosity increase, and suppression of lumps and precipitation were obtained.
更に、本発明で規定された範囲内で他のアミンを含むことで、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られ、実施例13に示すように、ダイマージアミンを0.5wt%含み、他のアミンを2wt%含むことでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。更に、実施例14〜実施例16に示すように、アミンの種類、添加量を変えても、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。 Furthermore, by including other amines within the range defined in the present invention, the effects of low volatility, suppression of increase in viscosity, and suppression of lumps and precipitation are obtained. Even when 0.5 wt% was included and 2 wt% of other amines were included, the effects of low volatility, suppression of viscosity increase, and suppression of lumps and precipitation were also obtained. Furthermore, as shown in Examples 14 to 16, even if the kind and amount of amine were changed, the effects of low volatility, suppression of increase in viscosity, and suppression of lumps and precipitation were obtained.
更に、実施例17に示すように、本発明で規定された範囲内でダイマージアミンを含むことで、有機ハロゲン化合物を含まなくても、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。これに対し、本発明で規定された範囲内で有機ハロゲン化合物を含むことで、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られ、実施例18に示すように、有機ハロゲン化合物を5wt%含んでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果の効果が得られた。また、実施例19に示すように、有機ハロゲン化合物の種類を変えても、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果の効果が得られた。 Furthermore, as shown in Example 17, by including dimer diamine within the range defined by the present invention, it is difficult to prevent volatility, increase in viscosity, and suppression of lumps / precipitation without including an organic halogen compound. The effect was obtained. On the other hand, by including an organic halogen compound within the range specified in the present invention, the effects of low volatility, suppression of increase in viscosity, and suppression of lumps and precipitation are obtained. Even when containing 5 wt% of a halogen compound, the effect of hardly volatility, suppression of viscosity increase and suppression of lumps / precipitation was obtained, and the effect of poor volatility, suppression of viscosity increase and suppression of dams / precipitation was obtained. Further, as shown in Example 19, even when the kind of the organic halogen compound was changed, the effects of the low volatility, the suppression of increase in viscosity, and the suppression of lumps and precipitation were obtained.
更に、本発明で規定された範囲内でアミンハロゲン化水素酸塩を含むことで、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られ、実施例20に示すように、アミンハロゲン化水素酸塩を1wt%含んでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制が得られ、実施例21に示すように、アミンハロゲン化水素酸塩を5wt%含んでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。また、本発明で規定された範囲内で酸化防止剤、消泡剤を含むことでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られ、実施例22に示すように、酸化防止剤を3wt%含んでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。また、実施例23に示すように、消泡剤を2wt%含んでも、難揮発性、粘度上昇の抑制及びダマ・析出の抑制の効果が得られた。 Furthermore, by including an amine hydrohalide within the range defined in the present invention, the effect of low volatility, suppression of viscosity increase, and suppression of lumps and precipitation can be obtained, as shown in Example 20, Even if 1 wt% of the amine hydrohalide is included, it is difficult to volatility, suppression of increase in viscosity and suppression of lumps and precipitation are obtained. As shown in Example 21, even if 5 wt% of the amine hydrohalide is included, The effects of low volatility, suppression of viscosity increase, and suppression of lumps and precipitation were obtained. Moreover, even if it contains an antioxidant and an antifoaming agent within the range specified in the present invention, the effect of hardly volatility, suppression of increase in viscosity and suppression of lumps and precipitation can be obtained, as shown in Example 22. Even when 3 wt% of the antioxidant was contained, the effects of hardly volatility, suppression of increase in viscosity, and suppression of lumps and precipitation were obtained. Further, as shown in Example 23, even when 2 wt% of the antifoaming agent was included, the effects of hardly volatility, suppression of increase in viscosity, and suppression of lumps and precipitation were obtained.
以上のことから、ダイマー酸を変性させた反応物であるダイマージアミン、トリマー酸を変性させた反応物であるトリマートリアミン、水添ダイマージアミンまたは水添トリマートリアミンのいずれか、あるいは、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を、合計で0.5wt%以上20wt%以下、ロジンを30wt%以上60wt%以下、有機酸を0wt%以上15wt%以下、より好ましくは、有機酸を0wt%以上10wt%以下、アミンを0wt%以上10wt%以下、有機ハロゲン化合物を0wt%以上5wt%以下、アミンハロゲン化水素酸塩を0wt%以上5wt%以下、溶剤を29wt%以上60wt%以下、チキソ剤を0wt%以上10wt%以下、酸化防止剤を0wt%以上5wt%以下、消泡剤を0wt%以上5wt%以下含むフラックス、及びこのフラックスを用いたソルダペーストでは、熱負荷の大きい条件下でもフラックス中の活性剤成分の揮発が抑制され、リフロー炉の内部に付着することを抑制することができた。 From the above, dimer amine, which is a reaction product obtained by modifying dimer acid, trimer triamine, reaction product obtained by modifying trimer acid, hydrogenated dimer amine or hydrogenated trimer triamine, or dimer amine, trimer Two or more of triamine, hydrogenated dimer diamine and hydrogenated trimer triamine, in total, 0.5 wt% to 20 wt%, rosin 30 wt% to 60 wt%, organic acid 0 wt% to 15 wt%, more preferably Organic acid: 0 wt% to 10 wt%, amine: 0 wt% to 10 wt%, organic halogen compound: 0 wt% to 5 wt%, amine hydrohalide: 0 wt% to 5 wt%, solvent: 29 wt% 60wt% or less, thixotropic agent 0wt% or more and 10wt% or less, oxidation In the flux containing 0 wt% or more and 5 wt% or less of the deterrent and 0 wt% or more and 5 wt% or less of the defoaming agent, and the solder paste using this flux, the volatilization of the activator component in the flux is suppressed even under a large heat load condition. It was possible to suppress adhesion to the inside of the reflow furnace.
また、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの2種以上を含むフラックスを用いたソルダペーストでは、粘度を低く抑えることができ、かつ、ダマ、析出の発生を抑えることができ、ソルダペーストの良好な印刷性を得ることができた。 In addition, the solder paste using a flux containing two or more of dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine can suppress the viscosity to a low level and suppress the occurrence of lumps and precipitation. And good printability of the solder paste was obtained.
更に、リフロー条件下でダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンの揮発が抑制されることで、ダイマージアミン、トリマートリアミン、水添ダイマージアミン及び水添トリマートリアミンがはんだ付け時に活性剤として機能し、はんだが良好に濡れ広がり、はんだの濡れ不良の発生を抑制することができた。 In addition, dimeramine amine, trimer triamine, hydrogenated dimer amine and hydrogenated trimer triamine are inhibited from volatilizing under reflow conditions, so that dimer amine, trimer triamine, hydrogenated dimer amine and hydrogenated trimer triamine are active during soldering. It functioned as an agent, the solder spreads well, and it was possible to suppress the occurrence of poor solder wetting.
Claims (10)
ことを特徴とするフラックス。 A flux comprising any one of dimer amine, trimer triamine, hydrogenated dimer amine, or hydrogenated trimer triamine, or two or more of dimer amine, trimer triamine, hydrogenated dimer amine, and hydrogenated trimer triamine.
ことを特徴とする請求項1に記載のフラックス。 Dimer diamine, trimer triamine, hydrogenated dimer diamine or hydrogenated trimer triamine, or two or more of dimer diamine, trimer triamine, hydrogenated dimer diamine and hydrogenated trimer triamine, in total 0.5 wt% or more and 20 wt% The flux according to claim 1, wherein the flux is contained in an amount of not more than%.
ことを特徴とする請求項1または請求項2に記載のフラックス。 Dimeriamine is a reaction product obtained by modifying dimer acid, which is a reaction product between oleic acid and linoleic acid. Trimer triamine is a reaction product obtained by modifying trimer acid, which is a reaction product between oleic acid and linoleic acid. The flux according to claim 1 or 2, wherein
溶剤を29wt%以上60wt%以下で含む
ことを特徴とする請求項1〜請求項3の何れか1項に記載のフラックス。 30 wt% or more and 60 wt% or less of rosin,
The flux according to any one of claims 1 to 3, wherein the solvent is contained in an amount of 29 wt% or more and 60 wt% or less.
有機ハロゲン化合物を0wt%以上5wt%以下、
アミンハロゲン化水素酸塩を0wt%以上5wt%以下で含む
ことを特徴とする請求項1〜請求項4の何れか1項に記載のフラックス。 Further, an organic acid is added in an amount of 0 wt% to 15 wt% as an activator
Organohalogen compounds in an amount of 0 wt% to 5 wt%
The flux according to any one of claims 1 to 4, comprising an amine hydrohalide in an amount of 0 wt% to 5 wt%.
ことを特徴とする請求項1〜請求項5の何れか1項に記載のフラックス。 The flux according to any one of claims 1 to 5, further comprising another amine as an activator in an amount of 0 wt% to 10 wt%.
ことを特徴とする請求項1〜請求項6の何れか1項に記載のフラックス。 Furthermore, a thixotropic agent is contained in 0 wt% or more and 10 wt% or less. The flux according to any one of claims 1 to 6 characterized by things.
ことを特徴とする請求項1〜請求項7の何れか1項に記載のフラックス。 Furthermore, antioxidant is contained in 0 wt% or more and 5 wt% or less. The flux of any one of Claims 1-7 characterized by the above-mentioned.
ことを特徴とする請求項1〜請求項8の何れか1項に記載のフラックス。 The flux according to any one of claims 1 to 8, further comprising an antifoaming agent in an amount of 0 wt% to 5 wt%.
ことを特徴とするソルダペースト。 A solder paste comprising the flux according to any one of claims 1 to 9 and metal powder.
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JP2020192562A (en) * | 2019-05-27 | 2020-12-03 | 千住金属工業株式会社 | Solder paste and flux for solder paste |
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JP6993594B2 (en) * | 2020-03-27 | 2022-02-04 | 千住金属工業株式会社 | Flux and solder paste |
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