JP6329688B1 - Gas supply device - Google Patents

Abstract

A gas supply device capable of switching the supply of an additive gas with high accuracy. A plurality of source gas supply sources 1a and 1b, a gas mixing pipe 2 for generating an additive gas from the source gas, and a branch from one end 2a of the gas mixing pipe and connected to the source gas supply source A plurality of source gas injection pipes 3a and 3b, and an additive gas supply pipe 4 having one end 4a connected to the other end 2b of the gas mixing pipe and the other end 4b connected to the gas flow path 5, First mass flow controllers 6a and 6b provided on the downstream side of the source gas supply source in the source gas injection pipe, an exhaust pipe 8 branched from the front of the other end of the additive gas supply pipe, and an exhaust pipe A second mass flow controller 9 is provided, and a controller 10 that controls the first and second mass flow controllers based on a predetermined additive gas concentration / flow rate / supply time set value. [Selection] Figure 1

Description

  The present invention relates to a gas supply device that supplies an additive gas to a gas passage through which a gas flows.

As a gas supply device that supplies an additive gas to a gas flow path, for example, there is one described in Patent Document 1.
The gas supply device described in Patent Document 1 includes a plurality of source gas supply sources that supply source gas of additive gas, a gas mixing line for generating additive gas from the source gas, and a gas mixing line, respectively. A plurality of source gas supply pipes branched from one end and connected to a plurality of source gas supply sources are provided. The other end of the gas mixing pipe is connected to the gas flow path.

  The gas supply device further includes a first flow rate control valve provided in each source gas supply line, a second flow rate control valve having an inlet connected to the other end of the gas mixing line, and a gas mixing line. An overflow pipe branched from the passage, a mixed gas supply pipe connected to the outlet of the second flow control valve, and a controller for controlling the first and second flow control valves are provided.

  The control unit adjusts the opening of the first flow control valve according to the concentration of the additive gas to be supplied to the gas flow path and the flow rate setting value, and simultaneously adjusts the opening of the first flow control valve and the first flow control valve. The opening degree of the second flow control valve is adjusted based on the conversion factor for the additive gas of the second flow control valve calculated from the conversion factor for the raw material gas of the flow control valve.

  According to this gas supply device, when the concentration of the additive gas to be supplied and the flow rate set value are changed, the additive gas having the concentration and flow rate corresponding to the set value is instantaneously supplied to the mixed gas supply line. Supplied.

However, in this gas supply device, when the additive gas to be supplied is switched, the portion on the downstream side of the branch point with the overflow pipe in the mixed gas pipe (the flow path in the second flow control valve is also The flow rate value of the previously supplied additive gas staying in (including) deviates from the set value due to the influence of the flow rate value of the subsequently supplied additive gas.
This influence increases as the difference between the flow rate value of the previously supplied additive gas and the flow rate value of the subsequently supplied additive gas increases.

  Therefore, for example, when switching the supply of a small flow rate additive gas and the supply of a large flow rate additive gas alternately, when the supply of the additive gas is switched from a small flow rate to a large flow rate, the addition to be supplied at a small flow rate While the gas is supplied in a shorter time than the predetermined time, when the supply of the additive gas is switched from the large flow rate to the small flow rate, the additive gas to be supplied at the large flow rate is longer than the predetermined time. It took time to supply, and the supply time of the additive gas could not be accurately controlled.

  Specifically, the supply of additive gas A and additive gas B is switched every 5 seconds, additive gas A is supplied at 0.2 liter / second for 5 seconds, and additive gas B is then supplied at 1 liter / second. When the cycle of supplying for 5 seconds is repeated, additive gas A is supplied in less than 5 seconds, while additive gas B is supplied in 5 seconds or more, and supply of additive gas A and additive gas B is accurately performed every 5 seconds. Could not switch to

Japanese Patent No. 4925493

  Therefore, the subject of this invention is providing the gas supply apparatus which can switch supply of additive gas with high precision.

In order to solve the above-described problems, the present invention provides a gas supply device that supplies an additive gas to a gas passage through which a gas flows, and a plurality of source gas supply sources that respectively supply the additive gas source gas And a gas mixing line for generating the additive gas from the source gas, and a plurality of source gas injections branched from one end of each of the gas mixing lines and connected to the plurality of source gas supply sources A pipe, one end connected to the other end of the gas mixing pipe, the other end connected to the gas flow path, and a downstream of the source gas supply source in the source gas injection pipe A first flow rate controller provided on the side, a plurality of exhaust pipes branched from the other end of the additive gas supply pipe or from the front of the other end of the additive gas supply pipe, it a plurality of exhaust passage A second flow rate controller provided in Le, a first on-off valve provided on the upstream side of the second flow controller in each of the exhaust line of the plurality of, predetermined, or the A control unit for controlling the first and second flow rate controllers and the first on-off valve based on an additive gas concentration / flow rate / supply time set value determined based on a flow rate measurement value in the gas flow path; The gas supply apparatus is characterized by comprising the above.
Here, “mixing” of the “gas mixing pipe line” is not only mixing a plurality of source gases supplied simultaneously from a plurality of source gas supply sources, but also from one of a plurality of source gas supply sources. It also means that the supplied raw material gas is circulated as it is.

In the above configuration, preferably, the gas supply device is connected to the alternative gas supply pipe branched from the second flow rate controller and the first on-off valve in the exhaust pipe, and connected to the alternative gas supply pipe An alternative gas supply source, and a second on-off valve provided downstream of the alternative gas supply source in the alternative gas supply line, wherein the second on-off valve is controlled by the control unit. The control is performed on the basis of the additive gas concentration, flow rate, and supply time set value.

  The gas supply device further includes a third on-off valve provided on the downstream side of the first flow rate controller in the source gas injection pipe, and the third on-off valve is provided by the control unit. It is preferable to control based on the additive gas concentration / flow rate / supply time set value.

  Furthermore, a gas supply device is provided in the source gas discharge pipe branched from the first flow rate controller and the third on-off valve in the source gas injection pipe, and in the source gas discharge pipe And a fourth on-off valve, and the fourth on-off valve is preferably controlled by the control unit based on the additive gas concentration / flow rate / supply time set value.

  The gas supply device may include a plurality of the gas mixing lines, and each of the plurality of gas mixing lines may branch from the one end of the gas supply line.

According to the present invention, the second flow rate controller is provided in each of the plurality of exhaust lines branched from the additive gas supply line , and further, the first flow rate controller is provided upstream of the second flow rate controller in each exhaust line. The on-off valve is provided to control the flow rate of the additive gas on the exhaust pipe side and to switch the exhaust pipe.
As a result, the internal volume of the pipeline portion downstream from the branch point with the exhaust pipeline in the additive gas supply pipeline is minimized, and the additive gas stays in the pipeline portion when the supply of the additive gas is switched ( The amount of additive gas (supplied previously) can be minimized, so that even if the additive gas to be supplied is switched, the flow rate of the additive gas to be supplied next is the same as that of the additive gas supplied previously. Almost no influence on flow rate. Furthermore, a plurality of exhaust pipes are used by switching, and the opening of the second flow rate controller of the exhaust pipe used for supplying the next additive gas is set in advance when the previous additive gas is supplied. can do.
In this way, the additive gas having the set concentration can be supplied to the gas flow channel while switching the supply time and the concentration / flow rate / supply time at the set flow rate at a high speed.

It is a figure which shows schematic structure of the gas supply apparatus by one Example of this invention. It is a figure which shows schematic structure of the gas supply apparatus by another Example of this invention. It is a figure which shows schematic structure of the gas supply apparatus by another Example of this invention. It is a figure which shows schematic structure of the gas supply apparatus by another Example of this invention. It is a figure which shows schematic structure of the gas supply apparatus by another Example of this invention. It is a graph which shows the result of the simulation for confirming the precision of switching of the addition gas supply by the gas supply apparatus of FIG.

Hereinafter, the configuration of the present invention will be described based on preferred embodiments with reference to the accompanying drawings.
FIG. 1 is a diagram showing a schematic configuration of a gas supply apparatus according to an embodiment of the present invention.
Referring to FIG. 1, the gas supply apparatus according to the present invention generates a plurality of (two in this embodiment) source gas supply sources 1a and 1b that supply source gases of additive gases, and generates additive gases from the source gases. A gas mixing line 2 and a plurality of (in this embodiment, two) source gases that branch from one end 2a of each gas mixing line 2 and are connected to two source gas supply sources 1a and 1b The injection pipes 3 a and 3 b and the additive gas supply pipe 4 having one end 4 a connected to the other end 2 b of the gas mixing pipe 2 and the other end 4 b connected to the gas flow path 5 are provided.

  In addition, the gas mixing pipe line 2 has not only a function of mixing the raw material gases simultaneously supplied from the two raw material gas supply sources 1a and 1b, but also a supply from one of the two raw material gas supply sources 1a and 1b. It also has a function of distributing the raw material gas as it is.

  The gas supply apparatus of the present invention also includes first mass flow controllers (flow rate controllers) 6a and 6b provided downstream of the source gas supply sources 1a and 1b in the source gas injection pipes 3a and 3b, and source gas. On-off valves 7a and 7b provided on the downstream side of the first mass flow controllers 6a and 6b in the injection pipes 3a and 3b are provided.

In the case where the on-off valves 7a and 7b need to completely close the related raw material gas injection pipes 3a and 3b in view of the characteristics of the mass flow controllers 6a and 6b that cannot completely shut off the gas flow. That is, for example, the raw material gas injection pipes 3a and 3b are switched and used as in the case where the raw material gases are not mixed and each of the raw material gases is switched as an additive gas and supplied to the gas mixing pipe 2. Provided in case.
Therefore, in this embodiment, when the source gas injection pipes 3a and 3b are not switched and used, any of the on-off valves 7a and 7b is always open.

  The gas supply device of the present invention is also provided with an exhaust pipe 8 branched from the other end (connection point with the gas flow path 5) 4b of the additive gas supply pipe 4 and a first provided in the exhaust pipe 8. 2, a mass flow controller (flow rate controller) 9, a first and second mass flow controllers 6 a, 6 b, 8, and a controller 10 that controls the on-off valves 7 a, 7 b.

  In this case, the branch point between the exhaust pipe 8 and the additive gas supply pipe 4 is preferably as close as possible to the other end 4b of the additive gas supply pipe 4 (the connection point with the gas flow path 5). The branch point may coincide with the other end 4b of the additive gas supply line 4 (the exhaust line 8 branches from the other end 4b).

  Based on the set value of the additive gas concentration, flow rate, and supply time, the control unit 10 supplies the additive gas having the concentration and flow rate corresponding to the set values from the source gas supply sources 1a and 1b to the gas mixing conduit 2. Accordingly, the first mass flow controllers 6a and 6b are adjusted in opening degree, and at the same time, the first mass flow controllers 6a and 6b are calculated from the opening degree and the conversion factor for the source gas of the first mass flow controllers 6a and 6b. The opening degree of the second mass flow controller 8 is adjusted based on the conversion factor for the additive gas of the second mass flow controller 8.

  The way of adjusting the opening degree of the first and second mass flow controllers 6a, 6b, and 8 by the control unit 10 is based on the opening degree of the first and second flow control valves by the control unit described in Patent Document 1 described above. The conversion factor for the additive gas of the second mass flow controller is calculated as follows.

That is, considering the case where n kinds of source gases are mixed, the conversion factors for the first source gas, the second source gas,... ₁ , CF ₂ ,..., And CF _n (conversion factors for each source gas include, for example, CF value of nitrogen = 1, CF value of oxygen = 0.98, CF value of carbon dioxide = 0.74, CF value of carbon monoxide = 1, etc., known), first source gas concentration X ₁ (vol%), second source gas concentration X ₂ (vol%),. The conversion factor CF for the mixed gas of the second mass flow controller when mixing at a ratio of the raw material gas concentration X _n (vol%) is

となる。

It becomes.

  Therefore, for example, when the additive gas is generated by mixing 5 vol% of oxygen, 12 vol% of carbon dioxide, 6 vol% of carbon monoxide, and 77 vol% of nitrogen, the CF value of the mixed gas is 0.958.

And the control part 10 maintains the said adjusted opening degree of the 1st and 2nd mass flow controllers 6a, 6b, 8 only for the time of the supply time set value of additive gas, and when the said time passes, it supplies next. Based on the concentration setting value and flow rate setting value of the additive gas to be adjusted, the opening degree of the first and second mass flow controllers 6a, 6b, and 8 is adjusted in the same manner as before, and the adjusted opening degree is used as the additive gas. Is maintained only for the set time of the supply time.
Thus, the supply of the additive gas is instantaneously switched by switching the opening degrees of the first and second mass flow controllers 6a, 6b, 8 based on the additive gas concentration / flow rate / supply time set value.

  When the supply of the additive gas is switched, the supplied gas is supplied before in the pipeline from the first mass flow controllers 6a, 6b to the branch point of the additive gas supply pipeline 4 with the exhaust pipeline 8. In view of the point that a time delay occurs before the gas is replaced, the timing of switching the opening of the first mass flow controller 1a, 1b and the switching of the opening of the second mass flow controller 8 are shifted.

  This timing shift is based on the internal volume of the pipeline from the first mass flow controllers 6a and 6b to the branch point of the additive gas supply pipeline 4 with the exhaust pipeline 8, and the flow rate setting value of the additive gas to be supplied. Is calculated in advance. Alternatively, a concentration meter for measuring the concentration of the additive gas is disposed at the outlet of the additive gas supply pipe 4, and a timing shift is determined by the control unit 10 each time based on the measured value of the concentration meter. The

  According to the present invention, the second mass flow controller 8 is provided in the exhaust pipe 8 branched from the additive gas supply pipe 4, and the flow rate of the additive gas is controlled on the exhaust pipe 8 side. 4, the internal volume of the pipe line portion downstream from the branch point with the exhaust pipe line 8 is minimized, and stays in the pipe line portion when the supply of the additive gas is switched (supplied before). The amount of additive gas can be kept to a minimum.

  Therefore, even if the supply of the additive gas is switched, the flow rate of the additive gas to be supplied next hardly affects the flow rate of the previously supplied additive gas. Therefore, the additive gas having the set concentration is set. The gas can be supplied to the gas flow path for a set time at the set flow rate, and the supply gas supply can be switched with high accuracy.

Next, a simulation was performed to confirm the accuracy of switching of the additive gas supply by the gas supply device of FIG.
In this simulation, CO having a concentration of 1000 volppm is added from the gas supply device of FIG. 1 when the flow rate is switched every second (4 L / sec, 8 L / sec, 12 L / sec) in the main flow path 5. By supplying gas (CO) to the main flow path 5, the CO concentration in the main flow path 5 was changed between 1120 volppm and 880 volppm every 0.1 second.

In this case, the additive gas concentration / flow rate / supply time set values of the gas supply device are as follows.
(1) 0 to 1 second 1 L / sec of 1600 volppm CO (corresponding to 25% of 4 L / sec) and 1 L / sec of 400 volppm CO are switched and supplied every 0.1 second.
(2) 1-2 seconds 2 L / sec of 1600 volppm CO (corresponding to 25% of 8 L / sec) and 2 L / sec of 400 volppm CO are switched and supplied every 0.1 sec.
(3) 2-3 seconds 3 L / sec of CO of 1600 volppm (corresponding to 25% of 12 L / sec) and 3 L / sec of 400 volppm CO are switched and supplied every 0.1 second.

The result of the simulation is shown in the graph of FIG.
In the graph of FIG. 6, the left vertical axis represents the CO concentration (volppm), the right vertical axis represents the flow rate (SLM), and the horizontal axis represents the elapsed time (sec). Further, (I) represents the set concentration value of the gas (CO) in the main flow path 5, and (II) represents the measured concentration value of the mixed gas of the gas in the main flow path 5 and the additive gas (response speed is 0.1 second). (III) represents the set flow rate value of the gas in the main flow path 5, and (IV) represents the set flow rate value of the additive gas supplied from the gas supply device. Yes.

From the graph of FIG. 6, it was confirmed that the concentration of the mixed gas in the main flow path 5 was changed every 1 second by switching between 1120 volppm and 880 volppm.
From this, it can be seen that according to the gas supply device of the present invention, the supply gas supply can be switched at high speed and with high accuracy.

FIG. 2 is a diagram showing a schematic configuration of a gas supply device according to another embodiment of the present invention.
The embodiment of FIG. 2 differs from the embodiment of FIG. 1 only in the configuration relating to the exhaust pipe. Therefore, in FIG. 2, the same components as those shown in FIG. 1 are denoted by the same reference numerals, and detailed description thereof will be omitted below.

  Referring to FIG. 2, in this embodiment, the exhaust pipe 8 branched from the additive gas supply pipe 4 further branches to the first exhaust pipe 8a and the second exhaust pipe 8b toward the downstream side. In addition, second mass flow controllers 9a and 9b are provided in the first and second exhaust pipe lines 8a and 8b, respectively. Furthermore, on-off valves 11a and 11b are provided upstream of the second mass flow controllers 9a and 9b in the first and second exhaust pipe lines 8a and 8b, respectively.

  The second mass flow controllers 9 a and 9 b and the on-off valves 11 a and 11 b are controlled by the control unit 10.

In the illustrated embodiment, the first and second exhaust pipes 8 a and 8 b are branched from the exhaust pipe 8, but the first and second exhaust pipes 8 a and 8 b are connected to the exhaust pipe 8. You may branch from the additive gas supply line 4 directly, respectively.
In the illustrated embodiment, two exhaust pipes 8a and 8b are provided, but three or more exhaust pipes may be provided.

In the embodiment of FIG. 2, the first and second exhaust pipes 8a and 8b are switched in accordance with the switching of the supply of the additive gas.
For example, at the time of supplying the additive gas, the on-off valve 11a is opened, while the on-off valve 11b is closed and the first exhaust pipe 8a is used. The opening degree of the first mass flow controllers 6a, 6b and the opening degree of the second mass flow controller 9a of the first exhaust pipe line 8a are adjusted based on the additive gas concentration / flow rate / supply time set value. The opening degree is maintained for the time set for the supply time, and the set flow rate of the additive gas having the set concentration is supplied from the additive gas supply line 4 to the main channel 5 for the set time.

  In parallel with this, the opening of the second mass flow controller 9b of the second exhaust pipe 8b is set in advance by the control unit 10 based on the concentration / flow rate setting value of the additive gas to be supplied next. Is done.

At the time when the supply of the previous additive gas is completed, the on-off valve 11a is closed, while the on-off valve 11b is opened, and the control unit 10 sets the concentration, flow rate, and supply time of the additive gas to be supplied next. The opening degree of the first mass flow controllers 6a, 6b is adjusted based on the above, the opening degree of the first mass flow controllers 6a, 6b, and the opening degree of the second mass flow controller 11b of the second exhaust pipe line 8b. However, it is maintained for the time of the supply time set value.
In parallel with this, the opening degree of the second mass flow controller 9a of the first exhaust pipe 8a is preset based on the concentration / flow rate setting value of the additive gas to be supplied next.

  Thus, in this embodiment, the exhaust pipe can be switched, and when the previous additive gas is supplied, the opening of the mass flow controller of the exhaust pipe used for supplying the next additive gas is set in advance. In addition to the effect obtained in the first embodiment, the effect of switching the supply of the additive gas at a higher speed can be obtained.

FIG. 3 is a diagram showing a schematic configuration of a gas supply device according to still another embodiment of the present invention.
The embodiment of FIG. 3 differs from the embodiment of FIG. 2 only in the configuration relating to the first and second exhaust pipes. Therefore, in FIG. 3, the same components as those shown in FIG. 2 are denoted by the same reference numerals, and detailed description thereof will be omitted below.

  Referring to FIG. 3, in this embodiment, the first and second alternative gases from between the second mass flow controllers 9a and 9b and the on-off valves 11a and 11b in the first and second exhaust pipes 8a and 8b, respectively. The supply pipelines 12a and 12b are branched, and the first and second alternative gas supply pipelines 12a and 12b are connected to the first and second alternative gas supply sources 13a and 13b, respectively.

Furthermore, on-off valves 14a and 14b are provided in the first and second alternative gas supply lines 12a and 12b, respectively.
The on-off valves 14 a and 14 b are controlled by the control unit 10.

  The types of alternative gas supplied by the first and second alternative gas supply sources 13a and 13b are not particularly limited, and the alternative gas supply sources 13a and 13b may be constituted by, for example, a pump that supplies outside air.

Also in this embodiment, similarly to the embodiment of FIG. 2, the first and second exhaust pipes 8a and 8b are switched in accordance with the switching of the supply of the additive gas.
Further, in this embodiment, the first and second exhaust pipes 8a and 8b are not used for the current supply of the additive gas but are preliminarily related for the supply of the next additive gas. When the opening degree of the exhaust pipe line, for example, the second exhaust pipe line 8b, in which the opening degree of the mass flow controllers 9a, 9b is adjusted, the opening / closing valve 14b of the second alternative gas supply pipe line 12b is adjusted. Is opened, and the alternative gas is supplied from the second alternative gas supply source 13b to the second exhaust pipe 8b. In this way, the second mass flow controller 9b whose opening degree has been adjusted waits until the start of the supply of the next additive gas in a state where the alternative gas has flowed therein.

  Then, when the supply of the current additive gas (using the first exhaust pipe 8a) is completed, the on-off valve 11a of the first exhaust pipe 8a is closed, while the on-off valve 14b is closed and the second The supply of the substitute gas to the exhaust pipe 8b is stopped, the on-off valve 11b of the second exhaust pipe 8b is opened, and the next additive gas is supplied using the second exhaust pipe 8b. Be started.

  In parallel with the supply of the additive gas, the on-off valve 14a of the first alternative gas supply line 12a is opened, and the alternative gas is supplied from the first alternative gas supply source 13a to the first exhaust line 8a. At the same time, the opening degree of the first mass flow controller 9a of the first exhaust pipe line 8a is adjusted. Thus, the first mass flow controller 9a whose opening degree has been adjusted waits until the start of the supply of the next additive gas in a state where the alternative gas has flowed therein.

  When the supply of the additive gas (using the second exhaust pipe line 8b) is completed, the on-off valve 11b of the second exhaust pipe line 8b is closed, while the on-off valve 14a is closed and the first exhaust gas is closed. While the supply of the substitute gas to the pipe line 8a is stopped, the on-off valve 11a of the first exhaust pipe line 8a is opened, and the supply of the next additive gas is performed using the first exhaust pipe line 8a. Be started.

  In this embodiment, the exhaust pipe can be switched, and not only the opening degree of the mass flow controller of the exhaust pipe used for the supply of the next additive gas is set in advance, but also set when the previous additive gas is supplied. In addition to the effect obtained in the embodiment of FIG. 2, the effect of switching the supply of the additive gas at a higher speed can be obtained.

FIG. 4 is a diagram showing a schematic configuration of a gas supply device according to still another embodiment of the present invention.
The embodiment of FIG. 4 differs from the embodiment of FIG. 1 only in the configuration relating to the source gas injection pipe. Therefore, in FIG. 4, the same components as those shown in FIG. 1 are denoted by the same reference numerals, and detailed description thereof will be omitted below.

  Referring to FIG. 4, in this embodiment, source gas discharge pipes 15a and 15b branch from between first mass flow controllers 6a and 6b and on-off valves 7a and 7b in source gas injection pipes 3a and 3b, On-off valves 16a and 16b are provided in the source gas discharge pipes 15a and 15b. The on-off valves 16 a and 16 b are controlled by the control unit 10.

  In this embodiment, the supply of the additive gas is switched by switching the source gas injection pipes 3a, 3b by switching the opening / closing valves 7a, 7b. That is, the raw material gas is not mixed, and the raw material gas is supplied as it is as an additive gas from the additive gas supply pipe 4 to the gas passage 5.

For example, when the on-off valve 7a is opened and the on-off valve 7b is closed, the source gas (added gas) is supplied from the source gas supply source 1a to the gas mixing pipe 2 through the source gas injection pipe 3a. The opening / closing valve 16b of the source gas discharge line 15b is opened, and at the same time, the opening of the first mass flow controller 6b in the source gas injection line 3b determines the concentration / flow rate of the additive gas (source gas) to be supplied next. It is adjusted based on the set value.
Thus, the first mass flow controller 6b whose opening degree has been adjusted waits until the supply of the additive gas starts in a state where the additive gas (raw material gas) to be supplied next is flowed inside.

When the supply of the source gas (addition gas) from the source gas supply source 1a is completed (when the set time of the supply time of the additive gas has elapsed), the on-off valve 7a is closed and the on-off valve 16b is closed. The on-off valve 7b is opened, and an additive gas (raw material gas) is supplied from the raw material gas supply source 1b to the gas mixing line 2 through the raw material gas injection line 3b.
In parallel with this, the opening / closing valve 16a of the raw material gas discharge line 15a is opened, and at the same time, the opening of the first mass flow controller 6a of the raw material gas injection line 3a determines the additional gas (raw material gas) to be supplied next. ) Is adjusted based on the concentration / flow rate setting values.
Thus, the first mass flow controller 6a whose opening degree has been adjusted is in a standby state until the supply of the additive gas starts in a state where the additive gas (raw material gas) to be supplied next is flowed inside.

  According to this embodiment, in addition to the effect obtained in the embodiment of FIG. 1, there is an effect that the supply gas supply can be switched at a higher speed.

  The configuration of the present invention has been described based on some preferred embodiments. However, the configuration of the present invention is not limited to the above-described embodiments, and those skilled in the art will be described in the claims attached to this application. It goes without saying that various modifications can be easily devised within the scope of the configuration described above.

  For example, in the embodiment of FIG. 1, only one gas mixing line 2 is provided, but as shown in FIG. 5, a plurality of gas mixing lines 2, 2 ′ are provided, and these gas mixing lines are provided. 2 and 2 ′ may be branched from one end 4 a of the gas supply pipe 4.

  According to this modification, when an additive gas is generated by mixing raw material gases, a plurality of different types of additive gases can be switched and supplied at high speed.

  In the above-described embodiment, the additive gas concentration / flow rate / supply time set value is determined in advance, but the additive gas concentration / flow rate / supply time set value is set to, for example, the gas flow rate set value in the gas flow path 5. Based on the above, the mixing ratio between the gas in the gas flow path 5 and the additive gas can be determined to be always constant, or the additive gas concentration, flow rate, and supply time set values can be determined as follows. Based on the measured value of the flow rate of the gas flowing through the gas channel 5 or the measured flow rate of the mixed gas of the gas flowing in the gas channel 5 and the additive gas, the mixing ratio of the gas and the additive gas in the gas channel 5 is always constant. It can also be determined as follows.

  In the above-described embodiment, the additive gas supply pipe 4 (the other end 4b) is connected to the middle portion of the gas flow path 5. However, the other end 4b of the additive gas supply pipe 4 is connected to the inlet of the gas flow path 5. The gas supply device of the present invention can also be used as a supply source of gas flowing through the gas flow path 5 by connecting to the end.

1a, 1b, 1c, 1d Source gas supply source 2, 2 ′ Gas mixing line 2a, 2a ′ One end 2b, 2b ′ Other end 3a, 3b, 3c, 3d Source gas injection line 4 Additional gas supply line 4a One end 4b Other end 5 Gas flow paths 6a, 6b, 6c, 6d First mass flow controller (flow rate controller)
7a, 7b, 7c, 7d On-off valves 8, 8a, 8b Exhaust pipes 9, 9a, 9b Second mass flow controller (flow rate controller)
DESCRIPTION OF SYMBOLS 10 Control part 11a, 11b On-off valve 12a, 12b Alternative gas supply line 13a, 13b Alternative gas supply source 14a, 14b On-off valve 15a, 15b Raw material gas discharge line 16a, 16b On-off valve

Claims (5)

A gas supply device that supplies an additive gas to a gas flow path through which gas flows,
A plurality of source gas supply sources each supplying a source gas of the additive gas;
A gas mixing line for generating the additive gas from the source gas;
A plurality of source gas injection pipes each branching from one end of the gas mixing pipe and connected to the plurality of source gas supply sources;
An additive gas supply line having one end connected to the other end of the gas mixing line and the other end connected to the gas flow path;
A first flow rate controller provided downstream of the source gas supply source in the source gas injection line;
A plurality of exhaust pipes branched from the other end of the additive gas supply pipe or from the front of the other end of the additive gas supply pipe;
A second flow rate controller provided in each of the plurality of exhaust lines;
A first on-off valve provided on the upstream side of the second flow rate controller in each of the plurality of exhaust pipe lines;
The first and second flow rate controllers and the first on-off valve based on the additive gas concentration / flow rate / supply time setting values determined in advance or determined based on the flow rate measurement value in the gas flow path And a control unit for controlling the gas supply device. An alternative gas supply line branched from between the second flow rate controller and the first on-off valve in the exhaust line;
An alternative gas supply source connected to the alternative gas supply line;
A second on-off valve provided on the downstream side of the alternative gas supply source in the alternative gas supply line,
2. The gas supply device according to claim 1, wherein the second on-off valve is controlled by the control unit based on the additive gas concentration / flow rate / supply time set value. The apparatus further comprises a third on-off valve provided on the downstream side of the first flow rate controller in the source gas injection line, and the third on-off valve is controlled by the controller by the additive gas concentration, flow rate, The gas supply device according to claim 1, wherein the gas supply device is controlled based on a supply time set value. A source gas discharge line branched from between the first flow rate controller and the third on-off valve in the source gas injection line;
  A fourth on-off valve provided in the source gas discharge pipe, and the fourth on-off valve is controlled by the control unit based on the additive gas concentration / flow rate / supply time set value. The gas supply device according to claim 3. 5. The gas mixing pipe according to claim 1, wherein a plurality of the gas mixing pipes are provided, and each of the plurality of gas mixing pipes is branched from the one end of the gas supply pipe. Gas supply device.

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