JP6327150B2 - Shot processing device - Google Patents

Shot processing device Download PDF

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JP6327150B2
JP6327150B2 JP2014542614A JP2014542614A JP6327150B2 JP 6327150 B2 JP6327150 B2 JP 6327150B2 JP 2014542614 A JP2014542614 A JP 2014542614A JP 2014542614 A JP2014542614 A JP 2014542614A JP 6327150 B2 JP6327150 B2 JP 6327150B2
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projection
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JPWO2014119136A1 (en
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万俊 山本
万俊 山本
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Sintokogio Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • B24C3/10Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces for treating external surfaces
    • B24C3/14Apparatus using impellers

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
  • Attitude Control For Articles On Conveyors (AREA)
  • Projection Apparatus (AREA)

Description

本発明は、被処理対象物に対して投射材を投射するショット処理装置に関する。   The present invention relates to a shot processing apparatus that projects a projection material onto an object to be processed.

ショットブラスト装置としては、例えば、金属製の製品のスケール除去等に用いられるクレーン吊下げ式ショットブラスト装置が知られている(例えば、特許文献1参照)。このような装置では、搬送路の側面に遠心式投射機が配置され、被処理対象物である製品を吊り下げて所定方向に移動させると共に、製品全体を表面処理するために、製品を反転、正転させたり傾動させたりしながら当該製品に対して投射材を投射している。   As a shot blasting device, for example, a crane hanging type shot blasting device used for removing a scale of a metal product is known (for example, see Patent Document 1). In such an apparatus, a centrifugal projector is arranged on the side surface of the conveyance path, and the product that is the object to be processed is suspended and moved in a predetermined direction, and the product is inverted to surface-treat the entire product. The projection material is projected onto the product while rotating forward or tilting.

特表2010−533072公報Special table 2010-533072 gazette

しかしながら、被処理対象物である製品が大型の場合、製品を吊り下げた状態で所望の反転、正転や傾動をさせるのが難しいため、製品の全面を表面処理するのが難しい。   However, when the product to be processed is large, it is difficult to perform desired reversal, normal rotation, and tilting in a suspended state, so that it is difficult to surface-treat the entire surface of the product.

本発明は、上記事実を考慮して、大型の被処理対象物の全面を表面処理することができるショット処理装置を得ることが目的である。   In view of the above fact, an object of the present invention is to obtain a shot processing apparatus capable of surface-treating the entire surface of a large object to be processed.

請求項1に記載する本発明のショット処理装置は、被処理対象物を吊り下げる吊下部と、前記吊下部を被処理対象物の搬送ラインに沿って直進移動させる直進移動機構と、羽根車の回転に伴って前記搬送ライン側に向けて投射材を投射すると共に、投射方向中心線が前記搬送ラインに対して、平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で斜め上側、及び側面視で斜め下側からそれぞれ交わるように複数設置された遠心式投射機と、を有する。「搬送方向斜め前側」、「搬送方向斜め後側」は、投射方向中心線の、搬送ライン上の被処理対象物との関係について言うものである。(以下の各段落の記載においても同じ)」   According to a first aspect of the present invention, there is provided a shot processing apparatus according to the present invention, a hanging portion for suspending an object to be processed, a rectilinear movement mechanism for moving the hanging portion straight along a conveyance line of the object to be processed, and an impeller The projection material is projected toward the transport line side with the rotation, and the projection direction center line is obliquely forward in the transport direction in plan view, obliquely in the transport direction in plan view, and in plan view with respect to the transport line. And a plurality of centrifugal projectors installed so as to cross each other from the diagonally left side in the conveying direction, diagonally right side in the conveying direction in plan view, diagonally upward in the side view, and diagonally downward in the side view. “Slanting front side in the transport direction” and “diagonal rear side in the transport direction” refer to the relationship between the projection direction center line and the object to be processed on the transport line. (The same applies to the paragraphs below)

請求項1に記載する本発明のショット処理装置によれば、吊下部が被処理対象物を吊り下げ、吊下部を直進移動機構が被処理対象物の搬送ラインに沿って直進移動させる。そして、遠心式投射機が羽根車の回転に伴って搬送ライン側に向けて投射材を投射する。ここで、遠心式投射機は、投射方向中心線が被処理対象物の搬送ラインに対して、平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で(搬送ラインの側方側から見て)斜め上側、及び側面視で(搬送ラインの側方側から見て)斜め下側からそれぞれ交わるように複数設置されている。このため、複数の遠心式投射機が被処理対象物に向けて平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で斜め上側、及び側面視で斜め下側から投射材を投射する。よって、複数の遠心式投射機は、大型の被処理対象物の全面を表面処理する。   According to the shot processing apparatus of the first aspect of the present invention, the hanging portion suspends the object to be processed, and the linear movement mechanism moves the hanging portion straight along the conveyance line of the object to be processed. And a centrifugal projector projects a projection material toward the conveyance line side with rotation of an impeller. Here, the centrifugal projector has a projection direction center line that is obliquely forward in the conveyance direction in plan view, obliquely in the conveyance direction in plan view, and obliquely left in the conveyance direction in plan view, with respect to the conveyance line of the object to be processed. Multiple installations cross each other from the diagonally right side of the conveyance direction in plan view, diagonally from the side (viewed from the side of the conveyance line), and diagonally from the side (viewed from the side of the conveyance line). Has been. For this reason, a plurality of centrifugal projectors are obliquely forward in the transport direction in plan view, obliquely in the transport direction in plan view, obliquely left in the transport direction in plan view, obliquely in the transport direction in plan view, in plan view, The projection material is projected from an obliquely upper side in a side view and from an obliquely lower side in a side view. Thus, the plurality of centrifugal projectors surface-treat the entire surface of the large object to be processed.

請求項2に記載する本発明のショット処理装置は、請求項1記載の構成において、前記遠心式投射機として、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第一投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第二投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第三投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第四投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第五投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第六投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第七投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第八投射機と、を備える。   According to a second aspect of the present invention, there is provided the shot processing apparatus according to the first aspect, wherein the centrifugal projector has a projection direction center line that is obliquely rearward in the conveyance direction in a plan view with respect to the conveyance line. The first projector installed so that it crosses obliquely from the left in the conveying direction and from the lower side in side view, and the center line of the projection direction is conveyed obliquely rearward in the conveying direction in plan view and in plan view with respect to the conveying line A second projector installed obliquely on the left side and obliquely from above in a side view, and a projection direction center line is obliquely rearward in the conveyance direction in plan view and obliquely in the conveyance direction in plan view with respect to the conveyance line; A third projector installed so as to cross obliquely from the lower side in a side view, and a projection direction center line obliquely rearward in the conveyance direction in a plan view with respect to the conveyance line and obliquely in the right direction in the conveyance direction in a plan view Crossed diagonally from above The fourth projector installed in such a manner that the center line of the projection direction intersects the transport line obliquely from the front in the transport direction in plan view, obliquely from the left in the transport direction in plan view, and obliquely from the lower side in the side view. And a sixth projector installed such that the center line in the projection direction intersects the transport line obliquely from the front in the transport direction in the plan view, diagonally from the left in the transport direction in the plan view, and from the diagonally upper side in the side view. A seventh projection device installed such that the center line in the projection direction intersects the transport line obliquely from the front side in the plan view and from the diagonally right side in the plan view and from the obliquely lower side in the side view; And an eighth projector installed such that the center line intersects the transport line obliquely from the front in the transport direction in plan view, obliquely from the right in the transport direction in plan view, and obliquely from the upper side in the side view.

請求項2に記載する本発明のショット処理装置によれば、第一投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第二投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。   According to the shot processing apparatus of the present invention described in claim 2, the first projector is transported obliquely rearward in the transport direction in plan view with respect to the transport line of the object to be processed, and transported in plan view. It is installed so that it crosses diagonally from the left side in the direction and from the lower side in the side view. Projection material is projected from The second projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the object to be processed from the obliquely rear side in the conveyance direction in a plan view and from the obliquely upper side in the conveyance direction obliquely left side and in a side view in a plan view.

第三投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。第四投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The third projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the rear side in the conveyance direction in plan view, obliquely from the right side in the conveyance direction in plan view, and obliquely from the lower side in side view. Therefore, the projection material is projected toward the object to be processed from the obliquely rear side in the conveyance direction in a plan view and from the obliquely lower side in the conveyance direction obliquely to the right side and in a side view. The fourth projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the rear side in the conveyance direction in plan view, obliquely from the right in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally rear side in the conveyance direction in a plan view, from the diagonally right side in the conveyance direction in a plan view and from the diagonally upper side in a side view.

第五投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第六投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。   The fifth projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed obliquely from the front side in the conveyance direction in the plan view, obliquely from the left side in the conveyance direction in the plan view, and obliquely from the lower side in the side view. Therefore, the projection material is projected toward the object to be processed from the oblique front side in the transport direction in a plan view and from the diagonally lower side in the transport direction obliquely to the left and in a side view in plan view. The sixth projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the front in the conveyance direction in plan view, obliquely from the left in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the transport direction in a plan view and from the diagonally upper side in the transport direction diagonally left side and in a side view.

第七投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。第八投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The seventh projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed obliquely from the front in the conveyance direction in plan view, obliquely from the right in the conveyance direction in plan view, and obliquely from the bottom in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the conveyance direction in a plan view and from the diagonally lower side in the conveyance direction diagonally to the right side and in a side view. The eighth projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the front in the conveyance direction in the plan view, obliquely from the right in the conveyance direction in the plan view, and obliquely from the upper side in the side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the transport direction in a plan view, from the diagonally right side in the transport direction in a plan view and from the diagonally upper side in a side view.

請求項3に記載する本発明のショット処理装置は、請求項1記載の構成において、前記遠心式投射機として、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ側面視で斜め下側から交わるようになおかつ平面視で搬送ラインに沿いかつ搬送ラインと重なる方向に設置された第一投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第二投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第三投射機と、投射方向中心線が前記搬送ラインに対して側面視で搬送方向斜め前側かつ側面視で斜め下側から交わるようになおかつ平面視で搬送ラインに沿いかつ搬送ラインと重なる方向に設置された第四投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第五投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第六投射機と、を備える。   According to a third aspect of the present invention, there is provided the shot processing apparatus according to the first aspect, wherein, as the centrifugal projector, the center line in the projection direction is obliquely rearward and side in the conveying direction in plan view with respect to the conveying line. A first projector installed so as to cross obliquely from below and in a direction along the conveyance line in a plan view and overlapping the conveyance line, and the projection direction center line is oblique to the conveyance line in the conveyance direction in plan view A second projector installed so as to intersect from the diagonally left side in the conveyance direction in the rear side and in the plan view and from the diagonally upper side in the side view, and the projection direction center line obliquely in the conveyance direction in the plane direction with respect to the conveyance line A third projector installed so as to cross from the diagonally right side in the conveying direction and from the diagonally upper side in the side view, and the projection direction center line obliquely downward in the conveying direction in the lateral direction and in the lateral direction with respect to the conveying line From In addition, the fourth projector installed along the conveyance line in a plan view and overlapping with the conveyance line, and the projection direction center line is conveyed obliquely forward in the conveyance direction in a plan view with respect to the conveyance line and in a plan view. A fifth projector installed so as to cross diagonally from the left side and from the upper side in a side view, and a projection direction center line obliquely forward from the transport direction in a plan view with respect to the transport line and a diagonally right side and a side in a transport direction in plan view And a sixth projector installed so as to intersect obliquely from above.

請求項3に記載する本発明のショット処理装置によれば、第一投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ側面視で斜め下側から交わるようになおかつ平面視で被処理対象物の搬送ラインに沿いかつ搬送ラインと重なる方向に設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ側面視で斜め下側から投射材を投射する。第二投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第三投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   According to the shot processing apparatus of the present invention described in claim 3, the first projector has a projection direction center line that is obliquely rearward in the conveying direction in plan view and obliquely viewed in side view with respect to the conveying line of the object to be processed. Since it is installed along the transfer line of the object to be processed in a plan view so as to cross from the lower side and overlap the transfer line, the transfer direction is obliquely rearward and side view toward the object to be processed in a plan view Project the projectile from diagonally below. The second projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the object to be processed from the obliquely rear side in the conveyance direction in a plan view and from the obliquely upper side in the conveyance direction obliquely left side and in a side view in a plan view. The third projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the rear in the conveyance direction in plan view, obliquely from the right in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally rear side in the conveyance direction in a plan view, from the diagonally right side in the conveyance direction in a plan view and from the diagonally upper side in a side view.

第四投射機は、投射方向中心線が被処理対象物の搬送ラインに対して側面視で搬送方向斜め前側かつ側面視で斜め下側から交わるようになおかつ平面視で被処理対象物の搬送ラインに沿いかつ搬送ラインと重なる方向に設置されているので、被処理対象物に向けて側面視で搬送方向斜め前側かつ側面視で斜め下側から投射材を投射する。第五投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第六投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The fourth projector is configured such that the center line of the projection direction intersects with the conveyance line of the object to be processed from the obliquely front side of the conveyance direction in a side view and from the obliquely lower side in a side view, and the conveyance line of the object to be processed in a plan view. The projection material is projected toward the object to be treated from the obliquely lower side in the front side view and the side obliquely in the side view. The fifth projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed obliquely from the front in the conveyance direction in the plan view, obliquely from the left in the conveyance direction in the plan view, and obliquely from the upper side in the side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the transport direction in a plan view and from the diagonally upper side in the transport direction diagonally left side and in a side view. The sixth projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed obliquely from the front in the conveyance direction in plan view, obliquely from the right in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the transport direction in a plan view, from the diagonally right side in the transport direction in a plan view and from the diagonally upper side in a side view.

請求項4に記載する本発明のショット処理装置は、請求項1記載の構成において、前記遠心式投射機として、投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側から交わるように設置された第一投射機と、投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側から交わるように設置された第二投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第三投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第四投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第五投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第六投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第七投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第八投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第九投射機と、投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第十投射機と、投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側から交わるように設置された第十一投射機と、投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側から交わるように設置された第十二投射機と、を備える。   According to a fourth aspect of the present invention, there is provided the shot processing apparatus according to the first aspect, wherein, as the centrifugal projector, the center line in the projection direction is horizontal and obliquely in the conveyance direction in plan view with respect to the conveyance line. The first projector is installed so as to cross from the left side and in the conveyance direction obliquely in plan view, and the projection direction center line is horizontal and the conveyance direction is obliquely rearward and planar in the plan view with respect to the conveyance line. The second projector installed so as to intersect diagonally from the right side, and the projection direction center line intersect with the conveyance line obliquely from the rear side in the conveyance direction in plan view and obliquely from the left side in the conveyance direction and from the diagonally upper side in side view. And the third projector installed in such a manner that the center line in the projection direction intersects the transport line obliquely from the rear in the transport direction in plan view, obliquely from the right in the transport direction in plan view, and obliquely from the upper side in side view. First A projector and a fifth projector installed so that the center line in the projection direction intersects the transport line obliquely from the rear in the transport direction in plan view, obliquely from the left in the transport direction in plan view, and obliquely from the bottom in side view; A sixth projector installed such that the center line of the projection direction intersects the transport line obliquely rearward in the plan view with respect to the transport line, obliquely on the right side in the transport direction in plan view, and obliquely below in the side view; A seventh projector installed such that the center line intersects the transport line obliquely in front of the transport line in plan view, obliquely on the left side of transport direction in plan view, and obliquely below in side view; An eighth projector installed so as to intersect with the conveyance line obliquely in the conveyance direction in plan view, obliquely in the conveyance direction in plan view, and obliquely from the lower side in side view, and the projection direction center line with respect to the conveyance line In the plan view A ninth projector installed so as to cross from the front side and in the transport direction obliquely from the left side and from the obliquely upper side in the side view, and the projection direction center line obliquely forward and in the transport direction in plan view with respect to the transport line And the tenth projector installed so as to cross from the diagonally right side in the conveyance direction and from the diagonally upper side in side view, and the projection direction center line is horizontal and conveyed in the conveyance direction diagonally front side and in plan view with respect to the conveyance line The eleventh projector installed so as to cross from the left side of the direction, and the center line of the projection direction is horizontal and crosses the transport line obliquely from the front in the transport direction in plan view and from the right side of the transport direction in plan view And a twelfth projector installed.

請求項4に記載する本発明のショット処理装置によれば、第一投射機は、投射方向中心線が水平でかつ被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側から水平に投射材を投射する。第二投射機は、投射方向中心線が水平でかつ被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側から水平に投射材を投射する。   According to the shot processing apparatus of the present invention as set forth in claim 4, the first projector has a projection direction center line that is horizontal and is obliquely rearward and flat in the conveyance direction in plan view with respect to the conveyance line of the object to be processed. Since it is installed so as to cross from the diagonally left side in the conveyance direction as viewed, the projection material is projected toward the object to be processed horizontally from the diagonally rear side in the conveyance direction in plan view and from the diagonally left side in the conveyance direction in plan view. Since the second projector is installed so that the center line in the projection direction is horizontal and intersects from the diagonally right side in the conveyance direction in plan view and the diagonally right side of the conveyance direction in plan view with respect to the conveyance line of the object to be processed. A projection material is projected horizontally toward the object to be processed from the diagonally rear side in the transport direction in plan view and from the diagonally right side in the transport direction in plan view.

第三投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第四投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The third projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed from the diagonally rear side in the conveyance direction in plan view, diagonally from the left in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the object to be processed from the obliquely rear side in the conveyance direction in a plan view and from the obliquely upper side in the conveyance direction obliquely left side and in a side view in a plan view. The fourth projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the rear side in the conveyance direction in plan view, obliquely from the right in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally rear side in the conveyance direction in a plan view, from the diagonally right side in the conveyance direction in a plan view and from the diagonally upper side in a side view.

第五投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第六投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。   The fifth projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed obliquely from the rear side in the conveyance direction in plan view, obliquely from the left in the conveyance direction in plan view, and obliquely from the lower side in side view. Therefore, the projection material is projected toward the object to be processed from the obliquely rear side in the transport direction in a plan view and from the obliquely lower side in the transport direction obliquely to the left and in a side view in a plan view. The sixth projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the rear side in the conveyance direction in plan view, obliquely from the right side in the conveyance direction in plan view, and obliquely from the lower side in side view. Therefore, the projection material is projected toward the object to be processed from the obliquely rear side in the conveyance direction in a plan view and from the obliquely lower side in the conveyance direction obliquely to the right side and in a side view.

第七投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第八投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。   The seventh projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the front in the conveyance direction in the plan view, obliquely from the left in the conveyance direction in the plan view, and obliquely from the lower side in the side view. Therefore, the projection material is projected toward the object to be processed from the oblique front side in the transport direction in a plan view and from the diagonally lower side in the transport direction obliquely to the left and in a side view in plan view. The eighth projector is installed such that the center line in the projection direction intersects with the conveyance line of the object to be processed obliquely from the front in the conveyance direction in the plan view, obliquely from the right in the conveyance direction in the plan view, and obliquely from the bottom in the side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the conveyance direction in a plan view and from the diagonally lower side in the conveyance direction diagonally to the right side and in a side view.

第九投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第十投射機は、投射方向中心線が被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The ninth projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed obliquely from the front in the conveyance direction in plan view, obliquely from the left in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the transport direction in a plan view and from the diagonally upper side in the transport direction diagonally left side and in a side view. The tenth projector is installed such that the center line in the projection direction intersects the conveyance line of the object to be processed from the diagonally front side in the conveyance direction in plan view, from the diagonally right side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the object to be processed from the diagonally front side in the transport direction in a plan view, from the diagonally right side in the transport direction in a plan view and from the diagonally upper side in a side view.

第十一投射機は、投射方向中心線が水平でかつ被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側から投射材を水平に投射する。第十二投射機は、投射方向中心線が水平でかつ被処理対象物の搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側から交わるように設置されているので、被処理対象物に向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側から投射材を水平に投射する。   The eleventh projector is installed so that the center line in the projection direction is horizontal and intersects from the diagonally left side in the transport direction in plan view and the diagonally left side in plan view with respect to the transport line of the object to be processed. A projection material is projected horizontally toward the object to be processed from the front side in the transport direction obliquely in plan view and from the left side in the transport direction obliquely in plan view. Since the twelfth projector is installed so that the center line in the projection direction is horizontal and intersects from the oblique front side in the transport direction in the plan view and the oblique right side in the transport direction in the plan view with respect to the transport line of the object to be processed. A projection material is projected horizontally toward the object to be processed from the oblique front side in the transport direction in plan view and from the diagonally right side in the transport direction in plan view.

請求項5に記載する本発明のショット処理装置は、請求項1〜請求項4のいずれか1項に記載の構成において、前記搬送ラインにおいて複数の前記遠心式投射機の各々によって投射材が投射される投射ゾーンが当該搬送ラインに沿って複数設定され、複数の前記投射ゾーンに対してそれぞれ搬送方向上流側に設けられて被処理対象物の通過を検出する上流側検出部と、複数の前記投射ゾーンに対してそれぞれ搬送方向下流側に設けられて被処理対象物の通過を検出する下流側検出部と、前記遠心式投射機への投射材の供給用とされて前記遠心式投射機に対して投射材の供給及び供給停止が可能な投射材供給部と、前記上流側検出部による検出結果及び前記下流側検出部による検出結果に基づいて、被処理対象物が前記投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように前記投射材供給部を制御する制御部と、を有する。   A shot processing apparatus according to a fifth aspect of the present invention is the shot processing apparatus according to any one of the first to fourth aspects, wherein the projection material is projected by each of the plurality of centrifugal projectors in the transport line. A plurality of projection zones to be set along the conveyance line, an upstream side detection unit that is provided on the upstream side in the conveyance direction with respect to the plurality of projection zones, and detects the passage of the object to be processed; A downstream detection unit that is provided on the downstream side in the transport direction with respect to the projection zone and detects the passage of the object to be processed, and is used for supplying a projection material to the centrifugal projector, and is used for the centrifugal projector. On the other hand, based on the projection material supply unit capable of supplying and stopping the supply of the projection material, the detection result by the upstream detection unit, and the detection result by the downstream detection unit, the object to be processed is one of the projection zones. of And a control unit for controlling the projection material supply unit to project projection material to the projection zone only if it is determined that the 囲内.

請求項5に記載する本発明のショット処理装置によれば、被処理対象物の搬送ラインにおいて複数の遠心式投射機の各々によって投射材が投射される投射ゾーンが当該搬送ラインに沿って複数設定されている。なお、投射ゾーン同士は重なっていてもよいし離れていてもよい。複数の投射ゾーンに対してそれぞれ搬送方向上流側には上流側検出部が設けられ、複数の投射ゾーンに対してそれぞれ搬送方向下流側には下流側検出部が設けられており、上流側検出部及び下流側検出部は、被処理対象物の通過を検出する。また、遠心式投射機への投射材の供給用とされた投射材供給部は、遠心式投射機に対して投射材の供給及び供給停止が可能となっている。そして、制御部は、上流側検出部による検出結果及び下流側検出部による検出結果に基づいて、被処理対象物が投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように投射材供給部を制御する。よって、遠心式投射機による無駄な投射を抑えることができる。   According to the shot processing apparatus of the present invention as set forth in claim 5, a plurality of projection zones are set along the transport line, on which the projection material is projected by each of the plurality of centrifugal projectors in the transport line of the object to be processed. Has been. Note that the projection zones may overlap each other or may be separated from each other. An upstream detection unit is provided on the upstream side in the conveyance direction for each of the plurality of projection zones, and a downstream detection unit is provided on the downstream side in the conveyance direction for each of the plurality of projection zones. The downstream detection unit detects the passage of the object to be processed. Moreover, the projection material supply part used for the supply of the projection material to the centrifugal projector can supply and stop supplying the projection material to the centrifugal projector. Then, the control unit enters the projection zone only when it is determined that the object to be processed is within one of the projection zones based on the detection result by the upstream detection unit and the detection result by the downstream detection unit. The projection material supply unit is controlled to project the projection material. Therefore, useless projection by the centrifugal projector can be suppressed.

請求項6に記載する本発明のショット処理装置は、請求項1〜請求項5のいずれか1項に記載の構成において、前記遠心式投射機によって投射材が投射される第一処理室と、前記第一処理室よりも被処理対象物の搬送方向下流側に設けられ、圧縮空気とともに投射材を噴射する噴射ノズルが設置された第二処理室と、を有する。   A shot processing apparatus according to a sixth aspect of the present invention is the shot processing apparatus according to any one of the first to fifth aspects, wherein a first processing chamber in which a projection material is projected by the centrifugal projector, A second processing chamber provided downstream of the first processing chamber in the conveyance direction of the object to be processed and provided with an injection nozzle for injecting a projection material together with compressed air.

請求項6に記載する本発明のショット処理装置によれば、第一処理室では、遠心式投射機によって投射材が投射されることで被処理対象物の表面が処理される。第一処理室で表面処理された被処理対象物は、第一処理室よりも被処理対象物の搬送方向下流側に設けられた第二処理室に搬送される。第二処理室には、圧縮空気とともに投射材を噴射する噴射ノズルが設置されている。よって、噴射ノズルから被処理対象物に向けて圧縮空気とともに投射材が噴射されれば、被処理対象物の表面がさらに処理される。   According to the shot processing apparatus of the present invention described in claim 6, in the first processing chamber, the surface of the object to be processed is processed by projecting the projection material by the centrifugal projector. The object to be processed that has been surface-treated in the first processing chamber is transferred to a second processing chamber that is provided downstream of the first processing chamber in the transfer direction of the object to be processed. An injection nozzle that injects the projection material together with the compressed air is installed in the second processing chamber. Therefore, if the projection material is jetted together with the compressed air from the jet nozzle toward the target object, the surface of the target object is further processed.

請求項7に記載する本発明のショット処理装置は、請求項6記載の構成において、閉止状態で前記第一処理室と前記第二処理室との間の流通路を遮断する開閉可能な仕切扉が設けられている。   According to a seventh aspect of the present invention, there is provided the shot processing apparatus according to the sixth aspect, wherein the openable and closable partition door is configured to block the flow path between the first processing chamber and the second processing chamber in the closed state. Is provided.

請求項7に記載する本発明のショット処理装置によれば、開閉可能な仕切扉は、閉止状態で第一処理室と第二処理室との間の流通路を遮断する。よって、仕切扉が閉止されることで第一処理室と第二処理室とで同時に被処理対象物の表面処理をすることができる。   According to the shot processing apparatus of the present invention described in claim 7, the openable and closable partition door blocks the flow path between the first processing chamber and the second processing chamber in the closed state. Therefore, it is possible to simultaneously treat the surface of the object to be processed in the first processing chamber and the second processing chamber by closing the partition door.

以上説明したように、本発明に係るショット処理装置によれば、大型の被処理対象物の全面を表面処理することができるという優れた効果を有する。   As described above, the shot processing apparatus according to the present invention has an excellent effect that the entire surface of a large object to be processed can be surface-treated.

本発明の第1の実施形態に係るショットブラスト装置を示す正面図である。1 is a front view showing a shot blasting apparatus according to a first embodiment of the present invention. 図1の2−2線矢視図である。FIG. 2 is a view taken along line 2-2 in FIG. 1. 図1の3−3線矢視図である。FIG. 3 is a view taken along line 3-3 in FIG. 1. 本発明の第1の実施形態に係るショットブラスト装置を示す平面図である。1 is a plan view showing a shot blasting apparatus according to a first embodiment of the present invention. 本発明の第1の実施形態に係るショットブラスト装置の出口扉の駆動部を示す図である。図5(A)は正面図であり、図5(B)は側面図である。It is a figure which shows the drive part of the exit door of the shot blasting apparatus which concerns on the 1st Embodiment of this invention. FIG. 5A is a front view, and FIG. 5B is a side view. 本発明の第1の実施形態に係るショットブラスト装置における第二ブラスト室の内部を示す拡大平面図である。It is an enlarged plan view which shows the inside of the 2nd blast chamber in the shot blasting apparatus which concerns on the 1st Embodiment of this invention. 本発明の第1の実施形態に係るショットブラスト装置における遠心式投射機による投射を説明するための模式的な平面図である。It is a typical top view for demonstrating the projection by the centrifugal projector in the shot blasting apparatus which concerns on the 1st Embodiment of this invention. 本発明の第2の実施形態に係るショットブラスト装置において被処理対象物の搬送方向に見た遠心式投射機の配置を示す図である。It is a figure which shows arrangement | positioning of the centrifugal projector seen in the conveyance direction of the to-be-processed target object in the shot blasting apparatus which concerns on the 2nd Embodiment of this invention. 図8の9−9線矢視図である。It is a 9-9 line arrow directional view of FIG. 本発明の第3の実施形態に係るショットブラスト装置において被処理対象物の搬送方向に見た遠心式投射機の配置を示す図である。It is a figure which shows arrangement | positioning of the centrifugal projector seen from the conveyance direction of the to-be-processed target object in the shot blasting apparatus which concerns on the 3rd Embodiment of this invention. 図10の11−11線矢視図である。It is a 11-11 line arrow directional view of FIG.

[第1の実施形態]
本発明の第1の実施形態に係るショット処理装置としてのショットブラスト装置について図1〜図7を用いて説明する。なお、これらの図において適宜示される矢印FRは装置正面視の手前側を示しており、矢印UPは装置上方側を示しており、矢印LHは装置正面視の左側を示している。また、矢印Xは、被処理対象物Wの搬送方向を示している。
[First Embodiment]
A shot blasting apparatus as a shot processing apparatus according to a first embodiment of the present invention will be described with reference to FIGS. In these drawings, an arrow FR appropriately shown indicates the front side of the apparatus when viewed from the front, an arrow UP indicates the upper side of the apparatus, and an arrow LH indicates the left side of the apparatus when viewed from the front. An arrow X indicates the conveyance direction of the workpiece W.

図1には、ショット処理装置としてのショットブラスト装置10が正面図にて示されている。図1では、図中左側から図中右側へ向かう方向が被処理対象物Wの搬送方向Xとなっている。図2には、図1の2−2線矢視の側面図が示され、図3には、図1の3−3線矢視の側面図が示されている。また、図4には、ショットブラスト装置10が平面図にて示されている。但し、図1では集塵機は省略されている。   FIG. 1 is a front view showing a shot blasting apparatus 10 as a shot processing apparatus. In FIG. 1, the direction from the left side to the right side in the drawing is the conveyance direction X of the workpiece W. 2 shows a side view taken along line 2-2 in FIG. 1, and FIG. 3 shows a side view taken along line 3-3 in FIG. 4 shows the shot blasting apparatus 10 in a plan view. However, the dust collector is omitted in FIG.

(ショットブラスト装置の装置概要)
まず、ショットブラスト装置10の装置概要について説明する。なお、本実施形態のショットブラスト装置10では、大型の金属製品を被処理対象物Wとすることが可能なクレーン吊下げ式のショットブラスト装置とされている。図1に示されるように、ショットブラスト装置10は、被処理対象物Wの搬送方向Xの上流側から順に、入口側エプロン室14、第一処理室としての第一ブラスト室16、出口側エプロン室18、及び第二処理室としての第二ブラスト室22を備えている。入口側エプロン室14への搬入口には、入口扉12が開閉可能に設けられている。出口側エプロン室18と第二ブラスト室22との間には、仕切扉としての中間扉20が開閉可能に設けられている。中間扉20は、閉止状態で第一ブラスト室16と第二ブラスト室22との間の流通路を遮断する。第二ブラスト室22の搬出口には、出口扉24が開閉可能に設けられている。
(Summary of shot blasting equipment)
First, an outline of the shot blasting apparatus 10 will be described. In addition, in the shot blasting apparatus 10 of this embodiment, it is set as the crane hanging type shot blasting apparatus which can make a large-sized metal product the to-be-processed target object W. As shown in FIG. 1, the shot blasting apparatus 10 includes an inlet apron chamber 14, a first blast chamber 16 as a first processing chamber, and an outlet apron in order from the upstream side in the conveyance direction X of the workpiece W. A chamber 18 and a second blast chamber 22 as a second processing chamber are provided. An entrance door 12 is provided at the entrance to the entrance apron chamber 14 so as to be opened and closed. An intermediate door 20 as a partition door is provided between the outlet apron chamber 18 and the second blast chamber 22 so as to be opened and closed. The intermediate door 20 blocks the flow path between the first blast chamber 16 and the second blast chamber 22 in the closed state. An exit door 24 is provided at the carry-out port of the second blast chamber 22 so as to be opened and closed.

第一ブラスト室16では、詳細後述する遠心式投射機42によって投射材が投射される。すなわち、第一ブラスト室16は、被処理対象物Wへの投射材の投射によって被処理対象物Wの表面加工(本実施形態では、スケール除去等の研掃処理、ショットブラスト処理)をなす部屋である。第一ブラスト室16は、天井部16Aによって装置上方側の空間と隔成されると共に、装置背面側の第一側壁部16B(図2参照)及び装置正面側の第二側壁部16Cによって、搬送方向Xに対する左右両側の外部空間と隔成されている。また、第一ブラスト室16の下方側に隣接する空間は、ホッパ部17の内部空間とされている。   In the first blast chamber 16, a projection material is projected by a centrifugal projector 42, which will be described in detail later. In other words, the first blast chamber 16 is a chamber that performs surface processing of the processing target object W by the projection of the projection material onto the processing target object W (in this embodiment, polishing treatment such as scale removal, shot blast processing). It is. The first blast chamber 16 is separated from the space above the apparatus by the ceiling 16A, and is conveyed by the first side wall 16B (see FIG. 2) on the apparatus rear side and the second side wall 16C on the apparatus front side. It is separated from the left and right external spaces with respect to the direction X. A space adjacent to the lower side of the first blast chamber 16 is an internal space of the hopper portion 17.

これに対して、第二ブラスト室22は、被処理対象物Wへ圧縮空気とともに投射材が噴射されることによって被処理対象物Wの表面加工(本実施形態では、研掃処理、ショットブラスト処理)をなす部屋である。第二ブラスト室22は、天井部22Aによって装置上方側の空間と隔成されると共に、装置背面側の第一側壁部22B(図4参照)及び装置正面側の第二側壁部22Cによって、搬送方向Xに対する左右両側の空間と隔成されている。また、第二ブラスト室22の床面は底壁部22Dによって構成されている。   On the other hand, in the second blast chamber 22, the surface treatment of the object to be processed W is performed by jetting the projection material together with the compressed air to the object to be processed W (in this embodiment, a polishing process and a shot blasting process). ). The second blast chamber 22 is separated from the space above the apparatus by the ceiling 22A, and is conveyed by the first side wall 22B (see FIG. 4) on the apparatus rear side and the second side wall 22C on the apparatus front side. It is separated from the left and right spaces with respect to the direction X. The floor surface of the second blast chamber 22 is constituted by a bottom wall portion 22D.

入口側エプロン室14の下方側には、投射材収集用のホッパ26Aが設けられ、ホッパ26Aの下方側には、投射材回収用の第一ベルトコンベヤ26Cが設けられている。第一ベルトコンベヤ26Cは、水平に配置されて図中左側から図中右側へ向かう方向を搬送方向とし、ホッパ26Aの直下範囲を超えて第一ブラスト室16の搬送方向下流側の下方側まで延びている。   A hopper 26A for collecting the projection material is provided below the inlet apron chamber 14, and a first belt conveyor 26C for collecting the projection material is provided below the hopper 26A. The first belt conveyor 26C is disposed horizontally and has a direction from the left side in the drawing to the right side in the drawing as a conveying direction, and extends to the lower side downstream of the first blast chamber 16 in the conveying direction beyond the range directly below the hopper 26A. ing.

また、出口側エプロン室18の下方側にはホッパ28Aが設けられ、第二ブラスト室22の下方側にもホッパ28Bが設けられている。ホッパ28A、28Bは、ともに投射材収集用とされている。ホッパ28A、28Bの下方側には、投射材回収用の第二ベルトコンベヤ28Cが設けられている。第二ベルトコンベヤ28Cは、水平に配置されて図中右側から図中左側へ向かう方向を搬送方向とし、ホッパ28Aの直下範囲及びホッパ28Bの直下範囲を含む範囲に配置されると共に、第二ベルトコンベヤ28Cの最下流側が第一ブラスト室16の搬送方向下流側の下方側まで延びている。   A hopper 28 </ b> A is provided below the outlet apron chamber 18, and a hopper 28 </ b> B is also provided below the second blast chamber 22. Both hoppers 28A and 28B are for collecting projection material. A second belt conveyor 28C for collecting the projection material is provided below the hoppers 28A and 28B. The second belt conveyor 28C is disposed horizontally and is disposed in a range including a range immediately below the hopper 28A and a range immediately below the hopper 28B, with the direction from the right side in the drawing toward the left side in the drawing being the conveyance direction. The most downstream side of the conveyor 28 </ b> C extends to the lower side on the downstream side in the transport direction of the first blast chamber 16.

第一ブラスト室16の下方側においては、ホッパ部17の下方側に第二ホッパ30Aが設けられている。第二ホッパ30Aの上端は、第一ベルトコンベヤ26Cの最下流側(図中右側)に隣接配置されると共に、第二ベルトコンベヤ28Cの最下流側(図中左側)に隣接配置されている。第二ホッパ30Aの下方側には、スクリューコンベヤ30Bが配置されている。スクリューコンベヤ30Bは、水平に配置されて装置前後方向(図1の紙面に垂直な方向)を長手方向としており、当該長手方向に沿った所定方向へ向けて投射材を搬送するようになっている。   On the lower side of the first blast chamber 16, a second hopper 30 </ b> A is provided on the lower side of the hopper portion 17. The upper end of the second hopper 30A is disposed adjacent to the most downstream side (right side in the figure) of the first belt conveyor 26C, and is disposed adjacent to the most downstream side (left side in the figure) of the second belt conveyor 28C. A screw conveyor 30B is disposed below the second hopper 30A. The screw conveyor 30B is arranged horizontally and has a longitudinal direction in the apparatus front-rear direction (direction perpendicular to the paper surface of FIG. 1), and conveys the projection material in a predetermined direction along the longitudinal direction. .

スクリューコンベヤ30Bの搬送方向下流側には、装置上下方向に延びるバケットエレベータ32の下端部側が配置されている。バケットエレベータ32は、スクリューコンベヤ30Bから搬送された投射材を上方側へ向けて搬送するようになっている。バケットエレベータ32の上部出口に隣接する位置にはセパレータ34が設けられている。セパレータ34は、バケットエレベータ32の上部出口から排出された投射材を受け入れて、使用可能な投射材と使用不能な投射材等とに分級するようになっている。   On the downstream side in the conveying direction of the screw conveyor 30B, a lower end side of the bucket elevator 32 extending in the vertical direction of the apparatus is disposed. The bucket elevator 32 is configured to transport the projection material transported from the screw conveyor 30 </ b> B upward. A separator 34 is provided at a position adjacent to the upper outlet of the bucket elevator 32. The separator 34 receives the projection material discharged from the upper outlet of the bucket elevator 32 and classifies it into a usable projection material and an unusable projection material.

セパレータ34の下方側に隣接する位置にはスクリューコンベヤ36が配置されている。スクリューコンベヤ36は、セパレータ34にて使用可能な投射材を排出する排出部に通じている。そして、スクリューコンベヤ36は、水平に配置されて装置前後方向(図1の紙面に垂直な方向)を長手方向としており、当該長手方向に沿った装置背面側へ向けて投射材を搬送するようになっている。   A screw conveyor 36 is disposed at a position adjacent to the lower side of the separator 34. The screw conveyor 36 leads to a discharge unit that discharges the projection material that can be used in the separator 34. The screw conveyor 36 is horizontally arranged so that the longitudinal direction of the apparatus (direction perpendicular to the paper surface of FIG. 1) is the longitudinal direction, and the projection material is conveyed toward the apparatus back side along the longitudinal direction. It has become.

図2に示されるように、スクリューコンベヤ36の搬送方向下流側(図2の左側)には、オーバフローパイプ44の上端部が接続されている。オーバフローパイプ44の下端部は、投射材タンク46に接続されている。これにより、余剰の投射材はスクリューコンベヤ36からオーバフローパイプ44を通過して投射材タンク46に貯蔵される。   As shown in FIG. 2, the upper end portion of the overflow pipe 44 is connected to the downstream side in the conveying direction of the screw conveyor 36 (the left side in FIG. 2). The lower end of the overflow pipe 44 is connected to the projection material tank 46. As a result, surplus projection material passes from the screw conveyor 36 through the overflow pipe 44 and is stored in the projection material tank 46.

一方、図1に示されるように、スクリューコンベヤ36の下方側には、タンクを介して複数の導入管38が接続されている。これにより、導入管38の上端開口に投射材が供給されるようになっている。導入管38の下端部は、投射材供給部としての流量調整装置40を介して遠心式投射機42に接続されている。なお、本実施形態では、遠心式投射機42は計十二台設置されており、これらは、図中では、符号42A、42B、42C、42D、42E、42F、42G、42H、42I、42J、42K、42Lで示されるが、以下において、これらを区別することなく遠心式投射機を説明する場合には、これらの末尾を外した符号42を用いて説明する。   On the other hand, as shown in FIG. 1, a plurality of introduction pipes 38 are connected to the lower side of the screw conveyor 36 through tanks. As a result, the projection material is supplied to the upper end opening of the introduction pipe 38. The lower end portion of the introduction pipe 38 is connected to a centrifugal projector 42 via a flow rate adjusting device 40 as a projection material supply unit. In the present embodiment, a total of twelve centrifugal projectors 42 are installed, and these are shown by reference numerals 42A, 42B, 42C, 42D, 42E, 42F, 42G, 42H, 42I, 42J, Although indicated by 42K and 42L, in the following, when the centrifugal projector is described without distinguishing between them, the description will be made using the reference numeral 42 from which these tails are removed.

導入管38は、遠心式投射機42への投射材供給用の配管とされている。流量調整装置40は、遠心式投射機42への投射材の供給用とされ、公知構造であるため詳細説明は省略するが、開閉及び開閉量の調整が可能な開閉ゲート(図示省略)を備えている。流量調整装置40は、制御部84(図中ではブロック化して図示)に接続されており(接続状態は図示省略)、開閉ゲートの作動(開閉及び開閉量の調整)が制御部84によって制御されている。すなわち、流量調整装置40は、前記開閉ゲートの作動によって、遠心式投射機42に対して投射材の供給及び供給停止が可能とされると共に、遠心式投射機42へ供給する投射材の流量を調整可能となっている。   The introduction pipe 38 is a pipe for supplying a projection material to the centrifugal projector 42. The flow rate adjusting device 40 is used for supplying the projection material to the centrifugal projector 42, and since it has a publicly-known structure, a detailed description thereof is omitted, but an open / close gate (not shown) capable of opening and closing and adjusting the open / close amount is provided. ing. The flow rate adjusting device 40 is connected to a control unit 84 (illustrated in a block form in the drawing) (connected state is not shown), and the operation of the open / close gate (open / close and adjustment of the open / close amount) is controlled by the control unit 84. ing. That is, the flow rate adjusting device 40 can supply and stop the supply of the projection material to the centrifugal projector 42 by the operation of the open / close gate, and can control the flow rate of the projection material supplied to the centrifugal projector 42. It is adjustable.

遠心式投射機42は、回転可能な羽根車(図示省略)を備え、羽根車の回転により投射材(ショット、本実施形態では一例として鋼球)に遠心力を付与することが可能とされている。そして、遠心式投射機42は、前記羽根車の回転に伴って、遠心力で加速させた投射材を第一ブラスト室16の搬送ライン(被処理対象物Wが搬送される搬送経路)側に向けて投射するようになっている。また、遠心式投射機42によって投射された投射材は末広がり状に拡がって(図1、図2等の二点鎖線参照)被処理対象物Wに当る。なお、複数の遠心式投射機42の配置構成については詳細後述する。   The centrifugal projector 42 includes a rotatable impeller (not shown), and can apply centrifugal force to the projection material (shot, in this embodiment, a steel ball as an example) by the rotation of the impeller. Yes. Then, the centrifugal projector 42 moves the projection material accelerated by centrifugal force along with the rotation of the impeller to the side of the first blast chamber 16 on the conveying line (the conveying path on which the workpiece W is conveyed). Projected towards. Further, the projection material projected by the centrifugal projector 42 spreads in a divergent shape (see the two-dot chain line in FIGS. 1 and 2) and hits the object to be processed W. The arrangement configuration of the plurality of centrifugal projectors 42 will be described in detail later.

また、前述した入口側エプロン室14、出口側エプロン室18、及び第二ブラスト室22の各部屋には、装置正面側及び装置背面側に吸出口48が形成されている。吸出口48はダクト50を介して集塵機52(図2参照)に接続されている。これにより、入口側エプロン室14、出口側エプロン室18、及び第二ブラスト室22の各室内の粉塵がエアーと共に吸出口48及びダクト50を介して集塵機52(図2参照)に回収されるようになっている。   In each of the above-described inlet apron chamber 14, outlet apron chamber 18, and second blast chamber 22, suction ports 48 are formed on the apparatus front side and apparatus back side. The suction port 48 is connected to a dust collector 52 (see FIG. 2) via a duct 50. Thereby, dust in each chamber of the inlet side apron chamber 14, the outlet side apron chamber 18, and the second blast chamber 22 is recovered together with air to the dust collector 52 (see FIG. 2) via the suction port 48 and the duct 50. It has become.

図2に示されるように、集塵機52にはダクト62が設けられ、ダクト62の先端部にはファン64の吸気側に接続されている。ファン64の排気側には、マフラー66を介して排気ダクト68が接続されている。ファン64が作動した状態では、集塵機52に回収された粉塵(ダスト)が集塵機52でろ過され、ろ過された空気(清浄空気、クリーンエアー)がダクト62、ファン64、マフラー66、及び排気ダクト68を通過して排気されるようになっている。   As shown in FIG. 2, the dust collector 52 is provided with a duct 62, and the end of the duct 62 is connected to the intake side of the fan 64. An exhaust duct 68 is connected to the exhaust side of the fan 64 via a muffler 66. In a state where the fan 64 is operated, dust (dust) collected by the dust collector 52 is filtered by the dust collector 52, and the filtered air (clean air, clean air) is the duct 62, the fan 64, the muffler 66, and the exhaust duct 68. It is designed to be exhausted after passing through.

集塵機52の下部にはホッパ54が設けられ、ホッパ54の下方にはスクリューコンベヤ56が水平に装置前後方向(図2の左右方向)に沿って配置されている。スクリューコンベヤ56は、粉塵を装置手前側から装置奥側(図2の右側から左側)へ向けて搬送するようになっている。スクリューコンベヤ56の搬送方向下流側には、ロータリーバルブ58が設けられ、ロータリーバルブ58の下方側にダストボックス60が設置されている。これにより、ホッパ54に流れた粉塵がスクリューコンベヤ56でロータリーバルブ58の側へ搬送されてダストボックス60に破棄される。   A hopper 54 is provided below the dust collector 52, and a screw conveyor 56 is horizontally disposed below the hopper 54 along the front-rear direction of the apparatus (left-right direction in FIG. 2). The screw conveyor 56 conveys dust from the front side of the apparatus toward the back side of the apparatus (from the right side to the left side in FIG. 2). A rotary valve 58 is provided on the downstream side of the screw conveyor 56 in the conveying direction, and a dust box 60 is installed below the rotary valve 58. As a result, the dust flowing into the hopper 54 is conveyed to the rotary valve 58 side by the screw conveyor 56 and discarded in the dust box 60.

図1〜図4に示されるように、ショットブラスト装置10の上部には、レール72が配置されている。レール72は、装置左右方向を長手方向として水平に配置され(図1及び図4参照)、被処理対象物Wが搬送される搬送ラインに沿って当該搬送ラインの上方側に案内経路を形成している。図1及び図3に示されるように、このレール72は、多数の支持部材によって支持されている。また、図2に示されるように、レール72は、長手方向に直交する縦断面形状がI字形状に形成されている。   As shown in FIGS. 1 to 4, a rail 72 is arranged on the upper part of the shot blasting apparatus 10. The rail 72 is horizontally arranged with the apparatus left-right direction as the longitudinal direction (see FIGS. 1 and 4), and forms a guide path above the transfer line along the transfer line where the workpiece W is transferred. ing. As shown in FIGS. 1 and 3, the rail 72 is supported by a number of support members. As shown in FIG. 2, the rail 72 is formed with an I-shaped longitudinal cross-section perpendicular to the longitudinal direction.

図2の部分拡大図に示されるように、レール72には、走行機構74が走行可能に搭載されている。走行機構74は、一台設けられてもよいし、複数台設けられてもよい。走行機構74は、レール72の縦壁部の両側に配置される左右一対のローラ74Aを備えている。フレーム74Bに固定されたモータ74Mの回転軸の先端にはローラ74Aが回転可能に取り付けられており、レール72上を移動可能にされている。フレーム74Bにはローラ74Aを駆動するモータ74Mが固定されている。これにより、走行機構74は、モータ74Mが作動することで、レール72の長手方向に沿って(換言すれば、被処理対象物の搬送ラインに沿って)直進移動可能となっている。   As shown in the partially enlarged view of FIG. 2, a traveling mechanism 74 is mounted on the rail 72 so as to be able to travel. One traveling mechanism 74 may be provided, or a plurality of traveling mechanisms 74 may be provided. The travel mechanism 74 includes a pair of left and right rollers 74 </ b> A disposed on both sides of the vertical wall portion of the rail 72. A roller 74A is rotatably attached to the tip of the rotation shaft of the motor 74M fixed to the frame 74B, and is movable on the rail 72. A motor 74M for driving the roller 74A is fixed to the frame 74B. Thereby, the traveling mechanism 74 can move straight along the longitudinal direction of the rail 72 (in other words, along the conveyance line of the object to be processed) by the operation of the motor 74M.

この走行機構74には、ホイスト(小型の巻上装置)78が吊り下げ状態で取り付けられている。ホイスト78はチェーン78Aを備え、このチェーン78Aの下端に被処理対象物Wを吊り下げるための吊下部材80が取り付けられている。吊下部材80の下端には被処理対象物Wの吊り下げ用としてフック部が設けられている。なお、本実施形態では、ホイスト78及び吊下部材80が、被処理対象物Wを吊り下げる吊下部76を構成している。また、レール72及び走行機構74が、吊下部76を被処理対象物Wの搬送ラインに沿って直進移動させる直進移動機構70を構成している。   A hoist (small hoisting device) 78 is attached to the traveling mechanism 74 in a suspended state. The hoist 78 includes a chain 78A, and a suspension member 80 for suspending the workpiece W is attached to the lower end of the chain 78A. A hook portion is provided at the lower end of the suspension member 80 for suspending the workpiece W to be processed. In the present embodiment, the hoist 78 and the suspension member 80 constitute a suspension lower portion 76 that suspends the workpiece W. Further, the rail 72 and the travel mechanism 74 constitute a rectilinear movement mechanism 70 that linearly moves the suspended portion 76 along the conveyance line of the object W to be processed.

また、レール72の所定位置には、位置検出用の位置検出センサ82が設けられている。位置検出センサ82は、被処理対象物Wにおける搬送方向の前側の端部及び搬送方向の後側の端部の通過を検出することが可能となっている。位置検出センサ82には、公知のセンサが適用されている。位置検出センサ82は、制御部84と接続されている。制御部84は、位置検出センサ82の検出結果に基づいて、種々制御を行う。   A position detection sensor 82 for position detection is provided at a predetermined position of the rail 72. The position detection sensor 82 can detect the passage of the processing object W at the front end in the transport direction and the rear end in the transport direction. A known sensor is applied to the position detection sensor 82. The position detection sensor 82 is connected to the control unit 84. The control unit 84 performs various controls based on the detection result of the position detection sensor 82.

具体的には、まず、制御部84は、図4に示される入口扉12、中間扉20、出口扉24を被処理対象物Wの搬送に合わせて順次開閉するように制御する。ここで、入口扉12、中間扉20、出口扉24の開閉機構について簡単に説明する。   Specifically, first, the control unit 84 controls the entrance door 12, the intermediate door 20, and the exit door 24 shown in FIG. 4 to open and close sequentially in accordance with the conveyance of the workpiece W. Here, the opening / closing mechanism of the entrance door 12, the intermediate door 20, and the exit door 24 will be briefly described.

図3に示されるように、出口扉24は、両開きスライド扉とされている。出口扉24の上方側には、扉幅方向に延びる左右一対のレール86が設けられている。図5(B)に示されるように、出口扉24は、トロリー85を介してレール86に吊り下げ支持されている。図3に示されるように、閉止状態の出口扉24の上方側となる天井部には、図中の両サイド側に、扉駆動用のモータ88が取り付けられている。   As shown in FIG. 3, the exit door 24 is a double sliding door. On the upper side of the exit door 24, a pair of left and right rails 86 extending in the door width direction are provided. As shown in FIG. 5B, the exit door 24 is supported by being suspended from the rail 86 via a trolley 85. As shown in FIG. 3, door driving motors 88 are attached to the ceiling portion on the upper side of the closed exit door 24 on both sides in the drawing.

図5(B)に示されるように、モータ88には、天井部に設けられたチェーンホイール90が接続されており、モータ88の作動によりチェーンホイール90が回転駆動される。図5(A)及び図5(B)に示されるように、チェーンホイール90には、ローラチェーン92Aが噛み合っている。ローラチェーン92Aには、アタッチメント92Bが取り付けられており、出口扉24の上端に取り付けられたローラチェーン92Aは、モータ88及びチェーンホイール90の回転力を出口扉24の扉幅方向の直線運動に変換してアタッチメント92Bを介して出口扉24に伝える。すなわち、モータ88の正転、逆転によって、出口扉24が開閉するようになっている。   As shown in FIG. 5B, a chain wheel 90 provided on the ceiling portion is connected to the motor 88, and the chain wheel 90 is rotationally driven by the operation of the motor 88. As shown in FIGS. 5A and 5B, the roller chain 92A meshes with the chain wheel 90. An attachment 92B is attached to the roller chain 92A, and the roller chain 92A attached to the upper end of the outlet door 24 converts the rotational force of the motor 88 and the chain wheel 90 into a linear motion of the outlet door 24 in the door width direction. Then, it is transmitted to the exit door 24 through the attachment 92B. That is, the outlet door 24 is opened and closed by forward and reverse rotation of the motor 88.

このモータ88は、前述した制御部84に接続されている。制御部84は、図2に示される位置検出センサ82の検出結果に基づいて、被処理対象物Wが出口扉24に近付いていると判断した場合に出口扉24を開くようにモータ88(図5(B)参照)を制御し、被処理対象物Wが出口扉24の間を通過したと判断した場合に出口扉24を閉めるようにモータ88(図5(B)参照)を制御する。   The motor 88 is connected to the control unit 84 described above. Based on the detection result of the position detection sensor 82 shown in FIG. 2, the control unit 84 determines that the workpiece W is approaching the outlet door 24 and opens the motor 88 (see FIG. 5 (B)) is controlled, and the motor 88 (see FIG. 5 (B)) is controlled to close the outlet door 24 when it is determined that the workpiece W has passed between the outlet doors 24.

なお、図5(B)に示されるように、出口扉24を吊り下げ支持して固定する際には、扉駆動用の噛み合わせを好適に設定するために、昇降用のボルト93Aによって出口扉24の高さ位置を調整したうえで吊り下げ用の部材93Bに出口扉24をボルト93Cで固定する。また、図4に示される入口扉12及び中間扉20も出口扉24と同様の機構により開閉されるようになっている。   As shown in FIG. 5B, when the exit door 24 is suspended and supported and fixed, the exit door is lifted by a lifting bolt 93A in order to suitably set the engagement for driving the door. After adjusting the height position of 24, the exit door 24 is fixed to the member 93B for suspension with the bolt 93C. Further, the entrance door 12 and the intermediate door 20 shown in FIG. 4 are also opened and closed by the same mechanism as the exit door 24.

図1及び図4に示されるように、第二ブラスト室22は、第一ブラスト室16よりも被処理対象物Wの搬送方向下流側に設けられている。第二ブラスト室22には、圧縮空気とともに投射材を噴射する噴射ノズル94(エアーブラストノズルともいう。)が設置されている。噴射ノズル94は、公知のエアーブラスト装置の一部を構成しており、配管を介して、投射材を貯蔵した加圧タンク(図示省略)及び圧縮エアを供給するコンプレッサ(図示省略)と接続されている。第二ブラスト室22では、搬送された被処理対象物Wに表面処理の仕上がりの良くない箇所がある場合、作業者Pが被処理対象物Wの当該箇所へ向けて噴射ノズル94を保持し、噴射ノズル94から投射材を噴射させることで、被処理対象物Wの表面をさらにブラスト処理している。換言すれば、第二ブラスト室22は、表面処理の修正用、仕上げ用の処理室として把握することができる。   As shown in FIGS. 1 and 4, the second blast chamber 22 is provided downstream of the first blast chamber 16 in the transport direction of the workpiece W. The second blast chamber 22 is provided with an injection nozzle 94 (also referred to as an air blast nozzle) that injects a projection material together with compressed air. The injection nozzle 94 constitutes a part of a known air blast device, and is connected via a pipe to a pressurized tank (not shown) that stores the projection material and a compressor (not shown) that supplies compressed air. ing. In the second blast chamber 22, when there is a portion where the surface treatment finish is not good in the conveyed workpiece W, the worker P holds the spray nozzle 94 toward the portion of the workpiece W, By blasting the projection material from the ejection nozzle 94, the surface of the workpiece W is further blasted. In other words, the second blast chamber 22 can be grasped as a processing chamber for correcting and finishing the surface treatment.

第二ブラスト室22には、装置背面側の第一側壁部22B及び装置正面側の第二側壁部22Cにそれぞれ作業者の出入り用の出入扉96が設けられている。図4に示されるように、第二ブラスト室22の天井部22Aには、複数の照明灯98が配置されている。複数の照明灯98の照明により第二ブラスト室22内は明るく照らされ、作業者Pの作業環境が良好に確保される。なお、作業者Pは、宇宙服のようなブラスト処理作業用の防護服を着用し、防護服内へはフレッシュエアーが供給される。これにより、快適な作業が出来る環境としている。   The second blast chamber 22 is provided with an entrance door 96 for an operator to enter and exit from the first side wall portion 22B on the back side of the apparatus and the second side wall portion 22C on the front side of the apparatus. As shown in FIG. 4, a plurality of illumination lamps 98 are arranged on the ceiling portion 22 </ b> A of the second blast chamber 22. The interior of the second blast chamber 22 is brightly illuminated by the illumination of the plurality of illumination lamps 98, and the working environment of the worker P is ensured satisfactorily. In addition, the worker P wears protective clothing for blasting work such as space suit, and fresh air is supplied into the protective clothing. This provides an environment where comfortable work can be performed.

図6には、第二ブラスト室22の内部が拡大した平断面図にて示されている。第二ブラスト室22の底壁部22D(床面)には、その全面にグレーチング100が敷設されている。グレーチング100が敷設されることで、投射材の堆積が抑えられて作業環境が向上する。なお、図6では、グレーチング100の下側の構成を図示するために、グレーチング100の一部が外された状態で示されている。グレーチング100の下には、グレーチング受け102が配置されている。グレーチング受け102が配置されることでグレーチング100が強固に保持されている。   FIG. 6 is an enlarged plan sectional view showing the inside of the second blast chamber 22. A grating 100 is laid on the entire surface of the bottom wall portion 22D (floor surface) of the second blast chamber 22. By laying the grating 100, the deposition of the projection material is suppressed and the working environment is improved. In FIG. 6, in order to illustrate the lower configuration of the grating 100, the grating 100 is shown with a part thereof removed. A grating receiver 102 is disposed under the grating 100. The grating 100 is firmly held by arranging the grating receiver 102.

(遠心式投射機の配置)
次に、図1等に示される遠心式投射機42の配置について説明する。図7には、遠心式投射機42による投射を説明するための模式的な平面図が示されている。なお、図7では、図を見易くするために、図7にて模式的に示す遠心式投射機42の丸の中の番号は、投射機ナンバー(例えば、第一投射機の場合は1)と一致させている。
(Arrangement of centrifugal projector)
Next, the arrangement of the centrifugal projector 42 shown in FIG. FIG. 7 shows a schematic plan view for explaining the projection by the centrifugal projector 42. In FIG. 7, in order to make the drawing easier to see, the number in the circle of the centrifugal projector 42 schematically shown in FIG. 7 is the projector number (for example, 1 in the case of the first projector). Match.

図1及び図7に示されるように、本実施形態のショットブラスト装置10における遠心式投射機42は、投射方向中心線が、平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で(搬送ラインの側方側から見て)斜め上側、及び側面視で(搬送ラインの側方側から見て)斜め下側からそれぞれ交わるように複数設置されている。以下、具体的に説明する。   As shown in FIGS. 1 and 7, the centrifugal projector 42 in the shot blasting apparatus 10 of the present embodiment has a projection direction center line that is obliquely forward in the conveying direction in plan view, obliquely in the conveying direction in plan view, Oblique left side of the conveying direction in plan view, Diagonal right side of the conveying direction in plan view, Diagonally upper side (viewed from the side of the conveying line) and Diagonally down in side view (viewed from the side of the conveying line) There are multiple installations that cross each other. This will be specifically described below.

第一ブラスト室16における被処理対象物Wの搬送方向Xの上流側には、装置背面側の第一側壁部16Bに第一投射機42A、装置正面側の第二側壁部16Cに第二投射機42B、装置上側の天井部16Aに第三投射機42C、第四投射機42D、装置下側のホッパ部17に第五投射機42E、第六投射機42Fがそれぞれ設けられている。   On the upstream side in the transport direction X of the workpiece W in the first blast chamber 16, the first projection 42A is applied to the first side wall portion 16B on the rear side of the apparatus, and the second projection is applied to the second side wall portion 16C on the front side of the apparatus. The projector 42B is provided with a third projector 42C and a fourth projector 42D on the ceiling 16A on the upper side of the apparatus, and a fifth projector 42E and a sixth projector 42F on the hopper 17 on the lower side of the apparatus.

装置正面視の図1では、第一投射機42Aは、第二投射機42Bと装置前後方向(図1の紙面に垂直な方向)に重なる位置に配置されている。図7に示される第一投射機42Aは、投射方向中心線CL1が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側から45°前後(35°〜55°)で交わるように設置されている。これに対して、第二投射機42Bは、投射方向中心線CL2が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側から45°前後(35°〜55°)で交わるように設置されている。   In FIG. 1 of the apparatus front view, the first projector 42A is arranged at a position overlapping the second projector 42B in the apparatus front-rear direction (direction perpendicular to the paper surface of FIG. 1). The first projector 42A shown in FIG. 7 has a projection direction center line CL1 that is horizontal, and is 45 in the transport direction obliquely rearward with respect to the transport line of the object to be processed W from the obliquely left side in the transport direction in plan view. It is installed so that it intersects at around (35 ° -55 °). On the other hand, the second projector 42B has a projection direction center line CL2 that is horizontal and 45 ° from the diagonally right side in the conveyance direction in the plan view and the diagonally right side in the conveyance direction in the plan view with respect to the conveyance line of the workpiece W. It is installed so that it intersects at around (35 ° -55 °).

第三投射機42Cは、被処理対象物Wの搬送方向に見てレール72よりも左側に配置され、装置正面視の図1では、第四投射機42Dと装置前後方向(図1の紙面に垂直な方向)に重なる位置に配置されている。図7に示される第三投射機42Cは、投射方向中心線CL3が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。第四投射機42Dは、被処理対象物Wの搬送方向に見てレール72よりも右側に配置され、投射方向中心線CL4が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The third projector 42C is disposed on the left side of the rail 72 when viewed in the conveyance direction of the workpiece W. In FIG. 1 of the apparatus front view, the fourth projector 42D and the apparatus front-rear direction (on the paper surface of FIG. 1). It is arranged at a position that overlaps (vertical direction). In the third projector 42C shown in FIG. 7, the projection direction center line CL3 is obliquely inclined with respect to the conveyance line of the workpiece W in the plan view in the conveyance direction obliquely rearward and in the conveyance direction obliquely on the left side and in the side view. It is installed so as to intersect at around 45 ° (35 ° to 55 °) from the upper side. The fourth projector 42D is arranged on the right side of the rail 72 when viewed in the conveyance direction of the object to be processed W, and the projection direction center line CL4 is oblique in the conveyance direction in plan view with respect to the conveyance line of the object to be processed W. It is installed so as to intersect at around 45 ° (35 ° to 55 °) from the diagonally right side in the rear side and in the plan view and obliquely from the upper side in the side view.

図7に示されるように、第五投射機42Eは、被処理対象物Wの搬送方向に見てレール72よりも左側に配置され、装置正面視の図1では、第六投射機42Fと装置前後方向(図1の紙面に垂直な方向)に重なる位置に配置されている。図7に示される第五投射機42Eは、投射方向中心線CL5が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。第六投射機42Fは、被処理対象物Wの搬送方向に見てレール72よりも右側に配置され、投射方向中心線CL6が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。   As shown in FIG. 7, the fifth projector 42E is disposed on the left side of the rail 72 when viewed in the transport direction of the object to be processed W. In FIG. It is arranged at a position overlapping in the front-rear direction (direction perpendicular to the paper surface of FIG. 1). In the fifth projector 42E shown in FIG. 7, the projection direction center line CL5 is oblique with respect to the conveyance line of the object W to be processed obliquely in the conveyance direction obliquely rearward in the plan view and in the conveyance direction obliquely on the left side and in the side view. It is installed so as to intersect at around 45 ° (35 ° to 55 °) from the lower side. The sixth projector 42F is disposed on the right side of the rail 72 when viewed in the conveyance direction of the object to be processed W, and the projection direction center line CL6 is oblique in the conveyance direction in plan view with respect to the conveyance line of the object to be processed W. It is installed so as to intersect at around 45 ° (35 ° to 55 °) from the rear side and in the conveyance direction obliquely right side and in side view obliquely from the lower side.

一方、図1及び図7に示されるように、第一ブラスト室16における被処理対象物Wの搬送方向Xの下流側には、装置下側のホッパ部17に第七投射機42G、第八投射機42H、装置上側の天井部16Aに第九投射機42I、第十投射機42J、装置背面側の第一側壁部16Bに第十一投射機42K、装置正面側の第二側壁部16Cに第十二投射機42Lがそれぞれ設けられている。   On the other hand, as shown in FIGS. 1 and 7, on the downstream side in the transport direction X of the workpiece W in the first blast chamber 16, the seventh projector 42 </ b> G and the eighth The projector 42H, the ninth projector 42I, the tenth projector 42J on the ceiling 16A on the upper side of the apparatus, the eleventh projector 42K on the first side wall 16B on the rear side of the apparatus, and the second side wall 16C on the front side of the apparatus A twelfth projector 42L is provided.

図7に示されるように、第七投射機42Gは、被処理対象物Wの搬送方向に見てレール72よりも左側に配置されている。第七投射機42Gは、図2では、第五投射機42Eと装置左右方向(図2の紙面に垂直な方向)に重なる位置に配置されている。また、第七投射機42Gは、装置正面視の図1では、第八投射機42Hと装置前後方向(図1の紙面に垂直な方向)に重なる位置に配置されている。図7に示される第七投射機42Gは、投射方向中心線CL7が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。第八投射機42Hは、被処理対象物Wの搬送方向に見てレール72よりも右側に配置されている。第八投射機42Hは、図2では、第六投射機42Fと装置左右方向(図2の紙面に垂直な方向)に重なる位置に配置されている。図7に示される第八投射機42Hは、投射方向中心線CL8が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。   As shown in FIG. 7, the seventh projector 42 </ b> G is disposed on the left side of the rail 72 when viewed in the transport direction of the object W to be processed. In FIG. 2, the seventh projector 42G is arranged at a position overlapping the fifth projector 42E in the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 2). In addition, the seventh projector 42G is arranged at a position overlapping with the eighth projector 42H in the front-rear direction of the apparatus (direction perpendicular to the paper surface of FIG. 1) in FIG. In the seventh projector 42G shown in FIG. 7, the projection direction center line CL7 is obliquely downward with respect to the conveyance line of the workpiece W in the plan view obliquely forward in the transport direction and obliquely forward in the transport direction in plan view and left in the side view. It is installed so as to intersect at around 45 ° (35 ° to 55 °) from the side. The eighth projector 42H is arranged on the right side of the rail 72 when viewed in the transport direction of the workpiece W. In FIG. 2, the eighth projector 42 </ b> H is disposed at a position overlapping the sixth projector 42 </ b> F in the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 2). In the eighth projector 42H shown in FIG. 7, the projection direction center line CL8 is obliquely downward with respect to the conveyance line of the workpiece W in the plan view obliquely forward in the conveyance direction and diagonally right in the conveyance direction in plan view and in the side view. It is installed so as to intersect at around 45 ° (35 ° to 55 °) from the side.

第九投射機42Iは、被処理対象物Wの搬送方向に見てレール72よりも左側に配置され、装置正面視の図1では、第十投射機42Jと装置前後方向(図1の紙面に垂直な方向)に重なる位置に配置されている。図7に示される第九投射機42Iは、投射方向中心線CL9が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。第十投射機42Jは、被処理対象物Wの搬送方向に見てレール72よりも右側に配置されている。第十投射機42Jは、投射方向中心線CL10が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The ninth projector 42I is arranged on the left side of the rail 72 when viewed in the conveyance direction of the workpiece W, and in FIG. 1 of the apparatus front view, the tenth projector 42J and the apparatus front-rear direction (on the paper surface of FIG. 1). It is arranged at a position that overlaps (vertical direction). In the ninth projector 42I shown in FIG. 7, the projection direction center line CL9 is obliquely frontward in the transport direction in plan view and obliquely left in the transport direction in plan view with respect to the transport line of the object W to be processed. It is installed so that it may cross at around 45 degrees (35 degrees-55 degrees). The tenth projector 42J is disposed on the right side of the rail 72 when viewed in the conveyance direction of the workpiece W. The tenth projector 42J has a projection direction center line CL10 of about 45 ° from the obliquely upper side in the conveyance direction obliquely front side and in the planar view in the conveyance direction obliquely and in the side view with respect to the conveyance line of the workpiece W ( 35 ° to 55 °).

また、第十一投射機42Kは、装置正面視の図1では、第十二投射機42Lと装置前後方向(図1の紙面に垂直な方向)に重なる位置に配置されている。図7に示される第十一投射機42Kは、投射方向中心線CL11が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側から45°前後(35°〜55°)で交わるように設置されている。また、第十二投射機42Lは、投射方向中心線CL12が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側から45°前後(35°〜55°)で交わるように設置されている。   The eleventh projector 42K is arranged at a position overlapping the twelfth projector 42L in the front-rear direction of the apparatus (direction perpendicular to the paper surface of FIG. 1) in FIG. The eleventh projector 42K shown in FIG. 7 has a projection direction center line CL11 that is horizontal and is 45 to the front in the transport direction in the plan view and 45 degrees from the left in the transport direction in the plan view with respect to the transport line of the object W to be processed. It is installed so that it intersects at around (35 ° -55 °). In addition, the twelfth projector 42L has a projection direction center line CL12 that is horizontal and is about 45 ° from the front side in the transport direction obliquely with respect to the transport line of the object W to be processed and from the obliquely right side in the transport direction in plan view. 35 ° to 55 °).

以上のように、計十二台の遠心式投射機42は、被処理対象物Wの平面に対し切削力が増す入射角度となるように傾けられて設置されている。   As described above, a total of twelve centrifugal projectors 42 are installed so as to be inclined with respect to the plane of the workpiece W so that the incident angle increases the cutting force.

また、本実施形態では、被処理対象物Wの搬送ラインにおいて複数の遠心式投射機42の各々によって投射材が投射される投射ゾーンが当該搬送ラインに沿って複数(計六個)設定されている。   In the present embodiment, a plurality of projection zones (a total of six) are set along the conveyance line in which the projection material is projected by each of the plurality of centrifugal projectors 42 in the conveyance line of the workpiece W. Yes.

第一の投射ゾーンは、第一投射機42A及び第二投射機42Bによって投射材が投射されるゾーンであり、搬送ラインにて投射方向中心線CL1、CL2を含む範囲に設定されている。第二の投射ゾーンは、第三投射機42C及び第四投射機42Dによって投射材が投射されるゾーンであり、搬送ラインにて投射方向中心線CL3、CL4を含む範囲に設定されている。第三の投射ゾーンは、第五投射機42E及び第六投射機42Fによって投射材が投射されるゾーンであり、搬送ラインにて投射方向中心線CL5、CL6を含む範囲に設定されている。   The first projection zone is a zone in which the projection material is projected by the first projector 42A and the second projector 42B, and is set in a range including the projection direction center lines CL1 and CL2 on the transport line. The second projection zone is a zone in which the projection material is projected by the third projector 42C and the fourth projector 42D, and is set in a range including the projection direction center lines CL3 and CL4 on the transport line. The third projection zone is a zone in which the projection material is projected by the fifth projector 42E and the sixth projector 42F, and is set in a range including the projection direction center lines CL5 and CL6 on the transport line.

第四の投射ゾーンは、第七投射機42G及び第八投射機42Hによって投射材が投射されるゾーンであり、搬送ラインにて投射方向中心線CL7、CL8を含む範囲に設定されている。第五の投射ゾーンは、第九投射機42I及び第十投射機42Jによって投射材が投射されるゾーンであり、搬送ラインにて投射方向中心線CL9、CL10を含む範囲に設定されている。第六の投射ゾーンは、第十一投射機42K及び第十二投射機42Lによって投射材が投射されるゾーンであり、搬送ラインにて投射方向中心線CL11、CL12を含む範囲に設定されている。   The fourth projection zone is a zone in which the projection material is projected by the seventh projector 42G and the eighth projector 42H, and is set in a range including the projection direction center lines CL7 and CL8 on the transport line. The fifth projection zone is a zone in which the projection material is projected by the ninth projector 42I and the tenth projector 42J, and is set to a range including the projection direction center lines CL9 and CL10 on the transport line. The sixth projection zone is a zone in which the projection material is projected by the eleventh projector 42K and the twelfth projector 42L, and is set in a range including the projection direction center lines CL11 and CL12 on the transport line. .

また、第一の投射ゾーンに対しては、搬送方向上流側に上流側検出部A1が設けられると共に、搬送方向下流側に下流側検出部A2が設けられている。第二の投射ゾーンに対しては、搬送方向上流側に上流側検出部B1が設けられると共に、搬送方向下流側に下流側検出部B2が設けられている。第三の投射ゾーンに対しては、搬送方向上流側に上流側検出部C1が設けられると共に、搬送方向下流側に下流側検出部C2が設けられている。   For the first projection zone, an upstream detection unit A1 is provided on the upstream side in the transport direction, and a downstream detection unit A2 is provided on the downstream side in the transport direction. For the second projection zone, an upstream detection unit B1 is provided on the upstream side in the transport direction, and a downstream detection unit B2 is provided on the downstream side in the transport direction. For the third projection zone, an upstream detection unit C1 is provided on the upstream side in the transport direction, and a downstream detection unit C2 is provided on the downstream side in the transport direction.

第四の投射ゾーンに対しては、搬送方向上流側に上流側検出部D1が設けられると共に、搬送方向下流側に下流側検出部D2が設けられている。第五の投射ゾーンに対しては、搬送方向上流側に上流側検出部E1が設けられると共に、搬送方向下流側に下流側検出部E2が設けられている。第六の投射ゾーンに対しては、搬送方向上流側に上流側検出部F1が設けられると共に、搬送方向下流側に下流側検出部F2が設けられている。   For the fourth projection zone, an upstream detection unit D1 is provided on the upstream side in the conveyance direction, and a downstream detection unit D2 is provided on the downstream side in the conveyance direction. For the fifth projection zone, an upstream detection unit E1 is provided on the upstream side in the transport direction, and a downstream detection unit E2 is provided on the downstream side in the transport direction. For the sixth projection zone, an upstream detection unit F1 is provided on the upstream side in the transport direction, and a downstream detection unit F2 is provided on the downstream side in the transport direction.

上流側検出部A1、B1、C1、D1、E1、F1及び下流側検出部A2、B2、C2、D2、E2、F2は、前述した位置検出センサ82(図2参照)で構成されて制御部84に接続されており(接続状態は図示省略)、被処理対象物Wの搬送方向の前側の端部及び搬送方向の後側の端部を検出するようになっている。制御部84は、上流側検出部A1、B1、C1、D1、E1、F1による検出結果及び下流側検出部A2、B2、C2、D2、E2、F2による検出結果に基づいて、被処理対象物Wが投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように流量調整装置40(図1参照)における開閉ゲートの作動を制御する。   The upstream side detection units A1, B1, C1, D1, E1, and F1 and the downstream side detection units A2, B2, C2, D2, E2, and F2 are configured by the position detection sensor 82 (see FIG. 2) described above, and the control unit. 84 (the connection state is not shown), and the front end of the workpiece W in the transport direction and the rear end of the transport direction are detected. Based on the detection results by the upstream detection units A1, B1, C1, D1, E1, and F1 and the detection results by the downstream detection units A2, B2, C2, D2, E2, and F2, the control unit 84 Only when it is determined that W is in any range of the projection zone, the operation of the open / close gate in the flow rate adjusting device 40 (see FIG. 1) is controlled so that the projection material is projected onto the projection zone.

(作用・効果)
次に、上記実施形態の作用及び効果について説明する。
(Action / Effect)
Next, the operation and effect of the above embodiment will be described.

図2に示されるように、本実施形態に係るショットブラスト装置10では、吊下部76が被処理対象物Wを吊り下げ、吊下部76を直進移動機構70が被処理対象物Wの搬送ラインに沿って直進移動させる。このとき、被処理対象物Wは、図4に示される入口扉12が開けられることでショットブラスト装置10の装置本体内に搬入され、入口側エプロン室14を通って第一ブラスト室16に搬入される。入口扉12は、被処理対象物Wの搬入後に閉じられる。第一ブラスト室16には遠心式投射機42が設けられており、遠心式投射機42が羽根車の回転に伴って搬送ライン側に向けて投射材を投射することで、被処理対象物Wがショットブラスト処理される。   As shown in FIG. 2, in the shot blasting apparatus 10 according to this embodiment, the hanging portion 76 suspends the workpiece W, and the linear movement mechanism 70 moves the hanging portion 76 to the conveyance line of the workpiece W. Move straight along. At this time, the object to be processed W is carried into the apparatus body of the shot blasting apparatus 10 by opening the inlet door 12 shown in FIG. 4, and then carried into the first blast chamber 16 through the inlet apron chamber 14. Is done. The entrance door 12 is closed after the workpiece W is loaded. The first blast chamber 16 is provided with a centrifugal projector 42, and the centrifugal projector 42 projects the projection material toward the conveyance line along with the rotation of the impeller, whereby the workpiece W to be processed is provided. Is shot blasted.

ここで、図7に模式的に示されるように、遠心式投射機42は、投射方向中心線が被処理対象物Wの搬送ラインに対して、水平、平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で斜め上側、及び側面視で斜め下側からそれぞれ交わるように複数設置されている。このため、複数の遠心式投射機42が被処理対象物Wに向けてその投射方向中心線が水平、平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で斜め上側、及び側面視で斜め下側から投射材を投射する。よって、本実施形態では、大型の被処理対象物Wを旋回、反転、昇降等させなくても、複数の遠心式投射機42が大型の被処理対象物Wの全面を表面処理することができる。以下、遠心式投射機42による投射について具体的に説明する。   Here, as schematically shown in FIG. 7, the centrifugal projector 42 has a projection direction center line that is horizontally and planarly viewed from the conveyance line obliquely front and planar with respect to the conveyance line of the workpiece W to be processed. Are arranged so as to cross from the diagonally rear side in the conveying direction, the diagonally left side in the conveying direction in plan view, the diagonally right side in the conveying direction in plan view, the diagonally upper side in side view, and the diagonally downward side in side view. For this reason, the plurality of centrifugal projectors 42 are directed toward the object W to be processed, and their projection direction center lines are horizontal, obliquely forward in the conveying direction in plan view, obliquely backward in the conveying direction in plan view, and oblique in the conveying direction in plan view. The projection material is projected from the left side, obliquely rightward in the conveying direction in plan view, obliquely upward in side view, and obliquely downward in side view. Therefore, in this embodiment, the plurality of centrifugal projectors 42 can surface-treat the entire surface of the large object to be processed W without turning, reversing, raising and lowering the large object to be processed W. . Hereinafter, the projection by the centrifugal projector 42 will be specifically described.

まず、被処理対象物Wが第一ブラスト室16に搬入されると、第一投射機42A及び第二投射機42Bによる投射材の投射が開始される。第一投射機42Aは、投射方向中心線CL1が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側から水平に投射材を投射する。第二投射機42Bは、投射方向中心線CL2が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側から水平に投射材を投射する。   First, when the workpiece W is carried into the first blast chamber 16, the projection of the projection material by the first projector 42A and the second projector 42B is started. The first projector 42A is installed such that the projection direction center line CL1 is horizontal and intersects with the conveyance line of the workpiece W from the diagonally rear side in the conveyance direction in plan view and from the diagonally left side in the conveyance direction in plan view. Therefore, the projection material is projected toward the object W to be processed horizontally from the diagonally rear side in the transport direction in plan view and from the left side in the transport direction in plan view. The second projector 42B is installed such that the projection direction center line CL2 is horizontal and intersects with the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view and from the diagonally right side in the conveyance direction in plan view. Therefore, the projection material is projected toward the object W to be processed horizontally from the diagonally rear side in the transport direction in plan view and from the diagonally right side in the transport direction in plan view.

また、第一投射機42A及び第二投射機42Bによって投射材が投射される第一の投射ゾーンに対して搬送方向上流側には上流側検出部A1が設けられ、前記第一の投射ゾーンに対して搬送方向下流側には下流側検出部A2が設けられている。上流側検出部A1及び下流側検出部A2は、被処理対象物Wの通過を検出する。そして、制御部84は、上流側検出部A1による検出結果及び下流側検出部A2による検出結果に基づいて、被処理対象物Wが前記第一の投射ゾーンの範囲内にあると判断した場合に当該第一の投射ゾーンに投射材を投射するように、第一投射機42A及び第二投射機42Bにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを開くように制御する。また、制御部84は、上流側検出部A1による検出結果及び下流側検出部A2による検出結果に基づいて、被処理対象物Wが前記第一の投射ゾーンの範囲内には存在しないと判断した場合に、第一投射機42A及び第二投射機42Bにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを閉じるように制御する。よって、第一投射機42A及び第二投射機42Bによる無駄な投射を抑えることができる。   Further, an upstream side detection unit A1 is provided on the upstream side in the transport direction with respect to the first projection zone on which the projection material is projected by the first projector 42A and the second projector 42B. On the other hand, a downstream detection unit A2 is provided on the downstream side in the transport direction. The upstream side detection unit A1 and the downstream side detection unit A2 detect the passage of the workpiece W. And when the control part 84 judges that the to-be-processed target object W exists in the range of said 1st projection zone based on the detection result by upstream detection part A1, and the detection result by downstream detection part A2. Control is performed to open the open / close gate of the flow rate adjusting device 40 (see FIG. 1 and the like) connected to the first projector 42A and the second projector 42B so as to project the projection material onto the first projection zone. . Further, the control unit 84 determines that the workpiece W does not exist within the first projection zone based on the detection result by the upstream detection unit A1 and the detection result by the downstream detection unit A2. In such a case, control is performed so that the open / close gates of the flow rate adjusting devices 40 (see FIG. 1 and the like) connected to the first projector 42A and the second projector 42B are closed. Therefore, useless projection by the first projector 42A and the second projector 42B can be suppressed.

第一投射機42A及び第二投射機42Bによる投射材の投射が開始された後に、第三投射機42C及び第四投射機42Dによる投射材の投射が開始される。第三投射機42Cは、投射方向中心線CL3が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第四投射機42Dは、投射方向中心線CL4が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   After the projection of the projection material by the first projector 42A and the second projector 42B is started, the projection of the projection material by the third projector 42C and the fourth projector 42D is started. The third projector 42C has a projection direction center line CL3 that intersects the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally upper side in side view. Since it is installed, the projection material is projected toward the object W to be processed from the obliquely rear side in the conveying direction in plan view and from the obliquely upper side in the conveying direction obliquely left side and side view in planar view. The fourth projector 42D has the projection direction center line CL4 intersecting the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, the diagonally right side in the conveyance direction in planar view, and the diagonally upper side in side view. Since it is installed, the projection material is projected toward the object W to be processed from the obliquely upper side in the conveyance direction obliquely rearward and in the planar view obliquely rightward and sidewise in plan view.

また、第三投射機42C及び第四投射機42Dによって投射材が投射される第二の投射ゾーンに対して搬送方向上流側には上流側検出部B1が設けられ、前記第二の投射ゾーンに対して搬送方向下流側には下流側検出部B2が設けられている。上流側検出部B1及び下流側検出部B2は、被処理対象物Wの通過を検出する。そして、制御部84は、上流側検出部B1による検出結果及び下流側検出部B2による検出結果に基づいて、被処理対象物Wが前記第二の投射ゾーンの範囲内にあると判断した場合に当該第二の投射ゾーンに投射材を投射するように、第三投射機42C及び第四投射機42Dにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを開くように制御する。また、制御部84は、上流側検出部B1による検出結果及び下流側検出部B2による検出結果に基づいて、被処理対象物Wが前記第二の投射ゾーンの範囲内には存在しないと判断した場合に、第三投射機42C及び第四投射機42Dにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを閉じるように制御する。よって、第三投射機42C及び第四投射機42Dによる無駄な投射を抑えることができる。   Further, an upstream side detection unit B1 is provided on the upstream side in the transport direction with respect to the second projection zone where the projection material is projected by the third projector 42C and the fourth projector 42D, and the second projection zone On the other hand, a downstream detection unit B2 is provided on the downstream side in the transport direction. The upstream side detection unit B1 and the downstream side detection unit B2 detect passage of the workpiece W. And when the control part 84 judges that the to-be-processed target object W exists in the range of said 2nd projection zone based on the detection result by upstream detection part B1, and the detection result by downstream detection part B2. Control is performed to open the open / close gate of the flow rate adjusting device 40 (see FIG. 1 and the like) connected to the third projector 42C and the fourth projector 42D so as to project the projection material onto the second projection zone. . Moreover, the control part 84 judged that the to-be-processed target object W does not exist in the range of said 2nd projection zone based on the detection result by upstream detection part B1, and the detection result by downstream detection part B2. In such a case, control is performed to close the open / close gate of the flow rate adjusting device 40 (see FIG. 1 and the like) connected to the third projector 42C and the fourth projector 42D, respectively. Therefore, useless projection by the third projector 42C and the fourth projector 42D can be suppressed.

第三投射機42C及び第四投射機42Dによる投射材の投射が開始された後に、第五投射機42E及び第六投射機42Fによる投射材の投射が開始される。第五投射機42Eは、投射方向中心線CL5が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第六投射機42Fは、投射方向中心線CL6が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。   After the projection of the projection material by the third projector 42C and the fourth projector 42D is started, the projection of the projection material by the fifth projector 42E and the sixth projector 42F is started. In the fifth projector 42E, the projection direction center line CL5 intersects the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally lower side in side view. Therefore, the projection material is projected toward the object to be processed W from the obliquely rear side in the conveying direction in a plan view and from the obliquely lower side in the conveying direction obliquely to the left and in a side view in a plan view. In the sixth projector 42F, the projection direction center line CL6 intersects the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally right side in the conveyance direction in plan view, and from the diagonally lower side in side view. Therefore, the projection material is projected toward the object to be processed W from the obliquely rear side in the conveyance direction in a plan view and from the obliquely lower side in the conveyance direction obliquely to the right and in a side view in plan view.

また、第五投射機42E及び第六投射機42Fによって投射材が投射される第三の投射ゾーンに対して搬送方向上流側には上流側検出部C1が設けられ、前記第三の投射ゾーンに対して搬送方向下流側には下流側検出部C2が設けられている。上流側検出部C1及び下流側検出部C2は、被処理対象物Wの通過を検出する。そして、制御部84は、上流側検出部C1による検出結果及び下流側検出部C2による検出結果に基づいて、被処理対象物Wが前記第三の投射ゾーンの範囲内にあると判断した場合に当該第三の投射ゾーンに投射材を投射するように、第五投射機42E及び第六投射機42Fにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを開くように制御する。また、制御部84は、上流側検出部C1による検出結果及び下流側検出部C2による検出結果に基づいて、被処理対象物Wが前記第三の投射ゾーンの範囲内には存在しないと判断した場合に、第五投射機42E及び第六投射機42Fにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを閉じるように制御する。よって、第五投射機42E及び第六投射機42Fによる無駄な投射を抑えることができる。   Further, an upstream side detection unit C1 is provided on the upstream side in the transport direction with respect to the third projection zone on which the projection material is projected by the fifth projector 42E and the sixth projector 42F, and the third projection zone On the other hand, a downstream side detection unit C2 is provided on the downstream side in the transport direction. The upstream side detection unit C1 and the downstream side detection unit C2 detect passage of the object to be processed W. And when the control part 84 judges that the to-be-processed target object W exists in the range of the said 3rd projection zone based on the detection result by the upstream detection part C1, and the detection result by the downstream detection part C2. Control is performed to open the open / close gate of the flow rate adjusting device 40 (see FIG. 1 and the like) connected to the fifth projector 42E and the sixth projector 42F so as to project the projection material onto the third projection zone. . Moreover, the control part 84 judged that the to-be-processed target object W does not exist in the range of the said 3rd projection zone based on the detection result by the upstream detection part C1, and the detection result by the downstream detection part C2. In such a case, control is performed so that the open / close gates of the flow rate adjusting devices 40 (see FIG. 1 and the like) connected to the fifth projector 42E and the sixth projector 42F are closed. Therefore, useless projection by the fifth projector 42E and the sixth projector 42F can be suppressed.

第五投射機42E及び第六投射機42Fによる投射材の投射が開始された後に、第七投射機42G及び第八投射機42Hによる投射材の投射が開始される。第七投射機42Gは、投射方向中心線CL7が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第八投射機42Hは、投射方向中心線CL8が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。   After the projection of the projection material by the fifth projector 42E and the sixth projector 42F is started, the projection of the projection material by the seventh projector 42G and the eighth projector 42H is started. The seventh projector 42G has a projection direction center line CL7 intersecting with the conveyance line of the workpiece W from the diagonally front side in the conveyance direction in plan view, diagonally on the left in the conveyance direction in plan view, and diagonally below in the side view. Since it is installed, the projection material is projected toward the workpiece W from the diagonally front side in the transport direction in a plan view and from the diagonally lower side in the transport direction diagonally to the left and in a side view in plan view. The eighth projector 42H intersects the projection direction center line CL8 with respect to the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view, from the diagonally right side in the conveyance direction in plan view, and from the diagonally lower side in side view. Since it is installed, the projection material is projected toward the object W to be processed from the oblique front side in the transport direction in a plan view and from the diagonally lower side in the transport direction obliquely right side and in a side view in plan view.

また、第七投射機42G及び第八投射機42Hによって投射材が投射される第四の投射ゾーンに対して搬送方向上流側には上流側検出部D1が設けられ、前記第四の投射ゾーンに対して搬送方向下流側には下流側検出部D2が設けられている。上流側検出部D1及び下流側検出部D2は、被処理対象物Wの通過を検出する。そして、制御部84は、上流側検出部D1による検出結果及び下流側検出部D2による検出結果に基づいて、被処理対象物Wが前記第四の投射ゾーンの範囲内にあると判断した場合に当該第四の投射ゾーンに投射材を投射するように、第七投射機42G及び第八投射機42Hにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを開くように制御する。また、制御部84は、上流側検出部D1による検出結果及び下流側検出部D2による検出結果に基づいて、被処理対象物Wが前記第四の投射ゾーンの範囲内には存在しないと判断した場合に、第七投射機42G及び第八投射機42Hにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを閉じるように制御する。よって、第七投射機42G及び第八投射機42Hによる無駄な投射を抑えることができる。   Further, an upstream side detection unit D1 is provided on the upstream side in the transport direction with respect to the fourth projection zone on which the projection material is projected by the seventh projector 42G and the eighth projector 42H, and the fourth projection zone On the other hand, a downstream detection unit D2 is provided on the downstream side in the transport direction. The upstream side detection unit D1 and the downstream side detection unit D2 detect passage of the object to be processed W. And when the control part 84 judges that the to-be-processed target object W exists in the range of the said 4th projection zone based on the detection result by the upstream detection part D1, and the detection result by the downstream detection part D2. Control is performed to open the open / close gates of the flow rate adjusting devices 40 (see FIG. 1 and the like) connected to the seventh projector 42G and the eighth projector 42H so as to project the projection material onto the fourth projection zone. . Further, the control unit 84 determines that the workpiece W does not exist within the range of the fourth projection zone based on the detection result by the upstream detection unit D1 and the detection result by the downstream detection unit D2. In this case, control is performed so that the open / close gates of the flow rate adjusting devices 40 (see FIG. 1 and the like) connected to the seventh projector 42G and the eighth projector 42H are closed. Therefore, useless projection by the seventh projector 42G and the eighth projector 42H can be suppressed.

第七投射機42G及び第八投射機42Hによる投射材の投射が開始された後に、第九投射機42I及び第十投射機42Jによる投射材の投射が開始される。第九投射機42Iは、投射方向中心線CL9が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第十投射機42Jは、投射方向中心線CL10が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   After projection of the projection material by the seventh projector 42G and the eighth projector 42H is started, projection of the projection material by the ninth projector 42I and the tenth projector 42J is started. The ninth projector 42I is installed such that the projection direction center line CL9 intersects the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the workpiece W from the diagonally front side in the transport direction in plan view and from the diagonally upper side in the transport direction obliquely left side and side view in plan view. The tenth projector 42J is installed such that the projection direction center line CL10 intersects the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view, from the diagonally right side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the object W to be processed from the oblique front side in the transport direction in a plan view and from the diagonally upper side in the transport direction obliquely right side and in a side view in plan view.

また、第九投射機42I及び第十投射機42Jによって投射材が投射される第五の投射ゾーンに対して搬送方向上流側には上流側検出部E1が設けられ、前記第五の投射ゾーンに対して搬送方向下流側には下流側検出部E2が設けられている。上流側検出部E1及び下流側検出部E2は、被処理対象物Wの通過を検出する。そして、制御部84は、上流側検出部E1による検出結果及び下流側検出部E2による検出結果に基づいて、被処理対象物Wが前記第五の投射ゾーンの範囲内にあると判断した場合に当該第五の投射ゾーンに投射材を投射するように、第九投射機42I及び第十投射機42Jにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを開くように制御する。また、制御部84は、上流側検出部E1による検出結果及び下流側検出部E2による検出結果に基づいて、被処理対象物Wが前記第五の投射ゾーンの範囲内には存在しないと判断した場合に、第九投射機42I及び第十投射機42Jにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを閉じるように制御する。よって、第九投射機42I及び第十投射機42Jによる無駄な投射を抑えることができる。   An upstream detection unit E1 is provided on the upstream side in the transport direction with respect to the fifth projection zone on which the projection material is projected by the ninth projector 42I and the tenth projector 42J, and the fifth projection zone On the other hand, a downstream side detection unit E2 is provided on the downstream side in the transport direction. The upstream side detection unit E1 and the downstream side detection unit E2 detect passage of the workpiece W. And when the control part 84 judges that the to-be-processed target object W exists in the range of the said 5th projection zone based on the detection result by the upstream detection part E1, and the detection result by the downstream detection part E2. Control is performed to open the open / close gate of the flow rate adjusting device 40 (see FIG. 1 and the like) connected to the ninth projector 42I and the tenth projector 42J so as to project the projection material onto the fifth projection zone. . Further, the control unit 84 determines that the workpiece W does not exist within the fifth projection zone based on the detection result by the upstream detection unit E1 and the detection result by the downstream detection unit E2. In such a case, control is performed so that the open / close gates of the flow rate adjusting devices 40 (see FIG. 1 and the like) connected to the ninth projector 42I and the tenth projector 42J are closed. Therefore, useless projection by the ninth projector 42I and the tenth projector 42J can be suppressed.

第九投射機42I及び第十投射機42Jによる投射材の投射が開始された後に、第十一投射機42K及び第十二投射機42Lによる投射材の投射が開始される。第十一投射機42Kは、投射方向中心線CL11が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側から投射材を水平に投射する。第十二投射機42Lは、投射方向中心線CL12が水平でかつ被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側から投射材を水平に投射する。   After the projection of the projection material by the ninth projector 42I and the tenth projector 42J is started, the projection of the projection material by the eleventh projector 42K and the twelfth projector 42L is started. The eleventh projector 42K is installed such that the projection direction center line CL11 is horizontal and intersects the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view and from the diagonally left side in the conveyance direction in plan view. Therefore, the projection material is projected horizontally toward the object W to be processed from the front side in the transport direction obliquely in plan view and from the left side in the transport direction obliquely in plan view. The twelfth projector 42L is installed such that the projection direction center line CL12 is horizontal and intersects the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view and from the diagonally right side in the conveyance direction in plan view. Therefore, the projection material is projected horizontally toward the object W to be processed from the diagonally front side in the transport direction in plan view and from the diagonally right side in the transport direction in plan view.

また、第十一投射機42K及び第十二投射機42Lによって投射材が投射される第六の投射ゾーンに対して搬送方向上流側には上流側検出部F1が設けられ、前記第六の投射ゾーンに対して搬送方向下流側には下流側検出部F2が設けられている。上流側検出部F1及び下流側検出部F2は、被処理対象物Wの通過を検出する。そして、制御部84は、上流側検出部F1による検出結果及び下流側検出部F2による検出結果に基づいて、被処理対象物Wが前記第六の投射ゾーンの範囲内にあると判断した場合に当該第六の投射ゾーンに投射材を投射するように、第十一投射機42K及び第十二投射機42Lにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを開くように制御する。また、制御部84は、上流側検出部F1による検出結果及び下流側検出部F2による検出結果に基づいて、被処理対象物Wが前記第六の投射ゾーンの範囲内には存在しないと判断した場合に、第十一投射機42K及び第十二投射機42Lにそれぞれ接続される流量調整装置40(図1等参照)の開閉ゲートを閉じるように制御する。よって、第十一投射機42K及び第十二投射機42Lによる無駄な投射を抑えることができる。   An upstream detection unit F1 is provided on the upstream side in the transport direction with respect to the sixth projection zone on which the projection material is projected by the eleventh projector 42K and the twelfth projector 42L, and the sixth projection A downstream detection unit F2 is provided on the downstream side in the transport direction with respect to the zone. The upstream side detection unit F1 and the downstream side detection unit F2 detect passage of the workpiece W. And when the control part 84 judges that the to-be-processed target object W exists in the range of the said 6th projection zone based on the detection result by the upstream detection part F1, and the detection result by the downstream detection part F2. Open and close the open / close gates of the flow control devices 40 (see FIG. 1 and the like) respectively connected to the eleventh projector 42K and the twelfth projector 42L so as to project the projection material onto the sixth projection zone. Control. Further, the control unit 84 determines that the workpiece W does not exist within the range of the sixth projection zone based on the detection result by the upstream detection unit F1 and the detection result by the downstream detection unit F2. In this case, control is performed so that the open / close gates of the flow rate adjusting devices 40 (see FIG. 1 and the like) connected to the eleventh projector 42K and the twelfth projector 42L are closed. Therefore, useless projection by the eleventh projector 42K and the twelfth projector 42L can be suppressed.

また、本実施形態では、図4に示される第一ブラスト室16で表面処理された被処理対象物Wが中間扉20の直前まで搬送されると、中間扉20が開き、被処理対象物Wが第二ブラスト室22に搬送される。第二ブラスト室22には、圧縮空気とともに投射材を噴射する噴射ノズル94が設置されている。よって、噴射ノズル94から被処理対象物Wに向けて圧縮空気とともに投射材が噴射されれば、被処理対象物Wの表面がさらに処理される。   Moreover, in this embodiment, if the to-be-processed target object W surface-treated in the 1st blast chamber 16 shown by FIG. 4 is conveyed just before the intermediate door 20, the intermediate door 20 will open, and the to-be-processed target object W will be shown. Is conveyed to the second blast chamber 22. The second blast chamber 22 is provided with an injection nozzle 94 that injects a projection material together with compressed air. Therefore, if the projection material is jetted together with the compressed air from the jet nozzle 94 toward the workpiece W, the surface of the workpiece W is further processed.

より具体的には、第二ブラスト室22では、中間扉20及び出口扉24が閉じられた状態で、被処理対象物Wが底壁部22D(図6参照)に降ろされて接地面以外の部位の要仕上げ箇所(局部)にショットブラスト処理がなされ、その後、被処理対象物Wが吊り上げられて先の接地面の要仕上げ箇所(局部)にショットブラスト処理がなされる。第二ブラスト室22でのショットブラスト処理は、作業者Pが被処理対象物Wの要仕上げ箇所へ向けて噴射ノズル94を保持し、噴射ノズル94から圧縮空気とともに投射材を噴射することでなされる。なお、第二ブラスト室22で仕上げの処理がなされるのは、例えば、被処理対象物Wに穴や突起等がある場合である。   More specifically, in the second blast chamber 22, the workpiece W is lowered to the bottom wall portion 22D (see FIG. 6) with the intermediate door 20 and the outlet door 24 closed, and other than the ground contact surface. The shot blasting process is performed on the required finishing point (local part) of the part, and then the workpiece W is lifted, and the shot blasting process is performed on the required finishing point (local part) of the ground contact surface. The shot blasting process in the second blasting chamber 22 is performed by the operator P holding the injection nozzle 94 toward the finishing point of the workpiece W and injecting the projection material together with the compressed air from the injection nozzle 94. The The finishing process is performed in the second blast chamber 22 when, for example, the object to be processed W has holes, protrusions, or the like.

また、第一ブラスト室16と第二ブラスト室22との間の流通路は、中間扉20が閉止されることで遮断されるので、中間扉20が閉止されることで第一ブラスト室16と第二ブラスト室22とで同時に(並行して)被処理対象物Wの表面処理をすることができる。すなわち、無駄な待ち時間をなくすことができる。その後、出口扉24が開けられて被処理対象物が第二ブラスト室22から搬出された後、出口扉24が閉じられることで、一連のショットブラスト処置が完了する。   Moreover, since the flow path between the 1st blast chamber 16 and the 2nd blast chamber 22 is interrupted | blocked when the intermediate door 20 is closed, when the intermediate door 20 is closed, the 1st blast chamber 16 and The surface treatment of the workpiece W can be performed simultaneously (in parallel) with the second blast chamber 22. That is, useless waiting time can be eliminated. Thereafter, after the exit door 24 is opened and the object to be processed is carried out of the second blast chamber 22, the exit door 24 is closed, whereby a series of shot blasting treatments are completed.

以上説明したように、本発明に係るショットブラスト装置10によれば、大型の被処理対象物Wの全面を表面処理することができる。   As described above, according to the shot blasting apparatus 10 according to the present invention, the entire surface of the large workpiece W can be surface-treated.

ここで、従来構造のショットブラスト装置と比較しながら、補足説明する。例えば、クレーン吊下げ式のショットブラスト装置であって、搬送ラインの側方の側壁に遠心式投射機が固定されかつ被処理対象物を旋回、反転、昇降、傾斜等させながら投射するような従来構造に係る装置では、熟練した作業者でないと被処理対象物の全面を表面処理するのが難しいという問題点がある。すなわち、このような従来構造に係る装置では、例えば、反転機にて被処理対象物を任意に傾斜等させながら昇降ホイストにて昇降させるといったことをするので、被処理対象物のセット(より具体的には、被処理対象物の吊り重心や反転時の安定性等を考慮した吊り下げ)及び反転位置出しが難しい。その結果、熟練した作業者でないと被処理対象物の全面をショットブラスト処理することが難しい。また、このような従来構造に係る装置を用いて被処理対象物の全面をショットブラスト処理すると、無駄投射が非常に多くなってしまう問題点もある。これに対して、本実施形態では、熟練した作業者が操作しなくても、無駄な投射を抑えつつ、大型の被処理対象物Wの全面を表面処理することができる。   Here, a supplementary explanation will be given in comparison with a shot blasting device having a conventional structure. For example, it is a crane-suspended shot blasting apparatus in which a centrifugal projector is fixed to the side wall on the side of the transfer line and the object to be processed is projected while being swiveled, inverted, lifted, tilted, etc. In the apparatus according to the structure, there is a problem that it is difficult to surface-treat the entire surface of the object to be processed unless it is a skilled worker. That is, in the apparatus according to such a conventional structure, for example, the object to be processed is moved up and down by an elevating hoist while arbitrarily tilting the object to be processed by a reversing machine. Specifically, it is difficult to suspend the object to be processed and suspend it in consideration of stability at the time of reversal, etc.) and reverse position. As a result, it is difficult for a non-skilled worker to perform shot blasting on the entire surface of the object to be processed. In addition, when the entire surface of the object to be processed is shot blasted using such an apparatus according to the conventional structure, there is a problem that wasteful projections are extremely increased. On the other hand, in the present embodiment, the entire surface of the large workpiece W can be surface-treated while suppressing unnecessary projections even without operation by a skilled worker.

また、前記の従来構造に係る装置では、天井面の反転用チェーンスリングが反転角度により移動するため、被処理対象物の搬送方向における天井シールとそれに直交する方向の天井シールが必要となり、シール構造が複雑となる。これに対して、本実施形態では、そのようなシール構造の複雑化といった問題も生じない。   Further, in the apparatus according to the conventional structure described above, since the chain sling for reversing the ceiling surface moves according to the reversal angle, a ceiling seal in the conveyance direction of the object to be processed and a ceiling seal in a direction perpendicular to the ceiling seal are necessary. Becomes complicated. On the other hand, in this embodiment, the problem of such a complicated sealing structure does not occur.

[第2の実施形態]
次に、本発明の第2の実施形態に係るショット処理装置としてのショットブラスト装置110について、図8及び図9を用いて説明する。図8には、被処理対象物Wの搬送方向に見た遠心式投射機42の配置が示されており、図9には、図8の9−9線矢視図が示されている。なお、第2の実施形態は、遠心式投射機42として、第一投射機42M、第二投射機42N、第三投射機42O、第四投射機42P、第五投射機42Q、第六投射機42R、第七投射機42S、及び第八投射機42Tの八台を設置した点が特徴であり、他の構成は、第1の実施形態とほぼ同様の構成となっている。よって、第1の実施形態と実質的に同様の構成部については、同一符号を付して説明を省略する。
[Second Embodiment]
Next, a shot blasting apparatus 110 as a shot processing apparatus according to a second embodiment of the present invention will be described with reference to FIGS. 8 shows the arrangement of the centrifugal projectors 42 as viewed in the conveying direction of the object to be processed W, and FIG. 9 shows a view taken along line 9-9 in FIG. In the second embodiment, as the centrifugal projector 42, the first projector 42M, the second projector 42N, the third projector 42O, the fourth projector 42P, the fifth projector 42Q, and the sixth projector. The feature is that eight units of 42R, the seventh projector 42S, and the eighth projector 42T are installed, and other configurations are substantially the same as those of the first embodiment. Therefore, components that are substantially the same as those of the first embodiment are denoted by the same reference numerals and description thereof is omitted.

図8に示されるように、第一ブラスト室16において室内空間と装置上方側の空間とを隔成する天井部16Dは、被処理対象物Wの搬送ラインと同一平面における搬送方向と直交する部分の幅が被処理対象物Wの搬送方向と直交する中央部の幅よりも狭く設定されている。   As shown in FIG. 8, the ceiling portion 16 </ b> D that separates the indoor space and the space above the apparatus in the first blast chamber 16 is a portion orthogonal to the transport direction on the same plane as the transport line of the object W to be processed. Is set to be narrower than the width of the central portion orthogonal to the conveyance direction of the workpiece W.

ショットブラスト装置110における遠心式投射機42は、平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で(搬送ラインの側方側から見て)斜め上側、及び側面視で(搬送ラインの側方側から見て)斜め下側からそれぞれ交わるように複数設置されている。以下、具体的に説明する。   The centrifugal projector 42 in the shot blasting device 110 is obliquely forward in the conveying direction in plan view, obliquely rearward in the conveying direction in plan view, obliquely left in the conveying direction in plan view, obliquely right in the conveying direction in plan view, and in side view (conveyed) A plurality are installed so as to cross each other from the diagonally upper side (viewed from the side of the line) and from the diagonally lower side (viewed from the side of the conveyance line). This will be specifically described below.

図8及び図9に示されるように、第一ブラスト室16における被処理対象物Wの搬送方向Xの上流側には、装置下側のホッパ部17に第一投射機42M及び第三投射機42Oが設けられると共に、装置上側の天井部16Dに第二投射機42N及び第四投射機42Pが設けられている。   As shown in FIGS. 8 and 9, on the upstream side in the transport direction X of the workpiece W in the first blast chamber 16, the first projector 42 </ b> M and the third projector are placed in the hopper portion 17 on the lower side of the apparatus. 42O is provided, and a second projector 42N and a fourth projector 42P are provided on the ceiling 16D on the upper side of the apparatus.

装置下側の第一投射機42Mは、被処理対象物Wの搬送方向に見て搬送幅方向左側に配置され、装置正面視の図9では、第三投射機42Oと装置前後方向(図9の紙面に垂直な方向)に重なる位置に配置されている。図8に示される第一投射機42Mは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。   The first projector 42M on the lower side of the apparatus is arranged on the left side in the conveyance width direction when viewed in the conveyance direction of the workpiece W, and in FIG. 9 as viewed from the front of the apparatus, the third projector 42O and the apparatus front-rear direction (FIG. 9). In a direction perpendicular to the paper surface). In the first projector 42M shown in FIG. 8, the center line in the projection direction is obliquely downward with respect to the conveyance line of the object to be processed W in the conveyance direction obliquely rearward in the plan view and in the conveyance direction obliquely on the left side and in the side view. It is installed so as to intersect at around 45 ° (35 ° to 55 °) from the side.

装置上側の第二投射機42Nは、被処理対象物Wの搬送方向に見て搬送幅方向左側に配置され、装置正面視の図9では、第四投射機42Pと装置前後方向(図9の紙面に垂直な方向)に重なる位置に配置されている。図8に示される第二投射機42Nは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The second projector 42N on the upper side of the apparatus is arranged on the left side in the conveyance width direction when viewed in the conveyance direction of the workpiece W, and in FIG. 9 as viewed from the front of the apparatus, the fourth projector 42P and the apparatus front-rear direction (in FIG. 9). It is arranged at a position overlapping (in a direction perpendicular to the paper surface). The second projector 42N shown in FIG. 8 has a projection direction center line that is obliquely rearward in the conveying direction in plan view and obliquely left in the conveying direction in plan view and obliquely upward in side view with respect to the conveying line of the object W to be processed. It is installed so that it may cross at around 45 degrees (35 degrees-55 degrees).

装置下側の第三投射機42Oは、被処理対象物Wの搬送方向に見て搬送幅方向右側に配置されている。第三投射機42Oは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。   The third projector 42O on the lower side of the apparatus is arranged on the right side in the transport width direction when viewed in the transport direction of the workpiece W. The third projector 42O has a projection direction center line of about 45 ° from the obliquely lower side in the conveyance direction obliquely rearward and planarly in the plan view in the plan view with respect to the conveyance line of the workpiece W. It is installed so as to intersect at (35 ° to 55 °).

装置上側の第四投射機42Pは、被処理対象物Wの搬送方向に見て搬送幅方向右側に配置されている。第四投射機42Pは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The fourth projector 42P on the upper side of the apparatus is arranged on the right side in the transport width direction when viewed in the transport direction of the workpiece W. In the fourth projector 42P, the projection direction center line is about 45 ° from the obliquely upper side in the conveyance direction obliquely rearward and planarly in the plan view with respect to the conveyance line of the object W to be processed. 35 ° to 55 °).

図8及び図9に示されるように、第一ブラスト室16における被処理対象物Wの搬送方向Xの下流側には、装置下側のホッパ部17に第五投射機42Q及び第七投射機42Sが設けられると共に、装置上側の天井部16Dに第六投射機42R及び第八投射機42Tが設けられている。   As shown in FIGS. 8 and 9, on the downstream side in the transport direction X of the workpiece W in the first blast chamber 16, the fifth projector 42 </ b> Q and the seventh projector are placed on the hopper portion 17 on the lower side of the apparatus. 42S is provided, and a sixth projector 42R and an eighth projector 42T are provided on the ceiling 16D on the upper side of the apparatus.

装置下側の第五投射機42Qは、被処理対象物Wの搬送方向に見て搬送幅方向左側に配置されている。第五投射機42Qは、被処理対象物Wの搬送方向に見た図8では、第一投射機42Mと装置左右方向(図8の紙面に垂直な方向)に重なる位置に配置され、装置正面視の図9では、第七投射機42Sと装置前後方向(図9の紙面に垂直な方向)に重なる位置に配置されている。第五投射機42Qは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。   The fifth projector 42Q on the lower side of the apparatus is arranged on the left side in the transport width direction when viewed in the transport direction of the workpiece W. The fifth projector 42Q is arranged in a position overlapping the first projector 42M in the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 8) in FIG. 8 as viewed in the conveyance direction of the workpiece W. In FIG. 9, the seventh projector 42 </ b> S is arranged at a position overlapping with the apparatus front-rear direction (direction perpendicular to the paper surface of FIG. 9). In the fifth projector 42Q, the projection direction center line is about 45 ° from the obliquely lower side in the conveyance direction obliquely front side and the planar view obliquely left side and side view in plan view with respect to the conveyance line of the workpiece W to be processed ( 35 ° to 55 °).

装置上側の第六投射機42Rは、被処理対象物Wの搬送方向に見て搬送幅方向左側に配置されている。第六投射機42Rは、被処理対象物Wの搬送方向に見た図8では、第二投射機42Nと装置左右方向(図8の紙面に垂直な方向)に重なる位置に配置され、装置正面視の図9では、第八投射機42Tと装置前後方向(図9の紙面に垂直な方向)に重なる位置に配置されている。第六投射機42Rは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The sixth projector 42R on the upper side of the apparatus is arranged on the left side in the transport width direction when viewed in the transport direction of the workpiece W. The sixth projector 42R is arranged in a position overlapping the second projector 42N and the apparatus left-right direction (direction perpendicular to the paper surface of FIG. 8) in FIG. 8 as viewed in the conveyance direction of the object W to be processed. In FIG. 9, the eighth projector 42 </ b> T is disposed at a position overlapping with the apparatus front-rear direction (direction perpendicular to the paper surface of FIG. 9). In the sixth projector 42R, the projection direction center line is about 45 ° from the obliquely upper side in the conveyance direction obliquely front side in the plan view and in the conveyance direction obliquely left side and in the side view with respect to the conveyance line of the workpiece W (35 It is installed so that it may cross at (° -55 °).

装置下側の第七投射機42Sは、被処理対象物Wの搬送方向に見て搬送幅方向右側に配置されている。第七投射機42Sは、被処理対象物Wの搬送方向に見た図8では、第三投射機42Oと装置左右方向(図8の紙面に垂直な方向)に重なる位置に配置されている。第七投射機42Sは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるように設置されている。   The seventh projector 42S on the lower side of the apparatus is disposed on the right side in the transport width direction when viewed in the transport direction of the workpiece W. The seventh projector 42S is arranged at a position overlapping with the third projector 42O in the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 8) in FIG. 8 as viewed in the conveyance direction of the workpiece W. In the seventh projector 42S, the center line in the projection direction is about 45 ° from the obliquely lower side in the conveyance direction obliquely front side and the planar view obliquely right side and side view in plan view with respect to the conveyance line of the workpiece W to be processed ( 35 ° to 55 °).

装置上側の第八投射機42Tは、被処理対象物Wの搬送方向に見て搬送幅方向右側に配置されている。第八投射機42Tは、被処理対象物Wの搬送方向に見た図8では、第四投射機42Pと装置左右方向(図8の紙面に垂直な方向)に重なる位置に配置されている。第八投射機42Tは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The eighth projector 42T on the upper side of the apparatus is disposed on the right side in the transport width direction when viewed in the transport direction of the workpiece W. The eighth projector 42T is arranged at a position overlapping the fourth projector 42P in the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 8) in FIG. 8 as viewed in the conveyance direction of the workpiece W. The eighth projector 42T has a projection direction center line of about 45 ° from the obliquely upper side in the conveyance direction obliquely front side in the plan view and in the conveyance direction obliquely right side and in the side view with respect to the conveyance line of the workpiece W (35 It is installed so that it may cross at (° -55 °).

被処理対象物Wの搬送ラインにおいて複数の遠心式投射機42の各々によって投射材が投射される投射ゾーンが当該搬送ラインに沿って複数(本実施形態では一例として上流側と下流側の計二個)設定されている。また、第1の実施形態と同様に、複数の投射ゾーンに対してそれぞれ搬送方向上流側には、上流側検出部(図示省略)が設けられると共に、複数の投射ゾーンに対してそれぞれ搬送方向下流側には、下流側検出部(図示省略)が設けられている。前記上流側検出部及び前記下流側検出部は、被処理対象物Wの通過を検出する。また、第1の実施形態と同様に、制御部84は、前記上流側検出部による検出結果及び前記下流側検出部による検出結果に基づいて、被処理対象物Wが投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように流量調整装置40の開閉ゲートの作動を制御する。   A plurality of projection zones along which the projection material is projected by each of the plurality of centrifugal projectors 42 in the transport line of the workpiece W (a total of two on the upstream side and the downstream side as an example in the present embodiment). Set). Similarly to the first embodiment, upstream detection units (not shown) are provided on the upstream side in the transport direction with respect to the plurality of projection zones, and downstream in the transport direction with respect to the plurality of projection zones. On the side, a downstream side detection unit (not shown) is provided. The upstream detection unit and the downstream detection unit detect passage of the object to be processed W. Similarly to the first embodiment, the control unit 84 determines whether the object to be processed W is in any one of the projection zones based on the detection result by the upstream detection unit and the detection result by the downstream detection unit. The operation of the open / close gate of the flow rate adjusting device 40 is controlled so that the projection material is projected onto the projection zone only when it is determined that it is within the projection zone.

(作用・効果)
次に、上記実施形態の作用及び効果について説明する。
(Action / Effect)
Next, the operation and effect of the above embodiment will be described.

第一投射機42Mは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第二投射機42Nは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。   The first projector 42M has a projection direction center line that intersects the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally lower side in side view. Since it is installed, the projection material is projected toward the workpiece W from the obliquely rear side in the conveying direction in a plan view and from the obliquely lower side in the conveying direction obliquely to the left and in a side view in a plan view. The second projector 42N is installed such that the center line in the projection direction intersects with the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, diagonally left in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object W to be processed from the obliquely rear side in the conveying direction in plan view and from the obliquely upper side in the conveying direction obliquely left side and side view in plan view.

第三投射機42Oは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。第四投射機42Pは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The third projector 42O crosses the center line in the projection direction with respect to the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally right side in the conveyance direction in plan view, and from the diagonally lower side in side view. Since it is installed, the projection material is projected toward the object W to be processed from the obliquely rear side in the conveying direction in plan view and from the obliquely lower side in the conveying direction obliquely right side and side view in plan view. The fourth projector 42P is installed such that the center line in the projection direction intersects the conveyance line of the workpiece W to be processed obliquely from the rear in the conveyance direction in plan view, obliquely from the right in the conveyance direction in plan view, and obliquely from the upper side in side view. Therefore, the projection material is projected toward the object W to be processed from the obliquely rear side in the conveyance direction in a plan view and from the obliquely upper side in the conveyance direction obliquely right side and in a side view in plan view.

第五投射機42Qは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から投射材を投射する。第六投射機42Rは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。   The fifth projector 42Q is installed such that the projection direction center line intersects the conveyance line of the workpiece W to be processed obliquely from the front in the conveyance direction, obliquely from the left in the conveyance direction in plan view, and obliquely from the lower side in the side view. Therefore, the projection material is projected toward the object W to be processed from the diagonally front side in the transport direction in a plan view and from the diagonally lower side in the transport direction diagonally to the left and in a side view in plan view. The sixth projector 42R is installed such that the center line in the projection direction intersects the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the workpiece W from the diagonally front side in the transport direction in a plan view and from the diagonally upper side in the transport direction diagonally to the left and in a side view in plan view.

第七投射機42Sは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から投射材を投射する。第八投射機42Tは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The seventh projector 42S is installed such that the center line in the projection direction intersects the conveyance line of the object W to be processed obliquely from the front in the conveyance direction in the plan view, obliquely from the right in the conveyance direction in the plan view, and obliquely from the lower side in the side view. Therefore, the projection material is projected toward the workpiece W from the diagonally front side in the transport direction in plan view and from the diagonally lower side in the transport direction diagonally right side and side view in plan view. The eighth projector 42T is installed such that the center line in the projection direction intersects the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view, from the diagonally right side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the workpiece W from the diagonally front side in the transport direction in a plan view, from the diagonally right side in the transport direction in a plan view and from the diagonally upper side in a side view.

以上説明したように、本実施形態に係るショットブラスト装置110によれば、大型の被処理対象物Wの全面を表面処理することができる。   As described above, according to the shot blasting apparatus 110 according to the present embodiment, the entire surface of the large workpiece W can be surface-treated.

[第3の実施形態]
次に、本発明の第3の実施形態に係るショット処理装置としてのショットブラスト装置120について、図10及び図11を用いて説明する。図10には、被処理対象物Wの搬送方向に見た遠心式投射機42の配置が示されており、図11には、図10の11−11線矢視図が示されている。なお、第3の実施形態は、遠心式投射機42として第一投射機42U、第二投射機42V、第三投射機42W、第四投射機42X、第五投射機42Y、及び第六投射機42Zの六台設置した点が特徴であり、他の構成は、第1、第2の実施形態とほぼ同様の構成となっている。よって、第1、第2の実施形態と実質的に同様の構成部については、同一符号を付して説明を省略する。
[Third Embodiment]
Next, a shot blasting apparatus 120 as a shot processing apparatus according to a third embodiment of the present invention will be described with reference to FIGS. 10 shows the arrangement of the centrifugal projectors 42 as viewed in the conveying direction of the object to be processed W, and FIG. 11 shows a view taken along line 11-11 in FIG. In the third embodiment, the centrifugal projector 42 includes a first projector 42U, a second projector 42V, a third projector 42W, a fourth projector 42X, a fifth projector 42Y, and a sixth projector. The feature is that six 42Z units are installed, and other configurations are substantially the same as those in the first and second embodiments. Therefore, components substantially the same as those in the first and second embodiments are denoted by the same reference numerals and description thereof is omitted.

ショットブラスト装置120における遠心式投射機42は、平面視で搬送方向斜め前側、平面視で搬送方向斜め後側、平面視で搬送方向斜め左側、平面視で搬送方向斜め右側、側面視で(搬送ラインの側方側から見て)斜め上側、及び側面視で(搬送ラインの側方側から見て)斜め下側からそれぞれ交わるように複数設置されている。以下、具体的に説明する。   The centrifugal projector 42 in the shot blast device 120 is obliquely forward in the conveying direction in plan view, obliquely rearward in the conveying direction in plan view, obliquely left in the conveying direction in plan view, obliquely right in the conveying direction in plan view, A plurality are installed so as to cross each other from the diagonally upper side (viewed from the side of the line) and from the diagonally lower side (viewed from the side of the conveyance line). This will be specifically described below.

図10及び図11に示されるように、第一ブラスト室16における被処理対象物Wの搬送方向Xの上流側には、装置下側のホッパ部17に第一投射機42Uが設けられると共に、装置上側の天井部16Dに第二投射機42V及び第三投射機42Wが設けられている。   As shown in FIGS. 10 and 11, a first projector 42U is provided on the hopper 17 on the lower side of the apparatus on the upstream side in the transport direction X of the workpiece W in the first blast chamber 16, A second projector 42V and a third projector 42W are provided on the ceiling 16D on the upper side of the apparatus.

装置下側の第一投射機42Uは、投射方向中心線が被処理対象物Wの搬送ラインに対して側面視で搬送方向斜め後側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるようになおかつ平面視で被処理対象物Wの搬送ラインに沿いかつ搬送ラインと重なる方向に設置されている。   The first projector 42U on the lower side of the apparatus has a center line in the projection direction of about 45 ° from the obliquely lower side in the conveyance direction obliquely rear side and in the side view with respect to the conveyance line of the workpiece W (from 35 ° to 35 °). 55) so as to intersect with each other and along the conveyance line of the workpiece W in plan view and in a direction overlapping the conveyance line.

装置上側の第二投射機42Vは、被処理対象物Wの搬送方向に見て搬送幅方向左側に配置され、装置正面視の図11では、第三投射機42Wと装置前後方向(図11の紙面に垂直な方向)に重なる位置に配置されている。図10に示される第二投射機42Vは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The second projector 42V on the upper side of the apparatus is arranged on the left side in the transport width direction when viewed in the transport direction of the object to be processed W. In FIG. It is arranged at a position overlapping (in a direction perpendicular to the paper surface). In the second projector 42V shown in FIG. 10, the center line in the projection direction is obliquely rearward in the conveyance direction in plan view and obliquely in the left in the conveyance direction in plan view and obliquely upward in the side view with respect to the conveyance line of the object W to be processed. It is installed so that it may cross at around 45 degrees (35 degrees-55 degrees).

装置上側の第三投射機42Wは、被処理対象物Wの搬送方向に見て搬送幅方向右側に配置されている。第三投射機42Wは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   The third projector 42 </ b> W on the upper side of the apparatus is arranged on the right side in the transport width direction when viewed in the transport direction of the object to be processed W. The third projector 42W has a projection direction center line of about 45 ° from the obliquely upper side in the conveyance direction obliquely rearward and planarly in the plan view with respect to the conveyance line of the object W to be processed. 35 ° to 55 °).

図10及び図11に示されるように、第一ブラスト室16における被処理対象物Wの搬送方向Xの下流側には、装置下側のホッパ部17に第四投射機42Xが設けられると共に、装置上側の天井部16Dに第五投射機42Y及び第六投射機42Zが設けられている。   As shown in FIGS. 10 and 11, a fourth projector 42 </ b> X is provided in the hopper 17 on the lower side of the apparatus on the downstream side in the transport direction X of the workpiece W in the first blast chamber 16, A fifth projector 42Y and a sixth projector 42Z are provided on the ceiling 16D on the upper side of the apparatus.

装置下側の第四投射機42Xは、被処理対象物Wの搬送方向に見た図10では、第一投射機42Uと装置左右方向(図10の紙面に垂直な方向)に重なる位置に配置されている。図11に示される第四投射機42Xは、投射方向中心線が被処理対象物Wの搬送ラインに対して側面視で搬送方向斜め前側かつ側面視で斜め下側から45°前後(35°〜55°)で交わるようになおかつ平面視で被処理対象物Wの搬送ラインに沿いかつ搬送ラインと重なる方向に設置されている。   The fourth projector 42X on the lower side of the apparatus is arranged at a position overlapping with the first projector 42U in the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 10) in FIG. Has been. In the fourth projector 42X shown in FIG. 11, the projection direction center line is approximately 45 ° (35 ° to approximately 35 ° from the obliquely forward side in the conveyance direction in the side view and the obliquely lower side in the side view with respect to the conveyance line of the object W to be processed. 55) so as to intersect with each other and along the conveyance line of the workpiece W in plan view and in a direction overlapping the conveyance line.

図10及び図11に示されるように、装置上側の第五投射機42Yは、被処理対象物Wの搬送方向に見て搬送幅方向左側に配置され、被処理対象物Wの搬送方向に見た図10では、第二投射機42Vと装置左右方向(図10の紙面に垂直な方向)に重なる位置に配置され、装置正面視の図11では、第六投射機42Zと装置前後方向(図11の紙面に垂直な方向)に重なる位置に配置されている。第五投射機42Yは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から45°前後(35°〜55°)で交わるように設置されている。   As shown in FIGS. 10 and 11, the fifth projector 42 </ b> Y on the upper side of the apparatus is disposed on the left side in the transport width direction when viewed in the transport direction of the object to be processed W, and is viewed in the transport direction of the object to be processed W. 10, the second projector 42V is disposed at a position overlapping the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 10), and in FIG. 11 in the direction perpendicular to the paper surface). In the fifth projector 42Y, the center line in the projection direction is about 45 ° from the obliquely upper side in the conveyance direction obliquely front side in the plan view and in the conveyance direction obliquely left side and in the side view with respect to the conveyance line of the workpiece W (35 It is installed so that it may cross at (° -55 °).

装置上側の第六投射機42Zは、被処理対象物Wの搬送方向に見て搬送幅方向右側に配置され、被処理対象物Wの搬送方向に見た図10では、第三投射機42Wと装置左右方向(図10の紙面に垂直な方向)に重なる位置に配置されている。第六投射機42Zは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されている。   The sixth projector 42Z on the upper side of the apparatus is arranged on the right side in the transport width direction when viewed in the transport direction of the object to be processed W, and in FIG. It is arranged at a position overlapping in the left-right direction of the apparatus (direction perpendicular to the paper surface of FIG. 10). The sixth projector 42Z is installed such that the projection direction center line intersects the conveyance line of the workpiece W to be processed obliquely from the front side in the conveyance direction, from the diagonally right side in the conveyance direction in plan view, and from the diagonally upper side in side view. ing.

被処理対象物Wの搬送ラインにおいて複数の遠心式投射機42の各々によって投射材が投射される投射ゾーンが当該搬送ラインに沿って複数(本実施形態では一例として上流側と下流側の計二個)設定されている。また、第1、第2の実施形態と同様に、複数の投射ゾーンに対してそれぞれ搬送方向上流側には、上流側検出部(図示省略)が設けられると共に、複数の投射ゾーンに対してそれぞれ搬送方向下流側には、下流側検出部(図示省略)が設けられている。前記上流側検出部及び前記下流側検出部は、被処理対象物Wの通過を検出する。また、第1、第2の実施形態と同様に、制御部84は、前記上流側検出部による検出結果及び前記下流側検出部による検出結果に基づいて、被処理対象物Wが投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように流量調整装置40の開閉ゲートの作動を制御する。   A plurality of projection zones along which the projection material is projected by each of the plurality of centrifugal projectors 42 in the transport line of the workpiece W (a total of two on the upstream side and the downstream side as an example in the present embodiment). Set). Similarly to the first and second embodiments, an upstream side detection unit (not shown) is provided on the upstream side in the conveyance direction for each of the plurality of projection zones, and each of the plurality of projection zones. A downstream side detection unit (not shown) is provided on the downstream side in the transport direction. The upstream detection unit and the downstream detection unit detect passage of the object to be processed W. Similarly to the first and second embodiments, the control unit 84 determines whether the object to be processed W is in the projection zone based on the detection result by the upstream detection unit and the detection result by the downstream detection unit. Only when it is determined to be within the range, the operation of the open / close gate of the flow rate adjusting device 40 is controlled so that the projection material is projected onto the projection zone.

(作用・効果)
次に、上記実施形態の作用及び効果について説明する。
(Action / Effect)
Next, the operation and effect of the above embodiment will be described.

図10及び図11に示される第一投射機42Uは、投射方向中心線が被処理対象物Wの搬送ラインに対して側面視で搬送方向斜め後側かつ側面視で斜め下側から交わるように、なおかつ平面視で搬送ラインに沿いかつ搬送ラインと重なる方向に設置されているので、被処理対象物Wに向けて側面視で搬送方向斜め後側かつ側面視で斜め下側から投射材を投射する。第二投射機42Vは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第三投射機42Wは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   In the first projector 42U shown in FIGS. 10 and 11, the center line in the projection direction intersects the conveyance line of the workpiece W from the obliquely rear side in the conveyance direction in the side view and from the obliquely lower side in the side view. In addition, since it is installed in a direction along the conveyance line and overlapping with the conveyance line in plan view, the projection material is projected toward the workpiece W from the obliquely rear side in the conveyance direction in the side view and from the obliquely lower side in the side view. To do. The second projector 42V is installed such that the center line in the projection direction intersects the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, diagonally from the left in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the object W to be processed from the obliquely rear side in the conveying direction in plan view and from the obliquely upper side in the conveying direction obliquely left side and side view in plan view. The third projector 42W is installed such that the center line in the projection direction intersects the conveyance line of the object W to be processed from the diagonally rear side in the conveyance direction in plan view, from the diagonally right side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the object W to be processed from the obliquely rear side in the conveyance direction in a plan view and from the obliquely upper side in the conveyance direction obliquely right side and in a side view in plan view.

第四投射機42Xは、投射方向中心線が被処理対象物Wの搬送ラインに対して側面視で搬送方向斜め前側かつ側面視で斜め下側から交わるようになおかつ平面視で被処理対象物Wの搬送ラインに沿いかつ搬送ラインと重なる方向に設置されているので、被処理対象物Wに向けて側面視で搬送方向斜め前側かつ側面視で斜め下側から投射材を投射する。第五投射機42Yは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から投射材を投射する。第六投射機42Zは、投射方向中心線が被処理対象物Wの搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置されているので、被処理対象物Wに向けて平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から投射材を投射する。   The fourth projector 42X has the projection direction center line intersecting the conveyance line of the object W to be processed from the side obliquely in the conveyance direction when viewed from the side and from the obliquely lower side when viewed from the side, and in the plan view. Therefore, the projection material is projected toward the object W to be processed from the obliquely lower side in the front side view and in the side view. The fifth projector 42Y is installed such that the center line in the projection direction intersects the conveyance line of the object W to be processed from the diagonally front side in the conveyance direction in plan view, from the diagonally left side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the workpiece W from the diagonally front side in the transport direction in a plan view and from the diagonally upper side in the transport direction diagonally to the left and in a side view in plan view. The sixth projector 42Z is installed such that the projection direction center line intersects the conveyance line of the workpiece W to be processed obliquely from the front side in the conveyance direction, from the diagonally right side in the conveyance direction in plan view, and from the diagonally upper side in side view. Therefore, the projection material is projected toward the workpiece W from the diagonally front side in the transport direction in a plan view and from the diagonally upper side in the transport direction diagonally right side and in a side view in plan view.

以上説明したように、本実施形態に係るショットブラスト装置120によれば、大型の被処理対象物Wの全面を表面処理することができる。   As described above, according to the shot blasting apparatus 120 according to the present embodiment, the entire surface of the large workpiece W can be surface-treated.

[実施形態の補足説明]
なお、上記実施形態では、ショット処理装置がショットブラスト装置10、110、120とされているが、ショット処理装置は、ショットピーニング装置であってもよいし、ショットブラスト装置兼ショットピーニング装置であってもよい。
[Supplementary explanation of the embodiment]
In the above embodiment, the shot processing apparatus is the shot blasting apparatus 10, 110, 120. However, the shot processing apparatus may be a shot peening apparatus or a shot blasting apparatus and shot peening apparatus. Also good.

また、上記実施形態の変形例として、下流側検出部を設けない構成とし、制御部は、上流側検出部による検出結果及び吊下部の移動速度に基づいて、被処理対象物が前記投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように投射材供給部を制御する構成でもよい。   Further, as a modification of the above-described embodiment, the downstream detection unit is not provided, and the control unit detects that the object to be processed is the projection zone based on the detection result by the upstream detection unit and the moving speed of the suspension. The structure which controls a projection material supply part so that a projection material may be projected on the said projection zone only when it judges that it exists in one of the ranges may be sufficient.

また、他の変形例として、下流側検出部を設けず、かつ搬送方向の最上流側に設定された投射ゾーンの搬送方向上流側にのみ検出部(被処理対象物の通過を検出する構成部)を設ける構成とし、制御部は、前記検出部による検出結果及び吊下部の移動速度に基づいて、被処理対象物が前記投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように投射材供給部を制御する構成でもよい。   As another modification, a detection unit (a component that detects the passage of the object to be processed is provided only on the upstream side in the conveyance direction of the projection zone that is set on the most upstream side in the conveyance direction without providing the downstream side detection unit. ), And the control unit performs the projection only when it is determined that the object to be processed is within any one of the projection zones based on the detection result of the detection unit and the moving speed of the suspension. The structure which controls a projection material supply part so that a projection material may be projected on a zone may be sufficient.

また、上記実施形態の変形例として、第二ブラスト室22(第二処理室)を設けない構成も採り得る。   Further, as a modification of the above embodiment, a configuration in which the second blast chamber 22 (second processing chamber) is not provided may be employed.

また、上記実施形態では、図1等に示される中間扉20(仕切扉)が設けられているが、処理量が少ない場合には、中間扉(仕切扉)を設けない構成も可能である。また、上記実施形態の出口扉24を設けずに、ショット処理後に被処理対象物の搬送方向を搬入時とは反対の方向にして搬入口の側から被処理対象物を搬出する構成としてもよい。また、入口扉12、中間扉20(仕切扉)、出口扉24の少なくともいずれかに代えて、二重又は三重の所謂ゴム暖簾を配置してもよい。   Moreover, in the said embodiment, although the intermediate door 20 (partition door) shown by FIG. 1 etc. is provided, when the amount of processing is small, the structure which does not provide an intermediate door (partition door) is also possible. Moreover, it is good also as a structure which carries out a to-be-processed object from the entrance side by making the conveyance direction of a to-be-processed object into the direction opposite to the time of carrying in after shot processing, without providing the exit door 24 of the said embodiment. . Further, instead of at least one of the entrance door 12, the intermediate door 20 (partition door), and the exit door 24, double or triple so-called rubber warming may be arranged.

また、上記実施形態の変形例として、第一ブラスト室16に搬入された被処理対象物Wの高さ位置を変えて第一ブラスト室16の中を複数回通過させるような構成を採ってもよい。また、被処理対象物Wを任意の位置で停止又は(通常搬送速度よりも低速の)低速移動させ、任意の研掃の仕上がりを選択させるようにしてもよい。さらに、投射の停止を被処理対象物の任意位置で行なうことで、必要でない箇所の投射をなくすような方法を採用してもよい。   Further, as a modified example of the above-described embodiment, a configuration may be adopted in which the height position of the object to be processed W carried into the first blast chamber 16 is changed and the object is passed through the first blast chamber 16 a plurality of times. Good. Alternatively, the object to be processed W may be stopped at an arbitrary position or moved at a low speed (lower than the normal conveying speed) to select an arbitrary polishing finish. Furthermore, you may employ | adopt the method of eliminating the projection of the location which is not required by stopping a projection in the arbitrary positions of a to-be-processed target object.

なお、上記実施形態及び上述の複数の変形例は、適宜組み合わされて実施可能である。   In addition, the said embodiment and the above-mentioned some modification can be implemented combining suitably.

以上、本発明の一例について説明したが、本発明は、上記に限定されるものでなく、上記以外にも、その主旨を逸脱しない範囲内において種々変形して実施可能であることは勿論である。   Although an example of the present invention has been described above, the present invention is not limited to the above, and it is needless to say that various modifications can be made without departing from the spirit of the present invention. .

この出願は、日本国で2013年1月30日に出願された特願2013―015672号に基づいており、その内容は本出願の内容として、その一部を形成する。
また、本発明は本明細書の詳細な説明により更に完全に理解できるであろう。しかしながら、詳細な説明および特定の実施例は、本発明の望ましい実施の形態であり、説明の目的のためにのみ記載されているものである。この詳細な説明から、種々の変更、改変が、当業者にとって明らかだからである。
出願人は、記載された実施の形態のいずれをも公衆に献上する意図はなく、開示された改変、代替案のうち、特許請求の範囲内に文言上含まれないかもしれないものも、均等論下での発明の一部とする。
本明細書あるいは請求の範囲の記載において、名詞及び同様な指示語の使用は、特に指示されない限り、または文脈によって明瞭に否定されない限り、単数および複数の両方を含むものと解釈すべきである。本明細書中で提供されたいずれの例示または例示的な用語(例えば、「等」)の使用も、単に本発明を説明し易くするという意図であるに過ぎず、特に請求の範囲に記載しない限り本発明の範囲に制限を加えるものではない。
This application is based on Japanese Patent Application No. 2013-015672 filed on January 30, 2013 in Japan, the contents of which form part of the present application.
The present invention will also be more fully understood from the detailed description herein. However, the detailed description and specific examples are preferred embodiments of the present invention and are described for illustrative purposes only. This is because various changes and modifications will be apparent to those skilled in the art from this detailed description.
The applicant does not intend to contribute any of the described embodiments to the public, and the disclosed modifications and alternatives that may not be included in the scope of the claims are equivalent. It is part of the invention under discussion.
In this specification or in the claims, the use of nouns and similar directives should be interpreted to include both the singular and the plural unless specifically stated otherwise or clearly denied by context. The use of any examples or exemplary terms provided herein (eg, “etc.”) is merely intended to facilitate the description of the invention and is not specifically recited in the claims. As long as it does not limit the scope of the present invention.

10 ショットブラスト装置(ショット処理装置)
16 第一ブラスト室(第一処理室)
20 中間扉(仕切扉)
22 第二ブラスト室(第二処理室)
40 流量調整装置(投射材供給部)
42A 第一投射機(遠心式投射機)
42B 第二投射機(遠心式投射機)
42C 第三投射機(遠心式投射機)
42D 第四投射機(遠心式投射機)
42E 第五投射機(遠心式投射機)
42F 第六投射機(遠心式投射機)
42G 第七投射機(遠心式投射機)
42H 第八投射機(遠心式投射機)
42I 第九投射機(遠心式投射機)
42J 第十投射機(遠心式投射機)
42K 第十一投射機(遠心式投射機)
42L 第十二投射機(遠心式投射機)
42M 第一投射機(遠心式投射機)
42N 第二投射機(遠心式投射機)
42O 第三投射機(遠心式投射機)
42P 第四投射機(遠心式投射機)
42Q 第五投射機(遠心式投射機)
42R 第六投射機(遠心式投射機)
42S 第七投射機(遠心式投射機)
42T 第八投射機(遠心式投射機)
42U 第一投射機(遠心式投射機)
42V 第二投射機(遠心式投射機)
42W 第三投射機(遠心式投射機)
42X 第四投射機(遠心式投射機)
42Y 第五投射機(遠心式投射機)
42Z 第六投射機(遠心式投射機)
70 直進移動機構
76 吊下部
84 制御部
94 噴射ノズル
110 ショットブラスト装置(ショット処理装置)
120 ショットブラスト装置(ショット処理装置)
A1、B1、C1、D1、E1、F1 上流側検出部
A2、B2、C2、D2、E2、F2 下流側検出部
CL1、CL2、CL3、CL4、CL5、CL6、CL7、CL8、CL9、CL10、CL11、CL12 投射方向中心線
W 被処理対象物
10 Shot blasting equipment (shot processing equipment)
16 First blast chamber (first processing chamber)
20 Intermediate door (partition door)
22 Second blast chamber (second processing chamber)
40 Flow rate adjustment device (projection material supply unit)
42A First projector (centrifugal projector)
42B Second projector (centrifugal projector)
42C Third projector (centrifugal projector)
42D Fourth projector (centrifugal projector)
42E Fifth projector (centrifugal projector)
42F 6th projector (centrifugal projector)
42G 7th projector (centrifugal projector)
42H Eighth projector (centrifugal projector)
42I 9th projector (centrifugal projector)
42J Tenth projector (centrifugal projector)
42K Eleventh projector (centrifugal projector)
42L 12th projector (centrifugal projector)
42M first projector (centrifugal projector)
42N Second projector (centrifugal projector)
42O 3rd projector (centrifugal projector)
42P 4th projector (centrifugal projector)
42Q Fifth projector (centrifugal projector)
42R 6th projector (centrifugal projector)
42S 7th projector (centrifugal projector)
42T 8th projector (centrifugal projector)
42U first projector (centrifugal projector)
42V second projector (centrifugal projector)
42W Third projector (centrifugal projector)
42X Fourth projector (centrifugal projector)
42Y Fifth projector (centrifugal projector)
42Z 6th projector (centrifugal projector)
70 linear movement mechanism 76 hanging part 84 control part 94 injection nozzle 110 shot blasting device (shot processing device)
120 Shot blasting equipment (shot processing equipment)
A1, B1, C1, D1, E1, F1 Upstream detector A2, B2, C2, D2, E2, F2 Downstream detector CL1, CL2, CL3, CL4, CL5, CL6, CL7, CL8, CL9, CL10, CL11, CL12 Projection direction center line W Object to be processed

Claims (7)

被処理対象物を吊り下げる吊下部と、
前記吊下部を被処理対象物の搬送ラインに沿って直進移動させる直進移動機構と、
羽根車の回転に伴って前記搬送ライン側に向けて投射材を投射すると共に、投射方向中心線が前記搬送ラインに対して、
平面視で搬送方向斜め前側又は平面視で搬送方向斜め後側、及び
平面視で搬送方向斜め左側又は平面視で搬送方向斜め右側、及び
側面視で斜め上側又は側面視で斜め下側から
それぞれ交わるように設置された複数の遠心式投射機と、
前記遠心式投射機によって投射材が投射される第一処理室と、
前記第一処理室よりも被処理対象物の搬送方向下流側に設けられ、圧縮空気とともに投射材を噴射する噴射ノズルが設置された第二処理室と、
を有するショット処理装置。
A hanging part for suspending the object to be treated;
A rectilinear movement mechanism that linearly moves the suspended portion along the conveyance line of the object to be processed;
While projecting the projection material toward the transport line side with the rotation of the impeller, the projection direction center line with respect to the transport line,
Crossing from the front side of the transport direction obliquely in plan view or obliquely rearward side of the transport direction in plan view, diagonally left side of the transport direction in plan view, diagonally right side of the transport direction in plan view, and diagonally upside or side view in side view A plurality of centrifugal projectors installed so that
A first processing chamber in which a projection material is projected by the centrifugal projector,
A second processing chamber provided on the downstream side in the transport direction of the object to be processed with respect to the first processing chamber and provided with an injection nozzle for injecting a projection material together with compressed air;
A shot processing apparatus.
前記遠心式投射機として、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第一投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第二投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第三投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第四投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第五投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第六投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第七投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第八投射機と、
を備える請求項1記載のショット処理装置。
As the centrifugal projector,
A first projector installed so that the projection direction center line intersects the transport line obliquely from the rear in the transport direction in plan view and obliquely from the left in the transport direction in plan view and from the obliquely lower side in side view;
A second projector that is installed so that the center line in the projection direction intersects the transport line obliquely rearward in the plan view and the obliquely upper side in the transport direction obliquely left side and side view in plan view;
A third projector installed so that the projection direction center line intersects the transport line obliquely from the back in the transport direction in plan view and obliquely from the right in the transport direction in plan view and from the obliquely lower side in side view;
A fourth projector installed so that the projection direction center line intersects the transport line obliquely from the rear in the transport direction in plan view and obliquely from the upper side in the transport direction obliquely right side and side view in plan view;
A fifth projector that is installed so that the center line in the projection direction intersects the transport line obliquely from the front side in the plan view and the obliquely lower side in the transport direction obliquely left side and side view in plan view;
A sixth projection machine installed so that the projection direction center line intersects the transport line obliquely from the front side in the plan view and the obliquely upper side in the transport direction obliquely left side and side view in plan view;
A seventh projector installed so that the projection direction center line intersects the transport line obliquely from the front side in the plan view and from the obliquely lower side in the transport direction obliquely right side and side view in plan view;
An eighth projector installed so that the projection direction center line intersects the transport line obliquely from the front side in the plan view and the obliquely upper side in the transport direction obliquely right side and side view in plan view;
The shot processing apparatus according to claim 1, further comprising:
前記遠心式投射機として、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ側面視で斜め下側から交わるようになおかつ平面視で搬送ラインに沿いかつ搬送ラインと重なる方向に設置された第一投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第二投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第三投射機と、
投射方向中心線が前記搬送ラインに対して側面視で搬送方向斜め前側かつ側面視で斜め下側から交わるようになおかつ平面視で搬送ラインに沿いかつ搬送ラインと重なる方向に設置された第四投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第五投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第六投射機と、
を備える請求項1記載のショット処理装置。
As the centrifugal projector,
The projection direction center line is installed in a direction so as to intersect with the conveyance line along the conveyance line in plan view so that the center line in the projection direction intersects with the conveyance line from the obliquely rear side in the conveyance direction in plan view and from the obliquely lower side in side view. A projector,
A second projector that is installed so that the center line in the projection direction intersects the transport line obliquely rearward in the plan view and the obliquely upper side in the transport direction obliquely left side and side view in plan view;
A third projector installed so that the projection direction center line intersects the transport line obliquely from the back in the transport direction in plan view and obliquely from the upper side in the transport direction diagonally right side and side view in plan view;
A fourth projection installed so that the center line in the projection direction intersects the transport line obliquely from the front side in the side view and from the obliquely lower side in the side view and along the transport line in the plan view and overlapping the transport line. Machine,
A fifth projection machine installed so that the center line in the projection direction intersects the transport line obliquely from the front side in the plan view and the obliquely upper side in the transport direction obliquely left side and side view in plan view;
A sixth projection machine installed so that the projection direction center line intersects the transport line obliquely from the front side in the plan view and from the obliquely upper side in the transport direction obliquely right side and side view in plan view;
The shot processing apparatus according to claim 1, further comprising:
前記遠心式投射機として、
投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側から交わるように設置された第一投射機と、
投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側から交わるように設置された第二投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第三投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第四投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第五投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め後側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第六投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め下側から交わるように設置された第七投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め下側から交わるように設置された第八投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側かつ側面視で斜め上側から交わるように設置された第九投射機と、
投射方向中心線が前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側かつ側面視で斜め上側から交わるように設置された第十投射機と、
投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め左側から交わるように設置された第十一投射機と、
投射方向中心線が水平でかつ前記搬送ラインに対して平面視で搬送方向斜め前側かつ平面視で搬送方向斜め右側から交わるように設置された第十二投射機と、
を備える請求項1記載ショット処理装置。
As the centrifugal projector,
A first projector installed so that the center line of the projection direction is horizontal and intersects from the diagonally rear side of the transport direction in plan view with respect to the transport line and from the diagonally left side of the transport direction in plan view;
A second projector that is installed so that the center line of the projection direction is horizontal and intersects from the diagonally rear side of the transport direction in plan view with respect to the transport line and from the diagonally right side of the transport direction in plan view;
A third projector installed so that the projection direction center line intersects the transport line obliquely from the rear in the transport direction in plan view and from the obliquely upper side in the transport direction obliquely left side and side view in plan view;
A fourth projector installed so that the projection direction center line intersects the transport line obliquely from the rear in the transport direction in plan view and obliquely from the upper side in the transport direction obliquely right side and side view in plan view;
A fifth projector installed so that the projection direction center line intersects the transport line obliquely from the back in the transport direction in plan view and obliquely from the left in the transport direction in plan view and from the obliquely lower side in side view;
A sixth projector installed so that the projection direction center line intersects the conveyance line with respect to the conveyance line obliquely in the conveyance direction obliquely from the rear side and in the planar view in the conveyance direction obliquely right side and obliquely from the side in side view;
A seventh projector installed so that the projection direction center line intersects the transport line obliquely from the front side in the plan view and the obliquely lower side in the transport direction obliquely left side and side view in plan view;
An eighth projector installed so that the projection direction center line intersects the transport line obliquely from the front side in the plan view and from the diagonally lower side in the transport direction obliquely right side and side view in plan view;
A ninth projector installed so that the projection direction center line intersects the transport line obliquely from the front side in the plan view and the diagonally upper side in the transport direction obliquely left side and side view in plan view;
A tenth projector installed such that the center line in the projection direction intersects the transport line obliquely from the front side in the plan view and the diagonally right side in the transport direction in plan view and from the diagonally upper side in the side view;
An eleventh projector installed so that the center line of the projection direction is horizontal and intersects from the oblique front side of the transport direction in plan view with respect to the transport line and from the diagonally left side of the transport direction in plan view;
A twelfth projector installed so that the center line in the projection direction is horizontal and intersects from the oblique front side of the transport direction in plan view with respect to the transport line and from the diagonally right side of the transport direction in plan view;
The shot processing apparatus according to claim 1, further comprising:
前記搬送ラインにおいて複数の前記遠心式投射機の各々によって投射材が投射される投射ゾーンが当該搬送ラインに沿って複数設定され、
複数の前記投射ゾーンに対してそれぞれ搬送方向上流側に設けられて被処理対象物の通過を検出する上流側検出部と、
複数の前記投射ゾーンに対してそれぞれ搬送方向下流側に設けられて被処理対象物の通過を検出する下流側検出部と、
前記遠心式投射機への投射材の供給用とされて前記遠心式投射機に対して投射材の供給及び供給停止が可能な投射材供給部と、
前記上流側検出部による検出結果及び前記下流側検出部による検出結果に基づいて、被処理対象物が前記投射ゾーンのいずれかの範囲内にあると判断した場合にのみ当該投射ゾーンに投射材を投射するように前記投射材供給部を制御する制御部と、
を有する請求項1〜請求項4のいずれか1項に記載のショット処理装置。
A plurality of projection zones along which the projection material is projected by each of the plurality of centrifugal projectors in the conveyance line are set along the conveyance line,
An upstream side detection unit that is provided on the upstream side in the transport direction with respect to the plurality of projection zones and detects the passage of the object to be processed;
A downstream side detection unit that is provided on the downstream side in the transport direction with respect to the plurality of projection zones and detects the passage of the object to be processed;
A projection material supply unit capable of supplying and stopping supply of the projection material to the centrifugal projector, which is used for supplying the projection material to the centrifugal projector.
Based on the detection result by the upstream side detection unit and the detection result by the downstream side detection unit, the projection material is applied to the projection zone only when it is determined that the object to be processed is in any range of the projection zone. A control unit for controlling the projection material supply unit to project,
The shot processing apparatus of any one of Claims 1-4 which has these.
閉止状態で前記第一処理室と前記第二処理室との間の流通路を遮断する開閉可能な仕切扉が設けられている、請求項記載のショット処理装置。 The shot processing apparatus according to claim 5 , further comprising an openable / closable partition door that blocks a flow path between the first processing chamber and the second processing chamber in a closed state. 前記第二処理室では、被処理対象物Wが底壁部に降ろされて接地面以外の部位の要仕上げ箇所にショットブラスト処理がなされ、その後、被処理対象物Wが吊り上げられて先の接地面の要仕上げ箇所にショットブラスト処理がなされる、請求項記載のショット処理装置。 In the second processing chamber, the object to be processed W is lowered to the bottom wall portion, and shot blasting processing is performed at a required finishing location other than the ground contact surface, and then the object to be processed W is lifted and the previous contact is made. The shot processing apparatus according to claim 6 , wherein the shot blasting process is performed at a required finishing position on the ground.
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