JP6290732B2 - Metal mesh fabric for screen printing and screen plate for screen printing - Google Patents

Description

  The present invention relates to a metal mesh fabric and a screen plate used for screen printing.

  In recent years, the use of electronic components in printing methods such as printed circuits, IC circuits, printing of electronic component boards for various display devices, solar cell electrode printing, etc., where screen printing has been used, has become increasingly fine in recent years. Is desired. That is, a technique for printing a high-definition pattern is required.

  Generally, a plate used for screen printing uses a mesh or a porous metal plate fixed to a plate frame in a state where a certain tension is applied, and a mesh opening or a metal plate with a photosensitive resin (emulsion) on the screen surface. By closing a predetermined portion of the hole, a region through which ink or paste passes, that is, a printing pattern is formed.

  In screen printing, the screen surface of the plate is placed in parallel with a certain distance (clearance) from the surface to be printed, and the screen is temporarily pressed against the surface to be printed while ink or paste is filled into the opening of the screen with a squeegee. This is performed by applying an ink or paste to the printing surface by immediately separating (separating the plate) based on the restoring force using the elastic deformation of the screen. This plate separation is an important factor that greatly affects the print quality, and a predetermined tension is applied to the screen for the purpose of ensuring appropriate plate separation.

  A screen printing plate pattern is formed by forming a photosensitive resin film having a thickness of, for example, about 1 to 100 μm on an image forming portion of a predetermined mesh fixed to a plate frame in a state where a certain tension is applied. A positive pattern image film or glass mask with a desired pattern is superimposed on the surface and irradiated with ultraviolet rays (exposure) to cure the negative pattern, and then the uncured resin film of the desired pattern portion is washed away (development). It is formed with.

  Synthetic fiber mesh and metal fiber mesh can be used for the screen, but to form high-definition printing, that is, to form a thin or fine pattern by screen printing, a thin wire with a thickness of 20 μm or less, which is difficult to produce with synthetic fiber, A metal fiber mesh using metal fibers that can be woven at high density is suitable. Stainless steel is widely used as the metal fiber.

  However, since metal fibers suitable for high-definition printing tend to diffusely reflect light compared to synthetic fibers, the diffused reflection of light when exposing the photosensitive agent will also cure the photosensitive agent in areas that do not need to be cured, The effect of a phenomenon called so-called halation may be greater. In other words, the edge of the positive pattern is hardened by the light of irregular reflection, and the resin film cannot be removed by the pattern by washing, resulting in inconveniences such as unstable line width and residual resin pieces. Will occur. When printing is performed using such a plate, there is a problem that the line width of the printed pattern becomes thinner than a predetermined value or the wire breaks. Therefore, particularly in high-definition pattern formation, irregular reflection of light. It is extremely important to suppress this.

  In order to suppress irregular reflection of light, there is a method in which the surface of a screen formed by knitting thin metal wires such as stainless steel is subjected to a black treatment such as black chrome plating or black nickel plating or a coloring treatment by electrodeposition coating. This is proposed in Patent Document 2. Patent Document 3 discloses that a black clad layer is formed on the surface of a metal mesh fabric made of austenitic stainless steel as a base material, so that the reflectance is lower than that of an ordinary soft metal mesh fabric for screen printing. It is described that the resolution of the photosensitive resin is improved by suppressing it. Patent Document 4 proposes a method of forming an antireflection film by reacting a metal mesh made of nickel or a material containing nickel with an organic acid.

Japanese Patent Laid-Open No. 9-123631 JP 2007-99853 A JP 2012-140735 A JP 2007-334058 A

  However, the above-described method of forming a plating or cladding layer on the surface of the screen or using the reaction with a nickel material to suppress the irregular reflection of light has the following problems.

  That is, a large-scale plating apparatus is required for the coloring treatment and surface treatment by the methods of Patent Literature 1 and Patent Literature 2, continuous production by roll-to-roll is difficult, and environmental problems in waste liquid treatment, etc. Yes. Further, the method of Patent Document 3 has a problem that the manufacturing process becomes complicated, for example, a fluorination treatment in which a fluorine-based gas is introduced into a heating furnace such as a muffle furnace is performed at a high temperature of about 300 ° C. for several hours. That is, in any of the methods, there is a problem such as a problem of stability of quality and an increase in manufacturing cost due to inferior productivity because a large facility is required or a processing process becomes complicated.

  Further, in the method of Patent Document 4, since the antireflection film is formed by nickel constituting the metal mesh and the organic acid salt derived from the acrylic polymer, the target metal mesh is limited to the one having nickel as a constituent component. There is a problem with. Further, a metal having a low nickel content such as austenitic stainless steel has a problem that the antireflection effect is not sufficient and a pretreatment such as nickel plating is required.

  Furthermore, Patent Document 1 and Patent Document 2 that perform coloring treatment by metal plating or electrodeposition coating on the surface of the substrate, and Patent Document 3 that forms a black clad layer on the surface of the metal mesh or antireflection by the metal mesh and organic acid In any of Patent Documents 4 that form a film, the metal mesh fabric colored in black is significantly inferior in visibility, for example, in a tensioning operation in which a mesh is tensioned and fixed to a frame in a plate making process, There is a difficulty in handling, such as the mesh being inadvertently bent due to difficulty in seeing.

  The present invention has been made to solve the above-described problems, and provides a novel technique relating to a metal mesh fabric for screen printing that can form a high-definition pattern.

  That is, the first invention has a structure in which warp yarns and weft yarns made of metal wires are woven so as to intersect with each other, and can suppress scattering of ultraviolet rays irradiated when forming a photosensitive resin film. An ultraviolet absorbing film comprising at least one or more types of ultraviolet absorbing metal compound particles and a binder, which is a mesh fabric and formed on the surfaces of warp and weft yarns constituting the metal mesh fabric, the ultraviolet ray The average thickness converted to only the metal compound particles of the absorptive film is 50 nm or more and 500 nm or less, and the reflectance of light with a wavelength of 375 nm becomes a substantially constant value by stacking a predetermined number or more of the screen printing metal mesh fabrics. In some cases, the metal mesh fabric for screen printing is characterized in that the reflectance of light having the wavelength of 375 nm is 6% or less. That.

  Further, a second invention is a metal mesh fabric for screen printing, characterized in that, in the first invention, the metal compound particles include at least a monovalent copper compound or AgI particles.

  Furthermore, a third invention is the first or second invention, wherein the metal wire has a wire diameter of 16 μm or less, and each 25.4 mm of the warp and weft in the metal mesh fabric for screen printing. Is a metal mesh fabric for screen printing, characterized in that the number thereof is 300 or more.

  Further, a fourth invention is a screen printing screen plate comprising the screen printing metal mesh fabric described in any one of the first to third inventions.

  Furthermore, a fifth invention comprises the metal mesh fabric for screen printing described in any one of the first to third inventions as an image forming screen in the fourth invention, and is made of a synthetic fiber. A screen printing screen plate, further comprising a woven structure as a support screen for supporting the image forming screen on a frame.

  Further, a sixth invention according to the fourth or fifth invention, further comprising a pattern which is a photosensitive resin film formed on the screen printing screen plate, and has a minimum pattern width or a minimum pattern. A screen printing plate having a pattern dot diameter of 30 μm or less.

  ADVANTAGE OF THE INVENTION According to this invention, the novel technique which concerns on the metal mesh fabric for screen printing which makes it possible to print a high-definition pattern can be provided.

It is a block diagram which shows the outline | summary of a structure of the metal mesh fabric for pattern printing which can suppress ultraviolet-ray scattering of this embodiment. It is a partial model figure of photosensitive resin hardening in the metal mesh fabric for pattern printing which can control ultraviolet ray scattering of this embodiment. It is a partial model figure of photosensitive resin hardening in the conventional metal mesh fabric. It is a graph which shows the ultraviolet absorption characteristic of a metal compound particle. It is a conceptual diagram of the apparatus which manufactures the metal mesh fabric for pattern printing of this embodiment which has the thin film 4 by the roll-to-roll system by the spray method, and can suppress ultraviolet-ray scattering. It is a conceptual diagram of the apparatus which manufactures the metal mesh fabric for pattern printing of this embodiment which has the thin film 4 by the roll-to-roll system by immersion method, and can suppress ultraviolet-ray scattering. It is a schematic diagram of an example of a combination version. It is a figure which shows the positive pattern of the glass mask used in the Example. 4 is a photograph of a pattern having a pattern width of 20 μm in Example 1. FIG. It is a photograph of the pattern whose width of the pattern in comparative example 1 is 20 micrometers.

  Hereinafter, one embodiment of the present invention will be described. The present embodiment relates to a metal mesh fabric for screen printing (hereinafter also simply referred to as “ultraviolet scattering suppression mesh”) capable of suppressing scattering of ultraviolet rays irradiated when forming a photosensitive resin film. FIG. 1 is a configuration diagram showing an outline of the configuration of the ultraviolet scattering suppression mesh 1 of the present embodiment. 1A is a plan view of the ultraviolet scattering suppression mesh 1, and FIG. 1B is a cross-sectional view of the ultraviolet scattering suppression mesh 1 at the position of the arrow A-A ′ in FIG.

  The ultraviolet scattering suppression mesh 1 of the present embodiment includes warp 2 made of a metal wire and weft 3 made of a metal wire, and is woven and molded so as to intersect each other (in FIG. The vertical yarn is shown as warp 2).

  An ultraviolet absorbing film 4 is formed on the surfaces of the warp 2 and the weft 3 constituting the ultraviolet scattering suppression mesh 1 of the present embodiment. The ultraviolet absorbing film 4 includes at least one or more kinds of metallic compound particles having ultraviolet absorbing property and a binder, and the ultraviolet absorbing film (hereinafter also simply referred to as “thin film”) 4 is converted into only metallic compound particles. The average thickness is preferably 50 nm or more and 500 nm or less.

  In the present specification, the thin film is formed on the surfaces of the warp yarn 2 and the weft yarn 3 means that the thin film 4 is formed on at least a part of the exposed portion of the metal mesh fabric as the base material. What is necessary is just a concept which does not require that the thin film 4 is formed to the part where the warp and the weft intersect.

  The ultraviolet scattering suppression mesh 1 of the present embodiment has a wavelength of 375 nm when the reflectance of light with a wavelength of 375 nm becomes a substantially constant value by stacking a certain number or more of the ultraviolet scattering suppression meshes 1 of the present embodiment. The light reflectance is preferably 6% or less. In other words, the reflectance of the light having a wavelength of 375 nm in a state where a plurality of the ultraviolet scattering suppression meshes 1 are stacked and the number of the layers that are irradiated with light is not less than the number of the reflection of the light having a wavelength of 375 nm. Is preferably 6% or less. In addition, in the ultraviolet scattering suppression mesh 1 of the present embodiment, the number of superimposed mesh fabrics in which the reflectance of light having a wavelength of 375 nm does not change varies depending on conditions such as the yarn diameter, the number of meshes, and the opening area (opening ratio). When the yarn diameter is 11 to 20 μm, the number of meshes is 290 to 730, and the aperture ratio is 39 to 63%, the reflectance is almost constant when the number of stacked sheets is three or more. And in this embodiment, it is preferable that the reflectance when it becomes substantially constant is 6% or less as described above. Here, the number of meshes means the number of wefts or warps per 25.4 mm length parallel to the warp or weft of the mesh fabric, and unless otherwise specified, means the fabric of the same number of meshes in the warp and warp. Since it is a numerical value determined for each of the weft and the weft, they may be different. The opening area refers to the area occupancy rate of the opening (the portion where no yarn is present) within each pitch of the warp and weft yarns constituting the mesh fabric when the mesh fabric is viewed in plan. This is a calculated value obtained from the diameter and the number of meshes.

  A process for forming a desired pattern on the screen printing screen plate (hereinafter also simply referred to as “screen plate”) for the ultraviolet scattering suppression mesh 1 of the present embodiment will be described. FIG. 2 is a model diagram showing a process of forming a screen plate according to the present embodiment on which a desired pattern is formed. FIG. 2A is a cross section of a plate when a screen plate is formed using the ultraviolet scattering suppression mesh 1 of the present embodiment. A photosensitive resin film is formed on the image forming portion of the mesh, and the surface thereof is formed. An outline of a method of transmitting ultraviolet rays when a negative type pattern is cured by overlaying a positive type image film (mask) having a desired pattern and exposing it to ultraviolet rays for exposure. FIG. 2B shows a pattern obtained by removing (developing) the photosensitive resin film in a desired pattern portion that has not been cured by washing or the like after the exposure processing of FIG. It is sectional drawing of the screen plate in which the conductive resin film 31) was formed.

  The photosensitive resin film is formed on the screen plate by coating and drying the photosensitive emulsion containing the photosensitive resin on the image forming part of the metal mesh fabric given a certain tension to form a photosensitive resin film with a predetermined thickness. The direct method is widely used. Furthermore, a direct method for forming a photosensitive resin film by transferring a film made of a photosensitive resin to a metal mesh fabric is also used taking advantage of its simplicity and characteristics. In any method, after forming a photosensitive resin film of a predetermined thickness, a negative pattern is cured by irradiating the surface with a positive pattern image film or a glass mask with a desired pattern, and then uncured. The resin film portion is removed by washing to form a desired pattern.

  In FIG. 2A, a layer (film) of the photosensitive resin 40 is formed on the ultraviolet scattering suppression mesh 1 constituting the screen plate by coating or the like, and a mask pattern corresponding to the screen plate pattern formed on the surface is further formed. A mask 20 having the same is placed. The mask 20 includes a negative pattern portion 22 which is an opening of the mask 20 corresponding to a portion where the photosensitive resin is cured, and a positive pattern portion 23 which does not transmit ultraviolet light corresponding to a portion where the photosensitive resin is removed. Have FIG. 2A shows a state in which ultraviolet rays 24 are irradiated from the mask 20 side as indicated by an arrow.

  In the state shown in FIG. 2A, the ultraviolet rays 24 that pass through the negative pattern portion 22 are transmitted to the inside of the resin curing portion, and the photosensitive resin is cured. On the other hand, in the part from which the resin is removed (the part corresponding to the opening 32 of the pattern formed by removing the resin in FIG. 2B), the positive pattern part 23 shields the ultraviolet rays, and the photosensitive resin is cured. Will remain.

  And since the thin film 4 which has ultraviolet absorptivity is formed in the surface of the screen yarn 21 (warp yarn 2 and weft 3) which comprises the ultraviolet-ray scattering suppression mesh 1 of this embodiment, compared with the conventional metal mesh fabric. The reflectance of ultraviolet rays, which are exposure light, is low. Thus, when the reflectance of ultraviolet rays is low, it will be reflected by the thread | yarn which comprises the metal mesh fabric 1, and it will be suppressed that ultraviolet rays are scattered around. The scattered light is shown as reflected light 25 in FIG. By suppressing the scattering of the ultraviolet rays, the light incident through the mask at a position close to the photosensitive resin in the portion where the ultraviolet rays are shielded by the positive pattern portion 23, that is, the photosensitive resin in a range not to be cured, is Is effectively suppressed from entering the resin side in the range where it is not cured. Thereby, the pattern by the photosensitive resin can be formed on the metal mesh fabric 1 with high accuracy as in the original mask pattern, and a high-definition screen printing screen can be provided.

  On the other hand, the screen plate made of a conventional metal mesh fabric in which the surface of the screen yarn 35 is not formed with a UV-absorbing thin film has a higher reflectance and higher definition than the UV scattering suppression mesh 1 of the present embodiment. The pattern cannot be formed. FIG. 3 shows that a layer of a photosensitive resin 40 is formed on a conventional metal mesh fabric 30 and a mask 20 is overlaid, and the resin is cured by irradiating ultraviolet light 24 to form a desired pattern by the photosensitive resin film 31. It is a figure which shows the process to form. FIG. 3 (a) shows a cross section of the mesh fabric in the state of being irradiated with ultraviolet light as in FIG. 2 (a), and FIG. 3 (b) shows an uncured resin as in FIG. 2 (b). 2 shows a cross section of a metal mesh fabric that has been cleaned to form a desired pattern.

  As shown in FIG. 3A, when the reflectance of the screen mesh is large, the ultraviolet light that is the reflected light 25 reaches the peripheral portion of the positive pattern portion 23, so that it is not necessary to cure the peripheral portion. 40 is also partially cured. For this reason, in the cleaning and removal in the next step, the resin in the range that should be originally removed is cured and is not removed by the work, and the peripheral portion remains. In this case, the region formed by removing the photosensitive resin and transmitting the screen printing ink and paste becomes narrower than the desired pattern width, and the disadvantage that it cannot be removed by washing occurs. In particular, as the pattern width for passing ink or paste and the dot diameter are smaller, the influence of the curing of the resin at the peripheral portion becomes larger, and the printing accuracy decreases. On the other hand, in this embodiment, since the reflectance of the mesh yarn is low, there is little irregular reflection of ultraviolet light to the peripheral portion that does not need to be cured, and the excessive curing is suppressed, so that the positive pattern A faithful pattern can be formed.

  Hereinafter, the configuration of the ultraviolet scattering suppression mesh 1 of the present embodiment and the operational effects of the ultraviolet scattering suppression mesh 1 of the present embodiment will be described in detail.

  In the ultraviolet scattering suppression mesh 1 of the present embodiment, ultraviolet light is absorbed when the photosensitive resin film is cured according to the mask pattern by the thin film 4 containing the metal compound particles having ultraviolet absorptivity and the binder. In addition, the reflectance of ultraviolet light is reduced, and irregular reflection to the photosensitive resin side that does not need to be cured can be effectively suppressed.

  Although it does not specifically limit as metal compound particle | grains which have ultraviolet absorptivity, What is necessary is just to use iodides, such as a monovalent copper compound and AgI, and metal oxides, such as Ti, Zn, Fe, Ce, Sn, and In.

As the monovalent copper compound, for example, chloride, acetic acid compound, sulfide, iodide, bromide, peroxide, oxide, hydroxide, cyanide, thiocyanate and the like are preferable, and in particular, CuCl, Cu (CH ₃ COO), CuI, CuBr, Cu ₂ S, Cu ₂ O, CuOH, CuCN, and CuSCN are preferred.

Further, as iodides, CuI, AgI, SbI ₃ , IrI ₄ , GeI ₂ , GeI ₄ , SnI ₂ , SnI ₄ , TlI, PtI ₂ , PtI ₄ , PdI ₂ , BiI ₃ , AuI, AuI ₃ , FeI ₂ , CoI ₂ , NiI ₂ , ZnI ₂ , HgI, InI _{3 and the} like are preferable, and as the metal oxide, TiO ₂ , ZnO, Fe ₂ O ₃ , Ce ₂ O ₃ , CeO ₂ , SnO, SnO ₂ , In ₂ O ₃ can be used.

FIG. 4 shows the ultraviolet absorption characteristics of a metal compound powder having ultraviolet absorptivity. The diazo resin type most widely used as a photosensitive resin for screen printing plates has a maximum absorption wavelength in the ultraviolet region of 375 nm. As can be seen from the ultraviolet absorption characteristics in FIG. 4, CuI, CuCl, CuO ₂ , Monovalent copper compounds such as CuBr and AgI are particularly preferable for suppressing irregular reflection because they are excellent in wide absorption characteristics up to ultraviolet rays on the long wavelength side called UVA. For reference, FIG. 4 also shows ultraviolet absorption characteristics when three conventional stainless steel meshes, on which a thin film having ultraviolet absorptivity is not formed, are superimposed.

  Here, in the ultraviolet scattering suppression mesh 1 of the present embodiment, the average thickness of the film (hereinafter referred to as a converted film thickness) calculated only with the metal compound contained in the thin film 4 is 50 nm or more and 500 nm or less. Preferably there is. When the converted film thickness is less than 50 nm, ultraviolet light cannot be sufficiently absorbed, and irregular reflection cannot be effectively suppressed. Further, even if the equivalent film thickness is greater than 500 nm, the effect of reducing the reflectivity is almost constant, so it is not necessary to make the thickness greater than 500 nm, and the entire thickness of the thin film 4 is increased and the opening of the screen mesh is narrowed. Therefore, when making a plate, there is an unfavorable influence, such as a resin residue when the uncured resin is washed to obtain a desired pattern, or a less amount of paste discharged during printing. Is preferred.

  The ratio of the metal compound particles in the thin film 4 formed on the surface of the warp yarn 2 and the weft yarn 3 constituting the ultraviolet scattering suppression mesh 1 and containing the binder and the metal compound particles having ultraviolet absorptivity is not particularly limited. Although it can set suitably, 10 to 80 mass% is preferable. If this ratio is less than 10% by mass, the average thickness of the thin film for obtaining an equivalent film thickness of 50 nm or more that sufficiently absorbs ultraviolet light may be larger than 3000 nm, and at this time, the opening of the screen mesh becomes narrower. For this reason, there is an unfavorable effect such as resin residue when the uncured resin is washed to obtain a desired pattern during plate making, or the amount of paste discharged during printing decreases. On the other hand, if it exceeds 80% by mass, the average thickness of the thin film may be less than 100 nm, and since the adhesive content to the screen mesh is weak due to the low binder content, peeling or the like may occur during printing. It is not preferable in terms.

  That is, in order to sufficiently suppress the reflection of ultraviolet light, reduce the influence on the opening of the screen mesh, and have sufficient adhesion as a binder, the converted film thickness is 50 nm to 500 nm and the average of the thin film 4 The thickness is preferably 100 nm or more and 3000 nm or less.

In addition, the converted film thickness and the average thickness of the thin film are expressed as follows: the mass ratio of the metal compound particles in the thin film is r, and the density of the metallized metal compound particles and other components contained in the thin film such as the binder component is m [g / cm ³ ], b [g / cm ³ ], the mass of the thin film W [g], and the surface area of the portion of the warp and weft where the thin film is formed is S [cm ² ]. The average thickness can be calculated by the following equation.
Equivalent film thickness: W × r × 10 ⁷ / (m × S) [nm]
Average thickness of thin film: W × (r × b + (1-r) × m) × 10 ⁷ / (S × b × m) [nm]

  In addition, the surface area S in the calculation of the converted film thickness and the average thickness of the thin film is the number of meshes, yarn diameter, warp and weft without taking into account the bending of the UV scattering suppression mesh and the overlap of the intersections of the warp and weft. A value calculated from the length.

  The size of the metal compound particles having ultraviolet absorptivity is not particularly limited, but is preferably fine particles having an average particle diameter of 500 nm or less. When the average particle diameter exceeds 500 nm, the strength of fixing the metal compound particles to the metal mesh fabric, which is the base material, becomes weak, and the metal compound particles easily peel off or fall off from the metal mesh fabric due to frictional force.

  The lower limit of the average particle diameter of the metal compound particles having ultraviolet absorptivity is not particularly limited, but is preferably 1 nm or more. If it is 1 nm or more, the ultraviolet ray shielding effect can be maintained more stably, and it is also preferable from the viewpoint of particle production, handling, and chemical stability. In addition, in this specification, an average particle diameter means a volume average particle diameter.

  The binder contained in the thin film 4 is not particularly limited as long as the metal compound particles having ultraviolet absorptivity are fixed to the surfaces of the warp 2 and the weft 3 constituting the metal mesh fabric, and the thin film 4 can be formed together with the metal compound particles. For example, acrylic resin, polyurethane resin, epoxy resin, silicone resin, phenol resin, alkyd resin, melamine urea resin, chlorinated rubber resin, vinyl chloride resin, vinyl acetate resin, fluororesin, cellulose resin, etc. are used. it can.

  The ultraviolet scattering suppression mesh 1 of the present embodiment has a converted film thickness of 50 nm or more and 500 nm or less, and the reflectance when the light having a wavelength of 375 nm is irradiated is substantially changed even when the ultraviolet scattering suppression mesh 1 is further stacked. The reflectance of 375 nm light is 6% or less in the state of being overlapped with the number of sheets that is not in the state. In the ultraviolet scattering suppression mesh 1 of the present embodiment, factors that affect the number of layers to be overlaid when the reflectance becomes almost constant and does not change include the thread diameter, the number of meshes, and the opening area (opening ratio). When the yarn diameter is 11 to 20 μm, the number of meshes is 290 to 730, and the aperture ratio is 39 to 63%, the reflectivity shows a constant value in a state where three or more sheets are stacked in any case. The reflectance in this specification refers to the reflectance in a state where three or more sheets are stacked unless otherwise specified.

  In the ultraviolet scattering suppression mesh 1 of the present embodiment, for example, the yarn diameter, the number of meshes, the opening area, the equivalent film thickness, the type of metal compound particles having ultraviolet absorptivity included in the thin film 4, and the like are adjusted. Thus, the reflectance can be set to 6% or less.

  In the case of soft stainless steel, which is most widely used as a metal mesh fabric for screen printing, the reflectance of ultraviolet light having a wavelength of 375 nm is 14.4% (when three sheets are superimposed). In such a metal mesh fabric, it is difficult to form a high-definition pattern according to the mask pattern due to irregular reflection (halation) of ultraviolet light to a photosensitive resin in a range adjacent to the resin to be cured that does not need to be cured. Therefore, it is not preferable.

  On the other hand, according to the ultraviolet-scattering suppression mesh 1 of this embodiment, the scattering of the ultraviolet light to the peripheral part at the time of exposure can be reduced more reliably.

  In the ultraviolet scattering suppression mesh 1, it is preferable that the reflectance of ultraviolet light having a wavelength of 375 nm in a state where a predetermined number (for example, three) of the mesh is 6% or less as compared with the prior art, This will be described more specifically.

  Photosensitive resins for forming a pattern on a screen plate using a mesh include a type using a diazo resin as a crosslinking agent, a type using polyvinyl alcohol (PVA) added with styrylpyridinium (SBQ), an acryloyl group, and acrylamide. A type using a group polymerization cross-linking reaction is used alone or in combination. Among these, the most widely used diazo resin type has a maximum absorption wavelength in the ultraviolet region of 375 nm, and a metal halide lamp or an ultrahigh pressure mercury lamp is generally used as an exposure light source. In addition, the SBQ type has a maximum absorption wavelength of 340 nm, and any of an ultra-high pressure mercury lamp, a high-pressure mercury lamp, and a metal halide can be used as an exposure light source.

  Here, as can be seen from FIG. 4 described above, the reflectance of ultraviolet rays at a wavelength of 340 nm which is the maximum absorption wavelength of the SBQ type is equal to or smaller than the reflectance of the maximum absorption wavelength of 375 nm of the diazo resin type. Therefore, by suppressing the reflectance at a wavelength of 375 nm, the reflectance can be suppressed when using not only the most widely used diazo resin type but also the SBQ type and various photosensitive resin types in combination thereof. Is possible.

  Then, the present inventor sets the reflectance of ultraviolet light having a wavelength of 375 nm in a state where the equivalent film thickness is 50 nm or more and 500 nm or less and a predetermined number (for example, three in this embodiment) or more of the ultraviolet scattering suppression meshes 1 are stacked. It was found that by setting the ratio to not more than%, it is possible to more reliably reduce the scattering of ultraviolet light to the peripheral edge during exposure. If the reflectivity of the UV scattering suppression mesh 1 is larger than 6%, the resin film at the peripheral portion is cured by the ultraviolet light reaching the peripheral portion of the negative image film, and is cured by cleaning and removal in the next step. A part of the peripheral edge remains, and an accurate pattern cannot be formed on the screen plate, so 6% or less is preferable.

  In the ultraviolet scattering suppression mesh 1 of the present embodiment, the configuration of the warp yarn 2 and the weft yarn 3 and the weaving mode are not particularly limited as long as the warp yarn 2 and the weft yarn 3 cross each other to form a formed body. For example, the ultraviolet scattering suppression mesh 1 can be obtained by forming the thin film 4 on a metal mesh fabric manufactured by a known method.

  That is, the woven structure in the ultraviolet scattering suppression mesh 1 is not particularly limited, and a general structure called plain weave, a weave structure such as twill weave or satin weave, a form of an intertwined portion of a thread, Metal yarns having different thicknesses may be woven or combined as appropriate. For example, by interweaving fibers with different thicknesses, the opening area is not dropped much, and the bending of the fibers increases at the entangled part of the metal thread, so printing with thicker ink and paste can be printed. It can also be a thing.

  On the other hand, in this embodiment, since it can be set as the structure by which the thin film 4 is formed in the surface of the warp 2 and the weft 3 irrespective of the material which comprises a metal mesh fabric, the conventional metal for screen printing As compared with the mesh fabric, it is possible to print more stable and fine lines.

  Specifically, the reflectance of the ultraviolet light with a wavelength of 375 nm in a state where the equivalent film thickness is 50 nm or more and 500 nm or less and a predetermined number of sheets (for example, 3 sheets in this embodiment) or more are stacked is 6% or less. When the ultraviolet scattering suppression mesh 1 is used for forming a high-definition pattern with a minimum line width or dot diameter of 30 μm or less, the wire diameters of the metal wires related to the warp yarn 2 and the weft yarn 3 are 16 μm or less. The number of meshes is preferably 300 or more. More preferably, the reflectance of ultraviolet light with a wavelength of 375 nm in a state where a predetermined number (for example, three in the present embodiment) or more are stacked is 4% or less, and even more preferably 3% or less. Here, the number of meshes means the number of warp or weft per 25.4 mm (1 inch) length parallel to the warp or weft of the mesh fabric.

  Thereby, compared with the reflectance when the thin film 4 is not formed, the ultraviolet reflectance can be reduced by about 8 to 12 points depending on the value of the converted film thickness, etc., and the minimum line width or dot Even in the case of a high-thin line pattern with a diameter of 30 μm or less, high-thin line printing can be performed more stably in which the phenomenon of disconnection and creaking is suppressed more effectively.

  Hereinafter, by providing the above-described configuration, even in the case of a high-thin line pattern in which the minimum line width or the dot diameter is 30 μm or less, the phenomenon of disconnection and galling is more effectively suppressed, and high-thin line printing is more effective. The reason why this is possible stably will be described in detail.

  The influence of the reflectance on the hardening of the peripheral part of the resin film is the yarn diameter of the screen mesh used, the number of wefts or warps (mesh number) per 25.4 mm length parallel to the warp or weft of the mesh fabric, the resin The degree varies depending on the thickness of the film, the integrated exposure amount, and the like.

  In addition, the influence of the curing of the peripheral portion that does not need to be cured by reflection of ultraviolet light varies depending on the degree of high definition of the printing pattern at the time of screen printing, the physical properties of the ink and paste, and the printing conditions. In the case of a high-definition pattern in which the minimum line width or dot diameter of the print pattern (that is, the size of the portion where the ink or paste passes through the screen plate) is 30 μm or less, the influence of the reflectance is exerted. It becomes even more prominent.

  The influence of ultraviolet light reflection on the printed pattern is not only that the line width is uniformly narrowed, but also the spread of ink and paste in the area where the mesh exists and particularly in the area corresponding to the intersection of the mesh. As a result, the pattern edge portion called “gizari” becomes a saw-toothed shape, becomes blurred, or breaks. These phenomena become more prominent as the pattern width becomes narrower.

  Here, it is said that the minimum pattern line width and pattern dot diameter that can be generally handled by screen printing at present is about 80 μm. The selection and design of screen mesh and emulsion, and further paste characteristics corresponding to the substrate are devised. For this reason, printing to about 40 μm is becoming possible.

  When printing a high-definition pattern having a minimum line width or dot diameter of 30 μm or less, the diameter of the wire used is less than the pattern width, preferably less than 2/3 times the pattern width, more preferably 1/2. Is less than double. However, since the strength of the wire becomes weaker as the wire diameter becomes smaller, it is preferable to increase the number of meshes in order to have strength that enables screen printing as a mesh fabric.

  The ink or paste forming the pattern is transferred to the substrate through the opening of the mesh fabric. Since the opening area calculated from the number of meshes and the thread diameter is inversely proportional to the number of meshes, increasing the number of meshes to maintain the strength reduces the opening area and also reduces the amount of paste permeation. It becomes a trade-off relationship that it is easy to cause phenomena such as squeezing.

  A soft stainless steel is widely used as a wire of a metal mesh fabric used for forming a high-definition pattern. Furthermore, high-definition stainless steel with a high elastic modulus compared to general soft stainless steel and mesh woven with tungsten as a wire can be used to keep the rate of increase in the number of meshes low even if the wire diameter is reduced. It is more suitable for forming a pattern. As a screen used for forming a high-definition pattern having a minimum line width or dot diameter of 30 μm or less, it is preferable to use a fine wire material of 16 μm or less and a woven fabric having a mesh number of 300 or more.

  Furthermore, when forming a higher definition pattern of 20 μm or less, the wire material is 13 μm or less and the number of meshes is 400 or more, and when forming an ultrahigh definition pattern of 15 μm or less, a wire material having a wire diameter of 11 μm or less is 500 mesh or more. A mesh fabric with a high mesh number is preferred. Ordinary soft stainless steel can be used, but if high-strength stainless steel or tungsten with high elastic modulus is used, the number of meshes is not significantly increased, that is, the aperture ratio is maintained and the amount of ink and paste discharged is high. It is possible to obtain a mesh fabric for screen printing that can be repeatedly printed with high dimensional accuracy, which is further excellent in durability, after obtaining resolution.

A material capable of weaving a wire having an extremely thin diameter of 16 μm or less, particularly 13 μm or 11 μm, with a high mesh number is extremely limited. In this respect, high strength stainless steel or tungsten having a Young's modulus of 2500 N / mm ² or more is more suitable. It can be said that it is a material. In the ultraviolet scattering suppression mesh 1 of the present embodiment, the type of material (metal wire) constituting the metal mesh fabric is not limited, and the thin film 4 containing metal compound particles and a binder is formed on the surfaces of the warp 2 and the weft 3. Thus, it can be obtained as a metal mesh fabric for screen printing in which scattering of ultraviolet rays is suppressed. That is, with the technique according to the present embodiment, the reflectivity of ultraviolet rays is suppressed, and it is possible to form an ultra-high-definition pattern having a minimum line width or dot diameter of 30 μm or less, or 20 μm or 15 μm.

(Method for manufacturing ultraviolet scattering suppression mesh 1)
Then, an example of the manufacturing method of the ultraviolet-ray scattering suppression mesh 1 of this embodiment is demonstrated.

  The thin film 4 composed of the metal compound particles and the binder according to this embodiment is obtained by, for example, applying and drying a solution containing the metal compound particles and the binder to a metal mesh fabric obtained by warp and weft yarns. Can be formed. The metal compound particles and the binder become non-volatile components in this solution (hereinafter referred to as a thin film solution).

  The ratio of the non-volatile component to the entire thin-film solution when the metal compound particles and the binder as the non-volatile component are dispersed or dissolved in the solvent as the volatile component in the thin-film solution is not particularly limited. It can be appropriately changed according to the application method. Moreover, the case where the additive and pigment which are mentioned later are included can also be suitably changed similarly. Furthermore, the mixing method of each component in this embodiment is not specifically limited, It can carry out by a well-known method.

  That is, the solvent contained in the thin film solution can be appropriately selected according to the method of use, and is not particularly limited. Examples of the solvent include water, methanol, ethanol, di-n-propyl ether, n-pentene, dibutyl ether, n-hexane, diethyl ether, n-heptane, diisobutyl ketone, methylcyclohexane, diisopropyl ketone, isobutyl chloride, cyclohexane, Ethyl amyl ketone, isobutyl acetate, bendonitrile, isopropyl acetate, methyl isobutyl ketone, amyl acetate, butyl acetate, cellosolve, diethyl carbonate, diethyl ketone, ethylbenzene, xylene, butyl carbitol, toluene, ethyl acetate, diacetone alcohol, Benzene, chloroform, methyl ethyl ketone, styrene, ethyl carbitol, methyl acetate, anone, anisole, cellosolve, diethylacetamide, diethyl Rubonate, dioxane, acetone, methyl isobutyl carbinol, nitrobenzene, acrylonitrile, diethylformamide, dimethylacetamide, butanol, cyclohexanol, acetonitrile, propyl alcohol, benzyl alcohol, butylene carbonate, dimethylformamide, ethylene carbonate, methylformamide or these Mixtures such as various thinners can be used.

  Here, a dispersant may be used in order to enhance the dispersion stability of the thin film solution, and as the dispersant, for example, a surfactant or a polymer dispersant may be used.

  Specifically, anionic surfactants, cationic surfactants, nonionic surfactants and amphoteric surfactants can be used as the surfactant. The anionic surfactant may have a carboxylic acid, sulfonic acid, or phosphoric acid structure as a hydrophilic group. Moreover, as a carboxylic acid type | system | group, it can be set as the fatty acid salt and cholate which are the main components of soap, for example. Examples of the sulfonic acid series include sodium linear alkylbenzene sulfonate and sodium lauryl sulfate which are frequently used in synthetic detergents. More specifically, fatty acid soda soap, potassium oleate soap, carboxylate such as alkyl ether carboxylate, sodium lauryl sulfate, higher alcohol sodium sulfate, lauryl sulfate triethanolamine, polyoxyethylene lauryl ether sodium sulfate, polyoxyethylene Sulfates such as sodium oxyethylene alkyl ether sodium sulfate, sodium dodecylbenzene sulfonate, sodium alkyl naphthalene sulfonate, sodium alkyl diphenyl ether disulfonate, sodium alkane sulfonate, sodium salt of aromatic sulfonic acid formalin condensate, Examples thereof include potassium alkyl phosphate, sodium hexametaphosphate, dialkyl sulfosuccinic acid and the like. These may be used alone or in combination.

  Cationic surfactants include tetramethylammonium chloride, tetramethylammonium hydroxide, tetrabutylammonium chloride, dodecyldimethylbenzylammonium chloride, alkyltrimethylammonium chloride, octyltrimethylammonium chloride, stearyltrimethylammonium chloride, alkyltrimethylammonium bromide. Quaternary ammonium circles such as hexadecyltrimethylammonium bromide, benzyltrimethylammonium chloride, and benzalkonium chloride. Further, alkylamine salt types such as monomethylamine hydrochloride, dimethylamine hydrochloride and trimethylamine hydrochloride, and types having a pyridine ring such as butylpyridinium chloride and dodecylpyridinium chloride may be used alone or in combination.

  Nonionic surfactants include alkylphenol ethylene oxide adduct and higher alcohol ethylene oxide adduct, polyoxyethylene fatty acid ester, fatty acid ethylene oxide adduct and polyethylene glycol fatty acid ester, higher alkylamine ethylene oxide adduct and fatty acid amide ethylene oxide adduct, Polyoxyethylene alkylamines and polyoxyethylene fatty acid amides, polypropylene glycol ethylene oxide adducts, nonionic surfactants glycerin and pentaerythritol fatty acid esters, sorbitol and sorbitan fatty acid esters, sucrose fatty acid esters, alkylpolyglycoside fatty acids, alkanols Examples include amides. These may be used alone or in combination.

  Amphoteric surfactants include alkylbetaine types such as lauryldimethylaminoacetic acid betaine and dodecylaminomethyldimethylsulfopropylbetaine, fatty acid amidepropylbetaine types such as cocamidopropyl betaine, amino acid types such as sodium lauroylglutamate, and lauryl. An amine oxide type such as dimethylamine N-oxide may be used.

  Furthermore, as the polymeric dispersant, polyurethane prepolymer, styrene / polycarboxylic acid copolymer, lignin sulfonate, carboxymethyl cellulose, acrylate, polystyrene sulfonate, acrylamide, polyvinyl pyrrolidone, casein, gelatin, As the oligomer and prepolymer, unsaturated polyester, unsaturated acrylic, epoxy acrylate, urethane acrylate, polyester acrylate, polyether acrylate, polybutadiene acrylate, silicone acrylate, maleimide, polyene / polythiol, alkoxy oligomer, and the like can be used. .

  In addition to the structure described above, the thin film solution of the present embodiment may further contain additives, functional agents, and the like as necessary. Additives and functional agents include thickeners, viscosity modifiers, stabilizers, drying modifiers, plasticizers, desiccants, curing agents, anti-skinning agents, leveling agents, anti-sagging agents, antifungal agents, antibacterial agents Agents, heat ray absorbers, lubricants, catalysts, antireflection materials, organic ultraviolet absorbers, and the like, and these may be used in appropriate mixture.

  In the present embodiment, the thin film solution is a known method such as a spray method, a dipping method, a roll coater method, a bar coater method, a spin coat method, a gravure printing method, an offset printing method, a screen printing method, an ink jet printing method, a brush. What is necessary is just to apply | coat to a metal mesh fabric by methods, such as a coating method. Thereafter, the warp yarn 2 and the weft yarn 3 constituting the ultraviolet scattering suppression mesh 1 by removing the solvent by heating drying, drying under reduced pressure, irradiation with infrared rays, far infrared rays, ultraviolet rays, electron beams, γ rays, or the like, or an appropriate combination thereof. The thin film 4 can be formed on the surface.

  In screen printing, a pattern is formed by the paste passing through an opening of a mesh fabric corresponding to a printing pattern and transferred to a substrate. Here, when the mesh fabric is viewed in plan, the area occupancy ratio of the openings (portions where no yarn is present) within each pitch of the warp and weft constituting the mesh is called the opening area, which is an important characteristic of the mesh fabric. One of the values.

  As a method for applying the thin film solution, a spray method is particularly suitable as a method for uniformly forming the thin film 4 on the surface of the warp 2 and the weft 3 without narrowing the opening area of the ultraviolet scattering suppression mesh 1 as much as possible. In the spray method, the thin film solution is sprayed and applied to the metal mesh fabric from the spray nozzle, so that the thin film solution does not remain in the openings of the metal mesh fabric. A uniform thin film 4 can be formed. The spray coating by spraying may be performed simultaneously from both the front and back surfaces of the metal mesh fabric, or after the front surface spray coating, the back surface spray coating is performed and then dried to remove the volatile components to form the thin film 4. Good. Alternatively, after spraying and drying on the front surface, spraying and drying may be performed on the back surface. Further, the thin film 4 may be formed by repeating the spray coating / drying process as described above a plurality of times.

  Even in the case of the dipping method, it is possible to form a uniform thin film 4 similar to the spray method by dipping the metal mesh fabric in the thin film solution and taking out the air after performing the air blow or the like. In the dipping method, the thin film 4 may be formed by repeating the coating and drying steps a plurality of times.

Thus, the thin film 4 which has ultraviolet absorptivity can be formed on the surface of the warp 2 and the weft 3 constituting the ultraviolet scattering suppression mesh 1 by a simple method of applying and drying the thin film solution to the metal mesh fabric. .
Moreover, the thin film solution may be applied to and dried on a sheet-like metal mesh fabric cut into a sheet shape, or may be continuously applied and dried by a roll-to-roll method.

  Here, the roll-to-roll method continuously unwinds a metal mesh fabric wound in a roll shape, passes through a coating and drying process, and then continuously obtains the obtained product (ultraviolet scattering suppression mesh of this embodiment). It is intended to be wound around. The continuous production enables stable production at low cost and is suitable for mass production. In particular, the spray method or the application method combining the dipping method and the air blow is suitable for forming the thin film 4 having a uniform thickness on the entire surface of the fabric without blocking the opening of the metal mesh fabric. By using the coating / drying treatment in the system, it is possible to obtain a high-quality, low-cost, low-reflectance ultraviolet scattering mesh 1.

  FIG. 5 shows an example of a conceptual diagram of an apparatus for manufacturing an ultraviolet scattering suppression mesh 1 in which a thin film 4 having ultraviolet absorptivity is formed by a roll-to-roll method using a spray method. The metal mesh fabric 52 unwound from the unwinding roll 51 is conveyed to the coating unit 54 through the guide roller 53. The thin film solution is supplied from the thin film solution tank 59 to the spray nozzle 55 in the coating unit 54 via the liquid feed pump 58, and the thin film solution is continuously applied from the spray nozzle 55 to the conveyed metal mesh fabric 52. Is done. The number and arrangement method of the spray nozzles 55 may be appropriately determined according to the size of the metal mesh fabric 52 and the number of meshes. The metal mesh fabric coated with the thin film solution removes volatile components in the drying furnace 56 and is dried to form the thin film 4 on the surfaces of the warp and the weft, and is continuously wound by the winding roll 57. There is no particular limitation on the drying method of the drying furnace 56, and volatile components are removed and dried by heating drying with an electric heater or hot air, vacuum drying, irradiation with infrared rays, far infrared rays, ultraviolet rays, electron beams, γ rays, or a combination thereof. I can do it.

  FIG. 6 shows an example of a conceptual diagram of an apparatus for manufacturing an ultraviolet scattering suppression mesh 1 in which a thin film 4 having ultraviolet absorptivity is formed by combining an immersion method and air blow. The metal mesh fabric 62 unwound from the unwinding roll 61 passes through the immersion tank 64 containing the thin film solution through the guide roller 63, and then from the air compressor 70 by the air nozzle 67 in the spraying section 66. The supplied air is blown onto the metal mesh fabric 62, and the excessively adhering solution is continuously removed. Here, if necessary, after passing through the immersion tank 64, the excessively adhered solution may be removed by the nip roller 65 and then introduced into the spray unit 66. Alternatively, the excessively adhered solution may be removed with a squeeze blade instead of a nip roller. The material and arrangement of the nip roller and squeegee blade may be selected so as not to damage or damage the metal mesh fabric. Here, the number and arrangement method of the air nozzles 67 and the drying process are the same as in the case of using the spray nozzle described above. The metal mesh fabric to which the solution is applied is stripped of volatile components in a drying furnace 68 and dried to form the thin film 4 and is continuously wound by a winding roll 69. There is no particular limitation on the drying method of the drying furnace 68, and volatile components are removed and dried by heating drying with an electric heater or hot air, drying under reduced pressure, irradiation with infrared rays, far infrared rays, ultraviolet rays, electron beams, γ rays, or a combination thereof. It is the same as in the spray method that it should be possible.

  When the thin film 4 having ultraviolet absorptivity is formed on the metal mesh fabric by the roll-to-roll method to form the ultraviolet scattering suppression mesh 1, the resulting ultraviolet scattering suppression mesh 1 does not cause curl or non-uniform thin film thickness. Thus, a mechanism for applying tension in the width direction of the metal mesh fabric between the unwinding roll and the winding roll, a mechanism for making the tension in the winding direction uniform, and the like may be appropriately introduced. Also, before passing through the tank 64 containing the thin film solution by the spraying method or the dipping method, the metal mesh fabric is subjected to a cleaning treatment or a pretreatment such as a blast treatment. The adhesion of the thin film 4 to the warp and weft may be improved.

  The ultraviolet scattering suppression mesh 1 of this embodiment can be used in a screen printing screen plate.

  As an example, a combination screen plate for screen printing using the ultraviolet scattering suppression mesh 1 of the present embodiment will be described.

  Plates used for screen printing are made by applying tension to a synthetic fiber mesh or metal fiber mesh and bonding and fixing to a resin or metal frame. A plurality of materials composed of a screen plate, a synthetic fiber mesh bonded to the frame, and a metal mesh that is formed at the center of the plate and is an image forming unit that is actually used for image formation; "Combination screen version" is used. The synthetic fiber screen in the combination screen plate is generally called a support screen. A schematic diagram of an example combination screen plate 100 is shown in FIG.

  The combination screen plate 100 of FIG. 7 includes an image forming screen 102 and a support screen 103 fixed to a frame 101. The frame 101 is a holding frame that holds the screen plate. The image forming screen 102 is a portion of the combination screen plate 100 where a pattern for actually forming an image is formed. In the present embodiment, the image forming screen 102 is the ultraviolet scattering suppression mesh 1. The support screen 103 is a screen around the image forming screen 102 that is fixed to the frame 101 and supports the image forming screen 102, and is a screen formed of a material such as synthetic fiber as described above. .

  In order to form high-definition printing, that is, to form a fine or fine pattern by screen printing, a metal fiber mesh capable of weaving a thin wire having a thickness of 20 μm or less, which is difficult to produce with synthetic fibers, at high density is suitable. On the other hand, such a metal fiber mesh has a high manufacturing cost, and its use as a full-faced printing plate is disadvantageous in terms of cost. Therefore, it is used as a combination screen plate using a metal mesh fabric for a part used for image formation. Often.

  In the combination screen plate 100, the support screen 103 bears the elongation due to the clearance during printing. Therefore, the support screen 103 has a woven structure made of nylon or polyester which is a material having high elasticity, that is, low Young's modulus. As a material having a high Young's modulus, a woven structure made of metal fibers, a metal mask, or the like is generally used in the image forming unit.

(How to create a combination screen version)
Next, a typical manufacturing method of the combination screen plate 100 using the ultraviolet scattering suppression mesh 1 in this embodiment will be described below.

  In the first manufacturing method, the support screen 103 is stretched on the frame 101 with a high tension in consideration of a decrease in tension after bonding, and then an image forming screen 102 having a predetermined size (in this embodiment, ultraviolet scattering). The restraining mesh 1) is bonded to a predetermined position of the support screen 103, and then the portion of the support screen 103 corresponding to the image forming screen 102 is cut and removed. Many conventional combination screen plates are Created this way.

  In addition, as a second production method, a screen plate made of a single synthetic fiber screen called a full-length plate is used using an integrated screen in which the image forming screen 102 is bonded to a support screen 103 in which the center portion has been pulled out in advance. The combination screen plate 100 can also be manufactured by the same method.

  Further, as a third manufacturing method, the support screen 103 is put in a temporary tension state (first step) where light tension is applied on a tension machine, and the image forming screen 102 having a predetermined size is used as the support screen. After bonding to a predetermined position 103, the support screen on the image forming screen is cut and removed. Furthermore, a predetermined tension is applied to the tensioning machine (second step), and a method of applying tension in two steps, in which the support screen 103 is bonded to the frame 101, or a fourth production method is described. There is a method in which both the forming screen 102 and the forming screen 102 are bonded in a state where substantially the same predetermined tension is applied, and then unnecessary portions are cut and removed.

In any case, the present invention is not limited to the above-described production method, and any jig, equipment, or method suitable for producing a combination screen plate may be used. Polyester and nylon are widely used as the support screen 103, but a high elastic modulus and high strength metal material such as high strength stainless steel or tungsten having a Young's modulus of 2500 N / mm ² or more as the image forming screen 102. In the case of using a synthetic fiber having a higher elastic modulus and strength than that of polyester or nylon, the support screen 103 can be printed with even higher durability and higher positional accuracy.

  Examples of high elastic modulus and high strength synthetic fibers include aramid, polyarylate, ultrahigh molecular weight polyethylene, polyparaphenylene benzobisoxazole (PBO), polyparaphenylene benzobisthiazole (PBT), and polyparaphenylene benzobisimidazole. (PBI), carbon fibers, other liquid crystal polymers, and two or more kinds of materials mainly composed of the above materials, for example, core-sheath type composite fibers.

  In the production of the combination screen plate 100 by combining such a high elastic modulus and high strength synthetic fiber as the support screen 103 and a high strength stainless steel or tungsten metal mesh as the image forming screen 102, The tension distribution in the surface of the image forming screen 102 is made uniform by using the integrated screen in which the image forming screen 102 is bonded to the support screen 103 in which the image forming screen is pulled out. It is easy to use and is particularly suitable for producing a highly durable plate with high positional accuracy.

(About the method of forming a pattern on the screen plate with photosensitive resin)
A method of forming a pattern with a photosensitive resin film on a mesh fabric (screen mesh) stretched on a frame is a method of directly applying a photosensitive solution to form a photosensitive resin film (direct method), which is previously applied on a plastic film. A method of transferring the formed photosensitive resin film onto the screen (direct method), baking and developing the photosensitive resin coated on the plastic film, and transferring the pattern formed on the film onto the screen There is a method (indirect method) to do. In this embodiment, a glass mask or film having a positive pattern is adhered to the photosensitive resin film formed on the ultraviolet scattering suppression mesh 1 and cured by ultraviolet irradiation to form the pattern. The interim method is preferred.

  There are methods such as bucket coating, spinner coating, and flow coater as methods for applying the photosensitive solution in the direct method, but the bucket method is most commonly used. In the bucket method, the doctor part of the bucket containing the photosensitive solution is pressed against the screen mesh held vertically, and a certain amount of photosensitive solution is applied onto the screen while moving the bucket from the bottom to the top while making contact with the screen. dry. By repeating this coating and drying process, a photosensitive resin film having a predetermined thickness is formed.

  The thickness of the photosensitive resin film is appropriately set depending on the required thickness of the printed matter. However, when a high-definition pattern having a minimum line width or a dot diameter of 30 μm or less is formed on the screen plate according to this embodiment, the photosensitive resin film is photosensitive. The thickness of the conductive resin film is preferably as thin as 30 μm or less. In particular, the reflectance of the screen mesh has a larger influence on pattern formation as the thickness of the photosensitive resin film is smaller. Therefore, using the ultraviolet scattering suppression mesh of the present embodiment, the thickness of the photosensitive resin film is 20 μm or less, The thickness is preferably 15 μm or less, more preferably 10 μm or less. With such a thickness, a pattern with extremely excellent resolution can be formed. However, when the thickness of the photosensitive resin film is less than 5 μm, particularly less than 3 μm, the intersection of the mesh remains as a trace of the print pattern, resulting in uneven thickness of the print pattern, or cracking of the photosensitive resin film during repeated printing. Therefore, the thickness is preferably 3 μm or more, and more preferably 5 μm or more.

  Furthermore, using the ultraviolet scattering suppression mesh of the present embodiment, the thickness of the photosensitive resin film is controlled to 20 μm or less and the like as described above, and the surface smoothness of the formed photosensitive resin film is high-definition printing. It is preferable to be controlled in order to achieve more stably. Specifically, the arithmetic average roughness Ra is preferably 1 μm or less as the roughness of the photosensitive resin film surface, more preferably 0.5 μm or less, and even more preferably 0.3 μm or less. In particular, in order to achieve printing of a very high-definition pattern of 15 μm or less, the arithmetic average roughness Ra of the photosensitive resin film surface is preferably 0.3 μm or less.

  The screen mesh on which the photosensitive resin film is formed is set in an exposure machine, and a glass or film mask on which a positive pattern is formed is adhered using a pressure bonding method or a vacuum method and cured by ultraviolet irradiation (exposure). The portion of the photosensitive film that was not hit is dissolved and removed (developed) with a developer to form a pattern.

  The photosensitive resin used as the base material of the photosensitive resin film is a type using a diazo resin as a crosslinking agent, a type using polyvinyl alcohol (PVA) added with styrylpyridinium (SBQ), and a polymerization crosslinking reaction of acryloyl group and acrylamide group. The type using is used alone or in combination. Among these, the most widely used diazo resin type has a maximum absorption wavelength in the ultraviolet region of 375 nm, and a metal halide lamp or an ultrahigh pressure mercury lamp is generally used as an exposure light source. The SBQ type has a maximum absorption wavelength of 340 nm, and any type of ultra-high pressure mercury lamp, high pressure mercury lamp, and metal halide can be used.

  In order to form a high-definition pattern, it is important to suppress irregular reflection of the maximum absorption wavelength, and it is desirable to irradiate light for exposure at an angle of 90 degrees with respect to the photosensitive resin film. It is extremely effective to reduce the reflectance.

  The effects of the metal mesh fabric 1 and the screen plate of the present embodiment described above will be described.

  According to this embodiment, for example, a thin film containing metal compound particles and a binder can be formed on the surfaces of warp and weft yarns by applying a solution containing metal compound particles and a binder to a metal mesh fabric and drying. The thin film can be formed by a simple process such as coating and drying, and a thin film can be formed according to the purpose by appropriately combining the type and composition of metal compound particles and binder, regardless of the material of the metal mesh. . When the metal compound contained in the thin film is a monovalent copper compound or iodide such as CuI or AgI, it has a high absorption rate for ultraviolet light on the long wavelength side. Since the metal mesh fabric can be made into a metal mesh fabric, and the color of the metal mesh fabric can be made, for example, gray, the handleability is superior to the mesh obtained by conventional black plating or black electrodeposition coating.

  In addition, the ultraviolet scattering suppression mesh of the present embodiment can be manufactured by forming a thin film by continuously drying a solution after applying the solution by, for example, a roll-to-roll method using a spray method or a dipping method. An excellent low-cost and stable quality metal mesh fabric for screen printing can be obtained.

  Furthermore, in this embodiment, since the average value of the equivalent film thickness of the metal compound particles having ultraviolet absorptivity is 50 nm or more and 500 nm or less is formed on the surface of the warp and weft constituting the ultraviolet scattering suppression mesh, In a state where a predetermined number (for example, three in this embodiment) of metal mesh fabrics are stacked, the reflectance of light with a wavelength of 375 nm is 6% or less. In order to form a pattern on the screen plate using the ultraviolet scattering suppression mesh of this embodiment, the photosensitive resin film is irradiated with ultraviolet light and cured in accordance with the mask pattern. Reflection of incident ultraviolet light is suppressed, and a faithful print pattern can be formed by the mask pattern.

  Furthermore, in the metal wire constituting the ultraviolet scattering suppression mesh of this embodiment, the reflection of ultraviolet light by a thin film having ultraviolet absorptivity is reduced by setting the wire diameter to 16 μm or less and the number of meshes of the mesh fabric to 300 or more. A synergistic effect with the effect makes it possible to produce a printing plate having a printing pattern that is difficult to form with conventional materials such as a minimum line width or dot diameter of 30 μm or less, particularly 20 μm or 15 μm. Furthermore, if high-strength stainless steel or tungsten, which is higher in strength than ordinary soft stainless steel, is used, screen plates can be printed with good reproducibility with less change in printing accuracy over time even when high-definition patterns are repeatedly printed. Can be provided.

  Next, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to only these examples.

Example 1
(Preparation of CuI dispersion)
CuI (copper iodide) was used as a metal compound having ultraviolet absorptivity, and the particles were obtained by grinding copper iodide (manufactured by Nippon Chemical Industry Co., Ltd.) in ethanol using a bead mill. At this time, 20% by mass of polyvinylpyrrolidone (manufactured by SIGMA-ALDRICH) was added to CuI as a dispersant to prevent aggregation of the pulverized CuI. The average particle diameter of CuI in the obtained dispersion was 100 nm. The concentration of CuI in the dispersion was adjusted to 5% by mass with ethanol.

(Preparation of thin film solution)
A commercially available acrylic urethane resin paint (manufactured by Ohashi Chemical Co., Ltd., trade name: OFFLEX) was used as a binder, and a CuI dispersion was mixed with this to obtain a thin film solution. Specifically, 68 parts of synthetic resin paint thinner (No. 7400, manufactured by Ohashi Chemical Industry Co., Ltd.) is mixed with 1.6 parts of resin base (Oflex No8127) and 0.4 parts of curing agent (Oflex E-70). And fully dissolved. Thereafter, 30 parts of the CuI dispersion was added to the resulting mixture and stirred well to obtain a thin film solution. Nonvolatile components in the prepared thin film solution include 1.5% by mass of CuI as a metal compound, 0.3% by mass of polyvinylpyrrolidone as a dispersant, and a resin film forming component in the resin main agent and the curing agent. Is 1.2% by mass.

(Formation of thin film on metal mesh fabric)
(A) Yarn diameter of 16 μm, (b) Yarn diameter of 19 μm, (a) and (b) both cut out a soft stainless steel mesh having a mesh number of 500 (manufactured by NBC Metal Mesh Co., Ltd., M10) in a size of 300 mm × 300 mm, After degreasing and cleaning, the weight was precisely measured. Thereafter, the film was fixed vertically to the stand, and both the front and back surfaces were uniformly sprayed and applied to the entire mesh surface by hand spraying, and then the volatile components were removed by a dryer. The coating amount was determined from the difference in weight before and after coating after removing the volatile components with a dryer, and the coating and drying operations were repeated until a predetermined coating amount was obtained. Here, the thickness of the thin film (average thickness of the thin film) and the converted film thickness are calculated using the surface area calculated from the number of warp yarns and weft yarns constituting the mesh and the yarn diameter from the obtained coating amount. The converted film thicknesses were (a) 193 nm, (b) 204 nm, thin film thicknesses (a) 1106 nm, and (b) 1169 nm, respectively. That is, when the mass ratio of the metal compound particles in the non-volatile component forming the thin film in the thin film solution is r, the mass ratio of the non-volatile component other than the metal compound particles (referred to as a binder component) is (1-r). Become. In addition, the density of the metal compound particles and the binder component is expressed as m [g / cm ³ ] and b [g / cm ³ ], respectively, the coating amount from the weight difference before and after coating is W [g], and the mesh of the coating area When the surface area calculated from the number and the thread diameter is S [cm ² ], the converted film thickness is W × r × 10 ⁷ / (m × S) [nm], and the thin film thickness is W × (r × b + ( 1−r) × m) × 10 ⁷ / (S × b × m) [nm]. Here, the surface area S does not take into account the bending of the mesh or the overlap of the intersections of the warp and weft yarns, the number of yarns having a size of 300 mm × 300 mm, the yarn diameter of the used yarn, and the length of the yarn ( The calculated values based on the warp and weft are 300 mm).

(Creation of combination version)
A combination plate was prepared using a metal mesh fabric on which a thin film was formed. First, the obtained metal mesh fabric was cut into a square of 240 mm × 240 mm with an angle of 23 ° with respect to the warp direction to obtain a screen mesh for image formation. Further, UX230T (manufactured by NBC Meshtec Co., Ltd.) made of polyester was cut into a 500 mm × 500 mm square with one side parallel to the warp direction to obtain a support screen. The corresponding sides of the two square meshes for image formation and support are overlapped with the corresponding sides parallel to each other, and the periphery of the image formation screen mesh is bonded to the peripheral portion of the image formation screen mesh with an adhesive width of 10 mm. Glued to. Thereafter, the support mesh in the portion overlapping the image forming screen inside the bonded portion was cut off to obtain an integrated screen for a combination screen plate. Here, the reflectance of ultraviolet light with a wavelength of 375 nm of the image forming screen (reflectance in a state where three metal mesh fabrics are stacked. The same applies to the following reflectance) was 2.2%.

  Aluminum frame (outer dimensions: 320mm x 320mm, inner dimensions: 290mm x 290mm, thickness 20mm, thickness 1.5mm hollow structure) is used as the frame, and one side of the frame and the above combination screen plate The support screen was placed in parallel with the warp direction of the support screen, and was stretched by a conventional method. Here, the tension at the center of the image forming screen was 1.2 mm as measured using a tension gauge STG-75B (manufactured by Sun Giken).

  A frame with a monolithic screen for a combination screen plate was vertically attached to a bucket type coating machine to obtain a combination screen plate. Then, a photosensitive resin film having a thickness of 10 μm was formed by repeating coating and drying of the diazo photosensitive emulsion (product name: V1 emulsion, manufactured by NBC Meshtec Co., Ltd., trade name: V1 emulsion) 10 times on this combination screen plate. .

A combination screen plate on which a photosensitive resin film is formed and a glass mask on which a positive pattern shown in FIG. 8 is formed are set in an exposure machine (manufactured by Protec Co., Ltd., model SP-1000FL), and the photosensitivity of the combination screen plate by a pressure bonding method. A glass mask was adhered to the resin film. The portion where the positive pattern was formed was 150 mm × 150 mm, and this range was divided into 9 by 3 × 3 at equal intervals in the X direction and Y direction, which are two orthogonal sides. Then, a glass mask shown in FIG. 8 having a positive pattern with a pattern line width of 10 μm to 50 μm was arranged in each of the divided regions. The combination screen plate was exposed for 100 seconds at an appropriate exposure amount with a power of 7.2 mW / cm ² using a metal halide lamp as a light source. Thereafter, the uncured photosensitive film was dissolved and removed by washing in warm water at 40 ° C. to obtain a combination screen plate in which a pattern was formed.

  The glass mask pattern of FIG. 8 has a pattern width of 10 μm with the smallest line width (width of the line to be printed) in the lower right pattern of FIG. 8, the pattern width in the lower stage is 15 μm, and the pattern width in the lower stage is 20 μm. The middle right pattern has a pattern width of 25 μm, the middle stage has a pattern width of 30 μm, the middle stage left has a pattern width of 35 μm, the upper stage right pattern has a pattern width of 40 μm, the upper stage has a pattern width of 45 μm, and the upper stage left has the largest line width. The pattern is 50 μm.

(Example 2)
The thin film formed on the surface of the stainless steel mesh used for the image forming screen in Example 1 was controlled in the amount applied by spraying, so that the converted film thickness was (a) 48 nm and (b) 485 nm. In the same manner as in Example 1, a combination screen plate was produced. Here, the reflectance of the image forming screen with ultraviolet light having a wavelength of 375 nm was (a) 5.4% and (b) 2.2%.

(Example 3)
In Example 1, the amount of CuI in the nonvolatile component of the thin film solution was (a) doubled by making the amount of the CuI dispersion liquid (a) 60 parts and (b) 15 parts at the time of preparing the thin film solution. (B) 1/2 times. The thin film formed on the surface of the stainless steel mesh of the image forming screen using the respective thin film solutions is controlled by controlling the coating amount by spraying, except that the converted film thickness is (a) 208 nm and (b) 195 nm. A combination screen plate was produced in the same manner as in Example 1. Here, the reflectance of the image forming screen with ultraviolet light having a wavelength of 375 nm was (a) 2.1% and (b) 2.3%.

Example 4
In Example 1, instead of CuI in the nonvolatile component of the thin film solution, dry pulverization was performed with a jet mill (a) Cu ₂ O (cuprous oxide, manufactured by Wako Pure Chemical Industries, Ltd.) (b) AgI ( A combination screen plate was produced in the same manner as in Example 1 except that silver iodide (manufactured by Wako Pure Chemical Industries, Ltd.) was used. Here, the average particle diameters of (a) Cu ₂ O and (b) AgI are 238 nm and 476 nm, respectively, and the reflectance of the image forming screen with ultraviolet light with a wavelength of 375 nm is (a) 3.5%, ( b) 2.0%.

(Example 5)
In Example 1, coating and drying of a diazo photosensitive emulsion (trade name V1 emulsion, manufactured by NBC Meshtec Co., Ltd.) was repeated 20 times, so that the thickness of the photosensitive resin film was 20 μm and the exposure time was 220. A combination screen plate was produced in the same manner as in Example 1 except that the second was used. Here, the reflectance of the image forming screen with ultraviolet light at a wavelength of 375 nm was 2.2%.

Example 6
The stainless steel screen used as the image forming screen in Example 1 was (a) a stainless steel screen having a thread diameter of 13 μm and 730 mesh (M13, manufactured by NBC Metal Mesh Co., Ltd.), and (b) a thread diameter of 16 mesh and 325 mesh. A combination screen plate was produced in the same manner as in Example 1 except that a high-strength stainless steel screen (manufactured by NBC Metal Mesh Co., Ltd., M30) was used. Here, the reflectance of the image forming screen with ultraviolet light at a wavelength of 375 nm was (a) 2.3% and (b) 2.1%.

(Example 7)
The stainless steel screen used as the image forming screen in Example 1 was made of (a) a tungsten screen having a thread diameter of 11 μm and 520 mesh (M40 manufactured by NBC Metal Mesh Co., Ltd.), and (b) a thread diameter of 13 mesh and 450 mesh. A combination screen plate was produced in the same manner as in Example 1 except that the tungsten screen (manufactured by NBC Metal Mesh Co., Ltd., M40) was used. Here, the reflectance of the image forming screen with ultraviolet light at a wavelength of 375 nm was (a) 2.3% and (b) 2.2%.

(Comparative Example 1)
A combination screen plate having the same specifications as in Example 1 was produced except that the stainless steel screen used for the image forming screen in Example 1 was not subjected to the thin film formation process described in this embodiment. Here, the reflectance of ultraviolet light with a wavelength of 375 nm of the image forming screen was 14.4%.

(Comparative Example 2)
The thin film formed on the surface of the stainless steel mesh used for the image forming screen in Example 1 was controlled in the amount applied by spraying, so that the converted film thickness was (a) 35 nm and (b) 721 nm. In the same manner as in No. 1, a combination screen was produced. Here, the reflectance of the image forming screen with ultraviolet light having a wavelength of 375 nm was (a) 6.3% and (b) 2.1%.

(Measurement of reflectance)
The reflectance was measured using a spectrophotometer (manufactured by JASCO Corporation, model V-670). A mesh fabric is composed of a solid part with warp and weft yarns and a gap that allows ink to pass through during printing. Light is transmitted through the gap even when a light beam is projected. Therefore, the reflectivity differs. Therefore, a plurality of meshes were stacked and the reflectance was measured, and the reflectance when the value showed a constant value was used. Since the reflectance is almost constant in the case where three or more meshes are overlapped in any of the different examples and comparative examples with respect to the yarn diameter, the number of meshes, the opening area (opening ratio), etc., the three meshes The reflectance was measured with the stacked ones.

(Resolution evaluation method)
In Examples 1 to 7 and Comparative Examples 1 and 2, a coordinate measuring machine (PCM-1300, manufactured by Sokkia Co., Ltd.) was used, and the pattern portion of the plate was enlarged and evaluated by visual observation. When a pattern is formed using the mask having a pattern width of 10 to 50 μm shown in FIG. 8, the pattern width without remaining emulsion (photosensitive resin) can be resolved, and all the sections divided into nine (9 patterns) ) Was given a five-level evaluation rank according to the following criteria.

  Evaluation rank AAA = 15 μm resolution is possible in all 9 sections, AA = 20 sections can be resolved in all 9 sections, A = 9 sections can be resolved in 30 μm and 5 sections or more can be resolved in 20 μm, B = 5 sections or more can be resolved in 30 μm Possible, C = 30μm resolution is possible only in 4 sections or less.

  Here, as a typical resolvable example, FIG. 9 shows the case where the pattern width is 20 μm in Example 1, and as an example where the emulsion remains in the pattern portion, FIG. 10 shows the pattern width of 20 μm in Comparative Example 1. Showed the case. In FIG. 9 and FIG. 10, a large number of vertically extending lines are a part of the pattern formed on the mesh fabric by the photosensitive film. In the image shown in FIG. 9 of the example, it can be seen that there is no photosensitive resin other than the upper and lower line-shaped patterns. On the other hand, in the image shown in FIG. 10 of the comparative example, it can be seen that the photosensitive resin remains between the upper and lower line patterns. The resin that does not need to be cured is cured by scattering of the ultraviolet light to the surroundings, and the resin remains in addition to the line-shaped pattern as shown in the image of FIG.

  Evaluation results of resolution together with the types of screens used in the image forming portions and the support portions in Examples 1 to 7 and Comparative Examples 1 and 2, the converted film thickness and thin film thickness of the image forming portions, and the reflectance values Are shown in Table 1. In order to be able to be said to be a sufficiently high-definition pattern, it is necessary that the line width and the dot diameter of 30 μm or less can be surely resolved on almost the entire surface of the pattern forming portion, and therefore an evaluation rank of A or higher is required.

In any of Examples 1 to 7 in which the converted film thickness is 50 nm or more and 500 nm or less, the reflectance of light with a wavelength of 375 nm is 6% or less, and all have a 30 μm solution in all 9 divisions (all 9 patterns). An image was possible. In Example 3, although the equivalent film thickness is approximately the same 200 nm, it is considered that 3a having a small thin film thickness has a higher evaluation of resolution than 3b because the opening area of the mesh is large. In Example 7a having a thin yarn diameter of 11 μm and Example 7b having a yarn diameter of 13 μm using a tungsten yarn which is a high-strength material having a Young's modulus of 4000 N / mm ² level, the reflectance is less than 3%, and all of the nine divided portions A resolution of 15 μm was possible in the section. On the other hand, in Comparative Example 1 in which no thin film is formed, the reflectance is as high as 14.4%, so that 30 μm can be resolved only in three of the nine divisions. Further, in Comparative Example 2a in which the equivalent film thickness was 35 nm, the reflectance was 6.3%, and 30 μm could be resolved in only 7 of the 9 divisions. Furthermore, in Comparative Example 2b, in which the equivalent film thickness is 721 nm and thicker than Example 2b, the 30 μm resolution is possible only in 7 of the 9 divisions, although the reflectance is as low as 2.1%. I stayed there. This is presumably because the thickness of the thin film was as thick as 4000 nm or more, which adversely affected the mesh opening area.

1: Metal mesh fabric 2: Warp yarn 3: Weft yarn 4: Thin film
20: Mask
21: Screen yarn (warp 3 and weft 4)
22: Negative pattern part
23: Positive pattern section
24: Ultraviolet light
25: Reflected light
31: Photosensitive resin film cured to form a pattern
32: Opening of plate section model
35: Conventional screen yarn
51,61: Unwinding roll
52,62: Metal mesh fabric
53,63: Guide roller
54: Application part
55: Spray nozzle
56,68: Drying furnace
57,69: Winding roll
58: Liquid feed pump
59: Solution tank for thin film
64: Immersion tank
65: Nip roller
66: Spraying part
67: Air nozzle
70: Air compressor
100: Combination screen version
101: Frame
102: Screen for image formation
103: Support screen

Claims (6)

A metal mesh fabric for screen printing having a structure in which warp yarns and weft yarns made of metal wires are woven so as to cross each other, and can suppress scattering of ultraviolet rays irradiated when forming a photosensitive resin film,
An ultraviolet absorbing film comprising at least one kind of ultraviolet absorbing metal compound particles and a binder formed on the surface of the metal mesh fabric;
The UV-absorbing film has an average thickness converted to metal compound particles only of 50 nm or more and 500 nm or less, and a predetermined number or more of the screen printing metal mesh fabrics are stacked so that the reflectance of light having a wavelength of 375 nm is substantially constant. The metal mesh fabric for screen printing is characterized in that the reflectance of light with the wavelength of 375 nm is 6% or less.   The metal mesh fabric for screen printing according to claim 1, wherein the metal compound particles having ultraviolet absorptivity include monovalent copper compounds or AgI particles.   In the metal wire, the warp and the weft have a wire diameter of 16 μm or less, and the number of the warp and the weft in the metal mesh fabric for screen printing is 300 or more per 25.4 mm. The metal mesh fabric for screen printing according to claim 1 or 2.   A screen plate for screen printing, comprising the metal mesh fabric for screen printing according to any one of claims 1 to 3.   A metal mesh fabric for screen printing according to any one of claims 1 to 3 as an image forming screen, and a support for supporting a fabric structure made of synthetic fibers with a frame of the image forming screen. The screen plate for screen printing according to claim 4, further comprising a screen. The pattern which is the photosensitive resin film formed in the screen plate for the screen printing is further provided, and the minimum pattern width or the minimum pattern dot diameter of the pattern is 30 μm or less. 5. A screen plate for screen printing according to 5.