JP6285630B2 - Lithographic apparatus, control apparatus, lithography system, and article manufacturing method - Google Patents

Description

  The present invention relates to a lithographic apparatus, a control apparatus, a lithographic system, and an article manufacturing method.

  In a lithographic apparatus typified by an exposure apparatus, there are a large number of parameters for controlling each unit. These parameters are displayed on a user interface (screen), and the values can be changed so that adjustments can be made for machine differences for each lithography apparatus and changes with time associated with operation of the lithography apparatus.

  The parameters related to each other are classified into several groups for each control target, and are displayed on different screens for each group. In a lithographic apparatus, there are generally 200 or more screens for displaying parameters, and there are tens of thousands of parameters that can be changed by the user.

  Therefore, in order to improve usability (operability), an exposure apparatus that aggregates (stores) parameter change histories and makes it possible to transition to a screen that displays parameters with a high change frequency with few operations (procedures). Has been proposed (see Patent Document 1).

Japanese Patent Laid-Open No. 2003-077785

  However, in the prior art, the number of parameters that can be changed by the user is not reduced, so that a user who is not familiar with the control target of each parameter may change an incorrect parameter value during operation of the device. There is sex. In fact, if an incorrect parameter, that is, a parameter value different from the parameter to be changed is changed, a defect may be caused in an article (semiconductor device, display device, etc.) manufactured by the lithographic apparatus. Become.

  The present invention has been made in view of the above-described problems of the prior art, and an object of the present invention is to provide a lithography apparatus that is advantageous in terms of operability related to parameter setting.

In order to achieve the above object, a lithographic apparatus according to one aspect of the present invention is a lithographic apparatus that forms a pattern on a substrate, the display unit displaying a parameter set in the lithographic apparatus, and a value of the parameter There possess a storage unit for storing a table for representing the changed frequency in number, and a control unit for the parameter before Kishiki degree is in a low state visibility as low parameters displayed on the display unit, and The control unit adjusts the visibility of a parameter displayed on the display unit according to a score for each parameter obtained based on a table stored in the storage unit and information on the frequency. .

  Further objects and other aspects of the present invention will become apparent from the preferred embodiments described below with reference to the accompanying drawings.

  According to the present invention, for example, it is possible to provide a lithographic apparatus that is advantageous in terms of operability related to parameter setting.

1 is a schematic diagram showing a configuration of a lithographic apparatus as one aspect of the present invention. FIG. 2 is a diagram showing an example of a parameter setting screen displayed on the display unit of the lithography apparatus shown in FIG. FIG. 2 shows an example of a table stored in a storage unit of the lithography apparatus shown in FIG. 3 is a flowchart for explaining display processing for displaying parameters on a display unit in the lithography apparatus shown in FIG. 1. It is a figure which shows an example of the score for every parameter calculated by S404 shown in FIG. It is a figure which shows an example of the color tone table showing the correspondence of the score of a parameter and color tone information. FIG. 2 is a diagram specifically showing display of parameters on a display unit of the lithography apparatus shown in FIG. 1. 1 is a schematic diagram showing a configuration of a lithography system as one aspect of the present invention. FIG. 9 is a diagram showing an example of a table for converting the frequency of parameter change in each lithography apparatus of the lithography system shown in FIG. 8 into points. FIG. 9 is a flowchart for explaining a display process for displaying parameters on a display unit of each lithography apparatus in the lithography system shown in FIG. 8.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described with reference to the accompanying drawings. In addition, in each figure, the same reference number is attached | subjected about the same member and the overlapping description is abbreviate | omitted.

<First Embodiment>
FIG. 1 is a schematic diagram showing a configuration of a lithographic apparatus 100 according to one aspect of the present invention. The lithographic apparatus 100 is an apparatus that forms a pattern on a substrate, and is embodied as an exposure apparatus having a projection optical system that emits exposure light for exposing the substrate. However, the lithography apparatus 100 is not limited to an exposure apparatus, and for example, performs drawing on a substrate with a charged particle beam (electron beam or ion beam), that is, a charged particle beam emitted from a charged particle optical system. A drawing apparatus that draws a pattern on the substrate may be used.

  The lithographic apparatus 100 includes an illumination optical system 1 that illuminates a mask, a mask stage 2 that moves while holding the mask, a projection optical system 3 that projects a pattern of the mask onto a substrate, and a substrate stage that moves while holding the substrate. 4. In addition, the lithography apparatus 100 includes a display unit 5, an input unit 6, an acquisition unit 7, a control unit 8, and a storage unit 9.

  The display unit 5 displays information related to the lithography apparatus 100, for example, the state of the lithography apparatus 100 and parameters set in the lithography apparatus 100. The display unit 5 can provide a graphical user interface.

  The input unit 6 includes input devices such as a keyboard and a mouse, for example. The user can change the value of the parameter displayed on the display unit 5 via the input unit 6.

  In the present embodiment, the acquisition unit 7 stores the change history of parameters set in the lithography apparatus 100, thereby acquiring frequency information regarding the frequency with which the parameter values have been changed. Such frequency information is not only information indicating the number of times each parameter value has been changed, but also how the value of each parameter has been changed (for example, whether it has been changed directly via the input unit 6, Information indicating whether it has been indirectly changed by internal processing).

  The control unit 8 controls each unit (overall operation) of the lithography apparatus 100. For example, the control unit 8 is configured to illuminate the optical system 1, the mask stage 2, the projection optical system 3, so that a mask pattern is formed (transferred) on the substrate based on the parameter values set in the lithography apparatus 100. Each unit such as the substrate stage 4 is controlled. In addition, the control unit 8 reflects the correspondence between the frequency information acquired by the acquisition unit 7 and the parameters, and displays the parameters in a state where the frequency at which the value of each parameter is changed can be identified. It functions as a display control unit for controlling. Specifically, the control unit 8 controls the display unit 5 so that the parameter whose value is changed less frequently displays the parameter with a lower visibility. The visibility can be adjusted by changing the color of the parameter displayed on the display unit 5 step by step.

  As will be described later, the storage unit 9 stores a table for converting the frequency of changing the parameter value into a score. In the present embodiment, the control unit 8 converts the frequency at which the parameter value is changed into a score based on the table stored in the storage unit 9 (that is, scores the frequency at which the parameter value is changed). The display unit 5 is controlled based on the converted score.

  FIG. 2 is a diagram showing an example of a screen displayed on the display unit 5, specifically, a parameter setting screen for setting parameter values. Each parameter set in the lithographic apparatus 100 is classified into several groups for each control target. For example, the parameters are displayed separately on the parameter setting screens 51, 52, and 53 for each group. The parameter setting screens 51, 52 and 53 displayed on the display unit 5 can be selected by a menu icon 55 including menus M1, M2 and M3. In the present embodiment, when the menu M1 is selected, a parameter setting screen 51 including parameters P1 to P9 is displayed on the display unit 5. When the menu M2 is selected, a parameter setting screen 52 including parameters P11 to P19 is displayed on the display unit 5, and when the menu M3 is selected, a parameter setting screen 53 including parameters P21 to P29 is displayed on the display unit 5. Is displayed.

  When changing the value of a certain parameter, the parameter setting screen to which the parameter belongs is selected by the menu icon 55 (menus M1 to M3) and displayed on the display unit 5, and the parameter value (changed value) is displayed. Input via the input unit 6. For example, when changing the value of the parameter P14, the menu M2 is selected from the menu icon 55, the parameter setting screen 52 is displayed on the display unit 5, and the value of the parameter P14 is input via the input unit 6.

  Further, by selecting the EXIT button 56 included in each of the parameter setting screens 51, 52 and 53, the parameter setting screen displayed on the display unit 5 is hidden.

  When the parameter change history is stored in the acquisition unit 7, even if the parameter value is changed a plurality of times after the parameter setting screen to which the parameter belongs is displayed on the display unit 5 until it is not displayed, The number of times the parameter value has been changed is stored as one time. If the parameter value is changed after the parameter setting screen is displayed again on the display unit 5 until it is not displayed, the number of times the parameter value is changed is stored as two times. . In addition, if the parameter value is not changed between the time when the parameter setting screen is displayed on the display unit 5 and the time when the parameter setting screen is not displayed, the number of times the parameter value is changed is 0 (that is, the parameter value is changed). Not).

  FIGS. 3A and 3B are diagrams illustrating an example of a table stored in the storage unit 9, that is, a table for converting the frequency at which the parameter value is changed into points. Here, a table is set so that points are added when the parameter value is changed, and points are subtracted when the parameter value is not changed. When the value of the parameter is changed, the number of points added to the parameter (the number of points added) and the number of points subtracted from other parameters other than the parameter (the number of subtraction points) can be set by the user. In FIG. 3A, the number of points added to the parameter is set to 50 points, and the number of subtraction points subtracted from other parameters is set to -40 points. Here, FIG. 3A shows a table in the case where the parameter value is directly changed via the input unit 6.

  In addition, the parameter values set in the lithographic apparatus 100 may be changed in the control sequence (that is, indirectly changed by internal processing). Therefore, it is preferable that different addition points and subtraction points are set in the table stored in the storage unit 9 according to the situation in which the parameter value is changed (that is, the change in the parameter score depends on the situation). Should be different). FIG. 3B shows a table when parameter values are changed in the control sequence. In FIG.3 (b), when the value of a parameter is changed in the control sequence, the number of points added to the parameter is set to 30 points, and the number of subtraction points subtracted from other parameters is set to -20 points. Has been. In addition, when the value of a parameter is changed in the control sequence, the number of points to be added to the parameter and the number of subtraction points to be subtracted from parameters other than the parameter can be set by the user.

  With reference to FIG. 4, display processing for displaying parameters on the display unit 5 in the lithography apparatus 100 will be described. Such display processing is performed by the control unit 8 controlling the display unit 5 as described above.

  In S402, the control unit 8 converts the frequency information regarding the frequency of the parameter value change from the acquisition unit 7 and the table for converting the frequency of the parameter value change from the storage unit 9 into a score (FIG. 3 ( a) and FIG. 3B) are acquired.

  In S404, based on the frequency information and table acquired in S402, the control unit 8 converts the frequency at which the parameter value is changed into a score for each parameter, and calculates a score for each parameter. For example, 100 points are added in advance to each parameter set in the lithographic apparatus 100, and for each parameter, as shown in FIG. 5, a score indicating the frequency with which the parameter value is changed is calculated.

  In S406, the control unit 8 determines the color of the parameter displayed on the display unit 5 according to the score calculated in S404. Specifically, the control unit 8 refers to a color tone table representing the correspondence between the number of parameter points and the color tone information as shown in FIG. 6, and calculates each parameter set in the lithography apparatus 100 in S404. The color corresponding to the score is determined. In the color tone table shown in FIG. 6, if the parameter score is 100, the parameter color is black. As the parameter score decreases, the density of black gradually decreases, and the parameter score becomes 0. It is set to be white. Such a color tone table may be stored in the storage unit 9 or may be stored in the memory of the control unit 8 or the like. It is assumed that the color tone information is a fixed value and cannot be changed by the user.

  In S408, the control unit 8 controls the display unit 5 (that is, display of parameters on the display unit 5) so that each parameter is displayed in the color determined in S406. Here, when the parameter setting screen to which the parameter whose value has been changed belongs is displayed on the display unit 5, the parameter color is displayed (updated) based on the color determined in S406. On the other hand, when the parameter setting screen to which the parameter whose value has changed is not displayed on the display unit 5, the parameter color is displayed (updated) when the parameter setting screen is displayed.

  FIG. 7A to FIG. 7C are diagrams specifically showing the display of parameters on the display unit 5. Initially, since the number of points of all parameters set in the lithography apparatus 100 is 100, as shown in FIG. 7A, the parameter and the input field for the parameter value are displayed in black. When the value of each parameter is changed, as shown in FIG. 7B, the parameter (parameters P4 to P9) with a low change frequency and the input field for the parameter value are displayed in gray with a reduced black density. Is displayed. Further, when the value of each parameter is changed and the score of the parameter becomes 0, the parameter for which the score is 0 and the input field for the parameter value are displayed in white.

  7A to 7C, since the background of the parameter setting screen is white, when the input field of the parameter and the value of the parameter is white, it is not visible on the display unit 5 (low visibility). State). Therefore, when the screen size is optimized by removing the invisible parameter and the display area of the input field for the parameter value, as shown in FIG. Only parameters that are frequently changed are displayed. Therefore, it is possible to prevent (reduce) changing an incorrect parameter.

  The method of hiding the parameter whose change frequency is low and the input field for the parameter is not limited to the method described above. For example, a method may be used in which the background of the parameter setting screen is colored and the color tone information is controlled by the transmittance.

  Further, as shown in FIG. 7C, when a parameter with a low change frequency is hidden, a redisplay button is configured on the parameter setting screen, and when the redisplay button is selected, FIG. ), The hidden parameters are redisplayed.

<Second Embodiment>
FIG. 8 is a schematic diagram showing a configuration of a lithography system 200 as one aspect of the present invention. The lithography system 200 includes a plurality of lithography apparatuses 100A, 100B,..., 100N that form a pattern on a substrate, and a control device 202 that controls each of the plurality of lithography apparatuses 100A to 100N.

  Each of the plurality of lithography apparatuses 100A to 100N is an exposure apparatus having a configuration similar to that of the lithography apparatus 100, and is connected via a network NT.

  A control device 202 is connected to the network NT (upstream). The control device 202 has a configuration having functions similar to those of the acquisition unit 7, the control unit 8, and the storage unit 9 of the lithography apparatus 100, and controls the display units of the lithography apparatuses 100A to 100N (that is, parameters in the display units). Control the display). Specifically, the control device 202 acquires frequency information regarding the frequency with which the parameter value is changed for each of the lithography apparatuses 100A to 100N. Then, the control device 202 reflects the correspondence between the frequency information and the parameter so that the display unit of each lithography apparatus 100A to 100N displays the parameter in a state where the frequency at which the parameter value is changed can be identified. Control. Therefore, as described in the first embodiment, the control device 202 converts the frequency of changing the parameter value into a score for each of the lithography apparatuses 100A to 100N, and based on the converted score, each lithography apparatus 100A to 100N The display units 100A to 100N are controlled. Here, in each of the lithographic apparatuses 100A to 100N, when the parameter value is changed by itself, when the parameter value is changed in its own control sequence, and when the parameter value is changed by another apparatus. It may be the case. Therefore, in the table for converting the frequency of changing the parameter value into points, different addition points and subtraction points are set according to the situation where the parameter values are changed.

  FIG. 9A to FIG. 9C are diagrams illustrating an example of a table for converting the frequency of parameter change in each of the lithography apparatuses 100A to 100N into points. FIG. 9A shows a table when the parameter value is directly changed by itself. In FIG. 9A, the number of points added to the parameter is set to 50 points, and the number of subtraction points subtracted from other parameters is set to -40 points. FIG. 9B shows a table when the parameter value is changed in its own control sequence. In FIG. 9B, when a parameter value is changed in its own control sequence, the number of points added to the parameter is set to 30 points, and the number of subtraction points subtracted from other parameters is -20 points. Is set to FIG. 9C shows a table when the parameter value is changed by another device. In FIG.9 (c), when the value of a parameter is changed by another apparatus, the addition score added to the said parameter is set to 10 points, and the subtraction score subtracted from another parameter is set to -10 points. Is set.

  With reference to FIG. 10, display processing for displaying parameters on the display units of the lithography apparatuses 100 </ b> A to 100 </ b> N in the lithography system 200 will be described. As described above, such display processing is performed by the control device 202 controlling the display units of the lithography apparatuses 100A to 100N.

  In step S1002, the control apparatus 202 acquires frequency information regarding the frequency with which the value of the parameter has been changed from the target lithography apparatus (for example, the lithography apparatus 100A) to be subjected to display processing among the lithography apparatuses 100A to 100N.

  In step S1004, the frequency at which the parameter value set in the target lithography apparatus is changed is converted into a score for each parameter, and the score of each parameter is calculated. For example, 100 points are added in advance to each parameter set in the target lithography apparatus, and for each parameter, a score representing the frequency with which the parameter value is changed is calculated. Specifically, first, in the case where the parameter value is changed by itself or in its own control sequence, the frequency information obtained in S1002 for the score of each parameter, and FIG. 9 (a) and FIG. It calculates based on the table shown in (b). Next, when the parameter value is changed by another device, the score of each parameter is calculated based on the frequency information acquired in S1002 and the table shown in FIG. 9C.

  In step S1006, the control apparatus 202 determines the color of the parameter displayed on the display unit of the target lithography apparatus according to the score calculated in step S1004. Specifically, the control device 202 refers to a color tone table representing the correspondence between the number of parameter points and the color tone information as shown in FIG. 6, and for each parameter set in the target lithography apparatus, in step S1004. A color corresponding to the calculated score is determined.

  In step S1008, the control device 202 controls the display unit (that is, parameter display on the display unit) of the target lithography apparatus so that each parameter is displayed in the color determined in step S1006. Here, when the parameter setting screen to which the parameter whose value has been changed belongs is displayed on the display unit of the target lithography apparatus, the parameter color is displayed (updated) based on the color determined in S1006. . On the other hand, when the parameter setting screen to which the parameter whose value has changed is not displayed on the display unit of the target lithography apparatus, the parameter color display (update) is performed when the parameter setting screen is displayed. Is called.

  In step S1010, the control apparatus 202 determines whether all the lithography apparatuses 100A to 100N are target lithography apparatuses. If all the lithography apparatuses 100A to 100N are not the target lithography apparatus, the process proceeds to S1002 with the next lithography apparatus as the target lithography apparatus. Further, when all the lithography apparatuses 100A to 100N are the target lithography apparatuses, the process ends.

  As described above, in the lithography system 200, when displaying parameters on the display unit of each of the lithography apparatuses 100A to 100N, a parameter with a low change frequency is hidden (reduced visibility), and only a parameter with a high change frequency is displayed. Can be displayed. Therefore, it is possible to prevent (reduce) changing an incorrect parameter.

In the present embodiment, the control device 202 controls the display units of the lithography apparatuses 100A to 100N, but the present invention is not limited to this.
For example, the control unit of each lithography apparatus 100A to 100N may control its own display unit, or the control unit of one lithography apparatus among the lithography apparatuses 100A to 100N controls the display unit of each lithography apparatus 100A to 100N. May be.

<Third Embodiment>
The lithographic apparatus 100 and the lithography system 200 according to the above-described embodiments can prevent (reduce) changing an incorrect parameter, that is, a parameter value different from the parameter to be changed. Therefore, the lithographic apparatus 100 and the lithography system 200 can normally perform the process of forming the pattern on the substrate, and are suitable for manufacturing articles such as microdevices such as semiconductor devices and elements having a fine structure, for example. It is. Here, the manufacturing method of such an article will be described using the case of using the lithography apparatus 100 as an example, but the lithography system 200 may be used. The method for manufacturing an article includes a step of forming a pattern on a substrate using the lithography apparatus 100 (steps such as exposure, drawing, or imprinting for applying a pattern related to energy or a pattern for patterning the substrate to the substrate). . In addition, the method for manufacturing an article includes a step of processing (processing) the substrate on which a pattern has been formed in this step (for example, a step of performing development or etching). Further, the manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferable embodiment of this invention was described, it cannot be overemphasized that this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

Claims (8)

A lithographic apparatus for forming a pattern on a substrate,
A display for displaying parameters set in the lithographic apparatus;
A storage unit for storing a table for expressing the frequency of change of the parameter value by a score;
A control unit that causes the parameter to be displayed on the display unit in a state where the visibility is lower as the parameter is less frequent,
Have
The control unit adjusts the visibility of a parameter displayed on the display unit according to a score for each parameter obtained based on a table stored in the storage unit and information on the frequency. Lithographic apparatus.   2. The lithography according to claim 1, wherein the table is set so that a score is added to a parameter whose value has been changed, and a score is subtracted from a parameter whose value has not been changed. apparatus.   The lithographic apparatus according to claim 1, wherein the table is set so that a change in the number of parameters varies depending on a situation in which the value is changed. The control unit A lithographic apparatus according to any one of claims 1 to 3 wherein the adjusting the visibility, characterized in that by changing the color of that or parameters parameters invisible. The lithographic apparatus according to any one of claims 1 to 4 having a unit for applying a pattern for patterning the substrate to the substrate, it is characterized. An acquisition unit that acquires information about a frequency at which a parameter value set in the lithography apparatus is changed;
A storage unit for storing a table for expressing the frequency in points;
Based on the information acquired by the acquisition unit, a control unit that causes the display unit of the lithographic apparatus to display the parameter in a state where the visibility is lower as the parameter is less frequent,
Have
The said control part adjusts the said visibility according to the score for every parameter obtained based on the table memorize | stored in the said memory | storage part, and the said information, The control apparatus characterized by the above-mentioned. At least one lithographic apparatus for forming a pattern;
A control device according to claim 6 ;
A lithography system comprising: Forming a pattern on a substrate using the lithographic apparatus according to any one of claims 1 to 5 or the lithography system according to claim 7 ;
Processing the substrate on which the pattern has been formed in the step;
A method for producing an article comprising: