JP6277092B2 - Cleaning method - Google Patents

Description

  The present invention relates to a cleaning method and a cleaning apparatus for a line in which a plurality of devices are connected to distribute a fluid.

  A line used for the production of a compound is configured by connecting a plurality of devices such as process devices and piping, for example, and various raw materials and intermediates which are fluids are distributed through the line. In this type of line, for example, the cleaning operation is performed when the production type is switched or periodically.

  As a line cleaning method, for example, a method of disassembling a line and cleaning each device is known. Moreover, the cleaning method described in Patent Document 1 is a method in which a cleaning medium such as steam or hot water is circulated in a line to clean a plurality of devices at once.

JP 2008-126198 A

  In the method of disassembling the line and cleaning it for each device, since there are many work processes such as dismantling, cleaning for each device, and assembly, it takes days for the cleaning operation, which causes a reduction in production efficiency. In particular, in the production of pharmaceuticals and the like, it is necessary to strictly check for prevention of cross-contamination and contamination, and the burden of equipment cleaning is greater.

  In the cleaning method described in Patent Document 1, a plurality of devices can be cleaned at once by circulating the cleaning medium in the line, and the work process can be simplified. However, the cleaning medium circulated in the line is gradually soiled to reduce the cleaning effect, and the cleaning medium circulated in the line and soiled is finally discharged from the line. May remain in the line.

  The present invention has been made in view of the above-described circumstances, and an object thereof is to provide a cleaning method and a cleaning apparatus capable of efficiently and reliably cleaning a line in which a plurality of devices are connected and a fluid is distributed. It is said.

The cleaning method according to one aspect of the present invention is a cleaning method for a line in which a plurality of devices are connected to flow a fluid, and at least one end portion of the line is used as an introduction port, and the introduction port is excluded. The at least one end of the line is used as a discharge port, an evaporation pot for vaporizing the cleaning liquid is connected to the introduction port, and the cleaning liquid is sequentially introduced into the line in the vaporized state via the introduction port, and the plurality of devices by sequentially cooling the sequentially cause condensation of sequentially introduced Ru said cleaning liquid vaporized state to the line at each device sequentially to discharge the cleaning fluid introduced into the line from the discharge port.

  ADVANTAGE OF THE INVENTION According to this invention, the washing | cleaning method and washing | cleaning apparatus which can wash | clean efficiently and reliably the line by which a some apparatus is connected and a fluid distribute | circulates can be provided.

It is a figure which shows the structure of an example of a line for describing embodiment of this invention. It is a figure which shows an example of the washing | cleaning method of the line of FIG. 1 for describing embodiment of this invention. It is a figure which shows the other example of the washing | cleaning method of the line of FIG. 1 for demonstrating embodiment of this invention. It is a figure which shows the modification of the washing | cleaning method of FIG.

  FIG. 1 shows an exemplary configuration of a line for explaining an embodiment of the present invention.

  The line 1 is configured by connecting a plurality of devices. In the illustrated example, the line 1 includes a kettle 2 as a process device, a condenser 3, a centrifugal filter 4, a filtrate tank 5, and a large number of pipes, and these devices are connected to each other. Note that “equipment” constituting the line 1 includes piping.

  A pipe 6 a provided with a plurality of raw material supply ports (terminal portions) 7 is connected to the pot 2. Various raw materials that are fluids such as liquids or suspensions (slurries) of powder and liquid are supplied to the line 1 through these raw material supply ports 7 and charged into the pot 2. In some cases, powder as a raw material is directly charged into the pot 2 through a lid provided on the pot 2. Various raw materials charged in the kettle 2 are heated in the kettle 2 and the reaction proceeds.

  The capacitor 3 is connected to the shuttle 2 via pipes 6b and 6c. The solvent contained in the raw material charged in the kettle 2 is heated and vaporized in the kettle 2, introduced into the capacitor 3 through the pipe 6b, cooled and condensed there, and again to the kettle 2 through the pipe 6c. Returned.

  The centrifugal filter 4 is connected to the kettle 2 via a pipe 6d, and the filtrate tank 5 is connected to the centrifugal filter 4 via a pipe 6e. After completion of the reaction, a refrigerant is introduced into the kettle 2 and crystallization is performed by cooling. The crystal-solvent suspension (slurry) deposited upon cooling is transferred from the kettle 2 to the centrifugal filter 4 and is solid-liquid separated by the centrifugal filter 4. The crystals remain in the centrifugal filter 4 and the filtrate is stored in the filtrate tank 5.

  FIG. 2 shows an example of the cleaning method for line 1.

  In the cleaning of the line 1, at least one end portion of the line 1 is used as the introduction port 7a, and at least one end portion of the line 1 excluding the introduction port 7a is used as the discharge port 7b, and the cleaning liquid is vaporized through the introduction port 7a. The cleaning liquid introduced into the line 1 is sequentially discharged from the discharge port 7b.

  As the cleaning liquid, for example, water, a solvent such as methanol or acetone, and the like can be used. The cleaning liquid is appropriately selected according to the substance to be removed to be removed by cleaning, that is, the compound produced in the line 1 and its raw material.

  In the example shown in FIG. 2, one of the plurality of raw material supply ports 7 provided in the pipe 6 a connected to the kettle 2 is an introduction port 7 a, and the filtrate stored in the filtrate tank 5 is used. The end of the pipe 6f that discharges water is a discharge port 7b.

  The introduction port 7a is connected to an evaporation pot 8 for vaporizing the cleaning liquid. The cleaning liquid is vaporized in the evaporation pot 8 and introduced into the line 1 from the evaporation pot 8 in the vaporized state.

  In the example shown in FIG. 2, the cleaning liquid sequentially discharged from the discharge port 7 b and the removal target substance contained therein are collected and discarded by a treatment method suitable for each.

  In the example shown in FIG. 2, a plurality of raw material supply ports 7 which are the end portions of the line 1 excluding the introduction port 7 a and the discharge port 7 b are connected to each other by a piping member 9.

  The cleaning liquid is continuously introduced into the line 1 from the evaporation pot 8 in a vaporized state. The cleaning liquid is circulated through the kettle 2, the condenser 3, the centrifugal filter 4, the filtrate tank 5, and the pipes 6a to 6f of the line 1 in a vaporized state or condensed in the middle, and each part of the line 1 is batched by the forced flow of the cleaning liquid. And washed. Thereby, the work process of the cleaning operation of the line 1 can be simplified and the efficiency can be increased.

  In particular, as shown in the illustrated example, if a plurality of raw material supply ports 7 which are the end portions of the line 1 excluding the introduction port 7a and the discharge port 7b are connected to each other by a piping member 9, these raw material supply ports Since 7 is a non-terminal portion, the cleaning liquid can be sufficiently circulated also to these raw material supply ports 7, which is preferable.

  Then, a fresh cleaning liquid is sequentially introduced into the line 1, and the cleaning liquid in which the substance to be removed is dissolved through the parts of the line 1 is sequentially discharged from the line 1. The cleaning effect can be maintained, and the cleaning liquid in which the removal target substance is dissolved can be suppressed from remaining in the line 1.

  In the above-described example, the raw material supply port 7 that is the upstream end of the line 1 is the introduction port 7a, and the end portion of the pipe 6f that is the downstream end of the line 1 is the discharge port 7b. However, the introduction port 7a and the discharge port 7b can be appropriately set according to the configuration of the line 1, and a part of the line 1 can be used as one washing unit in consideration of airtightness.

  For example, when the airtightness of the centrifugal filter 4 is not ensured in the line 1 described above, only the centrifugal filter 4 is removed from the line 1, the kettle 2 upstream from the centrifugal filter 4, the condenser 3, and the pipes 6 a to 6 d. The airtight line composed of the above can be used as one washing unit, and the airtight line composed of the filtrate tank 5 and the pipes 6e to 6f downstream from the centrifugal filter 4 can be used as one washing unit. .

  FIG. 3 shows another example of the line 1 cleaning method.

  In the example shown in FIG. 3, the cleaning device 10 including the evaporation pot 8 is used, the cleaning liquid sequentially discharged from the discharge port 7 b is collected in the cleaning device 10, and the cleaning liquid is circulated between the cleaning device 10 and the line 1. It is a thing.

  The cleaning device 10 includes an evaporation pot 8 connected to the introduction port 7 a of the line 1, and a backflow prevention unit 11 interposed between the discharge port 7 b of the line 1 and the evaporation pot 8. The backflow prevention unit 11 prevents the cleaning liquid vaporized in the evaporating pot 8 from flowing into the line 1 from the evaporating pot 8 through the discharge port 7b. For example, a pump or a valve can be used.

  Also in this example, the cleaning liquid is continuously introduced into the line 1 from the evaporation pot 8 through the introduction port 7a in the vaporized state, and the kettle 2, the condenser 3 and the centrifugal filter in the line 1 in the vaporized state or in the condensed state on the way. It distribute | circulates to the machine 4, the filtrate tank 5, and the piping 6a-6f, and each part of the line 1 is wash | cleaned collectively by the forced flow of a washing | cleaning liquid.

  The cleaning liquid sequentially discharged from the discharge port 7b is collected in the evaporation pot 8 through the backflow prevention unit 11. Then, the recovered cleaning liquid is vaporized in the evaporation pot 8 and introduced into the line 1 again.

  The substance to be removed is dissolved in the cleaning liquid that has been circulated through each part of the line 1 and collected in the evaporation kettle 8, but the substance to be removed is removed by the vaporization of the collected cleaning liquid in the evaporation kettle 8. Is reintroduced into line 1. Therefore, the cleaning effect of the cleaning liquid distributed in the line 1 is maintained.

  Thus, even if the cleaning liquid is circulated between the cleaning device 10 and the line 1, the cleaning effect of the cleaning liquid distributed in the line 1 can be maintained, which is preferable when using a solvent as the cleaning liquid, for example. This is preferable because the amount of solvent used can be reduced while maintaining the cleaning effect.

  FIG. 4 shows another example of the cleaning method for line 1.

  The cleaning liquid introduced into the line 1 in the vaporized state condenses as it flows through the line 1, but the cleaning efficiency is generally higher in the liquid than in the vaporized state. Therefore, an arbitrary device in the device group constituting the line 1 is cooled, and a device located on the upstream side of the device to be cooled along the flow path of the cleaning liquid is heated as necessary to make the device to be cooled. Thus, the cleaning liquid may be condensed to increase the cleaning efficiency of the apparatus to be cooled.

In the example shown in FIG. 4, first, the shuttle 2 is cooled, and the cleaning liquid is condensed in the shuttle 2 (see FIG. 4A). Thereby, the vapor | steam of a washing | cleaning liquid distribute | circulates from the piping 7a to the introduction part of the shuttle 2, and is wash | cleaned. The washing liquid is condensed in the kettle 2, and the kettle 2, the centrifugal filter 4, the filtrate tank 5, and the discharge port 7b can be washed with the condensed liquid.
Next, the pot 2 is heated, the condenser 3 is cooled, and the condenser 3 is condensed in the condenser 3 (see FIG. 4B). By heating the pot 2, the cleaning liquid flows through the pipe 6 b in the vaporized state and is introduced into the capacitor 3. The cleaning liquid is cooled and condensed in the condenser 3, and the inside of the condenser 3 and the pipe 6 c are washed and returned to the hook 2.
Thus, the cleaning efficiency of the line 1 can be further enhanced by causing the cleaning liquid to be condensed sequentially in each device constituting the line 1.

  The configurations of the line 1, the cleaning apparatus 10, and the cleaning method for the line 1 described above are examples, and appropriate modifications and changes can be made without departing from the scope of the present invention.

  As described above, the following items are disclosed in this specification.

(1) A cleaning method for a line in which a plurality of devices are connected and a fluid is circulated, wherein at least one end of the line is an introduction port, and at least one end of the line excluding the introduction port An evaporation pot for vaporizing the cleaning liquid is connected to the introduction port, the cleaning liquid is introduced into the line in the vaporized state via the introduction port, and the cleaning liquid introduced into the line is discharged to the discharge port. Cleaning method that drains sequentially.
(2) The cleaning method according to (1), wherein the discharge port is connected to the evaporation pot and the cleaning liquid is circulated between the evaporation pot and the line.
(3) The cleaning method according to (1) or (2) above, wherein a plurality of end portions of the line excluding the introduction port and the discharge port are connected to each other using a piping member. A cleaning method for distributing the gas through the line.
(4) A vaporizer connected to an introduction port and a discharge port, which are end portions of a line through which a plurality of devices are connected and through which a fluid flows, and evaporates the cleaning liquid flowing through the line; A backflow prevention unit that prevents a cleaning liquid from flowing into the line from the evaporation pot through the discharge port.
(5) The cleaning apparatus according to (4), wherein the backflow prevention unit is a pump interposed between the evaporation pot and the discharge port.

1 Line 2 Kettle 3 Condenser 4 Centrifugal Filter 5 Filtrate Tanks 6a to 6f Piping 7 Raw Material Supply Port (Terminal)
7a Introduction port 7b Discharge port 8 Evaporation pot 9 Piping member 10 Cleaning device 11 Backflow prevention part

Claims (4)

A cleaning method for a line in which a plurality of devices are connected and a fluid is distributed,
At least one end portion of the line as an introduction port, and at least one end portion of the line excluding the introduction port as an exhaust port,
An evaporation pot for vaporizing the cleaning liquid is connected to the introduction port, and the cleaning liquid is sequentially introduced into the line in the vaporized state through the introduction port,
Wherein by a plurality of sequentially cooling equipment, sequentially causing condensation of sequentially introduced Ru said cleaning liquid vaporized state to the line at each device,
A cleaning method for sequentially discharging the cleaning liquid introduced into the line from the discharge port. The cleaning method according to claim 1,
A cleaning method in which the discharge port is connected to the evaporation pot and the cleaning liquid is circulated between the evaporation pot and the line. A cleaning method according to claim 1 or 2,
A cleaning method in which the cleaning liquid is circulated through the line in a state where a plurality of end portions of the line excluding the introduction port and the discharge port are connected to each other using a piping member. A cleaning method according to any one of claims 1 to 3,
A cleaning method for heating a device located upstream of a device to be cooled among the plurality of devices along the flow path of the cleaning liquid introduced into the line.

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