JP6245741B2 - Construction method for buried structures - Google Patents

Construction method for buried structures Download PDF

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JP6245741B2
JP6245741B2 JP2013241372A JP2013241372A JP6245741B2 JP 6245741 B2 JP6245741 B2 JP 6245741B2 JP 2013241372 A JP2013241372 A JP 2013241372A JP 2013241372 A JP2013241372 A JP 2013241372A JP 6245741 B2 JP6245741 B2 JP 6245741B2
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ground improvement
region
soil
embedded
contaminated
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JP2015101843A (en
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将史 舟川
将史 舟川
佐藤 英二
英二 佐藤
宏 岩本
宏 岩本
岡本 圭史郎
圭史郎 岡本
洋一 泉澤
洋一 泉澤
太郎 長澤
太郎 長澤
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Takenaka Corp
Takenaka Civil Engineering and Construction Co Ltd
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Takenaka Civil Engineering and Construction Co Ltd
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  • Investigation Of Foundation Soil And Reinforcement Of Foundation Soil By Compacting Or Drainage (AREA)
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Description

本発明は、埋設構造物の施工方法に関する。   The present invention relates to a method for constructing a buried structure.

従来から、土壌汚染が認められた汚染区画から土壌汚染が認められていない非汚染区画までを横断するように埋設構造物を埋設する技術の一つとして、例えば、埋設構造物であるソイルセメント壁を汚染区画から非汚染区画までを横断するように複数構築する施工方法であって、これら複数のソイルセメント壁の一部であって、汚染区画と非汚染区画との境界付近に配置される一部を、遮水性を有する遮水部として形成する施工方法が提案されている(例えば、特許文献1参照)。この遮水部は、例えばオールケーシング工法を用いて、汚染区画と非汚染区画との境界付近の土壌を流動化処理土(具体的には泥土モルタル)に置換することにより形成されており、当該遮水部の一部が複数のソイルセメント壁の一部と重複するように配置されている。   Conventionally, as one of the techniques for embedding an embedded structure so as to cross from a contaminated section where soil contamination is recognized to an uncontaminated section where soil contamination is not recognized, for example, a soil cement wall which is an embedded structure A plurality of construction methods for crossing from a contaminated compartment to a non-contaminated compartment, which are part of the plurality of soil cement walls and are arranged near the boundary between the contaminated compartment and the non-contaminated compartment. The construction method which forms a part as a water-impervious part which has water-imperviousness is proposed (for example, refer patent document 1). This impermeable part is formed by replacing the soil in the vicinity of the boundary between the contaminated compartment and the non-contaminated compartment with fluidized soil (specifically, mud mortar) using the all casing method, for example. It arrange | positions so that a part of water part may overlap with a part of some soil cement wall.

特開2013−174086号公報JP 2013-174086 A

しかしながら、上記従来の方法においては、例えば、遮水部に埋設された流動化処理土が締め固まるまで、当該遮水部の一部と重複するように配置されるソイルセメント壁を構築することができないことから、施工時間が長くなるという問題が生じていた。また、遮水部の一部と重複するように配置されるソイルセメント壁を構築する際には、オールケーシング工法を用いて遮水部を形成することを考慮すれば、遮水部を形成した後に当該重複するように配置されるソイルセメント壁を構築することになるので、施工の自由度が低くなるという問題があった。   However, in the conventional method described above, for example, a soil cement wall that is arranged so as to overlap with a part of the impermeable portion can be constructed until the fluidized soil embedded in the impermeable portion is compacted. Since it was not possible, the problem that construction time became long had arisen. In addition, when constructing a soil cement wall that is arranged so as to overlap with a part of the water-impervious part, if considering the formation of the water-impervious part using the all casing method, after forming the water-impervious part Since the soil cement wall arranged so that it overlaps will be constructed, there was a problem that the degree of freedom of construction became low.

本発明は、上記に鑑みてなされたものであって、施工時間を短縮することが可能になると共に、施工の自由度を向上させることが可能になる、埋設構造物の施工方法を提供することを目的とする。   The present invention has been made in view of the above, and provides a method for constructing an embedded structure that enables the construction time to be shortened and the degree of freedom of construction to be improved. With the goal.

上述した課題を解決し、目的を達成するために、請求項1に記載の埋設構造物の施工方法は、土壌が汚染されていない領域である非汚染領域と土壌が汚染されている領域である汚染領域とを含む施工対象領域において、前記非汚染領域から前記汚染領域までを横断するように埋設される埋設構造物を施工する方法であって、前記汚染領域と前記非汚染領域との境界に形成される汚染拡散防止領域であって、前記汚染領域の土壌が前記非汚染領域に拡散することを防止するための汚染拡散防止領域の形成が予定されている形成予定領域の外縁に、当該形成予定領域を外部から区画するための区画壁を埋設する区画壁埋設工程と、前記区画壁埋設工程において前記区画壁が埋設された前記形成予定領域の土壌を取り除く除去工程と、前記除去工程において土壌が取り除かれた前記形成予定領域に健全土を埋設することにより、前記汚染拡散防止領域を形成する形成工程と、前記形成工程において形成された前記汚染拡散防止領域の外縁に埋設された前記区画壁を撤去する撤去工程と、前記埋設構造物の少なくとも一部が前記汚染拡散防止領域に配置されるように、当該埋設構造物を埋設する埋設構造物埋設工程と、を含む。   In order to solve the above-described problems and achieve the object, the construction method of the buried structure according to claim 1 is a non-contaminated area where the soil is not contaminated and an area where the soil is contaminated. In a construction target area including a contaminated area, a method of constructing an embedded structure that is embedded so as to cross from the non-contaminated area to the contaminated area, the boundary between the contaminated area and the non-contaminated area A contamination diffusion prevention region to be formed, which is formed on the outer edge of the formation planned region where the formation of a contamination diffusion prevention region for preventing the soil of the contamination region from diffusing into the non-contamination region is formed. A partition wall burying step of burying a partition wall for partitioning the planned region from the outside, a removing step of removing soil in the planned formation region where the partition wall is embedded in the partition wall burying step, and the removing step Embedded in the formation planned region where the soil was removed in the formation step, forming the contamination diffusion prevention region, and embedded in the outer edge of the contamination diffusion prevention region formed in the formation step A removal step of removing the partition wall, and a buried structure burying step of burying the buried structure so that at least a part of the buried structure is disposed in the contamination diffusion prevention region.

また、請求項2に記載の埋設構造物の施工方法は、請求項1に記載の埋設構造物の施工方法において、前記非汚染領域から前記汚染領域に向かう方向に略沿って並設される複数の地盤改良体であって、当該複数の地盤改良体の各々の一部が隣接する他の地盤改良体の一部と相互に重複するように配置される複数の地盤改良体を埋設する地盤改良体埋設工程を含み、前記地盤改良体埋設工程の一部を前記埋設構造物埋設工程として行うことにより、前記複数の地盤改良体の一部を前記埋設構造物として埋設する。   Moreover, the construction method of the embedded structure according to claim 2 is the construction method of the embedded structure according to claim 1, wherein a plurality of the embedded structure are arranged substantially along a direction from the non-contaminated region to the contaminated region. A ground improvement body in which a plurality of ground improvement bodies are arranged so that a part of each of the plurality of ground improvement bodies overlaps with a part of another adjacent ground improvement body. Including a body burying step, a part of the ground improvement body burying step is performed as the buried structure burying step, thereby burying a part of the plurality of ground improvement bodies as the buried structure.

また、請求項3に記載の埋設構造物の施工方法は、請求項2に記載の埋設構造物の施工方法において、前記埋設構造物として埋設する前記地盤改良体は、前記汚染領域に至らない領域に配置される地盤改良体と、当該地盤改良体に隣接する地盤改良体であって前記汚染領域に至る領域に配置される地盤改良体とを含み、前記撤去工程において前記区画壁を撤去した後、前記埋設構造物埋設工程において、前記汚染領域に至らない領域に配置される前記地盤改良体を埋設した後に、前記汚染領域に至る領域に配置される前記地盤改良体を埋設する。   Moreover, the construction method of the buried structure according to claim 3 is the construction method of the buried structure according to claim 2, wherein the ground improvement body buried as the buried structure does not reach the contamination area. And a ground improvement body that is adjacent to the ground improvement body and is disposed in an area that reaches the contaminated area, and after removing the partition wall in the removal step In the buried structure burying step, after the ground improvement body arranged in the area not reaching the contaminated area is buried, the ground improvement body arranged in the area reaching the contaminated area is buried.

また、請求項4に記載の埋設構造物の施工方法は、請求項2又は3に記載の埋設構造物の施工方法において、前記地盤改良体埋設工程においては、前記複数の地盤改良体を、前記非汚染領域から前記汚染領域に向けて順次埋設する。   Moreover, the construction method of the buried structure according to claim 4 is the construction method of the buried structure according to claim 2 or 3, wherein the plurality of ground improvement bodies in the ground improvement body burying step, Embedding sequentially from the non-contaminated area to the contaminated area.

また、請求項5に記載の埋設構造物の施工方法は、請求項1から4のいずれか一項に記載の埋設構造物の施工方法において、前記形成工程においては、前記形成予定領域の地表面が前記非汚染領域及び前記汚染領域の地表面と略面一になるまで前記健全土を埋設するのに必要な土量から、前記埋設構造物埋設工程において前記埋設構造物が埋設される際に排出される土の土量を減算した量の前記健全土を、前記形成予定領域に埋設する。   Moreover, the construction method of the embedded structure according to claim 5 is the construction method of the embedded structure according to any one of claims 1 to 4, wherein in the formation step, the ground surface of the planned formation region When the embedded structure is embedded in the embedded structure embedding step, the amount of soil necessary for embedding the healthy soil until the non-contaminated area and the ground surface of the contaminated area are substantially flush with each other. The amount of the healthy soil obtained by subtracting the amount of soil discharged is embedded in the planned formation area.

請求項1に記載の埋設構造物の施工方法によれば、形成工程において、非汚染領域と汚染領域との境界に、健全土を埋設することにより汚染拡散防止領域を形成し、埋設構造物埋設工程において、埋設構造物の少なくとも一部が汚染拡散防止領域に配置されるように、当該埋設構造物を埋設するので、非汚染領域から汚染領域までを横断するように埋設構造物を埋設する場合でも、汚染領域の汚染された土壌が非汚染領域へ拡散することを防止できる。特に、汚染拡散防止領域が形成された直後でも埋設構造物を埋設できることから、従来方法に比べて施工時間を短縮することが可能となる。また、例えば、埋設構造物が、非汚染領域及び汚染拡散防止領域にわたって配置される第1の埋設構造物と、汚染拡散防止領域のみに配置される第2の埋設構造物と、汚染拡散防止領域及び汚染領域にわたって配置される第3の埋設構造物とを含む場合に、汚染拡散防止領域が形成された後に第1の埋設構造物、第2の埋設構造物、第3の埋設構造物を非汚染領域から汚染領域に向けて順次埋設したり、あるいは、汚染拡散防止領域が形成された後に第2の埋設構造物を埋設し、その後第1の埋設構造物、第3の埋設構造物を埋設することができることから、従来方法に比べて施工の自由度を向上させることが可能となる。   According to the construction method of the buried structure according to claim 1, in the forming step, the pollution diffusion prevention region is formed by embedding healthy soil at the boundary between the non-contaminated region and the contaminated region, and the buried structure is buried. In the process, since the embedded structure is embedded so that at least a part of the embedded structure is disposed in the pollution diffusion prevention area, the embedded structure is embedded so as to cross from the non-contaminated area to the contaminated area. However, the contaminated soil in the contaminated area can be prevented from diffusing into the non-contaminated area. In particular, since the buried structure can be buried immediately after the contamination diffusion prevention region is formed, the construction time can be shortened as compared with the conventional method. Further, for example, the first embedded structure in which the embedded structure is disposed over the non-contaminated region and the contamination diffusion prevention region, the second embedded structure disposed only in the contamination diffusion prevention region, and the contamination diffusion prevention region. And the third embedded structure disposed over the contaminated area, the first embedded structure, the second embedded structure, and the third embedded structure are not made after the contamination diffusion prevention area is formed. Embed in order from the contaminated area to the contaminated area, or bury the second embedded structure after the contamination diffusion prevention area is formed, and then embed the first embedded structure and the third embedded structure Therefore, the degree of freedom in construction can be improved as compared with the conventional method.

請求項2に記載の埋設構造物の施工方法によれば、地盤改良体埋設工程の一部を埋設構造物埋設工程として行うことにより、複数の地盤改良体の一部を埋設構造物として埋設するので、複数の地盤改良体を汚染拡散防止領域に埋設する場合でも、汚染領域の汚染された土壌が非汚染領域へ拡散することを防止できる。   According to the construction method of the buried structure according to claim 2, a part of the ground improvement body is buried as a buried structure by performing a part of the ground improvement body burying process as a buried structure burying process. Therefore, even when a plurality of ground improvement bodies are embedded in the pollution diffusion prevention region, it is possible to prevent the soil contaminated with the contamination region from diffusing into the non-pollution region.

請求項3に記載の埋設構造物の施工方法によれば、撤去工程において区画壁を撤去した後、埋設構造物埋設工程において、汚染領域に至らない領域に配置される地盤改良体を埋設した後に、汚染領域に至る領域に配置される地盤改良体を埋設するので、複数の地盤改良体のうち、埋設構造物として埋設される地盤改良体の各々の一部が隣接する地盤改良体の一部と相互に重複するように、当該地盤改良体を埋設する場合でも、汚染領域の汚染された土壌が汚染領域と非汚染領域との境界を越えて拡散することを防止できる。   According to the construction method of the buried structure according to claim 3, after removing the partition wall in the removal process, after burying the ground improvement body arranged in the area that does not reach the contaminated area in the buried structure burying process. Since the ground improvement body arranged in the area leading to the contaminated area is buried, among the plurality of ground improvement bodies, each of the ground improvement bodies embedded as buried structures is a part of the adjacent ground improvement body Even when the ground improvement body is buried so as to overlap with each other, it is possible to prevent the contaminated soil in the contaminated area from spreading beyond the boundary between the contaminated area and the non-contaminated area.

請求項4に記載の埋設構造物の施工方法によれば、複数の地盤改良体を、非汚染領域から汚染領域に向けて順次埋設するので、汚染領域から非汚染領域に向けて順次埋設する場合に比べて汚染領域の汚染された土壌が非汚染領域へ拡散することを防止できる。また、複数の地盤改良体をランダムな順序で埋設する場合に比べて効率良く埋設できるため、施工性を向上させることが可能となる。   According to the construction method of the buried structure according to claim 4, since the plurality of ground improvement bodies are buried sequentially from the non-contaminated area toward the contaminated area, the case where they are sequentially embedded from the contaminated area toward the non-contaminated area. Compared with this, it is possible to prevent the contaminated soil in the contaminated area from diffusing into the non-contaminated area. Moreover, since it can embed efficiently compared with the case where a several ground improvement body is embed | buried in random order, it becomes possible to improve workability | operativity.

請求項5に記載の埋設構造物の施工方法によれば、除去工程後の形成予定領域を面一するのに必要な土量から、汚染拡散防止領域に配置される埋設構造物が埋設される際に排出される土の土量を減算した量の健全土を、形成予定領域に埋設するので、形成工程において形成予定領域に埋設する健全土の土量を減らすことができるため、例えば、形成工程における健全土の埋設に対する作業負荷を軽減することが可能となる。   According to the construction method of the buried structure according to claim 5, the buried structure to be arranged in the pollution diffusion prevention region is buried from the amount of soil necessary for flushing the formation scheduled region after the removal step. Since the amount of healthy soil subtracted from the amount of soil discharged in the process is embedded in the planned formation region, the amount of healthy soil embedded in the planned formation region in the formation process can be reduced. It becomes possible to reduce the work load for burying healthy soil in the process.

本実施の形態に係る施工対象領域の概要を示す平面図である。It is a top view which shows the outline | summary of the construction object area | region which concerns on this Embodiment. 図1における領域Aの拡大図である。It is an enlarged view of the area | region A in FIG. 図2のB−B矢視断面図である。It is a BB arrow sectional view of Drawing 2. 埋設構造物の施工方法における区画壁埋設工程を示す平面図である。It is a top view which shows the partition wall embedding process in the construction method of an embedded structure. 図4のC−C矢視断面図である。It is CC sectional view taken on the line of FIG. 埋設構造物の施工方法における除去工程を示す平面図である。It is a top view which shows the removal process in the construction method of a buried structure. 図6のD−D矢視断面図である。It is DD sectional view taken on the line of FIG. 埋設構造物の施工方法における形成工程を示す平面図である。It is a top view which shows the formation process in the construction method of a buried structure. 図8のE−E矢視断面図である。It is EE arrow sectional drawing of FIG. 埋設構造物の施工方法における撤去工程を示す平面図である。It is a top view which shows the removal process in the construction method of a buried structure. 図10のF−F矢視断面図である。It is FF arrow sectional drawing of FIG. 形成工程及び後述する撤去工程が終了した後の状況を示す平面図である。It is a top view which shows the condition after the formation process and the removal process mentioned later are complete | finished. 図12のG−G矢視断面図である。It is GG arrow sectional drawing of FIG. 埋設構造物の施工方法の地盤改良体埋設工程を示す平面図である。It is a top view which shows the ground improvement body embedding process of the construction method of an embedded structure. 図14のH−H矢視断面図である。It is HH arrow sectional drawing of FIG. 埋設構造物の施工方法の地盤改良体埋設工程を示す平面図である。It is a top view which shows the ground improvement body embedding process of the construction method of an embedded structure. 図16のI−I矢視断面図である。It is II sectional view taken on the line of FIG. 地盤改良体40a〜40lの埋設手順を示す図である。It is a figure which shows the embedding procedure of the ground improvement bodies 40a-40l. 実験Aの実験結果を示すグラフであって、改良体のpHの測定結果と、改良体から水平方向に沿って50mm離れた場所に位置する周辺土のpHの測定結果と、改良体から水平方向に沿って100mm離れた場所に位置する周辺土のpHの測定結果とを示すグラフである。It is a graph which shows the experimental result of experiment A, Comprising: The measurement result of pH of an improved body, the measurement result of pH of the surrounding soil located in the place 50 mm away from the improved body in the horizontal direction, and horizontal direction from an improved body It is a graph which shows the measurement result of pH of the surrounding soil located in the place 100 mm away along. 実験Bの実験結果を示すグラフであって、改良土のpHの測定結果と、改良土の真下に位置する未改良土のpHの測定結果とを示すグラフである。It is a graph which shows the experimental result of Experiment B, Comprising: It is a graph which shows the measurement result of pH of improved soil, and the measurement result of pH of unmodified soil located just under improved soil.

以下、本発明に係る埋設構造物の施工方法の実施の形態について図面を参照しつつ詳細に説明する。ただし、この実施の形態によって本発明が限定されるものではない。   Hereinafter, an embodiment of a construction method for an embedded structure according to the present invention will be described in detail with reference to the drawings. However, the present invention is not limited by this embodiment.

(本実施の形態の基本的概念)
まずは、本実施の形態の基本的概念について説明する。本実施の形態は、概略的に、土壌が汚染されていない領域である非汚染領域と土壌が汚染されている領域である汚染領域とを含む施工対象領域に埋設される埋設構造物の施工方法に関するものである。
(Basic concept of the present embodiment)
First, the basic concept of this embodiment will be described. The present embodiment is generally a method for constructing an embedded structure embedded in a construction target region including a non-contaminated region that is a region where soil is not contaminated and a contaminated region that is a region where soil is contaminated. It is about.

ここで、「汚染されている」とは、土壌中に重金属、揮発性有機化合物、農薬等の有害物質が人や生態系に対して影響を及ぼす程度に含まれている状態を意味する(なお、当該意味は、状況に応じて異なる意味に変更されてもよい。また、後述する「汚染されていない」の意味についても同様とする)。また、「汚染されていない」とは、土壌中に上記有害物質が人や生態系に対して影響を及ぼさない程度に含まれている状態、又は、土壌中に上記有害物質が含まれていない状態を意味する。また、「埋設構造物」とは、少なくとも一部が地中に埋設される構造物を意味する。この「埋設構造物」は、例えば、地盤改良体、水道管やガス管等の配管、トンネル用のボックスカルバート等を含む概念であるが、本実施の形態では、土壌の強度を向上させるための地盤改良体として説明する。   Here, “contaminated” means a state where heavy metals, volatile organic compounds, pesticides and other harmful substances are contained in the soil to such an extent that they affect humans and ecosystems. The meaning may be changed to a different meaning depending on the situation, and the same applies to the meaning of “not contaminated” described later). In addition, “not contaminated” means that the above hazardous substances are contained in the soil to such an extent that they do not affect humans and ecosystems, or the above hazardous substances are not contained in the soil. Means state. Further, the “embedded structure” means a structure that is at least partially embedded in the ground. This “buried structure” is a concept including, for example, a ground improvement body, pipes such as water pipes and gas pipes, box culverts for tunnels, etc., but in this embodiment, it is for improving the strength of the soil. It will be described as a ground improvement body.

また、この埋設構造物の施工方法の適用対象については任意であるが、本実施の形態では、商業施設の建設が予定されている工場跡地の液状化対策を行うために、当該工場跡地に地盤改良体を埋設することにより地盤改良を行う工事に適用する場合について説明する。ただし、これに限られず、例えば、工場施設と、当該工場施設と隣接する施設とをつなぐ配管を埋設する工事や、所定量以上の農薬が残存している農地の跡地を含む用地に、ボックスカルバートを埋設することによってトンネルを建設する工事等に適用されてもよい。   In addition, the application target of the construction method of the buried structure is arbitrary, but in this embodiment, in order to take measures against liquefaction of the factory site where the commercial facility is scheduled to be built, The case where it applies to the construction which improves the ground by burying the improved body is explained. However, the present invention is not limited to this. For example, a box culvert may be installed on a site that includes a plant facility and a pipe that connects the plant facility and a facility adjacent to the plant facility or a farmland site where a predetermined amount or more of agricultural chemicals remain. The present invention may be applied to construction for constructing a tunnel by burying.

(本実施の形態の具体的内容)
次に、本実施の形態の具体的内容について説明する。
(Specific contents of this embodiment)
Next, specific contents of the present embodiment will be described.

(構成−施工対象領域)
最初に、本実施の形態に係る埋設構造物が施工される施工対象領域の構成について説明する。図1は、本実施の形態に係る施工対象領域の概要を示す平面図である。図2は、図1における領域Aの拡大図である。図3は、図2のB−B矢視断面図である。なお、以下の説明では、図1のX方向を施工対象領域の右方向、図1のX’方向を施工対象領域の左方向、図1のY方向を施工対象領域の後方向、図1のY’方向を施工対象領域の前方向、図3のZ方向を施工対象領域の上方向、図3のZ’方向を施工対象領域の下方向とする。ここで、図1〜図3において、後述する各基準不適合区画20の外縁(又は、基準適合区画10と基準不適合区画20との境界)を想像線で示している(なお、後述する図4〜図17についても同様とする)。また、図1、図2において、後述する汚染拡散防止領域30を斜線で示している(なお、後述する図12〜図16についても同様とする)。
(Configuration-construction target area)
Initially, the structure of the construction object area | region where the buried structure which concerns on this Embodiment is constructed is demonstrated. FIG. 1 is a plan view showing an outline of a construction target area according to the present embodiment. FIG. 2 is an enlarged view of region A in FIG. 3 is a cross-sectional view taken along line BB in FIG. In the following description, the X direction in FIG. 1 is the right direction of the construction target area, the X ′ direction in FIG. 1 is the left direction of the construction target area, the Y direction in FIG. The Y ′ direction is the forward direction of the construction target area, the Z direction of FIG. 3 is the upward direction of the construction target area, and the Z ′ direction of FIG. 3 is the downward direction of the construction target area. Here, in FIG. 1 to FIG. 3, the outer edge of each reference nonconforming section 20 (or the boundary between the reference conforming section 10 and the reference nonconforming section 20), which will be described later, is indicated by an imaginary line. The same applies to FIG. 17). 1 and 2, the contamination diffusion prevention region 30 described later is indicated by hatching (the same applies to FIGS. 12 to 16 described later).

図1に示すように、この施工対象領域1は、工場跡地であり、当該施工対象領域1の周囲が鋼製の仮囲い(図示省略)等によって囲まれている。また、この施工対象領域1は、基準適合区画10と、基準不適合区画20と、汚染拡散防止領域30とを含んでいる。   As shown in FIG. 1, the construction target area 1 is a factory site, and the construction target area 1 is surrounded by a temporary steel enclosure (not shown). The construction target area 1 includes a reference conforming section 10, a reference nonconforming section 20, and a contamination diffusion preventing area 30.

(構成−施工対象領域−基準適合区画及び基準不適合区画)
基準適合区画10は、施工対象領域1における土壌が汚染されていない非汚染領域に設けられた区画である。また、基準不適合区画20は、施工対象領域1における土壌が汚染されている汚染領域に設けられた区画である。この基準不適合区画20には、基準不適合区画20の汚染された土壌が外部へ拡散することを抑制するための設備が設けられることが好ましく、例えば、基準不適合区画20に散水設備、仮囲い、敷き鉄板等が設けられてもよい。
(Configuration-construction target area-standard conforming section and standard nonconforming section)
The reference conforming section 10 is a section provided in a non-contaminated area where the soil in the construction target area 1 is not contaminated. Moreover, the reference | standard nonconforming division 20 is a division provided in the contamination area | region where the soil in the construction object area | region 1 is contaminated. It is preferable that the nonconforming section 20 is provided with equipment for suppressing the soil contaminated with the nonconforming section 20 from diffusing to the outside. For example, the nonconforming section 20 has a watering facility, a temporary enclosure, and a floor. An iron plate or the like may be provided.

ここで、基準不適合区画20の決定方法については任意であるが、例えば、現地測量によって施工対象領域1を法令等で定められたサイズの格子(具体的には縦10m×横10mの格子)で区切り、各格子内から採取された土壌(具体的には、各格子内の少なくとも1つ以上の地点から採取された土壌)を用いて公知の表層土壌調査を行い、この公知の表層土壌調査の結果から土壌汚染が認められた格子を基準不適合区画20として認定するという方法等が該当する。   Here, although the method for determining the reference nonconforming section 20 is arbitrary, for example, the construction target region 1 is a grid of a size determined by laws and regulations by local surveying (specifically, a grid of 10 m in length and 10 m in width). Perform a known surface soil survey using the soil sampled from each grid (specifically, soil collected from at least one point in each grid). The method of certifying the lattice in which soil contamination is recognized from the result as the reference nonconforming section 20 is applicable.

(構成−施工対象領域−汚染拡散防止領域)
汚染拡散防止領域30は、基準不適合区画20の土壌が基準適合区画10に拡散することを防止するための領域である。この汚染拡散防止領域30は、基準適合区画10と基準不適合区画20との境界に形成されている。ここで、「基準適合区画10と基準不適合区画20との境界に形成されている」とは、汚染拡散防止領域30が基準適合区画10と基準不適合区画20との境界をまたぐ周辺領域に形成されていること、又は汚染拡散防止領域30が上記境界よりも基準不適合区画20側に配置された周辺領域であって、当該汚染拡散防止領域30の一部が上記境界に隣接する周辺領域に形成されていることを意味するが、本実施の形態では、前者の意味として説明する。
(Configuration-Construction target area-Pollution diffusion prevention area)
The contamination diffusion prevention area 30 is an area for preventing the soil of the reference nonconforming section 20 from diffusing into the reference conforming section 10. The contamination diffusion prevention region 30 is formed at the boundary between the reference conforming section 10 and the reference nonconforming section 20. Here, “formed at the boundary between the reference conforming section 10 and the reference nonconforming section 20” means that the contamination diffusion prevention region 30 is formed in a peripheral region that crosses the boundary between the reference conforming section 10 and the reference nonconforming section 20. Or a contamination diffusion prevention region 30 is a peripheral region arranged closer to the reference nonconforming section 20 than the boundary, and a part of the contamination diffusion prevention region 30 is formed in a peripheral region adjacent to the boundary. In this embodiment, the former meaning will be described.

また、この汚染拡散防止領域30の具体的な形状については、汚染拡散防止領域30の平面形状については、例えば、後述する地盤改良体40の平面形状よりも大きな形状に設定されており(あるいは、後述する地盤改良体40の平面形状と略同一に設定されてもよい)、具体的には直径1,200m程度の略円形状に設定されている。また、汚染拡散防止領域30の深さについては、後述する地盤改良体40の上下方向の長さと略同一に設定されており、具体的には11,000mm〜16,000mmに設定されている。   Moreover, about the specific shape of this pollution diffusion prevention area | region 30, about the planar shape of the pollution diffusion prevention area | region 30, for example, it is set to a shape larger than the planar shape of the ground improvement body 40 mentioned later (or It may be set substantially the same as the planar shape of the ground improvement body 40 described later), specifically, it is set to a substantially circular shape with a diameter of about 1,200 m. Further, the depth of the contamination diffusion preventing region 30 is set to be substantially the same as the length in the vertical direction of the ground improvement body 40 described later, specifically, 11,000 mm to 16,000 mm.

また、この汚染拡散防止領域30の形成方法については任意であるが、例えば、後述する形成予定領域31の土壌を取り除いた後に健全土を埋設することにより形成する方法等が採用されている。ここで、「健全土」とは、汚染されていない土を意味し、例えば公知の土壌洗浄機等で洗浄処理された洗浄土、基準適合区画10内の土、あるいは、これらを混合した土等を含む概念である。   A method for forming the contamination diffusion prevention region 30 is arbitrary. For example, a method of forming the soil by embedding healthy soil after removing soil in the formation planned region 31 described later is employed. Here, “healthy soil” means soil that has not been contaminated. For example, washed soil that has been washed with a known soil washing machine or the like, soil in the standard-adapted section 10, or a mixture thereof. It is a concept that includes

(構成−地盤改良体)
次に、地盤改良体40の構成について説明する。図1に示すように、施工対象領域1には、複数の地盤改良体40が左右方向に略沿って埋設されていると共に、前後方向に略沿って埋設されている。ここで、複数の地盤改良体40の構成の詳細については、複数の地盤改良体40は相互に同一のものであるが、以下では、複数の地盤改良体40の中の地盤改良体40a〜40lであって、図2、図3に示す地盤改良体40a〜40lに着目して説明する(なお、地盤改良体40a〜40lは、相互に区別する必要がない場合には「地盤改良体40」と総称する)。
(Configuration-ground improvement body)
Next, the configuration of the ground improvement body 40 will be described. As shown in FIG. 1, a plurality of ground improvement bodies 40 are embedded substantially along the left-right direction and embedded along the front-rear direction in the construction target region 1. Here, regarding the details of the configuration of the plurality of ground improvement bodies 40, the plurality of ground improvement bodies 40 are the same as each other, but in the following, the ground improvement bodies 40a to 40l in the plurality of ground improvement bodies 40 will be described. Then, explanation will be made by paying attention to the ground improvement bodies 40a to 40l shown in FIGS. 2 and 3 (in the case where the ground improvement bodies 40a to 40l do not need to be distinguished from each other, “the ground improvement body 40”). Generically).

地盤改良体40a〜40lは、施工対象領域1の土壌の強度を高めるためのものである。例えば、図2、図3に示すように、地盤改良体40a〜40lは、略長尺状の柱状体にて形成されており、基準適合区画10から基準不適合区画20までを横断するように左右方向に略沿って並設されている。具体的には、地盤改良体40a〜40dは基準適合区画10に配置され、地盤改良体40e、40fは基準適合区画10及び汚染拡散防止領域30にわたって配置され、地盤改良体40gは汚染拡散防止領域30及び基準不適合区画20にわたって配置され、地盤改良体40h〜40lは基準不適合区画20に配置されている。より具体的には、地盤改良体40a〜40lの各々の一部が隣接する地盤改良体40の一部と相互に重複するように(より具体的には、100mm〜200mm程度相互に重複するように)、当該地盤改良体40a〜40lは配置されている。   The ground improvement bodies 40a-40l are for raising the intensity | strength of the soil of the construction object area | region 1. As shown in FIG. For example, as shown in FIG. 2 and FIG. 3, the ground improvement bodies 40 a to 40 l are formed of substantially elongated columnar bodies, and left and right so as to cross from the reference conforming section 10 to the reference nonconforming section 20. They are juxtaposed along the direction. Specifically, the ground improvement bodies 40a to 40d are disposed in the reference conforming section 10, the ground improvement bodies 40e and 40f are disposed over the reference conforming section 10 and the pollution diffusion prevention area 30, and the ground improvement body 40g is disposed in the pollution diffusion prevention area. 30 and the reference nonconforming section 20, and the ground improvement bodies 40 h to 40 l are arranged in the reference nonconforming section 20. More specifically, a part of each of the ground improvement bodies 40a to 40l overlaps with a part of the adjacent ground improvement body 40 (more specifically, about 100 mm to 200 mm). Ii) The ground improvement bodies 40a to 40l are arranged.

ここで、地盤改良体40の具体的な形状については任意であり、例えば、地盤改良体40の平面形状については、地盤改良体40の強度及び安定性が得られる形状にて設定されることが望ましく、具体的には直径1,000mmの略円形状に設定されている。また、地盤改良体40の上下方向の長さについては、地盤改良体40が埋設された際に、当該地盤改良体40の下端面と地下水が浸透しにくい地層2(具体的には、厚さが0.5m以上で、かつ透水係数が毎秒1μm以下である準不透水層等)とが当接可能となるように設定されることが望ましく、具体的には11,000mm〜16,000mmに設定されている。   Here, the specific shape of the ground improvement body 40 is arbitrary. For example, the planar shape of the ground improvement body 40 may be set to a shape that provides the strength and stability of the ground improvement body 40. Specifically, it is set to a substantially circular shape with a diameter of 1,000 mm. Moreover, about the length of the vertical direction of the ground improvement body 40, when the ground improvement body 40 is embed | buried, the bottom layer of the said ground improvement body 40 and the stratum 2 (specifically thickness is difficult to osmose | permeate). Is preferably set so as to be able to come into contact with a semi-impervious layer having a water permeability coefficient of 1 μm or less per second, specifically 11,000 mm to 16,000 mm. Is set.

また、地盤改良体40の形成方法については任意であるが、例えば、セメント系の固化材等を含む安定剤(以下、「安定剤」と称する)と現地の土とを攪拌し、当該攪拌したものを固化することにより形成する方法等が採用されている。なお、地盤改良体40a〜40lのうち、地盤改良体40e〜40gは、特許請求の範囲における「埋設構造物」に対応する。   The formation method of the ground improvement body 40 is arbitrary, but, for example, a stabilizer containing cement-based solidifying material or the like (hereinafter referred to as “stabilizer”) and local soil are stirred, and the stirring is performed. A method of forming by solidifying a material is employed. In addition, among the ground improvement bodies 40a-40l, the ground improvement bodies 40e-40g respond | correspond to the "buried structure" in a claim.

(埋設構造物の施工方法)
次に、本実施の形態に係る埋設構造物の施工方法について説明する。図4は、後述する埋設構造物の施工方法における区画壁埋設工程を示す平面図である。図5は、図4のC−C矢視断面図である。図6は、後述する埋設構造物の施工方法における除去工程を示す平面図である。図7は、図6のD−D矢視断面図である。図8は、後述する埋設構造物の施工方法における形成工程を示す平面図である。図9は、図8のE−E矢視断面図である。図10は、後述する埋設構造物の施工方法における撤去工程を示す平面図である。図11は、図10のF−F矢視断面図である。図12は、後述する形成工程及び後述する撤去工程が終了した後の状況を示す平面図である。図13は、図12のG−G矢視断面図である。図14は、後述する埋設構造物の施工方法の地盤改良体埋設工程を示す平面図である。図15は、図14のH−H矢視断面図である。図16は、後述する埋設構造物の施工方法の地盤改良体埋設工程を示す平面図である。図17は、図16のI−I矢視断面図である。図4から図17に示すように、本実施の形態に係る埋設構造物の施工方法は、区画壁埋設工程と、除去工程と、形成工程と、撤去工程と、地盤改良体埋設工程とを含んでいる。
(Construction method for buried structures)
Next, the construction method of the buried structure according to the present embodiment will be described. FIG. 4 is a plan view showing a partition wall burying step in the construction method of the buried structure to be described later. 5 is a cross-sectional view taken along the line CC in FIG. FIG. 6 is a plan view showing a removal step in the construction method of the buried structure to be described later. 7 is a cross-sectional view taken along the line DD in FIG. FIG. 8 is a plan view showing a forming step in the construction method of the embedded structure to be described later. FIG. 9 is a cross-sectional view taken along the line E-E in FIG. 8. FIG. 10: is a top view which shows the removal process in the construction method of the embedded structure mentioned later. 11 is a cross-sectional view taken along line FF in FIG. FIG. 12 is a plan view showing a situation after a forming process and a removing process described later are completed. 13 is a cross-sectional view taken along the line GG in FIG. FIG. 14: is a top view which shows the ground improvement body embedding process of the construction method of the embedded structure mentioned later. 15 is a cross-sectional view taken along line HH in FIG. FIG. 16: is a top view which shows the ground improvement body embedding process of the construction method of the embedded structure mentioned later. 17 is a cross-sectional view taken along the line II in FIG. As shown in FIGS. 4 to 17, the embedded structure construction method according to the present embodiment includes a partition wall burying step, a removing step, a forming step, a removing step, and a ground improvement body burying step. It is out.

このうち、「区画壁埋設工程」は、形成予定領域31に後述する区画壁50を埋設する工程である。ここで、「形成予定領域31」とは、施工対象領域1において汚染拡散防止領域30の形成が予定されている領域を意味する。この形成予定領域31は、本実施の形態では、汚染拡散防止領域30が形成される前の施工対象領域1において、基準適合区画10と基準不適合区画20との境界をまたぐ周辺領域に形成されている。また、この形成予定領域31の具体的な形状については、例えば、汚染拡散防止領域30の形状と略同一の形状にて設定されており、具体的には、形成予定領域31の平面形状については、直径1,000mmの略円形状に設定され、形成予定領域31の上下方向の長さについては、11,000mm〜16,000mmに設定されている。また、「除去工程」は、形成予定領域31の土壌を取り除く工程である。また、「形成工程」は、汚染拡散防止領域30を形成する工程である。また、「撤去工程」は、後述する区画壁50を撤去する工程である。また、「地盤改良体埋設工程」は、複数の地盤改良体40を埋設する工程である。以下では、複数の地盤改良体40のうち、図2に示す地盤改良体40a〜40lを施工対象領域1に埋設する場合における各工程の詳細について順に説明する。   Among these, the “partition wall burying step” is a step of burying a partition wall 50 to be described later in the formation planned region 31. Here, the “formation scheduled region 31” means a region in the construction target region 1 where the contamination diffusion prevention region 30 is scheduled to be formed. In the present embodiment, the planned formation region 31 is formed in a peripheral region across the boundary between the reference conforming section 10 and the reference nonconforming section 20 in the construction target region 1 before the contamination diffusion preventing region 30 is formed. Yes. In addition, the specific shape of the planned formation region 31 is set, for example, in substantially the same shape as the shape of the contamination diffusion prevention region 30. Specifically, the planar shape of the planned formation region 31 is The length of the formation region 31 in the vertical direction is set to 11,000 mm to 16,000 mm. Further, the “removal step” is a step of removing the soil in the formation planned region 31. The “forming step” is a step of forming the contamination diffusion prevention region 30. Further, the “removal step” is a step of removing a partition wall 50 described later. The “ground improvement body burying step” is a step of burying a plurality of ground improvement bodies 40. Below, among the several ground improvement bodies 40, the detail of each process in the case of embedding the ground improvement bodies 40a-40l shown in FIG.

(埋設構造物の施工方法−区画壁埋設工程)
まず、区画壁埋設工程について説明する。図4、図5に示すように、区画壁埋設工程においては、形成予定領域31の外縁に区画壁50が埋設される。
(Construction method for buried structure-partition wall burying process)
First, the partition wall embedding process will be described. As shown in FIGS. 4 and 5, in the partition wall embedding step, the partition wall 50 is embedded at the outer edge of the formation planned region 31.

ここで、「区画壁50」とは、形成予定領域31内の汚染された土壌が基準適合区画10に拡散しないようにするために、形成予定領域31を外部から区画するための壁体であり、例えば、略管状のケーシング等を含む概念である。この区画壁50の具体的な形状については任意であるが、区画壁50の平面形状については、例えば、汚染拡散防止領域30の外縁形状と略同一に設定されており、具体的には、区画壁50の内径=1,180mm、区画壁50の外径=1,200mmの略円環状に設定されている。また、区画壁50の上下方向の長さについては、例えば汚染拡散防止領域30の上下方向の長さと略同一に設定されており、具体的には11,000mm〜16,000mmに設定されている。また、この区画壁50の材質については任意であるが、例えば、区画壁50が埋設された際に、区画壁50内の汚染された土壌や地下水等が外部へ拡散することを防止できるように、遮水性を有する材質が望ましく、例えば鋼材等にて形成されている。   Here, the “partition wall 50” is a wall body for partitioning the formation region 31 from the outside in order to prevent the contaminated soil in the formation region 31 from diffusing into the reference conforming region 10. For example, it is a concept including a substantially tubular casing. The specific shape of the partition wall 50 is arbitrary, but the planar shape of the partition wall 50 is set to be substantially the same as the outer edge shape of the contamination diffusion prevention region 30, for example. The inner diameter of the wall 50 is set to 1,180 mm, and the outer diameter of the partition wall 50 is set to a substantially annular shape of 1,200 mm. The vertical length of the partition wall 50 is set to be substantially the same as the vertical length of the contamination diffusion prevention region 30, for example, specifically, 11,000 mm to 16,000 mm. . The material of the partition wall 50 is arbitrary. For example, when the partition wall 50 is buried, it is possible to prevent the contaminated soil or groundwater in the partition wall 50 from diffusing outside. A material having a water barrier property is desirable, for example, a steel material.

また、この区画壁50の埋設方法については任意であるが、例えば、区画壁50がセットされた公知の揺動圧入機(図示省略)を形成予定領域31近傍に据え付けた後、この公知の揺動圧入機によって区画壁50を形成予定領域31の外縁に対して揺動圧入(例えば回転圧入等)することにより埋設する方法等が採用されている。   The partition wall 50 may be embedded in any method. For example, after installing a known rocking press (not shown) on which the partition wall 50 is set in the vicinity of the formation planned region 31, this known rocking press is installed. A method of embedding the partition wall 50 by oscillating press-fitting (for example, rotary press-fitting or the like) with respect to the outer edge of the planned formation region 31 by a dynamic press-fitting machine is employed.

(埋設構造物の施工方法−除去工程)
次に、除去工程について説明する。図6、図7に示すように、除去工程においては、区画壁埋設工程において区画壁50が埋設された形成予定領域31の土壌が取り除かれる。具体的には、公知の掘削機(図示省略)によって、区画壁50内の土壌が所定深さ(例えば、地盤改良体40の上下方向の長さと略同一となる深さ等)まで掘削され、当該掘削された土が外部へ排出される。なお、この外部へ排出される土が、基準適合区画10から排出された土と基準不適合区画20から排出された土とに分離可能である場合には、例えば、当該基準適合区画10から排出された土は、形成工程において用いられる健全土として利用され、当該基準不適合区画20から排出された土は、車両等によって所定の汚染処理施設に搬送された後に、当該所定の汚染処理施設にて浄化処理されることが望ましい。一方、この外部へ排出される土が、基準適合区画10から排出された土と基準不適合区画20から排出された土とに分離不可能である場合には、当該外部へ排出される土は、車両等によって所定の汚染処理施設に搬送された後に、当該所定の汚染処理施設にて浄化処理されることが望ましい。
(Embedded structure construction method-removal process)
Next, the removal process will be described. As shown in FIGS. 6 and 7, in the removing step, the soil of the formation scheduled region 31 in which the partition wall 50 is embedded in the partition wall burying step is removed. Specifically, the soil in the partition wall 50 is excavated by a known excavator (not shown) to a predetermined depth (for example, a depth substantially equal to the vertical length of the ground improvement body 40). The excavated soil is discharged to the outside. In addition, when the soil discharged to the outside can be separated into the soil discharged from the standard conforming section 10 and the soil discharged from the standard nonconforming section 20, for example, the soil discharged from the standard conforming section 10 is discharged. The soil is used as healthy soil used in the formation process, and the soil discharged from the non-standard-conforming section 20 is transported to a predetermined contamination treatment facility by a vehicle or the like and then purified at the predetermined contamination treatment facility. It is desirable to be processed. On the other hand, when the soil discharged to the outside cannot be separated into the soil discharged from the standard conforming section 10 and the soil discharged from the standard nonconforming section 20, the soil discharged to the outside is It is desirable that after being transported to a predetermined contamination treatment facility by a vehicle or the like, the purification treatment is performed in the predetermined contamination treatment facility.

ここで、区画壁50内の土壌の掘削方法については任意であるが、例えば、区画壁50内の土壌の掘削深さが地下水の水位よりも低くなる場合には、公知の揚水機(図示省略)を用いて形成予定領域31及びその周辺領域に存在する地下水を揚水することで地下水の水位を低下させた後に、区画壁50内の土壌を掘削する方法等が採用されることが望ましい(なお、後述する地盤改良体埋設工程における一対の攪拌軸下杭60を貫入する作業についても同様とする)。この方法により、地下水によって基準不適合区画20の汚染土が拡散することを防止することが可能となる。なお、この方法において、公知の揚水機によって揚水された地下水は、例えば、下水排除基準に適合していることが確認された場合には下水道等に排出され、下水排除基準に適合していないと確認された場合には車両等によって所定の汚染処理施設に搬送された後に、当該所定の汚染処理施設にて浄化処理されることが望ましい。   Here, the method for excavating the soil in the partition wall 50 is arbitrary. For example, when the soil excavation depth in the partition wall 50 is lower than the groundwater level, a known pump (not shown) It is desirable to adopt a method of excavating the soil in the partition wall 50 after lowering the groundwater level by pumping up the groundwater existing in the planned formation region 31 and its surrounding region using The same applies to the operation of penetrating the pair of stirring shaft lower piles 60 in the ground improvement body burying step described later). By this method, it becomes possible to prevent the contaminated soil in the nonconforming section 20 from diffusing due to groundwater. In this method, groundwater pumped by a known pump is discharged into the sewer, etc., for example, when it is confirmed that it conforms to the sewage exclusion standard. When confirmed, it is desirable that after being transported to a predetermined contamination treatment facility by a vehicle or the like, the purification treatment is performed at the predetermined contamination treatment facility.

(埋設構造物の施工方法−形成工程、撤去工程)
次いで、形成工程及び撤去工程について説明する。図8、図9、図12、図13に示すように、形成工程においては、除去工程において土壌が取り除かれた形成予定領域31に健全土が埋設されることにより、汚染拡散防止領域30が形成される。そして、図10から図13に示すように、撤去工程においては、形成工程において形成された汚染拡散防止領域30の外縁に埋設された区画壁50が引き抜かれることにより、当該区画壁50が撤去される。
(Construction method for buried structures-formation process, removal process)
Then, a formation process and a removal process are demonstrated. As shown in FIGS. 8, 9, 12, and 13, in the formation process, the contamination diffusion prevention region 30 is formed by burying healthy soil in the formation planned region 31 from which the soil has been removed in the removal step. Is done. Then, as shown in FIGS. 10 to 13, in the removal process, the partition wall 50 embedded in the outer edge of the contamination diffusion prevention region 30 formed in the formation process is pulled out, so that the partition wall 50 is removed. The

具体的には、本実施の形態のように、区画壁50の埋設深さが比較的深い場合には、以下に示すように、形成工程及び撤去工程が交互に行われることが望ましい。すなわち、まず、図8、図9に示すように、区画壁50内に所定量の健全土(例えば、形成予定領域31の地表面が1,000mm程度高くなる量の健全土)が投入され、当該投入された健全土が散水等によって締め固められることで埋設される。次に、図10、図11に示すように、区画壁50の下端部のみが当該埋設された健全土の上部に被る程度の高さ(例えば、800mm〜900mm程度)まで、当該区画壁50が上記公知の揺動圧入機によって引き上げられる(なお、区画壁50が引き上げられたことによって生じた隙間には、健全土が埋め込まれる)。続いて、上記締め固められた健全土の上方に、区画壁50内に所定量の健全土がさらに投入され、当該投入された健全土が締め固められることで埋設された後、区画壁50が上記健全土に被る程度の高さまで引き上げられる。そして、上述した一連の作業が、図12、図13に示すように、形成予定領域31の地表面が基準適合区画10及び基準不適合区画20の地表面と略面一となり、且つ、区画壁50が完全に引き抜かれるまで繰り返される。   Specifically, when the embedding depth of the partition wall 50 is relatively deep as in the present embodiment, it is desirable that the formation process and the removal process are alternately performed as described below. That is, first, as shown in FIGS. 8 and 9, a predetermined amount of healthy soil (for example, the amount of healthy soil in which the ground surface of the formation planned region 31 is increased by about 1,000 mm) is input into the partition wall 50. The filled soil is buried by being compacted by watering or the like. Next, as shown in FIGS. 10 and 11, the partition wall 50 has a height (e.g., about 800 mm to 900 mm) to the extent that only the lower end portion of the partition wall 50 covers the embedded healthy soil. It is pulled up by the above-mentioned known rocking press-fitting machine (in addition, healthy soil is embedded in the gap generated by pulling up the partition wall 50). Subsequently, a predetermined amount of healthy soil is further introduced into the partition wall 50 above the compacted healthy soil, and after the filled healthy soil is compacted, the partition wall 50 is It is raised to a height that covers the above-mentioned healthy soil. 12 and 13, the ground surface of the planned formation region 31 is substantially flush with the ground surfaces of the reference conforming section 10 and the reference nonconforming section 20, and the partition wall 50 Repeat until is completely pulled out.

このように、汚染拡散防止領域30は、形成予定領域31に健全土が埋設されることにより形成されるので、汚染拡散防止領域30が形成された直後でも地盤改良体40e〜40gを埋設できることから、従来方法に比べて施工時間を短縮することが可能となる。そしてさらに、形成工程及び撤去工程が交互に行われることで、形成工程後に撤去工程が行われる場合に比べて、区画壁50が引き上げられた際に、区画壁50と当該区画壁50内に埋設された健全土との間で生じる摩擦力によって、当該埋設された健全土が共上がりすることを抑制できる。   Thus, since the contamination diffusion prevention area 30 is formed by burying healthy soil in the formation planned area 31, the ground improvement bodies 40e to 40g can be embedded immediately after the contamination diffusion prevention area 30 is formed. The construction time can be shortened as compared with the conventional method. Further, by alternately performing the formation process and the removal process, the partition wall 50 and the partition wall 50 are embedded when the partition wall 50 is pulled up, compared to the case where the removal process is performed after the formation process. It is possible to prevent the buried healthy soil from rising together by the frictional force generated between the soil and the healthy soil.

(埋設構造物の施工方法−地盤改良体埋設工程)
続いて、地盤改良体埋設工程について説明する。図2、図3、図14から図17に示すように、地盤改良体埋設工程においては、撤去工程において区画壁50が撤去された後、左右方向に略沿って並設される地盤改良体40a〜40lであって、当該地盤改良体40a〜40lの各々の一部が隣接する他の地盤改良体40の一部と相互に重複するように配置される地盤改良体40a〜40lが埋設される。
(Construction method of buried structure-ground improvement body burying process)
Subsequently, the ground improvement body burying step will be described. As shown in FIGS. 2, 3, and 14 to 17, in the ground improvement body embedding process, after the partition wall 50 is removed in the removal process, the ground improvement body 40 a that is arranged substantially along the left-right direction. The ground improvement bodies 40a to 40l are arranged so that a part of each of the ground improvement bodies 40a to 40l overlaps with a part of the other adjacent ground improvement bodies 40. .

具体的には、本実施の形態では、以下に示す手順にしたがって、地盤改良体40a〜40lが埋設される。図18は、地盤改良体40a〜40lの埋設手順を示す図である。図18に示すように、まず、公知の地盤改良処理機器に装着されている一対の攪拌軸下杭60が、施工対象領域1における隣接する2つの地盤改良体40が配置される位置にそれぞれ据え付けられる(図18(a)参照)。次に、上記一対の攪拌軸下杭60の各々によって、外部から注入された安定剤と対応する地盤改良体40が配置される位置の土とが攪拌されながら、当該一対の攪拌軸下杭60の各々が貫入される(図18(b)参照)。次いで、上記一対の攪拌軸下杭60の各々が所定深さまで貫入されると、この公知の地盤改良処理機器によって、当該一対の攪拌軸下杭60の各々の先端部分と対向する地表面に対して先端処理が行われる(図18(c)参照)。ここで、「先端処理」とは、上記一対の攪拌軸下杭60の各々の先端部分と対向する地表面の強度を高めるための処理であって、例えば、当該地表面に対してセメントミルクを噴射する処理等が該当する。次に、上記一対の攪拌軸下杭60によって、上記安定剤と上記対応する地盤改良体40が配置される位置の土とが攪拌されながら、当該一対の攪拌軸下杭60がそれぞれ引き抜かれる(図18(d)参照)。その後、この攪拌されたものが固化することにより、2つの地盤改良体40が埋設される。続いて、この公知の地盤改良処理機器が、施工対象領域1における他の隣接する2つの地盤改良体40が配置される位置近傍に据え付けられた後(図18(e)参照)、上述したように、上記一対の攪拌軸下杭60の貫入、上記先端処理、上記一対の攪拌軸下杭60の引き抜き等の作業が行われる。この場合において、例えば、上記他の隣接する2つの地盤改良体40の少なくともいずれか1つの一部が既設の地盤改良体40の一部と重複する位置で作業が行われる場合には、上記一対の攪拌軸下杭60のうち既設の地盤改良体40側の攪拌軸下杭60が、当該既設の地盤改良体40の側部を切削しながら貫入される。次いで、上述した先端処理が行われた後、上記安定剤と、上記対応する地盤改良体40が配置される位置の土と、切削された既設の地盤改良体40の破片とが攪拌されながら、上記一対の攪拌軸下杭60が引き抜かれる。その後、この攪拌されたものが固化することにより、上記他の隣接する2つの地盤改良体40が埋設されると共に、当該他の隣接する2つの地盤改良体40のうち既設の地盤改良体40の一部と重複している地盤改良体40と当該既設の地盤改良体40とが一体化される。そして、上述した一連の作業が、図2、図3に示すように、地盤改良体40a〜40lがすべて埋設されるまで繰り返し行われる。   Specifically, in the present embodiment, ground improvement bodies 40a to 40l are embedded according to the following procedure. FIG. 18 is a diagram illustrating a procedure for burying the ground improvement bodies 40a to 40l. As shown in FIG. 18, first, a pair of stirring shaft lower piles 60 mounted on a known ground improvement processing device are respectively installed at positions where two adjacent ground improvement bodies 40 in the construction target region 1 are arranged. (See FIG. 18A). Next, while each of the pair of stirring shaft lower piles 60 is agitated between the stabilizer injected from the outside and the soil where the corresponding ground improvement body 40 is disposed, the pair of stirring shaft lower piles 60 Are penetrated (see FIG. 18B). Next, when each of the pair of stirring shaft lower piles 60 is penetrated to a predetermined depth, the known ground improvement processing device causes the pair of stirring shaft lower piles 60 to face the ground surface facing the tip portions of the pair of stirring shaft lower piles 60. The tip processing is performed (see FIG. 18C). Here, the “tip treatment” is a treatment for increasing the strength of the ground surface facing the tip portion of each of the pair of stirring shaft lower piles 60. For example, cement milk is applied to the ground surface. The process etc. which inject are applicable. Next, the pair of stirring shaft lower piles 60 are respectively pulled out while the stabilizer and the soil at the position where the corresponding ground improvement body 40 is disposed are stirred by the pair of stirring shaft lower piles 60 ( (Refer FIG.18 (d)). Then, the two ground improvement bodies 40 are embed | buried when this stirred thing solidifies. Subsequently, after this known ground improvement processing device is installed in the vicinity of the position where the other two adjacent ground improvement bodies 40 are arranged in the construction target area 1 (see FIG. 18 (e)), as described above. In addition, operations such as penetration of the pair of stirring shaft lower piles 60, the tip treatment, and extraction of the pair of stirring shaft lower piles 60 are performed. In this case, for example, when the work is performed at a position where at least one of the other two adjacent ground improvement bodies 40 overlaps with a part of the existing ground improvement body 40, the pair of The stirring shaft lower pile 60 on the existing ground improvement body 40 side is penetrated while cutting the side part of the existing ground improvement body 40. Next, after the above-described tip treatment is performed, the stabilizer, the soil at the position where the corresponding ground improvement body 40 is disposed, and the cut pieces of the existing ground improvement body 40 are stirred, The pair of stirring shaft lower piles 60 are pulled out. Thereafter, the agitated material is solidified, whereby the other two adjacent ground improvement bodies 40 are embedded, and of the other adjacent two ground improvement bodies 40, the existing ground improvement body 40 The ground improvement body 40 which overlaps with a part and the existing ground improvement body 40 are integrated. And a series of work mentioned above is repeatedly performed until all the ground improvement bodies 40a-40l are embed | buried as shown in FIG. 2, FIG.

ここで、地盤改良体40a〜40lの埋設順序については、本実施の形態のように、地盤改良体40a〜40lの各々の一部が隣接する地盤改良体40の一部と相互に重複するように、当該地盤改良体40a〜40lが埋設される場合でも、基準不適合区画20の汚染された土壌が基準適合区画10と基準不適合区画20との境界を越えて拡散することを防止できる順序で埋設される。例えば、図14から図17に示すように、少なくとも一部が汚染拡散防止領域30と重複する位置に埋設される地盤改良体40e〜40g(埋設構造物)の中に、基準不適合区画20に至らない領域に配置される地盤改良体40fと、当該地盤改良体40fに隣接する地盤改良体40gであって基準不適合区画20に至る領域に配置される地盤改良体40gとが含まれている場合には、地盤改良体40fが埋設された後に地盤改良体40gが埋設される順序で、地盤改良体40a〜40lが埋設される。ここで、「基準不適合区画20に至らない領域」とは、例えば、汚染拡散防止領域30や、汚染拡散防止領域30及び基準適合区画10にわたる領域等が該当する。また、「基準不適合区画20に至る領域」とは、例えば、汚染拡散防止領域30及び基準不適合区画20にわたる領域等が該当する。   Here, as to the embedding order of the ground improvement bodies 40a to 40l, a part of each of the ground improvement bodies 40a to 40l overlaps with a part of the adjacent ground improvement body 40 as in the present embodiment. In addition, even when the ground improvement bodies 40a to 40l are buried, they are buried in an order that can prevent the contaminated soil of the reference nonconforming section 20 from spreading beyond the boundary between the reference conforming section 10 and the reference nonconforming section 20. Is done. For example, as shown in FIG. 14 to FIG. 17, the ground non-conformity section 20 is reached in the ground improvement bodies 40 e to 40 g (embedded structure) embedded at a position at least partially overlapping with the pollution diffusion prevention region 30. When the ground improvement body 40f arrange | positioned in the area | region which does not exist, and the ground improvement body 40g which is the ground improvement body 40g adjacent to the said ground improvement body 40f, and is arrange | positioned to the area | region which reaches | attains the reference | standard nonconformity division 20 are included. The ground improvement bodies 40a to 40l are embedded in the order in which the ground improvement body 40g is embedded after the ground improvement body 40f is embedded. Here, the “region that does not reach the reference nonconforming section 20” corresponds to, for example, the contamination diffusion prevention region 30, the region extending over the contamination diffusion prevention region 30 and the reference conformation section 10, or the like. Further, the “region reaching the reference nonconforming section 20” corresponds to, for example, an area extending over the contamination diffusion preventing area 30 and the reference nonconforming section 20.

具体的には、本実施の形態では、上述したように、上記一対の攪拌軸下杭60によって、2つの地盤改良体40が同時に埋設されることから、地盤改良体40a〜40lは、基準適合区画10から基準不適合区画20に向けて順次2つずつ埋設される(より具体的には、図14、図15に示すように、地盤改良体40e、40fが埋設された後に、図16、図17に示すように、地盤改良体40g、40hが埋設される等)。このような順序で地盤改良体40a〜40lを埋設することで、基準不適合区画20から基準適合区画10に向けて順次埋設する場合に比べて基準不適合区画20の汚染された土壌が基準適合区画10へ拡散することを防止できる。また、地盤改良体40a〜40lをランダムな順序で埋設する場合に比べて効率良く埋設できるため、施工性を向上させることが可能となる。なお、このような地盤改良体埋設工程のうち、地盤改良体40e〜40gが埋設される工程は、特許請求の範囲における「埋設構造物埋設工程」に対応する。これにて、埋設構造物の施工方法は終了する。   Specifically, in the present embodiment, as described above, since the two ground improvement bodies 40 are buried at the same time by the pair of stirring shaft lower piles 60, the ground improvement bodies 40a to 40l are adapted to the standard. Two sections are embedded sequentially from the section 10 toward the reference nonconforming section 20 (more specifically, as shown in FIGS. 14 and 15, after the ground improvement bodies 40e and 40f are embedded, FIG. As shown in FIG. 17, the ground improvement bodies 40g and 40h are buried, etc.). By embedding the ground improvement bodies 40a to 40l in this order, the contaminated soil in the reference nonconforming section 20 is compared with the reference conforming section 10 as compared to the case of sequentially embedding from the standard nonconforming section 20 toward the reference conforming section 10. Can be prevented from diffusing. Moreover, since the ground improvement bodies 40a-40l can be embedded efficiently compared with the case where it embeds in random order, it becomes possible to improve workability. In addition, among such ground improvement body embedding processes, the process of embedding the ground improvement bodies 40e to 40g corresponds to the “buried structure embedding process” in the claims. Thus, the construction method for the buried structure is completed.

(実験結果)
次に、地盤改良体40に関するpHの測定試験の実験結果について説明する。ここで、「pHの測定試験」とは、所定期間経過後の地盤改良体40及びその周辺領域のpHを測定する試験である。また、以下では、非特許文献(「セメント系固化材による地盤改良マニュアル」、(社)セメント協会、p.58)に示す2つの実験(以下では、「実験A」、「実験B」と称する)の実験結果について説明する。
(Experimental result)
Next, experimental results of a pH measurement test related to the ground improvement body 40 will be described. Here, the “pH measurement test” is a test for measuring the pH of the ground improvement body 40 and its surrounding area after a predetermined period. In the following, two experiments (hereinafter referred to as “Experiment A” and “Experiment B”) shown in non-patent literature (“Ground improvement manual using cement-based solidification material”, (Cement Corporation), p. 58) ) Will be described.

まず、「実験A」の実験結果について説明する。図19は、実験Aの実験結果を示すグラフであって、改良体(本発明の地盤改良体40に相当)のpHの測定結果と、改良体から水平方向に沿って50mm離れた場所に位置する周辺土のpHの測定結果と、改良体から水平方向に沿って100mm離れた場所に位置する周辺土のpHの測定結果とを示すグラフであり、横軸は改良体の材齢、縦軸はpH測定値を示す。この実験Aは、改良体と上記周辺土とに関するpH測定値の経年変化(具体的には、改良体の材齢0年〜10年までの経年変化)を調査した実験である。図19に示すように、実験Aの実験結果から、改良体の材齢が10年経過したとしても、上記各種の周辺土におけるpH測定値の変動が小さく、ほぼ中性を示していることがわかった。   First, the experimental result of “Experiment A” will be described. FIG. 19 is a graph showing the experimental results of Experiment A, the measurement results of the pH of the improved body (corresponding to the ground improved body 40 of the present invention), and a position 50 mm away from the improved body in the horizontal direction. It is a graph which shows the measurement result of pH of the surrounding soil to be measured, and the measurement result of pH of the surrounding soil located 100 mm away from the improved body in the horizontal direction, the horizontal axis is the age of the improved body, the vertical axis Indicates a measured pH value. This experiment A is an experiment in which the secular change (specifically, the secular change from 0 years to 10 years of age of the improved body) of the pH measurement values regarding the improved body and the surrounding soil is investigated. As shown in FIG. 19, from the experimental results of Experiment A, even when the age of the improved body has passed 10 years, the fluctuations of the pH measurement values in the various surrounding soils are small and almost neutral. all right.

次に、実験Bの実験結果について説明する。図20は、実験Bの実験結果を示すグラフであって、改良土(本発明の地盤改良体40に相当)のpHの測定結果と、改良土の真下に位置する未改良土のpHの測定結果とを示すグラフであり、横軸はpHの測定値、縦軸は深度及びpHの測定値(図20では、「pH」と示す)を示す。この実験Bは、材齢2年9ヶ月経過した改良土と上記未改良土とに関するpHの測定値を調査した実験である。図20に示すように、実験Bの実験結果から、改良体の材齢が2年9ヶ月経過すると、上記未改良土における深度−30mmから−40mmに至る範囲において、pHの測定値が急激に低下していることがわかった。また、上記未改良土における−40mmから−90mmに至る範囲においては、ほぼ中性を示していることがわかった。   Next, the experimental result of Experiment B will be described. FIG. 20 is a graph showing the experimental results of Experiment B. The measurement results of the pH of the improved soil (corresponding to the ground improvement body 40 of the present invention) and the measurement of the pH of the unmodified soil located directly under the improved soil. FIG. 20 is a graph showing the results, in which the horizontal axis represents the measured value of pH, and the vertical axis represents the measured value of depth and pH (shown as “pH” in FIG. 20). This experiment B is an experiment in which the measured values of pH regarding the improved soil after 2 years and 9 months of age and the unmodified soil were investigated. As shown in FIG. 20, when the age of the improved body is 2 years and 9 months from the experimental result of Experiment B, the measured value of the pH suddenly increases in the range from -30 mm to -40 mm in the unmodified soil. It turns out that it is falling. Moreover, it turned out that it is almost neutral in the range from -40 mm to -90 mm in the unmodified soil.

このように、上述した実験A、実験Bの実験結果が得られた要因としては、空気中の炭酸ガスによる炭酸化や降雨等の影響によって改良体(又は改良土)の表面からアルカリ成分が溶脱した場合でも、改良体(又は改良土)周辺の土の緩衝作用が働くことによって、当該アルカリ成分の拡散が抑制されたためと言える。このことから、例えば、本発明に係る地盤改良体40a〜40lのうち、埋設構造物として埋設される地盤改良体40fであって、基準不適合区画20に至る領域に配置される地盤改良体40fが埋設された場合に、この地盤改良体40fのアルカリ成分の溶脱に伴って当該地盤改良体40fに含まれる有害物質が外部に漏出したとしても、当該地盤改良体40f周辺の土の緩衝作用が働くことによって、当該有害物質の拡散が抑制されるものと考えられる。   As described above, the reason why the above experimental results of Experiment A and Experiment B were obtained is that the alkaline component is leached from the surface of the improved body (or improved soil) due to carbonation by the carbon dioxide gas in the air, rainfall, or the like. Even in this case, it can be said that the diffusion of the alkali component is suppressed by the buffering action of the soil around the improved body (or improved soil). From this, for example, among the ground improvement bodies 40a to 40l according to the present invention, the ground improvement body 40f embedded as an embedded structure, and the ground improvement body 40f disposed in the region reaching the reference nonconforming section 20 is provided. When buried, even if the harmful substances contained in the ground improvement body 40f leak to the outside due to the leaching of the alkaline component of the ground improvement body 40f, the buffering action of the soil around the ground improvement body 40f works. Therefore, it is considered that the diffusion of the harmful substance is suppressed.

(効果)
このように本実施の形態によれば、形成工程において、基準適合区画10と基準不適合区画20との境界に、健全土を埋設することにより汚染拡散防止領域30を形成し、埋設構造物埋設工程において、地盤改良体40e〜40gの少なくとも一部が汚染拡散防止領域30に配置されるように、当該地盤改良体40e〜40gを埋設するので、基準適合区画10から基準不適合区画20までを横断するように地盤改良体40e〜40gを埋設する場合でも、基準不適合区画20の汚染された土壌が基準適合区画10へ拡散することを防止できる。特に、汚染拡散防止領域30が形成された直後でも地盤改良体40e〜40gを埋設できることから、従来方法に比べて施工時間を短縮することが可能となる。
(effect)
As described above, according to the present embodiment, in the formation process, the contamination diffusion prevention region 30 is formed by embedding healthy soil at the boundary between the standard conforming section 10 and the standard nonconforming section 20, and the embedded structure embedding process. , Since the ground improvement bodies 40e to 40g are embedded so that at least a part of the ground improvement bodies 40e to 40g is arranged in the pollution diffusion prevention region 30, the ground improvement bodies 10e to 40g are crossed from the reference conforming section 10 to the reference nonconforming section 20. Thus, even when the ground improvement bodies 40e to 40g are embedded, it is possible to prevent the contaminated soil in the reference nonconforming section 20 from diffusing into the reference conforming section 10. In particular, since the ground improvement bodies 40e to 40g can be embedded immediately after the contamination diffusion prevention region 30 is formed, the construction time can be shortened as compared with the conventional method.

また、地盤改良体埋設工程の一部を埋設構造物埋設工程として行うことにより、地盤改良体40a〜40lのうち地盤改良体40e〜40gを埋設構造物として埋設するので、地盤改良体40e〜40gを汚染拡散防止領域30に埋設する場合でも、基準不適合区画20の汚染された土壌が基準適合区画10へ拡散することを防止できる。   Moreover, since the ground improvement bodies 40e-40g are embed | buried as a buried structure among the ground improvement bodies 40a-40l by performing a part of ground improvement body burying process as a buried structure burying process, the ground improvement bodies 40e-40g. Even when the soil is buried in the pollution diffusion prevention region 30, it is possible to prevent the contaminated soil in the reference nonconforming section 20 from diffusing into the reference conforming section 10.

また、撤去工程において区画壁50を撤去した後、埋設構造物埋設工程において、基準不適合区画20に至らない領域に配置される地盤改良体40e、40fを埋設した後に、地盤改良体40e、40fと隣接する地盤改良体40g、40hを埋設するので、地盤改良体40a〜40lのうち、埋設構造物として埋設される地盤改良体40e〜40gの各々の一部が隣接する地盤改良体40の一部と相互に重複するように、当該地盤改良体40e〜40gを埋設する場合でも、基準不適合区画20の汚染された土壌が基準不適合区画20と基準適合区画10との境界を越えて拡散することを防止できる。   In addition, after removing the partition wall 50 in the removal process, after burying the ground improvement bodies 40e and 40f arranged in the area not reaching the reference nonconforming section 20 in the buried structure burying process, the ground improvement bodies 40e and 40f Since the adjacent ground improvement bodies 40g and 40h are embedded, among the ground improvement bodies 40a to 40l, a part of each of the ground improvement bodies 40e to 40g embedded as an embedded structure is a part of the adjacent ground improvement body 40. Even when the ground improvement bodies 40e to 40g are buried so as to overlap with each other, the contaminated soil of the reference nonconforming section 20 is diffused beyond the boundary between the reference nonconforming section 20 and the reference conforming section 10. Can be prevented.

また、地盤改良体埋設工程においては、地盤改良体40a〜40lを、基準適合区画10から基準不適合区画20に向けて順次埋設するので、基準不適合区画20から基準適合区画10に向けて順次埋設する場合に比べて基準不適合区画20の汚染された土壌が基準適合区画10へ拡散することを防止できる。また、地盤改良体40a〜40lをランダムな順序で埋設する場合に比べて効率良く埋設できるため、施工性を向上させることが可能となる。   Further, in the ground improvement body embedding process, the ground improvement bodies 40a to 40l are sequentially embedded from the standard conforming section 10 toward the standard nonconforming section 20, so that they are sequentially embedded from the standard nonconforming section 20 to the standard conforming section 10. Compared to the case, it is possible to prevent the contaminated soil in the nonconforming section 20 from diffusing into the conforming section 10. Moreover, since the ground improvement bodies 40a-40l can be embedded efficiently compared with the case where it embeds in random order, it becomes possible to improve workability.

〔実施の形態に対する変形例〕
以上、本発明に係る実施の形態について説明したが、本発明の具体的な構成及び手段は、特許請求の範囲に記載した各発明の技術的思想の範囲内において、任意に改変及び改良することができる。以下、このような変形例について説明する。
[Modifications to Embodiment]
Although the embodiments of the present invention have been described above, the specific configuration and means of the present invention can be arbitrarily modified and improved within the scope of the technical idea of each invention described in the claims. Can do. Hereinafter, such a modification will be described.

(解決しようとする課題や発明の効果について)
まず、発明が解決しようとする課題や発明の効果は、上述の内容に限定されるものではなく、発明の実施環境や構成の細部に応じて異なる可能性があり、上述した課題の一部のみを解決したり、上述した効果の一部のみを奏することがある。例えば、埋設構造物埋設工程において、埋設構造物の少なくとも一部が汚染拡散防止領域30に配置されるように、当該埋設構造物を埋設することを従来より正確に実施できない場合であっても、当該埋設構造物の埋設を従来とは異なる技術により従来と同様に達成できている場合には、本願発明の課題が解決されている。
(About problems to be solved and effects of the invention)
First, the problems to be solved by the invention and the effects of the invention are not limited to the above contents, and may vary depending on the implementation environment and details of the configuration of the invention. May be solved, or only some of the effects described above may be achieved. For example, in the buried structure burying process, even if it is not possible to embed the buried structure more accurately than in the past so that at least a part of the buried structure is disposed in the pollution diffusion prevention region 30, In the case where the burying of the embedded structure can be achieved in the same manner as before by a technique different from the conventional technique, the problem of the present invention has been solved.

(汚染拡散防止領域の平面形状について)
上記実施の形態では、汚染拡散防止領域30の平面形状については、略円形状に形成されていると説明したが、これに限られず、例えば、略三角形状、略四角形状、略五角形状等の方形状にて形成されてもよい。また、汚染拡散防止領域30が上記境界よりも基準不適合区画20側の周辺領域であって、当該汚染拡散防止領域30の一部が上記境界に隣接する周辺領域に形成されている場合には、略方形状や略半円状にて形成されてもよい。この場合において、区画壁50の平面形状については、汚染拡散防止領域30の平面形状に応じた形状にて形成され、例えば、汚染拡散防止領域30の平面形状が略四角形状の場合には、略四角形環状にて形成される。
(About the planar shape of the pollution diffusion prevention area)
In the above embodiment, the planar shape of the contamination diffusion prevention region 30 has been described as being formed in a substantially circular shape, but is not limited to this, for example, a substantially triangular shape, a substantially rectangular shape, a substantially pentagonal shape, or the like. It may be formed in a square shape. Further, when the contamination diffusion prevention region 30 is a peripheral region closer to the reference nonconforming section 20 than the boundary, and a part of the contamination diffusion prevention region 30 is formed in a peripheral region adjacent to the boundary, It may be formed in a substantially square shape or a substantially semicircular shape. In this case, the planar shape of the partition wall 50 is formed in a shape corresponding to the planar shape of the contamination diffusion prevention region 30. For example, when the planar shape of the contamination diffusion prevention region 30 is a substantially square shape, It is formed in a square ring shape.

(区画壁について)
上記実施の形態では、区画壁50は、略円管状のケーシングであると説明したが、これに限られず、例えば、複数の鋼矢板を隙間なく並設することにより形成された土留め壁等であってもよい。この場合において、区画壁50の埋設方法については任意であるが、例えば、区画壁50がセットされた公知の杭打ち機が形成予定領域31近傍に据え付けた後、この公知の杭打ち機によって、区画壁50を形成予定領域31の外縁に打ち込むことにより埋設する方法等が採用されてもよい。
(Regional wall)
In the said embodiment, although the division wall 50 demonstrated that it was a substantially cylindrical casing, it is not restricted to this, For example, with the earth retaining wall etc. which were formed by arranging several steel sheet piles in parallel without a gap There may be. In this case, the method for embedding the partition wall 50 is arbitrary. For example, after a known pile driving machine in which the partition wall 50 is set is installed in the vicinity of the formation planned region 31, by this known pile driver, For example, a method of embedding the partition wall 50 by driving it into the outer edge of the region 31 to be formed may be employed.

(地盤改良体について)
上記実施の形態では、埋設構造物として埋設する地盤改良体40の個数が複数であると説明したが(具体的には、地盤改良体40e〜40gが該当する)、これに限られず、埋設構造物として埋設する地盤改良体40の個数が単数であってもよい。
(About ground improvement)
In the said embodiment, although it demonstrated that the number of the ground improvement bodies 40 embed | buried as a buried structure was plural (specifically, ground improvement bodies 40e-40g correspond), it is not restricted to this, A buried structure The number of ground improvement bodies 40 to be embedded as an object may be singular.

また、上記実施の形態では、地盤改良体40の平面形状が略円形状にて形成されていると説明したがこれに限られず、例えば、略三角形状、略四角形状等の方形状であってもよく、あるいは、略楕円状や略扇形状であってもよい。   In the above embodiment, the planar shape of the ground improvement body 40 has been described as being formed in a substantially circular shape, but is not limited thereto, and is, for example, a rectangular shape such as a substantially triangular shape or a substantially rectangular shape. Alternatively, it may be substantially elliptical or substantially fan-shaped.

(埋設構造物の施工方法について)
上記実施の形態では、区画壁埋設工程と、除去工程と、形成工程と、撤去工程と、地盤改良体埋設工程とが順次行われると説明したが、これに限られない。例えば、施工対象領域1に基準適合区画10と基準不適合区画20との境界が複数存在する場合には、当該複数の境界において区画壁埋設工程と、除去工程と、形成工程と、撤去工程とが行われることで、当該複数の境界のすべてに汚染拡散防止領域30が先行して形成された後に、当該複数の境界において地盤改良体埋設工程が行われることで、地盤改良体40が埋設されてもよい。
(About construction method of buried structure)
In the above-described embodiment, it has been described that the partition wall burying step, the removing step, the forming step, the removing step, and the ground improvement body burying step are sequentially performed, but the present invention is not limited thereto. For example, when there are a plurality of boundaries between the reference conforming section 10 and the reference nonconforming section 20 in the construction target region 1, a partition wall embedding process, a removing process, a forming process, and a removing process are performed at the plurality of boundaries. By being performed, after the pollution diffusion prevention area 30 is formed in advance on all of the plurality of boundaries, the ground improvement body 40 is embedded by performing the ground improvement body embedding process at the plurality of boundaries. Also good.

(形成工程、撤去工程について)
上記実施の形態では、形成工程及び撤去工程が交互に行われると説明したが、これに限られない。例えば、区画壁50の埋設深さが比較的浅い場合には、形成工程が行われた後、撤去工程が行われてもよい。
(About formation process and removal process)
In the said embodiment, although demonstrated that the formation process and the removal process were performed alternately, it is not restricted to this. For example, when the embedding depth of the partition wall 50 is relatively shallow, the removal process may be performed after the formation process is performed.

また、上記実施の形態では、形成工程においては、区画壁50内の地表面が基準適合区画10及び基準不適合区画20の地表面と略面一となるまで、健全土が区画壁50内に埋設されると説明したが、これに限られない。例えば、形成予定領域31の地表面が基準適合区画10及び基準不適合区画20の地表面と略面一になるまで健全土を埋設するのに必要な土量から、埋設構造物埋設工程において埋設構造物として埋設する地盤改良体40e〜40gの少なくとも一部が埋設される際に排出される土の土量を減算した量の健全土が、形成予定領域31に埋設されてもよい。ここで、「地盤改良体40e〜40gの少なくとも一部が埋設される際に排出される土」とは、例えば、地盤改良体40e〜40gの少なくとも一部が埋設される場合に、上記一対の攪拌軸下杭60の各々によって、上記安定剤と上記対応する地盤改良体40が配置される位置の土とが攪拌された際に、当該安定剤の量に相当する土量の土であって外部に排出される土等が該当する。このように、形成工程において上記減算した量の健全土(つまり、上記安定剤の量に相当する土量があらかじめ差し引かれた土量の健全土)が形成予定領域31に埋設された場合には、埋設構造物埋設工程において地盤改良体40e〜40gの少なくとも一部が埋設される際に排出される土を用いて、当該形成工程後に汚染拡散防止領域30に形成される凹部を埋めることにより、汚染拡散防止領域30の地表面を基準適合区画10及び基準不適合区画20の地表面と略面一にすることが可能となる。これにより、形成工程において形成予定領域31に埋設する健全土の土量を減らすことができるため、例えば、形成工程における健全土の埋設に対する作業負荷を軽減することが可能となる。なお、上述したように、施工対象領域1に基準適合区画10と基準不適合区画20との境界が複数存在する場合に、当該複数の境界のすべてに汚染拡散防止領域30が先行して形成された場合には、安全性を確保するために、地盤改良体埋設工程が未だ行われていない汚染拡散防止領域30の外縁に、鉄柵等の仮囲いが設けられることが望ましい。   In the above embodiment, in the forming step, the healthy soil is embedded in the partition wall 50 until the ground surface in the partition wall 50 is substantially flush with the ground surfaces of the reference conforming section 10 and the reference nonconforming section 20. However, the present invention is not limited to this. For example, from the amount of soil necessary to bury healthy soil until the ground surface of the planned formation region 31 is substantially flush with the ground surfaces of the standard conforming section 10 and the standard nonconforming section 20, the embedded structure is embedded in the embedded structure embedding process. The amount of healthy soil obtained by subtracting the amount of soil discharged when at least a part of the ground improvement bodies 40e to 40g to be embedded as objects may be embedded may be embedded in the formation planned region 31. Here, “the soil discharged when at least a part of the ground improvement bodies 40e to 40g is buried” means, for example, when at least a part of the ground improvement bodies 40e to 40g is buried. When the stabilizer and the soil at the position where the corresponding ground improvement body 40 is arranged are stirred by each of the stirring shaft lower piles 60, the soil has a soil amount corresponding to the amount of the stabilizer. Applicable to soil discharged outside. In this way, when the amount of healthy soil subtracted in the formation step (that is, the amount of healthy soil in which the amount of soil corresponding to the amount of the stabilizer is subtracted in advance) is embedded in the formation planned region 31. By using the soil discharged when at least a part of the ground improvement bodies 40e to 40g is buried in the buried structure burying step, by filling the recess formed in the pollution diffusion prevention region 30 after the forming step, It is possible to make the ground surface of the pollution diffusion prevention region 30 substantially flush with the ground surfaces of the reference conforming section 10 and the reference nonconforming section 20. Thereby, since the amount of the soil of the healthy soil embedded in the formation planned region 31 in the formation process can be reduced, for example, it becomes possible to reduce the work load for the embedding of the healthy soil in the formation process. As described above, when there are a plurality of boundaries between the reference conforming section 10 and the reference nonconforming section 20 in the construction target region 1, the contamination diffusion preventing region 30 is formed in advance on all of the plurality of boundaries. In that case, in order to ensure safety, it is desirable that a temporary enclosure such as an iron fence be provided on the outer edge of the pollution diffusion prevention region 30 where the ground improvement body burying process has not yet been performed.

(地盤改良体埋設工程について)
上記実施の形態では、地盤改良体埋設工程において、少なくとも一部が汚染拡散防止領域30と重複する位置に埋設される地盤改良体40e〜40g(埋設構造物)が、基準適合区画10から基準不適合区画20に向けて順次埋設されると説明したが、これに限られない。例えば、地盤改良体40fが埋設された後に、地盤改良体40e、40gが埋設されてもよい。この場合には、1本の攪拌軸下杭60が装着された上記公知の地盤改良処理機器によって、地盤改良体40e〜40gが1体ずつ埋設される。このように、状況に応じて地盤改良体40e〜40gの埋設順序を変更することができるので、従来方法に比べて施工の自由度を向上させることが可能であると言える。
(About ground improvement body burial process)
In the above embodiment, in the ground improvement body burying step, the ground improvement bodies 40e to 40g (buried structure) at least partially embedded in the position overlapping with the pollution diffusion prevention region 30 are not compliant with the standard conformity section 10. Although it described that it was embed | buried sequentially toward the division 20, it is not restricted to this. For example, the ground improvement bodies 40e and 40g may be embedded after the ground improvement body 40f is embedded. In this case, the ground improvement bodies 40e to 40g are buried one by one by the known ground improvement processing equipment to which one stirring shaft lower pile 60 is attached. Thus, since the embedding order of the ground improvement bodies 40e-40g can be changed according to a condition, it can be said that the freedom degree of construction can be improved compared with the conventional method.

また、上記実施の形態では、汚染拡散防止領域30が形成された後に、地盤改良体埋設工程において地盤改良体40a〜40lが埋設されると説明したが、これに限られない。例えば、地盤改良体40fが、基準適合区画10と基準不適合区画20との境界よりも基準適合区画10側に位置し、且つ当該境界の近傍に位置する場合には、地盤改良体40a〜40fが埋設された後に汚染拡散防止領域30が形成され(この場合には、汚染拡散防止領域30が基準不適合区画20内の領域であって、当該汚染拡散防止領域30の一部が上記境界に隣接する周辺領域に形成される)、その後地盤改良体40g〜40lが埋設されてもよい。この場合において、汚染拡散防止領域30の大きさについては、汚染領域の汚染された土壌が汚染領域と非汚染領域との境界を越えて拡散することを防止できる大きさに設定されており、例えば、地盤改良体40gを当該汚染拡散防止領域30内に完全に収めることが可能な大きさに設定される。この場合には、例えば、1本の攪拌軸下杭60が装着された上記公知の地盤改良処理機器によって、地盤改良体40gが埋設される。あるいは、上記大きさに限られず、例えば、地盤改良体40g、40hを当該汚染拡散防止領域30内に完全に収めることが可能な大きさに設定されてもよい。この場合には、例えば、2本の攪拌軸下杭60が装着された上記公知の地盤改良処理機器によって、地盤改良体40g、40hが埋設される。このように、状況に応じて汚染拡散防止領域30の形成する順序を変更することができるので、従来方法に比べて施工の自由度を向上させることが可能であると言える。また、この場合における汚染拡散防止領域30の平面形状については任意であり、例えば、汚染拡散防止領域30を容易に形成できるように、その一辺が基準適合区画10と基準不適合区画20との境界に隣接するような略矩形状に形成されてもよい。   Moreover, although the said embodiment demonstrated that the ground improvement body 40a-40l was embed | buried in the ground improvement body embedding process after the contamination spreading | diffusion prevention area | region 30 was formed, it is not restricted to this. For example, when the ground improvement body 40f is located closer to the reference conforming section 10 than the boundary between the reference conforming section 10 and the reference nonconforming section 20, and located near the boundary, the ground improving bodies 40a to 40f are provided. After being buried, a contamination diffusion prevention region 30 is formed (in this case, the contamination diffusion prevention region 30 is a region in the reference nonconforming section 20, and a part of the contamination diffusion prevention region 30 is adjacent to the boundary. Then, ground improvement bodies 40g to 40l may be embedded. In this case, the size of the contamination diffusion prevention region 30 is set to a size that can prevent the contaminated soil in the contamination region from diffusing beyond the boundary between the contamination region and the non-contamination region. The ground improvement body 40g is set to a size that allows the ground improvement body 40g to be completely accommodated in the contamination diffusion prevention region 30. In this case, the ground improvement body 40g is embed | buried by the said well-known ground improvement processing apparatus with which one stirring shaft lower pile 60 was mounted | worn, for example. Or it is not restricted to the said magnitude | size, For example, you may set to the magnitude | size which can fully accommodate the ground improvement bodies 40g and 40h in the said pollution diffusion prevention area | region 30. FIG. In this case, for example, the ground improvement bodies 40g and 40h are embedded by the above-described known ground improvement processing equipment to which the two stirring shaft lower piles 60 are attached. Thus, since the order in which the contamination diffusion prevention regions 30 are formed can be changed according to the situation, it can be said that the degree of freedom in construction can be improved as compared with the conventional method. In this case, the planar shape of the contamination diffusion prevention region 30 is arbitrary. For example, one side of the contamination diffusion prevention region 30 is a boundary between the reference conforming section 10 and the reference nonconforming section 20 so that the contamination diffusion preventing region 30 can be easily formed. You may form in the substantially rectangular shape which adjoins.

また、上記実施の形態では、撤去工程において区画壁50が撤去された後に、地盤改良体埋設工程において地盤改良体40a〜40lが埋設されると説明したが、これに限られない。例えば、地盤改良体埋設工程において地盤改良体40a〜40d、40i〜40lが埋設された後に、撤去工程において区画壁50が撤去され、その後地盤改良体埋設工程において地盤改良体40e〜40hが埋設されてもよい。   Moreover, although the said embodiment demonstrated that the ground improvement bodies 40a-40l were embed | buried in the ground improvement body embedding process after the partition wall 50 was removed in the removal process, it is not restricted to this. For example, after the ground improvement bodies 40a to 40d and 40i to 40l are buried in the ground improvement body embedding process, the partition wall 50 is removed in the removal process, and then the ground improvement bodies 40e to 40h are buried in the ground improvement body embedding process. May be.

また、上記実施の形態では、地盤改良体40a〜40lが、基準適合区画10から基準不適合区画20に向けて順次2つずつ埋設されると説明したが、これに限られない。例えば、地盤改良体40a〜40d、40i〜40lが、基準適合区画10から基準不適合区画20に向けて順次2つずつ埋設された後、地盤改良体40e〜40hが基準適合区画10から基準不適合区画20に向けて順次2つずつ埋設されてもよい。あるいは、地盤改良体40a〜40d、40i〜40lが、基準不適合区画20から基準適合区画10に向けて順次2つずつ埋設された後、地盤改良体40e〜40hが基準適合区画10から基準不適合区画20に向けて順次2つずつ埋設されてもよい。   In the above-described embodiment, the ground improvement bodies 40a to 40l have been described as being embedded two by two from the reference conforming section 10 toward the reference nonconforming section 20, but the present invention is not limited thereto. For example, after the ground improvement bodies 40a to 40d and 40i to 40l are embedded in order from the reference conforming section 10 toward the reference nonconforming section 20, the ground improvement bodies 40e to 40h are changed from the reference conforming section 10 to the reference nonconforming section. Two of them may be buried sequentially toward 20. Or after the ground improvement bodies 40a-40d and 40i-40l are embed | buried sequentially 2 each toward the reference | standard conformity division 10 from the reference | standard nonconformity division 20, the ground improvement bodies 40e-40h are reference noncompliance division 10 Two of them may be buried sequentially toward 20.

1 施工対象領域
2 地下水が浸透しにくい地層
10 基準適合区画
20 基準不適合区画
30 汚染拡散防止領域
31 形成予定領域
40、40a〜40l 地盤改良体
50 区画壁
60 攪拌軸下杭

DESCRIPTION OF SYMBOLS 1 Construction object area | region 2 The stratum which groundwater does not osmose | permeate 10 Standard conformity division 20 Standard nonconformity division 30 Contamination diffusion prevention area 31 Planned formation area 40, 40a-40l Ground improvement body 50 Compartment wall 60 Pile under stirring axis

Claims (5)

土壌が汚染されていない領域である非汚染領域と土壌が汚染されている領域である汚染領域とを含む施工対象領域において、前記非汚染領域から前記汚染領域までを横断するように埋設される埋設構造物を施工する方法であって、
前記汚染領域と前記非汚染領域との境界に形成される汚染拡散防止領域であって、前記汚染領域の土壌が前記非汚染領域に拡散することを防止するための汚染拡散防止領域の形成が予定されている形成予定領域の外縁に、当該形成予定領域を外部から区画するための区画壁を埋設する区画壁埋設工程と、
前記区画壁埋設工程において前記区画壁が埋設された前記形成予定領域の土壌を取り除く除去工程と、
前記除去工程において土壌が取り除かれた前記形成予定領域に健全土を埋設することにより、前記汚染拡散防止領域を形成する形成工程と、
前記形成工程において形成された前記汚染拡散防止領域の外縁に埋設された前記区画壁を撤去する撤去工程と、
前記埋設構造物の少なくとも一部が前記汚染拡散防止領域に配置されるように、当該埋設構造物を埋設する埋設構造物埋設工程と、
を含む埋設構造物の施工方法。
In a construction target area including a non-contaminated area that is an area in which the soil is not contaminated and a contaminated area that is an area in which the soil is contaminated, embedding is performed so as to cross from the non-contaminated area to the contaminated area A method of constructing a structure,
Contamination diffusion prevention region formed at the boundary between the contamination region and the non-contamination region, and the formation of a contamination diffusion prevention region for preventing the soil of the contamination region from diffusing into the non-contamination region is scheduled A partition wall burying step of burying a partition wall for partitioning the formation planned region from the outside at the outer edge of the planned formation region;
A removal step of removing soil in the planned formation area in which the partition wall is embedded in the partition wall burying step;
A formation step of forming the contamination diffusion prevention region by embedding healthy soil in the formation planned region where the soil has been removed in the removal step;
A removal step of removing the partition wall embedded in the outer edge of the contamination diffusion prevention region formed in the formation step;
A buried structure burying step of burying the buried structure so that at least a part of the buried structure is disposed in the contamination diffusion prevention region;
Construction method of buried structure including
前記非汚染領域から前記汚染領域に向かう方向に略沿って並設される複数の地盤改良体であって、当該複数の地盤改良体の各々の一部が隣接する他の地盤改良体の一部と相互に重複するように配置される複数の地盤改良体を埋設する地盤改良体埋設工程を含み、
前記地盤改良体埋設工程の一部を前記埋設構造物埋設工程として行うことにより、前記複数の地盤改良体の一部を前記埋設構造物として埋設する、
請求項1に記載の埋設構造物の施工方法。
A plurality of ground improvement bodies arranged approximately along the direction from the non-contaminated area toward the contaminated area, and a part of each of the plurality of ground improvement bodies adjacent to each other. Including a ground improvement body burying step of burying a plurality of ground improvement bodies arranged so as to overlap with each other,
By performing a part of the ground improvement body burying process as the embedded structure burying process, a part of the plurality of ground improvement bodies is embedded as the embedded structure,
The construction method of the buried structure according to claim 1.
前記埋設構造物として埋設する前記地盤改良体は、前記汚染領域に至らない領域に配置される地盤改良体と、当該地盤改良体に隣接する地盤改良体であって前記汚染領域に至る領域に配置される地盤改良体とを含み、
前記撤去工程において前記区画壁を撤去した後、前記埋設構造物埋設工程において、前記汚染領域に至らない領域に配置される前記地盤改良体を埋設した後に、前記汚染領域に至る領域に配置される前記地盤改良体を埋設する、
請求項2に記載の埋設構造物の施工方法。
The ground improvement body to be buried as the buried structure is a ground improvement body arranged in a region not reaching the contaminated area, and a ground improvement body adjacent to the ground improvement body and arranged in a region reaching the contaminated area. Including a ground improvement body,
After the partition wall is removed in the removal step, in the buried structure embedding step, the ground improvement body disposed in a region that does not reach the contaminated region is embedded and then disposed in a region that reaches the contaminated region. Bury the ground improvement body,
The construction method of the buried structure according to claim 2.
前記地盤改良体埋設工程においては、
前記複数の地盤改良体を、前記非汚染領域から前記汚染領域に向けて順次埋設する、
請求項2又は3に記載の埋設構造物の施工方法。
In the ground improvement body burying process,
The plurality of ground improvement bodies are sequentially embedded from the non-contaminated area toward the contaminated area.
The construction method of the buried structure according to claim 2 or 3.
前記形成工程においては、
前記形成予定領域の地表面が前記非汚染領域及び前記汚染領域の地表面と略面一になるまで前記健全土を埋設するのに必要な土量から、前記埋設構造物埋設工程において前記埋設構造物が埋設される際に排出される土の土量を減算した量の前記健全土を、前記形成予定領域に埋設する、
請求項1から4のいずれか一項に記載の埋設構造物の施工方法。

In the forming step,
From the amount of soil necessary to bury the healthy soil until the ground surface of the planned formation region is substantially flush with the ground surface of the non-contaminated region and the contaminated region, the embedded structure is embedded in the embedded structure embedding step. The amount of the healthy soil obtained by subtracting the amount of soil discharged when the object is embedded is embedded in the formation planned area.
The construction method of the embedded structure as described in any one of Claim 1 to 4.

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