JP6208245B2 - 時間コントラストが向上したレーザーパルスを増幅する装置 - Google Patents
時間コントラストが向上したレーザーパルスを増幅する装置 Download PDFInfo
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- 230000003321 amplification Effects 0.000 claims description 39
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 39
- 230000003071 parasitic effect Effects 0.000 claims description 28
- 239000013078 crystal Substances 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 11
- 239000007787 solid Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 2
- 229920000535 Tan II Polymers 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
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- 239000007789 gas Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000036278 prepulse Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- -1 titanium ions Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/042—Arrangements for thermal management for solid state lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/0604—Crystal lasers or glass lasers in the form of a plate or disc
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/0615—Shape of end-face
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0619—Coatings, e.g. AR, HR, passivation layer
- H01S3/0621—Coatings on the end-faces, e.g. input/output surfaces of the laser light
- H01S3/0623—Antireflective [AR]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0064—Anti-reflection devices, e.g. optical isolaters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
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- Surface Treatment Of Optical Elements (AREA)
Description
−周囲に水を循環させる従来の方法で結晶を冷却する方法は有効な方策であるが、100ワット以上で動作するシステムを開発することができず、また、
−極低温システムを用いて結晶は冷却する方法は、結晶の熱伝導率を向上させて冷却を促進して、光ポンピングにより誘導される結晶の熱チャージに関連付けられた集束効果を低減させる。
−2個の平坦な面、すなわち増幅対象のいわゆる入射ビームの受光を目的とする前面および反射性の背面を有する屈折率がn1である固体の増幅媒体と、
−背面により増幅媒体を冷却する装置を含んでいる。
(2β’ 1Δn1)=(β’ 2Δn2)および/または(2β’’ 1Δn1)=(β’’ 2Δn2)
但し
L>φ/tan(2(θi+β’ 1n1)またはL>φ/tan(2(φi+β’’ 1n1)
λmin=750nm
λmax=850nm
ν1=244
n1=1.76
β1=β’1=β’’1=1°
θi=φi=0°
Lmin=Φ/tan(2.(θi+β1n1))、ここにLminは最短距離Lである。
Δφ=Lmin.tan(2β1Δn1)≒Lmin.10−4
を次式と比較した値を有している。
φ=Lmin.tan(2.(θi+β1n1))≒Lmin.6.10−2
Δφ/φ≒0,16.10−2
Claims (9)
- 多波長パルスレーザービーム(2)を増幅する装置であって、
−2個の平坦な面、すなわち前記増幅対象のいわゆる入射ビーム(2)の受光を目的とする前面(12)および反射性の背面(11)を有し、前記前面(12)が前記背面(11)に対して第1の非ゼロ傾斜だけ傾いていて屈折率がn1である固体の増幅媒体(1)と、
−前記背面(11)により前記増幅媒体(1)を冷却する装置を含み、
非ゼロの第2の傾斜を間に形成する入力面と出力面を有していて前記増幅媒体(1)の前記背面(11)により反射されて前記前面(12)により屈折されたビーム(6)の経路上にある位置に配置された屈折率がn2の台形プリズム(4)を更に含み、前記第1および第2の傾斜が、前記プリズム(4)の出力側で各波長のビームが互いに平行になるように設定されていることを特徴とする装置。 - 前記増幅媒体の前記前面(12)が軸Ozと直角をなし、前記第1の傾斜が平面yOz上で角度β’1および平面xOz上で角度β’’1を形成し、前記第2の傾斜が平面yOz上で、角度β’2および平面xOz上で角度β’’2を形成していて、
2β’1.Δn1=β’2.n2且つ2β’’1.n1=β’’2.n2
が成立することを特徴とする、請求項1に記載の多波長パルスレーザービーム増幅装置。 - n1>>(n1−1)/ν1であって、ν1は前記増幅媒体の収斂性であることを特徴とする、請求項1または2に記載の多波長パルスレーザービーム増幅装置。
- 前記増幅媒体の前記前面(12)が前記入射ビーム(2)を受光して、いわゆる寄生ビーム(5)を反射することを目的とし、前記プリズム(4)が前記寄生ビームの経路の外側に配置されていることを特徴とする、請求項1〜3のいずれか1項に記載の多波長パルスレーザービーム増幅装置。
- 前記増幅媒体の前記前面(12)に反射防止コーティングが施されていることを特徴とする、請求項1〜4のいずれか1項に記載の多波長パルスレーザービーム増幅装置。
- n1=n2であることを特徴とする、請求項1〜5のいずれか1項に記載の多波長パルスレーザービーム増幅装置。
- 前記増幅媒体の前記前面(12)により反射された前記ビーム(5)の経路上にあることを意図された位置に配置されたフィルタスクリーンを含むことを特徴とする、請求項1〜6のいずれか1項に記載のマルチスペクトルパルスレーザービーム増幅装置。
- 前記増幅媒体(1)が結晶またはガラスあるいはポリマーであることを特徴とする、請求項1〜7いずれか1項に記載のマルチスペクトルパルスレーザービーム増幅装置。
- 1パルス当たりのエネルギーが1mJより大きく、平均出力が10Wより大きいことを特徴とする、請求項1〜8のいずれか1項に記載のマルチスペクトルパルスレーザービーム増幅装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR12/02935 | 2012-10-31 | ||
FR1202935A FR2997572B1 (fr) | 2012-10-31 | 2012-10-31 | Dispositif d'amplification d'un laser impulsionnel a contraste temporel ameliore |
PCT/EP2013/072478 WO2014067888A2 (fr) | 2012-10-31 | 2013-10-28 | Dispositif d'amplification d'un laser impulsionnel a contraste temporel ameliore |
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JP2016500928A JP2016500928A (ja) | 2016-01-14 |
JP6208245B2 true JP6208245B2 (ja) | 2017-10-04 |
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US (1) | US9614343B2 (ja) |
EP (1) | EP2915226B1 (ja) |
JP (1) | JP6208245B2 (ja) |
KR (1) | KR102128636B1 (ja) |
CN (1) | CN104885314B (ja) |
FR (1) | FR2997572B1 (ja) |
HU (1) | HUE031451T2 (ja) |
WO (1) | WO2014067888A2 (ja) |
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EP2977931A1 (en) * | 2014-07-24 | 2016-01-27 | Universität Zürich | Method for tracking keypoints in a scene |
FR3061366B1 (fr) * | 2016-12-22 | 2019-04-05 | Thales | Chaine amplificatrice a derive de frequence et a plusieurs sorties |
US10575148B2 (en) | 2017-09-29 | 2020-02-25 | Intel Corporation | Autonomous, mobile, and network connected output devices |
FR3118330B1 (fr) | 2020-12-17 | 2023-02-10 | Thales Sa | Dispositif d'amplification d'un laser |
FR3118329B1 (fr) | 2020-12-17 | 2023-01-27 | Thales Sa | Dispositif d’amplification d’un faisceau laser |
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US6834064B1 (en) * | 1999-12-08 | 2004-12-21 | Time-Bandwidth Products Ag | Mode-locked thin-disk laser |
WO2001043242A1 (en) * | 1999-12-08 | 2001-06-14 | Time-Bandwidth Products Ag | Mode-locked thin-disk laser |
US6570713B2 (en) * | 2001-02-27 | 2003-05-27 | Silicon Valley Group, Inc. | Method and apparatus for optimizing the output beam characteristics of a laser |
US6717965B2 (en) * | 2001-07-06 | 2004-04-06 | Intel Corporation | Graded thin film wedge interference filter and method of use for laser tuning |
DE102004009593B4 (de) | 2004-02-27 | 2006-11-23 | Rofin-Sinar Laser Gmbh | Festkörperlaser mit einer Kristallscheibe |
WO2006062992A2 (en) * | 2004-12-07 | 2006-06-15 | Research Foundation Of The City University Of New York | Tetravalent chromium doped laser materials and nir tunable lasers |
US7535633B2 (en) * | 2005-01-10 | 2009-05-19 | Kresimir Franjic | Laser amplifiers with high gain and small thermal aberrations |
US7460574B2 (en) * | 2005-01-24 | 2008-12-02 | Research Foundation Of The City University Of New York | Cr3+-doped laser materials and lasers and methods of making and using |
CN101276985A (zh) * | 2008-05-07 | 2008-10-01 | 北京理工大学 | 一种激光二极管端面泵浦楔形固体激光器 |
CN101572386A (zh) * | 2009-06-09 | 2009-11-04 | 中国科学院上海光学精密机械研究所 | 倾斜板条激光放大器 |
JP5844535B2 (ja) * | 2011-03-28 | 2016-01-20 | ギガフォトン株式会社 | レーザシステムおよびレーザ生成方法 |
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- 2012-10-31 FR FR1202935A patent/FR2997572B1/fr active Active
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- 2013-10-28 HU HUE13785405A patent/HUE031451T2/en unknown
- 2013-10-28 JP JP2015540101A patent/JP6208245B2/ja active Active
- 2013-10-28 US US14/439,603 patent/US9614343B2/en active Active
- 2013-10-28 EP EP13785405.5A patent/EP2915226B1/fr active Active
- 2013-10-28 CN CN201380068420.7A patent/CN104885314B/zh active Active
- 2013-10-28 KR KR1020157011626A patent/KR102128636B1/ko active IP Right Grant
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Also Published As
Publication number | Publication date |
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US9614343B2 (en) | 2017-04-04 |
WO2014067888A2 (fr) | 2014-05-08 |
KR102128636B1 (ko) | 2020-06-30 |
CN104885314B (zh) | 2018-05-25 |
JP2016500928A (ja) | 2016-01-14 |
FR2997572B1 (fr) | 2014-12-12 |
WO2014067888A3 (fr) | 2014-07-31 |
EP2915226A2 (fr) | 2015-09-09 |
FR2997572A1 (fr) | 2014-05-02 |
EP2915226B1 (fr) | 2016-10-26 |
CN104885314A (zh) | 2015-09-02 |
US20150303642A1 (en) | 2015-10-22 |
KR20150079675A (ko) | 2015-07-08 |
HUE031451T2 (en) | 2017-07-28 |
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