JP6202307B2 - キラリティ測定方法及びキラリティ測定装置 - Google Patents
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Description
しかしながら、ガスクロマトグラフィ法のためのガスクロマトグラフ装置は高価であり且つ試料毎に対応した安価ではないキラルカラムの選定を必要とする。更に、キラリティの有無の判定だけでも数十分以上の測定時間が必要となる。そこで、ガス状物質からなる試料についても、安価であり且つ簡便にキラリティの有無や光学純度を測定できる方法が求められている。
非特許文献2に従って、幅13μm、深さ1.5μmの周期溝10aを有する基板10にネマチック液晶材料であるペンチルシアノビフェニル(5CB)からなる液晶体12を与えた。
測定例1において、旋性を互いに反対とするリモネンを所定の割合で混合したガス状試料30を調製し測定を行った。
eev%=100×(c(+)−c(−))/(c(+)+c(−))
で定義され、−100から+100までの11種類のガス状試料30を調製した。また、シリンジ21aのノズル先端からのガス状試料30の噴出速度を0.066ml/sとし、ガス状試料30の噴出開始から4秒経過後の偏光顕微鏡による画像を取得した。取得した画像を画像解析して、隣り合う6つのドメインについて、右旋性ドメインの長さl(+)と左旋性ドメインの長さl(−)を求めた。
eez%=100×(l(+)−l(−))/(l(+)+l(−))
で定義した。
測定例1において、飽和濃度に対する相対濃度を変化させたガス状試料30を調製し測定を行った。
10 基板
10a 周期溝
12 液晶体
15 欠陥構造
21 試料供給部
23 光学測定部
30 ガス状試料
Claims (13)
- ガス状試料におけるキラリティの測定方法であって、軸線に沿って分子配向させたネマチック液晶体にジグ‐ザグの一対からなる欠陥構造を与え、前記欠陥構造を変形させないように、前記軸線に沿って前記ネマチック液晶体の表面に前記ガス状試料を導いて前記欠陥構造の変化を測定することを特徴とするキラリティ測定方法。
- 前記ジグ‐ザグの一対は互いに等しい欠陥長であることを特徴とする請求項1記載のキラリティ測定方法。
- 前記変化は前記ジグ‐ザグの一対の欠陥長差を測定することを特徴とする請求項2記載のキラリティ測定方法。
- 前記軸線に沿って延びる溝部を互い平行になるように複数形成した基板の前記溝部に前記ネマチック液晶体を収容することを特徴とする請求項1乃至3のうちの1つに記載のキラリティ測定方法。
- 前記基板は周期波状表面を有しこの谷部を前記溝部とすることを特徴とする請求項4記載のキラリティ測定方法。
- 前記周期波状表面は圧縮応力により形成されていることを特徴とする請求項5記載のキラリティ測定方法。
- ガス状試料におけるキラリティの測定装置であって、
軸線に沿って分子配向させたネマチック液晶体にジグ‐ザグの一対からなる欠陥構造を与えて配置した基板と、
前記欠陥構造を変形させないように、前記軸線に沿って前記ネマチック液晶体の表面に前記ガス状試料を導く導管と、
前記ネマチック液晶体における前記欠陥構造の変化を測定する測定器と、を含むことを特徴とするキラリティ測定装置。 - 前記ジグ‐ザグの一対は互いに等しい欠陥長であることを特徴とする請求項7記載のキラリティ測定装置。
- 前記測定器は前記ジグ‐ザグの一対の欠陥長差を測定することを特徴とする請求項8記載のキラリティ測定装置。
- 前記基板は前記軸線に沿って延びる溝部を互い平行になるように複数形成され、前記溝部に前記ネマチック液晶体を収容していることを特徴とする請求項7乃至9のうちの1つに記載のキラリティ測定装置。
- 前記基板は周期波状表面を有しこの谷部を前記溝部とすることを特徴とする請求項10記載のキラリティ測定装置。
- 前記周期波状表面は圧縮応力により形成されていることを特徴とする請求項11記載のキラリティ測定装置。
- 前記導管は前記ガス状試料を前記軸線に沿って前記ネマチック液晶体の表面に流すことを特徴とする請求項12記載のキラリティ測定装置。
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