JP6201623B2 - Electrode member, method for manufacturing the same, touch panel using the electrode member, and image display device including the touch panel - Google Patents
Electrode member, method for manufacturing the same, touch panel using the electrode member, and image display device including the touch panel Download PDFInfo
- Publication number
- JP6201623B2 JP6201623B2 JP2013219251A JP2013219251A JP6201623B2 JP 6201623 B2 JP6201623 B2 JP 6201623B2 JP 2013219251 A JP2013219251 A JP 2013219251A JP 2013219251 A JP2013219251 A JP 2013219251A JP 6201623 B2 JP6201623 B2 JP 6201623B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- electrode member
- mesh
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Position Input By Displaying (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Laminated Bodies (AREA)
Description
本発明は、電極部材に関し、とりわけ、外光反射が低減され、線不可視性が高い、細線化された導電体メッシュを含む電極部材に関する。また、本発明は、該電極部材の製造方法、並びに、該電極部材を用いたタッチパネル、該タッチパネルを配置した画像表示装置等に関する。 The present invention relates to an electrode member, and more particularly, to an electrode member including a thinned conductor mesh with reduced external light reflection and high line invisibility. The present invention also relates to a method for manufacturing the electrode member, a touch panel using the electrode member, an image display device in which the touch panel is disposed, and the like.
近年、各種電子機器の入力装置としてタッチパネルが普及してきている。タッチパネルは抵抗膜方式、静電容量方式など各種方式のものが実用化されている。 In recent years, touch panels have become widespread as input devices for various electronic devices. Various types of touch panels such as a resistive film type and a capacitance type have been put into practical use.
タッチパネルは、一般的には、タッチパネル用電極部材として、ガラス板やポリエチレンテレフタレートフィルム等からなる透明基材の片方の面上に、ITO(インジウム錫酸化物)薄膜からなる透明導電膜を形成したものが使用されている(特許文献1)。
しかし、ITO薄膜からなる透明導電膜は、インジウムというレアメタル(希土類元素)が使用されるために高価である点、及び、抵抗(表面抵抗率)がタッチパネルの大面積化を図るには高抵抗である点で、低コスト化及び大画面化への要求に対応し難い。
A touch panel generally has a transparent conductive film made of an ITO (indium tin oxide) thin film formed on one surface of a transparent substrate made of a glass plate, a polyethylene terephthalate film, or the like as an electrode member for a touch panel. Is used (Patent Document 1).
However, the transparent conductive film made of an ITO thin film is expensive because a rare metal (rare earth element) called indium is used, and the resistance (surface resistivity) is high in order to increase the area of the touch panel. At some point, it is difficult to meet the demands for cost reduction and large screen.
そこで、ITO薄膜の透明導電膜に代えて、透明基材に、金属細線パターンからなる金属メッシュを形成したタッチパネル用電極部材が提案されている(特許文献2)。金属メッシュによれば、ITO薄膜に比べて低コストかつ低抵抗にできる。
しかし、金属メッシュは可視光線に対して比較的に高い反射率を呈するため、外光が反射されて、メッシュパターンが視認されたり、或いは導電体メッシュからの反射光が画像光に重畳してタッチパネル装置の画像コントラストが低下してしまう。そこで、黒化層が、金属層の観察者側に配置される必要がある。
また、タッチパネル用電極の金属メッシュとしては、昨今、高画質化、さらには、タブレットと呼ばれる携帯用小型端末の普及にともなって、視認性、高透過率の点から電極のさらなる細線化が強く要望される。
Therefore, an electrode member for a touch panel in which a metal mesh composed of a fine metal wire pattern is formed on a transparent base material instead of the ITO thin film transparent conductive film has been proposed (Patent Document 2). According to the metal mesh, the cost and the resistance can be reduced as compared with the ITO thin film.
However, since the metal mesh exhibits a relatively high reflectance with respect to visible light, the external light is reflected and the mesh pattern is visually recognized, or the reflected light from the conductor mesh is superimposed on the image light and the touch panel. The image contrast of the device is reduced. Therefore, the blackening layer needs to be disposed on the observer side of the metal layer.
In addition, as a metal mesh for electrodes for touch panels, there is a strong demand for further thinning of electrodes in terms of visibility and high transmittance with the recent increase in image quality and the spread of portable small terminals called tablets. Is done.
金属メッシュの表面に黒化層を設けたものとして、たとえば、特許文献3には、両面に黒化層を形成した銅箔を透明樹脂フィルム上に接着、積層し、しかる後にフォトリソグラフィ法によりメッシュ化してなる電磁波遮蔽フィルタが開示されている。しかし、銅箔は厚みが最低10μm以上であり、フォトエッチング時に銅箔のサイドエッチングに起因して線部の主切断面(線部の延在方向に直交する切断面)の形状が4角形にならず、透明基材表面から離れるに従って線幅が減少して透明基材側を底辺とする略3角形形状となり、線部の電気抵抗が増大したり、線部が断線するといった不具合が起こる。そのため、線幅10μm未満の細線化は困難である。
黒化層を有する金属メッシュであって、そのような細線化を可能にしたものとして、たとえば、特許文献4には、透明基材上に蒸着法で厚み0.3μmの銅薄膜を形成し、その上にスパッタリング法で厚み0.05μmの酸化銅薄膜を形成し、これをフォトエッチングして線幅10μm程度の金属メッシュを得ている。
しかしながら、この特許文献4の金属メッシュであっても、好ましいタッチパネル用電極とするには、さらに、外光反射を低減し、線不可視性を高めるため、メッシュ線の両側面及び基材側面にも黒化層が必要である。しかし、メッシュ線側面に酸化銅をスパッタして黒化層を形成しようとすると、メッシュ開口部にも酸化銅(酸化第二銅)の黒化層が堆積し、その除去は困難であるため、両側面の黒化さえ難しい(もとより、基材側面の黒化は不可能である)。
As an example in which a blackened layer is provided on the surface of a metal mesh, for example, in Patent Document 3, a copper foil having a blackened layer formed on both sides is bonded and laminated on a transparent resin film, and then meshed by photolithography. An electromagnetic wave shielding filter is disclosed. However, the thickness of the copper foil is at least 10 μm or more, and the shape of the main cut surface of the line portion (cut surface perpendicular to the extending direction of the line portion) due to side etching of the copper foil during photoetching is a quadrangular shape Instead, the line width decreases as the distance from the transparent substrate surface increases, resulting in a substantially triangular shape with the transparent substrate side as the base, causing problems such as an increase in the electrical resistance of the line portion or disconnection of the line portion. Therefore, it is difficult to reduce the line width to less than 10 μm.
As a metal mesh having a blackened layer, which enables such thinning, for example, in Patent Document 4, a copper thin film having a thickness of 0.3 μm is formed on a transparent substrate by vapor deposition, A copper oxide thin film having a thickness of 0.05 μm is formed thereon by sputtering, and this is photoetched to obtain a metal mesh having a line width of about 10 μm.
However, even if it is the metal mesh of this patent document 4, in order to make a preferable electrode for touch panels, in order to further reduce external light reflection and increase line invisibility, both sides of the mesh line and the side of the substrate are also provided. A blackening layer is required. However, when a blackened layer is formed by sputtering copper oxide on the side surface of the mesh line, a blackened layer of copper oxide (cupric oxide) is deposited on the mesh opening, which is difficult to remove. Even blacking on both sides is difficult (originally, blackening on the side of the substrate is impossible).
本発明は、このような状況下になされたものであり、その目的は、透明基材上に細線導電体メッシュを形成した電極部材であって、該導電体メッシュの線部の全面が黒化処理されてなる電極部材、およびその製造方法、並びに、当該電極部材を用いたタッチパネル、該タッチパネルを表示面に配置した画像表示装置等を提供することである。 The present invention has been made under such circumstances, and an object thereof is an electrode member in which a fine conductor mesh is formed on a transparent substrate, and the entire surface of the line portion of the conductor mesh is blackened. It is providing the electrode member processed, its manufacturing method, the touchscreen using the said electrode member, the image display apparatus which has arrange | positioned this touchscreen on the display surface, etc.
本発明者は、種々検討の結果、透明基材上に、銅層と、該銅層の透明基材側の面に酸化第二銅を含む第1黒化層、該銅層の上面及び両側面に塩化テルルを含む第2黒化層を形成した導電体メッシュを形成することにより、本発明の目的を達成したタッチパネル用電極部材が得られることを知見した。 As a result of various studies, the inventor has made a copper layer on the transparent substrate, a first blackening layer containing cupric oxide on the surface of the copper layer on the transparent substrate side, the upper surface and both sides of the copper layer. It has been found that an electrode member for a touch panel that achieves the object of the present invention can be obtained by forming a conductive mesh having a second blackening layer containing tellurium chloride on the surface.
すなわち、本発明は、
(1)透明基材と、透明基材上に設けられた導電体メッシュを備えたタッチパネル用電極部材であって、該導電体メッシュが、銅層と、該銅層の透明基材側の面に酸化第二銅を含む第1黒化層、該銅層の上面及び両側面に塩化テルルを含む第2黒化層を形成したことを特徴とするタッチパネル用電極部材、
(2)導電体メッシュの線幅が10μm未満である上記(1)に記載のタッチパネル用電極部材、
(3)透明基材上に、酸化第二銅からなる第1黒化膜、銅膜、レジスト膜を順次設け、当該レジスト膜をパターン露光および現像してメッシュ状にパターニングし、次いで、パターニングされたレジストパターン層をマスクとして、該レジスト開口部の銅膜をエッチングして銅層を形成し、その後順次、レジスト開口部の第一黒化膜を塩酸で溶解除去し、レジストパターン層を除去し、さらに、テルル黒化処理液でメッシュ形状となった銅層の上面及び両側面を黒化して第2黒化層とする上記(1)又は(2)に記載のタッチパネル用電極部材を製造する方法、
(4)上記(1)又は(2)請求項1又は2に記載の電極部材を含むタッチパネル、
(5)上記(4)に記載のタッチパネルを表示面に配置した画像表示装置、
を提供するものである。
That is, the present invention
(1) An electrode member for a touch panel including a transparent base material and a conductor mesh provided on the transparent base material, wherein the conductor mesh is a copper layer and a surface of the copper layer on the transparent base material side A first blackening layer containing cupric oxide, and a second blackening layer containing tellurium chloride on the upper surface and both side surfaces of the copper layer,
(2) The electrode member for a touch panel according to (1), wherein the conductor mesh has a line width of less than 10 μm,
(3) A first blackening film made of cupric oxide, a copper film, and a resist film are sequentially provided on a transparent substrate, and the resist film is patterned and developed to be patterned into a mesh, and then patterned. Using the resist pattern layer as a mask, the copper film in the resist opening is etched to form a copper layer, and then the first black film in the resist opening is dissolved and removed with hydrochloric acid to remove the resist pattern layer. Furthermore, the electrode member for a touch panel according to the above (1) or (2) is manufactured by blackening the upper surface and both side surfaces of the copper layer meshed with the tellurium blackening solution to form a second blackened layer. Method,
(4) The touch panel including the electrode member according to (1) or (2) above or (2),
(5) An image display device in which the touch panel according to (4) is arranged on a display surface,
Is to provide.
本発明によれば、透明基材上に細線導電体メッシュを形成した電極部材であって、該導電体メッシュの線部の全面が黒化処理されてなる電極部材およびその製造方法、当該電極部材を用いたタッチパネル並びに該タッチパネルを表示面に配置した画像表示装置等を提供することができる。本発明の電極部材は、導電体メッシュの線部の全面が黒化処理されているので、外光反射が低減され、線不可視性が高く、ディスプレイ側からの光との干渉もないという効果が奏される。また、タッチパネルでの使用においては、電極部材は導電体メッシュ側を上にする場合も、透明基材側を上にする場合もあるが、本発明の電極部材は全面が黒化処理されているので、いずれの場合においても同じ上記効果が奏されるという利点がある。 According to the present invention, an electrode member in which a fine wire conductor mesh is formed on a transparent substrate, the entire surface of the line portion of the conductor mesh being blackened, a method for manufacturing the same, and the electrode member It is possible to provide a touch panel using the image display device and an image display device in which the touch panel is arranged on a display surface. Since the electrode member of the present invention is blackened on the entire surface of the line portion of the conductor mesh, the effect of reducing external light reflection, high line invisibility, and no interference with light from the display side is obtained. Played. In addition, when used on a touch panel, the electrode member may be on the conductor mesh side or on the transparent substrate side, but the entire surface of the electrode member of the present invention is blackened. Therefore, there is an advantage that the same effect can be obtained in any case.
以下、本発明の実施形態について図面を参照しながら説明する。なお、図面は概念図であり、説明上の都合に応じて適宜、構成要素の縮尺関係、縦横比等は誇張されていることがある。
なお、以下、膜状乃至層状に形成されたものについて、メッシュ等の特定形状にパターン化されてなる形態を「層」、又パターン化される前の全面にわたって形成されてなる形態を「膜」と呼称する。
Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the drawings are conceptual diagrams, and the scale relations, aspect ratios, and the like of components may be exaggerated as appropriate for convenience of explanation.
In the following, for a film or layer, a pattern formed in a specific shape such as a mesh is referred to as a “layer”, and a form formed over the entire surface before being patterned is referred to as a “film”. It is called.
[電極部材]
図1は、本発明の電極部材の構成を示す概略断面図である。
電極部材100は、透明基材10と、その上に設けられた導電体メッシュである電極30は銅層21と該銅層の透明基材側の面に酸化第二銅を含む第1黒化層22、該銅層の上面及び両側面に塩化テルルを含む第2黒化層23が形成されてなる。
[Electrode member]
FIG. 1 is a schematic cross-sectional view showing the configuration of the electrode member of the present invention.
The electrode member 100 is a transparent base material 10 and the electrode 30 which is a conductor mesh provided thereon is a first blackening containing a copper layer 21 and cupric oxide on the surface of the copper layer on the transparent base material side. A second blackening layer 23 containing tellurium chloride is formed on the upper surface and both side surfaces of the layer 22 and the copper layer.
透明基材10は、透明な基材であれば特に制限はなく、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステル樹脂、ポリメチルメタクリレート等のアクリル樹脂、ポリプロピレン等のポリオレフィン樹脂、トリアセチルセルロース(三酢酸セルロース)等のセルロース系樹脂、ポリカーボネート樹脂などからなる樹脂シート、或いはソーダ硝子、カリ硝子、石英硝子等の硝子、結晶質石英、蛍石等の無機質材料の板を用いることができる。
これら透明基材の厚みは、20〜3000μm程度の範囲から、用途、要求性能、価格等に応じて適宜の厚みを選択する。
The transparent substrate 10 is not particularly limited as long as it is a transparent substrate, polyester resin such as polyethylene terephthalate and polyethylene naphthalate, acrylic resin such as polymethyl methacrylate, polyolefin resin such as polypropylene, triacetyl cellulose (cellulose triacetate). ), A resin sheet made of a cellulose resin, a polycarbonate resin, or the like, or a glass such as soda glass, potassium glass, or quartz glass, or a plate made of an inorganic material such as crystalline quartz or fluorite.
The thickness of these transparent substrates is selected from a range of about 20 to 3000 μm according to the application, required performance, price, and the like.
電極30は、高導電性金属層である銅層21に、該銅層の透明基材側の面に酸化第二銅(CuO)を含む第1黒化層22、該銅層の上面及び両側面に塩化テルルを含む第2黒化層23が形成されている。
銅層の厚みは0.1〜5μmが好ましく、0.5〜2.5μmであることがより好ましい。
銅層をこの薄さとすることで、エッチング加工の際のサイドエッチングによる前記不具合が低減化されて、細線化がしやすくなり、特に線幅が10μm以下、中でも特に7μm以下の銅層の細線を形状再現性良く加工することが可能となる。
第1黒化層、第2黒化層の厚みは0.01〜0.4μmであることが好ましい。
The electrode 30 includes a copper layer 21 which is a highly conductive metal layer, a first blackening layer 22 containing cupric oxide (CuO) on the surface of the copper layer on the transparent substrate side, an upper surface and both sides of the copper layer. A second blackening layer 23 containing tellurium chloride is formed on the surface.
The thickness of the copper layer is preferably 0.1 to 5 μm, and more preferably 0.5 to 2.5 μm.
By making the copper layer thin, the problems due to side etching at the time of etching processing are reduced, and it becomes easy to make a thin line. Particularly, a thin line of a copper layer having a line width of 10 μm or less, especially 7 μm or less. Processing can be performed with good shape reproducibility.
The thickness of the first blackened layer and the second blackened layer is preferably 0.01 to 0.4 μm.
本発明の電極30はメッシュ(網目模様又は格子模様)パターンであり、導電体メッシュの線幅は10μm未満であることが好ましく、より好ましくは2〜7μmであり、メッシュパターンの開口率は95〜99%程度であることが好ましい。このような細線で、高開口率であるため、高視認性、高透過率であり、タッチパネル用電極の金属メッシュとして好適である。
なお、本発明の電極部材及びその製造方法は、線幅10μm未満の導電体メッシュを有する場合に適用する際に、その効果が十分に奏されるものである。ただし、本発明の構成の電極部材を導電体メッシュの線幅が10μm以上の場合に適用してもよく、本発明は線幅10μ以上の形態も包含する。
本発明のタッチパネル用の電極部材は、透明基材10の表裏面のうちの少なくとも一方の面上に上記導電体メッシュ20を必須の部品として有する。ただし、本発明の電極部材は、通常は、これに加えて更に他の部品を有する。他の部品としては、取出電極、端子、FPC、表面保護板等である。これら他の部品はタッチパネルの分野において公知のものの中から、必要に応じて適宜選択採用すればよい。図示及び更なる説明は省略する。
The electrode 30 of the present invention is a mesh (mesh pattern or lattice pattern) pattern, the conductor mesh preferably has a line width of less than 10 μm, more preferably 2 to 7 μm, and the mesh pattern has an aperture ratio of 95 to 95 μm. It is preferably about 99%. Such a thin line has a high aperture ratio, and thus has high visibility and high transmittance, and is suitable as a metal mesh for a touch panel electrode.
In addition, when the electrode member of this invention and its manufacturing method are applied when it has a conductor mesh with a line | wire width of less than 10 micrometers, the effect is fully show | played. However, the electrode member having the configuration of the present invention may be applied to the case where the line width of the conductor mesh is 10 μm or more, and the present invention includes a form having a line width of 10 μm or more.
The electrode member for a touch panel of the present invention has the conductor mesh 20 as an essential component on at least one of the front and back surfaces of the transparent substrate 10. However, the electrode member of the present invention usually has other parts in addition to this. Other parts include an extraction electrode, a terminal, an FPC, a surface protection plate, and the like. These other components may be appropriately selected and adopted from those known in the field of touch panels as necessary. Illustration and further explanation are omitted.
[電極部材の製造方法]
図2は、本発明の電極部材の製造方法を説明するものである。
[Method for producing electrode member]
FIG. 2 illustrates a method for producing an electrode member of the present invention.
まず、図2(a)に示すように、透明基材10を準備する。 First, as shown to Fig.2 (a), the transparent base material 10 is prepared.
次に、図2(b)に示すように、酸化第二銅からなる(後に第1黒化層の構成材料となる)第1黒化膜11を、透明基材10上の全面に形成する。第1黒化膜11の成膜方法としては、酸化第二銅のスパッタリングもしくは蒸着を採用する。 Next, as shown in FIG. 2B, a first blackening film 11 made of cupric oxide (which will later become a constituent material of the first blackening layer) is formed on the entire surface of the transparent substrate 10. . As a method for forming the first blackening film 11, sputtering or vapor deposition of cupric oxide is employed.
続いて、図2(c)に示すように、(後に銅層21の構成材料となる)銅膜12を第1黒化膜11上の全面に形成する。銅膜12は、第1黒化膜11上に所望の厚みを有した銅膜12を成膜する。銅膜12の成膜方法としては、スパッタリング、蒸着、電界めっき、無電界めっき等の種々の方法を採用することができるが、厚み3μm程度以下の場合は比較的に短時間で安価に製造することができることから、蒸着が好ましい。 Subsequently, as shown in FIG. 2C, a copper film 12 (which will be a constituent material of the copper layer 21 later) is formed on the entire surface of the first blackening film 11. As the copper film 12, the copper film 12 having a desired thickness is formed on the first blackening film 11. As a method for forming the copper film 12, various methods such as sputtering, vapor deposition, electroplating, and electroless plating can be employed. However, when the thickness is about 3 μm or less, the copper film 12 is manufactured in a relatively short time and at a low cost. Vapor deposition is preferred because it can be used.
その後、フォトリソグラフィー技術を用いたパターニングにより、透明基材10上の第1黒化膜11および銅膜12を所望のパターンにて、パターニングする。
具体的には、まず、銅膜12上に感光性のレジスト膜13を設け(図2(d))、当該レジスト膜13をパターン露光および現像して網目模様又は格子模様にパターニングする(図2(e))。感光性のレジストとしては、例えば、重クロム酸カゼイン系、桂皮酸エステル系、アクリル酸エステル系、ゴム系等のものから選択できる。露光は、例えば、水銀灯から発する紫外線照射を採用することができる。次に、パターニングされたレジストパターン層14をマスクとして、レジスト開口部の銅膜12をエッチングする。エッチング液として、例えば、40°ボーメの塩化第二鉄水溶液を用いて35〜45℃でエッチングするのが好ましい。
これにより、透明基材10及び第1黒化膜11上に、銅膜12から銅層21が所望のパターンで形成される(図2(f))。
Thereafter, the first blackening film 11 and the copper film 12 on the transparent substrate 10 are patterned in a desired pattern by patterning using a photolithography technique.
Specifically, first, a photosensitive resist film 13 is provided on the copper film 12 (FIG. 2D), and the resist film 13 is patterned and developed by patterning into a mesh pattern or a lattice pattern (FIG. 2). (E)). The photosensitive resist can be selected from, for example, bichromate casein-based, cinnamic ester-based, acrylic ester-based, and rubber-based resists. For the exposure, for example, ultraviolet irradiation emitted from a mercury lamp can be adopted. Next, the copper film 12 in the resist opening is etched using the patterned resist pattern layer 14 as a mask. For example, the etching is preferably performed at 35 to 45 ° C. using a 40 ° Baume ferric chloride aqueous solution.
Thereby, the copper layer 21 is formed in a desired pattern from the copper film 12 on the transparent base material 10 and the first blackening film 11 (FIG. 2F).
次いで、メッシュ開口部に残留した酸化第二銅からなる第1黒化膜11を濃度0.5〜5%程度の塩酸で溶解除去する(図2(g))。 Next, the first blackened film 11 made of cupric oxide remaining in the mesh opening is dissolved and removed with hydrochloric acid having a concentration of about 0.5 to 5% (FIG. 2 (g)).
その後、銅層21上のレジストパターン層14を剥離して、第1黒化層22および銅層21がメッシュ状に透明基材10上に形成された積層体を得る(図2(h))。 Thereafter, the resist pattern layer 14 on the copper layer 21 is peeled off to obtain a laminate in which the first blackened layer 22 and the copper layer 21 are formed on the transparent substrate 10 in a mesh shape (FIG. 2 (h)). .
得られた電極部材の3面(導電体メッシュ20を構成する銅の線部の透明基材10とは反対側面及び両側面;図1及び図2(j)参照)が未黒化のものをテルルが溶解された塩酸溶液である黒化処理液に接触させて、当該銅メッシュ層21の上面及び両側面に第2黒化層23を形成する(図2(i))。 Three surfaces of the obtained electrode member (side surfaces and both side surfaces opposite to the transparent base material 10 of the copper wire portion constituting the conductor mesh 20; see FIGS. 1 and 2 (j)) are unblackened. A second blackening layer 23 is formed on the upper surface and both side surfaces of the copper mesh layer 21 by contacting with a blackening treatment solution that is a hydrochloric acid solution in which tellurium is dissolved (FIG. 2 (i)).
ここで用いる黒化処理液は、テルルが溶解された塩酸溶液であり、このテルルの供給源として、酸化テルルを用いることが好ましい。本発明でテルル供給源として使用される酸化テルルは、TeO2で表すことができる。
この黒化処理液(100重量%)中には、テルルは、酸化物換算で、0.01〜0.45重量%の範囲内の量、好ましくは0.05〜0.40重量%の量で含有されている。本発明で用いる黒化処理液は、従来のテルル系の黒化処理液よりもテルル濃度が低いため、黒化層の堆積速度が小さくなり、薄く、金属−黒化層間の密着性が高い黒化層を堆積させることができる。
黒化処理液のテルル含有量が0.45重量%を超える場合、黒化層の堆積速度が大きすぎて、金属表面に堆積する黒化層にはひびが入り、黒化層−金属間の密着性が不十分になるおそれがあり、0.01重量%未満の場合は、黒化層−金属間の密着性は充分だが、黒化層の堆積速度が小さく処理効率に劣るおそれがある。
酸化テルルを溶解する塩酸水溶液は、通常は35%塩酸(以下、単に塩酸とも呼称する。)に水を配合することにより形成される。この塩酸水溶液中のHCl(塩化水素)濃度は、0.05〜8重量%の範囲内にあり、好ましくは0.1〜2重量%、さらに好ましくは0.3〜1重量%である。このような濃度の塩酸水溶液を使用することにより、上記酸化テルルを完全に溶解することができる。
The blackening treatment solution used here is a hydrochloric acid solution in which tellurium is dissolved, and it is preferable to use tellurium oxide as the source of tellurium. Tellurium oxide is used as tellurium source in the present invention can be represented by TeO 2.
In this blackening treatment solution (100% by weight), tellurium is an amount in the range of 0.01 to 0.45% by weight, preferably 0.05 to 0.40% by weight, in terms of oxide. It is contained in. Since the blackening treatment liquid used in the present invention has a tellurium concentration lower than that of the conventional tellurium-based blackening treatment liquid, the deposition rate of the blackening layer is reduced, the thickness is black, and the adhesion between the metal and blackening layers is high. A chemical layer can be deposited.
When the tellurium content of the blackening treatment liquid exceeds 0.45% by weight, the deposition rate of the blackened layer is too high, the blackened layer deposited on the metal surface is cracked, and the blackened layer-to-metal Adhesion may be insufficient. If the amount is less than 0.01% by weight, the adhesion between the blackened layer and the metal is sufficient, but the deposition rate of the blackened layer is small and the processing efficiency may be inferior.
An aqueous hydrochloric acid solution that dissolves tellurium oxide is usually formed by blending water with 35% hydrochloric acid (hereinafter also simply referred to as hydrochloric acid). The concentration of HCl (hydrogen chloride) in the aqueous hydrochloric acid solution is in the range of 0.05 to 8% by weight, preferably 0.1 to 2% by weight, and more preferably 0.3 to 1% by weight. By using an aqueous hydrochloric acid solution having such a concentration, the tellurium oxide can be completely dissolved.
なお、テルル黒化処理は置換メッキの一種であり、銅の表面は黒色の化合物に置換されるが、開口部の非金属であるPETフィルムなど透明基材10表面はテルルと置換反応する金属原子がないため、黒くはならない。第2黒化層23の組成は、その分析結果によれば、塩化テルルを含む。また、これに加えて更に、塩化銅を含む場合もある。
かくして、メッシュ線の全面が黒化された本発明の電極部材100が得られる。
The tellurium blackening treatment is a kind of substitution plating, and the surface of the copper is substituted with a black compound, but the surface of the transparent substrate 10 such as a PET film which is a nonmetal in the opening is a metal atom that undergoes substitution reaction with tellurium. Because there is no, it will not be black. According to the analysis result, the composition of the second blackening layer 23 includes tellurium chloride. In addition to this, it may further contain copper chloride.
Thus, the electrode member 100 of the present invention in which the entire mesh line is blackened is obtained.
[電極部材の用途]
(タッチパネル)
本発明の電極部材は、タッチパネルセンサー(位置検知電極)として好ましく使用することができ、当該タッチパネルセンサーを含むタッチパネルは、携帯用小型端末、電子ペーパー、コンピュータディスプレイ、電子黒板、小型ゲーム機、現金自動支払機の表示面、乗車券自動販売機などの表示面等に装着されるタッチパネルとして好ましく使用することができる。なお、このような表示装置は、液晶表示装置(LCD)、プラズマ表示装置(PDP)、電場発光(EL)表示装置、陰極線管(CRT)表示装置、電気泳動表示装置等のいずれであってもよい。
[Application of electrode members]
(Touch panel)
The electrode member of the present invention can be preferably used as a touch panel sensor (position detection electrode), and the touch panel including the touch panel sensor is a portable small terminal, electronic paper, computer display, electronic blackboard, small game machine, cash automatic It can be preferably used as a touch panel to be mounted on a display surface of a payment machine, a display surface of a ticket vending machine or the like. Such a display device may be a liquid crystal display device (LCD), a plasma display device (PDP), an electroluminescence (EL) display device, a cathode ray tube (CRT) display device, an electrophoretic display device, or the like. Good.
(その他)
また、本発明の電極部材は、導電性でメッシュ不可視性なので、タッチパネルセンサー以外の用途として、PDPなどの画像表示装置のディスプレイ前面、建築物や乗物の窓に貼付する電磁波シールド材として好ましく使用することができる。
さらに、本発明の電極部材は、透明アンテナ用エレメントとして好ましく使用することができ、当該透明アンテナ用エレメントは、透視性と送受信機能の両機能を具備するため、各種の透明アンテナに利用できる。
当該透明アンテナは、透明性が要求される部位に取付けて好ましく使用することができる。特に携帯電話などモバイル通信機器のディスプレイ前面に取付けて地上波や衛星放送の受信に利用することができ、自動車、バス、トラック、鉄道車両、新交通システムの車両等の窓ガラスに取付けてGPS衛星の位置情報電波、テレビジョン、ラジオ、車輌無線等の電波の受信に使用でき、家屋並びに各種ビル、パーティションにおける窓ガラスに取付けて、地上波や衛星放送を受信するための建築物窓用透明アンテナ等として利用できる。
(Other)
In addition, since the electrode member of the present invention is conductive and invisible to the mesh, it is preferably used as an electromagnetic shielding material to be attached to the front surface of a display of an image display device such as a PDP, a window of a building or a vehicle as an application other than a touch panel sensor. be able to.
Furthermore, the electrode member of the present invention can be preferably used as a transparent antenna element. Since the transparent antenna element has both functions of transparency and transmission / reception, it can be used for various transparent antennas.
The transparent antenna can be preferably used by being attached to a site where transparency is required. In particular, it can be attached to the front of the display of mobile communication devices such as mobile phones and used for receiving terrestrial and satellite broadcasts. It can be attached to the window glass of automobiles, buses, trucks, railway vehicles, new transportation systems, etc. Transparent antenna for building windows that can be used for receiving radio waves such as radio waves, television, radio, vehicle radio, etc., and installed on window glass in houses, various buildings, and partitions to receive terrestrial waves and satellite broadcasts Can be used as etc.
次に、本発明を実施例により、さらに詳細に説明するが、本発明は、この例により何ら限定されるものではない。 EXAMPLES Next, although an Example demonstrates this invention further in detail, this invention is not limited at all by this example.
[実施例1]
透明基材10として、連続帯状で無着色透明な2軸延伸ポリエチレンテレフタレート
フィルム(厚さ100μm)を用意し(図2(a))の表側とする面に、まず、スパッタリング法(真空度:0.5Pa、ターゲット:銅、導入ガス分率:酸素100%)にて厚み0.05μmの酸化第二銅の層を形成し第1黒化膜11とした(図2(b)) 。次いで、抵抗加熱による真空蒸着法(真空度:3×10-3Pa)にて銅蒸着を行い、上記第1黒化膜11の上に厚み3μmの銅膜12を形成した(図2(c))。
次いで、上記の第1黒化膜11/銅膜12部分に対して、フォトリソグラフィー法を利用した腐食加工で、メッシュ状に加工し、透明基材10上にメッシュ状の第1黒化層22及びメッシュ状の銅層21が形成されたメッシュ積層シートを作成した。ここで、『A/B』はA層及びB層をこの順序で積層した積層体を現わすものとする。
[Example 1]
As the transparent base material 10, a continuous belt-shaped, uncolored and transparent biaxially stretched polyethylene terephthalate film (thickness: 100 μm) is prepared (see FIG. 2A). A layer of cupric oxide having a thickness of 0.05 μm was formed at .5 Pa, target: copper, introduced gas fraction: oxygen 100%) to form a first blackened film 11 (FIG. 2B). Next, copper vapor deposition was performed by a resistance heating vacuum vapor deposition method (vacuum degree: 3 × 10 −3 Pa) to form a copper film 12 having a thickness of 3 μm on the first blackened film 11 (FIG. 2C). )).
Next, the first blackened film 11 / copper film 12 portion is processed into a mesh shape by a corrosion process using a photolithography method, and the mesh-shaped first blackened layer 22 is formed on the transparent substrate 10. And the mesh lamination sheet in which the mesh-like copper layer 21 was formed was created. Here, “A / B” represents a stacked body in which the A layer and the B layer are stacked in this order.
具体的には、カラーTVシャドウマスク用の製造ラインを流用して、透明基材1/第1黒化膜11/銅膜12の積層体を連続した帯状シートとして、巻取から巻き出して供給し、この帯状シート(積層体)に対してマスキングからエッチングまでを行った。
まず、該積層体の銅膜12表面の全体へ、カゼイン系の感光性ネガ型レジストからなる感光性のレジスト膜13をディッピング法で塗布した(図2(d))。次のステーションへ間歇搬送し、ネガパターン版(フォトマスク)を用いて、水銀灯からの紫外線を照射して、該ネガパターンを該レジスト膜13上に密着露光した(図示略)。
該ネガパターン版は、透明硝子板表面に所定の電極パターンのネガ(陰画)の遮光パターンを形成したものからなる。該電極パターンは、開口部が正方形で線幅5μm、線間隔(周期)500μm、該帯状シートの両側の辺に対する直交する2組の線群のなす劣角、すなわち、バイアス角度が各々41度及び49度のメッシュ部(第1黒化層22/銅層21からなる)からなり、外輪郭が幅4mm長さ300mmの長方形領域(該長方形領域の内部が該メッシュ状に区画されている)が間隔4mmで50個平行配列されてなる検知電極パターンを含む。更に、各長方形領域の一端には取出回路パターンが接続されてなる。
Specifically, using a production line for a color TV shadow mask, the laminate of transparent substrate 1 / first black film 11 / copper film 12 is supplied as a continuous belt-like sheet unwound from winding. Then, this strip-shaped sheet (laminated body) was subjected to masking to etching.
First, a photosensitive resist film 13 made of casein-based photosensitive negative resist was applied to the entire surface of the copper film 12 of the laminate by a dipping method (FIG. 2D). The film was conveyed intermittently to the next station and irradiated with ultraviolet rays from a mercury lamp using a negative pattern plate (photomask), and the negative pattern was closely exposed on the resist film 13 (not shown).
The negative pattern plate is formed by forming a negative (negative) light shielding pattern of a predetermined electrode pattern on the surface of a transparent glass plate. The electrode pattern has a square opening, a line width of 5 μm, a line interval (period) of 500 μm, a subordinate angle formed by two sets of lines orthogonal to the sides on both sides of the belt-like sheet, that is, a bias angle of 41 degrees and A rectangular region (consisting of the first blackened layer 22 / copper layer 21) of 49 degrees and having an outer contour width of 4 mm and a length of 300 mm (the inside of the rectangular region is partitioned into the mesh shape) It includes 50 detection electrode patterns arranged in parallel at an interval of 4 mm. Further, an extraction circuit pattern is connected to one end of each rectangular area.
露光後、該レジスト膜13を水現像し、硬膜処理し、さらに、100℃でベーキングし、該ネガパターン状のレジストパターン層14を得た(図2(e))。更に次のステーションへ搬送し、腐食液として50℃、42゜ボーメの塩化第二鉄溶液を用いて、スプレイ法で吹きかけて腐食し、レジストパターン層14の開口部(レジスト層不在部)の銅膜12を除去した。当該開口部には第1黒化膜11は残留していた(図2(f))
次いで、次のステーションにて、1%の塩酸を用いてスプレイ法で吹きかけて腐食し、レジストパターン層13の開口部(レジスト層不在部)の第1黒化膜11も除去して開口部を形成した(図2(g))。
次いで、ステーションを搬送しながら、水洗し、レジストパターン層14を剥離し、洗浄し、さらに60℃で乾燥して、該電極パターン状に残留してなるメッシュ状に形成された第1黒化層22/銅層21の積層体を透明基材10上に形成した積層体を得た(図2(h))。
After the exposure, the resist film 13 was developed with water, hardened, and baked at 100 ° C. to obtain the negative pattern resist pattern layer 14 (FIG. 2E). Further, it is transported to the next station, and is corroded by spraying using a ferric chloride solution of 50 ° C. and 42 ° Baume as a corrosive solution, and copper at the opening of the resist pattern layer 14 (resist layer absent portion). The film 12 was removed. The first blackening film 11 remained in the opening (FIG. 2F).
Next, at the next station, 1% hydrochloric acid is used for spraying to corrode and the first blackening film 11 at the opening of the resist pattern layer 13 (resist layer absent portion) is also removed to open the opening. Formed (FIG. 2G).
Next, while transporting the station, it is washed with water, the resist pattern layer 14 is peeled off, washed, and dried at 60 ° C. to form a first blackened layer formed in a mesh shape remaining in the electrode pattern. The laminated body which formed the laminated body of 22 / copper layer 21 on the transparent base material 10 was obtained (FIG.2 (h)).
次いで、金属黒化処理液として、二酸化テルル0.25重量%(テルル濃度として0.2質量%)、塩酸0.45質量%、硫酸20質量%の水溶液を用い、当該処理液に上記積層体(図2(h))を処理温度25℃条件下、30秒間浸漬し、銅が露出している部分に塩化テルル(TeCl2)を含む第2黒化層23を被覆形成し、メッシュ状となった第1黒化層22、銅層21、及び第2黒化層23からなる導電体メッシュ20からなる電極30を得た(図2(i))。
その後、水洗、乾燥工程を経て、透明基材10/電極30(第1黒化層22、銅層21、及び第2黒化層23から構成される導電体メッシュ20からなる)の積層構成のタッチパネル用電極部材100を得た(図2(j))。
Next, an aqueous solution of 0.25% by weight of tellurium dioxide (0.2% by weight of tellurium concentration), 0.45% by weight of hydrochloric acid, and 20% by weight of sulfuric acid is used as the metal blackening treatment solution, and the laminate is used as the treatment solution. (FIG. 2 (h)) is immersed for 30 seconds at a treatment temperature of 25 ° C., and a second blackening layer 23 containing tellurium chloride (TeCl 2 ) is formed on the exposed portion of copper to form a mesh. As a result, an electrode 30 made of the conductive mesh 20 made of the first blackened layer 22, the copper layer 21, and the second blackened layer 23 was obtained (FIG. 2 (i)).
Thereafter, through a water washing and drying process, the transparent substrate 10 / electrode 30 (consisting of the conductive mesh 20 composed of the first blackened layer 22, the copper layer 21, and the second blackened layer 23) is laminated. An electrode member 100 for a touch panel was obtained (FIG. 2 (j)).
10 透明基材
11 第1黒化膜
12 銅膜
13 レジスト膜
14 レジストパターン層
20 導電体メッシュ
21 銅層
22 第1黒化層
23 第2黒化層
30 電極
100 電極部材
DESCRIPTION OF SYMBOLS 10 Transparent base material 11 1st blackening film 12 Copper film 13 Resist film 14 Resist pattern layer 20 Conductor mesh 21 Copper layer 22 1st blackening layer 23 2nd blackening layer 30 Electrode 100 Electrode member
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013219251A JP6201623B2 (en) | 2013-10-22 | 2013-10-22 | Electrode member, method for manufacturing the same, touch panel using the electrode member, and image display device including the touch panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013219251A JP6201623B2 (en) | 2013-10-22 | 2013-10-22 | Electrode member, method for manufacturing the same, touch panel using the electrode member, and image display device including the touch panel |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015082178A JP2015082178A (en) | 2015-04-27 |
JP6201623B2 true JP6201623B2 (en) | 2017-09-27 |
Family
ID=53012755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013219251A Active JP6201623B2 (en) | 2013-10-22 | 2013-10-22 | Electrode member, method for manufacturing the same, touch panel using the electrode member, and image display device including the touch panel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6201623B2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102427146B1 (en) | 2014-06-24 | 2022-07-28 | 가부시키가이샤 브이티에스 터치센서 | Touch sensor substrate, touch panel, display device, and method for manufacturing touch sensor substrate |
JP6421077B2 (en) | 2015-05-19 | 2018-11-07 | 富士フイルム株式会社 | Antenna manufacturing method and touch sensor |
KR102002884B1 (en) | 2015-06-14 | 2019-07-24 | 주식회사 엘지화학 | Touch sensor and method for preparing the same |
JP2017016241A (en) * | 2015-06-29 | 2017-01-19 | プロマティック株式会社 | Method for manufacturing electrode film, touch panel sensor including electrode film, and sticking device |
US10978489B2 (en) | 2015-07-24 | 2021-04-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, display panel, method for manufacturing semiconductor device, method for manufacturing display panel, and information processing device |
JP6823363B2 (en) * | 2015-07-24 | 2021-02-03 | 住友金属鉱山株式会社 | Conductive substrate, manufacturing method of conductive substrate |
WO2017103737A1 (en) | 2015-12-18 | 2017-06-22 | Semiconductor Energy Laboratory Co., Ltd. | Display panel, input/output device, data processing device, and method for manufacturing display panel |
WO2019066336A1 (en) * | 2017-09-26 | 2019-04-04 | 주식회사 엘지화학 | Electrode substrate for transparent light-emitting diode display and method for manufacturing same |
JP7035437B2 (en) * | 2017-10-11 | 2022-03-15 | 東レ株式会社 | Manufacturing method of substrate with conductive pattern and substrate with conductive pattern |
TW202211536A (en) * | 2020-04-09 | 2022-03-16 | 日商大日本印刷股份有限公司 | Wiring board and method for manufacturing wiring board |
CN113835552A (en) * | 2021-08-26 | 2021-12-24 | 牧东光电科技有限公司 | Touch display screen designed by Metal Mesh grid pattern |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0793502B2 (en) * | 1989-09-26 | 1995-10-09 | 松下電工株式会社 | Method for manufacturing multilayer laminate |
JPH11163587A (en) * | 1997-09-29 | 1999-06-18 | Nisshinbo Ind Inc | Electromagnetic shield material, panel and manufacture thereof |
JP4783721B2 (en) * | 2006-12-08 | 2011-09-28 | 大日本印刷株式会社 | Metal blackening method, electromagnetic wave shielding filter, composite filter, and display |
JP5128841B2 (en) * | 2007-04-16 | 2013-01-23 | 日本写真印刷株式会社 | Transparent thin plate |
JP5240106B2 (en) * | 2009-07-06 | 2013-07-17 | 大日本印刷株式会社 | Optical filter and image display device |
JP5418121B2 (en) * | 2009-10-02 | 2014-02-19 | 大日本印刷株式会社 | Transparent conductive material |
JP2012064846A (en) * | 2010-09-17 | 2012-03-29 | Dainippon Printing Co Ltd | Electromagnetic wave shield sheet, method of producing the same, and image display unit |
KR20120138287A (en) * | 2011-06-14 | 2012-12-26 | 삼성전기주식회사 | Touch panel and method of manufacturing the same |
-
2013
- 2013-10-22 JP JP2013219251A patent/JP6201623B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2015082178A (en) | 2015-04-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6201623B2 (en) | Electrode member, method for manufacturing the same, touch panel using the electrode member, and image display device including the touch panel | |
JP5888255B2 (en) | Electrode film, method for producing the same, and image display device | |
JP6233015B2 (en) | Electrode sheet, touch panel using the electrode sheet, and image display device provided with the touch panel | |
US9052786B2 (en) | Conductive sheet, usage method of conductive sheet and capacitive type touch panel | |
CN113299859B (en) | Display panel, display panel preparation method and display device | |
JP2006287729A (en) | Transparent antenna for window of building, and translucent member for window of building with antenna | |
CN105335034A (en) | Metal-grid single-film double-faced capacitance screen functional sheet and manufacturing method thereof | |
JP6445365B2 (en) | Translucent electrode, position detection electrode for touch panel using the translucent electrode, touch panel, and image display device | |
JP2011060146A (en) | Narrow frame touch input sheet and manufacturing method thereof | |
CN111052267B (en) | Electrode film and method for producing same | |
WO2013146787A1 (en) | Light-transmissible electrode | |
US10951211B2 (en) | FPC integrated capacitance switch and method of manufacturing the same | |
WO2007013499A1 (en) | Visible light transmitting type planar coil element | |
JP2011066691A (en) | Antenna | |
JP2979021B2 (en) | Transparent electromagnetic wave shielding material and manufacturing method thereof | |
KR20190032212A (en) | Electrode substrate for transparent light emitting device display and method for manufacturing thereof | |
US20190159339A1 (en) | Conductive structure and manufacturing method therefor | |
JP6722291B2 (en) | Conductive film, touch panel, photomask, imprint template, conductive film forming laminate, conductive film manufacturing method, and electronic device manufacturing method | |
WO2016175095A1 (en) | Conductive substrate and liquid crystal touch panel | |
JP2010287590A (en) | Electromagnetic wave shield material, and grounding-wire takeout structure thereof | |
JP6129611B2 (en) | Manufacturing method of touch panel | |
KR102095374B1 (en) | Method for Manufacturing Touch Panel of Metal-mesh Structure | |
JP6885024B2 (en) | Transparent electrode | |
JP2012064846A (en) | Electromagnetic wave shield sheet, method of producing the same, and image display unit | |
KR100513494B1 (en) | Method for forming electrode in plasma display panel |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160829 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170530 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170531 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170720 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170801 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170814 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6201623 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |