JP6181903B1 - 高光電変換効率太陽電池及び高光電変換効率太陽電池の製造方法 - Google Patents
高光電変換効率太陽電池及び高光電変換効率太陽電池の製造方法 Download PDFInfo
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
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- 239000011574 phosphorus Substances 0.000 description 6
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- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
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- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
前記ベース集電電極の一部が、該ベース集電電極が配置された前記ベース層に隣接する前記エミッタ層上にも配置されたものであることを特徴とする太陽電池を提供する。
前記ベース層上にベース集電電極を形成する工程と
を有する太陽電池の製造方法であって、
前記ベース層上にベース集電電極を形成する工程において、前記ベース集電電極の一部を、前記ベース層に隣接するエミッタ層上にも形成することを特徴とする太陽電池の製造方法を提供する。
本発明の太陽電池の製造方法を用い太陽電池の作製を行った。まず、厚さ200μm、比抵抗1Ω・cmの、リンドープ{100}N型アズカットシリコン基板を多数用意した。次に、熱濃水酸化カリウム水溶液により該シリコン基板のダメージ層を除去した。その後、72℃の水酸化カリウム/2−プロパノール水溶液中に浸漬しテクスチャ形成を行い、引き続き75℃に加熱した塩酸/過酸化水素混合溶液中で洗浄を行った。
Claims (11)
- 第一導電型を有する半導体基板の第一主表面に、前記第一導電型を有するベース層、及び、前記ベース層に隣接し、前記第一導電型と反対の導電型である第二導電型を有するエミッタ層を有し、少なくとも前記ベース層上にベース集電電極を有する太陽電池であって、
前記ベース集電電極の一部が、該ベース集電電極が配置された前記ベース層に隣接する前記エミッタ層上にも前記エミッタ層と接触するように配置されたものであることを特徴とする太陽電池。 - 前記エミッタ層上に配置されたベース集電電極の膜厚は、0.1〜10μmであることを特徴とする請求項1に記載の太陽電池。
- 前記エミッタ層上に配置されたベース集電電極の幅は、0.1〜10μmであることを特徴とする請求項1又は請求項2に記載の太陽電池。
- 前記ベース層は、前記第一主表面において、前記エミッタ層よりも凹んだ位置に配置されていることを特徴とする請求項1から請求項3のいずれか1項に記載の太陽電池。
- 前記エミッタ層は、前記第一主表面において、前記ベース層よりも凹んだ位置に配置されていることを特徴とする請求項1から請求項3のいずれか1項に記載の太陽電池。
- 請求項1から請求項5のいずれか1項に記載の太陽電池が内蔵されていることを特徴とする太陽電池モジュール。
- 請求項6に記載の太陽電池モジュールを有することを特徴とする太陽光発電システム。
- 第一導電型を有する半導体基板の第一主表面に、前記第一導電型を有するベース層、及び、前記ベース層に隣接し、前記第一導電型と反対の導電型である第二導電型を有するエミッタ層を形成する工程と、
前記ベース層上にベース集電電極を形成する工程と
を有する太陽電池の製造方法であって、
前記ベース層上にベース集電電極を形成する工程において、前記ベース集電電極の一部を、前記ベース層に隣接するエミッタ層上にも前記エミッタ層と接触するように形成することを特徴とする太陽電池の製造方法。 - 前記エミッタ層上のベース集電電極の膜厚を、0.1〜10μmとすることを特徴とする請求項8に記載の太陽電池の製造方法。
- 前記エミッタ層上のベース集電電極の幅を、0.1〜10μmとすることを特徴とする請求項8又は請求項9に記載の太陽電池の製造方法。
- 前記ベース集電電極を、スクリーン印刷法を用いて形成することを特徴とする請求項8から請求項10のいずれか1項に記載の太陽電池の製造方法。
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