JP6151648B2 - 作像部材 - Google Patents
作像部材 Download PDFInfo
- Publication number
- JP6151648B2 JP6151648B2 JP2014004255A JP2014004255A JP6151648B2 JP 6151648 B2 JP6151648 B2 JP 6151648B2 JP 2014004255 A JP2014004255 A JP 2014004255A JP 2014004255 A JP2014004255 A JP 2014004255A JP 6151648 B2 JP6151648 B2 JP 6151648B2
- Authority
- JP
- Japan
- Prior art keywords
- imaging
- imaging member
- fluorosilicone
- cavities
- microns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000003384 imaging method Methods 0.000 title claims description 120
- 229920001296 polysiloxane Polymers 0.000 claims description 51
- 239000000463 material Substances 0.000 claims description 43
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 10
- 238000009736 wetting Methods 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- -1 fluorosilicone Polymers 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- 239000006229 carbon black Substances 0.000 claims description 4
- 239000002041 carbon nanotube Substances 0.000 claims description 3
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 3
- 239000000945 filler Substances 0.000 claims description 3
- 229920001973 fluoroelastomer Polymers 0.000 claims description 3
- 229910021389 graphene Inorganic materials 0.000 claims description 3
- 239000000976 ink Substances 0.000 description 54
- 239000010410 layer Substances 0.000 description 48
- 238000000034 method Methods 0.000 description 42
- 239000012530 fluid Substances 0.000 description 24
- 239000000758 substrate Substances 0.000 description 24
- 229920002120 photoresistant polymer Polymers 0.000 description 21
- 238000000059 patterning Methods 0.000 description 14
- 239000002344 surface layer Substances 0.000 description 14
- 230000008569 process Effects 0.000 description 13
- 238000012546 transfer Methods 0.000 description 12
- 238000001878 scanning electron micrograph Methods 0.000 description 11
- 244000208734 Pisonia aculeata Species 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 238000000879 optical micrograph Methods 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- 238000001723 curing Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 238000004049 embossing Methods 0.000 description 4
- 238000000518 rheometry Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 241001479434 Agfa Species 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NRTJGTSOTDBPDE-UHFFFAOYSA-N [dimethyl(methylsilyloxy)silyl]oxy-dimethyl-trimethylsilyloxysilane Chemical compound C[SiH2]O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C NRTJGTSOTDBPDE-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000007774 anilox coating Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- QRPMCZNLJXJVSG-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-henicosafluorodecyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl QRPMCZNLJXJVSG-UHFFFAOYSA-N 0.000 description 1
- PISDRBMXQBSCIP-UHFFFAOYSA-N trichloro(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl PISDRBMXQBSCIP-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/06—Lithographic printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
- B41M5/0256—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet the transferable ink pattern being obtained by means of a computer driven printer, e.g. an ink jet or laser printer, or by electrographic means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/16—Curved printing plates, especially cylinders
- B41N1/22—Curved printing plates, especially cylinders made of other substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/75—Details relating to xerographic drum, band or plate, e.g. replacing, testing
- G03G15/751—Details relating to xerographic drum, band or plate, e.g. replacing, testing relating to drum
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/747,465 | 2013-01-22 | ||
| US13/747,465 US8907998B2 (en) | 2013-01-22 | 2013-01-22 | Apparatus and methods for ink-based digital printing using imaging plate having regular textured surface for reduced pullback |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014141090A JP2014141090A (ja) | 2014-08-07 |
| JP2014141090A5 JP2014141090A5 (enExample) | 2017-02-16 |
| JP6151648B2 true JP6151648B2 (ja) | 2017-06-21 |
Family
ID=51064622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014004255A Expired - Fee Related JP6151648B2 (ja) | 2013-01-22 | 2014-01-14 | 作像部材 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8907998B2 (enExample) |
| JP (1) | JP6151648B2 (enExample) |
| DE (1) | DE102014200458B4 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9250516B2 (en) * | 2013-07-29 | 2016-02-02 | Palo Alto Research Center Incorporated | Method of making a molded textured imaging blanket surface |
| US9272532B2 (en) * | 2013-07-29 | 2016-03-01 | Palo Alto Research Center Incorporated | Molded textured imaging blanket surface |
| US20150116444A1 (en) * | 2013-10-31 | 2015-04-30 | Palo Alto Research Center Incorporated | Imaging Blanket with Dispersed Carbon and Micro-Texture Surface |
| WO2021141589A1 (en) * | 2020-01-09 | 2021-07-15 | Hewlett-Packard Development Company, L.P. | Methods for forming structured images and related aspects |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU4905701A (en) * | 2000-02-08 | 2001-08-20 | 3M Innovative Properties Company | Ink fixing materials and methods of fixing ink |
| DE60200728T2 (de) * | 2001-04-11 | 2005-07-21 | Asahi Glass Co., Ltd. | Tintenstrahlaufzeichnungsmaterial für pigmenthaltige Tinte und Tintenstrahlaufzeichnungsverfahren |
| JP2002321448A (ja) * | 2001-04-26 | 2002-11-05 | Asahi Glass Co Ltd | 顔料インク用インクジェット記録用媒体及びその記録方法 |
| JP2002307810A (ja) * | 2001-04-11 | 2002-10-23 | Asahi Glass Co Ltd | 顔料インク用インクジェット記録媒体及びその記録方法 |
| JP2007290367A (ja) * | 2006-03-31 | 2007-11-08 | Canon Inc | インクジェット記録媒体及びその製造方法並びにインクジェット記録方法 |
| US8323803B2 (en) * | 2009-04-01 | 2012-12-04 | Xerox Corporation | Imaging member |
| US20120103212A1 (en) | 2010-10-29 | 2012-05-03 | Palo Alto Research Center Incorporated | Variable Data Lithography System |
| US9592699B2 (en) | 2011-04-27 | 2017-03-14 | Xerox Corporation | Dampening fluid for digital lithographic printing |
-
2013
- 2013-01-22 US US13/747,465 patent/US8907998B2/en active Active
-
2014
- 2014-01-13 DE DE102014200458.6A patent/DE102014200458B4/de not_active Expired - Fee Related
- 2014-01-14 JP JP2014004255A patent/JP6151648B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE102014200458A1 (de) | 2014-07-24 |
| US8907998B2 (en) | 2014-12-09 |
| DE102014200458B4 (de) | 2020-12-31 |
| US20140204171A1 (en) | 2014-07-24 |
| JP2014141090A (ja) | 2014-08-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
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| A521 | Request for written amendment filed |
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| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
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| LAPS | Cancellation because of no payment of annual fees |