JP6131187B2 - Manufacturing method of glass substrate for HDD - Google Patents

Manufacturing method of glass substrate for HDD Download PDF

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JP6131187B2
JP6131187B2 JP2013522434A JP2013522434A JP6131187B2 JP 6131187 B2 JP6131187 B2 JP 6131187B2 JP 2013522434 A JP2013522434 A JP 2013522434A JP 2013522434 A JP2013522434 A JP 2013522434A JP 6131187 B2 JP6131187 B2 JP 6131187B2
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glass substrate
cleaning
hdd
cleaning liquid
outer peripheral
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JPWO2013001798A1 (en
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典子 島津
典子 島津
直之 福本
直之 福本
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Hoya Corp
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67313Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements

Description

本発明は、HDD用ガラス基板の製造方法、HDD用ガラス基板、及びHDD用磁気記録媒体に関する。   The present invention relates to a method for manufacturing a glass substrate for HDD, a glass substrate for HDD, and a magnetic recording medium for HDD.

近年、HDD(hard disk drive)用磁気記録媒体に格納される情報の高密度化に伴い、磁気ヘッドの浮上高さが益々小さくなっており、数百nmの付着物でもヘッドクラッシュ(head crash)やサーマルアスペリティ(thermal asperity)を引き起こすほどである。特に、DFH(dynamic flying height)機構を搭載したヘッドの場合、ヘッドの浮上高さが数nmにまで微小なものとなり、HDD用磁気記録媒体の清浄性が強く求められている。また、記録領域の拡大に伴い、記録領域が記録媒体の外周端部にまで広がっている。そのため、記録媒体の最外周部まで高い清浄性が求められている。   In recent years, with the increase in the density of information stored in magnetic recording media for HDD (hard disk drive), the flying height of the magnetic head has become smaller and even a deposit of several hundred nm has caused a head crash. And cause thermal asperity. In particular, in the case of a head equipped with a DFH (dynamic flying height) mechanism, the flying height of the head is as small as several nanometers, and the cleanliness of the magnetic recording medium for HDD is strongly demanded. As the recording area is enlarged, the recording area is extended to the outer peripheral edge of the recording medium. Therefore, high cleanliness is required up to the outermost periphery of the recording medium.

HDD用磁気記録媒体の基板に用いられるHDD用ガラス基板は、その製造過程において、検査工程の前に洗浄液で洗浄される。この洗浄工程では、ガラス基板は、例えば洗浄キャリア等と称される専用容器に収容された状態で、洗浄槽に入れられ、洗浄槽内で洗浄液が流されて洗浄される。   The glass substrate for HDD used for the substrate of the magnetic recording medium for HDD is cleaned with a cleaning liquid before the inspection process in the manufacturing process. In this cleaning step, the glass substrate is placed in a cleaning tank in a state of being accommodated in a dedicated container called a cleaning carrier, for example, and the cleaning liquid is poured in the cleaning tank to be cleaned.

特許文献1に記載されるように、洗浄キャリアは、一対の対向壁間に複数の保持用ロッドが所定の間隔で相互に平行に架設された構造である。各保持用ロッドの周面には周方向に凹溝が形成されている。ガラス基板は、その両側端部と下端部とが3本の保持用ロッドで保持され、凹溝に嵌り込み、立った状態で洗浄キャリアに収容される。洗浄後、ガラス基板は、洗浄キャリアに収容された状態のまま乾燥される。   As described in Patent Document 1, the cleaning carrier has a structure in which a plurality of holding rods are installed in parallel with each other at a predetermined interval between a pair of opposing walls. A concave groove is formed in the circumferential direction on the peripheral surface of each holding rod. The glass substrate is held at its both end portions and lower end portions by three holding rods, fits into the groove, and is housed in the cleaning carrier in a standing state. After the cleaning, the glass substrate is dried while being accommodated in the cleaning carrier.

特開2009−87472号公報JP 2009-87472 A

ところで、洗浄、乾燥後のガラス基板の外周端部に欠陥(defect)が残ると、ガラス基板の主表面の上に記録層を形成して磁気記録媒体としたときに記録領域に障害が出るという問題がある。   By the way, if a defect remains at the outer peripheral edge of the glass substrate after cleaning and drying, the recording area is disturbed when a recording layer is formed on the main surface of the glass substrate to form a magnetic recording medium. There's a problem.

そこで、本発明の目的は、洗浄、乾燥後のガラス基板の外周端部に欠陥が残らないHDD用ガラス基板の製造方法、その製造方法により製造されたHDD用ガラス基板、及びそのHDD用ガラス基板を用いたHDD用磁気記録媒体を提供することである。   Accordingly, an object of the present invention is to provide a method for producing a glass substrate for HDD in which no defects remain on the outer peripheral edge of the glass substrate after cleaning and drying, a glass substrate for HDD produced by the production method, and the glass substrate for HDD. It is providing the magnetic recording medium for HDDs using this.

すなわち、本発明の一局面は、ガラス基板を洗浄液で洗浄する洗浄工程を含むHDD用ガラス基板の製造方法であって、洗浄工程では、ガラス基板に対して洗浄液をガラス基板の主表面に平行な方向であって相互に異なる複数の方向に順に流して洗浄することを特徴とするHDD用ガラス基板の製造方法である。   That is, one aspect of the present invention is a method for manufacturing a glass substrate for HDD including a cleaning step of cleaning a glass substrate with a cleaning liquid. In the cleaning step, the cleaning liquid is parallel to the main surface of the glass substrate with respect to the glass substrate. A method of manufacturing a glass substrate for HDD, wherein the cleaning is performed by sequentially flowing in a plurality of different directions.

本発明の他の一局面は、前記HDD用ガラス基板の製造方法により製造されたことを特徴とするHDD用ガラス基板である。   Another aspect of the present invention is a glass substrate for HDD manufactured by the method for manufacturing a glass substrate for HDD.

本発明のさらに他の一局面は、前記HDD用ガラス基板の主表面の上に記録層が設けられたことにより製造されたことを特徴とするHDD用磁気記録媒体である。   Yet another aspect of the present invention is an HDD magnetic recording medium manufactured by providing a recording layer on a main surface of the HDD glass substrate.

前記並びにその他の本発明の目的、特徴及び利点は、以下の詳細な記載と添付図面とから明らかになるであろう。   The above and other objects, features and advantages of the present invention will become apparent from the following detailed description and the accompanying drawings.

図1は、本発明の実施形態に係るHDD用ガラス基板の斜視図である。FIG. 1 is a perspective view of a glass substrate for HDD according to an embodiment of the present invention. 図2は、本発明の実施形態に係るHDD用ガラス基板の製造工程図である。FIG. 2 is a manufacturing process diagram of the glass substrate for HDD according to the embodiment of the present invention. 図3は、2次研磨工程で用いられる両面研磨機の主要部の構成を示す概略側面図である。FIG. 3 is a schematic side view showing the configuration of the main part of a double-side polishing machine used in the secondary polishing process. 図4は、最終洗浄工程後にガラス基板の外周端部に発見される欠陥の1例を示す図面代用写真である。FIG. 4 is a drawing-substituting photograph showing an example of defects found at the outer peripheral edge of the glass substrate after the final cleaning step. 図5は、最終洗浄工程で用いられる洗浄キャリアの斜視図である。FIG. 5 is a perspective view of a cleaning carrier used in the final cleaning step. 図6は、前記洗浄キャリアの側面図である。FIG. 6 is a side view of the cleaning carrier. 図7は、前記洗浄キャリアの正面図である。FIG. 7 is a front view of the cleaning carrier. 図8は、最終洗浄工程でガラス基板に対して洗浄液を流す方向の1例を示す説明図である。FIG. 8 is an explanatory diagram showing an example of the direction in which the cleaning liquid is passed through the glass substrate in the final cleaning step. 図9は、最終洗浄工程でガラス基板に対して洗浄液を流す方向の他の例を示す説明図である。FIG. 9 is an explanatory view showing another example of the direction in which the cleaning liquid flows through the glass substrate in the final cleaning step.

以下、図面を参照して、本発明の実施形態を説明する。ただし、本発明はこの実施形態に限定されるものではない。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention is not limited to this embodiment.

従来、洗浄、乾燥後のガラス基板の外周端部に欠陥が残り、そのため、ガラス基板の主表面の上に記録層を形成して磁気記録媒体としたときに記録領域に障害が出るという問題があった。   Conventionally, a defect remains in the outer peripheral edge of the glass substrate after cleaning and drying, and therefore, there is a problem that a recording area is obstructed when a recording layer is formed on the main surface of the glass substrate to form a magnetic recording medium. there were.

本発明者等は、従来、洗浄槽内で洗浄液を1方向にのみ流していたので、ガラス基板の外周端部において保持用ロッドの裏(洗浄液の流れに対して裏)に隠れる部分が生じ、この部分で洗浄残りが生じ、この洗浄残りがガラス基板の外周端部に欠陥となって残っていたことを見出して本発明を完成した。   Since the present inventors conventionally flowed the cleaning liquid only in one direction in the cleaning tank, a portion hidden behind the holding rod (back to the flow of the cleaning liquid) occurs at the outer peripheral end of the glass substrate, The present invention was completed by finding that a cleaning residue was generated in this portion, and that this cleaning residue was left as a defect at the outer peripheral edge of the glass substrate.

なお、本実施形態において、ガラス基板の洗浄工程等で、上、下、左、右、前、後、横等と方向をいうときは、特に断りがない限り、ガラス基板の主表面が重力方向と平行になるように前記ガラス基板を立てたときの前記主表面に関していう。   In this embodiment, in the glass substrate cleaning process and the like, when referring to directions such as up, down, left, right, front, back, side, etc., the main surface of the glass substrate is in the direction of gravity unless otherwise specified. This refers to the main surface when the glass substrate is erected so as to be in parallel.

<HDD用ガラス基板の製造方法>
図1に示すガラス基板50及び図2に示す製造工程図を参照して、HDD用ガラス基板の製造方法を説明する。
<Method for producing glass substrate for HDD>
The manufacturing method of the glass substrate for HDD is demonstrated with reference to the glass substrate 50 shown in FIG. 1, and the manufacturing-process figure shown in FIG.

本実施形態においては、HDD用ガラス基板50は、円盤加工工程、ラップ工程、1次研磨(粗研磨)工程、2次研磨(精密研磨)工程、化学強化工程、最終洗浄工程、検査工程等を経て製造される。   In the present embodiment, the HDD glass substrate 50 includes a disk processing step, a lapping step, a primary polishing (rough polishing) step, a secondary polishing (precision polishing) step, a chemical strengthening step, a final cleaning step, an inspection step, and the like. It is manufactured after.

ガラス基板50に用いられるガラス素材は、二酸化ケイ素(SiO)を主成分とするガラス組成物で構成される。ガラス組成物は、マグネシウム、カルシウム及び/又はセリウムを含んでも含まなくてもよい。代表的なガラス組成物は、例えば、SiO、Al、B、LiO、NaO、KO、MgO、CaO、BaO、SrO、ZnO等を含んだものである。Glass material used for the glass substrate 50 is composed of a glass composition whose main component is silicon dioxide (SiO 2). The glass composition may or may not contain magnesium, calcium and / or cerium. Typical glass compositions include, for example, SiO 2 , Al 2 O 3 , B 2 O 3 , Li 2 O, Na 2 O, K 2 O, MgO, CaO, BaO, SrO, ZnO and the like. is there.

[円盤加工工程]
円盤加工工程では、溶融したガラス素材を金型に流し込んでプレス成形することにより円盤状のガラス基板(これをblankという)を作製する。このときのガラス基板の大きさとしては、例えば、外径が2.5インチ、1.8インチ、1.0インチ、0.8インチ等、板厚が、2mm、1mm、0.8mm、0.63mm等である。得られたガラス基板の中心部に、例えばダイヤモンドコアドリル等を用いて円孔を形成し、環状のガラス基板とする。
[Disc machining process]
In the disk processing step, a molten glass material is poured into a mold and press-molded to produce a disk-shaped glass substrate (referred to as a blank). As the size of the glass substrate at this time, for example, the outer diameter is 2.5 inches, 1.8 inches, 1.0 inches, 0.8 inches, etc., and the plate thickness is 2 mm, 1 mm, 0.8 mm, 0 .63 mm or the like. A circular hole is formed in the center part of the obtained glass substrate, for example using a diamond core drill etc., and it is set as a cyclic | annular glass substrate.

[ラップ工程]
ラップ工程は、第1ラップ工程と第2ラップ工程とを含む。第1ラップ工程では、ガラス基板の表裏両面を研削し、ガラス基板の全体形状、すなわちガラス基板の平行度、平坦度及び厚み等を予備調整する。第2ラップ工程では、第1ラップ工程に続いて、ガラス基板の表裏両面を再び研削し、ガラス基板の全体形状、すなわちガラス基板の平行度、平坦度及び厚み等をさらに微調整する。ラップ工程では、例えばダイヤモンドペレットが貼り付けられた上下定盤を備える両面研削機が用いられる。
[Lapping process]
The lapping process includes a first lapping process and a second lapping process. In the first lapping step, both the front and back surfaces of the glass substrate are ground, and the overall shape of the glass substrate, that is, the parallelism, flatness, thickness and the like of the glass substrate are preliminarily adjusted. In the second lapping step, following the first lapping step, both the front and back surfaces of the glass substrate are ground again to further finely adjust the overall shape of the glass substrate, that is, the parallelism, flatness, thickness and the like of the glass substrate. In the lapping process, for example, a double-side grinding machine including an upper and lower surface plate on which diamond pellets are attached is used.

[1次研磨工程]
1次研磨工程では、次の2次研磨工程で最終的に求められる表面粗さが効率よく得られるように、ガラス基板の表裏両面を粗研磨する。この1次研磨工程では、例えば研磨パッドとして発泡ウレタンパッドが貼り付けられた上下一対の定盤を備える両面研磨機が用いられ、研磨液として例えば酸化セリウムを研磨砥粒として含むスラリー状の研磨液が用いられる。ただし、これに限定されるものではない。
[Primary polishing process]
In the primary polishing step, both the front and back surfaces of the glass substrate are roughly polished so that the surface roughness finally obtained in the next secondary polishing step can be efficiently obtained. In this primary polishing step, for example, a double-side polishing machine having a pair of upper and lower surface plates with a foamed urethane pad attached as a polishing pad is used, and a slurry-like polishing liquid containing, for example, cerium oxide as abrasive grains as the polishing liquid Is used. However, it is not limited to this.

[2次研磨工程]
2次研磨工程では、1次研磨工程に続いて、最終的に求められる表面粗さが得られるように、ガラス基板の表裏両面を精密研磨する。この2次研磨工程では、図3に示すように、ガラス基板50の表裏両面を同時研磨することが可能な両面研磨機10が用いられる。
[Secondary polishing process]
In the secondary polishing step, following the primary polishing step, both the front and back surfaces of the glass substrate are precisely polished so that the finally obtained surface roughness can be obtained. In the secondary polishing step, as shown in FIG. 3, a double-side polishing machine 10 capable of simultaneously polishing both the front and back surfaces of the glass substrate 50 is used.

両面研磨機10は、相互に平行になるように上下に間隔をおいて配置され、相互に逆方向に回転可能な円盤状の上定盤11と下定盤12とを備えている。この上下一対の定盤11,12の各対向面にガラス基板50の表裏両面を研磨するための研磨パッド(本実施形態ではポリウレタン製のスウェードパッド)Pが貼り付けられている。定盤11,12の間には、回転可能な複数のキャリア13が配置され、各キャリア13には、複数のガラス基板50が嵌め込まれてセットされている。キャリア13は、ガラス基板50を保持した状態で、自転しながら定盤11,12の回転中心に対して公転する。このような動作をしている上下定盤11,12及びキャリア13に対して、砥粒(本実施形態ではコロイダルシリカ)を含むスラリー状の研磨液が上定盤11の研磨パッドPとガラス基板50との間、及び、下定盤12の研磨パッドPとガラス基板50との間にそれぞれ供給され、これにより、ガラス基板50の表裏両面の精密研磨が実行される。   The double-side polishing machine 10 includes a disk-shaped upper surface plate 11 and a lower surface plate 12 which are arranged at intervals in the vertical direction so as to be parallel to each other and are rotatable in opposite directions. A polishing pad (a polyurethane suede pad in this embodiment) P for polishing the front and back surfaces of the glass substrate 50 is attached to the opposing surfaces of the pair of upper and lower surface plates 11 and 12. A plurality of rotatable carriers 13 are arranged between the surface plates 11 and 12, and a plurality of glass substrates 50 are fitted and set in each carrier 13. The carrier 13 revolves around the rotation center of the surface plates 11 and 12 while rotating while holding the glass substrate 50. A slurry-like polishing liquid containing abrasive grains (colloidal silica in the present embodiment) is applied to the upper and lower surface plates 11 and 12 and the carrier 13 that are operating in this manner. 50, and between the polishing pad P of the lower surface plate 12 and the glass substrate 50, respectively, thereby performing precise polishing on both the front and back surfaces of the glass substrate 50.

なお、図3において、符号14は研磨液回収装置、符号15は研磨液貯留タンク、符号16は研磨液供給管、符号17は潤滑液貯留タンク、符号18は潤滑液供給管である。   In FIG. 3, reference numeral 14 denotes a polishing liquid recovery device, reference numeral 15 denotes a polishing liquid storage tank, reference numeral 16 denotes a polishing liquid supply pipe, reference numeral 17 denotes a lubricating liquid storage tank, and reference numeral 18 denotes a lubricating liquid supply pipe.

[化学強化工程]
化学強化工程では、ガラス基板の表面に化学強化層を形成する。例えば、ガラス基板をナトリウムイオンやカリウムイオンの存在する化学強化処理液に浸漬することにより、ガラス基板の表層に存在するリチウムイオンが化学強化処理液中のナトリウムイオンと置換されたりあるいはナトリウムイオンがカリウムイオンと置換されて、ガラス基板の表層が化学強化層となる。化学強化層には圧縮応力がかかっている。このような化学強化層を形成することにより、最終的に得られるガラス基板50の耐衝撃性、耐振動性及び耐熱性等が向上する。
[Chemical strengthening process]
In the chemical strengthening step, a chemical strengthening layer is formed on the surface of the glass substrate. For example, by immersing a glass substrate in a chemical strengthening treatment solution containing sodium ions or potassium ions, lithium ions existing on the surface layer of the glass substrate are replaced with sodium ions in the chemical strengthening treatment solution, or sodium ions are potassium. By replacing the ions, the surface layer of the glass substrate becomes a chemically strengthened layer. A compressive stress is applied to the chemically strengthened layer. By forming such a chemically strengthened layer, the impact resistance, vibration resistance, heat resistance, and the like of the finally obtained glass substrate 50 are improved.

[最終洗浄工程]
(総論)
最終洗浄工程では、ガラス基板に付着している異物を、例えば、フィルタリングした純水、イオン交換水、超純水、酸性洗剤、中性洗剤、アルカリ性洗剤、有機溶剤、界面活性剤等を含んだ各種洗浄液を用いて、洗浄し、除去する。その後、ガラス基板を乾燥する。
[Final cleaning process]
(General)
In the final cleaning step, foreign substances adhering to the glass substrate include, for example, filtered pure water, ion-exchanged water, ultrapure water, acidic detergent, neutral detergent, alkaline detergent, organic solvent, surfactant and the like. Wash and remove using various cleaning solutions. Thereafter, the glass substrate is dried.

(従来の最終洗浄工程)
従来、ガラス基板を洗浄キャリアに収容し、この状態で洗浄槽に入れ、洗浄槽内でガラス基板に対して洗浄液を流すことにより洗浄を行っていた。このとき、洗浄槽内で洗浄液を1方向(例えば上下方向のうちの下から上への1方向)にのみ流していたので、ガラス基板の外周端部において、洗浄キャリアの保持用ロッドの裏(洗浄液の流れに対して裏)に隠れる部分が生じ、この部分で洗浄残りが生じ、この洗浄残りが、図4に例示するように、ガラス基板50の外周端部に欠陥(defect)となって残るという問題があった。
(Conventional final cleaning process)
Conventionally, a glass substrate is housed in a cleaning carrier, put in this state in a cleaning tank, and cleaning is performed by flowing a cleaning solution over the glass substrate in the cleaning tank. At this time, since the cleaning liquid was flowed only in one direction (for example, one direction from the bottom to the top in the vertical direction) in the cleaning tank, the back of the cleaning carrier holding rod ( A portion hidden behind the flow of the cleaning liquid is generated, and a cleaning residue is generated in this portion, and this cleaning residue becomes a defect at the outer peripheral edge of the glass substrate 50 as illustrated in FIG. There was a problem of remaining.

(本実施形態の最終洗浄工程)
本実施形態においては、ガラス基板50に対して洗浄液をガラス基板50の主表面に平行な方向であって相互に異なる複数の方向に順に流してガラス基板50を洗浄する。
(Final cleaning process of this embodiment)
In the present embodiment, the glass substrate 50 is cleaned by flowing a cleaning liquid in a direction parallel to the main surface of the glass substrate 50 in a plurality of directions different from each other.

図5〜図7に示すように、洗浄キャリア20は、前後一対の対向壁21,22間に複数(図例では5つ)の保持用ロッド23が所定の間隔で相互に平行に架設された構造である。各保持用ロッド23の周面には周方向に凹溝が形成されている。ガラス基板50は、その両側端部と下端部とが3本の保持用ロッド23で保持され、凹溝に嵌り込み、立った状態で洗浄キャリア20に収容される。洗浄キャリア20は一度に多数のガラス基板50を収容できる。   As shown in FIGS. 5 to 7, in the cleaning carrier 20, a plurality of (five in the illustrated example) holding rods 23 are installed in parallel with each other at a predetermined interval between a pair of front and rear opposing walls 21 and 22. Structure. A concave groove is formed in the circumferential direction on the peripheral surface of each holding rod 23. The glass substrate 50 is held at its both ends and lower ends by three holding rods 23, fits into the groove, and is housed in the cleaning carrier 20 in a standing state. The cleaning carrier 20 can accommodate many glass substrates 50 at a time.

本実施形態においては、この最終洗浄工程では、ガラス基板50を複数の保持用ロッド23で保持して洗浄し、洗浄後、ガラス基板50をその状態のまま、つまり複数の保持用ロッド23で保持した状態のまま乾燥する。ガラス基板50を保持する3本の保持用ロッド23は、保持するガラス基板50の中心に関して、略相互に90°ずつ離間している。保持用ロッド23が略相互に90°ずつ離間した状態でガラス基板50を乾燥することにより、ガラス基板50の外周端部を保持する保持用ロッド23とガラス基板50との間に洗浄液が残留してガラス基板50の外周端部に付着することを低減できる。   In this embodiment, in this final cleaning step, the glass substrate 50 is held and cleaned by a plurality of holding rods 23, and after cleaning, the glass substrate 50 is held in that state, that is, held by the plurality of holding rods 23. Dry as it is. The three holding rods 23 that hold the glass substrate 50 are separated from each other by about 90 ° with respect to the center of the glass substrate 50 to be held. The glass substrate 50 is dried in a state where the holding rods 23 are separated from each other by 90 °, so that the cleaning liquid remains between the holding rod 23 that holds the outer peripheral edge of the glass substrate 50 and the glass substrate 50. Thus, it is possible to reduce the adhesion to the outer peripheral edge of the glass substrate 50.

図8、図9に示すように、ガラス基板50を洗浄キャリア20に収容した状態で洗浄槽30に入れ、洗浄槽30内で洗浄液31を流すことによりガラス基板50を洗浄する。このとき、ガラス基板50は、その主表面が洗浄液31の流れ方向と平行になるように洗浄槽30内に配置される。   As shown in FIGS. 8 and 9, the glass substrate 50 is put in the cleaning tank 30 in a state where it is accommodated in the cleaning carrier 20, and the glass substrate 50 is cleaned by flowing the cleaning liquid 31 in the cleaning tank 30. At this time, the glass substrate 50 is disposed in the cleaning tank 30 so that the main surface thereof is parallel to the flow direction of the cleaning liquid 31.

図8は、洗浄槽30の上下に洗浄液給排装置(洗浄液31を洗浄槽30に供給し又は洗浄槽30から排出する装置をいう)32,33が備えられ、洗浄槽30内を洗浄液31がガラス基板50の主表面に関して上下2方向に流れる場合を示している。その結果、ガラス基板50に対して、洗浄液31を、上下方向のうちの下から上への1方向(噴流という)と、上から下への1方向(掛流しという)とに、順に切り替えて流すことができる(上下2方向)。噴流と掛流しのいずれを先に行ってもよいし、噴流と掛流しとを何回繰り返してもよい。また、ガラス基板50を噴流専用の洗浄槽と掛流し専用の洗浄槽とに移し替えてもよい。   8 is provided with cleaning liquid supply / discharge devices (referred to as apparatuses for supplying or discharging the cleaning liquid 31 to or from the cleaning tank 30) 32 and 33 above and below the cleaning tank 30, and the cleaning liquid 31 is disposed inside the cleaning tank 30. The case where the main surface of the glass substrate 50 flows in two directions is shown. As a result, the cleaning liquid 31 is sequentially switched with respect to the glass substrate 50 in one direction from the bottom to the top in the vertical direction (referred to as jet) and one direction from the top to the bottom (referred to as flowing). It can flow (up and down 2 directions). Either the jet flow or the hanging flow may be performed first, and the jet flow and the flowing flow may be repeated any number of times. Moreover, you may transfer the glass substrate 50 to the washing tank only for a jet, and the washing tank only for a pouring.

図9は、洗浄槽30の左右に洗浄液給排装置34,35が備えられ、洗浄槽30内を洗浄液31がガラス基板50の主表面に関して左右2方向に流れる場合を示している。その結果、ガラス基板50に対して、洗浄液31を、左右の横方向のうちの左から右への1方向(左層流という)と、右から左への1方向(右層流という)とに、順に切り替えて流すことができる(左右2方向)。左層流と右層流のいずれを先に行ってもよいし、左層流と右層流とを何回繰り返してもよい。また、ガラス基板50を左層流専用の洗浄槽と右層流専用の洗浄槽とに移し替えてもよい。   FIG. 9 shows a case where cleaning liquid supply / discharge devices 34 and 35 are provided on the left and right of the cleaning tank 30, and the cleaning liquid 31 flows in the left and right directions with respect to the main surface of the glass substrate 50 in the cleaning tank 30. As a result, with respect to the glass substrate 50, the cleaning liquid 31 is divided into one direction from left to right (referred to as a left laminar flow) and one direction from right to left (referred to as a right laminar flow) in the left and right lateral directions. In addition, the flow can be switched in order (two left and right directions). Either the left laminar flow or the right laminar flow may be performed first, and the left laminar flow and the right laminar flow may be repeated any number of times. Further, the glass substrate 50 may be transferred to a cleaning tank dedicated to the left laminar flow and a cleaning tank dedicated to the right laminar flow.

図示しないが、洗浄槽30の上下左右に洗浄液給排装置32〜35を備え、ガラス基板50に対して、洗浄液31を、下から上への噴流にも、上から下へ掛流しにも、左から右への左層流にも、右から左への右層流にも流すことができるようにしてもよい。そして、これらの方向のうちの2種以上を任意に組み合わせて順に切り替えてガラス基板50に対して洗浄液31を流すことができる。   Although not shown, the cleaning liquid supply / discharge devices 32 to 35 are provided on the top, bottom, left, and right of the cleaning tank 30, and the cleaning liquid 31 is sprayed from the bottom to the top or the top to the bottom with respect to the glass substrate 50. It may be possible to flow in a left laminar flow from left to right or a right laminar flow from right to left. Then, two or more of these directions can be arbitrarily combined and sequentially switched to allow the cleaning liquid 31 to flow over the glass substrate 50.

(本実施形態の作用)
本実施形態においては、ガラス基板50に対して洗浄液31がガラス基板50の主表面に平行な方向であって相互に異なる複数の方向に順に切り替わって流れるので、ある方向の洗浄液31の流れに対しては保持用ロッド23の裏に隠れる部分となっても、その部分は、別の方向の洗浄液31の流れに対しては保持用ロッド23の裏に隠れる部分ではなくなる。そのため、ガラス基板50の外周端部の洗浄残りが解消されて、洗浄、乾燥後のガラス基板50の外周端部に欠陥が残ることが抑制される。
(Operation of this embodiment)
In the present embodiment, the cleaning liquid 31 flows in a direction parallel to the main surface of the glass substrate 50 and in a plurality of different directions in order with respect to the glass substrate 50, so that the cleaning liquid 31 flows in a certain direction. Even if it becomes a portion hidden behind the holding rod 23, that portion is not a portion hidden behind the holding rod 23 with respect to the flow of the cleaning liquid 31 in another direction. Therefore, the cleaning residue at the outer peripheral edge of the glass substrate 50 is eliminated, and it is suppressed that defects remain at the outer peripheral edge of the glass substrate 50 after cleaning and drying.

本実施形態においては、ガラス基板50をその両側端部及び下端部の3点で保持して洗浄する。つまり、3つの保持用ロッド23のうちの1つがガラス基板50の左側端部を保持し、1つが右側端部を保持し、1つが下端部を保持するのである。これにより、ガラス基板50を洗浄中安定して保持することができる。また、3つの保持部がガラス基板50の中心に関して90°ずつ離間しているから、保持用ロッド23とガラス基板50との間に洗浄液31が残留してガラス基板50の外周端部に付着することが低減する。   In the present embodiment, the glass substrate 50 is cleaned while being held at three points on both side edges and a lower edge. That is, one of the three holding rods 23 holds the left end of the glass substrate 50, one holds the right end, and one holds the lower end. Thereby, the glass substrate 50 can be stably held during cleaning. Further, since the three holding portions are separated by 90 ° with respect to the center of the glass substrate 50, the cleaning liquid 31 remains between the holding rod 23 and the glass substrate 50 and adheres to the outer peripheral end portion of the glass substrate 50. That will be reduced.

本実施形態においては、ガラス基板50の全ての保持部で、ガラス基板50と保持用ロッド23とが必ず接している。これにより、ガラス基板50の乾燥時にガラス基板50へのパーティクルの付着や洗浄液31の乾燥染みの発生を防ぐことができる。つまり、3つの保持用ロッド23のそれぞれがガラス基板50と必ず接しているので、ガラス基板50と保持用ロッド23との間に洗浄液31が溜まることが避けられる。仮に、ガラス基板50と保持用ロッド23とが離間していると、ガラス基板50と保持用ロッド23との間に洗浄液31が表面張力で溜まり、乾燥時に、その溜まった洗浄液31に含まれるパーティクルがガラス基板50側に移動してガラス基板50に付着して残ったり、洗浄液31そのものがガラス基板50側に移動してガラス基板50に乾燥染みとなって残ってしまう。これらのパーティクルの付着や洗浄液31の乾燥染みもまた欠陥(defect)となる。これに対し、本実施形態では、ガラス基板50の全ての保持部で、ガラス基板50と保持用ロッド23とが必ず接しており、離間していないので、前記のような不具合が抑制される。すなわち、ガラス基板50の外周端部と保持用ロッド23とが離間している場合に生じ得る、ガラス基板50の外周端部と保持用ロッド23との間の洗浄液31の膜が回避でき、ガラス基板50の乾燥後に、洗浄液31の膜が乾燥することに起因する付着物等の欠陥がガラス基板50の外周端部に残ることが抑制される。   In the present embodiment, the glass substrate 50 and the holding rod 23 are in contact with each other at all the holding portions of the glass substrate 50. Thereby, it is possible to prevent the adhesion of particles to the glass substrate 50 and the generation of the dry stain of the cleaning liquid 31 when the glass substrate 50 is dried. That is, since each of the three holding rods 23 is always in contact with the glass substrate 50, it is possible to avoid the cleaning liquid 31 from being accumulated between the glass substrate 50 and the holding rod 23. If the glass substrate 50 and the holding rod 23 are separated, the cleaning liquid 31 accumulates between the glass substrate 50 and the holding rod 23 due to surface tension, and particles contained in the accumulated cleaning liquid 31 during drying. Moves to the glass substrate 50 side and remains attached to the glass substrate 50, or the cleaning liquid 31 itself moves to the glass substrate 50 side and remains on the glass substrate 50 as a dry stain. The adhesion of these particles and the dry stain of the cleaning liquid 31 also become defects. On the other hand, in this embodiment, since the glass substrate 50 and the holding rod 23 are always in contact with each other in all the holding portions of the glass substrate 50 and are not separated from each other, the above-described problems are suppressed. That is, the film of the cleaning liquid 31 between the outer peripheral end of the glass substrate 50 and the holding rod 23 that can be generated when the outer peripheral end of the glass substrate 50 and the holding rod 23 are separated can be avoided. After the substrate 50 is dried, it is possible to prevent defects such as deposits resulting from the drying of the film of the cleaning liquid 31 from remaining on the outer peripheral edge of the glass substrate 50.

本実施形態においては、洗浄液31をガラス基板50の主表面に関して上下方向及び横方向に流すことが好ましい。これにより、特に、ガラス基板50をその両側端部及び下端部の3点で保持して洗浄する場合に、乾燥時に保持部への洗浄液31の液残りがなくなり、ガラス基板50への洗浄液31の乾燥染みやパーティクルの付着を防止できる。また、確実に保持用ロッド23の裏に隠れる部分がなくなって、洗浄、乾燥後のガラス基板50の外周端部に欠陥が残ることが確実に抑制される。   In the present embodiment, the cleaning liquid 31 is preferably flowed in the vertical direction and the horizontal direction with respect to the main surface of the glass substrate 50. Thereby, in particular, when the glass substrate 50 is held and cleaned at three points on both side ends and the lower end thereof, the cleaning liquid 31 does not remain in the holding portion during drying, and the cleaning liquid 31 on the glass substrate 50 is removed. Dry stains and particle adhesion can be prevented. In addition, the portion hidden behind the holding rod 23 is surely lost, and it is reliably suppressed that a defect remains in the outer peripheral end of the glass substrate 50 after cleaning and drying.

本実施形態においては、洗浄液31をガラス基板50の主表面に関して上下方向の相対向する2方向(噴流と掛流し)及び横方向の相対向する2方向(左層流と右層流)に流すことが好ましい。つまり、洗浄液31を上下左右4方向に順に切り替えて流すのである。これにより、特に、ガラス基板50をその両側端部及び下端部の3点で保持して洗浄する場合に、乾燥時に保持部への洗浄液31の液残りが確実になくなり、ガラス基板50への洗浄液31の乾燥染みやパーティクルの付着を確実に防止できる。また、より一層確実に保持用ロッド23の裏に隠れる部分がなくなって、洗浄、乾燥後のガラス基板50の外周端部に欠陥が残ることがより一層確実に抑制される。   In the present embodiment, the cleaning liquid 31 is flowed in two opposite directions (jet flow and flowing) in the vertical direction with respect to the main surface of the glass substrate 50 and in two opposite directions (left laminar flow and right laminar flow) in the lateral direction. It is preferable. That is, the cleaning liquid 31 is sequentially switched in the four directions of up, down, left, and right. Thereby, in particular, when the glass substrate 50 is held and cleaned at three points on both side ends and the lower end thereof, the remaining liquid of the cleaning liquid 31 on the holding portion is surely eliminated during drying, and the cleaning liquid for the glass substrate 50 is removed. Thus, it is possible to reliably prevent the 31 dry stain and particles from adhering. Further, the portion hidden behind the holding rod 23 is more reliably eliminated, and it is further reliably suppressed that a defect remains on the outer peripheral end of the glass substrate 50 after cleaning and drying.

なお、洗浄槽30に供給され洗浄槽30から排出される(すなわち洗浄槽30を通過する)洗浄液31の流量(L/分)又は流速(m/分)は、洗浄槽30内の洗浄液31の置換率増大等の観点と、保持用ロッド23によるガラス基板50の保持の安定性等の観点とから、検討する必要がある。   The flow rate (L / min) or flow rate (m / min) of the cleaning liquid 31 supplied to the cleaning tank 30 and discharged from the cleaning tank 30 (that is, passing through the cleaning tank 30) is the same as that of the cleaning liquid 31 in the cleaning tank 30. It is necessary to study from the viewpoint of increasing the substitution rate and the like, and from the viewpoint of the stability of holding the glass substrate 50 by the holding rod 23.

[検査工程]
検査工程では、ガラス基板の平坦度や厚み、あるいは表面粗さや欠陥の有無等を検査する。そして、検査に合格したガラス基板のみが、異物等が表面に付着しないように、清浄な環境の中で、専用収納カセットに収納され、真空パックされた後、HDD用ガラス基板として出荷される。
[Inspection process]
In the inspection process, the flatness and thickness of the glass substrate, the surface roughness, the presence or absence of defects, etc. are inspected. Only the glass substrate that has passed the inspection is stored in a dedicated storage cassette and vacuum packed in a clean environment so that foreign matter or the like does not adhere to the surface, and then shipped as a glass substrate for HDD.

<HDD用ガラス基板>
次に、前記のようにして製造されたHDD用ガラス基板について説明する。図1に示すように、本実施形態に係るHDD用ガラス基板50は、その製造過程における洗浄工程で、外周端部の洗浄残りが解消されているから、外周端部に欠陥が残ることが抑制された高品質のHDD用ガラス基板である。
<Glass substrate for HDD>
Next, the glass substrate for HDD manufactured as described above will be described. As shown in FIG. 1, the HDD glass substrate 50 according to the present embodiment suppresses remaining defects at the outer peripheral edge because the cleaning residue at the outer peripheral edge is eliminated in the cleaning process in the manufacturing process. This is a high-quality glass substrate for HDD.

<HDD用磁気記録媒体>
次に、前記HDD用ガラス基板50を用いて製造されたHDD用磁気記録媒体について説明する。本実施形態に係るHDD用磁気記録媒体は、前記HDD用ガラス基板50の主表面の上に記録層としての磁性膜が設けられたことにより製造されたものである。磁性膜は主表面の上に直接に又は間接に形成されてよい。磁性膜はガラス基板50の片面に又は両面に形成されてよい。
<Magnetic recording medium for HDD>
Next, an HDD magnetic recording medium manufactured using the HDD glass substrate 50 will be described. The HDD magnetic recording medium according to this embodiment is manufactured by providing a magnetic film as a recording layer on the main surface of the HDD glass substrate 50. The magnetic film may be formed directly or indirectly on the main surface. The magnetic film may be formed on one side or both sides of the glass substrate 50.

磁性膜の形成方法としては従来公知の方法を用いることができ、例えば磁性粒子を分散させた熱硬化性樹脂をガラス基板50上にスピンコートして形成する方法や、スパッタリングや無電解めっきにより形成する方法等が挙げられる。スピンコート法での膜厚は約0.3μm〜1.2μm程度、スパッタリング法での膜厚は0.01μm〜0.08μm程度、無電解めっき法での膜厚は0.01μm〜0.1μm程度であり、薄膜化及び高密度化の観点からは、スパッタリング法や無電解めっき法による膜形成が好ましい。   As a method for forming the magnetic film, a conventionally known method can be used. For example, a method in which a thermosetting resin in which magnetic particles are dispersed is spin-coated on the glass substrate 50, or a method in which sputtering or electroless plating is used. And the like. The film thickness by spin coating is about 0.3 μm to 1.2 μm, the film thickness by sputtering is about 0.01 μm to 0.08 μm, and the film thickness by electroless plating is 0.01 μm to 0.1 μm. From the viewpoint of thinning and high density, film formation by sputtering or electroless plating is preferable.

磁性膜に用いる磁性材料としては特に限定はなく、従来公知のものが使用できる。なかでも、高い保持力を得るために結晶異方性の高いCoを基本材料とし、残留磁束密度を調整する目的でNiやCrを加えたCo系合金等が好適である。具体的には、Coを主成分とするCoPt、CoCr、CoNi、CoNiCr、CoCrTa、CoPtCr、CoNiPt、CoNiCrPt、CoNiCrTa、CoCrPtTa、CoCrPtB、CoCrPtSiO等が好ましい。   The magnetic material used for the magnetic film is not particularly limited, and conventionally known materials can be used. Among them, a Co-based alloy or the like containing Ni and Cr as the basic material for adjusting the residual magnetic flux density is preferable in order to obtain high coercive force. Specifically, CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, CoNiPt, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtB, CoCrPtSiO, and the like whose main component is Co are preferable.

磁性膜は、非磁性膜(例えば、Cr、CrMo、CrV等)で分割し、ノイズの低減を図った多層構成(例えば、CoPtCr/CrMo/CoPtCr、CoCrPtTa/CrMo/CoCrPtTa等)としてもよい。   The magnetic film may be divided into a non-magnetic film (for example, Cr, CrMo, CrV, etc.) to have a multilayer structure (for example, CoPtCr / CrMo / CoPtCr, CoCrPtTa / CrMo / CoCrPtTa, etc.) in which noise is reduced.

前記磁性材料の他、フェライト系や鉄−希土類系のものや、SiO、BN等からなる非磁性膜中に、Fe、Co、FeCo、CoNiPt等の磁性粒子を分散させた構造のグラニュラー等でもよい。The other magnetic material, ferrite or iron - and that of the rare earth, in a non-magnetic film made of SiO 2, BN, etc., Fe, Co, FeCo, in granular or the like of the structure obtained by dispersing magnetic particles such CoNiPt Good.

磁性膜は、内面型及び垂直型のいずれの記録形式であってもよい。   The magnetic film may be either an inner surface type or a vertical type recording format.

磁気ヘッドの滑りをよくするために磁性膜の表面に潤滑剤を薄くコーティングしてもよい。潤滑剤としては、例えば液体潤滑剤であるパーフロロポリエーテル(PFPE)をフレオン系等の溶媒で希釈したもの等が挙げられる。   In order to improve the sliding of the magnetic head, a lubricant may be thinly coated on the surface of the magnetic film. Examples of the lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a freon-based solvent.

本実施形態では、必要に応じて、記録層としての磁性膜の他に、下地層や保護層を設けてもよい。HDD用磁気記録媒体における下地層は磁性膜に応じて選択される。下地層の材料としては、例えば、Cr、Mo、Ta、Ti、W、V、B、Al、Ni等の非磁性金属からなる群より選ばれる少なくとも一種以上の材料が挙げられる。Coを主成分とする磁性膜の場合は、磁気特性の向上等の観点から、Cr単体やCr合金であることが好ましい。下地層は単層とは限らず、同一又は異種の層を積層した複数層構造としても構わない。例えば、Cr/Cr、Cr/CrMo、Cr/CrV、NiAl/Cr、NiAl/CrMo、NiAl/CrV等の多層下地層とすることができる。   In the present embodiment, if necessary, an underlayer or a protective layer may be provided in addition to the magnetic film as the recording layer. The underlayer in the HDD magnetic recording medium is selected according to the magnetic film. Examples of the material for the underlayer include at least one material selected from the group consisting of nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni. In the case of a magnetic film containing Co as a main component, it is preferable to use Cr alone or a Cr alloy from the viewpoint of improving magnetic characteristics. The underlayer is not limited to a single layer, and may have a multi-layer structure in which the same or different layers are stacked. For example, a multilayer underlayer such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, or NiAl / CrV can be used.

保護層は、磁性膜の摩耗や腐食を防止するために設けられる。保護層としては、例えば、Cr層、Cr合金層、カーボン層、水素化カーボン層、ジルコニア層、シリカ層等が挙げられる。これらの保護層は、下地層や磁性膜等と共に、インライン型スパッタ装置で連続して形成できる。また、これらの保護層は、単層としてもよく、あるいは、同一又は異種の層からなる多層構造としてもよい。   The protective layer is provided to prevent wear and corrosion of the magnetic film. Examples of the protective layer include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be continuously formed by an in-line sputtering apparatus together with the underlayer and the magnetic film. Further, these protective layers may be a single layer, or may have a multilayer structure composed of the same or different layers.

前記保護層上に、あるいは前記保護層に代えて、他の保護層を形成してもよい。例えば、前記保護層に代えて、Cr層の上にテトラアルコキシシランをアルコール系の溶媒で希釈した中に、コロイダルシリカ微粒子を分散して塗布し、さらに焼成することにより、二酸化ケイ素(SiO)層を形成してもよい。Another protective layer may be formed on the protective layer or instead of the protective layer. For example, in place of the protective layer, colloidal silica fine particles are dispersed and applied in a tetraalkoxysilane diluted with an alcohol solvent on the Cr layer, and further baked to obtain silicon dioxide (SiO 2 ). A layer may be formed.

以上のように、基板として本実施形態に係るHDD用ガラス基板50を用いて製造されたHDD用磁気記録媒体をHDDに用いることで、HDDの高速回転時の磁気ヘッドの動作を安定にすることができる。   As described above, by using the HDD magnetic recording medium manufactured using the HDD glass substrate 50 according to the present embodiment as the substrate, the operation of the magnetic head at the time of high-speed rotation of the HDD can be stabilized. Can do.

また、本実施形態に係るHDD用磁気記録媒体は、外周端部に欠陥が残ることが抑制されたHDD用ガラス基板50が用いられているから、最外周部まで清浄性が高い高品質のHDD用磁気記録媒体である。そのため、たとえ記録領域が記録媒体の外周端部にまで広がっていても、記録領域に障害が出ることが抑制される。   In addition, since the HDD magnetic recording medium according to the present embodiment uses the HDD glass substrate 50 in which defects are suppressed from remaining at the outer peripheral end, the high-quality HDD having high cleanliness up to the outermost peripheral portion. Magnetic recording medium. For this reason, even if the recording area extends to the outer peripheral edge of the recording medium, it is possible to prevent the recording area from being damaged.

なお、本実施形態では、研磨工程は、2回に分けて行ったが、これに限らず、1回のみ行ってもよい。また、化学強化工程を研磨工程の後に行ったが、状況に応じて研磨工程の前に行ってもよい。また、状況に応じて化学強化工程を省略することもできる。   In the present embodiment, the polishing step is performed twice. However, the polishing step is not limited to this and may be performed only once. Moreover, although the chemical strengthening process was performed after the polishing process, it may be performed before the polishing process depending on the situation. Further, the chemical strengthening step can be omitted depending on the situation.

さらに、落下強度対策として、ガラス基板の主表面以外の外周端面や内周端面の強化を行ってもよいし、ガラス基板に生じたキズのエッジ緩和処理として、ガラス基板をHF浸漬処理に供してもよい。   Furthermore, as measures against drop strength, the outer peripheral end face and the inner peripheral end face other than the main surface of the glass substrate may be strengthened, or the glass substrate is subjected to HF immersion treatment as an edge mitigation treatment for scratches generated on the glass substrate. Also good.

本実施形態に係るHDD用ガラス基板は、HDD用磁気記録媒体の製造用途に限定されるものではなく、例えば、光磁気ディスクや光ディスク等の製造用途にも用いることができる。   The glass substrate for HDD according to the present embodiment is not limited to the use for manufacturing the magnetic recording medium for HDD, and can be used for the manufacture of a magneto-optical disk, an optical disk, and the like.

本実施形態の技術的特徴をまとめると下記のようになる。   The technical features of this embodiment are summarized as follows.

本実施形態に係るHDD用ガラス基板の製造方法は、ガラス基板50を洗浄液31で洗浄する洗浄工程を含むHDD用ガラス基板の製造方法であって、洗浄工程では、ガラス基板50に対して洗浄液31をガラス基板50の主表面に平行な方向であって相互に異なる複数の方向に順に流して洗浄することを特徴とする。   The method for manufacturing a glass substrate for HDD according to the present embodiment is a method for manufacturing a glass substrate for HDD including a cleaning step of cleaning the glass substrate 50 with the cleaning liquid 31, and the cleaning liquid 31 is applied to the glass substrate 50 in the cleaning step. The substrate is washed by flowing it in a plurality of directions that are parallel to the main surface of the glass substrate 50 and different from each other.

本実施形態によれば、ガラス基板50に対して洗浄液31がガラス基板50の主表面に平行な方向であって相互に異なる複数の方向に順に切り替わって流れるので、ある方向の洗浄液31の流れに対しては保持用ロッド23の裏に隠れる部分となっても、その部分は、別の方向の洗浄液31の流れに対しては保持用ロッド23の裏に隠れる部分ではなくなる。そのため、ガラス基板50の外周端部の洗浄残りが解消されて、洗浄、乾燥後のガラス基板50の外周端部に欠陥が残ることが抑制される。   According to the present embodiment, the cleaning liquid 31 flows in a direction parallel to the main surface of the glass substrate 50 and in a plurality of different directions in order with respect to the glass substrate 50, so that the cleaning liquid 31 flows in a certain direction. On the other hand, even if the portion is hidden behind the holding rod 23, the portion is not hidden behind the holding rod 23 with respect to the flow of the cleaning liquid 31 in another direction. Therefore, the cleaning residue at the outer peripheral edge of the glass substrate 50 is eliminated, and it is suppressed that defects remain at the outer peripheral edge of the glass substrate 50 after cleaning and drying.

本実施形態においては、洗浄工程では、ガラス基板50をその両側端部及び下端部の3点で保持して洗浄し、洗浄後、ガラス基板50をその状態のまま乾燥し、前記保持部がガラス基板50の中心に関して90°ずつ離間している。   In the present embodiment, in the cleaning step, the glass substrate 50 is cleaned by holding the glass substrate 50 at three points on both side ends and the lower end, and after cleaning, the glass substrate 50 is dried as it is, and the holding unit is made of glass. The center of the substrate 50 is separated by 90 °.

本実施形態によれば、ガラス基板50を洗浄中安定して保持することができる。また、3つの保持部がガラス基板50の中心に関して90°ずつ離間しているから、保持用ロッド23とガラス基板50との間に洗浄液31が残留してガラス基板50の外周端部に付着することが低減する。   According to this embodiment, the glass substrate 50 can be stably held during cleaning. Further, since the three holding portions are separated by 90 ° with respect to the center of the glass substrate 50, the cleaning liquid 31 remains between the holding rod 23 and the glass substrate 50 and adheres to the outer peripheral end portion of the glass substrate 50. That will be reduced.

本実施形態においては、洗浄工程では、ガラス基板50を複数の保持用ロッド23で保持して洗浄し、洗浄後、ガラス基板50をその状態のまま乾燥し、ガラス基板50の全ての保持部で、ガラス基板50と保持用ロッド23とが必ず接している。   In the present embodiment, in the cleaning process, the glass substrate 50 is held and cleaned by the plurality of holding rods 23, and after the cleaning, the glass substrate 50 is dried as it is, and is held in all the holding portions of the glass substrate 50. The glass substrate 50 and the holding rod 23 are always in contact with each other.

本実施形態によれば、ガラス基板50の外周端部と保持用ロッド23とが離間している場合に生じ得る、ガラス基板50の外周端部と保持用ロッド23との間の洗浄液31の膜が回避でき、ガラス基板50の乾燥後に、洗浄液31の膜が乾燥することに起因する付着物等の欠陥がガラス基板50の外周端部に残ることが抑制される。   According to the present embodiment, the film of the cleaning liquid 31 between the outer peripheral end of the glass substrate 50 and the holding rod 23 that may occur when the outer peripheral end of the glass substrate 50 and the holding rod 23 are separated from each other. It is possible to prevent defects such as deposits resulting from the drying of the film of the cleaning liquid 31 from being left on the outer peripheral edge of the glass substrate 50 after the glass substrate 50 is dried.

本実施形態においては、洗浄液31をガラス基板50の主表面に関して上下方向及び横方向に流す。   In the present embodiment, the cleaning liquid 31 is flowed in the vertical direction and the horizontal direction with respect to the main surface of the glass substrate 50.

本実施形態によれば、特に、ガラス基板50をその両側端部及び下端部の3点で保持して洗浄する場合に、乾燥時に保持部への洗浄液31の液残りがなくなり、ガラス基板50への洗浄液31の乾燥染みやパーティクルの付着を防止できる。また、確実に保持用ロッド23の裏に隠れる部分がなくなって、洗浄、乾燥後のガラス基板50の外周端部に欠陥が残ることが確実に抑制される。   According to the present embodiment, in particular, when the glass substrate 50 is cleaned while being held at the three ends of the both side ends and the lower end thereof, the liquid remaining of the cleaning liquid 31 on the holding portion is eliminated during drying, and the glass substrate 50 is thus removed. The dry stain of the cleaning liquid 31 and the adhesion of particles can be prevented. In addition, the portion hidden behind the holding rod 23 is surely lost, and it is reliably suppressed that a defect remains in the outer peripheral end of the glass substrate 50 after cleaning and drying.

本実施形態においては、洗浄液31をガラス基板50の主表面に関して上下方向の相対向する2方向及び横方向の相対向する2方向に流す。   In the present embodiment, the cleaning liquid 31 is caused to flow in two opposite directions in the vertical direction and two opposite directions in the horizontal direction with respect to the main surface of the glass substrate 50.

本実施形態によれば、特に、ガラス基板50をその両側端部及び下端部の3点で保持して洗浄する場合に、乾燥時に保持部への洗浄液31の液残りが確実になくなり、ガラス基板50への洗浄液31の乾燥染みやパーティクルの付着を確実に防止できる。また、より一層確実に保持用ロッド23の裏に隠れる部分がなくなって、洗浄、乾燥後のガラス基板50の外周端部に欠陥が残ることがより一層確実に抑制される。   According to the present embodiment, in particular, when the glass substrate 50 is cleaned while being held at three points on both side ends and the lower end thereof, the liquid residue of the cleaning liquid 31 on the holding portion is surely eliminated during drying, and the glass substrate Thus, it is possible to reliably prevent the dry stain and particles from adhering to the cleaning liquid 31. Further, the portion hidden behind the holding rod 23 is more reliably eliminated, and it is further reliably suppressed that a defect remains on the outer peripheral end of the glass substrate 50 after cleaning and drying.

本実施形態に係るHDD用ガラス基板50は、前記HDD用ガラス基板の製造方法により製造されたことを特徴とする。   The HDD glass substrate 50 according to this embodiment is manufactured by the method for manufacturing an HDD glass substrate.

本実施形態によれば、その製造過程における洗浄工程で、外周端部の洗浄残りが解消されているから、外周端部に欠陥が残ることが抑制された高品質のHDD用ガラス基板50が得られる。   According to the present embodiment, the cleaning residue in the manufacturing process eliminates the remaining cleaning at the outer peripheral edge, so that a high-quality HDD glass substrate 50 for HDD with suppressed defects remaining at the outer peripheral edge is obtained. It is done.

本実施形態に係るHDD用磁気記録媒体は、前記HDD用ガラス基板50の主表面の上に記録層が設けられたことにより製造されたことを特徴とする。   The HDD magnetic recording medium according to the present embodiment is manufactured by providing a recording layer on the main surface of the HDD glass substrate 50.

本実施形態によれば、外周端部に欠陥が残ることが抑制されたHDD用ガラス基板50が用いられているから、最外周部まで清浄性が高い高品質のHDD用磁気記録媒体が得られる。そのため、たとえ記録領域が記録媒体の外周端部にまで広がっていても、記録領域に障害が出ることが抑制される。   According to the present embodiment, since the HDD glass substrate 50 in which defects are suppressed from remaining at the outer peripheral end portion is used, a high-quality HDD magnetic recording medium with high cleanliness up to the outermost peripheral portion can be obtained. . For this reason, even if the recording area extends to the outer peripheral edge of the recording medium, it is possible to prevent the recording area from being damaged.

本実施形態によれば、洗浄、乾燥後のHDD用ガラス基板50の外周端部に欠陥が残らないようにすることができるから、近年の磁気記録媒体の情報の高密度化、ひいては磁気ヘッドの浮上高さの微小化に十分対応できる。   According to the present embodiment, it is possible to prevent defects from remaining on the outer peripheral edge of the HDD glass substrate 50 after cleaning and drying. It can cope with miniaturization of flying height.

以下、実施例及び比較例を通して、本発明をさらに詳しく説明する。ただし、本発明はこの実施例に限定されるものではない。   Hereinafter, the present invention will be described in more detail through examples and comparative examples. However, the present invention is not limited to this embodiment.

<HDD用ガラス基板の製造>
図2に示した製造工程に従い、下記の組成(質量%)のガラス素材を用いて、外径が約65mm(2.5インチ)、内径(円孔の径)が約20mm、板厚が1mmの環状のアルミノシリケート製ガラス基板を作製した。
<Manufacture of glass substrates for HDD>
According to the manufacturing process shown in FIG. 2, using a glass material having the following composition (mass%), the outer diameter is about 65 mm (2.5 inches), the inner diameter (diameter of the circular hole) is about 20 mm, and the plate thickness is 1 mm. A ring-shaped aluminosilicate glass substrate was prepared.

(ガラス素材の組成)
・SiO:50〜70%
・Al:0.1〜20%
・B:0〜5%
ただし、SiO+Al+B=60〜85%であり、また、LiO+NaO+KO=0.1〜20%であり、また、MgO+CaO+BaO+SrO+ZnO=2〜20%である。
(Composition of glass material)
・ SiO 2 : 50 to 70%
· Al 2 O 3: 0.1~20%
・ B 2 O 3 : 0 to 5%
However, a SiO 2 + Al 2 O 3 + B 2 O 3 = 60~85%, also a 2 O = 0.1~20% Li 2 O + Na 2 O + K, also a MgO + CaO + BaO + SrO + ZnO = 2~20%.

なお、最終洗浄工程では、表1に示すように、実施例1は、洗浄液の流れ方向を上下2方向とし(噴流と掛流しとを順に切り替えて流した)、実施例2は、洗浄液の流れ方向を左右2方向とし(左層流と右層流とを順に切り替えて流した)、実施例3は、洗浄液の流れ方向を上下左右4方向とし(噴流と掛流しと左層流と右層流とを順に切り替えて流した)、実施例4は、洗浄液の流れ方向を上下1方向と左右1方向とした(噴流又は掛流しと左層流又は右層流とを順に切り替えて流した)。また、比較例1は、洗浄液の流れ方向を上下1方向のみとし(噴流又は掛流しのみ)、実施例2は、洗浄液の流れ方向を左右1方向のみとした(左層流又は右層流のみ)。   In the final cleaning step, as shown in Table 1, in Example 1, the flow direction of the cleaning liquid was set to two directions (up and down), and the flow of the cleaning liquid was changed in the order of jet flow and flowing. The direction is set to two directions (left and right laminar flows are sequentially switched), and in Example 3, the flow direction of the cleaning liquid is four directions (up and down, left and right) (jet flow, entrainment, left laminar flow, and right layer) In Example 4, the flow direction of the cleaning liquid was set to one direction in the vertical direction and one direction in the left and right direction (the jet flow or the flowing flow and the left laminar flow or the right laminar flow were switched in order). . In Comparative Example 1, the flow direction of the cleaning liquid is only in one vertical direction (only jet or flowing), and in Example 2, the flow direction of the cleaning liquid is only in one horizontal direction (only the left laminar flow or right laminar flow). ).

実施例1〜4及び比較例1、2において、洗浄キャリア、洗浄キャリアのガラス基板収容枚数、洗浄槽の大きさ、洗浄液の種類、洗浄液の流量又は流速、その他の洗浄条件は全て同じに揃えた。   In Examples 1 to 4 and Comparative Examples 1 and 2, the cleaning carrier, the number of glass substrates accommodated in the cleaning carrier, the size of the cleaning tank, the type of cleaning liquid, the flow rate or flow rate of the cleaning liquid, and other cleaning conditions were all the same. .

<HDD用ガラス基板の評価>
[欠陥の有無]
得られたガラス基板の外周端部に、図4に例示したような欠陥があるか否かを、日本機販社から商業的に入手し得る、欠陥可視化・外観検査装置「Micro−MAX」を用いて検査した。サンプル数は、実施例1〜4及び比較例1、2において、それぞれ100枚とした。結果を表1に示す。
<Evaluation of glass substrate for HDD>
[Presence of defects]
Whether or not there is a defect as illustrated in FIG. 4 at the outer peripheral edge of the obtained glass substrate is commercially available from Nihon Kikai Co., Ltd., using a defect visualization and appearance inspection device “Micro-MAX” And inspected. The number of samples was 100 in each of Examples 1 to 4 and Comparative Examples 1 and 2. The results are shown in Table 1.

<HDD用磁気記録媒体の製造>
得られたガラス基板の主表面の上に磁性膜(記録層)を設けて磁気記録媒体とした。すなわち、ガラス基板側から、Ni−Alからなる下地層(厚み約100nm)、Co−Cr−Ptからなる記録層(厚み20nm)、DLC(Diamond Like Carbon)からなる保護膜(厚み5nm)を順次積層した。
<Manufacture of HDD magnetic recording media>
A magnetic film (recording layer) was provided on the main surface of the obtained glass substrate to obtain a magnetic recording medium. That is, from the glass substrate side, a base layer made of Ni—Al (thickness of about 100 nm), a recording layer made of Co—Cr—Pt (thickness 20 nm), and a protective film made of DLC (Diamond Like Carbon) (thickness 5 nm) are sequentially formed. Laminated.

<HDD用磁気記録媒体の評価>
[リードライト試験]
得られた磁気記録媒体について、DFH機構を搭載した磁気ヘッドで、リードライト試験を行い、エラーの発生枚数を記録した。サンプル数は、実施例1〜4及び比較例1、2において、それぞれ50枚とした。結果を表1に示す。
<Evaluation of HDD magnetic recording media>
[Read / write test]
The obtained magnetic recording medium was subjected to a read / write test with a magnetic head equipped with a DFH mechanism, and the number of error occurrences was recorded. The number of samples was 50 in each of Examples 1 to 4 and Comparative Examples 1 and 2. The results are shown in Table 1.

Figure 0006131187
Figure 0006131187

<結果の考察>
洗浄槽内で洗浄液を1方向にのみ流した比較例1、2に比べて、洗浄槽内で洗浄液を複数方向に切り替えて流した実施例1〜4は、ガラス基板の欠陥枚数及び磁気記録媒体のリードライトエラー枚数共に評価結果に優れていた。
<Consideration of results>
Compared with Comparative Examples 1 and 2 in which the cleaning liquid was allowed to flow only in one direction in the cleaning tank, Examples 1 to 4 in which the cleaning liquid was switched in a plurality of directions in the cleaning tank were used for the number of defects in the glass substrate and the magnetic recording medium. The number of read / write errors was excellent in the evaluation results.

実施例1〜4のうちでも、洗浄槽内で洗浄液を上下左右4方向に切り替えて流した実施例3は、特にガラス基板の欠陥枚数が零枚であった。   Among Examples 1 to 4, Example 3 in which the cleaning liquid was switched in the cleaning tank in four directions, up and down, left and right, particularly had zero glass substrate defects.

この出願は、2011年6月30日に出願された日本国特許出願特願2011−146230を基礎とするものであり、その内容は、本願に含まれるものである。   This application is based on Japanese Patent Application No. 2011-146230 filed on June 30, 2011, the contents of which are included in the present application.

本発明を表現するために、前述において図面を参照しながら実施形態を通して本発明を適切かつ十分に説明したが、当業者であれば前述の実施形態を変更及び/又は改良することは容易になし得ることであると認識すべきである。したがって、当業者が実施する変更形態又は改良形態が、請求の範囲に記載された請求項の権利範囲を離脱するレベルのものでない限り、当該変更形態又は当該改良形態は、当該請求項の権利範囲に包括されると解釈される。   In order to express the present invention, the present invention has been properly and fully described through the embodiments with reference to the drawings. However, those skilled in the art can easily change and / or improve the above-described embodiments. It should be recognized as gaining. Therefore, unless the modifications or improvements implemented by those skilled in the art are at a level that departs from the scope of the claims recited in the claims, the modifications or improvements are not limited to the scope of the claims. To be construed as inclusive.

本発明は、HDD用ガラス基板の製造方法、HDD用ガラス基板、及びHDD用磁気記録媒体の技術分野において、広範な産業上の利用可能性を有する。   The present invention has wide industrial applicability in the technical fields of a method for manufacturing a glass substrate for HDD, a glass substrate for HDD, and a magnetic recording medium for HDD.

Claims (4)

ガラス基板を洗浄液で洗浄する洗浄工程を含むHDD用ガラス基板の製造方法であって、
前記洗浄工程では、前記ガラス基板の両側端部及び下端部の3点を保持用ロッドで保持し、前記保持用ロッドで保持されている保持部が前記ガラス基板の中心に関して90°ずつ離間し、前記ガラス基板に対して前記洗浄液を前記ガラス基板の主表面に平行な方向であって、前記ガラス基板の中心と前記保持部のいずれか1つとを結ぶ方向に平行な方向に相対向する2方向を含む相互に異なる複数の方向に順に流して洗浄することを特徴とするHDD用ガラス基板の製造方法。
A method for manufacturing a glass substrate for HDD comprising a cleaning step of cleaning a glass substrate with a cleaning liquid,
In the cleaning process, the glass substrate is held at three points on both side ends and the lower end with a holding rod, and the holding portion held by the holding rod is separated by 90 ° with respect to the center of the glass substrate, the cleaning fluid in a direction parallel to the main surface of the glass substrate to the glass substrate, two directions opposed to a direction parallel to any one of the connecting direction of the center and the holding portion of the glass substrate A method of manufacturing a glass substrate for HDD, wherein the substrate is washed by flowing in a plurality of mutually different directions in order.
前記洗浄液を前記ガラス基板の主表面に関して上下方向及び横方向に流すことを特徴とする請求項1に記載のHDD用ガラス基板の製造方法。 Method of manufacturing a glass substrate for an HDD according to claim 1, characterized in that flowing the cleaning liquid in the vertical and lateral directions with respect to the main surface of the glass substrate. 前記洗浄液を前記ガラス基板の主表面に関して上下方向の相対向する2方向及び横方向の相対向する2方向に流すことを特徴とする請求項2に記載のHDD用ガラス基板の製造方法。 The process for producing a glass substrate for HDD of claim 2, wherein the flowing the washing liquid in two directions facing each other in two directions and laterally opposed vertical with respect to the main surface of the glass substrate. 前記洗浄工程では、前記洗浄液を流して洗浄した後、前記ガラス基板をその状態のまま乾燥し、前記ガラス基板の全ての保持部で、前記ガラス基板と前記保持用ロッドとが必ず接していることを特徴とする請求項1からのいずれか1項に記載のHDD用ガラス基板の製造方法。
Wherein in the washing step, after washing by passing the washing solution, the glass substrate was dried remain in that state, in all of the holding portion of the glass substrate, the said glass substrate and said holding rod is always in contact The method for producing a glass substrate for HDD according to any one of claims 1 to 3 .
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