JP6126430B2 - Laminate - Google Patents
Laminate Download PDFInfo
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- JP6126430B2 JP6126430B2 JP2013072102A JP2013072102A JP6126430B2 JP 6126430 B2 JP6126430 B2 JP 6126430B2 JP 2013072102 A JP2013072102 A JP 2013072102A JP 2013072102 A JP2013072102 A JP 2013072102A JP 6126430 B2 JP6126430 B2 JP 6126430B2
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- Prior art keywords
- sensitive adhesive
- pressure
- adhesive layer
- laminate
- mass
- Prior art date
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- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 120
- 239000010410 layer Substances 0.000 claims description 105
- 239000000758 substrate Substances 0.000 claims description 66
- 239000000203 mixture Substances 0.000 claims description 50
- 239000012790 adhesive layer Substances 0.000 claims description 39
- 229920001296 polysiloxane Polymers 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 22
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 20
- 238000000137 annealing Methods 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 229920002379 silicone rubber Polymers 0.000 claims description 15
- 239000004945 silicone rubber Substances 0.000 claims description 14
- 239000012298 atmosphere Substances 0.000 claims description 12
- 239000003054 catalyst Substances 0.000 claims description 10
- 229910052697 platinum Inorganic materials 0.000 claims description 10
- 229920002050 silicone resin Polymers 0.000 claims description 7
- 238000004381 surface treatment Methods 0.000 claims description 7
- 239000000470 constituent Substances 0.000 claims description 6
- 125000003342 alkenyl group Chemical group 0.000 claims description 5
- 239000011521 glass Substances 0.000 description 54
- 239000000463 material Substances 0.000 description 49
- 239000000853 adhesive Substances 0.000 description 22
- 230000001070 adhesive effect Effects 0.000 description 22
- 238000000576 coating method Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 12
- 239000000047 product Substances 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- -1 heptenyl group Chemical group 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000005388 borosilicate glass Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000007496 glass forming Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000005355 lead glass Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229920006289 polycarbonate film Polymers 0.000 description 2
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 229920003067 (meth)acrylic acid ester copolymer Polymers 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- QYXVDGZUXHFXTO-UHFFFAOYSA-L 3-oxobutanoate;platinum(2+) Chemical compound [Pt+2].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O QYXVDGZUXHFXTO-UHFFFAOYSA-L 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- WOIHABYNKOEWFG-UHFFFAOYSA-N [Sr].[Ba] Chemical compound [Sr].[Ba] WOIHABYNKOEWFG-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229940051881 anilide analgesics and antipyretics Drugs 0.000 description 1
- 150000003931 anilides Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229920001038 ethylene copolymer Polymers 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical group Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920006264 polyurethane film Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
本発明は、基材と、この基材の一方の主面上に積層された粘着剤層とを備えた積層体に関する。 The present invention relates to a laminate including a substrate and an adhesive layer laminated on one main surface of the substrate.
粘着剤層を備える積層体は、表示デバイスの製造分野、半導体関連部材の製造分野、電気・電子部品の製造分野などに広く使用されている。表示デバイスの製造分野では、かかる積層体の具体例としてガラス基板(マザーガラス)と粘着剤層との積層体(本明細書において、「GP積層体」ともいう。)が挙げられ、使用にあたり、カバーガラスなどが被着体としてGP積層体の粘着剤層側の面に積層される。半導体関連部材の製造分野では、かかる積層体の具体例として半導体加工テープが挙げられ、使用にあたり、半導体ウェハなどが被着体としてこの積層体の粘着剤層側の面に積層され、半導体ウェハに加工が施される。電気・電子部品の製造分野では、かかる積層体の具体例として、フレキシブル印刷回路基板と粘着剤層との積層体(本明細書において、「FP積層体」ともいう。)が挙げられ、使用にあたり、筺体などが被着体としてFP積層体の粘着剤層側の面に積層される。 Laminates having an adhesive layer are widely used in the display device manufacturing field, the semiconductor-related member manufacturing field, the electric / electronic component manufacturing field, and the like. In the field of manufacturing display devices, a specific example of such a laminate includes a laminate of a glass substrate (mother glass) and an adhesive layer (also referred to as “GP laminate” in the present specification). A cover glass or the like is laminated as an adherend on the surface on the pressure-sensitive adhesive layer side of the GP laminate. In the field of manufacturing semiconductor-related members, a semiconductor processing tape is given as a specific example of such a laminate. In use, a semiconductor wafer or the like is laminated as an adherend on the surface of the laminate on the pressure-sensitive adhesive layer side. Processing is applied. In the field of manufacturing electrical / electronic components, a specific example of such a laminate is a laminate of a flexible printed circuit board and an adhesive layer (also referred to as “FP laminate” in this specification). A casing or the like is laminated as an adherend on the surface of the FP laminate on the pressure-sensitive adhesive layer side.
こうした積層体は、そのままの状態で、または被着体が積層された状態で、高温の環境(本明細書において、「高温の環境」とは、室温(23℃)より高い温度の環境を意味する。)下に置かれる場合がある。上記の例を用いて具体的に説明すれば、GP積層体はガラス面上に透明導電膜が形成される際に温度が高まる場合がある。半導体加工テープはダイシングテーブルなどに固定するために加熱される場合がある。FP積層体は筺体内の他の部品(例えばモータ)の動作によって高温の環境下に置かれる場合がある。 Such a laminate is a high temperature environment (in this specification, “high temperature environment” means an environment having a temperature higher than room temperature (23 ° C.) in the state as it is or in a state where the adherend is laminated. Yes, it may be placed underneath. If it demonstrates concretely using said example, when a transparent conductive film is formed on a glass surface, a GP laminated body may raise temperature. The semiconductor processing tape may be heated to fix it on a dicing table or the like. The FP laminate may be placed in a high temperature environment by the operation of other parts (for example, a motor) in the casing.
このような高温の環境下に置かれたときに、積層体が備える粘着剤層からアウトガス(積層体の保管中および/または使用中に、積層体の粘着剤層から放出された気体成分)が発生し、粘着剤層を構成する材料や基材を構成する材料が劣化したり、発生したアウトガスが被着体を含む積層体の周辺の部材を汚染したりすることが問題となる場合がある。 When placed in such a high-temperature environment, outgas (a gas component released from the pressure-sensitive adhesive layer of the laminate during storage and / or use of the laminate) from the pressure-sensitive adhesive layer included in the laminate is generated. It may occur that the material constituting the pressure-sensitive adhesive layer or the material constituting the base material deteriorates or the generated outgas contaminates members around the laminate including the adherend. .
かかる問題を解決するために、特許文献1には、つぎのa〜e五成分;
a)アルキル基の炭素数が2〜14個である(メタ)アクリル酸アルキルエステル70〜100重量%と、これと共重合可能なモノエチレン性不飽和単量体30〜0重量%とからなる単量体100重量部
b)ラジカル連鎖禁止剤0.1〜5重量部
c)交叉結合剤としての多官能(メタ)アクリレート0.02〜5重量部
d)光重合開始剤0.005〜1重量部
e)シランカップリング剤0.01〜10重量部
を含む組成物の光重合物からなり、ヘイズ値が1%以下、全光線透過率が90%以上である粘着剤層が開示されている。
In order to solve such a problem, Patent Document 1 discloses the following a to e five components:
a) It consists of 70 to 100% by weight of a (meth) acrylic acid alkyl ester having 2 to 14 carbon atoms in the alkyl group and 30 to 0% by weight of a monoethylenically unsaturated monomer copolymerizable therewith. 100 parts by weight of monomer b) 0.1 to 5 parts by weight of radical chain inhibitor c) 0.02 to 5 parts by weight of polyfunctional (meth) acrylate as a cross-linking agent d) Photopolymerization initiator 0.005 to 1 E) a pressure-sensitive adhesive layer comprising a photopolymer of a composition containing 0.01 to 10 parts by weight of a silane coupling agent, having a haze value of 1% or less and a total light transmittance of 90% or more. Yes.
しかし、特許文献1の粘着剤層では、200℃以上という過酷な使用条件では、アウトガスの発生を十分に抑えることができず、そのような環境での被着体の露出面側への表面処理を好適に行うことができなかった。
ところで、上記の積層体は、その製造過程や使用過程において、被着体から剥離させたり、再度被着体に積層(貼付)したりすることが求められる場合もある。また、用途によっては、この積層体を構成する基材と粘着剤層とを最終的に剥離する場合もある。これらの場合には、基材や被着体から粘着剤層を剥離させたときに、粘着剤層の構成材料が基材や被着体に残着する可能性が低減されている、すなわち、再剥離性に優れていることが好ましい。特に、粘着剤層は、高温の環境下に置かれる熱履歴を経た場合には、物理的・化学的な理由により、基材や被着体に対する粘着性が高まる場合があり、このような場合には、かかる熱履歴を経た後も、粘着剤層が基材や被着体に対して優れた再剥離性を有していることが好ましい。
However, in the pressure-sensitive adhesive layer of Patent Document 1, generation of outgas cannot be sufficiently suppressed under severe use conditions of 200 ° C. or higher, and surface treatment on the exposed surface side of the adherend in such an environment. Could not be suitably performed.
By the way, in the manufacturing process and the use process, the laminated body may be required to be peeled off from the adherend or laminated (attached) to the adherend again. Moreover, depending on a use, the base material and adhesive layer which comprise this laminated body may be finally peeled. In these cases, when the pressure-sensitive adhesive layer is peeled off from the substrate or the adherend, the possibility that the constituent material of the pressure-sensitive adhesive layer remains on the substrate or the adherend is reduced. It is preferable that the removability is excellent. In particular, when the adhesive layer undergoes a thermal history that is placed in a high-temperature environment, the adhesion to the substrate or adherend may increase due to physical or chemical reasons. For this reason, it is preferable that the pressure-sensitive adhesive layer has excellent removability after being subjected to such a thermal history.
本発明は、高温の環境下に置かれてもアウトガスが発生しにくいうえに、高温の環境下に置かれる熱履歴を経た後であっても被着体を汚染せず、再剥離性に優れる粘着剤層を備えた積層体を提供することを課題とする。 The present invention is less likely to generate outgas even when placed in a high temperature environment, and does not contaminate the adherend even after undergoing a heat history placed in a high temperature environment, and has excellent removability. It aims at providing the laminated body provided with the adhesive layer.
上記目的を達成するために提供される本発明は、第1に、基材と、前記基材の一の面上に積層された粘着剤層とを備えた積層体であって、前記粘着剤層は、シリコーン系粘着剤組成物から形成されたものであり、前記シリコーン系粘着剤組成物は、シロキサン結合を主骨格としアルケニル基を含有する付加型のオルガノポリシロキサンを構成成分として含むシリコーンゴムと、前記シリコーンゴム100質量部あたり0.01質量部以上3質量部以下の白金触媒と、前記シリコーンゴム100質量部あたり15質量部以上100質量部以下のシリコーンレジンとを含み、前記粘着剤層を、空気雰囲気内で、23℃から200℃まで5℃/分で加熱したときの、40℃における質量に対する200℃における質量の減少率が0.20質量%以下であることを特徴とする積層体を提供する(発明1)。 The present invention provided to achieve the above object is, firstly, a laminate comprising a base material and a pressure-sensitive adhesive layer laminated on one surface of the base material, the pressure-sensitive adhesive. The layer is formed from a silicone-based pressure-sensitive adhesive composition, and the silicone-based pressure-sensitive adhesive composition includes an addition-type organopolysiloxane having a siloxane bond as a main skeleton and an alkenyl group as a constituent component. A platinum catalyst of 0.01 parts by mass or more and 3 parts by mass or less per 100 parts by mass of the silicone rubber, and a silicone resin of 15 parts by mass or more and 100 parts by mass or less per 100 parts by mass of the silicone rubber, and the pressure-sensitive adhesive layer In an air atmosphere at a rate of 5 ° C./min from 23 ° C. to 200 ° C., the mass reduction rate at 200 ° C. with respect to the mass at 40 ° C. is 0.20% by mass or less. Providing a laminate wherein there (invention 1).
かかる積層体は、上記のように粘着剤層の質量減少率が低いため、本実施形態に係る積層体が高温環境下に置かれた場合でも、アウトガス量を安定的に低減させることが可能となる。また、粘着剤層が上記のシリコーン系粘着剤組成物から形成されるため、上記の積層体の粘着剤層を被着体に貼付した後、加熱処理を経ても、その後剥離する際には、粘着剤層が凝集破壊を起こさずに基材または被着体にのみ粘着剤層が残り、他方に粘着剤層が残らない。 Since such a laminate has a low mass reduction rate of the pressure-sensitive adhesive layer as described above, the amount of outgas can be stably reduced even when the laminate according to this embodiment is placed in a high-temperature environment. Become. In addition, since the pressure-sensitive adhesive layer is formed from the above-mentioned silicone-based pressure-sensitive adhesive composition, after pasting the pressure-sensitive adhesive layer of the above laminate to the adherend, even after heat treatment, when peeling thereafter, The pressure-sensitive adhesive layer does not cause cohesive failure, the pressure-sensitive adhesive layer remains only on the substrate or the adherend, and the pressure-sensitive adhesive layer does not remain on the other side.
上記発明(発明1)において、前記粘着剤層は、前記シリコーン系粘着剤組成物からなる粘着剤組成物層が表出した状態で200℃以上の温度の空気雰囲気内に60分間以上置く工程を含むアニール処理を経たものであることが好ましい(発明2)。 In the above invention (Invention 1), the pressure-sensitive adhesive layer is a step of placing in an air atmosphere at a temperature of 200 ° C. or higher for 60 minutes or more in a state where the pressure-sensitive adhesive composition layer composed of the silicone-based pressure-sensitive adhesive composition is exposed. It is preferable that it has passed through the annealing process which contains (Invention 2).
上記発明(発明1、2)において、前記積層体の前記粘着剤層側の面に被着体が積層された状態で、前記粘着剤層が加熱される処理が施されることが好ましい(発明3)。 In the said invention (invention 1 and 2), it is preferable that the said adhesive layer is heat-processed in the state by which the to-be-adhered body was laminated | stacked on the surface at the side of the said adhesive layer of the said laminated body (invention). 3).
上記発明(発明3)において、前記粘着剤層が加熱される処理は、前記被着体の前記粘着剤層に対向する面と反対側の面に対する表面処理であることが好ましい(発明4)。 In the said invention (invention 3), it is preferable that the process which the said adhesive layer is heated is a surface treatment with respect to the surface on the opposite side to the surface which opposes the said adhesive layer of the said to-be-adhered body (invention 4).
上記発明(発明4)において、前記表面処理は、透明導電膜を形成する処理を含むことが好ましい(発明5)。 In the said invention (invention 4), it is preferable that the said surface treatment includes the process which forms a transparent conductive film (invention 5).
本発明に係る積層体は、高温の環境下に置かれてもアウトガスが発生しにくいうえに、再剥離性にも優れる。これにより高温下での被着体への作業精度を向上させると共に、作業後の被着体への粘着剤層の残着等を防止できる。 The laminate according to the present invention hardly generates outgas even when placed in a high temperature environment, and also has excellent removability. Thereby, while improving the work precision to the to-be-adhered body under high temperature, the adhesion etc. of the adhesive layer to the to-be-adhered body after an operation | work can be prevented.
以下、本発明の実施形態について説明する。
1.積層体
本発明の一実施形態に係る積層体は、基材と、この基材の一の面上に積層された粘着剤層とを備える。
Hereinafter, embodiments of the present invention will be described.
1. Laminated body The laminated body which concerns on one Embodiment of this invention is equipped with a base material and the adhesive layer laminated | stacked on one surface of this base material.
(1)基材
本実施形態に係る積層体の基材は、耐熱性を有し、かつ後述する粘着剤層が適切に密着しうる限り、その組成および構造は特に限定されない。
(1) Base Material The composition and structure of the base material of the laminate according to the present embodiment are not particularly limited as long as the base material has heat resistance and a pressure-sensitive adhesive layer described later can be properly adhered.
基材における粘着剤層に対向する面を構成する材料の一具体例として、表示デバイスに使用されるガラス基板が挙げられる。
基材がガラス基板である場合において、そのガラス基板を構成する材料の具体的な種類は、特に限定されることなく、例えば、化学強化ガラス、無アルカリガラス、石英ガラス、ソーダライムガラス、バリウム・ストロンチウム含有ガラス、アルミノケイ酸ガラス、鉛ガラス、ホウケイ酸ガラス、バリウムホウケイ酸ガラス等が挙げられる。ガラス基板の厚さは、特に限定されないが、通常は0.1〜5mmであり、好ましくは0.2〜2mmである。
As a specific example of the material constituting the surface facing the pressure-sensitive adhesive layer in the substrate, a glass substrate used in a display device can be mentioned.
In the case where the substrate is a glass substrate, the specific type of material constituting the glass substrate is not particularly limited. For example, chemically tempered glass, alkali-free glass, quartz glass, soda lime glass, barium Examples include strontium-containing glass, aluminosilicate glass, lead glass, borosilicate glass, and barium borosilicate glass. Although the thickness of a glass substrate is not specifically limited, Usually, it is 0.1-5 mm, Preferably it is 0.2-2 mm.
基材は、耐熱性のプラスチック材料から構成されていてもよい。基材が耐熱性のプラスチックフィルムからなる場合において、その具体例としては、ポリイミドフィルム、ポリアミドフィルム、ポリアミドイミドフィルム、ポリサルフォンフィルム、ポリフェニレンサルファイドフィルム、ポリエーテルエーテルケトンフィルム、ポリアリレートフィルム、ポリカーボネートフィルム、液晶ポリマーフィルム、ポリエチレンナフタレートフィルム;これらの2種以上の積層体などを挙げることができる。プラスチックフィルムは、一軸延伸または二軸延伸されたものでもよい。 The substrate may be made of a heat resistant plastic material. When the substrate is made of a heat-resistant plastic film, specific examples thereof include polyimide film, polyamide film, polyamideimide film, polysulfone film, polyphenylene sulfide film, polyether ether ketone film, polyarylate film, polycarbonate film, and liquid crystal Examples thereof include polymer films, polyethylene naphthalate films; and laminates of two or more of these. The plastic film may be uniaxially stretched or biaxially stretched.
(2)粘着剤層
(2−1)組成
本実施形態に係る積層体が備える粘着剤層は、次に説明する成分を含有するシリコーン系粘着剤組成物から形成されたものである。シリコーン系粘着剤組成物は他の種類の粘着剤組成物、例えばアクリル系の粘着剤組成物に比べて耐熱性に優れるため、シリコーン系粘着剤組成物から形成された粘着剤層は、加熱されたときに浮き、剥がれ、発泡といった不具合が生じにくい。
(2) Adhesive layer (2-1) Composition The adhesive layer with which the laminated body which concerns on this embodiment is provided is formed from the silicone type adhesive composition containing the component demonstrated below. Since the silicone pressure-sensitive adhesive composition is superior in heat resistance compared to other types of pressure-sensitive adhesive compositions, for example, acrylic pressure-sensitive adhesive compositions, the pressure-sensitive adhesive layer formed from the silicone-based pressure-sensitive adhesive composition is heated. It is difficult to cause problems such as floating, peeling and foaming.
本実施形態に係るシリコーン系粘着剤組成物は、シロキサン結合を主骨格としアルケニル基を有する付加型のオルガノポリシロキサンを構成成分として含むシリコーンゴムを含有する。かかるシリコーンゴムを含有することにより、粘着剤層の剥離力を比較的低くすることが可能となる。それゆえ、基材や被着体から粘着剤層を容易に剥離することが可能であり、かつ、粘着剤層の凝集破壊に基づく粘着剤層を構成する材料の基材や被着体への残着を極めて僅少にすることができる。したがって、かかるシリコーンゴムを含有する本実施形態に係るシリコーン系粘着剤組成物から形成された粘着剤層は、再剥離性に優れたものとなり得る。 The silicone pressure-sensitive adhesive composition according to this embodiment contains a silicone rubber containing an addition type organopolysiloxane having a siloxane bond as a main skeleton and an alkenyl group as a constituent component. By containing such a silicone rubber, it becomes possible to relatively reduce the peeling force of the pressure-sensitive adhesive layer. Therefore, the pressure-sensitive adhesive layer can be easily peeled off from the base material or the adherend, and the material constituting the pressure-sensitive adhesive layer based on the cohesive failure of the pressure-sensitive adhesive layer is applied to the base material or the adherend. The remaining amount can be extremely small. Therefore, the pressure-sensitive adhesive layer formed from the silicone-based pressure-sensitive adhesive composition according to this embodiment containing such a silicone rubber can be excellent in removability.
前記アルケニル基の具体例として、アリル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基、ヘプテニル基、オクテニル基等が挙げられる。さらに、付加反応性を有さない有機基を有していてもよい。そのような有機基の具体例として、メチル基、エチル基、プロピル基等のアルキル基、フェニル基等などのアリール基などが挙げられる。 Specific examples of the alkenyl group include an allyl group, a propenyl group, a butenyl group, a pentenyl group, a hexenyl group, a heptenyl group, and an octenyl group. Furthermore, you may have the organic group which does not have addition reactivity. Specific examples of such an organic group include alkyl groups such as methyl group, ethyl group, and propyl group, and aryl groups such as phenyl group.
上記のシリコーンゴムに含まれるオルガノポリシロキサンの重合度は特に制限されないが、通常500以上10000以下、さらには2000以上8000以下であることが好ましい。 The degree of polymerization of the organopolysiloxane contained in the silicone rubber is not particularly limited, but is usually 500 or more and 10,000 or less, more preferably 2000 or more and 8,000 or less.
本実施形態に係るシリコーン系粘着剤組成物は白金触媒を含有する。この白金触媒は、上記のアルケニル基の付加反応を開始させる機能や当該付加反応を促進する機能を有する。この白金触媒の種類として、白金黒、塩化第2白金、塩化白金酸、塩化白金酸と1価アルコールとの反応物、塩化白金酸とオレフィン類との錯体、白金ビスアセトアセテート等を例示することができる。本実施形態に係るシリコーン系粘着剤組成物中の白金触媒の含有量は、シリコーンゴム100質量部あたり0.01質量部以上3質量部以下である。この範囲とすることで、白金触媒の機能が安定的に発揮される。白金触媒の機能をより安定的に発揮させる観点から、シリコーン系粘着剤組成物中の白金触媒の含有量は、シリコーンゴム100質量部あたり0.05質量部以上2.00質量部以下であることが好ましく、0.10質量部以上1.00質量部以下であることがより好ましい。 The silicone-based pressure-sensitive adhesive composition according to this embodiment contains a platinum catalyst. This platinum catalyst has a function of initiating the addition reaction of the alkenyl group and a function of promoting the addition reaction. Examples of the platinum catalyst include platinum black, secondary platinum chloride, chloroplatinic acid, a reaction product of chloroplatinic acid and a monohydric alcohol, a complex of chloroplatinic acid and an olefin, platinum bisacetoacetate, etc. Can do. Content of the platinum catalyst in the silicone type adhesive composition which concerns on this embodiment is 0.01 mass part or more and 3 mass parts or less per 100 mass parts of silicone rubber. By setting it as this range, the function of a platinum catalyst is exhibited stably. From the viewpoint of more stably exerting the function of the platinum catalyst, the content of the platinum catalyst in the silicone-based pressure-sensitive adhesive composition is 0.05 parts by mass or more and 2.00 parts by mass or less per 100 parts by mass of the silicone rubber. It is more preferable that it is 0.10 parts by mass or more and 1.00 parts by mass or less.
本実施形態に係るシリコーン系粘着剤組成物は、シリコーンレジン、すなわち、分子中に分岐状オルガノポリシロキサンを含有する。かかるシリコーンレジンを含有することにより、粘着剤層の基材や被着体に対する粘着性を高めることができる。この粘着性の程度を適切に設定するとともに、アウトガスが発生する可能性を低減させる観点から、本実施形態に係るシリコーン系粘着剤組成物中のシリコーンレジンの含有量は、シリコーンゴム100質量部あたり10質量部以上100質量部以下とする。上記の粘着性を適切に設定したり、アウトガスが発生する可能性をより低減させたりすることを安定的に達成する観点から、シリコーン系粘着剤組成物中のシリコーンレジンの含有量は、シリコーンゴム100質量部あたり15質量部以上75質量部以下とすることが好ましく、20質量部以上50質量部以下とすることがより好ましい。 The silicone-based pressure-sensitive adhesive composition according to this embodiment contains a silicone resin, that is, a branched organopolysiloxane in the molecule. By containing such a silicone resin, the adhesiveness of the adhesive layer to the substrate or adherend can be increased. From the viewpoint of appropriately setting the degree of adhesiveness and reducing the possibility of outgassing, the content of the silicone resin in the silicone-based adhesive composition according to this embodiment is about 100 parts by mass of silicone rubber. 10 parts by mass or more and 100 parts by mass or less. The silicone resin content in the silicone-based pressure-sensitive adhesive composition is silicone rubber from the viewpoint of stably achieving the above-mentioned adhesiveness appropriately and further reducing the possibility of outgas generation. It is preferable to set it as 15 to 75 mass parts per 100 mass parts, and it is more preferable to set it as 20 to 50 mass parts.
本実施形態に係るシリコーン系粘着剤組成物は、粘着剤層が所望の機能を発揮できる限り、各種の成分を含有することができる。例えば、ヒドロシリル基を有する架橋剤;架橋促進剤;染料、顔料等の着色材料;アニリド系、フェノール系等の酸化防止剤;ベンゾフェノン系、ベンゾトリアゾール系等の紫外線吸収剤;タルク、二酸化チタン、シリカ、でんぷん等のフィラー成分;可塑剤;酸化防止剤;光安定剤;分散剤;レベリング剤などが例示される。ただし、これらの成分はアウトガスを発生させにくいものであることが好ましい。また、本実施形態に係るシリコーン系粘着剤組成物がヒドロシリル基を有する架橋剤を含有する場合には、その含有量は、シリコーンゴム100質量部あたり1.0質量部以上10.0質量部以下とすることが好ましい。 The silicone-based pressure-sensitive adhesive composition according to this embodiment can contain various components as long as the pressure-sensitive adhesive layer can exhibit a desired function. For example, crosslinking agents having hydrosilyl groups; crosslinking accelerators; coloring materials such as dyes and pigments; antioxidants such as anilides and phenols; ultraviolet absorbers such as benzophenones and benzotriazoles; talc, titanium dioxide, silica And filler components such as starch, plasticizers, antioxidants, light stabilizers, dispersants, leveling agents and the like. However, these components are preferably those which do not easily generate outgas. Moreover, when the silicone type adhesive composition which concerns on this embodiment contains the crosslinking agent which has a hydrosilyl group, the content is 1.0 mass part or more and 10.0 mass parts or less per 100 mass parts of silicone rubbers. It is preferable that
ここで、本実施形態に係る粘着剤層は、前述のシリコーン系粘着剤組成物を塗布、乾燥することにより粘着剤組成物層を形成し、当該層にアニール処理を施すことにより得られる。詳細は後述する。 Here, the pressure-sensitive adhesive layer according to this embodiment is obtained by forming the pressure-sensitive adhesive composition layer by applying and drying the above-described silicone-based pressure-sensitive adhesive composition, and subjecting the layer to annealing treatment. Details will be described later.
(2−2)耐質量減少性
本実施形態に係る粘着剤層は、空気雰囲気内で、23℃から200℃まで5℃/分で加熱したときの、40℃における質量に対する200℃における質量の減少率(本明細書において「質量減少率」ともいう。)が0.20質量%以下である。すなわち、本実施形態に係る粘着剤層は優れた耐質量減少性を有する。
(2-2) Mass reduction resistance The pressure-sensitive adhesive layer according to this embodiment has a mass at 200 ° C. relative to the mass at 40 ° C. when heated at 5 ° C./min from 23 ° C. to 200 ° C. in an air atmosphere. The reduction rate (also referred to as “mass reduction rate” in this specification) is 0.20 mass% or less. That is, the pressure-sensitive adhesive layer according to this embodiment has excellent mass reduction resistance.
粘着剤層が優れた耐質量減少性を有することにより、本実施形態に係る積層体が高温環境下に置かれた場合でも、アウトガス量を安定的に低減させることが可能となる。このアウトガス量をより安定的に低減させる観点から、上記の粘着剤層の質量減少率は0.01質量%以下であることが好ましく、粘着剤層を加熱する際の最高到達温度(上記の場合には200℃)を250℃としたときの粘着剤層の質量減少率が0.5質量%以下であることがより好ましく、上記の最高到達温度を300℃としたときの粘着剤層の質量減少率が1.0質量%以下であることが特に好ましい。 Since the pressure-sensitive adhesive layer has excellent mass reduction resistance, the amount of outgas can be stably reduced even when the laminate according to this embodiment is placed in a high temperature environment. From the viewpoint of more stably reducing the amount of outgas, the mass reduction rate of the pressure-sensitive adhesive layer is preferably 0.01% by mass or less, and the highest temperature reached when the pressure-sensitive adhesive layer is heated (in the above case) It is more preferable that the mass reduction rate of the pressure-sensitive adhesive layer when the temperature is 250 ° C. is 0.5% by mass or less, and the mass of the pressure-sensitive adhesive layer when the maximum temperature reached is 300 ° C. The reduction rate is particularly preferably 1.0% by mass or less.
(2−3)再剥離性
本実施形態に係る積層体の粘着剤層は、基材や被着体に対する再剥離性に優れる。ここで、本明細書において、「再剥離性に優れる」とは、本実施形態に係る積層体の粘着剤層を被着体に貼付した後、加熱処理を経ても、その後剥離する際には、粘着剤層が凝集破壊を起こさずに基材または被着体にのみ粘着剤層が残り、他方に粘着剤層が残らないことを意味する。本実施形態に係る積層体の粘着剤層が再剥離性に優れる場合には、本実施形態に係る積層体と被着体とからなる積層構造体に対して加熱等の処理を行った後、本実施形態に係る積層体から処理後の被着体を剥離して別の工程に供する際に、処理後の被着体に粘着剤が残着する不具合が生じにくい。また、本実施形態に係る積層体と被着体とを貼合する工程(本明細書において「貼付工程」ともいう。)の貼付作業において貼り直しが可能となるため、作業負荷が軽減され、貼付工程の作業性が向上する。さらに、貼り直しが可能となるため、不良品の発生率が低下する。したがって、本実施形態に係る積層体を含む製品の製造コストが低減することも期待される。加えて、本実施形態に係る積層体と被着体とを貼合して得られる積層構造体に対して基材を剥離するなどの工程を行ったときに、粘着剤層が基材に残着しにくいため、基材を再使用することが容易になる(例えば、洗浄工程の負荷が高まりにくいことが挙げられる。)ことも期待される。
(2-3) Removability The pressure-sensitive adhesive layer of the laminate according to this embodiment is excellent in removability for a substrate or an adherend. Here, in this specification, “excellent in removability” means that the adhesive layer of the laminate according to this embodiment is pasted on the adherend, and then peeled off even after heat treatment. This means that the pressure-sensitive adhesive layer does not cause cohesive failure, the pressure-sensitive adhesive layer remains only on the substrate or the adherend, and the pressure-sensitive adhesive layer does not remain on the other side. When the pressure-sensitive adhesive layer of the laminate according to this embodiment is excellent in removability, after performing a treatment such as heating on the laminate structure composed of the laminate and adherend according to this embodiment, When the treated adherend is peeled from the laminate according to the present embodiment and subjected to another process, a problem that the adhesive remains on the treated adherence hardly occurs. Moreover, since it becomes possible to re-paste in the sticking operation of the step of bonding the laminate and the adherend according to the present embodiment (also referred to as "sticking step" in this specification), the work load is reduced, Workability of the attaching process is improved. Furthermore, since re-sticking becomes possible, the incidence rate of defective products decreases. Therefore, it is expected that the manufacturing cost of the product including the laminate according to the present embodiment is reduced. In addition, the adhesive layer remains on the substrate when a process such as peeling the substrate is performed on the laminated structure obtained by bonding the laminate and the adherend according to the present embodiment. Since it is difficult to wear, it is expected that the substrate can be easily reused (for example, it is difficult to increase the load of the cleaning process).
本実施形態に係る積層体の粘着剤層は、本実施形態に係る積層体と被着体とを貼合して得られる積層構造体の状態で粘着剤層が高温の環境下に置かれた場合であっても、基材や被着体に対して優れた再剥離性を有していることが好ましい。この点に関し、本実施形態に係る粘着剤層は、アニール処理をしていない粘着剤組成物層に対する粘着力(いずれの粘着力についても、測定方法は実施例において詳述する。)の比率が、50%以上200%以下であることが好ましい。 The pressure-sensitive adhesive layer of the laminate according to this embodiment was placed in a high-temperature environment in the state of a laminated structure obtained by bonding the laminate according to this embodiment and the adherend. Even if it is a case, it is preferable to have the excellent removability with respect to a base material or a to-be-adhered body. In this regard, the pressure-sensitive adhesive layer according to the present embodiment has a ratio of pressure-sensitive adhesive strength to the pressure-sensitive adhesive composition layer that has not been annealed (the measurement method will be described in detail in the examples for any pressure-sensitive adhesive strength). 50% or more and 200% or less is preferable.
(2−4)厚さ
粘着剤層の厚さは特に限定されない。粘着剤層が過度に薄い場合には、基材や被着体に対する粘着性が、必要とされる程度まで得られにくくなるおそれがある。この適切な程度の粘着性を得やすくする観点から、粘着剤層の厚さは2μm以上であることが好ましく、5μm以上であることがより好ましく、10μm以上であることが特に好ましい。一方、粘着剤層の厚さの上限は、その用途に応じて適宜設定されるべきものであり、通常、200μm以下とされ、100μm以下とすることが好ましく、50μm以下とすることがより好ましい。
(2-4) Thickness The thickness of the pressure-sensitive adhesive layer is not particularly limited. When the pressure-sensitive adhesive layer is excessively thin, there is a possibility that it is difficult to obtain the adhesiveness to the substrate or adherend to the required level. From the viewpoint of easily obtaining this appropriate level of tackiness, the thickness of the pressure-sensitive adhesive layer is preferably 2 μm or more, more preferably 5 μm or more, and particularly preferably 10 μm or more. On the other hand, the upper limit of the thickness of the pressure-sensitive adhesive layer should be appropriately set according to its use, and is usually 200 μm or less, preferably 100 μm or less, and more preferably 50 μm or less.
2.積層体の製造方法
本実施形態に係る積層体の製造方法は特に限定されない。一例として、次に説明するように、粘着シートをまず用意し、その粘着シートを用いて本実施形態に係る積層体を製造することが挙げられる。
2. Manufacturing method of laminated body The manufacturing method of the laminated body which concerns on this embodiment is not specifically limited. As an example, as described below, first, an adhesive sheet is prepared, and the laminate according to the present embodiment is manufactured using the adhesive sheet.
(1)粘着シート
本実施形態に係る粘着シートは、2枚の剥離シートと、それら2枚の剥離シートの剥離面と接するように当該2枚の剥離シートに挟持された粘着剤組成物層とから構成される。かかる粘着シートは次の方法で製造することができる。
(1) Adhesive Sheet The adhesive sheet according to the present embodiment includes two release sheets, and an adhesive composition layer sandwiched between the two release sheets so as to be in contact with the release surfaces of the two release sheets. Consists of Such an adhesive sheet can be produced by the following method.
まず、本実施形態に係るシリコーン系粘着剤組成物またはこれに溶媒を加えてなる塗工液を用意する。溶媒を用いる際に、その種類や塗工液の固形分濃度はシリコーン系粘着剤組成物の組成、塗工条件、目的とする粘着剤層の厚さなどを考慮して適宜設定すればよい。溶媒としては、トルエン、メチルエチルケトン、酢酸エチルなどが例示され、固形分濃度は10質量%以上40質量%程度の範囲が例示される。 First, the silicone type adhesive composition which concerns on this embodiment, or the coating liquid formed by adding a solvent to this is prepared. When using the solvent, the type and solid content concentration of the coating solution may be appropriately set in consideration of the composition of the silicone-based pressure-sensitive adhesive composition, the coating conditions, the thickness of the target pressure-sensitive adhesive layer, and the like. Examples of the solvent include toluene, methyl ethyl ketone, ethyl acetate, and the like, and the solid content concentration is in the range of about 10 mass% to about 40 mass%.
次に、剥離シートを2枚用意する。剥離シートとしては、例えば、ポリエチレンフィルム、ポリプロピレンフィルム、ポリブテンフィルム、ポリブタジエンフィルム、ポリメチルペンテンフィルム、ポリ塩化ビニルフィルム、塩化ビニル共重合体フィルム、ポリエチレンテレフタレートフィルム、ポリエチレンナフタレートフィルム、ポリブチレンテレフタレートフィルム、ポリウレタンフィルム、エチレン酢酸ビニルフィルム、アイオノマー樹脂フィルム、エチレン・(メタ)アクリル酸共重合体フィルム、エチレン・(メタ)アクリル酸エステル共重合体フィルム、ポリスチレンフィルム、ポリカーボネートフィルム、ポリイミドフィルム、フッ素樹脂フィルム等が用いられる。また、これらの架橋フィルムも用いられる。さらに、これらの積層フィルムであってもよい。 Next, two release sheets are prepared. As the release sheet, for example, polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polyethylene naphthalate film, polybutylene terephthalate film, Polyurethane film, ethylene vinyl acetate film, ionomer resin film, ethylene / (meth) acrylic acid copolymer film, ethylene / (meth) acrylic acid ester copolymer film, polystyrene film, polycarbonate film, polyimide film, fluororesin film, etc. Is used. These crosslinked films are also used. Furthermore, these laminated films may be sufficient.
上記剥離シートの剥離面(特に粘着剤組成物層と接する面)には、剥離処理が施されていることが好ましい。なお、本明細書における剥離シートの剥離面とは、剥離シートにおいて剥離性を有する面をいい、剥離処理を施した面および剥離処理を施さなくても剥離性を示す面のいずれをも含むものである。 The release surface of the release sheet (particularly the surface in contact with the pressure-sensitive adhesive composition layer) is preferably subjected to a release treatment. In addition, the release surface of the release sheet in this specification refers to a surface having peelability in the release sheet, and includes both a surface that has been subjected to a release treatment and a surface that exhibits peelability without being subjected to a release treatment. .
剥離処理に使用される剥離剤としては、例えば、アルキッド系、シリコーン系、フッ素系、不飽和ポリエステル系、ポリオレフィン系、ワックス系の剥離剤が挙げられる。塗工液がシリコーン系粘着剤組成物を含有することから、剥離処理は、フッ素系の剥離処理であることが好ましい。フッ素系の剥離処理がフッ素系の剥離剤(例えば、フッ化シリコーン)を塗布することにより行われる場合には、剥離剤の塗布量は限定されず、通常、0.02〜2.0g/cm3であり、好ましくは0.2〜1.0g/cm3である。 Examples of the release agent used for the release treatment include alkyd, silicone, fluorine, unsaturated polyester, polyolefin, and wax release agents. Since the coating liquid contains the silicone-based pressure-sensitive adhesive composition, the release treatment is preferably a fluorine-based release treatment. When the fluorine-based release treatment is performed by applying a fluorine-based release agent (for example, silicone fluoride), the application amount of the release agent is not limited and is usually 0.02 to 2.0 g / cm. 3 , preferably 0.2 to 1.0 g / cm 3 .
粘着剤組成物層の剥離不良を防止する観点から、2枚の剥離シートは異なる種類とすることによりそれらの剥離シートの剥離力に所定の差が生じるようにして、一方の剥離シートを重剥離型剥離シートとし、他方の剥離シートを軽剥離型剥離シートとすることが好ましい。なお、剥離力は、剥離剤層の組成および架橋度、ならびにフィルム厚等により適宜調節することができる。 From the standpoint of preventing poor release of the pressure-sensitive adhesive composition layer, the two release sheets are of different types, so that a predetermined difference occurs in the release force of the release sheets, and one release sheet is heavyly peeled off. It is preferable to use a mold release sheet and the other release sheet to be a light release type release sheet. The peeling force can be appropriately adjusted depending on the composition of the release agent layer, the degree of crosslinking, the film thickness, and the like.
剥離シートの厚さについては特に制限はないが、通常20〜150μm程度である。 Although there is no restriction | limiting in particular about the thickness of a peeling sheet, Usually, it is about 20-150 micrometers.
用意した一方の剥離シートの剥離面に、上記の塗工液を塗布し、乾燥処理(加熱する場合もある。)を行って塗布層を形成した後、その塗布層に他方の剥離シートの剥離面を重ね合わせる。養生期間が必要な場合は養生期間をおくことにより、養生期間が不要な場合はそのまま、上記塗布層が粘着剤組成物層となる。これにより、本実施形態に係る粘着シートが得られる。なお、2枚の剥離シートが重剥離型剥離シートと軽剥離型剥離シートとからなる場合には、上記の塗工液が塗布される剥離シートは重剥離型剥離シートであることが、製造を容易にしたり、得られる粘着シートの品質を安定させる観点から好ましい。 The above-mentioned coating liquid is applied to the release surface of one prepared release sheet, and after a drying treatment (may be heated) is performed to form a coating layer, the other release sheet is peeled off from the coating layer. Overlapping surfaces. If a curing period is required, a curing period is provided. If the curing period is not necessary, the coating layer becomes the pressure-sensitive adhesive composition layer as it is. Thereby, the adhesive sheet which concerns on this embodiment is obtained. In addition, when two release sheets consist of a heavy release type release sheet and a light release type release sheet, the release sheet to which the coating liquid is applied is a heavy release type release sheet. It is preferable from the viewpoint of facilitating or stabilizing the quality of the obtained pressure-sensitive adhesive sheet.
上記の塗工液を塗布する方法としては、例えばバーコート法、ナイフコート法、ロールコート法、ブレードコート法、ダイコート法、グラビアコート法等を利用することができる。
乾燥処理の条件の具体的な一例として、80℃以上140℃程度の温度の環境に30秒間以上4分間以下程度置くことが挙げられる。
As a method for applying the coating liquid, for example, a bar coating method, a knife coating method, a roll coating method, a blade coating method, a die coating method, a gravure coating method, or the like can be used.
As a specific example of the conditions for the drying treatment, it may be placed in an environment at a temperature of about 80 ° C. to about 140 ° C. for about 30 seconds to 4 minutes.
(2)積層体
上記の粘着シートの一方の剥離シート(剥離シートの種類が異なる場合には、軽剥離型剥離シートに相当する剥離シートであることが好ましい。)を剥離して粘着剤組成物層の面を表出させ、その面を基材の一の面に積層させる。続いて、粘着剤組成物層に貼着する剥離シート(剥離シートの種類が異なる場合には、重剥離型剥離シートに相当する剥離シートであることが好ましい。)を粘着剤組成物層から剥離して、基材と粘着剤組成物層とを備えた積層体を得る。以下、この積層体を「第一の積層体」ともいう。
(2) Laminate A pressure-sensitive adhesive composition by peeling off one release sheet of the above-mentioned pressure-sensitive adhesive sheet (when the type of release sheet is different, it is preferably a release sheet corresponding to a light-release type release sheet). The surface of the layer is exposed and the surface is laminated on one surface of the substrate. Subsequently, the release sheet to be adhered to the pressure-sensitive adhesive composition layer (when the type of release sheet is different, it is preferably a release sheet corresponding to a heavy release type release sheet) is peeled from the pressure-sensitive adhesive composition layer. And the laminated body provided with the base material and the adhesive composition layer is obtained. Hereinafter, this laminate is also referred to as a “first laminate”.
(3)アニール処理
第一の積層体に対して次のようなアニール処理を行って、粘着剤層に前述の耐質量減少性を付与して、第一の積層体を本実施形態に係る積層体とする。以下の説明では、基材がガラス基板からなる場合を具体例とする。
(3) Annealing treatment The first laminated body is subjected to the following annealing treatment to give the pressure-sensitive adhesive layer the aforementioned mass reduction resistance, and the first laminated body is laminated according to the present embodiment. Let it be the body. In the following description, the case where a base material consists of a glass substrate is taken as a specific example.
アニール処理では、第一の積層体を加熱して、その積層体の粘着剤層の内部に残留する揮発性成分を粘着剤組成物層から除去する。具体的な一実施形態では、アニール処理は、第一の積層体を、その粘着剤組成物層の面が表出した状態で、200℃以上の温度の環境に60分間以上置く工程を含む。このアニール処理における温度(本明細書において「アニール温度」ともいう。)を200℃以上とすることで、アニール処理を経て得られた積層体の粘着剤層が、前述の耐質量減少性を有することが安定的に実現される。上記の粘着剤層が前述の耐質量減少性を有することをより安定的に実現させる観点から、アニール温度は220℃以上とすることが好ましく、240℃以上とすることがより好ましい。アニール温度の上限は、上記の粘着剤層に耐質量減少性を付与する観点からは設定されない。アニール温度が過度に高い場合には、粘着剤層や基材が熱的に変質することに基づく不具合が生じやすくなるおそれがあるため、アニール温度は350℃以下とすることが好ましく、300℃以下とすることがより好ましい。なお、アニール処理におけるアニール温度から室温への冷却は、特に限定されず、常温の空気雰囲気内にて放冷するなど常法に従えばよい。 In the annealing treatment, the first laminate is heated to remove volatile components remaining inside the adhesive layer of the laminate from the adhesive composition layer. In a specific embodiment, the annealing treatment includes a step of placing the first laminate in an environment at a temperature of 200 ° C. or higher for 60 minutes or more with the surface of the pressure-sensitive adhesive composition layer exposed. By setting the temperature in this annealing process (also referred to as “annealing temperature” in this specification) to 200 ° C. or higher, the pressure-sensitive adhesive layer of the laminate obtained through the annealing process has the above-described mass reduction resistance. Can be realized stably. From the viewpoint of more stably realizing that the pressure-sensitive adhesive layer has the above-described mass reduction resistance, the annealing temperature is preferably 220 ° C. or higher, and more preferably 240 ° C. or higher. The upper limit of the annealing temperature is not set from the viewpoint of imparting mass reduction resistance to the pressure-sensitive adhesive layer. When the annealing temperature is excessively high, there is a risk that defects due to thermal deterioration of the pressure-sensitive adhesive layer or the base material may occur. Therefore, the annealing temperature is preferably 350 ° C. or less, and preferably 300 ° C. or less. More preferably. The cooling from the annealing temperature to room temperature in the annealing process is not particularly limited, and may be performed in accordance with a common method such as cooling in an air atmosphere at room temperature.
アニール処理を経て得られた積層体の粘着剤層側の面に対して剥離シートの剥離面を貼付して、被着体に貼付されるまでの間この粘着剤層側の面を保護していてもよい。この場合の剥離シートの剥離面は、前述のように、シリコーン系以外の剥離処理、具体的にはフッ素系の剥離処理が施された面であることが好ましい。 The release surface of the release sheet is applied to the adhesive layer side surface of the laminate obtained through the annealing treatment, and this adhesive layer side surface is protected until it is applied to the adherend. May be. As described above, the release surface of the release sheet in this case is preferably a surface that has been subjected to a release treatment other than silicone-based, specifically, a fluorine-based release treatment.
3.被着体
本実施形態に係る積層体の被着体は、特に限定されない。被着体として、半導体ウェハ、パッケージ等の半導体関連部材;カバーガラス、保護シート、偏光フィルム、位相差フィルム等の表示デバイス関連部材;ガラスエポキシ材料などによる回路基板、筺体等の電気・電子部品関連部材などが例示される。また、本実施形態に係る積層体上に複数の被着体が配置されていてもよい。この場合において、互いに近位な被着体同士が、本実施形態に係る積層体の粘着剤層の面の面内方向に離間していてもよい。
3. The adherend of the laminate according to the present embodiment is not particularly limited. Semiconductor-related members such as semiconductor wafers and packages as adherends; display device-related members such as cover glasses, protective sheets, polarizing films, and retardation films; electrical and electronic components such as circuit boards and housings made of glass epoxy materials A member etc. are illustrated. A plurality of adherends may be arranged on the laminate according to the present embodiment. In this case, the adherends close to each other may be separated in the in-plane direction of the surface of the pressure-sensitive adhesive layer of the laminate according to the present embodiment.
被着体の具体的な例として、基材の具体例と同様に、ガラス基板や耐熱性のプラスチックフィルムが挙げられる。被着体がガラス基板である場合おいて、被着体をなすガラス基板の材料は、特に限定されることなく、例えば、化学強化ガラス、無アルカリガラス、石英ガラス、ソーダライムガラス、バリウム・ストロンチウム含有ガラス、アルミノケイ酸ガラス、鉛ガラス、ホウケイ酸ガラス、バリウムホウケイ酸ガラス等が挙げられる。ガラス基板の厚さも基材の場合と同様に限定されず、通常は0.1〜5mmであり、好ましくは0.2〜2mmであることが例示される。 Specific examples of the adherend include a glass substrate and a heat-resistant plastic film, as in the specific example of the substrate. In the case where the adherend is a glass substrate, the material of the glass substrate forming the adherend is not particularly limited. For example, chemically strengthened glass, alkali-free glass, quartz glass, soda lime glass, barium strontium Examples thereof include glass, aluminosilicate glass, lead glass, borosilicate glass, and barium borosilicate glass. The thickness of the glass substrate is not limited as in the case of the base material, and is usually 0.1 to 5 mm, preferably 0.2 to 2 mm.
本実施形態に係る積層体の粘着剤層側の面に被着体が積層された状態で、粘着剤層が加熱される処理(本明細書において「加熱処理」ともいう。)が施されても、本実施形態に係る積層体の粘着剤層を構成する材料は前述の耐質量減少性を有するため、その積層体からのアウトガス量は低減されている。それゆえ、本実施形態に係る積層体を用いることにより、被着体がアウトガスで汚染されることや、被着体の周囲に存在する部品等がアウトガスで汚染されることを抑制することができる。 In a state where the adherend is laminated on the surface on the pressure-sensitive adhesive layer side of the laminate according to the present embodiment, a treatment for heating the pressure-sensitive adhesive layer (also referred to as “heating treatment” in this specification) is performed. Moreover, since the material which comprises the adhesive layer of the laminated body which concerns on this embodiment has the above-mentioned mass reduction resistance, the outgas amount from the laminated body is reduced. Therefore, by using the laminate according to the present embodiment, it is possible to suppress the adherend from being contaminated with outgas, and the components existing around the adherend from being contaminated with outgas. .
ここで、上記の加熱処理の具体的な内容は特に限定されず、本実施形態に係る積層体および被着体の少なくとも一方を加熱することが目的であってもよいし、本実施形態に係る積層体および被着体の少なくとも一方に加熱を目的としない処理を行った結果、粘着剤層が加熱される場合であってもよい。さらには、本実施形態に係る積層体および被着体の近傍に位置する部材が動作した結果として本実施形態に係る積層体および被着体の雰囲気温度が高まり、粘着剤層が加熱された状態に至る場合であってもよい。 Here, the specific content of the above-described heat treatment is not particularly limited, and the purpose may be to heat at least one of the laminate and the adherend according to the present embodiment, or according to the present embodiment. The pressure-sensitive adhesive layer may be heated as a result of performing a treatment not intended for heating on at least one of the laminate and the adherend. Furthermore, the atmospheric temperature of the laminate and adherend according to this embodiment increases as a result of the operation of the laminate and adherend in the vicinity of this embodiment, and the pressure-sensitive adhesive layer is heated. May be the case.
上記の加熱処理の例として、被着体の一の面に対する膜状体の形成、被着体や形成された膜状体の除去加工などを具体例とする、表面処理が挙げられる。表面処理のさらに具体的な例として、蒸着やスパッタリングによる、スズドープ酸化インジウム(ITO)、フッ素ドープ酸化スズ(FTO)、酸化亜鉛(ZnO)、酸化亜鉛にアルミニウムやガリウムが添加された酸化亜鉛系材料(AZO、GZO)などの透明導電膜の形成が例示される。 As an example of the above heat treatment, there is a surface treatment using a specific example of forming a film-like body on one surface of the adherend and removing the adherend or the formed film-like body. More specific examples of surface treatment include tin-doped indium oxide (ITO), fluorine-doped tin oxide (FTO), zinc oxide (ZnO), and zinc oxide-based materials in which aluminum or gallium is added to zinc oxide by vapor deposition or sputtering. The formation of a transparent conductive film such as (AZO, GZO) is exemplified.
この透明導電膜が形成される対象は、基材であってもよいし、被着体であってもよい。透明導電膜が形成される対象がガラス基板であり、透明導電膜の形成が表示デバイスの製造過程で行われる場合を具体例とすれば、光学的特性、特に透過率を高める観点から、このガラス基板の厚さは、通常、厚さ5mm以下とされる。したがって、ガラス基板の一の主面に対して透明導電膜を形成する工程が施されると、透明導電膜の形成に伴い、ガラス基板(基材であってもよいし、被着体であってもよい。)が加熱され、これに接するように配置される粘着剤層も加熱されることがある。透明導電膜がスパッタリングにより形成される場合には粘着剤層の加熱が生じやすく、特に、スパッタリングにより生成した高い運動エネルギーを有する物質が粘着剤層に直接到達しうる構成の場合には、この傾向が顕著となりやすい。このような場合であっても、本実施形態に係る積層体を用いる場合には、形成された透明導電膜がアウトガスにより汚染されることが抑制される。 The object on which the transparent conductive film is formed may be a substrate or an adherend. If the object on which the transparent conductive film is formed is a glass substrate, and the formation of the transparent conductive film is performed in the manufacturing process of the display device, this glass is used from the viewpoint of increasing optical characteristics, particularly transmittance. The thickness of the substrate is usually 5 mm or less. Therefore, when the step of forming the transparent conductive film is performed on one main surface of the glass substrate, the glass substrate (which may be a base material or an adherend) is formed along with the formation of the transparent conductive film. May be heated, and the pressure-sensitive adhesive layer disposed so as to be in contact therewith may be heated. When the transparent conductive film is formed by sputtering, heating of the pressure-sensitive adhesive layer is likely to occur, and in particular, in the case of a configuration in which a substance having high kinetic energy generated by sputtering can reach the pressure-sensitive adhesive layer directly. Tends to be prominent. Even in such a case, when the laminated body according to the present embodiment is used, the formed transparent conductive film is suppressed from being contaminated by outgas.
透明導電膜が形成されたガラス基板のその後の取り扱いは特に限定されない。粘着剤層がそのまま貼着していることが求められる場合には、ガラス基板と粘着剤層とからなる本実施形態に係る積層体を、これに貼着していた部材(基材である場合もあれば被着体である場合もある。)から剥離して、次の工程に供すればよい。透明導電膜が形成されたガラス基板だけが必要とされる場合には、本実施形態に係る積層体と被着体との積層構造体において、透明導電膜が形成されたガラス基板と粘着剤層との間で剥離を行って、透明導電膜が形成されたガラス基板を次の工程に供してもよい。あるいは、透明導電膜が形成されたガラス基板と粘着剤層とからなる本実施形態に係る積層体を上記の積層構造体から剥離して、その後、さらに透明導電膜が形成されたガラス基板から粘着剤層を剥離して、得られた透明導電膜が形成されたガラス基板を次の工程に供してもよい。透明導電膜が形成されたガラス基板に対する工程数が少ない観点から、上記の積層構造体から透明導電膜が形成されたガラス基板を剥離させる前者の方法の方が好ましい。 The subsequent handling of the glass substrate on which the transparent conductive film is formed is not particularly limited. When it is required that the pressure-sensitive adhesive layer is stuck as it is, a member (in the case of a base material) that has been stuck to the laminate according to the present embodiment composed of the glass substrate and the pressure-sensitive adhesive layer Or may be an adherend) and may be subjected to the next step. When only the glass substrate on which the transparent conductive film is formed is required, in the laminated structure of the laminate and the adherend according to this embodiment, the glass substrate and the adhesive layer on which the transparent conductive film is formed. And the glass substrate on which the transparent conductive film is formed may be subjected to the next step. Alternatively, the laminate according to the present embodiment composed of the glass substrate on which the transparent conductive film is formed and the pressure-sensitive adhesive layer is peeled off from the laminated structure, and then the glass substrate on which the transparent conductive film is further formed is adhered. The glass layer on which the transparent conductive film obtained by peeling the agent layer is formed may be subjected to the next step. From the viewpoint that the number of steps for the glass substrate on which the transparent conductive film is formed is small, the former method of peeling the glass substrate on which the transparent conductive film is formed from the above laminated structure is preferable.
なお、上記の積層構造体における透明導電膜が形成されたガラス基板以外の構成要素は、廃棄してもよいが、構成要素の少なくとも一つを再利用することが好ましい。基材がマザーガラスである場合を例として具体的に説明すれば、前述の粘着テープを用いてマザーガラス上に粘着剤層を貼付して、必要に応じアニール処理を行って本実施形態に係る積層体を得て、その積層体の粘着剤層にガラス基板を貼付し、ガラス基板上に透明導電膜を形成して、透明導電膜が形成されたガラス基板と粘着剤層との間で剥離して透明導電膜が形成されたガラス基板を得るだけでなく、基材をなすマザーガラスからも粘着剤層を剥離して、マザーガラスを必要に応じ洗浄した後、再び前述の粘着テープを用いて基材としてのマザーガラスと粘着剤層とを備えた本実施形態に係る積層体を得て、さらなる透明導電膜が形成されたガラス基板を得るために使用することが好ましい。 In addition, although constituent elements other than the glass substrate on which the transparent conductive film is formed in the above laminated structure may be discarded, it is preferable to reuse at least one of the constituent elements. If the case where a base material is mother glass is demonstrated concretely as an example, an adhesive layer will be stuck on mother glass using the above-mentioned adhesive tape, and annealing treatment may be performed if necessary, and this embodiment is concerned. A laminated body is obtained, a glass substrate is attached to the adhesive layer of the laminated body, a transparent conductive film is formed on the glass substrate, and peeling is performed between the glass substrate on which the transparent conductive film is formed and the adhesive layer. In addition to obtaining a glass substrate on which a transparent conductive film is formed, the adhesive layer is also peeled off from the mother glass forming the base material, the mother glass is washed as necessary, and then the above-mentioned adhesive tape is used again. It is preferable to obtain a laminated body according to this embodiment having a mother glass as a base material and an adhesive layer, and to obtain a glass substrate on which a further transparent conductive film is formed.
以上説明した実施形態は、本発明の理解を容易にするために記載されたものであって、本発明を限定するために記載されたものではない。したがって、上記実施形態に開示された各要素は、本発明の技術的範囲に属する全ての設計変更や均等物をも含む趣旨である。 The embodiment described above is described for facilitating understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.
例えば、上記の説明では基材や被着体はガラス基板である場合を具体例としたが、これに限定されない。基材を構成する材料は、ポリイミドなどの有機系材料であってもよい。この場合における基材の具体例として、ダイシングシート用基材フィルム、保護シート、最外層が樹脂層からなるフレキシブル印刷回路基板、塗膜を最表層に有する筺体などが挙げられる。基材を構成する材料は、アルミニウム、鉄合金、シリコン、セラミックスなど、ガラス材料以外の無機系材料であってもよい。この場合における基材の具体例として、シリコンウェハー、アルミナ基板、アルミニウム系合金製筐体、めっき鋼板製筺体などが挙げられる。基材を構成する材料は、ガラスエポキシ材料のように、有機材系材料と無機系材料との複合材料であってもよい。 For example, in the above description, the base material or the adherend is a glass substrate, but the present invention is not limited to this. The material constituting the substrate may be an organic material such as polyimide. Specific examples of the substrate in this case include a substrate film for dicing sheet, a protective sheet, a flexible printed circuit board having an outermost layer made of a resin layer, and a casing having a coating film on the outermost layer. The material constituting the base material may be an inorganic material other than a glass material, such as aluminum, iron alloy, silicon, or ceramics. Specific examples of the base material in this case include a silicon wafer, an alumina substrate, an aluminum alloy casing, a plated steel casing. The material constituting the substrate may be a composite material of an organic material and an inorganic material, such as a glass epoxy material.
以下、実施例等により本発明をさらに具体的に説明するが、本発明の範囲はこれらの実施例等に限定されるものではない。 EXAMPLES Hereinafter, although an Example etc. demonstrate this invention further more concretely, the scope of the present invention is not limited to these Examples etc.
〔実施例1〕
(1)塗工液の調製
付加硬化型のシリコーンゴム(信越化学工業社製、商品名:KS−847H)100質量部に、シリコーンレジン(東レ・ダウコーニング社製、製品名:SD4587L)30質量部、および白金触媒(東レ・ダウコーニング社製、製品名:SRX−212)0.6質量部を加え、メチルエチルケトンで固形分濃度が25質量%に調整された塗工液を用意した。
[Example 1]
(1) Preparation of coating solution 100 parts by mass of addition-curable silicone rubber (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KS-847H), 30 mass of silicone resin (manufactured by Dow Corning Toray, product name: SD4587L) And a platinum catalyst (manufactured by Dow Corning Toray, product name: SRX-212) (0.6 part by mass) were added, and a coating liquid in which the solid content concentration was adjusted to 25% by mass with methyl ethyl ketone was prepared.
(2)粘着シートの作製
ポリエチレンテレフタレート製基材フィルムの一方の主面上に、フッ化シリコーンからなる剥離剤を塗布することを含む剥離処理を施して、重剥離型剥離シートとした。また、ポリエチレンテレフタレート製基材フィルムの一方の主面上に、フッ化シリコーンからなる剥離剤を塗布することを含む剥離処理を施して、軽剥離型剥離シートとした。
(2) Production of pressure-sensitive adhesive sheet On one main surface of the polyethylene terephthalate base film, a release treatment including applying a release agent made of fluorosilicone was applied to obtain a heavy release type release sheet. Moreover, the peeling process including apply | coating the peeling agent which consists of a fluorosilicone was performed on one main surface of the base film made from a polyethylene terephthalate, and it was set as the light peeling type release sheet.
上記の重剥離型剥離シートの剥離面上に上記の塗工液をナイフコーターにて塗布し、120℃で1分間乾燥して、厚さ25μmの塗布層を得た。この塗布層と重剥離型剥離シートとからなる積層体の塗布層に上記の軽剥離型剥離シートの剥離面を貼合して、重剥離型剥離シート、粘着剤組成物層および軽剥離型剥離シートがこの順に配置されてなる粘着シートを得た。 The above coating solution was applied on the release surface of the above heavy release type release sheet with a knife coater and dried at 120 ° C. for 1 minute to obtain a coating layer having a thickness of 25 μm. The release surface of the light release release sheet is bonded to the coating layer of the laminate composed of the coating layer and the heavy release release sheet, and the heavy release release sheet, the pressure-sensitive adhesive composition layer, and the light release release A pressure-sensitive adhesive sheet having sheets arranged in this order was obtained.
(3)積層体の作製
この粘着シートの軽剥離型剥離シートを剥離して、無アルカリガラスからなるガラス基板(コーニング社製、製品名:イーグルXG)からなる基材の一方の主面に貼付し、重剥離型剥離シートを剥離して、基材と粘着剤組成物層とを備えた第一の積層体を得た。
(3) Production of Laminate The light release type release sheet of this pressure-sensitive adhesive sheet is peeled off and attached to one main surface of a base material made of a glass substrate made of alkali-free glass (product name: Eagle XG). Then, the heavy release type release sheet was peeled off to obtain a first laminate including a base material and an adhesive composition layer.
この第一の積層体に対して、温度が240℃の空気雰囲気を保持するオーブン内に投入し、60分間この雰囲気内に置いた後オーブンから取り出し、23℃、相対湿度50%の空気雰囲気内にて23℃まで放冷するアニール処理を行って、試験対象としての積層体を得た。 The first laminate is placed in an oven that maintains an air atmosphere at a temperature of 240 ° C., placed in this atmosphere for 60 minutes, and then removed from the oven, in an air atmosphere at 23 ° C. and a relative humidity of 50%. An annealing process for cooling to 23 ° C. was performed to obtain a laminate as a test object.
〔比較例1〕
実施例1における第一の積層体をそのまま試験対象としての積層体とした。すなわち、アニール処理を行っていない粘着剤組成物層を有する積層体である。
[Comparative Example 1]
The 1st laminated body in Example 1 was made into the laminated body as a test object as it is. That is, it is a laminate having a pressure-sensitive adhesive composition layer that has not been annealed.
〔試験例1〕 粘着力の評価
実施例および比較例に係る試験対象としての積層体のそれぞれについて、次の方法で、粘着剤層の基材に対する粘着力を測定した。なお、比較例に係る積層体の場合、実施例の粘着剤層と対比されるのは、粘着剤組成物層であるが、以下、簡易的に粘着剤層と称して説明する場合がある。
各積層体の粘着剤層の面を、ポリイミドフィルム(東レデュポン社製、製品名:カプトン100H)の一方の主面に貼合した後、ポリイミドフィルムおよび粘着剤層を切断してトリミングすることにより、ガラス基板上に、25mm幅、100mm長の粘着剤層とポリイミドフィルムとからなる積層体が配置されたサンプルを作製した。このサンプルをJIS Z0237:2009を準じて、引張試験機(オリエンテック社製、製品名:テンシロン)を用い、剥離速度300mm/分、剥離角度180°の条件で、粘着剤層とポリイミドフィルムとからなる積層体を剥離した。これにより、実施例の粘着剤層及び比較例の粘着剤組成物層の基材であるガラス基板に対する粘着力(mN/25mm)を測定した。測定結果を表1に示す。
[Test Example 1] Evaluation of adhesive strength For each of the laminates as test subjects according to Examples and Comparative Examples, the adhesive strength of the adhesive layer to the base material was measured by the following method. In addition, in the case of the laminated body which concerns on a comparative example, although it is an adhesive composition layer that is contrasted with the adhesive layer of an Example, it may hereafter be simply called an adhesive layer and may be demonstrated.
By bonding the surface of the adhesive layer of each laminate to one main surface of a polyimide film (product name: Kapton 100H, manufactured by Toray DuPont), then cutting and trimming the polyimide film and the adhesive layer A sample in which a laminate composed of an adhesive layer having a width of 25 mm and a length of 100 mm and a polyimide film was disposed on a glass substrate was prepared. Using this sample in accordance with JIS Z0237: 2009, using a tensile tester (product name: Tensilon, manufactured by Orientec Co., Ltd.) under the conditions of a peeling speed of 300 mm / min and a peeling angle of 180 °, The resulting laminate was peeled off. This measured the adhesive force (mN / 25mm) with respect to the glass substrate which is a base material of the adhesive layer of an Example, and the adhesive composition layer of a comparative example. The measurement results are shown in Table 1.
〔試験例2〕 再剥離性の評価
実施例および比較例に係る試験対象としての積層体のそれぞれについて、粘着剤層の面を、被着体としての無アルカリガラスからなるガラス基板(コーニング社製、製品名:イーグルXG)の一方の主面に貼付することにより、再剥離性の評価のための構造体を得た。この構造体を、相対湿度50%、23℃の空気雰囲気内に24時間放置した後、被着体をなすガラスを粘着剤層と基材とからなる積層体から剥離させた。その後、被着体の粘着剤層に対向していた側の主面を目視で観察して、粘着剤層を構成する材料が残着しているか否かによって、加熱処理なしの場合の再剥離性の程度を評価した。なお、目視では残着が確認できなかった場合を○とし、確認された場合を×とした。
上記の加熱処理なしの場合の再剥離性の評価に供したのと同様の構造体を別途用意した。この構造体に対して、240℃の空気雰囲気内に60分間放置する加熱処理を行い、さらに相対湿度50%、23℃の空気雰囲気内に24時間放置した後、粘着剤層と基材とからなる積層体から被着体をなすガラス基板を剥離させた。被着体の粘着剤層に対向していた側の主面を目視で観察して、粘着剤層を構成する材料が残着しているか否かによって、加熱処理ありの場合の再剥離性の程度を評価した。評価基準は、加熱処理なしの場合と同様である。評価結果を表1に示す。
[Test Example 2] Evaluation of removability For each of the laminates as test subjects according to Examples and Comparative Examples, the surface of the pressure-sensitive adhesive layer is formed of a glass substrate made of alkali-free glass as an adherend (manufactured by Corning). , Product name: Eagle XG) to obtain a structure for evaluation of removability. This structure was allowed to stand in an air atmosphere of 50% relative humidity and 23 ° C. for 24 hours, and then the glass forming the adherend was peeled off from the laminate composed of the pressure-sensitive adhesive layer and the substrate. Then, the main surface on the side facing the pressure-sensitive adhesive layer of the adherend is visually observed, and re-peeling without heat treatment depending on whether or not the material constituting the pressure-sensitive adhesive layer remains. The degree of sex was evaluated. In addition, the case where adhesion was not confirmed visually was set as (circle), and the case where it was confirmed was set as x.
A structure similar to that used for the evaluation of the removability without the above heat treatment was separately prepared. The structure is subjected to heat treatment for 60 minutes in an air atmosphere at 240 ° C., and further left in an air atmosphere at 50% relative humidity and 23 ° C. for 24 hours. The glass substrate forming the adherend was peeled from the resulting laminate. The main surface on the side of the adherend facing the adhesive layer is visually observed, and depending on whether or not the material constituting the adhesive layer remains, the removability in the case of heat treatment The degree was evaluated. Evaluation criteria are the same as in the case of no heat treatment. The evaluation results are shown in Table 1.
〔試験例3〕 質量減少率の測定
実施例および比較例に係る試験対象としての積層体のそれぞれについて、ガラス板からなる基材上の粘着剤層からこれを構成する材料を削り取り、示差熱・熱重量同時測定装置(島津製作所社製、製品名:DTG60)を用いて、室温(23℃)から300℃まで5℃/分で昇温し、40℃のときの質量に対する、200℃、250℃および300℃のそれぞれのときの質量の減少率(単位:質量%)を測定した。測定結果を表1に示す。
[Test Example 3] Measurement of mass reduction rate For each of the laminates as test subjects according to the examples and comparative examples, the material constituting this was scraped from the pressure-sensitive adhesive layer on the substrate made of a glass plate, and differential heat / Using a thermogravimetric simultaneous measurement device (manufactured by Shimadzu Corporation, product name: DTG60), the temperature was raised from room temperature (23 ° C.) to 300 ° C. at 5 ° C./min, and the mass at 40 ° C. was 200 ° C. and 250 ° C. The rate of mass reduction (unit: mass%) at each of ℃ and 300 ℃ was measured. The measurement results are shown in Table 1.
〔試験例4〕 アウトガスの影響評価
実施例および比較例に係る試験対象としての積層体のそれぞれについて、粘着剤層の面を、被着体としての厚さ0.5mmの無アルカリガラスからなるガラス基板(コーニング社製、製品名:イーグルXG)の一方の主面に貼付した。その後、被着体の粘着剤層に対向する面と反対側の面上にスパッタリングによりITO膜を形成した。形成されたITO膜の抵抗値を、4点法により測定した。測定の結果得られた抵抗率が50Ω/□以下である場合に、アウトガスの影響が軽微であり良好であると判定した。評価結果を表1に示す。
[Test Example 4] Evaluation of influence of outgas For each of the laminates as test objects according to Examples and Comparative Examples, the surface of the pressure-sensitive adhesive layer is made of an alkali-free glass having a thickness of 0.5 mm as an adherend. It stuck on one main surface of the board | substrate (Corning company make, product name: Eagle XG). Thereafter, an ITO film was formed on the surface of the adherend opposite to the surface facing the pressure-sensitive adhesive layer by sputtering. The resistance value of the formed ITO film was measured by a four-point method. When the resistivity obtained as a result of the measurement was 50Ω / □ or less, it was determined that the influence of outgasing was slight and good. The evaluation results are shown in Table 1.
表1に示されるように、本発明の条件を満たす実施例の積層体は、粘着剤を構成する材料の200℃における質量減少率が0.20質量%以下であり、積層体が加熱されてもアウトガスに基づく不具合が発生しにくいうえに、優れた再剥離性を有する。 As shown in Table 1, in the laminated body of the example satisfying the conditions of the present invention, the mass reduction rate at 200 ° C. of the material constituting the adhesive is 0.20% by mass or less, and the laminated body is heated. In addition, defects due to outgas are less likely to occur, and it has excellent removability.
本発明の積層体は、加熱処理が施されてもアウトガスが発生する可能性が低減されているとともに、優れた再剥離性を有し、例えば、ガラス基板にITO膜を形成する際に好適に使用される。 The laminate of the present invention has a reduced possibility of generating outgas even when heat treatment is performed, and has excellent removability, for example, suitable for forming an ITO film on a glass substrate. used.
Claims (5)
前記粘着剤層は、シリコーン系粘着剤組成物から形成されたものであり、
前記シリコーン系粘着剤組成物は、シロキサン結合を主骨格としアルケニル基を含有する付加型のオルガノポリシロキサンを構成成分として含むシリコーンゴムと、前記シリコーンゴム100質量部あたり0.01質量部以上3質量部以下の白金触媒と、前記シリコーンゴム100質量部あたり15質量部以上100質量部以下のシリコーンレジンとを含み、
前記粘着剤層を、空気雰囲気内で、23℃から300℃まで5℃/分で加熱したときの、40℃における質量に対する300℃における質量の減少率が1.0質量%以下であること
を特徴とする積層体。 A laminate comprising a substrate and an adhesive layer laminated on one surface of the substrate,
The pressure-sensitive adhesive layer is formed from a silicone-based pressure-sensitive adhesive composition,
The silicone-based pressure-sensitive adhesive composition includes a silicone rubber containing a siloxane bond as a main skeleton and an addition type organopolysiloxane containing an alkenyl group as a constituent component, and 0.01 parts by mass or more and 3 parts by mass per 100 parts by mass of the silicone rubber. Parts platinum catalyst and 15 parts by mass or more and 100 parts by mass or less of silicone resin per 100 parts by mass of the silicone rubber,
When the pressure-sensitive adhesive layer is heated from 23 ° C. to 300 ° C. at 5 ° C./min in an air atmosphere, the mass reduction rate at 300 ° C. with respect to the mass at 40 ° C. is 1.0 % by mass or less. A featured laminate.
前記粘着剤層を、前記シリコーン系粘着剤組成物からなる粘着剤組成物層が表出した状態で200℃以上の温度の空気雰囲気内に60分間以上置く工程を含むアニール処理を経て形成することを特徴とする積層体の製造方法。 A method for producing the laminate according to any one of claims 1 to 4,
The pressure-sensitive adhesive layer is formed through an annealing process including a step of placing in an air atmosphere at a temperature of 200 ° C. or higher for 60 minutes or more in a state where the pressure-sensitive adhesive composition layer composed of the silicone-based pressure-sensitive adhesive composition is exposed. A method for producing a laminate characterized by the above .
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