JP6111771B2 - Circuit member, connection structure, and manufacturing method of connection structure - Google Patents

Circuit member, connection structure, and manufacturing method of connection structure Download PDF

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JP6111771B2
JP6111771B2 JP2013058307A JP2013058307A JP6111771B2 JP 6111771 B2 JP6111771 B2 JP 6111771B2 JP 2013058307 A JP2013058307 A JP 2013058307A JP 2013058307 A JP2013058307 A JP 2013058307A JP 6111771 B2 JP6111771 B2 JP 6111771B2
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hole
adhesive
electrode
conductive particles
circuit member
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JP2014183004A (en
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有福 征宏
征宏 有福
伊澤 弘行
弘行 伊澤
敏光 森谷
敏光 森谷
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
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Description

本発明は、回路部材、接続構造体及び接続構造体の製造方法に関する。   The present invention relates to a circuit member, a connection structure, and a method for manufacturing the connection structure.

従来、回路部材同士を電気的に接続する方法として、異方導電性接着剤を用いた接続方法が知られている(例えば特許文献1、2参照)。この方法では、導電粒子及び接着剤成分を含む異方導電性接着剤を介して回路部材同士を圧着することにより、回路部材間の電極が電気的に接続されると同時に、同一回路部材内において隣接する電極間の絶縁性が確保される。   Conventionally, as a method of electrically connecting circuit members, a connection method using an anisotropic conductive adhesive is known (see, for example, Patent Documents 1 and 2). In this method, the electrodes between the circuit members are electrically connected by crimping the circuit members through an anisotropic conductive adhesive containing conductive particles and an adhesive component, and at the same time, in the same circuit member Insulation between adjacent electrodes is ensured.

特開昭60−191228号公報JP-A-60-191228 特開平1−251787号公報JP-A-1-251787

近年、電子機器の小型化及び薄型化にともない、回路の高密度化が進んでおり、電極の面積及び間隔が非常に狭くなっている。そのため、異方導電性接着剤を用いて回路部材同士を接続する際、回路部材間に所定数の導電粒子を捕捉させるために、異方導電性接着剤中の導電粒子の量を多くすると、隣接する電極間が短絡してしまう場合がある。これに対して、上記の短絡を防止するために、異方導電性接着剤中の導電粒子の量を少なくすると、接続信頼性が損なわれるという問題がある。   In recent years, with the miniaturization and thinning of electronic devices, the density of circuits has been increasing, and the area and spacing of electrodes have become very narrow. Therefore, when connecting circuit members using an anisotropic conductive adhesive, in order to capture a predetermined number of conductive particles between the circuit members, increasing the amount of conductive particles in the anisotropic conductive adhesive, There may be a short circuit between adjacent electrodes. On the other hand, in order to prevent said short circuit, there exists a problem that connection reliability will be impaired when the quantity of the electrically-conductive particle in anisotropic conductive adhesive is decreased.

本発明は、上記課題を解決するためになされたものであり、異方導電性接着剤中の導電粒子の量を少なくした場合であっても接続信頼性を確保できる回路部材、接続構造体及び接続構造体の製造方法を提供することを目的とする。   The present invention has been made in order to solve the above-described problems. A circuit member, a connection structure, and a circuit structure that can ensure connection reliability even when the amount of conductive particles in the anisotropic conductive adhesive is reduced. An object of the present invention is to provide a method for manufacturing a connection structure.

本発明に係る回路部材は、基板と、少なくとも基板の一面側に形成された電極とを備え、導電粒子及び接着剤成分を含む異方導電性接着剤を介して別の基板に圧着される回路部材であって、電極には、圧着の際に異方導電性接着剤が流入する孔部が形成されていることを特徴とする。   A circuit member according to the present invention includes a substrate and an electrode formed on at least one surface of the substrate, and is a circuit that is crimped to another substrate via an anisotropic conductive adhesive containing conductive particles and an adhesive component. It is a member, Comprising: The hole part into which an anisotropic conductive adhesive flows in in the case of crimping | compression-bonding is formed, and it is characterized by the above-mentioned.

この回路部材では、回路部材を別の回路部材と圧着する際に異方導電性接着剤が流入する孔部が電極に形成されている。この孔部により、圧着の際に電極に向かって異方導電性接着剤が流れ、電極付近に導電粒子を密集させることができる。したがって、異方導電性接着剤中の導電粒子の量が少ない場合でも接続信頼性を確保することができる。   In this circuit member, a hole into which the anisotropic conductive adhesive flows when the circuit member is pressure-bonded to another circuit member is formed in the electrode. By this hole portion, the anisotropic conductive adhesive flows toward the electrode during pressure bonding, and the conductive particles can be concentrated in the vicinity of the electrode. Therefore, connection reliability can be ensured even when the amount of conductive particles in the anisotropic conductive adhesive is small.

上記孔部は、異方導電性接着剤が流入する際に導電粒子を堰き止める粒子堰止部と、粒子堰止部によって導電粒子が堰き止められた場合でも、接着剤成分の流入を許容する接着剤流入部とを有することが好ましい。この場合、粒子堰止部によって電極付近に導電粒子を密集させることができる。また、導電粒子が密集してきた後でも、接着剤成分を接着剤流入部によって孔部内に流入させることができるので、導電粒子の密集効果を持続的に生じさせることが可能となる。   The hole portion allows the inflow of the adhesive component even when the conductive particles are dammed by the particle damming portion that dams the conductive particles when the anisotropic conductive adhesive flows. It is preferable to have an adhesive inflow portion. In this case, the conductive particles can be concentrated near the electrode by the particle blocking portion. Further, even after the conductive particles are densely packed, the adhesive component can be caused to flow into the hole portion by the adhesive inflow portion, so that the dense effect of the conductive particles can be continuously generated.

上記孔部は、電極を貫通する深さで形成されていることが好ましい。この場合、異方導電性接着剤が孔部に流入する体積をより確保できるので、電極に向かう異方導電性接着剤の流れをより確実に生じさせることができる。   The hole is preferably formed to a depth penetrating the electrode. In this case, since the volume in which the anisotropic conductive adhesive flows into the hole can be ensured, the flow of the anisotropic conductive adhesive toward the electrode can be generated more reliably.

上記孔部は、基板の内部に到達する深さで形成されていることが好ましい。この場合、異方導電性接着剤が孔部に流入する体積をより確保できるので、電極に向かう異方導電性接着剤の流れをより確実に生じさせることができる。   It is preferable that the hole is formed with a depth reaching the inside of the substrate. In this case, since the volume in which the anisotropic conductive adhesive flows into the hole can be ensured, the flow of the anisotropic conductive adhesive toward the electrode can be generated more reliably.

上記孔部は、基板を貫通する深さで形成されていることが好ましい。この場合、異方導電性接着剤が孔部に流入する体積をより確保できるので、電極に向かう異方導電性接着剤の流れをより確実に生じさせることができる。   The hole is preferably formed to a depth penetrating the substrate. In this case, since the volume in which the anisotropic conductive adhesive flows into the hole can be ensured, the flow of the anisotropic conductive adhesive toward the electrode can be generated more reliably.

また、本発明に係る接続構造体は、基板と、基板の一面側に形成された電極とを備える回路部材同士を、導電粒子及び接着剤成分を含む異方導電性接着剤を介して圧着してなる接続構造体であって、回路部材の少なくとも一方の電極には、圧着の際に異方導電性接着剤が流入した孔部が形成されていることを特徴とする。   In addition, the connection structure according to the present invention pressure-bonds circuit members each including a substrate and an electrode formed on one surface of the substrate via an anisotropic conductive adhesive containing conductive particles and an adhesive component. In this connection structure, at least one of the electrodes of the circuit member is formed with a hole into which the anisotropic conductive adhesive has flowed during the crimping.

この接続構造体では、回路部材同士を圧着する際に異方導電性接着剤が流入した孔部が電極に形成されている。この孔部により、圧着の際に電極に向かって異方導電性接着剤が流れ、電極付近に導電粒子を密集させることができる。したがって、異方導電性接着剤中の導電粒子の量が少ない場合でも接続信頼性を確保することができる。   In this connection structure, a hole into which the anisotropic conductive adhesive has flowed when the circuit members are pressure-bonded is formed in the electrode. By this hole portion, the anisotropic conductive adhesive flows toward the electrode during pressure bonding, and the conductive particles can be concentrated in the vicinity of the electrode. Therefore, connection reliability can be ensured even when the amount of conductive particles in the anisotropic conductive adhesive is small.

さらに、本発明に係る接続構造体の製造方法は、基板と、基板の一面側に形成された電極とを備える回路部材同士を、導電粒子及び接着剤成分を含む異方導電性接着剤を介して圧着してなる接続構造体の製造方法であって、回路部材の少なくとも一方の電極に孔部を形成し、圧着の際に孔部に異方導電性接着剤を流入させることを特徴とする。   Furthermore, in the method for manufacturing a connection structure according to the present invention, circuit members including a substrate and an electrode formed on one surface side of the substrate are connected to each other via an anisotropic conductive adhesive containing conductive particles and an adhesive component. A connection structure formed by pressure bonding, wherein a hole is formed in at least one electrode of a circuit member, and an anisotropic conductive adhesive is allowed to flow into the hole during the pressure bonding. .

この接続構造体の製造方法では、回路部材同士を圧着する際に異方導電性接着剤を電極に形成された孔部に流入させることにより、電極に向かって異方導電性接着剤が流れ、電極付近に導電粒子を密集させることができる。したがって、異方導電性接着剤中の導電粒子の量が少ない場合でも接続信頼性を確保することができる。   In the manufacturing method of this connection structure, the anisotropic conductive adhesive flows toward the electrodes by flowing the anisotropic conductive adhesive into the holes formed in the electrodes when the circuit members are crimped together. Conductive particles can be concentrated in the vicinity of the electrodes. Therefore, connection reliability can be ensured even when the amount of conductive particles in the anisotropic conductive adhesive is small.

本発明によれば、異方導電性接着剤中の導電粒子の量を少なくした場合であっても、接続信頼性を確保できる。   According to the present invention, connection reliability can be ensured even when the amount of conductive particles in the anisotropic conductive adhesive is reduced.

本発明に係る接続構造体の一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of the connection structure which concerns on this invention. 図1に示した接続構造体に適用される回路部材の一実施形態を示す平面図である。It is a top view which shows one Embodiment of the circuit member applied to the connection structure shown in FIG. 図2のI−I線断面図である。It is the II sectional view taken on the line of FIG. 回路部材が備える電極を示す平面図である。It is a top view which shows the electrode with which a circuit member is provided. 本発明に係る接続構造体の製造方法の一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of the manufacturing method of the connection structure which concerns on this invention. 孔部の作用を示す概念図である。It is a conceptual diagram which shows the effect | action of a hole. 変形例に係る電極に形成された孔部の構成を示す断面図である。It is sectional drawing which shows the structure of the hole formed in the electrode which concerns on a modification. 変形例に係る電極に形成された孔部の構成を示す平面図である。It is a top view which shows the structure of the hole formed in the electrode which concerns on a modification. 図9(a)は、変形例に係る回路部材を示す平面図であり、図9(b)は、図9(a)のII−II線断面図である。Fig.9 (a) is a top view which shows the circuit member which concerns on a modification, FIG.9 (b) is the II-II sectional view taken on the line of Fig.9 (a).

以下、図面を参照しながら、本発明に係る回路部材、接続構造体、及び接続構造体の製造方法の好適な実施形態について詳細に説明する。   Hereinafter, preferred embodiments of a circuit member, a connection structure, and a method for manufacturing the connection structure according to the present invention will be described in detail with reference to the drawings.

[接続構造体の構成]
図1は、本発明の一実施形態に係る接続構造体を示す断面図である。図1に示すように、この接続構造体1は、回路部材2と回路部材12とを、導電粒子51及び接着剤成分52を含む異方導電性接着剤5を介して接合することによって構成されている。
[Configuration of connection structure]
FIG. 1 is a cross-sectional view showing a connection structure according to an embodiment of the present invention. As shown in FIG. 1, the connection structure 1 is configured by joining a circuit member 2 and a circuit member 12 via an anisotropic conductive adhesive 5 including conductive particles 51 and an adhesive component 52. ing.

回路部材2は、基板3と、基板3の一面側に形成された電極4とを備えている。回路部材2としては、ICチップ、FPC(フレキシブル印刷配線板)等が用いられる。回路部材2がICチップの場合、基板3としては半導体シリコン基板等が用いられ、電極4としてはAu等からなるバンプ電極が用いられる。また、回路部材2がFPCの場合、基板3としてはポリイミド基板等が用いられ、電極4としては銅箔等からなる電極が用いられる。   The circuit member 2 includes a substrate 3 and an electrode 4 formed on one surface side of the substrate 3. As the circuit member 2, an IC chip, an FPC (flexible printed wiring board), or the like is used. When the circuit member 2 is an IC chip, a semiconductor silicon substrate or the like is used as the substrate 3 and a bump electrode made of Au or the like is used as the electrode 4. When the circuit member 2 is FPC, a polyimide substrate or the like is used as the substrate 3, and an electrode made of copper foil or the like is used as the electrode 4.

回路部材12は、基板13と、基板13の一面側に形成された電極14とを備えている。回路部材12としては、液晶ディスプレイ等が用いられる。回路部材12が液晶ディスプレイの場合、基板13としてはガラス基板等が用いられ、電極14としてはITO(インジウム錫酸化物)電極等が用いられる。   The circuit member 12 includes a substrate 13 and an electrode 14 formed on one surface side of the substrate 13. A liquid crystal display or the like is used as the circuit member 12. When the circuit member 12 is a liquid crystal display, a glass substrate or the like is used as the substrate 13, and an ITO (indium tin oxide) electrode or the like is used as the electrode 14.

接続構造体1では、電極4と電極14とを対向させた状態で異方導電性接着剤5を介して圧着され、電極4と電極14とが導電粒子51を噛合することで回路部材2と回路部材12との電気的な接続が実現されている。   In the connection structure 1, the electrode 4 and the electrode 14 are pressed against each other via the anisotropic conductive adhesive 5, and the electrode 4 and the electrode 14 mesh with the conductive particles 51, thereby connecting the circuit member 2. Electrical connection with the circuit member 12 is realized.

異方導電性接着剤5は導電粒子51及び接着剤成分52を含む。導電粒子51及び接着剤成分52は、接着剤成分100体積%に対して、導電粒子が例えば0.01〜50体積%、好ましくは0.1〜30体積%の割合で、用途により適宜配合される。これにより、電極4と電極14との間に十分な数の導電粒子を介在させることができる。   The anisotropic conductive adhesive 5 includes conductive particles 51 and an adhesive component 52. The conductive particles 51 and the adhesive component 52 are appropriately blended depending on the application in such a ratio that the conductive particles are, for example, 0.01 to 50% by volume, preferably 0.1 to 30% by volume with respect to 100% by volume of the adhesive component. The Thereby, a sufficient number of conductive particles can be interposed between the electrode 4 and the electrode 14.

導電粒子51としては、Au、Ag、Ni、Cu、はんだ等の金属粒子、又は、カーボン、ガラス、セラミック、プラスチック等の非導電粒子をAu、Ag、Pt等の貴金属で被覆した粒子が用いられる。導電粒子51として金属粒子を用いる場合には、粒子表面の酸化を抑制するために粒子表面を貴金属で被覆したものを用いることが好ましい。   As the conductive particles 51, metal particles such as Au, Ag, Ni, Cu, and solder, or particles obtained by coating nonconductive particles such as carbon, glass, ceramic, and plastic with noble metals such as Au, Ag, and Pt are used. . When metal particles are used as the conductive particles 51, it is preferable to use a particle whose surface is coated with a noble metal in order to suppress oxidation of the particle surface.

上記導電粒子の中でも、プラスチック粒子をAu、Ag等で被覆した導電粒子及び熱溶融する金属粒子は、回路部材同士の圧着の際に変形し、導電粒子と電極との接触面積を増加させることにより、接続信頼性をより向上させることができるので好ましい。プラスチック粒子をAu、Ag等で被覆した導電粒子は、同一回路部材内において隣接する電極間の絶縁信頼性を確保できる点でより好ましい。   Among the conductive particles, the conductive particles obtained by coating plastic particles with Au, Ag, and the like and the metal particles that are thermally melted are deformed when the circuit members are pressed together to increase the contact area between the conductive particles and the electrodes. This is preferable because the connection reliability can be further improved. Conductive particles obtained by coating plastic particles with Au, Ag, or the like are more preferable because they can ensure insulation reliability between adjacent electrodes in the same circuit member.

金属粒子又は非導電粒子を貴金属で被覆する場合の被覆層の厚さは、接続信頼性を確保するために、例えば、10nm以上が好ましく、30nm以上がより好ましい。また、導電粒子を絶縁性物質でさらに被覆することが好ましい。この場合、被覆層の厚さを例えば20〜500nmとすることで、接続信頼性及び絶縁信頼性を確保しやすくなる。また、導電粒子51の大きさは、例えば直径500〜50000nmであることが好ましい。   In order to ensure connection reliability, the thickness of the coating layer in the case where metal particles or non-conductive particles are coated with a noble metal is, for example, preferably 10 nm or more, and more preferably 30 nm or more. Moreover, it is preferable to further coat the conductive particles with an insulating material. In this case, it becomes easy to ensure connection reliability and insulation reliability by setting the thickness of the coating layer to 20 to 500 nm, for example. Moreover, it is preferable that the magnitude | size of the electrically-conductive particle 51 is 500-50000 nm in diameter, for example.

導電粒子の直径は、接合する電極面積、隣接電極間の距離により適宜選定されるが、直径が500nm未満となると接合する回路表面の凹凸に導電粒子が入り込んでしまい、接続信頼性が低下しやすくなる。また、直径が50000nmを超えると隣接電極間を短絡させやすくなる。   The diameter of the conductive particles is appropriately selected depending on the electrode area to be joined and the distance between adjacent electrodes. However, if the diameter is less than 500 nm, the conductive particles enter the unevenness of the circuit surface to be joined, and the connection reliability is likely to decrease. Become. Moreover, when a diameter exceeds 50000 nm, it will become easy to short-circuit between adjacent electrodes.

接着剤成分52は、接続信頼性の観点から、エポキシ樹脂、(メタ)アクリル樹脂、マレイミド樹脂、シトラコンイミド樹脂、ナジイミド樹脂、若しくはフェノール樹脂と、熱重合開始剤、硬化剤等とを含む熱硬化性樹脂;エポキシ樹脂、(メタ)アクリル樹脂等と光重合開始剤とを含む光硬化性樹脂;又はこれらを併用した樹脂から構成されることが好ましい。また、接着剤成分52は、フィルム成形性及び接着時の応力緩和性の観点から、アクリルゴム、スチレン‐ブタジエン‐スチレン共重合体、スチレン−イソプレン−スチレン共重合体等の熱可塑性樹脂を含むことが好ましい。   From the viewpoint of connection reliability, the adhesive component 52 is a thermosetting containing an epoxy resin, a (meth) acrylic resin, a maleimide resin, a citraconic imide resin, a nadiimide resin, or a phenol resin, and a thermal polymerization initiator, a curing agent, and the like. It is preferably composed of a photocurable resin; a photocurable resin containing an epoxy resin, a (meth) acrylic resin, etc. and a photopolymerization initiator; or a resin using these in combination. The adhesive component 52 contains a thermoplastic resin such as acrylic rubber, styrene-butadiene-styrene copolymer, styrene-isoprene-styrene copolymer from the viewpoint of film moldability and stress relaxation during adhesion. Is preferred.

また、異方導電性接着剤5の接着性、及び硬化時の応力緩和性の観点から、接着剤成分52は、ポリビニルブチラール樹脂、ポリビニルホルマール樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、キシレン樹脂、フェノキシ樹脂、ポリウレタン樹脂、尿素樹脂、アクリルゴム等の高分子成分を含むことができる。これらの高分子成分は、分子量が10000〜10000000であるものが好ましく、接着性が向上する点で、カルボキシル基、水酸基、エポキシ基等の官能基を有することが好ましい。   In addition, from the viewpoint of the adhesion of the anisotropic conductive adhesive 5 and the stress relaxation property during curing, the adhesive component 52 is a polyvinyl butyral resin, a polyvinyl formal resin, a polyester resin, a polyamide resin, a polyimide resin, a xylene resin, Polymer components such as phenoxy resin, polyurethane resin, urea resin, and acrylic rubber can be included. These polymer components preferably have a molecular weight of 10,000 to 10,000,000, and preferably have a functional group such as a carboxyl group, a hydroxyl group, and an epoxy group from the viewpoint of improving adhesiveness.

[回路部材の構成]
図2は、回路部材2の一実施形態を示す平面図である。また、図3は、図2のI−I線断面図であり、図4は、回路部材2が備える電極4を示す平面図である。図2に示すように、この回路部材2では、基板3の一面側に複数の電極4が一定間隔で配列されている。各電極4には、圧着の際に異方導電性接着剤5が流入する孔部41が形成されている。
[Configuration of circuit members]
FIG. 2 is a plan view showing an embodiment of the circuit member 2. 3 is a cross-sectional view taken along the line II of FIG. 2, and FIG. 4 is a plan view showing the electrode 4 provided in the circuit member 2. As shown in FIG. As shown in FIG. 2, in this circuit member 2, a plurality of electrodes 4 are arranged at a constant interval on one surface side of the substrate 3. Each electrode 4 is formed with a hole 41 through which the anisotropic conductive adhesive 5 flows during crimping.

孔部41は、図3に示すように、電極4及び基板3を貫通する深さで形成されている。また、孔部41は、図4に示すように、半径がL1の円と半径がL2の円とが互いに一部で重なり合った平面形状を有している。L1及びL2は導電粒子51の直径Lよりも小さく、孔部41の長手方向の一端から他端まで長さL3は導電粒子51の直径Lよりも大きい。なお、L1とL2は同じでもよく、異なっていてもよい。   As shown in FIG. 3, the hole 41 is formed with a depth that penetrates the electrode 4 and the substrate 3. As shown in FIG. 4, the hole 41 has a planar shape in which a circle with a radius L1 and a circle with a radius L2 partially overlap each other. L1 and L2 are smaller than the diameter L of the conductive particles 51, and the length L3 from one end to the other end of the hole 41 in the longitudinal direction is larger than the diameter L of the conductive particles 51. Note that L1 and L2 may be the same or different.

このような孔部41では、回路部材2を回路部材12に圧着する際、孔部41の略中央に位置する先鋭状の内向きの2つの壁部が、導電粒子51を孔部41の入口で堰き止める粒子堰止部41aとして作用する。また、導電粒子51が粒子堰止部41aによって堰き止められた場合でも、孔部41のうち、粒子堰止部41aによって堰き止められた導電粒子51からはみ出る部分が接着剤流入部41bとして作用する(詳細は後述する)。   In such a hole 41, when the circuit member 2 is pressure-bonded to the circuit member 12, the two sharp inward wall portions positioned substantially at the center of the hole 41 cause the conductive particles 51 to enter the hole 41. Acts as a particle blocking portion 41a. Even when the conductive particles 51 are blocked by the particle blocking portion 41a, the portion of the hole 41 that protrudes from the conductive particles 51 blocked by the particle blocking portion 41a acts as the adhesive inflow portion 41b. (Details will be described later).

孔部41の個数は、特に限定されないが、回路部材2に形成された孔部41の総体積が異方導電性接着剤5の体積に対して、50〜150%であることが好ましい。孔部41の総体積が50%より小さいと、孔部41が異方導電性接着剤5ですぐに埋まってしまい、孔部41に流入していない異方導電性接着剤5が電極4から離れるように流動するため導電粒子51が電極4に密集せずに分散しやすくなる。また、孔部41の総体積が150%より大きいと、孔部41が異方導電性接着剤5で十分に埋まらず、孔部41から湿気が入り込んで接続信頼性を低下させやすくなる。   The number of the holes 41 is not particularly limited, but the total volume of the holes 41 formed in the circuit member 2 is preferably 50 to 150% with respect to the volume of the anisotropic conductive adhesive 5. If the total volume of the holes 41 is smaller than 50%, the holes 41 are immediately filled with the anisotropic conductive adhesive 5, and the anisotropic conductive adhesive 5 not flowing into the holes 41 is removed from the electrode 4. Since the particles flow away from each other, the conductive particles 51 can be easily dispersed without being concentrated in the electrode 4. If the total volume of the holes 41 is larger than 150%, the holes 41 are not sufficiently filled with the anisotropic conductive adhesive 5, and moisture enters from the holes 41 and the connection reliability is likely to be lowered.

[接続構造体の製造方法]
図5は、本発明の一実施形態に係る接続構造体の製造方法を示す断面図である。図5(a)に示すように、まず、回路部材2及び回路部材12を準備する。電極4には予め孔部41を形成する。電極4に孔部41を形成する方法としては、メカニカルドリリング、パンチング、化学エッチング、サンドブラスト法、電子ビーム加工、放電加工、レーザー穴あけ等の公知の方法を用いることができる。
[Method of manufacturing connection structure]
FIG. 5 is a cross-sectional view showing a method for manufacturing a connection structure according to an embodiment of the present invention. As shown in FIG. 5A, first, the circuit member 2 and the circuit member 12 are prepared. A hole 41 is formed in the electrode 4 in advance. As a method for forming the hole 41 in the electrode 4, known methods such as mechanical drilling, punching, chemical etching, sand blasting, electron beam machining, electric discharge machining, and laser drilling can be used.

次に、図5(b)に示すように、電極4と電極14とが対向するように、導電粒子51及び接着剤成分52を含む異方導電性接着剤5を介して回路部材2及び回路部材12を配置し、図5(c)に示すように、回路部材2及び回路部材12に対して、それぞれ矢印A及び矢印Bの方向に圧力をかけて圧着する。この圧着の際、矢印Cで示すように、異方導電性接着剤5が電極4に形成された孔部41に流入する。そのため、接着剤成分52が電極4に向かって流れ、それに伴って、矢印Dで示すように、導電粒子51が電極4付近に密集する。その後、加熱又は光照射によって接着剤成分52を硬化させることで、図1に示す接続構造体1が得られる。   Next, as shown in FIG. 5B, the circuit member 2 and the circuit are connected via the anisotropic conductive adhesive 5 including the conductive particles 51 and the adhesive component 52 so that the electrode 4 and the electrode 14 face each other. The member 12 is arrange | positioned, and as shown in FIG.5 (c), it press-fits to the circuit member 2 and the circuit member 12 by applying a pressure to the direction of the arrow A and the arrow B, respectively. At the time of this crimping, as shown by an arrow C, the anisotropic conductive adhesive 5 flows into the hole 41 formed in the electrode 4. Therefore, the adhesive component 52 flows toward the electrode 4, and accordingly, as indicated by an arrow D, the conductive particles 51 are concentrated near the electrode 4. Then, the connection structure 1 shown in FIG. 1 is obtained by hardening the adhesive agent component 52 by heating or light irradiation.

[孔部の作用効果]
図6は、孔部の作用を示す概念図である。回路部材2と回路部材12とを圧着すると、異方導電性接着剤5が孔部41へ流入しようとする。この際、孔部41の略中央に位置する先鋭状の内向きの2つの壁部が、導電粒子51を堰き止める粒子堰止部41aとして作用する。そのため、導電粒子51は粒子堰止部41aによって引っかかり、孔部41の入口で堰き止められる。
[Function and effect of hole]
FIG. 6 is a conceptual diagram showing the operation of the hole. When the circuit member 2 and the circuit member 12 are pressure-bonded, the anisotropic conductive adhesive 5 tends to flow into the hole 41. At this time, the two sharp inward wall portions located substantially in the center of the hole portion 41 act as a particle blocking portion 41 a for blocking the conductive particles 51. Therefore, the conductive particles 51 are caught by the particle damming portion 41 a and dammed at the inlet of the hole 41.

一方、導電粒子51が粒子堰止部41aによって堰き止められた場合でも、孔部41の両端部分は開放された状態を維持し、接着剤成分52の流入を許容する接着剤流入部41bとして作用する。そのため、接着剤成分52は、矢印Cで示すように接着剤流入部41bから孔部41内に流入可能となっている。   On the other hand, even when the conductive particles 51 are blocked by the particle blocking portion 41a, both end portions of the hole portion 41 are maintained open, and act as an adhesive inflow portion 41b that allows the adhesive component 52 to flow in. To do. Therefore, as shown by the arrow C, the adhesive component 52 can flow into the hole 41 from the adhesive inflow portion 41b.

以上により、圧着の際、接着剤成分52は接着剤流入部41bから持続的に孔部41内に流入する一方で、導電粒子51は矢印Dで示すように電極4に向かって流れつつ、粒子堰止部41aによって堰き止められることで電極4付近に密集する。したがって、異方導電性接着剤5中の導電粒子51の量が少ない場合でも電極4と電極14とが導電粒子51を確実に噛合することができ、回路部材2と回路部材12との接続信頼性が確保される。   As described above, during the pressure bonding, the adhesive component 52 continuously flows into the hole 41 from the adhesive inflow portion 41b, while the conductive particles 51 flow toward the electrode 4 as indicated by the arrow D, By being dammed by the damming portion 41a, it is concentrated near the electrode 4. Therefore, even when the amount of the conductive particles 51 in the anisotropic conductive adhesive 5 is small, the electrode 4 and the electrode 14 can reliably mesh the conductive particles 51, and the connection reliability between the circuit member 2 and the circuit member 12 can be ensured. Sex is secured.

なお、複数の導電粒子51が孔部41を覆うように電極4付近に密集した場合であっても、導電粒子51は略球状であるため、導電粒子51が孔部41を完全に塞ぐことはなく、接着剤成分52が接着剤流入部41bから孔部41内に流入することは妨げられない。   Even when the plurality of conductive particles 51 are densely arranged in the vicinity of the electrode 4 so as to cover the hole 41, the conductive particles 51 are substantially spherical, so that the conductive particles 51 may completely block the hole 41. In addition, the adhesive component 52 is not prevented from flowing into the hole 41 from the adhesive inflow portion 41b.

[変形例]
上述した実施形態では、孔部41は電極4及び基板3を貫通する深さで形成されていたが、孔部41の深さは、圧着の際に用いる異方導電性接着剤5の量、異方導電性接着剤5中の導電粒子51と接着剤成分52との配合割合等に応じて適宜変形が可能である。例えば、図7(a)に示すように、孔部41は電極4を貫通しない深さで形成されていてもよく、図7(b)に示すように、孔部41は電極4のみを貫通する深さで形成されていてもよく、図7(c)に示すように、孔部41は電極4を貫通し、基板3の内部に到達する深さで形成されていてもよい。孔部41が深い場合には異方導電性接着剤5の流入量を十分確保でき、浅い場合には基板3又は電極4の強度をより確保することができる。
[Modification]
In the embodiment described above, the hole 41 is formed with a depth that penetrates the electrode 4 and the substrate 3, but the depth of the hole 41 is the amount of the anisotropic conductive adhesive 5 used during pressure bonding, It can be appropriately modified according to the blending ratio of the conductive particles 51 and the adhesive component 52 in the anisotropic conductive adhesive 5. For example, as shown in FIG. 7A, the hole 41 may be formed at a depth that does not penetrate the electrode 4, and the hole 41 penetrates only the electrode 4 as shown in FIG. 7B. The hole 41 may be formed with a depth that penetrates the electrode 4 and reaches the inside of the substrate 3 as shown in FIG. When the hole 41 is deep, the inflow amount of the anisotropic conductive adhesive 5 can be sufficiently secured, and when it is shallow, the strength of the substrate 3 or the electrode 4 can be further secured.

また、上述した実施形態では、電極4には、図4に示すような平面形状を有する孔部41が形成されていたが、図8(a)〜(e)に示すような平面形状を有する孔部41が形成されていてもよい。   In the above-described embodiment, the hole 4 having a planar shape as shown in FIG. 4 is formed in the electrode 4. However, the electrode 4 has a planar shape as shown in FIGS. A hole 41 may be formed.

図8(a)では、孔部41は長方形状を有している。孔部41の短辺の長さL4が導電粒子51の直径Lよりも小さいことにより、孔部41の長辺の壁部が粒子堰止部41aとして作用する。また、孔部41の長辺の長さL5が導電粒子51の直径Lよりも大きいことにより、孔部41のうち、粒子堰止部41aによって堰き止められた導電粒子51からはみ出る部分が接着剤流入部41bとして作用する。   In FIG. 8A, the hole 41 has a rectangular shape. When the length L4 of the short side of the hole 41 is smaller than the diameter L of the conductive particle 51, the wall of the long side of the hole 41 acts as the particle blocking part 41a. Further, since the length L5 of the long side of the hole 41 is larger than the diameter L of the conductive particle 51, the portion of the hole 41 that protrudes from the conductive particle 51 blocked by the particle blocking portion 41a is adhesive. It acts as an inflow portion 41b.

図8(b)では、孔部41は、半径がそれぞれL6、L7及びL8の3つの円が、当該3つの円の中心が三角形の頂点をなすように、互いに一部で重なり合っている平面形状を有している。なお、L6、L7及びL8は、互いに同じでもよく、異なっていてもよい。   In FIG. 8B, the hole 41 has a planar shape in which three circles each having a radius of L6, L7, and L8 partially overlap each other so that the centers of the three circles form a vertex of a triangle. have. Note that L6, L7, and L8 may be the same as or different from each other.

この孔部41においては、L6、L7及びL8が導電粒子51の直径Lよりも小さいことにより、孔部41の略中央に位置する先鋭状の壁部が粒子堰止部41aとして作用する。また、孔部41の一端から他端まで長さL9が導電粒子51の直径Lよりも大きいことにより、孔部41のうち、粒子堰止部41aによって堰き止められた導電粒子51からはみ出る部分が接着剤流入部41bとして作用する。   In the hole 41, L6, L7, and L8 are smaller than the diameter L of the conductive particles 51, so that a sharp wall located at the approximate center of the hole 41 acts as the particle blocking part 41a. Further, since the length L9 from one end to the other end of the hole 41 is larger than the diameter L of the conductive particle 51, a portion of the hole 41 protruding from the conductive particle 51 blocked by the particle blocking portion 41a is formed. It acts as an adhesive inflow portion 41b.

図8(c)では、孔部41は、半径がそれぞれL10、L11、L12及びL13の4つの円が、それぞれ他の円のうち少なくとも2つの円と一部で重なり合っている又は接している平面形状を有している。なお、L10、L11、L12及びL13は、互いに同じでもよく、異なっていてもよい。   In FIG. 8C, the hole 41 has a plane in which four circles each having a radius of L10, L11, L12, and L13 partially overlap or touch at least two of the other circles. It has a shape. L10, L11, L12, and L13 may be the same as or different from each other.

この孔部41においては、L10、L11、L12及びL13が導電粒子51の直径Lよりも小さいことにより、孔部41の略中央に位置する先鋭状の壁部が粒子堰止部41aとして作用する。また、孔部41の一端から他端までの長さL14が導電粒子51の直径Lよりも大きいことにより、孔部41のうち、粒子堰止部41aによって堰き止められた導電粒子51からはみ出る部分が接着剤流入部41bとして作用する。   In the hole 41, L10, L11, L12, and L13 are smaller than the diameter L of the conductive particles 51, so that the sharp wall located at the approximate center of the hole 41 acts as the particle blocking part 41a. . Further, when the length L14 from one end to the other end of the hole 41 is larger than the diameter L of the conductive particle 51, the portion of the hole 41 that protrudes from the conductive particle 51 blocked by the particle blocking portion 41a. Acts as the adhesive inflow portion 41b.

図8(d)では、孔部41は、一定間隔で互いに平行に配置された複数の長方形と、該長方形と直交するように一定間隔で互いに平行に配置された複数の長方形とからなるメッシュ状の平面形状を有している。上記長方形の短辺の長さL15が導電粒子51の直径Lよりも小さいことにより、孔部41の略中央に位置する電極部分が粒子堰止部41aとして作用する。また、上記長方形の長辺の長さL16が導電粒子51の直径Lよりも大きいことにより、孔部41のうち、粒子堰止部41aによって堰き止められた導電粒子51からはみ出る部分が接着剤流入部41bとして作用する。   In FIG. 8 (d), the hole 41 has a mesh shape composed of a plurality of rectangles arranged in parallel to each other at regular intervals and a plurality of rectangles arranged in parallel to each other at regular intervals so as to be orthogonal to the rectangles. It has the planar shape. Since the length L15 of the rectangular short side is smaller than the diameter L of the conductive particles 51, the electrode portion located at the approximate center of the hole 41 acts as the particle blocking portion 41a. Further, since the long side length L16 of the rectangle is larger than the diameter L of the conductive particles 51, the portion of the hole 41 that protrudes from the conductive particles 51 blocked by the particle blocking portions 41a flows into the adhesive. Acts as part 41b.

図8(e)では、孔部41は、複数の円が一定間隔で二次元に配置された平面形状を有している。円状の各孔の直径L17が導電粒子51の直径Lよりも小さいことにより、各孔間に位置する電極部分が粒子堰止部41aとして作用する。また、孔部41の一端から他端までの長さL18が導電粒子51の直径Lよりも大きいことにより、孔部41のうち、粒子堰止部41aによって堰き止められた導電粒子51からはみ出る部分が接着剤流入部41bとして作用する。   In FIG. 8E, the hole 41 has a planar shape in which a plurality of circles are two-dimensionally arranged at regular intervals. Since the diameter L17 of each circular hole is smaller than the diameter L of the conductive particles 51, the electrode portion located between the holes acts as the particle blocking portion 41a. Further, when the length L18 from one end to the other end of the hole 41 is larger than the diameter L of the conductive particle 51, the portion of the hole 41 that protrudes from the conductive particle 51 blocked by the particle blocking portion 41a. Acts as the adhesive inflow portion 41b.

また、上述した実施形態では、図4、8等に示すように、電極4は略正方形状を有していたが、図9(a)に示すように、電極4は、長辺が短辺よりも著しく長い長方形状を有していてもよい。この場合、孔部41は、電極4の長辺方向に貫通する長さの長方形状を有している。   In the above-described embodiment, the electrode 4 has a substantially square shape as shown in FIGS. 4 and 8 and the like. However, as shown in FIG. It may have a rectangular shape that is significantly longer than. In this case, the hole 41 has a rectangular shape with a length penetrating in the long side direction of the electrode 4.

そして、図9(a)のII−II線図である図9(b)に示すように、孔部41は、電極4を貫通しない深さで形成されている。この孔部41においては、孔部41の短辺の長さL19が導電粒子51の直径Lよりも小さいことにより、孔部41の長辺における壁部の一部が粒子堰止部41aとして作用する。また、孔部の長辺の長さL20が導電粒子51の直径Lよりも大きいことにより、孔部41のうち、粒子堰止部41aによって堰き止められた導電粒子51からはみ出る部分が接着剤流入部41bとして作用する。   9B, which is a II-II diagram of FIG. 9A, the hole 41 is formed with a depth that does not penetrate the electrode 4. In the hole portion 41, the length L19 of the short side of the hole portion 41 is smaller than the diameter L of the conductive particles 51, so that a part of the wall portion on the long side of the hole portion 41 acts as the particle blocking portion 41a. To do. In addition, since the length L20 of the long side of the hole is larger than the diameter L of the conductive particle 51, the portion of the hole 41 that protrudes from the conductive particle 51 blocked by the particle blocking part 41a flows into the adhesive. Acts as part 41b.

また、上述した実施形態では、回路部材2が備える電極4に孔部41が形成されていたが、さらに、回路部材12が備える電極14に孔部41と同様の孔部が形成されていてもよい。あるいは、電極4には孔部が形成されずに、電極14のみに孔部41と同様の孔部が形成されていてもよい。   In the embodiment described above, the hole 41 is formed in the electrode 4 included in the circuit member 2, but the hole 14 similar to the hole 41 is formed in the electrode 14 included in the circuit member 12. Good. Alternatively, a hole similar to the hole 41 may be formed only in the electrode 14 without forming a hole in the electrode 4.

1…接続構造体、2…回路部材、3…基板、4…電極、5…異方導電性接着剤、41…孔部、41a…粒子堰止部、41b…接着剤流入部、51…導電粒子、52…接着剤成分。   DESCRIPTION OF SYMBOLS 1 ... Connection structure, 2 ... Circuit member, 3 ... Board | substrate, 4 ... Electrode, 5 ... Anisotropic conductive adhesive, 41 ... Hole part, 41a ... Particle damming part, 41b ... Adhesive inflow part, 51 ... Conductivity Particle, 52 ... adhesive component.

Claims (6)

基板と、前記基板の一面側に形成された電極とを備え、導電粒子及び接着剤成分を含む異方導電性接着剤を介して別の基板に圧着される回路部材であって、
前記電極には、圧着の際に前記異方導電性接着剤が流入する孔部が形成されており、
前記孔部は、前記異方導電性接着剤が流入する際に前記導電粒子を堰き止める粒子堰止部と、前記堰止部によって前記導電粒子が堰き止められた場合でも、前記接着剤成分の流入を許容する接着剤流入部とを有することを特徴とする、回路部材。
A circuit member comprising a substrate and an electrode formed on one surface side of the substrate, and bonded to another substrate via an anisotropic conductive adhesive containing conductive particles and an adhesive component,
The electrode is formed with a hole into which the anisotropic conductive adhesive flows during crimping ,
The hole portion includes a particle damming portion that dams the conductive particles when the anisotropic conductive adhesive flows in, and even when the conductive particles are dammed by the damming portion. A circuit member comprising an adhesive inflow portion that allows inflow .
前記孔部は、前記電極を貫通する深さで形成されていることを特徴とする、請求項1記載の回路部材。 The hole is characterized by being formed with a depth extending through the electrode, according to claim 1 Symbol mounting circuit member. 前記孔部は、前記基板の内部に到達する深さで形成されていることを特徴とする、請求項1又は2記載の回路部材。 The hole is characterized by being formed to a depth reaching the interior of the substrate, according to claim 1 or 2 circuit member according. 前記孔部は、前記基板を貫通する深さで形成されていることを特徴とする、請求項1〜のいずれか一項記載の回路部材。 The hole is characterized in that it is formed at a depth which penetrates the substrate, the circuit member according to any one of claims 1-3. 基板と、前記基板の一面側に形成された電極とを備える回路部材同士を、導電粒子及び接着剤成分を含む異方導電性接着剤を介して圧着してなる接続構造体であって、
前記回路部材の少なくとも一方の前記電極には、圧着の際に前記異方導電性接着剤が流入した孔部が形成されており、
前記孔部には、前記異方導電性接着剤が流入する際に前記導電粒子が堰き止められた粒子堰止部と、前記堰止部によって前記導電粒子が堰き止められた場合でも、前記接着剤成分の流入を許容した接着剤流入部とが形成されていることを特徴とする、接続構造体。
A connection structure formed by pressure-bonding circuit members each including a substrate and an electrode formed on one side of the substrate via an anisotropic conductive adhesive containing conductive particles and an adhesive component,
At least one of the electrodes of the circuit member is formed with a hole into which the anisotropic conductive adhesive has flowed during crimping ,
The hole has a particle damming portion in which the conductive particles are dammed when the anisotropic conductive adhesive flows, and the bonding even when the conductive particles are dammed by the damming portion. An adhesive inflow portion that allows inflow of the agent component is formed .
基板と、前記基板の一面側に形成された電極とを備える回路部材同士を、導電粒子及び接着剤成分を含む異方導電性接着剤を介して圧着してなる接続構造体の製造方法であって、
前記回路部材の少なくとも一方の前記電極に粒子堰止部と接着剤流入部とを有する孔部を形成し、圧着の際に前記孔部に前記異方導電性接着剤を流入させ、前記異方導電性接着剤が流入する際に前記堰止部によって前記導電粒子を堰き止め、前記堰止部によって前記導電粒子が堰き止められた場合でも、前記流入部によって前記接着剤成分を流入させることを特徴とする、接続構造体の製造方法。
A method for producing a connection structure comprising a substrate and a circuit member comprising an electrode formed on one side of the substrate, and bonded by an anisotropic conductive adhesive containing conductive particles and an adhesive component. And
Wherein forming a hole having a particle blocking portion on at least one of the electrodes and the adhesive inflow portion of the circuit member, the allowed to flow into anisotropic conductive adhesive into the hole portion when the crimping, the anisotropic When the conductive adhesive flows, the conductive particles are dammed by the damming portion, and even when the conductive particles are dammed by the damming portion, the adhesive component is caused to flow by the inflow portion. A method for manufacturing a connection structure, which is characterized.
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JP2001243998A (en) * 2000-02-29 2001-09-07 Optrex Corp Electrode connection structure

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US11528805B2 (en) 2020-03-02 2022-12-13 Samsung Display Co., Ltd. Display device and method of manufacturing the same

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