JP6081227B2 - Authentication object, authentication apparatus, authentication method and authentication object manufacturing method - Google Patents

Description

  The present invention relates to an authentication object such as a credit card, and an authentication device, an authentication method, and a manufacturing method of an authentication object for determining the authentication.

  Conventionally, forgery of credit cards, cash cards, identification cards, health insurance cards, driver's licenses, passports, prepaid cards, securities, etc. has been a problem. The circulation of these counterfeit goods has had a major impact on society as a whole, including commercial transactions, welfare, public transportation, and medical care, and the safety of various activities has been threatened.

  Therefore, various measures have been taken to prevent counterfeiting of credit cards and the like. As an example, a storage medium such as a magnetic stripe or an IC chip in which information necessary for authentication is stored in a credit card is incorporated, and the information in the storage medium is read by a POS system provided in the store. There is one provided with an authenticity determination device for performing the above.

  When a credit card is used in this POS system, authentication is performed by an authenticity determination device, and if the credit card is determined to be counterfeit, the POS system uses the credit card for payment. It is supposed not to be broken.

  However, recent counterfeiting techniques have become increasingly sophisticated, and conventional counterfeiting prevention methods cannot cope with them. For example, even when using the anti-counterfeiting method using the magnetic stripe or IC chip described above, information required for authentication is read using a device called a schema, and a forged card is created based on the read information. And has been used.

  Therefore, in order to prevent forgery, a chip in which a chip for authenticating that is extremely difficult to forge is incorporated into a card such as a credit card has been proposed (see Patent Document 1). This authentication chip is configured by mixing radioactive substance particles in resin.

  The arrangement pattern of the mixed radioactive substance particles is unique to the authentication chip, that is, each card, and it is very difficult to forge the arrangement pattern. When used, the image of the authentication chip is read and compared with the image of the authentication chip stored in the storage device in advance. If the images match, the card is determined to be authentic. .

International Publication Number WO2007 / 072793

  By the way, in the anti-counterfeiting method described above, there is a tendency for the chip for authentication to be large, and it is very difficult to reduce the weight and size, particularly to a nano-order fine structure. In addition, it is necessary to secure a space for incorporating a large authentication chip while securing various functions inherent to the card, resulting in restrictions on the design layout of the card.

  In addition, the manufacture of the above-described conventional authentication chip requires a completely different type of process that is not used in the manufacture of a conventional card, thus complicating the card manufacturing process and manufacturing the card. The cost was increased.

  Therefore, the present invention has been devised in view of the above-described problems, and is an authentication object provided with an authentication structure for authenticating authentication, and the authentication structure has a fine size of nano order. Therefore, the authentication structure is formed in the other information recording part of the authentication object through the same process as that used in the conventional manufacturing process of the authentication object. An object is to provide an authentication object that can be authenticated.

  Another object of the present invention is to provide an authenticity determination device, an authenticity determination method, and a method for manufacturing an authenticity authentication object, which determine the authenticity of the authentication object.

  In order to solve the above-mentioned problems, the present inventor cannot forge and is not subject to layout restrictions by making the authentication structure a nano-order fine size. In this information recording part, the authentication object which can form an authentication structure through the process similar to the process used in the conventional manufacturing process of the authentication object was invented.

  Further, the inventor has invented an authenticity determination device, an authenticity determination method, and a method of manufacturing an authenticity authentication object for determining the authenticity of the authentication object.

  An authentication object according to claim 1 includes an authentication structure for authentication, and an information recording unit in which predetermined information different from the authentication structure is recorded. A resist structure formed by collapsing a resist pattern formed by a plurality of pillars in a columnar shape, which is nano-order, and having a minimum pattern interval of less than 10 nanometers, and the authentication structure is It is incorporated in the information recording part through a process included in the manufacturing process of the information recording part.

  An authentication object according to claim 2 includes an authentication structure for authenticating authentication and an information recording unit in which predetermined information different from the authentication structure is recorded, and the authentication structure is attached to a base. Formed by etching the substrate using a resist structure with a minimum pattern interval of less than 10 nanometers formed by collapsing a resist pattern formed by a plurality of pillars in the order of nanometers as a mask. The concavo-convex structure having a minimum pattern interval of less than 10 nanometers, wherein the authentication structure is incorporated in the information recording unit through a process included in the manufacturing process of the information recording unit. To do.

  An authentication object according to claim 3 includes an authentication structure for authenticating authentication, and an information recording unit in which predetermined information different from the authentication structure is recorded. Formed by etching the substrate using a resist structure with a minimum pattern interval of less than 10 nanometers formed by collapsing a resist pattern formed by a plurality of pillars in the order of nanometers as a mask. After forming the concavo-convex structure to be formed, the substrate is used as a mold, and is formed on another base, and the minimum pattern interval is less than 10 nanometers. The authentication structure includes the information recording It is incorporated in the information recording part through a process included in the manufacturing process of the part.

  The authentication object according to claim 4 is characterized in that the information recording unit is a hologram.

  The authentication object according to claim 5 is characterized in that the information recording material is an IC chip.

  An authentication device according to claim 6 is an authentication device for determining the authenticity of an authentication object provided with an authentication structure having a structure portion having a minimum pattern interval of less than 10 nanometers, wherein the authentication structure An acquisition unit that acquires image information including the structural part whose minimum pattern interval is less than 10 nanometers as authentication information, and the structural part whose minimum pattern interval is less than 10 nanometers as comparison information used for authenticity determination of the authentication information A storage unit that stores stored image information, a reading unit that reads the comparison information from the storage unit, a comparison unit that compares the authentication information and the comparison information by block matching, the authentication information and the comparison information And a determination unit that performs authenticity determination based on the comparison result.

  The authenticity determination apparatus according to claim 7 is characterized in that the comparison unit performs block matching using NCC.

  The authenticity determination apparatus according to an eighth aspect is characterized in that the comparison unit performs block matching using SAD.

  The authenticity determination apparatus according to claim 9 is characterized in that the comparison unit performs block matching using SSD.

  In the authenticity determination device according to claim 10, the acquisition unit is a scanning electron microscope, acquires an electron microscope image of the authentication structure as the authentication information, and the storage unit acquires an electron microscope image as the comparison information. Is stored.

  In the authenticity determination device according to claim 11, the acquisition unit is a scanning probe microscope, acquires a surface image of the authentication structure as the authentication information, and the storage unit stores a surface image as the comparison information. It is characterized by that.

  The authenticity determination device according to claim 12, wherein the acquisition unit is a near-field optical microscope, acquires a near-field microscope image of the authentication structure as the authentication information, and the storage unit includes a near-field as the comparison information. A microscope image is stored.

  In the authenticity determination device according to claim 13, the acquisition unit is an optical microscope, acquires an optical microscope image of the authentication structure as the authentication information, and the storage unit stores an optical microscope image as the comparison information. It is characterized by.

  The authenticity determination method according to claim 14 is an authenticity determination method for determining the authenticity of an authentication object provided with an authentication structure having a structure portion having a minimum pattern interval of less than 10 nanometers, wherein the authentication structure The acquisition step of acquiring image information including an enlarged image of the structural part whose minimum pattern interval is less than 10 nanometers as authentication information, and the structural part whose minimum pattern interval is less than 10 nanometers as comparison information used for authenticity determination A reading step of reading out stored image information including an enlarged image from the storage device, a comparison step of comparing the authentication information and the comparison information by block matching based on a luminance value, and authenticity determination based on a comparison result in the comparison step And a determination step for performing.

  The authenticity determination method according to claim 15 is characterized in that block matching is performed using NCC in the comparison step.

  The authenticity determination method according to claim 16 is characterized in that in the comparison step, block matching is performed using SAD.

  The authenticity determination method according to claim 17 is characterized in that block matching is performed using SSD in the comparison step.

  In the authenticity determination method according to claim 18, the acquisition step acquires an electron microscope image of the authentication structure as the authentication information, and the reading step reads an electron microscope image from the storage device as the comparison information. It is characterized by that.

  In the authentication method according to claim 19, in the obtaining step, a surface image of the authentication structure is obtained as the authentication information, and in the reading step, a surface image is read from the storage device as the comparison information. Features.

  In the authenticity determination method according to claim 20, in the obtaining step, a near-field microscope image of the authentication structure is obtained as the authentication information, and in the reading step, a near-field microscope image is obtained from the storage device as the comparison information. It is characterized by reading.

  In the authentication method according to claim 21, in the obtaining step, an optical microscope image of the authentication structure is obtained as the authentication information, and in the reading step, an optical microscope image is read from the storage device as the comparison information. It is characterized by that.

  A method for producing an authentication object according to claim 22 is included in an information recording part forming step for forming an information recording part in which predetermined information is recorded on a base, and the information recording part forming step on the base. A resist pattern forming step for forming a resist pattern formed by a plurality of pillars in a columnar shape, which is nano-order, and a resist structure in which the resist pattern is collapsed and the minimum pattern interval is less than 10 nanometers And a resist collapsing step for forming the structure.

  The method for manufacturing an authentication object according to claim 23, wherein the substrate is etched using the resist structure formed in the resist collapse step as a mask to form a concavo-convex structure with a minimum pattern interval of less than 10 nanometers. The method further comprises the step of forming the concavo-convex structure.

  25. The method for producing an authentication object according to claim 24, wherein the substrate having the concavo-convex structure formed in the concavo-convex structure forming step is used as a mold, and a molding concavo-convex having a minimum pattern interval of less than 10 nanometers on another substrate. The method further comprises a forming uneven structure forming step for forming the structure.

According to the authentication object and the authentication object manufacturing method according to the present invention having the above-described configuration, the authentication structure has a fine size in the nano order with a minimum pattern interval of less than 10 nanometers. It is possible to provide an authentication structure that cannot be counterfeited without affecting these functions even in other information recording parts such as holograms and IC chips of authentic authentication objects. it can.

  In addition, since the authentication structure can be formed through a manufacturing process included in the manufacturing process used in the conventional manufacturing process of the authentication object such as photolithography, the authentication structure and thus the entire authentication object The manufacturing process can be simplified and the manufacturing cost can be reduced.

  Further, according to the authenticity determination device according to the present invention having the above-described configuration and the authenticity determination method performed thereby, the authentication structure for authenticity authentication provided in the authentication object is the resolution limit of the resist drawing device and Even when the minimum pattern interval is less than 10 nanometers below the resolution limit of various lithography, the authentication structure can be read and an extremely accurate authentication can be performed.

The credit card as an example of the authentication target according to the first embodiment of the present invention is shown, (A) is a plan view, and (B) is a rear view. It is an enlarged plan view of the hologram part of the credit card of FIG. FIG. 3 shows a resist structure as an authentication structure provided in a predetermined region in the hologram of FIG. 2, (A) is an enlarged plan view, and (B) is an enlarged plan view further enlarging (A). FIG. 4 is a process diagram showing an example of a method for producing the resist structure of FIG. 3, in (A), a resist is applied on a substrate to form a resist layer, and in (B), a desired portion of the resist layer is irradiated with chemical rays. Thus, a latent image of the resist pattern is formed. In (C), the resist layer is developed to form a resist pattern. In (D), a resist structure is formed by resist collapse. It is process drawing which shows the method of forming the uneven | corrugated structure as an authentication structure in the authentication target object based on 2nd Embodiment of this invention, (A) forms a resist structure, (B) forms a resist structure. The substrate is etched using the body as a mask to form an uneven structure. It is process drawing which shows the method of forming the shaping | molding uneven | corrugated structure as an authentication structure in the authentication target object based on 3rd Embodiment of this invention, (A) forms an uneven | corrugated structure, (B) shows an uneven | corrugated structure. In (C), the resin layer is cured to create a molded concavo-convex structure, and in (D), the substrate is etched using the molded concavo-convex structure as a mask. It is a block diagram which shows the hardware constitutions of an authenticity determination apparatus. It is a functional block diagram which shows the functional structure of an authenticity determination apparatus. It is a flowchart which shows the authenticity determination method performed by an authenticity determination apparatus.

  Hereinafter, a credit card will be described in detail as an example of the authentication object according to the present invention.

<First Embodiment>
1A and 1B show a credit card 1 as an example of an authentication object according to the first embodiment of the present invention, in which FIG. 1A is a plan view and FIG. 1B is a rear view.

  The credit card 1 is formed by providing a plurality of structures each having a predetermined function on the front and back surfaces of a flat substrate made of an appropriate material such as resin. As shown in FIG. 1A, an IC chip 2 for storing various information such as security information and a hologram 3 for visually verifying authentication are formed on the surface of the credit card 1. As shown in FIG. 1B, a magnetic stripe 4 on which various types of information are recorded is provided on the back surface of the credit card 1.

  FIG. 2 is an enlarged plan view of a hologram portion of the credit card of FIG. 3 shows a resist structure as an authentication structure provided in the region 10 in the hologram of FIG. 2, wherein (A) is an enlarged plan view and (B) is an enlarged plan view further enlarging (A). is there.

  In the authentication object according to the present embodiment, a resist structure 5 is provided in the region 10 in the hologram 3 as an authentication structure for authenticating in nano order. That is, a hierarchical information recording medium is configured by the hologram 3 that provides visual authentication information and the resist structure 5 that provides authentication information that is nano-order and can be read by a predetermined reading device. Has been.

  The hologram 3 is created by forming so-called interference fringes on the surface of the base of the credit card 1 using photolithography or the like.

  The resist structure 5 is formed by collapsing a resist pattern formed by a plurality of pillars in the order of nanometers, which is formed using a resist such as a photoresist used when forming the hologram 3. ing.

  The pattern interval in the resist structure 5 is 10 nanometers or less, preferably 5 nanometers or less in a small portion. The resolution limit of the resist drawing apparatus used in the hologram 3 manufacturing process and the resolution of various lithography The pattern interval is less than the limit. That is, the resist structure 5 has an extremely fine pattern interval that cannot be formed by a resist drawing apparatus.

  In addition, since the structure of the resist structure 5 is very fine, the hologram 3 does not affect the optical characteristics for exhibiting the function as a hologram.

  FIG. 4 is a process diagram showing an example of a method for manufacturing the resist structure 5. First, as shown in FIG. 4A, a resist is applied on the surface 6 a of the base 6 of the credit card 1 to form a resist layer 11.

  Next, as shown in FIG. 4B, a desired portion of the resist layer 11 is irradiated with actinic radiation to form a latent image 11 'of the resist pattern. As the actinic radiation to be used, for example, an electron beam, an X-ray, an ultraviolet ray or the like can be used according to the sensitivity of the resist layer 11.

  Next, as shown in FIG. 4C, the resist layer 11 is subjected to development processing to form a resist pattern 8. The resist pattern 8 is preferably composed of a plurality of pillar-shaped and prismatic pillar-shaped patterns, but is not limited to this, and may be composed of a line and space pattern or a combination thereof. .

  Next, as shown in FIG. 4D, a resist structure having a resist collapse portion 7 in which the pattern interval is 10 nanometers or less by applying an external force to at least a part of the resist pattern 8 to cause the resist collapse. A body 5 is formed.

  The external force applied to the resist pattern 5 is, for example, the surface tension of the processing liquid in the drying process of the rinsing process performed after the development process, the electrostatic force generated by charging by charged particle beam irradiation, the fluid pressure by fluid ejection, or the ultrasonic vibration. A vibration pressure etc. can be mentioned, At least 1 sort (s) of these can be used. According to these methods, a resist structure having pattern randomness and fineness that can easily cause resist collapse phenomena such as tilt, fall, and slip in the resist pattern 8 and is difficult to reproduce artificially. The body 5 can be formed.

  In the present embodiment, the resist structure 5 is provided in the hologram 3. However, the present invention is not limited to this, and the resist structure 5 may be provided in the IC chip 2 or the magnetic stripe 4. In particular, since the IC chip 2 can be formed using photolithography or the like in the same manner as the hologram 3, the resist structure 5 can be formed through steps included in the manufacturing process of the IC chip 2. it can.

  According to the authentication object according to the present embodiment described above, the authentication structure is made to be a nano-order fine size whose minimum pattern interval is less than 10 nanometers, so that there is no restriction on the layout, and authentication is performed. An authentication structure that cannot be counterfeited can be provided without affecting these functions even in another information recording unit such as a hologram or an IC chip of an object.

  Moreover, since it can be formed through the manufacturing process included in the manufacturing process used in the conventional manufacturing process of the authentication object such as photolithography, the authentication structure, and thus the entire manufacturing process of the authentication object Simplification and reduction in manufacturing cost can be realized.

Second Embodiment
The authentication object according to the second embodiment of the present invention will be described by taking a credit card as an example as in the first embodiment described above. Note that the credit card according to the present embodiment is different from that in the first embodiment only in the structure of the authentication structure.

  Specifically, in this embodiment, after the formation of the resist structure 5 on the base 6 of the credit card 1 as in the first embodiment, the authentication structure further uses the resist structure 5 as a mask to form the base 6. Is etched to form the concavo-convex structure 9 as an authentication structure. Hereinafter, the manufacturing method of the uneven structure 9 will be described in more detail.

  FIG. 5 is a process diagram showing a method of forming a concavo-convex structure as an authentication structure in an authentication object according to the second embodiment of the present invention.

  First, as shown in FIG. 5A, the resist structure 5 is formed on the surface 6a of the substrate 6 in the same manner as in the first embodiment described above.

  Next, as shown in FIG. 5B, the substrate 6 is etched using the resist structure 5 as a mask to form a concavo-convex structure 9. As the etching of the substrate 6, for example, dry etching such as reactive ion etching and reactive gas etching, physical etching such as ion milling, and the like can be performed. Further, by appropriately setting the etching rate of the substrate 6 and the etching rate of the resist structure 5, the uneven structure 9 having various shapes and dimensions can be formed, and the pattern interval can be set to the resolution limit of the resist drawing apparatus and It can be 10 nanometers or less, which is below the resolution limit of various lithography.

  Note that the places where the authentication structure according to the present embodiment can be formed are the same as those according to the first embodiment.

  Even with the authentication object according to this embodiment described above, the authentication structure is made to be a nano-sized fine size with a minimum pattern interval of less than 10 nanometers, so that there is no restriction on the layout, and authentication is performed. An authentication structure that cannot be counterfeited can be provided without affecting these functions even in another information recording unit such as a hologram or an IC chip of an object.

  Moreover, since it can be formed through the manufacturing process included in the manufacturing process used in the conventional manufacturing process of the authentication object such as photolithography, the authentication structure, and thus the entire manufacturing process of the authentication object Simplification and reduction in manufacturing cost can be realized.

  Further, the resist structure which is the authentication structure of the authentication object according to the first embodiment is a separate structure provided on the surface of the base, but the authentication structure according to the present embodiment is attached to the base itself. It is the formed uneven structure. Therefore, the strength of the authentication structure itself can be secured, and the authentication structure can be effectively prevented from being damaged or dropped off due to the use of the authentication object.

<Third Embodiment>
The authentication object according to the third embodiment of the present invention will be described by taking a credit card as an example as in the first and second embodiments described above. Note that the credit card according to the present embodiment is different from that in the first and second embodiments only in the structure of the authentication structure.

  Specifically, in this embodiment, the authentication structure is formed on the base body 6 of the credit card 1 in the same manner as in the second embodiment, and then the uneven structure 9 is used as a mold on another base body 9. The concavo-convex structure 36 as the authentication structure is created by forming and curing the concavo-convex structure in the resin layer formed in the above. Hereinafter, the manufacturing method of this molded uneven structure 36 will be described in more detail.

  FIG. 6 is a process diagram showing a method of forming a molded concavo-convex structure as an authentication structure in the authentication object according to the third embodiment of the present invention.

  First, as shown in FIG. 6A, the concavo-convex structure 9 is formed on the surface 6a of the base 6 in the same manner as in the second embodiment described above, and a mold 61 is obtained.

  Next, as shown in FIG. 6 (B), a paste-like resin 34 is applied onto the surface 32a of the desired base 32, and the previously formed mold 61 is brought close to the resin layer 34, so that the uneven structure 9 The resin 34 is filled inside.

  The resin 34 to be used can be formed using a photo-curing, thermosetting, or thermoplastic resin material. For example, droplets of the resin material are supplied onto the base 32 and the base 32 and the mold 61 are supplied. Can be filled with the resin in the concavo-convex structure 9 by spreading the droplets of the resin 34. Of course, resin material droplets may be supplied onto the mold 61.

  Next, as shown in FIG. 6C, in this state, the resin 34 is cured to form the resin layer 35, and then the mold 61 and the resin layer 35 are released, so that the surface 32a of the base body 32 is formed. As the authentication structure, a molded concavo-convex structure 36 that is an inverted shape of the concavo-convex structure 9 can be formed.

  The pattern interval of the formed concavo-convex structure 36 thus created is obtained by using the concavo-convex structure 9 of the second embodiment having a pattern interval of 10 nanometers or less which is less than the resolution limit of the resist drawing apparatus and the resolution limit of various lithography as a mold. Since it is prepared, it is 10 nanometers or less, which is similarly below the resolution limit of the resist drawing apparatus and the resolution limit of various lithography.

  Therefore, for example, it is extremely difficult to forge a plan view shape obtained by optically identifying the molded concavo-convex structure 36 manufactured as in the present embodiment.

  Note that the locations where the authentication structure according to the present embodiment can be formed are the same as those according to the first and second embodiments.

  Even with the authentication object according to this embodiment described above, by making the authentication structure a nano-order fine size, there is no restriction on layout, such as a hologram or IC chip of the authentication object, An authentication structure that cannot be counterfeited can be provided without affecting these functions even in other information recording units.

  Moreover, since it can be formed through the manufacturing process included in the manufacturing process used in the conventional manufacturing process of the authentication object such as photolithography, the authentication structure, and thus the entire manufacturing process of the authentication object Simplification and reduction in manufacturing cost can be realized.

  The authentication structure according to the present embodiment is a molded concavo-convex structure made of a resin layer formed on a base. Therefore, the strength of the authentication structure itself can be secured, and the authentication structure can be effectively prevented from being damaged or dropped off due to the use of the authentication object.

  After forming the concavo-convex structure 36 as described above, the base 32 is etched using the concavo-convex structure 36 as a mask to provide a concavo-convex structure 37 on the base 32 as shown in FIG. It is also possible to manufacture as the authentication structure 31 ′.

  As described above, the molded concavo-convex structure 36 has a complicated shape reflecting the concavo-convex structure 9 of the mold 61, and is a minimum less than 10 nanometers below the resolution limit of the resist drawing apparatus and the resolution limit of various lithography. Since it has a pattern interval, the uneven structure 37 formed by etching the substrate 32 is also extremely difficult to forge.

  Therefore, even when the authentication structure 31 ′ shown in FIG. 6D is used, the same effect as that of the authentication object according to the third embodiment described above can be obtained.

<Fourth embodiment>
Next, an authenticity determination device that reads the authentication object according to the first to third embodiments described above will be described below as a fourth embodiment.

  FIG. 7 is a block diagram illustrating a hardware configuration of the authenticity determination device 70. The authenticity determination device 70 includes a reading device 71 as an acquisition unit that acquires image information of an authentication structure provided on an authentication object, a display 73 as a display unit that displays various types of information such as authentication results, The storage device 74 stores various information used for authentication, and includes a control unit 72 that controls the entire authentication device 70 including these components.

  The reading device 71 can be suitably used as long as it can acquire image information of the authentication structure, such as a scanning electron microscope, a scanning probe microscope, a near-field optical microscope, and an optical microscope.

  The display 73 displays image information of the authentication structure acquired by the reading device 71, and also displays authentication results, information for various operations related to the authentication device 70 as a whole, and the like. Further, a touch panel may be used as the display 73 so that the operator can perform various operations through the touch panel.

  The storage device 74 stores various information such as image information as comparison information to be compared with the image information acquired by the reading device 71. In the following description, the image information stored in the storage device 74 is referred to as stored image information.

  When the reading device 71 is a scanning microscope, the storage device 74 stores an electron microscope image of the authentication structure as comparison information.

  When the reading device 71 is a scanning probe microscope, the storage device 74 stores a surface image of the authentication structure as comparison information.

  When the reading device 71 is a near-field optical microscope, the storage device 74 stores a near-field microscope image of the authentication structure as comparison information.

  When the reading device 71 is an optical microscope, the storage device 74 stores an optical microscope image of the authentication structure as comparison information.

  These pieces of image information are acquired from the authentication structure in advance by a predetermined reader when the authentication structure is created, that is, acquired from the authentic authentication structure, and the minimum of the authentication structure is obtained. The enlarged image of the part from which a pattern space | interval becomes 10 nanometers or less is included.

  The control unit 72 includes a CPU 721 that controls the entire control unit 72, a ROM 722 that stores a control program that operates on the CPU 721, and a RAM 723 that temporarily stores various data.

  FIG. 8 is a functional block diagram showing a functional configuration of the authenticity determination device. The control unit 72 develops the control program stored in the ROM 722 in the RAM 723 and executes the control program in the RAM 723, whereby an acquisition unit 721a and a storage unit 721b for executing the authentication determination processing procedure shown in FIG. , Function as a reading unit 721c, a comparison unit 721d, a determination unit 721e, and a display unit 721f.

  The acquisition unit 721 a receives image information as authentication information acquired by the reading device 71.

  The storage unit 721b receives the image information received by the acquisition unit 721a and stores the image information in the storage device 74, or directly develops the image information in the RAM 723 when the image information is to be used immediately.

  The reading unit 721 c reads various information such as image information and other image information as comparison information stored in the storage device 74 from the storage device 74 and expands the information in the RAM 723.

  The comparison unit 721d performs block matching on image information as comparison information stored in the reading device 71 and image information as authentication information acquired by the acquisition unit 721a and developed in the RAM 723. Thus, the comparison information and the authentication information are compared.

  The determination unit 721e receives the comparison result between the comparison information and the authentication information performed by the comparison unit 721d, and performs authenticity determination of the authentication object based on this result.

  The display unit 721f transmits and displays the determination result of the authenticity determination performed by the determination unit 721e on the display 73b.

  Next, the authenticity determination method performed by the above-described authenticity determination device 70 will be described with reference to FIG. FIG. 9 is a flowchart showing an authenticity determination method performed by the authenticity determination device.

  First, the acquisition unit 721a uses the reading device 71 to enlarge and image a structure part having a minimum pattern interval of 10 nanometers or less as authentication information from the authentication structure, as described above. Image information including an image is acquired (step S1).

  Next, the reading unit 721c reads the stored image information including the enlarged image of the structure portion having the pattern interval of 10 nanometers or less as the comparison information stored in the storage device 74 (step S2).

  Next, the comparison unit 721d compares the image information as the authentication information with the stored image information as the comparison information by block matching, and obtains the similarity between the two (step S3). Here, the block matching can be performed using various methods such as normalized cross-correlation (NCC), sum of luminance differences (SAD), and sum of squares of luminance differences (SSD).

  Next, the determination unit 721e determines whether the similarity is equal to or higher than a predetermined threshold using the comparison result by the comparison unit 721d (step S4).

  When the similarity is equal to or higher than a predetermined threshold (step S4: Yes), the determination unit 721e determines that the authentication object is genuine (step S5), and the display unit 721f displays the determination result on the display 73. Display, and a series of authenticity determination operations ends.

  On the other hand, when the similarity is lower than the predetermined threshold (step S5: No), the determination unit 721e determines that the authentication object is a counterfeit product (step S7), and the display unit 721f displays the determination result on the display 73. Then, a series of authenticity determination operations ends.

  According to the authenticity determination apparatus and the authenticity determination method performed by the above-described embodiment, the authentication structure for authenticity provided on the authentication object is the resolution limit of the resist drawing apparatus and various lithography solutions. Even when the pattern interval is less than 10 nanometers below the image limit, it is possible to read the authentication structure and perform authentication with extremely high accuracy.

DESCRIPTION OF SYMBOLS 1 Credit card 2 IC chip 3 Hologram 4 Magnetic stripe 5 Resist structure 6 Base | substrate 7 Resist collapse part 8 Resist pattern 9 Uneven structure 36 Molding uneven structure 70 Authentication apparatus 71 Reading apparatus 72 Control part 73 Display 74 Storage apparatus 721 CPU
721a acquisition unit 721b storage unit 721c reading unit 721d comparison unit 721e determination unit 721f display unit 722 ROM
723 RAM

Claims (24)

An authentication structure for authenticity authentication;
An information recording unit in which predetermined information different from the authentication structure is recorded;
With
The authentication structure is a resist structure having a minimum pattern interval of less than 10 nanometers formed by collapsing a resist pattern formed by a plurality of pillars having a pillar shape which is nano-order formed on a substrate. Yes,
The authentication structure is incorporated in the information recording unit through a process included in the manufacturing process of the information recording unit.
This is an authentic authentication object. An authentication structure for authenticity authentication;
An information recording unit in which predetermined information different from the authentication structure is recorded;
With
The authentication structure is a resist structure having a minimum pattern interval of less than 10 nanometers formed by collapsing a resist pattern formed by a plurality of pillar-shaped columnar pillars formed on a substrate. A concavo-convex structure formed by etching the substrate and having a minimum pattern interval of less than 10 nanometers,
The authentication structure is incorporated in the information recording unit through a process included in the manufacturing process of the information recording unit.
This is an authentic authentication object. An authentication structure for authenticity authentication;
An information recording unit in which predetermined information different from the authentication structure is recorded;
With
The authentication structure is a resist structure having a minimum pattern interval of less than 10 nanometers formed by collapsing a resist pattern formed by a plurality of pillar-shaped columnar pillars formed on a substrate. And forming a concavo-convex structure formed by etching the base, and then forming the concavo-convex structure on the other base using the base as a mold, the minimum pattern spacing is less than 10 nanometers,
The authentication structure is incorporated in the information recording unit through a process included in the manufacturing process of the information recording unit.
This is an authentic authentication object.   4. The authentication object according to claim 1, wherein the information recording unit is a hologram.   4. The authentication object according to any one of claims 1 to 3, wherein the recorded information is an IC chip. An authenticity determination device for determining the authenticity of an authentication object provided with an authentication structure having a structure portion with a minimum pattern interval of less than 10 nanometers,
An acquisition unit for acquiring image information including the structure portion having a minimum pattern interval of less than 10 nanometers as authentication information from the authentication structure;
A storage unit that stores storage image information including the structural part with a minimum pattern interval of less than 10 nanometers as comparison information used for authenticity determination of the authentication information;
A reading unit that reads the comparison information from the storage unit;
A comparison unit that compares the authentication information and the comparison information by block matching;
A determination unit that performs authenticity determination based on a comparison result between the authentication information and the comparison information;
An authenticity determination device comprising:   The authenticity determination device according to claim 6, wherein the comparison unit performs block matching using NCC.   The authenticity determination device according to claim 6, wherein the comparison unit performs block matching using SAD.   The authenticity determination device according to claim 6, wherein the comparison unit performs block matching using an SSD. The acquisition unit is a scanning electron microscope, acquires an electron microscope image of the authentication structure as the authentication information,
The storage unit stores an electron microscope image as the comparison information.
The authenticity determination device according to any one of claims 6 to 9, wherein The acquisition unit is a scanning probe microscope, acquires a surface image of the authentication structure as the authentication information,
The storage unit stores a surface image as the comparison information.
The authenticity determination device according to any one of claims 6 to 9, wherein The acquisition unit is a near-field optical microscope, acquires a near-field microscope image of the authentication structure as the authentication information,
The storage unit stores a near-field microscope image as the comparison information.
The authenticity determination device according to any one of claims 6 to 9, wherein The acquisition unit is an optical microscope, acquires an optical microscope image of the authentication structure as the authentication information,
The storage unit stores an optical microscope image as the comparison information.
The authenticity determination device according to any one of claims 6 to 9, wherein An authentication method for determining the authenticity of an authentication object provided with an authentication structure having a structure portion with a minimum pattern interval of less than 10 nanometers,
As an authentication information from the authentication structure, an acquisition step of acquiring image information including an enlarged image of the structure portion with a minimum pattern interval of less than 10 nanometers;
A reading step of reading out stored image information including a magnified image of the structural portion whose minimum pattern interval is less than 10 nanometers as comparison information used for authenticity determination from a storage device;
A comparison step of comparing the authentication information and the comparison information by block matching based on a luminance value;
A determination step of performing authenticity determination based on the comparison result in the comparison step;
A method for determining authenticity, comprising:   The authenticity determination method according to claim 14, wherein in the comparison step, block matching is performed using NCC.   15. The authenticity determination method according to claim 14, wherein in the comparison step, block matching is performed using SAD.   15. The authenticity determination method according to claim 14, wherein block comparison is performed using SSD in the comparison step. In the acquisition step, an electron microscope image of the authentication structure is acquired as the authentication information,
In the reading step, an electron microscope image is read from the storage device as the comparison information.
The authenticity determination method according to any one of claims 14 to 17, characterized in that: In the acquisition step, a surface image of the authentication structure is acquired as the authentication information,
In the reading step, a surface image is read from the storage device as the comparison information.
The authenticity determination method according to any one of claims 14 to 17, characterized in that: In the acquisition step, a near-field microscope image of the authentication structure is acquired as the authentication information,
In the reading step, a near-field microscope image is read from the storage device as the comparison information.
The authenticity determination method according to any one of claims 14 to 17, characterized in that: In the acquisition step, an optical microscope image of the authentication structure is acquired as the authentication information,
In the reading step, an optical microscope image is read from the storage device as the comparison information.
The authenticity determination method according to any one of claims 14 to 17, characterized in that: A method for manufacturing an authentic object,
An information recording part forming step for forming an information recording part in which predetermined information is recorded on the substrate;
A resist pattern forming step of forming a resist pattern formed by a plurality of pillars in a columnar shape, which is nano-order, on the substrate through the steps included in the information recording portion forming step;
A resist collapse step of forming a resist structure in which the resist pattern is collapsed to form a resist structure having a minimum pattern interval of less than 10 nanometers;
The manufacturing method of the authentication target object characterized by comprising.   The method further comprises a concavo-convex structure forming step of forming a concavo-convex structure in which the minimum pattern interval is less than 10 nanometers by etching the base using the resist structure formed in the resist collapse step as a mask. Item 22. A method for producing an authentication object according to Item 22.   A molding concavo-convex structure forming step of forming a molding concavo-convex structure having a minimum pattern interval of less than 10 nanometers on another base using the base having the concavo-convex structure formed in the concavo-convex structure forming step as a mold; The method for manufacturing an authentication object according to claim 23, wherein

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