JP6052543B2 - Gas reactor for liquid to be processed - Google Patents

Description

  The present invention relates to a gas reaction apparatus for a liquid to be processed. More specifically, for example, the present invention relates to a gas reaction apparatus for a liquid to be treated that can be used for neutralizing a liquid to be treated such as alkaline wastewater by bringing a gas such as carbon dioxide into contact therewith.

  At present, alkaline wastewater such as concrete wastewater discharged in civil engineering works is neutralized and discarded in advance from the viewpoint of environmental protection. For neutralization of alkaline wastewater, for example, carbon dioxide is used as a neutralizing agent. At present, various proposals for increasing the reaction efficiency of carbon dioxide have been made.

  Specifically, for example, a form of “using a negative pressure generated on the back surface of a rotating impeller to continuously introduce carbon dioxide into alkaline water to generate fine bubbles and react” (see Patent Document 1) "A jet-type agitator is installed inside a sealed neutralization tank equipped with a drainage inflow pipe having a carbon dioxide gas injection mechanism and a drainage outflow pipe for discharging treated wastewater. An ejector that sucks carbon dioxide gas at the jet outlet and a diffuser having a flow path that guides the jet in a predetermined direction, and a pipe that communicates with the flow path of the ejector and extends to the air layer of the neutralization tank are arranged. '' Form (refer to Patent Document 2), "Fill carbon dioxide into the processing tank and spray waste water onto the filled carbon gas" (refer to Patent Document 3), "In the alkaline waste water, carbon dioxide gas from the bottom of the tank To serve And the bottom is supplied into the alkaline waste water "from the unit forms of the alkali waste water surface again the tank the carbon dioxide accumulated in the upper in the tank (see Patent Document 4) it has been proposed.

  However, even now, these forms are not necessary and sufficient, and proposals for further forms are expected.

Japanese Patent Application Laid-Open No. 7-100472 JP 11-169868 A JP 2003-136701 A JP 2003-326281 A

  The main problem to be solved by the present invention is to provide a gas reaction apparatus for a liquid to be treated with high reaction efficiency.

  The present invention for solving this problem is as follows.

[Invention of Claim 1 ]
A gas reaction apparatus for a liquid to be treated which is brought into contact with the liquid to be treated and reacted.
A reaction tank to which the liquid to be treated is supplied;
A supply path for the liquid to be treated connected to the reaction tank;
A supply pump for the liquid to be treated provided in the middle of the supply path;
The gas mixing path connected to the supply path upstream of the supply pump;
A filtration filter for passing the liquid to be treated supplied into the reaction tank and separating the gas mixed in the liquid to be treated from the liquid to be treated;
One end connected to the reaction tank and the other end connected to the supply path upstream of the supply pump,
The gas separated by the filtration filter accumulated in the reaction tank is configured to circulate through the circulation path,
It has a cylindrical support body whose upper surface and peripheral surface can be passed through,
The filtration filter is supported on the peripheral surface of the support,
A partition material for partitioning the reaction tank into a lower region and an upper region;
This partition is provided with a communication port communicating with the upper surface of the support,
Backwashing means for pushing the pressure liquid into the support through the communication port,
The supply path is connected to the lower end of the lower region;
The gas separated by the filtration filter is configured to accumulate at the upper end of the lower region.
A gas reaction apparatus for a liquid to be treated.

[Invention of Claim 2 ]
One end is connected to the partition member, passes through the upper region, and the other end has a circulation auxiliary path connected to the circulation path.
A gas reaction apparatus for a liquid to be treated according to claim 1 .

[Invention of Claim 3 ]
The supply path is connected to a peripheral wall of a reaction tank constituting the lower region;
This connection direction is the tangential direction of the reaction tank,
A gas reaction apparatus for a liquid to be processed according to claim 1 or 2 .

  According to the present invention, a gas reaction apparatus for a liquid to be treated with high reaction efficiency is obtained.

It is a processing system diagram of the gas reactor concerning this form. It is structure explanatory drawing of the gas reaction apparatus which concerns on this form. It is structure explanatory drawing of the filtration filter which concerns on this form. It is function explanatory drawing of the filtration filter which concerns on this form. It is an example of connection of a circulation way concerning this form. It is an example of arrangement of a filtration filter concerning this form. It is an example of connection of a supply way concerning this form.

Next, the form for implementing this invention is demonstrated.
In the following description, the case where the alkaline liquid to be treated is neutralized with an acidic gas such as carbon dioxide (carbon dioxide) will be described as an example. It can also be applied to. Furthermore, the present invention can also be applied to the case where a reaction other than neutralization is performed on the liquid to be treated using various gases other than the neutralization gas such as acid gas and alkaline gas.

  As shown in FIG. 1, the gas reaction apparatus 10 of this embodiment is an apparatus for bringing an acidic gas G into contact with an alkaline liquid W1 for neutralization, and obtains a processed liquid W2 that can be discharged into a river or the like, for example. be able to.

  The gas reaction apparatus 10 is provided with, for example, a cylindrical reaction tank 11. A supply path 81 for the liquid W1 to be treated is connected to the lower end of the reaction tank 11, that is, the bottom in the illustrated example. In the middle of the supply path 81, a supply pump P1 such as a centrifugal pump that pushes the liquid W1 to be processed into the reaction tank 11 is provided.

  One end of the mixing path 83 is connected to the supply path 81 on the upstream side of the supply pump P1. A gas cylinder 41 filled with the acidic gas G is connected to the other end of the mixing path 83. The acidic gas G in the gas cylinder 41 is mixed in the liquid W1 to be processed flowing in the supply path 81 through the mixing path 83.

  By this mixing, the acid gas G becomes countless bubbles, and the neutralization reaction of the liquid W1 to be processed is started. As the neutralization proceeds in this way, the liquid W1 to which the acidic gas G is mixed is supplied into the reaction tank 11 by the supply pump P1.

  When the liquid W1 to be treated passes through the supply pump P1, the acidic gas G in the form of bubbles is refined by an agitation means such as an impeller incorporated in the casing, for example, in the supply pump P1. Is done. This refinement improves the gas-liquid contact efficiency between the liquid to be treated W1 and the acid gas G, and the neutralization of the liquid to be treated W1 proceeds rapidly.

  The speed of this neutralization can also be controlled by the amount of acidic gas G mixed in the liquid to be processed W1, the supply speed of the liquid to be processed W1 into the reaction tank 11, and the like. In this regard, when carbon dioxide is used as the acidic gas G, even if the amount of carbon dioxide mixed is excessive, the pH is only lowered to about 5, so that the neutralization treatment can be performed quickly and accurately. However, it is more preferable that the pH of the treated liquid W2 is continuously detected by a pH detection sensor or the like and the amount of the acid gas G is adjusted based on the detected value, so that the acid gas G is not wasted.

  Note that the supply speed of the liquid W1 to be processed is to change the supply capacity of the supply pump P1, or to adjust the opening of the supply valve B3 provided in the supply path 81 and downstream of the supply pump P1. Can be adjusted by etc.

  As shown in FIG. 2, the reaction tank 11 is provided with a partition member 12 that partitions the reaction tank 11 into a lower region 10x and an upper region 10y. For example, the partition member 12 has a flat plate shape, and is fixed to the inner peripheral surface of the reaction tank 11 at the peripheral edge.

  For example, a circular communication port 12x is formed in the central portion of the partition member 12. Due to the presence of the communication port 12x, the partition member 12 has a donut shape.

  In the reaction tank 11, only the communication port 12x moves from the lower region 10x of the liquid, such as the liquid W1 to be processed and the processed liquid W2, to the upper region 10y, or from the upper region 10y to the lower region 10x. Is possible.

  In the present specification, the region below the partition material 12 is referred to as a lower region 10x, and the region above the partition material 12 is referred to as an upper region 10y. Therefore, a region 10z in the support 20 described later is a region where the treated liquid W2 exists, but is a lower region 10x because it is a region below the partitioning member 12.

  As shown in FIGS. 2 and 3, the reaction tank 11 is provided with a filtration filter (filtration membrane) 21 through which the liquid W1 to be treated supplied into the reaction tank 11 is passed. As shown in FIG. 4, the filtration filter 21 is configured to pass the liquid W1 (liquid) to be processed but not to pass bubbles Ga (gas) made of the acid gas G due to the surface tension of the liquid W1 to be processed. Yes. Therefore, the to-be-processed liquid W1 and the acidic gas G are gas-liquid separated by the filtration filter 21.

  Note that this gas-liquid separation uses the surface tension of the liquid to be treated W1. Therefore, a different filter 21 can be used depending on the supply pressure of the liquid W1 to be processed by the supply pump P1. However, it is more preferable to use a filtration filter that does not allow air bubbles Ga to pass even at a supply pressure exceeding the liquid flow pressure resistance because gas-liquid separation is reliably performed. Moreover, when the to-be-processed liquid W1 is a suspension etc. and the surface of the filtration filter 21 is covered with the laminated cake Sc, the kind of the filtration filter 21 and the to-be-treated liquid W1 are considered also considering this laminated cake Sc. It is preferable to set the supply pressure and the like.

  By the way, as the filtration filter 21, there are generally a “surface filtration type” filter that captures suspended substances and the like on the surface of the filter, and a “depth filtration type” filter that captures suspended substances and the like inside the filter. Exists. In the present embodiment, any filter that does not allow air bubbles Ga to pass is sufficient, and any filtration filter can be used. However, particularly when the liquid to be treated W1 contains a suspended substance, that is, when the liquid to be treated W1 is a suspension, it is preferable to use a surface filtration type filter. When a surface filtration type filter is used, regeneration (backwashing) of the filtration filter 21 described later can be performed instantaneously and reliably. The filtration filter 21 can also serve to filter the salt produced by the neutralization reaction, and it is useful to use a surface filtration type filter even when the liquid W1 to be treated is other than a suspension. is there.

  As the surface filtration type filter, it is preferable to use a filter composed of a substrate and a surface filter bonded to the surface of one of the substrates (the liquid W1 side).

  As a base material of the surface filtration type filter, for example, a nonwoven fabric such as polyester, nylon, PPS, or a SUS high-density wire mesh can be used. The film thickness of the substrate is preferably 0.4 to 1.0 mm, more preferably 0.6 mm.

  On the other hand, as a surface filtration body of the surface filtration type filter, a nano-level fiber thin film (layer) is assumed. As the surface filter, for example, a Teflon (registered trademark) film subjected to hydrophilic processing, a nanofiber spunbond film, or the like can be used. The film thickness of the surface filter is preferably 0.03 to 0.07 mm, more preferably 0.05 mm. The fiber diameter of the surface filter is preferably 100 to 300 nm, and the accuracy by the particle counter is particularly preferably 0.15 μm × 99.95%.

  As shown in FIG. 3, the filtration filter 21 is bent (bent) into a pleated shape (honeycomb shape) in a zigzag shape. Thus, it is preferable to use a cylindrical shape. According to this embodiment, a large filtration area of the filtration filter 21 can be secured without increasing the volume of the reaction tank 11, and the liquid passing ability is remarkably improved. Moreover, the pleated filtration filter 21 has a V-shaped groove structure that spreads outward centering on each inner bent portion (a portion in contact with the support base 22 to be described later). The cake Sc can be discharged very easily.

  As shown in FIGS. 2 and 3, the reaction tank 11 is provided with a cylindrical support 20 whose upper surface and peripheral surface are capable of liquid passage, and preferably whose lower surface is impermeable to liquid. The shape of the filtration filter 21 is maintained by the support 20. Details will be described below.

  The support body 20 includes a cylindrical support base body 22, a support auxiliary body 23 disposed outside the support base body 22, and a support bottom body 24 disposed below the support bodies 22 and 23. It is configured.

  The support base 22 is formed, for example, by forming a perforated plate such as punching metal into a cylindrical shape, and the upper surface and the lower surface are open. Therefore, the liquid can be passed through any of the upper surface, the lower surface, and the peripheral surface, but the lower surface is blocked by the support bottom body 24 and cannot pass through.

  In this embodiment, the liquid passing means that liquid such as the liquid to be processed W1 and the processed liquid W2 can pass through, and the liquid passing impossible means that the liquid such as the liquid to be processed W1 and the processed liquid W2 passes through. Say what you can't do.

  The support base 22 is a member for preventing the cylindrical shape of the filtration filter 21 from being deformed or crushed. The support base 22 is provided on the outside of the support base 22 through a support auxiliary body 23 described below. 21 is arranged.

  As shown in FIG. 3, the support auxiliary body 23 has a honeycomb shape that bends (bends) radially outward and inwardly in a plan view, and each inner bent portion has an outer peripheral surface of the support base 22. It is fixed to. The support auxiliary body 23 is a member for preventing the pleated shape of the filtration filter 21 from being crushed and folded due to a filtration differential pressure or the like, and functions as a spacer. Therefore, the filtration filter 21 is disposed along the surface of the support auxiliary body 23 (the peripheral surface of the support body 20). In addition, by preventing the filtration filter 21 from being folded, a flow path for the processed liquid W2 is secured, and a decrease in the liquid passing capacity is prevented.

  The support auxiliary body 23 is formed of a rigid member capable of passing liquid such as a wire mesh or nylon mesh, for example. Further, the support auxiliary body 23 may be formed in a honeycomb shape by joining a plurality of members. The support auxiliary body 23 and the support base 22 described above have a pressure resistance of, for example, 200 kPa.

  The support bottom body 24 has, for example, a flat plate shape, and is fixed to the lower end portions of the support base body 22 and the support auxiliary body 23, thereby closing the lower end openings of the support base body 22 and the support auxiliary body 23. The support bottom body 24 is not formed with an opening or the like, and is not allowed to pass liquid. On the other hand, the upper end portion of the support auxiliary body 23y is not allowed to pass through a plate material (not shown).

  With the above configuration, the support 20 of the present embodiment has a bottom surface (of the support 20) that cannot be passed by the support bottom 24 and can pass through the upper end opening of the support base 22 (of the support 20). An upper surface is configured, and a peripheral surface (of the support 20) that can be passed by the support base 22 and the support auxiliary body 23 is configured.

  As described above, the communication port 12x is formed in the central portion of the partition member 12, and the communication port 12x communicates with the upper surface of the support body 20, that is, the upper end opening of the support base 22. Various communication methods are conceivable, but in this embodiment, the pipe body 51 is used for communication. In the reaction tank 11, the lower end portion of the tubular body 51 is connected to the upper end portion of the support base 22 or is welded or the like, and the upper end portion is inserted into the communication port 12 x of the partition member 12. Or connected by welding or the like.

  Furthermore, the gas reaction apparatus 10 is provided with a circulation path 84 having one end connected to the reaction tank 11 and the other end connected to the supply path 81 on the upstream side of the supply pump P1. The circulation path 84 is provided with a circulation pump P2. By this circulation pump P2, the acidic gas G separated by the filtration filter 21 and accumulated in the reaction tank 11 is extracted from the reaction tank 11 and mixed into the liquid W1 to be processed flowing in the supply path 81 through the circulation path 84. . By this mixing, the unreacted acid gas G is used again for neutralization of the liquid W1 to be treated, and the reaction efficiency is improved. For example, when the acid gas G is carbon dioxide, if this circulation is not used, the reaction efficiency will remain at about 40%, and more than half of the carbon dioxide will be diffused into the atmosphere. .

  The connection position of the circulation path 84 to the reaction tank 11 can be, for example, the peripheral wall of the reaction tank 11 constituting the upper end portion of the lower region 10x, as shown in (1) of FIG. According to this connection form, the acidic gas G accumulated at the upper end of the lower region 10x can be efficiently extracted.

  In this regard, at the time of this extraction, a part of the liquid W1 to be treated is extracted together with the acid gas G. Therefore, it is preferable to use a pump capable of simultaneously processing gas and liquid such as a diaphragm pump, a vane pump, and a roots pump as the circulation pump P2. It should be noted that the liquid W1 that has been unintentionally extracted is returned to the supply path 81 through the circulation path 84.

  Moreover, as a connection form of the circulation path 84, as shown in (2) of FIG. 5, the circulation auxiliary path in which one end is connected to the partition member 12, passes through the upper region 10y, and the other end is connected to the circulation path 84. A form provided with 84s is also suitable. According to this form, the amount of the liquid W1 to be processed that enters the circulation path 84 is reduced, so that the load on the circulation pump P2 is reduced.

  By the way, the connection form of the above circulation path 84 and the circulation auxiliary path 84s is provided with the partition material 12 which partitions the inside of the reaction tank 11 into the lower region 10x and the upper region 10y, and is provided at the upper end of the lower region 10x. It is assumed that the acid gas G accumulates. Therefore, for example, as shown in (1) of FIG. 6, when the partition member 12 is not provided and the upper surface of the support 20 communicates with the communication port 11 x formed on the top surface of the reaction tank 11. The circulation path 84 is connected to the peripheral wall of the upper end portion of the reaction tank 11 where the acid gas G accumulates and the top surface of the reaction tank 11 (not shown).

  Further, for example, as shown in (2) of FIG. 6, the support 20 is not provided, and the communication port 11 x formed on the top surface of the reaction tank 11 is provided with a filtration filter (not shown). In this case, the circulation path 84 is connected to the peripheral wall of the upper end portion of the reaction tank 11 where the acid gas G accumulates and the top surface of the reaction tank 11 (not shown).

  As described above, in any form, a plurality of circulation paths 84 and circulation auxiliary paths 84 s can be provided at appropriate intervals in the circumferential direction of the reaction tank 11. However, from the viewpoint of simplifying the piping, it is preferable to reduce the circulation path 84 and the circulation auxiliary path 84 s. However, if the circulation path 84 and the circulation auxiliary path 84 s are reduced, the acidic gas spreading in the planar direction in the reaction tank 11. There may be a problem that G cannot be extracted efficiently. Therefore, from this point of view, as shown in (1) of FIG. 7, a supply path 81 is connected to the peripheral wall of the reaction tank 11 constituting the lower region 10x, and further as shown in (2) of FIG. In addition, the connection direction of the supply path 81 is preferably the tangential direction of the reaction tank 11. According to this embodiment, since a swirling flow is generated in the liquid W1 to be processed in the reaction tank 11, the acidic gas G that is spread in the plane direction also swirls at the upper end portion of the lower flow area 10x, and the acidic gas G is It becomes easy to be extracted from the circulation path 84 and the circulation auxiliary path 84s.

  Further, the gas reaction device 10 is provided with backwashing means for pushing the pressure liquid into the support 20 through the communication port 12x. Specifically, first, a compressed air supply means for blowing the compressed air A into the upper region 10 y of the reaction tank 11, in this embodiment, a compressor 31 is provided. The compressor 31 preferably has a performance of discharging (pushing out) all the liquid W1 to be processed in the reaction tank 11 from the reaction tank 11 in 5 to 15 seconds. According to this embodiment, the laminated cake Sc peeled off from the surface of the filtration filter 21 is completely discharged from the reaction tank 11 as the slurry S together with the liquid W1 to be processed. Therefore, it is not necessary to design the discharge path 88 of the slurry S in detail. For example, only by switching the three-way valve B1 at the connection portion of the supply path 81 connected to the lower end of the reaction tank 11, that is, the bottom in the illustrated example, It can be used as it is as a connection part of the discharge path 88, and even in such a form, there is no possibility that the laminated cake Sc stays in the reaction tank 11.

  Further, the capacity of the upper region 10y of the reaction tank 11 is set to a capacity in which the lower region 10x of the reaction tank 11 is filled with the treated liquid W2 in the state where the slurry S (laminated cake Sc) is discharged. And more preferred. In this embodiment, the upper region 10y functions as a storage tank for the pressure liquid that is pushed into the support 20, and the treated liquid W2 that has passed through the filter 21 is used as it is as the pressure liquid. become. Therefore, in this embodiment, there is no need to separately prepare a pressure liquid storage tank or pressure liquid, and the gas reactor 10 can be downsized.

(Neutralization and regeneration)
Next, a method for neutralizing the liquid W1 to be treated using the gas reactor 10 and a method for regenerating (cleaning) the filter 21 provided in the gas reactor 10 will be described.
In this embodiment, first, the acidic gas G from the gas cylinder 41 is mixed into the liquid to be processed W1 through the mixing path 84, and neutralization of the liquid to be processed W1 is started. The to-be-processed liquid W1 mixed with the acid gas G is supplied into the reaction tank 11 from the bottom of the reaction tank 11 using the supply pump P1.

The water to be treated W1 supplied into the reaction tank 11 is further neutralized and then passed through the filtration filter 21. At this time, as described above, the liquid W1 to be processed and the bubbles Ga composed of the acidic gas G are separated. Further, suspended substances in the liquid to be treated W1 and salts generated by neutralization are laminated on the surface of the filtration filter 21. This laminate becomes a laminated cake Sc by being consolidated and agglomerated with the filtration process. This laminated cake Sc grows, for example, until the thickness is 0.5 to 2 mm and the holding amount is about 1 kg / m ² (1 L / m ² ).

  The treated liquid W2 after the suspended matter, the acid gas G, and the like are removed from the liquid to be treated W1 ascends in the support 20 (10z) and moves from the lower area 10x to the upper area 10y. The treated liquid W2 is then discharged through a proximal end discharge path 85 and a distal end side discharge path 86 connected to the upper end portion of the reaction tank 11.

  The front end side discharge path 86 is provided with a flow meter 32, and the flow rate of the treated liquid W 2 discharged from the reaction tank 11 is measured by the flow meter 32. The reaction tank 11 is provided with a pressure gauge C1 for measuring the pressure in the lower area 10x and a pressure gauge C2 for measuring the pressure in the upper area 10y. The reaction is performed by both pressure gauges C1 and C2. The filtration differential pressure in the tank 11 is measured.

  In the present embodiment, during the above neutralization treatment or separation of the acid gas G, these treatments can be interrupted as appropriate, and the filtration filter 21 can be regenerated. The timing for switching from the neutralization process or the like to the regeneration process is such that the flow rate measured by the flow meter 32 is reduced by, for example, about 25%, or the filtration differential pressure measured by the pressure gauges C1 and C2 is, for example, about 80 kPa. It can be based on when it is reached. In addition, without being based on such a decrease in flow rate or an increase in filtration differential pressure, for example, when a predetermined set time is reached, it is configured to automatically switch from neutralization processing to regeneration processing. You can also.

  When the regeneration timing comes according to the various criteria as described above, the pressure liquid, in this embodiment, the treated liquid W2 is pushed into the support 20, and vibration is applied to the filtration filter 21 by vibration means (not shown) if necessary. By the pushing of the treated liquid W2 and the addition of vibration, a lifting force or a shearing force that rises from the surface of the filtration filter 21 is applied to the laminated cake Sc on the surface of the filtration filter 21.

  Here, when pushing in the liquid W2 to be treated, first, supply of the liquid W1 to be treated is stopped by closing the supply valve B3 and the compressed air A is blown into the upper region 10y from the compressor 31. The blowing of the compressed air A can be performed by switching the three-way valve B2 and utilizing the pressure air passage 87 and the discharge passage 85 of the treated liquid W2 connected to the upper end portion of the filtration tank 11 connected thereto. According to this form, the pressure of the processed liquid W2 is applied to the laminated cake Sc made of suspended material or the like. Therefore, especially when the filtration filter 21 is configured by a surface filtration filter, the laminated cake Sc is instantaneously peeled off from the surface of the filtration filter 21 and the filtration filter 21 is regenerated.

  The present invention is applicable, for example, as a gas reaction apparatus for a liquid to be processed that can be used for neutralization by bringing a gas such as carbon dioxide into contact with a liquid to be processed such as alkaline drainage.

  DESCRIPTION OF SYMBOLS 10 ... Gas reactor, 10x ... Lower area | region, 10y ... Upper area | region, 11 ... Reaction tank, 12 ... Partition material, 20 ... Support body, 21 ... Filtration filter, 22 ... Support base | substrate, 23 ... Supporting auxiliary body, 24 ... Support bottom body, 31 ... compressor, 32 ... flow meter, 41 ... gas cylinder, 83 ... supply path, 84 ... circulation path, 84s ... circulation auxiliary path, A ... compressed air, G ... oxidizing gas, Ga ... bubble, P1 ... supply Pump, P2 ... circulation pump, W1 ... processed liquid, W2 ... processed liquid.

Claims (3)

A gas reaction apparatus for a liquid to be treated which is brought into contact with the liquid to be treated and reacted.
A reaction tank to which the liquid to be treated is supplied;
A supply path for the liquid to be treated connected to the reaction tank;
A supply pump for the liquid to be treated provided in the middle of the supply path;
The gas mixing path connected to the supply path upstream of the supply pump;
A filtration filter for passing the liquid to be treated supplied into the reaction tank and separating the gas mixed in the liquid to be treated from the liquid to be treated;
One end connected to the reaction tank and the other end connected to the supply path upstream of the supply pump,
The gas separated by the filtration filter accumulated in the reaction tank is configured to circulate through the circulation path,
It has a cylindrical support body whose upper surface and peripheral surface can be passed through,
The filtration filter is supported on the peripheral surface of the support,
A partition material for partitioning the reaction tank into a lower region and an upper region;
This partition is provided with a communication port communicating with the upper surface of the support,
Backwashing means for pushing the pressure liquid into the support through the communication port,
The supply path is connected to the lower end of the lower region;
The gas separated by the filtration filter is configured to accumulate at the upper end of the lower region.
A gas reaction apparatus for a liquid to be treated. One end is connected to the partition member, passes through the upper region, and the other end has a circulation auxiliary path connected to the circulation path.
A gas reaction apparatus for a liquid to be treated according to claim 1 . The supply path is connected to a peripheral wall of a reaction tank constituting the lower region;
This connection direction is the tangential direction of the reaction tank,
A gas reaction apparatus for a liquid to be processed according to claim 1 or 2 .

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