JP6032648B2 - Opening pattern design method, image restoration method, and image restoration apparatus - Google Patents

Description

  The present invention relates to an aperture pattern design method, an image restoration method, and an image restoration apparatus.

  In an inspection device, an alignment device, and the like, an image pickup unit that picks up an object generally has an autofocus function. Thereby, it is possible to acquire an image by focusing on the surface of the object. However, when the operation of focusing on the surface of the object (autofocus operation) is not properly performed, imaging is performed in a state where the focus is shifted from the surface of the object, and a so-called blurred image (out-of-focus image) is generated. It will be acquired. When the blurred image is acquired, for example, the inspection apparatus cannot perform inspection accurately, and the alignment apparatus cannot align the target object with high accuracy.

  Therefore, development of a technique for restoring a blurred image is underway. In image restoration, an in-focus image (that is, a restored image) is obtained by performing a deconvolution of the blurred image and a point spread function (PSF) corresponding to the defocus amount at the time of imaging. (See, for example, Patent Documents 1 and 2). Non-Patent Document 1 discloses an opening pattern for improving the restoration accuracy of an image on the assumption that the frequency characteristic (power spectrum) of a natural image follows 1 / f. Note that Non-Patent Document 2 describes that the optimized aperture shape depends on the application and the object to be photographed.

JP 2010-81460 A JP 2012-22308 A

Changyin Zhou, 1 other, “What are Good Apertures for Defocus Deblurring?”, [Online], 2009, Columbia University, [April 17, 2013 search], Internet <URL: http: //www1.cs .columbia.edu / ~ changyin / files / ZhouICCP2009.pdf> Takuya Watanabe, 4 others, “Active Aperture Camera”, Information Processing Society of Japan Research Report, Information Processing Society of Japan, November 2010, 2010-CVIM-174 No. 8, p. 1-8

  By the way, since the power spectrum of the image differs depending on the type of imaging target, even if the aperture pattern of Non-Patent Document 1 is used, the image cannot always be accurately restored. Therefore, there is a need for a method for determining an appropriate opening pattern according to the category to be imaged.

  The present invention has been made in view of the above problems, and an object thereof is to determine an appropriate opening pattern in accordance with the category of an imaging target.

  The invention according to claim 1 is a method of designing an aperture pattern used in an imaging unit of an image restoration device, and a) a power spectrum in each direction in an image showing an imaging target belonging to one category is represented as a representative spectrum. And b) preparing a plurality of candidate patterns of the aperture pattern, and obtaining an evaluation value indicating the restoration accuracy of an image captured using each candidate pattern, the noise level and the representative spectrum in the imaging unit An aperture pattern used in the imaging unit from the plurality of candidate patterns by obtaining a final evaluation value from evaluation values in a plurality of directions for each candidate pattern. Determining the step.

  The invention according to claim 2 is the opening pattern design method according to claim 1, wherein the step a) prepares a plurality of images respectively indicating a plurality of imaging targets belonging to the category a1). And a2) acquiring a plurality of power spectra in the plurality of images for each direction, and a3) obtaining a representative value of the values of the plurality of power spectra at each frequency for each direction, Obtaining a representative spectrum.

The invention according to claim 3 is the opening pattern design method according to claim 1 or 2, wherein the frequency is ξ, the representative spectrum is S _ξ , and each candidate pattern is Fourier-transformed by K _ξ , Using the noise level as σ, the evaluation value R of each candidate pattern is obtained by Equation 1.

  A fourth aspect of the present invention is the opening pattern design method according to any one of the first to third aspects, wherein a step of measuring a noise level in the image pickup device of the image pickup unit before the step b) is performed. Further prepare.

  The invention according to claim 5 is an image restoration method, wherein the image pickup unit having the opening pattern determined by the opening pattern design method according to any one of claims 1 to 4 is classified into the category. A step of acquiring an image by capturing an imaging target belonging thereto, and a step of acquiring a restored image from the image using a point spread function prepared in advance for the opening pattern.

  The invention according to claim 6 is an image restoration device, wherein the imaging unit having an opening pattern determined by the opening pattern design method according to any one of claims 1 to 4, and the imaging unit An image restoration unit that obtains a restored image from an image obtained by imaging an imaging target belonging to a category using a point spread function stored in advance for the aperture pattern.

  The invention according to claim 7 is the image restoration device according to claim 6, wherein a pattern matching between the restored image of the imaging target that is an alignment mark and a template image is performed from a reference position of the imaging target. A positional deviation amount obtaining unit that obtains a positional deviation amount, and holding the target on which the imaging target is formed, and moving the target based on the positional deviation amount, thereby moving the imaging target to the reference position. And a moving mechanism to be disposed.

  According to the present invention, it is possible to determine an appropriate opening pattern according to the category to be imaged. As a result, the image can be accurately restored in the image restoration device.

It is a figure which shows the structure of the alignment apparatus. It is a block diagram which shows the function structure which a computer implement | achieves. It is a figure which shows the flow of the process which concerns on the design of an opening pattern. It is a figure which shows the flow of an opening pattern determination process. It is a figure which shows an optimization pattern. It is a figure which shows the flow of the alignment process of a board | substrate. It is a figure which shows an alignment mark. It is a figure which shows the blur image produced | generated by simulation. It is a figure which shows a decompression | restoration image. It is a figure which shows the relationship between a defocus amount and a score. It is a figure which shows the blurring image produced | generated by simulation, when using the opening pattern of a comparative example. It is a figure which shows a decompression | restoration image. It is a figure which shows the relationship between a defocus amount and a score. It is a figure which shows the blur image produced | generated by simulation, when using the opening pattern of another comparative example. It is a figure which shows a decompression | restoration image. It is a figure which shows the relationship between a defocus amount and a score.

  FIG. 1 is a diagram showing a configuration of an alignment apparatus 1 according to an embodiment of the present invention. The alignment apparatus 1 is an apparatus that arranges a substrate 9 such as a semiconductor substrate or a glass substrate at a reference position in a predetermined direction. The alignment device 1 is provided in an inspection device, a drawing device, or the like, and the substrate 9 is arranged at a reference position, thereby realizing a pattern inspection in the inspection device or a pattern drawing in the drawing device with high accuracy. Is done.

  The alignment apparatus 1 receives an image pickup unit 2 that picks up an alignment mark formed on the substrate 9, a moving mechanism 3 that moves the substrate 9 relative to the image pickup unit 2, and image data from the image pickup unit 2. A computer 4 is provided. The imaging unit 2 electrically outputs an illumination unit 21 that emits illumination light, an optical system 22 that guides illumination light to the substrate 9 and receives light from the substrate 9, and an image of the substrate 9 formed by the optical system 22. It has an image sensor 23 (line sensor or area sensor) that converts it into a signal. The optical system 22 has an aperture pattern (also referred to as a coded diaphragm) 221 described later. The moving mechanism 3 includes a stage 31 that holds the substrate 9, a rotating mechanism 32 that rotates the stage 31 around an axis parallel to the Z direction in FIG. 1, and a Y direction moving mechanism 33 that moves the stage 31 in the Y direction. And an X-direction moving mechanism 34 for moving the stage 31 in the X direction. The X direction, the Y direction, and the Z direction are perpendicular to each other.

  FIG. 2 is a block diagram showing a functional configuration realized by the computer 4. In FIG. 2, the imaging unit 2 and the moving mechanism 3 are also indicated by broken-line blocks. The computer 4 includes a calculation unit 41 that performs various calculations and a control unit 42 that performs overall control of the alignment apparatus 1. The calculation unit 41 includes an image restoration unit 411 and a positional deviation amount acquisition unit 412 described later. In addition, the function of the calculating part 41 may be constructed | assembled by a dedicated electrical circuit, and a dedicated electrical circuit may be utilized partially.

  As described above, in the imaging unit 2 of the alignment apparatus 1, the opening pattern 221 having a shape corresponding to the imaging target on the substrate 9 is designed and manufactured in advance. Further, information (point spread function) used in the alignment process of the substrate 9 described later is also acquired in advance for the opening pattern 221. Hereinafter, processing related to opening pattern design (that is, opening pattern design and fabrication processing and point spread function acquisition processing) performed as advance preparation for the alignment processing of the substrate 9 will be described with reference to FIG. explain.

  In the process related to the opening pattern design, first, a plurality of images showing a plurality of types of alignment marks having different shapes are prepared (step S11). Here, a plurality of substrates on which a plurality of types of alignment marks are formed (hereinafter referred to as “reference substrates” in order to distinguish them from the substrate 9 in the alignment process described later) are prepared, and the alignment apparatus 1 uses a plurality of references. A plurality of images (signals thereof) are acquired by imaging the alignment mark on the substrate.

  At this time, the focus function in the imaging unit 2 is adjusted so that the alignment mark is in focus. In addition, as the aperture pattern (aperture) in the imaging unit 2, a pattern having a general substantially circular light-transmitting region is used. Each alignment mark includes a plurality of linear portions extending in directions orthogonal to each other (that is, having anisotropy), and in a plurality of images, these linear portions are directed in substantially the same direction. . Note that a plurality of images indicating a plurality of types of alignment marks may be acquired by other imaging units. Further, by providing a mechanism for moving the stage 31 in the Z direction, the surface of the reference substrate may be focused.

  When a plurality of images are prepared, the calculation unit 41 obtains a power spectrum for each direction in the image by performing a Fourier transform on each of the plurality of images. Thereby, a plurality of power spectra in a plurality of images are acquired for each direction (step S12). Subsequently, for each direction, a representative value of the values of the plurality of power spectra at each frequency is obtained. Here, the representative value is a value indicating the vicinity of the center of the range in which the values of a plurality of power spectra at each frequency are distributed, such as an average value or a median value. And the spectrum expressed by the representative value in each frequency is acquired as a representative spectrum in each direction (step S13). The representative spectrum can be regarded as representing the power spectrum of a plurality of images in each direction. The representative spectrum in each direction is obtained by obtaining a plurality of power spectrum images from the plurality of images prepared in step S11 and obtaining representative values of the corresponding pixel values of the plurality of power spectrum images. May be.

  Further, in the alignment apparatus 1, a noise level (here, standard deviation of noise) in the image pickup device 23 of the image pickup unit 2 is measured (step S14). For example, the noise level is measured by acquiring the output from the image sensor 23 in a state where the objective lens of the imaging unit 2 is provided with a lid that shields light. Note that the noise level may be obtained by calculation from an image acquired by the imaging unit 2 (for example, an image acquired by the process of step S11).

  Subsequently, an aperture pattern used in the imaging unit 2 is determined using the noise level and the representative spectrum in the imaging unit 2 (step S15). In the opening pattern determination process in the present embodiment, a method using a genetic algorithm described in Table 1 of Non-Patent Document 1 is used.

  FIG. 4 is a diagram showing the flow of the opening pattern determination process, and shows the process performed in step S15 of FIG. Here, the shape of the opening pattern is regarded as a matrix of N rows and N columns in which “1” or “0” is assigned to each element (for example, N is 13). In the following description, the matrix is represented by a binary number sequence (hereinafter referred to as “sequence”) having a length (N × N).

In the opening pattern determination process, first, “1” or “0” is irregularly assigned to (N × N) element positions of a sequence, thereby making R sequences different from each other (hereinafter referred to as “initial sequence”). .) Is generated (step S151). Subsequently, when an image is captured using the opening pattern indicated by each initial sequence, the restoration accuracy of the image restored from the image (for example, the difference between the true image and the restored image) is shown. An evaluation value is obtained for each direction (step S152). Specifically, the frequency is ξ, the representative spectrum in each direction is S _ξ , the aperture pattern indicated by each initial sequence is Fourier-transformed with respect to each direction, K _ξ , and the noise level of the imaging unit 2 is σ. The evaluation value R in each direction of the initial sequence is obtained using Equation 2 similar to Equation 12 in Non-Patent Document 1.

  Thereafter, a sum of evaluation values in a plurality of (all) directions for each initial sequence is further obtained, and 1 to Mth (where M is 2 or more and smaller than R) of R initial sequences. Each of the M initial sequences having a small evaluation value sum is selected as a candidate sequence (step S153).

  Subsequently, of the M candidate sequences, two candidate sequences are randomly selected and duplicated, and two duplicate sequences are prepared (step S154). Element positions (sequence position values) in a sequence are selected with a predetermined probability c1 (for example, 0.2), and the element position values in the two duplicate sequences are exchanged to obtain two new sequences. (That is, crossover is performed) (step S155). In each of the two sequences, the element position of the sequence is selected with a predetermined probability c2 (for example, 0.05), and the value “1” or “0” of the element position is set to “0” or “1”. (Ie, a mutation is made). Thereby, two new candidate sequences are generated and added to the M candidate sequences (step S156). The processes in steps S154 to S156 are repeated until the number of candidate sequences becomes R (step S157).

  Subsequently, the R candidate sequences acquired in the immediately preceding step S157 are used as R initial sequences (that is, the generation is updated), and the processes in steps S152 to S157 are repeated (step S158). The process in step S158 is repeated a predetermined number of times (here, (G-1) times), with R candidate sequences acquired in the immediately previous step S157 as R initial sequences. Thereby, (R × G) candidate sequences, that is, (R × G) candidate patterns of the opening pattern are prepared.

Then, as in the process of step S152, the evaluation value R for each direction of the (R × G) candidate patterns is obtained from Equation 2 (for candidate patterns for which evaluation values have already been obtained, Value may be used). At this time, K _ξ in _Equation 2 is a Fourier transform of the candidate pattern with respect to each direction. Then, for each candidate pattern, the sum of evaluation values in all directions is obtained as a final evaluation value, and one candidate pattern having the lowest final evaluation value is used in the imaging unit 2. It is determined as an optimization pattern indicating a pattern (step S159). The final evaluation value may be another value (for example, an average value, a median value, a maximum value, or a minimum value) based on the evaluation values in a plurality of directions (all directions) (in step S153). The same applies to the selection of candidate sequences).

  FIG. 5 is a diagram illustrating an example of the optimization pattern. In the process related to the design of the aperture pattern, an aperture pattern 221 (aperture stop) is created using the black region as the light-transmitting region and the white region as the light-shielding region in FIG. 5 (step S16). The opening pattern 221 is attached to the optical system 22 of the imaging unit 2 (in place of the opening pattern having a circular light-transmitting region) (step S17).

  In the alignment apparatus 1, a point spread function (PSF) that is an image of a point light source is acquired using the imaging unit 2 in which the aperture pattern 221 is attached to the optical system 22 (step S18). Here, the point spread function is acquired for each of a plurality of defocus amounts, with the distance on the optical axis between the point light source to be imaged and the ideal focus position (focus position) as the defocus amount. The The point spread function is stored in the calculation unit 41. Note that the point spread function may be obtained by calculation based on the optimization pattern. With the above process, the process related to the opening pattern design, which is a preliminary preparation for the alignment process of the substrate 9, is completed.

  FIG. 6 is a diagram showing the flow of the alignment process for the substrate 9 in the alignment apparatus 1. In the alignment apparatus 1, first, the substrate 9 placed on the stage 31 is imaged by the imaging unit 2, and an image (hereinafter referred to as “target image”) is acquired (step S21). The target image is output to the calculation unit 41 of the computer 4. Here, for example, the alignment mark 91 shown in FIG. 7 is formed on the substrate 9, and the imaging region on the substrate 9 by the imaging unit 2 includes the alignment mark 91 that is an imaging target. That is, in the process of step S21, a target image indicating an imaging target of the same category as the plurality of images prepared in the process of step S11 of FIG. 3 is acquired.

  The image restoration unit 411 determines whether or not the target image is a blurred image based on, for example, the contrast of the target image, the spread of the histogram of pixel values, and the like. Then, when the target image is a blurred image, a restored image is acquired from the target image using the point spread function prepared in advance in the process of step S18 of FIG. 3 (step S22). In obtaining the restored image, for example, the well-known Wiener deconvolution is used. Here, a plurality of restored image candidates are acquired by Wiener deconvolution while changing each of the defocus amount and the noise level in a plurality of ways, and the one with the highest contrast among the plurality of restored image candidates is determined as the restored image. Is done. That is, the defocus amount and the noise level are acquired simultaneously with the acquisition of the restored image. In acquiring the restored image, the noise level acquired in step S14 may be used. In the alignment apparatus 1, a laser length measuring device may be provided, and a restored image may be acquired using a defocus amount obtained from a measurement result of the laser length measuring device.

  When the restored image is acquired, the position deviation amount acquisition unit 412 determines the position of the alignment mark 91 in the restored image by pattern matching between the restored image including the alignment mark 91 and the template image indicating the ideal alignment mark. Identified. Since the positional relationship between the imaging region by the imaging unit 2 and a reference position predetermined in the alignment apparatus 1, that is, the distance in the X direction and the Y direction between the imaging region and the reference position is known, the distance Then, using the position of the alignment mark 91 in the restored image, the amount of displacement from the reference position of the alignment mark 91 on the substrate 9 is obtained (step S23). At this time, the direction of the alignment mark 91 on the substrate 9 is also specified. The orientation of the alignment mark 91 is an inclination angle with respect to a predetermined reference direction on the XY plane. Usually, the substrate 9 is adjusted to some extent and positioned and placed on the stage 31. The inclination angle is very small.

  Then, the control unit 42 controls the moving mechanism 3 based on the displacement amount and the orientation of the alignment mark 91, so that the substrate 9 moves and rotates, and the alignment mark 91 is arranged at the reference position in a predetermined orientation. (Step S24). This makes it possible to perform various processes on the substrate 9 with high accuracy.

  FIG. 8 is an image generated by simulation of a blurred image of the alignment mark 91 obtained using the opening pattern indicated by the optimization pattern when the defocus amount is 300 micrometers (μm). Is a restored image acquired from the blurred image of FIG. It can be seen from FIG. 9 that a restored image with high restoration accuracy can be obtained by using the opening pattern.

  In addition, for each of the three types of alignment marks, a blur image obtained using the opening pattern indicated by the optimization pattern is generated by simulation while changing the defocus amount in a plurality of ways. FIG. 10 shows the relationship between the defocus amount and the score when the score (for example, the correlation coefficient in the normalized correlation) indicating the degree of similarity in pattern matching between the restored image acquired from the blurred image and the template image is obtained. become. From FIG. 10, by using the opening pattern indicated by the optimization pattern, a high score of 0.9 or more can be obtained even when the defocus amount is 300 μm, and pattern matching can be performed with high accuracy. It turns out that it becomes. The score may be another value indicating the degree of similarity, such as the sum of absolute values of differences between the restored image and the template image.

  Here, an opening pattern of a comparative example having a general circular translucent region will be described. When the opening pattern of the comparative example is used, the blurred image shown in FIG. 11 is acquired by simulation under the condition that the defocus amount is 300 μm, and the restored image shown in FIG. 12 is obtained from the blurred image. As shown in FIG. 12, the restored image in the case of using the opening pattern of the comparative example has lower restoration accuracy than the restored image of FIG. FIG. 13 is a diagram illustrating a relationship between the defocus amount and the score when the opening pattern of the comparative example is used, and corresponds to FIG. When using the opening pattern of the comparative example, when the defocus amount is 300 μm, depending on the type of alignment mark, the score (for example, the score in the restored image in FIG. 12) may be less than 0.9, and pattern matching may fail. There is sex.

  Moreover, when using the opening pattern produced | generated by the method of a nonpatent literature 1 as another comparative example, the blur image shown in FIG. 14 is acquired by simulation on the conditions whose defocus amount is 300 micrometers, The said blur image Thus, the restored image shown in FIG. 15 is obtained. As shown in FIG. 15, the restored image in the case of using the opening pattern of another comparative example has lower restoration accuracy than the restored image of FIG. 9. FIG. 16 is a diagram illustrating the relationship between the defocus amount and the score when the opening pattern of another comparative example is used, and is a diagram corresponding to FIG. When using the opening pattern of another comparative example, when the defocus amount is 300 μm, depending on the type of alignment mark, the score (for example, the score in the restored image in FIG. 15) is less than 0.9, and pattern matching fails. there's a possibility that.

  As described above, in designing the opening pattern, a plurality of images each representing a plurality of alignment marks are prepared, and a representative spectrum is acquired from a plurality of power spectra in the plurality of images in each direction. In addition, a plurality of candidate patterns of opening patterns are prepared, and an evaluation value indicating the restoration accuracy of an image captured using each candidate pattern is obtained for each direction using the noise level and the representative spectrum in the imaging unit 2. Is required. Then, by obtaining final evaluation values from evaluation values in a plurality of directions for each candidate pattern, an opening pattern used in the imaging unit 2 is determined from the plurality of candidate patterns. Thereby, it is possible to determine an appropriate opening pattern for the alignment mark. As a result, the alignment device 1 in which the opening pattern 221 is provided in the imaging unit 2 can accurately restore an image as an image restoration device, and the alignment mark 91 on the substrate 9 is accurately arranged at the reference position. It becomes possible.

  In designing the aperture pattern, the aperture pattern can be determined more appropriately by obtaining the evaluation value using the noise level measured for the image sensor 23 of the imaging unit 2.

  The imaging target in the opening pattern design may be other than the alignment mark, and the target on which the imaging target is formed may be other than the substrate. For example, when a human face is to be imaged, a plurality of images each showing a plurality of human faces are prepared in step S11 in the process related to the opening pattern design of FIG. The other processes are the same as described above, whereby an appropriate opening pattern for the human face can be determined. As described above, in the process related to the design of the opening pattern, by preparing a plurality of images respectively indicating a plurality of imaging targets belonging to the same category in step S11, an appropriate opening pattern corresponding to the category is determined. Can do. As a result, in the image restoration apparatus including the imaging unit 2 and the image restoration unit 411, a restored image can be accurately acquired from an image obtained by imaging an imaging target belonging to the category.

  The opening pattern design process can be modified in various ways. For example, in steps S152 and S159 in FIG. 4, the evaluation value for each candidate pattern may be obtained using an expression obtained by appropriately correcting Expression 2 or an expression different from Expression 2. Further, the opening pattern determination process may be performed by a method other than the genetic algorithm. Furthermore, the representative spectrum may be acquired from one image indicating the imaging target belonging to one category. In this case, the power spectrum in each direction in the one image is acquired as the representative spectrum.

  The imaging unit 2 may acquire an image using an electron beam or the like. Further, the image restoration apparatus including the imaging unit 2 and the image restoration unit 411 may be provided in another apparatus (for example, an inspection apparatus) that acquires an image in addition to the alignment apparatus 1.

  The configurations in the above-described embodiments and modifications may be combined as appropriate as long as they do not contradict each other.

DESCRIPTION OF SYMBOLS 1 Position alignment apparatus 2 Image pick-up part 3 Movement mechanism 9 Board | substrate 23 Image pick-up element 91 Alignment mark 221 Opening pattern 411 Image decompression | restoration part 412 Position shift amount acquisition part S11-S18, S21-S24 Step

Claims (7)

A method of designing an aperture pattern used in an imaging unit of an image restoration device,
a) obtaining a power spectrum in each direction in an image indicating an imaging target belonging to one category as a representative spectrum;
b) preparing a plurality of candidate patterns of the opening pattern, and using the noise level and the representative spectrum in the imaging unit to calculate an evaluation value indicating the restoration accuracy of an image captured using each candidate pattern in each direction Determining an opening pattern used in the imaging unit from the plurality of candidate patterns by obtaining a final evaluation value from evaluation values in a plurality of directions for each candidate pattern;
A method for designing an opening pattern, comprising: A method for designing an opening pattern according to claim 1,
Step a)
a1) preparing a plurality of images respectively indicating a plurality of imaging targets belonging to the category;
a2) obtaining a plurality of power spectra in the plurality of images with respect to each direction;
a3) obtaining the representative spectrum by obtaining a representative value of the values of the plurality of power spectra at each frequency with respect to each direction;
A method for designing an opening pattern, comprising: An opening pattern design method according to claim 1 or 2,
With the frequency ξ, the representative spectrum S _ξ , Fourier transform of each candidate pattern K _ξ , and the noise level σ, the evaluation value R of each candidate pattern is
A method for designing an opening pattern, characterized in that A method for designing an opening pattern according to any one of claims 1 to 3,
The method for designing an opening pattern, further comprising a step of measuring a noise level in the image pickup device of the image pickup unit before the step b). An image restoration method,
A step of acquiring an image by imaging an imaging target belonging to the category by the imaging unit having the opening pattern determined by the opening pattern design method according to claim 1;
Obtaining a restored image from the image using a point spread function prepared in advance for the opening pattern;
An image restoration method comprising: An image restoration device,
An imaging unit having an opening pattern determined by the opening pattern design method according to any one of claims 1 to 4,
An image restoration unit that obtains a restored image using a point spread function stored in advance for the aperture pattern from an image obtained by imaging an imaging target belonging to the category by the imaging unit;
An image restoration apparatus comprising: The image restoration device according to claim 6,
A positional deviation amount acquisition unit for obtaining a positional deviation amount from a reference position of the imaging target by pattern matching between the restored image of the imaging target that is an alignment mark and a template image;
A moving mechanism that holds the object on which the imaging object is formed and moves the object based on the amount of positional deviation to place the imaging object at the reference position;
An image restoration apparatus further comprising: