JP6031649B2 - Organic electroluminescent device, organic electroluminescent device manufacturing method, and electronic apparatus - Google Patents

Description

  The present disclosure relates to an organic electric field display device that emits light using an organic electroluminescence (EL) phenomenon, a manufacturing method thereof, and an electronic device.

  As the development of the information and telecommunications industry accelerates, display devices with high performance are required. Among them, the organic EL element attracting attention as a next-generation display element has an advantage of not only a wide viewing angle and excellent contrast but also a quick response time as a spontaneous emission type display element.

  The organic EL element has a configuration in which a plurality of layers including a light emitting layer are stacked, and these layers are formed by, for example, a vacuum evaporation method. Specifically, a method of patterning a layer having a desired shape by sandwiching a mask having an opening between a vapor deposition source and a substrate is common. In a display device using such an organic EL element, when the size is increased or the definition is increased, the mask is bent and the conveyance becomes complicated, so that alignment becomes difficult and the aperture ratio is lowered. For this reason, element characteristics deteriorate.

  On the other hand, for example, Patent Documents 1 and 2 disclose a pattern manufacturing method using thermal transfer. However, in this method, since a laser is used as a heat source, an enormous cost is required for the entire manufacturing apparatus.

  Therefore, as a technique for manufacturing a high-definition display device by an inexpensive manufacturing process, a reversal printing method using a silicon rubber blanket (hereinafter simply referred to as a blanket) has been proposed (for example, Patent Documents 3 to 5). In this reverse printing method, after applying an ink containing a light emitting material on a blanket, an unnecessary area (non-printing pattern) in the ink layer is selectively removed using an intaglio. Thus, the light emitting layer is formed by transfer using the blanket on which the printed pattern is formed.

  In addition, in order to obtain a good pattern using such a reverse printing method, it is important that the film formed on the blanket maintains an appropriate humidity. Patent Documents 3 and 4 describe that when an ink is applied on a blanket, the blanket is swollen by a solvent contained in the ink.

JP 1997-167684 A JP 2002-216957 A JP 2007-95517 A JP 2007-90698 A JP 2010-58330 A

  However, if the blanket is swollen as in the methods described in Patent Documents 3 and 4, a new pattern defect is caused due to this, so that improvement is desired.

  The present disclosure has been made in view of such problems, and an object of the present disclosure is to provide an organic electroluminescent device capable of suppressing deterioration in element characteristics by a simple and inexpensive manufacturing process, a method for manufacturing the organic electroluminescent device, and To provide electronic equipment.

An organic electroluminescence device of the present disclosure includes a first electrode, first to third light-emitting layers made of an organic material and disposed on the first electrode, and having different colors, and first to third light-emitting layers. A second thin film layer provided on the first electrode side of the second light emitting layer, and a first thin film layer including a first organic material that is a light emitting material or a charge transporting material; And a second thin film layer including a second organic material which is a light emitting material or a charge transporting material, and is provided on the second electrode side of one light emitting layer. At least one of the first and second organic materials is a charge transporting material, and the first organic material is included between the third light emitting layer and the first electrode in order from the first electrode side. A third thin film layer and a fourth thin film layer containing a second organic material are stacked .

A method of manufacturing an organic electroluminescent device according to the present disclosure includes a step of forming a first electrode, and a light emitting layer formation that forms first to third light emitting layers made of an organic material and having different colors on the first electrode. And a step of forming a second electrode on the first to third light emitting layers. In the light emitting layer forming step , the first light emitting layer is formed using an intaglio in a selective region on the first blanket swollen with a solution containing the first organic material which is a light emitting material or a charge transporting material. After forming the first light emitting layer by transferring from the first blanket , the second light emitting layer includes a second organic material that is a light emitting material or a charge transporting material. It forms by using the intaglio in the selective area | region on the 2nd blanket swollen with the solution, and transferring from on the 2nd blanket. At least one of the first and second organic materials is a charge transport material.

In the organic electroluminescent device and the manufacturing method thereof of the present disclosure, the first thin film layer including the first organic material that is the light emitting material or the charge transporting material is formed on the first electrode side of the second light emitting layer, A second thin film layer containing a second organic material that is a light emitting material or a charge transporting material is formed on the second electrode side of the first light emitting layer. When at least one of the first and second organic materials is a charge transport material, a light emitting material of another color adheres to at least one light emitting layer of the first and second light emitting layers. Is suppressed.

  An electronic apparatus according to the present disclosure includes the organic electroluminescent device.

According to the organic electroluminescent device, the manufacturing method thereof, and the electronic apparatus of the present disclosure, the first thin film including the first organic material that is the light emitting material or the charge transporting material on the first electrode side of the second light emitting layer. A layer is formed, and a second thin film layer containing a second organic material that is a light emitting material or a charge transporting material is formed on the second electrode side of the first light emitting layer. Thus, the light emitting layer can be formed while suppressing color mixing of the light emitting materials of the respective colors without going through a vacuum vapor deposition process using a high-definition mask or a thermal transfer process using a laser. Therefore, it is possible to suppress deterioration of element characteristics by a simple and inexpensive manufacturing process.

3 is a cross-sectional view illustrating a configuration of a display device according to a first embodiment of the present disclosure. FIG. FIG. 2 is a schematic diagram illustrating a circuit configuration example of a drive substrate of the display device illustrated in FIG. 1. FIG. 2 is an equivalent circuit diagram illustrating an example of a pixel circuit of the display device illustrated in FIG. 1. FIG. 2 is a cross-sectional view illustrating a configuration example of a drive substrate illustrated in FIG. 1. It is a cross-sectional schematic diagram showing the detailed structure of the organic EL element shown in FIG. It is sectional drawing for demonstrating the manufacturing method of the display apparatus shown in FIG. FIG. 7 is a cross-sectional view illustrating a process following FIG. 6. It is sectional drawing showing the process (R, G light emitting layer formation process) following FIG. It is a schematic diagram for demonstrating the specific procedure of the process shown in FIG. FIG. 10 is a schematic diagram illustrating a process following FIG. 9. It is a schematic diagram showing the process of following FIG. FIG. 12 is a schematic diagram illustrating a process following FIG. 11. It is a schematic diagram showing the process following FIG. It is a schematic diagram showing the process following FIG. (A) is an element substrate after G light emitting layer formation, (B) is a cross-sectional schematic diagram showing each detailed structure of the element substrate after R light emitting layer formation. It is sectional drawing showing the process (B light emitting layer formation process) following FIG. FIG. 17 is a cross-sectional diagram illustrating a process following the process in FIG. 16. FIG. 18 is a cross-sectional diagram illustrating a process following the process in FIG. 17. It is a cross-sectional schematic diagram showing the detailed structure of the organic EL element which concerns on a comparative example. It is sectional drawing showing the detailed structure of the organic EL element in the display apparatus which concerns on 2nd Embodiment of this indication. It is a schematic diagram for demonstrating the layer state of the surface before the transfer of the blanket used at the time of red light emitting layer formation of the organic EL element shown in FIG. 10 is a cross-sectional view illustrating a detailed configuration of an organic EL element according to Modification 1. FIG. 10 is a cross-sectional view illustrating a detailed configuration of an organic EL element according to Modification 2. FIG. FIG. 24 is a cross-sectional view illustrating another configuration example of the organic EL element illustrated in FIG. 23. FIG. 24 is a cross-sectional view illustrating another configuration example of the organic EL element illustrated in FIG. 23. 10 is a cross-sectional view illustrating a detailed configuration of an organic EL element according to Modification 3. FIG. It is a perspective view showing the structure of the smart phone using a display apparatus. It is a perspective view showing the structure of the television apparatus using a display apparatus. It is a perspective view showing the structure of the digital still camera using a display apparatus. It is a perspective view showing the appearance of a personal computer using a display device. It is a perspective view showing the external appearance of the video camera using a display apparatus. It is a top view showing the structure of the mobile telephone using a display apparatus.

Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The description will be given in the following order.
1. First embodiment (an example in which a blanket is swollen with a solution containing a hole transporting material only when a green light emitting layer is formed)
2. Second Embodiment (Furthermore, when a red light emitting layer is formed, the blanket is swollen with a solution containing an electron transporting material)
3. Modification 1 (example in which a blanket is swollen with a solution containing an electron transporting material only when a red light emitting layer is formed)
4). Modification 2 (example in which a green light emitting layer is formed after forming a red light emitting layer)
5. Modification 3 (example in which a blanket is swollen with a solution containing a hole transporting material when forming a yellow light emitting layer)
6). Application examples (examples of electronic devices)

<First Embodiment>
[Constitution]
FIG. 1 illustrates a cross-sectional configuration of a display device (display device 1) according to a first embodiment of the present disclosure. The display device 1 is used, for example, as an organic electroluminescent color display. For example, on the driving substrate 10, an organic EL element 10R (red pixel) that generates red light and an organic EL element 10G that generates green light are used. (Green pixels) and a plurality of organic EL elements 10B (blue pixels) that generate blue light are regularly arranged. These organic EL elements 10 </ b> R, 10 </ b> G, and 10 </ b> B are covered with a protective layer 18 and sealed with a sealing substrate 20 through an adhesive layer 19. In this display device 1, a set of organic EL elements 10 R, 10 G, and 10 B adjacent to each other forms one pixel, and three colors of light LR, LG, and LB are received from the upper surface of the sealing substrate 20. It is a top emission display device that emits light. Hereinafter, the configuration of each unit will be described.

(Drive board 10)
FIG. 2 shows a circuit configuration formed on the drive substrate 10 of the display device 1 together with the organic EL elements 10R, 10G, and 10B. In the driving substrate 10, a display region 110A in which, for example, a plurality of organic EL elements 10R, 10G, and 10B are arranged in a matrix is formed on the substrate 110, and a video display driver is provided so as to surround the display region 110A. A signal line driving circuit 120 and a scanning line driving circuit 130 are provided. A plurality of signal lines 120A extending in the column direction are connected to the signal line driving circuit 120, and a plurality of scanning lines 130A extending in the row direction are connected to the scanning line driving circuit 130. Has been. An intersection between each signal line 120A and each scanning line 130A corresponds to one of the organic EL elements 10R, 10G, and 10B. In addition to this, a power line driving circuit (not shown) is provided in the peripheral area of the display area 110A.

  FIG. 3 illustrates an example of the pixel circuit 140 provided in the display region 110A. The pixel circuit 140 includes, for example, a driving transistor Tr1 and a writing transistor Tr2 (corresponding to a TFT 111 described later), a capacitor (holding capacity) Cs between these transistors Tr1 and Tr2, a first power supply line (Vcc), and a second Organic EL elements 10R, 10G, and 10B connected in series to the drive transistor Tr1 between the power supply lines (GND). The drive transistor Tr1 and the write transistor Tr2 are configured by a general thin film transistor (TFT), and the configuration may be, for example, an inverted staggered structure (so-called bottom gate type) or a staggered structure (top gate type). . With such a configuration, an image signal is supplied from the signal line driver circuit 120 to the source (or drain) of the writing transistor Tr2 via the signal line 120A. A scanning signal is supplied from the scanning line driving circuit 130 to the gate of the writing transistor Tr2 via the scanning line 130A.

  FIG. 4 shows a detailed cross-sectional configuration of the drive substrate 10 (configuration of the TFT 111) together with schematic configurations of the organic EL elements 10R, 10G, and 10B. On the drive substrate 10, TFTs 111 corresponding to the drive transistor Tr1 and the write transistor Tr2 are formed. In the TFT 111, for example, a gate electrode 1101 is disposed in a selective region on the substrate 110, and a semiconductor layer 1104 is formed on the gate electrode 1101 through gate insulating films 1102 and 1103. A channel protective film 1105 is provided over a region serving as a channel (a region facing the gate electrode 1101) of the semiconductor layer 1104. A pair of source / drain electrodes 1106 are electrically connected to the semiconductor layer 1104. A planarization layer 112 is formed over the entire surface of the substrate 110 so as to cover the TFT 111.

  The substrate 110 is made of, for example, a glass substrate or a plastic substrate. Alternatively, the substrate 110 may be an insulating surface of quartz, silicon, metal, or the like. Moreover, it may have flexibility or may have rigid properties.

  The gate electrode 1101 serves to control the carrier density in the semiconductor layer 1104 by the gate voltage applied to the TFT 111. The gate electrode 1101 is composed of a single layer film made of, for example, one of Mo, Al, and an aluminum alloy, or a laminated film made of two or more kinds. Examples of the aluminum alloy include an aluminum-neodymium alloy.

The gate insulating films 1102 and 1103 are formed of a single type of silicon oxide film (SiO _x ), silicon nitride (SiN _x ), silicon nitride oxide (SiON), aluminum oxide (Al ₂ O ₂ ), or the like. It is a layer film or a laminated film composed of two or more of these. Here, the gate insulating film 1102 is made of, for example, SiO ₂ , and the gate insulating film 1103 is made of, for example, Si ₃ N ₄ . The total film thickness of the gate insulating films 1102 and 1103 is, for example, 200 nm to 300 nm.

  The semiconductor layer 1104 is made of an oxide semiconductor containing, as a main component, at least one oxide of indium (In), gallium (Ga), zinc (Zn), tin (Sn), Al, and Ti, for example. The semiconductor layer 1104 forms a channel between the pair of source / drain electrodes 1106 by applying a gate voltage. The film thickness of the semiconductor layer 1104 is preferably such that it does not cause deterioration of the on-state current of the thin film transistor so that the negative charge described later affects the channel, and specifically, it is preferably 5 nm to 100 nm. .

The channel protective film 1105 is formed on the semiconductor layer 1104 and prevents the channel from being damaged when the source / drain electrode 1106 is formed. The channel protective film 1105 is made of an insulating film containing, for example, silicon (Si), oxygen (O ₂ ), and fluorine (F), and has a thickness of, for example, 10 to 300 nm.

  The source / drain electrode 1106 functions as a source or a drain. For example, the source / drain electrode 1106 is a single electrode made of one of molybdenum (Mo), aluminum (Al), copper (Cu), titanium, ITO, titanium oxide (TiO), and the like. It is a layer film or a laminated film composed of two or more of them. For example, a metal or metal compound having a weak bond with oxygen, such as a three-layer film laminated in the order of Mo, Al, and Mo in a thickness of 50 nm, 500 nm, and 50 nm, or a metal compound containing oxygen such as ITO and titanium oxide It is desirable to use Accordingly, the electrical characteristics of the oxide semiconductor can be stably maintained.

  The planarization layer 112 is made of an organic material such as polyimide or novolac, for example. The thickness of the planarization layer 112 is, for example, 10 nm to 100 nm, and preferably 50 nm or less. On the planarization layer 112, the anode electrode 12 of the organic EL element 10 is formed.

  The planarizing film 112 is provided with a contact hole H, and the source / drain electrode 1106 and the first electrodes 11 of the organic EL elements 10R, 10G, and 10B are electrically connected through the contact hole H. ing. The first electrode 11 is electrically separated for each pixel by an insulating film 12, and an organic layer 14 and a second electrode 16 including each color light emitting layer described later are stacked on the first electrode 11. The detailed configuration of the organic EL elements 10R, 10G, and 10B will be described later.

The protective layer 18 is for preventing moisture from entering the organic EL elements 10R, 10G, and 10B, and is made of a material having low permeability and low water permeability, and has a thickness of, for example, 2 to 3 μm. The protective layer 18 may be made of either an insulating material or a conductive material. Insulating materials include inorganic amorphous insulating materials such as amorphous silicon (α-Si), amorphous silicon carbide (α-SiC), amorphous silicon nitride (α-Si _1-x N _x ), amorphous carbon (α -C). Such an inorganic amorphous insulating material does not constitute grains, and thus has low water permeability and becomes a good protective film.

  The sealing substrate 20 seals the organic EL elements 10R, 10G, and 10B together with the adhesive layer 19. The sealing substrate 20 is made of a material such as glass that is transparent to the light generated in the organic EL element 10. The sealing substrate 20 may be provided with, for example, a color filter and a black matrix (both not shown). In this case, each color light generated in the organic EL elements 10R, 10G, and 10B is taken out. The contrast can be improved by absorbing the external light reflected in the organic EL elements 10R, 10G, and 10B.

(Organic EL elements 10R, 10G, 10B)
Each of the organic EL elements 10R, 10G, and 10B has, for example, a top emission type (top emission type) element structure. However, it is not limited to such a configuration, and may be, for example, a transmission type that extracts light from the substrate 110 side, that is, a bottom emission type (bottom emission type).

  The organic EL element 10R is formed in the opening of the insulating film 12. For example, on the first electrode 11, a hole injection layer (HIL) 13B, a hole transport layer (HTL) 13A, a red light emitting layer 14R, a blue light emitting layer 14B, an electron transport layer (ETL) 15A, an electron injection layer (EIL) 15B, and a second electrode 16 are laminated in this order. The same applies to the organic EL element 10G. For example, the organic EL element 10G has a stacked structure in which the red light emitting layer 14R in the stacked structure of the organic EL element 10R is replaced with the green light emitting layer 14G. In the organic EL element 10B, for example, a hole injection layer 13B, a hole transport layer 13A, a blue light emitting layer 14B, an electron transport layer 15A, an electron injection layer 15B, and a second electrode 16 are stacked on the first electrode 11 in this order. It has been done. Thus, in the present embodiment, the red light emitting layer 14R and the green light emitting layer 14G are formed separately for each pixel, and the blue light emitting layer 14B is formed over the entire display region 110A in common to each pixel. Has been. The other hole injection layer 13B, hole transport layer 13A, electron transport layer 15A and electron injection layer 15B are provided in common for each pixel. Although details will be described later, these organic EL elements 10R, 10G, and 10B further include a charge transporting thin film layer (such as a hole transporting layer 17a1) formed during printing of the light emitting layer.

  The first electrode 11 functions as, for example, an anode. When the display device 1 is a top emission type, the first electrode 11 is made of a highly reflective material such as aluminum, titanium, or chromium (Cr). In the case of the bottom emission type, for example, a transparent conductive film such as ITO, IZO, IGZO or the like is used.

The insulating film 12 electrically insulates the organic light emitting elements 10R, 10G, and 10B and partitions the light emitting region of each pixel. The insulating film 12 is provided with a plurality of openings, and any one of the organic light emitting elements 10R, 10G, and 10B is formed in each opening. The insulating film 12 is made of an organic material such as polyimide, novolac resin, or acrylic resin. Alternatively, the insulating film 12 may be configured by laminating an organic material and an inorganic material. As the inorganic materials, for example SiO _2, SiO, SiC, include SiN.

  The hole injection layer 13B is a buffer layer for increasing the efficiency of hole injection into each color light emitting layer and preventing leakage. The thickness of the hole injection layer 13B is preferably, for example, 5 nm to 200 nm, and more preferably 8 nm to 150 nm. The constituent material of the hole injection layer 13B may be appropriately selected in relation to the material of an adjacent layer such as an electrode. For example, polyaniline, polythiophene, polypyrrole, polyphenylene vinylene, polythienylene vinylene, polyquinoline, polyquinoxaline And derivatives thereof, conductive polymers such as polymers containing an aromatic amine structure in the main chain or side chain, metal phthalocyanines (such as copper phthalocyanine), and carbon. Specific examples of the conductive polymer include oligoaniline and polydioxythiophene such as poly (3,4-ethylenedioxythiophene) (PEDOT).

  The hole transport layer 13A is for increasing the hole transport efficiency to each color light emitting layer. Although the thickness of the hole transport layer 13A depends on the entire configuration of the element, it is preferably, for example, 5 nm to 200 nm, and more preferably 8 nm to 150 nm. As a material constituting the hole transport layer 13A, a polymer material soluble in an organic solvent, for example, polyvinyl carbazole, polyfluorene, polyaniline, polysilane or a derivative thereof, a poly having an aromatic amine in a side chain or a main chain. It is composed of a siloxane derivative, polythiophene and its derivative, polypyrrole, Alq3, or 4,4′-bis (N-1-naphthyl-N-phenylamino) biphenyl (α-NPD).

  Each of the red light emitting layer 14R, the green light emitting layer 14G, and the blue light emitting layer 14B emits light by causing recombination of electrons and holes when an electric field is applied. Although the thickness of each color light emitting layer depends on the overall structure of the device, it is preferably, for example, 10 nm to 200 nm, and more preferably 20 nm to 150 nm.

  The material constituting the red light-emitting layer 14R, the green light-emitting layer 14G, and the blue light-emitting layer 14B may be any material corresponding to each light emission color, and may be a polymer material (molecular weight is, for example, 5000 or more). , May be a low molecular material (molecular weight is, for example, 5000 or less). In the case of a low molecular material, for example, a mixed material of two or more of a host material and a dopant material is used. In the case of a polymer material, for example, it is used in an ink state dissolved in an organic solvent. Further, a mixed material of these low molecular materials and high molecular materials may be used.

  Examples of polymer materials include polyfluorene polymer derivatives, (poly) paraphenylene vinylene derivatives, polyphenylene derivatives, polyvinyl carbazole derivatives, polythiophene derivatives, perylene dyes, coumarin dyes, rhodamine dyes, and dopants to these materials. What mixed the material is mentioned. Examples of the dopant material include rubrene, perylene, 9,10-diphenylanthracene, tetraphenylbutadiene, Nile red, coumarin 6 and the like. Examples of low molecular weight materials include benzine, styrylamine, triphenylamine, porphyrin, triphenylene, azatriphenylene, tetracyanoquinodimethane, triazole, imidazole, oxadiazole, polyarylalkane, phenylenediamine, arylamine, oxazole, and anthracene. , Fluorenone, hydrazone, stilbene or derivatives thereof, or heterocyclic conjugated monomers or oligomers such as polysilane compounds, vinylcarbazole compounds, thiophene compounds or aniline compounds. In addition to such materials, each color light-emitting layer may contain, as a guest material, a material with high luminous efficiency, such as a low-molecular fluorescent material, a phosphorescent dye, or a metal complex.

  The electron transport layer 15A is for increasing the efficiency of electron transport to each color light emitting layer. As a constituent material of the electron transport layer 15A, an organic material having excellent electron transport performance is preferably used. Specific examples include arylpyridine derivatives and benzimidazole derivatives. Although the total film thickness of the electron transport layer 15A and the electron injection layer 15B depends on the entire structure of the device, it is preferably 5 nm to 200 nm, and more preferably 10 nm to 180 nm, for example.

  The electron injection layer 15B is for increasing the efficiency of electron injection into each color light emitting layer. Examples of the constituent material of the electron injection layer 15B include alkali metals, alkaline earth metals, rare earth metals and their oxides, composite oxides, fluorides, carbonates, and the like.

  For example, the second electrode 16 has a thickness of about 10 nm, and in the case of a top emission type, a light-transmitting conductive film material, for example, a single layer film such as ITO, IZO, ZnO, InSnZnO, MgAg, or Ag, It consists of a laminated film containing two or more of these. In the case of the bottom emission type, for example, a highly reflective material such as aluminum, AlSiC, titanium, or chromium is used.

(Detailed configuration of organic EL elements 10R, 10G, and 10B)
In the present embodiment, the organic EL elements 10R, 10G, and 10B are microscopically, in addition to the various functional layers described above, a thin film layer (hole transporting thin film layer 17a1, red light emission) as described below. Thin film layer 17r).

  FIG. 5 schematically shows a laminated structure of the organic EL elements 10R, 10G, and 10B. As described above, among the organic EL elements 10R, 10G, and 10B, in the organic EL elements 10R and 10G, the red light emitting layer 14R and the green light emitting layer 14G are formed separately for each pixel. On the other hand, in the organic EL element 10R, the blue light emitting layer 14B is formed extending to the formation region of the organic EL elements 10R and 10G. In other words, of the three color light-emitting layers, two color light-emitting layers (red light-emitting layer 14R and green light-emitting layer 14G) are formed on the drive substrate 11 in a predetermined pattern (for example, a line or matrix pattern). ing. The red light emitting layer 14R and the green light emitting layer 14G can be formed by reversal printing using a blanket, as will be described in detail later.

  Among these red light emitting layer 14R, green light emitting layer 14G, and blue light emitting layer 14B, the red light emitting layer 14R is on the first electrode 11 side (specifically, between the red light emitting layer 14R and the hole transport layer 13A). The hole transporting thin film layer 17a1 is formed. In the organic EL element 10B, the hole transporting thin film layer 17a1 is on the first electrode 11 side of the blue light emitting layer 14B (specifically, between a red light emitting thin film layer 17r described later and the hole transporting layer 13A). Also formed. In other words, the hole transporting thin film layer 17a1 is provided under each light emitting layer in a region excluding the formation region of the organic EL element 10G (formation region of the organic EL elements 10R and 10B).

  The hole transporting thin film layer 17a1 includes a hole transporting material and has a thickness of, for example, 0.1 nm to 20 nm. As the constituent material of the hole transporting thin film layer 17a1, the same materials as those mentioned for the hole transporting layer 13A are used. The hole transporting thin film layer 17a1 and the hole transporting layer 13A may be made of the same material or different materials. The hole transporting thin film layer 17a1 is a layer formed by swelling a blanket with a solution containing a hole transporting material in the printing process of the green light emitting layer 14G.

  On the other hand, on the second electrode 16 side of the green light emitting layer 14G (specifically, between the green light emitting layer 14G and the blue light emitting layer 14B), a red light emitting thin film layer 17r is formed. The red light-emitting thin film layer 17r is also formed on the first electrode 11 side of the blue light-emitting layer 14B (specifically, between the hole-transporting thin film layer 17a1 and the blue light-emitting layer 14B) in the organic EL element 10B. Has been. In other words, the red light-emitting thin film layer 17r is provided in a region excluding the formation region of the organic EL element 10R (formation region of the organic EL elements 10G and 10B). In the organic EL element 10G, the organic EL element is formed on the green light-emitting layer 14G. In the element 10B, it is provided under the blue light emitting layer 14B.

  The red light-emitting thin film layer 17r includes the red light-emitting material included in the red light-emitting layer 14R, and has a thickness of, for example, 35 nm to 70 nm. The red light-emitting thin film layer 17r is a layer formed by swelling a blanket with a solution containing a red light-emitting material in the printing process of the red light-emitting layer 14R.

  As described above, in this embodiment, for each of the organic EL elements 10R, 10G, and 10B, the film configuration is different on the lower surface side (first electrode 11 side) and the upper surface side (second electrode 16 side) of the light emitting layer. Is different. A hole transporting thin film layer 17a1 is formed on the first electrode 11 side of the red light emitting layer 14R, and a red light emitting thin film layer 17r is formed on the second electrode 16 side of the green light emitting layer 14R. In the blue pixel, a hole transporting thin film layer 17a1 and a red light emitting thin film layer 17r are stacked in this order from the first electrode 11 side on the first electrode 11 side of the blue light emitting layer 14B.

[Production method]
The display device 1 as described above can be manufactured, for example, as follows.

  First, as shown in FIG. 6A, the first electrode 11 is formed on the driving substrate 10. At this time, the electrode material described above is formed over the entire surface of the substrate by, for example, vacuum deposition or sputtering, and then patterned by etching using, for example, photolithography. The first electrode 11 is connected to the TFT 111 (specifically, the source / drain electrode 1106) through the contact hole H of the planarization layer 112 formed on the driving substrate 10.

  Subsequently, as shown in FIG. 6B, an insulating film 12 is formed. Specifically, after applying the above-described resin material to the entire surface of the drive substrate 10 by, for example, a spin coating method, an opening is formed in a portion corresponding to the first electrode 11 by using, for example, a photolithography method. Form. After forming the opening, the insulating film 12 may be reflowed as necessary.

  Next, as illustrated in FIG. 7, the hole injection layer 13 </ b> B and the hole transport layer 13 </ b> A are sequentially formed by, for example, vacuum deposition so as to cover the first electrode 11 and the insulating film 12. However, as a method for forming the hole injection layer 13B and the hole transport layer 13A, a direct coating method such as a spin coating method, a slit coating method, or an ink jet method may be used in addition to the vacuum deposition method. Alternatively, a gravure offset method, a relief printing method, an intaglio inversion printing method, or the like may be used.

(G and R light emitting layer forming process)
Next, as shown in FIG. 8, a red light emitting layer 14R is formed in the red pixel region 10R1, and a green light emitting layer 14G is formed in the green pixel region 10G1. At this time, as will be described below, the green light emitting layer 14G and the red light emitting layer 14R are respectively patterned in this order by a reverse printing method using a blanket. The outline is as follows.
1. Formation of green light emitting layer 14G (1) Swelling of blanket using solution containing hole transporting material (2) Applying solution containing green light emitting material on blanket (3) Printing pattern on blanket using intaglio Formation (4) Transfer the printing pattern on the blanket onto the driving substrate 10. Formation of red light emitting layer 14R (1) Application / swelling of solution containing red light emitting material on blanket (2) Formation of printing pattern on blanket using intaglio (3) Transfer of printing pattern on blanket onto driving substrate 10

1. Formation of Green Light-Emitting Layer 14G (1) Swelling Step First, a blanket 60 used for transferring the green light-emitting layer 14G in a subsequent step is prepared, and at least the surface of the blanket 60 is swollen. Specifically, as shown in FIGS. 9A and 9B, a solution D1a containing a hole transporting material is formed over the entire surface of the blanket 60 by, for example, spin coating. As a result, as shown in FIG. 9C, the solution D1a penetrates the surface layer (surface layer S1) of the blanket 60, and the surface layer S1 is swollen by the solvent contained in the solution D1a. Thereby, the surface of the blanket 60 can be maintained at an appropriate humidity, and a favorable film can be formed at the time of transfer in a subsequent process. The amount of swelling of the blanket 60 is desirably such that it causes a volume swelling ratio of 10% or more to a silicon blanket having a thickness of 0.05 mm to 1 mm, for example. Thereafter, if necessary, the excessive layer (S1 ′) of the solution D1a on the blanket 60 is removed by, for example, a spin coating method. Alternatively, when the layer S1 ′ is being dried, it may be removed using an adhesive sheet or the like.

(2) Luminescent Material Application Step Subsequently, a solution D2g containing a green luminescent material is applied and formed over the entire surface of the blanket 60. Specifically, as shown in FIGS. 10A and 10B, the solution D2g is formed over the entire surface of the blanket 60 by a direct coating method such as a spin coating method or a slit coating method. Thus, as shown in FIG. 10C, in the blanket 60, a layer of the solution D2g containing the green light emitting material is formed on the surface layer S1 swollen by the solution D1a containing the hole transporting material.

(3) Print pattern formation process Next, the print pattern layer (print pattern layer 14g1) of the green light emitting layer 14G is formed on the blanket 60. Specifically, first, as shown in FIG. 11 (A), the intaglio 61 having a recess corresponding to the green pixel region 10G1 and the layer of the solution D2g in the blanket 60 face each other. The layer of solution D2g on the blanket 60 is pressed against the intaglio plate 61 as shown in FIG. After that, as shown in FIG. 11C, the blanket 60 is peeled off from the intaglio 61 so that the unnecessary portion (D2g ′) of the layer of the solution D2g is transferred to the convex side of the intaglio 61. The blanket 60 is removed. As a result, a print pattern 14g1 of the green light emitting layer 14G corresponding to the green pixel region is formed on the blanket 60. In the figure, a line pattern is shown, but the pattern shape is not limited to a line shape as long as it is consistent with the TFT pixel arrangement.

(4) Transfer Step Subsequently, the printed pattern layer 14g1 of the green light emitting layer 14G on the blanket 60 is transferred to the drive substrate 10 side. Specifically, first, as shown in FIG. 12A, a drive substrate 10 (hereinafter referred to as drive substrate 10a for convenience) having a hole injection layer 13B and a hole transport layer 13A formed thereon, and a blanket. 60 and face each other. Here, in detail, as shown in FIG. 12B, on the surface of the blanket 60 before transfer, the hole transporting material is formed on the surface of the blanket 60 together with the printed pattern layer 14g1 in the region excluding the printed pattern layer 14g1. A thin film layer (hole transporting thin film layer 17a1) is formed. The hole transporting thin film layer 17a1 is formed by the deposition of a hole transporting material from the solution D1a contained in the surface layer S1 of the blanket 60.

  Thereafter, the drive substrate 10a and the print pattern 14g1 are aligned, and the formation surface of the print pattern layer 14g1 of the blanket 60 is pressed onto the drive substrate 10a as shown in FIG. Next, the blanket 60 is peeled from the drive substrate 10a, whereby the green light emitting layer 14G is patterned on the drive substrate 10a (FIG. 12D). At this time, although not shown in FIG. 12D, the hole transporting thin film layer 17a1 deposited on the blanket 60 is also transferred to the driving substrate 10a at the same time.

2. Formation of Red Light-Emitting Layer 14R (1) Luminescent Material Application / Swelling Step First, a blanket 62 used for transferring the red light-emitting layer 14R in a subsequent step is prepared, and at least the surface of this blanket 62 is swollen. At this time, specifically, as shown in FIGS. 13A and 13B, a solution D2r containing a red light emitting material is applied to the surface of the blanket 62 by, for example, a spin coating method. As a result, as shown in FIG. 13C, the solution D2r penetrates the surface layer (surface layer S1r) of the blanket 62, and the surface layer S1r is swollen by the solvent contained in the solution D2r. As a result, as in the formation of the green light-emitting layer 14, it is possible to form a favorable film during the subsequent transfer process. Thereafter or simultaneously with the swelling step, a layer of the solution D2r containing the red light emitting material is formed on the blanket 62.

(2) Print Pattern Formation Step Next, although not particularly shown, the print pattern layer (print pattern layer) of the red light emitting layer 14R on the blanket 62 is formed using a predetermined intaglio as in the case of the green light emitting layer 14G. 14r1).

(3) Transfer Step Subsequently, the printed pattern layer 14r1 of the red light emitting layer 14r on the blanket 62 is transferred to the drive substrate 10a side. Specifically, first, as shown in FIG. 14A, the drive substrate 10a (specifically, the drive substrate 10a on which the green light emitting layer 14G has been formed) and the blanket 62 are arranged facing each other. Here, in detail, as shown in FIG. 14B, a thin film containing a red light emitting material is formed on the surface of the blanket 62 before transfer together with the printed pattern layer 14r1 in a region excluding the printed pattern layer 14r1. A layer (red light-emitting thin film layer 17r) is formed. This red light-emitting thin film layer 17r is formed by precipitation of a red light-emitting material from the solution D2r contained in the surface layer S1r of the blanket 62.

  Thereafter, the drive substrate 10a and the print pattern 14r1 are aligned, and the formation surface of the print pattern layer 14r1 of the blanket 62 is pressed onto the drive substrate 10a as shown in FIG. 14C. Next, the blanket 62 is peeled from the drive substrate 10a, whereby the red light emitting layer 14R is patterned on the drive substrate 10a (FIG. 14D). At this time, although not shown in FIG. 14D, the red light-emitting thin film layer 17r deposited on the blanket 62 is also transferred to the drive substrate 10a at the same time.

  As described above, in the present embodiment, among the three color light-emitting layers, the green light-emitting layer 14G and the red light-emitting layer 14R are separated and patterned for each pixel by reversal printing using a blanket. Here, when forming the green light emitting layer 14G, the blanket is used in a state swollen by a solution containing a hole transporting material. As a result, as shown in FIG. 15A, the green light emitting layer 14G is formed in the green pixel region 10G1, while the other red pixel region 10R1 and blue pixel region 10B1 have hole transport properties. A thin film layer 17a1 is formed. Thereafter, when the red light emitting layer 14R is formed, a blanket swollen with a solution containing a red light emitting material is used. Thus, after the red light emitting layer 14R is formed, as shown in FIG. 15B, the red light emitting layer 14R is formed in the red pixel region 10R1, and other green pixel regions 10G1 and blue pixel regions are formed. A red light emitting thin film layer 17r is formed on each of 10B1.

  Next, as shown in FIG. 16, the blue light emitting layer 14B is formed over the entire surface of the substrate by, for example, a vacuum evaporation method.

  Subsequently, as shown in FIG. 17, the electron transport layer 15A and the electron injection layer 15B are formed on the blue light emitting layer 14B by, for example, a vacuum deposition method. Thereafter, as shown in FIG. 18, the second electrode 16 is formed on the electron injection layer 15B by, for example, a vacuum deposition method, a CVD method or a sputtering method. Thereby, the organic EL elements 10R, 10G, and 10B are formed on the driving substrate 10.

  Finally, after forming the protective layer 18 so as to cover the organic EL elements 10R, 10G, and 10B on the driving substrate 10, the sealing substrate 20 is bonded through the adhesive layer 19, thereby displaying the display shown in FIG. The apparatus 1 is completed.

[Action, effect]
In the display device 1 of the present embodiment, a scanning signal is supplied to each pixel from the scanning line driving circuit 130 via the gate electrode of the writing transistor Tr2, and an image signal is transmitted from the signal line driving circuit 120 to the writing transistor Tr2. Is held in the holding capacitor Cs. As a result, the drive current Id is injected into the organic EL element 10, and holes and electrons are recombined to emit light. For example, in the case of the top emission type, this light passes through the second electrode 16 and the sealing substrate 20 and is extracted above the display device 1.

  In such a display device 1, in the manufacturing process, as described above, among the three color light emitting layers of R, G, and B, two color light emitting layers (green light emitting layer 14 G and red light emitting layer 14 R) are used as a blanket. Are formed separately for each pixel by reversal printing using. Among these, when forming the green light emitting layer 14G, the blanket to be used is used in a state swollen by a solution containing a hole transporting material.

(Comparative example)
FIG. 19 schematically shows a cross-sectional configuration of a display device according to a comparative example of the present embodiment. In this display device, as in the present embodiment, the first electrode 101 is provided for each of the organic EL elements 100R, 100G, and 100B, and the hole injection layer 102B, the hole transport layer 102A, the electron transport layer 105A, and the electron injection layer. 105B and the second electrode 16 are formed in common for each pixel. The red light emitting layer 104R and the green light emitting layer 104G are separately formed for each pixel, and the blue light emitting layer 104B is formed as a common layer for each pixel. The red light emitting layer 104R and the green light emitting layer 104G are formed by reversal printing using a blanket.

  However, in the display device of the comparative example, when forming the red light emitting layer 104R and the green light emitting layer 104G, a blanket swollen with a solution containing each light emitting material is used. For this reason, the light emitting material is deposited on the blanket surface, and a thin film layer containing the light emitting material is formed in a region other than the desired region. Specifically, a green light-emitting thin film layer 103g containing a green light-emitting material is formed between the red light-emitting layer 104R and the hole transport layer 102A, and between the green light-emitting layer 104G and the blue light-emitting layer 104B. A red light-emitting thin film layer 103r containing a red light-emitting material is formed. In the blue pixel, the green light-emitting thin film layer 103g and the red light-emitting thin film layer 103r are stacked between the blue light-emitting layer 104B and the hole transport layer 102A. For this reason, in the organic EL elements 100R, 100G, and 100B, the emission spectrum is mixed and desired emission efficiency and chromaticity cannot be obtained, resulting in deterioration of element characteristics.

  On the other hand, in this embodiment, when forming the green light emitting layer 14G, the blanket is used in a state swollen by a solution containing a hole transporting material instead of the green light emitting material. Therefore, as shown in FIG. 5, a hole transporting thin film layer 17a1 is formed between the red light emitting layer 14R and the hole transport layer 13A. Also in the blue pixel, the hole transporting thin film layer 17a1 is formed between the blue light emitting layer 14B and the hole transport layer 13A. As a result, adhesion of the green light emitting material to the red light emitting layer 14R and the blue light emitting layer 14B is suppressed (mixing of green light in the red pixel and blue pixel is suppressed), and color mixing of the emission spectrum is suppressed.

  As described above, in the display device 1 according to the present embodiment, the hole transporting thin film layer 17a1 is formed on the first electrode 11 side of the red light emitting layer 14R and the blue light emitting layer 14B. The light emitting layer can be formed while suppressing color mixing of the light emitting materials of the respective colors without going through a vacuum vapor deposition process using a mask or a thermal transfer process using a laser. Therefore, it is possible to suppress deterioration of element characteristics by a simple and inexpensive manufacturing process.

<Second Embodiment>
FIG. 20 schematically illustrates a stacked structure of the organic EL elements 10R, 10G, and 10B of the display device according to the second embodiment of the present disclosure. Similarly to the first embodiment, the organic EL elements 10R, 10G, and 10B according to the present embodiment are also formed on the driving substrate 10 and sealed by the protective layer 18, the adhesive layer 19, and the sealing substrate 20. As a result, a display device is configured. In the following, the same components as those in the first embodiment are denoted by the same reference numerals, and the description thereof is omitted as appropriate.

  Also in the present embodiment, the organic EL elements 10R and 10G include, for example, the hole injection layer 13B, the hole transport layer 13A, the red light emitting layer 14R or the green light emitting layer 14G, and the blue light emitting layer 14B on the first electrode 11. The electron transport layer 15A, the electron injection layer 15B, and the second electrode 16 are laminated in this order. In the organic EL element 10B, for example, a hole injection layer 13B, a hole transport layer 13A, a blue light emitting layer 14B, an electron transport layer 15A, an electron injection layer 15B, and a second electrode 16 are stacked on the first electrode 11 in this order. It has been done. Further, the red light emitting layer 14R and the green light emitting layer 14G are formed by reversal printing using a blanket, and the blue light emitting layer 14B is formed by, for example, a vacuum evaporation method. In the organic EL element 10R, the hole transporting thin film layer 17a1 is interposed between the red light emitting layer 14R and the hole transporting layer 13A. In the organic EL element 10B, between the blue light emitting layer 14B and the hole transporting layer 13A. The hole transporting thin film layer 17a1 is interposed between the two.

  However, in the present embodiment, in the organic EL element 10G, the electron transporting thin film layer 17a2 including the electron transporting material is formed between the green light emitting layer 14G and the blue light emitting layer 14B. Further, in the organic EL element 10B, a hole transporting thin film layer 17a1 and an electron transporting thin film layer 17a2 are stacked in this order from the hole transporting layer 13A side between the blue light emitting layer 14B and the hole transporting layer 13A. ing.

  In this case, in the step of forming the red light emitting layer 14R described in the first embodiment, the blanket 62 is swollen using a solution in which an electron transporting material is dissolved instead of the red light emitting material. As the electron transport material, a material equivalent to the electron transport layer 15A described above can be used. Thereafter, a solution containing a red light emitting material is applied onto the blanket 62 to form the printed pattern layer 14r1. As a result, as shown in FIG. 21, the electron transport material is deposited on the surface of the blanket 62 before transfer together with the print pattern layer 14r1 in an area excluding the print pattern layer 14r1 (electron transport thin film layer). 17a2 is formed). By performing such transfer using the blanket 62, the red light emitting layer 14R is formed in the red pixel region, while the electron transporting thin film layer 17a2 is formed on the green light emitting layer 14G in the green pixel region. . In the blue pixel region, the electron transporting thin film layer 17a2 is formed on the hole transporting thin film layer 17a1.

  As described above, in the present embodiment, when the green light emitting layer 14G is formed, the blanket is swollen with a solution containing a hole transporting material, and when the red light emitting layer 14R is formed, the blanket is used. Each is used in a state swollen by a solution containing an electron transporting material. Therefore, a hole transporting thin film layer 17a1 is formed between the red light emitting layer 14R and the hole transporting layer 13A, and an electron transporting thin film layer is formed between the green light emitting layer 14 and the blue light emitting layer 14B. 17a2 is formed. In the blue pixel, a hole transporting thin film layer 17a1 and an electron transporting thin film layer 17a2 are formed between the blue light emitting layer 14B and the hole transporting layer 13A. For this reason, it is possible to obtain substantially the same effect as in the first embodiment, and it is possible to suppress the red light emitting material from adhering to the green light emitting layer 14G, so that the emission spectrum can be mixed more effectively. Can be suppressed.

  In the present embodiment, unlike the first embodiment, in the blue pixel, the electron transporting thin film layer 17a2 is interposed between the blue light emitting layer 14B and the first electrode 11. Since this may lead to a decrease in light emission efficiency in the blue pixel, the application may be determined in consideration of the balance between the element characteristics of the red pixel and the green pixel.

  Next, modified examples (1, 2) of the organic EL elements 10R, 10G, 10B of the first and second embodiments will be described. In the following, the same components as those in the first embodiment are denoted by the same reference numerals, and the description thereof is omitted as appropriate.

<Modification 1>
FIG. 22 schematically shows a laminated structure of the organic EL elements 10R, 10G, and 10B according to the first modification. Also in this modified example, the organic EL elements 10R and 10G include, for example, a hole injection layer 13B, a hole transport layer 13A, a red light emitting layer 14R or a green light emitting layer 14G, a blue light emitting layer 14B, The electron transport layer 15A, the electron injection layer 15B, and the second electrode 16 are laminated in this order. In the organic EL element 10B, for example, a hole injection layer 13B, a hole transport layer 13A, a blue light emitting layer 14B, an electron transport layer 15A, an electron injection layer 15B, and a second electrode 16 are stacked on the first electrode 11 in this order. It has been done. Further, the red light emitting layer 14R and the green light emitting layer 14G are formed by reversal printing using a blanket, and the blue light emitting layer 14B is formed by, for example, a vacuum evaporation method.

  However, in this modification, unlike the first embodiment, in the organic EL element 10R, the green light-emitting thin film layer 17g is interposed between the red light-emitting layer 14R and the hole transport layer 13A, and the organic EL element In 10G, an electron-transporting thin film layer 17a2 is formed between the green light-emitting layer 14G and the blue light-emitting layer 14B. In the organic EL element 10B, a green light-emitting thin film layer 17g and an electron-transport thin film layer 17a2 are stacked in this order from the hole transport layer 13A side between the blue light-emitting layer 14B and the hole transport layer 13A.

  In this case, in the green light emitting layer 14G forming step, the blanket is swollen using a solution containing a green light emitting material, and in the red light emitting layer 14R forming step, as in the second embodiment, electron transport is performed. The blanket may be swollen using a solution containing a functional material. Thereby, in the formation process of the green light emitting layer 14G, the green light emitting thin film layer 17g is formed in the red pixel region and the blue pixel region. In the step of forming the red light emitting layer 14R, the electron transporting thin film layer 17a2 is formed in the green pixel region and the blue pixel region.

  As in this modification, the blanket may be swollen with a solution containing an electron transporting material only in the formation process of the red light emission layer 14R, not in the formation process of the green light emission layer 14G. Thereby, the adhesion of the red light emitting material to the green light emitting layer 14G and the blue light emitting layer 14B can be suppressed, and the substantially same effect as the first embodiment can be obtained.

<Modification 2>
23 to 25 schematically show a laminated structure of the organic EL elements 10R, 10G, and 10B according to the second modification. In both the first and second embodiments and Modification 1, the case where the red light emitting layer 14R is formed after forming the green light emitting layer 14G has been described. The order of formation is not limited to this. As in this modification, the green light emitting layer 14G may be formed after the red light emitting layer 14R is formed. Also in this case, as described above, when forming one or both of the light emitting layers of the first color and the second color, the blanket is formed with a solution containing a hole transporting material or an electron transporting material. What is necessary is just to swell.

  For example, as in the first embodiment, in the step of forming the first color light emitting layer (red light emitting layer 14R), a second color light emitting layer (with a blanket swollen with a solution containing a hole transporting material ( In the formation process of the green light emitting layer 14G), the blanket is swollen with a solution containing a green light emitting material. Accordingly, as shown in FIG. 23, in the organic EL element 10R, a green light-emitting thin film layer 17g is formed between the red light-emitting layer 14R and the blue light-emitting layer 14B. In the organic EL element 10G, a hole transport layer is formed. A hole transporting thin film layer 17a1 is formed between 13A and the green light emitting layer 14G. In the organic EL element 10B, a hole transporting thin film layer 17a1 and a green light emitting thin film layer 17g are laminated in this order from the hole transporting layer 13A side between the blue light emitting layer 14B and the hole transporting layer 13A.

  Alternatively, as in the second embodiment, in the step of forming the first color light emitting layer (red light emitting layer 14R), a blanket swollen with a solution containing a hole transporting material is used, and the second color light emitting layer ( In the step of forming the green light emitting layer 14G), a blanket swollen with a solution containing an electron transporting material may be used. Accordingly, as shown in FIG. 24, in the organic EL element 10R, the electron transporting thin film layer 17a2 is formed between the red light emitting layer 14R and the blue light emitting layer 14B. In the organic EL element 10G, the hole transporting layer is formed. A hole transporting thin film layer 17a1 is formed between 13A and the green light emitting layer 14G. In the organic EL element 10B, a hole transporting thin film layer 17a1 and an electron transporting thin film layer 17a2 are stacked in this order from the hole transporting layer 13A side between the blue light emitting layer 14B and the hole transporting layer 13A.

  Alternatively, as in Modification 1, the first color light emitting layer (red light emitting layer 14R) is formed using a blanket swollen with a solution containing a red light emitting material, and the second color light emitting layer (green light emitting layer 14G). In the forming step, a blanket swollen with a solution containing an electron transporting material may be used. Thus, as shown in FIG. 25, in the organic EL element 10R, the electron transporting thin film layer 17a2 is formed between the red light emitting layer 14R and the blue light emitting layer 14B. In the organic EL element 10G, the hole transporting layer is formed. A red light emitting thin film layer 17r is formed between 13A and the green light emitting layer 14G. In the organic EL element 10B, a red light-emitting thin film layer 17r and an electron transport thin film layer 17a2 are stacked in this order from the hole transport layer 13A side between the blue light-emitting layer 14B and the hole transport layer 13A.

  As described above, even when the formation order of the red light emitting layer 11R and the green light emitting layer 11G is changed, color mixing is suppressed, and an effect substantially equivalent to that of the above-described embodiment and the like can be obtained. However, in a green pixel, if a red light emitting layer is interposed on the hole transport layer 13A side of the green light emitting layer 14G, the influence of red light emission is increased in energy (color mixing is likely to occur). Therefore, from such a viewpoint, it is desirable to form each color light emitting layer in the order as in this modification, and to swell the blanket using a hole transporting material in the step of forming the red light emitting layer 14r.

<Modification 3>
FIG. 26 schematically shows a stacked structure of organic EL elements 10R, 10G, and 10B according to Modification 3. In the first embodiment and the like, the red light emitting layer and the green light emitting layer are exemplified as the light emitting layer to be patterned by reversal printing using a blanket, but other color light emitting layers may be used. For example, as in this modification, the yellow light emitting layer 14Y may be formed over the two pixels of the organic EL elements 10R and 10G, and the blue light emitting layer 14B may be formed to cover the yellow light emitting layer 14Y. . In this case, in the organic EL elements 10 </ b> R and 10 </ b> G, since white light is generated by mixing yellow and blue, a color filter layer 21 is provided on the sealing substrate 20 side. Light and green light are extracted respectively. The color filter layer 21 has a red filter 21R, a green filter 21G, and a blue filter 21B so as to face the organic EL elements 10R, 10G, and 10B, respectively. The red filter 21R selectively transmits red light, the green filter 21G transmits green light, and the blue filter 21B selectively transmits blue light. In such a configuration, in this modification, the hole transporting thin film layer 17a1 is formed between the blue light emitting layer 14B and the hole transporting layer 13A in the blue pixel.

  In this modification, the yellow light-emitting layer 14Y is formed by reversal printing using a blanket in a region corresponding to two pixels of the red pixel and the green pixel on the hole transport layer 13A. At this time, by using a blanket swollen with a solution containing a hole transporting material, a yellow light emitting layer 14Y is formed in a region corresponding to two pixels of a red pixel and a green pixel, and a positive pixel is formed in a blue pixel region. The hole transporting thin film layer 17a1 is formed. Therefore, in the organic EL element 10B, the yellow light emitting material is suppressed from adhering to the blue light emitting layer 14B, and the color mixture thereof is suppressed.

<Application example>
The display device including the organic EL elements 10r, 10g, and 10B described in the first and second embodiments and the first to third modifications, for example, displays any image (or video) as shown below. It can be mounted on electronic devices in the field.

  FIG. 27 shows the appearance of the smartphone. This smartphone includes, for example, a display unit 110 (display device 1), a non-display unit (housing) 120, and an operation unit 130. The operation unit 130 may be provided on the front surface of the non-display unit 120 as shown in (A), or may be provided on the upper surface as shown in (B).

  FIG. 28 illustrates an appearance configuration of a television device. The television device includes a video display screen unit 200 (display device 1) including a front panel 210 and a filter glass 220, for example.

  FIG. 29 shows the external configuration of a digital still camera, and (A) and (B) show the front and rear surfaces, respectively. This digital still camera includes, for example, a light emitting unit 310 for flash, a display unit 320 (display device 1), a menu switch 330, and a shutter button 340.

  FIG. 30 illustrates an appearance configuration of a notebook personal computer. The personal computer includes, for example, a main body 410, a keyboard 420 for inputting characters and the like, and a display unit 430 (display device 1) for displaying an image.

  FIG. 31 shows an external configuration of the video camera. This video camera includes, for example, a main body 510, a subject photographing lens 520 provided on the front side surface of the main body 510, a start / stop switch 530 during photographing, and a display 540 (display device 1). It has.

  FIG. 32 illustrates an appearance configuration of a mobile phone. (A) and (B) have shown the front and side surface of the state which opened the mobile phone, respectively. (C)-(G) have shown the front, the left side, the right side, the upper surface, and the lower surface of the state which respectively closed the mobile telephone. In this mobile phone, for example, an upper housing 610 and a lower housing 620 are connected by a connecting portion (hinge portion) 630, a display 640 (display device 1), a sub-display 650, a picture light, and the like. 660 and a camera 670.

  Although the embodiments have been described above, the present disclosure is not limited to the above-described embodiments, and various modifications can be made. For example, in the above-described embodiment and the like, the red and green light emitting layers of the red, green and blue light emitting layers are exemplified as the light emitting layer formed by reversal printing using a blanket. However, the light emitting layer that is printed using a blanket is not limited to a combination of these colors. For example, the blue light-emitting layer may be patterned by printing using a blanket (that is, all of red, green, and blue may be applied separately by printing). In the blue light emitting layer formation step, the blanket may be swollen with a solution containing an electron transporting material. In this case, for example, in the example shown in FIG. 5, an electron transporting thin film layer is formed on the red light emitting layer 14R, and on the green light emitting layer 14, the red light emitting thin film layer 17r and the electron transporting thin film are formed. The layers are stacked.

In addition, as the charge transporting material of the present disclosure, an appropriate hole transporting material or electron transporting material may be selected in accordance with the order of formation of the light emitting layer and the element characteristics of each pixel.

  In addition, the material and thickness of each layer described in the above embodiment, the film formation method, the film formation conditions, and the like are not limited, and may be other materials and thicknesses, or other film formation methods and film formation. It is good also as conditions.

The present disclosure may be configured as follows.
(1)
A plurality of light emitting layers made of an organic material and having different colors,
A first electrode and a second electrode provided across each light emitting layer;
An organic layer formed on at least one side of the first electrode and the second electrode of one or more light emitting layers of the plurality of light emitting layers and including a thin film layer containing a charge transporting material Electroluminescent device.
(2)
The plurality of light emitting layers include at least two first and second light emitting layers formed separately for each pixel,
The 1st thin film layer as the said thin film layer is formed in the said 1st electrode side of the said 2nd light emitting layer among the said 1st and 2nd light emitting layers. The organic electric field as described in said (1) Light emitting device.
(3)
Including red, green and blue pixels,
The green electroluminescent device according to (2), wherein the green pixel is provided with a green light emitting layer as the first light emitting layer, and the red pixel is provided with a red light emitting layer as the second light emitting layer. .
(4)
The blue pixel has a blue light emitting layer formed to extend to a region on the red light emitting layer and the green light emitting layer,
The organic electroluminescence device according to (3), wherein the first thin film layer is also provided on the first electrode side of the blue light emitting layer in the blue pixel.
(5)
A second thin film layer as the thin film layer is formed on the second electrode side of the green light emitting layer,
In the blue pixel, the first and second thin film layers are stacked on the first electrode side of the blue light emitting layer. The organic electroluminescent device according to (4) above.
(6)
Including red, green and blue pixels,
The red light emitting layer as the first light emitting layer is provided in the red pixel, and the green light emitting layer as the second light emitting layer is provided in the green pixel, respectively. The organic electroluminescent device according to (2) above .
(7)
The plurality of light emitting layers include at least two first and second light emitting layers formed separately for each pixel,
The organic electroluminescence device according to (1), wherein the thin film layer is formed on the second electrode side of the first light emitting layer of the first and second light emitting layers.
(8)
Including red, green and blue pixels,
The red pixel and the green pixel are provided with a yellow light emitting layer,
In the blue pixel, the blue light emitting layer is provided with a blue light emitting layer formed to extend to a region on the yellow light emitting layer,
The organic electroluminescence device according to (1), wherein the thin film layer is provided also on the first electrode side of the blue light emitting layer in the blue pixel.
(9)
Forming a first electrode;
A light emitting layer forming step of forming a plurality of light emitting layers made of an organic material and having different colors on the first electrode;
Forming a second electrode on the plurality of light emitting layers,
In the light emitting layer forming step,
When forming at least one light emitting layer of the plurality of light emitting layers, a thin film layer containing a charge transporting material is formed on at least one side of the other light emitting layer on the first and second electrode sides. Manufacturing method of organic electroluminescent device.
(10)
In the light emitting layer forming step,
The first and second light-emitting layers are formed in this order by printing using a blanket,
When forming the first light emitting layer,
After the blanket is swollen with the solution containing the charge transporting material, the blanket is used to print the first light-emitting layer, thereby removing the first light-emitting layer forming region. Forming the first thin film layer as the thin film layer. The method for producing an organic electroluminescent device according to (9).
(11)
The method for producing an organic electroluminescent device according to (10), wherein a green light emitting layer as the first light emitting layer is formed in the green pixel region, and a red light emitting layer as the second light emitting layer is formed in the red pixel region.
(12)
After forming the green light emitting layer and the red light emitting layer,
The method for producing an organic electroluminescent device according to (11), wherein a blue light emitting layer is formed from a region on the red light emitting layer and the green light emitting layer to a blue pixel region.
(13)
When forming the second light emitting layer,
After the other blanket is swollen with the solution containing the charge transporting material, the second light emitting layer is printed using the blanket, thereby removing the second light emitting layer forming region. The manufacturing method of the organic electroluminescent apparatus as described in said (12) which forms the 2nd thin film layer as said thin film layer in said.
(14)
The method for producing an organic electroluminescent device according to (10), wherein a red light emitting layer as the first light emitting layer is formed in a red pixel region, and a green light emitting layer as the second light emitting layer is formed in a green pixel region.
(15)
In the light emitting layer forming step,
The first and second light-emitting layers are formed separately for each pixel by printing using a blanket in this order,
When forming the second light emitting layer,
The blanket is swelled with a solution containing the charge transporting material, and then the second light emitting layer is printed using the blanket, so that the region except for the second light emitting layer forming region is formed. The method for producing the organic electroluminescence device according to (9), wherein the thin film layer is formed.
(16)
In the light emitting layer forming step,
A yellow light emitting layer is formed over the red pixel region and the green pixel region by printing using a blanket,
When forming a blue light emitting layer from a region on the yellow light emitting layer to a blue pixel region, and forming the yellow light emitting layer,
After the blanket is swollen with a solution containing the charge transporting material, the yellow light emitting layer is printed using the blanket, so that the thin film layer is formed in a region excluding the yellow light emitting layer forming region. The manufacturing method of the organic electroluminescent apparatus as described in said (9).
(17)
A plurality of light emitting layers made of an organic material and having different colors,
A first electrode and a second electrode provided across each light emitting layer;
An organic layer formed on at least one side of the first electrode and the second electrode of one or more light emitting layers of the plurality of light emitting layers and including a thin film layer containing a charge transporting material An electronic device having an electroluminescent device.

DESCRIPTION OF SYMBOLS 1 ... Display apparatus, 10R, 10G, 10B ... Organic EL element, 11 ... 1st electrode, 12 ... Insulating film, 13A ... Hole transport layer, 13B ... Hole injection layer, 14R ... Red light emitting layer, 14G ... Green light emission Layer, 14B ... blue light emitting layer, 15A ... electron transport layer, 15B ... electron injection layer, 16 ... second electrode, 17a1 ... hole transport thin film layer, 17a2 ... electron transport thin film layer, 18 ... protective layer, 19 ... Adhesive layer, 20 ... sealing substrate.

Claims (15)

A first electrode;
First to third light-emitting layers made of an organic material and disposed on the first electrode and having different colors,
A second electrode provided on the first to third light emitting layers;
A first thin film layer which is provided on the first electrode side of the second light emitting layer and includes a first organic material which is a light emitting material or a charge transporting material;
A second thin film layer that is provided on the second electrode side of the first light emitting layer and includes a second organic material that is a light emitting material or a charge transporting material ;
At least one of the first and second organic materials is a charge transporting material;
A third thin film layer containing the first organic material and a fourth organic material containing the second organic material are sequentially arranged between the third light emitting layer and the first electrode from the first electrode side. An organic electroluminescent device in which a thin film layer is laminated . Including red, green and blue pixels,
Wherein the green pixel, the green light emitting layer as the first light-emitting layer is a red light emitting layer as the second light-emitting layer in the red pixel, blue light-emitting layer as the third light-emitting layer in the blue pixel The organic electroluminescent device according to claim 1, wherein each is provided . The first organic material is a hole transporting material;
The second organic material is a red light emitting material.
The organic electroluminescent device according to claim 2. The first organic material is a hole transporting material;
The second organic material is an electron transporting material
The organic electroluminescent device according to claim 2. The first organic material is a green light emitting material,
The second organic material is an electron transporting material
The organic electroluminescent device according to claim 2. The third light emitting layer is formed to extend up to a region on the first and second light emitting layers.
The organic electroluminescent device according to claim 2. Including red, green and blue pixels,
The red pixel emits a red light emitting layer as the first light emitting layer , the green pixel emits a green light emitting layer as the second light emitting layer , and the blue pixel emits blue light as the third light emitting layer. The organic electroluminescent device according to claim 1, wherein each of the layers is provided. The first organic material is a hole transporting material;
The second organic material is a green light emitting material
The organic electroluminescent device according to claim 7. The first organic material is a hole transporting material;
The second organic material is an electron transporting material
The organic electroluminescent device according to claim 7. The first organic material is a red light emitting material,
The second organic material is an electron transporting material
The organic electroluminescent device according to claim 7. Forming a first electrode;
A light emitting layer forming step of forming first to third light emitting layers made of an organic material and having different colors on the first electrode;
Forming a second electrode on the first to third light-emitting layers,
In the light emitting layer forming step,
After the pre-Symbol first light-emitting layer was formed using an intaglio in a selective region on the first blanket swollen with a solution containing a first organic material is a light-emitting material or a charge transporting material, wherein Formed by transferring from the first blanket ,
After forming the first light emitting layer, the second light emitting layer is formed in a selective region on the second blanket swollen with a solution containing a second organic material that is a light emitting material or a charge transporting material. After forming using an intaglio, transferring from above the second blanket,
A method for manufacturing an organic electroluminescent device, wherein at least one of the first and second organic materials is a charge transporting material . The green light emitting layer as the green pixel region first light-emitting layer, the red emission layer as the red pixel region a second light-emitting layer, a blue emission layer as the third light-emitting layer in the blue pixel region The method of manufacturing an organic electroluminescent device according to claim 11 , wherein each is formed. After forming the first and second light emitting layers,
The method of manufacturing an organic electroluminescent device according to claim 12 , wherein the third light emitting layer is formed to extend to a region on the first and second light emitting layers . The red light-emitting layer as the red pixel region a first light-emitting layer, green emitting layer as the green pixel region second light-emitting layer, a blue emission layer as the third light-emitting layer in the blue pixel region The method of manufacturing an organic electroluminescent device according to claim 11 , wherein each is formed. A first electrode;
First to third light-emitting layers made of an organic material and disposed on the first electrode and having different colors,
A second electrode provided on the first to third light emitting layers;
A first thin film layer which is provided on the first electrode side of the second light emitting layer and includes a first organic material which is a light emitting material or a charge transporting material;
A second thin film layer that is provided on the second electrode side of the first light emitting layer and includes a second organic material that is a light emitting material or a charge transporting material ;
At least one of the first and second organic materials is a charge transporting material;
A third thin film layer containing the first organic material and a fourth organic material containing the second organic material are sequentially arranged between the third light emitting layer and the first electrode from the first electrode side. Thin film layer is laminated
An electronic device having a male electromechanical field light-emitting device.

Images