JP6005364B2 - Semiconductor device manufacturing method and semiconductor device - Google Patents

Description

  The present invention relates to a method of manufacturing a semiconductor device using an SOI (Silicon On Insulator) substrate and a semiconductor device manufactured using the SOI substrate.

  FIG. 1 is a cross-sectional view schematically showing the structure of a conventional semiconductor device manufactured using an SOI substrate having a support substrate 1, a BOX (Buried Oxide) layer 2 and an SOI layer 3. As shown in FIG. 1, in the conventional semiconductor device, the etching mask is misaligned during etching for forming an opening (contact hole) 31 in the interlayer insulating film 28 covering the MOS transistor 20 as a semiconductor element. When the misalignment D occurs, the region below the BOX layer 2 (that is, the upper surface of the support substrate 1) and the contact 33 are short-circuited, as shown in the broken line region 40, and the semiconductor element has desired characteristics. There was a problem that it could not be held (see, for example, Patent Documents 1 and 2). The MOS transistor 20 includes a gate insulating film 21, a gate electrode 22, an LDD (Lightly Doped Drain) sidewall 25, metal silicide films 26 and 27, and contacts 32 and 33 formed in the contact hole 31. It is electrically isolated from adjacent elements by an insulating layer 7 as an element isolation layer.

  The inventor of the present application has applied an etching stopper film (for example, a film corresponding to reference numeral 121 in FIG. 1 of Patent Document 2) having a selection ratio different from that of the interlayer insulating film 28 to the semiconductor element 20 for the problem of short circuit of the contact 33. After forming on top, the interlayer insulation film 28 and the opening part (contact hole) 31 were formed, and the method of removing an etching stopper film | membrane was examined after that.

JP-A-8-8436 JP 2001-185703 A (for example, FIG. 1)

  However, since the SOI layer and the BOX layer are thinned as the semiconductor device is thinned, when the above-described misalignment occurs, the SOI layer and the BOX layer are formed by an etching process for removing the etching stopper film. The through portion is formed, and the problem that the semiconductor element cannot have desired characteristics due to a short circuit between the region below the BOX layer and the contact has not been solved.

  An object of the present invention is to provide a method for manufacturing a semiconductor device and a semiconductor device capable of preventing a short circuit between a support substrate constituting an SOI substrate and a conductive member formed in an opening formed in an insulating layer covering a semiconductor element. Is to provide.

The method of manufacturing a semiconductor device according to an embodiment of the present invention, the supporting substrate, a first insulating layer,及Beauty element formation layer are laminated Rutotomoni element formation region where the semiconductor element is formed and the device forming region A step of preparing an SOI substrate having a region corresponding to an element isolation region in contact with an outer edge on a main surface of the element formation layer; and the first insulating layer and the element formation layer in the region corresponding to the element isolation region And a first opening forming step for forming a first opening that exposes the first surface of the support substrate in a region corresponding to the element isolation region, and the first opening is exposed in the first opening. the side surface of the first insulating layer, a first insulating layer removing step of removing to the inside from the end portion of the element forming layer corresponding to the element forming region, within the first opening, the element forming layer And the side surface of the first insulating layer and the side surface To cover the first surface of the lifting substrate, a second insulating layer forming step of forming a second insulating layer at a slow etch rate material than the material of the element forming layer, the element formed by the CMP technique A second insulating layer removing step in which a main surface of the layer and a flat top surface of the second insulating layer are flush with each other, and forming the element so that at least a part thereof is close to the second insulating layer Forming the semiconductor element in a region; forming a third insulating layer so as to cover the semiconductor element; and exposing the part of the semiconductor element through the third insulating layer. of forming an opening by anisotropic etching, that a step of forming the second conductive member to fill the second opening portion so as to be in contact with the semiconductor element that is exposed by the opening Features.

A semiconductor device according to one embodiment of the present invention includes a first insulating layer disposed in contact with one surface of a main surface of a support substrate, and a surface opposite to the one surface of the first insulating layer. Covering the element forming layer disposed in contact with the other surface on the back surface, the main surface of the support substrate, the side surface of the first insulating layer, and the back surface and the side surface of the element forming layer; The upper surface adjacent to the formation layer has a flat top surface that is flush with the surface opposite to the back surface of the element formation layer, and is formed of a material having an etching rate slower than that of the constituent material of the element formation layer. The semiconductor element formed on the surface of the element formation layer so that at least a part of the second insulation layer is close to the second insulation layer, and the semiconductor element and the element formation layer the covers and the flat top surface of the said surface second insulating layer An insulating layer, a second opening that passes through the third insulating layer and exposes a part of the semiconductor element, and the second element is in contact with the semiconductor element exposed by the second opening. And a conductive member filling the inside of the opening.

  According to the present invention, it is possible to prevent a short circuit between the support substrate constituting the SOI substrate and the conductive member formed in the second opening formed in the third insulating layer covering the semiconductor element. The element can have desired characteristics.

It is sectional drawing which shows the structure of the conventional semiconductor device roughly. It is sectional drawing which shows roughly the process of the manufacturing method of the semiconductor device which concerns on the 1st Embodiment of this invention. FIG. 3 is a cross sectional view schematically showing a next process of FIG. 2. FIG. 4 is a cross sectional view schematically showing a next process of FIG. 3. FIG. 5 is a cross sectional view schematically showing a next process of FIG. 4. FIG. 6 is a cross-sectional view schematically showing a process subsequent to FIG. 5. FIG. 7 is a cross-sectional view schematically showing a process subsequent to FIG. 6. FIG. 8 is a cross-sectional view schematically showing a process subsequent to FIG. 7. FIG. 9 is a cross-sectional view schematically showing a process subsequent to FIG. 8. FIG. 10 is a cross-sectional view schematically showing a process subsequent to FIG. 9. FIG. 11 is a cross sectional view schematically showing a next process of FIG. 10. FIG. 12 is a cross-sectional view schematically showing the next process of FIG. 11 and the semiconductor device according to the first embodiment. (A) And (b) is an expanded sectional view which shows roughly the principal part of 1st Embodiment and a comparative example, respectively. It is sectional drawing which shows roughly the process of the manufacturing method of the semiconductor device which concerns on the 2nd Embodiment of this invention. FIG. 15 is a cross sectional view schematically showing a next process of FIG. 14. FIG. 16 is a cross sectional view schematically showing a next process of FIG. 15. FIG. 17 is a cross sectional view schematically showing a next process of FIG. 16. FIG. 18 is a cross-sectional view schematically showing a process subsequent to FIG. 17. FIG. 19 is a cross-sectional view schematically showing the next process of FIG. 18. FIG. 20 is a cross-sectional view schematically showing the next process of FIG. 19. FIG. 21 is a cross sectional view schematically showing a next process of FIG. 20. FIG. 22 is a cross-sectional view schematically showing a process subsequent to FIG. 21. FIG. 23 is a cross-sectional view schematically showing a next process of FIG. 22. FIG. 24 is a cross-sectional view schematically showing a semiconductor device according to a second process and the next process of FIG. 23. It is an expanded sectional view showing the important section of a 2nd embodiment roughly.

<< First Embodiment >>
2 to 12 are cross-sectional views schematically showing a process of the semiconductor device manufacturing method according to the first embodiment of the present invention. FIG. 12 is also a diagram showing the structure of the semiconductor device according to the first embodiment.

  The method for manufacturing the semiconductor device according to the first embodiment will be described below. First, as shown in FIG. 2, an SOI substrate 100 having a structure in which a support substrate 101, a BOX layer 102 as a first insulating layer, and an SOI layer 103 as an element formation layer on which a semiconductor element is formed are stacked. Prepare. Next, a pad oxide film 104 is formed on the SOI layer 103, and a silicon nitride film 105 is formed on the pad oxide film 104. The pad oxide film 104 is formed by a method such as thermally oxidizing the surface of the SOI layer 103, for example. The thickness of the pad oxide film 104 is, for example, about 15 [nm]. The silicon nitride film 105 is formed by, for example, a CVD (Chemical Vapor Deposition) method. The film thickness of the silicon nitride film 105 is, for example, about 200 [nm].

  Next, as shown in FIG. 3, a resist mask 106 is formed on the silicon nitride film 105 on the element formation region of the SOI layer 103 by using a photolithography technique.

  Next, as shown in FIG. 4, the silicon nitride film 105, the pad oxide film 104, the SOI layer 103, and the BOX layer 102 other than the element formation region are removed using an etching technique. In the first embodiment, the portion from which the SOI layer 103 as the element formation layer and the BOX layer 102 as the first insulating layer are removed is also referred to as a first opening. The etching at this time is usually anisotropic etching in which etching proceeds in the thickness direction. Thereafter, isotropic etching such as wet etching is performed, so that the end of the BOX layer 102 is located inside the end of the element formation region of the SOI layer 103 as shown in FIG. Remove the side of 102 a little. In other words, the position E1 of the end portion (side surface) of the element formation region of the SOI layer 103 and the position E2 of the end portion (side surface) of the BOX layer 102 do not coincide with each other in the horizontal direction parallel to the support substrate 1. To do. In FIG. 4, it is desirable that the distance E between the position E1 and the position E2 is at least 10 [nm] or more.

  In addition, it is desirable to include a step of cleaning the exposed side surfaces of the element formation layer after forming the first opening. As the cleaning liquid, a cleaning liquid that can remove the oxide film, such as a hydrofluoric acid-based cleaning liquid, is used. When the element formation layer is removed, the exposed side surface of the element formation layer may be oxidized. In this case, even when the second insulating layer is formed, the oxidized portion is formed during etching for contact formation. However, if the oxide film is removed by cleaning the side surfaces of the element formation layer, such a problem is less likely to occur.

  Next, as shown in FIG. 5, the resist mask 106 is removed.

  Next, as shown in FIG. 6, the upper surface of the support substrate 101, the side surface of the BOX layer 103, the side surface of the element formation region of the SOI layer 103, the side surface of the pad oxide film 104, the side surface and the upper surface of the silicon nitride film 105 are covered. In this manner, the first element isolation film 107 as the second insulating layer is formed. The first element isolation film 107 is a film having a slow etching rate during contact etching (described later with reference to FIG. 11) such as a silicon nitride film, and is formed by a CVD method or the like. The film thickness of the first element isolation film 107 is preferably about 200 [nm], for example. In the case where the first element isolation film 107 is a silicon nitride film, a silicon nitride film is formed at the interface of the SOI layer 103 and the interface state increases, which may increase the parasitic leakage of the transistor. Therefore, a silicon oxide film may be formed under the first element isolation film 107 that is a silicon nitride film. This silicon oxide film can be formed by, for example, a thermal oxidation method or a CVD method.

  Next, as shown in FIG. 6, a second element isolation film 108 is formed on the first element isolation film 107. The second element isolation film 108 is formed, for example, by depositing a silicon oxide film for embedding STI (Shallow Trench Isolation) using an HDP (High Density Plasma) apparatus or the like.

  Next, as shown in FIG. 7, the first element isolation film 107, which is a silicon nitride film, and the silicon oxide film are formed only in the element isolation region by performing planarization using a CMP (Chemical Mechanical Polishing) technique. A shape in which the second element isolation film 108 remains is obtained.

  Next, as shown in FIG. 8, the element formation region of the SOI layer 103 (of the SOI layer 103, such that at least a part thereof is close to the first element isolation film 107 as the second insulating layer). The semiconductor element 120 is formed on the portion not removed by the process 4. The semiconductor element 120 is, for example, a MOS transistor, and is formed using a known transistor formation process. Further, the semiconductor element 120 may be an element other than a MOS transistor. Here, “proximity” is a distance shorter than the diameter of contacts (contacts 132 and 133 in FIG. 1) to the semiconductor element 120 opened in the interlayer insulating film 128.

  The semiconductor element 120 is formed by the following procedure, for example. First, as shown in FIG. 8, a gate oxide film 121 is formed on the SOI layer 103 and a gate electrode 122 made of polysilicon or the like is formed on the gate oxide film 121 by photolithography and etching. Next, impurities are implanted into the SOI layer 103 to form n-type or p-type impurity diffusion regions 123 and 124. Next, an LDD sidewall 125 that is a sidewall insulating film of the semiconductor element 120 is formed on the SOI layer 103, and metal silicide films 126 and 127 are formed. The LDD sidewall 125 is, for example, a silicon nitride film.

  Next, as shown in FIG. 9, an interlayer insulating film 128 as a third insulating layer is formed so as to cover the semiconductor element 120. The interlayer insulating film 128 is made of, for example, BPSG (Boron Phosphorus Silicon Glass).

  Next, as shown in FIG. 10, in order to form a contact on the interlayer insulating film 128, a resist mask 129 is formed by using a photolithography technique. In the example of FIG. 10, a case where misalignment occurs in the opening 129a on the right side of the resist mask 129 is shown.

  Next, as shown in FIG. 11, a contact hole 131 is formed by etching as a second opening that penetrates the interlayer insulating film 128 and exposes part of the semiconductor element. In FIG. 11, it should be originally formed so as not to have a region deviated from the metal silicide film 127. However, the contact hole 131 is displaced (causing misalignment) due to some cause, and the metal is not formed. The case where it extends outside the silicide film 127 (portion indicated by reference numeral 131a) is illustrated.

  Next, as shown in FIG. 12, contacts 132 and 133 that are conductive members filling the second opening are formed so as to be in contact with the semiconductor element exposed through the contact hole 131. The contacts 132 and 133 are made of, for example, a metal such as tungsten (W) by a CVD method or the like.

  As shown in a broken line region 140 in FIG. 12, the outer end of the contact hole 131 is formed to be shifted outward from the end of the element formation region of the SOI layer 103, but formed outside the BOX layer 102. The film 107 having a low etching rate, such as a silicon nitride film, functions as an etching stopper and plays a role of preventing the contact hole 131 from reaching the support substrate 101. Therefore, according to the method of manufacturing a semiconductor device according to the first embodiment, in manufacturing the semiconductor device, in the step of forming the contact hole 131 that penetrates the interlayer insulating film 128 and exposes a part of the semiconductor element 120, A short circuit between the support substrate 101 constituting the SOI substrate 100 and the contact 133 formed in the contact hole 131 can be prevented, and the semiconductor element 120 can have desired characteristics.

  FIGS. 13A and 13B are enlarged cross-sectional views schematically showing main parts of the first embodiment and the comparative example, respectively. As shown in FIG. 13A, according to the first embodiment, a silicon nitride film having a slow contact etching rate is formed in the STI region (region 107) in contact with the end of the SOI layer 103. Therefore, even when the contact 131 is formed so as to protrude from the element region, the contact etching is stopped at the silicon nitride film (reference numeral 107), so that the contact etching is stopped at the silicon nitride film (reference numeral 107). Therefore, the tip 133 a of the contact 133 is also stopped by the BOX layer 102, and it is possible to eliminate defects due to a short circuit between the support substrate 101 and the SOI layer 103.

  In particular, the silicon nitride film (reference numeral 107) formed so as to be in contact with the BOX layer 102 has a shape in which the silicon nitride film (reference numeral 107) has digged in by 10 [nm] or more from the end of the SOI layer 103 (retracted inward). If an oxide film is formed on the silicon surface of 102, the etching progresses only at that portion quickly, and there is a risk that a short circuit between the tip of the contact 333 and the support substrate 101 made of silicon occurs as shown in FIG. Can be reduced.

  Further, since the dielectric constant (about 7.5) of the silicon nitride film is about twice that of the silicon oxide film (about 3.9), the SiN layer is uniform under the BOX layer 102. As compared with the case where the transistor exists, an increase in parasitic capacitance can be suppressed, and the cause of adverse effects on the high-speed operation of the transistor can be reduced.

<< Second Embodiment >>
14 to 24 are cross-sectional views schematically showing a process of a method for manufacturing a semiconductor device according to the second embodiment of the present invention. FIG. 24 is also a diagram showing the structure of the semiconductor device according to the second embodiment.

  The method for manufacturing the semiconductor device according to the second embodiment will be described below. First, as shown in FIG. 14, an SOI substrate 200 having a structure in which a support substrate 201, a BOX layer 202 as a first insulating layer, and an SOI layer 203 as an element formation layer on which a semiconductor element is formed are stacked. Prepare. Next, a pad oxide film 204 is formed on the SOI layer 203, and a silicon nitride film 205 is formed on the pad oxide film 204. The pad oxide film 204 is formed by a method such as thermally oxidizing the surface of the SOI layer 203, for example. The silicon nitride film 205 is formed by, for example, a CVD method. The thickness of the pad oxide film 204 is, for example, about 15 [nm]. The thickness of the silicon nitride film 205 is, for example, about 200 [nm].

  Next, as shown in FIG. 15, a resist mask 206 is formed on the silicon nitride film 205 in the element formation region of the SOI layer 203 by using a photolithography technique.

  Next, as shown in FIG. 16, the silicon nitride film 205, the pad oxide film 204, and the SOI layer 203 other than the element formation region are removed using an etching technique. In the second embodiment, the portion from which the SOI layer 203 as the element formation layer is removed is also referred to as a first opening. In the etching process at this time, anisotropic etching in which etching proceeds in the thickness direction is mainly performed.

  In addition, it is desirable to include a step of cleaning the exposed side surfaces of the element formation layer after forming the first opening. As the cleaning liquid, a cleaning liquid that can remove the oxide film, such as a hydrofluoric acid-based cleaning liquid, is used. When the element formation layer is removed, the exposed side surface of the element formation layer may be oxidized. In this case, even when the second insulating layer is formed, the oxidized portion is formed during etching for contact formation. However, if the oxide film is removed by cleaning the side surfaces of the element formation layer, such a problem is less likely to occur.

  Next, as shown in FIG. 17, the resist mask 206 is removed.

  Next, as shown in FIG. 18, the upper surface, the upper surface of the BOX layer 203, the side surface of the element formation region of the SOI layer 203, the side surface of the pad oxide film 204, the side surface and the upper surface of the silicon nitride film 205 are covered. A first element isolation film 207 is formed as a second insulating layer. The first element isolation film 207 is a film having a low etching rate during contact etching (described later with reference to FIG. 23) such as a silicon nitride film, and is formed by a CVD method or the like. The film thickness of the first element isolation film 207 is preferably about 200 [nm], for example. In the case where the first element isolation film 207 is a silicon nitride film, the silicon nitride film is formed at the interface of the SOI layer 203 and the interface state increases, which may increase the parasitic leakage of the transistor. Therefore, a silicon oxide film may be formed under the first element isolation film 207 that is a silicon nitride film. This silicon oxide film can be formed by, for example, a thermal oxidation method or a CVD method.

  Next, as shown in FIG. 18, a second element isolation film 208 is formed on the first element isolation film 207. The second element isolation film 208 is formed, for example, by depositing a silicon oxide film for STI filling using an HDP apparatus or the like.

  Next, as shown in FIG. 19, the first element isolation film 207, which is a silicon nitride film, and the second element isolation film, which is a silicon oxide film, are formed only in the element isolation region by performing planarization using CMP technology. A shape with 108 remains is obtained.

  Next, as shown in FIG. 20, the semiconductor element 220 is formed on the element formation region of the SOI layer 203 so that at least a part thereof is close to the first element isolation film 207 as the second insulating layer. The semiconductor element 220 is, for example, a MOS transistor, and is formed using a known transistor formation process. The semiconductor element 220 may be an element other than a MOS transistor, for example. Here, “proximity” is a distance shorter than the diameter of contacts (contacts 232 and 233 in FIG. 1) to the semiconductor element 220 opened in the interlayer insulating film 228.

  The semiconductor element 220 is formed by the following procedure, for example. First, as shown in FIG. 20, a gate oxide film 221 is formed on the SOI layer 203 by photolithography and etching, and a gate electrode 222 made of polysilicon or the like is formed on the gate oxide film 221. Next, an impurity is implanted into the SOI layer 203 to form n-type or p-type impurity diffusion regions 223 and 224. Next, LDD sidewalls 225 which are sidewall insulating films of the semiconductor element 120 are formed on the SOI layer 203, and metal silicide films 226 and 227 are formed. The LDD sidewall 225 is, for example, a silicon nitride film.

  Next, as shown in FIG. 21, an interlayer insulating film 228 as a third insulating layer is formed so as to cover the semiconductor element 220.

  Next, as shown in FIG. 22, in order to form a contact on the interlayer insulating film 228, a resist mask 229 is formed by using a photolithography technique.

  Next, as shown in FIG. 23, a contact hole 231 is formed by etching as a second opening that penetrates the interlayer insulating film 228 and exposes part of the semiconductor element. In FIG. 23, it should be originally formed so as not to have a region deviated from the metal silicide film 227. However, for some reason, the contact hole 231 is shifted (alignment occurs), and the metal The case where it extends outside the silicide film 227 is illustrated.

  Next, as shown in FIG. 24, contacts 232 and 233, which are conductive members filling the inside of the second opening, are formed so as to be in contact with the semiconductor element exposed by the contact hole 231. For example, the contact hole 231 is formed of a metal such as tungsten (W) by a CVD method or the like.

  As shown in a broken line region 240 in FIG. 24, the outer end portion of the contact hole 231 is formed to be shifted outward from the end portion of the element formation region of the SOI layer 203, but the upper surface of the BOX layer 202 is an etching stopper. The contact hole 231 does not reach the support substrate 101. Therefore, according to the method of manufacturing the semiconductor device according to the second embodiment, in the process of forming the contact hole 231 that penetrates the interlayer insulating film 228 and exposes a part of the semiconductor element 220 when manufacturing the semiconductor device. A short circuit between the support substrate 201 constituting the SOI substrate 200 and the contact 233 formed in the contact hole 231 can be prevented, and the semiconductor element 220 can have desired characteristics.

  FIG. 25 is an enlarged cross-sectional view schematically showing a main part of the second embodiment. As shown in FIG. 25A, according to the second embodiment, a silicon nitride film having a slow contact etching rate is formed in the STI region (region 207) in contact with the end of the SOI layer 203. The BOX layer 202 is provided below the SOI layer 203 and below the silicon nitride film (reference numeral 207), and contact etching is stopped at the BOX layer 202. Therefore, the tip 233a of the contact 233 is also stopped at the BOX layer 202. In addition, it is possible to eliminate defects due to a short circuit between the support substrate 201 and the SOI layer 203.

  100, 200 SOI substrate, 101, 201 support substrate, 102, 202 BOX layer (first insulating layer), 103, 203 SOI layer, 104, 204 pad oxide film, 105, 205 silicon nitride film, 106, 206 resist mask 107, 207 First element isolation film (second insulating layer), 108, 208 Second element isolation film, 120, 220 Semiconductor element, 121, 212 Gate oxide film, 122, 222 Gate electrode, 123, 124, 223 , 224 impurity diffusion region, 125, 225 LDD sidewall, 126, 127, 226, 227 metal silicide film, 128, 228 interlayer insulating film (third insulating layer), 129, 229 resist mask, 131, 231 contact hole ( Second opening), 132,1 3,232,233 contacts.

Claims (8)

Supporting substrate, a first insulating layer,及Beauty element formation layer are laminated Rutotomoni, wherein a region corresponding to the device isolation region in contact with the outer edge of the element forming region where a semiconductor element is formed and the element forming region element Preparing an SOI substrate on the main surface of the formation layer ;
A first opening for removing the first insulating layer and the element formation layer in the region corresponding to the element isolation region and exposing the first surface of the support substrate in the region corresponding to the element isolation region. A first opening forming step of forming
A first insulating layer removing step of removing a side surface of the first insulating layer exposed in the first opening from the end of the element forming layer corresponding to the element forming region to the inside;
Etching rate is slower than the constituent material of the element forming layer covering the side surface of the element forming layer, the side surface of the first insulating layer, and the first surface of the support substrate in the first opening. A second insulating layer forming step of forming a second insulating layer with a material;
A second insulating layer removing step in which a main surface of the element forming layer and a flat top surface of the second insulating layer are flush with each other by a CMP technique;
Forming the semiconductor element in the element formation region so that at least a part is close to the second insulating layer;
Forming a third insulating layer so as to cover the semiconductor element;
Forming a second opening through the third insulating layer and exposing a part of the semiconductor element by anisotropic etching ;
Forming a conductive member filling the second opening so as to be in contact with the semiconductor element exposed by the second opening.   The second insulating layer removing step includes a process of forming an element isolation film covering the second insulating layer,
  The second insulating layer removing step includes a process in which a main surface of the element formation layer, a flat top surface of the second insulating layer, and an upper surface of the element isolation film are flush with each other.
  The method of manufacturing a semiconductor device according to claim 1. The first insulating layer removing step, a method of manufacturing a semiconductor device according to claim 1 or 2, characterized in that it comprises an isotropic etching process. 4. The method according to claim 1, wherein the first insulating layer removing step includes a process of making the side surface of the first insulating layer at least 10 nm inside the side surface of the element formation layer . 5. A method for manufacturing the semiconductor device according to the item . 5. The method according to claim 1, further comprising a step of cleaning a side surface facing the first opening of the element formation region before the second insulating layer forming step. The manufacturing method of the semiconductor device of description. The second insulating layer is a silicon nitride film;
The method for manufacturing a semiconductor device according to claim 1, wherein the third insulating layer is a silicon oxide film. A first insulating layer disposed in contact with one surface of the main surface of the support substrate;
An element forming layer disposed in contact with the back surface of the other surface which is the surface opposite to the one surface of the first insulating layer;
The main surface of the support substrate, the side surface of the first insulating layer, the back surface and the side surface of the element forming layer are covered, and the upper surface adjacent to the element forming layer is opposite to the back surface of the element forming layer. A second insulating layer formed of a material having a flat top surface that is flush with the surface of the element forming layer and having an etching rate slower than that of the constituent material of the element forming layer;
A semiconductor element formed on the surface of the element formation layer so that at least a part is close to the second insulating layer;
A third insulating layer covering the semiconductor element , the surface of the element forming layer, and the flat top surface of the second insulating layer;
A second opening that penetrates the third insulating layer and exposes a portion of the semiconductor element;
And a conductive member filling the inside of the second opening so as to be in contact with the semiconductor element exposed by the second opening. The second insulating layer includes a bottom surface portion covering the main surface of the support substrate, and a side surface portion covering the side surface of the first insulating layer and the back surface and the side surface of the element forming layer. With a recess,
  The recess is embedded with an element isolation film.
  The semiconductor device according to claim 7.

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