JP5999084B2 - Silicon-based liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element - Google Patents
Silicon-based liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element Download PDFInfo
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- JP5999084B2 JP5999084B2 JP2013501100A JP2013501100A JP5999084B2 JP 5999084 B2 JP5999084 B2 JP 5999084B2 JP 2013501100 A JP2013501100 A JP 2013501100A JP 2013501100 A JP2013501100 A JP 2013501100A JP 5999084 B2 JP5999084 B2 JP 5999084B2
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- liquid crystal
- polysiloxane
- alkoxysilane
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- 239000004973 liquid crystal related substance Substances 0.000 title claims description 198
- 239000003795 chemical substances by application Substances 0.000 title claims description 87
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title description 4
- 229910052710 silicon Inorganic materials 0.000 title description 3
- 239000010703 silicon Substances 0.000 title description 3
- -1 polysiloxane Polymers 0.000 claims description 108
- 229920001296 polysiloxane Polymers 0.000 claims description 98
- 125000004432 carbon atom Chemical group C* 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 32
- 238000006068 polycondensation reaction Methods 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000005842 heteroatom Chemical group 0.000 claims description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 4
- 125000005504 styryl group Chemical group 0.000 claims description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 4
- 125000005395 methacrylic acid group Chemical group 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 239000000243 solution Substances 0.000 description 52
- 238000000034 method Methods 0.000 description 39
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 30
- 230000015572 biosynthetic process Effects 0.000 description 29
- 238000003786 synthesis reaction Methods 0.000 description 28
- 239000002904 solvent Substances 0.000 description 27
- 230000004044 response Effects 0.000 description 25
- 229910004298 SiO 2 Inorganic materials 0.000 description 22
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 210000002858 crystal cell Anatomy 0.000 description 20
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 12
- 239000010419 fine particle Substances 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 12
- 238000010992 reflux Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 235000006408 oxalic acid Nutrition 0.000 description 10
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- 125000000962 organic group Chemical group 0.000 description 9
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 7
- 230000007062 hydrolysis Effects 0.000 description 7
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 210000004027 cell Anatomy 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 4
- GPAAEXYTRXIWHR-UHFFFAOYSA-N (1-methylpiperidin-1-ium-1-yl)methanesulfonate Chemical compound [O-]S(=O)(=O)C[N+]1(C)CCCCC1 GPAAEXYTRXIWHR-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 229940051250 hexylene glycol Drugs 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 125000005641 methacryl group Chemical group 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 2
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 2
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- YGUFXEJWPRRAEK-UHFFFAOYSA-N dodecyl(triethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OCC)(OCC)OCC YGUFXEJWPRRAEK-UHFFFAOYSA-N 0.000 description 2
- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002454 metastable transfer emission spectrometry Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 2
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 2
- 229960003493 octyltriethoxysilane Drugs 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 2
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- OYGYKEULCAINCL-UHFFFAOYSA-N triethoxy(hexadecyl)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC OYGYKEULCAINCL-UHFFFAOYSA-N 0.000 description 2
- HDYOCGKYEWQGDZ-UHFFFAOYSA-N triethoxy(nonadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC HDYOCGKYEWQGDZ-UHFFFAOYSA-N 0.000 description 2
- BBWMWJONYVGXGQ-UHFFFAOYSA-N triethoxy(undecyl)silane Chemical compound CCCCCCCCCCC[Si](OCC)(OCC)OCC BBWMWJONYVGXGQ-UHFFFAOYSA-N 0.000 description 2
- PPUHSHGIVZSPFO-UHFFFAOYSA-N trimethoxy(nonadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC PPUHSHGIVZSPFO-UHFFFAOYSA-N 0.000 description 2
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 2
- LIJFLHYUSJKHKV-UHFFFAOYSA-N trimethoxy(undecyl)silane Chemical compound CCCCCCCCCCC[Si](OC)(OC)OC LIJFLHYUSJKHKV-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- KKYDYRWEUFJLER-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F KKYDYRWEUFJLER-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- PVMMVWNXKOSPRB-UHFFFAOYSA-N 1,2-dipropoxypropane Chemical compound CCCOCC(C)OCCC PVMMVWNXKOSPRB-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 1
- QMGJMGFZLXYHCR-UHFFFAOYSA-N 1-(2-butoxypropoxy)butane Chemical compound CCCCOCC(C)OCCCC QMGJMGFZLXYHCR-UHFFFAOYSA-N 0.000 description 1
- HQSLKNLISLWZQH-UHFFFAOYSA-N 1-(2-propoxyethoxy)propane Chemical compound CCCOCCOCCC HQSLKNLISLWZQH-UHFFFAOYSA-N 0.000 description 1
- ZVDJGAZWLUJOJW-UHFFFAOYSA-N 1-(4-ethenylphenyl)ethyl-trimethoxysilane Chemical compound CO[Si](OC)(OC)C(C)C1=CC=C(C=C)C=C1 ZVDJGAZWLUJOJW-UHFFFAOYSA-N 0.000 description 1
- BOGFHOWTVGAYFK-UHFFFAOYSA-N 1-[2-(2-propoxyethoxy)ethoxy]propane Chemical compound CCCOCCOCCOCCC BOGFHOWTVGAYFK-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- RGYAVZGBAJFMIZ-UHFFFAOYSA-N 2,3-dimethylhex-2-ene Chemical compound CCCC(C)=C(C)C RGYAVZGBAJFMIZ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- PSLRXNFNXYNXEK-UHFFFAOYSA-N 2-triethoxysilylethyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCOC(=O)C=C PSLRXNFNXYNXEK-UHFFFAOYSA-N 0.000 description 1
- BUJVPKZRXOTBGA-UHFFFAOYSA-N 2-trimethoxysilylethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCOC(=O)C=C BUJVPKZRXOTBGA-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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Description
本発明は、アルコキシシランを重縮合して得られるポリシロキサンを含有する液晶配向剤、及び前記液晶配向剤から得られる液晶配向膜、並びにその液晶配向膜を有する液晶表示素子に関する。 The present invention relates to a liquid crystal alignment agent containing polysiloxane obtained by polycondensation of alkoxysilane, a liquid crystal alignment film obtained from the liquid crystal alignment agent, and a liquid crystal display element having the liquid crystal alignment film.
近年、液晶表示素子の表示方式の中でも、垂直(VA)方式の液晶表示素子は、大画面の液晶テレビや高精細なモバイル用途(デジタルカメラや携帯電話の表示部)などに広く利用されている。
VA方式には、液晶の倒れる方向を制御するための突起をTFT板やカラーフィルタ基板に形成するMVA方式(Multi Vertical Alignment)や、基板のITO電極にスリットを形成し電界によって液晶の倒れる方向を制御するPVA(Patterned Vertical Alignment)方式が知られている。In recent years, among the liquid crystal display element display methods, the vertical (VA) liquid crystal display elements are widely used for large-screen liquid crystal televisions and high-definition mobile applications (display units of digital cameras and mobile phones). .
In the VA method, the MVA method (Multi Vertical Alignment) in which a projection for controlling the direction in which the liquid crystal falls is formed on the TFT plate or the color filter substrate, or the direction in which the liquid crystal falls by the electric field by forming a slit in the ITO electrode of the substrate. A PVA (patterned vertical alignment) system to be controlled is known.
別の配向方式として、PSA(Polymer sustained Alignment)方式がある。VA方式の中でも、PSA方式は近年注目されている技術である。この方式は、液晶中に光重合性化合物を添加し、液晶パネル作製後に、電界を印加し液晶が倒れた状態でUVを液晶パネルに照射する。その結果、重合性化合物が光重合することで液晶の配向方向が固定化され、プレチルトが生じ、応答速度が向上する。液晶パネルを構成する片側の電極にスリットを作製し、対向側の電極パターンにはMVAのような突起やPVAのようなスリットを設けていない構造でも動作可能であり、製造の簡略化や優れたパネル透過率が得られることを特徴としている。(特許文献1参照) As another alignment method, there is a PSA (Polymer sustained Alignment) method. Among VA systems, the PSA system is a technology that has attracted attention in recent years. In this method, a photopolymerizable compound is added to a liquid crystal, and after the liquid crystal panel is produced, an electric field is applied to irradiate the liquid crystal panel with UV in a state where the liquid crystal falls down. As a result, the polymerizable compound is photopolymerized to fix the alignment direction of the liquid crystal, causing a pretilt and improving the response speed. It is possible to operate with a structure in which a slit is made in one electrode constituting the liquid crystal panel, and the electrode pattern on the opposite side is not provided with a protrusion such as MVA or a slit such as PVA, and the manufacturing is simplified and excellent. The panel transmittance is obtained. (See Patent Document 1)
従来から用いられているポリイミド等の有機系の液晶配向膜材料と共に、無機系の液晶配向膜材料も知られている。例えば、塗布型の無機系配向膜の材料として、テトラアルコキシシランと、トリアルコキシシランと、アルコール及び蓚酸との反応生成物を含有する配向剤組成物が提案され、液晶表示素子の電極基板上で垂直配向性、耐熱性及び均一性に優れる液晶配向膜を形成することが報告されている。(特許文献2参照) Inorganic liquid crystal alignment film materials are known together with organic liquid crystal alignment film materials such as polyimide that have been used conventionally. For example, as a material for a coating-type inorganic alignment film, an alignment agent composition containing a reaction product of tetraalkoxysilane, trialkoxysilane, alcohol, and oxalic acid has been proposed. It has been reported that a liquid crystal alignment film excellent in vertical alignment, heat resistance and uniformity is formed. (See Patent Document 2)
また、テトラアルコキシシラン、特定のトリアルコキシシラン及び水との反応生成物と特定のグリコールエーテル系溶媒を含有する液晶配向剤組成物が提案され、表示不良を防止し、長時間駆動後も残像特性の良好な、液晶を配向させる能力を低下させることなく、且つ光及び熱に対する電圧保持率の低下が少ない液晶配向膜を形成することが報告されている。(特許文献3参照) In addition, a liquid crystal aligning agent composition containing a reaction product of tetraalkoxysilane, specific trialkoxysilane and water and a specific glycol ether solvent has been proposed to prevent display failure and afterimage characteristics even after long-time driving. It has been reported that a liquid crystal alignment film is formed without decreasing the ability to align liquid crystal and having little decrease in voltage holding ratio against light and heat. (See Patent Document 3)
PSA方式の液晶表示素子においては、液晶に添加する重合性化合物の溶解性が低く、添加量を増やすと低温時に析出するといった問題がある。他方で、重合性化合物の添加量を減らすと良好な配向状態が得られなくなる。また、液晶中に残留する未反応の重合性化合物は液晶中の不純物(コンタミ)となるため液晶表示素子の信頼性を低下させるといった問題がある。この問題に対し、配向膜中に重合反応をする側鎖を導入することで、重合性化合物を添加していない液晶を使用した場合においても、PSA方式と同等な特性を得ることができる。 In the PSA type liquid crystal display element, there is a problem that the polymerizable compound added to the liquid crystal has low solubility, and when the addition amount is increased, it is precipitated at a low temperature. On the other hand, when the addition amount of the polymerizable compound is reduced, a good alignment state cannot be obtained. Moreover, since the unreacted polymerizable compound remaining in the liquid crystal becomes an impurity (contamination) in the liquid crystal, there is a problem that the reliability of the liquid crystal display element is lowered. With respect to this problem, by introducing a side chain that undergoes a polymerization reaction into the alignment film, characteristics equivalent to those of the PSA method can be obtained even when a liquid crystal to which no polymerizable compound is added is used.
垂直配向をするVAモードにおいては、垂直配向をさせるための強い垂直配向力が必要であるが、重合性化合物を用いないこの方式では、垂直配向力を向上させるとUV照射後の応答速度は遅くなり、UV照射後の応答速度を向上させると、垂直配向力が低下する。垂直配向力とUV照射後の応答速度の向上はトレードオフ(二律背反)の関係にある。 In the VA mode in which the vertical alignment is performed, a strong vertical alignment force is required for the vertical alignment. However, in this method without using a polymerizable compound, the response speed after UV irradiation becomes slow when the vertical alignment force is improved. Thus, when the response speed after UV irradiation is improved, the vertical alignment force decreases. The improvement in the vertical alignment force and the response speed after UV irradiation has a trade-off relationship.
本発明の課題は、重合性化合物を添加しない液晶を用いて、PSA方式と同様に処理し、UV照射後の応答速度を向上させる方式の液晶表示素子においても、垂直配向力を低下させることなく、UV照射後の応答速度を向上させることが可能な液晶配向膜を形成することが可能な液晶配向剤、及び該液晶配向剤から得られる液晶配向膜を有する液晶表示素子を提供することである。 An object of the present invention is to use a liquid crystal to which a polymerizable compound is not added and treat the same as in the PSA method to improve the response speed after UV irradiation without reducing the vertical alignment force. It is to provide a liquid crystal alignment agent capable of forming a liquid crystal alignment film capable of improving the response speed after UV irradiation, and a liquid crystal display element having a liquid crystal alignment film obtained from the liquid crystal alignment agent. .
本発明は、以下を要旨とする。
〔1〕下記のポリシロキサン(A)及びポリシロキサン(B)を含有する液晶配向剤。
ポリシロキサン(A):式(1)で表されるアルコキシシラン及び式(2)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサン。
R1Si(OR2)3 (1)
(R1はフッ素原子で置換されていてもよい、炭素数8〜30の炭化水素基であり、R2は炭素数1〜5のアルキル基を表す。)
R3Si(OR4)3 (2)
(R3は、アクリル基、メタクリル基若しくはスチリル基で置換された炭素数1〜30のアルキル基であり、R4は炭素数1〜5のアルキル基を表す。)
ポリシロキサン(B):式(3)で表されるアルコキシシランを70%〜100%含有するアルコキシシランを重縮合して得られるポリシロキサン。
Si(OR5)4 (3)
(R5は炭素数1〜5のアルキル基を表す。)
The gist of the present invention is as follows.
[1] A liquid crystal aligning agent containing the following polysiloxane (A) and polysiloxane (B).
Polysiloxane (A): A polysiloxane obtained by polycondensation of an alkoxysilane represented by the formula (1) and an alkoxysilane containing the alkoxysilane represented by the formula (2).
R 1 Si (OR 2 ) 3 (1)
(R 1 is an optionally substituted hydrocarbon group having 8 to 30 carbon atoms, and R 2 represents an alkyl group having 1 to 5 carbon atoms.)
R 3 Si (OR 4 ) 3 (2)
(R 3 is acryl group, an alkyl group has been C1-30 substituted methacrylic group or a styryl group, R 4 represents an alkyl group having 1 to 5 carbon atoms.)
Polysiloxane (B): polysiloxane obtained by polycondensation of alkoxysilane containing 70% to 100% of alkoxysilane represented by formula (3).
Si (OR 5 ) 4 (3)
(R 5 represents an alkyl group having 1 to 5 carbon atoms.)
〔2〕ポリシロキサン(B)が、さらに式(2)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサンである、上記〔1〕に記載の液晶配向剤。
〔3〕ポリシロキサン(B)が、さらに式(4)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサンである、上記〔1〕に記載の液晶配向剤。
R6Si(OR7)3 (4)
(R6は、炭素数1〜5のアルキル基であり、R7は炭素数1〜5のアルキル基を表す。)
〔4〕ポリシロキサン(A)及びポリシロキサン(B)から選ばれる少なくとも一種のポリシロキサンが、さらに、下記式(5)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサンである、上記〔1〕〜〔3〕のいずれかに記載の液晶配向剤。
(R8)nSi(OR9)4−n (5)
(R8は、水素原子、又はヘテロ原子、ハロゲン原子、アミノ基、グリシドキシ基、メルカプト基、イソシアネート基若しくはウレイド基で置換されていてもよい、炭素数1〜12の炭化水素基であり、R9は炭素数1〜5のアルキル基であり、nは0〜3の整数を表す。)[2] The liquid crystal aligning agent according to [1], wherein the polysiloxane (B) is a polysiloxane obtained by polycondensation of an alkoxysilane containing an alkoxysilane represented by the formula (2).
[3] The liquid crystal aligning agent according to [1], wherein the polysiloxane (B) is a polysiloxane obtained by polycondensation of an alkoxysilane containing an alkoxysilane represented by the formula (4).
R 6 Si (OR 7 ) 3 (4)
(R 6 is an alkyl group having 1 to 5 carbon atoms, and R 7 represents an alkyl group having 1 to 5 carbon atoms.)
[4] A polysiloxane obtained by polycondensing an alkoxysilane containing an alkoxysilane represented by the following formula (5), wherein at least one polysiloxane selected from polysiloxane (A) and polysiloxane (B) The liquid crystal aligning agent in any one of said [1]-[3] which is siloxane.
(R 8 ) n Si (OR 9 ) 4-n (5)
(R 8 is a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms which may be substituted with a hetero atom, a halogen atom, an amino group, a glycidoxy group, a mercapto group, an isocyanate group or a ureido group; 9 is an alkyl group having 1 to 5 carbon atoms, and n represents an integer of 0 to 3.)
〔5〕前記式(1)で表されるアルコキシシランが、ポリシロキサン(A)に用いられる全アルコキシシラン中、1モル%〜20モル%含まれ、かつ前記式(2)で表されるアルコキシシランが、ポリシロキサン(A)に用いられる全アルコキシシラン中、10モル%〜80モル%含まれる上記〔1〕〜〔3〕のいずれかに記載の液晶配向剤。
〔6〕上記〔1〕〜〔5〕のいずれかに記載の液晶配向剤から得られる液晶配向膜。
〔7〕上記〔6〕に記載の液晶配向膜を有する液晶表示素子。
〔8〕上記〔1〕〜〔5〕のいずれかに記載の液晶配向剤を塗布し、焼成した2枚の基板で液晶を挟持し、電圧を印加した状態でUVを照射する液晶表示素子の製造方法。
[5] The alkoxysilane represented by the formula (1) is contained in an amount of 1 mol% to 20 mol% in the total alkoxysilane used in the polysiloxane (A), and is represented by the formula (2). The liquid crystal aligning agent in any one of said [1]-[3] in which 10 mol%-80 mol% are contained in all the alkoxysilanes used for polysiloxane (A).
[6] A liquid crystal alignment film obtained from the liquid crystal aligning agent according to any one of [1] to [5].
[7] A liquid crystal display device having the liquid crystal alignment film according to [6].
[8] A liquid crystal display element that applies the liquid crystal aligning agent according to any one of [1] to [5], sandwiches liquid crystal between two baked substrates, and irradiates UV in a state where a voltage is applied. Production method.
本発明によれば、重合性化合物を添加しない液晶を用い、PSA方式と同様にUVを照射することで、垂直配向力を低下させることなく、UV照射後の応答速度を向上することが可能な液晶配向膜を形成することが可能な液晶配向剤、及び該液晶配向剤から得られる液晶配向膜を有する液晶表示素子を得ることができる。 According to the present invention, it is possible to improve the response speed after UV irradiation without reducing the vertical alignment force by irradiating UV similarly to the PSA method using a liquid crystal to which no polymerizable compound is added. A liquid crystal aligning agent capable of forming a liquid crystal aligning film and a liquid crystal display element having a liquid crystal aligning film obtained from the liquid crystal aligning agent can be obtained.
<ポリシロキサン(A)>
ポリシロキサン(A)は、式(1)で表されるアルコキシシラン及び式(2)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサンである。
R1Si(OR2)3 (1)
式(1)中、R1はフッ素原子で置換されていてもよい、炭素数8〜30の炭化水素基であり、R2は炭素数1〜5のアルキル基を表す。
R3Si(OR4)3 (2)
式(2)中、R3は、アクリル基、メタクリル基若しくはスチリル基で置換されたアルキル基であり、R4は炭素数1〜5のアルキル基を表す。
<Polysiloxane (A)>
The polysiloxane (A) is a polysiloxane obtained by polycondensation of an alkoxysilane represented by the formula (1) and an alkoxysilane containing the alkoxysilane represented by the formula (2).
R 1 Si (OR 2 ) 3 (1)
In Formula (1), R 1 is a hydrocarbon group having 8 to 30 carbon atoms which may be substituted with a fluorine atom, and R 2 represents an alkyl group having 1 to 5 carbon atoms.
R 3 Si (OR 4 ) 3 (2)
In formula (2), R 3 is an alkyl group substituted with an acryl group, a methacryl group or a styryl group, and R 4 represents an alkyl group having 1 to 5 carbon atoms.
式(1)で表されるアルコキシシランのR1(以下、特定有機基ともいう。)は、フッ素で置換されていてもよい炭素数が8〜30、好ましくは8〜22の炭化水素基であって、液晶を垂直に配向させる効果を有するものであれば特に限定されない。
特定有機基の例としては、アルキル基、フルオロアルキル基、アルケニル基、フェネチル基、スチリルアルキル基、ナフチル基、フルオロフェニルアルキル基等が挙げられる。これらの中でも、R1がアルキル基、又はフルオロアルキル基であるアルコキシシランは比較的安価で市販品として入手が容易であるため好ましい。上記フルオロアルキル基において、フッ素原子の数は、1以上であり、全部の水素がフッ素原子で置換されていてもよい。
特に、R1がアルキル基であるアルコキシシランが好ましい。本発明に用いるポリシロキサン(A)は、これらの特定有機基を複数種有していてもよい。
式(1)で表されるアルコキシシランのR2は、炭素数1〜5、好ましくは1〜3のアルキル基である。より好ましくは、R2がメチル基又はエチル基である。R 1 of the alkoxysilane represented by the formula (1) (hereinafter also referred to as a specific organic group) is a hydrocarbon group having 8 to 30 carbon atoms, preferably 8 to 22 carbon atoms which may be substituted with fluorine. There is no particular limitation as long as it has the effect of vertically aligning the liquid crystal.
Examples of the specific organic group include an alkyl group, a fluoroalkyl group, an alkenyl group, a phenethyl group, a styrylalkyl group, a naphthyl group, and a fluorophenylalkyl group. Among these, alkoxysilanes in which R 1 is an alkyl group or a fluoroalkyl group are preferable because they are relatively inexpensive and easily available as commercial products. In the fluoroalkyl group, the number of fluorine atoms is 1 or more, and all hydrogens may be substituted with fluorine atoms.
In particular, alkoxysilane in which R 1 is an alkyl group is preferable. The polysiloxane (A) used in the present invention may have a plurality of these specific organic groups.
R 2 of the alkoxysilane represented by the formula (1) is an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms. More preferably, R 2 is a methyl group or an ethyl group.
このような式(1)で表されるアルコキシシランの具体例を挙げるが、これに限定されるものではない。
例えば、オクチルトリメトキシシラン、オクチルトリエトキシシラン、デシルトリメトキシシラン、デシルトリエトキシシラン、ドデシルトリメトキシシラン、ドデシルトリエトキシシラン、ヘキサデシルトリメトキシシラン、ヘキサデシルトリエトキシシラン、ヘプタデシルトリメトキシシラン、ヘプタデシルトリエトキシシラン、オクタデシルトリメトキシシラン、オクタデシルトリエトキシシラン、ノナデシルトリメトキシシラン、ノナデシルトリエトキシシラン、ウンデシルトリエトキシシラン、ウンデシルトリメトキシシラン、21−ドコセニルトリエトキシシラン、トリデカフルオロオクチルトリメトキシシラン、トリデカフルオロオクチルトリエトキシシラン、ヘプタデカフルオロデシルトリメトキシシラン、ヘプタデカフルオロデシルトリエトキシシラン、イソオクチルトリエトキシシラン、フェネチルトリエトキシシラン、ペンタフルオロフェニルプロピルトリメトキシシラン、m−スチリルエチルトリメトキシシラン、p−スチリルエチルトリメトキシシラン、(1−ナフチル)トリエトキシシラン、(1−ナフチル)トリメトキシシラン等が挙げられる。なかでも、オクチルトリメトキシシラン、オクチルトリエトキシシラン、デシルトリメトキシシラン、デシルトリエトキシシラン、ドデシルトリメトキシシラン、ドデシルトリエトキシシラン、ヘキサデシルトリメトキシシラン、ヘキサデシルトリエトキシシラン、ヘプタデシルトリメトキシシラン、ヘプタデシルトリエトキシシラン、オクタデシルトリメトキシシラン、オクタデシルトリエトキシシラン、ノナデシルトリメトキシシラン、ノナデシルトリエトキシシラン、ウンデシルトリエトキシシラン、又はウンデシルトリメトキシシランが好ましい。Although the specific example of the alkoxysilane represented by such Formula (1) is given, it is not limited to this.
For example, octyltrimethoxysilane, octyltriethoxysilane, decyltrimethoxysilane, decyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, heptadecyltrimethoxysilane, Heptadecyltriethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, nonadecyltrimethoxysilane, nonadecyltriethoxysilane, undecyltriethoxysilane, undecyltrimethoxysilane, 21-docosenyltriethoxysilane, trideca Fluorooctyltrimethoxysilane, tridecafluorooctyltriethoxysilane, heptadecafluorodecyltrimethoxysilane, heptadecaful Lodecyltriethoxysilane, isooctyltriethoxysilane, phenethyltriethoxysilane, pentafluorophenylpropyltrimethoxysilane, m-styrylethyltrimethoxysilane, p-styrylethyltrimethoxysilane, (1-naphthyl) triethoxysilane, ( 1-naphthyl) trimethoxysilane and the like. Among them, octyltrimethoxysilane, octyltriethoxysilane, decyltrimethoxysilane, decyltriethoxysilane, dodecyltrimethoxysilane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, heptadecyltrimethoxysilane Heptadecyltriethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, nonadecyltrimethoxysilane, nonadecyltriethoxysilane, undecyltriethoxysilane, or undecyltrimethoxysilane is preferred.
上述した特定有機基を有する式(1)で表されるアルコキシシランは、ポリシロキサン(A)を得るために用いる全アルコキシシラン中において、良好な液晶配向性を得るため、1モル%以上が好ましい。より好ましくは1.5モル%以上である。更に好ましくは2モル%以上である。また、形成される液晶配向膜の充分な硬化特性を得るためには、30モル%以下が好ましい。より好ましくは25モル%以下である。
式(2)で表されるアルコキシシランのR3(以下、第二の特定有機基ともいう)は、アクリル基(アクリロイル基又はアクリロキシ基ともいう。)、メタクリル基(メタクリロイル基又はメタクリロキシ基ともいう。)、及びスチリル基からなる群から選ばれる少なくとも一つで置換されたアルキル基である。置換されている水素原子は1つ以上であり、好ましくは1つである。アルキル基の炭素数は1〜30が好ましく、より好ましくは1〜20である。更に好ましくは1〜10である。アルキル基は、直鎖状でも分岐状でもよいが、直鎖状がより好ましい。
式(2)で表されるアルコキシシランのR4は、炭素数1〜5のアルキル基であり、好ましくは炭素数1〜3であり、特に好ましくは炭素数1〜2である。
The alkoxysilane represented by the formula (1) having the specific organic group described above is preferably 1 mol% or more in order to obtain good liquid crystal alignment in all alkoxysilanes used for obtaining the polysiloxane (A). . More preferably, it is 1.5 mol% or more. More preferably, it is 2 mol% or more. Further, in order to obtain sufficient curing characteristics of the liquid crystal alignment film to be formed, 30 mol% or less is preferable. More preferably, it is 25 mol% or less.
R 3 of the alkoxysilane represented by the formula (2) (hereinafter also referred to as a second specific organic group) is an acrylic group (also referred to as an acryloyl group or an acryloxy group) , a methacryl group (also referred to as a methacryloyl group or a methacryloxy group ). And an alkyl group substituted with at least one selected from the group consisting of styryl groups. The number of substituted hydrogen atoms is one or more, preferably one. 1-30 are preferable and, as for carbon number of an alkyl group, More preferably, it is 1-20. More preferably, it is 1-10. The alkyl group may be linear or branched, but is more preferably linear.
R 4 of the alkoxysilane represented by the formula (2) is an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms, and particularly preferably 1 to 2 carbon atoms.
式(2)で表されるアルコキシシランの具体例を挙げるが、これらに限定されるものではでない。例えば、3−メタクリロキシプロピルトリメトキシシラン、3−メタクリロキシプロピルトリエトキシシラン、メタクリロキシメチルトリメトキシシラン、メタクリロキシメチルトリエトキシシラン、3−アクリロキシプロピルトリメトキシシラン、3−アクリロキシプロピルトリエトキシシラン、アクリロキシエチルトリメトキシシラン、アクリロキシエチルトリエトキシシラン、スチリルエチルトリメトキシシラン、スチリルエチルトリエトキシシラン、3−(N−スチリルメチル−2−アミノエチルアミノ)プロピルトリメトキシシランである。 Although the specific example of the alkoxysilane represented by Formula (2) is given, it is not limited to these. For example, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, methacryloxymethyltrimethoxysilane, methacryloxymethyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 3-acryloxypropyltriethoxy Silane, acryloxyethyltrimethoxysilane, acryloxyethyltriethoxysilane, styrylethyltrimethoxysilane, styrylethyltriethoxysilane, and 3- (N-styrylmethyl-2-aminoethylamino) propyltrimethoxysilane.
ポリシロキサン(A)の製造には、式(1)及び式(2)で表されるアルコキシシラン以外に、基板との密着性、液晶分子との親和性改善等を目的として、本発明の効果を損なわない限りにおいて、下記式(5)で表されるアルコキシシランを一種又は複数種使用することもできる。式(5)で表されるアルコキシシランは、ポリシロキサンに種々の特性を付与させることが可能であるため、必要特性に応じて一種又は複数種を選択して用いることができる。
(R8)nSi(OR9)4−n (5)
式(5)中、R8は、水素原子、又はヘテロ原子、ハロゲン原子、アミノ基、グリシドキシ基、メルカプト基、イソシアネート基若しくはウレイド基で置換されていてもよい、炭素数1〜10の炭化水素基である。
R9は炭素数1〜5、好ましくは1〜3のアルキル基である。
nは0〜3、好ましくは0〜2の整数である。For the production of polysiloxane (A), in addition to the alkoxysilanes represented by the formulas (1) and (2), the effects of the present invention are intended for the purpose of improving the adhesion with the substrate and the affinity with the liquid crystal molecules. 1 or a plurality of alkoxysilanes represented by the following formula (5) can also be used. Since the alkoxysilane represented by the formula (5) can impart various characteristics to the polysiloxane, one or more kinds can be selected and used according to the required characteristics.
(R 8 ) n Si (OR 9 ) 4-n (5)
In formula (5), R 8 is a hydrogen atom or a hydrocarbon having 1 to 10 carbon atoms which may be substituted with a hetero atom, a halogen atom, an amino group, a glycidoxy group, a mercapto group, an isocyanate group or a ureido group. It is a group.
R 9 is an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms.
n is an integer of 0 to 3, preferably 0 to 2.
式(5)で表されるアルコキシシランのR8は、水素原子又は炭素数が1〜10の炭化水素基(以下、第三の特定有機基ともいう)である。
第三の特定有機基の例としては、脂肪族炭化水素基;脂肪族環、芳香族環及びヘテロ環のような環構造の炭化水素基;不飽和結合を有する炭化水素基;酸素原子、窒素原子、硫黄原子等のヘテロ原子等を含んでいてもよく、分岐構造を有していてもよい、炭素数が1〜6の炭化水素基である。第三の特定有機基はハロゲン原子、アミノ基、グリシドキシ基、メルカプト基、イソシアネート基、ウレイド基などで置換されていてもよい。R 8 of the alkoxysilane represented by the formula (5) is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms (hereinafter also referred to as a third specific organic group).
Examples of the third specific organic group include an aliphatic hydrocarbon group; a hydrocarbon group having a ring structure such as an aliphatic ring, an aromatic ring and a heterocyclic ring; a hydrocarbon group having an unsaturated bond; an oxygen atom, nitrogen It is a C1-C6 hydrocarbon group which may contain hetero atoms, such as an atom and a sulfur atom, and may have a branched structure. The third specific organic group may be substituted with a halogen atom, an amino group, a glycidoxy group, a mercapto group, an isocyanate group, a ureido group, or the like.
以下に、式(5)で表されるアルコキシシランの具体例を挙げるが、これに限定されるものではない。3−(2−アミノエチルアミノプロピル)トリメトキシシラン、3−(2−アミノエチルアミノプロピル)トリエトキシシラン、2−アミノエチルアミノメチルトリメトキシシラン、2−(2−アミノエチルチオエチル)トリエトキシシラン、3−メルカプトプロピルトリエトキシシラン、メルカプトメチルトリメトキシシラン、ビニルトリエトキシシラン、3−イソシアネートプロピルトリエトキシシラン、トリフルオロプロピルトリメトキシシラン、クロロプロピルトリエトキシシラン、ブロモプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、ジメチルジエトキシシラン、ジメチルジメトキシシラン、ジエチルジエトキシシラン、ジエチルジメトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、3−アミノプロピルメチルジエトキシシラン、3―アミノプロピルジメチルエトキシシラン、トリメチルエトキシシラン、トリメチルメトキシシラン、γ-ウレイドプロピルトリエトキシシラン、γ-ウレイドプロピルトリメトキシシラン及びγ-ウレイドプロピルトリプロポキシシラン等が挙げられる。 Although the specific example of the alkoxysilane represented by Formula (5) below is given, it is not limited to this. 3- (2-aminoethylaminopropyl) trimethoxysilane, 3- (2-aminoethylaminopropyl) triethoxysilane, 2-aminoethylaminomethyltrimethoxysilane, 2- (2-aminoethylthioethyl) triethoxy Silane, 3-mercaptopropyltriethoxysilane, mercaptomethyltrimethoxysilane, vinyltriethoxysilane, 3-isocyanatopropyltriethoxysilane, trifluoropropyltrimethoxysilane, chloropropyltriethoxysilane, bromopropyltriethoxysilane, 3- Mercaptopropyltrimethoxysilane, dimethyldiethoxysilane, dimethyldimethoxysilane, diethyldiethoxysilane, diethyldimethoxysilane, diphenyldimethoxysilane, diphenyldiet Sisilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyldimethylethoxysilane, trimethylethoxysilane, trimethylmethoxysilane, γ-ureidopropyltriethoxysilane, γ-ureidopropyltrimethoxysilane and γ-ureidopropyltripropoxysilane Etc.
式(5)で表されるアルコキシシランにおいて、nが0であるアルコキシシランは、テトラアルコキシシランである。テトラアルコキシシランは、式(1)〜(4)で表されるアルコキシシランと縮合し易いので、本発明のポリシロキサン(A)を得るために好ましい。
このような式(5)において、nが0であるアルコキシシランとしては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、又はテトラブトキシシランがより好ましく、特に、テトラメトキシシラン又はテトラエトキシシランが好ましい。
本発明では、式(1)で表されるアルコキシシランが、ポリシロキサン(A)の製造に使用される全アルコキシシラン中、好ましくは1モル%〜20モル%、特に好ましくは2モル%〜20モル%含まれ、かつ式(2)で表されるアルコキシシランが、ポリシロキサン(A)の製造に使用される全アルコキシシラン中、10モル%〜80モル%、特に好ましくは30モル%〜80モル%含まれるのが好ましい。In the alkoxysilane represented by the formula (5), the alkoxysilane in which n is 0 is tetraalkoxysilane. Tetraalkoxysilane is preferable for obtaining the polysiloxane (A) of the present invention because it easily condenses with the alkoxysilane represented by the formulas (1) to (4).
In such a formula (5), as alkoxysilane whose n is 0, tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, or tetrabutoxysilane is more preferable, and tetramethoxysilane or tetraethoxysilane is particularly preferable. .
In the present invention, the alkoxysilane represented by the formula (1) is preferably 1 mol% to 20 mol%, particularly preferably 2 mol% to 20 in the total alkoxysilane used for the production of the polysiloxane (A). The alkoxysilane which is contained in mol% and represented by the formula (2) is 10 mol% to 80 mol%, particularly preferably 30 mol% to 80 mol in all alkoxysilanes used for the production of the polysiloxane (A). It is preferably contained in mol%.
<ポリシロキサン(B)>
ポリシロキサン(B)は、式(3)で表されるアルコキシシランを70重量%〜100重量%含有するアルコキシシランを重縮合して得られるポリシロキサンである。
Si(OR5)4 (3)
式(3)中、R5は炭素数1〜5のアルキル基を表し、炭素数1又は2が好ましい。
このような式(3)で表されるアルコキシシランの具体例としては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン又はテトラブトキシシランがより好ましく、特に、テトラメトキシシラン又はテトラエトキシシランが好ましい。<Polysiloxane (B)>
The polysiloxane (B) is a polysiloxane obtained by polycondensation of an alkoxysilane containing 70% by weight to 100% by weight of the alkoxysilane represented by the formula (3).
Si (OR 5 ) 4 (3)
In Formula (3), R 5 represents an alkyl group having 1 to 5 carbon atoms, and preferably 1 or 2 carbon atoms.
As specific examples of the alkoxysilane represented by the formula (3), tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, or tetrabutoxysilane is more preferable, and tetramethoxysilane or tetraethoxysilane is particularly preferable.
ポリシロキサン(B)は、式(3)で表されるアルコキシシランの他に、さらに式(2)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサンであっても良い。
ポリシロキサン(B)に含まれる式(2)で表されるアルコキシシランとしては、上記ポリシロキサン(A)の製造において用いたアルコキシシランが使用できる。具体例についても、上記と同様である。The polysiloxane (B) may be a polysiloxane obtained by polycondensing an alkoxysilane containing an alkoxysilane represented by the formula (2) in addition to the alkoxysilane represented by the formula (3). good.
As the alkoxysilane represented by the formula (2) contained in the polysiloxane (B), the alkoxysilane used in the production of the polysiloxane (A) can be used. The specific examples are the same as described above.
ポリシロキサン(B)は、式(3)で表されるアルコキシシランの他に、さらに式(4)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサンであっても良い。
R6Si(OR7)3 (4)
式(4)中、R6は、炭素数1〜5のアルキル基であり、R7は炭素数1〜5のアルキル基を表す。
式(4)で表されるアルコキシシランのR6は、炭素数1〜5のアルキル基である。アルキル基の炭素数は1〜4が好ましく、より好ましくは1〜3である。
式(4)で表されるアルコキシシランのR7は、炭素数1〜5のアルキル基であり、好ましくは炭素数が1〜3であり、特に好ましくは炭素数1〜2である。The polysiloxane (B) may be a polysiloxane obtained by polycondensing an alkoxysilane containing an alkoxysilane represented by the formula (4) in addition to the alkoxysilane represented by the formula (3). good.
R 6 Si (OR 7 ) 3 (4)
In Formula (4), R 6 is an alkyl group having 1 to 5 carbon atoms, and R 7 represents an alkyl group having 1 to 5 carbon atoms.
R 6 of the alkoxysilane represented by the formula (4) is an alkyl group having 1 to 5 carbon atoms. 1-4 are preferable, as for carbon number of an alkyl group, More preferably, it is 1-3.
R 7 of the alkoxysilane represented by the formula (4) is an alkyl group having 1 to 5 carbon atoms, preferably 1 to 3 carbon atoms, and particularly preferably 1 to 2 carbon atoms.
式(4)で表されるアルコキシシランの具体例を挙げるが、これらに限定されるものではない。例えば、メチルトリエトキシシラン、メチルトリメトキシシラン、ジメチルトリメトキシシラン、ジメチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシランである。
特に、式(3)で表されるアルコキシシランの他に、さらに式(4)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサン(B)を含有する液晶配向剤は、垂直配向力が高く、特に望ましい。Although the specific example of the alkoxysilane represented by Formula (4) is given, it is not limited to these. For example, methyltriethoxysilane, methyltrimethoxysilane, dimethyltrimethoxysilane, dimethyltriethoxysilane, n-propyltrimethoxysilane, and n-propyltriethoxysilane.
In particular, in addition to the alkoxysilane represented by the formula (3), a liquid crystal aligning agent containing a polysiloxane (B) obtained by polycondensation of an alkoxysilane containing an alkoxysilane represented by the formula (4) Is particularly desirable because of its high vertical alignment force.
重合性化合物を添加していない液晶を用いて、電圧を印加しながらUV照射することにより液晶表示素子の応答速度を向上するためには、第二の特定有機基を有する式(2)で表されるアルコキシシランは、ポリシロキサン(B)を得るために用いる全アルコキシシラン中において、10モル%以上が好ましい。より好ましくは20モル%以上である。更に好ましくは30モル%以上である。また、形成される液晶配向膜を充分に硬化させるためには、75モル%以下が好ましい。 In order to improve the response speed of the liquid crystal display element by applying UV light while applying a voltage using a liquid crystal to which no polymerizable compound is added, it is expressed by the formula (2) having the second specific organic group. The alkoxysilane to be used is preferably 10 mol% or more in all alkoxysilanes used for obtaining the polysiloxane (B). More preferably, it is 20 mol% or more. More preferably, it is 30 mol% or more. Moreover, in order to fully harden the liquid crystal aligning film formed, 75 mol% or less is preferable.
ポリシロキサン(B)の製造には、式(2)、式(3)、及び式(4)で表されるアルコキシシラン以外に、基板との密着性、液晶分子との親和性改善等を目的として、本発明の効果を損なわない限りにおいて、下記式(5)で表されるアルコキシシランを一種又は複数種使用することも出来る。式(5)で表されるアルコキシシランは、ポリシロキサンに種々の特性を付与させることが可能であるため、必要特性に応じて一種又は複数種を選択して用いることができる。
(R8)nSi(OR9)4−n (5)
式(5)中、R8及びR9の構造及び好ましい範囲、式(5)で表されるアルコキシシランの具体例は、前記した通りである。
<ポリシロキサンの製造方法>For the production of polysiloxane (B), in addition to the alkoxysilanes represented by formula (2), formula (3), and formula (4), the purpose is to improve adhesion to the substrate and affinity with liquid crystal molecules. As long as the effect of the present invention is not impaired, one or more alkoxysilanes represented by the following formula (5) can be used. Since the alkoxysilane represented by the formula (5) can impart various characteristics to the polysiloxane, one or more kinds can be selected and used according to the required characteristics.
(R 8 ) n Si (OR 9 ) 4-n (5)
In formula (5), the structures and preferred ranges of R 8 and R 9 and specific examples of alkoxysilanes represented by formula (5) are as described above.
<Method for producing polysiloxane>
本発明に用いるポリシロキサンを得る方法は特に限定されない。本発明のポリシロキサン(A)においては、上記した式(1)及び式(2)を必須成分とするアルコキシシランを、ポリシロキサン(B)においては、上記した式(3)を必須成分とするアルコキシシランを、有機溶媒中で重縮合させて得られる。通常、ポリシロキサンは、このようなアルコキシシランを重縮合して、有機溶媒に均一に溶解した溶液として得られる。 The method for obtaining the polysiloxane used in the present invention is not particularly limited. In the polysiloxane (A) of the present invention, the alkoxysilane having the above-described formulas (1) and (2) as essential components is used, and in the polysiloxane (B), the above-described formula (3) is used as an essential component. An alkoxysilane is obtained by polycondensation in an organic solvent. Usually, polysiloxane is obtained as a solution obtained by polycondensation of such alkoxysilanes and uniformly dissolved in an organic solvent.
アルコキシシランを重縮合する方法として、例えば、アルコキシシランをアルコール又はグリコールなどの溶媒中で加水分解・縮合する方法が挙げられる。その際、加水分解・縮合反応は、部分加水分解及び完全加水分解のいずれであってもよい。完全加水分解の場合は、理論上、アルコキシシラン中の全アルコキシ基の0.5倍モルの水を加えればよいが、通常は0.5倍モルより過剰量の水を加えるのが好ましい。
本発明においては、上記反応に用いる水の量は、所望により適宜選択することができるが、通常、アルコキシシラン中の全アルコキシ基の0.5倍モル〜2.5倍モルであるのが好ましく、1倍モル〜2倍モルがより好ましい。Examples of the method for polycondensing alkoxysilane include a method of hydrolyzing and condensing alkoxysilane in a solvent such as alcohol or glycol. At that time, the hydrolysis / condensation reaction may be either partial hydrolysis or complete hydrolysis. In the case of complete hydrolysis, theoretically, it is sufficient to add 0.5 times mole of water of all alkoxy groups in the alkoxysilane, but it is usually preferable to add an excess amount of water more than 0.5 times mole.
In the present invention, the amount of water used in the above reaction can be appropriately selected as desired, but usually it is preferably 0.5 to 2.5 times mol of all alkoxy groups in the alkoxysilane. 1-fold mole to 2-fold mole is more preferred.
また、通常、加水分解・縮合反応を促進する目的で、塩酸、硫酸、硝酸、酢酸、蟻酸、蓚酸、マレイン酸、フマル酸などの酸;アンモニア、メチルアミン、エチルアミン、エタノールアミン、トリエチルアミンなどのアルカリ;塩酸、硫酸、硝酸などの金属塩;などの触媒が用いられる。加えて、アルコキシシランが溶解した溶液を加熱することで、更に、加水分解・縮合反応を促進させることも一般的である。その際、加熱温度及び加熱時間は所望により適宜選択できる。例えば、50℃で24時間加熱・撹拌したり、還流下で1時間加熱・撹拌するなどの方法が挙げられる。 Usually, for the purpose of promoting hydrolysis / condensation reaction, acids such as hydrochloric acid, sulfuric acid, nitric acid, acetic acid, formic acid, succinic acid, maleic acid, fumaric acid; alkalis such as ammonia, methylamine, ethylamine, ethanolamine, triethylamine A metal salt such as hydrochloric acid, sulfuric acid or nitric acid; In addition, it is also common to further promote the hydrolysis / condensation reaction by heating the solution in which the alkoxysilane is dissolved. At that time, the heating temperature and the heating time can be appropriately selected as desired. For example, heating and stirring at 50 ° C. for 24 hours, heating and stirring for 1 hour under reflux, and the like can be mentioned.
また、別法として、例えば、アルコキシシラン、溶媒及び蓚酸の混合物を加熱して重縮合する方法が挙げられる。具体的には、あらかじめアルコールに蓚酸を加えて蓚酸のアルコール溶液とした後、該溶液を加熱した状態で、アルコキシシランを混合する方法である。その際、用いる蓚酸の量は、アルコキシシランが有する全アルコキシ基の1モルに対して0.2モル〜2モルとすることが好ましく、0.5モル〜1.5モルがより好ましい。この方法における加熱は、液温50℃〜180℃で行うことができる。好ましくは、液の蒸発、揮散などが起こらないように、還流下で数十分〜十数時間加熱する方法である。 As another method, for example, a method of heating and polycondensing a mixture of alkoxysilane, a solvent and oxalic acid can be mentioned. Specifically, after adding oxalic acid to alcohol in advance to obtain an alcohol solution of oxalic acid, the alkoxysilane is mixed while the solution is heated. In that case, the amount of succinic acid to be used is preferably 0.2 mol to 2 mol, more preferably 0.5 mol to 1.5 mol, relative to 1 mol of all alkoxy groups of the alkoxysilane. Heating in this method can be performed at a liquid temperature of 50 ° C to 180 ° C. Preferably, it is a method of heating for several tens of minutes to several tens of hours under reflux so that the liquid does not evaporate or volatilize.
ポリシロキサンを得る際に、アルコキシシランを複数種用いる場合は、アルコキシシランをあらかじめ混合し、混合物として用いてもよく、複数種のアルコキシシランを順次混合して用いてもよい。
アルコキシシランを重縮合する際に用いられる溶媒(以下、重合溶媒ともいう)は、アルコキシシランを溶解するものであれば特に限定されない。また、アルコキシシランが溶解しない場合でも、アルコキシシランの重縮合反応の進行とともに溶解するものであればよい。一般的には、アルコキシシランの重縮合反応によりアルコールが生成するため、アルコール類、グリコール類、グリコールエーテル類、又はアルコール類と相溶性の良好な有機溶媒が用いられ、特に好ましくはグリコール類が用いられる。In the case of using a plurality of types of alkoxysilanes when obtaining polysiloxane, the alkoxysilanes may be mixed in advance and used as a mixture, or a plurality of types of alkoxysilanes may be sequentially mixed and used.
The solvent used for polycondensation of alkoxysilane (hereinafter also referred to as polymerization solvent) is not particularly limited as long as it can dissolve alkoxysilane. Moreover, even when alkoxysilane does not melt | dissolve, what melt | dissolves as the polycondensation reaction of alkoxysilane progresses is sufficient. In general, alcohol is produced by polycondensation reaction of alkoxysilane, and therefore alcohols, glycols, glycol ethers, or organic solvents having good compatibility with alcohols are used, and glycols are particularly preferably used. It is done.
このような重合溶媒の具体例としては、メタノール、エタノール、プロパノール、ブタノール,ジアセトンアルコール等のアルコール類;エチレングリコール、ジエチレングリコール、プロピレングリコール、ジプロピレングリコール、へキシレングリコール、1,3−プロパンジオール、1,2−ブタンジオール、1,3−ブタンジオール、1,4−ブタンジオール、2,3−ブタンジオール、1,2−ペンタンジオール、1,3−ペンタンジオール、1,4−ペンタンジオール、1,5−ペンタンジオール、2,4−ペンタンジオール、2,3−ペンタンジオール、1,6−ヘキサンジオール等のグリコール類;エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、エチレングリコールジプロピルエーテル、エチレングリコールジブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノプロピルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、プロピレングリコールジメチルエーテル、プロピレングリコールジエチルエーテル、プロピレングリコールジプロピルエーテル、プロピレングリコールジブチルエーテル等のグリコールエーテル類;N−メチル−2−ピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、γ−ブチロラクトン、ジメチルスルホキシド、テトラメチル尿素、ヘキサメチルホスホトリアミド、m−クレゾール;等が挙げられる。本発明においては、上記の重合溶媒を複数種混合して用いてもよい。 Specific examples of such a polymerization solvent include alcohols such as methanol, ethanol, propanol, butanol, diacetone alcohol; ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, hexylene glycol, 1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 1,2-pentanediol, 1,3-pentanediol, 1,4-pentanediol, 1 Glycols such as 1,5-pentanediol, 2,4-pentanediol, 2,3-pentanediol, 1,6-hexanediol; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether , Ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, ethylene glycol dibutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether , Diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, Glycol ethers such as propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, propylene glycol dibutyl ether; N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, γ-butyrolactone , Dimethyl sulfoxide, tetramethylurea, hexamethylphosphotriamide, m-cresol; and the like. In the present invention, a plurality of the above polymerization solvents may be mixed and used.
上記の方法で得られたポリシロキサンの重合溶液(以下、重合溶液ともいう。)は、原料として仕込んだ全アルコキシシランのケイ素原子をSiO2に換算した濃度(以下、SiO2換算濃度と称す。)として、好ましくは20重量%以下、さらには5重量%〜15重量%とすることがより好ましい。この濃度範囲において任意の濃度を選択することにより、ゲルの生成を抑え、均質な溶液を得ることができる。The polysiloxane polymerization solution (hereinafter also referred to as polymerization solution) obtained by the above method is a concentration obtained by converting silicon atoms of all alkoxysilanes charged as raw materials into SiO 2 (hereinafter referred to as SiO 2 conversion concentration). ) Is preferably 20% by weight or less, more preferably 5% by weight to 15% by weight. By selecting an arbitrary concentration within this concentration range, gel formation can be suppressed and a homogeneous solution can be obtained.
<ポリシロキサンの溶液>
本発明においては、上記の方法で得られた重合溶液をそのままポリシロキサンの溶液としてもよい。また、必要に応じて、上記の方法で得られた溶液を、濃縮したり、溶媒を加えて希釈したり又は他の溶媒に置換して、ポリシロキサンの溶液としてもよい。
その際、用いる溶媒(以下、添加溶媒ともいう。)は、重合溶媒と同じでもよいし、別の溶媒でもよい。この添加溶媒は、ポリシロキサンが均一に溶解している限りにおいて特に限定されず、一種でも複数種でも任意に選択して用いることができる。<Polysiloxane solution>
In the present invention, the polymerization solution obtained by the above method may be used as a polysiloxane solution as it is. If necessary, the solution obtained by the above method may be concentrated, diluted by adding a solvent, or substituted with another solvent to obtain a polysiloxane solution.
In that case, the solvent to be used (hereinafter also referred to as additive solvent) may be the same as the polymerization solvent, or may be another solvent. The additive solvent is not particularly limited as long as the polysiloxane is uniformly dissolved, and one kind or plural kinds can be arbitrarily selected and used.
このような添加溶媒の具体例としては、上記した重合溶媒の例として挙げた溶媒のほかに、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類;酢酸メチル、酢酸エチル、乳酸エチル等のエステル類が挙げられる。
これらの溶媒は、液晶配向剤の粘度の調整、又はスピンコート、フレキソ印刷、インクジェット等で液晶配向剤を基板上に塗布する際の塗布性を向上できる。Specific examples of such an additive solvent include, in addition to the solvents mentioned as examples of the polymerization solvent described above, ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; esters such as methyl acetate, ethyl acetate, and ethyl lactate. Can be mentioned.
These solvents can improve the applicability when the liquid crystal aligning agent is applied onto the substrate by adjusting the viscosity of the liquid crystal aligning agent, or by spin coating, flexographic printing, ink jetting or the like.
<その他の成分>
本発明においては、本発明の効果を損なわない限りにおいて、ポリシロキサン以外のその他の成分、例えば、無機微粒子、メタロキサンオリゴマー、メタロキサンポリマー、レベリング剤、更に界面活性剤等の成分がポリシロキサンの溶液中に含まれていてもよい。
無機微粒子としては、シリカ微粒子、アルミナ微粒子、チタニア微粒子、フッ化マグネシウム微粒子等の微粒子が好ましく、特にコロイド溶液の状態であるものが好ましい。このコロイド溶液は、無機微粒子を分散媒に分散したものでもよいし、市販品のコロイド溶液であってもよい。本発明においては、無機微粒子を含有させることにより、形成される硬化被膜の表面形状及びその他の機能を付与することが可能となる。無機微粒子としては、その平均粒子径が0.001μm〜0.2μmであることが好ましく、更に好ましくは0.001μm〜0.1μmである。無機微粒子の平均粒子径が0.2μmを超える場合には、調製される塗布液を用いて形成される硬化被膜の透明性が低下する場合がある。<Other ingredients>
In the present invention, as long as the effects of the present invention are not impaired, other components other than polysiloxane, for example, inorganic fine particles, metalloxane oligomers, metalloxane polymers, leveling agents, and surfactants are further composed of polysiloxane. It may be contained in the solution.
As the inorganic fine particles, fine particles such as silica fine particles, alumina fine particles, titania fine particles, and magnesium fluoride fine particles are preferable, and those in the state of a colloidal solution are particularly preferable. This colloidal solution may be a dispersion of inorganic fine particles in a dispersion medium, or a commercially available colloidal solution. In the present invention, the inclusion of inorganic fine particles makes it possible to impart the surface shape of the formed cured film and other functions. The inorganic fine particles preferably have an average particle size of 0.001 μm to 0.2 μm, more preferably 0.001 μm to 0.1 μm. When the average particle diameter of the inorganic fine particles exceeds 0.2 μm, the transparency of the cured film formed using the prepared coating liquid may be lowered.
無機微粒子の分散媒としては、水及び有機溶剤を挙げることができる。コロイド溶液としては、被膜形成用塗布液の安定性の観点から、pH又はpKaが1〜10に調整されていることが好ましい。より好ましくは2〜7である。 Examples of the dispersion medium for the inorganic fine particles include water and organic solvents. As a colloidal solution, it is preferable that pH or pKa is adjusted to 1-10 from the viewpoint of the stability of the coating liquid for forming a film. More preferably, it is 2-7.
コロイド溶液の分散媒に用いる有機溶剤としては、メタノール、プロパノール、ブタノール、エチレングリコール、プロピレングリコール、ブタンジオール、ペンタンジオール、ヘキシレングリコール、ジエチレングリコール、ジプロピレングリコール、エチレングリコールモノプロピルエーテル等のアルコール類;メチルエチルケトン、メチルイソブチルケトン等のケトン類;トルエン、キシレン等の芳香族炭化水素類;ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等のアミド類;酢酸エチル、酢酸ブチル、γ−ブチロラクトン等のエステル類;テトラヒドロフラン、1,4−ジオキサン等のエ−テル類;を挙げることができる。これらの中で、アルコール類又はケトン類が好ましい。これら有機溶剤は、単独で又は2種以上を混合して分散媒として使用することができる。 Examples of the organic solvent used for the dispersion medium of the colloidal solution include alcohols such as methanol, propanol, butanol, ethylene glycol, propylene glycol, butanediol, pentanediol, hexylene glycol, diethylene glycol, dipropylene glycol, and ethylene glycol monopropyl ether; Ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic hydrocarbons such as toluene and xylene; amides such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; esters such as ethyl acetate, butyl acetate and γ-butyrolactone; And ethers such as tetrahydrofuran and 1,4-dioxane. Of these, alcohols or ketones are preferred. These organic solvents can be used alone or in admixture of two or more as a dispersion medium.
メタロキサンオリゴマー、及びメタロキサンポリマーとしては、ケイ素、チタン、アルミニウム、タンタル、アンチモン、ビスマス、錫、インジウム、亜鉛等の単独又は複合酸化物前駆体が用いられる。メタロキサンオリゴマー、及びメタロキサンポリマーとしては、市販品であっても、金属アルコキシド、硝酸塩、塩酸塩、カルボン酸塩等のモノマーから、加水分解等の常法により得られたものであってもよい。 As the metalloxane oligomer and the metalloxane polymer, single or composite oxide precursors such as silicon, titanium, aluminum, tantalum, antimony, bismuth, tin, indium, and zinc are used. The metalloxane oligomer and the metalloxane polymer may be commercially available products or may be obtained from monomers such as metal alkoxides, nitrates, hydrochlorides, and carboxylates by a conventional method such as hydrolysis. .
市販品のメタロキサンオリゴマー、及びメタロキサンポリマーの具体例としては、コルコート社製の、メチルシリケート51、メチルシリケート53A、エチルシリケート40、エチルシリケート48、EMS−485、SS−101等のシロキサンオリゴマー又はシロキサンポリマー、関東化学社製のチタニウム−n−ブトキシドテトラマー等のチタノキサンオリゴマーが挙げられる。これらは単独又は2種以上混合して使用してもよい。
また、レベリング剤及び界面活性剤等は、公知のものを用いることができ、特に市販品は入手が容易なので好ましい。
また、ポリシロキサンに、上記したその他の成分を混合する方法は、ポリシロキサンと同時であっても、後であってもよく、特に限定されない。Specific examples of commercially available metalloxane oligomers and metalloxane polymers include siloxane oligomers such as methyl silicate 51, methyl silicate 53A, ethyl silicate 40, ethyl silicate 48, EMS-485, and SS-101 manufactured by Colcoat. Examples thereof include titanoxane oligomers such as siloxane polymer and titanium-n-butoxide tetramer manufactured by Kanto Chemical. You may use these individually or in mixture of 2 or more types.
Moreover, a leveling agent, surfactant, etc. can use a well-known thing, and since a commercial item is easy to acquire especially, it is preferable.
Moreover, the method of mixing the above-mentioned other components with the polysiloxane may be simultaneous with or after the polysiloxane, and is not particularly limited.
[液晶配向剤]
本発明の液晶配向剤は、上述したポリシロキサン、必要に応じてその他の成分を含有する溶液である。その際、溶媒としては、上述したポリシロキサンの重合溶媒および添加溶媒からなる群から選ばれる溶媒が用いられる。
液晶配向剤における全ポリシロキサンの含有量は、SiO2換算濃度が好ましくは0.5重量%〜15重量%、より好ましくは1重量%〜6重量%である。このようなSiO2換算濃度の範囲であれば、一回の塗布で所望の膜厚を得やすく、充分な溶液のポットライフ(可使時間)が得られ易い。[Liquid crystal aligning agent]
The liquid crystal aligning agent of this invention is the solution containing the polysiloxane mentioned above and other components as needed. In this case, as the solvent, a solvent selected from the group consisting of the above-mentioned polysiloxane polymerization solvent and additive solvent is used.
The total content of the polysiloxane in the liquid crystal aligning agent, SiO 2 conversion concentration is preferably 0.5 wt% to 15 wt%, more preferably from 1% to 6% by weight. Within such a SiO 2 equivalent concentration range, it is easy to obtain a desired film thickness by a single application, and a sufficient pot life (pot life) of the solution is likely to be obtained.
本発明の液晶配向剤は、全ポリシロキサンとして、ポリシロキサン(A)とポリシロキサン(B)とを、重量比として、10対90〜50対50、好ましくは20対80〜40対60で含有する。
また、本発明の液晶配向剤中における全ポリシロキサンと、必要に応じて加えられるその他の成分との重量比は、99対1〜50対50、好ましくは98対2〜70対30である。
本発明の液晶配向剤を調製する方法は特に限定されない。本発明に用いるポリシロキサン、必要に応じて加えられるその他の成分が均一に混合した状態であればよい。通常、ポリシロキサンは、溶媒中で重縮合されるので、ポリシロキサンの溶液をそのまま用いるか、ポリシロキサンの溶液に必要に応じてその他の成分を添加することが簡便である。更に、ポリシロキサンの重合溶液をそのまま用いる方法が最も簡便である。
また、液晶配向剤中におけるポリシロキサンの含有量を調整する際には、上述したアルコキシシランの重合溶媒及びポリシロキサンの添加溶媒からなる群から選ばれる溶媒を用いることができる。The liquid crystal aligning agent of the present invention contains polysiloxane (A) and polysiloxane (B) as a total polysiloxane in a weight ratio of 10:90 to 50:50, preferably 20:80 to 40:60. To do.
Moreover, the weight ratio of all the polysiloxanes in the liquid crystal aligning agent of this invention and the other component added as needed is 99: 1-50: 50, Preferably 98: 2-70: 30.
The method for preparing the liquid crystal aligning agent of the present invention is not particularly limited. The polysiloxane used in the present invention may be in a state where other components added as necessary are uniformly mixed. Since polysiloxane is usually polycondensed in a solvent, it is convenient to use the polysiloxane solution as it is or to add other components to the polysiloxane solution as necessary. Furthermore, the most convenient method is to use the polysiloxane polymerization solution as it is.
Moreover, when adjusting content of polysiloxane in a liquid crystal aligning agent, the solvent chosen from the group which consists of the polymerization solvent of the alkoxysilane mentioned above and the addition solvent of polysiloxane can be used.
[液晶配向膜]
本発明の液晶配向膜は、本発明の液晶配向剤を用いて得られる。例えば、本発明の液晶配向剤を、基板に塗布した後、乾燥・焼成を行うことで得られる硬化膜を、そのまま液晶配向膜として用いることもできる。また、この硬化膜は、ラビングしたり、偏光又は特定の波長の光等を照射したり、イオンビーム等の処理をしたり、液晶充填後の液晶表示素子に電圧を印加した状態でUVを照射することも可能である。[Liquid crystal alignment film]
The liquid crystal aligning film of this invention is obtained using the liquid crystal aligning agent of this invention. For example, after applying the liquid crystal aligning agent of this invention to a board | substrate, the cured film obtained by drying and baking can also be used as a liquid crystal aligning film as it is. In addition, this cured film is rubbed, irradiated with polarized light or light of a specific wavelength, processed with an ion beam, etc., and irradiated with UV in a state where a voltage is applied to the liquid crystal display element after filling the liquid crystal. It is also possible to do.
液晶配向剤を塗布する基板としては、透明性の高い基板であれば特に限定されないが、基板上に液晶を駆動するための透明電極が形成された基板が好ましい。
具体例を挙げると、ガラス板、ポリカーボネート、ポリ(メタ)アクリレート、ポリエーテルサルホン、ポリアリレート、ポリウレタン、ポリサルホン、ポリエーテル、ポリエーテルケトン、トリメチルペンテン、ポリオレフィン、ポリエチレンテレフタレート、(メタ)アクリロニトリル、トリアセチルセルロース、ジアセチルセルロース、アセテートブチレートセルロースなどのプラスチック板などに透明電極が形成された基板を挙げることができる。
液晶配向剤の塗布方法としては、スピンコート法、印刷法、インクジェット法、スプレー法、ロールコート法などが挙げられるが、生産性の面から工業的には転写印刷法が広く用いられており、本発明でも好適に用いられる。The substrate on which the liquid crystal aligning agent is applied is not particularly limited as long as it is a highly transparent substrate, but a substrate in which a transparent electrode for driving liquid crystal is formed on the substrate is preferable.
Specific examples include glass plate, polycarbonate, poly (meth) acrylate, polyethersulfone, polyarylate, polyurethane, polysulfone, polyether, polyetherketone, trimethylpentene, polyolefin, polyethylene terephthalate, (meth) acrylonitrile, tri Examples thereof include a substrate in which a transparent electrode is formed on a plastic plate such as acetyl cellulose, diacetyl cellulose, and acetate butyrate cellulose.
Examples of the method for applying the liquid crystal aligning agent include spin coating, printing, ink jet, spraying, roll coating, and the like.In terms of productivity, the transfer printing method is widely used industrially. The present invention is also preferably used.
液晶配向剤を塗布した後の乾燥の工程は、必ずしも必要とされないが、塗布後から焼成までの時間が基板ごとに一定していない場合、又は塗布後ただちに焼成されない場合には、乾燥工程を含める方が好ましい。この乾燥は、基板の搬送等により塗膜形状が変形しない程度に溶媒が除去されていればよく、その乾燥手段については特に限定されない。例えば、温度40℃〜150℃、好ましくは60℃〜100℃のホットプレート上で、0.5分〜30分、好ましくは1分〜5分乾燥させる方法が挙げられる。 The drying process after applying the liquid crystal aligning agent is not necessarily required, but if the time from application to baking is not constant for each substrate, or if baking is not performed immediately after application, a drying process is included. Is preferred. The drying is not particularly limited as long as the solvent is removed to such an extent that the shape of the coating film is not deformed by transporting the substrate or the like. For example, a method of drying on a hot plate at a temperature of 40 ° C. to 150 ° C., preferably 60 ° C. to 100 ° C., for 0.5 minutes to 30 minutes, preferably 1 minute to 5 minutes.
上記の方法で液晶配向剤を塗布して形成される塗膜は、焼成して硬化膜とすることができる。その際、焼成温度は、100℃〜350℃の任意の温度で行うことができるが、好ましくは140℃〜300℃であり、より好ましくは150℃〜230℃、更に好ましくは160℃〜220℃である。焼成時間は5分〜240分の任意の時間で焼成を行うことができる。好ましくは10分〜90分であり、より好ましくは20分〜80分である。加熱は、通常公知の方法、例えば、ホットプレート、熱風循環オーブン、IR(赤外線)オーブン、ベルト炉などを用いることができる。 The coating film formed by applying the liquid crystal aligning agent by the above method can be baked to obtain a cured film. At that time, the firing temperature can be carried out at an arbitrary temperature of 100 ° C. to 350 ° C., preferably 140 ° C. to 300 ° C., more preferably 150 ° C. to 230 ° C., further preferably 160 ° C. to 220 ° C. It is. Firing can be performed at an arbitrary time of 5 minutes to 240 minutes. Preferably it is 10 minutes-90 minutes, More preferably, it is 20 minutes-80 minutes. For the heating, a generally known method such as a hot plate, a hot air circulation oven, an IR (infrared) oven, a belt furnace or the like can be used.
液晶配向膜中のポリシロキサンは、焼成工程において、重縮合が進行する。しかし、本発明においては、本発明の効果を損なわない限り、完全に重縮合させる必要はない。但し、液晶セル製造行程で必要とされる、シール剤硬化などの熱処理温度より、10℃以上高い温度で焼成することが好ましい。
この硬化膜の厚みは必要に応じて選択することができるが、好ましくは5nm以上、より好ましくは10nm以上であり、液晶表示素子の信頼性が得られ易いので好適である。また、硬化膜の厚みが好ましくは300nm以下、より好ましくは150nm以下であり、液晶表示素子の消費電力が極端に大きくならないので好適である。The polysiloxane in the liquid crystal alignment film undergoes polycondensation in the firing step. However, in the present invention, it is not necessary to completely polycondense unless the effects of the present invention are impaired. However, firing is preferably performed at a temperature higher by 10 ° C. or more than the heat treatment temperature required for the liquid crystal cell production process, such as curing of the sealant.
The thickness of the cured film can be selected as necessary, but is preferably 5 nm or more, more preferably 10 nm or more, which is preferable because the reliability of the liquid crystal display element can be easily obtained. Further, the thickness of the cured film is preferably 300 nm or less, more preferably 150 nm or less, and the power consumption of the liquid crystal display element does not become extremely large.
<液晶表示素子>
本発明の液晶表示素子は、上記の方法により、基板に液晶配向膜を形成した後、公知の方法で液晶セルを作製して得ることができる。
液晶セル作製の一例を挙げると、液晶配向膜が形成された1対の基板を、スペーサーを挟んで、シール剤で固定し、液晶を注入して封止する方法が一般的である。その際、用いるスペーサーの大きさは1μm〜30μmであるが、好ましくは2μm〜10μmである。<Liquid crystal display element>
The liquid crystal display element of the present invention can be obtained by forming a liquid crystal alignment film on a substrate by the above method and then preparing a liquid crystal cell by a known method.
As an example of manufacturing a liquid crystal cell, a method is generally employed in which a pair of substrates on which a liquid crystal alignment film is formed are fixed with a sealant with a spacer interposed therebetween, and liquid crystal is injected and sealed. In this case, the size of the spacer used is 1 μm to 30 μm, preferably 2 μm to 10 μm.
液晶を注入する方法は特に制限されず、作製した液晶セル内を減圧にした後、液晶を注入する真空法、液晶を滴下した後に封止を行う滴下法などを挙げることができる。
液晶が導入された液晶セルの、両側基板の電極間に電圧を印加した状態でUV照射することにより、配向膜中のアクリル基、メタクリル基等がその場で重合し架橋されることで、液晶ディスプレイの応答速度が速くなる。ここで、印加する電圧は5Vp−p〜50Vp−pであるが、好ましくは、5Vp−p〜30Vp−pである。照射するUV照射量は、1J(ジュール)〜60Jであるが、好ましくは、40J以下である。UV照射量が少ないほうが、液晶ディスプレイを構成する部材の破壊からなる信頼性低下を抑制でき、かつUV照射時間を減らせることで製造上のタクト(稼働量)が上がるので好適である。The method for injecting the liquid crystal is not particularly limited, and examples thereof include a vacuum method for injecting liquid crystal after the inside of the manufactured liquid crystal cell is decompressed, and a dropping method for sealing after dropping the liquid crystal.
In the liquid crystal cell in which the liquid crystal is introduced, UV irradiation is performed while a voltage is applied between the electrodes on both sides of the substrate, whereby acrylic groups, methacryl groups, etc. in the alignment film are polymerized in situ and crosslinked. The response speed of the display becomes faster. Here, the applied voltage is 5 Vp-p to 50 Vp-p, and preferably 5 Vp-p to 30 Vp-p. The UV irradiation amount to be irradiated is 1 J (joule) to 60 J, but preferably 40 J or less. A smaller UV irradiation amount is preferable because it can suppress a decrease in reliability due to destruction of members constituting the liquid crystal display and can reduce a UV irradiation time, thereby increasing a manufacturing tact (operation amount).
液晶表示素子に用いる基板としては、透明性の高い基板であれば特に限定されないが、通常は、基板上に液晶を駆動するための透明電極が形成された基板である。具体例は[液晶配向膜]で記載した基板と同様である。標準的なPVAやMVAといった電極パターンや突起パターンを有する基板でも使用できる。
液晶表示素子に用いる基板としては、PSA方式の液晶ディスプレイと同様に、片側基板に1μm〜10μmのライン/スリット電極パターンを形成し、対向基板にはスリットパターンや突起パターンを形成していない構造においても動作可能であり、この構造の液晶ディスプレイによって、製造時のプロセスを簡略化でき、高い透過率を得ることができる。The substrate used for the liquid crystal display element is not particularly limited as long as it is a highly transparent substrate, but is usually a substrate in which a transparent electrode for driving liquid crystal is formed on the substrate. A specific example is the same as the substrate described in [Liquid crystal alignment film]. A substrate having an electrode pattern or a projection pattern such as standard PVA or MVA can also be used.
As a substrate used for a liquid crystal display element, a line / slit electrode pattern of 1 μm to 10 μm is formed on one side substrate, and a slit pattern or a projection pattern is not formed on the opposite substrate, similar to a PSA type liquid crystal display. The liquid crystal display with this structure can simplify the manufacturing process and obtain high transmittance.
また、TFT型の液晶表示素子のような高機能液晶表示素子においては、液晶駆動のための電極と基板の間にトランジスタ素子が、基板上に形成されたものが用いられる。
透過型の液晶表示素子の場合は、上記のような基板を用いることが一般的であるが、反射型の液晶表示素子では、片側の基板のみに光を反射するアルミニウムのような材料を用いることも可能であり、シリコンウエハー等の不透明な基板も用いることが可能である。In a high-performance liquid crystal display element such as a TFT type liquid crystal display element, a transistor element formed on a substrate between an electrode for driving liquid crystal and the substrate is used.
In the case of a transmissive liquid crystal display element, it is common to use a substrate as described above. However, in a reflective liquid crystal display element, a material such as aluminum that reflects light only on one substrate is used. It is also possible to use an opaque substrate such as a silicon wafer.
以下本発明の実施例によりさらに具体的に説明するが、これらに限定して解釈されるものではない。
本実施例で用いた化合物における略語は以下のとおりである。
TEOS:テトラエトキシシラン
C18:オクタデシルトリエトキシシラン
ACPS:3−アクリロキシプロピルトリメトキシシラン
MPMS:3−メタクリロキシプロピルトリメトキシシラン
MTES:メチルトリエトキシシラン
HG:2−メチル−2,4−ペンタンジオール(別名:ヘキシレングリコール)
BCS:2−ブトキシエタノール
UPS:3−ウレイドプロピルトリエトキシシランHereinafter, the present invention will be described more specifically with reference to examples, but the present invention should not be construed as being limited thereto.
Abbreviations in the compounds used in the examples are as follows.
TEOS: tetraethoxysilane C18: octadecyltriethoxysilane ACPS: 3-acryloxypropyltrimethoxysilane MPMS: 3-methacryloxypropyltrimethoxysilane MTES: methyltriethoxysilane HG: 2-methyl-2,4-pentanediol ( (Alternative name: hexylene glycol)
BCS: 2-butoxyethanol UPS: 3-ureidopropyltriethoxysilane
<合成例1>
温度計、還流管を備え付けた200mLの四つ口反応フラスコ中で、HGの20.6g、BCSの6.9g、TEOSの18.3g、C18の4.2g、及びACPSの23.4gを混合して、アルコキシシランモノマーの溶液を調製した。この溶液に、予め混合しておいたHGの10.3g、BCSの3.4g、水の10.8g及び触媒として蓚酸の1.4gの溶液を、室温下で30分かけて滴下し、さらに室温で30分間撹拌した。その後、オイルバスを用いて加熱して30分間還流させた後、予め混合しておいたUPS含有量92質量%のメタノール溶液0.6g、HGの0.3g及びBCSの0.1gの混合液を加えた。更に30分間還流させてから放冷して、SiO2換算濃度が12重量%のポリシロキサン溶液を得た。<Synthesis Example 1>
Mix 20.6 g of HG, 6.9 g of BCS, 18.3 g of TEOS, 4.2 g of C18, and 23.4 g of ACPS in a 200 mL four-necked reaction flask equipped with a thermometer and reflux tube. Thus, a solution of the alkoxysilane monomer was prepared. To this solution, a solution of 10.3 g of HG, 3.4 g of BCS, 10.8 g of water and 1.4 g of oxalic acid as a catalyst was added dropwise over 30 minutes at room temperature, Stir at room temperature for 30 minutes. Then, after heating using an oil bath and refluxing for 30 minutes, 0.6 g of a methanol solution with a UPS content of 92% by mass, 0.3 g of HG, and 0.1 g of BCS were mixed in advance. Was added. The mixture was further refluxed for 30 minutes and then allowed to cool to obtain a polysiloxane solution having a SiO 2 equivalent concentration of 12% by weight.
得られたポリシロキサン溶液10.0gと、BCSの20.0gを混合し、SiO2換算濃度が4重量%の液晶配向剤中間体(S1)を得た。
また、温度計、還流管を備え付けた200mLの四つ口反応フラスコ中で、HGの23.6g、BCSの7.9g、及びTEOSの41.2gを混合して、アルコキシシランモノマーの溶液を調製した。この溶液に、予め混合しておいたHGの11.8g、BCSの3.9g、水の10.8g及び触媒として蓚酸の0.2gの溶液を、室温下で30分かけて滴下し、さらに室温で30分間撹拌した。その後、オイルバスを用いて加熱して30分間還流させた後、予め混合しておいたUPS含有量92質量%のメタノール溶液0.6g、HGの0.3g及びBCSの0.1gの混合液を加えた。更に30分間還流させてから放冷して、SiO2換算濃度が12重量%のポリシロキサン溶液を得た。
得られたポリシロキサン溶液10.0gと、BCSの20.0gを混合し、SiO2換算濃度が4重量%の液晶配向剤中間体(U1)を得た。得られた液晶配向剤中間体(S1)と液晶配向剤中間体(U1)を、3:7の比率(重量比、以下同様である。)で混合し、SiO2換算濃度が4重量%の液晶配向剤[K1]を得た。10.0 g of the obtained polysiloxane solution and 20.0 g of BCS were mixed to obtain a liquid crystal aligning agent intermediate (S1) having a SiO 2 equivalent concentration of 4% by weight.
In addition, in a 200 mL four-necked reaction flask equipped with a thermometer and a reflux tube, 23.6 g of HG, 7.9 g of BCS, and 41.2 g of TEOS were mixed to prepare a solution of an alkoxysilane monomer. did. To this solution, 11.8 g of HG, 3.9 g of BCS, 10.8 g of water and 0.2 g of oxalic acid as a catalyst were added dropwise over 30 minutes at room temperature, Stir at room temperature for 30 minutes. Then, after heating using an oil bath and refluxing for 30 minutes, 0.6 g of a methanol solution with a UPS content of 92% by mass, 0.3 g of HG, and 0.1 g of BCS were mixed in advance. Was added. The mixture was further refluxed for 30 minutes and then allowed to cool to obtain a polysiloxane solution having a SiO 2 equivalent concentration of 12% by weight.
10.0 g of the obtained polysiloxane solution and 20.0 g of BCS were mixed to obtain a liquid crystal aligning agent intermediate (U1) having a SiO 2 equivalent concentration of 4% by weight. The obtained liquid crystal aligning agent intermediate (S1) and liquid crystal aligning agent intermediate (U1) were mixed at a ratio of 3: 7 (weight ratio, the same applies hereinafter), and the SiO 2 equivalent concentration was 4% by weight. A liquid crystal aligning agent [K1] was obtained.
<合成例2>
温度計、還流管を備え付けた200mLの四つ口反応フラスコ中で、HGの19.9g、BCSの6.6g、TEOSの18.3g、C18の4.2g、及びMPMSの24.8gを混合して、アルコキシシランモノマーの溶液を調製した。この溶液に、予め混合しておいたHGの10.0g、BCSの3.3g、水の10.8g及び触媒として蓚酸の1.4gの溶液を、室温下で30分かけて滴下し、さらに室温で30分間撹拌した。その後、オイルバスを用いて加熱して30分間還流させた後、予め混合しておいたUPS含有量92質量%のメタノール溶液0.6g、HGの0.3g及びBCSの0.1gの混合液を加えた。更に30分間還流させてから放冷して、SiO2換算濃度が12重量%のポリシロキサン溶液を得た。
得られたポリシロキサン溶液10.0gと、BCSの20.0gを混合し、SiO2換算濃度が4重量%の液晶配向剤中間体(S2)を得た。得られた液晶配向剤中間体(S2)と合成例1で得られた液晶配向剤中間体(U1)を、3:7の比率で混合し、SiO2換算濃度が4重量%の液晶配向剤[K2]を得た。<Synthesis Example 2>
Mix 19.9 g of HG, 6.6 g of BCS, 18.3 g of TEOS, 4.2 g of C18, and 24.8 g of MPMS in a 200 mL four-necked reaction flask equipped with a thermometer and reflux tube. Thus, a solution of the alkoxysilane monomer was prepared. To this solution, 10.0 g of HG, 3.3 g of BCS, 10.8 g of water, and 1.4 g of oxalic acid as a catalyst were added dropwise over 30 minutes at room temperature, Stir at room temperature for 30 minutes. Then, after heating using an oil bath and refluxing for 30 minutes, 0.6 g of a methanol solution with a UPS content of 92% by mass, 0.3 g of HG, and 0.1 g of BCS were mixed in advance. Was added. The mixture was further refluxed for 30 minutes and then allowed to cool to obtain a polysiloxane solution having a SiO 2 equivalent concentration of 12% by weight.
10.0 g of the obtained polysiloxane solution and 20.0 g of BCS were mixed to obtain a liquid crystal aligning agent intermediate (S2) having a SiO 2 equivalent concentration of 4% by weight. The obtained liquid crystal aligning agent intermediate (S2) and the liquid crystal aligning agent intermediate (U1) obtained in Synthesis Example 1 were mixed at a ratio of 3: 7, and the liquid crystal aligning agent having a SiO 2 equivalent concentration of 4% by weight. [K2] was obtained.
<合成例3>
温度計、還流管を備え付けた200mLの四つ口反応フラスコ中で、HGの23.3g、BCSの7.8g、TEOSの39.2g、及びMPMSの2.5gを混合して、アルコキシシランモノマーの溶液を調製した。この溶液に、予め混合しておいたHGの11.7g、BCSの3.9g、水の10.8g及び触媒として蓚酸の0.4gの溶液を、室温下で30分かけて滴下し、さらに室温で30分間撹拌した。その後、オイルバスを用いて加熱して30分間還流させた後、予め混合しておいたUPS含有量92質量%のメタノール溶液0.6g、HGの0.3g及びBCSの0.1gの混合液を加えた。更に30分間還流させてから放冷して、SiO2換算濃度が12重量%のポリシロキサン溶液を得た。
得られたポリシロキサン溶液10.0gと、BCSの20.0gを混合し、SiO2換算濃度が4重量%の液晶配向剤中間体(U2)を得た。合成例1で得られた液晶配向剤中間体(S1)と得られた液晶配向剤中間体(U2)を、3:7の比率で混合し、SiO2換算濃度が4重量%の液晶配向剤[K3]を得た。<Synthesis Example 3>
In a 200 mL four-necked reaction flask equipped with a thermometer and a reflux tube, 23.3 g of HG, 7.8 g of BCS, 39.2 g of TEOS, and 2.5 g of MPMS were mixed to obtain an alkoxysilane monomer. A solution of was prepared. To this solution, 11.7 g of HG previously mixed, 3.9 g of BCS, 10.8 g of water, and 0.4 g of oxalic acid as a catalyst were added dropwise over 30 minutes at room temperature. Stir at room temperature for 30 minutes. Then, after heating using an oil bath and refluxing for 30 minutes, 0.6 g of a methanol solution with a UPS content of 92% by mass, 0.3 g of HG, and 0.1 g of BCS were mixed in advance. Was added. The mixture was further refluxed for 30 minutes and then allowed to cool to obtain a polysiloxane solution having a SiO 2 equivalent concentration of 12% by weight.
10.0 g of the obtained polysiloxane solution and 20.0 g of BCS were mixed to obtain a liquid crystal aligning agent intermediate (U2) having a SiO 2 equivalent concentration of 4% by weight. The liquid crystal aligning agent intermediate (S1) obtained in Synthesis Example 1 and the obtained liquid crystal aligning agent intermediate (U2) are mixed at a ratio of 3: 7, and the SiO 2 equivalent concentration is 4% by weight. [K3] was obtained.
<合成例4>
合成例2で得られた液晶配向剤中間体(S2)と合成例3で得られた液晶配向剤中間体(U2)を、3:7の比率で混合し、SiO2換算濃度が4重量%の液晶配向剤[K4]を得た。<Synthesis Example 4>
The liquid crystal aligning agent intermediate (S2) obtained in Synthesis Example 2 and the liquid crystal aligning agent intermediate (U2) obtained in Synthesis Example 3 were mixed at a ratio of 3: 7, and the SiO 2 equivalent concentration was 4% by weight. Liquid crystal aligning agent [K4] was obtained.
<合成例5>
温度計、還流管を備え付けた200mLの四つ口反応フラスコ中で、HGの23.8g、BCSの7.9g、TEOSの37.1g、及びMTESの3.6gを混合して、アルコキシシランモノマーの溶液を調製した。この溶液に、予め混合しておいたHGの11.9g、BCSの4.0g、水の10.8g及び触媒として蓚酸の0.4gの溶液を、室温下で30分かけて滴下し、さらに室温で30分間撹拌した。その後オイルバスを用いて加熱して30分間還流させた後、予め混合しておいたUPS含有量92質量%のメタノール溶液0.6g、HGの0.3g及びBCSの0.1gの混合液を加えた。更に30分間還流させてから放冷して、SiO2換算濃度が12重量%のポリシロキサン溶液を得た。
得られたポリシロキサン溶液10.0gと、BCSの20.0gを混合し、SiO2換算濃度が4重量%の液晶配向剤中間体(U3)を得た。合成例1で得られた液晶配向剤中間体(S1)と得られた液晶配向剤中間体(U3)を、3:7の比率で混合し、SiO2換算濃度が4重量%の液晶配向剤[K5]得た。<Synthesis Example 5>
In a 200 mL four-necked reaction flask equipped with a thermometer and a reflux tube, 23.8 g of HG, 7.9 g of BCS, 37.1 g of TEOS, and 3.6 g of MTES were mixed to obtain an alkoxysilane monomer. A solution of was prepared. To this solution, 1.9 g of HG, 4.0 g of BCS, 10.8 g of water, and 0.4 g of oxalic acid as a catalyst were added dropwise over 30 minutes at room temperature, Stir at room temperature for 30 minutes. Thereafter, the mixture was heated using an oil bath and refluxed for 30 minutes. Then, a premixed mixture of a methanol solution 0.6 g of UPS content 92 mass%, HG 0.3 g, and BCS 0.1 g was added. added. The mixture was further refluxed for 30 minutes and then allowed to cool to obtain a polysiloxane solution having a SiO 2 equivalent concentration of 12% by weight.
10.0 g of the obtained polysiloxane solution and 20.0 g of BCS were mixed to obtain a liquid crystal aligning agent intermediate (U3) having a SiO 2 equivalent concentration of 4% by weight. The liquid crystal aligning agent intermediate (S1) obtained in Synthesis Example 1 and the obtained liquid crystal aligning agent intermediate (U3) are mixed at a ratio of 3: 7, and the SiO 2 equivalent concentration is 4% by weight. [K5] was obtained.
<合成例6>
合成例2で得られた液晶配向剤中間体(S2)と合成例5で得られた液晶配向剤中間体(U3)を、3:7の比率で混合し、SiO2換算濃度が4重量%の液晶配向剤[K6]を得た。<Synthesis Example 6>
The liquid crystal aligning agent intermediate (S2) obtained in Synthesis Example 2 and the liquid crystal aligning agent intermediate (U3) obtained in Synthesis Example 5 were mixed at a ratio of 3: 7, and the SiO 2 equivalent concentration was 4% by weight. Liquid crystal aligning agent [K6] was obtained.
<比較合成例1>
温度計、還流管を備え付けた200mLの四つ口反応フラスコ中で、HGの22.6g、BCSの7.5g、TEOSの39.6gを混合して、アルコキシシランモノマーの溶液を調製した。この溶液に、予め混合しておいたHGの11.3g、BCSの3.8g、水の10.8g及び触媒として蓚酸の0.2gの溶液を、室温下で30分かけて滴下し、さらに室温で30分間撹拌した。その後、オイルバスを用いて加熱して1時間還流させてから放冷して、SiO2換算濃度が12重量%のポリシロキサン溶液を得た。
得られたポリシロキサン溶液10.0gと、BCSの20.0gを混合し、SiO2換算濃度が4重量%の液晶配向剤[L1]を得た。<Comparative Synthesis Example 1>
In a 200 mL four-necked reaction flask equipped with a thermometer and a reflux tube, 22.6 g of HG, 7.5 g of BCS, and 39.6 g of TEOS were mixed to prepare an alkoxysilane monomer solution. To this solution, 11.3 g of HG, 3.8 g of BCS, 10.8 g of water, and 0.2 g of oxalic acid as a catalyst were added dropwise over 30 minutes at room temperature, Stir at room temperature for 30 minutes. Then allowed to cool was refluxed for 1 hour and heated using an oil bath, SiO 2 conversion concentration was obtained 12 wt% of a polysiloxane solution.
10.0 g of the obtained polysiloxane solution and 20.0 g of BCS were mixed to obtain a liquid crystal aligning agent [L1] having a SiO 2 equivalent concentration of 4% by weight.
<比較合成例2>
合成例1で得られた液晶配向剤中間体(S1)と同様にして、液晶配向剤[L2]を得た。
<比較合成例3>
合成例2で得られた液晶配向剤中間体(S2)と同様にして、液晶配向剤[L3]を得た。<Comparative Synthesis Example 2>
A liquid crystal aligning agent [L2] was obtained in the same manner as the liquid crystal aligning agent intermediate (S1) obtained in Synthesis Example 1.
<Comparative Synthesis Example 3>
A liquid crystal aligning agent [L3] was obtained in the same manner as the liquid crystal aligning agent intermediate (S2) obtained in Synthesis Example 2.
<実施例1>
合成例1で得られた液晶配向処理剤[K1]を、画素サイズが100ミクロン×300ミクロンで、ライン/スペースがそれぞれ5ミクロンのITO電極パターンが形成されているITO電極基板のITO面にスピンコートした。80℃のホットプレートで2分間乾燥した後、200℃又は220℃の熱風循環式オーブンで30分間焼成を行い、膜厚100nmの液晶配向膜を形成した。合成例1で得られた液晶配向処理剤[K1]を、電極パターンが形成されていないITO面にスピンコートし、80℃のホットプレートで2分間乾燥した後、上記基板同様に200℃又は220℃の熱風循環式オーブンで30分間焼成を行い、膜厚100nmの液晶配向膜を形成した。これらの2枚の基板を用意し、一方の基板の液晶配向膜面上に6μmのビーズスペーサーを散布した後、その上からシール剤を印刷した。他方の基板を液晶配向膜面を内側にし、張り合わせた後、シール剤を硬化させて空セルを作製した。液晶MLC−6608(メルク社製商品名)を、空セルに減圧注入法によって注入し、液晶セルを作製した。
得られた液晶セルの応答速度特性を、後述する方法により測定した。その後、この液晶セルに20Vp−pの電圧を印加した状態で、この液晶セルの外側からUV(波長;365nmバンドパスフィルター使用)を20J照射した。その後、再び応答速度特性を測定し、UV照射前後での応答速度を比較した。その結果を表1に示した。
また、セルの垂直配向性についても、後述する方法により測定し評価した。その結果についてもあわせて表1に示した。<Example 1>
Spin the liquid crystal aligning agent [K1] obtained in Synthesis Example 1 onto the ITO surface of the ITO electrode substrate on which an ITO electrode pattern having a pixel size of 100 microns × 300 microns and a line / space of 5 microns is formed. Coated. After drying for 2 minutes on a hot plate at 80 ° C., baking was performed in a hot air circulation oven at 200 ° C. or 220 ° C. for 30 minutes to form a liquid crystal alignment film having a thickness of 100 nm. The liquid crystal aligning agent [K1] obtained in Synthesis Example 1 was spin-coated on the ITO surface on which no electrode pattern was formed, dried on an 80 ° C. hot plate for 2 minutes, and then 200 ° C. or 220 like the above substrate. Baking was performed for 30 minutes in a hot air circulation oven at 0 ° C. to form a liquid crystal alignment film having a thickness of 100 nm. These two substrates were prepared, and a 6 μm bead spacer was sprayed on the liquid crystal alignment film surface of one of the substrates, and a sealant was printed thereon. The other substrate was bonded with the liquid crystal alignment film surface inside, and then the sealing agent was cured to produce an empty cell. Liquid crystal MLC-6608 (trade name, manufactured by Merck & Co., Inc.) was injected into the empty cell by a reduced pressure injection method to produce a liquid crystal cell.
The response speed characteristics of the obtained liquid crystal cell were measured by the method described later. Thereafter, UV (wavelength; using a 365 nm bandpass filter) was irradiated from the outside of the liquid crystal cell in a state where a voltage of 20 Vp-p was applied to the liquid crystal cell. Thereafter, the response speed characteristic was measured again, and the response speed before and after UV irradiation was compared. The results are shown in Table 1.
Further, the vertical alignment of the cells was also measured and evaluated by the method described later. The results are also shown in Table 1.
<実施例2>
液晶配向処理剤[K1]を合成例2で得られた液晶配向処理剤[K2]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。
<実施例3>
液晶配向処理剤[K1]を合成例3で得られた液晶配向処理剤[K3]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。<Example 2>
A liquid crystal cell was prepared in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [K2] obtained in Synthesis Example 2, and the response speed was measured. The results are shown in Table 1.
<Example 3>
A liquid crystal cell was prepared in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [K3] obtained in Synthesis Example 3, and the response speed was measured. The results are shown in Table 1.
<実施例4>
液晶配向処理剤[K1]を合成例4で得られた液晶配向処理剤[K4]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。
<実施例5>
液晶配向処理剤[K1]を合成例5で得られた液晶配向処理剤[K5]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。
<実施例6>
液晶配向処理剤[K1]を合成例6で得られた液晶配向処理剤[K6]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。<Example 4>
A liquid crystal cell was prepared in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [K4] obtained in Synthesis Example 4, and the response speed was measured. The results are shown in Table 1.
<Example 5>
A liquid crystal cell was produced in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [K5] obtained in Synthesis Example 5, and the response speed was measured. The results are shown in Table 1.
<Example 6>
A liquid crystal cell was prepared in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [K6] obtained in Synthesis Example 6, and the response speed was measured. The results are shown in Table 1.
<比較例1>
液晶配向処理剤[K1]を比較合成例1で得られた液晶配向処理剤[L1]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。
<比較例2>
液晶配向処理剤[K1]を比較合成例2で得られた液晶配向処理剤[L2]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。
<比較例3>
液晶配向処理剤[K1]を比較合成例2で得られた液晶配向処理剤[L3]に変更した以外は、実施例1と同様にして液晶セルを作製し、応答速度を測定した。その結果を表1に示した。<Comparative Example 1>
A liquid crystal cell was prepared in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [L1] obtained in Comparative Synthesis Example 1, and the response speed was measured. The results are shown in Table 1.
<Comparative example 2>
A liquid crystal cell was produced in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [L2] obtained in Comparative Synthesis Example 2, and the response speed was measured. The results are shown in Table 1.
<Comparative Example 3>
A liquid crystal cell was prepared in the same manner as in Example 1 except that the liquid crystal alignment treatment agent [K1] was changed to the liquid crystal alignment treatment agent [L3] obtained in Comparative Synthesis Example 2, and the response speed was measured. The results are shown in Table 1.
[応答速度特性]
電圧を印加していない液晶セルに、電圧±4V、周波数1kHzの矩形波を印加した際の、液晶パネルの輝度の時間変化をオシロスコープにて取り込んだ。電圧を印加していない時の輝度を0%、±4Vの電圧を印加し、飽和した輝度の値を100%として、輝度が10%〜90%まで変化する時間を立ち上がりの応答速度とした。[Response speed characteristics]
The change in luminance of the liquid crystal panel over time when a rectangular wave with a voltage of ± 4 V and a frequency of 1 kHz was applied to the liquid crystal cell to which no voltage was applied was captured with an oscilloscope. When the voltage was not applied, the luminance was 0%, a voltage of ± 4 V was applied, the saturated luminance value was 100%, and the time for the luminance to change from 10% to 90% was taken as the rising response speed.
[垂直配向性]
垂直配向性の評価については、クロスニコルに配置した2枚の偏光板の間にセルを配置し観察し、黒表示を示しているかどうかで判定した。焼成温度を上げても垂直配向性を示すものほど、垂直配向性が高いとした。[Vertical alignment]
For the evaluation of the vertical alignment, a cell was placed between two polarizing plates arranged in crossed Nicols and observed, and whether or not black display was shown was determined. Even if the firing temperature was raised, the vertical alignment was higher as the vertical alignment was higher.
○:200℃又は220℃30分の焼成において垂直配向を示す
◎:220℃、60分の焼成においても垂直配向を示す
表1からわかるように、実施例の液晶セルでは、220℃焼成時においても垂直配向を示し、かつUV照射後に応答速度が向上した。特に、実施例5と実施例6の液晶セルは、220℃焼成の時間を60分に延ばした時においても、垂直配向を示した。一方、比較例1では、220℃焼成では垂直配向を示すが、UV照射後で、応答速度は向上しなかった。比較例2、3では、UV照射後で、応答速度は向上したが、220℃焼成の場合では、垂直配向を示さなかった。 As can be seen from Table 1, the liquid crystal cell of the example showed vertical alignment even when baked at 220 ° C., and the response speed was improved after UV irradiation. In particular, the liquid crystal cells of Example 5 and Example 6 exhibited vertical alignment even when the 220 ° C. baking time was extended to 60 minutes. On the other hand, in Comparative Example 1, although the vertical alignment was exhibited by baking at 220 ° C., the response speed was not improved after UV irradiation. In Comparative Examples 2 and 3, the response speed was improved after UV irradiation, but no vertical alignment was exhibited in the case of baking at 220 ° C.
本発明の液晶配向剤を用いて作製した液晶表示素子は、PSA方式の配向方式において、重合性化合物を添加しない液晶を使用した場合においても、PSA方式と同等な特性を得ることが可能な液晶表示素子を提供することができ、PSA方式のTFT液晶表示素子、TN液晶表示素子、VA液晶表示素子等として使用可能である。 The liquid crystal display device manufactured using the liquid crystal aligning agent of the present invention is a liquid crystal capable of obtaining characteristics equivalent to those of the PSA method even when a liquid crystal to which no polymerizable compound is added is used in the PSA method. A display element can be provided and can be used as a PSA TFT liquid crystal display element, a TN liquid crystal display element, a VA liquid crystal display element, or the like.
なお、2011年2月24日に出願された日本特許出願2011−038413号の明細書、特許請求の範囲、及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入れるものである。 It should be noted that the entire contents of the specification, claims, and abstract of Japanese Patent Application No. 2011-038413 filed on February 24, 2011 are incorporated herein as the disclosure of the specification of the present invention. Is.
Claims (8)
ポリシロキサン(A):式(1)で表されるアルコキシシラン及び式(2)で表されるアルコキシシランを含有するアルコキシシランを重縮合して得られるポリシロキサン。
R1Si(OR2)3 (1)
(R1はフッ素原子で置換されていてもよい、炭素数8〜30の炭化水素基であり、R2は炭素数1〜5のアルキル基を表す。)
R3Si(OR4)3 (2)
(R3は、アクリル基、メタクリル基若しくはスチリル基で置換された炭素数1〜30のアルキル基であり、R4は炭素数1〜5のアルキル基を表す。)
ポリシロキサン(B):式(3)で表されるアルコキシシランを70%〜100%含有するアルコキシシランを重縮合して得られるポリシロキサン。
Si(OR5)4 (3)
(R5は、炭素数1〜5のアルキル基を表す。) A liquid crystal aligning agent comprising the following polysiloxane (A) and polysiloxane (B).
Polysiloxane (A): A polysiloxane obtained by polycondensation of an alkoxysilane represented by the formula (1) and an alkoxysilane containing the alkoxysilane represented by the formula (2).
R 1 Si (OR 2 ) 3 (1)
(R 1 is an optionally substituted hydrocarbon group having 8 to 30 carbon atoms, and R 2 represents an alkyl group having 1 to 5 carbon atoms.)
R 3 Si (OR 4 ) 3 (2)
(R 3 is acryl group, an alkyl group has been C1-30 substituted methacrylic group or a styryl group, R 4 represents an alkyl group having 1 to 5 carbon atoms.)
Polysiloxane (B): polysiloxane obtained by polycondensation of alkoxysilane containing 70% to 100% of alkoxysilane represented by formula (3).
Si (OR 5 ) 4 (3)
(R 5 represents an alkyl group having 1 to 5 carbon atoms.)
R6Si(OR7)3 (4)
(R6は、炭素数1〜5のアルキル基であり、R7は炭素数1〜5のアルキル基を表す。) The liquid crystal aligning agent of Claim 1 whose polysiloxane (B) is polysiloxane obtained by polycondensing the alkoxysilane containing the alkoxysilane further represented by Formula (4).
R 6 Si (OR 7 ) 3 (4)
(R 6 is an alkyl group having 1 to 5 carbon atoms, and R 7 represents an alkyl group having 1 to 5 carbon atoms.)
(R8)nSi(OR9)4−n (5)
(R8は、水素原子、又はヘテロ原子、ハロゲン原子、アミノ基、グリシドキシ基、メルカプト基、イソシアネート基若しくはウレイド基で置換されていてもよい、炭素数1〜12の炭化水素基であり、R9は炭素数1〜5のアルキル基であり、nは0〜3の整数を表す。) At least one polysiloxane selected from polysiloxane (A) and polysiloxane (B) is a polysiloxane obtained by further polycondensing an alkoxysilane containing an alkoxysilane represented by the following formula (5). The liquid crystal aligning agent in any one of Claims 1-3.
(R 8 ) n Si (OR 9 ) 4-n (5)
(R 8 is a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms which may be substituted with a hetero atom, a halogen atom, an amino group, a glycidoxy group, a mercapto group, an isocyanate group or a ureido group; 9 is an alkyl group having 1 to 5 carbon atoms, and n represents an integer of 0 to 3.)
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