JP5986646B2 - 試料を分析する方法およびシステム - Google Patents
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- G—PHYSICS
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- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
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Description
本願は、参照によりその内容の全体を本明細書に組み込む、2012年2月7日出願の米国仮出願第61/595903号の優先権を主張するものである。
実施例
12 電磁放射パルス
14 電磁放射
16 プラズマ
20 試料
30 励起源
40 検出器
50 電子プロセッサ
Claims (15)
- 試料を分析する方法であって、
前記試料の一部分をプラズマに複数回変換するステップと、
前記試料変換のそれぞれに応答して発出される電磁放射のスペクトルを記録して、前記試料のスペクトルのシーケンスを規定するステップであって、前記試料の前記スペクトルの前記シーケンスが複数のメンバからなり、前記シーケンスの各メンバが、前記試料変換の異なる1回に応答して記録された前記スペクトルに対応する、ステップと、
電子プロセッサを使用して、前記試料のスペクトルの前記シーケンスを、参照ライブラリ中の少なくとも1つの参照試料のそれぞれのスペクトルのシーケンスと比較するステップであって、前記参照試料のぞれぞれのスペクトルのシーケンスが、複数のメンバからなり、前記比較が、前記試料のスペクトルの前記シーケンスの中の、それぞれのメンバが現れる回数を、前記参照試料のそれぞれのスペクトルのシーケンスの中の、それぞれメンバが現れる回数と、比較することからなる、ステップと、
前記電子プロセッサを使用して、前記ライブラリ中の前記少なくとも1つの参照試料との前記比較に基づいて前記試料に関する情報を決定するステップとを含む、方法。 - 前記試料の前記プラズマへの前記変換によって、前記試料が、原子発光を示す電磁放射を発出する、請求項1に記載の方法。
- 前記試料の前記プラズマへの前記変換によって、前記試料が、同位体発光、分子発光、分子同位体発光、および前記試料中の異なる原子による原子発光間のスペクトル干渉のうちの1つまたは複数を示す電磁放射を発出する、請求項2に記載の方法。
- 各スペクトルが、原子発光、ならびに同位体発光、分子発光、分子同位体発光、および異なる原子による原子発光間のスペクトル干渉のうちの1つまたは複数に対応する電磁放射の前記発出を解像するのに十分なスペクトル解像度で記録される、請求項1に記載の方法。
- 前記試料の前記シーケンスのメンバが、前記複数回の間に前記試料の前記一部分を前記プラズマに変換するために使用した電磁放射パルスの異なるパラメータと、前記複数回の間に前記試料の前記一部分を前記プラズマに変換するために使用した電磁放射パルスの前記試料上の異なる入射箇所との組合せに応じて記録された前記スペクトルに対応する、請求項1に記載の方法。
- 前記電子プロセッサが、クラスタ技術を用いて、前記試料のスペクトルの前記シーケンスの一意的なメンバを決定する、請求項1に記載の方法。
- 前記電子プロセッサによる前記比較が、分析対象の前記試料のスペクトルの前記シーケンスの前記メンバの確率分布を、前記参照試料のそれぞれのスペクトルの前記シーケンスのメンバの確率分布と比較するステップを含む、請求項1に記載の方法。
- 前記分析対象の試料の前記確率分布が、各メンバが前記分析対象の試料のスペクトルの前記シーケンスに現れる回数を示すヒストグラムとして表され、各参照試料の前記メンバの前記確率分布が、各メンバが各参照試料のスペクトルの前記シーケンスに現れる回数を示すヒストグラムとして表される、請求項7に記載の方法。
- 前記電子プロセッサによる前記比較が、前記試料の前記シーケンスが前記ライブラリ中の前記少なくとも1つの参照試料のそれぞれのシーケンスと一致する程度を特定するステップを含む、請求項1に記載の方法。
- 前記試料の前記シーケンスが前記参照試料のそれぞれのシーケンスと一致する前記程度を特定する前記ステップが、前記分析対象の試料の前記メンバの確率分布を前記参照試料のそれぞれのスペクトルの前記シーケンスのメンバの確率分布と比較するステップを含む、請求項9に記載の方法。
- 程度を特定するステップが、
前記試料の前記シーケンスの各スペクトルを前記ライブラリ中の前記異なるスペクトルと比較して、前記試料の前記シーケンス中の前記スペクトルと一致する可能性が最も高い前記ライブラリの前記異なるスペクトルを特定するステップと、
前記ライブラリのどの参照試料が前記特定したスペクトルの全てを含むかを特定するステップと、
前記試料の前記シーケンスが前記特定した参照試料のそれぞれのシーケンスと一致する程度を特定するステップとを含む、請求項9に記載の方法。 - 前記電子プロセッサが、最近傍アルゴリズムを使用して、前記特定するステップの一方または両方を実行する、請求項11に記載の方法。
- 前記参照ライブラリが、
各参照試料の前記アイデンティティに関する情報を提供するステップ、
各参照試料の一部分をプラズマに複数回変換するステップ、および
前記参照試料変換のそれぞれに応答して各参照試料から発出される電磁放射のスペクトルを記録して、各参照試料のスペクトルのシーケンスを規定するステップであり、前記参照試料シーケンスの各メンバが、前記参照試料変換の異なる1回に応答して記録された前記スペクトルに対応するステップによって作成される、請求項1に記載の方法。 - 各参照試料シーケンスのメンバが、前記複数回の間に各参照試料の前記一部分を前記プラズマに変換するために使用した電磁放射パルスの異なるパラメータと、前記複数回の間に各参照試料を前記プラズマに変換するために使用した前記電磁放射パルスの各参照試料上の異なる入射箇所との組合せに応じて記録された前記スペクトルに対応する、請求項13に記載の方法。
- 試料を分析するシステムであって、
前記試料の一部分をプラズマに複数回変換する励起源と、
前記試料変換のそれぞれに応答する電磁放射のスペクトルを記録して、前記試料のスペクトルのシーケンスを規定するように構成された分光計であって、前記試料の前記スペクトルの前記シーケンスが複数のメンバからなり、前記シーケンスの各メンバが、前記試料変換の異なる1回に応答して記録された前記スペクトルに対応する分光計と、
電子プロセッサとを備え、当該電子プロセッサは、前記試料のスペクトルの前記シーケンスを、参照ライブラリ中の少なくとも1つの参照試料のそれぞれのスペクトルのシーケンスと比較し、前記ライブラリ中の前記少なくとも1つの参照試料との前記比較に基づいて前記試料に関する情報を決定し、前記参照試料のぞれぞれのスペクトルのシーケンスが、複数のメンバからなり、前記比較が、前記試料のスペクトルの前記シーケンスの中の、それぞれのメンバが現れる回数を、前記参照試料のそれぞれのスペクトルのシーケンスの中の、それぞれメンバが現れる回数と、比較することからなる、システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US201261595903P | 2012-02-07 | 2012-02-07 | |
US61/595,903 | 2012-02-07 | ||
PCT/US2013/024843 WO2013119604A1 (en) | 2012-02-07 | 2013-02-06 | Methods and systems for analyzing samples |
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