JP5964400B2 - Extreme ultraviolet light source device and its target supply system - Google Patents

Description

  The present invention relates to an extreme ultraviolet light source device used as a light source of an exposure apparatus, and a target supply system capable of supplying a target without interruption in the extreme ultraviolet light source device.

  In recent years, along with miniaturization of semiconductor processes, miniaturization in photolithography has rapidly progressed, and in the next generation, fine processing of 100 to 70 nm, and further fine processing of 50 nm or less will be required. Therefore, for example, in order to meet the demand for fine processing of 50 nm or less, development of an exposure apparatus that combines an extreme ultra violet (EUV) light source device having a wavelength of about 13 nm and a reduced projection reflective optics (reduced projection reflective optics) has been developed. Expected.

  As an EUV light source, an LPP (laser produced plasma) light source (hereinafter also referred to as an “LPP type EUV light source”) using plasma generated by irradiating a target with a laser beam is generated by discharge. Three types are known: a DPP (discharge produced plasma) light source using plasma and an SR (synchrotron radiation) light source using synchrotron radiation.

  Among these, the LPP type EUV light source can considerably increase the plasma density, so that high luminance close to black body radiation can be obtained, and light emission only in a necessary wavelength band is possible by selecting a target material. Since it is a point light source with a rectangular angular distribution, there is no structure such as an electrode around the light source, and it is possible to secure a very large collection solid angle of 2π steradians. It is promising as a light source for optical lithography requiring power.

  The LPP type EUV light source includes various kinds of materials including extreme ultraviolet light (EUV) from the generated plasma when the target is excited and turned into plasma by condensing the laser light from the driver laser onto a substance called a target existing in the vacuum chamber. Since a wavelength component is radiated, this is used. The EUV light source selects and collects extreme ultraviolet light having a wavelength of, for example, 13.5 nm using a condensing mirror that selectively reflects a desired wavelength component, and supplies the light to an exposure machine.

For the target, a molten metal such as tin (Sn) or lithium (Li) is used. The target is filled in the high-pressure tank and melted by a heater disposed on the outer wall of the high-pressure tank. The melted target is pressurized with an inert gas such as argon (Ar) or nitrogen (N ₂ ), and ejected as a jet stream through a capillary tube at the front end of the tank. As the target form, the form of a droplet is preferred. Therefore, a laser having a uniform volume can be obtained by a continuous jet method that gives a regular disturbance to the surface of the molten metal jet using a vibrating element such as a piezo. Supplied to the condensing point.

Since the high-pressure tank of the conventional target supply device cannot replenish the target material during operation, the target can be supplied to the focusing point only for a certain period of time, and the EUV light source is also stopped when the target material is consumed. Had to do. In addition, when the target material in the high-pressure tank is exhausted and refilling is attempted, the high-temperature high-pressure tank is cooled, disassembled, filled with the target, reassembled, and heated to raise the temperature, requiring considerable time. . For this reason, the EUV light source has a problem that it must be stopped for a long time after being operated for several hours.
As a solution to such a difficulty, Patent Document 1 discloses a technique for continuously supplying a target by connecting a bulk reservoir container to a target supply device. The disclosed technology replenishes the high-pressure tank of the target supply device with the target material melted in the bulk reservoir container when the target material in the high-pressure tank of the target supply device falls below a certain amount. By the method disclosed in Patent Document 1, the EUV light source can be restarted without a long pause.

Special table 2008-532228 gazette

Overview

  However, in the method disclosed in Patent Document 1, the target material replenished from the bulk reservoir container needs to be heated to increase the fluidity in order to flow down the pipes and valves. The target temperature in the supply device is disturbed. Further, in order to flow the target material into the target supply device, there must be a differential pressure between the bulk reservoir container and the target supply device, so the pressure of the target supply device is lowered. Therefore, it is necessary to stop the operation until the pressure is recovered and the temperature is readjusted, although it is shorter than the conventional one. In addition, the valve provided between the bulk server container and the target supply device must be higher than the melting temperature of the target metal (232 ° C. in the case of tin), and has high performance and high cost with stable closing performance in a high temperature environment. It needs to be a proper valve.

  Therefore, the problem to be solved by the present invention is to supply a target material continuously without using a bulb exposed to high temperature in order to enable long-term continuous operation in an LPP extreme ultraviolet (EUV) light source device. It is to provide a target supply system that can be used, and an extreme ultraviolet light source device that uses such a target supply system.

In order to solve the above problems, a target supply system of the present invention applied to an LPP type EUV light source includes a first tank containing a target material, a second tank having a heating mechanism, the first tank, A connecting pipe communicating with the second tank, which is connected to the second tank at a position lower than the connection position to the first tank, and which opens and closes the passage of the connecting pipe And a droplet generator including a nozzle provided in the second tank.
The target supply system of the present invention may further include a heat insulating part disposed at a connection position between the connection pipe and the second tank, and a cooling part disposed in the connection pipe.
The first tank may be detachable from the connecting pipe.
The said partition part may have a 1st gate valve and the 2nd gate valve between the said 1st gate valve and the said 2nd tank.
The target supply system of the present invention further includes a vibration device in the middle of the connection pipe, the connection pipe has an inclined pipe portion that stops movement of the target material in the middle of the connection pipe, The target material in the tube may flow by applying vibration to the inclined tube portion.
The target supply system of the present invention further includes an intermediate container and a vibration device in the middle of the connecting pipe, and the partition portion is disposed between the first tank and the intermediate container, so that the target material of the intermediate container If the amount is less than a set amount, the target material is supplied from the first tank to the intermediate container, and the connecting pipe is in the middle of a portion connecting the intermediate container and the second tank. The target material may have an inclined tube portion that stops movement, and the vibration exciter may apply vibration to the inclined tube portion to drop the target material in the tube into the second tank.
The partition includes a first partition valve, a second partition valve between the first partition valve and the second tank, and a second partition between the first and second partition valves. And an intermediate container.

Also, extreme ultraviolet light source device of the present invention is characterized in that it comprises a target supply system according to the present invention.

  According to the target supply system of the present invention, the high-pressure melting tank of the target supply device can receive replenishment from the target material storage tank if the stored target material is insufficient, so that the target is not interrupted by the LPP type EUV light source device. Can be supplied. Moreover, since the target supply conditions are not disturbed while the target material is replenished, the LPP type EUV light source device can be operated continuously over a long period of time.

In addition, since the high-pressure melting tank receives solid granular target material and heats it in the tank to melt it, the transfer mechanism that opens and closes the target material storage tank and the flow path handles only the solid target material, and the melting point of the target material Since it operates in a low temperature environment, the temperature condition of the transfer mechanism is relaxed and high performance can be exhibited.
The LPP type EUV light source apparatus to which the target supply system of the present invention is applied can supply a target material as appropriate, and can be operated for a long time.

It is a schematic diagram which shows the structure of the extreme ultraviolet light source device to which the target supply system of this invention is applied. 1 is a schematic diagram showing a target supply system according to a first embodiment of the present invention. It is a schematic diagram which shows the target supply system which concerns on 2nd Embodiment of this invention. It is a schematic diagram which shows the target supply system which concerns on 3rd Embodiment of this invention. It is a schematic diagram which shows the target supply system which concerns on 4th Embodiment of this invention. It is a schematic diagram which shows the target supply system which concerns on 5th Embodiment of this invention.

Embodiment

Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the drawings. In addition, in each drawing, the same reference number is attached | subjected to the component which has the same function as what was described in drawing of a young number, and duplication of description was avoided.
FIG. 1 is a schematic diagram showing a configuration of an extreme ultraviolet light source device to which a target supply system of the present invention is applied. The extreme ultraviolet light source device shown in FIG. 1 employs a laser excitation plasma (LPP) system that generates extreme ultraviolet light by irradiating a target material with a laser beam and exciting it.

  The target supply system of the present invention includes a target supply device 11 that supplies a droplet-like target 13 to a predetermined position in a vacuum chamber 10 and a target that supplies a granular target material to the target supply device 11 shown in FIG. A substance replenishing device 12 is provided.

  As shown in FIG. 1, an LPP extreme ultraviolet light source device to which the present invention is applied includes a vacuum chamber 10 in which extreme ultraviolet light is generated, a target supply system including a target supply device 11 and a target material replenishment device 12. A driver laser 15 for generating an excitation laser beam 20 for irradiating the target 13, a laser condensing optical system 16 for condensing the excitation laser beam 20 emitted from the driver laser 15 at the predetermined position, and a predetermined A condensing mirror 14 that condenses and emits extreme ultraviolet light emitted from the plasma 18 generated by irradiating the target 13 with the excitation laser beam 20 at a position, and an exhaust for keeping the vacuum chamber 10 in a vacuum. A device 17 is provided.

In this extreme ultraviolet light source device, for example, a metal droplet such as tin (Sn) or lithium (Li) or a solid particle is used as the target 13, and light having a relatively long wavelength is used as the driver laser 15. A carbon dioxide (CO ₂ ) laser that can be produced is used. The target 13 is preferably tin that has high conversion efficiency from laser light energy to extreme ultraviolet light energy. When the tin target is irradiated with a carbon dioxide laser, the conversion efficiency is about 2 to 4%.

The laser condensing optical system 16 includes at least one lens and / or at least one mirror. The laser condensing optical system 16 may be arranged outside the vacuum chamber 10 as shown in FIG. 1, but can also be arranged inside the vacuum chamber 10.
The condensing mirror 14 is a condensing optical element that selectively reflects and condenses a predetermined derivative component such as extreme ultraviolet light near 13.5 nm among various wavelength components emitted from the plasma 18. is there. The condensing mirror 14 has a concave reflecting surface, and on this reflecting surface, for example, a multilayer of molybdenum (Mo) and silicon (Si) that selectively reflects extreme ultraviolet light having a wavelength of around 13.5 nm, for example. A film is formed.

(Embodiment 1)
FIG. 2 is a schematic diagram showing the target supply system according to the first embodiment of the present invention.
In the target supply system according to the first embodiment shown in FIG. 2, the target supply device 11 includes a high-pressure melting tank 21, a nozzle 22 having a fine hole, and a piezoelectric element 23 provided at the bottom of the high-pressure melting tank 21. The target material supply device 12 includes a target material storage tank 30 and a transfer mechanism including a valve 33. The target material storage tank 30 and the high-pressure melting tank 21 are connected by a connecting pipe, and are partitioned by a partition valve type valve 33 such as a ball valve or a gate valve.

  The high-pressure melting tank 21 is provided with a liquid level sensor 25 for detecting the liquid level of the molten metal. The liquid level of the molten tin 26 in the high-pressure melting tank 21 is monitored by the liquid level sensor 25, and a detection signal is input to the level controller 40. When the liquid level of the molten tin 26 falls below a preset lower limit level, the level controller 40 opens the valve 33 and opens the target material (tin) 35 that is solid and granular in the target material storage tank 30. Is supplied to the high-pressure melting tank 21. Then, when the liquid level of the molten tin 26 monitored by the liquid level sensor 25 exceeds the preset upper limit level, the valve 33 is closed and the supply of the granular tin 35 is stopped. Solid tin 35 supplied from the target material storage tank 30 is melted in the high-pressure melting tank 21.

  The high-pressure melting tank 21 is held at a temperature (for example, about 280 ° C. for tin) equal to or higher than the melting point of the target material (232 ° C. for tin) by the heater 24 in order to melt the target material tin. Therefore, without the heat insulation jacket 31, heat is transferred from the wall of the high pressure melting tank 21, the connecting pipe becomes higher than the melting point of the target material, and part of the solid target material supplied from the target material storage tank 30 is mutually melted. This will cause the connecting pipe to be blocked. For this reason, a heat insulating jacket 31 is arranged in a portion of the connecting pipe connecting the valve 33 and the high pressure melting tank 21 in contact with the high pressure melting tank 21 so as to block heat transfer from the wall of the high pressure melting tank 21. ing. If necessary, a cooling jacket 32 may be arranged on the connecting pipe to further cool the connecting pipe.

A high pressure gas pipe from a pressure regulating valve 28 is connected to the high pressure melting tank 21. The pressure regulating valve 28 depressurizes high-pressure argon (Ar) gas supplied from a gas source 27 such as a cylinder to an appropriate pressure such as 10 MPa, and supplies the high-pressure melting tank 21 as pressurized gas. When the inside of the high-pressure melting tank 21 is pressurized with a high-pressure gas, molten tin is injected as an extremely thin jet from the fine holes of the nozzle 22 provided at the bottom of the tank. The fine hole of the nozzle 22 is a hole having a diameter of about 20 μm, for example. When the jet surface is disturbed by the piezo element 23 when injecting molten tin, the molten tin 26 becomes a fine droplet-shaped target 13, and the position irradiated by the excitation laser beam 20 in the vacuum chamber 10 To be supplied.
Since the speed of the target 13 depends on the pressure in the pressure melting tank 21, the pressure in the tank is maintained at a predetermined value by the pressure adjusting valve 28.

  If the solid tin 35 reaches the nozzle 22 without being completely melted, the diameter of the nozzle 22 is small, which causes clogging. For this reason, the solid tin 35 is required to have a size and shape that can be completely melted before reaching the nozzle. Further, the solid tin 35 is preferably in a spherical shape that is not easily clogged in the connecting pipe, and is particularly preferably a true sphere. The optimum size and shape of the solid tin 35 also depends on the size and shape of the high-pressure melting tank 21. In the present embodiment, true spherical tin particles having a diameter of 2 mm are used.

The target material storage tank 30 is provided with a level sensor 34 for detecting the solid target amount, and a lower limit detection signal is transmitted to the level controller 40. When the amount of the granular tin 35 in the target material storage tank 30 becomes equal to or less than the set value, an alarm is issued, and the operator replenishes the target material storage tank 30 with the tin 35.
In addition, when the target material storage tank 30 is configured to be detachably attached to the transfer mechanism, the target material storage tank 30 is quickly and easily replenished by replacing the target material storage tank 30 with a target material storage tank previously filled with granular tin. be able to.

Moreover, it is preferable to connect a purge pipe for introducing an inert gas such as argon or nitrogen to the target material storage tank 30 to prevent the target material in the storage tank from being oxidized by the purge. As the purge gas, it is more preferable to use the same gas as the gas used for pressurization of the pressure melting tank 21.
When the valve 33 is opened rapidly, the pressure of the pressure melting tank 21 is influenced by the pressure of the target material storage tank 30 and the speed of the target 13 changes. Therefore, it is preferable that the valve 33 is opened slowly.

  According to the target supply system according to the first embodiment, it is possible to fill the target material into the target supply device 11 without stopping the extreme ultraviolet light source device, and to generate extreme ultraviolet light stably for a long period of time. The operating time required at a practical level for the extreme ultraviolet light source device can be achieved.

(Embodiment 2)
FIG. 3 is a schematic diagram showing a target supply system according to the second embodiment of the present invention.
The target supply system according to the second embodiment differs from the target supply system according to the first embodiment shown in FIG. 2 only in the configuration and function of the transfer mechanism, and the other functions are the same. The parts having the same reference numerals are used to simplify the description.

  As shown in FIG. 3, the connecting pipe that connects the target material storage tank 30 of the target material replenishment apparatus 12 and the high-pressure melting tank 21 of the target supply apparatus 11 is not provided with a valve, and an inclined pipe section having an inclination is provided in the pipe. , So that the particulate matter in the tube stays in the middle without flowing down. Furthermore, by arranging a vibrator 50 using a piezo element or a hammer in the connecting pipe and operating the vibrator 50 to shake the pipe, the particulate matter remaining in the pipe is fluidized and melted at high pressure. It is configured to fall into the tank 21.

  The liquid level sensor 25 provided in the high-pressure melting tank 21 monitors the liquid level of the molten tin 26 in the tank, and when the level drops below a predetermined lower limit level, the vibrator 50 is driven by the level controller 40 to the connecting pipe. Vibration is applied to supply the granular tin 35 stored in the target material storage tank 30 to the high-pressure melting tank 21. When the liquid level of the molten tin 26 in the high-pressure melting tank 21 reaches a predetermined upper limit level, the vibration of the vibrator 50 is stopped and the supply of the granular tin 35 is stopped.

According to the target supply system according to the second embodiment, as in the first embodiment, the target material is filled in the target supply device 11 without stopping the extreme ultraviolet light source device, and extreme ultraviolet light is generated stably for a long period of time. As a result, it has become possible to achieve the operating time required at a practical level for the extreme ultraviolet light source device.
In addition, the target supply system according to the second embodiment intermittently distributes tin using a vibrator applied from the outside of the connecting pipe, so that troubles can occur without interposing a complicated device such as a valve in the connecting pipe. And maintenance work is reduced.

(Embodiment 3)
FIG. 4 is a schematic diagram showing a target supply system according to a third embodiment of the present invention.
The target supply system according to the third embodiment differs from the target supply system of the first embodiment and the second embodiment only in the configuration and function of the transfer mechanism, and the other functions are not different. The parts having the same reference numerals are used to simplify the description.

  In the target supply system of the present embodiment, an intermediate container 60 for storing granular target material is provided in a transfer mechanism provided between the target material storage tank 30 of the target material supply device 12 and the high-pressure melting tank 21 of the target supply device 11. There are some features. The intermediate container 60 is provided with a level sensor 61 that detects the level of the granular target material, and transmits a detection signal to the level controller 40.

  Between the intermediate vessel 60 and the high-pressure melting tank 21, an inclined tube that stops the spontaneous fall of tin particles and a vibrator 50 that vibrates from the outside of the piping are provided. The tin particles in the intermediate vessel 60 are melted at high pressure. The mechanism and action supplied to the tank 21 are the same as those provided between the target material storage tank 30 and the high-pressure melting tank 21 in the second embodiment.

On the other hand, two valves 63 and 64 are provided between the target material storage tank 30 and the intermediate container 60 and are automatically opened and closed by the level controller 40.
The solid granular tin 62 in the intermediate container 60 is monitored by the level sensor 61. When the level of the granular tin 62 falls below a predetermined lower limit, the level controller 40 opens the two valves 63 and 64, The granular tin 35 falls from the target material storage tank 30 and is replenished to the intermediate container 60. When the level of the granular tin 62 in the intermediate container 60 reaches a predetermined upper limit value or more, the two valves 63 and 64 are closed to stop the supply of the granular tin 35.

  The two valves 63 and 64 may be operated at the same time or may be replaced with one valve, but it is more preferable to open and close the two valves 63 and 64 in two stages. That is, when replenishing the granular tin 35 from the target material storage tank 30 to the intermediate container 60, the lower valve 63 is closed, the upper valve 64 is opened, and the granular material from the target material storage tank 30 is between the two valves. After the tin 35 is filled, the upper valve 64 is closed and the lower valve 63 is opened, and then discharged into the intermediate container 60.

  Thus, when the two-stage opening / closing operation is performed, one of the valves 63 and 64 can always be closed, so that the pressure in the high-pressure melting tank 32 is prevented from reaching the target material storage tank 30 via the intermediate container 60. Can do. Therefore, the target material storage tank 30 does not need to be a high pressure container. In addition, a replacement storage tank filled with granular tin in advance is prepared by allowing the upper valve 64 to be attached to the target material storage tank 30 so that it can be separated between the two valves. It is also possible to exchange modules that replace the whole.

In addition, since a sufficient amount of granular tin 62 for supplementing the high-pressure melting tank 21 is always stored in the intermediate container 60, even if it takes some time to replenish the granular tin 35 in the target material storage tank 30, The liquid level of the molten tin 26 in the high-pressure melting tank 21 is not disturbed.
Further, the high-pressure gas that escapes from the high-pressure melting tank 21 to the target material storage tank 30 via the intermediate container 60 is limited to the volume of the pipe sandwiched between the valves every time the double valves 63 and 64 are opened and closed. The pressure fluctuations in the are suppressed, and the speed change of the target is sufficiently suppressed.

(Embodiment 4)
FIG. 5 is a schematic diagram showing a target supply system according to the fourth embodiment of the present invention.
The target supply system according to the fourth embodiment has the same function as the target supply system of the first, second, and third embodiments, except that the configuration and function of the transfer mechanism are different and the other configurations are not different. The same reference numerals are used for the parts to simplify the description.

In the target supply system of the fourth embodiment, in the transfer mechanism of the third embodiment, the second vibration exciter 61 is provided upstream of the dual valves 63 and 64 for supplying the intermediate container 60 with the granular tin 35. There is a difference in preparation.
As shown in FIG. 3, the granular material supplied from the target material storage tank 30 is provided with an inclined pipe portion having an inclination in the connecting pipe connecting the target material storage tank 30 of the target material replenishing device 12 and the dual valves 63 and 64. The substance stays in the middle so that the passage in the tube is blocked. Further, the second vibrator 51 is arranged in the vicinity of the inclined pipe portion, and when the pipe is shaken by the second vibrator 51, the particulate matter in the connecting pipe flows down and falls into the intermediate container 60.

  The level of the granular tin 62 in the intermediate container 60 is constantly monitored by the level sensor 61, and the detection signal is transmitted to the level controller 40. When the level of the granular tin 62 becomes equal to or lower than a preset lower limit value, the level controller 40 opens the two valves 63 and 64 and vibrates the connecting pipe with the second vibrator 51, so that the inside of the connecting pipe Then, the flow of granular tin is caused to replenish the intermediate container 60 with the granular tin 35 in the target material storage tank 30. Then, when the level of the granular tin 62 in the intermediate container 60 exceeds the preset upper limit value by the level sensor 61, the second vibrator 51 is stopped and the dual valves 63 and 64 are closed, and the target The flow of the granular tin 35 from the substance storage tank 30 to the intermediate container 60 is stopped.

At this time, by the two-stage operation of the dual valves 63 and 64, the lower valve 63 is closed, the upper valve 64 is opened, the second exciter 51 vibrates the connecting pipe, and the two valves In the meantime, the granular tin 35 from the target material storage tank 30 is filled, and the second vibrator 51 is stopped. Thereafter, the upper valve 64 is closed and the lower valve 63 is opened, and the granular tin 35 is discharged to the intermediate container 60.
Note that one valve may be used instead of the dual valves 63 and 64. However, when the dual valve is operated in two stages, the advantages described with respect to the third embodiment are obtained.

(Embodiment 5)
FIG. 6 is a schematic diagram showing a target supply system according to a fifth embodiment of the present invention.
The target supply system according to the fifth embodiment is different from the target supply system according to the fourth embodiment only in that the second intermediate container is disposed between the two series valves, and other configurations are not different. For parts having the same function, the same reference numerals are used to simplify the description. However, the intermediate container 60 in the description of the fourth embodiment will be read as the first intermediate container 60.

  In the target supply system of the fifth embodiment, in the transfer mechanism of the fourth embodiment, the second intermediate container 70 is disposed at a position sandwiched between the valves of the dual valves 63 and 64 provided upstream of the first intermediate container 60. It is a thing. The second intermediate container 70 is provided with a level sensor 71 that detects the level of the granular tin 72 contained therein. The level sensor 71 monitors the level of solid granular tin 72 in the first intermediate container 70 and transmits a detection signal to the level controller 40.

  When the level of the granular tin 72 in the second intermediate container 70 falls below a predetermined lower limit value, the level controller 40 opens the upstream valve 64 of the double valve and drives the second vibrator 51 to drive the inclined pipe. By applying vibration to the portion, the granular tin 35 in the target material storage tank 30 is supplemented in the second intermediate container 70. When the level of the granular tin 72 in the second intermediate container 70 exceeds a predetermined upper limit value, the level controller 40 stops the second vibrator 51 and closes the upstream valve 64 of the double valve, and the target material The supply from the storage tank 30 is stopped. Further, the downstream side valve 63 is opened to supply the granular tin 72 in the second intermediate container 70 to the first intermediate container 60.

By providing the second intermediate container 70, the second intermediate container 70 has a larger buffer capacity than the pipe connecting the dual valves 63 and 64, so the frequency of the two-stage operation of the dual valves is reduced and supplied once. The amount of granular tin that can be produced also increases.
At the same time, the second intermediate vessel 70 is filled with solid granular tin 35 in the target material storage tank 30 by applying vibration to the inclined tube portion.

In each of the above embodiments, tin is used as a target. However, it goes without saying that the present invention can be similarly used for lithium and other metals used in the extreme ultraviolet light source device.
In addition, level sensors 25, 34, 61, 71 for detecting the level of a molten metal surface or granular material such as tin in each tank or each container are necessary for determining whether or not a predetermined level is exceeded. Therefore, it can be used not only as an instrument for obtaining an analog output corresponding to the level but also as a level switch.

  The extreme ultraviolet light source apparatus to which the target supply system according to the present invention is applied can fill the target without stopping the apparatus and generate extreme ultraviolet light stably for a long period of time. With the extreme ultra violet light source device of this embodiment, the operating time of the device required at a practical level could be achieved.

DESCRIPTION OF SYMBOLS 10 ... Vacuum chamber, 11 ... Target supply apparatus, 12 ... Target material replenishment apparatus, 13 ... Target, 14 ... Condensing mirror, 15 ... Driver laser, 16 ... Laser Condensing optical system, 17 ... exhaust device, 18 ... plasma, 20 ... excitation laser beam, 21 ... high pressure melting tank, 22 ... nozzle, 23 ... piezo element, 24. ..Heater, 25 ... liquid level sensor, 26 ... molten tin, 27 ... gas source, 28 ... pressure regulating valve, 30 ... target material storage tank, 31 ... heat insulation jacket, 32 ... Cooling jacket, 33 ... Valve, 34 ... Level sensor, 35 ... Granular tin, 40 ... Level controller, 50 ... (First) Vibrator, 51 ... Second vibrator, 60 ... (first) intermediate container, 61 ... Level sensor, 62 ... granular tin, 63, 64 ... valve, 70 ... second intermediate container, 71 ... level sensor, 72 ... granular tin.

Claims (12)

A target supply system used for an extreme ultraviolet light source device that generates extreme ultraviolet light by irradiating a target material with laser light to generate plasma.
A first tank containing a target substance;
A second tank with a heating mechanism;
A connecting pipe that connects the first tank and the second tank, is connected to the second tank at a position lower than a connection position to the first tank, and the connection The connecting pipe having a partition portion for opening and closing the passage of the pipe;
A droplet generator including a nozzle provided in the second tank;
A heat insulating portion disposed at a connection position between the connecting pipe and the second tank;
A cooling unit disposed in the connecting pipe ;
Target supply system comprising a. Wherein the cooling unit is located between said partition portion the insulating part, the target supply system of claim 1, wherein.   The target supply system according to claim 1, further comprising a level control device that adjusts the partition portion to replenish the second tank with a target material from the first tank according to the level of the second tank. A target supply system used for an extreme ultraviolet light source device that generates extreme ultraviolet light by irradiating a target material with laser light to generate plasma.
A first tank containing a target substance;
A second tank with a heating mechanism;
A connecting pipe that connects the first tank and the second tank, is connected to the second tank at a position lower than a connection position to the first tank, and the connection The connecting pipe having a partition portion for opening and closing the passage of the pipe;
A droplet generator including a nozzle provided in the second tank;
With
The first tank is detachable from said connecting tube, motor Getto supply system. A target supply system for use in an extreme ultraviolet light source device that generates extreme ultraviolet light by irradiating a target material with laser light to generate plasma.
A first tank containing a target substance;
A second tank with a heating mechanism;
A connecting pipe that connects the first tank and the second tank, is connected to the second tank at a position lower than a connection position to the first tank, and the connection The connecting pipe having a partition portion for opening and closing the passage of the pipe;
A droplet generator including a nozzle provided in the second tank;
With
The partition portion includes a first gate valve, and a second gate valve between the second tank and said first gate valve, motor Getto supply system. The first gate valve is opened with the second gate valve closed, the first gate valve is then closed, and the second gate valve is closed with the first gate valve closed. The target supply system according to claim 5 , further comprising a control device that controls the first and second gate valves to open the valve. A target supply system used for an extreme ultraviolet light source device that generates extreme ultraviolet light by irradiating a target material with laser light to generate plasma.
A first tank containing a target substance;
A second tank with a heating mechanism;
A connecting pipe that connects the first tank and the second tank, is connected to the second tank at a position lower than a connection position to the first tank, and the connection The connecting pipe having a partition portion for opening and closing the passage of the pipe;
A droplet generator including a nozzle provided in the second tank;
A vibration device in the middle of the connecting pipe ,
The connecting pipe has an inclined pipe section that stops the movement of the target material in the middle of the pipe, and the vibration exciter applies vibration to the inclined pipe section to cause the target material in the pipe to flow . Target supply system. A target supply system used for an extreme ultraviolet light source device that generates extreme ultraviolet light by irradiating a target material with laser light to generate plasma.
A first tank containing a target substance;
A second tank with a heating mechanism;
A connecting pipe that connects the first tank and the second tank, is connected to the second tank at a position lower than a connection position to the first tank, and the connection The connecting pipe having a partition portion for opening and closing the passage of the pipe;
A droplet generator including a nozzle provided in the second tank;
An intermediate container and a vibration device in the middle of the connecting pipe ,
The partition portion is disposed between the first tank and the intermediate container, and if the amount of the target material in the intermediate container is less than a set amount, the partition material receives the target material from the first tank. The intermediate pipe and the connecting pipe have an inclined pipe portion that stops the movement of the target material in the middle of the portion connecting the intermediate container and the second tank. giving vibration to the tube portion dropping the target material in the tube into the second tank, motor Getto supply system. The connecting pipe has a second inclined pipe portion that stops the movement of the granular target material in the pipe between the first tank and the partition portion, and a second vibration device is added to the second inclined pipe portion. The target supply according to claim 8 , wherein the second vibration device applies vibration to the second inclined pipe portion to drop the target material in the pipe to the intermediate container through the partition portion. system. A target supply system used for an extreme ultraviolet light source device that generates extreme ultraviolet light by irradiating a target material with laser light to generate plasma.
A first tank containing a target substance;
A second tank with a heating mechanism;
A connecting pipe that connects the first tank and the second tank, is connected to the second tank at a position lower than a connection position to the first tank, and the connection The connecting pipe having a partition portion for opening and closing the passage of the pipe;
A droplet generator including a nozzle provided in the second tank;
With
The partition includes a first partition valve, a second partition valve between the first partition valve and the second tank, and a second partition between the first and second partition valves. having an intermediate container, a motor Getto supply system. The first gate valve is opened with the second gate valve closed, the first gate valve is then closed, and the second gate valve is closed with the first gate valve closed. The target supply system according to claim 10 , further comprising a control device that controls the first and second gate valves to open the valve. An extreme ultraviolet light source device incorporating the target supply system according to any one of claims 1 to 11 .

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