JP5949205B2 - Color filter - Google Patents

Description

  When used in an organic electroluminescence display device, the present invention suitably suppresses external light reflection at a portion corresponding to a white subpixel of a color filter in the organic electroluminescence display device, and performs display with good luminance. The present invention relates to an enabling color filter, an organic electroluminescence display device using the color filter, and a method for manufacturing the color filter.

  An organic electroluminescence (hereinafter abbreviated as “organic EL”) display device has high visibility due to self-coloring, and, unlike a liquid crystal display device, is an all-solid-state display, has excellent impact resistance, and has a high response speed. Attention has been focused on advantages such as little influence from temperature changes and a large viewing angle.

  The organic EL display device has an organic EL element based on a laminated structure in which an anode, an organic EL layer including a light emitting layer, and a cathode are laminated in this order. In addition, the organic EL display device can perform color display by the color of light from the light emitting layer of the organic EL element, but a color filter having a colored layer in order to perform color display with better color development. A combination of these is also widely used.

  Here, as an organic EL display device capable of color display, an organic EL display device having a pixel portion having three sub-pixels of red, green, and blue has been conventionally known. However, when performing white display, the organic EL elements corresponding to the three sub-pixels of red, green, and blue need to emit light, so that power consumption is large and the organic EL of the entire organic EL display device There exists a problem that an element tends to deteriorate.

  Therefore, in recent years, an organic EL display device having a pixel portion having a sub-pixel of four colors in which a white sub-pixel is added to a sub-pixel of three colors of red, green, and blue is proposed for such a problem. (For example, Patent Document 1). In such an organic EL display device, when white display is performed, the organic EL element corresponding to the white subpixel may be caused to emit light, and power consumption can be reduced. Also, red, green, Compared with the case where the organic EL elements corresponding to the three sub-pixels of blue are caused to emit light, it is possible to suppress deterioration of the organic EL elements of the entire organic EL display device.

However, such an organic EL display device has the following problems.
That is, in the color filter used in the organic EL display device, usually, a colored layer is formed on the subpixels of three colors of red, green, and blue, and the white subpixel is provided with an opening, or as necessary. Since the transparent resin layer is formed, the white sub-pixel of the color filter has a higher external light transmittance than the other sub-pixels. Therefore, external light incident on the inside of the organic EL display device from a portion corresponding to the white subpixel of the color filter in the organic EL display device (hereinafter sometimes referred to as a white subpixel of the organic EL display device) is converted into the organic EL display. There is a problem that the display of the organic EL display device becomes difficult to see due to so-called external light reflection, which is reflected by the electrode of the element and emitted again to the outside of the organic EL display device.

  In addition, in the organic EL display device, with respect to the above-described problem of external light reflection, conventionally, a circularly polarizing plate is disposed on the observer side of the organic EL display device, so that the outside incident on the inside of the organic EL display device can be obtained. A method of preventing reflected light from exiting the organic EL display device by converting light into circularly polarized light has also been proposed. However, when a circularly polarizing plate is provided, the luminance of the organic EL display device is circular. There exists a problem that it will fall 50% or more compared with before arrangement | positioning of a polarizing plate. Further, since the circularly polarizing plate itself is expensive, there is a problem that the manufacturing cost of the organic EL display device is increased.

JP 2004-334204 A

  The present invention has been made in view of the above circumstances, and is a color capable of suppressing external light reflection at the white subpixel of the organic EL display device and improving the luminance of the entire organic EL display device. It is a main object to provide a filter, an organic EL display device using the filter, and a method for manufacturing a color filter.

  In order to solve the above-described problems, the present invention provides a transparent base material, a light shielding portion formed in a pattern on the transparent base material, and an opening of the light shielding portion, and has a pattern on the transparent base material. A colored subpixel having a colored layer formed in a shape, a white subpixel having a linearly polarizing layer provided in a pattern on the transparent substrate provided in the opening of the light shielding portion, and the transparent substrate A phase difference control layer formed on at least the white subpixel, and the white subpixel is formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent substrate. A color filter is provided.

  According to the present invention, the white subpixel of the color filter has a linearly polarizing layer, and the white subpixel is formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent base material. It becomes possible to give a circular polarization function to the sub-pixel. Therefore, when the color filter of the present invention is used in an organic EL display device, it is possible to prevent external light reflection in the white subpixel of the organic EL display device, and good display can be performed. In this case, the color filter of the present invention does not have to be used in combination with the circularly polarizing plate to prevent reflection of external light, so that the brightness of the entire organic EL display device can be improved, and organic The manufacturing cost of the EL display device can be suppressed.

  In the present invention, the linearly polarizing layer is preferably a laminate of an alignment layer and a dichroic molecular layer formed on the surface of the alignment layer and containing a dichroic molecule. This is because when the linearly polarizing layer is a laminate of an alignment layer and a dichroic molecular layer, the linearly polarizing layer can be accurately formed on the white subpixel on the transparent substrate.

  The present invention provides a transparent base material, a light-shielding portion formed in a pattern on the transparent base material, and a colored layer provided in the opening of the light-shielding portion and formed in a pattern on the transparent base material A sub-pixel, a white sub-pixel having a linearly polarizing layer formed in a pattern on the transparent substrate provided in the opening of the light-shielding portion, and at least a white sub-pixel formed on the transparent substrate A color filter formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent base material, a counter base material, and the color filter; Provided is an organic EL display device comprising: an organic EL element formed on either the upper substrate or the counter substrate, and disposed between the color filter and the counter substrate. .

  According to the present invention, by having the color filter, it is possible to prevent external light reflection in the white subpixel of the organic EL display device, and to obtain an organic EL display device capable of performing good display. Can do. In addition, the organic EL display device of the present invention does not need to be provided with a circularly polarizing plate for preventing reflection of external light, can improve the luminance of the entire organic EL display device, and is cost effective. In addition, the organic EL display device can be advantageous.

  The present invention provides a transparent base material, a light-shielding portion formed in a pattern on the transparent base material, and a colored layer provided in the opening of the light-shielding portion and formed in a pattern on the transparent base material A color filter substrate having a subpixel and a white subpixel provided in the opening of the light-shielding portion and having no colored layer formed on the transparent substrate is prepared, and the transparent substrate of the color filter substrate is prepared. After the alignment layer is formed in a pattern on the white subpixel, a linearly polarizing layer is formed in a pattern by forming a dichroic molecule layer containing a dichroic molecule on the surface of the alignment layer. A color comprising: a linearly polarizing layer forming step to be formed; and a phase difference control layer forming step of forming a phase difference control layer on at least the white subpixel on the transparent substrate of the color filter substrate. Filter manufacturing The law provides.

  According to the present invention, the linear polarizing layer can be formed in a pattern on the white subpixel on the transparent substrate of the color filter by having the linear polarizing layer forming step and the phase difference control layer forming step described above. Since the white subpixel can be formed by laminating a linearly polarizing layer and a phase difference control layer on a transparent base material, it is possible to manufacture a color filter in which a circularly polarizing function is imparted to the white subpixel. .

  ADVANTAGE OF THE INVENTION According to this invention, the color filter which can suppress the external light reflection in the white subpixel of an organic electroluminescent display device, and can make the brightness | luminance of the whole organic electroluminescent display device favorable, and an organic electroluminescent display using the same There exists an effect that the manufacturing method of an apparatus and a color filter can be provided.

It is a schematic sectional drawing which shows an example of the color filter of this invention. It is a schematic sectional drawing which shows the other example of the color filter of this invention. It is a schematic sectional drawing which shows the other example of the color filter of this invention. It is a schematic sectional drawing which shows an example of the organic electroluminescent display apparatus of this invention. It is a schematic sectional drawing which shows the other example of the organic electroluminescent display apparatus of this invention. It is a schematic sectional drawing which shows the other example of the organic electroluminescent display apparatus of this invention. It is process drawing which shows an example of the manufacturing method of the color filter of this invention.

  The present invention relates to a color filter, an organic EL display device, and a method for manufacturing a color filter. Each invention will be described below.

A. Color Filter First, the color filter of the present invention will be described.
The color filter of the present invention is provided in a transparent base material, a light shielding part formed in a pattern on the transparent base material, and an opening of the light shielding part, and is formed in a pattern on the transparent base material. A colored subpixel having a colored layer; a white subpixel having a linearly polarizing layer provided in an opening of the light shielding portion and formed in a pattern on the transparent substrate; and at least a white subpixel on the transparent substrate. A phase difference control layer formed on the pixel, and the white subpixel is formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent substrate. Is.

  In the present invention, “formed on a white subpixel on a transparent substrate” means forming on an opening of a light shielding portion provided with a white subpixel on a transparent substrate.

Here, the color filter of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic sectional view showing an example of the color filter of the present invention. As illustrated in FIG. 1, the color filter 10 of the present invention is provided in a transparent base material 1, a light shielding portion 2 formed in a pattern on the transparent base material 1, and an opening portion of the light shielding portion 2. A colored subpixel 10C (red subpixel 10R, green in FIG. 1) having a colored layer 3 (red colored layer 3R, green colored layer 3G, and blue colored layer 3B in FIG. 1) formed in a pattern on the substrate 1 A subpixel 10G and a blue subpixel 10B), a white subpixel 10W having a linearly polarizing layer 4 formed in a pattern on the transparent base material 2 provided in the opening of the light shielding portion 2, and the transparent base material 1 And a phase difference control layer 5 formed on at least the white subpixel 10W. The white subpixel 10W is formed by laminating the linearly polarizing layer 4 and the phase difference control layer 5 on the transparent substrate 1. It is characterized by. Further, in this example, an example is shown in which the phase difference control layer 5 is continuously formed in the colored subpixel 10C in addition to the white subpixel 10W on the transparent substrate 1, and in the white subpixel 10W, An example in which a linearly polarizing layer 4 and a retardation control layer 5 are laminated in this order on the transparent substrate 1 is shown. In addition, an example is shown in which the linearly polarizing layer 4 is composed of a laminated body of an alignment layer 4a and a dichroic molecular layer 4b formed on the surface of the alignment layer 4a and containing a dichroic molecule.

  FIG. 2 is a schematic sectional view showing another example of the color filter of the present invention. As illustrated in FIG. 2, in the color filter 10 of the present invention, the phase difference control layer 5 may be formed in a pattern on the white subpixel 10 </ b> W on the transparent substrate 1. Since the reference numerals not described in FIG. 2 can be the same as the reference numerals described in FIG. 1, the description thereof is omitted here.

  FIG. 3 is a schematic cross-sectional view showing another example of the color filter of the present invention. As illustrated in FIG. 3, in the color filter 10 of the present invention, in the white subpixel 10 </ b> W, the phase difference control layer 5 and the linearly polarizing layer 4 may be laminated on the transparent substrate 1 in this order. Note that the reference numerals not described in FIG. 3 can be the same as the reference numerals described in FIG.

  According to the present invention, the white subpixel of the color filter has a linearly polarizing layer, and the white subpixel is formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent base material. It becomes possible to give a circular polarization function to the sub-pixel. Therefore, when the color filter of the present invention is used in an organic EL display device, it is possible to prevent external light reflection in the white subpixel of the organic EL display device, and good display can be performed. In this case, the color filter of the present invention does not have to be used in combination with the circularly polarizing plate to prevent reflection of external light, so that the brightness of the entire organic EL display device can be improved, and organic The manufacturing cost of the EL display device can be suppressed.

  Details of the color filter of the present invention will be described below.

I. Color Filter Layer Configuration In the color filter of the present invention, each layer of a light shielding part, a colored layer, a linearly polarizing layer, and a phase difference control layer is formed on a transparent substrate. Moreover, in this invention, each layer mentioned above and the layer formed as needed are normally formed in the same surface side of a transparent base material.

  The stacking order of the linearly polarizing layer and the phase difference control layer in the white subpixel of the color filter of the present invention is appropriately determined depending on the arrangement of the color filter when the color filter of the present invention is used in an organic EL display device. Specifically, in the organic EL display device, a linearly polarizing layer and a phase difference control layer are laminated in order with respect to the incident direction of external light. More specifically, as illustrated in FIG. 4 to be described later, in the organic EL display device 100, the light shielding portion 2 and the like side of the color filter 10 and the organic EL element 30 formed on the counter substrate 20 face each other. In the case where the organic EL element 30 is formed on the surface of the color filter 10 on the light shielding part 2 side as illustrated in FIG. 6, the white subpixel is illustrated as illustrated in FIGS. 1 and 2. At 10 W, the linearly polarizing layer 4 and the phase difference control layer 5 are laminated on the transparent substrate 1 in this order. On the other hand, for example, as illustrated in FIG. 5 to be described later, in the organic EL display device 100, the side opposite to the light shielding portion 2 and the like side of the color filter 10 and the organic EL element 30 formed on the counter substrate 20 3, as illustrated in FIG. 3, in the white subpixel 10 </ b> W, the phase difference control layer 5 and the linearly polarizing layer 4 are formed in this order on the transparent substrate 1.

II. Each structure of a color filter The color filter of this invention has a transparent base material, a light-shielding part, a coloring subpixel, a white subpixel, and a phase difference control layer. Each configuration will be described below.

1. White subpixel The white subpixel in the present invention is provided in an opening of a light shielding portion to be described later, and has a linearly polarizing layer formed in a pattern on a transparent substrate.
The white subpixel constitutes a pixel portion of a color filter together with a colored subpixel described later.

(1) Linearly polarizing layer The linearly polarizing layer used for this invention is demonstrated.
The linearly polarizing layer of the present invention is formed in a pattern on white subpixels on a transparent substrate. The linearly polarizing layer may be formed directly on the transparent substrate, or may be formed through another layer such as a retardation control layer described later or a transparent resin layer formed as necessary. .
Such a linearly polarizing layer is not particularly limited as long as it can convert light into linearly polarized light. However, the dichroic layer is formed on the surface of the alignment layer and the alignment layer and contains a dichroic molecule. It is preferable that it is comprised from the laminated body of a molecular layer.
Hereinafter, the alignment layer and the dichroic molecular layer used in such a linearly polarizing layer will be described.

(A) Alignment layer The alignment layer is formed in a pattern on white subpixels on a transparent substrate, and arranges dichroic molecules contained in a dichroic molecule layer described later in a predetermined direction. Is.
Such an alignment layer can be divided into two modes depending on the difference in alignment treatment used for the alignment layer. Specifically, the orientation layer has an aspect in which fine irregularities are formed on the surface (first aspect) and the aspect in which the orientation layer is composed of a photo-alignment film (second aspect). Can be divided.

(I) 1st aspect The orientation layer of this aspect has a fine uneven | corrugated shape formed in the surface.

  The fine uneven shape is not particularly limited as long as the dichroic molecules contained in the dichroic molecular layer can be arranged in a certain direction. For example, a striped line-shaped uneven structure may be used, and a mode in which minute line-shaped uneven structures are randomly formed in a substantially constant direction and discontinuous may be used.

Here, the stripe-like line-shaped uneven structure means an aspect in which convex portions formed in a wall shape are formed in a stripe shape at regular intervals, for example, when the surface is rubbed Uneven shapes such as minute scratches that are formed are not included in this.
In addition, here, the mode in which the minute line-shaped concavo-convex structure is formed in a substantially discontinuous state in a substantially constant direction is, for example, a minute scratch that is formed when the surface is rubbed. Such a line-shaped concavo-convex structure means an aspect formed in a discontinuous state in a substantially constant direction.

  In this embodiment, it is particularly preferable that the fine line-shaped uneven structure is formed in a discontinuous state at random in a substantially constant direction.

  As the thickness of the alignment layer, a fine concavo-convex shape can be formed on the surface, and the dichroic molecules contained in the dichroic molecular layer described later are arranged in a desired direction using the fine concavo-convex shape. Although it is not particularly limited as long as it can be adjusted, it is preferably in the range of 0.001 μm to 10 μm, more preferably in the range of 0.01 μm to 5 μm, and particularly preferably in the range of 0.1 μm to 3 μm. This is because if the thickness of the alignment layer is less than the above range, it may be difficult to form the alignment layer with a uniform thickness. In addition, when a fine uneven shape is formed on the surface of the alignment layer by rubbing, there is a possibility of damaging the configuration located in the lower layer of the alignment layer.

The constituent material used for forming the alignment layer in this embodiment is not particularly limited as long as the alignment layer can be formed in a pattern at the opening of the light-shielding portion where the white subpixel is provided. For example, photosensitive resin etc. are mentioned.
More specifically, polyimide resin, polyvinyl resin, epoxy resin, urethane resin, urea resin, acrylic resin, polyvinyl alcohol resin, melamine resin, polyamide resin, polyamideimide resin, and the like can be given.

The method for forming the alignment layer is not particularly limited as long as the alignment layer can be formed in a pattern in the opening of the light-shielding portion where the white subpixel on the transparent substrate is provided. Further, it may be a wet process using an alkali solution or an organic solvent, or may be a dry process using CF ₄ , CHF ₃ or the like. Among these, a wet process is preferable from the viewpoint of the selectivity of the photosensitive resin composition, the apparatus cost, and the like.
Examples of the wet process include a formation method using a photolithography method, an inkjet method, a printing method, and the like. In the present invention, a formation method using a photolithography method is particularly preferable. This is because the alignment layer can be formed in a pattern with high accuracy in the opening of the light shielding portion where the white subpixel is provided on the transparent substrate.

An example of a method for forming an alignment layer using a photolithography method will be described below.
First, a coating liquid containing an alignment layer material such as a photosensitive resin is prepared. Next, the coating liquid is applied to the entire surface of the transparent substrate on the light-shielding portion side surface and dried to form a coating film. Next, the coating film is irradiated with exposure light using a photomask to perform pattern exposure processing, patterning processing is performed to form an alignment layer forming layer at a predetermined position, and heat processing is performed. Thereafter, the alignment layer is formed in a pattern on the white subpixel on the transparent substrate by rubbing the alignment layer forming layer. In addition, when the colored layer and the alignment layer forming layer are formed on the transparent base material, after forming a protective resist on the colored layer, the alignment layer forming layer is rubbed, and then In some cases, the protective layer is removed to form an alignment layer.

In the above formation method, a solvent or the like may be added to the coating solution as necessary. Since such a solvent can be the same as that used when forming a general resin member, description thereof is omitted here.
Moreover, as a coating method of the coating liquid, for example, a spin coating method, a roll coating method, a rod bar coating method, a spray coating method, an air knife coating method, a slot die coating method, a wire bar coating method and the like can be used.
The rubbing process can be the same as that used for a general alignment process, and thus the description thereof is omitted here.
Further, the pattern exposure process, the development process, the heating process, and the like can be the same as those used in a general photolithography method, and thus description thereof is omitted here.

(Ii) Second Aspect The alignment layer of this aspect is composed of a photo-alignment film.

  Here, the photo-alignment film is a film obtained by irradiating a substrate on which a constituent material of the photo-alignment film described later is applied with light with controlled polarization to cause a photoexcitation reaction (decomposition, isomerization, dimerization). By imparting anisotropy, the dichroic molecules on the film are oriented.

  The constituent material of the photo-alignment film used in this embodiment is particularly limited as long as it has an effect of orienting dichroic molecules by irradiating light and causing a photoexcitation reaction (photo-alignment). However, such materials can be broadly divided into photoisomerization types in which only the molecular shape changes and reversible orientation changes are possible, and photoreaction types in which the molecules themselves change.

  Here, the photoisomerization reaction refers to a phenomenon in which a single compound changes to another isomer by light irradiation. By using such a photoisomerizable material, a stable isomer among a plurality of isomers is increased by light irradiation, whereby anisotropy can be easily imparted to the photo-alignment film.

  In addition, the photoreaction is not limited as long as the molecule itself is changed by light irradiation and anisotropy can be imparted to the photoalignment property of the photoalignment film, but anisotropy is imparted to the photoalignment film. Is easier, it is preferably a photodimerization reaction or a photolysis reaction. Here, the photodimerization reaction refers to a reaction in which two reaction molecules oriented in the polarization direction by light irradiation undergo radical polymerization and two molecules are polymerized. By this reaction, the alignment in the polarization direction can be stabilized and anisotropy can be imparted to the photo-alignment film. On the other hand, the photolysis reaction refers to a reaction that decomposes molecular chains such as polyimide oriented in the polarization direction by light irradiation. This reaction leaves molecular chains aligned in the direction perpendicular to the polarization direction, and can provide anisotropy to the photo-alignment film.

  In this embodiment, as the constituent material of the photo-alignment film, among the above, it is preferable to use a photoreactive material that imparts anisotropy to the photo-alignment film by causing a photodimerization reaction or a photodecomposition reaction.

  The wavelength region of the light that causes the photoexcitation reaction of the constituent material of the photo-alignment film is preferably in the ultraviolet light range, that is, in the range of 100 nm to 400 nm, and more preferably in the range of 250 nm to 380 nm. .

  The photoisomerization type material is not particularly limited as long as it is a material that can impart anisotropy to the photoalignment film by a photoisomerization reaction, but dichroism that makes absorption different depending on the polarization direction. It is preferable to include a photoisomerization reactive compound that has an isomerization reaction upon irradiation with light. Anisotropy can be easily imparted to the photo-alignment film by causing isomerization of the reaction site oriented in the polarization direction of the photoisomerization-reactive compound having such characteristics.

  In the photoisomerization reactive compound, the isomerization reaction is preferably a cis-trans isomerization reaction. This is because either the cis isomer or the trans isomer is increased by light irradiation, whereby anisotropy can be imparted to the photo-alignment film.

  Examples of the photoisomerization reactive compound used in this embodiment include a monomolecular compound or a polymerizable monomer that is polymerized by light or heat. These may be appropriately selected according to the type of dichroic molecule to be used, but after anisotropy is imparted to the photo-alignment film by light irradiation, the anisotropy is stabilized by polymerization. Therefore, it is preferable to use a polymerizable monomer. Among such polymerizable monomers, after anisotropy is imparted to the photo-alignment film, it can be easily polymerized while maintaining the anisotropy in a good state, so that it is an acrylate monomer or a methacrylate monomer. preferable.

  Specific examples of such a photoisomerization-reactive compound include compounds having a cis-trans isomerization-reactive skeleton such as an azobenzene skeleton or a stilbene skeleton.

  Among the photomolecular isomerization reactive compounds of the monomolecular compound or polymerizable monomer as described above, the photoisomerization reactive compound used in this embodiment is preferably a compound having an azobenzene skeleton in the molecule. This is because the azobenzene skeleton contains a lot of π electrons, and thus has a high interaction with liquid crystal molecules, and is particularly suitable for controlling the alignment of a liquid crystal material that is preferably used as a dichroic molecule.

  In addition, the photoreactive material utilizing the photodimerization reaction is not particularly limited as long as it is a material that can impart anisotropy to the photoalignment film by the photodimerization reaction, but it is a radical polymerizable material. It is preferable to include a photodimerization reactive compound having a dichroism having a functional group and different absorption depending on the polarization direction. This is because by radical polymerization of the reaction site oriented in the polarization direction, the orientation of the photodimerization reactive compound is stabilized and anisotropy can be easily imparted to the photo-alignment film.

  Examples of the photodimerization reactive compound having such characteristics include a dimerization reactive polymer having at least one reactive site selected from cinnamate ester, coumarin, quinoline, chalcone group and cinnamoyl group as a side chain. Can do. Among these, the photodimerization reactive compound is preferably a dimerization reactive polymer containing any one of cinnamate ester, coumarin and quinoline as a side chain. This is because anisotropy can be easily imparted to the photo-alignment film by radical polymerization of α and β unsaturated ketone double bonds aligned in the polarization direction as reaction sites.

  The main chain of the dimerization reactive polymer is not particularly limited as long as it is generally known as a polymer main chain, but the reaction sites of the side chains such as aromatic hydrocarbon groups are not limited. It is preferable that it does not have a substituent containing a lot of π electrons that hinders the interaction.

  Furthermore, examples of the photoreactive material utilizing photolysis reaction include polyimide “RN1199” manufactured by Nissan Chemical Industries, Ltd.

  Moreover, the constituent material of the photo-alignment film used in this embodiment may contain an additive within a range that does not hinder the optical alignment property of the photo-alignment film. Examples of the additive include a polymerization initiator and a polymerization inhibitor.

  The method for forming the alignment layer when the photo-alignment film is used is not particularly limited as long as the photo-alignment film can be formed in a pattern on the white subpixel on the transparent substrate. Specifically, a forming method using a pattern coating method, an ink jet method, a printing method, and the like can be given.

An example of a method for forming an alignment layer using a pattern coating method will be described below.
First, a coating liquid obtained by diluting the constituent material of the above-mentioned photo-alignment film with an organic solvent is applied to the white subpixel on the transparent substrate in a pattern and dried. In this case, the content of the photodimerization reactive compound or the photoisomerization reactive compound in the coating liquid is preferably in the range of 0.05% by weight to 10% by weight, More preferably, it is in the range of 2% by weight. If the content is smaller than the above range, it will be difficult to impart an appropriate anisotropy to the alignment film. Conversely, if the content is larger than the above range, the viscosity of the coating liquid will increase, so a uniform coating film will be formed. It is because it becomes difficult to form.
In addition, about the said organic solvent, since it can be set as the thing used for formation of a general photo-alignment film | membrane, description here is abbreviate | omitted.

  The application method is not particularly limited as long as the above-described coating liquid can be applied in a pattern to white subpixels on a transparent substrate, and specific examples include an inkjet method.

  The thickness of the film obtained by applying the above constituent materials is preferably in the range of 1 nm to 1000 nm, more preferably in the range of 3 nm to 100 nm. This is because if the thickness of the film is thinner than the above range, sufficient optical alignment may not be obtained, and conversely, if the thickness is thicker than the above range, it may be disadvantageous in cost.

  The obtained film can impart anisotropy by causing a photoexcitation reaction by irradiating light with polarization controlled. The wavelength range of the light to be irradiated may be appropriately selected according to the constituent material of the photo-alignment film to be used, but is preferably in the ultraviolet light range, that is, in the range of 100 nm to 400 nm, more preferably 250 nm. Within the range of ˜380 nm.

  The polarization direction is not particularly limited as long as it can cause the photoexcitation reaction. However, since the orientation state of the dichroic molecule can be made favorable, It is preferable that the angle is within the range of 0 ° to 45 °, and more preferably within the range of 20 ° to 45 °.

  Furthermore, when a polymerizable monomer is used as a constituent material of the photo-alignment film, among the above photoisomerization-reactive compounds, after photo-alignment treatment, it is polymerized by heating to form a photo-alignment film. The provided anisotropy can be stabilized.

(B) Dichroic molecular layer The dichroic molecular layer in this invention is demonstrated.
The thickness of the dichroic molecular layer used in the present invention is not particularly limited as long as linear polarization can be exhibited, and is appropriately selected depending on the type of dichroic molecule described later. Usually, it is in the range of 0.5 μm to 2 μm, but is not limited thereto.

  Next, the dichroic molecule contained in the dichroic molecular layer will be described. The dichroic molecules used in the present invention are arranged regularly by the alignment layer described above, thereby exhibiting linear polarization. The dichroic molecules contained in the dichroic molecular layer in the present invention are particularly those that can impart desired linear polarization to the dichroic molecular layer in the present invention by arranging them regularly. It is not limited. The dichroic molecule used in the present invention is preferably a rod-like compound, and particularly preferably a liquid crystalline material exhibiting liquid crystallinity. This is because by using the liquid crystalline material, linear polarization can be easily imparted to the dichroic molecular layer of the present invention.

  As said liquid crystalline material used for this invention, the material which shows liquid crystal phases, such as a nematic phase and a smectic phase, can be mentioned, for example. In the present invention, any material exhibiting any of these liquid crystal phases can be suitably used, but it is particularly preferable to use a liquid crystalline material exhibiting a nematic phase. This is because a liquid crystalline material exhibiting a nematic phase is easily arranged regularly as compared with liquid crystalline materials exhibiting other liquid crystal phases.

  In the present invention, it is preferable to use a material having spacers at both ends of the mesogen as the liquid crystalline material exhibiting the nematic phase. This is because a liquid crystalline material having spacers at both mesogen ends is excellent in flexibility, and by using such a liquid crystalline material, the linearly polarizing layer can be made excellent in transparency.

  Furthermore, as the dichroic molecule used in the present invention, those having a polymerizable functional group in the molecule are preferably used, and among them, those having a polymerizable functional group capable of three-dimensional crosslinking are more preferably used. Since the dichroic molecule has a polymerizable functional group, it is possible to polymerize and fix the dichroic molecule, so that the dichroic molecule is excellent in alignment stability and hardly changes with time in linear polarization. This is because a sex molecule layer can be obtained. When a dichroic molecule having a polymerizable functional group is used, the dichroic molecule layer in the present invention contains a dichroic molecule cross-linked by the polymerizable functional group.

  The “three-dimensional cross-linking” means that liquid crystal molecules are polymerized three-dimensionally to form a network (network) structure.

  Examples of the polymerizable functional group include polymerizable functional groups that are polymerized by the action of ionizing radiation such as ultraviolet rays and electron beams, or heat. Representative examples of these polymerizable functional groups include radically polymerizable functional groups or cationic polymerizable functional groups. Further, representative examples of radically polymerizable functional groups include functional groups having at least one addition-polymerizable ethylenically unsaturated double bond, and specific examples include vinyl groups having or not having substituents, An acrylate group (generic name including an acryloyl group, a methacryloyl group, an acryloyloxy group, and a methacryloyloxy group) and the like can be given. Moreover, an epoxy group etc. are mentioned as a specific example of the said cation polymerizable functional group. In addition, examples of the polymerizable functional group include an isocyanate group and an unsaturated triple bond. Among these, from the viewpoint of the process, a functional group having an ethylenically unsaturated double bond is preferably used.

Furthermore, the dichroic molecule in the present invention is a liquid crystalline material exhibiting liquid crystallinity and particularly preferably has a polymerizable functional group at the terminal. By using such a liquid crystalline material, for example, they can be polymerized three-dimensionally to form a network structure, so that they have alignment stability and excellent optical properties. This is because the dichroic molecular layer can be formed.
In the present invention, even when a liquid crystalline material having a polymerizable functional group at one end is used, the alignment can be stabilized by crosslinking with other molecules.

  Specific examples of the dichroic molecule used in the present invention include compounds represented by the following formulas (1) to (17).

  In the present invention, only one type of dichroic molecule may be used, or a mixture of two or more types may be used. For example, as the dichroic molecule, a mixture of a liquid crystalline material having one or more polymerizable functional groups at both ends and a liquid crystalline material having one or more polymerizable functional groups at one end, The polymerization density (crosslinking density) and optical characteristics can be arbitrarily adjusted by adjusting the blending ratio of these. Further, from the viewpoint of ensuring reliability, a liquid crystalline material having one or more polymerizable functional groups at both ends is preferable, but from the viewpoint of liquid crystal alignment, it is preferable that there is one polymerizable functional group at both ends. .

The method for forming the dichroic molecular layer is not particularly limited as long as the dichroic molecular layer can be arranged in a pattern on the alignment layer described above.
As a method for forming such a dichroic molecular layer, for example, a method using a photolithography method, that is, a coating liquid containing a dichroic molecule is applied to the entire light shielding part side of a transparent substrate, and then a photomask The method of forming by exposing and developing using etc. can be mentioned. Moreover, the method of apply | coating and forming the coating liquid containing a dichroic molecule in a pattern form using the inkjet method etc. can be mentioned. In addition, the said coating liquid may add the solvent as needed. Since the solvent can be a general one, the description here is omitted.

(C) Linearly polarizing layer As the linearly polarizing layer used in the present invention, a polymer film containing, for example, a polyvinyl alcohol resin containing iodine, in addition to the above-described laminate of the alignment layer and the dichroic molecular layer. You may use what was extended | stretched and patterned.

(2) Other Configurations The white subpixel in the present invention may have a configuration other than the linear polarization layer described above. An example of such a configuration is a transparent resin layer. Moreover, when it has a transparent resin layer, the said transparent resin layer is formed between a transparent base material and a linearly polarizing layer, and is formed by the thickness equivalent to the colored layer which the coloring subpixel mentioned later has. In the case of having the transparent resin layer, since the alignment layer surface in the linearly polarizing layer described above can be formed at a position higher than the colored layer surface, it is possible to apply the rubbing treatment to the colored layer when forming the alignment layer. Damage can be reduced. Further, since the height of the colored layer formed on the colored subpixel of the color filter and the linearly polarizing layer can be made uniform, the parallax between the colored subpixel and the white subpixel when used in an organic EL display device Can be made difficult to occur.
Since the resin material used for the transparent resin layer, the formation method, and the like can be the same as those used for a general color filter, description thereof is omitted here.

2. Next, the retardation control layer in the present invention will be described.
The retardation control layer in the present invention is formed on at least the white subpixel on the transparent substrate, and is converted into circularly polarized light by transmitting the linearly polarized light converted by the linearly polarizing layer.

  Such a phase difference control layer is only required to be formed on at least a white subpixel on a transparent substrate, and the phase difference control layer 5 is a white subpixel 10W on the transparent substrate 1 as illustrated in FIG. In addition to the white subpixel 10W such as the colored subpixel 10C, the phase difference control layer 5 may be formed on the transparent substrate 1 as illustrated in FIG. It may be formed in a pattern of 10W.

Such a retardation control layer is not particularly limited as long as it can convert linearly polarized light into circularly polarized light, but the in-plane retardation value is λ / 4 minutes or λ / 2 × n (n Is a natural number) + λ / 4 min. Among them, the in-plane retardation value is more preferably λ / 4 min. As will be described later, since the in-plane retardation value of the retardation control layer depends on the thickness, by setting the in-plane retardation value to λ / 4 minutes, the thickness of the retardation control layer can be increased. Can be formed thinly.
More specifically, the in-plane retardation value of the retardation control layer is preferably in the range of 100 nm to 160 nm, more preferably in the range of 110 nm to 150 nm, and in the range of 120 nm to 140 nm. More preferably it is.

Here, the in-plane retardation value is an index indicating the degree of birefringence in the in-plane direction of the refractive index anisotropic body, and the refractive index in the slow axis direction having the largest refractive index in the in-plane direction is represented by Nx. When the refractive index in the fast axis direction orthogonal to the slow axis direction is Ny and the thickness in the direction perpendicular to the in-plane direction of the refractive index anisotropic body is d,
Re [nm] = (Nx−Ny) × d [nm]
It is a value represented by. The in-plane retardation value (Re value) can be measured by, for example, KOBRA-WR manufactured by Oji Scientific Instruments Co., Ltd. by the parallel Nicol rotation method, and the in-plane retardation value of a minute region can be measured by AXOMETRICS (USA). It is also possible to measure using the Mueller matrix with AxoScan made by. In the present specification, unless otherwise stated, the Re value means a value at a wavelength of 589 nm.

  The configuration of such a phase difference control layer is not particularly limited as long as linearly polarized light can be converted into circularly polarized light, and can be divided into two modes depending on the form of the phase difference control layer. Specifically, an embodiment (third embodiment) that is a retardation control resin layer composed of a resin layer containing a retardation compound that exhibits retardation, and an embodiment (fourth embodiment) that is a retardation control film Can be divided into Hereinafter, each aspect will be described.

(1) 3rd aspect The phase difference control layer of this aspect is a phase difference control resin layer comprised from the resin layer containing the phase difference compound which shows phase difference.

The retardation compound is not particularly limited as long as the desired retardation can be imparted to the retardation control resin. In the present invention, a liquid crystalline material exhibiting a cholesteric phase is particularly preferable. As the liquid crystalline material exhibiting a cholesteric phase, those used for general optical films and the like can be used, for example, those listed in International Publication No. 2011-078055 and the like.
Moreover, the dichroic molecule mentioned above can be used as a phase difference compound.

  The content of the retardation compound in the retardation control resin layer is not particularly limited as long as it exhibits a desired retardation, and is appropriately selected depending on the type of the retardation compound and the thickness of the retardation control layer. Is.

  Moreover, as resin used for a phase difference control resin layer, photosensitive resin etc. can be used suitably, for example. The photosensitive resin can be suitably used particularly when the retardation control resin layer is formed by patterning. The photosensitive resin is the same as that used for a general photoresist.

  The thickness of the retardation control resin layer is not particularly limited as long as the desired retardation can be exhibited. However, the thickness is preferably such that the in-plane retardation value is λ / 4 minutes. The thickness of such a retardation control resin layer is appropriately selected depending on the type of the retardation compound, etc., but when the above-described retardation compound is used, within the range of 0.01 μm to 10 μm, In particular, it is preferably in the range of 0.1 μm to 7 μm, particularly preferably in the range of 0.5 μm to 5 μm. The thickness of the retardation control resin layer means the distance from the surface of the linear polarization layer to the surface of the retardation control resin layer when the retardation control resin layer is formed on the linear polarization layer. And the distance indicated by p1 in FIG. On the other hand, when the retardation control resin layer is formed on the transparent substrate, it refers to the distance from the transparent substrate surface to the retardation control resin layer surface, which is the distance indicated by p2 in FIG.

The method for forming the retardation control resin layer is not particularly limited as long as it can form a retardation control layer having a desired thickness on at least the white subpixel on the transparent substrate.
When forming the phase difference control resin layer in a pattern on the white subpixel on the transparent substrate, for example, the phase difference control resin layer can be formed by the following formation method.
First, a coating solution containing a retardation compound and a photosensitive resin is prepared. Next, the said coating liquid is apply | coated to the whole surface on the light-shielding part side surface of a transparent base material, and the layer for phase difference control resin layer formation is formed. Next, the phase difference control resin layer forming layer is irradiated with exposure light using a photomask, subjected to pattern exposure processing, then subjected to development processing, and further subjected to heat treatment as necessary to obtain a transparent substrate. A phase difference control resin layer is formed in a pattern on white subpixels on the material.

In the above formation method, a solvent or the like may be added to the coating solution as necessary. Since such a solvent can be the same as that used when forming a general resin member, description thereof is omitted here.
Moreover, since it can be the same as that of the application | coating method used for the formation method of the orientation layer of the 1st aspect mentioned above as a coating method of the said coating liquid, description here is abbreviate | omitted.
Further, the pattern exposure process, the development process, and the like can be the same as those used in a general photolithography method, and thus description thereof is omitted here.

(2) Fourth Aspect The retardation control layer of this aspect is composed of a retardation control film. Such a retardation control film is not particularly limited as long as it exhibits a desired retardation, but is preferably a λ / 4 plate having an in-plane retardation value of λ / 4.

As the λ / 4 plate, a general plate can be used, and examples thereof include a plate made of polycarbonate resin and a plate made of cycloolefin polymer. Further, as the λ / 4 plate composed of polycarbonate resin, for example, those composed of polycarbonate resin disclosed in JP 2012-67300 A can be suitably used.
Further, the λ / 4 plate may be a single-layer film composed of the above-described resin, or a film in which a layer composed of the above-described resin layer is disposed between a pair of protective sheets. May be. Since the protective sheet can be the same as that used for a general λ / 4 plate, description thereof is omitted here.

  When the phase difference control layer is a phase difference control film, the phase difference control film is disposed on the transparent substrate via the adhesive layer. The adhesive or pressure-sensitive adhesive used for the adhesive layer is not particularly limited as long as it has transparency, and can be a general one.

  Moreover, when using a retardation control film as a retardation control layer, it is preferable that a retardation control film is arrange | positioned in the whole surface on a transparent base material. This is because the phase difference control layer can be easily arranged.

3. Colored subpixel The colored subpixel in the present invention is provided in the opening of the light shielding portion. The colored sub-pixel has a colored layer formed in a pattern on the transparent substrate.
In addition, the colored subpixel constitutes a pixel portion of a color filter together with the white subpixel described above.

  The colored subpixel usually has three colored subpixels, a red subpixel having a red colored layer, a green subpixel having a green colored layer, and a blue subpixel having a blue colored layer. It is not limited to this.

  The material, thickness, formation method, and the like of the colored layer used for the colored subpixel can be the same as those of the colored layer used for a general color filter, and thus description thereof is omitted here.

In the present invention, when the light transmittance of the colored layer included in the colored subpixel is relatively high, the colored subpixel may be formed by laminating the linearly polarizing layer and the phase difference control layer. Thereby, when the color filter of this invention is used for an organic electroluminescence display, it becomes possible to suppress external light reflection in the part corresponding to the coloring subpixel of an organic electroluminescence display.
When forming a polarizing layer etc. on the said coloring, forming in a green subpixel is preferable.

4). Light-shielding part The light-shielding part in this invention is formed in pattern shape on a transparent base material.
Further, the light shielding part defines each colored subpixel and white subpixel.

  The pattern arrangement of the openings of the light-shielding part is not particularly limited as long as the above-described colored subpixels and white pixel subpixels can be arranged, and is the same as the pattern arrangement of the pixel part of a general color filter. It can be. Specific examples of the pattern arrangement of the pixel portion include a stripe arrangement, a mosaic arrangement, a dot arrangement, and a pen tile arrangement.

Examples of the light shielding part include those composed of a metal material such as chromium, those obtained by dispersing a light shielding material in a resin layer, and those obtained by laminating a plurality of layers made of the same material as the colored layer. Can do.
About the material used for these light-shielding parts, thickness, its formation method, etc., since a well-known thing can be used, description here is abbreviate | omitted.

  In the present invention, the light shielding portion may also serve as a partition wall used in the ink jet method or the like (inkjet light shielding portion). This is because it becomes easy to apply an alignment layer composed of a photo-alignment film in a pattern. When the light-shielding part is an inkjet light-shielding part, the thickness of the ink-jet light-shielding part can be appropriately selected according to the use of the color filter and the like, and is not particularly limited, but is preferably 2 μm or more, for example.

5. Transparent base material The transparent base material in this invention supports the light-shielding part mentioned above, the colored layer formed in a colored subpixel, the linearly polarizing layer formed in a white subpixel, a phase difference control layer, etc.

  The transparency of the transparent substrate is not particularly limited as long as the color filter of the present invention is used in an organic EL display device so long as light can be transmitted through the organic EL layer. However, the transmittance in the visible light region is preferably 80% or more, and more preferably 90% or more. Here, the transmittance | permeability of a transparent base material can be measured by JISK7361-1 (the test method of the total light transmittance of a plastic-transparent material).

  Examples of the transparent substrate include inflexible rigid materials such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plates, or flexible materials such as resin films and optical resin plates. Can be used. Moreover, you may use what formed the barrier layer in the resin film.

  About the thickness of a transparent base material, it can determine suitably according to the use etc. of the color filter of this invention, and the material which comprises a transparent base material.

6). Other Configurations The color filter of the present invention is not particularly limited as long as it has the above-described transparent substrate, light shielding part, colored layer, linear polarizing layer, and phase difference control layer, and a necessary configuration is appropriately selected. Can be added. Examples of such a configuration include a protective layer formed so as to cover the light shielding part, the colored layer, the linearly polarizing layer, and the retardation control layer formed in a pattern as necessary. Since the protective layer can be the same as that used for a general color filter, description thereof is omitted here.
Moreover, when using the color filter of this invention for a bottom emission type organic electroluminescence display, it can have TFT formed on the transparent base material.
Since the TFT can be the same as that used in a general organic EL display device, description thereof is omitted here.

III. Color Filter The color filter of the present invention can be used for an organic EL display device. In particular, it can be suitably used for an organic EL display device used in a portable device intended for outdoor use.

  Moreover, it does not specifically limit about the manufacturing method of the color filter of this invention, For example, the manufacturing method described in the term of the "C. manufacturing method of a color filter" mentioned later can be used suitably.

B. Organic EL Display Device Next, the organic EL display device of the present invention will be described.
The organic EL display device of the present invention is provided in a transparent base material, a light shielding part formed in a pattern on the transparent base material, an opening of the light shielding part, and formed in a pattern on the transparent base material A colored sub-pixel having a colored layer, a white sub-pixel having a linearly polarizing layer provided in a pattern on the transparent base material provided in the opening of the light-shielding portion, and at least a white sub-pixel on the transparent base material A color filter formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent base material, and a counter base material. And an organic EL element that is formed on either the color filter or the counter substrate and disposed between the color filter and the counter substrate. is there.

Here, the organic EL display device of the present invention will be described with reference to the drawings.
FIG. 4 is a schematic cross-sectional view showing an example of the organic EL display device of the present invention. FIG. 4 shows an example in which the organic EL display device of the present invention is a top emission type organic EL display device. As illustrated in FIG. 4, the organic EL display device 100 of the present invention is formed on one surface of the color filter 10, the counter substrate 20, and the counter substrate 20, and the color filter 10 and the counter group. And an organic EL element 30 disposed between the materials 20. In addition, the organic EL element 30 is usually formed with a first electrode layer 31a formed on the counter substrate 20, an organic EL layer 32 formed on the first electrode layer 31a and including at least a light emitting layer, and an organic EL layer. And a second electrode layer 31b formed on the substrate 32. In this case, a transparent electrode is used for the second electrode layer 31b. In the present invention, the sealing material 40 is usually disposed between the color filter 10 and the counter substrate 20 and on the outer periphery of the color filter 10 and the counter substrate 20. The color filter 10 can be the same as the content described in FIG. 1, and thus the description thereof is omitted here.

  FIG. 5 is a schematic cross-sectional view showing another example of the organic EL display device of the present invention. As illustrated in FIG. 5, when the organic EL display device 100 of the present invention is a top emission type organic EL display device, the side opposite to the light shielding portion 2 and the like side of the color filter 10, the organic EL element 30, and May be arranged so as to face each other.

FIG. 6 is a schematic sectional view showing another example of the organic EL display device of the present invention. FIG. 6 shows an example in which the organic EL display device of the present invention is a bottom emission type organic EL display device. In this case, the organic EL display device 100 of the present invention is formed on the color filter 10, the counter substrate 20, and the phase difference control layer 5 of the color filter 10, and is disposed between the color filter 10 and the counter substrate 20. The organic EL element 30 is provided. The organic EL element 30 includes a first electrode layer 31a formed on the color filter 10, an organic EL layer 32 formed on the first electrode layer 31a, and a second electrode layer formed on the organic EL layer 32. The transparent electrode is used as the first electrode layer 31a.
Note that the reference numerals not described in FIG. 6 can be the same as the reference numerals described in FIG.

  According to the present invention, by having the color filter, it is possible to prevent external light reflection in the white subpixel of the organic EL display device, and to obtain an organic EL display device capable of performing good display. Can do. In addition, the organic EL display device of the present invention does not need to be provided with a circularly polarizing plate for preventing reflection of external light, can improve the luminance of the entire organic EL display device, and is cost effective. In addition, the organic EL display device can be advantageous.

  Hereinafter, each configuration of the organic EL display device of the present invention will be described.

1. Color Filter The color filter in the present invention will be described.
In the color filter of the present invention, when the organic EL display device of the present invention is a bottom emission type organic EL display device, an organic EL element to be described later is formed on the surface on the light shielding portion side or the like.
On the other hand, when the organic EL display device of the present invention is a top emission type organic EL display device, the organic EL element formed on the surface of the counter substrate and the light shielding portion side of the color filter face each other. You may arrange | position so that the opposite side to the light-shielding part side of the said organic EL element and a color filter may oppose.
Especially, in this invention, it is preferable to arrange | position so that the said organic EL element and the light-shielding part side of a color filter may oppose. This is because each component of the color filter can be protected by forming the transparent substrate of the color filter outside the organic EL display device.

  The details of the color filter in the present invention have been described in the above-mentioned section “A. Color filter”, and thus description thereof is omitted here.

2. Next, the counter substrate in the present invention will be described.
When the organic EL display device of the present invention is a top emission type organic EL display device, an organic EL element to be described later is formed on the counter substrate in the present invention.

  Since the organic EL display device of the present invention uses the color filter side as the light emitting surface, the opposing substrate may be transparent or may not be transparent.

  Examples of the opposing substrate include inflexible rigid materials such as quartz glass, Pyrex (registered trademark) glass, and synthetic quartz plates, or flexible materials such as resin films and optical resin plates. Can be used. Moreover, you may use what formed the barrier layer in the resin film.

When the organic EL display device of the present invention is a bottom emission type organic EL display device, a TFT may be formed on the counter substrate.
As TFT, what is generally used for an organic EL element can be used.

3. Organic EL element The organic EL element used in the present invention is formed on a color filter or on a counter substrate, on a first transparent electrode layer and a first transparent electrode layer, and at least a light emitting layer is formed. The organic EL layer can be included, and the second electrode layer formed on the organic EL layer can be included. Hereinafter, each configuration of the organic EL element will be described.

(A) Organic EL layer The organic EL layer has one or more organic layers including at least a light emitting layer. Examples of the layer constituting the organic EL layer include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer in addition to the light emitting layer.
The light emitting layer may emit light of a single color or a plurality of colors. The light-emitting layer may be, for example, a white light-emitting layer that emits white light or a blue light-emitting layer that emits blue light, and a light-emitting layer having a red light-emitting layer, a green light-emitting layer, and a blue light-emitting layer that emits three primary colors, respectively. It may be.
The organic EL layer can be the same as a general organic EL layer used in an organic EL element, and thus description thereof is omitted here.

(B) 1st electrode layer and 2nd electrode layer As a 1st electrode layer and a 2nd electrode layer, what is generally used for an organic EL element can be used. In the present invention, a transparent electrode is used for the first electrode layer and the second electrode layer formed on the color filter side, and a reflective electrode is used for the one formed on the counter substrate side. Is used.
Moreover, the 1st electrode layer may be uniformly formed on the color filter or the opposing base material, and may be formed in pattern shape, According to the use and drive method of the organic EL apparatus of this invention. It is selected appropriately.

4). Other Configurations The organic EL display device of the present invention is not particularly limited as long as it has the above-described color filter, counter substrate, and organic EL element.

In the present invention, a sealing material is usually disposed between the color filter and the counter substrate and on the outer periphery of the color filter and the counter substrate. The sealing material is provided for adhering the color filter and the counter substrate and sealing the organic EL element.
As a material used for the sealing material, any material can be used as long as it can adhere the color filter and the opposing base material and can prevent the organic EL element from coming into contact with moisture in the atmosphere. What is used for can be used.

Moreover, in this invention, the insulating layer may be formed in the opening part of the 1st electrode layer formed in the pattern form on the color filter or the opposing base material. The insulating layer is provided to prevent direct contact between the first electrode layer and the second electrode layer.
As an insulating layer, what is generally used for an organic EL element can be used.

  In the present invention, other than the above-described sealing material and insulating layer, necessary configurations can be appropriately selected and added.

  The space between the color filter and the counter substrate of the organic EL display device of the present invention may be filled with an inert gas. The inert gas is not particularly limited as long as it is a general one used for organic EL elements, and examples thereof include nitrogen gas, helium gas, and argon gas. Further, the space between the color filter and the counter substrate may be evacuated.

5. Organic EL Display Device The organic EL display device of the present invention is particularly preferably used for portable devices.
As a method for driving the organic EL display device of the present invention, either a passive matrix or an active matrix can be applied.

  Since the manufacturing method of the organic EL display device of the present invention can be the same as the manufacturing method of a general organic EL display device, description thereof is omitted here.

C. Next, a method for producing a color filter of the present invention will be described.
The method for producing a color filter of the present invention includes a transparent substrate, a light-shielding portion formed in a pattern on the transparent substrate, an opening in the light-shielding portion, and formed in a pattern on the transparent substrate. A color filter substrate having a colored sub-pixel having a colored layer and a white sub-pixel provided in the opening of the light-shielding portion and having the colored layer not formed on a transparent substrate is prepared. After forming an alignment layer in a pattern on the white subpixel on the transparent base material of the substrate, a straight line is formed by forming a dichroic molecule layer containing a dichroic molecule on the surface of the alignment layer in a pattern. A linear polarizing layer forming step of forming a polarizing layer in a pattern, and a phase difference control layer forming step of forming a phase difference control layer on at least the white subpixel on the transparent base of the color filter substrate. That features Is a manufacturing method to be.

Here, the manufacturing method of the color filter of this invention is demonstrated using figures. FIG. 7 is a schematic cross-sectional view showing an example of a method for producing a color filter of the present invention.
In the method for manufacturing a color filter of the present invention, first, as illustrated in FIG. 7A, the transparent base material 1, the light shielding portion 2 formed in a pattern on the transparent base material 1, and the opening of the light shielding portion 2. A colored subpixel 10C having a colored layer 3 (a red colored layer 3R, a green colored layer 3G, and a blue colored layer 3B in FIG. 7) provided in a pattern and formed in a pattern on the transparent substrate 1; A color filter substrate 11 having a white subpixel 10 </ b> W provided in the opening of 2 and having no colored layer formed on the transparent substrate 1 is prepared. Next, as illustrated in FIGS. 7B and 7C, after the alignment layer 4 a is formed in a pattern on the white subpixel 10 W on the transparent base material 1 of the color filter substrate 11, the alignment layer 4 a The linearly polarizing layer 4 is formed in a pattern by forming the dichroic molecule layer 4b containing the dichroic molecule on the surface in a pattern (linearly polarizing layer forming step). Next, as illustrated in FIG. 7D, the phase difference control layer 5 is formed on at least the white subpixel 10W on the transparent base material 1 of the color filter substrate 11 (phase difference control layer forming step). By performing the above steps, the color filter 10 illustrated in FIG. 7D can be manufactured.
Although not shown, in the present invention, the phase difference control layer forming step may be performed before the linearly polarizing layer forming step.

  According to the present invention, the linear polarizing layer can be formed in a pattern on the white subpixel on the transparent substrate of the color filter by having the linear polarizing layer forming step and the phase difference control layer forming step described above. Since the white subpixel can be formed by laminating a linearly polarizing layer and a phase difference control layer on a transparent base material, it is possible to manufacture a color filter in which a circularly polarizing function is imparted to the white subpixel. .

  Hereinafter, each process in the manufacturing method of the color filter of this invention is demonstrated. In addition, the transparent base material, the light-shielding part, the colored layer used for the colored subpixels, etc. in the color filter substrate used in the present invention are the same as those described in the above-mentioned section “A. Color filter” The description here is omitted.

1. Linear Polarizing Layer Forming Step In the linear polarizing layer forming step of the present invention, the alignment layer is formed in a pattern on the white subpixel on the transparent substrate of the color filter substrate, and then two colors are formed on the surface of the alignment layer. This is a step of forming a linearly polarizing layer in a pattern by forming a dichroic molecular layer containing a functional molecule in a pattern.

  The process order of this process and the phase difference control layer forming process described later is determined by the stacking order of the linearly polarizing layer and the phase difference control layer on the transparent substrate in the white subpixel of the color filter. For example, when the color filter obtained by the production method of the present invention is formed by laminating a linearly polarizing layer and a retardation control layer in this order on a transparent substrate, this step is performed before the retardation control layer forming step. Done.

  The alignment layer formed in this step and the formation method of the alignment layer can be the same as those described in the above-mentioned section “A. Color filter”, and thus description thereof is omitted here.

  In addition, the dichroic molecular layer formed in this step and the method for forming the dichroic molecular layer can be the same as those described in the above section “A. Color filter”. Description of is omitted.

2. Phase difference control layer forming step The phase difference control layer forming step of the present invention is a step of forming a phase difference control layer on at least the white subpixel on the transparent substrate of the color filter substrate.

  The method for forming the retardation control layer used in this step and the retardation control layer to be formed can be the same as those described in the section “A. Color filter” described above. Is omitted.

3. Other Steps The production method of the color filter of the present invention is not particularly limited as long as it is a production method having the above-described linearly polarizing layer forming step and retardation control layer forming step, and other necessary configurations are appropriately selected. Can be added. Examples of such a process include a color filter substrate forming process for forming the color filter substrate described above, a protective layer forming process for forming a protective layer of the color filter, and the like.

4). Color Filter The color filter manufactured by the manufacturing method of the present invention can be the same as the contents described in the above-mentioned section “A. Color Filter”, and thus the description thereof is omitted here.

  This aspect is not limited to the above embodiment. The above-described embodiment is an exemplification, and this embodiment has substantially the same configuration as the technical idea described in the claims of this embodiment and exhibits any similar effect. Are included in the technical scope.

  Hereinafter, this embodiment will be specifically described with reference to Examples and Comparative Examples.

[Example 1]
(Adjustment of curable resin composition)
In a polymerization tank, 63 parts by mass of methyl methacrylate (MMA), 12 parts by mass of acrylic acid (AA), 6 parts by mass of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by mass of diethylene glycol dimethyl ether (DMDG) are charged. After stirring and dissolving, 7 parts by mass of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly. Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour. Further, 7 parts by mass of glycidyl methacrylate (GMA), 0.4 parts by mass of triethylamine, and 0.2 parts by mass of hydroquinone were added to the obtained solution, and the mixture was stirred at 100 ° C. for 5 hours. A solid content of 50%) was obtained.

  Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.

<Composition of curable resin composition>
-16 parts by mass of the above copolymer resin solution (solid content 50%)-Dipentaerythritol pentaacrylate (Sartomer SR399)
24 parts by mass / orthocresol novolac type epoxy resin (Epico Shell Epoxy Co., Ltd. Epicoat 180S70) 4 parts by mass / 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one
4 parts by mass, 52 parts by mass of diethylene glycol dimethyl ether

(Formation of light shielding part)
First, the following components were mixed and sufficiently dispersed with a sand mill to prepare a black pigment dispersion.
<Composition of black pigment dispersion>
・ Black pigment 23 parts by mass ・ Polymer dispersing agent (Bicchemy Japan Co., Ltd. Disperbyk 111) 2 parts by mass ・ Solvent (diethylene glycol dimethyl ether) 75 parts by mass

Next, the following components were sufficiently mixed to obtain a light shielding layer composition.
<Composition of composition for light shielding part>
-61 parts by mass of the black pigment dispersion-20 parts by mass of the curable resin composition-30 parts by mass of diethylene glycol dimethyl ether

The light shielding layer composition was coated on a 0.7 mm thick glass substrate (Asahi Glass Co., Ltd. AN material) with a spin coater and dried at 100 ° C. for 3 minutes to form a light shielding layer having a thickness of about 1 μm. The light-shielding layer is exposed to a light-shielding pattern (repetition of RGB having a 75 μm pitch stripe shape) with an ultra-high pressure mercury lamp, and then developed with a 0.05 wt% potassium hydroxide aqueous solution. Thereafter, the substrate is placed in an atmosphere at 170 ° C. The light-shielding part was formed in the area | region which should heat-process by leaving it to stand for 30 minutes and should form a light-shielding part.
After forming the light-shielding part, an alignment film (Nissan Chemical Co., Ltd., SE-130) was applied to a thickness of 0.5 μm and left in an atmosphere of 150 ° C. for 30 minutes. A photoresist (OFPR-800, manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied on the alignment film forming substrate to a thickness of about 1 μm, exposed using a mask, developed, etched, and the resist was peeled off, and the alignment film was patterned at a predetermined position. The patterned substrate was left in an atmosphere at 230 ° C. for 30 minutes.

(Formation of colored layer)
After forming the alignment film, a red curable resin composition having the following composition was applied to the substrate by spin coating (application thickness: 3.0 μm), and then dried in an oven at 70 ° C. for 3 minutes. Next, a photomask is disposed at a distance of 100 μm from the coating film of the red curable resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer forming region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 10 seconds. Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a red curable resin composition was removed. Thereafter, the substrate was left in an atmosphere of 170 ° C. for 30 minutes to perform heat treatment to form a red relief pattern (red colored layer) in a region where a red subpixel was to be formed.
Next, using the green curable resin composition having the following composition, a green relief pattern (green colored layer) was formed in a region where a green subpixel was to be formed, in the same process as the red relief pattern formation.
Further, using a blue curable resin composition having the following composition, a blue relief pattern (blue colored layer) was formed in a region where a blue subpixel was to be formed, in the same process as the red relief pattern formation.

<Composition of red curable resin composition>
・ C. I. Pigment Red 254 7 parts by mass, polysulfonic acid type polymer dispersant 3 parts by mass, the curable resin composition 23 parts by mass, and 3-methoxybutyl acetate 67 parts by mass

<Composition of green curable resin composition>
・ C. I. Pigment Green 58 7 parts by mass / C.I. I. Pigment Yellow 138 1 part by mass, polysulfonic acid type polymer dispersant 3 parts by mass, the curable resin composition 22 parts by mass, and 3-methoxybutyl acetate 67 parts by mass

<Composition of blue curable resin composition>
・ C. I. Pigment Blue 1 5 parts by mass, polysulfonic acid type polymer dispersant 3 parts by mass, the curable resin composition 25 parts by mass, and 3-methoxybutyl acetate 67 parts by mass

(Formation of alignment layer)
After coloring, the formed substrate was rubbed to obtain an alignment layer.

(Spacer formation)
After forming the alignment layer, the curable resin composition was applied onto the substrate by a spin coating method and dried to form a coating film. A photomask was placed at a distance of 100 μm from the coating film of the curable resin composition, and only a spacer formation region was irradiated with ultraviolet rays for 10 seconds using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali image development was carried out, and only the uncured part of the coating film of curable resin composition was removed. Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 30 minutes to perform heat treatment to form a predetermined number density.

(Formation of dichroic molecular layer)
The following composition A was applied, exposed and developed using a photomask, and baked for 30 minutes using an oven at 170 ° C. to form a 1.0 μm-thick dichroic molecular layer on the alignment layer. A polarizing layer was obtained. In addition, compound (a)-(d) is a compound shown by a following formula.

<Composition of Composition A>
Compound (a) 3.27 parts by mass Compound (b) 1.87 parts by mass Compound (c) 2.10 parts by mass Compound (d) 2.10 parts by mass Dodecanol 0.10 parts by mass BHT 0 .01 parts by mass, Irgacure 907 0.45 parts by mass, the above copolymer resin solution (solid content 50%) 20.00 parts by mass, 3-mercaptopropylmethyldimethoxysilane (KBM-802 manufactured by Shin-Etsu Chemical Co., Ltd.)
0.10 parts by mass / propylene glycol monomethyl ether acetate 80.00 parts by mass

(Formation of retardation control layer)
After forming the linearly polarizing layer, the composition A is applied to the substrate, the entire surface of the substrate is exposed, and the film is baked using an oven at 170 ° C. for 30 minutes to a thickness of 2.0 μm so as to correspond to λ / 4 minutes. Adjustment was performed to form a retardation control layer, and a color filter substrate was obtained. The phase difference was measured using a phase difference measuring apparatus (Axoscan ^™ Mueller Matrix Polarimeter manufactured by AXOMETRICS). In-plane refractive index Nx in the fast axis direction (direction with the smallest refractive index), refractive index Ny in the slow axis direction (direction with the largest refractive index), refractive index Nz in the thickness direction, and layer thickness d From (nm), it is obtained from the equation Rth = {(Nx + Ny) / 2−Nz} × d. The value of the phase difference is a value at 589 nm.

(Create display device)
After the color filter substrate was dehydrated, a sealing material was applied onto the white organic EL substrate, and the color filter substrate and the film surface were bonded together to obtain a display device.

[Example 2]
A display device was produced in the same manner as in Example 1 except that the phase difference control layer was formed only on the linearly polarizing layer using a photomask.

[Example 3]
In the color filter substrate, the phase difference control layer is formed after the light shielding layer is formed, the spacer is not formed, the protective layer is formed as follows, the spacer is formed on the white organic EL substrate, and the back surface of the color filter substrate is white. A display device was produced in the same manner as in Example 1 except that the film surfaces of the organic EL substrate were bonded together.

(Formation of protective film)
The curable resin composition was applied by a spin coating method on a substrate on which a phase difference control layer was formed, and dried to form a coating film having a dry coating film thickness of 2 μm.
A photomask is placed at a distance of 100 μm from the coating film of the curable resin composition, and a proximity aligner is used to irradiate only a region corresponding to a protective layer formation region with ultraviolet rays for 10 seconds using a 2.0 kW ultrahigh pressure mercury lamp. did. Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali image development was carried out, and only the uncured part of the coating film of curable resin composition was removed. Thereafter, the substrate was left to stand in an atmosphere at 170 ° C. for 30 minutes to perform heat treatment to form a protective film.

[Example 4]
A display device was obtained in the same manner as in Example 1 except that the retardation control layer was formed using a retardation film (S-148, manufactured by Teijin Chemicals Ltd.).

[Comparative Example 1]
A display device was produced in the same manner as in Example 1 except that the linearly polarizing layer and the retardation control layer were not formed and the white curable resin composition was used to form the white pixel portion.
[Comparative Example 2]
A display device was produced in the same manner as in Comparative Example 1 except that a circularly polarizing plate (manufactured by Sanlitz) was installed on the back surface of the color filter.

(Luminance evaluation)
The voltage value of the manufactured display device was fixed, and the luminance was measured using a luminance meter (SR-UL1 manufactured by TOPCON). In contrast to Comparative Example 1, “X” was given when the luminance was reduced by 50% or more, and “◯” was given when the luminance reduction rate was less than 50%. Comparative Example 1 was marked with ◎.

(Reflection visibility evaluation)
The visibility was evaluated using a D65 light source in a state where the power of the manufactured display device was turned off. The case where the visibility was lowered by the reflected light was evaluated as x.

DESCRIPTION OF SYMBOLS 1 ... Transparent base material 2 ... Light-shielding part 3 ... Colored layer 4 ... Linearly polarized light layer 4a ... Orientation layer 4b ... Dichroic molecular layer 5 ... Phase difference control layer 10 ... Color filter 10C ... Colored subpixel 10W ... White subpixel 11 ... Color filter substrate 20 ... Opposite base material 30 ... Organic EL element

Claims (5)

A transparent substrate;
A light-shielding portion formed in a pattern on the transparent substrate;
A colored sub-pixel provided in an opening of the light-shielding portion and having a colored layer formed in a pattern on the transparent substrate;
A white sub-pixel having a linearly polarizing layer provided in an opening of the light-shielding part and formed in a pattern on the transparent substrate;
A phase difference control layer formed on at least a white subpixel on the transparent substrate;
The white subpixel is formed by laminating the linearly polarizing layer and the retardation control layer on the transparent substrate ,
The color filter, wherein the colored subpixel is formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent substrate .   2. The color filter according to claim 1, wherein the linearly polarizing layer is a laminate of an alignment layer and a dichroic molecular layer formed on the surface of the alignment layer and containing a dichroic molecule.   The color filter according to claim 1 or 2, wherein the colored subpixel formed by laminating the linearly polarizing layer and the phase difference control layer is a green subpixel. A transparent substrate, a light shielding portion formed in a pattern on the transparent substrate, a colored subpixel provided in an opening of the light shielding portion and having a colored layer formed in a pattern on the transparent substrate, A white subpixel having a linearly polarizing layer formed in a pattern on the transparent substrate, and a phase difference control layer formed on at least the white subpixel on the transparent substrate; The white subpixel is formed by laminating the linearly polarizing layer and the phase difference control layer on the transparent base material, and the colored subpixel also includes the linearly polarizing layer on the transparent base material. And a color filter formed by laminating the retardation control layer ,
An opposing substrate;
An organic electroluminescence element formed on either the color filter or the counter substrate, and disposed between the color filter and the counter substrate;
An organic electroluminescence display device comprising: A transparent substrate, a light shielding portion formed in a pattern on the transparent substrate, a colored subpixel provided in an opening of the light shielding portion and having a colored layer formed in a pattern on the transparent substrate, and Prepare a color filter substrate having a white sub-pixel provided in the opening of the light-shielding portion, the colored layer is not formed on a transparent substrate,
After forming an alignment layer in a pattern on the white subpixel on the transparent substrate of the color filter substrate, a dichroic molecule layer containing a dichroic molecule is formed in a pattern on the surface of the alignment layer. A linearly polarizing layer forming step of forming the linearly polarizing layer in a pattern by,
A phase difference control layer forming step of forming a phase difference control layer on at least the white subpixel on the transparent base of the color filter substrate;
I have a,
The linearly polarizing layer forming step forms the linearly polarizing layer in a pattern on the colored subpixels,
The method for producing a color filter, wherein the phase difference control layer forming step forms the phase difference control layer also on the colored subpixels on the transparent substrate .

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