JP5903359B2 - Method for producing water repellent film and method for producing nozzle plate - Google Patents

Description

The present invention relates to a method of manufacturing a manufacturing method and a nozzle plate of the water-repellent film, a technique of forming a water-repellent film using a particular silane coupling.

  In an ink jet head used in an ink jet recording apparatus, if ink adheres to the surface of a nozzle plate, ink droplets ejected from the nozzles are affected, and the ejection direction of the ink droplets may vary. If the ejection direction of the ink droplets varies, it becomes difficult to land the ink droplets on a predetermined position on the recording medium, which causes deterioration in image quality.

  For this reason, a water-repellent film is usually formed on the surface of the nozzle plate, preventing ink from adhering to the surface of the nozzle plate and improving the ejection performance.

  However, even if a water-repellent film is formed, ink stains on the nozzle plate surface are unavoidable. Therefore, it is common to remove ink stains by wiping the nozzle plate surface with a rubber blade or the like.

For this reason, a water repellent film having high adhesion and high water repellency is required on the surface of the nozzle plate. In order to solve such problems, the water repellent film of the nozzle plate is formed by forming a base adhesion film having a ≡Si—OH group such as SiO ₂ and further having a silane coupling bond thereon. In general, an agent is formed into a film.

  However, the film formation by the silane coupling agent has a problem that surplus substances remain as aggregates on the film surface, and the aggregates clog the nozzles by maintenance wiping. For this reason, it is necessary to remove the surplus in advance at the film formation stage.

  On the other hand, Patent Document 1 discloses a method of removing excess water-repellent material with an adhesive tape.

Patent Document 2 discloses a technique in which a hydrophilic film such as SiO ₂ is formed on a water repellent material, and then the hydrophilic film is removed.

JP 2005-262471 A JP 2008-273079 A

  However, the technique of Patent Document 1 requires a large number of treatments in order to remove excess water-repellent material, and there is a problem that it is not possible to remove the surplus sufficiently. This is because the water-repellent material originally has the property of not having compatibility with the water droplets on the surface, and particularly in the case of the water- and oil-repellent material containing fluorine, the oily liquid has the property of not having an affinity for the surface. Thus, it is considered that the water-repellent material that originally has a low affinity with other substances is difficult to adhere to the adhesive tape.

  In this method, it is considered that an adhesive tape and a water-repellent material that originally have low affinity are attached with a weak force such as an intermolecular force. Therefore, on the contrary, there is a problem that the adhesive adhered to the adhesive tape contaminates the water repellent film surface. Since the water repellency of the pressure-sensitive adhesive is low, the water repellency of the surface of the water-repellent film contaminated with the pressure-sensitive adhesive is lowered. In particular, when a water-repellent material containing fluorine is used, it becomes remarkable.

In the technique of Patent Document 2, the water repellent film is exposed on the surface by removing SiO ₂ formed on the water repellent film by polishing. However, when the water repellent film is very thin, there is a problem that even the water repellent film is removed by polishing.

The present invention has been made in view of such circumstances, no extra water repellent material, and to provide a manufacturing method of preparation and the nozzle plate of the water-repellent film for contamination of the surface .

  In order to achieve the above object, one aspect of a method for producing a water-repellent film includes a water-repellent film forming step of forming a water-repellent film by bonding a silane coupling material to a substrate, and the formed water-repellent film. A contact step of contacting the hydrophilic member to bond the excess silane coupling material not bonded to the base material to the hydrophilic member, and a separation step of separating the hydrophilic member from the water-repellent film were provided.

  According to this aspect, the hydrophilic member is brought into contact with the formed water-repellent film, the excess silane coupling material not bonded to the base material is bonded to the hydrophilic member, and the excess silane coupling material is bonded. Since the hydrophilic member is separated from the water repellent film, it is possible to generate a water repellent film having no extra water repellent material and having no surface contamination. In this embodiment, the water repellent film refers to a film having water repellency, for example, a film having a pure water contact angle of 60 ° or more. Moreover, this water-repellent film may be called an oil-repellent film or an antifouling film. In the present specification, the contact angle refers to an angle measured by the θ / 2 method.

  The silane coupling material preferably contains fluorine. According to this aspect, even when fluorine is contained, it is possible to produce a water-repellent film that has no extra water-repellent material and has no surface contamination.

  The contact angle with the pure water on the surface of the hydrophilic member is preferably 30 ° or less. Thereby, the excess silane coupling material which is not couple | bonded with the base material appropriately can be combined.

The hydrophilic member preferably comprising SiO _2. Thereby, the excess silane coupling material which is not couple | bonded with the base material appropriately can be combined.

  The hydrophilic member is preferably a flexible member that deforms following the surface shape of the water-repellent film. Thereby, it can contact | abut on the whole surface of a water-repellent film.

  It is preferable to include an activation step of activating the surface of the hydrophilic member by at least one of oxygen plasma treatment, atmospheric pressure plasma treatment, low-pressure mercury lamp irradiation treatment, and excimer lamp irradiation treatment. Thereby, organic substances on the surface are removed, and an excess silane coupling material that is not properly bonded to the substrate can be bonded.

  In the contacting step, it is preferable to bring the hydrophilic member into contact with the water repellent film by applying a predetermined pressure. Thereby, the gap between the water repellent film and the hydrophilic member can be eliminated, and the entire surface of the water repellent film can be brought into contact with the hydrophilic member.

  The predetermined pressure is preferably 5 kPa or more and 50 kPa or less. Accordingly, it is possible to appropriately prevent the hydrophilic member from floating and prevent the base material from being damaged.

  The contact step may include a step of heating and / or humidifying the atmosphere of the water repellent film while the hydrophilic member is in contact with the water repellent film. Thereby, the excess silane coupling material which is not couple | bonded with the base material appropriately can be combined.

In order to achieve the above object, one aspect of a method for manufacturing a nozzle plate includes a water-repellent film forming step of forming a water-repellent film by bonding a silane coupling material to a base material, and the formed water-repellent film is hydrophilic. A contact step for contacting the hydrophilic member to bond the excess silane coupling material not bonded to the base material to the hydrophilic member, a separation step for separating the hydrophilic member from the water repellent film, and a nozzle hole in the base material And a nozzle forming step . According to this aspect, it is possible to obtain a nozzle plate having a water-repellent film that has no extra water-repellent material and has no surface contamination.

  According to the present invention, it is possible to obtain a water-repellent film that does not have an extra water-repellent material and has no surface contamination.

Flow chart showing processing of film forming method of water repellent film Schematic diagram of the chemical structure of the molecules that make up the water-repellent film The figure which shows typically the water-repellent film formed in the film-forming board | substrate. Schematic diagram showing contact and separation of hydrophilic member against water repellent film The figure which shows the evaluation result of an Example The figure which shows the structure of the principal part of an inkjet recording device Diagram showing head structure example Plane perspective view showing another structural example of the head Sectional drawing which shows the three-dimensional structure of a droplet discharge element Diagram showing nozzle arrangement in matrix form

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

<Embodiment>
FIG. 1 is a flowchart showing a process of a water repellent film forming method (water repellent film manufacturing method) in the present embodiment.

(Step S1)
First, a film formation substrate (an example of a base material) is prepared. In this embodiment, a case where a water repellent film is formed on a nozzle plate of an ink jet head used in an ink jet recording apparatus will be described as an example.

  The nozzle plate may be provided with nozzle holes in advance, or may be provided with nozzle holes after forming a water-repellent film. In other words, the nozzle plate manufacturing method includes a nozzle forming step.

In this embodiment, since a silane coupling water repellent material is used, the nozzle plate is preferably a hydrophilic substrate having an OH group on the surface of the base material. For example, glass containing Si—OH on the surface can be used. In addition, when silicon, metal, or resin is used, it is preferable that the surface is treated in advance with SiO ₂ or the like.

(Step S2: Example of water-repellent film forming step)
Next, a silane coupling agent is formed on the film formation substrate. The silane coupling agent is a silicon compound represented by Y _n SiX _4-n (n = 1, 2, 3). The surface modified with a fluorine-based silane coupling agent with a fluorocarbon chain introduced into Y has low surface free energy like the PTFE (polytetrafluoroethylene) surface, water repellency, lubrication, mold release, etc. These properties are improved and oil repellency is also exhibited. Examples of such a linear fluoroalkylsilane include Y═CF ₃ CH ₂ CH ₂ , CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ , CF ₃ (CF ₂ ) ₇ CH ₂ CH _{2, and the} like. Can do.

For the Y portion, a material having a perfluoropolyether (PFPE) group (—CF ₂ —O—CF ₂ —) can be used. Thus, materials having an ether bond are known to have excellent dynamic water repellency.

Further, as the silane coupling agent, a material X ₃ SiYSiX _{3 in} which silane coupling groups are bonded to both sides as well as one side can be used.

  Also, Daikin Industries, Ltd. OPTOOL, Harves Co., Ltd. Durasurf, Sumitomo 3M Co., Ltd. Novec EGC1720, Solvay Solexis Co., Ltd. Fluorolink S-10, T & K Co., Ltd. Nanos, Shin-Etsu Commercially available silane coupling water repellent materials such as Seifel KY-100 and AGC Cytop M type manufactured by Chemical Industry Co., Ltd. can also be used.

  As a film forming method, in addition to a method of applying a solution such as a dip method, a spin coat method, a spray coat method, or a dispenser method, a vapor deposition method can also be used. In this embodiment, an evaporation method in which the amount can be controlled by time or temperature is more preferable in the sense that an excessive water-repellent material is formed in advance.

  FIG. 2 is a schematic view of the chemical structure of molecules constituting the water-repellent film according to this embodiment. Reference numeral 100 denotes a hydrophilic film-forming substrate, and reference numeral 102 denotes a silane coupling agent containing fluorine. As shown in the figure, the OH group of the silane coupling agent 102 is bonded to the film formation substrate 100 by a dehydration condensation reaction.

FIG. 3 is a diagram schematically showing a water-repellent film formed on the film-formation substrate. In the figure, a circle mark indicates the silane coupling agent bonding site side (OH side in FIG. 2), and a cross mark indicates hydrophobicity. The sex side (CF ₃ side in FIG. 2) is shown.

  FIG. 3A shows a state in which excess (unbonded) silane coupling material is buried in the silane coupling material bonded to the deposition substrate, and FIG. 3B shows the excess silane coupling material. It shows a state where the coupling material is attached to the surface of a silane coupling material (water repellent film) bonded to the deposition substrate in the form of a ball (μm order) with the hydrophobic side protruding outward.

  As described above, in this embodiment, the film is formed using an excessive water-repellent material, and as shown in FIGS. 3A and 3B, there is an extra water-repellent material on the surface of the film-forming substrate. .

(Step S3)
Next, a hydrophilic member is prepared.

As the hydrophilic member, in addition to a material containing Si—OH on the surface, such as Pyrex glass borosilicate glass or quartz glass, a member obtained by hydrophilic coating on the substrate itself may be used. As the hydrophilic coat, SiO ₂ is more preferable. For example, a hydrophilic titanium oxide thin film having Ti—OH or an alumina film having Al—OH may be used, and an anodized alumina having a particularly high content of Al—OH may be used. .

In _particular, AlO _X, TiO _X, among the various hydrophilic member such as SiO _X, SiO _X is preferably efficiency to form the silane coupling bond containing a high Si-OH.

  When the surface is coated with a hydrophilic film, various thin film forming means such as a sol-gel method, a CVD method, and a sputtering method can be used, and an anodic oxidation method for an aluminum substrate can also be used. The substrate in this case is not particularly limited, such as glass, metal, ceramics, and plastic.

  The hydrophilic member is preferably a member (flexible member) that is flexible enough to be deformed following the surface shape of the water-repellent film, such as a film or a foil. By deforming following the surface shape of the water repellent film, it can be brought into contact with the entire surface of the water repellent film.

  Furthermore, it is preferable that the hydrophilic member is previously activated by removing organic substances on the surface with high energy such as oxygen plasma treatment, atmospheric pressure plasma treatment, low-pressure mercury lamp irradiation treatment, and excimer lamp irradiation treatment.

(Step S4: An example of a contact process)
Next, a hydrophilic member is pressed against the water repellent film formed in step S2.

  FIG. 4A is a schematic diagram showing a state in which the hydrophilic member configured as described above is brought into contact with the water repellent film shown in FIG. When a flexible member is used as the hydrophilic member, the hydrophilic member may be pressed against the water repellent film using an elastic member such as rubber or sponge.

  At this time, pressure may be applied to the hydrophilic member in the direction of the water-repellent film so that no float (gap) is generated. If the pressure is low, there may be a gap between the water repellent film and the hydrophilic member, which may prevent the hydrophilic member from coming into contact with the entire surface of the water repellent film. Conversely, if the pressure is high, the film is formed. There is a possibility of damaging the substrate (nozzle plate). Therefore, it is necessary to select an appropriate pressure between them. Although it depends on the material of the film formation substrate, for example, when the nozzle plate is made of silicon, it is preferable to select from 5 [kPa] to 50 [kPa].

  Further, the atmosphere of the water repellent film may be heated and / or humidified while being in contact (an example of a step of heating and / or humidifying). Note that the hydrophilic member may be directly heated.

  FIG. 4B is a schematic diagram showing a state in which the hydrophilic side of the unbonded silane coupling material is bonded toward the hydrophilic member. In this way, by pressing the hydrophilic member against the water-repellent film, the excess silane coupling material present on the surface of the water-repellent film is bonded to the hydrophilic member by silane coupling.

(Step S5: an example of a separation step)
Finally, the hydrophilic member is separated from the water repellent film. Thereby, excess silane coupling material can be removed from the surface of the water-repellent film.

  As described above, according to this embodiment, it is possible to generate a water-repellent film that does not have an excess of silane coupling material without generating contamination such as an adhesive.

  This embodiment is greatly different from Patent Document 1 in which the pressure-sensitive adhesive tape is pressed in that the member to be pressed is hydrophilic. A silicon adhesive material, which is a typical adhesive material, has a contact angle of about 75 to 100 °, for example, by Panac Panapeel. Also in the non-silicone adhesive material, the contact angle with respect to water is 50 ° or more, for example, 83 to 103 ° by Panac Co., Panapeel and 57 to 102 ° by Lintec Corp. non-silicone release material.

  On the other hand, the hydrophilic member in the present embodiment has a contact angle with pure water of the surface of 30 ° or less, more preferably 20 ° or less, for example, about 10 ° (to the extent that hydrophilicity cannot be accurately measured due to wet spreading). It is. For example, a thermal oxide film generated by heating has a contact angle of 50 ° or more before irradiation with a low-pressure mercury lamp, and the effect cannot be obtained when used as a hydrophilic member in this embodiment. However, when this thermal oxide film is irradiated with a low-pressure mercury lamp, the contact angle measured with pure water becomes about 25 °, and some effects are seen when used as the hydrophilic member in this embodiment.

Further, the contact angle with pure water on the substrate on which the CVD-SiO ₂ film is formed is about 12 °, and when used as a hydrophilic member in this embodiment, a great effect can be obtained.

<Example>
First, the deposition silicon substrate which SiO ₂ is CVD deposited on the surface as a deposition substrate, prepared Daikin Optool DSX as a silane coupling material, the water-repellent film by vacuum deposition on the SiO ₂ film forming substrate Generated samples.

Further, SiO _{2 formed} by CVD as a hydrophilic member was prepared and brought into contact with the water-repellent film of the above sample at a pressure of 10 [kPa] to remove excess silane coupling material.

  At this time, the number of treatments until the excess silane coupling material was removed and the presence or absence of contamination (impurities) were evaluated under different conditions of temperature, humidity, and contact time in the atmosphere. FIG. 5 shows the evaluation results.

  In addition, the presence or absence of removal of the excess silane coupling material was determined by observing with an optical microscope. Moreover, the presence or absence of generation | occurrence | production of contamination was performed by the time-of-flight type secondary ion mass spectrometry (TOF-SIMS).

  As shown in FIG. 5, when the temperature was 25 ° C. (room temperature), the humidity was 50%, and the contact time was 1 hour, excess silane coupling material could be removed when the treatment was performed 12 times. At this time, no contamination occurred.

  Excess silane coupling material is removed 6 times at a temperature of 40 ° C, 30% humidity and 1 hour contact time, and 3 times at a temperature of 40 ° C, 30% humidity and 2 hours contact time. We were able to.

  Furthermore, when the temperature is 40 ° C, the humidity is 60%, and the contact time is 1 hour, it is 4 times, and when the temperature is 40 ° C, the humidity is 60%, and the contact time is 2 hours, the excess silane coupling material is removed. We were able to.

  Note that no contamination occurred under any of these conditions.

  As described above, according to this embodiment, it is possible to form a water repellent film that does not have an excess silane coupling material without causing contamination. Moreover, the excess silane coupling material can be efficiently removed by adjusting the temperature and humidity in the atmosphere (heating and / or humidification).

<Example of inkjet recording apparatus>
Next, an ink jet head having a nozzle plate on which a water repellent film is formed by the method of forming a water repellent film according to the present embodiment and an ink jet recording apparatus using the ink jet head will be described.

  6A and 6B are diagrams showing the configuration of the main part of the ink jet recording apparatus according to the present embodiment. FIG. 6A is a side view and FIG. 6B is a plan view.

  As shown in FIG. 6, the ink jet recording apparatus 10 is a single-pass type line printer, and conveys a sheet (sheet) 12 serving as a recording medium to a conveyance drum 14 and a sheet 12 conveyed by the conveyance drum 14. Ink jet heads 16K, 16C, 16M, 16Y and ink jet heads 16K, 16C, 16M, 16Y for ejecting ink droplets of black (K), cyan (C), magenta (M), yellow (Y) toward predetermined The head support frame 20 is fixed to the position.

  The transport drum 14 is driven to rotate by a motor (not shown). A gripper (not shown) is provided on the outer peripheral surface of the transport drum 14, and the paper 12 is transported while the leading end is gripped by the gripper. A large number of suction ports (not shown) are formed on the outer peripheral surface of the transport drum 14, and air is sucked from the suction holes toward the inside. The paper 12 is conveyed while being sucked and held in the suction holes.

The inkjet heads 16K, 16C, 16M, and 16Y are constituted by line heads corresponding to the maximum sheet width of the sheet 12 to be printed (width in the rotation axis direction of the transport drum 14). Each inkjet head 16K, 16C, 16M, 16Y is formed in a rectangular block shape, and nozzle surfaces 18K, 18C, 18M, 18Y are formed on the bottom thereof. The number of nozzles formed on the nozzle surfaces 18K, 18C, 18M, and 18Y and the arrangement form thereof are not particularly limited. The inkjet heads 16K, 16C, 16M, and 16Y eject ink from the nozzles by a piezo method or a thermal method.

  The head support frame 20 includes a head mounting portion (not shown) for mounting the inkjet heads 16K, 16C, 16M, and 16Y. Each inkjet head 16K, 16C, 16M, 16Y is detachably attached to the head attachment portion.

  The inkjet heads 16K, 16C, 16M, and 16Y attached to the head support frame 20 are arranged orthogonal to the conveyance direction of the paper 12. Further, the paper 12 is arranged in a predetermined order along the conveyance direction of the paper 12 with a constant interval (in this example, black, cyan, magenta, and yellow are arranged in this order).

  Further, each of the inkjet heads 16K, 16C, 16M, and 16Y is attached to the head support frame 20 so that the respective nozzle surfaces 18K, 18C, 18M, and 18Y are parallel to the circumferential surface of the conveying drum 14 that faces each other. .

  Although not shown in the drawing, the ink jet recording apparatus 10 of the present example includes an ink storage / loading unit for supplying ink to the ink jet heads 16K, 16C, 16M, and 16Y, and each ink jet head in addition to the above-described configuration. 16K, 16C, 16M, 16Y cleaning (nozzle surface wiping, purge, nozzle suction, etc.) head maintenance unit, position detection sensor for detecting the position of the paper 12 on the paper transport path, temperature for detecting the temperature of each part of the apparatus It has a sensor.

  The ink jet recording apparatus 10 configured as described above ejects each color ink from the respective ink jet heads 16K, 16C, 16M, and 16Y onto the paper 12 sucked and conveyed by the conveying drum 14, and an image is formed on the recording surface of the paper 12. Record.

  In addition, although the drum conveyance type inkjet recording apparatus has been described here, a belt conveyance type inkjet recording apparatus may be used.

[Inkjet head structure]
Next, an example of the structure of the inkjet head will be described. Since the inkjet heads 16K, 16C, 16M, and 16Y corresponding to the respective colors have the same structure, an inkjet head (hereinafter also simply referred to as a “head”) is denoted by reference numeral 50 below. Shall.

  FIG. 7A is a plan perspective view showing an example of the structure of the head 50, and FIG. 7B is an enlarged view of a part of the head 50. 8 is a perspective plan view showing another example of the structure of the head 50, and FIG. 9 is a three-dimensional configuration of one channel of droplet discharge elements (ink chamber units corresponding to one nozzle 51) serving as a recording element unit. It is sectional drawing (sectional drawing in alignment with the AA in FIG.7 (b)) which shows this.

  As shown in FIG. 7, in the head 50 of the present embodiment, a plurality of nozzles 51 that are ink ejection ports are arranged over the entire width of the image forming area of the nozzle surface facing the paper 12 of the head 50. This achieves a high density of substantial nozzle intervals (projection nozzle pitch) projected (orthogonal projection) so as to be aligned along the head longitudinal direction (direction orthogonal to the conveyance direction of the paper 12).

  The configuration in which the nozzle rows having a length corresponding to the full width Wm of the sheet 12 in the direction substantially perpendicular to the conveyance direction (arrow S direction) of the sheet 12 (arrow M direction; main scanning direction) is not limited to this example. For example, instead of the configuration of FIG. 7A, as shown in FIG. 8, a short head module 50 ′ in which a plurality of nozzles 51 are two-dimensionally arranged is arranged in a staggered manner and connected to form a sheet. You may comprise the line head 50 which has a nozzle row of the length corresponding to the full width of 12.

  The pressure chamber 52 provided corresponding to each nozzle 51 has a substantially square planar shape (see FIGS. 7A and 7B), and the nozzle 51 is provided at one of the diagonal corners. An outlet for supplying ink (supply port) 54 is provided on the other side. The shape of the pressure chamber 52 is not limited to this example, and the planar shape may have various forms such as a quadrangle (rhombus, rectangle, etc.), a pentagon, a hexagon and other polygons, a circle, and an ellipse.

  As shown in FIG. 9, the head 50 has a structure in which a nozzle plate 51P, a flow path plate 52P, a diaphragm 56, and the like are laminated and joined. The nozzle plate 51P constitutes the nozzle surface 50A of the head 50, and a plurality of nozzles 51 communicating with the respective pressure chambers 52 are two-dimensionally formed.

  A water repellent film is formed on the nozzle surface 50A of the nozzle plate 51P by the water repellent film forming method shown in the flowchart of FIG. That is, a water repellent film is formed using the nozzle plate 51P as a film formation substrate, and is used as the water repellent film on the nozzle surface 50A.

  The flow path plate 52 </ b> P constitutes a side wall portion of the pressure chamber 52 and forms a supply port 54 as a throttle portion (the most narrowed portion) of an individual supply path that guides ink from the common flow channel 55 to the pressure chamber 52. It is a forming member. For convenience of explanation, although shown in FIG. 9 in a simplified manner, the flow path plate 52P has a structure in which one or a plurality of substrates are stacked.

  The diaphragm 56 constitutes one wall surface (upper surface in FIG. 9) of the pressure chamber 52 and is made of a conductive material such as stainless steel (SUS) or silicon (Si) with a nickel (Ni) conductive layer. It also serves as a common electrode for a plurality of actuators (here, piezoelectric elements) 58 arranged corresponding to the chamber 52. It is also possible to form the diaphragm with a non-conductive material such as resin. In this case, a common electrode layer made of a conductive material such as metal is formed on the surface of the diaphragm member.

  A piezoelectric body 59 is provided at a position corresponding to each pressure chamber 52 on the surface opposite to the pressure chamber 52 side of the diaphragm 56 (upper side in FIG. 9). An individual electrode 57 is formed on a surface opposite to the surface in contact with the diaphragm 56 that also serves as the same. A piezoelectric element that functions as the actuator 58 is configured by the individual electrode 57, the common electrode (in this example, also serving as the diaphragm 56) facing the individual electrode 57, and the piezoelectric body 59 interposed so as to be sandwiched between the electrodes. . For the piezoelectric body 59, a piezoelectric material such as lead zirconate titanate or barium titanate is preferably used.

  Each pressure chamber 52 communicates with a common flow channel 55 through a supply port 54. The common channel 55 communicates with an ink tank (not shown) as an ink supply source, and the ink supplied from the ink tank is distributed and supplied to each pressure chamber 52 via the common channel 55.

  By applying a drive voltage between the individual electrode 57 and the common electrode of the actuator 58, the actuator 58 is deformed to change the volume of the pressure chamber 52, and ink is ejected from the nozzles 51 due to the pressure change accompanying this. After the ink is ejected, when the displacement of the actuator 58 returns to its original state, new ink is refilled into the pressure chamber 52 from the common channel 55 through the supply port 54.

  As shown in FIG. 10, the ink chamber units 53 having the above-described structure are arranged in the main scanning direction by a structure in which a plurality of ink chamber units 53 are arranged at a constant pitch d along the direction of an angle ψ with respect to the main scanning direction. Can be handled in an equivalent manner in which each nozzle 51 is arranged in a straight line with a constant pitch PN = d × cos ψ.

  In the matrix nozzle arrangement as shown in FIG. 10, the nozzles 51-11, 51-12, 51-13, 51-14, 51-15, 51-16 are made into one block (other nozzles 51-21 ,..., 51-26 as one block, nozzles 51-31,..., 51-36 as one block,...), And nozzles 51-11, 51-12,. -16 is sequentially driven, so that one line can be printed in the width direction of the paper 12.

  On the other hand, printing of the paper 12 in the transport direction is performed by repeatedly printing one line (a line formed by one row of dots or a line composed of a plurality of rows of dots) formed by the main scanning as described above. Made.

  In the present embodiment, the arrangement form of the nozzles 51 in the head 50 is not limited to the illustrated example. For example, instead of the matrix arrangement described with reference to FIG. 7, a linear array of one row, a V-shaped nozzle arrangement, and a zigzag (W-shaped) nozzle having a V-shaped arrangement as a repeating unit. An array or the like is also possible.

  In the present embodiment, a method of ejecting ink droplets by deformation of an actuator typified by a piezo element (piezoelectric element) is adopted, but in the practice of the present invention, the method of ejecting ink is not particularly limited, Instead of the piezo jet method, various methods such as a thermal jet method in which ink is heated by a heating element such as a heater to generate bubbles and ink droplets are ejected by the pressure can be applied.

  The technical scope of the present invention is not limited to the scope described in the above embodiment. The configurations and the like in the embodiments can be appropriately combined between the embodiments without departing from the gist of the present invention.

  DESCRIPTION OF SYMBOLS 10 ... Inkjet recording device, 16K, 16C, 16M, 16Y, 50 ... Inkjet head, 18K, 18C, 18M, 18Y, 50A ... Nozzle surface, 51 ... Nozzle, 51P ... Nozzle plate, 100 ... Film-forming substrate, 102 ... Silane Coupling agent

Claims (10)

A water repellent film forming step of forming a water repellent film by bonding a silane coupling material to a substrate;
Contacting a hydrophilic member to the formed water-repellent film, and contacting an excess silane coupling material not bonded to the base material to the hydrophilic member;
A separation step of separating the hydrophilic member from the water repellent film;
A method for producing a water repellent film comprising:   The method for producing a water-repellent film according to claim 1, wherein the silane coupling material contains fluorine.   The method for producing a water repellent film according to claim 1 or 2, wherein a contact angle of the surface of the hydrophilic member with pure water is 30 ° or less. The method for producing a water repellent film according to claim 1, wherein the hydrophilic member contains SiO ₂ .   5. The method for producing a water-repellent film according to claim 1, wherein the hydrophilic member is a flexible member that deforms following the surface shape of the water-repellent film. 6.   6. An activation step of activating the surface of the hydrophilic member by at least one of oxygen plasma treatment, atmospheric pressure plasma treatment, low-pressure mercury lamp irradiation treatment, and excimer lamp irradiation treatment. The method for producing a water-repellent film according to claim 1.   7. The method for producing a water repellent film according to claim 1, wherein in the contacting step, the hydrophilic member is brought into contact with the water repellent film by applying a predetermined pressure. 8.   The method for producing a water repellent film according to claim 7, wherein the predetermined pressure is 5 kPa or more and 50 kPa or less.   9. The contact step according to claim 1, further comprising a step of heating and / or humidifying an atmosphere of the water-repellent film while the hydrophilic member is in contact with the water-repellent film. A method for producing a water-repellent film as described in 1.   A water repellent film forming step of forming a water repellent film by bonding a silane coupling material to a substrate;
  Contacting a hydrophilic member to the formed water-repellent film, and contacting an excess silane coupling material not bonded to the base material to the hydrophilic member;
  A separation step of separating the hydrophilic member from the water repellent film;
  A nozzle forming step of providing nozzle holes in the substrate;
  The manufacturing method of the nozzle plate provided with.

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