JP5888154B2 - CAN ROLL WITH GAS RELEASE MECHANISM AND LONG SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD - Google Patents

Description

  The present invention relates to a can roll that wraps and cools a long substrate when a process such as sputtering is applied to the long substrate, and a processing apparatus and a processing method provided with the can roll. Therefore, a can roll with a gas release mechanism capable of releasing gas from the outer peripheral surface side between the outer peripheral surface around which the long substrate is wound and the long substrate, and a processing apparatus and a processing method for the long substrate having the same About.

  In a liquid crystal panel, a notebook computer, a digital camera, a mobile phone, and the like, a flexible wiring board in which a wiring pattern is formed on a heat resistant resin film is used. This flexible wiring board is obtained by subjecting a heat-resistant resin film with a metal film to which a metal film is formed on one side or both sides of a heat-resistant resin film by performing a patterning process using a thin film technique such as photolithography or etching. In recent years, the wiring patterns of flexible wiring boards tend to be more delicate and denser, and accordingly, heat-resistant resin films with metal films are required to be flat and free from wrinkles.

  As a manufacturing method of this kind of heat-resistant resin film with a metal film, conventionally, a method in which a metal foil is attached to a heat-resistant resin film with an adhesive (manufacturing method of a three-layer substrate), a heat-resistant resin on the metal foil After coating the solution, dry and manufacture (casting method), heat-resistant resin film by vacuum film formation method alone or in combination with vacuum film formation method and wet plating method. A method (metalizing method) or the like is known.

  In the metalizing method, a vacuum deposition method, a sputtering method, an ion plating method, an ion beam sputtering method or the like is used as the vacuum film forming method. For example, Patent Document 1 describes a method in which a conductor layer is formed by sputtering copper after sputtering a chromium layer on a polyimide insulating layer. Patent Document 2 discloses a flexible film in which a first metal thin film formed by sputtering using a copper nickel alloy as a target and a second metal thin film formed by sputtering using a copper as a target are formed on a polyimide film in this order. Circuit board materials are disclosed.

  Film formation by these sputtering methods is generally excellent in adhesion, but it is said that the heat load applied to the heat-resistant resin film as a base material is larger than that of the vacuum deposition method. It is also known that when a large heat load is applied to the heat resistant resin film during film formation, the film is likely to be wrinkled.

  Therefore, a sputtering web coater equipped with a can roll is generally used in the process of forming a heat-resistant resin film with a metal film by forming a film on the heat-resistant resin film such as the polyimide film by a vacuum film formation method. Has been. This web coater is equipped with a can roll having a cooling function, which is rotated and driven by a roll-to-roll to a conveyance path defined on the outer peripheral surface thereof. By winding the film, it becomes possible to perform a sputtering process that requires a thermal load on the surface of the long resin film while cooling the long resin film from the back surface side.

  For example, Patent Document 3 discloses an unwinding type (roll-to-roll type) vacuum sputtering apparatus which is an example of a sputtering web coater. The unwinding / winding-type vacuum sputtering apparatus includes a cooling roll that plays the role of the can roll. Further, a sub-roll is provided on at least the film feeding side or the feeding side of the cooling roll, thereby controlling the heat-resistant long resin film in close contact with the cooling roll.

  By the way, as described in Non-Patent Document 1, since the outer peripheral surface of the can roll is not flat when viewed microscopically, the outer peripheral surface of the can roll and a long resin film conveyed in contact therewith There is a gap (gap) that is separated by a vacuum space. For this reason, it cannot be said that the heat of the film applied during sputtering or vapor deposition is actually efficiently transferred from the long resin film to the can roll, which causes wrinkles of the long resin film. It was.

  In order to solve this problem, there is a technique for introducing a gas from the can roll side into the gap portion between the outer peripheral surface of the can roll and the long resin film so that the thermal conductivity of the gap portion is higher than that of the vacuum. Proposed. For example, Patent Document 4 discloses a technique for providing a large number of fine holes serving as gas discharge ports on the outer peripheral surface of the can roll as a specific method for introducing gas into the gap portion from the can roll side. . Patent Document 5 discloses a technique for providing a groove serving as a gas discharge port on the outer peripheral surface of a can roll. Furthermore, a method is also known in which the can roll itself is composed of a porous body, and the micropores of the porous body itself are used as gas discharge ports.

  However, in any of these techniques, the area where the long resin film is not wound on the outer peripheral surface of the can roll has a lower resistance at the gas discharge port than the area where the long resin film is wound. The gas supplied to the can roll is easily discharged from the gas discharge port in the region where the long resin film is not wound into the vacuum chamber. As a result, an amount of gas that should be introduced into the gap between the outer peripheral surface of the can roll and the long resin film wound around the can roll is not supplied, and the effect of increasing the thermal conductivity cannot be obtained. was there.

  To solve this problem, a valve that protrudes from the outer peripheral surface of the can roll is provided in the gas discharge port, and the gas discharge port is opened by pressing the valve with the long resin film surface (Patent Document 5). Attach a cover to the area of the outer peripheral surface of the roll where the long resin film is sent and received and the area where the long resin film cannot be wound to increase the pressure in the cover, and gas is released from this area into the chamber. A method of preventing gas from being introduced and introducing gas into the gap between the outer peripheral surface of the can roll and the long resin film (Patent Document 6) has been proposed.

Japanese Patent Laid-Open No. 2-98994 Japanese Patent No. 3447070 Japanese Patent Laid-Open No. 62-247073 International Publication No. 2005/001157 pamphlet U.S. Pat. No. 3,414,048 International Publication No. 2002/070778 Pamphlet

“Vacuum Heat Transfer Models for Web Substrates: Review of Theory and Experimental Heat Transfer Data,” 2000 Society of Vacuum Coaters, 43rd. Annual Technical Conference Proceeding, Denver, April 15-20, 2000, p.335 “Improvement of Web Condition by the Deposition Drum Design,” 2000 Society of Vacuum Coaters, 50th. Annual Technical Conference Proceeding (2007), p.749

  By providing the can roll with the gas release mechanism as described above, as shown in FIG. 1, the long resin film F is guided by the front feed roll 1 and starts to come into contact with the outer peripheral surface of the can roll 2. , Only within the range of the angle range A (the angle range A may be referred to as the holding angle of the long resin film F) until the long resin film F is fed out by the rear feed roll 3 and is separated from the outer peripheral surface. In addition, it is possible to release gas from the outer peripheral surface side of the can roll 2, and thus it is possible to efficiently introduce gas into the gap portion between the outer peripheral surface and the long resin film F. Thereby, the thermal conductivity in the gap portion is improved, and it is possible to satisfactorily reduce the thermal load applied to the long resin film F during sputtering film formation.

  However, in the angular range A, heat is applied to the long resin film F only almost immediately below the cathodes 4, 5, 6, and 7, and in the other angular ranges B, the long length is long. Since heat is not applied to the resin film F, it is less necessary to introduce a gas into the gap portion than immediately below the cathode. Moreover, since the friction between the long resin film F and the outer peripheral surface of the can roll 2 is reduced by introducing the gas into the gap portion, it becomes difficult to transmit the rotational motion of the can roll 2 to the long resin film F. Therefore, the synchronous control of the can roll 2 and the two feed rolls 1 and 3 may be difficult. Furthermore, separating the long resin film F and the outer peripheral surface of the can roll 2 over the entire range of the angle range A does not restrain the long resin film F over a long distance in the conveyance direction. Therefore, wrinkles of the long resin film F being conveyed may be easily generated.

  The present invention has been made paying attention to such conventional problems, and the problem is that a long substrate (long resin film) conveyed by roll-to-roll is used as an outer peripheral surface of a can roll. When the long substrate is subjected to a heat-loading process such as sputtering film formation while being partially wound around and cooled, the outer surface of the can roll An object of the present invention is to provide an apparatus and method capable of introducing a gas into a gap portion (gap) formed between a long substrate and a long substrate.

  In order to solve the above-mentioned problems, the present inventor transported a long substrate by roll-to-roll in a vacuum chamber under reduced pressure, and partially attached the long substrate to the outer peripheral surface of the can roll in which the refrigerant circulates. In a long substrate processing apparatus that performs a process of applying a thermal load to the long substrate while being wound and cooled, in order to reliably reduce the generation of wrinkles of the long substrate due to the thermal load, the long surface wound around the outer surface of the can roll We have earnestly studied a can roll with a gas introduction mechanism that can introduce gas from the can roll side into a gap formed between the substrate and the substrate.

  As a result, a plurality of gas introduction passages extending substantially parallel to the rotation center axis and disposed over the entire circumference at substantially equal intervals in the circumferential direction, and an outer periphery from each of the plurality of gas introduction passages In a can roll having a plurality of gas discharge holes opened on the surface side, the gas supply to each gas introduction path is controlled, and the can roll outer peripheral surface is positioned in a region where the long substrate is not wound. This prevents the gas from being supplied not only to the gas introduction path, but also to the gas introduction path located in a region where the long substrate is wound and where no thermal load is applied, thereby hindering the conveyance of the long substrate. The present inventors have found that the gas can be satisfactorily introduced into the gap portion between the outer peripheral surface and the long substrate and the long substrate can be cooled more effectively.

In other words, the can roll provided by the present invention is a cylindrical part that is partially wound around the outer peripheral surface and cooled when a surface treatment is applied to a long substrate that is transported by roll-to-roll in a vacuum chamber. The cylindrical portion includes a plurality of gas introduction passages that extend substantially parallel to the rotation center axis and that are disposed over the entire circumference at substantially equal intervals in the circumferential direction. And a plurality of gas discharge holes that open to the outer peripheral surface side from each of the plurality of gas introduction paths, and are located in each of the plurality of regions where a thermal load is applied within a range in which the long substrate is wound. the gas introduction passage located in an area not applied with at least one heat load between areas consuming thermal load adjacent while performing the supply of gas from the outside of the vacuum chamber without the supply of gas to the introducing path, To the gas introduction passage located within the scale substrate is not wound is characterized by the gas supply valve to operate so as not to supply the gas.

In addition, the surface treatment method for a long substrate provided by the present invention is a method of extending a long substrate conveyed by roll-to-roll in a vacuum chamber substantially parallel to the rotation center axis and having a substantially uniform interval in the circumferential direction. The outer peripheral surface of the can roll comprising a cylindrical portion having a plurality of gas introduction passages that are opened and arranged over the entire circumference, and a plurality of gas discharge holes that open from the gas introduction passages to the outer peripheral surface side. with partially wound cooling, a long substrate surface processing method for performing surface treatment consuming heat load, among the plurality of gas introducing path, consuming heat load within a long substrate is wound gas guide is located in a region not applied with at least one heat load between areas consuming thermal load adjacent while performing the supply of gas from the outside of the vacuum chamber to a gas introduction path located in each of the plurality of regions The road without the supply of the gas, is characterized by refraining from supplying gas to the gas introduction passage located within the elongate substrate is not wound.

  According to the present invention, gas can be reliably introduced only into the gap portion between the outer peripheral surface and the long substrate in a region where a thermal load is applied, such as a region facing the sputtering cathode, of the outer peripheral surface of the can roll. . Thereby, problems such as gas leakage into the vacuum chamber can be suppressed, and pressure control in the vacuum chamber can be accurately performed. Further, the gas pressure in the gas release mechanism can be stabilized, and a constant amount of gas can always be introduced into the gap portion between the outer peripheral surface of the can roll and the long substrate wound around the can roll.

  Furthermore, since gas is not released from the outer peripheral surface of the can roll in the region where the thermal load is not applied in the region where the long substrate is wound, the long substrate can be brought into contact with the outer peripheral surface of the can roll in this region. It becomes. As a result, the rotational movement of the can roll can be satisfactorily transmitted to the long substrate, so that the long substrate can be stably conveyed, and the generation of wrinkles is suppressed. Thus, according to the present invention, the long substrate can be cooled extremely efficiently, and a high-quality heat-resistant resin film with a metal film without wrinkles can be produced with a high yield.

It is a front view which shows typically a mode when gas is discharge | released from the can roll side between the outer peripheral surface of a can roll and the film wound there. It is a front view showing typically a specific example of a roll-to-roll type long substrate processing apparatus in which a can roll concerning the present invention is used suitably. It is a cutting figure when the can roll of one specific example of this invention is cut | disconnected by the surface parallel to the rotation center axis | shaft. It is a perspective view of the rotary joint which the can roll of FIG. 3 comprises. It is the front view and partial sectional view of the rotary joint of FIG. It is the front view and partial sectional view of the rotary joint which the can roll of the other specific example of this invention comprises.

  Hereinafter, a vacuum film forming apparatus 50 will be described as a specific example of the long substrate processing apparatus of the present invention with reference to FIG. The vacuum film forming apparatus 50 shown in FIG. 2 is an apparatus that is also called a sputtering web coater, and continuously performs a process that requires a heat load such as sputtering on the surface of a long substrate conveyed by a roll-to-roll method. It is preferably used when often applied.

  More specifically, the vacuum film forming apparatus 50 is provided in a vacuum chamber 51 and is a heat resistant resin film (hereinafter referred to as a long resin film) as a long substrate unwound from an unwinding roll 52. ) After a predetermined film forming process is performed on F, the film is wound up by a winding roll 64. A can roll 56 that is rotationally driven by a motor is disposed in the middle of the conveyance path from the unwind roll 52 to the take-up roll 64. Inside the can roll 56, a coolant whose temperature is adjusted outside the vacuum chamber 51 circulates. The structure of the can roll 56 will be described in detail later.

The vacuum chamber 51 is provided with various devices such as a dry pump, a turbo molecular pump, and a cryocoil (not shown). After these pressures are reduced to an ultimate pressure of about 10 ⁻⁴ Pa, a sputtering gas is introduced. The pressure is adjusted to about 0.1 to 10 Pa. A known gas such as argon is used as the sputtering gas, and a gas such as oxygen is further added depending on the purpose. The shape and material of the vacuum chamber 51 are not particularly limited as long as they can withstand a reduced pressure state, and various types can be used.

  A free roll 53 that guides the long resin film F and a tension sensor roll 54 that measures the tension of the long resin film F are arranged in this order on the conveyance path from the unwinding roll 52 to the can roll 56. ing. The long resin film F fed from the tension sensor roll 54 toward the can roll 56 is rotated around the can roll 56 driven by a motor by a motor-driven feed roll 55 provided in the vicinity of the can roll 56. Adjustment to the speed is performed, whereby the long resin film F can be brought into close contact with the outer peripheral surface of the can roll 56 and conveyed.

  Similarly to the above, the motor-driven feed roll 61 that adjusts the peripheral speed of the can roll 56 and the tension sensor roll that measures the tension of the long resin film F are also provided on the conveyance path from the can roll 56 to the take-up roll 64. 62 and a free roll 63 for guiding the long resin film F are arranged in this order.

  In the unwinding roll 52 and the winding roll 64, the tension balance of the long resin film F is maintained by torque control using a powder clutch or the like. Further, the long resin film F is unwound from the unwinding roll 52 and wound around the winding roll 64 by the rotation of the can roll 56 and the motor-driven feed rolls 55 and 61 that rotate in conjunction with the rotation of the can roll 56. It has become.

  In the vicinity of the can roll 56, the conveyance path defined by the outer peripheral surface of the can roll 56 (that is, along the range of the angular range A around which the long resin film F is wound on the outer peripheral surface of the can roll 56). Magnetron sputtering cathodes 57, 58, 59 and 60 are provided as film forming means so as to face each other.

  In the case of sputtering of a metal film, a plate-shaped target as shown in FIG. 2 can be used for these magnetron sputtering cathodes. However, when a plate-shaped target is used, nodules (growth of foreign matter) are formed on the target. ) May occur. When this becomes a problem, it is preferable to use a cylindrical rotary target that generates no nodules and has high target use efficiency.

  In addition, since the vacuum film-forming apparatus 50 of the long resin film F of FIG. 2 assumes a sputtering process as a process to which a thermal load is applied, the magnetron sputtering cathodes 57 to 60 are illustrated. In the case where the process to be applied is other processes such as CVD (chemical vapor deposition) and vapor deposition, other vacuum film forming means is provided in place of the plate target.

  Next, a specific example of the can roll 56 having a gas release mechanism that is preferably used in the vacuum film forming apparatus 50 will be described with reference to FIG. The can roll 56 shown in FIG. 3 includes a cylindrical portion 10 that is driven to rotate about a rotation center shaft 56a by a driving device (not shown). The outer peripheral surface of the cylindrical portion 10 is a transport path for winding and transporting the long resin film F. On the inner peripheral surface side of the cylindrical portion 10, a refrigerant circulation portion 11 through which a refrigerant such as cooling water flows is formed in a jacket structure, for example.

  The rotating shaft 12 located at the rotation center shaft 56a portion of the cylindrical portion 10 has a double piping structure, and a refrigerant cooling device and a refrigerant (not shown) provided outside the vacuum chamber 51 described above via the rotating shaft 12. The refrigerant circulates between the circulation unit 11 and the temperature of the outer peripheral surface of the can roll can be adjusted. That is, the refrigerant cooled by the refrigerant cooling device is sent to the refrigerant circulation portion 11 through the inner side of the inner pipe 12a, and receives the heat of the long resin film F to raise the temperature, and then the inner pipe 12a and the outer pipe. It returns to a refrigerant cooling device again through the space between 12b. A bearing 13 for supporting the rotating can roll is provided outside the outer pipe 12b.

  A plurality of gas introduction passages 14 are formed in the thick portion of the cylindrical portion 10 so as to extend substantially parallel to the rotation center axis 56a and at substantially equal intervals in the circumferential direction. Yes. Each gas introduction path 14 extends in parallel to the direction of the rotation center line 56 a of the can roll 56. Each gas introduction path 14 has a plurality of gas discharge holes 15 that open to the outer peripheral surface side of the cylindrical portion 10 (that is, the outer peripheral surface side of the can roll 56). The plurality of gas discharge holes 15 are formed at substantially equal intervals along the direction of the rotation center line 56 a of the can roll 56.

  The inner diameter of each gas discharge hole 15 is particularly large as long as the gas can be satisfactorily introduced into a gap (gap) formed between the outer peripheral surface of the can roll 56 and the long resin film F wound around the can roll 56. For example, the inner diameter may be about 30 μm to 500 μm. Further, the number of the gas introduction paths 14 and the number of the gas discharge holes 15 included in each gas introduction path 14 are the areas in which the long resin film F is wound in the area defined by the outer peripheral surface of the can roll 56. It is determined appropriately depending on the area, the amount of gas released, the capacity of the exhaust pump, and the like.

  Generally, it is possible to make the thermal conductivity uniform by providing a large number of gas discharge holes 15 with the smallest possible inner diameter in the conveyance path portion on the outer peripheral surface of the can roll 56 as a whole. preferable. However, since a processing technique for providing a large number of holes with a very small inner diameter at a narrow pitch is difficult, it is realistic to provide small holes with an inner diameter of about 150 to 300 μm on the outer peripheral surface of the can roll 56 at a pitch of 5 to 10 mm. In FIG. 3, ten gas discharge holes 15 arranged along the rotation center line 56a of the can roll 56 are shown as an example.

  Each gas introduction path 14 is supplied with gas from the outside of the vacuum chamber 51 through a rotary joint 20 as a gas supply valve. The rotary joint 20 is configured to allow gas from outside the vacuum chamber 51 to enter the gas introduction path 14 within the range where the long resin film F is wound and the range where the thermal load is applied on the outer peripheral surface of the can roll 56. It operates so as not to supply gas to the gas introduction path 14 that is supplied and located in the other region. Thereby, gas can be introduced satisfactorily into a gap portion (gap) formed between the outer peripheral surface of the can roll 56 and the long resin film F wound around the outer surface of the can roll 56 except in a region where no thermal load is applied. It becomes possible.

  The rotary joint 20 will be specifically described with reference to FIG. The rotary joint 20 includes a pair of rotating ring units 21 and a fixed ring unit 22. The rotating ring unit 21 is concentrically attached to the side portion of the cylindrical portion 10 constituting the can roll 56, and rotates about the central axis 56a together with the can roll 56. On the other hand, the fixing ring unit 22 is supported so as not to move in the vacuum chamber 51 by a support member (not shown). The rotating ring unit 21 and the fixed ring unit 22 have sliding contact surfaces 21 a and 22 a at portions facing each other. When the rotating ring unit 21 rotates together with the can roll 56, the sliding contact surfaces 21 a and 22 a. They come into sliding contact with each other.

  In the rotating ring unit 21, the same number of gas supply passages 23 as the number of the gas introduction passages 14 are formed over the entire circumference at equal intervals in the circumferential direction. Each of the plurality of gas supply paths 23 is formed radially inside the rotary ring unit 21 and / or parallel to the direction of the rotation axis 56 a of the can roll 56, and one end thereof is the same as the gas supply path 23. The gas introduction path 14 at an angular position communicates with the gas connection pipe 25. The other end opposite to the one end connected to the gas introduction path 14 is opened at the sliding contact surface 21 a of the rotating ring unit 21.

  That is, the angular position of the opening where each gas supply path 23 opens at the sliding contact surface 21a of the rotating ring unit 21 (hereinafter, this opening is referred to as the rotational opening 23a) is connected to the gas supply path 23. It coincides with the angular position of the gas introduction path 14. Note that the gas supply path 23 and the gas introduction path 14 may be directly communicated without using the gas connection pipe 25.

  On the other hand, two gas distribution paths 24 are formed in the fixed ring unit 22, and these two gas distribution paths 24 are respectively connected to two gas supply pipes 26 that supply gas supplied from the outside of the vacuum chamber 51. One end is in communication. The other end of the two gas distribution paths 24 is a thermal load in the region where the rotary opening 23a provided at one end of the gas supply path 23 of the rotary ring unit 21 moves on the sliding surface 21a. The opening is made in a region corresponding to the angle range where the is applied. Specifically, the gas distribution path 24 is fixed to open in a region corresponding to the angular range of the region facing the sputtering cathodes 57 to 60 in the locus formed by the rotation opening 23 a as the can roll 56 rotates. An opening 24a is provided on the sliding surface 22a.

  Thereby, only when the rotation opening 23a of the gas supply path 23 of the rotating ring unit 21 rotates and opposes the fixed opening 24a of the gas distribution path 24 of the fixed ring unit 22, the gas distribution path 24 and the gas supply path 23 are provided. Therefore, gas is introduced into the gas introduction path 14 that communicates with the gas supply path 23 via the gas connection pipe 25. That is, as shown in FIG. 5, the gas introduction path 14 that is rotated by the rotation of the can roll 56 is formed within a range of an angle range A in which the long resin film F is wound around the outer peripheral surface of the can roll 56. When the gas distribution path 24 and the gas supply path 23 are in communication with each other as shown in the II cross section of FIG. 5, the gas is supplied. As shown in the cross section, the gas distribution path 24 and the gas supply path 23 are disconnected from each other, so that no gas is supplied.

  As a result, of the outer peripheral surface of the can roll 56, the outer peripheral surface of the can roll 56 is only within the range of the angle range A around which the long resin film F is wound and the thermal load is applied by the sputtering cathodes 57-60. And the long resin film F are introduced with a gas to improve heat conduction, and the thermal load on the long resin film F during sputtering film formation is efficiently reduced. In this region, friction between the long resin film F and the outer peripheral surface of the can roll 56 is reduced, but in the angular range A, the sputtering cathode 57 which is a region where no thermal load is applied during the sputtering film formation. Since gas is not released in an angle range where -60 is not opposed, the long resin film F can be brought into contact with the outer peripheral surface of the can roll 56. Thereby, it becomes possible to transmit the rotational motion of a can roll favorably to a film, and synchronous control with the front feed roll 55 or the rear feed roll 61 becomes easy.

  Further, since gas is not released even in a region other than the angular range A, which is a region where the long resin film F is not wound, it should be discharged into the gap portion between the outer peripheral surface of the can roll 56 and the long resin film F. It is possible to prevent the gas from being discharged into the vacuum chamber 51 in vain. Thereby, it is possible to suppress an adverse effect on the pressure control in the vacuum chamber 51 and to stably maintain the gas pressure of the introduced gas at a predetermined pressure. Further, since no electromagnetic valve or pneumatic valve is used when stopping gas introduction, it is not necessary to provide complicated wiring or piping inside the rotating can roll 56, and a complicated control device is also unnecessary. That is, it is excellent in production, operation and maintenance.

  Next, another specific example of the can roll of the present invention will be described. The can roll of this other specific example has a gas suction valve for sucking gas from a gas introduction path located within a range where the long substrate is wound and where no thermal load is applied. Specifically, the rotary ring unit of the rotary joint has the same structure as the rotary ring unit 21 shown in FIG. 4 described above, but in addition to the two gas distribution paths described above, gas suction is performed on the fixed ring unit. It is characterized by the formation of a road. That is, a gas suction valve is constituted by the gas suction path formed in the fixed ring unit and the gas supply path formed in the rotating ring unit.

  Specifically, with reference to FIG. 6, the fixed ring unit 122 is provided with one gas suction path 27 between the two gas distribution paths 24. As will be described later, one end of the gas suction path 27 communicates with a gas suction pipe 28 that communicates with the outside of the vacuum chamber 51 and the like. The other end of the gas suction path 27 is a holding angle A in a region where the rotary opening 23a provided at one end of the gas supply path 23 of the rotary ring unit 21 moves on the sliding surface 21a. In the angular range corresponding to a region where no thermal load is applied.

  Thereby, only when the rotation opening 23a of the gas supply path 23 of the rotating ring unit 21 rotates and faces the fixed opening 27a of the gas suction path 27 of the fixed ring unit 122, the gas suction path 27 and the gas supply path 23 are arranged. Are in communication within the angle range corresponding to the region where the holding angle A is not applied and the heat load is not applied via the gas suction pipe 28, the gas suction path 27, and the gas supply path 23. Gas is sucked from the gas introduction path 14 to be used. Thereby, the long resin film F can be brought into contact with the outer peripheral surface of the can roll 56, and the rotational motion of the can roll 56 can be transmitted to the long resin film F satisfactorily.

  The end of the gas suction pipe 28 communicating with the gas suction path 27 may be connected to a suction device such as a suction pump provided outside the vacuum chamber 51, and the sucked gas may be discharged outside the vacuum chamber 51. Then, the suctioned gas may be discharged into the vacuum chamber by providing an opening in the vacuum chamber 51.

  The angle range in which the fixed opening 24a of the gas distribution path 24 opens at the sliding surface 22a may be set so as to substantially coincide with a region where a thermal load is applied, for example, a region where the sputtering cathodes 57 to 60 are opposed to each other. In addition, the angle range in which the fixed opening 27a of the gas suction path 27 opens at the sliding surface 22a is a region where no thermal load is applied in the holding angle A, for example, a region where the sputtering cathode 58 faces and the sputtering cathode 60 faces. What is necessary is just to set so that it may correspond substantially between area | regions. Note that the angular range in which the long substrate is not wound on the outer peripheral surface of the can roll 56 substantially coincides between the region facing the sputtering cathode 60 and the region facing the sputtering cathode 57.

  In the rotary joint 20 described above, the number of the gas supply pipes 23 provided in the rotary ring unit 21 and the number of the gas introduction paths 14 are matched, and those at the same angular position in the circumferential direction of the can roll 56 are communicated with each other. Although the structure has been described, it may be desirable to connect one gas supply path 23 to a plurality of gas introduction paths 14 due to restrictions such as space and the size of piping that can be used. In this case, for example, a branch pipe may be attached to the distal end portion of the gas supply pipe 23 and the branch destinations may be connected to a plurality of gas introduction paths 14 adjacent to each other.

  When using the above-mentioned branch pipe, the number of the gas introduction paths 14 existing simultaneously in the area where the long resin film F is not wound on the outer peripheral surface of the can roll 56 is a pipe that branches from one gas supply path 23. It is preferable to match the number. For example, as shown in FIG. 5, if the three gas introduction paths 14 are simultaneously present in a region where the long resin film F is not wound, each branch pipe has a structure that branches into three. Is preferred. However, when it is desired to finely control the introduction of the gas, the number of the gas introduction paths 14 that are simultaneously present in the region where the long resin film F is not wound is equally divided by an integer of 2 or 3 or more. It is more preferable to match the number of pipes branched from each branch pipe.

  Up to now, the rotary joint provided with the rotating sliding contact surface shown in FIGS. 5 and 6 has been described as an example of the gas supply valve and the gas suction valve, but the gas supply valve and the gas suction valve are limited to these. For example, even if the valve is opened and closed by using the attractive force or repulsive force of the magnet, gas supply or suction, and supply of gas to the area where the long resin film is not wound are stopped. good.

  In addition, the rotary joint which the above-mentioned can roll 56 of one specific example of the present invention includes is a ring-shaped member in which the shapes of the rotating ring unit 21 and the fixed ring unit 22 are substantially the same when viewed from the central axis direction. The sliding surfaces 21a and 22a are formed perpendicular to the central axis 56a of the can roll 56. However, the gas is supplied only to the gas introduction path 14 located within a predetermined angle range to effectively form the gap portion. If it can introduce gas, it will not be limited to this shape.

  For example, the inner diameter of the rotating ring unit 21 and the outer diameter of the fixing ring unit 22 may be made substantially the same size so that the fixing ring unit 22 is fitted inside the rotating ring unit 21. In this case, the inner peripheral portion of the rotating ring unit 21 and the outer peripheral portion of the fixed ring unit 22 form a sliding surface that slides on each other, and each opening is provided here. In order to prevent gas leakage from the sliding portion of the rotary joint, it is preferable to provide a known gas sealing means.

According to Non-Patent Document 2, when the introduced gas is argon gas, when the introduced gas pressure is 500 Pa and the gap distance is about 40 μm or less, the thermal conductivity between the gaps is 250 (W / m ² · K). It becomes. Also in the long substrate processing apparatus of the present invention, assuming the same introduced gas pressure condition, the distance of the gap formed between the outer peripheral surface of the can roll 56 and the long resin film F is 40 μm. Although it is conceivable, if the gap portion has such a distance, the amount of gas leaking from the gap can be exhausted by a vacuum pump that is normally provided in a long substrate vacuum film forming apparatus.

  Furthermore, if the introduced gas is the same as the gas in the sputtering atmosphere, the sputtering atmosphere will not be contaminated. In addition, as described above, in the area where the long resin film F is not wound around the outer peripheral surface of the can roll 56, the gas supply is shut off before supplying the gas to the gas introduction path 14, thereby reducing the risk of gas leakage. Can do.

  As mentioned above, the long substrate processing apparatus of one specific example of the present invention has been described by taking the heat resistant resin film as an example of the long substrate, but the long substrate used in the long substrate processing apparatus of the present invention is In addition to other resin films, metal films such as metal foils and metal strips can be used. Examples of the resin film include a resin film having a relatively poor heat resistance such as a polyethylene terephthalate (PET) film and a heat resistant resin film such as a polyimide film.

  When producing a heat-resistant resin film with a metal film, it is selected from a polyimide film, a polyamide film, a polyester film, a polytetrafluoroethylene film, a polyphenylene sulfide film, a polyethylene naphthalate film, or a liquid crystal polymer film. A heat resistant resin film is preferably used. This is because the heat-resistant resin film with a metal film obtained by using these is excellent in flexibility required for a flexible substrate with a metal film, strength necessary for practical use, and electrical insulation suitable as a wiring material. .

  The heat-resistant resin film with a metal film can be produced by using the above heat-resistant resin film as a long substrate in the vacuum film forming apparatus as described above and forming a metal film on the surface by sputtering. For example, a film made of a Ni-based alloy or the like and a Cu film are formed on the surface of the heat resistant resin film by treating the heat resistant resin film with a metalizing method using the film forming apparatus (sputtering web coater) 50 as described above. A long heat resistant resin film with a metal film having a laminated structure can be obtained.

  The heat-resistant resin film with a metal film having such a structure is sent to another process after the film formation process, and is processed into a flexible wiring board having a predetermined wiring pattern by a subtractive method. Here, the subtractive method is a method of manufacturing a flexible wiring substrate by removing a metal film (for example, the Cu film) not covered with a resist by etching.

  A film made of the above-described Ni-based alloy or the like is called a seed layer, and its composition is appropriately selected depending on characteristics such as electrical insulation and migration resistance required for a heat-resistant resin film with a metal film. Is formed of a known alloy such as Ni-Cr alloy, Inconel, Constantan, Monel. In addition, when it is desired to make the metal film (Cu film) of the long heat-resistant resin film with a metal film thicker, a wet plating method may be used. In this case, it is processed by a method of forming a metal film only by an electroplating process, or a method of combining an electroless plating process as a primary plating and a wet plating process such as an electrolytic plating process as a secondary plating. The For this wet plating process, general wet plating conditions can be employed.

  In the above specific example of the present invention, as the heat-resistant resin film with a metal film, a structure in which a metal film such as a Ni—Cr alloy or Cu is laminated on a long resin film F has been described as an example. Depending on the purpose, the film forming method of the present invention can be used for forming an oxide film, a nitride film, a carbide film, or the like.

  Further, in the above specific examples of the present invention, the long substrate vacuum film forming apparatus has been described. However, the long substrate processing apparatus of the present invention includes a vacuum such as sputtering on the long substrate in a vacuum chamber under a reduced pressure atmosphere. In addition to the process of forming a film, a process with a thermal load such as a plasma process or an ion beam process is also included. Although the surface of the long substrate is modified by the plasma processing or the ion beam processing, a thermal load is applied to the long substrate. Even in such a case, it is effective to use the can roll of the present invention and the film forming apparatus for a long substrate using the same, and thereby, due to the heat load without leaking a large amount of introduced gas into the processing atmosphere. Generation of wrinkles on the long substrate can be suppressed.

  Here, the plasma treatment is a known plasma treatment method, for example, by performing discharge in a reduced-pressure atmosphere with a mixed gas of argon and oxygen or a mixed gas of argon and nitrogen, thereby generating oxygen plasma or nitrogen plasma to generate a long substrate. It is a method of processing. The ion beam treatment is a treatment in which a plasma discharge is generated in a magnetic field gap to which a strong magnetic field is applied, and a target (long substrate) is irradiated as an ion beam by cation in the plasma by electrolysis with an anode. A known ion beam source can be used for this ion beam treatment. Note that both the plasma treatment and the ion beam treatment are performed in a reduced pressure atmosphere.

  A long heat-resistant resin film with a metal film was prepared using the film forming apparatus (sputtering web coater) shown in FIG. For the heat-resistant resin film (long resin film F) as a long substrate, a heat-resistant polyimide film “UPILEX (registered trademark)” manufactured by Ube Industries, Ltd. having a width of 500 mm, a length of 800 m, and a thickness of 25 μm was used. .

  As the can roll, a can roll 56 with a gas introduction mechanism having a jacket roll structure as shown in FIG. 3 was used. The cylindrical part 10 of the can roll 56 was made of aluminum having a diameter of 900 mm and a width of 750 mm, and the outer peripheral surface thereof was subjected to hard chrome plating. In the thick portion of the cylindrical portion 10, 360 gas introduction passages 14 having an inner diameter of 4 mm extending in parallel with the direction of the rotation center axis 56a of the can roll 56 are formed at equal intervals in the circumferential direction over the entire circumference. Set up. In addition, the front end side of both ends of the gas introduction path 14 is bottomed so as not to penetrate the cylindrical portion 10.

  Each gas introduction path 14 was provided with 47 gas discharge holes 15 having an inner diameter of 0.2 mm that opened to the outer surface side of the cylindrical portion 10 (that is, the outer peripheral surface side of the can roll 56). These 47 gas discharge holes 15 are formed so that the long resin film F travels in a region between the inner lines 20 mm from both ends of the transport path of the long resin film F defined on the outer surface of the cylindrical portion 10. They were arranged at a pitch of 10 mm in a direction orthogonal to the direction. In other words, the gas discharge hole 15 was not provided in the region from the both end portions to 145 mm on the outer peripheral surface of the can roll 56.

  As described above, 360 gas introduction paths 14 are disposed in the cylindrical portion 10 so as to extend evenly in the circumferential direction and substantially parallel to the rotation center axis 56a over the entire circumference. When the 12 o'clock position on the upper side of FIG. 2 is 0 °, the front feed roll is in contact with the can roll at the angle of 20 °, and the rear feed roll is in contact with the can roll at the angle of 340 °. As a result of measurement using a thermocouple during the film formation, the region where the thermal load is generated in the sputter film formation was an angle range of 40 ° to 140 ° and an angle range of 220 ° to 320 °. Therefore, the fixed opening 24a of the gas distribution path 24 for introducing gas is opened at an angle of 35 ° to 145 ° and an angle of 215 ° to 125 °, and the fixed opening 27a of the gas suction path 27 is set to an angle of 150 ° to 210 °. Opened at. The other end of the gas suction path 27 is opened in the vacuum chamber 51 so that the sucked gas is discharged into the vacuum chamber 51.

  As a metal film to be formed on the long resin film F, a Cu film is formed on a Ni—Cr film as a seed layer. Therefore, a Ni—Cr target is used for the magnetron sputter target 57 and a magnetron is used. Cu targets were used for the sputtering targets 58, 59 and 60. The tension of the unwinding roll 51 and the winding roll 64 was 80N. Although the can roll 56 is controlled to 20 ° C. by water cooling, the cooling effect cannot be expected unless the heat conduction efficiency between the long resin film F and the can roll 56 is good.

The wound long resin film F was set on the unwinding roll 51 side of the film forming apparatus, and one end thereof was attached to the winding roll 64 via the can roll 56. In this state, the air in the vacuum chamber 51 was exhausted to 5 Pa using a plurality of dry pumps, and further exhausted to 3 × 10 ⁻³ Pa using a plurality of turbo molecular pumps and cryocoils.

  Next, the rotational driving device is started, and while the long resin film F is being conveyed at a conveyance speed of 3 m / min, argon gas is introduced at 300 sccm and 10 kW of power is applied to the magnetron sputter cathodes 57, 58, 59 and 60. Power control. Further, argon gas was introduced into the can roll 56 at 150 sccm. In this way, a process for continuously forming a seed layer composed of a Ni—Cr film on one side and a Cu film formed thereon on the long resin film F conveyed by roll-to-roll is started. did.

  During the surface treatment, the length on the outer peripheral surface of the can roll 56 into which gas is introduced from the observation window capable of observing the surface of the long resin film F on the outer peripheral surface of the can roll 56 during film formation. When the surface of the long resin film F was observed, the surface of the long resin film F immediately after film formation after passing through the film formation zones of the magnetron sputtering cathodes 57, 58, 59, 60 was easy to appear and parallel to the traveling direction causing wrinkles. The lift of the long resin film F from the outer peripheral surface of the can roll 56 in any direction was not seen. Further, there is no deviation between the conveyance speeds of the can roll 56 and the long resin film F, and the conveyance control can be synchronized.

  For comparison, instead of opening the other end of the gas suction path 27 in the vacuum chamber 51, gas is also introduced into the gas suction path 27 (angle 150 ° to 210 °) and argon is introduced into the can roll 56 at 100 sccm. Except for introducing gas, a film forming process was performed on the long resin film F made of a heat-resistant polyimide film in the same manner as described above.

  During the film formation process, from the observation window capable of observing the surface of the long resin film F on the outer peripheral surface of the can roll 56 during film formation, the gas is introduced on the outer peripheral surface of the can roll 56. When the surface of the long resin film F is observed, it is easy to appear on the long resin film F immediately after film formation after passing through the film formation zones of the magnetron sputtering cathodes 57, 58, 59, 60. In some cases, the long resin film F was slightly lifted from the outer peripheral surface of the can roll 56 in the parallel direction. Furthermore, the conveyance speed of the can roll 56 and the long resin film F may be misaligned, and it is difficult to synchronize the conveyance control, and the conveyance speed of the can roll 56 varies greatly.

DESCRIPTION OF SYMBOLS 10 Cylindrical part 11 Refrigerant circulation part 12 Rotating shaft 13 Bearing 14 Gas introduction path 15 Gas discharge hole 20 Gas rotary joint 21 Rotating ring unit 22 Fixed ring unit 22
23 Gas supply path 24 Gas distribution path 25 Gas connection pipe 26 Gas supply pipe 27 Gas suction path 28 Gas suction pipe 50 Film forming apparatus 51 Vacuum chamber 52 Unwinding roll 53, 63 Free roll 54, 62 Tension sensor roll 55, 61 Feed Roll 56 Can roll 56a Rotation center shaft 57, 58, 59, 60 Magnetron sputtering cathode 64 Winding roll F Long resin film A Holding angle B Angular range within which the heat load is not applied

Claims (16)

For a long substrate conveyed by roll-to-roll in a vacuum chamber, it is a can roll consisting of a cylindrical portion that is partially wrapped around the outer peripheral surface and cooled when performing a surface treatment with a thermal load,
The cylindrical portion includes a plurality of gas introduction paths extending substantially parallel to the rotation center axis and disposed over the entire circumference at substantially equal intervals in the circumferential direction, and the plurality of gas introduction paths. A plurality of gas discharge holes that open to the outer peripheral surface from each of the gas introduction paths located in each of the plurality of regions where the thermal load is applied within the range in which the long substrate is wound. the gas introduction passage located on at least one region not applied heat load between areas consuming adjacent heat load while performing the supply of gas from without the supply of the gas, a range of the elongated substrate is not wound A can roll characterized in that a gas supply valve that operates so as not to supply gas is also provided in a gas introduction path located inside . The gas supply valve is configured by a rotary joint including a rotating ring unit that rotates with the cylindrical portion and a fixed ring unit that is in sliding contact with the rotating ring unit, and the rotating ring unit is connected to each of the plurality of gas introduction paths. There are a plurality of gas supply passages communicating with each other, and one end of each gas supply passage is on the sliding contact surface with the fixed ring unit at the same angular position on the outer peripheral surface of the can roll of the gas introduction passage communicating therewith. The fixing ring unit has a gas distribution path that communicates with the outside of the vacuum chamber, and the gas distribution path is a region where one end of the gas supply path moves on the sliding surface. 2. The can roll according to claim 1, wherein the can roll opens in a region corresponding to a plurality of angular ranges to which a thermal load is applied. It further has a gas suction valve for sucking gas from a gas introduction path located in an area where no thermal load is applied , which is sandwiched between adjacent areas where the thermal load is applied within a range in which the long substrate is wound. The can roll according to claim 1, wherein the can roll.   The gas suction valve includes a gas suction path provided at the fixed ring unit, with one end communicating with the outside of the vacuum chamber and the other end opened at the sliding surface. The other end portion is an angle range corresponding to a region in which the long substrate is wound and the heat load is not applied in a region where the one end portion of the gas supply path moves on the sliding surface. The can roll according to claim 3, wherein the can roll is opened inside.   5. The can roll according to claim 4, wherein one end portion of the gas suction path opens in the vacuum chamber or communicates with a suction device provided outside the vacuum chamber.   A long substrate processing apparatus, wherein the can roll according to claim 1 is mounted.   The long substrate processing apparatus according to claim 6, wherein the thermal load processing is plasma processing or ion beam processing.   The long substrate processing apparatus according to claim 7, wherein a mechanism for performing plasma processing or ion beam processing is opposed to a conveyance path defined by an outer peripheral surface of the can roll.   The long substrate vacuum film forming apparatus according to claim 6, wherein the heat load is a vacuum film forming process using a vacuum film forming unit.   9. The long substrate vacuum film forming apparatus according to claim 8, wherein the vacuum film forming means is magnetron sputtering. A plurality of gas introduction passages that extend over the entire circumference of a long substrate transported by roll-to-roll in a vacuum chamber, extending substantially parallel to the central axis of rotation and spaced substantially evenly in the circumferential direction. And a surface treatment that is subjected to a thermal load while being partially wrapped around and cooled by the outer peripheral surface of a can roll comprising a cylindrical portion having a plurality of gas discharge holes that open to the outer peripheral surface side from each of the plurality of gas introduction paths. A surface treatment method for a long substrate,
Among the plurality of gas inlet passage, the thermal load of the adjacent while performing the supply of gas from the outside of the vacuum chamber to a gas introduction path located in each of the plurality of areas consuming thermal load within a long substrate is wound Gas is not supplied to the gas introduction path located in the area where the thermal load is not applied, which is sandwiched between the areas where the substrate is applied, and gas is also supplied to the gas introduction path located in the range where the long substrate is not wound. A surface treatment method for a long substrate, wherein the supply is not performed . Among the plurality of gas introduction paths, from a gas introduction path located in an area where no thermal load is applied , which is sandwiched between adjacent areas where the thermal load is applied within a range where the long substrate is wound around the can roll The long gas according to claim 11, wherein gas is sucked to remove gas in a gap between the long substrate and the outer peripheral surface of the can roll in a region where a thermal load is not applied to the long substrate. A method for surface treatment of a scale substrate.   The long length according to claim 12, wherein the sucked gas is discharged into the vacuum chamber or discharged to the outside of the vacuum chamber by a suction pump provided outside the vacuum chamber. Substrate surface treatment method.   14. The length according to claim 11, wherein the surface treatment to which the thermal load is applied is a plasma treatment or an ion beam treatment performed on a long substrate wound around an outer peripheral surface of the can roll. A method for surface treatment of a scale substrate.   The surface treatment subject to the thermal load according to claim 11 to 14 is a vacuum film formation treatment performed on a long substrate wound around an outer peripheral surface of the can roll. Film forming method.   The method for forming a long substrate according to claim 15, wherein the vacuum film forming process is a sputtering process.

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