JP5864009B1 - Fine particle detector - Google Patents

Abstract

Even when an autofocus function is not provided, a focal position can be detected with small size and light weight and high reliability. A microparticle detection apparatus includes an irradiation optical system (1) for irradiating light from a light source (8, 12) to a specimen on a disk (6), and light for detecting light from the microparticles in the specimen. A detection optical system, a detection unit for detecting the fine particles, a test sample for detecting the focal position of the light collected by the irradiation optical system (1), the disk (6), and the test sample. A rotational drive system that is housed in a holder (26) and rotates, and the test sample is disposed at a first light scattering film pattern disposed at a first level position and a second level position in the rotational axis direction. The second light-scattering film pattern, and the light detection optical system is capable of detecting light emitted from both the light-scattering film patterns. Based on the light intensity from the light scattering film pattern, It can be detected. [Selection] Figure 1

Description

  The present invention relates to a microparticle detection apparatus.

  Conventionally, as a microparticle detection device, the microparticles developed in the liquid or on the membrane or slide glass are irradiated with light, and fluorescence or scattered light generated from the microparticles is detected, and particle counting or property inspection is performed. There is something to do. Here, the fine particles include inorganic particles, microorganisms, cells, erythrocytes in blood, leukocytes, platelets, vascular endothelial cells, fine cell fragments of the tissue, and the like. The microparticles become a microparticle suspension when in the liquid.

  A flow cytometer is generally used as a method for detecting the fine particles.

  In the flow cytometer, the microparticle suspension is caused to flow along with the sheath liquid through a capillary tube. Then, the type of particle and the size of the particle are classified by irradiating a part of the capillary with laser light and detecting scattered light or fluorescence generated when the fine particle is irradiated with light. For example, by labeling particles with a fluorescent reagent that binds to specific particles, the number of fluorescent particles can be counted to count only the specific particles.

  However, a flow cytometer capable of quantitatively measuring the intensity of scattered light emitted from submicron particles is a large-scale and expensive system.

  In general, the flow cytometer requires a complicated mechanism such as a flow mechanism, which causes deterioration in maintainability and an increase in cost.

  As a method for detecting particles other than the flow cytometer, without using the flow mechanism, image a predetermined range in which microparticles are two-dimensionally distributed, and coefficient the number of microparticles from information of the captured image, Furthermore, there is a method for determining the type and size. In this method, since detection and analysis of particles are performed using a captured image, the flow cytometer is referred to as an image cytometer.

  As an imaging method in the image cytometer, a method of imaging a two-dimensional region of a visual field range with a light source and the imaging device fixed using an imaging device composed of a microscope and a digital camera having a certain visual field range And a method of imaging the particles in the scan region by detecting scattered light or fluorescence while scanning the optical head two-dimensionally.

  In the case of imaging with the above-mentioned microscope and digital camera, high-precision image measurement is possible with particles of 1 μm or more, but when measuring submicron particles, a microscope with a high-magnification objective lens and a high-power lens are used. A sensitive digital camera (that is, low noise and wide dynamic range) is required, which makes the system very expensive. In the case of submicron particles, the wavelength of light and the size of the particles are equivalent, so that the imaging performance is degraded due to the diffraction limit, making it difficult to accurately determine the particle size.

  Furthermore, if a fluorescence microscope system is used as the microscope, particles can be easily detected. However, similarly, in the case of submicron particles, the wavelength of light is equal to the size of the particles, and thus the particle size cannot be accurately determined.

  On the other hand, in a system that detects scattered light or fluorescence while scanning the optical head having the laser, the laser is collected while irradiating the laser light on the particle and detecting the scattered light or fluorescence generated from the particle. An optical head carrying light is scanned two-dimensionally to form an image.

  Thus, in a system that detects light while scanning the optical head relative to the sample, when detecting submicron particles, the laser spot diameter is equal to or smaller than the particle size. More than that. For this reason, the image obtained as a result of the two-dimensional scan is not an image in which each particle is resolved, and it is difficult to directly measure the size of the particle from the image. However, even if the laser beam irradiation spot is larger than the particle size, the intensity of the scattered light generated from the particle varies depending on the particle size, so that the particle diameter can be determined from the intensity of the scattered light. The reason is that there is a correlation between the particle diameter and the scattered light intensity.

  In that case, a detector that detects scattered light with high sensitivity (a detector with low noise and a wide dynamic range) and a laser light source are required, but a microscope with a high-magnification objective lens and a high-sensitivity digital camera are required. Compared to the system to be used, an inexpensive system configuration is possible.

  However, the conventional system that detects light while scanning the optical head relative to the sample has the following problems.

  That is, in the system that detects the scattered light from the sample by performing the above two-dimensional scan, it is necessary to condense and reduce the irradiation spot in order to increase the detection sensitivity and resolution. Since LED (Light Emitting Diode: light emitting diode) and a lamp light source cannot fully condense, it is necessary to use a laser light source. In the case of the laser light source, a semiconductor laser is advantageous because it is small and inexpensive. However, depending on the wavelength band, it may be expensive or only a solid laser having a volume larger than that of the semiconductor laser may be obtained. Therefore, depending on the wavelength band, there may be an expensive system.

  Further, in the system that performs the two-dimensional scan, it is necessary to scan the sample or the optical head two-dimensionally, and time for acceleration / deceleration in the reciprocating operation of the sample or the optical head is required. Therefore, there is a problem that the scanning time becomes long when the scanning interval becomes fine.

  Therefore, in order to solve the problems of the system that performs such a two-dimensional scan, an analysis apparatus using disk cytometry disclosed in Japanese Patent Laid-Open No. 2002-310886 (Patent Document 1) has been proposed.

  In Patent Document 1, a specimen containing particle-like substances such as cells, fungus bodies, viruses, DNA, mitochondria is injected into a plate-like sample container. Then, the sample container is centrifuged to form a particle-like substance distribution in the sample container to obtain a preparation. Thereafter, the sample container, which is the preparation, is irradiated and scanned with laser light, and at least one set of data obtained from the particle-like substance is analyzed data. Like to get as.

  That is, in the above-mentioned Patent Document 1, an analysis apparatus having both an image acquisition function and a sampling function for cells or the like is configured by combining a centrifugal separation method and a fluorescent labeling method such as flow cytometry.

  In this analyzer, the sample is layered on a circular disk (disk) sample container, centrifuged at a certain number of revolutions for a certain period of time, and then the sample-like substances arranged according to a certain gradient are rotated in the sample container. In this way, scanning by laser irradiation is performed in the radial direction, and fluorescence intensity, scattered light intensity, and number are captured as analysis information. Further, depending on the purpose, the optical system of the confocal laser microscope acquires image information at the position based on the position information of the disk from the sensor. In addition, the information of the said detection position is read by the unevenness | corrugation carved in the end surface of the said sample container.

  However, the disc cytometry analyzer disclosed in Patent Document 1 has the following problems.

  That is, when scanning while rotating the disk-shaped sample container, a part of the particle-like substance as a sample is caused to have a focal depth of the laser light as excitation light due to surface blurring that occurs when the sample container rotates. If it deviates from the above, there is a problem that defocusing occurs at that portion, and an image suitable for analyzing the particle size and the count cannot be acquired. Therefore, in order to perform imaging without causing defocusing in the entire region, it is necessary that the thickness of the particle-like substance be present at least within the focal depth of the laser beam during the rotation of the sample container.

As a method for adjusting the focus position, if the optical head is small like an optical disk reading device, it is common to mount a focus position correction function on the optical head. However, in the analyzer based on disc cytometry disclosed in Patent Document 1,
(1) Cost increases (2) In the case of a confocal system that acquires a plurality of information, the configuration may be complicated.

  Depending on the design of the optical system, the depth of focus can be increased. However, if the depth of focus is increased too much with respect to the thickness of the sample (the above particle-like substance), the optical parts such as lenses to be used are limited, and the possibility of taking in substances other than the sample and stray light is increased. There are also harmful effects.

  From the above, the depth of focus is designed to be the minimum necessary size calculated by the total value of the surface blurring amount of the sample container (optical disk) and the thickness of the sample (the particle-like substance). It is desirable that the focal position of the light (the laser beam) coincides with the center of the sample thickness in the sample container. More specifically, if the sample container (optical disc) is shaken when the sample container (optical disc) is rotated, the height at which the upper end of the sample passes when the sample container (optical disc) is actually rotated. It is desirable to adjust the focal position of the excitation light (the laser light) to the center position with the height at which the lower end of the sample passes.

  That is, in the microparticle detection apparatus based on the disc cytometry, it is necessary to check whether the focal position of the excitation light such as the laser beam is appropriate and to adjust the focal position as necessary. .

  Therefore, in the scanner having the confocal optical system disclosed in Japanese Patent Laid-Open No. 3928884 (Patent Document 2), the position of the objective lens is adjusted.

  That is, the light emitting material is set at the reference position on the surface of the distance measuring device, scanned with laser light, the light emitting material set at the reference position is excited, and the fluorescence emitted from the light emitting material is detected. The position of the objective lens of the confocal optical system is changed at a predetermined movement pitch while photoelectrically detecting by the detector, and the focus position of the objective lens is determined based on the signal intensity of the fluorescence detected by the photodetector. Is determined and stored in the non-volatile memory, and the position data stored in the non-volatile memory is corrected by the control means based on the stored focus position data of the objective lens, and the corrected Based on the focus position data of the objective lens, a drive signal is output to the drive means, and the objective lens is moved to adjust the position of the objective lens. I have to so that.

JP 2002-310886 A Japanese Patent Laid-Open No. 3928846

  However, the scanner having the conventional confocal optical system disclosed in Patent Document 2 has the following problems.

  That is, in the “scanner having a confocal optical system”, the driving unit (stepping motor) is driven to move the objective lens in the optical axis direction based on the corrected focus position data of the objective lens. Thus, the focus position of the objective lens is adjusted.

  Therefore, in the scanner having the confocal optical system, means for determining the focus position of the objective lens based on the signal intensity of the fluorescence, and the objective constituting the confocal optical system detected by the photodetector. Since a stepping motor that moves the lens in the optical axis direction is required, the fluorescence detection optical system becomes complicated and large. Therefore, there is a problem that the entire apparatus of the “scanner having a confocal optical system” becomes large.

  Furthermore, there is a problem that the fluorescence detection optical system becomes heavy and cannot be scanned at high speed.

  In addition, when the fluorescence detection optical system does not have an autofocus function, a slight mechanical shift of the apparatus that can be caused by vibration during conveyance or vibration during repeated operation is directly a focal position shift of the luminescent material, There is a problem of deteriorating measurement accuracy.

  Further, at the time of measurement, it is necessary to adjust the focal height to the center of the thickness of the light emitting material as a specimen. However, when the focal depth of the detection optical system is designed to be large, there is a problem that it is difficult to manually adjust to a predetermined focal height during focus adjustment.

  SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a microparticle detection apparatus that is small and lightweight and can detect a focal position in the thickness direction of a specimen with high reliability even when it does not have an autofocus function.

In order to solve the above problems, a microparticle detection apparatus according to the present invention includes:
A disc having a specimen injection part into which a specimen containing fine particles is injected;
A light source;
An irradiation optical system for condensing and irradiating the light emitted from the light source with respect to the specimen in the disk;
A light detection optical system for detecting light emitted from the microparticles in the specimen by the light irradiation;
Based on the intensity of light from the microparticles detected by the photodetection optical system, a detection unit that detects the microparticles;
A disk-shaped test sample for detecting whether the focal position of the light collected by the irradiation optical system is in the direction of the rotation axis of the disk;
A holder for accommodating the disk and the test sample, and a rotational drive system for rotating the disk and the test sample,
The test sample is a position where light is irradiated by the irradiation optical system, and the first light scattering film pattern arranged at the first level position in the rotation axis direction is different from the first level. A second light scattering film pattern disposed at two levels,
The light detection optical system is capable of detecting light emitted from the first light scattering film pattern and light emitted from the second light scattering film pattern in the test sample by irradiation of the light,
The detection unit is capable of detecting the focal position based on the intensity of light from the first light scattering film pattern and the second light scattering film pattern detected by the light detection optical system. It is a feature.

Moreover, in the microparticle detection apparatus of one embodiment,
The detection unit compares the light intensity from the first light scattering film pattern detected by the light detection optical system with the light intensity from the second light scattering film pattern, and based on the comparison result The direction of deviation from the reference position in the rotational axis direction at the focal position and the amount of deviation can be detected.

Moreover, in the microparticle detection apparatus of one embodiment,
An intermediate position in the rotation axis direction between the first light scattering film pattern and the second light scattering film pattern of the test sample is set as the reference position.

Moreover, in the microparticle detection apparatus of one embodiment,
The position of the disc in the specimen injection portion in the rotation axis direction corresponds to the intermediate position in the rotation axis direction of the first light scattering film pattern and the second light scattering film pattern of the test sample.

Moreover, in the microparticle detection apparatus of one embodiment,
The test sample is a position where light is irradiated by the irradiation optical system, and is a third position arranged at an intermediate position in the rotation axis direction between the first light scattering film pattern and the second light scattering film pattern. It has a light scattering film pattern.

Moreover, in the microparticle detection apparatus of one embodiment,
In the test sample, a plurality of light scattering film pattern groups including the first light scattering film pattern and the second light scattering film pattern are arranged at different positions on the circumference around the rotation axis. .

  As is clear from the above, the microparticle detection device of the present invention is configured such that the first light scattering film pattern disposed at the first level position in the rotation axis direction and the second level position different from the first level. Based on the intensity of light from the first light scattering film pattern and the second light scattering film pattern detected by the light detection optical system using a test sample having a second light scattering film pattern disposed on The focus position of the light condensed by the irradiation optical system can be detected by the detection unit.

  Therefore, it is possible to determine not only the deviation in the rotation axis direction but also the deviation direction in the test sample from the relationship of the light intensity from the light scattering film patterns arranged at two different levels. Become.

  On the other hand, when the light scattering film pattern exists only at one level in the rotation axis direction, the light scattering film pattern is detected by detecting the intensity of light from the light scattering film pattern. Although it can be determined that the position is shifted, it cannot be determined in which direction the position is shifted.

  That is, according to the present invention, even when the autofocus function is not provided, the focal position in the thickness direction of the specimen can be detected with a small size and a light weight and high reliability.

It is a figure which shows schematic structure in the microparticle detection apparatus of this invention. It is the external appearance perspective view and circumferential direction fragmentary sectional view of a test sample. It is a figure which shows the signal strength by the scan to the circumferential direction of a test sample. It is the top view and circumferential direction fragmentary sectional view of a test sample different from FIG. It is a figure which shows the position change of the sample injection part by the tilt of a disc, and a focal depth. It is a schematic block diagram of the rotational drive system in the microparticle detection apparatus different from FIG. It is explanatory drawing of the surface blur amount measuring method using the test sample shown in FIG.

  Hereinafter, the present invention will be described in detail with reference to the illustrated embodiments.

-1st Embodiment FIG. 1: is a figure which shows schematic structure of the microparticle detection apparatus of this Embodiment. The microparticle detection apparatus includes a disk into which a specimen is injected, a rotation drive system that rotates the disk, a light detection optical system that detects scattered light or fluorescence, and a drive mechanism that drives the light detection optical system in the radial direction. The outline is composed of the following.

  In FIG. 1, 1 is a light source device, 2 is an objective lens, 3 is a first detection device, and 4 is a second detection device. The light source device 1, the objective lens 2, the first detection device 3, and the second detection device 4 are housed in a frame to constitute an optical module 5. A circular disk 6 is disposed above the optical module 5 so as to face the objective lens 2. In the disk 6, for example, a suspension, a gel support, or a membrane in which fine particles labeled with a fluorescent substance are distributed. Or the like is encapsulated as a sample (the specimen) 7.

  The light source device 1 of the optical module 5 is provided with a first semiconductor laser 8 that is an example of the light source. On the optical axis of the first semiconductor laser 8, a first lens 9 and a spot size adjusting lens 10 are provided. And the 1st aperture 11 is arranged in this order. Furthermore, in addition to the first semiconductor laser 8, a second semiconductor laser 12 is disposed as the light source that emits a laser beam having a second wavelength different from the first wavelength of the laser beam emitted from the first semiconductor laser 8. doing. Further, a second lens 13 for collimating the laser beam from the second semiconductor laser 12 is disposed. A first dichroic mirror that transmits the laser light having the first wavelength and reflects the laser light having the second wavelength is transmitted to the intersection between the optical axis of the first semiconductor laser 8 and the optical axis of the second semiconductor laser 12. 14 is arranged. Here, the first semiconductor laser 8, the first lens 9, the spot size adjusting lens 10, the first aperture 11, the second semiconductor laser 12, the second lens 13 and the first dichroic mirror 14 are accommodated in one case. The light source device 1 which is an example of the irradiation optical system is configured.

  Further, on the optical axis of the first semiconductor laser 8, a prism 15 that reflects the light transmitted through the first dichroic mirror 14 toward the objective lens 2 is disposed. Further, a second dichroic mirror 16 that reflects the light from the prism 15 so as to enter the objective lens 2 is disposed at the intersection of the light reflected by the prism 15 and the optical axis of the objective lens 2. Here, the second dichroic mirror 16 transmits the fluorescence from the sample 7 and reflects the scattered light.

  The “scattered light” referred to in the present invention is light in which the light emitted from the first semiconductor laser 8 or the second semiconductor laser 12 is isotropically scattered from the irradiated position of the sample 7 to the surroundings. Yes, the light has the same wavelength as the emitted light. On the other hand, “fluorescence” means that the light emitted from the first semiconductor laser 8 or the second semiconductor laser 12 irradiates the sample 7 to excite the fluorescent substance labeling the microparticles, and irradiates the sample 7. It is fluorescence scattered isotropically from a location to the surroundings, and is light having a wavelength different from that of outgoing light.

  Here, although not described in detail, the objective lens 2 is stored in a lens holder (not shown), and is moved in the optical axis direction by a drive unit (not shown) such as a stepping motor, so that the focal position is adjusted. It can be changed. The spot size adjustment lens 10 is stored in a lens holder (not shown), and is moved in the optical axis direction by a drive unit (not shown) so that the spot size can be adjusted.

  Further, in FIG. 1, a sample 7 that is condensed by the objective lens 2 and converted into parallel light is sequentially from the second dichroic mirror 16 side below the second dichroic mirror 16 on the optical axis of the objective lens 2. Bandpass filter 17 that attenuates light (light having a wavelength different from that of fluorescence), a third lens 18 that collects fluorescence that has passed through bandpass filter 17, and stray light of fluorescence that has passed through third lens 18 The 2nd aperture 19 which cuts is arranged. Furthermore, a first detector 20 including a detection element such as a photomultiplier tube (PMT) that detects fluorescence that has passed through the second aperture 19 is disposed below the second aperture 19 on the optical axis of the objective lens 2. Has been. Here, the second aperture 19 and the first detector 20 are housed in one case and constitute a first detection device 3 which is an example of the light detection optical system.

  On the left side of the prism 15 in FIG. 1 on the optical axis connecting the prism 15 and the second dichroic mirror 16, the sample 7 condensed by the objective lens 2 and converted into parallel light in order from the prism 15 side. ND (attenuating) filter 21 that attenuates scattered light from the ND filter, a fourth lens 22 that condenses the scattered light that has passed through the ND filter 21, and a first lens that cuts stray light from the scattered light that has passed through the fourth lens 22. Three apertures 23 are arranged. Further, on the left side of the third aperture 23, a second detector 24 including a detection element such as the PMT for detecting scattered light that has passed through the third aperture 23 is disposed. Here, the 3rd aperture 23 and the 2nd detector 24 are stored in one case, and constitute the 2nd detection device 4 which is an example of the above-mentioned optical detection optical system. Note that three or more detection devices may be added by adding dichroic mirrors.

  In the above configuration, a plurality of light sources of the first semiconductor laser 8 and the second semiconductor laser 12 are mounted, but a plurality of light sources are not necessarily required.

  The disk 6 is configured to be transparent and circular, and is accommodated in a circular dish-shaped holder 26 fixed to the rotary shaft 25 and fixed to the rotary shaft 25. The rotation shaft 25 is rotatable by a spindle motor 27 as an example of the rotation drive system. On the other hand, the optical module 5 can be moved stepwise by the drive mechanism in the radial direction of the disk formed by the disk 6. The drive mechanism of the optical module 5 is not particularly limited. For example, the frame of the optical module 5 is configured to be movable by being guided by the guide rail disposed in the radial direction by a timing belt or the like reciprocated in the radial direction by a stepping motor or the like.

  As described above, the disk 6 is formed in a circular shape. The optical module 5 is set to move one step each time the disk 6 makes one revolution. However, for the disc-like disc 6, in order to perform the above-described operation while the disc 6 is continuously rotated, a band-like non-detection area having a certain width and extending in the radial direction is set on the disc 6 and the objective is set. It is necessary to move the optical module 5 by one step while the spot of the excitation light from the lens 2 moves in the non-detection region.

  If there is no problem in analyzing the obtained fluorescent image, the optical module 5 may be continuously moved while the disk 6 is continuously rotated to scan in a spiral manner.

  In the above configuration, when light detection is performed, the optical module 5 is moved in the radial direction of the disk 6 while rotating the disk 6 to detect fluorescence or scattered light from the microparticles in the sample 7.

  Hereinafter, as an example, the case of fluorescence detection for detecting the fluorescence will be described as an example.

  Of the first semiconductor laser 8 and the second semiconductor laser 12 of the light source device 1, a semiconductor laser that emits a laser beam having a wavelength capable of exciting the fluorescent substance, for example, a laser having a first wavelength from the first semiconductor laser 8. Light is emitted.

  Laser light (excitation light) emitted from the first semiconductor laser 8 is converged by the first lens 9, the spot size adjusting lens 10 and the first aperture 11, and passes through the first dichroic mirror 14. Next, the light is reflected by the prism 15 and the second dichroic mirror 16, passes through the objective lens 2 and the disk 6, and is collected at one point on the lower surface of the sample 7. In that case, the length of the prism 15 in the longitudinal direction (horizontal direction) is short, the width in the direction orthogonal to the longitudinal direction is narrow, and the excitation light from the first semiconductor laser 8 is near the optical axis of the objective lens 2. It passes through only (excitation light transmission part). Thus, when focused light is irradiated to the microparticles in the sample 7, the fluorescent material that labels the microparticles irradiated with the focused light is excited, and the portion from the irradiated portion of the focused light to the surroundings, etc. Directionally scattered fluorescence occurs.

  Thus, the component of the emitted fluorescence that has passed through the disk 6 and entered the objective lens 2 passes through the objective lens 2, passes through the second dichroic mirror 16, and passes through the bandpass filter 17, the third lens 18, and the like. It passes through the second aperture 19 and is detected by the first detector 20. The signal detected by the first detector 20 is subjected to processing such as AD conversion by a built-in AD converter or the like, and then sent to a PC (personal computer) which is an example of the detection unit. . Thus, the fluorescence intensity distribution at each measurement point on the sample 7 is recorded in the internal memory or the like. Further, when the particle count is performed based on the detection signal, the particle count data is recorded in the internal memory or the like.

  The second aperture 19 is arranged to cut spatial stray light. It also functions as a confocal aperture and removes unnecessary reflected light and stray light from areas other than the surface where the sample 7 exists. For example, since the reflected light generated on the surface of the disk 6 or the lens surface is deviated from the focal position of the objective lens 2, it becomes light spread at the position of the second aperture 19 by the optical system following the objective lens 2. It cannot pass through the second aperture 19 well.

  Thus, by performing the detection as described above while rotating the disk 6, the fluorescence intensity at each measurement point is recorded in the internal memory or the like of the PC.

  In the above description, the scattered light detection by the first wavelength laser light from the first semiconductor laser 8 has been described. However, the second wavelength laser light from the second semiconductor laser 12 can also be detected by the first wavelength. Except for being reflected by the one dichroic mirror 14, the same is true. In the case of the scattered light detection for detecting the scattered light, the semiconductor laser that emits the laser light having the wavelength reflected by the second dichroic mirror 16 is used, and the scattered light reflected by the second dichroic mirror 16 is used. Except for detection by the second detection device 4, the same is true.

  The disk 6 has a structure in which two transparent substrates each provided with a fixing center hole are bonded to each other through a spacer. A circular groove is formed in the spacer, and the circular groove becomes a donut-shaped space by closing both side surfaces of the spacer with the two substrates, and the sample (the specimen) 7 is injected into the spacer. It becomes a specimen injection part. The specimen injection portion has a thickness corresponding to the thickness of the spacer.

  Then, as described above, the focal depth of the laser beam (excitation light) is designed to be the minimum necessary size calculated by the total value of the surface blur amount of the disk 6 and the thickness of the specimen injection portion, It is desirable that the focal position of the laser light (excitation light) coincides with the center of the thickness of the specimen injection portion in the disk 6.

  Therefore, in the present embodiment, using a disk-shaped test sample, whether the focal position of the laser beam (excitation light) coincides with the center of the thickness of the specimen injection portion in the disk 6 or not. Is determined.

  FIG. 2 shows an external perspective view of the test sample 31 (FIG. 2A) and an enlarged partial cross-sectional view in the circumferential direction (FIG. 2B). The basic configuration of the test sample 31 is the same as the basic configuration of the disk 6, and two transparent substrates 33 and 34 each having a center hole 32 for fixing at the center are provided via a spacer 35 formed of a transparent body. And have a laminated structure. However, the circular groove for the specimen injection part is not formed in the spacer 35 of the test sample 31. Instead, as shown in FIG. 2 (a), the upper and lower surfaces of the spacer 35 are alternately arranged at four positions shifted by approximately 90 ° on the outer periphery of the test sample 31 as shown in FIG. 2 (b). A total of six light scattering film patterns 36 are patterned by three. Hereinafter, the light scattering film pattern 36 on the upper surface is referred to as an upper light scattering film pattern 36a, and the light scattering film pattern 36 on the lower surface is referred to as a lower light scattering film pattern 36b.

  The test sample 31 having the above configuration is accommodated in the holder 26 in place of the disk 6 in the microparticle detection apparatus shown in FIG. 1 when determining the focal position of the laser beam (excitation light), and the spindle motor 27. It is fixed with respect to the rotating shaft 25 that is rotated.

  The laser light emitted from the first semiconductor laser 8 or the second semiconductor laser 12 is collected in the spacer 35 of the test sample 31 by the objective lens 2 in the same manner as in the case of fluorescence detection or scattered light detection on the disk 6. Light up. Then, the fluorescence or scattered light emitted from the upper light scattering film pattern 36a and the lower light scattering film pattern 36b of the test sample 31 is received by the first detection device 3 or the second detection device 4, and the first detector 20 or the first detection device 4 is received. The fluorescence or scattered light received by the two detectors 24 is AD converted and measured as signal intensity. Here, when fluorescence is emitted from the upper light scattering film pattern 36a and the lower light scattering film pattern 36b, the light scattering films of the upper light scattering film pattern 36a and the lower light scattering film pattern 36b may contain a fluorescent substance. That's fine.

  In the following description, in order to simplify the description, the light scattering films of the upper light scattering film pattern 36 a and the lower light scattering film pattern 36 b do not contain a fluorescent substance, and are emitted from the first semiconductor laser 8. A case will be described in which scattered light emitted from the upper light scattering film pattern 36a and the lower light scattering film pattern 36b is received by the second detector 24 of the second detection device 4 based on the laser light.

  FIG. 3 shows that when the position of the optical module 5 is fixed and the test sample 31 is rotated, the second detector 24 of the second detection device 4 in the optical module 5 causes the test sample 31 to move in the tangential direction (circumference). Signal intensity of scattered light obtained by scanning in the direction). In FIG. 3, the peak of each signal intensity and the upper light scattering film pattern 36 a and the lower light scattering film pattern 36 b in the “partial enlarged sectional view in the circumferential direction” of the test sample 31 are disclosed in association with each other. Yes.

  In each “enlarged partial sectional view in the circumferential direction” in FIG. 3, a curve indicated by a broken line is within the focal depth d of the laser light emitted from the first semiconductor laser 8 and condensed by the objective lens 2. An envelope of a group of rays (not shown) is shown. That is, the narrowest position of the curve indicated by the broken line is the focal position.

  When the focal depth d of the laser beam substantially matches the “total value of the thickness of the spacer 35 and the surface blur amount in the test sample 31”, the signal intensity obtained at that time is the focal position of the laser beam. The distribution shown in FIG.

  In FIG. 3, FIG. 3A shows the case where the focal position of the laser beam is at the center of the spacer 35 in the test sample 31 in the thickness direction. In this case, as the test sample 31 rotates, the upper light scattering film pattern 36a and the lower light scattering film pattern 36b are focused to the same extent. Therefore, the signal intensity detected by the second detector 24 is substantially equal between the upper light scattering film pattern 36a and the lower light scattering film pattern 36b.

  FIG. 3B shows a case where the focal position of the laser beam is biased downward in the thickness direction of the spacer 35 in the test sample 31. In this case, the lower light scattering film pattern 36b is focused. Therefore, the signal intensity detected by the second detector 24 is larger in the lower light scattering film pattern 36b than in the upper light scattering film pattern 36a.

  Although not shown, when the focal position of the laser beam is biased upward in the test sample 31, the upper light scattering film pattern 36a is focused on the upper light scattering film pattern 36a. The signal strength of becomes larger.

  FIG. 3C shows a case where the focal position of the laser beam is deviated downward from the thickness of the spacer 35 in the test sample 31. In this case, the signal intensity detected by the second detector 24 is only the signal intensity from the lower light scattering film pattern 36b located within the focal depth d.

  Although not shown, when the focal position of the laser beam deviates upward from the thickness of the spacer 35 in the test sample 31, the upper light scattering film pattern 36a is located within the focal depth d. Only the signal intensity from the upper light scattering film pattern 36a is detected.

  Accordingly, the signal intensities from the upper light scattering film pattern 36a and the lower light scattering film pattern 36b detected by the second detector 24 are recorded in the internal memory of the PC and analyzed by the PC. By doing so, it is possible to inspect whether or not the focal position of the laser light emitted from the first semiconductor laser 8 and condensed by the objective lens 2 is an appropriate position.

  In this case, the irradiation optical system and the light detection optical system used at the time of normal fine particle detection are used as they are, and the test sample 31 is accommodated in the holder 26 instead of the disk 6. Then, the signal intensity of the scattered light from the upper light scattering film pattern 36a and the lower light scattering film pattern 36b formed on the test sample 31 is detected by the first detector 20 or the second detector 24 and analyzed by the PC. Just do it.

  Therefore, according to the present microparticle detection apparatus, it is possible to detect the focal position in the thickness direction of the specimen injection portion with a small size, light weight, and high reliability without having an autofocus function.

  Further, it is not necessary to design the focal depth d to be larger than necessary in consideration of the surface blur of the disk 6, and stray light can be prevented.

  The number and interval between the upper light scattering film pattern 36a and the lower light scattering film pattern 36b are not limited to those shown in FIG. 2, and may be changed as appropriate. In the present embodiment, the upper light scattering film pattern 36a and the lower light scattering film pattern 36b are formed on the upper surface and the lower surface of the spacer 35 having a thickness corresponding to the thickness of the specimen injection portion, and the substrate. Although it has the structure covered with 33,34, this invention is not limited to this. In short, it is only necessary to arrange them alternately in a transparent disk at a vertical interval corresponding to the thickness of the specimen injection portion.

Second Embodiment The present embodiment relates to a structure different from the first embodiment in the test sample 31. Therefore, the schematic configuration of the microparticle detection apparatus using the test sample of the present embodiment is the same as that of the microparticle detection apparatus shown in FIG. 1 in the first embodiment. Therefore, in the following description, the microparticle detection apparatus shown in FIG. 1 is used as necessary.

  However, in the microparticle detection apparatus in the present embodiment, the first detector 20 of the first detection apparatus 3 and the second detector 24 of the second detection apparatus 4 are configured to be removable.

  The test sample in the present invention is not limited to the structure of the test sample 31 shown in the first embodiment.

  For example, in a general confocal microscope, information on the focal position only (that is, information on the light (scattered light) emitted from the focal position portion of the sample) reaches the photodetector. A resolution in the thickness direction of the sample is obtained by installing an aperture in front of the lens. In this case, since the position of the aperture on the optical axis changes depending on the position (depth) in the thickness direction where the excitation light is irradiated on the sample, first, the depth at which the excitation light is irradiated, that is, the sample stage It is necessary to decide the height.

  However, when the aperture position is not adjusted, the aperture is not positioned at an appropriate position. Therefore, when the scattered light does not pass through the aperture, the focus alignment of the excitation light and the scattered light pass through the aperture. In this case, there arises a problem that it cannot be separated from the focal point alignment of the excitation light. For this reason, it is difficult to quantitatively determine whether or not the focal position of the excitation light is appropriate.

  Therefore, in the present embodiment, the pattern of the scattering film is also formed at an intermediate position in the thickness direction between the upper light scattering film pattern 36a and the lower light scattering film pattern 36b in the test sample 31 of the first embodiment. .

  FIG. 4 shows a plan view (FIG. 4A) of the test sample 41 in the present embodiment and an enlarged partial cross-sectional view in the circumferential direction (FIG. 4B). The basic configuration of the test sample 41 has a single transparent substrate 42 provided with a fixing center hole 43 in the center. Then, as shown in FIG. 4 (b), an upper light scattering film pattern 44a and a lower light scattering film pattern 44b are formed on the upper and lower surfaces of the substrate 42, respectively, at four positions shifted by approximately 90 ° on the outer peripheral portion of the substrate 42. Three first regions 45 patterned by facing the two light scattering film patterns 44 to each other are provided at predetermined intervals. Further, adjacent to the first region 45, five second regions 47 in which one medium light scattering film pattern 46 is patterned are provided between the upper and lower surfaces. Further, three blank third regions 48 where no light scattering film pattern is provided are provided between the second regions 47.

  In the case where fluorescence is emitted from the upper light scattering film pattern 44a, the lower light scattering film pattern 44b, and the middle light scattering film pattern 46, each light scattering film may contain a fluorescent material.

  Determination of the focal position of the laser beam using the test sample 41 having the above configuration is performed as follows.

  First, the test sample 41 is accommodated in the holder 26 in the fine particle detection apparatus shown in FIG. 1 and fixed to the rotating shaft 25 rotated by the spindle motor 27. At this time, provisionally, the height of the test sample 41 in the direction of the rotation axis 25 is uniquely determined with reference to the optical design value or the like, so that the first light scattering film pattern 46 in the test sample 41 is positioned at the first position. The focal position of the laser beam from the semiconductor laser 8 is generally adjusted.

  Next, the second detector 24 (that is, the PMT) of the second detection device 4 is removed and replaced with an optical power meter. Then, the three-dimensional position of the third aperture 23 corresponding to the removed second detector 24 is adjusted so that the amount of light received by the optical power meter is maximized. In this case, since the focal position of the laser light is substantially aligned with the position of the medium light scattering film pattern 46, the maximum amount of light received by the optical power meter is the scattered light from the medium light scattering film pattern 46.

  Here, the reason why the optical power meter is used instead of the PMT for the three-dimensional position adjustment of the third aperture 23 is that all scattered light from the test sample 41 is detected regardless of its wavelength. For this purpose, a heat conversion type optical power meter whose sensitivity is constant in a wide optical wavelength band is desirable.

  Thus, the three-dimensional position adjustment of the third aperture 23 is performed quantitatively.

  Finally, the removed second detector 24 is installed again in the second detection device 4 that is the removal source. Then, the focal position of the laser beam is finely adjusted by adjusting the spot size of the laser beam from the first semiconductor laser 8 with the spot size adjusting lens 10. In this case, the signal intensity from the medium light scattering film pattern 46 and the lower light scattering film pattern 44b of the test sample 41 is detected by the second detector 24 in the same manner as in the first embodiment. Then, the focal position of the laser beam is finely adjusted so that the signal intensity of the intermediate light scattering film pattern 46 is maximized.

  Here, if the fine adjustment of the focal position of the laser beam is performed on the short-distance side with respect to the position of the medium light scattering film pattern 46 that is substantially matched, the light scattering film pattern of the test sample 41 may be medium light. The scattering film pattern 46 and the lower light scattering film pattern 44b may be present, and the upper light scattering film pattern 44a is actually unnecessary. However, assuming that the front and back are reversed when the test sample 41 is accommodated in the holder 26, it is desirable that the light scattering film pattern is also present at a position opposite to the lower light scattering film pattern 44b.

  Therefore, in the present embodiment, the upper light scattering film pattern 44a and the lower light scattering film pattern 44b are not alternately arranged in the circumferential direction as shown in FIG. 2 (b) but as shown in FIG. 4 (b). The substrate 42 is disposed so as to overlap the upper and lower surfaces. In this way, when the upper light scattering film pattern 44a is accommodated on the lower side when the test sample 41 is accommodated in the holder 26, the upper light scattering film pattern 44a can be made to function as the lower light scattering film pattern. It is.

  In the above description, the focal position of the laser beam from the first semiconductor laser 8 is finely adjusted by the spot size adjusting lens 10. However, the present invention is not limited to the spot size adjustment lens 10, and the focal position of the laser beam can be finely adjusted by a collimator lens.

  As described above, according to the present embodiment, it is possible to appropriately adjust the position adjustment of the aperture and the fine adjustment of the focal position of the laser beam quantitatively.

Third Embodiment The present embodiment relates to a case where the tilt of the holder 26 that accommodates the disk 6 exceeds an allowable amount. Therefore, the schematic configuration of the microparticle detection apparatus using the test sample of the present embodiment is the same as that of the microparticle detection apparatus shown in FIG. 1 in the first embodiment. Therefore, in the following description, the microparticle detection apparatus shown in FIG. 1 is used as necessary.

  When the aperture diameter described in the second embodiment is large due to the design of the microparticle detection apparatus (for example, when a certain amount of stray light is allowed by image processing or other methods), the height of the disk 6 is Even if it changes slightly (that is, within an allowable range), if the predetermined light amount can be detected by the first detector 20 or the second detector 24, it is determined that the minute particles can be detected. be able to.

  However, the tilt or height (position in the direction of the rotary shaft 25) of the disk 6 may change beyond the allowable amount due to aging deterioration of the microparticle detection device, rattling during transportation, or the like. In that case, if the height of the disk 6 is automatically adjusted, the lifetime of the microparticle detection device can be extended.

  For example, consider the case where the tilt of the disk 6 changes as shown in FIG. Here, in FIG. 5, the disk 6 has a structure in which two transparent substrates 51 and 52 are bonded via a transparent spacer 53. The thickness D of the spacer 53 is the thickness of the specimen injection portion (that is, the specimen). Similarly to the case of FIG. 3, a continuous triangle indicated by a broken line indicates a group of rays (not shown) within the focal depth d of the laser light emitted from the first semiconductor laser 8 and condensed by the objective lens 2. ). That is, the narrowest position 54 of the continuous triangle indicated by the broken line is the focal position.

  Here, the focal depth d of the laser beam is set to be slightly wider than the thickness D of the specimen injection portion (specimen) without taking into account the tilt of the disk 6 so much. Further, it is assumed that the focal position 54 of the laser beam is shifted slightly above the intermediate position in the thickness direction of the specimen injection portion (specimen). In this case, as shown in FIG. 5 (a), when the disk 6 is not tilted, all of the specimen injection part (specimen) is within the focal depth d, and the fine particles are detected with high accuracy. It is possible.

  However, as shown in FIG. 5B, when the disk 6 is tilted beyond an allowable amount, the focal position 54 of the laser beam is more than the intermediate position in the thickness direction of the specimen injection portion (specimen). Due to the slight upward displacement, the lower part A of the sample injection part (sample) deviates from the depth of focus d. In this case, fine particles cannot be detected with high accuracy at the current focal position 54.

  In this case, as shown in FIG. 5C, the position of the disk 6 in the direction of the rotation axis 25 is set so that the focal position 54 of the laser beam is an intermediate position in the thickness direction of the specimen injection portion (sample). Adjust it. That is, in this case, as indicated by the white arrow, the disk 6 is pushed upward in the direction of the rotation axis 25. By doing so, it is possible to accurately measure the specimen at a predetermined focal position.

  Therefore, in the present embodiment, the measurement of the focal position of the laser beam is performed using the test sample 31 as the calibration, as in the case of the first embodiment, before the measurement. As a result, when the upper light scattering film pattern 36a and the lower light scattering film pattern 36b are not captured within the depth of focus d (see FIG. 3A), or as shown in FIG. As described above, when the predetermined signal intensity cannot be obtained, the height in the rotation axis direction of the holder 26 accommodating the test sample 31 is moved up and down by the stepping motor as the calibration mode.

  FIG. 6A is a schematic configuration diagram of the rotational drive system in the present embodiment. In FIG. 6 (a), the rotating shaft 55 that fixes the holder 26 is rotationally driven by a stepping motor 56 via a ball screw mechanism 57 and a clutch mechanism 58.

  The nut 59 of the ball screw mechanism 57 has a bottomed cylindrical shape, and one end of the rotating shaft 55 is coaxially attached to the center of the outer end surface of the bottom of the nut 59. Further, a screw shaft 60 is inserted into a screw hole which is a hole portion in the nut 59 and meshed with each other via a ball (not shown). On the opposite side of the screw shaft 60 from the nut 59 side, a screw is not formed, and the rotary shaft 61 of the stepping motor 56 is formed. A clutch mechanism 58 is interposed on the rotating shaft 61.

  A spindle motor 27 is installed in parallel with the stepping motor 56. The rotation of the rotary shaft 25 in the spindle motor 27 is caused by the second gear attached between the screw shaft 60 and the clutch mechanism 58 in the rotary shaft 61 via the first gear 62 and the intermediate gear 63 of the rotary shaft 25. 64 is transmitted.

  In the rotary drive system having the above-described configuration, when adjusting the height of the holder 26 accommodating the test sample 31 in the rotation axis direction during the calibration mode, the clutch mechanism 58 is brought into the connected state, and the ball screw mechanism 57 Allow the ball to circulate. In this state, the stepping motor 56 is driven to rotate. Then, the nut 59 moves up and down according to the rotation direction as the rotating shaft 51 (screw shaft 60) rotates, and the rotating shaft 55 moves up and down accordingly.

  In this way, the focal position 65 of the laser light emitted from the first semiconductor laser 8, reflected by the prism 15 and collected by the objective lens 2 is approximately in the middle of the rotation axis direction of the test sample 31 accommodated in the holder 26. The height in the rotation direction of the holder 26 is adjusted so as to be in the position.

  In this case, the determination as to whether or not the focal position 65 of the laser beam has become a substantially intermediate position in the rotation axis direction of the test sample 31 is detected by the second detector 24 as shown in FIG. The signal intensity is substantially equal between the upper light scattering film pattern 36a and the lower light scattering film pattern 36b.

  In the measurement mode in which the fluorescence or scattered light from the sample 7 enclosed in the disk 6 is measured after the position of the holder 26 in the rotation axis direction is determined as described above, the following is performed. Do.

  That is, the clutch mechanism 58 is disconnected and the circulation of the ball in the ball screw mechanism 57 is stopped. In this state, the spindle motor 27 is rotationally driven. By doing so, the rotation of the rotary shaft 25 is transmitted to the rotary shaft 61 (screw shaft 60) via the first gear 62, the intermediate gear 63, and the second gear 64. Here, since the circulation of the ball is stopped and the ball screw mechanism 57 is locked, the rotation of the screw shaft 60 is directly transmitted to the nut 59, and the rotation shaft 55 of the holder 26 is rotated at a desired number of rotations. It is.

  As described above, according to the present embodiment, the stepping motor 56 is driven to rotate while monitoring the signal intensity detected by the second detector 24 using the test sample 31 similar to that of the first embodiment. Then, the height of the holder 26 is adjusted by the ball screw mechanism 57 so that the focal position 65 of the laser beam is approximately the middle position in the thickness direction of the test sample 31.

  Therefore, even if the change in tilt or height (position in the direction of the rotation axis 25) of the disk 6 exceeds an allowable amount due to aging deterioration of the present microparticle detection apparatus, rattling during transportation, or the like, the disk 6 Therefore, it is possible to extend the lifetime of the microparticle detection apparatus by allowing all of the specimen injection parts (specimens) to fall within the focal depth d.

  In addition, the structure of the said rotational drive system in this Embodiment is not limited to the structure shown to Fig.6 (a). In short, any configuration may be used as long as the configuration in which the height of the rotation direction of the holder 26 is moved up and down by the stepping motor 56 and the configuration in which the holder 26 is continuously rotated by the spindle motor 27 are combined.

Fourth Embodiment This embodiment relates to an inspection using the test sample 31 for the amount of surface blur of the holder 26 that accommodates the disk 6. Therefore, the schematic configuration of the microparticle detection apparatus using the test sample 31 of the present embodiment is the same as the basic configuration shown in FIG. 1 in the third embodiment, but the rotational drive system shown in FIG. It is the same as that of the microparticle detection apparatus provided. Therefore, in the following description, the microparticle detection apparatus shown in FIGS. 1 and 6 (a) is used as necessary.

  In addition to the change in tilt or height (position in the direction of the rotation axis 25) of the disk 6 in the third embodiment due to aging deterioration of the microparticle detection device, rattling during transportation, etc., a holder for housing the disk 6 There is a possibility that the amount of surface blur will increase due to the change in the posture of 26.

  Conventionally, when measuring the amount of surface blur of a disc, while rotating the disc, a change in the circumferential direction of the amount of shake in the height direction at a certain radial position on the disc In manual measurement. Therefore, it takes man-hours and the measurement accuracy is low. Therefore, in the present embodiment, the surface shake amount of the holder 26 is automatically measured using the test sample 31 in the first embodiment.

  FIG. 7 is an explanatory diagram of a surface blur amount measuring method using the test sample 31. 7A is a plan view of the test sample 31, and FIG. 7B is a diagram showing the measurement result of the amount of surface blur.

  When measuring the amount of surface blur using the test sample 31, the test sample 31 is placed in the holder 26 in the microparticle detection apparatus in which the rotational drive system shown in FIG. 6A is provided in the basic configuration shown in FIG. The optical module 5 is positioned so that the objective lens 2 is positioned at the patterning position of the light scattering film pattern 36 in the test sample 31. Then, the laser beam emitted from the first semiconductor laser 8 is irradiated to one formation portion A of the light scattering film patterns 36 formed at four locations on the outer peripheral portion of the test sample 31, and the measurement target The formation place A to be formed is stored in the PC via the second detector 24. In this case, the formation location A may be stored based on the recognition of the attached mark or the recognition of the rotation angle from the reference position.

  In FIG. 7, only the portions where the light scattering film pattern is formed are indicated by A to D, and a specific illustration of the light scattering film pattern is omitted.

  After that, the spindle motor 27 is rotated, and the signal intensity of the scattered light from the upper light scattering film pattern 36a and the lower light scattering film pattern 36b is stored in the PC via the second detector 24. Then, the stepping motor is configured so that the signal intensities from the upper light scattering film pattern 36a and the lower light scattering film pattern 36b at the memorized formation location A are substantially equal as shown in FIG. 56, the ball screw mechanism 57 and the clutch mechanism 58 are controlled so that the height of the holder 26 in the rotational direction is such that the focal position 65 is substantially the middle position in the rotational axis direction at the formation position A of the test sample 31. Adjusted. In this manner, the height of the holder 26 is adjusted while detecting the signal intensity related to the formation location A.

  In the same manner, the focal position of the test sample 31 is the same with respect to the formation B where the angle is shifted by 90 degrees from the formation A among the light scattering film patterns 36 formed on the outer periphery of the test sample 31. The height of the holder 26 in the rotation direction is adjusted so that it is approximately in the middle position in the rotation axis direction. In that case, the position of the holder 26 when the height in the rotation direction of the holder 26 is adjusted with respect to the formation location A is different from the position of the holder 26 when the height in the rotation direction of the holder 26 is adjusted with respect to the formation location B. In this case, the height of the holder 26 at the time of adjustment with respect to the formation location B with respect to the height of the holder 26 at the time of adjustment with respect to the formation location A is set as the amount of surface blur of the formation location B with respect to the formation location A.

  In this way, the amount of surface blurring with respect to the formation location A is further measured with respect to the formation location C whose angle is shifted 90 degrees from the formation location B and the formation location D whose angle is shifted 90 degrees from the formation location C. As a result, as shown in FIG. 7B, the relative amount of surface blur with respect to the formation location A at the formation locations A to D representing the circumferential position of the test sample 31 is obtained.

  In FIG. 7B, the height of the holder 26 at the formation locations B and C where the amount of surface blur relative to the formation location A is the minimum and the height of the holder 26 at the formation location D where it is the maximum. The difference is obtained as the amount of surface blurring of the holder 26 in the microparticle detection apparatus of the present embodiment.

  As described above, in the present embodiment, the upper light scattering film pattern 36a and the lower light scattering film pattern formed at the four light forming positions A to D are shifted by 90 degrees on the outer periphery of the test sample 31. Based on the signal intensity with 36b, the height of the holder 26 is adjusted so that the focal point position 65 is at an approximately intermediate position in the rotation axis direction at each of the light forming points A to D, thereby forming the forming points at the forming points A to D. A relative amount of surface blur relative to A is obtained. Then, the height of the holder 26 at the maximum formation location relative to the position of the holder 26 at the formation location where the relative surface shake amount is minimum is obtained as the surface shake amount of the holder 26.

  Therefore, it is possible to automatically measure the surface shake amount of the holder 26 in the fine particle detection device of the present embodiment, thereby reducing the number of steps for measuring the surface shake amount and increasing the measurement accuracy.

  In the test sample 31, the light scattering film patterns 36 are formed at four locations shifted by 90 degrees in the circumferential direction. However, the present invention is not limited to this, and the surface blur amount can be measured in more detail by increasing the number of locations where the light scattering film pattern 36 is formed.

In summary, the microparticle detection device of the present invention includes a disk 6 having a sample injection unit 7 into which a sample containing microparticles is injected,
Light sources 8, 12;
An irradiation optical system 1 for condensing and irradiating the light emitted from the light sources 8 and 12 onto the specimen in the disk 6;
A light detection optical system for detecting light emitted from the microparticles in the specimen by the light irradiation;
Based on the intensity of light from the microparticles detected by the photodetection optical system, a detection unit that detects the microparticles;
Disk-shaped test samples 31 and 41 for detecting which of the focal positions 54 and 65 of the light collected by the irradiation optical system 1 is in the rotational axis direction of the disk 6;
A holder 26 that accommodates the disk 6 and the test samples 31 and 41, and a rotation drive system 27 that rotates the disk 6 and the test samples 31 and 41;
The test samples 31 and 41 are positions where light is irradiated by the irradiation optical system 1, and the first light scattering film patterns 36a and 44a arranged at the first level positions in the rotation axis direction, and the above Second light scattering film patterns 36b, 44b arranged at positions of a second level different from the first level,
The light detection optical system emits light emitted from the first light scattering film patterns 36a and 44a in the test samples 31 and 41 and light emitted from the second light scattering film patterns 36b and 44b by the light irradiation. Can be detected,
The detection unit is configured to detect the focal positions 54 and 65 based on the intensity of light from the first light scattering film patterns 36a and 44a and the second light scattering film patterns 36b and 44b detected by the light detection optical system. It can be detected.

  When there is a deviation in the rotation axis direction of the disk 6 with respect to the focal positions 54 and 65 of the light emitted from the light sources 8 and 12, the deviation is adjusted by adjusting the position of the disk 6 in the rotation axis direction. Can be corrected. For this purpose, it is necessary to correctly detect the shift amount of the disk 6 with respect to the focal positions 54 and 65.

  According to the above configuration, the first light scattering film patterns 36a and 44a arranged at the first level position in the rotation axis direction and the second light arranged at the second level position different from the first level. Using the test samples 31, 41 having the scattering film patterns 36b, 44b, the first light scattering film patterns 36a, 44a and the second light scattering film patterns 36b, 44b detected by the light detection optical system. Based on the intensity of the light, the detection unit can detect the focal positions 54 and 65 of the light collected by the irradiation optical system 1.

  Therefore, from the relationship between the light intensities from the light scattering film patterns arranged at two different levels, not only the deviation in the rotation axis direction from the focal positions 54 and 65 in the test samples 31 and 41, The direction of deviation can also be determined.

  On the other hand, when the light scattering film pattern exists only at one level in the rotation axis direction, the light scattering film pattern is detected by detecting the intensity of light from the light scattering film pattern. Although it can be determined that the position is shifted from the positions 54 and 65, it cannot be determined in which direction the position is shifted.

Moreover, in the microparticle detection apparatus of one embodiment,
The detection unit compares the light intensity from the first light scattering film patterns 36a and 44a detected by the light detection optical system with the light intensity from the second light scattering film patterns 36b and 44b. Based on this comparison result, it is possible to detect the direction and amount of deviation of the focal positions 54 and 65 from the reference position in the rotational axis direction.

  According to this embodiment, the detection unit compares the light intensity from the first light scattering film patterns 36a and 44a with the light intensity from the second light scattering film patterns 36b and 44b. When the intensity of both lights is the same, the focal positions 54 and 65 are in the middle of both light scattering film patterns, and when the intensity of one of the lights is strong, the focal positions 54 and 65 have a higher light intensity. It can be determined that there is a shift to the scattering film pattern side.

  In this case, the deviation amount is determined by determining the intensity of light from the first light scattering film patterns 36a and 44a and the second light scattering film patterns 36b and 44b and the deviation of the focal positions 54 and 65 from the reference position. By measuring the relationship with the amount in advance and recording it as a table, it is possible to determine the shift amount at the focal positions 54 and 65 with reference to the table from the measured light intensity.

Moreover, in the microparticle detection apparatus of one embodiment,
An intermediate position in the rotation axis direction between the first light scattering film patterns 36a and 44a and the second light scattering film patterns 36b and 44b of the test samples 31 and 41 is set as the reference position.

  According to this embodiment, the test sample 31, when the light intensity from the first light scattering film patterns 36a, 44a and the light intensity from the second light scattering film patterns 36b, 44b are equal. An intermediate position of 41 in the rotational axis direction can be set as the reference position. Therefore, the rotation at the focal positions 54 and 65 is simply based on the strength relationship between the light intensity from the first light scattering film patterns 36a and 44a and the light intensity from the second light scattering film patterns 36b and 44b. It is possible to detect the direction and amount of deviation from the axial reference position.

Moreover, in the microparticle detection apparatus of one embodiment,
The position of the disc 6 in the specimen injection portion 7 in the direction of the rotational axis is the rotational axis of the first light scattering film pattern 36a, 44a and the second light scattering film pattern 36b, 44b of the test sample 31, 41. Corresponds to the middle position of the direction.

  According to this embodiment, using the test samples 31 and 41, the focal positions 54 and 65 are set to the positions of the first light scattering film patterns 36a and 44a and the second light scattering film patterns 36b and 44b. By adjusting to the intermediate position in the rotation axis direction, it becomes possible to easily adjust the focal positions 54 and 65 of the light from the light sources 8 and 12 to the position of the specimen injection section 7 on the disk 6.

Moreover, in the microparticle detection apparatus of one embodiment,
The test sample 41 is a position where light is irradiated by the irradiation optical system 1, and is arranged at an intermediate position in the rotation axis direction between the first light scattering film pattern 44a and the second light scattering film pattern 44b. The third light scattering film pattern 46 is provided.

  According to this embodiment, in addition to the first light scattering film pattern 44a and the second light scattering film pattern 44b for detecting the focal positions 54 and 65 of the light from the light sources 8 and 12, the specimen injection The third light scattering film pattern 46 is disposed at the same height level as the portion 7.

  The third light scattering film pattern 46 can be used for detection and adjustment of the focal position of the light detection optical system (for example, aperture). Therefore, according to this embodiment, in addition to the adjustment of the focal positions 54 and 65 of the light from the light sources 8 and 12, the adjustment of the focal position of the optical detection optical system can be performed quantitatively and simultaneously. Is possible.

Moreover, in the microparticle detection apparatus of one embodiment,
The test samples 31 and 41 include a light scattering film pattern group including the first light scattering film patterns 36a and 44a and the second light scattering film patterns 36b and 44b on a circumference around the rotation axis. Are arranged at different positions.

  According to this embodiment, the amount of deviation in the rotational axis direction from the focal positions 54 and 65 in the light scattering film pattern groups arranged at different positions on the circumference of the test samples 31 and 41 is detected. By doing so, the relative surface blurring amount in each light scattering film pattern group can be obtained.

  Therefore, the amount of displacement of the position in the rotational axis direction in the light scattering film pattern group exhibiting the maximum value with respect to the position in the rotational axis direction in the light scattering film pattern group in which the relative surface blur amount exhibits the minimum value, It can be obtained as a surface blur amount of the holder 26.

DESCRIPTION OF SYMBOLS 1 ... Light source device 2 ... Objective lens 3, 4 ... Detection apparatus 5 ... Optical module 6 ... Disc 7 ... Sample (specimen)
8, 12 ... Semiconductor laser 9, 13, 18, 22 ... Lens 10 ... Spot size adjusting lens 11, 19, 23 ... Aperture 14, 16 ... Dichroic mirror 15 ... Prism 17 ... Band pass filter 20, 24 ... Detector 21 ... ND filter 25, 55, 61 ... rotating shaft 26 ... holder 27 ... spindle motor 31, 41 ... test sample 32, 43 ... center hole 33, 34, 42, 51, 52 ... substrate 35, 53 ... spacer 36, 44 ... light Scattering film pattern 36a, 44a ... Upper light scattering film pattern 36b, 44b ... Lower light scattering film pattern 45 ... First region 46 ... Middle light scattering film pattern 47 ... Second region 48 ... Third region 54, 65 ... Focus position 56 ... Stepping motor 57 ... Ball screw mechanism 58 ... Clutch mechanism 59 ... Nut 60 ... Screw shafts 62, 63, 64 ... Gear

Claims (6)

A disc having a specimen injection part into which a specimen containing fine particles is injected;
A light source;
An irradiation optical system for condensing and irradiating the light emitted from the light source with respect to the specimen in the disk;
A light detection optical system for detecting light emitted from the microparticles in the specimen by the light irradiation;
Based on the intensity of light from the microparticles detected by the photodetection optical system, a detection unit that detects the microparticles;
A disk-shaped test sample for detecting whether the focal position of the light collected by the irradiation optical system is in the direction of the rotation axis of the disk;
A holder for accommodating the disk and the test sample, and a rotational drive system for rotating the disk and the test sample,
The test sample is a position where light is irradiated by the irradiation optical system, and the first light scattering film pattern arranged at the first level position in the rotation axis direction is different from the first level. A second light scattering film pattern disposed at two levels,
The light detection optical system is capable of detecting light emitted from the first light scattering film pattern and light emitted from the second light scattering film pattern in the test sample by irradiation of the light,
The detection unit is capable of detecting the focal position based on the intensity of light from the first light scattering film pattern and the second light scattering film pattern detected by the light detection optical system. A featured microparticle detection device. The fine particle detection apparatus according to claim 1,
The detection unit compares the light intensity from the first light scattering film pattern detected by the light detection optical system with the light intensity from the second light scattering film pattern, and based on the comparison result A fine particle detection device capable of detecting the direction of deviation and the amount of deviation from the reference position in the rotational axis direction at the focal position. In the microparticle detection apparatus according to claim 2,
The microparticle detection apparatus, wherein an intermediate position in the rotation axis direction between the first light scattering film pattern and the second light scattering film pattern of the test sample is set as the reference position. In the microparticle detection apparatus according to any one of claims 1 to 3,
The position in the rotation axis direction of the specimen injection portion of the disk corresponds to the intermediate position in the rotation axis direction of the first light scattering film pattern and the second light scattering film pattern of the test sample. A microparticle detection device characterized by the above. In the microparticle detection apparatus according to any one of claims 1 to 4,
The test sample is a position where light is irradiated by the irradiation optical system, and is a third position arranged at an intermediate position in the rotation axis direction between the first light scattering film pattern and the second light scattering film pattern. A fine particle detection apparatus having a light scattering film pattern. In the microparticle detection apparatus according to any one of claims 1 to 5,
In the test sample, a plurality of light scattering film pattern groups including the first light scattering film pattern and the second light scattering film pattern are arranged at different positions on the circumference around the rotation axis. A microparticle detection apparatus characterized by that.

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