JP5861884B2 - Method for producing exo-type norbornene compound - Google Patents

Method for producing exo-type norbornene compound Download PDF

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JP5861884B2
JP5861884B2 JP2012077711A JP2012077711A JP5861884B2 JP 5861884 B2 JP5861884 B2 JP 5861884B2 JP 2012077711 A JP2012077711 A JP 2012077711A JP 2012077711 A JP2012077711 A JP 2012077711A JP 5861884 B2 JP5861884 B2 JP 5861884B2
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norbornene compound
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孝明 曽根
孝明 曽根
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Arakawa Chemical Industries Ltd
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本発明は、エキソ型ノルボルネン化合物の製造方法に関する。   The present invention relates to a method for producing an exo-type norbornene compound.

2−アシル−5−ノルボルネン類は、例えば電子材料や光学材料用モノマー類の原料前駆体として有用であり、還元してメチロール基としたり、酸化してカルボン酸やエステルあるいは酸ハロゲン化物等に誘導して利用されている。特にエキソ体はエンド体に比べて重合特性や光学特性に優れていることが知られている(特許文献1〜4参照)。   2-Acyl-5-norbornenes are useful as raw material precursors for monomers for electronic materials and optical materials, for example, and are reduced to methylol groups or oxidized to carboxylic acids, esters, acid halides, etc. It is used. In particular, exo isomers are known to be superior in polymerization characteristics and optical properties compared to end isomers (see Patent Documents 1 to 4).

2−置換−5−ノルボルネン類はディールス−アルダー反応により製造されるものであり、該反応ではエンド付加体が優先的に得られることがよく知られている(非特許文献1参照)。このエンドリッチ付加体を水酸化アルカリ溶液や金属アルコラート溶液中でエピメリ化反応によりエキソ富化しようとする試みがなされてきた(特許文献5及び非特許文献2〜4参照)。しかしながら、これらの固体塩基類を用いた場合には、反応を円滑に進めるため溶媒で希釈溶解した反応系にするという工業的不利益の他に、アルデヒド基の場合(R=H)には塩基性が強過ぎてアセタール化反応、アルドール縮合反応、重合反応、樹脂化等の副反応を引き起こし高収率でエキソ(富化)体が得られないという欠点もあった。 2-Substituted-5-norbornenes are produced by Diels-Alder reaction, and it is well known that endo adducts are obtained preferentially in this reaction (see Non-Patent Document 1). Attempts have been made to exo-enrich this endrich adduct by epimerization reaction in an alkali hydroxide solution or a metal alcoholate solution (see Patent Document 5 and Non-Patent Documents 2 to 4). However, when these solid bases are used, in addition to the industrial disadvantage of making the reaction system diluted and dissolved with a solvent to facilitate the reaction, in the case of an aldehyde group (R = H), a base is used. There is also a drawback that the exo (enriched) product cannot be obtained in a high yield due to side effects such as acetalization reaction, aldol condensation reaction, polymerization reaction, resinification, etc. due to its too strong properties.

特表2011−503004号公報Special table 2011-503004 gazette 特表2010−522254号公報Special table 2010-522254 gazette 特開2007−261980号公報JP 2007-261980 A 特開2006−160712号公報JP 2006-160712 A 特表平03−505452号公報Japanese translation of PCT publication No. 03-505542

J.Furukawa等,J.Am.Chem.Soc.,92,6548(1970)J. et al. Furukawa et al., J. MoI. Am. Chem. Soc. , 92, 6548 (1970) R.S.Bly等,J.Org.Chem.,34,2346(1969)R. S. Bly et al. Org. Chem. , 34, 2346 (1969) F.Kasper,J.prakt.Chem.,311,201(1969)F. Kasper, J .; prakt. Chem. , 311, 201 (1969) J.G.Dinwiddie等,J.Org.Chem.,30,766(1965)J. et al. G. Dinwiddie et al. Org. Chem. , 30, 766 (1965)

本発明の目的は、電子材料や光学材料用モノマー類の原料前駆体として有用なエキソ体を多く含む(エキソ富化体)ノルボルネン化合物、特に2−アシル−5−ノルボルネン類の製造方法を提供することにある。   The object of the present invention is to provide a process for producing norbornene compounds, particularly 2-acyl-5-norbornenes, containing many exo-forms useful as raw material precursors for monomers for electronic materials and optical materials (exo-enriched forms). There is.

本発明者は、かかる課題に鑑み鋭意検討した結果、エキソ体を多く含む(エキソ富化)ノルボルネン化合物を製造する方法を見出し、本発明を完成するに至った。 As a result of intensive studies in view of such problems, the present inventor has found a method for producing a norbornene compound containing a large amount of exo isomers (exo-enriched), and has completed the present invention.

すなわち、本発明は、一般式(1):

Figure 0005861884
(式中、Rは水素、または置換基を有していてもよいメチル基及びアルキル基もしくはフェニル基のいずれかを表す。)で表わされる2位にアシル基を有するエンド型ノルボルネン化合物(A)に、アセトニトリル中における共役酸の酸解離定数が20以上の強塩基性有機化合物(B)を接触させることを特徴とするエキソ型ノルボルネン化合物の製造方法に関する。 That is, the present invention relates to the general formula (1):
Figure 0005861884
(In the formula, R represents hydrogen or an optionally substituted methyl group, alkyl group or phenyl group.) An endo-type norbornene compound having an acyl group at the 2-position (A) And a strongly basic organic compound (B) having an acid dissociation constant of conjugate acid in acetonitrile of 20 or more in contact with the exo-type norbornene compound.

本発明によれば、電子材料や光学材料用モノマー類の原料前駆体として有用なエキソ体を多く含むエキソ型ノルボルネン化合物、特に2−アシル−5−ノルボルネン類を効率的に提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the exo-type norbornene compound containing many exo bodies useful as a raw material precursor of monomers for electronic materials and optical materials, especially 2-acyl-5-norbornenes can be provided efficiently.

本発明は、2位にアシル基を有するエンド型ノルボルネン化合物(A)(以下、成分(A)という)に、アセトニトリル中における共役酸の酸解離定数が20以上の強塩基性有機化合物(B)(以下、成分(B)という)を接触させることを特徴とする。
本発明の製造に用いられる成分(A)は、特に限定されないが、通常は一般式(1)
The present invention relates to an endo-norbornene compound (A) having an acyl group at the 2-position (hereinafter referred to as component (A)), a strongly basic organic compound (B) having an acid dissociation constant of conjugate acid in acetonitrile of 20 or more. (Hereinafter referred to as “component (B)”).
Although the component (A) used for manufacture of this invention is not specifically limited, Usually, General formula (1)

Figure 0005861884
Figure 0005861884

(式中、Rは水素または置換基を有していてもよいアルキル基もしくはフェニル基を表す。)で表わされる。成分(A)は、公知の方法によりアクロレインあるいはビニルケトン類(CH2=CH−CO−R)(式中、Rは水素または置換基を有していてもよいアルキル基もしくはフェニル基を表す。)とシクロペンタジエンとのディールス−アルダー反応によって調製される。 (In the formula, R represents hydrogen or an alkyl group or a phenyl group which may have a substituent). Component (A) is acrolein or vinyl ketones (CH 2 ═CH—CO—R) (wherein R represents hydrogen or an alkyl group or phenyl group which may have a substituent) by a known method. It is prepared by Diels-Alder reaction of cyclopentadiene.

本エピメリ化(異性化)反応は、通常は非水系で成分(B)を用いる。成分(B)のアセトニトリル中における共役酸の酸解離定数は、I.Leito等,J.Org.Chem.,70,1019(2005)に記載の方法で行う。なお、反応の際には溶剤を用いてもよい。溶剤としては、成分(A)と反応し得る一級アミン類や成分(B)の窒素と反応する化合物や酸性物質等以外のものであれば、通常の炭化水素系溶剤の他、アルコール系溶剤、エステル系溶剤、ケトン系溶剤、アセトニトリルやジメチルスルホキシド(DMSO)等の極性有機溶剤を使用して反応することもできる。 This epimerization (isomerization) reaction is usually non-aqueous and uses component (B). The acid dissociation constant of the conjugate acid in acetonitrile of component (B) is described in I. Leito et al. Org. Chem. , 70 , 1019 (2005). In the reaction, a solvent may be used. As the solvent, in addition to the primary amines that can react with the component (A) and the compounds and acidic substances that react with the nitrogen of the component (B), other than ordinary hydrocarbon solvents, alcohol solvents, The reaction can also be carried out using an ester solvent, a ketone solvent, a polar organic solvent such as acetonitrile or dimethyl sulfoxide (DMSO).

成分(B)としては、テトラメチルグアニジンやポリグアニジン等のグアニジン塩基類(グアニジン及びグアニジン誘導体としてその置換体とポリグアニド類を含む)、ジアザビシクロノネン(DBN)、ジアザビシクロウンデセン(DBU)、トリアザビシクロデセン(TBD)、N−メチル−トリアザビシクロデセン(MTBD)等に代表されるアミジン系及びグアニジン系多窒素多複素環状化合物やそれらのポリマー担持強塩基類、フォスファゼン(Schweisinger)塩基類、プロアザフォスファトラン(Verkade)塩基類が挙げられる。使用量は、成分(A)に対して成分(B)が0.1〜20モル%程度が適量であり、好ましくは0.5〜10モル%がより適量である。   Component (B) includes guanidine bases such as tetramethylguanidine and polyguanidine (including guanidine and guanidine derivatives and their substitution products and polyguanides), diazabicyclononene (DBN), diazabicycloundecene (DBU) Amidine-based and guanidine-based polynitrogen polyheterocyclic compounds represented by triazabicyclodecene (TBD), N-methyl-triazabicyclodecene (MTBD), and their polymer-supported strong bases, phosphazene bases And proazaphosphatolan (Verkade) bases. The amount of the component (A) used is suitably about 0.1 to 20 mol%, preferably 0.5 to 10 mol%, relative to the component (A).

反応温度は通常−60〜140℃であり、好ましくは−20〜100℃、より好ましくは0〜80℃である。140℃を超えると熱異性化平衡とともに熱分解・熱重合等の副反応が複雑に起こってしまい、収率が低下することがある。   The reaction temperature is generally −60 to 140 ° C., preferably −20 to 100 ° C., more preferably 0 to 80 ° C. If it exceeds 140 ° C., side reactions such as thermal decomposition and thermal polymerization may be complicated as well as thermal isomerization equilibrium, and the yield may decrease.

反応時間は通常1分〜24時間であるが、触媒量及び反応温度を調整することにより適宜変更可能である。   The reaction time is usually 1 minute to 24 hours, but can be appropriately changed by adjusting the amount of catalyst and the reaction temperature.

得られた反応液を、必要に応じて精製することで、エキソ型ノルボルネン化合物を得ることができる。精製方法としては特に限定されないが、反応液を蒸留することが、低沸点のエキソ型ノルボルネン化合物を選択的に取り出し、反応液系内にはエンド型ノルボルネン化合物を残存させて更にエピメリ化(異性化)平衡反応を継続して行える反応場を提供できる点から好ましい。   The exo-type norbornene compound can be obtained by purifying the obtained reaction solution as necessary. The purification method is not particularly limited, but distillation of the reaction solution selectively removes the low-boiling exo-type norbornene compound and leaves the endo-type norbornene compound in the reaction solution system for further epimerization (isomerization). ) It is preferable from the viewpoint that a reaction field capable of continuously performing an equilibrium reaction can be provided.

反応液には成分(B)が含まれていてもよく、成分(B)を接触させつつ反応液を蒸留することが、低沸点のエキソ型ノルボルネン化合物を選択的に取り出し、反応液系内にはエンド型ノルボルネン化合物と成分(B)を残存させて更にエピメリ化(異性化)平衡反応を継続して行うので連続的にエキソ型ノルボルネン化合物を製造できる点から好ましい。   The reaction solution may contain the component (B), and distilling the reaction solution while contacting the component (B) selectively takes out the low-boiling exo-type norbornene compound and puts it in the reaction solution system. Is preferable from the viewpoint that an exo-type norbornene compound can be continuously produced since the endo-norbornene compound and the component (B) are left and the epimerization (isomerization) equilibrium reaction is continued.

なお、成分(A)に、成分(B)を接触させつつ反応液を移すことなくそのまま蒸留するとともに成分(A)必要に応じて成分(B)を連続的または分割して追加供給しながら反応と蒸留を継続することで連続的にエキソ型ノルボルネン化合物を製造することができる。   The component (A) is distilled as it is without transferring the reaction solution while contacting the component (B), and the component (A) is reacted while it is supplied continuously or divided as needed. The exo-type norbornene compound can be continuously produced by continuing the distillation.

上記方法で得たエキソ型ノルボルネン化合物に成分(B)またはその分解生成物等の塩基性化合物や酸性化合物が混入していた場合には再びエピメリ化が起こる可能性があり、長期の保存安定性を確実なものとするためこれらの化合物を、吸着剤を用いて除去することが好ましい。   When basic compounds or acidic compounds such as component (B) or its decomposition products are mixed in the exo-type norbornene compound obtained by the above method, epimerization may occur again, and long-term storage stability It is preferable to remove these compounds by using an adsorbent in order to ensure the reliability.

吸着剤としては、シリカゲル、活性アルミナ、活性炭、活性白土、イオン交換樹脂、珪藻土及びセルロ−スから選択される少なくとも1種類を用いることができる。吸着剤の使用量は特に限定されないが、エピメリ化後蒸留精製して得られたエキソ型ノルボルネン化合物に対し1重量%から100重量%を、好ましくは5〜50重量%を、より好ましくは10〜25重量%である。処理方法は特に限定されないが、通常、得られたエキソ型ノルボルネン化合物に吸着剤を加え、10分〜120分間混合攪拌した後、濾過するかまたは該吸着剤の充填塔にエピメリ化後蒸留精製したエキソ体を通して長期保存可能なエキソ体を得ることができる。   As the adsorbent, at least one selected from silica gel, activated alumina, activated carbon, activated clay, ion exchange resin, diatomaceous earth and cellulose can be used. The amount of the adsorbent used is not particularly limited, but is 1 to 100% by weight, preferably 5 to 50% by weight, more preferably 10 to 10% by weight based on the exo-type norbornene compound obtained by distillation purification after epimerization. 25% by weight. The treatment method is not particularly limited. Usually, an adsorbent is added to the obtained exo-type norbornene compound, mixed and stirred for 10 minutes to 120 minutes, and then filtered or purified by distillation after epimerization in a packed column of the adsorbent. An exo form that can be stored for a long time can be obtained through the exo form.

以下、実施例、比較例、応用例及び保存安定性試験によって本発明をさらに具体的に説明するが、本発明はこれらの例示に限定されるものではない。   EXAMPLES Hereinafter, although an Example, a comparative example, an application example, and a storage stability test demonstrate this invention further more concretely, this invention is not limited to these illustrations.

[2−ホルミル−5−ノルボルネン(R=H)の例]
実施例1
攪拌機、温度計、窒素導入口を装備した50mL四口フラスコにエンドリッチ2−ホルミル−5−ノルボルネン(A)12.22g(100ミリモル)を仕込み、25℃の恒温槽に浸し、窒素雰囲気攪拌下にエンドリッチ2−ホルミル−5−ノルボルネン(A)に対し強塩基性有機化合物(B)として5モル%に相当するジアザビシクロウンデセン(DBU)0.76g(5ミリモル≒0.75mL)を注入してエピメリ化反応を開始した。反応の追跡はガスクロマトグラフィー(GC)を用いて行った(装置:(株)島津製作所製GC17A;検出器:FID;カラム:DB5使用)。反応液の一部を1,2,4及び24時間でサンプリング、そのGC分析結果を表1に示した。なお、エンドリッチ2−ホルミル−5−ノルボルネン(A)の組成はエキソ体19.9%、エンド体76.9%であった。
[Example of 2-formyl-5-norbornene (R = H)]
Example 1
A 50 mL four-necked flask equipped with a stirrer, thermometer, and nitrogen inlet was charged with 12.22 g (100 mmol) of endrich 2-formyl-5-norbornene (A), immersed in a constant temperature bath at 25 ° C., and stirred under a nitrogen atmosphere. 0.76 g (5 mmol≈0.75 mL) of diazabicycloundecene (DBU) corresponding to 5 mol% as a strongly basic organic compound (B) with respect to endorich 2-formyl-5-norbornene (A) The epimerization reaction was started by injection. The reaction was monitored using gas chromatography (GC) (apparatus: GC17A manufactured by Shimadzu Corporation; detector: FID; column: using DB5). A part of the reaction solution was sampled at 1, 2, 4 and 24 hours, and the GC analysis results are shown in Table 1. The composition of endorich 2-formyl-5-norbornene (A) was 19.9% exo isomer and 76.9% exo isomer.

実施例2及び比較例1〜2
使用した塩基を表1のように変更した他は実施例1と同様に行った。結果を表1に示した。
Example 2 and Comparative Examples 1-2
The same procedure as in Example 1 was performed except that the base used was changed as shown in Table 1. The results are shown in Table 1.

Figure 0005861884
Figure 0005861884

(表中、DBUはジアザビシクロウンデセン、28%NaOMeは28重量%ナトリウムメトキシドを含有したメタノール溶液、MTBDはN−メチル−トリアザビシクロデセン、1M−t−BuOKは1モル/l濃度のt−ブトキシドカリウムを含有したt−ブタノール溶液を表す。) (In the table, DBU is diazabicycloundecene, 28% NaOMe is a methanol solution containing 28 wt% sodium methoxide, MTBD is N-methyl-triazabicyclodecene, 1Mt-BuOK is 1 mol / l concentration. Represents a t-butanol solution containing potassium t-butoxide.)

表1の実施例1及び2に示した強塩基性有機化合物(B)を用いたエピメリ化(異性化)反応では、副生物も少なくエンド体のエキソ体へのエピメリ化(異性化)が主反応であるのに対し、比較例1及び2に示した金属アルコラート塩基を用いた反応では高沸点化合物であるアセタール化合物やアルドール縮合物が主生成物として得られ、目的とするエピメリ化(異性化)生成物はほとんど得られないことがわかった。   In the epimerization (isomerization) reaction using the strongly basic organic compound (B) shown in Examples 1 and 2 of Table 1, there are few by-products and the epimerization (isomerization) of the endo form into the exo form is the main. In contrast to the reaction, in the reactions using metal alcoholate bases shown in Comparative Examples 1 and 2, an acetal compound or aldol condensate which is a high boiling point compound is obtained as a main product, and the desired epimerization (isomerization) is obtained. It was found that little product was obtained.

実施例3
攪拌機、温度計、窒素導入口を装備した50mL四口フラスコにエンドリッチ2−ホルミル−5−ノルボルネン(A)12.22g(100ミリモル)を仕込み、5℃の恒温槽に浸し、窒素雰囲気攪拌下にエンドリッチ2−ホルミル−5−ノルボルネン(A)に対し強塩基性有機化合物(B)として5モル%に相当するテトラメチルグアニジン(TMG)0.58g(5ミリモル≒0.63mL)を注入してエピメリ化反応を開始した。5℃で1時間反応させた後、25℃で1時間、50℃で2時間、70℃で2時間、100℃で2時間反応させた。その後表2に記した温度に段階的に昇温して一定時間反応を継続した。反応の追跡はガスクロマトグラフィーを用いて行った(装置:(株)島津製作所製GC17A;検出器:FID;カラム:DB5使用)。反応液の一部を所定時間毎にサンプリングし、結果を表2に示した。原料(A)の組成はエキソ体19.9%、エンド体76.9%であった。なお、表2各欄の数値はエキソ体/エンド体比を記した。
Example 3
A 50 mL four-necked flask equipped with a stirrer, thermometer and nitrogen inlet was charged with 12.22 g (100 mmol) of endrich 2-formyl-5-norbornene (A), immersed in a 5 ° C. constant temperature bath, and stirred under a nitrogen atmosphere. To the endrich 2-formyl-5-norbornene (A) was injected 0.58 g (5 mmol≈0.63 mL) of tetramethylguanidine (TMG) corresponding to 5 mol% as a strongly basic organic compound (B). The epimerization reaction was started. After reacting at 5 ° C. for 1 hour, it was reacted at 25 ° C. for 1 hour, 50 ° C. for 2 hours, 70 ° C. for 2 hours, and 100 ° C. for 2 hours. Thereafter, the temperature was raised stepwise to the temperature shown in Table 2, and the reaction was continued for a certain time. The reaction was traced using gas chromatography (apparatus: GC17A manufactured by Shimadzu Corporation; detector: FID; column: using DB5). A part of the reaction solution was sampled every predetermined time, and the results are shown in Table 2. The composition of the raw material (A) was 19.9% exo product and 76.9% endo product. In addition, the numerical value of each column of Table 2 described exo-body / endo-body ratio.

実施例4〜8及び比較例3〜5
使用した塩基をTMGから表2のように変更した他は実施例3と同様に行った。なお、実施例8は6時間で反応を終了させた。結果を表2に示した。
Examples 4-8 and Comparative Examples 3-5
The same procedure as in Example 3 was performed except that the base used was changed from TMG as shown in Table 2. In Example 8, the reaction was completed in 6 hours. The results are shown in Table 2.

Figure 0005861884
Figure 0005861884

(表中、pKBHは酸解離定数、TMGはテトラメチルグアニジン、DBUはジアザビシクロウンデセン、DBNはジアザビシクロノネン、PS−BnTBDはN−ベンジルポリスチレン担持トリアザビシクロデセン、MTBDはN−メチル−トリアザビシクロデセン、BTPPは、フォスファゼン塩基P1−t−ブチル−トリス(テトラメチレン)、Pyはピリジン、H+スポンジはプロトンスポンジを表す。) (In the table, pKBH + is an acid dissociation constant, TMG is tetramethylguanidine, DBU is diazabicycloundecene, DBN is diazabicyclononene, PS-BnTBD is N-benzylpolystyrene-supported triazabicyclodecene, MTBD is N- (Methyl-triazabicyclodecene, BTPP represents phosphazene base P1-t-butyl-tris (tetramethylene), Py represents pyridine, and H + sponge represents proton sponge.)

表2の5℃から100℃まで順次昇温した実施例3〜8及び比較例3〜5より、アセトニトリル中で求められた共役酸の酸解離定数が20以上の強塩基性有機化合物(B)であるTMG、DBU、DBN、PS−BnTBS、MTBD及びBTPPを用いた実施例3〜8ではエピメリ化(異性化)反応が容易に進行し、エキソ体/エンド体比が1.2前後の平衡値に到達するのに対し、無触媒や弱塩基のピリジンあるいはプロトンスポンジの比較例3〜5では反応温度にかかわりなくほとんどエピメリ化(異性化)が進行しないことがわかった。 Strongly basic organic compound (B) having an acid dissociation constant of 20 or more for the conjugate acid determined in acetonitrile from Examples 3 to 8 and Comparative Examples 3 to 5 that were sequentially heated from 5 ° C. to 100 ° C. in Table 2 In Examples 3 to 8 using TMG, DBU, DBN, PS-BnTBS, MTBD, and BTPP, the epimerization (isomerization) reaction proceeds easily, and the exo / endo ratio is about 1.2. On the other hand, it was found that epimerization (isomerization) hardly progressed regardless of the reaction temperature in Comparative Examples 3 to 5 of the uncatalyzed or weakly basic pyridine or proton sponge.

実施例9
攪拌機、温度計、窒素導入口を装備した50mL四口フラスコにエンドリッチ2−ホルミル−5−ノルボルネン(A)12.22g(100ミリモル)と同量のトルエン12.22gを仕込み、25℃の恒温槽に浸し、窒素雰囲気攪拌下にエンドリッチ2−ホルミル−5−ノルボルネン(A)に対し強塩基性有機化合物(B)として5モル%に相当するジアザビシクロウンデセン(DBU)0.76g(5ミリモル≒0.75mL)を注入してエピメリ化反応を開始した。25℃で4時間反応後、昇温して50℃とし2時間反応を継続した。反応追跡はガスクロマトグラフィーを用いて行った(装置:(株)島津製作所製GC17A;検出器:FID;カラム:DB5使用)。6時間反応後の結果を表3に示した。なお、エンドリッチ2−ホルミル−5−ノルボルネン(A)の組成はエキソ体19.9%、エンド体76.9%であった。
Example 9
A 50 mL four-necked flask equipped with a stirrer, a thermometer, and a nitrogen inlet was charged with 12.22 g (100 mmol) of endrich 2-formyl-5-norbornene (A) and 12.22 g of toluene at a constant temperature of 25 ° C. In a tank, 0.76 g of diazabicycloundecene (DBU) corresponding to 5 mol% as a strongly basic organic compound (B) with respect to endorich 2-formyl-5-norbornene (A) under stirring in a nitrogen atmosphere ( 5 mmol ≒ 0.75 mL) was injected to start the epimerization reaction. After reacting at 25 ° C. for 4 hours, the temperature was raised to 50 ° C. and the reaction was continued for 2 hours. The reaction was traced using gas chromatography (apparatus: GC17A manufactured by Shimadzu Corporation; detector: FID; column: DB5 used). The results after 6 hours of reaction are shown in Table 3. The composition of endorich 2-formyl-5-norbornene (A) was 19.9% exo isomer and 76.9% exo isomer.

実施例10〜17
使用した溶媒をトルエンからクロロホルム、酢酸エチル、テトラヒドロフラン(THF)、t−ブタノ−ル(t−BuOH),シクロヘキサノン、アセトニトリル、ジメチルスルホキシド(DMSO)及び無溶媒に替えた他は実施例9と同様に行い、結果を表3に示した。
Examples 10-17
Except that the solvent used was changed from toluene to chloroform, ethyl acetate, tetrahydrofuran (THF), t-butanol (t-BuOH), cyclohexanone, acetonitrile, dimethyl sulfoxide (DMSO) and no solvent, the same as in Example 9. The results are shown in Table 3.

Figure 0005861884
Figure 0005861884

実施例18
温度計、窒素導入毛細管及びウイットマ−精留塔(60cm、約5段)を装備した300mLナシ型四口フラスコにエンドリッチ2−ホルミル−5−ノルボルネン(A)122.2g(1モル)を仕込み、フラスコ内を窒素置換した後、氷冷下にジアザビシクロウンデセン(DBU)7.6(0.05モル)を添加して窒素置換して室温で1日放置した。その後、減圧下に窒素バブリング開始し、80℃の油浴に浸し液温70℃1000Pa前後の減圧度で2時間維持した後、減圧度を300〜400Paまで高め沸点48〜52℃の留分を分取した。蒸留結果を表4に示した。
Example 18
Charged 122.2 g (1 mol) of endrich 2-formyl-5-norbornene (A) to a 300 mL pear type four-necked flask equipped with a thermometer, a nitrogen-introducing capillary tube, and a Witma-rectification column (60 cm, about 5 stages). The flask was purged with nitrogen, then diazabicycloundecene (DBU) 7.6 (0.05 mol) was added under ice-cooling, and the mixture was purged with nitrogen and allowed to stand at room temperature for 1 day. After that, nitrogen bubbling was started under reduced pressure, immersed in an 80 ° C. oil bath and maintained at a reduced pressure of about 70 ° C. and 1000 Pa for 2 hours, then the reduced pressure was increased to 300 to 400 Pa and a fraction having a boiling point of 48 to 52 ° C. Sorted. The distillation results are shown in Table 4.

Figure 0005861884
Figure 0005861884

実施例19
温度系、窒素導入毛細管及びディクソンパッキン充填精留塔(100cm、約10段)を装備した300mLナシ型四口フラスコにエンドリッチ2−ホルミル−5−ノルボルネン(A)122.2g(1モル)を仕込み、フラスコ内を窒素置換した後、室温下にジアザビシクロウンデセン(DBU)7.6(0.05モル)を添加して窒素置換した。その後、減圧下に窒素バブリング開始し、80℃の油浴に浸し液温70℃1000Pa前後の減圧度で2時間維持した後、減圧度を350〜400Paまで高め還流比10:1(戻し:留出弁開放時間比)で沸点49〜51℃の留分を分取した。蒸留結果を表5に示した。
Example 19
Endrich 2-formyl-5-norbornene (A) 122.2 g (1 mol) was added to a 300 mL pear type four-necked flask equipped with a temperature system, a nitrogen-introducing capillary tube and a Dixon packing packed rectification column (100 cm, about 10 stages). The flask was purged with nitrogen, and diazabicycloundecene (DBU) 7.6 (0.05 mol) was added at room temperature to purge with nitrogen. After that, nitrogen bubbling was started under reduced pressure, immersed in an 80 ° C. oil bath and maintained at a reduced pressure of about 70 ° C. and 1000 Pa for 2 hours, then the reduced pressure was increased to 350 to 400 Pa and the reflux ratio was 10: 1 (return: distillation). The fraction having a boiling point of 49 to 51 ° C. was fractionated by the ratio of the valve opening time. The distillation results are shown in Table 5.

Figure 0005861884
Figure 0005861884

保存安定性試験1
実施例18で得た留分2を5.0gとり、トルエン5.0gとシリカゲル0.5gを加えて1時間攪拌した。シリカゲルを濾過した後、トルエンを減圧留去したサンプルを5℃及び25℃で保管し、所定時間毎にサンプリングしたものをGC分析してエキソ/エンド比を求めて保存安定性(エピメリ化)の有無を調べた。その結果を表6に示した。
Storage stability test 1
5.0 g of fraction 2 obtained in Example 18 was taken, 5.0 g of toluene and 0.5 g of silica gel were added, and the mixture was stirred for 1 hour. After filtering the silica gel, the toluene was distilled off under reduced pressure and stored at 5 ° C and 25 ° C. The samples sampled every predetermined time were subjected to GC analysis to obtain the exo / endo ratio and the storage stability (epimerization) The presence or absence was examined. The results are shown in Table 6.

保存安定性試験2〜4及び比較保存安定性試験1
シリカゲルに替えて吸着剤をアルミナ、活性炭、活性白土及び比較例として吸着剤未処理のままで保存安定性試験1と同様に行った。それらの結果を表6に示した。
Storage stability tests 2-4 and comparative storage stability test 1
It replaced with the silica gel, and it carried out similarly to the storage stability test 1 with the adsorbent untreated as an alumina, activated carbon, activated clay, and a comparative example. The results are shown in Table 6.

Figure 0005861884
Figure 0005861884

保存安定性試験5
実施例19で得た留分2を10.0gとり、シリカゲル2.0gを充填したカラムに通したものを5℃及び25℃で保管し、所定時間毎にサンプリングしたものをGC分析してエキソ/エンド比を求めて保存安定性(エピメリ化)の有無を調べた。その結果を表7に示した。
Storage stability test 5
10.0 g of fraction 2 obtained in Example 19 was taken, passed through a column packed with 2.0 g of silica gel, stored at 5 ° C. and 25 ° C., and sampled every predetermined time to be subjected to GC analysis and exo / End ratio was determined to determine the presence or absence of storage stability (epimerization). The results are shown in Table 7.

保存安定性試験6〜8
シリカゲルに替えて吸着剤をアルミナ、活性炭、活性白土を用いて保存安定性試験5と同様に行った。それらの結果を表7に示した。
Storage stability test 6-8
It replaced with the silica gel and it carried out similarly to the storage stability test 5 for the adsorption agent using the alumina, activated carbon, and activated clay. The results are shown in Table 7.

Figure 0005861884
Figure 0005861884

表6の結果より、いずれの吸着剤も未処理の場合に比べてエピメリ化の進行度合いは少なく安定であり、効果のあることが分かった。特にシリカゲルの効果が顕著であった。また表7の結果より、高段数で還流かけて精留効果を高めた留分については、いずれの吸着材を用いた場合にも高い割合でエピメリ化の進行を抑えられることが分かった。 From the results of Table 6, it was found that the degree of progress of epimerization was small and stable as compared with the case where any adsorbent was not treated. In particular, the effect of silica gel was remarkable. Further, from the results of Table 7, it was found that the progress of epimerization can be suppressed at a high rate in the case of using any adsorbent for the fraction obtained by increasing the rectification effect by refluxing at a high stage number.

[2−アセチル−5−ノルボルネン(R=Me)の例]
実施例20
攪拌機、温度計、窒素導入口を装備した50mL四口フラスコにエンドリッチ2−アセチル−5−ノルボルネン(A)13.6g(100ミリモル)を仕込み、0℃の恒温槽に浸し、窒素雰囲気下に(A)に対し強塩基性有機化合物(B)として5モル%に相当するジアザビシクロウンデセン(DBU)0.76g(5ミリモル≒0.75mL)を注入してエピメリ化反応を開始した。0℃で1時間反応後(エキソ体/エンド体比は0.12)、25℃に昇温し1時間(エキソ体/エンド体比は0.12)、50℃に昇温し2時間(エキソ体/エンド体比は0.17)、70℃に昇温し2時間(エキソ体/エンド体比は0.30)、80℃で6時間反応させた。反応追跡はガスクロマトグラフィーを用いて行った(装置:(株)島津製作所製GC17A;検出器:FID;カラム:DB5使用)。12時間反応後の結果を表8に示した。なお、原料(A)の組成はエキソ体10.7%、エンド体88.5%であった。
[Example of 2-acetyl-5-norbornene (R = Me)]
Example 20
Into a 50 mL four-necked flask equipped with a stirrer, a thermometer, and a nitrogen inlet, 13.6 g (100 mmol) of endrich 2-acetyl-5-norbornene (A) was charged, immersed in a thermostatic bath at 0 ° C., and placed in a nitrogen atmosphere. Epimerization reaction was initiated by injecting 0.76 g (5 mmol≈0.75 mL) of diazabicycloundecene (DBU) corresponding to 5 mol% as a strongly basic organic compound (B) to (A). After reacting at 0 ° C. for 1 hour (the exo / endo ratio is 0.12), the temperature is raised to 25 ° C. for 1 hour (the exo / endo ratio is 0.12), and the temperature is raised to 50 ° C. for 2 hours ( The exo isomer / endo isomer ratio was 0.17), the temperature was raised to 70 ° C., and the reaction was performed for 2 hours (exo isomer / endo isomer ratio was 0.30) and at 80 ° C. for 6 hours. The reaction was traced using gas chromatography (apparatus: GC17A manufactured by Shimadzu Corporation; detector: FID; column: DB5 used). The results after 12 hours of reaction are shown in Table 8. The composition of the raw material (A) was 10.7% exo-form and 88.5% end-form.

実施例21
使用した塩基をDBUからN−メチル−トリアザビシクロデセン(MTBD)0.76g(5ミリモル≒0.71mL)に替え、反応を、0℃で1時間反応後、25℃に昇温し1時間、50℃に昇温し2時間、70℃に昇温し6時間反応させたほかは実施例20と同様に行い、結果を表8に示した。
Example 21
The base used was changed from DBU to 0.76 g (5 mmol≈0.71 mL) of N-methyl-triazabicyclodecene (MTBD), and the reaction was allowed to react at 0 ° C. for 1 hour, then warmed to 25 ° C. and heated for 1 hour. The temperature was raised to 50 ° C. for 2 hours, and the temperature was raised to 70 ° C. and reacted for 6 hours. The reaction was performed in the same manner as in Example 20, and the results are shown in Table 8.

実施例22
使用した塩基をDBUからフォスファゼン塩基P1−t−ブチル−トリス(テトラメチレン)(BTPP)1.56g(5ミリモル≒1.5mL)に替え、反応を、0℃で1時間反応後、25℃に昇温し1時間、50℃に昇温し2時間(エキソ体/エンド体比は0.24)、70℃に昇温し2時間、100℃に昇温し6時間反応させたほかは実施例20と同様に行い、結果を表8に示した。
Example 22
The base used was changed from DBU to 1.56 g (5 mmol≈1.5 mL) of phosphazene base P1-t-butyl-tris (tetramethylene) (BTPP), and the reaction was carried out at 0 ° C. for 1 hour and then to 25 ° C. The temperature was raised for 1 hour, then raised to 50 ° C. for 2 hours (the exo / endo ratio was 0.24), raised to 70 ° C. for 2 hours, raised to 100 ° C. and reacted for 6 hours. It carried out like Example 20 and the result was shown in Table 8.

実施例23
反応温度を50℃の一定とし48時間反応させたほかは実施例20と同様に行い、結果を表8に示した。
Example 23
The reaction was carried out in the same manner as in Example 20 except that the reaction temperature was kept constant at 50 ° C. for 48 hours, and the results are shown in Table 8.

実施例24
反応温度を80℃の一定とし24時間反応させたほかは実施例20と同様に行い、結果を表8に示した。
Example 24
The reaction was carried out in the same manner as in Example 20 except that the reaction temperature was kept constant at 80 ° C. for 24 hours, and the results are shown in Table 8.

Figure 0005861884
Figure 0005861884

(表中、DBUはジアザビシクロウンデセン、MTBDはN−メチル−トリアザビシクロデセン、BTPPはフォスファゼン塩基P1−t−ブチル−トリス(テトラメチレン)を表す。) (In the table, DBU represents diazabicycloundecene, MTBD represents N-methyl-triazabicyclodecene, and BTPP represents phosphazene base P1-t-butyl-tris (tetramethylene).)

[2−ベンゾイル−5−ノルボルネン(R=Ph)の例]
実施例25
攪拌機、温度計、窒素導入口を装備した50mL四口フラスコにエンドリッチ2−ベンゾイル−5−ノルボルネン(A)19.8g(100ミリモル)を仕込み、0℃の恒温槽に浸し、窒素雰囲気下にエンドリッチ2−ベンゾイル−5−ノルボルネン(A)に対し強塩基性有機化合物(B)として5モル%に相当するジアザビシクロウンデセン(DBU)0.76g(5ミリモル≒0.75mL)を注入してエピメリ化反応を開始した。0℃で1時間反応後、25℃まで昇温し1時間、50℃まで昇温し2時間、70℃に昇温し3時間、80℃で5時間反応させた。反応追跡はガスクロマトグラフィーを用いて行った(装置:(株)島津製作所製GC17A;検出器:FID;カラム:DB5使用)。結果を表9に示した。なお、エンドリッチ2−ベンゾイル−5−ノルボルネン(A)の組成はエキソ体47.0%、エンド体50.5%であった。
[Example of 2-benzoyl-5-norbornene (R = Ph)]
Example 25
Into a 50 mL four-necked flask equipped with a stirrer, a thermometer, and a nitrogen inlet, 19.8 g (100 mmol) of endrich 2-benzoyl-5-norbornene (A) was charged, immersed in a thermostatic bath at 0 ° C., and placed in a nitrogen atmosphere. Into endrich 2-benzoyl-5-norbornene (A), 0.76 g (5 mmol≈0.75 mL) of diazabicycloundecene (DBU) corresponding to 5 mol% was injected as a strongly basic organic compound (B). Then, the epimerization reaction was started. After reacting at 0 ° C. for 1 hour, the temperature was raised to 25 ° C. for 1 hour, raised to 50 ° C., raised for 2 hours, raised to 70 ° C., and reacted at 80 ° C. for 5 hours. The reaction was traced using gas chromatography (apparatus: GC17A manufactured by Shimadzu Corporation; detector: FID; column: DB5 used). The results are shown in Table 9. The composition of endorich 2-benzoyl-5-norbornene (A) was 47.0% exo isomer and 50.5% endo isomer.

実施例26
反応温度を50℃の一定として24時間反応させたほかは実施例25と同様に行い、GC分析の結果を表9に示した。
Example 26
The reaction was carried out in the same manner as in Example 25 except that the reaction temperature was kept constant at 50 ° C. for 24 hours, and the results of GC analysis are shown in Table 9.

実施例27
反応温度を80℃の一定とした12時間反応させたほかは実施例25と同様に行い、GC分析の結果を表9に示した。
Example 27
The reaction was performed in the same manner as in Example 25 except that the reaction temperature was kept constant at 80 ° C. for 12 hours. The results of GC analysis are shown in Table 9.

Figure 0005861884
Figure 0005861884

本発明のエキソ体を多く含む(エキソ富化)2−アシル−5−ノルボルネン類の製造方法は、電子材料及び光学材料用脂環系ポリマーを効率的に製造する方法として有用である。
The method for producing 2-acyl-5-norbornenes containing a large amount of exo isomers according to the present invention is useful as a method for efficiently producing alicyclic polymers for electronic materials and optical materials.

Claims (8)

一般式(1):
Figure 0005861884
(式中、Rは水素、または置換基を有していてもよいメチル基及びアルキル基もしくはフェニル基のいずれかを表す。)で表わされる2位にアシル基を有するエンド型ノルボルネン化合物(A)に、アセトニトリル中における共役酸の酸解離定数が20以上の強塩基性有機化合物(B)を接触させることを特徴とするエキソ型ノルボルネン化合物の製造方法。
General formula (1):
Figure 0005861884
(In the formula, R represents hydrogen or an optionally substituted methyl group, alkyl group or phenyl group.) An endo-type norbornene compound having an acyl group at the 2-position (A) And a strongly basic organic compound (B) having an acid dissociation constant of the conjugate acid in acetonitrile of 20 or more is contacted with the process for producing an exo-type norbornene compound.
アセトニトリル中で求められた共役酸の酸解離定数が20以上の強塩基性有機化合物(B)が、グアニジン塩基類、アミジン系及びグアニジン系多窒素多複素環状化合物の強塩基類およびそのポリマ−担持強塩基類、フォスファゼン塩基類、プロアザフォスファトラン塩基類からなる群より選ばれる少なくとも1種である請求項記載のエキソ型ノルボルネン化合物の製造方法。 A strongly basic organic compound (B) having an acid dissociation constant of 20 or more for a conjugate acid obtained in acetonitrile is a strong base of guanidine bases, amidine-based and guanidine-based polynitrogen polyheterocyclic compounds, and a polymer support thereof. The method for producing an exo-type norbornene compound according to claim 1 , wherein the exo-norbornene compound is at least one selected from the group consisting of strong bases, phosphazene bases, and proazaphosphatran bases. 2位にアシル基を有するエンド型ノルボルネン化合物(A)に、アセトニトリル中で求められた共役酸の酸解離定数が20以上の強塩基性有機化合物(B)を接触させて得られた反応液を蒸留することによりエキソ型ノルボルネン化合物を得ることを特徴とする請求項1又は2記載のエキソ型ノルボルネン化合物の製造方法。 A reaction solution obtained by contacting an endo-norbornene compound (A) having an acyl group at the 2-position with a strongly basic organic compound (B) having an acid dissociation constant of a conjugate acid of 20 or more determined in acetonitrile. The method for producing an exo-type norbornene compound according to claim 1 or 2 , wherein the exo-type norbornene compound is obtained by distillation. 2位にアシル基を有するエンド型ノルボルネン化合物(A)に、アセトニトリル中で求められた共役酸の酸解離定数が20以上の強塩基性有機化合物(B)を接触させつつ反応液を蒸留することによりエキソ型ノルボルネン化合物を得ることを特徴とする請求項1〜のいずれかに記載のエキソ型ノルボルネン化合物の製造方法。 Distilling the reaction solution while contacting an endo-type norbornene compound (A) having an acyl group at the 2-position with a strongly basic organic compound (B) having an acid dissociation constant of the conjugate acid determined in acetonitrile of 20 or more. The exo-type norbornene compound according to any one of claims 1 to 3 , wherein the exo-type norbornene compound is obtained by the method. 2位にアシル基を有するエンド型ノルボルネン化合物(A)に、アセトニトリル中で求められた共役酸の酸解離定数が20以上の強塩基性有機化合物(B)を接触させつつ反応液を蒸留するとともに2位にアシル基を有するエンド型ノルボルネン化合物を連続的または分割して追加供給しながら反応と蒸留を継続することによりエキソ型ノルボルネン化合物を得ることを特徴とする請求項1〜のいずれかに記載のエキソ型ノルボルネン化合物の製造方法。 While the endo-norbornene compound (A) having an acyl group at the 2-position is brought into contact with a strongly basic organic compound (B) having an acid dissociation constant of conjugate acid of 20 or more obtained in acetonitrile, the reaction solution is distilled. to any one of claims 1 to 4, characterized in that to obtain the exo-type norbornene compound by continuing continuous or divided and distillation reaction while additionally supplied ended norbornene compound having a 2-position acyl group The manufacturing method of exo-type norbornene compound of description. 2位にアシル基を有するエンド型ノルボルネン化合物(A)に、アセトニトリル中で求められた共役酸の酸解離定数が20以上の強塩基性有機化合物(B)を接触させつつ反応液を蒸留するとともに2位にアシル基を有するエンド型ノルボルネン化合物(A)と強塩基性有機化合物(B)を同時あるいは別々に連続的または分割して追加供給しながら反応と蒸留を継続することによりエキソ型ノルボルネン化合物を得ることを特徴とする請求項1〜4のいずれかに記載のエキソ型ノルボルネン化合物の製造方法。 While the endo-norbornene compound (A) having an acyl group at the 2-position is brought into contact with a strongly basic organic compound (B) having an acid dissociation constant of conjugate acid of 20 or more obtained in acetonitrile, the reaction solution is distilled. An exo-type norbornene compound by continuing the reaction and distillation while supplying the endo-type norbornene compound (A) having an acyl group at the 2-position and the strongly basic organic compound (B) simultaneously or separately continuously or separately. The method for producing an exo-type norbornene compound according to any one of claims 1 to 4, wherein: 蒸留により得られたエキソ型ノルボルネン化合物を吸着剤に接触させることを特徴とする請求項3〜6に記載のエキソ型ノルボルネン化合物の製造方法。 The method for producing an exo-type norbornene compound according to claim 3 , wherein an exo-type norbornene compound obtained by distillation is brought into contact with an adsorbent. 吸着剤がシリカゲル、活性アルミナ、活性炭、活性白土、イオン交換樹脂、珪藻土及びセルロ−スからなる群より選ばれる少なくとも1種である請求項に記載のエキソ型ノルボルネン化合物の製造方法。 The method for producing an exo-type norbornene compound according to claim 7 , wherein the adsorbent is at least one selected from the group consisting of silica gel, activated alumina, activated carbon, activated clay, ion exchange resin, diatomaceous earth, and cellulose.
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