JP5847681B2 - Chemical liquid discharge amount measuring jig, chemical liquid discharge amount measuring mechanism and chemical liquid discharge amount measuring method - Google Patents

Description

  The present invention relates to a measurement jig, a measurement mechanism, and a measurement method for measuring a discharge amount of a chemical solution from a chemical solution supply unit to a substrate in a coating processing apparatus that applies the chemical solution to the substrate by the chemical solution supply unit.

  For example, in a photolithography process in a semiconductor device manufacturing process, for example, a resist coating process for applying a resist solution on a semiconductor wafer (hereinafter referred to as “wafer”) to form a resist film, and exposing the resist film to a predetermined pattern An exposure process, a development process for developing the exposed resist film, and the like are sequentially performed to form a predetermined resist pattern on the wafer.

  In the above-described resist solution coating process, the resist solution is supplied from the supply nozzle to the center of the wafer while being rotated while being held by the spin chuck, and the resist solution is diffused on the wafer by centrifugal force. Therefore, so-called spin coating for forming a resist film on a wafer is widely known.

  In order to control the film thickness of the resist film formed on the surface of the wafer in such spin coating with high accuracy, it is necessary to accurately control the discharge amount of the resist liquid discharged from the supply nozzle to the wafer. Therefore, in the above-described coating processing apparatus, the discharge amount from the supply nozzle is periodically measured, and the discharge pressure setting operation of the pump that sends the resist solution to the supply nozzle is performed as necessary.

  For example, Patent Document 1 proposes a resist coating processing apparatus having a mechanism for measuring the amount of resist solution supplied from a supply nozzle. Specifically, a container capable of storing a predetermined amount of resist solution is installed at a standby position where an unused supply nozzle waits, and the resist solution is discharged from the supply nozzle into the container at this standby position. Then, this container is unloaded from the resist coating apparatus by an operator, and the discharge amount of the resist solution from the supply nozzle is measured by, for example, a graduated cylinder by the operator's manual operation. And the discharge pressure of a pump is adjusted as needed.

JP-A-4-236419

  However, when carrying out the above-mentioned container from the resist coating apparatus or measuring with a graduated cylinder, there is a risk that the chemical solution may scatter and be applied to the worker, or the worker may be injured by the drive system device of the coating process apparatus. . Therefore, there is a demand for a method for measuring the discharge amount that does not cause the operator to perform work in the coating apparatus.

  The present invention has been made in view of such a point, and in a coating processing apparatus for applying a chemical solution to a substrate, the amount of the chemical solution discharged from the nozzle to the substrate is measured without the manual operation of an operator. It is an object.

In order to achieve the above object, the present invention provides an apparatus for supplying a chemical solution in a coating processing apparatus that performs a substrate coating process by holding a substrate in a substrate holder and discharging a chemical solution from a chemical solution supply unit to the held substrate. A measurement jig for measuring the amount of chemical liquid discharged from the means onto the substrate, the measurement substrate held by the substrate holder, and a capacitance meter provided on the measurement substrate, A capacitance measuring reservoir provided on an upper surface of the measurement substrate for storing the chemical solution discharged from the chemical solution supply means, and the electrode constituting the capacitance meter is configured to store the capacitance measurement. as the contact area between the chemical changes in accordance with a change in liquid level of the stored drug solution in part, in the interior of the capacitance measurement reservoir, provided in a state inclined from the at least horizontal, for the measurement On the upper surface of the substrate, from the chemical solution supply means A dielectric constant measurement reservoir for storing the discharged chemical is further formed, and the capacitance meter is all stored in the dielectric constant measurement reservoir by the amount of chemical discharged to the dielectric constant reservoir. It is provided so that it may be immersed in a chemical | medical solution .

  According to the present invention, the capacity measurement storage section is provided on the upper surface of the measurement substrate, and the capacitance measurement storage section has a capacitance so that the capacitance changes according to the capacity of the stored chemical solution. Since the meter is provided, the liquid level height of the chemical liquid stored in the capacity measurement storage unit can be obtained from the measurement value of the capacitance meter. Therefore, the amount of the stored chemical solution in the capacity measurement storage unit, in other words, the amount of the chemical solution discharged from the chemical solution supply means can be obtained based on the measurement result of the chemical solution discharge amount measuring jig. Therefore, it is possible to measure the discharge amount of the chemical liquid from the chemical liquid supply means to the substrate without the manual operation of the worker.

  The capacity measuring reservoir may be inclined downward so that an area in plan view is narrowed, and a plurality of the capacitance meters may be provided radially in the capacity measuring reservoir.

  The electrodes constituting the capacitance meter may be arranged to face each other along grooves formed radially in the capacity measuring storage section.

  The electrodes constituting the capacitance meter may be arranged to face each other along grooves radially formed in the dielectric constant measurement storage unit.

  The surface of the capacity measurement storage unit may have water repellency with respect to the chemical solution, and the surface of the dielectric constant measurement storage unit has water repellency with respect to the chemical solution. The chemical | medical solution discharge amount measuring jig in any one of Claim 3 or 5.

According to another aspect of the present invention, there is provided a coating processing apparatus for performing a substrate coating process by holding a substrate on a substrate holding unit and discharging a chemical solution from the chemical solution supply unit to the held substrate. A measurement mechanism for measuring a discharge amount of the chemical liquid to the measurement substrate, the measurement substrate held on the substrate holding unit, a capacitance meter provided on the measurement substrate, and provided on the upper surface of the measurement substrate A storage unit for capacity measurement that stores the chemical solution discharged from the chemical solution supply means, and a calculation unit that calculates a discharge amount of the chemical solution based on a measurement result of the capacitance meter, The electrodes constituting the capacitance meter are arranged inside the capacity measurement storage section so that the contact area with the chemical liquid changes according to the change in the liquid level of the chemical liquid stored in the capacity measurement storage section. in, provided in a state inclined from the at least horizontal On the upper surface of the measurement substrate, a dielectric constant measurement reservoir for storing the chemical liquid discharged from the chemical liquid supply means is further formed, and the capacitance meter includes the dielectric meter in the dielectric constant measurement reservoir. It is characterized in that it is provided so as to be all immersed in the chemical solution by the amount of the chemical solution discharged to the rate measuring storage unit .

  The capacity measuring reservoir may be inclined downward so that an area in plan view is narrowed, and a plurality of the capacitance meters may be provided radially in the capacity measuring reservoir.

  The electrodes constituting the capacitance meter may be arranged to face each other along grooves formed radially in the capacity measuring storage section.

  The electrodes constituting the capacitance meter may be arranged to face each other along grooves radially formed in the dielectric constant measurement storage unit.

  The surface of the capacity measurement reservoir may have water repellency with respect to the chemical solution, and the surface of the dielectric constant measurement reservoir may have water repellency with respect to the chemical solution.

  Further, the present invention according to another aspect is a measuring method for measuring a discharge amount of a chemical solution from the chemical solution supply unit to the substrate using the chemical solution discharge amount measuring jig, wherein the chemical solution supply unit It is characterized in that the chemical solution is discharged into the capacity measuring storage unit and the discharge amount of the chemical solution is calculated based on the measurement result of the capacitance meter.

  ADVANTAGE OF THE INVENTION According to this invention, in the coating processing apparatus which apply | coats a chemical | medical solution to a board | substrate, the discharge amount of the chemical | medical solution to a board | substrate from a nozzle can be measured without an operator's manual operation.

It is a longitudinal cross-sectional view which shows the outline of a structure of the coating processing apparatus concerning this Embodiment. It is a cross-sectional view which shows the outline of a structure of the coating processing apparatus concerning this Embodiment. It is a perspective view which shows the outline of a structure of the wafer for a measurement. It is a perspective view which shows the outline of a structure of the storage part for capacity | capacitance measurement. It is a top view which shows the outline of a structure of the storage part for capacity | capacitance measurement. It is explanatory drawing which shows the structure of the vicinity of a groove | channel. It is a perspective view which shows the outline of a structure of the storage part for dielectric constant measurement. It is explanatory drawing showing the relationship between an electrostatic capacitance value and the quantity of the chemical | medical solution between electrodes. It is explanatory drawing which shows the cross-sectional shape of a storage part. It is a flowchart which shows the main processes of the discharge amount measurement of a chemical | medical solution. It is explanatory drawing which shows the state which discharged the chemical | medical solution to the storage part for dielectric constant measurement. It is explanatory drawing which shows the state which discharged the chemical | medical solution to the storage part for capacity | capacitance measurement. It is explanatory drawing which showed a mode that the wafer for a measurement was wash | cleaned.

  Embodiments of the present invention will be described below. FIG. 1 is a longitudinal sectional view showing an outline of a configuration of a coating processing apparatus 10 using a chemical discharge amount measuring jig 1 according to the present embodiment. FIG. 2 is a cross-sectional view showing an outline of the configuration of the coating treatment apparatus 10.

  The coating processing apparatus 10 has a processing container 11 as shown in FIG. A spin chuck 20 serving as a holding unit that holds and rotates the substrate is provided at the center of the processing container 11. The spin chuck 20 has a horizontal upper surface, and a suction port (not shown) for sucking the substrate, for example, is provided on the upper surface. The wafer W can be sucked and held on the spin chuck 20 by suction from the suction port. The wafer W in the present embodiment is a chemical liquid discharge amount measuring jig 1. Details of the chemical discharge amount measuring jig 1 will be described later.

  The spin chuck 20 includes a chuck drive mechanism 21 including, for example, a motor, and can be rotated at a predetermined speed by the chuck drive mechanism 21. Further, the chuck drive mechanism 21 is provided with an elevating drive source such as a cylinder, so that the spin chuck 20 can move up and down.

  Around the spin chuck 20, there is provided a cup 22 that receives and collects the liquid scattered or dropped from the wafer W. A discharge pipe 23 for discharging the collected liquid and an exhaust pipe 24 for exhausting the atmosphere in the cup 22 are connected to the lower surface of the cup 22.

  As shown in FIG. 2, a rail 30 extending along the Y direction (left and right direction in FIG. 2) is formed on the X direction negative direction (downward direction in FIG. 2) side of the cup 22. The rail 30 is formed, for example, from the outer side of the cup 22 on the Y direction negative direction (left direction in FIG. 2) to the outer side on the Y direction positive direction (right direction in FIG. 2). For example, two arms 31 and 32 are attached to the rail 30.

  As shown in FIGS. 1 and 2, the first arm 31 supports a supply nozzle 33 as a chemical solution supply unit that supplies a chemical solution to the wafer W.

  The first arm 31 is movable on the rail 30 by a nozzle driving unit 34 shown in FIG. As a result, the supply nozzle 33 can move from the standby part 35 installed outside the cup 22 on the positive side in the Y direction to above the center of the wafer W in the cup 22, and further on the surface of the wafer W It can move in the radial direction of W. The first arm 31 can be moved up and down by a nozzle drive unit 34 and the height of the supply liquid nozzle 33 can be adjusted. The standby unit 35 is provided with a standby block 35 a into which a plurality of supply nozzles 33 can be inserted. The standby block 35 a is configured so that a plurality of, for example, eight supply nozzles 33 can be inserted, and the standby arm 35 can hold an arbitrary supply nozzle 33 by the first arm 31.

  As shown in FIG. 1, a supply pipe 37 that communicates with a chemical solution supply source 36 is connected to the supply nozzle 33. A chemical solution is stored in the chemical solution supply source 36, and a pump (not shown) that pumps the chemical solution to the supply nozzle 33 is provided. The supply pipe 37 is provided with a supply device group 38 including a valve for controlling the flow of the chemical solution, a flow rate adjusting unit, and the like. Note that the chemical solution in the present embodiment is, for example, a resist solution.

  A pure water nozzle 40 that supplies pure water as a cleaning liquid is supported on the second arm 32. The second arm 32 is movable on the rail 30 by a nozzle drive unit 41 as a nozzle moving mechanism shown in FIG. 2, and the pure water nozzle 40 is provided outside the cup 22 on the Y direction negative direction side. The standby unit 42 can be moved up to the upper center of the wafer W in the cup 22. Further, the second arm 32 can be moved up and down by the nozzle drive unit 41, and the height of the pure water nozzle 40 can be adjusted.

  As shown in FIG. 1, a supply pipe 44 that communicates with a pure water supply source 43 is connected to the pure water nozzle 40. Pure water is stored in the pure water supply source 43. The supply pipe 44 is provided with a supply device group 45 including a valve for controlling the flow of pure water, a flow rate adjusting unit, and the like.

  Next, the configuration of the chemical discharge amount measuring jig 1 will be described. As shown in FIG. 3, the chemical discharge amount measurement jig 1 has a substantially disk-shaped measurement wafer W that is thicker than a semiconductor wafer used for manufacturing a semiconductor device. As shown in FIGS. 3 and 4, the measurement wafer W is provided with a capacity measurement storage unit 50 for storing the resist solution discharged from the supply nozzle 33, which is recessed downward. A plurality of the capacity measurement storage units 50 are arranged concentrically near the outer periphery of the measurement wafer W, and in this embodiment, for example, eight capacity measurement storage units 50 are arranged at predetermined intervals. Further, on the upper surface of the measurement wafer W, there is a dielectric constant measurement storage unit 51 that stores the resist solution discharged from the supply nozzle 33, which is concentrically with the capacity measurement storage unit 50 and is recessed downward. It is provided in the place. A circuit board 52 having a predetermined electric circuit, a device such as a memory, and a power source is located inside the area where the capacity measurement storage section 50 and the dielectric constant measurement storage section 51 are provided, that is, in the center of the measurement wafer W. Is provided. The circuit board 52 includes a transmitter (not shown) that transmits a signal to the control unit 100 described later.

  As shown in FIG. 4, the capacity measuring reservoir 50 is a substantially conical depression. As shown in FIG. 5, a plurality of, for example, eight, a plurality of grooves 60 are formed radially on the surface of the capacity measurement storage section 50 from the lower end that is the center of the capacity measurement storage section 50. The groove 60 extends to the upper end of the capacity measurement storage unit 50.

  As shown in FIG. 6, the groove 60 has a rectangular cross-sectional shape. On the side wall 60a of the groove 60, two plate-like electrodes 61, 61 are provided in parallel and opposite to each other along the side wall 60a. That is, the electrodes 61, 61 form a capacitor and function as a capacitance meter whose capacity changes according to the liquid level of the chemical stored in the capacity measuring storage unit 50. The two electrodes 61 and 61 are connected to the circuit board 52 by wiring (not shown). In FIG. 6, for convenience of illustration, the electrode 61 narrower than the side wall 60a is depicted, but the electrode 61 may have a size covering the entire surface of the side wall 60a.

  As shown in FIG. 7, the dielectric constant measurement reservoir 51 is also a substantially conical depression, similar to the capacitance measurement reservoir 50. A plurality of grooves 70 are also formed on the surface of the dielectric constant measurement reservoir 51. Similarly to the groove 60, eight grooves 70 are formed radially from the lower end portion of the dielectric constant measurement storage portion 51. Unlike the groove 60, the groove 70 does not extend to the upper end of the dielectric constant measurement storage unit 51, but the other configurations are the same as the groove 60. That is, the groove 70 has a rectangular cross section, and electrodes 61 and 61 functioning as a capacitance meter are provided on the side wall thereof. The specific length of the groove 70 is set to such a length that the electrodes 61 and 61 of the groove 70 are all immersed in the amount of the chemical solution discharged from the supply nozzle 33 at a time. In the present embodiment, for example, the dielectric constant measuring reservoir 51 is formed to a height of about 2/3.

  The rotation operation and the vertical operation of the spin chuck 20 described above, the movement operation of the developing solution nozzle 33 by the nozzle driving unit 34, the supply operation of the developing solution of the developing solution nozzle 33 by the supply device group 38, and the pure water nozzle 40 by the nozzle driving unit 41. The operation of the drive system, such as the movement operation of the pure water nozzle 40 by the supply device group 45 and the supply operation of the pure water nozzle 40, is controlled by the control unit 100. The control unit 100 is configured to be able to receive a transmission signal from the circuit board 52. The control unit 100 is configured by, for example, a computer having a CPU, a memory, and the like. For example, by executing a program stored in the memory, the coating process in the coating processing apparatus 10 can be realized. The control unit 100 also functions as a calculation unit that executes processing of transmission signals from the circuit board 52. Various programs for realizing the development processing in the coating processing apparatus 10 include, for example, a computer-readable hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnetic optical desk (MO), a memory card, and the like. That is stored in the storage medium H and installed in the control unit 100 from the storage medium H is used.

  Next, when the supply / discharge measurement in the coating treatment apparatus 10 by the chemical discharge amount measuring jig 1 configured as described above is described, the measurement principle will be described first.

  The capacitance C of the capacitor (capacitance meter) constituted by the electrodes 61 and 61 is represented by εS / d. Here, ε is the dielectric constant of the dielectric between the electrodes 61 and 61, S is the area of the electrode 61, and d is the distance between the electrodes 61 and 61. Therefore, for example, when the chemical solution is stored in the capacity measurement storage unit 50 and the electrodes 61 and 61 of the groove 60 are immersed in the chemical solution, the static electricity is obtained as shown in FIG. 8 according to the liquid surface height and the dielectric constant of the chemical solution. The capacitance changes. More specifically, since the relative permittivity of the chemical solution is usually larger than the dielectric constant of air, the larger the amount of the chemical solution stored in the capacity measuring storage unit 50 and the higher the liquid level, the more the capacitance becomes growing.

Therefore, if the dielectric constant ε of the chemical solution is known in advance, the capacitance X between the electrodes 61 and 61 is obtained, so that the length X of the portion of the electrode 61 immersed in the chemical solution is expressed by the following formula (1 ).
X = dC / εW (1)
Here, W is the width of the electrode 61.

And if the length X of the electrode immersed in the chemical | medical solution is calculated | required, the volume V of the chemical | medical solution stored in the storage part 50 for capacity | capacitance measurement can be calculated | required from Formula (2) which is a formula of a conical volume. it can.
V = 1 / 3π (X cos θ) ² X sin θ (2)
Here, as shown in FIG. 9, θ is an inclination angle in the cross-sectional shapes of the capacity measurement storage unit 50 and the dielectric constant measurement storage unit 51, and X cos θ is the capacity measurement storage unit 50 and the dielectric constant measurement. The radius of the region where the chemical solution K is stored in the reservoir 51, and Xsinθ is the height in the vertical direction of the region where the chemical solution K is stored.

  In addition, when the dielectric constant ε of the chemical solution is known, the volume of the chemical solution in the capacity measurement storage unit 50 can be obtained from the above formulas (1) and (2). It is necessary to obtain the dielectric constant ε. However, in order to obtain the dielectric constant ε, it is necessary to carry a chemical solution by an operator. Therefore, the chemical solution discharge amount measuring jig 1 according to the present embodiment is provided with a dielectric constant measurement reservoir 51 for obtaining the dielectric constant ε for a chemical solution with an unknown dielectric constant ε. Next, the dielectric constant measurement storage unit 51 will be described.

  As described above, since the capacitance C between the electrodes 61 and 61 can be obtained by εS / d, the capacitance measuring storage unit 50 obtains the value of the capacitance C according to the change in the area S. On the other hand, in the dielectric constant measurement storage unit 51, the capacitance C is obtained with the area S of the electrode 61 and the width d between the electrodes 61 and 61 being constant, thereby obtaining the dielectric constant of the chemical solution K that is an unknown value. Find ε.

  In the present embodiment, the groove 70 of the dielectric constant measurement reservoir 51 is set to a height at which all of the electrodes 61 and 61 are immersed by an amount of the chemical solution discharged from the supply nozzle 33 at a time. Therefore, the area S of the electrode 61 and the width d between the electrodes 61 and 61 are constant, and by measuring the capacitance C between the electrodes 61 and 61, the dielectric constant ε is obtained without manual intervention by the worker. Can be requested.

  Then, by using the dielectric constant ε obtained by the dielectric constant measurement storage unit 51 in the equation (1), the chemical liquid stored in the capacity measurement storage unit 50 even when the dielectric constant ε is unknown. Can be obtained from equation (2).

  The above formulas (1) and (2) are stored as programs in the memory of the control unit 100 in advance.

  The chemical solution discharge amount measuring jig 1 according to the present embodiment and the coating treatment apparatus 10 using the part chemical solution discharge amount measuring jig 1 are configured as described above. Next, the chemical solution discharge amount measuring tool is used. A process for measuring the discharge amount from the supply nozzle 33 using the jig 1 will be described. FIG. 10 is a flowchart showing an example of main steps of such development processing.

  In measuring the discharge amount of the chemical solution from the supply nozzle 33, first, the chemical discharge amount measurement jig 1 is carried into the processing container 11 of the coating processing apparatus 10 by a transport mechanism (not shown) (step S1 in FIG. 10). . The chemical discharge amount measuring jig 1 carried into the coating processing apparatus 10 is first sucked and held by the spin chuck 20.

Subsequently, the supply nozzle 33 of the standby unit 35 is moved to above the peripheral part of the measurement wafer W by the first arm 31 (step S2 in FIG. 10). In this case, the peripheral portion of the measurement wafer W is a concentric position of the capacity measurement storage unit 50 and the dielectric constant measurement storage unit 51 of the measurement wafer W.

  Next, the spin chuck 20 is rotated so that the dielectric constant measurement reservoir 51 is positioned below the supply nozzle 33. Next, in a state where the measurement wafer W is stopped, a predetermined amount of chemical solution is discharged from the supply nozzle 33, and as shown in FIG. 11, the chemical solution K is stored in the dielectric constant measurement storage unit 51 (FIG. 10). Step S3). Based on the signal transmitted from the circuit board 52, the control unit 100 obtains the dielectric constant ε of the chemical solution K stored in the dielectric constant measurement storage unit 51 (step S4 in FIG. 10).

  Thereafter, the measurement wafer W is rotated by the spin chuck 20 so that the capacity measurement reservoir 50 is positioned below the supply nozzle 33. Next, in a state where the measurement wafer W is stopped, a predetermined amount of the chemical solution K is discharged from the supply nozzle 33, and the chemical solution K is stored in the capacity measurement storage unit 50 as shown in FIG. Step S5). Then, based on the signal transmitted from the circuit board 52 and the dielectric constant ε determined by the dielectric constant measurement storage unit 51, the static electricity between the electrodes 61, 61 stored in the capacity measurement storage unit 50 by the control unit 100. Obtain the capacitance C. In the control unit 100, the volume of the chemical solution K stored in the capacity measurement storage unit 50, that is, the supply nozzle 33 is further discharged based on the capacitance C and the expressions (1) and (2). The amount of the chemical solution K is obtained (step S6 in FIG. 10).

  When the discharge amount is measured for one supply nozzle 33, the first arm 31 moves to the standby unit 35. Then, the other supply nozzle 33 is moved again to the periphery of the measurement wafer W, and the discharge amount of the supply nozzle 33 is also measured. Then, the discharge amount is sequentially measured for all eight supply nozzles 33.

  When the measurement of the discharge amount of the supply nozzle 33 is completed, the pure water nozzle 40 of the standby unit 42 is then moved above the center of the measurement wafer W by the second arm 32. Next, pure water is supplied from the pure water nozzle 40 to the center of the measurement wafer W while rotating the measurement wafer W, and the chemical liquid discharge amount measuring jig 1 is cleaned with pure water P as shown in FIG. This is performed (step S7 in FIG. 10). At this time, since the capacity measurement storage section 50 and the dielectric constant measurement storage section 51 formed on the measurement wafer W have a conical shape, the capacity measurement storage section 50 and the dielectric constant measurement storage section 51 are formed by centrifugal force. The chemical liquid K is easily discharged from.

  Thereafter, the chemical discharge amount measuring jig 1 is transported from the coating treatment apparatus 10 by a transport mechanism (not shown), and a series of measurement operations is completed. In parallel with this, the control unit 100 determines whether or not the discharge amount from the supply nozzle 33 is a desired value. The set values of the discharge pressure and the flow rate adjustment unit of the supply device group 38 are changed.

  According to the above embodiment, the capacity measurement reservoir 50 is provided on the upper surface of the measurement wafer W, and the liquid level of the chemical solution stored in the capacity measurement reservoir 50 is included in the capacity measurement reservoir 50. Electrodes 61 and 61 which are capacitance meters whose capacitance changes according to the height are provided. Therefore, the length X of the part immersed in the chemical | medical solution K among the electrodes 61 of the storage part 50 for capacity | capacitance measurement can be calculated | required by the electrostatic capacitance C of the electrodes 61 and 61. FIG. Based on this, the control unit 100 can determine the amount of the stored chemical solution in the capacity measurement storage unit 50, in other words, the amount of the chemical solution K discharged from the supply nozzle 33. Therefore, according to the present invention, it is possible to measure the discharge amount of the chemical liquid K from the supply nozzle 33 onto the measurement wafer W without the manual operation of the worker.

  In the above embodiment, a plurality of capacity measurement reservoirs 50 are provided concentrically. However, the number and arrangement of the capacity measurement reservoirs 50 are not limited to the present embodiment. It can be set arbitrarily according to the number of installations.

  In the above embodiment, one dielectric constant measurement storage unit 51 is provided. However, when a plurality of different types of chemical liquids K are supplied from the plurality of supply nozzles 33, the dielectric constant measurement storage unit 50 is also provided. A plurality of chemical liquids K may be provided depending on the type of the chemical liquid K. In addition, when the dielectric constant ε of the chemical solution K is known, the dielectric constant measurement reservoir 51 is not necessarily provided.

  In the above embodiment, the capacity measurement reservoir 50 and the dielectric constant measurement reservoir 51 are conical, but the capacity measurement reservoir 50 and the dielectric constant measurement reservoir 51 are not necessarily conical. There is no need, and a quadrangular pyramid or a triangular pyramid, for example, may be used as long as the opening area in plan view is narrowed toward the lower part of the capacity measurement storage part 50 and the dielectric constant measurement storage part 51. For example, when the shape of the capacity measurement storage unit 50 or the dielectric constant measurement storage unit 51 is a cylindrical shape having a flat bottom surface, the center of the depression of the capacity measurement storage unit 50 or the dielectric constant measurement storage unit 51 If the centers of the nozzles do not match, there is a possibility that the shape of the liquid may not be constant, coupled with the large volume at the bottom of the recess. In this case, it is conceivable to reduce the opening areas of the capacity measurement storage section 50 and the dielectric constant measurement storage section 51. However, if the opening area is reduced, the capacity measurement storage section 50 and the dielectric constant measurement storage section 51 are supplied. It is necessary to strictly adjust the position of the nozzle 33 with respect to the center position. On the other hand, the supply nozzle 33 is displaced from the center position of the capacity measurement storage section 50 and the dielectric constant measurement storage section 51 by making the capacity measurement storage section 50 and the dielectric constant measurement storage section 51 into a cone or a quadrangular pyramid. Even if the chemical solution K gathers in the center of the depression due to its own weight and the volume of the bottom of the capacity measurement storage unit 50 or the dielectric constant measurement storage unit 51 is small, the shape of the chemical solution K is changed to the storage unit 50. , 51 can be constant. Further, from the viewpoint of collecting the liquid at the center of the capacity measurement reservoir 50 or the dielectric constant measurement reservoir 51, the lower end of the capacity measurement reservoir 50 or the dielectric constant measurement reservoir 51 is not necessarily sharp. It may be flat, and the surface treatment may be performed so that the surfaces of the capacity measurement reservoir 50 and the dielectric constant measurement reservoir 51 have water repellency with respect to the chemical solution K.

In addition, the capacity measurement storage unit 50 and the dielectric constant measurement storage unit 51 may be a container disposed on the upper surface of the measurement wafer W instead of the depression.

  In the above embodiment, the capacitance meter is the plate-like electrodes 61, 61. However, the configuration of the capacitance meter is not limited to this embodiment. The capacitor may be formed by a conductor and a cylindrical conductor concentrically surrounding the conductor, or may be formed by a flat electrode and a linear conductor. .

  In the above embodiment, eight grooves 60 and 70 are provided radially in each reservoir 50 and 51, but the number of grooves 60 and 70 is not limited to this embodiment. According to the measurement principle described above, the discharge amount and the dielectric constant ε can be measured if there is one groove 60, 70, but the capacitance C can be measured by increasing the contact area between the electrode 61 and the chemical liquid K. Since the error can be reduced, it is preferable to provide a plurality of grooves 60 and 70. Further, the arrangement of the grooves 60 and 70 can be arbitrarily set as long as the electrodes 61 of the grooves 60 and 70 are arranged so as to be equally immersed in the chemical solution K stored in the storage units 50 and 51. It is. For example, the grooves may be arranged in a spiral shape or in a V shape. For example, when a concentric conductor is used as the electrode, the grooves 60 and 70 may have a circular cross-sectional shape in accordance with the electrode.

  In the above embodiment, the electrodes 61 and 61 as capacitance meters are arranged in parallel along the grooves 60 and 70. However, the arrangement and configuration of the electrodes 61 and 61 are limited to the present embodiment. If it is arranged so that the contact area with the chemical liquid K changes according to the change in the liquid surface height of the chemical liquid K stored in the capacity measurement storage unit 50, it can be arbitrarily set, You may arrange | position directly on the inner surface of the storage part 50 for capacity | capacitance measurement, or the storage part 51 for dielectric constant measurement, without providing the groove | channels 60 and 70. FIG. The arrangement in which the contact area with the chemical solution K changes according to the change in the liquid level height of the chemical solution K stored in the capacity measurement storage unit 50 is the capacity measurement storage unit 50 or the dielectric constant measurement storage unit. This means that the electrodes 61 and 61 are arranged so as to have a length in the height direction inside the 51. Note that having the length in the height direction includes not only the vertical direction but also a case of extending obliquely upward, for example. In addition, the arrangement in which the electrodes 61 and 61 have a length in the height direction means that the electrodes 61 and 61 are arranged in a state inclined at least from parallel. For example, when the flat parallel electrodes 61 and 61 are provided horizontally, the contact area with the electrodes 61 and 61 does not vary even if the liquid level of the chemical solution K varies, but it may be slightly tilted from parallel. For example, as the liquid level of the chemical liquid K varies, the contact area between the electrodes 61 and 61 and the chemical liquid K changes, and the capacitance C changes.

  In the above embodiment, the capacity of the chemical solution K is obtained by the control unit 100 based on the signal transmitted from the circuit board 52. For example, the memory of the circuit board 52 stores equations (1) and (2) for other operations. The volume of the chemical solution K may be calculated in the circuit board 52. In this case, the circuit board 52 functions as a calculation unit, and the calculation result is transmitted to the control unit 100. In addition, from the measurement of the capacitance C in the capacity measurement storage section 50 and the dielectric constant measurement storage section 51 by the chemical solution discharge amount measuring jig 1 and the calculation section, the capacity measurement storage section 50 and the dielectric constant measurement storage. A chemical solution discharge amount measuring mechanism that consistently calculates the volume of the chemical solution K stored in the unit 51, in other words, the calculation of the discharge amount from the supply nozzle 33 is configured.

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It is obvious for those skilled in the art that various modifications or modifications can be conceived within the scope of the idea described in the claims, and these naturally belong to the technical scope of the present invention. It is understood. The present invention is not limited to this example and can take various forms. For example, the present invention can be applied to the case where other processing liquids such as a developing solution and an etching solution are used in addition to the resist solution as the chemical solution. The above-described embodiment is an example of a semiconductor wafer coating apparatus, but the present invention applies other substrates such as an FPD (flat panel display) other than a semiconductor wafer and a mask reticle for a photomask. The present invention can also be applied to a processing apparatus.

  INDUSTRIAL APPLICABILITY The present invention is useful when measuring a discharge amount of a chemical solution from a nozzle to a substrate in a coating processing apparatus that applies the chemical solution to the substrate.

DESCRIPTION OF SYMBOLS 1 Chemical solution discharge amount measuring mechanism 10 Application | coating processing apparatus 11 Processing container 20 Spin chuck 21 Chuck drive mechanism 22 Cup 23 Ejection pipe 24 Exhaust pipe 30 Rail 31, 32 Arm 33 Supply nozzle 34 Nozzle drive part 35 Standby part 36 Chemical solution supply source 37 Supply Pipe 38 Supply device group 40 Pure water nozzle 41 Nozzle drive unit 42 Standby unit 43 Pure water supply source 44 Supply pipe 45 Supply device group 50 Capacity measurement storage unit 51 Dielectric constant measurement storage unit 52 Circuit board 60 Groove 61 Electrode 70 Groove 100 Control unit W Measuring wafer
K chemical
P pure water

Claims (13)

In a coating processing apparatus that holds a substrate on a substrate holding unit and discharges a chemical solution from the chemical solution supply unit to the held substrate to perform a substrate coating process, the amount of the chemical solution discharged from the chemical solution supply unit to the substrate is measured. A measuring jig for
A measurement substrate held by the substrate holder;
A capacitance meter provided on the measurement substrate;
A capacity measurement storage section for storing the chemical liquid discharged from the chemical liquid supply means provided on the upper surface of the measurement substrate;
The electrodes constituting the capacitance meter are arranged in the capacity measuring reservoir so that the contact area with the chemical changes according to the change in the liquid level of the chemical stored in the capacity measuring reservoir. Inside, at least tilted from the horizontal ,
On the upper surface of the measurement substrate, a dielectric constant measurement reservoir for storing the chemical discharged from the chemical supply means is further formed,
In the dielectric measurement reservoir, the capacitance meter is provided so as to be all immersed in the chemical with the amount of chemical discharged into the dielectric measurement reservoir. Quantity measuring jig. The capacity measuring storage part is inclined so that the area in plan view is narrowed downward,
2. The chemical discharge amount measuring jig according to claim 1, wherein a plurality of the capacitance meters are radially provided in the capacity measuring storage unit. The electrode which comprises the said capacitance meter is opposingly arranged along the groove | channel formed radially in the said storage part for capacity | capacitance measurement, It is any one of Claim 1 or 2 characterized by the above-mentioned. Jig for measuring the amount of discharged chemical. The electrode which comprises the said capacitance meter is opposingly arranged along the groove | channel formed radially in the said dielectric constant measurement storage part, The Claim 1 characterized by the above-mentioned. The jig for measuring the discharge amount of the chemical liquid described. The surface of the said capacity | capacitance measurement storage part has the water repellency with respect to the said chemical | medical solution, The chemical | medical solution discharge amount measuring jig as described in any one of Claims 1-4 characterized by the above-mentioned. 6. The chemical liquid discharge amount measuring jig according to claim 1, wherein a surface of the dielectric constant measuring storage part has water repellency with respect to the chemical liquid. In a coating processing apparatus that holds a substrate on a substrate holding unit and discharges a chemical solution from the chemical solution supply unit to the held substrate to perform a substrate coating process, the amount of the chemical solution discharged from the chemical solution supply unit to the substrate is measured. Measuring mechanism
A measurement substrate held by the substrate holder;
A capacitance meter provided on the measurement substrate;
A capacity measurement storage section for storing the chemical solution discharged from the chemical solution supply means, provided on the upper surface of the measurement substrate;
A calculation unit that calculates the discharge amount of the chemical based on the measurement result of the capacitance meter, and
The electrodes constituting the capacitance meter are arranged in the capacity measuring reservoir so that the contact area with the chemical changes according to the change in the liquid level of the chemical stored in the capacity measuring reservoir. Inside, at least tilted from the horizontal,
On the upper surface of the measurement substrate, a dielectric constant measurement reservoir for storing the chemical discharged from the chemical supply means is further formed,
In the dielectric measurement reservoir, the capacitance meter is provided so as to be all immersed in the chemical with the amount of chemical discharged into the dielectric measurement reservoir. Quantity measuring mechanism. The capacity measuring storage part is inclined so that the area in plan view is narrowed downward,
The medicinal-solution discharge amount measuring mechanism according to claim 7, wherein a plurality of the capacitance meters are radially provided in the capacity measuring storage unit. 9. The electrode according to claim 7, wherein the electrodes constituting the capacitance meter are disposed so as to face each other along grooves formed radially in the storage unit for capacitance measurement. 10. Chemical discharge measurement mechanism. 10. The electrode according to claim 7, wherein the electrodes constituting the capacitance meter are arranged to face each other along grooves radially formed in the dielectric constant measurement storage section. The chemical solution discharge amount measuring mechanism described. The chemical liquid discharge amount measuring mechanism according to any one of claims 7 to 10, wherein a surface of the capacity measuring reservoir has water repellency with respect to the chemical liquid. The chemical liquid discharge amount measuring mechanism according to any one of claims 7 to 11, wherein a surface of the dielectric constant measuring reservoir has water repellency with respect to the chemical liquid. A measurement method for measuring a discharge amount of a chemical solution from the chemical solution supply means to the substrate using the chemical solution discharge amount measuring jig according to claim 1,
The chemical solution is discharged by the chemical solution supply means into the capacity measuring reservoir,
A chemical solution discharge amount measuring method, comprising: calculating a chemical solution discharge amount based on a measurement result of the capacitance meter.

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