JP5821146B2 - Operation method of heat storage type gas processing apparatus and heat storage type gas processing apparatus - Google Patents

Description

  The present invention relates to an operation method of a regenerative gas processing apparatus used for exhaust air treatment for purifying exhaust air by burning volatile organic components contained in exhaust air from a paint booth or a paint drying furnace, and an operation method thereof. The present invention relates to a heat storage type gas processing apparatus to be implemented.

  More specifically (see FIG. 6 and FIG. 7), each of the four or more heat storage chambers 8 (8i, 8o, 8p, 8s) having one end communicating with the combustion processing chamber 5 including the combustion heater 5a is breathable. These heat storage material layers are arranged, and the other end of each of the heat storage chambers 8 is connected to each separate switching valve device 4, and this switching valve device 4 includes a rotary valve body 18 including a valve plate 20 and a receiving plate 21. The rotary valve body 18 and the distributor 15 are rotated relative to each other in a state in which the valve plate 20 is closely opposed to the receiving plate 21, and the distributor 15 includes the distributor 15. A plurality of distribution chambers 22 that are always in communication with the other end are divided and formed around the rotation axis of the relative rotation, and the distribution chamber 22 is separately provided in the receiving plate 21 in the receiving plate 21 in the distributor 15. Distributing ports 22a to be opened are formed at an equal pitch p around the rotation axis of the relative rotation, The valve body 18 includes an air supply chamber 23 that is always in communication with the gas introduction path 10, a purge chamber 25 that is always in communication with the purge gas path 28, and an exhaust chamber 24 that is in constant communication with the gas delivery path 11. A first and a second first and second facing each other simultaneously and in the relative rotation with respect to the two distribution ports 22a which are not adjacent to the valve plate 20 in the rotary valve body 18 are formed side by side around the rotation axis of the relative rotation. Two wind shielding plate portions 20a and 20b are formed, and the purge chamber 25 is provided in the valve plate 20 in the first wind shielding plate portion 20a of the first and second two wind shielding plate portions 20a and 20b. A purge port 25a to be opened is formed, and of the valve plate portions between the two wind shield plate portions 20a and 20b, the preceding valve plate preceding the first wind shield plate portion 20a in the relative rotation. In the part, there is an air supply chamber 23 An air supply port 23a that is opened in the plate 20 is formed, and an exhaust that opens the exhaust chamber 24 in the valve plate 20 in the valve plate portion on the downstream side that follows the first wind shielding plate portion 20a in the relative rotation. The present invention relates to an operation method of a regenerative gas processing apparatus in which an opening 24a is formed, and a regenerative gas processing apparatus that implements the operation method.

  That is, in this heat storage type gas processing apparatus, the heat storage chamber 8 that communicates with the gas introduction path 10 through the air supply port 23a and the distribution port 22a that is opposed to the air supply port 23a is used as the inlet side heat storage chamber 8i, and the exhaust port. The heat storage chamber 8 that communicates with the gas delivery path 11 through 24a and the distribution port 22a that communicates with the distribution port 22a is referred to as an outlet side heat storage chamber 8o.

  In addition, the heat storage chamber 8 communicating with the purge gas passage 28 through the purge port 25a of the first wind shielding plate portion 20a and the distribution port 22a opposed to the purge port 25a is defined as a purge target heat storage chamber 8p. 2 Let the heat storage chamber 8 corresponding to the distribution port 22a obstruct | occluded by the wind-shielding board part 20b be the wind-shield heat storage chamber 8s.

  Then, due to the relative rotation of the rotary valve body 18 and the distributor 15 in the switching valve device 4, each distribution port 22 a in the receiving plate 21 of the distributor 15 is exhausted from the air supply port 23 a and the purge port 25 a in the valve plate 20. By sequentially facing the opening 24a and the second wind shielding plate portion 20b in that order, a heat storage chamber serving as the inlet side heat storage chamber 8i, a heat storage chamber serving as the purge target heat storage chamber 8p, and an outlet side heat storage chamber 8o are provided. Each of the heat storage chambers, which are the heat storage chamber and the wind-insulated heat storage chamber 8s, is sequentially switched cyclically among the four or more heat storage chambers 8. By this switching, the outlet-side heat storage chamber 8o The high temperature processed gas G ′ from the combustion processing chamber 5 is passed through the heat storage material layer of the heat storage chamber 8 and the heat stored in the high temperature processed gas G ′ is stored in the heat storage material layer. The heat storage chamber 8 is connected to the inlet side heat storage chamber. i to preheat the gas to be processed G that is guided to the combustion processing chamber 5 by passing the gas to be processed G through the heat storage material layer that has been stored in the previous step, and thereby the combustion in the combustion processing chamber 5 The required heating amount of the heater 5a is reduced.

  Further, the heat storage chamber 8 which is the inlet side heat storage chamber 8i is switched to the purge target heat storage chamber 8p prior to the next switching to the outlet side heat storage chamber 8o, and the purge gas G ″ is passed through the purge target heat storage chamber 8p. Thus, the untreated gas G remaining in the heat storage chamber 8 in the switching from the inlet side heat storage chamber 8i is scavenged by the purge gas G ″.

  Conventionally, in this type of regenerative gas processing apparatus, in the gas processing operation in which the gas G to be processed is sent to the switching valve device 4 through the gas introduction path 10, the rotary valve body 18 and the distributor 15 in the switching valve device 4 are continuously connected. In general, as shown in FIG. 11, the first wind shielding plate portion 20 a that forms the purge port 25 a in the valve plate 20 has two adjacent distribution ports 22 a in the receiving plate 21. The windshield width θa ′ (the width in the rotation direction, in other words, the central angle) that can be directly opposed to each other.

  That is, this prevents the air supply port 23a and the purge port 25a in the valve plate 20 from being in communication with one distribution port 22a in the receiving plate 21 at the same time. The exhaust port 24a and the purge port 25a are prevented from simultaneously communicating with the distribution port 22a. (See Patent Documents 1 and 2)

  Of the first and second wind shield plate portions 20a and 20b in the valve plate 20, the other second wind shield plate portion 20b has a continuous relative rotation between the rotary valve body 18 and the distributor 15. The air supply width 23b of the air supply port 23a and the exhaust port 24a of the valve plate 20 is not provided at the same time with respect to one distribution port 22a of the receiving plate 21.

JP-A-7-305824 JP 10-61940 A

  However, in the above-described conventional device, since the wind shielding width θa ′ of the first wind shielding plate portion 20a in the valve plate 20 is large, the opening widths θs ′ and θr ′ ( The central angle) is limited to a small size, and the cross-sectional area of the air supply side air passage formed by the air supply port 23a and the distribution port 22a opposed to the air supply port 23a, and the distribution that communicates with the exhaust port 24a and the air supply side. The cross-sectional area of the exhaust-side air passage formed with the opening 22a is reduced, which causes problems such as a large gas ventilation resistance and increased blowing power, and a limited amount of gas processing air in the apparatus. It was.

  In view of this situation, the main object of the present invention is to effectively solve the above-described problems by rational improvements and to perform a so-called idling operation in a simplified manner.

A first characteristic configuration of the present invention relates to an operation method of a regenerative gas processing apparatus, and the characteristics are as follows. (For the sake of easy understanding, the same reference numerals as those used in the drawings are attached as reference numerals. In particular, refer to FIGS. 6 to 8 and FIGS. 9 and 10).
A breathable heat storage material layer 8a is disposed in each of four or more heat storage chambers 8 (8i, 8o, 8p, 8s) having one end communicating with the combustion processing chamber 5 including the combustion heater 5a, and these heat storage chambers. The other end of each of the 8 is connected to the switching valve device 4,
The switching valve device 4 includes a rotary valve body 18 having a valve plate 20 and a distributor 15 having a receiving plate 21, and the rotary valve is in a state where the valve plate 20 is closely opposed to the receiving plate 21. A configuration in which the body 18 and the distributor 15 are relatively rotated;
In the distributor 15, a plurality of distribution chambers 22 that are always in communication with the other end of each of the heat storage chambers 8 are arranged and arranged around the rotation axis of the relative rotation,
The receiving plate 21 in the distributor 15 is formed with a distribution port 22a for opening the distribution chamber 22 separately in the receiving plate 21, arranged at an equal pitch p around the rotation axis of the relative rotation,
The rotary valve body 18 includes an air supply chamber 23 that is always in communication with the gas introduction path 10, a purge chamber 25 that is always in communication with the purge gas path 28, and an exhaust chamber 24 that is in constant communication with the gas delivery path 11. A section is formed side by side around the rotation axis of the relative rotation,
The valve plate 20 of the rotary valve body 18 has first and second wind shielding plate portions 20a and 20b facing each other simultaneously and separately in the relative rotation with respect to the two non-adjacent distribution ports 22a. Forming,
Of these first and second wind shield plate portions 20a, 20b, the first wind shield plate portion 20a is formed with a purge port 25a for opening the purge chamber 25 in the valve plate 20,
Of the valve plate portions between the two wind shield plate portions 20a and 20b, the preceding valve plate portion preceding the first wind shield plate portion 20a in the relative rotation has the air supply chamber 23. Is formed in the valve plate 20 to form an air supply port 23a,
A regenerative gas processing apparatus in which an exhaust port 24a for opening the exhaust chamber 24 in the valve plate 20 is formed in a valve plate portion on the subsequent side following the first wind shielding plate portion 20a in the relative rotation. Driving method,
In the valve plate 20, the two wind shielding plate portions 20a, 20b, the air supply port 23a, and the exhaust port 24a are arranged in a relative arrangement relationship. In a state of facing the distribution port 22a, one of the two distribution ports 22a adjacent to the directly-facing distribution port 22a is fully open with respect to the air supply port 23a, and the other The arrangement is such that the distribution port 22a is fully open with respect to the exhaust port 24a.
In the gas processing operation in which the gas G to be processed is sent to the switching valve device 4 through the gas introduction path 10, the rotational positions at which the two wind shielding plate portions 20a and 20b are opposed to the one distribution port 22a are intermittently rotated. In the state of the stop position of each time, the rotating valve body 18 and the distributor 15 are intermittently relatively rotated by the parallel pitch p of the distribution ports 22a,
In the air baking operation in which the clean gas OA for air baking is sent to the switching valve device 4 through the gas introduction path 10 instead of the gas G to be processed,
Each of the two wind shielding plate portions 20a, 20b is in a state of straddling two adjacent distribution ports 22a, and half of the distribution ports 22a communicate with the air supply port 23a, and the distribution ports 22a An empty baking first half step of sending an empty baking clean gas OA to the switching valve device 4 through the gas introduction passage 10 in a state where the relative rotation is stopped at the rotational position where the other half communicates with the exhaust port 24a. Carried out,
Thereafter, with the rotary valve body 18 and the distributor 15 rotated by 180 degrees relative to the rotation stop position in the first half of the baking process, the cleaning gas OA for baking is supplied through the gas introduction path 10. It is in the point which implements the empty baking second half process sent to the said switching valve apparatus 4. FIG.

  According to this operating method, first, as the device configuration, in the state where each of the first and second wind shielding plate portions 20a and 20b in the valve plate 20 is directly facing one distribution port 22a, the facing distribution is performed. One of the two distribution ports 22a adjacent to the port 22a is fully open with respect to the air supply port 23a (the light gray portion in FIG. 8), and the other distribution port 22a is the exhaust port 24a (FIG. 8, the opening width θs in the rotation direction of the air supply port 23a and the exhaust port 24a in the valve plate 20 as compared with the above-described conventional device (FIG. 11). , Θr (center angle) can be secured large.

  In this way, in the gas processing operation (see FIGS. 8A to 8B), the opening widths θs and θr (center angles) of the air supply port 23a and the exhaust port 24a are ensured to be large. With the rotational position where each of the wind plate portions 20a, 20b is directly facing one distribution port 22a being the stop position for each rotation in intermittent rotation, the rotary valve body 18 and the distributor 15 are arranged in parallel with the pitch p of the distribution ports 22a. Since the relative rotation is intermittently performed at a time, the supply port 23a and the purge port 25a are simultaneously in communication with one distribution port 22a, or the exhaust port 24a and the purge port are connected to one distribution port 22a. It is possible to substantially reliably prevent the opening 25a from being in communication with each other at the same time.

  That is, according to this operation method, while preventing the gas leak between the air supply port 23a and the purge port 25a and the gas leak between the exhaust port 24a and the purge port 25a as in the conventional apparatus. Also, the cross-sectional area of the air supply side air passage formed by the air supply port 23a and the distribution port 22a facing and communicating with the air supply port 23a, and the exhaust port 24a and the distribution port 22a facing and communicating with the air supply port 23a are formed. A large cross-sectional area of the exhaust-side air passage can be secured, and the gas to be treated G and the treated gas G ′ can be smoothly ventilated through the air supply-side air passage and the exhaust-side air passage with a low airflow resistance. Can

  And by these things, the process air volume of an apparatus can be increased, without increasing the ventilation power of to-be-processed gas G and processed gas G ', and also the supply side and exhaust side with reduction of ventilation resistance. Can be made uniform, and the stability of the operation of the apparatus can be improved.

  By the way, in this type of heat storage type gas processing apparatus, in the gas processing operation, the spear component in the gas to be processed G condenses in each of the heat storage chambers 8 and each part of the chamber (particularly the inflow portion of the gas to be processed G in the heat storage material layer). ) And the amount of adhesion gradually increases. Instead of gas treatment operation in a timely manner, a clean high-temperature gas is allowed to pass through each of the heat storage chambers 8 to evaporate (or dry exfoliate or adhere the condensed condensation component). It is necessary to perform a so-called empty-burning operation in which it is removed by oxidation).

  On the other hand, according to the above method, in the first half of the baking process (see FIGS. 9A and 10A), each of the two wind shielding plate portions 20a and 20b in the valve plate 20 is in the receiving plate 21. Half of the distribution ports 22a communicate with the air supply port 23a (the light gray portion in FIG. 10) in the valve plate 20, and the other half of the distribution ports 22a are valves. In a state where the relative rotation between the rotary valve body 18 and the distributor 15 is stopped at a rotational position communicating with the exhaust port 24a (the dark gray portion in FIG. 10) in the plate 20, the clean gas OA for empty baking is introduced into the gas introduction path. 10, the half-heat storage chamber 8 corresponding to half of the distribution ports 22a communicating with the air supply port 23a is changed to the inlet-side heat storage chamber 8i and the exhaust port 24a. Ream In the state where the remaining half of the heat storage chambers 8 corresponding to the other half of the distribution ports 22a are set as the outlet side heat storage chamber 8o, the clean gas OA for baking is supplied to the gas introduction path 10—the switching valve device 4—the inlet side heat storage. The half-burning process is performed on half of the heat storage chambers 8 which are passed through the chamber 8i, the combustion processing chamber 5, the outlet side heat storage chamber 8o, the switching valve device 4 and the gas delivery path 11 in this order. Can do.

  Further, in the second half baking process (see FIGS. 9B and 10B), the rotary valve body 18 and the distributor 15 are relatively rotated by 180 degrees from the rotation stop position in the first half baking process and stopped. In this state, since the clean gas OA for empty baking is sent to the switching valve device 4 through the gas introduction path 10, the half of the heat storage chambers 8 made into the outlet side heat storage chamber 8o in the previous half baking step is the inlet side heat storage chamber 8i. In the same manner as in the first half of the baking process, the clean gas OA for empty baking is used with the remaining half of the heat storage chambers 8i used as the inlet side heat storage chamber 8i in the first half of the previous baking process as the outlet heat storage chamber 8o. Gas passage 10-switching valve device 4-inlet side heat storage chamber 8i-combustion treatment chamber 5-outlet side heat storage chamber 8o-switching valve device 4-gas delivery path 11 in this order to form outlet side heat storage chamber 8o. The remaining half of the heat storage chambers 8 can be baked Kill.

  That is, according to the above method, half of the four or more heat storage chambers 8 in the first half of the baking process and the second half of the baking process can be subjected to a single baking process at a time. It is possible to complete the baking process for all of the four or more heat storage chambers 8 in two processes, the second process and the latter process, thereby effectively reducing the time required for the baking process and performing the baking process. It can be simplified.

  In the implementation of this method, in the empty baking operation, a heater operation method in which the introduced empty burning clean gas OA is heated to the required empty baking temperature by the operation of the combustion heater 5a, or the combustion heater 5a. After the end of the gas processing operation, the empty burning operation is performed in a state where the residual heat from the gas processing operation remains in the combustion processing chamber 5 and the heat storage chamber 8, and the introduced clean gas for baking Any of the residual heat utilization methods for raising the OA to the required baking temperature by residual heat may be adopted.

  In addition, if the residual heat utilization method is adopted, the time required for the empty baking operation can be effectively shortened by the above method, and the empty baking operation is performed following the end of the gas treatment operation for one day. It is possible to avoid performing the baking operation on a holiday without gas treatment operation, and in this respect, the operating cost of the baking operation can be effectively reduced by adopting the residual heat utilization method. In addition, it is possible to effectively reduce the burden of apparatus maintenance including empty baking operation.

The second characteristic configuration of the present invention relates to a regenerative gas processing apparatus,
A breathable heat storage material layer is provided in each of the four or more heat storage chambers having one end communicating with a combustion processing chamber having a combustion heater, and the other end of each of the heat storage chambers is connected to a switching valve device;
The switching valve device includes a rotary valve body including a valve plate and a distributor including a receiving plate, and the rotary valve body and the distributor are disposed in a state where the valve plate is closely opposed to the receiving plate. With a relative rotation configuration,
In the distributor, a plurality of distribution chambers that always communicate with each other with respect to the other end of each of the heat storage chambers are arranged around the rotation axis of the relative rotation to form a partition,
In the receiving plate in the distributor, a distribution port for opening the distribution chamber separately in the receiving plate is formed side by side at an equal pitch around the rotation axis of the relative rotation,
The rotary valve body includes a supply chamber that is always in communication with the gas introduction path, a purge chamber that is always in communication with the purge gas path, and an exhaust chamber that is in continuous communication with the gas delivery path. Form the compartments side by side,
The valve plate in the rotary valve body is formed with two first and second wind shielding plate portions that face each other simultaneously and separately in the relative rotation with respect to the two distribution ports that are not adjacent to each other,
Of the first and second wind shielding plate portions, the first wind shielding plate portion is formed with a purge port for opening the purge chamber in the valve plate,
Among the valve plate portions between the two wind shield plate portions, the valve chamber on the leading side preceding the first wind shield plate portion in the relative rotation is provided with the air supply chamber in the valve plate. Form an air supply opening to open,
In the relative rotation, a regenerative gas processing device in which an exhaust port that opens the exhaust chamber in the valve plate is formed in a valve plate portion on the subsequent side that follows the first wind shielding plate portion,
The relative arrangement relationship between the two wind shielding plate portions, the air supply port, and the exhaust port in the valve plate is such that each of the two wind shielding plate portions faces one distribution port. An arrangement in which one of the two distribution ports adjacent to the directly-distributed distribution port is fully open with respect to the air supply port, and the other distribution port is fully open with respect to the exhaust port. Relationship,
A control means for operating the switching valve device;
In the gas processing operation in which the gas to be processed is sent to the switching valve device through the gas introduction path, the control means sets the rotational position at which each of the two wind shielding plate portions directly faces one of the distribution ports in each intermittent rotation. In the state of the stop position, the rotating valve body and the distributor are intermittently relatively rotated by the pitch of the distribution ports arranged in parallel,
In the air baking operation in which the clean gas for air baking is sent to the switching valve device through the gas introduction path instead of the gas to be treated,
Each of the two wind shielding plate portions straddles two adjacent distribution ports so that half of the distribution ports communicate with the air supply port, and the other half of the distribution ports are the exhaust ports. In the state where the relative rotation is stopped at the rotational position communicating with the air, the first half step of empty baking is performed in which the clean gas for baking is sent to the switching valve device through the gas introduction path.
After that, in the state where the rotary valve body and the distributor are relatively rotated by 180 degrees from the rotation stop position in the first half of the baking process and stopped, the switching valve device supplies the clean gas for baking through the gas introduction path. It is in the point which has the structure which implements the empty baking second half process sent to No.1.

  According to this configuration, the gas according to the operation method of the first characteristic configuration described above is configured in such a manner that the rotary valve body and the distributor are intermittently rotated relative to each other by the parallel pitch of the distribution ports by the operation of the switching valve device by the control means. The processing operation can be carried out automatically, and the relative rotation between the rotary valve body and the distributor at a predetermined stop position in each of the first half of the baking process and the second half of the baking process by operating the switching valve device by the control means. Can be automatically performed by the operation method of the first characteristic configuration described above.

The third feature configuration of the present invention specifies an embodiment suitable for the implementation of the second feature configuration.
The purge port is disposed in a state of facing the receiving plate portion between the two distribution ports between the first wind shielding plate portions of the receiving plate in the empty baking operation. .

  According to this configuration, in the empty baking operation, the purge port is in a state of facing the receiving plate portion between the two distribution ports between the first wind shielding plate portions of the receiving plate, and the receiving plate. By being in a state of being blocked by the part, high-temperature air-cleaning clean gas in the combustion processing chamber or heat storage chamber under air-burning operation is taken out of the device through the ventilation path of the purge gas, and conversely It is possible to avoid the external low-temperature gas from being brought into the combustion processing chamber or the heat storage chamber under the idling operation through the purge gas ventilation path.

  That is, this makes it possible to effectively reduce the heat loss in the air-burning operation, perform the air-burning operation more efficiently, and use the heater operation method described above. In the baking operation, the operating cost of the empty baking operation can be further reduced by the amount of reduction in the heat loss.

  Further, in the baking operation employing the residual heat utilization method, the residual heat can be used more effectively for raising the temperature of the clean gas for baking by the amount corresponding to the reduction of the heat loss. Combined with the shortening of the time required for the baking operation by the operation method, the time required for the baking operation can be further effectively reduced while adopting the residual heat utilization method.

  In the implementation of the above configuration, the purge port being blocked by the receiving plate portion is not limited to the form in which the purge port is completely closed by the directly facing receiving plate portion. It includes a form in which the portion is semi-closed, and even in this semi-closed state, the above-described effect can be obtained to an appropriate extent.

  In addition, the purge gas that passes through the purge target heat storage chamber in the gas processing operation by the operation method of the first characteristic configuration is a part of the processed gas that directly flows from the combustion processing chamber to the purge target heat storage chamber, or a gas delivery path. Various gases can be adopted as long as they can be used for purging of the heat storage chamber to be purged, such as a part of the treated gas diverted from the gas, or a gas derived from another gas source, The purge gas passage direction in the purge target heat storage chamber is also the direction in which the purge gas flows into the purge target heat storage chamber from the side of the combustion processing chamber, or conversely the direction of flow out of the purge target heat storage chamber to the combustion processing chamber side. Either may be sufficient.

Side view of gas processing equipment Plan view of gas processing equipment Schematic plan view showing the transition process of the four heat storage chambers Side view sectional view of switching valve device Side view sectional view of switching valve device Exploded perspective view of rotary valve body Explanatory drawing of gas flow in gas processing operation Explanatory drawing of switching operation of rotary valve body in gas processing operation Explanatory drawing of gas flow in empty baking operation Explanatory drawing of the switching operation of the rotary valve body in the idling operation Schematic configuration diagram of switching valve device in conventional device

  1 and 2 show a heat storage type gas treatment device, which is installed in a rectangular parallelepiped heat insulation chamber 3 in which a heat insulating material 2 is attached to the inner wall surface of the chamber wall 1 and on the lateral side thereof. The inside of the heat insulation chamber 3 is divided into an upper combustion processing chamber 5 that is open to each other and a heat storage chamber region 6 located therebelow. A burner 5a as a heater is provided.

  In the heat storage chamber region 6 of the heat insulation chamber 3, the region is partitioned by an internal partition wall 7 made of heat-resistant metal, so that eight heat storage chambers 8 whose upper ends open to the combustion processing chamber 5 are partitioned. In this partition formation, the eight heat storage chambers 8 are all arranged in a horizontal row.

  Each heat storage chamber 8 is provided with a breathable heat storage material layer 8a having a honeycomb structure, and the lower portion of each heat storage chamber 8 is a chamber portion 8b (small chamber portion) for ventilating the heat storage material layer 8a. .

  The lower chamber portion 8b of each heat storage chamber 8 is connected to the switching valve device 4 through a separate supply / exhaust passage 9, and the gas to be treated G containing volatile organic components and the like is supplied to the switching valve device 4. A gas introduction path 10 to be sent to the switching valve device 4 is connected, and a gas delivery path 11 for sending the treated gas G ′ processed and purified in the combustion processing chamber 5 of the heat insulation chamber 3 from the switching valve device 4 is connected. is there.

  As shown in FIGS. 3 and 7, the switching valve device 4 includes three heat storage chambers 8 as inlet side heat storage chambers 8i through which the gas to be processed G passes, and the other three chambers as processed gas G ′. The outlet side heat storage chamber 8o through which the gas passes, the other one chamber as the purge target heat storage chamber 8p through which the purge gas G ″ passes, and the remaining one chamber as the wind-insulated heat storage chamber 8s that blocks gas passage, these four types The heat storage chambers 8i, 8o, 8p, and 8s are sequentially switched among the eight heat storage chambers 8 in a cycle.

  That is, the switching valve device 4 basically sends the processing gas G sent from the gas introduction path 10 to the lower chamber portion 8b of the three inlet side heat storage chambers 8i through the corresponding supply / discharge path 9, The gas to be treated G is passed upward through the heat storage material layer 8a of the inlet side heat storage chamber 8i and guided to the combustion processing chamber 5.

  Further, along with this, the high temperature processed gas G ′ that is sent from the combustion processing chamber 5 to the outlet side heat storage chamber 8 o and passes downward through the heat storage material layer 8 a of the outlet side heat storage chamber 8 o is converted into the outlet side heat storage chamber 8. From the lower chamber portion 8 b, it returns to the switching valve device 4 through the corresponding supply / discharge passage 9 and is sent out to the gas delivery passage 11.

  In this gas processing operation, the four types of heat storage chambers 8i, 8o, 8p, and 8s are sequentially switched cyclically by the switching valve device 4 so that heat is stored by passing the high-temperature processed gas G 'in the previous step. The heat storage material layer 8a of the outlet-side heat storage chamber 8o is used as the heat storage material layer 8a of the inlet-side heat storage chamber 8i in a later step, and the gas G to be processed is passed through the heat storage material layer 8a. The gas G to be treated is preheated.

  The switching valve device 4 is configured to sequentially switch the four types of heat storage chambers 8i, 8o, 8p, and 8s so that the heat storage chamber 8 that has been changed to the inlet side heat storage chamber 8i is then switched to the outlet side heat storage chamber 8o. Prior to switching to the purge target heat storage chamber 8p, the purge gas G ″ (a part of the processed gas delivered from the combustion processing chamber 5 in this example) is passed through the purge target heat storage chamber 8p, so that the inlet side heat storage The gas to be processed G remaining in the heat storage material layer 8a in the switching from the chamber 8i is scavenged by the purge gas G ″.

  In addition, the switching valve device 4 switches the four types of heat storage chambers 8i, 8o, 8p, and 8s sequentially in a cycle. As shown in FIG. ) To the start end (the left end in the figure), and the three inlet side heat storage chambers 8i move from the start end to the end of the eight rows of heat storage chambers in the adjacent state, and are also the three outlet side heat storage chambers. 8o shifts from the start to the end of the 8 rows of heat storage chambers in the adjacent state, and furthermore, there are two boundary portions between the inlet side heat storage chamber 8i and the outlet side heat storage chamber 8o, whereas the purge target heat storage chamber 8p has one side. 4 states in which the wind-insulated heat storage chamber 8s is located at the other boundary portion and moves from the start end to the end of the heat storage chamber 8 row. The heat storage chambers 8i, 8o, 8p, and 8s are switched to each other.

  That is, the eight heat storage chambers 8 are arranged in a horizontal row, and the four types of heat storage chambers 8i, 8o, 8p, and 8s are switched as described above, so that the gas G to be treated is supplied from the inlet side heat storage chamber 8i. Even if it leaks, the leaked gas to be processed G is mixed into the processed gas G ′ passing through the outlet side heat storage chamber 8o and prevented from being taken out of the apparatus together with the processed gas G ′ without being processed. To do.

  The switching valve device 4 is arranged on one lateral side of the heat insulating chamber 3 in a direction orthogonal to the arrangement direction of the horizontal row of the heat storage chambers 8 in a plan view, and extends from the switching valve device 4. All the supply / discharge passages 9 are connected to one side wall 1 a located on the switching valve device 4 side of the side wall of the heat insulation chamber 3 and opened to the lower chamber portion 8 b of the corresponding heat storage chamber 8.

  And in the side wall 1b located in the opposite side to the switching valve apparatus 4 among the side walls of the heat insulation chamber 3, each separate maintenance door 12 with respect to all the eight heat storage chambers 8 is arranged in a horizontal row with the eight heat storage chambers. By arranging in such an arrangement form, the gas flow resistance of each of the supply and exhaust passages 9 is made uniform, and the gas accompanied by mutual switching of the four types of heat storage chambers 8i, 8o, 8p, and 8s is provided. In order to stabilize the processing operation, the inspection / maintenance door 12 can be arranged in an easy-to-use state without being restricted by the supply / exhaust path 9.

  Each supply / discharge path 9 has a vertically long rectangular cross section and is connected to the side wall 1a of the heat insulating chamber 3 so as to open to the lower chamber portion 8b of each heat storage chamber 8, and the lower chamber portion 8b of each heat storage chamber 8 includes As a guide means for guiding the gas flow between the connection port 9a of the supply / discharge passage 9 and the heat storage material layer 8a, a position higher than the guide vane 13 disposed in front of the supply / discharge passage connection port 9a. Arranged side by side.

  That is, by these things, the direction change from the horizontal direction to the upward direction in the process which goes to the thermal storage material layer 8a of the to-be-processed gas G which flowed in from the supply / discharge channel connection port 9a, and the processed gas which passed the thermal storage material layer 8a In the process of G ′ toward the air supply / exhaust connection port 9a, the direction change from the downward direction to the horizontal direction is made smooth, and the gas to be treated G flowing from the supply / exhaust path connection port 9a is uniform with respect to the heat storage material layer 8a. To pass through.

  Specifically, as shown in FIGS. 4 to 6, the switching valve device 4 includes a rotating shaft 14 that extends in a direction perpendicular to the arrangement direction of the horizontal row of the heat storage chambers 8 in a plan view. The distributor 15, the valve body 16 and the air chamber 17 are arranged in order from the heat insulation chamber 3 side.

  A rotary valve body 18 is accommodated in the valve body 16, and the rotary valve body 18 rotates integrally with the rotary shaft 14 by driving rotation of the rotary shaft 14 by a motor 19 as a rotary drive means. On the other hand, the distributor 15, the valve body 16, and the air chamber unit 17 through which the rotating shaft 14 passes are fixed so as to allow the rotating shaft 14 to rotate.

  The rotary valve body 18 includes a disc-like valve plate 20 in a posture orthogonal to the rotary shaft 14, and the distributor 15 is attached to the valve plate 20 of the rotary valve body 18 in a posture orthogonal to the rotary shaft 14. On the other hand, a receiving plate 21 that is opposed to each other in the proximity state is provided, and the valve plate 20 rotates while maintaining the proximity facing state with respect to the receiving plate 21 as the rotary valve body 18 rotates.

  In the distributor 15, eight distribution chambers 22 in which the lower chamber portions 8 b of the respective heat storage chambers 8 are individually communicated with each other through the corresponding supply / exhaust passages 9 are arranged around the rotating shaft 14. In the receiving plate 21, distribution ports 22 a that open the distribution chambers 22 in the receiving plate 21 are arranged at equal pitches p around the rotation shaft 14.

  On the other hand, an air supply chamber 23, an exhaust chamber 24, and a purge chamber 25 are arranged around the rotation shaft 14 inside the rotary valve body 18, and the air supply chamber 23 is a rotation of the rotary valve body 18. Regardless, the gas introduction path 10 connected to the air chamber 17 is always in communication with the internal space 17a of the air chamber 17 and the inlet 26 formed in the rotary valve body 18.

  Similarly, the exhaust chamber 24 has a flow formed in the internal air 16 a of the valve body 16 and the rotary valve body 18 with respect to the gas delivery path 11 connected to the valve body 16 regardless of the rotation of the rotary valve body 18. It always communicates through the exit 27.

  In addition, the purge chamber 25 has an introduction port 14 a formed in the rotary shaft 14 inside the rotary shaft 14 with respect to the purge gas path 28 connected to the gas chamber 17 regardless of the rotation of the rotary valve body 18. It always communicates through the formed in-shaft path 14 b, the outlet 14 c formed in the rotating shaft 14, and the compartment 17 b in the air chamber 17.

  In this example, a part of the processed gas G ′ delivered from the combustion processing chamber 5 is passed through the purge target heat storage chamber 8p as the purge gas G ″ and passed through the purge target heat storage chamber 8p. The purge gas G ″ (that is, the purge gas G ″ containing the residual process gas G) is mixed with the process gas G in the gas introduction path 10 through the purge gas path 28 and reprocessed.

  The valve plate 20 of the rotary valve body 18 includes a first and a second which face each other simultaneously and separately with respect to two non-adjacent distribution ports 22a in the receiving plate 21 of the distributor 15 when the rotary valve body 18 rotates. The second two wind shielding plate portions 20a and 20b are formed, and the purge chamber 25 in the rotary valve body 18 is provided in the first wind shielding plate portion 20a of the two wind shielding plate portions 20a and 20b. Is formed in the valve plate 20.

  Further, in the valve plate 20, of the pair of valve plate portions between the first and second two wind shielding plate portions 20a and 20b, the rotation of the rotary valve body 18 causes the first wind shielding plate portion 20a to rotate. The leading valve plate portion is also provided with an air supply port 23a for opening the air supply chamber 23 in the rotary valve body 18 in the valve plate 20. Similarly, in the rotation of the rotary valve body 18 An exhaust port 24 a that opens the exhaust chamber 24 in the rotary valve body 18 in the valve plate 20 is formed in the valve plate portion on the downstream side that follows the one wind shielding plate portion 20 a.

  With this configuration, as shown in FIG. 8, as the rotary valve body 18 rotates, the air supply port 23 a (see FIG. 8) in the valve plate 20 of the rotary valve body 18 with respect to each distribution port 22 a in the receiving plate 21 of the distributor 15. In FIG. 5, the purging port 25 a, the exhaust port 24 a (dark gray portion in the figure), and the second wind shielding plate portion 20 b having no opening are sequentially opposed to each other in this order and are processed from the gas introduction path 10. The gas G is sent to the heat storage chamber 8 serving as the inlet-side heat storage chamber 8i through the air supply side air passage formed by the air supply port 23a and the distribution port 22a in communication with the air supply port 23a.

  The purge gas G ″ that has passed through the purge target heat storage chamber 8p from the combustion processing chamber 5 is purged through a purge vent formed by the purge port 25a and the distribution port 22a that is in communication with the purge port 25a. Send to gas path 28.

  At the same time, the treated gas G ′ delivered from the heat storage chamber 8 serving as the outlet-side heat storage chamber 8o is an exhaust-side ventilation formed by the exhaust port 24a and the distribution port 22a in an opposed communication state with the exhaust port 24a. It leads to the gas delivery path 11 through the path.

  Further, one distribution port 22a is closed by the direct facing of the second wind shielding plate portion 20b having no opening, whereby the heat storage chamber 8 corresponding to the closed distribution port 22a is defined as the wind shield heat storage chamber 8s and the heat storage chamber. The gas passage to 8 is blocked.

  Then, the four types of heat storage chambers 8 of the inlet side heat storage chamber 8i, the purge target heat storage chamber 8p, the outlet side heat storage chamber 8o, and the wind-shielded heat storage chamber 8s are switched cyclically by the rotation of the rotary valve body 18 in this way. On the other hand, the transition from the start end to the end of the four types of heat storage chambers 8i, 8p, 8o, 8s in the eight rows of heat storage chambers in the horizontal row is arranged so as to have a transition form as shown in FIG. The eight supply / exhaust passages 9 extending from the switching valve device 4 are extended to each heat storage chamber 8.

  In the switching valve device 4, the first and second wind shielding plate portions 20 a, 20 b, the air supply port 23 a, and the exhaust port 24 b in the valve plate 20 of the rotary valve body 18 are relative to each other. As described above, when each of the first and second wind shielding plate portions 20a and 20b is directly opposed to one distribution port 22a, of the two distribution ports 22a adjacent to each other in the front and rear direction of rotation of the directly-facing distribution port 22a One of the two is fully open with respect to the air supply port 23a, and the other is fully open with respect to the exhaust port 24a.

  In other words, in the regenerative gas processing apparatus of this example, each of the first wind shielding plate portion 20a forming the purge port 25a and the second wind shielding plate portion 20b having no opening is one distribution port 22a. In such a state as to face directly, only the wind shielding widths θa and θb (center angles) that only wind-shield the single distribution port 22a are provided.

  In other words, this arrangement relationship ensures a larger opening width θs, θr (center angle) in the rotation direction of the air supply port 23a and the exhaust port 24a than the conventional device shown in FIG. And the cross-sectional area of the air supply side air passage formed by the distribution port 22a facing and communicating with the air supply side, and the disconnection of the exhaust side air passage formed by the exhaust port 24a and the distribution port 22a facing and communicating with the air outlet side. Each of the areas is secured to be large so that the gas to be processed G and the processed gas G ′ can be smoothly ventilated through the air supply side exhaust passage and the exhaust side air passage with a low airflow resistance. is there.

  In addition, the controller 29 of the regenerative gas processing device adopts this arrangement relationship, whereas the detection information of the rotational position detecting means for detecting the rotational position (rotational angle) of the rotary valve body 18 with respect to the fixed distributor 15. 8 and / or in accordance with a predetermined motor operation program for gas processing operation, the valve body rotating motor 19 is controlled so that during the gas processing operation, as shown in FIGS. The rotary valve body 18 is disposed in the distribution port 22a in a state where the rotation position where each of the first and second wind shielding plate portions 20a, 20b faces the one distribution port 22a is set to the stop position in each rotation. Are arranged so that they are rotated intermittently at a pitch p.

  That is, each of the first wind shielding plate portion 20a formed with the purge port 25a and the second wind shielding plate portion 20b without an opening is sequentially aligned with respect to each one distribution port 22a by the rotation of the rotary valve body 18. In the pairing (blocking), the rotary valve body 18 is intermittently rotated in a state where the rotation is stopped every time the pairing is generated.

  As described above, by intermittently rotating the rotary valve body 18 in the gas processing operation, as described above, the opening widths θs and θr of the air supply port 23a and the exhaust port 24a are kept large, and the single distribution port 22a is provided. On the other hand, a gas leak between the air supply port 23a and the purge port 25a caused by the air supply port 23a and the purge port 25a communicating with each other at the same time, and an exhaust port 24a with respect to one distribution port 22a. Gas leakage between the exhaust port 24a and the purge port 25a, which occurs when the purge port 25a simultaneously communicates with the purge port 25a, is prevented.

  The receiving plate 21 of the distributor 15 is provided with a packing 30 that seals between the valve plate 20 of the rotary valve body 16 and the receiving plate 21 of the distributor 15 so as to surround the distribution ports 22a one by one. Yes, the packing 30 maintains a sealing function by slidingly contacting the valve plate 20 as the rotary valve body 16 rotates.

  In this type of heat storage type gas processing apparatus, in the gas processing operation, the components of the gas G to be processed condense in the respective heat storage chambers 8 and each part of the room (particularly the heat storage material layer into which the gas G to be processed before preheating flows). 8a), and the amount of adhesion gradually increases. Instead of gas treatment operation in a timely manner, clean high-temperature air is passed through each heat storage chamber 8 to evaporate the adhering condensation component. It is necessary to perform a so-called baking operation that is removed by dry peeling or oxidation). The controller 29 automatically performs this baking operation with the following control operations (a) to (e). It is.

  (B) When the operation of the painting booth or painting drying furnace is terminated and the generation of the gas G to be treated is eliminated and a gas processing operation end command is given, the operation of the burner 5a in the combustion processing chamber 5 is stopped. While the gas processing operation is finished, subsequently, the combustion processing chamber 5 and each heat storage chamber 8 are still in a high temperature state (that is, the residual heat from the gas processing operation is generated in the combustion processing chamber 5 and each heat storage chamber 8). In the state that remains sufficiently)

  (B) In this idling operation, first, based on the detection information of the rotational position detection means and / or according to a predetermined motor operation program for idling operation, the valve body rotating motor 19 is controlled, In the switching valve device 4, as shown in FIG. 10A, each of the first and second wind shielding plate portions 20a and 20b in the valve plate 20 is in a state of straddling two adjacent distribution ports 22a. Thus, the rotational position where each of the two distribution ports 22a is half-opened (in other words, half of the four distribution ports 22a communicate with the air supply port 23a, and the remaining half of the distribution ports 22a communicate with the exhaust port 24a. The rotary valve body 18 is rotated to the rotation position), and the rotary valve body 18 is kept in the rotation stopped state for a predetermined time Ta at the rotation position.

  (C) Further, the dampers 10a and 10b around the gas introduction path 10 are switched to replace the gas G to be treated with normal temperature baked clean air OA such as outside air through the gas introduction path 10 to the switching valve device 4. Switch the blower system to the sending state.

  That is, in a state where the rotation valve body 18 is stopped at the rotation position (position shown in FIG. 10A), the clean air OA at normal temperature is sent to the switching valve device 4 through the gas introduction path 10 to 9 (a), among the eight heat storage chambers 8, half of the four heat storage chambers 8 in the adjacent state are changed to the inlet side heat storage chamber 8i, and the other half of the heat storage chambers in the adjacent state are also in the same state. The room 8 is set as the outlet side heat storage chamber 8o, and normal temperature clean air OA is caused to flow into the four inlet side heat storage chambers 8i.

  Thereby, the clean air OA for normal baking that has flowed into the inlet side heat storage chamber 8i passes through the combustion treatment chamber 5 from the half of the inlet side heat storage chamber 8i, and passes through the outlet side heat storage chamber 8o. Due to the residual heat remaining in each chamber from the processing operation, the temperature gradually rises and becomes high temperature, and by passing this high temperature clean air OA, as the first half of the baking process, first, half of the heat storage chambers 8 are set as the outlet side heat storage chambers 8o. (In particular, the condensed resin component adhering to the heat storage material layer 8a of the outlet side heat storage chamber 8o is removed by transpiration (or dry peeling or oxidation).

  (D) When the predetermined time Ta has elapsed, the valve body rotation motor 19 is controlled based on the detection information of the rotational position detection means and / or according to a predetermined motor operation program for the idling operation. The rotary valve body 18 is rotated by a half rotation (180 degrees) as shown in FIG. 10B, and the rotary valve body 18 is kept in the rotation stopped state for a predetermined time Tb at the rotational position.

  That is, by this half rotation, half of the heat storage chambers 8 that were the inlet-side heat storage chambers 8i in the previous half-baking first half step are switched to the outlet-side heat storage chambers 8o, and the first half-baking first half-step is used as the outlet side heat storage chamber 8o. The remaining half of the heat storage chambers 8 that have been baked are switched to the inlet-side heat storage chamber 8, and as a result, as shown in FIG. By passing the clean air OA, the condensed resin component adhering to the remaining half of the heat storage chamber 8 as the outlet side heat storage chamber 8o is removed by evaporation (or dry peeling or oxidation).

  In both the first half of the baking process and the second half of the baking process, the high temperature clean air OA that has passed through the outlet side heat storage chamber 8o (that is, the high temperature air that has been in a state containing the removed spear component) is treated gas G ′. In the same manner as described above, the gas is led out from the switching valve device 4 through the gas delivery path 11.

(E) Although the empty-burning operation is substantially finished after the elapse of the predetermined time Tb in the latter half, after that, clean air OA at normal temperature is used as a cooling operation until each of the heat storage chambers 8 and the combustion treatment chamber 5 is in a predetermined low temperature state. Is continued to pass through each heat storage chamber 8 and combustion treatment chamber 5, and when each heat storage chamber 8 and combustion treatment chamber 5 reaches a predetermined low temperature, the ventilation of room temperature clean air OA is stopped and the operation of the apparatus is stopped. Then, a start command for the next gas processing operation is awaited.

  Note that, in both the first half baking step and the second half baking step described above, the purge port 25a is located between the two distribution ports 22a of the receiving plate 21 in the distributor 15 across the first wind shield plate portion 20a. Is disposed so as to be closed (including a semi-closed state) by the receiving plate portion, so that a high temperature is generated by residual heat in the combustion processing chamber 5 under the idling operation. The air-cleaned clean air OA is prevented from being taken out of the apparatus through the purge gas G ″ ventilation path, and heat loss due to the carry-out is avoided.

[Another embodiment]
In the above-described embodiment, an example in which the eight heat storage chambers 8 are arranged in a horizontal row has been described. However, in the embodiment of the present invention, the number of the heat storage chambers 8 is not limited to eight, and what is required is four or more. It may be a room, and the arrangement is not limited to one horizontal row, and may be arranged in a plurality of rows and a plurality of columns in plan view.

  Further, in the above-described embodiment, the switching valve device 4 is arranged in the posture in which the rotary valve body 18 rotates around the lateral axis, but instead, the switching valve device 4 is replaced with the rotary valve body 18. May be arranged so as to rotate around the longitudinal axis.

  Furthermore, in the above-described embodiment, an example in which the receiving plate 21 that forms the distribution port 22a is fixed and the valve plate 20 that forms the air supply port 23, the exhaust port 24, and the purge port 25a is rotated is shown. Conversely, the valve plate 20 may be fixed and the receiving plate 21 may be rotated, or both may be rotated in the opposite direction.

  In the above-described embodiment, the residual heat utilization type air baking operation in which the temperature of the clean baking gas OA at room temperature is raised to the required air baking temperature by the residual heat remaining from the gas processing operation is shown. You may make it employ | adopt the baking operation of the heater operation system which heats normal temperature baking baking clean gas OA to the required baking temperature by the combustion heater 5a of the process chamber 5. FIG.

  In the above-described embodiment, when the Ta time elapses from the start of the first half-baking process, the process is switched to the second half-baking process. However, instead of this, the temperature of the outlet-side heat storage chamber 8o (particularly the gas outlet-side temperature of the heat storage material layer 8a in the outlet-side heat storage chamber 8o) becomes a predetermined temperature after the start of the first half of the baking process. When the temperature reaches or exceeds the predetermined temperature for a predetermined time, the operation is switched to the second half baking process. Similarly, after the second half baking process, the temperature of the outlet-side heat storage chamber 8o is increased. When the predetermined temperature is reached, or when the state where the temperature is equal to or higher than the predetermined temperature continues for a predetermined time, the empty baking second half step may be substantially ended.

  The gas G to be treated is not limited to the exhaust air from the painting booth or the painting drying furnace, but may be any gas as long as it can be treated by combustion.

  The operation method of the regenerative gas processing apparatus according to the present invention and the regenerative gas processing apparatus that implements the operation method can be used for processing various gases to be processed in various fields.

5a Combustion heater 5 Combustion processing chamber 8 Thermal storage chamber 8a Thermal storage material layer 9 Supply / exhaust passage 4 Switching valve device 20 Valve plate 18 Rotary valve element 21 Receptacle 15 Distributor 22 Distribution chamber 22a Distributing port p Distributing pitch in parallel DESCRIPTION OF SYMBOLS 10 Gas introduction path 23 Air supply chamber 28 Purge gas path 25 Purge chamber 11 Gas delivery path 24 Exhaust chamber 20a 1st windshield part 20b 2nd windshield part 25a Purge port 23a Air supply port 24a Exhaust port G Processed gas OA Clean gas for empty baking 29 Control means

Claims (3)

A breathable heat storage material layer is provided in each of the four or more heat storage chambers having one end communicating with a combustion processing chamber having a combustion heater, and the other end of each of the heat storage chambers is connected to a switching valve device;
The switching valve device includes a rotary valve body including a valve plate and a distributor including a receiving plate, and the rotary valve body and the distributor are disposed in a state where the valve plate is closely opposed to the receiving plate. With a relative rotation configuration,
In the distributor, a plurality of distribution chambers that always communicate with each other with respect to the other end of each of the heat storage chambers are arranged around the rotation axis of the relative rotation to form a partition,
In the receiving plate in the distributor, a distribution port for opening the distribution chamber separately in the receiving plate is formed side by side at an equal pitch around the rotation axis of the relative rotation,
The rotary valve body includes a supply chamber that is always in communication with the gas introduction path, a purge chamber that is always in communication with the purge gas path, and an exhaust chamber that is in continuous communication with the gas delivery path. Form the compartments side by side,
The valve plate in the rotary valve body is formed with two first and second wind shielding plate portions that face each other simultaneously and separately in the relative rotation with respect to the two distribution ports that are not adjacent to each other,
Of the first and second wind shielding plate portions, the first wind shielding plate portion is formed with a purge port for opening the purge chamber in the valve plate,
Among the valve plate portions between the two wind shield plate portions, the valve chamber on the leading side preceding the first wind shield plate portion in the relative rotation is provided with the air supply chamber in the valve plate. Form an air supply opening to open,
In the operation method of the regenerative gas processing apparatus, an exhaust port for opening the exhaust chamber in the valve plate is formed in the valve plate portion on the subsequent side following the first wind shield plate portion in the relative rotation. There,
The relative arrangement relationship between the two wind shielding plate portions, the air supply port, and the exhaust port in the valve plate is such that each of the two wind shielding plate portions faces one distribution port. An arrangement in which one of the two distribution ports adjacent to the directly-distributed distribution port is fully open with respect to the air supply port, and the other distribution port is fully open with respect to the exhaust port. Leave it in a relationship,
In the gas processing operation in which the gas to be processed is sent to the switching valve device through the gas introduction path, the rotation position at which each of the two wind shielding plate portions directly faces one of the distribution ports is set as the stop position at each rotation in the intermittent rotation. In the state, the rotating valve body and the distributor are intermittently rotated relative to each other by the pitch of the distribution ports,
In the air baking operation in which the clean gas for air baking is sent to the switching valve device through the gas introduction path instead of the gas to be treated,
Each of the two wind shielding plate portions straddles two adjacent distribution ports so that half of the distribution ports communicate with the air supply port, and the other half of the distribution ports are the exhaust ports. In the state where the relative rotation is stopped at the rotational position communicating with the air, the first half step of empty baking is performed in which the clean gas for baking is sent to the switching valve device through the gas introduction path.
After that, in the state where the rotary valve body and the distributor are relatively rotated by 180 degrees from the rotation stop position in the first half of the baking process and stopped, the switching valve device supplies the clean gas for baking through the gas introduction path. Method of operating a regenerative gas processing apparatus that performs the latter half of the empty baking process to be sent to the factory. A breathable heat storage material layer is provided in each of the four or more heat storage chambers having one end communicating with a combustion processing chamber having a combustion heater, and the other end of each of the heat storage chambers is connected to a switching valve device;
The switching valve device includes a rotary valve body including a valve plate and a distributor including a receiving plate, and the rotary valve body and the distributor are disposed in a state where the valve plate is closely opposed to the receiving plate. With a relative rotation configuration,
In the distributor, a plurality of distribution chambers that always communicate with each other with respect to the other end of each of the heat storage chambers are arranged around the rotation axis of the relative rotation to form a partition,
In the receiving plate in the distributor, a distribution port for opening the distribution chamber separately in the receiving plate is formed side by side at an equal pitch around the rotation axis of the relative rotation,
The rotary valve body includes a supply chamber that is always in communication with the gas introduction path, a purge chamber that is always in communication with the purge gas path, and an exhaust chamber that is in continuous communication with the gas delivery path. Form the compartments side by side,
The valve plate in the rotary valve body is formed with two first and second wind shielding plate portions that face each other simultaneously and separately in the relative rotation with respect to the two distribution ports that are not adjacent to each other,
Of the first and second wind shielding plate portions, the first wind shielding plate portion is formed with a purge port for opening the purge chamber in the valve plate,
Among the valve plate portions between the two wind shield plate portions, the valve chamber on the leading side preceding the first wind shield plate portion in the relative rotation is provided with the air supply chamber in the valve plate. Form an air supply opening to open,
In the relative rotation, a regenerative gas processing device in which an exhaust port that opens the exhaust chamber in the valve plate is formed in a valve plate portion on the subsequent side that follows the first wind shielding plate portion,
The relative arrangement relationship between the two wind shielding plate portions, the air supply port, and the exhaust port in the valve plate is such that each of the two wind shielding plate portions faces one distribution port. An arrangement in which one of the two distribution ports adjacent to the directly-distributed distribution port is fully open with respect to the air supply port, and the other distribution port is fully open with respect to the exhaust port. Relationship,
A control means for operating the switching valve device;
In the gas processing operation in which the gas to be processed is sent to the switching valve device through the gas introduction path, the control means sets the rotational position at which each of the two wind shielding plate portions directly faces one of the distribution ports at each rotation in the intermittent rotation. In the state of the stop position, the rotating valve body and the distributor are intermittently relatively rotated by the pitch of the distribution ports arranged in parallel,
In the air baking operation in which the clean gas for air baking is sent to the switching valve device through the gas introduction path instead of the gas to be treated,
Each of the two wind shielding plate portions straddles two adjacent distribution ports so that half of the distribution ports communicate with the air supply port, and the other half of the distribution ports are the exhaust ports. In the state where the relative rotation is stopped at the rotational position communicating with the air, the first half step of empty baking is performed in which the clean gas for baking is sent to the switching valve device through the gas introduction path.
After that, in the state where the rotary valve body and the distributor are relatively rotated by 180 degrees from the rotation stop position in the first half of the baking process and stopped, the switching valve device supplies the clean gas for baking through the gas introduction path. A regenerative gas processing apparatus configured to carry out the latter half of the baking process.   The purge port is disposed in a state of facing the receiving plate portion between the two distribution ports between the first wind shielding plate portions of the receiving plate in the empty baking operation. The regenerative gas treatment device described in 1.

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