JP5815827B2 - Plating processing apparatus, plating processing method, and storage medium - Google Patents

Description

  The present invention relates to a plating apparatus, a plating method, and a storage medium for supplying a plating solution to a surface of a substrate to perform a plating process.

  In recent years, a substrate such as a semiconductor wafer or a liquid crystal substrate has been provided with wiring in order to form a circuit on the surface. This wiring is made of a copper material having a low electrical resistance and high reliability instead of an aluminum material. However, since copper is more easily oxidized than aluminum, it is desirable to perform plating with a metal having high electromigration resistance in order to prevent oxidation of the copper wiring surface.

  The plating process is performed, for example, by supplying an electroless plating solution to the surface of the substrate on which the copper wiring is formed. For example, Patent Document 1 proposes a plating apparatus including a substrate rotation mechanism that rotates a substrate, a nozzle that discharges a plating solution onto the substrate, and a nozzle movement mechanism that moves the nozzle in a direction along the substrate. ing. According to the plating processing apparatus described in Patent Document 1, a uniform flow of the plating solution is formed on the surface of the substrate by supplying the plating solution while rotating the substrate. Thus, the plating process is uniformly performed over the entire surface of the substrate.

JP 2009-249679 A

  It is known that the plating treatment by electroless plating is affected by reaction conditions such as the composition of the plating solution and temperature. By the way, when supplying the plating solution while rotating the substrate, the plating solution flows from the central portion of the substrate toward the peripheral portion. Therefore, it is considered that the temperature of the plating solution on the substrate decreases as it goes from the central portion of the substrate toward the peripheral portion. For this reason, it is conceivable that the reaction conditions of the plating solution differ between the central portion of the substrate and the peripheral portion of the substrate.

  An object of the present invention is to provide a plating apparatus, a plating method, and a storage medium that can effectively solve such problems.

According to a first aspect of the present invention, there is provided a plating apparatus for performing a plating process by supplying a plating solution to a substrate, the substrate rotation holding mechanism for holding and rotating the substrate, and the substrate rotation holding mechanism. A discharge mechanism for discharging a plating solution toward the held substrate;
A plating solution supply mechanism that supplies the plating solution to the discharge mechanism; and a control mechanism that controls the discharge mechanism and the plating solution supply mechanism. The discharge mechanism discharges the plating solution toward the substrate. A first nozzle including an outlet, and a second nozzle including a discharge port that can be positioned closer to the center of the substrate than the discharge port of the first nozzle, and the plating solution supply mechanism includes: There is provided a plating apparatus configured such that the temperature of the plating solution supplied to the first nozzle is higher than the temperature of the plating solution supplied to the second nozzle.

  According to a second aspect of the present invention, there is provided a plating method for performing a plating process by supplying a plating solution to a substrate, wherein the substrate is disposed on a substrate rotation holding mechanism, and the substrate is disposed via a discharge mechanism. Discharging the plating solution, and the discharge mechanism includes a first nozzle including a discharge port for discharging the plating solution toward the substrate, and a central portion of the substrate rather than the discharge port of the first nozzle. A second nozzle including a discharge port that can be positioned close to the substrate, and the temperature of the plating solution discharged from the first nozzle toward the substrate is directed from the second nozzle toward the substrate. There is provided a plating method characterized by being higher than the temperature of the plating solution discharged.

  According to a third aspect of the present invention, in a storage medium storing a computer program for causing a plating apparatus to execute a plating method, the plating method performs plating by supplying a plating solution to the substrate. A method comprising: disposing the substrate on a substrate rotation holding mechanism; and discharging a plating solution to the substrate via a discharge mechanism, wherein the discharge mechanism discharges the plating solution toward the substrate. A first nozzle including a discharge port for discharging, and a second nozzle including a discharge port that can be positioned closer to the center of the substrate than the discharge port of the first nozzle. The memory is characterized in that the temperature of the plating solution discharged from the nozzle toward the substrate is higher than the temperature of the plating solution discharged from the second nozzle toward the substrate. The body is provided.

  According to the present invention, the discharge mechanism that discharges the plating solution toward the substrate includes the first nozzle including the discharge port that discharges the plating solution toward the substrate, and the central portion of the substrate from the discharge port of the first nozzle. And a second nozzle including a discharge port that can be positioned close to each other. The plating solution supply mechanism that supplies the plating solution to the discharge mechanism is configured such that the temperature of the plating solution supplied to the first nozzle is higher than the temperature of the plating solution supplied to the second nozzle. For this reason, the plating solution supplied from the first nozzle and the plating solution supplied from the second nozzle are mixed at the peripheral portion of the substrate, whereby the temperature of the plating solution at the peripheral portion of the substrate is changed to the first nozzle. Even when the temperature is lower than the temperature of the plating solution when discharged from the substrate, there is a difference between the temperature of the plating solution at the periphery of the substrate and the temperature of the plating solution at or near the center of the substrate This can be suppressed. Thereby, it is possible to suppress a difference between the reaction condition of the plating solution at the central portion of the substrate and the reaction condition of the plating solution at the peripheral portion of the substrate.

FIG. 1 is a plan view showing a schematic configuration of a plating system in an embodiment of the present invention. FIG. 2 is a side view showing the plating apparatus in the embodiment of the present invention. FIG. 3 is a plan view of the plating apparatus shown in FIG. FIG. 4 is a diagram showing a plating solution supply mechanism in the embodiment of the present invention. FIG. 5 is a view showing a first heating means of the plating solution supply mechanism. FIG. 6 is a view showing a second heating means of the plating solution supply mechanism. 7 is a cross-sectional view of the second nozzle of FIG. 3 as viewed from the VII-VII direction. FIG. 8 is a flowchart showing a plating method. FIGS. 9A to 9E are views showing a state in which a Co plating layer is formed. FIG. 10 is a diagram illustrating a manner in which a plating solution is discharged from a nozzle having a vertical discharge port toward a substrate in a comparative embodiment. FIG. 11 is a view showing a modification of the plating solution supply mechanism. FIG. 12 is a plan view showing a modification of the second nozzle. 13 is a cross-sectional view of the second nozzle of FIG. 12 as viewed from the XIII-XIII direction. FIG. 14 is a plan view showing a modification of the first nozzle. FIGS. 15A and 15B are views showing a first modification of the second nozzle control method. FIGS. 16A and 16B are views showing a second modification of the second nozzle control method. FIG. 17 is a view showing a further modification of the first nozzle 40. FIG. 18 is a diagram showing a result of measuring the temperature of the substrate in the example.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS. 1 to 9A to 9E. First, referring to FIG. 1, the entire plating system 1 in this embodiment will be described.

Plating System As shown in FIG. 1, the plating system 1 mounts a carrier 3 that accommodates a plurality of substrates 2 (here, 25 semiconductor wafers) (for example, 25 wafers), and carries in a predetermined number of substrates 2. And a substrate loading / unloading chamber 5 for unloading and a substrate processing chamber 6 for performing various processes such as plating and cleaning of the substrate 2. The substrate carry-in / out chamber 5 and the substrate processing chamber 6 are provided adjacent to each other.

(Board loading / unloading room)
The substrate carry-in / out chamber 5 includes a carrier placement unit 4, a transfer chamber 9 that stores the transfer device 8, and a substrate transfer chamber 11 that stores a substrate transfer table 10. In the substrate carry-in / out chamber 5, the transfer chamber 9 and the substrate delivery chamber 11 are connected to each other via a delivery port 12. The carrier placement unit 4 places a plurality of carriers 3 that accommodate a plurality of substrates 2 in a horizontal state. In the transfer chamber 9, the substrate 2 is transferred, and in the substrate transfer chamber 11, the substrate 2 is transferred to and from the substrate processing chamber 6.

  In such a substrate carry-in / out chamber 5, a predetermined number of substrates 2 are transported by the transport device 8 between any one carrier 3 placed on the carrier platform 4 and the substrate delivery table 10. The

(Substrate processing room)
In addition, the substrate processing chamber 6 is arranged in the front and back on one side and the other side of the substrate transfer unit 13 and extends in the front and back in the central portion, and supplies the plating solution to the substrate 2 to perform the plating process. A plurality of plating processing apparatuses 20.

  Among these, the board | substrate conveyance unit 13 contains the board | substrate conveyance apparatus 14 comprised so that a movement in the front-back direction was possible. The substrate transfer unit 13 communicates with the substrate transfer table 10 in the substrate transfer chamber 11 via the substrate transfer port 15.

  In such a substrate processing chamber 6, the substrates 2 are transported to the respective plating processing apparatuses 20 while being held horizontally one by one by the substrate transport device 14 of the substrate transport unit 13. Then, in each plating processing apparatus 20, the substrate 2 is subjected to cleaning processing and plating processing one by one.

  Each plating apparatus 20 differs only in the plating solution used, and the other points have substantially the same configuration. Therefore, in the following description, the configuration of one plating processing apparatus 20 among the plurality of plating processing apparatuses 20 will be described.

Plating Processing Device Hereinafter, the plating processing device 20 will be described with reference to FIGS. 2 and 3. FIG. 2 is a side view showing the plating apparatus 20, and FIG. 3 is a plan view showing the plating apparatus 20.

  As shown in FIGS. 2 and 3, the plating apparatus 20 holds the substrate 2 inside the casing 101 and rotates the substrate 2 on the surface of the substrate 2 held by the substrate rotation holding mechanism 110. A discharge mechanism 21 that discharges the plating liquid toward the discharge mechanism, a plating liquid supply mechanism 30 that supplies the plating liquid to the discharge mechanism 21, and a cup 105 that is driven up and down by an elevating mechanism 164 and has discharge ports 124, 129, and 134. The liquid discharge mechanisms 120, 125, and 130 for collecting and discharging the plating solution and the like scattered from the substrate 2 to the discharge ports 124, 129, and 134, the substrate rotation holding mechanism 110, the discharge mechanism 21, and the plating solution supply mechanism 30 are controlled. And a control mechanism 160.

(Substrate rotation holding mechanism)
2 and 3, the substrate rotation holding mechanism 110 includes a hollow cylindrical rotation shaft 111 extending vertically in the casing 101, and a turntable 112 attached to the upper end portion of the rotation shaft 111. And a wafer chuck 113 that is provided on the outer peripheral portion of the upper surface of the turntable 112 and supports the substrate 2, and a rotation mechanism 162 that rotates the rotation shaft 111. Among these, the rotation mechanism 162 is controlled by the control mechanism 160, and the rotation shaft 111 is rotationally driven by the rotation mechanism 162, whereby the substrate 2 supported by the wafer chuck 113 is rotated.

(Discharge mechanism)
Next, the discharge mechanism 21 that discharges a plating solution or the like toward the substrate 2 will be described. The discharge mechanism 21 includes a first nozzle 40 and a second nozzle 45 that discharge a chemical reduction type plating solution such as a CoP plating solution toward the substrate 2. The chemical reduction type plating solution is supplied from the plating solution supply mechanism 30 to the first nozzle 40 and the second nozzle 45. Details of the first nozzle 40 and the second nozzle 45 will be described later.

  The discharge mechanism 21 may further include a third nozzle 70 including a discharge port 71 and a discharge port 72 as shown in FIG. As shown in FIGS. 2 and 3, the third nozzle 70 is attached to the distal end portion of the arm 74, and the arm 74 can extend in the vertical direction and is rotated by the rotation mechanism 165. 73 is fixed.

  In the third nozzle 70, the discharge port 71 is connected via a valve 76a to a plating solution supply mechanism 76 that supplies a replacement type plating solution, for example, a Pd plating solution. The discharge port 72 is connected to a cleaning process liquid supply mechanism 77 that supplies a cleaning process liquid via a valve 77a. By providing the third nozzle 70 as described above, not only the plating process using the chemical reduction type plating solution but also the plating process using the replacement type plating solution and the cleaning process are performed in one plating processing apparatus 20. Is possible.

  Further, as shown in FIG. 2, a rinsing treatment liquid supply for supplying a pretreatment liquid for pretreatment performed before the plating process, for example, a rinsing liquid such as pure water, to the discharge port 72 of the third nozzle 70. A mechanism 78 may be further connected via a valve 78a. In this case, by appropriately controlling opening and closing of the valve 77a and the valve 78a, either the cleaning processing liquid or the rinsing processing liquid is selectively discharged from the nozzle 70 onto the substrate 2.

[First nozzle]
As shown in FIGS. 2 and 3, the first nozzle 40 includes a plurality of discharge ports 41. The first nozzle 40 is attached to the tip of an arm 44, and the arm 44 is fixed to a support shaft 43 that can be extended in the vertical direction and is rotationally driven by a rotation mechanism 165.

  As shown in FIG. 3, the discharge ports 41 of the first nozzle 40 are provided so as to be aligned along the radial direction of the substrate 2. Therefore, the plating solution can be directly supplied from the first nozzle 40 to a region within a predetermined range in the radial direction of the substrate 2 in the region on the substrate 2. Here, “directly supplying” means that the path for the plating solution to reach a predetermined region on the substrate 2 is caused by the rotation of the substrate 2 when the plating solution dropped on the center side of the substrate 2 from the predetermined region. This means that it is not a path that reaches the predetermined area by the centrifugal force, but a path that the plating solution is dropped onto the predetermined area.

  In general, the atmospheric temperature in the plating apparatus 20 or the temperature of the substrate 2 is lower than the temperature of the plating solution that is discharged from the first nozzle 40 or the second nozzle 45 toward the substrate 2. For this reason, when the plating solution dropped on or near the center portion of the substrate 2 flows outwardly by centrifugal force on the substrate 2, the temperature of the plating solution is considered to become lower toward the peripheral side of the substrate 2. . For this reason, in the case of a plating process in which a plating solution is dropped only at or near the center of the substrate 2 and the plating solution is distributed over the entire region of the substrate 2 by centrifugal force, the temperature of the plating solution on the substrate 2 is: It is thought that it becomes low as it goes from the center part of the board | substrate 2 to a peripheral part.

  Here, according to the present embodiment, by providing the first nozzle 40 described above, the plating solution is supplied to the first nozzle 40 in a region within a predetermined range in the radial direction of the substrate 2 in the region on the substrate 2. Can be supplied directly from. For this reason, there is a difference between the temperature of the plating solution that reaches the region on the peripheral side of the center portion of the substrate 2 in the region on the substrate 2 and the temperature of the plating solution that reaches the center portion of the substrate. Can be suppressed.

[Second nozzle]
Next, the second nozzle 45 will be described. As shown in FIGS. 2 and 3, the second nozzle 45 includes a discharge port 46. The second nozzle 45 is attached to the tip of an arm 49, and the arm 49 is configured to be able to advance and retract in the radial direction of the substrate 2 (the direction indicated by the arrow D in FIGS. 2 and 3). ing. Therefore, the second nozzle 45 has a central position where the discharge port 46 of the second nozzle 45 is closer to the center of the substrate 2 than each discharge port 41 of the first nozzle 40, and a peripheral edge that is closer to the peripheral side than the central position. It can move between positions. In FIG. 3, the second nozzle at the center position is indicated by reference numeral 45 ′, and the second nozzle at the peripheral position is indicated by reference numeral 45 ″.

Next, a specific shape of the discharge port 46 of the second nozzle 45 will be described with reference to FIG. FIG. 7 is a cross-sectional view of the second nozzle 45 shown in FIG. 3 as viewed from the VII-VII direction. In FIG. 3 and FIG. 7, the arrow shown by reference numeral R _1, indicates the direction of rotation (first rotational direction) when the substrate 2 rotates clockwise, the arrow indicated by reference numeral R _2, the substrate 2 is The rotation direction (second rotation direction) when rotating counterclockwise is shown.

As shown in FIG. 7, the discharge port 46 of the second nozzle 45 is represented by an inclination direction (indicated by an arrow S <b> ₁ in FIG. 7) inclined from the normal direction of the substrate 2 (direction indicated by the arrow N in FIG. 7). Inclined discharge ports 46 a configured to discharge the plating solution 35 toward the substrate 2 in the direction of Here, “inclined” means that the arrow N and the arrow S ₁ are not parallel to each other and the arrow N and the arrow S ₁ are not orthogonal to each other in FIG.

As shown in FIG. 7, the inclined discharge port 46a is inclined direction S ₁ of the inclined discharge port 46a is configured to correspond to the first rotational direction R _1. Here, the "inclination direction S ₁ of the inclined discharge port 46a corresponds to the first rotational direction R _1" is a vector S ₁ indicating a discharge direction of the plating liquid discharged from the inclined discharge port 46a, shown in FIG. 7 as such, rather than the second component of the rotational direction R ₂ of the substrate 2, which means having a first component of the rotational direction R ₁ of the substrate 2. Incidentally phrase "inclined discharge port 46a inclined direction S ₁ is corresponding to the first rotational direction R ₁ of" wording and referred to as the "first rotational direction R ₁ corresponds to the inclination direction S ₁ of the inclined discharge port 46a 'is synonymous It is.

The degree of slope on the inclined discharge port 46a is not particularly limited, for example, as the angle of the normal direction N and is the angle of inclination direction S ₁ and the substrate is in the range of 5 to 60 degrees, the inclined discharge port 46a Is configured.

The advantages of the discharge port 46 including the inclined discharge port 46a as described above will be described. Here, a case where the plating solution 35 is discharged onto the rotating substrate 2 using the inclined discharge port 46a will be considered. In this case, the magnitude of impact given to the substrate 2 by the plating solution 35 colliding with the substrate 2 is such that the moving speed of the substrate 2 in the horizontal direction in the region where the plating solution 35 has collided and the moving speed of the plating solution 35 in the horizontal direction. And the speed of the plating solution 35 in the vertical direction. Here, if the inclination direction S ₁ of the inclined discharge port 46a corresponds to the rotation direction of the substrate 2, and the moving speed of the substrate 2 in the horizontal direction of the region where the plating solution 35 has collided, the plating solution 35 in the horizontal direction The difference with the moving speed of is small. Accordingly, by tilting direction S ₁ of the inclined discharge port 46a constitute the inclined discharge port 46a so as to correspond to the rotation direction of the substrate 2, can plating solution 35 that has collided with the substrate 2 attenuates impact on the substrate 2 It becomes. That is, when the plating solution 35 is ejected toward the substrate 2 by using the inclined discharge port 46a, impact plating solution 35 is applied to the substrate 2, toward the case where the substrate 2 is rotated in the first rotational direction R ₁ but it is smaller than when the substrate 2 is rotated in the second rotational direction R _2.

(Plating solution supply mechanism)
Next, the plating solution supply mechanism 30 that supplies a chemical reduction type plating solution such as a CoP plating solution to the first nozzle 40 and the second nozzle 45 of the discharge mechanism 21 will be described. FIG. 4 is a diagram showing the plating solution supply mechanism 30.

  As shown in FIG. 4, the plating solution supply mechanism 30 includes a supply tank 31 that stores the plating solution 35, a first supply pipe 33 </ b> A that supplies the plating solution 35 in the supply tank 31 to the first nozzle 40, and a supply tank 31. And a second supply pipe 33 </ b> B that supplies the plating solution 35 to the second nozzle 45. A first valve 32A is inserted in the first supply pipe 33A, and a second valve 32B is inserted in the second supply pipe 33B.

  Further, as shown in FIG. 4, tank heating means 50 for heating the plating solution 35 to the storage temperature is attached to the supply tank 31. Further, between the tank heating means 50 and the first nozzle 40, a first heating means 60A for heating the plating solution 35 to a first discharge temperature higher than the storage temperature is attached to the first supply pipe 33A. . Similarly, between the tank heating means 50 and the second nozzle 45, a second heating means 60B for heating the plating solution 35 to a second discharge temperature higher than the storage temperature is attached to the second supply pipe 33B. ing. The tank heating unit 50, the first heating unit 60A, and the second heating unit 60B will be described in detail later.

The “reservation temperature” described above is a predetermined temperature that is lower than the temperature (plating temperature) at which the deposition of metal ions due to self-reaction in the plating solution 35 proceeds and higher than room temperature. The “first discharge temperature” and the “second discharge temperature” are predetermined temperatures that are equal to or higher than the above-described plating temperature. According to the present embodiment, the plating solution 35 is thus heated to a temperature equal to or higher than the plating temperature in two stages.
For this reason, compared with the case where the plating solution 35 is heated to a temperature equal to or higher than the plating temperature in the supply tank 31, the deactivation of the reducing agent and the evaporation of the components can be prevented in the plating solution 35 in the supply tank 31. . Thereby, the life of the plating solution 35 can be extended.
Moreover, compared with the case where the plating solution 35 is stored in the supply tank 31 at room temperature and then heated to a temperature equal to or higher than the plating temperature by the first heating unit 60A and the second heating unit 60B, the plating solution 35 is stored with less energy. It can be quickly heated to a temperature above the plating temperature. Thereby, precipitation of metal ions can be suppressed.

Various chemicals are supplied to the supply tank 31 from a plurality of chemical supply sources (not shown) in which various components of the plating solution 35 are stored. For example, chemical solutions such as CoSO ₄ metal salts containing Co ions, reducing agents (for example, hypophosphorous acid, etc.) and additives are supplied. At this time, the flow rates of various chemical solutions are adjusted so that the components of the plating solution 35 stored in the supply tank 31 are appropriately adjusted.

[Heating means for tanks]
As shown in FIG. 4, the tank heating means 50 is attached to the circulation pipe 52 that forms a circulation path of the plating solution 35 in the vicinity of the supply tank 31 and the circulation pipe 52, and heats the plating solution 35 to a storage temperature. A heater 53 and a pump 56 that is inserted into the circulation pipe 52 and circulates the plating solution 35 are provided. By providing the tank heating means 50, the plating solution 35 in the supply tank 31 can be heated to the above-mentioned storage temperature while circulating in the vicinity of the supply tank 31.

  Further, as shown in FIG. 4, the first supply pipe 33 </ b> A and the second supply pipe 33 </ b> B are connected to the circulation pipe 52. Here, when the valve 36 is opened and the first valve 32 </ b> A and the second valve 32 </ b> B are closed, the plating solution 35 that has passed through the heater 53 is returned to the supply tank 31. On the other hand, when the valve 36 is closed and the first valve 32 </ b> A and the second valve 32 </ b> B are opened, the plating solution 35 that has passed through the heater 53 reaches the first nozzle 40 and the second nozzle 45.

  As shown in FIG. 4, a filter 55 may be inserted in the circulation pipe 52. Thereby, when the plating solution 35 is heated by the tank heating means 50, various impurities contained in the plating solution 35 can be removed. As shown in FIG. 4, the circulation pipe 52 may be provided with monitor means 57 for monitoring the characteristics of the plating solution 35. The monitor means 57 includes, for example, a temperature monitor that monitors the temperature of the plating solution 35, a pH monitor that monitors the pH of the plating solution 35, and the like.

  As shown in FIG. 4, the plating solution supply mechanism 30 further includes a deaeration unit 37 connected to the supply tank 31 for removing dissolved oxygen and dissolved hydrogen in the plating solution 35 stored in the supply tank 31. It may be. The deaeration unit 37 is configured to supply, for example, an inert gas such as nitrogen into the supply tank 31. In this case, by dissolving an inert gas such as nitrogen in the plating solution 35, other gases such as oxygen and hydrogen already dissolved in the plating solution 35 can be discharged to the outside of the plating solution 35. . Oxygen and hydrogen discharged from the plating solution 35 are discharged from the supply tank 31 by the exhaust means 38.

[First heating means]
Next, the first heating means 60A will be described with reference to FIG. The first heating means 60A is for heating the plating solution 35 heated to the storage temperature by the tank heating means 50 to the first discharge temperature. As shown in FIG. 5, the first heating means 60A includes a first temperature medium supply means 61A for heating a predetermined heat transfer medium to a first discharge temperature or a temperature higher than the first discharge temperature, and a first supply pipe. And a temperature controller 62 that conducts heat of the heat transfer medium from the first temperature medium supply means 61A to the plating solution 35 in the first supply pipe 33A. Further, as shown in FIG. 5, temperature holding for holding the plating solution 35 passing through the first supply pipe 33 </ b> A that is provided so as to reach the inside of the first nozzle 40 at the first discharge temperature. A vessel 65 may be further provided.

  The temperature controller 62 has a supply port 62a for introducing a heat transfer medium for temperature adjustment (for example, hot water) supplied from the first temperature medium supply means 61A, and a discharge port 62b for discharging the heat transfer medium. ing. The heat transfer medium supplied from the supply port 62 a comes into contact with the first supply pipe 33 </ b> A while flowing through the space 62 c inside the temperature regulator 62. Thus, the plating solution 35 flowing through the first supply pipe 33A is heated to the first discharge temperature. The heat transfer medium after being used for heating the plating solution 35 is discharged from the discharge port 62b.

  Preferably, the first supply pipe 33A in the temperature controller 62 is formed in a spiral shape as shown in FIG. As a result, the contact area between the heat transfer medium and the first supply pipe 33 </ b> A can be increased, whereby the heat of the heat transfer medium can be efficiently transferred to the plating solution 35.

  The temperature holder 65 is for holding the temperature of the plating solution 35 until the plating solution 35 heated to the first discharge temperature by the temperature controller 62 is discharged from the first nozzle 40. As shown in FIG. 5, the temperature retainer 65 includes a heat retaining pipe 65c extending in contact with the first supply pipe 33A in the temperature retainer 65 and a heat transfer medium supplied from the first temperature medium supply means 61A. It has the supply port 65a introduced into the heat insulation pipe 65c, and the discharge port 65b which discharges | emits a heat transfer medium. The heat retaining pipe 65c extends to the vicinity of the tip of the first nozzle 40 along the first supply pipe 33A, and thereby the temperature of the plating solution 35 discharged from each discharge port 41 of the first nozzle 40 is made uniform. The first discharge temperature can be maintained.

  As shown in FIG. 5, the heat retaining pipe 65 c may be opened inside the first nozzle 40 and communicate with the space 65 d in the temperature retainer 65. In this case, the temperature holder 65 includes the first supply pipe 33A located at the center of the cross section, the heat retaining pipe 65c disposed in thermal contact with the outer periphery of the first supply pipe 33A, and the outer periphery of the heat retaining pipe 65c. It has a triple structure (structure of triple piping) consisting of a space 65d located in the area. The heat transfer medium supplied from the supply port 65 a keeps the plating solution 35 through the heat retaining pipe 65 c until reaching the tip of the first nozzle 40, and then passes through the space 65 d in the temperature holder 65 to the discharge port. It is discharged from 65b. The heat transfer medium flowing through the space 65d thermally shuts off the heat transfer medium flowing through the heat retaining pipe 65c (and the plating solution 35 flowing through the first supply pipe 33A inside thereof) and the atmosphere outside the temperature holder 65. do. Therefore, heat loss of the heat transfer medium flowing through the heat retaining pipe 65c can be suppressed, and heat transfer from the heat transfer medium flowing through the heat retaining pipe 65c to the plating solution 35 flowing through the first supply pipe 33A can be efficiently performed.

  In FIG. 5, the heat transfer medium supplied to the temperature controller 62 and the heat transfer medium supplied to the temperature holder 65 are both the heat transfer medium supplied from the first temperature medium supply means 61A. An example is shown. However, the present invention is not limited to this, and the heat transfer medium supplied to the temperature controller 62 and the heat transfer medium supplied to the temperature holder 65 are supplied from separate heat transfer medium sources. Also good.

[Second heating means]
Next, the second heating means 60B will be described with reference to FIG. The second heating means 60B is for heating the plating solution 35 heated to the storage temperature by the tank heating means 50 to the second discharge temperature. As shown in FIG. 6, the second heating means 60B includes a second temperature medium supply means 61B for heating a predetermined heat transfer medium to a second discharge temperature or a temperature higher than the second discharge temperature, and a second supply pipe. And a temperature controller 62 that conducts the heat of the heat transfer medium from the second temperature medium supply means 61B to the plating solution 35 in the second supply pipe 33B. Further, as shown in FIG. 6, temperature holding for holding the plating solution 35 that is provided so as to reach the inside of the second nozzle 45 and passes through the second supply pipe 33 </ b> B located in the second nozzle 45 at the second discharge temperature. A vessel 65 may be further provided.

  The second heating means 60B is different only in that the heat transfer medium is heated to the second discharge temperature or a temperature higher than the second discharge temperature by the second temperature medium supply means 61B. The first heating means 60A shown in FIG. Regarding the second heating means 60B shown in FIG. 6, the same parts as those of the first heating means 60A shown in FIG.

  The first heating means 60A and the second heating means 60B described above are controlled by the control mechanism 160 so that the first discharge temperature is higher than the second discharge temperature. That is, in the plating solution supply mechanism 30 having the first heating unit 60A and the second heating unit 60B, the temperature of the plating solution supplied to the first nozzle 40 is higher than the temperature of the plating solution supplied to the second nozzle 45. It is comprised so that it may become. Thus, as will be described later, between the temperature of the plating solution that reaches the peripheral side region of the substrate 2 in the region on the substrate 2 and the temperature of the plating solution that reaches the center portion of the substrate. It can suppress more reliably that a difference arises.

(Liquid discharge mechanism)
Next, the liquid discharge mechanisms 120, 125, and 130 for discharging the plating solution and the cleaning solution scattered from the substrate 2 will be described with reference to FIG. As shown in FIG. 2, a cup 105 that is driven up and down by an elevating mechanism 164 and has outlets 124, 129, and 134 is disposed in the casing 101. The liquid discharge mechanisms 120, 125, and 130 discharge the liquid collected at the discharge ports 124, 129, and 134, respectively.

  The processing liquid splashed from the substrate 2 is discharged by the liquid discharge mechanism 120, 125, 130 via the discharge ports 124, 129, 134 for each type. For example, the CoP plating solution scattered from the substrate 2 is discharged from the plating solution discharge mechanism 120, the Pd plating solution scattered from the substrate 2 is discharged from the plating solution discharge mechanism 125, and the cleaning solution and the rinse treatment solution scattered from the substrate 2 are processed. The liquid is discharged from the liquid discharge mechanism 130.

(Other components)
As shown in FIG. 2, the plating apparatus 20 further includes a back surface treatment liquid supply mechanism 145 that supplies a treatment liquid to the back surface of the substrate 2 and a back surface gas supply mechanism 150 that supplies gas to the back surface of the substrate 2. You may do it.

  The plating processing system 1 including a plurality of plating processing apparatuses 20 configured as described above is driven and controlled by the control mechanism 160 according to various programs recorded in the storage medium 161 provided in the control mechanism 160, whereby the substrate 2 is controlled. Various processes are performed. Here, the storage medium 161 stores various programs such as various setting data and a plating processing program described later. As the storage medium 161, known media such as a computer-readable memory such as ROM and RAM, and a disk-shaped storage medium such as a hard disk, CD-ROM, DVD-ROM, and flexible disk can be used.

Plating Processing Method In the present embodiment, the plating processing system 1 and the plating processing apparatus 20 are driven and controlled to perform plating processing on the substrate 2 in accordance with a plating processing program recorded in the storage medium 161. In the following description, first, a method of performing Pd plating treatment on the substrate 2 by displacement plating and then performing Co plating treatment by chemical reduction plating with one plating treatment apparatus 20 will be described with reference to FIGS. This will be described with reference to e).

(Board loading process and board receiving process)
First, a substrate carrying-in process and a substrate receiving process are performed. First, using the substrate transfer device 14 of the substrate transfer unit 13, a single substrate 2 is carried from the substrate delivery chamber 11 into one plating processing device 20. In the plating apparatus 20, first, the cup 105 is lowered to a predetermined position, and then the loaded substrate 2 is supported by the wafer chuck 113, and then the discharge port 134 and the outer peripheral edge of the substrate 2 face each other. The cup 105 is raised by the elevating mechanism 164 to the position.

(Washing process)
Next, a cleaning process including a rinse process, a pre-clean process, and a subsequent rinse process is executed (S301). First, the valve 78a of the rinse treatment liquid supply mechanism 78 is opened, whereby the rinse treatment liquid is supplied to the surface of the substrate 2 through the discharge port 72 of the third nozzle 70. Next, a pre-cleaning process is performed. First, the valve 77a of the cleaning processing liquid supply mechanism 77 is opened, whereby the cleaning processing liquid is supplied to the surface of the substrate 2 through the discharge port 72 of the third nozzle 70. Thereafter, the rinse treatment liquid is supplied to the surface of the substrate 2 through the discharge port 72 of the third nozzle 70 in the same manner as described above. The rinse treatment liquid and the cleaning treatment liquid after the treatment are discarded through the discharge port 134 of the cup 105 and the treatment liquid discharge mechanism 130. In yet any washing step S301 and the following steps may, unless otherwise specified, the substrate 2 is rotated in the first rotational direction R ₁ by the substrate rotation holding mechanism 110.

(Pd plating process)
Next, a Pd plating process is performed (S302). This Pd plating process is executed as a displacement plating process while the substrate 2 after the pre-cleaning process is not dried. In this way, by performing the displacement plating process in a state where the substrate 2 is not dried, it is possible to prevent the copper on the surface to be plated of the substrate 2 from being oxidized and failing to perform a satisfactory displacement plating process. it can.

  In the Pd plating step, first, the cup 105 is lowered by the lifting mechanism 164 to a position where the discharge port 129 and the outer peripheral edge of the substrate 2 face each other. Next, the valve 76 a of the plating solution supply mechanism 76 is opened, whereby the plating solution containing Pd is discharged onto the surface of the substrate 2 at a desired flow rate through the discharge port 71 of the third nozzle 70. As a result, the surface of the substrate 2 is subjected to Pd plating. The treated plating solution is discharged from the discharge port 129 of the cup 105. The plating solution discharged from the discharge port 129 is collected and reused or discarded via the discharge mechanism 125.

(Rinsing process)
Next, for example, a rinsing process is performed as a pre-process performed prior to the Co plating process (S303). In the rinse treatment step S303, for example, a rinse treatment liquid is supplied to the surface of the substrate 2 as a pretreatment liquid.

(Co plating process)
Thereafter, a Co plating step is performed in the same plating apparatus 20 as that in which the above-described steps S301 to S303 are performed (S304). This Co plating step S304 is performed as a chemical reduction plating treatment step. As shown in FIG. 8, the Co plating step S304 includes a liquid replacement step S305 (first step), an incubation step S306 (second step), and a plating film growth step S307 (third step). Yes.

  In addition, the element which deposits in a Co plating process and forms a plating layer is not restricted to Co, Other elements may precipitate simultaneously. For example, when the plating solution used in the Co plating step contains ions of other elements in addition to Co ions, other elements may be deposited simultaneously with Co. Here, the case where the plating solution contains Co ions and P ions, and therefore a plating layer (CoP) containing not only Co but also P will be described. In the following description, a plating layer obtained by the Co plating process is referred to as a “Co plating layer” even when an element other than Co is included in the plating layer.

  Among the above-described steps S305 to 307, the liquid replacement step S305 is a step of replacing the rinse treatment liquid supplied to the substrate 2 in the above-described rinse treatment step S303 with the plating solution 35 that forms CoP. The incubation step S306 is a step of forming the initial Co plating layer 84 over the entire area of the Pd plating layer 83 described later after the liquid replacement step S305. The initial Co plating layer 84 is a Co plating layer 84 having a thickness of several tens of nm or less. In the plating film growth step S307, the plating reaction is further advanced on the initial Co plating layer 84 formed in the incubation step S306 to form the Co plating layer 84 having a sufficient thickness, for example, a thickness of 100 nm or more. It has become.

  Hereinafter, the Co plating process will be described in detail with reference to FIGS. FIG. 9A shows the substrate 2 after the Pd plating step S302 and the rinse treatment step S303 are performed. As shown in FIG. 9A, the substrate 2 has an insulating layer 81 made of an organic compound, a wiring 82 made of copper, and a Pd plating layer 83 provided so as to cover the wiring 82. Yes. Further, the rinse treatment liquid 79 supplied in the rinse treatment step S303 is present on the substrate 2. In each of the steps S305, S306, and S307 of the Co plating step S304, the discharge port 46 of the second nozzle 45 is positioned closer to the center of the substrate 2 than the discharge ports 41 of the first nozzle 40, unless otherwise specified. doing.

  First, as shown in FIG. 9B, the plating solution 35 heated to the first discharge temperature by the first heating means 60 </ b> A is discharged from the discharge ports 41 of the first nozzle 40 toward the surface of the substrate 2. . In addition, the plating solution 35 heated to the second discharge temperature by the second heating unit 60B is discharged from the discharge port 46 of the second nozzle 45 toward the surface of the substrate 2. Among these, the plating solution 35 discharged from each discharge port 41 of the first nozzle 40 reaches a region within a predetermined range in the radial direction of the substrate 2 in the region on the substrate 2 as shown in FIG. To do. Further, the plating solution 35 discharged from the discharge port 46 of the second nozzle 45 reaches the substantially central portion of the substrate 2.

[Liquid replacement process]
By discharging the plating solution 35 toward the substrate 2 using the first nozzle 40 and the second nozzle 45, as shown in FIG. 9B, the rinse treatment solution 79 present on the substrate 2 is It is replaced by a plating solution 35 that forms CoP. That is, the above-described liquid replacement step S305 is completed. The time required for the liquid replacement step S305 varies depending on the dimensions of the substrate 2 and the flow rate of the plating solution 35, but is, for example, about 1 second to 2 minutes.

[Incubation step]
Subsequently, when the plating solution 35 is discharged toward the substrate 2 using the first nozzle 40 and the second nozzle 45, the initial Co plating layer 84 is partially formed on the Pd plating layer 83 as shown in FIG. 9C. Formed. When the plating solution 35 is continuously discharged toward the substrate 2, an initial Co plating layer 84 is formed over the entire area on the Pd plating layer 83 as shown in FIG. 9 (d). That is, the above-described incubation step S306 is completed.

[Plating film growth process]
Subsequently, when the plating solution 35 is discharged toward the substrate 2 using the first nozzle 40 and the second nozzle 45, the thickness of the Co plating layer 84 on the Pd plating layer 83 is predetermined as shown in FIG. Reaching a thickness of, for example, 1 μm. That is, the plating film growth step S307 described above is completed.

  In the Co plating step S304, the cup 105 is lowered by the lifting mechanism 164 to a position where the discharge port 124 and the outer peripheral edge of the substrate 2 face each other. For this reason, the treated plating solution 35 is discharged from the discharge port 124 of the cup 105. The discharged plating solution 35 that has been discharged is collected and reused or discarded through the discharge mechanism 120.

(Washing process)
Next, a cleaning step S308 including a rinse process, a post-clean process, and a subsequent rinse process is performed on the surface of the substrate 2 that has been subjected to the Co plating process. Since this cleaning step S308 is substantially the same as the above-described cleaning step S301, detailed description thereof is omitted.

(Drying process)
Thereafter, a drying process for drying the substrate 2 is performed (S309). For example, when the turntable 112 is rotated, the liquid adhering to the substrate 2 is blown outward by centrifugal force, thereby drying the substrate 2. That is, the turntable 112 may have a function as a drying mechanism that dries the surface of the substrate 2.

  In this way, in one plating apparatus 20, the surface of the substrate 2 is first subjected to Pd plating by displacement plating, and then Co plating by chemical reduction plating.

  Then, the board | substrate 2 may be conveyed by the other plating processing apparatus 20 for Au plating processing. In this case, in another plating processing apparatus 20, the surface of the substrate 2 is subjected to Au plating processing by displacement plating. The Au plating treatment method is substantially the same as the above-described method for Pd plating treatment except that the plating solution and the cleaning solution are different, and thus detailed description thereof is omitted.

(Operational effects of the present embodiment due to temperature)
Here, according to the present embodiment, as described above, the discharge mechanism 21 that discharges the plating solution 35 toward the substrate 2 includes a plurality of discharge ports 41 arranged in the radial direction of the substrate 2. One nozzle 40 and a second nozzle 45 including a discharge port 46 that can be positioned closer to the center of the substrate 2 than the discharge ports 41 of the first nozzle 40 are provided. For this reason, the plating solution 35 can be supplied to the central portion of the substrate 2 by the second nozzle 45, and the first nozzle 40 is used to provide a predetermined region on the peripheral side of the central portion of the substrate 2 in the region on the substrate 2. The plating solution 35 can be directly supplied to the region. For this reason, the temperature of the plating solution 35 reaching the predetermined region can be increased as compared with the case where only the plating solution 35 passing through the central portion of the substrate 2 reaches the predetermined region. Thereby, it is possible to suppress the occurrence of a difference between the reaction condition of the plating solution 35 in the central portion of the substrate 2 and the reaction condition of the plating solution 35 in the peripheral portion of the substrate 2. Thereby, the thickness of the Co plating layer 84 formed on the substrate 2 can be made substantially uniform over the entire area of the substrate 2.

  Incidentally, in the plating method according to the present embodiment, the substrate 2 is rotated by the substrate rotation holding mechanism 110 during the plating process as described above. Therefore, not only the plating solution 35 directly supplied from the first nozzle 40 but also the second nozzle 45 is discharged into a predetermined region located on the peripheral side of the center portion of the substrate 2 in the region on the substrate 2. It is conceivable that the plating solution 35 also reaches the plating solution 35 via the central portion of the substrate 2. In this case, the plating solution 35 directly supplied from the first nozzle 40 to the predetermined area is mixed with the plating liquid 35 passing through the central portion of the substrate 2, whereby the temperature of the plating liquid 35 in the predetermined area is increased. The temperature of the plating solution 35 (first discharge temperature) when discharged from the first nozzle 40 is considered to be lower.

  Here, according to the present embodiment, as described above, the plating solution supply mechanism 30 performs the plating in which the temperature (first discharge temperature) of the plating solution supplied to the first nozzle 40 is supplied to the second nozzle 45. The temperature is higher than the temperature of the liquid (second discharge temperature). Therefore, even when the plating solution 35 from the first nozzle 40 and the plating solution 35 from the second nozzle 45 are mixed in the predetermined region, the temperature of the mixed plating solution 35 and the second nozzle The difference between the temperature of the plating solution 35 reaching the center of the substrate 2 from 45 (second discharge temperature) can be suppressed. Thereby, the thickness of the Co plating layer 84 formed on the substrate 2 can be made substantially uniform over the entire area of the substrate 2 more reliably.

  It should be noted that not only the plating solution 35 supplied directly from the first nozzle 40 and the plating solution 35 from the second nozzle 45 via the central portion of the substrate 2 but also other parts of the substrate 2 are provided on the peripheral edge of the substrate 2. It is conceivable that the plating solution from the first nozzle 40 also passes through the region. Therefore, it is considered that the phenomenon that the temperature of the plating solution 35 is lowered by mixing is most remarkable in the peripheral portion of the substrate 2. For this reason, preferably, each discharge port 41 of the 1st nozzle 40 is comprised so that the plating solution 35 may be directly supplied to the peripheral part vicinity of the board | substrate 2. FIG. Thereby, it is possible to suppress a difference between the reaction condition of the plating solution 35 at or near the center of the substrate 2 and the reaction condition of the plating solution 35 at the peripheral edge of the substrate 2. Thus, the thickness of the Co plating layer 84 formed on the substrate 2 can be made substantially uniform over the entire area of the substrate 2 more reliably.

(Operational effects of the present embodiment resulting from the discharge angle)
Further, according to the present embodiment, as described above, the discharge port 46 of the second nozzle 45 applies the plating solution 35 toward the substrate 2 along the inclined direction S ₁ inclined from the normal direction N of the substrate 2. An inclined discharge port 46a configured to discharge is included. Further, the inclination direction S ₁ of the inclined discharge port 46 a corresponds to the first rotation direction R ₁ of the substrate 2. For this reason, the impact which the plating solution 35 which reached | attained the center part of the board | substrate 2 has on the board | substrate 2 can be weakened. As a result, it is possible to prevent the incubation step S306 and the plating film growth step S307 described above from being inhibited in the central portion of the substrate 2 or in the vicinity of the central portion.

  Next, the effect of the discharge port 46 including the inclined discharge port 46a will be described in comparison with a comparative embodiment. FIG. 10 shows a plating solution directed toward the substrate 2 using a nozzle 100 having a vertical discharge port 101 configured to discharge the plating solution 35 along the normal direction N of the substrate 2 toward the center of the substrate 2. It is a figure which shows the case where 35 is discharged. In the comparative form shown in FIG. 10, the components of the moving speed of the plating solution 35 are all components in the vertical direction. For this reason, compared with the case of this Embodiment, the impact which the plating solution 35 which arrived at the center part of the board | substrate 2 has on the board | substrate 2 is large. In this case, it is conceivable that the state of the plating solution 35 existing on the substrate 2 becomes unstable at or near the center of the substrate 2. For example, as shown in FIG. 10, it is conceivable that the amount of the plating solution 35 present on the substrate 2 decreases or the flow of the plating solution 35 becomes intense at or near the center of the substrate 2.

  In general, in the chemical reduction type plating solution 35, the reducing agent in the plating solution 35 emits electrons to the Pd plating layer 83 of the substrate 2, and these electrons are converted to metal ions (for example, Co ions) on the Pd plating layer 83. ) Is received, metal (Co) is deposited on the Pd plating layer 83. In this case, it is conceivable that some layer for transferring electrons is formed between the plating solution 35 and the Pd plating layer 83. For example, it is conceivable that an electric double layer formed by forming positive and negative charged particles in pairs at the interface and arranging them in a layered manner is considered. In this case, in order to quickly transfer and receive electrons, it is important to stably maintain a layer for transferring and receiving electrons.

  Here, according to the above-described comparative form, the state of the plating solution 35 existing on the substrate 2 is unstable at or near the center of the substrate 2. In this case, it is conceivable that the layer for transferring and receiving electrons becomes unstable, and as a result, the speed of transferring and receiving electrons decreases, or the transfer of electrons cannot be performed. For this reason, according to the comparative form, the thickness of the Co plating layer 84 formed at or near the center of the substrate 2 is thinner than the thickness of the Co plating layer 84 formed at other regions of the substrate. It can be considered. Alternatively, it is conceivable that the Co plating layer 84 is not formed at the center of the substrate 2.

  On the other hand, according to the present embodiment, as described above, the plating solution 35 is discharged toward the central portion of the substrate 2 using the inclined discharge port 46a, thereby reaching the central portion of the substrate 2. The impact of the liquid 35 on the substrate 2 can be weakened. Thereby, the layer for transferring and receiving electrons can be stably maintained, so that the transfer of electrons between the plating solution 35 and the Pd plating layer 83 can be performed quickly. This can prevent the thickness of the Co plating layer 84 formed at the center of the substrate 2 from becoming thinner than the thickness of the Co plating layer 84 formed in other regions of the substrate. Further, by using the inclined discharge port 46a, the impact of the plating solution 35 on the substrate 2 can be weakened without reducing the discharge flow rate of the plating solution 35.

Modified Example of Plating Solution Supply Mechanism In this embodiment, the plating solution supply mechanism 30 stores a supply tank 31 that stores the plating solution 35, and tank heating means that heats the plating solution 35 in the supply tank 31 to a storage temperature. 50, a first supply pipe 33A for supplying the plating solution 35 in the supply tank 31 to the first nozzle 40, and a plating solution 35 attached to the first supply pipe 33A and supplied to the first nozzle 40 at the first discharge temperature. The first heating means 60A for heating the first, the second supply pipe for supplying the plating solution 35 of the supply tank 31 to the second nozzle 45, and the plating solution attached to the second supply pipe 33B and supplied to the second nozzle 45 The example which has the 2nd heating means 60B which heats 35 to 2nd discharge temperature was shown. However, the present invention is not limited to this, as long as it is realized that the temperature of the plating solution 35 supplied to the first nozzle 40 is higher than the temperature of the plating solution 35 supplied to the second nozzle 45. Various configurations of the plating solution supply mechanism 30 may be employed.

  For example, in the plating solution supply mechanism 30, the tank heating means 50 for heating the plating solution 35 in the supply tank 31 to the storage temperature may not be provided. In this case, the normal temperature plating solution 35 reaches the first heating means 60A and the second heating means 60B. Then, the plating solution 35 is heated to the first discharge temperature by the first heating means 60A, and the plating solution 35 is heated to the second discharge temperature by the second heating means 60B.

  In the plating solution supply mechanism 30, the second heating unit 60B may not be provided. In this case, the above-described storage temperature realized by the tank heating means 50 is set to be higher than the plating temperature. That is, the tank heating means 50 heats the plating solution 35 in the supply tank 31 to a temperature higher than the plating temperature. Thereby, the temperature of the plating solution 35 discharged from the second nozzle 45 can be set to a predetermined temperature equal to or higher than the plating temperature. Further, the temperature of the plating solution 35 supplied to the first nozzle 40 can be made higher than the temperature of the plating solution 35 supplied to the second nozzle 45 by the first heating means 60A.

  Alternatively, as shown in FIG. 11, the plating solution supply mechanism 30 supplies the first supply tank 31 </ b> A and the second supply tank 31 </ b> B storing the plating solution 35 and the plating solution 35 in the first supply tank 31 </ b> A to the first nozzle 40. The first supply pipe 33A to be supplied, the second supply pipe 33B to supply the plating solution 35 in the second supply tank 31B to the second nozzle 45, and the plating solution 35 in the first supply tank 31A are heated to the first storage temperature. The tank first heating means 50A and the tank second heating means 50B for heating the plating solution 35 in the second supply tank 31B to the second storage temperature may be provided. Here, the first tank heating means 50A and the tank heating means 50B differ only in the target temperature, and the other points are substantially the same as the tank heating means 50 shown in FIG. Regarding the first tank heating means 50A and the tank heating means 50B shown in FIG. 11, the same parts as those of the tank heating means 50 shown in FIG.

  In the modified example shown in FIG. 11, the tank first heating means 50 </ b> A and the tank second heating means 50 </ b> B are controlled by the control mechanism 160 so that the first storage temperature is higher than the second storage temperature. . Moreover, the 1st storage temperature and the 2nd storage temperature are set so that it may become higher than the above-mentioned plating temperature. For this reason, the temperature of the plating solution 35 supplied to the first nozzle 40 and the second nozzle 45 can be made higher than the plating temperature, and the temperature of the plating solution 35 supplied to the first nozzle 40 is The temperature of the plating solution 35 supplied to the second nozzle 45 can be made higher.

  In addition, as shown by the alternate long and short dash line in the modification shown in FIG. 11, the plating solution supply mechanism 30 may further include a first heating means 60A and a second heating means 60B. In this case, the plating solution 35 is heated in two stages by the tank heating means 50A and 50B and the heating means 60A and 60B, as in the case of the embodiment shown in FIG. For this reason, the temperature of the plating solution 35 stored in each of the first supply tank 31A and the second supply tank 31B can be set lower than the plating temperature. Thus, it is possible to prevent the reducing agent in the plating solution 35 from being deactivated and the components from evaporating in the first supply tank 31A and the second supply tank 31B, and as a result, the life of the plating solution 35 can be prevented from being shortened. .

Modified Example of Second Nozzle In the present embodiment, the discharge port 46 of the second nozzle 45 discharges the plating solution 35 toward the substrate 2 along the inclined direction S ₁ inclined from the normal direction N of the substrate 2. The example including the inclined discharge port 46a configured to do is shown. However, the present invention is not limited to this, and the discharge port 46 of the second nozzle 45 has a vertical discharge port 46 b configured to discharge the plating solution 35 toward the substrate 2 along the normal direction N of the substrate 2. Further, it may be included. 12 is a plan view showing a second nozzle 45 having a discharge port 46 further including a vertical discharge port 46b, and FIG. 13 is a cross-sectional view of the second nozzle 45 shown in FIG. 12 as viewed from the XIII-XIII direction. is there.

As shown in FIG. 13, the vertical discharge port 46 b discharges the plating solution 35 along a direction S ₂ parallel to the normal direction N of the substrate 2. In the example shown in FIG. 13, the inclined discharge port 46a is connected to the inclined supply port second supply pipe 33B (1), and the vertical discharge port 46b is connected to the vertical supply port second supply pipe 33B (2). It is connected. Although not shown, the second supply pipe 33B is disposed between the second supply pipe 33B (1) for the inclined discharge port and the second supply pipe 33B (2) for the vertical discharge port and the second supply pipe 33B. A closing means for selectively supplying the plating solution 35 to either the second supply pipe 33B (1) for the inclined discharge port or the second supply pipe 33B (2) for the vertical discharge port is provided. This closing means is controlled by the control mechanism 160. Accordingly, by controlling the closing means by the control mechanism 160, the supply of the plating solution 35 to either the inclined discharge port 46a or the vertical discharge port 46b can be stopped. In other words, the closing means can close either the inclined discharge port 46 a or the vertical discharge port 46 b based on control from the control mechanism 160.

  When the discharge port 46 of the second nozzle 45 further includes the above-described vertical discharge port 46b, the following effects can be obtained by properly using the inclined discharge port 46a and the vertical discharge port 46b depending on the situation. For example, in the above-described liquid replacement step S305, the plating liquid 35 is discharged toward the substrate 2 using the vertical discharge port 46b of the second nozzle 45. On the other hand, in the above-described incubation step S306 and plating film growth step S307, the plating solution 35 is discharged toward the substrate 2 using the inclined discharge port 46a of the second nozzle 45. For this reason, in the liquid replacement step S305, the impact given to the substrate 2 by the plating solution 35 that has reached the substrate 2 can be increased, whereby the rinse treatment solution on the substrate 2 is replaced with the plating solution 35. Can be promoted. In addition, in the incubation step S306 and the plating film growth step S307, the impact given to the substrate 2 by the plating solution 35 that has reached the substrate 2 can be weakened, as in the case of the present embodiment described above. Accordingly, it is possible to prevent the initial Co plating layer 84 from being formed and the Co plating layer 84 from being hindered by an impact.

Modified Example of First Nozzle In the present embodiment, the example in which the first nozzle 40 includes a plurality of discharge ports 41 arranged along the radial direction of the substrate 2 has been shown. However, as long as the first nozzle 40 can directly supply the plating solution 35 to a region within a predetermined range in the radial direction of the substrate 2 in the region on the substrate 2, a specific form of the first nozzle 40. Is not limited. For example, as shown in FIG. 14, the first nozzle 40 may include a slit-like discharge port 42 extending along the radial direction of the substrate 2. Alternatively, although not shown, the first nozzle 40 may be configured by arranging a plurality of independent nozzles along the radial direction of the substrate 2.

  Similarly to the inclined discharge port 46 a of the second nozzle 45, also in the first nozzle 40, the discharge port 41 or the discharge port 42 is formed on the substrate 2 along the inclined direction inclined from the normal direction N of the substrate 2. You may be comprised so that the plating solution 35 may be discharged toward. Thereby, it is possible to weaken the impact when the plating solution 35 discharged from the first nozzle 40 collides with the substrate 2. This makes it possible to more stably maintain a layer for transferring electrons between the plating solution 35 and the Pd plating layer 83 during the incubation step S306 and the plating film growth step S307.

In the first modification of the control method and in the present embodiment, the discharge port 46 of the second nozzle 45 is positioned closer to the center of the substrate 2 than the discharge ports 41 of the first nozzle 40. In the example, the second nozzle 45 discharges the plating solution 35 toward the substrate 2. However, the present invention is not limited to this, and the control mechanism 160 causes the second nozzle 45 to discharge the plating solution 35 toward the substrate 2 while the second nozzle 45 is moving from the center position to the peripheral position. The two nozzles 45 and the arm 49 may be controlled.

15A and 15B are diagrams showing an example in which the plating solution 35 is discharged toward the substrate 2 while the second nozzle 45 is moving from the center position to the peripheral position in the above-described liquid replacement step S305. It is. In FIG. 15 (b), the direction from the center position to peripheral positions is represented by arrow D _1. In this case, first, as shown in FIG. 15A, the second nozzle 45 discharges the plating solution 35 toward the center of the substrate 2 at the center position. Next, as shown in FIG. 15B, the second nozzle 45 discharges the plating solution 35 toward the substrate 2 while the second nozzle 45 moves from the center position to the peripheral position. As a result, as shown in FIGS. 15A and 15B, the rinsing solution 79 on the substrate 2 is sequentially replaced with the plating solution 35 in the direction from the central portion to the peripheral portion of the substrate 2.

  By the way, when the second nozzle 45 discharges the plating solution 35 toward the substrate 2 while moving from the center position to the peripheral position, the moving speed of the second nozzle 45 is included in the velocity component of the discharged plating solution 35. In the horizontal direction from the center portion of the substrate 2 toward the peripheral portion. For this reason, the force by which the plating solution 35 pushes the rinsing treatment liquid 79 toward the peripheral edge of the substrate 2 is strengthened, whereby the rinsing treatment solution 79 on the substrate 2 is more efficiently replaced with the plating solution 35. Can do.

Second Modified Example of Control Method In the first modified example of the above-described control method, the second nozzle 45 moves toward the substrate 2 while the second nozzle 45 moves from the center position to the peripheral position. The example in which the second nozzle 45 and the arm 49 are controlled by the control mechanism 160 so as to discharge 35 is shown. However, the present invention is not limited to this, and the control mechanism 160 causes the second nozzle 45 to discharge the plating solution 35 toward the substrate 2 while the second nozzle 45 is moving from the peripheral position to the center position. The two nozzles 45 and the arm 49 may be controlled.

16A and 16B, in the incubation step S306 described above, the second nozzle 45 discharges the plating solution 35 toward the substrate 2 while the second nozzle 45 moves from the peripheral position to the center position. It is a figure which shows an example. In FIG. 16 (a) (b), the direction toward the center position from the edge position is indicated by the arrow D _2.

  By the way, when the second nozzle 45 discharges the plating solution 35 toward the substrate 2 while the second nozzle 45 is moving from the peripheral position to the center position, the second nozzle 45 is included in the velocity component of the discharged plating solution. A speed component corresponding to a moving speed of 45, which is a horizontal speed component from the peripheral edge of the substrate 2 toward the center, is included. On the other hand, the substrate 2 is rotated by the substrate rotation holding mechanism 110, and therefore, the plating solution 35 already existing on the substrate 2 is moved from the center of the substrate 2 toward the peripheral portion based on the centrifugal force. Considered moving. That is, the velocity component in the horizontal direction of the plating solution 35 discharged from the second nozzle 45 toward the substrate 2 and the velocity component in the horizontal direction of the plating solution 35 already existing on the substrate 2 are contradictory. It has become. In this case, as shown in FIGS. 16 (a) and 16 (b), the plating solution 35 discharged from the second nozzle 45 and the plating solution 35 already present on the substrate 2 collide, thereby causing the flow of the plating solution 35. It is conceivable that the liquid accumulation portion 35 a of the plating solution 35 is formed on the substrate 2 due to the stagnation. According to this modified example, by forming such a liquid accumulation portion 35a, it is possible to maintain a more stable layer for transferring electrons, whereby the plating solution 35 and the Pd plating layer 83 Exchange of electrons between the two can be carried out more quickly. This can promote the formation of the initial Co plating layer 84 on the Pd plating layer 83.

  In the present modification, in the incubation step S306, the example in which the second nozzle 45 discharges the plating solution 35 toward the substrate 2 while the second nozzle 45 is moving from the peripheral position to the center position is shown. However, the present invention is not limited to this, and also in the plating film growth step S307 described above, the second nozzle 45 moves toward the substrate 2 while the second nozzle 45 moves from the peripheral position to the center position. The second nozzle 45 and the arm 49 may be controlled by the control mechanism 160 so as to discharge the gas. Thereby, the growth of the Co plating layer 84 can be promoted.

  Preferably, during the liquid replacement step S305, the control mechanism 160 discharges the plating solution 35 toward the substrate 2 while the second nozzle 45 is moving from the center position to the peripheral position, and the incubation step S306. At this time, the second nozzle 45 and the arm 49 are controlled so that the second nozzle 45 discharges the plating solution 35 toward the substrate 2 while the second nozzle 45 is moving from the peripheral position to the center position. Thereby, both the liquid replacement step S305 and the incubation step S306 can be efficiently performed.

In the third modification also the embodiment of the control method, the substrate 2 is an example that is rotated in the first rotational direction R ₁ by the substrate rotation holding mechanism 110. However, the present invention is not limited to this, and the substrate 2 may be rotated in the second rotation direction R ₂ depending on the situation.

For example, in the above-described liquid replacement step S305, so that the plating liquid 35 from the inclined discharge port 46a of the second nozzle 45 is ejected toward the substrate 2 while the substrate 2 is rotated in the second rotational direction R _2, the control The mechanism 160 may control the substrate rotation holding mechanism 110 and the second nozzle 45. Here inclined discharge port 46a is first rotational direction R ₁ corresponds to, and the second rotational direction R ₂ as described above has a direction opposite the first rotational direction R _1. Therefore, when rotating the substrate 2 in the second rotational direction R _2, the moving speed of the substrate 2 in the horizontal direction of the region where the plating solution 35 collide, large difference between the moving speed of the plating solution 35 in the horizontal direction It has become. Therefore, by ejecting the plating solution 35 toward the inclined discharge port 46a to the substrate 2 while the substrate 2 is rotated in the second rotational direction R _2, the plating solution 35 that has collided with the substrate 2 has on the substrate 2 The impact can be strengthened. As a result, the force with which the plating solution 35 pushes the rinsing treatment liquid 79 can be increased, whereby the rinsing treatment solution 79 on the substrate 2 can be replaced with the plating solution 35 more efficiently.

Preferably, the control mechanism 160, the second nozzle 45 ejects the plating solution 35 toward the substrate 2 while the substrate 2 when the liquid replacement step S305 is rotating in the second rotational direction _{R 2,} the incubation step S306 the second nozzle 45 to eject the plating solution 35 toward the substrate 2, which controls the substrate rotating holding mechanism 110 and the second nozzle 45 while the substrate 2 is rotated in the first rotational direction R ₁ when. Thereby, the impact of the plating solution 35 on the substrate 2 at the time of the liquid replacement step S305 can be increased, and the impact of the plating solution 35 on the substrate 2 at the time of the incubation step S306 can be reduced. Thereby, both the liquid replacement step S305 and the incubation step S306 can be efficiently performed.

In the fourth modified example of the control method and in the present embodiment, the substrate 2 is supplied from both the first nozzle 40 and the second nozzle 45 in all steps of the liquid replacement step S305, the incubation step S306, and the plating film growth step S307. An example in which the plating solution 35 is discharged is shown. However, the present invention is not limited to this. As long as at least the second nozzle 45 is used in the liquid replacement step S305 and at least the first nozzle 40 is used in the incubation step S306, the first nozzle 40 and the first nozzle used in each step are used. The two nozzles 45 can be determined as appropriate. For example, in the liquid replacement step S305, the plating solution 35 may be discharged toward the substrate 2 using only the second nozzle 45. In the incubation step S306 and the plating film growth step S307, the plating solution 35 may be discharged toward the substrate 2 using only the first nozzle 40.

Other Modifications In the present embodiment and each modification, the plating solution 35 discharged from the second nozzle 45 is applied to the substrate 2 during the incubation step S306 by using the inclined discharge port 46a of the second nozzle 45. An example where the impact is weakened is shown. However, specific means for reducing the impact of the plating solution 35 discharged from the second nozzle 45 on the substrate 2 is not particularly limited. For example, even when the discharge port 46 of the second nozzle 45 includes only the vertical discharge port 46b, the second nozzle 45 is adjusted during the incubation step S306 by appropriately adjusting the second valve 32B of the plating solution supply mechanism 30. , The discharge speed of the plating solution 35 discharged toward the substrate 2 in the normal direction N of the substrate 2 can be reduced. Thereby, it is possible to weaken the impact applied to the substrate 2 by the plating solution 35 discharged from the second nozzle 45 during the incubation step S306. In this case, preferably, the discharge speed in the normal direction N of the substrate 2 of the plating solution 35 discharged from the second nozzle 45 toward the substrate 2 during the incubation step S306 is such that the second nozzle is discharged during the liquid replacement step S305. The control mechanism 160 controls the plating solution supply mechanism 30 so that the plating solution 35 discharged from 45 toward the substrate 2 is smaller than the discharge speed in the normal direction N of the substrate 2. Thereby, both the liquid replacement step S305 and the incubation step S306 can be efficiently performed.

  In the present embodiment and each modification, an example in which a CoP plating solution is used as the chemical reduction type plating solution 35 discharged from the first nozzle 40 and the second nozzle 45 toward the substrate 2 has been described. However, the plating solution 35 used is not limited to the CoP plating solution, and various plating solutions 35 can be used. For example, as the chemical reduction type plating solution 35, various plating solutions 35 such as a CoWB plating solution, a CoWP plating solution, a CoB plating solution, or a NiP plating solution may be used.

  Further, in the present embodiment and each modification, the first nozzle 40 includes a plurality of discharge ports 41 arranged along the radial direction of the substrate 2, or has a slit shape extending along the radial direction of the substrate 2. An example including the discharge port 42 was shown. However, the present invention is not limited to this, and the first nozzle 40 may include only one circular discharge port 41. For example, as shown in FIG. 17, the discharge mechanism 21 includes a first nozzle 40 including a discharge port 41 that discharges the plating solution 35 toward the substrate 2, and the central portion of the substrate 2 rather than the discharge port 41 of the first nozzle 40. And a second nozzle 45 including a discharge port 46 that can be positioned close to the nozzle. Even in this case, according to the present embodiment and each modification, the plating solution supply mechanism 30 uses the plating solution in which the temperature of the plating solution 35 supplied to the first nozzle 40 is supplied to the second nozzle 45. The temperature is higher than 35. For this reason, it is possible to increase the temperature of the plating solution 35 that reaches the region on the peripheral side of the central portion of the substrate 2 in the region on the substrate 2. Thereby, it is possible to suppress the occurrence of a difference between the reaction condition of the plating solution 35 in the central portion of the substrate 2 and the reaction condition of the plating solution 35 in the peripheral portion of the substrate 2.

  An example in which the plating solution is discharged toward the substrate 2 using the first nozzle 40 and the second nozzle 45 of the plating apparatus 20 described above will be described.

Example 1
The CoP plating solution was discharged toward the substrate 2 using the first nozzle 40 having a plurality of discharge ports 41 and the second nozzle 45 located at the center of the substrate 2. At this time, the temperature of the plating solution supplied to the first nozzle 40 was 90 ° C., and the temperature of the plating solution supplied to the second nozzle 45 was 80 ° C. Then, the temperature of the substrate 2 was measured along the radial direction of the substrate 2. The results are shown in FIG. In FIG. 18, the horizontal axis indicates the position on the substrate 2, and the vertical axis indicates the measured temperature. In the horizontal axis of FIG. 18, “0” corresponds to the center portion of the substrate 2, and “± 150” corresponds to the peripheral portion of the substrate 2.

(Comparative Example 1)
The CoP plating solution was discharged toward the substrate 2 using only the second nozzle 45 located at the center of the substrate 2. At this time, the temperature of the plating solution supplied to the second nozzle 45 was set to 80 ° C. Then, the temperature of the substrate 2 was measured along the radial direction of the substrate 2. The results are shown in FIG. 18 together with the results of Example 1.

  As shown in FIG. 18, by using the first nozzle 40 having a plurality of discharge ports 41 and the second nozzle 45 located at the center of the substrate 2, the temperature of the substrate 2 is substantially reduced over the entire area of the substrate 2. It was possible to make it uniform.

DESCRIPTION OF SYMBOLS 1 Plating process system 2 Substrate 20 Plating apparatus 21 Discharge mechanism 30 Plating solution supply mechanism 31 Supply tank 31A First supply tank 31B Second supply tank 33A First supply pipe 33B Second supply pipe 40 First nozzle 41 Discharge port 45 First 2 nozzles 46 discharge ports 46a inclined discharge ports 46b vertical discharge ports 50 tank heating means 50A first tank heating means 50B second tank heating means 60A first heating means 60B second heating means 110 substrate rotation holding mechanism 160 control mechanism 161 storage media

Claims (6)

In a plating apparatus that performs plating by supplying a plating solution to a substrate,
A substrate rotation holding mechanism for holding and rotating the substrate;
A discharge mechanism for discharging a plating solution toward the substrate held by the substrate rotation holding mechanism;
A plating solution supply mechanism for supplying a plating solution to the discharge mechanism;
A control mechanism for controlling the discharge mechanism and the plating solution supply mechanism,
The discharge mechanism includes a first nozzle including a discharge port for discharging a plating solution toward the substrate, and a discharge port that can be positioned closer to the center of the substrate than the discharge port of the first nozzle. A second nozzle including
The plating solution supply mechanism is configured such that the temperature of the plating solution supplied to the first nozzle is higher than the temperature of the plating solution supplied to the second nozzle,
The plating apparatus, wherein the second nozzle is movable along a radial direction of the substrate.   The second nozzle moves from a central position where the discharge port of the second nozzle is closer to the center of the substrate than the discharge port of the first nozzle to a peripheral position that is closer to the peripheral side than the central position. The plating apparatus according to claim 1, wherein a plating solution is discharged toward the substrate during the time.   The second nozzle is moved from a peripheral position closer to a peripheral side than the central position to a central position where the discharge port of the second nozzle is closer to the center of the substrate than the discharge port of the first nozzle. The plating apparatus according to claim 1, wherein a plating solution is discharged toward the substrate during the time. In a plating method for performing plating by supplying a plating solution to a substrate,
Disposing the substrate on a substrate rotation holding mechanism;
Discharging a plating solution to the substrate via a discharge mechanism,
The discharge mechanism includes a first nozzle including a discharge port for discharging a plating solution toward the substrate, and a discharge port that can be positioned closer to the center of the substrate than the discharge port of the first nozzle. A second nozzle including,
The temperature of the plating solution discharged from the first nozzle toward the substrate is higher than the temperature of the plating solution discharged from the second nozzle toward the substrate,
The plating method according to claim 1, wherein the second nozzle is movable along a radial direction of the substrate.   The second nozzle moves from a central position where the discharge port of the second nozzle is closer to the center of the substrate than the discharge port of the first nozzle to a peripheral position that is closer to the peripheral side than the central position. 5. The plating method according to claim 4, wherein a plating solution is discharged toward the substrate during the period.   The second nozzle is moved from a peripheral position closer to a peripheral side than the central position to a central position where the discharge port of the second nozzle is closer to the center of the substrate than the discharge port of the first nozzle. 5. The plating method according to claim 4, wherein a plating solution is discharged toward the substrate during the period.

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