JP5778411B2 - Liquid crystal display device and manufacturing method thereof - Google Patents

Description

  The present invention relates to a liquid crystal display device including a liquid crystal cell in which a pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween is bonded via a sealing material, and a method for manufacturing the same.

As a liquid crystal display device (LCD), an active matrix liquid crystal display device using a thin film transistor (TFT) as a pixel switching element is widely used.
A TFT-LCD is a TFT substrate (element substrate) on which a plurality of pixel electrodes and a plurality of TFTs formed in a matrix are formed, a color filter (color material layer, CF), a light shielding layer (BM), and a common The basic configuration is a liquid crystal cell in which a CF substrate on which an electrode or the like is formed is disposed to face each other with a liquid crystal layer interposed therebetween. Usually, in the TFT-LCD, the CF substrate is arranged on the viewing side.

In recent years, development of an LCD capable of simultaneously displaying different images in different directions of visual direction on one LCD has been progressing.
Examples of the LCD include a left and right two-screen LCD that displays different images on the left and right, and a 3D-LCD that performs three-dimensional display by slightly shifting the images displayed on the left and right.
As a method for displaying different images simultaneously in different visual directions, a method using a lenticular lens, a method using a parallax barrier layer, and the like have been proposed.

A parallax barrier LCD is disclosed in Patent Documents 1 to 3 and the like.
The parallax barrier method will be described by taking a two-screen LCD or a 3D-LCD capable of different displays on the left and right as an example.

  In the parallax barrier method that performs different display on the left side and the right side, a plurality of pixels arranged in a matrix are divided into a pixel that displays data for left visual field and a pixel that displays data for right visual field. . Also, a parallax barrier layer having a light-shielding portion that is spaced apart from a light-shielding layer (CF-BM) that shields adjacent pixels formed on the CF substrate and has a different planar view position from the light-shielding portion of the CF-BM. Is provided.

Of the light transmitted through the opening of the CF-BM, the light traveling in the front direction is blocked by the parallax barrier layer, and only the light traveling in the oblique direction (left direction and right direction) is transmitted through the parallax barrier layer and visually recognized. .
The pixel electrode, the CF-BM, and the parallax so that the display from the pixel displaying the data for the left visual field is emitted only to the left and the display from the pixel displaying the data for the right visual field is emitted only to the right. The pattern of the barrier layer and the distance between them are designed.

JP 2007-072476 JP 2008-089630 International Publication No. 2007/007552 Japanese Patent Laid-Open No. 2002-229008

In a parallax barrier LCD, the CF-BM and the parallax barrier layer need to be separated to some extent in order to ensure parallax.
Therefore, in a parallax barrier type LCD, the CF-BM that shields light between adjacent pixels is usually formed on the inner surface (surface on the liquid crystal layer side) of the CF substrate, and the parallax barrier layer is opposite to the outer surface (the liquid crystal layer side) of the CF substrate. Side surface).

When CF-BM formed on the inner surface of the CF substrate is present in the formation region of the sealing material that seals the liquid crystal, the photocuring of the sealing material is performed in an ODF (One Drop Filling) method, which is one of liquid crystal injection methods. This hinders light (usually UV light) irradiation during processing. Therefore, it is necessary to perform light irradiation for curing the sealing material from the TFT substrate side. In the light irradiation from the TFT substrate side on which a large number of wirings are formed, there is a possibility that the light irradiation to the sealing material may be hindered by the wirings formed on the TFT substrate.
Further, when a resin material is used as CF-BM, if it is present in the formation region of the sealing material that seals the liquid crystal, the adhesive strength of the sealing material is reduced, and reliability such as intrusion of moisture into the liquid crystal cell or liquid crystal leakage due to this May cause a drop.

  For the above reasons, it is preferable that the formation region of the sealing material is partially removed from the CF-BM. However, simply removing the CF-BM sealing material formation region causes a problem of light leakage from the peripheral frame region.

  When the vacuum injection method which is another liquid crystal injection method is used while avoiding the problem of the ODF method, the liquid crystal injection is performed after the substrates are bonded. Since the LCD is manufactured at low cost, a large number of liquid crystal cells are usually manufactured at once using a large mother substrate. Therefore, a pair of mother substrates with electrodes and other necessary elements formed on the inner surface are bonded together, the mother CF substrate is thinned by polishing or etching, a parallax barrier layer is formed on the outer surface, and divided into individual liquid crystal cells. Liquid crystal injection is performed. The formation of the parallax barrier layer requires the formation and patterning of a light-shielding film, and these processes are difficult to implement after being divided and cut into individual liquid crystal cells, and the efficiency is poor. It is necessary to carry out in the state of. Therefore, in the parallax barrier LCD, the mother CF substrate must be thinned and the parallax barrier layer must be formed at least before the mother substrate is divided, that is, before the liquid crystal is injected after the mother substrate is divided.

In the above method, since the CF substrate at the time of liquid crystal injection is thin, a protective material such as protective glass is attached to the CF substrate at the time of liquid crystal injection to prevent cracking of the CF substrate (usually a glass substrate). This protective material needs to be removed after liquid crystal injection. For this reason, the cost of the protective material that is not directly used in the product is excessive, and the number of processes due to the attachment / detachment of the protective material increases, resulting in high manufacturing costs.
Since a parallax barrier LCD (two-screen LCD or 3D-LCD) has a larger number of manufacturing steps and higher manufacturing costs compared to a general single-screen 2D-LCD, the parallax barrier layer is formed on the CF substrate. The above manufacturing cost increase is not preferable.
In the ODF method, since the mother CF substrate can be thinned and a parallax barrier layer can be formed after liquid crystal injection, a protective material for liquid crystal injection is not necessary and the cost is low.

  The viewing side substrate may be a TFT substrate. Also in this case, a parallax barrier layer is usually provided on the outer surface of the TFT substrate. In this case, the situation is the same as above.

  Patent Document 3 discloses a display device in which a parallax barrier layer is not formed in a sealing material formation region in order to suppress separation of the parallax barrier layer in a sealing material formation region. FIG. 1 etc.). However, Patent Document 3 does not describe problems and solutions in the formation region of the CF-BM sealing material.

  Patent Document 4 describes a structure in which an opening is provided in a CF-BM sealing material formation region and an external light shielding film is provided at the corresponding position (FIG. 9 and the like). However, Patent Document 4 does not describe application to a parallax barrier type LCD, and describes that providing an external light shielding film in a general LCD increases costs (paragraphs 0008-0009).

  The present invention has been made in view of the above circumstances, and has a parallax barrier system that suppresses light leakage from the peripheral frame region, has good adhesion of the sealing material, has good reliability, and can be manufactured at low cost. An object of the present invention is to provide a liquid crystal display device.

The first liquid crystal display device of the present invention comprises:
A pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween includes a liquid crystal cell attached via a sealing material,
An inter-pixel light-shielding layer that shields between adjacent pixels is formed on the inner surface of one of the pair of substrates on the liquid crystal layer side, and the inter-pixel is disposed on the outer surface of the viewing-side substrate of the pair of substrates. A liquid crystal display device in which a parallax barrier layer having a light shielding pattern different from the light shielding layer is formed,
The inter-pixel light shielding layer is not formed in at least a part of the formation region of the sealing material,
The parallax barrier layer also serves as an external light-shielding layer that covers a region where the inter-pixel light-shielding layer is not formed in the sealing material formation region.

As a preferable aspect of the first liquid crystal display device of the present invention,
An aspect in which one of the pair of substrates is an element substrate including a plurality of pixel electrodes formed in a matrix and a plurality of pixel switching elements, and the other is a counter substrate including the inter-pixel light shielding layer. It is done.

As another preferable aspect of the first liquid crystal display device of the present invention,
An embodiment in which one of the pair of substrates is an element substrate including a plurality of pixel electrodes formed in a matrix, a plurality of pixel switching elements, and the inter-pixel light-shielding layer.

As another preferable aspect of the first liquid crystal display device of the present invention,
One of the pair of substrates is an element substrate including a plurality of pixel electrodes and a plurality of pixel switching elements formed in a matrix,
A mode in which a part of the inter-pixel light-shielding layer is formed on the element substrate and the parallax barrier layer also serves as a part of the inter-pixel light-shielding layer is exemplified.

As said aspect,
The pixel switching element is a thin film transistor;
A part of the inter-pixel light-shielding layer formed on the element substrate shields light between pixels on the source wiring side,
A mode in which a part of the inter-pixel light-shielding layer also serving as the external light-shielding layer shields light between the pixels on the gate wiring side can be mentioned.

As said aspect,
Common wiring in which a part of the inter-pixel light-shielding layer formed on the element substrate branches from the common wiring arranged substantially in parallel with the gate wiring and extends to a region under the source wiring and partially covering the pixel electrode The aspect which is a branch part is mentioned.

The second liquid crystal display device of the present invention comprises:
A pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween includes a liquid crystal cell attached via a sealing material,
An inter-pixel light-shielding layer that shields between adjacent pixels is formed on the inner surface of one of the pair of substrates on the liquid crystal layer side, and the inter-pixel light-shielding is formed on the inner surface of one of the pair of substrates. A liquid crystal display device in which a parallax barrier layer having a light shielding pattern different from the layer is formed,
The inter-pixel light-shielding layer and the parallax barrier layer are not formed in at least a part of the formation region of the sealing material,
An external light shielding layer is formed on an outer surface on the viewing side of the liquid crystal cell to cover a region where neither the inter-pixel light shielding layer nor the parallax barrier layer is formed in the sealing material formation region.

A manufacturing method of a liquid crystal display device of the present invention is a manufacturing method of the above-described liquid crystal display device of the present invention,
The method includes a step of forming the external light-shielding layer after a step of performing liquid crystal injection by ODF (One Drop Filling) method and substrate bonding to the pair of substrates before forming the external light-shielding layer. is there.
Here, “substrate bonding” includes not only a pair of substrates on which one liquid crystal cell is formed but also a bonding of a pair of mother substrates on which a plurality of liquid crystal cells are formed in a lump.

  According to the present invention, it is possible to provide a parallax barrier liquid crystal display device in which light leakage from the peripheral frame region is suppressed, the sealing material has good adhesion and reliability, and can be manufactured at low cost. it can.

It is a principal part disassembled perspective view of LCD of 1st Embodiment. It is a whole top view (perspective view) of LCD of 1st Embodiment. It is principal part sectional drawing of the display area of LCD of 1st Embodiment. It is principal part sectional drawing of the sealing material of LCD of 1st Embodiment, and its vicinity. It is process drawing which shows the manufacturing method of LCD of 1st Embodiment. It is process drawing which shows the manufacturing method of LCD of 1st Embodiment. It is principal part sectional drawing of the sealing material of LCD of 2nd Embodiment, and its vicinity. It is a principal part top view (perspective view) of the display area of LCD of 2nd Embodiment. It is the example of a change of FIG. 6A. It is principal part sectional drawing of the sealing material of LCD of 3rd Embodiment, and its vicinity.

“First Embodiment”
A parallax barrier liquid crystal display (LCD) according to a first embodiment of the present invention will be described with reference to the drawings.
The present embodiment can be used as a left and right two-screen LCD that displays different images on the left and right, and a 3D-LCD that performs three-dimensional display by slightly shifting the images displayed on the left and right.
In the present embodiment, a transmissive TFT-LCD of a vertical electric field drive method will be described as an example.

FIG. 1 is an exploded perspective view of a main part of the LCD of this embodiment. FIG. 2 is an overall plan view (perspective view) of the LCD of this embodiment. FIG. 3 is a cross-sectional view of the main part of the display area of the LCD of this embodiment. FIG. 4 is a cross-sectional view (IV-IV cross-sectional view of FIG. 2) of the main part of the sealing material of the LCD of this embodiment and the vicinity thereof.
In order to facilitate visual recognition, the scale and position of each component are appropriately different from the actual ones, and some components are not shown. In the cross-sectional view, hatching is omitted as appropriate.

  As shown in FIG. 1, the LCD 1 of this embodiment is a transmissive LCD including a backlight (BL) 101 including a light source and a light guide plate. As shown in FIG. 3, the liquid crystal cell 1A has a plurality of pixels PL and PR arranged in a matrix.

  As shown in FIGS. 1 and 3, the liquid crystal cell 1A includes a TFT substrate (element substrate) 104 on the BL 101 side, a CF substrate (opposite substrate) 106 on the viewing side, and a liquid crystal layer sandwiched between the pair of substrates. 105. As shown in FIG. 2, the TFT substrate 104 and the CF substrate 106 are attached via a sealing material 109 applied to the peripheral portion between these substrates, and the liquid crystal layer 105 is enclosed inside the sealing material 109. Has been.

The TFT substrate 104 has a pixel electrode 114 (not shown in FIGS. 1 to 4) for each pixel on the inner surface (surface on the liquid crystal layer side) of a light-transmitting substrate such as a glass substrate, and a TFT 115 (Thin Film Transistor, 1 to 4 are formed, and a plurality of gate lines (scanning signal lines) 111 (not shown in FIGS. 1 to 4) and a plurality of source lines (display signal lines) 112 for driving each pixel. And a plurality of lead wires (not shown) connected to the plurality of signal wires, and an alignment film (not shown) is formed on the outermost surface on the liquid crystal layer 105 side. .
See FIG. 3 and FIG. 6B for the source wiring 112. For the pixel electrode 114, the TFT 115, and the gate wiring 111, refer to FIG. 6B.

As shown in FIG. 3, the CF substrate 106 has a common electrode (not shown) and red (R) / green (G) / blue on the inner surface (surface on the liquid crystal layer side) of a translucent substrate such as a glass substrate. A color filter (color material layer, CF, not shown) in (B) and an inter-pixel light-shielding layer (CF-BM) 107 that shields light between adjacent pixels are formed, and an alignment film is formed on the outermost surface on the liquid crystal layer 105 side. This is a substrate on which (not shown) is formed.
In the CF substrate 106, a pixel opening 107 </ b> B is formed between adjacent light shielding portions 107 </ b> A of the CF-BM 107.
A parallax barrier layer 108 having a light shielding pattern different from that of the CF-BM 107 is provided on the outer surface of the CF substrate 106 (the surface opposite to the liquid crystal layer 105 and the surface on the viewing side). The parallax barrier layer 108 includes a light shielding part 108A and an opening part 108B.

As shown in FIG. 3, in the liquid crystal cell 1 </ b> A, a plurality of pixels arranged in a matrix form a pixel PL that displays data for the left visual field on the display screen, and data for the right visual field on the display screen. Are assigned to the pixels PR for displaying the image.
In the present embodiment, the cross-sectional view, the left-view pixel PL and the right-view pixel PR are alternately arranged.
The plane pattern of the left-view pixel PL and the right-view pixel PR is not particularly limited. For example, in a plan view, a line-shaped left-view pixel group consisting of a plurality of left-view pixel pixels PL arranged in a line in a line and a plurality of right-view pixels PR arranged in a line in a line The line-shaped right-view pixel groups are alternately arranged in stripes.

The parallax barrier layer 108 is adjusted so that display data from the individual pixels PL and PR constituting the LCD 1 is selectively emitted to a visual field region of a specific angular range, and different displays are performed in a plurality of visual field regions of different angular ranges. It is adjusted to display an image.
In the LCD 1, the opening positions of the pixel opening 107 </ b> B formed in the CF-BM 107 and the opening 108 </ b> B of the parallax barrier layer 108 are shifted. Specifically, the opening 108B of the parallax barrier layer 108 is located between the pixel opening 107B of the left-view pixel PL and the pixel opening 107B of the right-view pixel PR that are adjacent to each other.

In the LCD 1, display data from the left viewing pixel PL is selectively transmitted to the left with respect to the display screen through the pixel opening 107 B of the left viewing pixel PL and the opening 108 B of the parallax barrier layer 108. Emitted. As a result, the display image IL for the left visual field is observed by the observer who is on the left with respect to the display screen. For example, the display image IL is observed in a range in which the viewing angle is shifted from the front to the left by about 20 to 50 °.
Similarly, display data from the right-view pixel PR is selectively transmitted to the right with respect to the display screen through the pixel opening 107B of the right-view pixel PR and the opening 108B of the parallax barrier layer 108. Emitted. As a result, the display image IR for the right visual field is observed by an observer on the right side of the display screen. For example, the display image IR is observed in a range in which the viewing angle is shifted from the front to the right by about 20 to 50 °.

  In the LCD 1, as described above, the pixel electrode 114, the CF-BM 107, and the parallax barrier layer are emitted so that the display data from the left-view pixel PL and the display data from the right-view pixel PR are emitted with angle separation. 108 patterns and their separation distances are designed.

In the present embodiment, as shown in FIG. 1, the parallax barrier layer 108 has a planar pattern in which a plurality of openings 108 </ b> B are formed in a dot checkered pattern and the other regions are light shielding portions 108 </ b> A.
The planar pattern of the parallax barrier layer 108 is not limited to the above example, and the display image IL for the left visual field is observed by the observer who is on the left with respect to the display screen, and the observer who is on the right with respect to the display screen Any pattern may be used as long as the pattern of the light shielding part 108A and the opening part 108B is designed so that the display image IR for the visual field is observed.
Specifically, if the opening 108B of the parallax barrier layer 108 is positioned between the pixel opening 107B of the pixel PL for the left visual field and the pixel opening 107B of the pixel PR for the right visual field that are adjacent to each other. Good. For example, the parallax barrier layer 108 may have a pattern in which a plurality of openings 108B are formed in a stripe shape and the other regions are light shielding portions 108A.

As shown in FIG. 1, the LCD 1 of the present embodiment further includes a viewing angle compensation film (Wide Viewing (WV) film) 103a that compensates between the BL 101 and the liquid crystal cell 1A so as to widen the viewing angle with the polarizer 102a. Are sequentially provided.
The LCD 1 of the present embodiment also has a viewing angle compensation film (Wide Viewing (WV) film, phase difference compensation element) 103b for compensating for widening the viewing angle from the liquid crystal cell 1A side on the viewing side of the liquid crystal cell 1A and the polarization. A child 102b is sequentially provided.

As shown in FIG. 4, in the LCD 1 of the present embodiment, the CF-BM 107 and the parallax barrier layer 108 are formed not only inside the seal material 109 but also outside the seal material 109.
Here, the formation area of the sealing material 109 and the outside thereof, and the vicinity of the sealing material 109 inside the sealing material 109 are non-display areas (peripheral frame areas) where no display is performed.
In the present embodiment, the CF-BM 107 is not formed in at least a part of the formation region of the sealing material 109, and a part of the parallax barrier layer 108 formed on the outer surface on the viewing side of the liquid crystal cell 1A is the sealing material. In the formation region 109, an external light shielding layer is formed to cover a region where the CF-BM 107 is not formed.
In this embodiment, since the parallax barrier layer 108 also serves as an external light shielding layer, it is not necessary to separately provide an external light shielding layer as shown in FIG. 9 of Patent Document 4, and the cost does not increase.

In the LCD 1 of the present embodiment, the CF-BM 107 that is the inter-pixel light-shielding layer formed on the inner surface of the CF substrate 106 is not formed in at least a part of the region where the sealing material 109 is formed. In the ODF (One Drop Filling) method, light (normally UV light) irradiation during the photocuring treatment of the sealing material 109 is not hindered. The ODF method is a low-cost manufacturing method compared to the vacuum injection method.
In conventional LCDs, CF-BM is provided in the sealing material formation region to prevent light leakage from the peripheral frame region. Therefore, when the ODF method is used, light irradiation for curing the sealing material is performed from the TFT substrate side. There is a need to do. In light irradiation from the TFT substrate side on which a large number of wirings and the like are formed, there is a possibility that light irradiation to the sealing material may be hindered by the wirings and the like formed on the TFT substrate, and the sealing material is not easily cured.
In this embodiment, since light irradiation for curing the sealing material 109 can be performed from the CF substrate 106 side, the sealing material 109 can be easily cured in the ODF method.

In addition, when a resin material is used as CF-BM in a conventional LCD, if this is present in the sealing material forming region, the adhesion of the sealing material is reduced, and reliability such as intrusion of moisture into the liquid crystal cell or liquid crystal leakage is thereby reduced. There is a risk of causing.
In the LCD 1 of the present embodiment, the CF-BM 107 that is the inter-pixel light-shielding layer formed on the inner surface of the CF substrate 106 is not formed in at least a part of the formation region of the sealing material 109. Even when a material is used, the adhesiveness of the sealing material 109 is improved.
Therefore, even when a resin material is used as CF-BM, moisture intrusion and liquid crystal leakage due to a decrease in the adhesion of the sealing material are suppressed, and reliability is improved.

In a conventional LCD, simply removing the CF-BM sealing material forming region causes a problem of light leakage from the peripheral frame region.
In the present embodiment, a part of the parallax barrier layer 108 formed on the outer surface on the viewing side of the liquid crystal cell 1A serves as an external light shielding layer that covers a region where the CF-BM 107 is not formed in the region where the sealing material 109 is formed. Therefore, light leakage from the peripheral frame area is suppressed.

As described above, in this embodiment, the CF-BM 107 that is the inter-pixel light shielding layer formed on the inner surface of the CF substrate 106 is not formed in at least a part of the formation region of the sealing material 109.
The CF-BM 107 may have one opening in the region where the sealant 109 is formed, may have a plurality of openings, or may have a mesh shape having a large number of openings.
In any case, the opening width of the CF-BM 107 in the region where the sealing material 109 is formed (the total opening width in the case of having a plurality of openings) is a range in which the sealing material 109 can be sufficiently cured by light irradiation from the CF substrate 106 side. If it is. If an uncured sealing material remains, the uncured sealing material may be mixed into the liquid crystal layer 105, which is not preferable.
Specifically, when the width of the sealing material 109 is 0.7 mm, the overlapping width of CF-BM 107 and the sealing material 109 (the total overlapping width in the case of having a plurality of openings) is preferably 150 μm or less. . With this overlapping width, the entire sealing material 109 can be cured well in a practical light irradiation processing time even for the sealing material 109 under the CF-BM 107 including the wrapping of irradiation light (normally UV light). Is possible.

  In this embodiment, the CF-BM 107 is formed outside the sealing material 109, but the CF-BM 107 is not formed outside the sealing material 109, and the sealing material 109 is controlled so that light leakage from the peripheral frame region is suppressed. An external light shielding layer that is also used as the parallax barrier layer 108 may be formed outside of the formation region.

  In this embodiment, light irradiation for curing the sealing material 109 can be performed from the CF substrate 106 side, so that an opening area for light irradiation for curing the sealing material 109 is secured on the TFT substrate 104 (wiring overlapping the sealing material). Etc.) is not required. Therefore, the degree of freedom in wiring design of the TFT substrate 104 is improved. Therefore, it becomes easy to design a narrow frame.

As described above, in the present embodiment, the CF-BM layer 107 that is the inter-pixel light-shielding layer is not formed in at least a part of the formation region of the sealing material 109, so that the sealing material 109 from the CF substrate 106 side is transferred to. Therefore, the production by the ODF method is easy.
Therefore, the LCD 1 of this embodiment can be manufactured using either the vacuum injection method or the ODF method.
Here, as explained in the section “Problems to be solved by the invention”, in the vacuum injection method, it is necessary to perform liquid crystal injection after thinning the CF substrate and forming the parallax barrier layer. A protective material such as glass is necessary. In the ODF method, the CF substrate is thinned and the parallax barrier layer is formed after the liquid crystal is injected, so that a protective material such as a protective glass at the time of liquid crystal injection is not necessary, and the cost can be reduced. Therefore, it is preferable to use the ODF method.

An example of a suitable manufacturing method will be described below.
Necessary elements such as electrodes are formed on the inner surfaces (surfaces on the liquid crystal layer 105 side) of the TFT substrate 104 and the CF substrate 106. At this time, the parallax barrier layer 108 is not formed.
Next, as shown in FIG. 5A, liquid crystal injection and substrate bonding by the ODF method are performed on the pair of substrates 104 and 106 before the parallax barrier layer 108 is formed. Thereafter, the CF substrate 106 is thinned by polishing or etching.
Next, as shown in FIG. 5B, a parallax barrier layer 108 is formed on the outer surface of the CF substrate 106.
FIG. 5A shows a curing process of the sealing material 109. In the drawing, “UV” indicates light (normally UV light) used for curing the sealing material 109.
The liquid crystal cell 1A is manufactured as described above.

In the above description, in order to simplify the description, “TFT substrate 104” and “CF substrate 106” are simply described. However, in actual manufacture, a plurality of liquid crystal cells are manufactured collectively using a pair of mother substrates. Things are done.
Specifically, a required element such as an electrode is formed on the inner surface (the surface on the liquid crystal layer side), and liquid crystal injection by ODF method and substrate pasting are performed on a pair of mother substrates on which the parallax barrier layer 108 is not formed. The mother CF substrate is thinned, the parallax barrier layer 108 is formed on the outer surface of the mother CF substrate, and then divided into individual liquid crystal cells 1A, whereby a plurality of liquid crystal cells 1A are manufactured collectively. The

  Viewing angle compensation films 103a and 103b and polarizers 102a and 102b are attached to liquid crystal cell 1A, and LCD 1 is manufactured.

As described above, according to the present embodiment, the light leakage from the peripheral frame region is suppressed, the adhesiveness of the sealing material 109 is good, the reliability is good, and the parallax barrier method that can be manufactured at low cost. An LCD 1 can be provided.
In the present embodiment, the LCD 1 can be manufactured at a low cost by using the ODF method.

In the first embodiment, the aspect in which the CF substrate 106 is the viewing-side substrate and the parallax barrier layer 108 is provided on the outer surface thereof has been described.
The TFT substrate 104 may be a viewing-side substrate, and the parallax barrier layer 108 may be provided on the outer surface thereof (the same applies to the second embodiment described later). In this case, liquid crystal injection and substrate bonding by the ODF method are performed on the pair of substrates 104 and 106 before the parallax barrier layer 108 is formed, the TFT substrate 104 is thinned, and the outer surface of the TFT substrate 104 If the parallax barrier layer 108 is formed on the substrate, it can be manufactured in the same manner as in the first embodiment.

“Second Embodiment”
A parallax barrier LCD according to a second embodiment of the present invention will be described.
The basic configuration of the present embodiment is the same as that of the first embodiment, and the same components are denoted by the same reference numerals and description thereof is omitted.
6A is a cross-sectional view of main parts corresponding to FIG. 4 of the first embodiment, and FIG. 6B is a plan view (perspective view) of main parts in the display area.

The liquid crystal cell 2A and the LCD 2 of the present embodiment are not provided with the CF-BM 107 of the first embodiment.
Instead, in this embodiment, the inside of the sealing material 109 shields light between adjacent pixels by the inter-pixel light-shielding layer 110 provided on the TFT substrate 104 and the parallax barrier layer 108 of the CF substrate 106.
Specifically, an inter-pixel light shielding layer 110 that shields light between pixels on the source wiring 112 side is formed on the TFT substrate 104 inside the sealing material 109. In addition, in the sealant 109, the parallax barrier layer 108 also serves as an inter-pixel light-shielding layer that shields light between the pixels on the gate wiring 111 side.
In addition, the formation region of the sealing material 109 without the inter-pixel light shielding layer 110 on the CF-BM 107 and the TFT substrate 104 and the vicinity thereof are shielded by providing a light shielding portion 108A on the parallax barrier layer 108.

In FIG. 6B, each symbol indicates the following component.
Reference numeral 111: gate wiring, reference numeral 112: source wiring, reference numeral 113: common wiring, reference numeral 114: pixel electrode, reference numeral 115: TFT.
In the drawing, the hatching of the parallax barrier layer 108 and the hatching of the layer below the hatching are overlapped to make the formation region of each layer easy to see.

In this embodiment, the inter-pixel light shielding layer 110 formed on the TFT substrate 104 is formed by a so-called shield Cs structure. The inter-pixel light-shielding layer 110 formed on the TFT substrate 104 branches a common wiring 113 arranged substantially in parallel with the gate wiring 111 and extends to a region partially under the source wiring 112 and the pixel electrode 114. It is a wiring branch.
In such a configuration, the inter-pixel light shielding layer 110 can be formed at the same time in the gate layer process for forming the gate wiring 111 and the common wiring 113, and the number of processes can be reduced as compared with the case where the inter-pixel light shielding layer 110 is separately formed. .
The inter-pixel light-shielding layer 110 may be provided independently from the common wiring 113 as long as the number of processes can be increased.

The liquid crystal cell 2A of the present embodiment may be manufactured using either the vacuum injection method or the ODF method, as in the first embodiment.
As in the first embodiment, in the ODF method, since the substrates are bonded after the liquid crystal is injected, it is preferable to use the ODF method because a protective glass or the like at the time of liquid crystal injection is not necessary and the cost can be reduced.
As in the first embodiment, the liquid crystal cell 2A of the present embodiment performs liquid crystal injection and substrate bonding by the ODF method on the pair of substrates 104 and 106 before forming the parallax barrier layer 108, and CF It can be manufactured by thinning the substrate 106 and then forming the parallax barrier layer 108 on the outer surface of the CF substrate 106.
In the above description, in order to simplify the description, the “TFT substrate 104” and the “CF substrate 106” are simply described as in the first embodiment. However, in actual manufacture, a plurality of mother substrates are used. The liquid crystal cell is manufactured in batch.

In an ordinary TFT-LCD, an alignment mark for substrate alignment is generally provided on the CF-BM in the substrate bonding step.
In this embodiment, since there is no CF-BM, it is necessary to form an alignment mark separately. For example, as shown in FIG. 6A, an opening 108M can be provided in the parallax barrier layer 108 to form an alignment mark.
Alternatively, as shown in FIG. 6C, what is a color material layer for color display on a CF (not shown) having red (R), green (G), and blue (B) color material layers provided on a CF substrate? It is conceivable that a color material portion 118M (red, green, or blue) is provided as an alignment mark.

According to the present embodiment, as in the first embodiment, the light leakage from the peripheral frame region is suppressed, the adhesiveness of the sealing material is good, the reliability is good, and the parallax barrier method that can be manufactured at low cost. An LCD 2 can be provided.
In the present embodiment, since the CF-BM formation step can be omitted, the number of steps can be reduced as compared with the first embodiment, and the manufacturing can be performed at a lower cost.

In this embodiment, since the inter-pixel light shielding is performed on the TFT substrate 104 side, the problem that the region that should originally be shielded is not shielded due to the accuracy of the overlapping position of the pair of substrates 104 and 106 is reduced.
More specifically, it is possible to prevent a portion that cannot be properly shielded from light on the CF substrate 106 due to the problem of the overlay position accuracy, and it is possible to prevent display quality from being deteriorated due to light leakage. In addition, since it is not necessary to increase the light shielding area more than necessary in order to suppress light leakage due to the positional deviation of the substrate, a larger pixel aperture ratio can be ensured.

In this embodiment, the inside of the sealing material 109 shields light between the pixels on the source wiring 112 side by the inter-pixel light shielding layer 110 provided on the TFT substrate 104, and between the pixels on the gate wiring 111 side by the parallax barrier layer 108 of the CF substrate 106. The mode of shielding the light has been described.
Inside the sealing material 109, the inter-pixel light shielding layer 110 provided on the TFT substrate 104 shields light between the pixels on the gate wiring 111 side, and the parallax barrier layer 108 of the CF substrate 106 shields light between the pixels on the source wiring 112 side. May be.
Inside the sealing material 109, the inter-pixel light-shielding layer 110 formed on the TFT substrate 104 shields light between the pixels on the gate wiring 111 side and between the pixels on the source wiring 112 side, and the parallax barrier layer 108 functions as an inter-pixel light-shielding layer. You may make it not have.
For example, in the case of a reflective type or a transflective type, a pixel that shields light between pixels on the gate wiring 111 side and / or between pixels on the source wiring 112 side using a reflective material such as a reflective plate or a reflective electrode. An intermediate light shielding layer can be formed.

“Third Embodiment”
A parallax barrier LCD according to a third embodiment of the present invention will be described.
The basic configuration of the LCD of the present embodiment is the same as that of the first embodiment, and the same components are denoted by the same reference numerals and description thereof is omitted.
FIG. 7 is a cross-sectional view of a main part corresponding to FIG. 4 of the first embodiment.

In the liquid crystal cell 3 </ b> A and the LCD 3 of the present embodiment, the inter-pixel light-shielding layer CF-BM 107 and the parallax barrier layer 108 are provided on the inner surface of the CF substrate 104. The parallax barrier layer 108 is provided on the viewing side of the CF-BM 107, and an insulating layer 116 is provided between the CF-BM 107 and the parallax barrier layer 108.
The CF-BM 107 and the parallax barrier layer 108 are not formed in at least a part of the formation region of the sealing material 109.
In the present embodiment, an external light shielding layer formed on the outer surface of the CF substrate 104 so as to cover a region where neither the inter-pixel light shielding layer CF-BM 107 nor the parallax barrier layer 108 is formed in the formation region of the sealing material 109. 117 is provided.

  In the example shown in the figure, the CF-BM 107 and the parallax barrier layer 108 are formed only inside the sealing material 109 and are not formed in the formation region of the sealing material 109 and outside thereof. The external light shielding layer 117 is formed on the sealing material 109 forming region and outside the sealing material 109.

The liquid crystal cell 3A of the present embodiment may be manufactured using either the vacuum injection method or the ODF method, as in the first embodiment.
In this embodiment, since the distance between the CF-BM 107 and the parallax barrier layer 108 is formed by the insulating layer 116, it is not particularly necessary to reduce the thickness of the substrate 106. When liquid crystal is injected by either the vacuum injection method or the ODF method, In addition, no protective glass or the like is required, and the cost can be reduced.
As in the first embodiment, the liquid crystal cell 3A of the present embodiment performs liquid crystal injection and substrate bonding by the ODF method on the pair of substrates 104 and 106 before forming the external light shielding layer 117, and thereafter It can be manufactured by forming the external light shielding layer 117 on the outer surface of the CF substrate 106.

The present invention is also applicable when a parallax barrier layer is provided inside a liquid crystal cell.
In the present embodiment, the CF-BM 107 and the parallax barrier layer 108 provided inside the liquid crystal cell 3A are not formed in at least a part of the formation region of the sealing material 109, and thus the same effects as in the first embodiment. Is obtained.
Also according to this embodiment, it is possible to provide the parallax barrier type LCD 3 in which light leakage from the peripheral frame region is suppressed, the adhesiveness of the sealing material 109 is good, and the reliability is good.
In this embodiment, since the parallax barrier layer 108 does not serve as an external light shielding layer, the cost is increased because the external light shielding layer 117 is separately formed. However, both the liquid crystal injection methods of the vacuum injection method and the ODF method are used. There is no need for protective glass or the like, and the cost can be reduced.

"Design changes"
The present invention is not limited to the above-described embodiment, and the design can be changed without departing from the spirit of the present invention.
In the above embodiment, the transmissive TFT-LCD of the vertical electric field driving method has been described as an example, but the present invention can be applied to any LCD.
The present invention can also be applied to a lateral electric field driving method.
The present invention can also be applied to a reflective type or a semi-transmissive / semi-reflective type.
The present invention is also applicable to an active matrix type using other pixel switching elements such as TFD.
The present invention is also applicable to a passive matrix type that does not use a pixel switching element.

1-3 Liquid crystal display (LCD)
1A to 3A liquid crystal cells 102a and 102b Polarizers 103a and 103b Viewing angle compensation film 104 TFT substrate (element substrate)
105 Liquid crystal layer 106 CF substrate (counter substrate)
107 CF-BM (inter-pixel shading layer)
107A Light-shielding portion 107B Pixel opening 108 Parallax barrier layer 108A Light-shielding portion 108B Opening 108M Alignment mark 109 Sealing material 110 Inter-pixel light-shielding layer 111 Gate wiring 112 Source wiring 113 Common wiring 114 Pixel electrode 115 TFT
116 Insulating layer 117 External light shielding layer 118M Alignment mark

Claims (6)

A pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween is provided with a liquid crystal cell attached via a sealing material that is cured by light irradiation,
The pair of substrates includes an element substrate including a plurality of switching elements and a plurality of pixel electrodes formed in a matrix, and a counter substrate disposed on the viewing side of the element substrate,
An inter-pixel light-shielding layer that shields between adjacent pixels is formed on the inner surface of the counter substrate on the liquid crystal layer side, and a parallax barrier layer having a light-shielding pattern different from the inter-pixel light-shielding layer is formed on the outer surface of the counter substrate. A liquid crystal display device,
The inter-pixel light shielding layer is not formed in at least a part of the formation region of the sealing material,
In the inter-pixel light-shielding layer disposed in the sealing material formation region, the width of the inter-pixel light-shielding layer overlapped with the seal material is sufficiently cured by light irradiation from the outer surface side of the counter substrate. An opening that is less than or equal to the width possible is formed,
The liquid crystal display device in which the parallax barrier layer also serves as an external light-shielding layer that covers the entire region where the inter-pixel light-shielding layer is not formed in the sealing material formation region. A pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween is provided with a liquid crystal cell attached via a sealing material that is cured by light irradiation,
The pair of substrates includes an element substrate including a plurality of switching elements and a plurality of pixel electrodes formed in a matrix, and a counter substrate disposed on the viewing side of the element substrate,
An inter-pixel light-shielding layer that shields between adjacent pixels is formed on the inner surface of the element substrate on the liquid crystal layer side, and a parallax barrier layer having a light-shielding pattern different from the inter-pixel light-shielding layer is formed on the outer surface of the counter substrate. A liquid crystal display device,
The inter-pixel light shielding layer is not formed in at least a part of the formation region of the sealing material,
In the inter-pixel light-shielding layer disposed in the sealing material formation region, the width of the inter-pixel light-shielding layer overlapped with the seal material is sufficiently cured by light irradiation from the outer surface side of the counter substrate. An opening that is less than or equal to the width possible is formed,
The liquid crystal display device in which the parallax barrier layer also serves as an external light-shielding layer that covers the entire region where the inter-pixel light-shielding layer is not formed in the sealing material formation region. A pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween is provided with a liquid crystal cell attached via a sealing material that is cured by light irradiation,
The pair of substrates includes an element substrate including a plurality of switching elements and a plurality of pixel electrodes formed in a matrix, and a counter substrate disposed on the viewing side of the element substrate,
A parallax barrier in which a part of an inter-pixel light-shielding layer that shields between adjacent pixels is formed on the inner surface of the element substrate on the liquid crystal layer side, and has a light-shielding pattern different from the inter-pixel light-shielding layer on the outer surface of the counter substrate A liquid crystal display device in which a layer is formed,
The inter-pixel light shielding layer is not formed in at least a part of the formation region of the sealing material,
In the inter-pixel light-shielding layer disposed in the sealing material formation region, the width of the inter-pixel light-shielding layer overlapped with the seal material is sufficiently cured by light irradiation from the outer surface side of the counter substrate. An opening that is less than or equal to the width possible is formed,
The parallax barrier layer also serves as an external light-shielding layer that covers the entire area where the inter-pixel light-shielding layer is not formed in the sealing material formation area,
A liquid crystal display device in which the parallax barrier layer also serves as a part of the inter-pixel light shielding layer. The switching element is a thin film transistor;
A part of the inter-pixel light-shielding layer formed on the element substrate shields light between pixels on the source wiring side,
The liquid crystal display device according to claim 3 , wherein a part of the parallax barrier layer also serving as the external light shielding layer shields light between pixels on a gate wiring side. Common wiring in which a part of the inter-pixel light-shielding layer formed on the element substrate branches from the common wiring arranged substantially in parallel with the gate wiring and extends to a region under the source wiring and partially covering the pixel electrode The liquid crystal display device according to claim 4 , wherein the liquid crystal display device is a branch. An alignment mark for positioning the pair of substrates is used for color display in an opening provided in the parallax barrier layer or a color filter formed on one of the pair of substrates. The liquid crystal display device according to claim 1 , which is a color material portion provided separately from the color material layer.

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