JP5770989B2 - 垂直面発光半導体素子 - Google Patents
垂直面発光半導体素子 Download PDFInfo
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- JP5770989B2 JP5770989B2 JP2010205649A JP2010205649A JP5770989B2 JP 5770989 B2 JP5770989 B2 JP 5770989B2 JP 2010205649 A JP2010205649 A JP 2010205649A JP 2010205649 A JP2010205649 A JP 2010205649A JP 5770989 B2 JP5770989 B2 JP 5770989B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/041—Optical pumping
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/14—Semiconductor lasers with special structural design for lasing in a specific polarisation mode
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
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- H—ELECTRICITY
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/18347—Mesa comprising active layer
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/1835—Non-circular mesa
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- H—ELECTRICITY
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- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18383—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with periodic active regions at nodes or maxima of light intensity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3407—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers characterised by special barrier layers
Description
ΣG N(厚さn)(屈折率n)
式中、層nは、量子井戸層、バリア層、および拡散層を含む。すなわち、利得構造16は、各層の厚さにその層の屈折率を掛けた積の合計であり、ポンプ波長とレーザ波長の整数倍でもある厚さを有する。
以下は、本開示の一実施形態による、まず半導体利得構造を形成し、次に完全な発光素子を形成するためのステップおよび条件の具体例である。この例によれば、全キャビティ長は、405nmポンプ波長で約14λ/2の長さを有するように選択され、これは、460nmレーザ波長での12λ/2の長さに対応する(レーザ波長は一般に460nm〜500nmの範囲である)。それによって、11の発光InGaN層およびPLAを、405nmのポンプ波長または460nmのレーザ波長を有する光の定在波パターンの波腹に配置された状態で組み込むことができる。
この具体例では、全キャビティ長が、460nmで10λ/2の長さを有するように選択される。それによって、20の発光InGaN層およびPLAを、460nmのレーザ波長を有する光の定在波パターンの波腹に配置された状態で組み込むことができる。
この例では、全キャビティ長が、460nmで6λ/2の長さを有するように選択される。それによって、DBR構造と半導体エアインターフェースの間に垂直導波路が形成される。
Claims (4)
- ポンプ光源と、
第1のヒートシンク(32a)と第2のヒートシンク(32b)とを備えたヒートシンク、及び分布非エピタキシャルブラッグ反射器構造を備える半導体利得構造と、
前記分布非エピタキシャルブラッグ反射器構造上に配置された利得構造であって、少なくとも窒化ガリウムを備え、前記利得構造には、それぞれが、0.0<y≦0.4のInyGa1−yNの上下層の間に配置された0.10≦x≦0.5のInxGa1−xNの量子井戸層を備える、前記利得構造の主ポンプ光吸収要素である複数の量子井戸構造が形成されており、前記量子井戸層が、単一、二重、および三重の量子井戸群の中から選択される群に配置されて、主光軸を有する利得構造サブキャビティの少なくとも一部を形成し、各量子井戸群が、前記半導体利得構造の軸に沿いかつ前記半導体利得構造内において、ポンプ波長とレーザ波長の定在波パターンの波腹の間の局所的オーバーラップによって決定される前記半導体利得構造の前記レーザ波長のビームの定在波パターンの前記波腹をオーバーラップする、前記利得構造と、
を備え、
前記第1のヒートシンク(32a)と前記第2のヒートシンク(32b)とは、前記半導体利得構造を挟むように、配置され、
前記半導体利得構造の一方の面が前記第1のヒートシンク(32a)に接しかつ前記半導体利得構造の他方の面が前記第2のヒートシンク(32b)に接し、
前記第1のヒートシンク(32a)及び前記第2のヒートシンク(32b)の各々には、前記第1のヒートシンク(32a)及び前記第2のヒートシンク(32b)を完全に貫通して延在する開口が形成されており、これによって、前記ポンプ光源によって発せられる光ビームが前記第1のヒートシンク(32a)の前記開口内を進み、前記半導体利得構造の主光軸に沿って前記利得構造サブキャビティの下端面に入射しかつ前記半導体利得構造からのレーザビーム(36)は前記第2のヒートシンク(32b)の前記開口内を進み外部に出る
ことを特徴とする、発光素子。 - さらに、前記利得構造サブキャビティによって発せられる光ビームが、前記主光軸に沿ったビーム路で、前記利得構造サブキャビティの上端面から前記利得構造サブキャビティを出る請求項1に記載の発光素子。
- 前記分布非エピタキシャルブラッグ反射器構造は、440nm〜550nmの波長の光に対して少なくとも99.9%の反射率を有し、370nm〜425nmの波長範囲の光に対して5%未満の反射率を有し、さらに、凹面出力結合反射鏡は、440nm〜550nmの光を少なくとも99.5%反射し、300nmより短い波長の光をより多く透過させる請求項2に記載の発光素子。
- 前記利得構造サブキャビティの上端面と前記凹面出力結合反射鏡の間の前記ビーム路に配置された周波数逓倍結晶構造をさらに含む請求項3に記載の発光素子。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/564,264 US8000371B2 (en) | 2009-09-22 | 2009-09-22 | Vertical surface emitting semiconductor device |
US12/564,264 | 2009-09-22 |
Publications (2)
Publication Number | Publication Date |
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JP2011071506A JP2011071506A (ja) | 2011-04-07 |
JP5770989B2 true JP5770989B2 (ja) | 2015-08-26 |
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JP2010205649A Expired - Fee Related JP5770989B2 (ja) | 2009-09-22 | 2010-09-14 | 垂直面発光半導体素子 |
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US (2) | US8000371B2 (ja) |
EP (1) | EP2299549B1 (ja) |
JP (1) | JP5770989B2 (ja) |
Families Citing this family (19)
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US8872217B2 (en) | 2011-04-15 | 2014-10-28 | Luminus Devices, Inc. | Electronic device contact structures |
CN103828071B (zh) * | 2011-06-28 | 2018-08-07 | 发光装置公司 | 用于增强性能的发光二极管结构 |
US9337615B2 (en) * | 2011-07-27 | 2016-05-10 | Ecole Polytechnique Federale De Lausanne (Epfl) | Vertical cavity surface emitting laser cavity with low thermal impedance |
WO2013123241A1 (en) | 2012-02-17 | 2013-08-22 | The Regents Of The University Of California | Method for the reuse of gallium nitride epitaxial substrates |
US9124062B2 (en) | 2012-03-22 | 2015-09-01 | Palo Alto Research Center Incorporated | Optically pumped surface emitting lasers incorporating high reflectivity/bandwidth limited reflector |
US9112331B2 (en) * | 2012-03-22 | 2015-08-18 | Palo Alto Research Center Incorporated | Surface emitting laser incorporating third reflector |
CN104247174B (zh) * | 2012-04-26 | 2018-02-16 | 皇家飞利浦有限公司 | 光学泵浦垂直外腔表面发射激光设备 |
US9112332B2 (en) | 2012-06-14 | 2015-08-18 | Palo Alto Research Center Incorporated | Electron beam pumped vertical cavity surface emitting laser |
US9136673B2 (en) | 2012-07-20 | 2015-09-15 | The Regents Of The University Of California | Structure and method for the fabrication of a gallium nitride vertical cavity surface emitting laser |
US9106053B2 (en) | 2012-10-15 | 2015-08-11 | Palo Alto Research Center Incorporated | Distributed feedback surface emitting laser |
WO2014175128A1 (ja) | 2013-04-23 | 2014-10-30 | 住友電気工業株式会社 | 半導体素子およびその製造方法 |
KR20140142040A (ko) * | 2013-06-03 | 2014-12-11 | 서울바이오시스 주식회사 | 기판 재생 방법 및 재생 기판 |
US9660417B2 (en) | 2014-01-31 | 2017-05-23 | Photodigm, Inc. | Light emitting device with extended mode-hop-free spectral tuning ranges and method of manufacture |
KR102163961B1 (ko) * | 2014-04-07 | 2020-10-12 | 엘지이노텍 주식회사 | 발광소자 및 조명시스템 |
WO2016134332A1 (en) * | 2015-02-20 | 2016-08-25 | Hrl Laboratories, Llc | Chip-scale power scalable ultraviolet optical source |
US10714893B2 (en) * | 2017-07-17 | 2020-07-14 | Thorlabs, Inc. | Mid-infrared vertical cavity laser |
US11532922B2 (en) * | 2017-10-02 | 2022-12-20 | The Regents Of The University Of California | III-nitride surface-emitting laser and method of fabrication |
US10868213B2 (en) * | 2018-06-26 | 2020-12-15 | Lumileds Llc | LED utilizing internal color conversion with light extraction enhancements |
JP2024018682A (ja) | 2022-07-29 | 2024-02-08 | 日亜化学工業株式会社 | 光源装置、及び半導体素子 |
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US6744800B1 (en) | 1998-12-30 | 2004-06-01 | Xerox Corporation | Method and structure for nitride based laser diode arrays on an insulating substrate |
JP2001085793A (ja) * | 1999-09-10 | 2001-03-30 | Fuji Photo Film Co Ltd | 半導体レーザ装置 |
JP2001148536A (ja) * | 1999-09-10 | 2001-05-29 | Fuji Photo Film Co Ltd | 半導体レーザ装置 |
US6562648B1 (en) | 2000-08-23 | 2003-05-13 | Xerox Corporation | Structure and method for separation and transfer of semiconductor thin films onto dissimilar substrate materials |
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JP2006173562A (ja) * | 2004-11-22 | 2006-06-29 | National Institute Of Information & Communication Technology | アンチモン系材料を用いた光通信波長用面発光レーザ素子及びその画像生成装置並びに情報中継装置 |
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KR101206035B1 (ko) * | 2006-11-14 | 2012-11-28 | 삼성전자주식회사 | 수직 외부 공동 면발광 레이저 |
-
2009
- 2009-09-22 US US12/564,264 patent/US8000371B2/en not_active Expired - Fee Related
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2010
- 2010-09-14 JP JP2010205649A patent/JP5770989B2/ja not_active Expired - Fee Related
- 2010-09-22 EP EP10178248.0A patent/EP2299549B1/en not_active Not-in-force
-
2011
- 2011-07-11 US US13/180,461 patent/US20110268143A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
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EP2299549B1 (en) | 2018-04-04 |
EP2299549A3 (en) | 2016-03-09 |
US20110069729A1 (en) | 2011-03-24 |
JP2011071506A (ja) | 2011-04-07 |
US20110268143A1 (en) | 2011-11-03 |
US8000371B2 (en) | 2011-08-16 |
EP2299549A2 (en) | 2011-03-23 |
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