JP5767359B2 - Manufacturing method of solar cell - Google Patents

Description

The present invention generally relates to solar cells. More specifically, it relates to the manufacturing process and structure of solar cells, but is not limited thereto.

A solar cell is a known device for converting solar radiation into electrical energy. Solar cells can be manufactured on a semiconductor wafer using semiconductor process technology. In general, solar cells can be manufactured by forming P-type and N-type diffusion regions in a silicon substrate. When solar irradiation light is applied to the solar cell, electrons and holes move to the diffusion region, thereby generating a voltage difference between the diffusion regions. Backside junction so
In the lar cell, the diffusion region and the metal contact finger (contact part, cont)
Both act fingers are on the back of the solar cell. The contact fingers couple the external electrical circuit to the solar cell and are powered by the solar cell.

Due to cost reasons, inkjet printing steps have been developed for use in back-end processes involving the formation of electrical connections between metal contact fingers and corresponding diffusion regions. More specifically, a contact mask that defines contact holes through which metal contact fingers can be electrically connected to the diffusion region can be formed by ink jet printing. However, this contact mask is typically
Critical alignment with other characteristic structures of the solar cell wafer (critical alignment)
Need. Such matching limits the process parameters of other steps in the backend process.

In one aspect, a contact mask for use in the manufacture of solar cells may include dots formed by ink jet printing. The dots can be formed in openings between dielectric layers (eg polyimide). A gap defining the contact area can be formed by the intersection of the superimposed dots (by overlapping the dots). The gap spacing can be determined by the alignment of the nozzles supplying the dots. Using the dots as a contact mask, the underlying dielectric layer can be etched to form a contact region that penetrates the underlying dielectric layer. Metal contact fingers can be formed on the wafer, thereby forming an electrical connection through the contact region to the corresponding diffusion region.

These and other features of the present invention will become apparent to those of ordinary skill in the art upon reading the entirety of this disclosure, including the accompanying drawings and claims.

1 schematically illustrates an exemplary inkjet printer that can be used in aspects of the present invention. 1 schematically illustrates one means of forming a contact mask on a wafer by ink jet printing. Consists of FIGS. It is sectional drawing which shows schematically the solar cell manufacturing process in the aspect of this invention. FIG. 6 is a top view showing a positional relationship between a gap and an adjacent dot according to an aspect of the present invention. FIG. 4 is a schematic top view illustrating a contact mask formed by multiple printing passes, in accordance with aspects of the present invention.

Where the same reference designation is used in different drawings, it indicates the same or similar component.

This disclosure sets forth numerous specific details, such as examples of apparatus, structures and methods, so that aspects of the invention may be better understood. However, it will be recognized by one skilled in the art that the present invention may be practiced without one or more specific details. In other instances, well-known details are not shown or described to avoid obscuring aspects of the invention.

FIG. 1 schematically illustrates an exemplary inkjet printer that can be used in aspects of the present invention. In the example of FIG. 1, the ink jet printer includes a print head 110 and a plurality of nozzles 112. The nozzles 112 may be arranged in rows and columns to form an array. The use of ink jet printers in semiconductor processes is generally well known. Briefly, material flows out through the nozzle 112 to the wafer 114. By passing the print head 110 over the wafer 114 one or more times, a pattern printed on the wafer 114 is obtained. In the following aspects, this pattern can be a mask for forming a metal contact region in a solar cell.

FIG. 2 schematically shows one method of forming the contact mask 200 on the wafer 114 by ink jet printing. In the example of FIG. 2, the contact mask 200 has a plurality of dots 201 that define an aperture 210. In order to simplify the illustration, in FIG. 2, all the dots 201 are not given reference numerals. The aperture 210 defines a region through which the metal contact is formed, and is formed by the absence of the dot 201. That is, the aperture 210 is formed by printing the dots 201 so that no dots are provided in the area of the aperture 210. By using an inkjet printer having a relatively high dot per inch (DPI), a dot diameter of about 100 μm, and a distance 202 between the centers of successive dots 201 of about 31.75 μm,
Aperture 210 can define a contact region having a diameter of about 30 μm. This mask 200 is satisfactory for most solar cell applications, but with an aperture 21.
It is relatively difficult to fabricate a window that limits the alignment of zero to other feature structures of the wafer 114. This is especially true when the aperture 210 is made smaller.

FIG. 3 comprises FIGS. 3A-3D and shows a cross-sectional view schematically illustrating a solar cell manufacturing process according to an embodiment of the present invention. The process of FIG. 3 relates to the formation of a contact mask for forming solar cell metal contact fingers. For the sake of simplicity, details of processes that are not necessary to understand the present invention have been omitted.

Referring to FIG. 3A, a solar cell includes a wafer 301 and a plurality of diffusion regions 303 and 30.
There are two types of substrates. The diffusion regions 303 and 302 can be formed in the wafer 301 or a layer overlaid thereon. In the example of FIG. 3, the diffusion region 303 includes a P-type diffusion region, and the diffusion region 302 includes an N-type diffusion region. There are several diffusion regions 303 and 302 in any given solar cell wafer according to aspects of the present invention. The solar cell of FIG. 3A is a back junction solar cell in which the diffusion regions 303 and 302 are on the back side opposite to the front side 304. The front surface 304 faces the sun during normal operation.

A dielectric layer 304 is formed on the diffusion region. In one aspect, the dielectric layer 304 includes silicon dioxide formed to a thickness of about 1000 to 6000 mm by atmospheric pressure chemical vapor deposition (APCVD). Layer 304 provides electrical isolation between the diffusion region and the overlying conductive layer, eg, subsequently formed metal contact fingers.

A dielectric layer 305 is formed on the dielectric layer 304, which advantageously prevents one polarity metal contact finger from being electrically shorted to another polarity diffusion region. In the example of FIG. 3, the layer 305 has a metal contact finger electrically connected to the N-type diffusion region 302 (that is, the N-type metal contact finger).
Against electrical short circuit. In one aspect, dielectric layer 305 comprises polyimide screen printed to a thickness of 5 microns. Dielectric layer 305 can also be formed using other deposition techniques.

However, the dielectric layer 305 is preferably screen printed to reduce cost. Cost reduction is particularly important in solar cell applications. In one aspect, the opening between layers 305 is about 200 μm.

In FIG. 3B, a plurality of dots 306 are inkjet printed on the wafer 301. As will be appreciated, the name dot 306 is given to indicate that it is formed by the discharge material passing through the nozzle. That is, the dots 306 are not necessarily circular. The dots 306 can be inkjet printed on the wafer 301 such that gaps 321 are formed between the dots 306. As will become clearer in the following description, the gap 321 defines a contact region through which the metal contact fingers can be electrically connected to the corresponding diffusion region. The dots 306 can be formed in a single pass of the print head on the wafer 301, thereby causing the layer 30.
A gap 321 formed in the opening between the five is obtained. The dots 306 forming the contact mask 400 of FIG. 4 may contain hot melt resin.

FIG. 4 shows a top view illustrating the positional relationship between gap 321 and adjacent dots 306 in accordance with aspects of the present invention. In the example of FIG. 4, the contact mask 400 includes a plurality of superimposed dots 306 that are inkjet printed so that a gap 321 is formed. The gap 321 is an area where the dots 306 are not printed. As shown in FIG. 4, each gap 321 may be formed by an intersection of a plurality of (for example, four) overlapping dots 306. Advantageously, the size and position of the gap 321 can be defined and determined by the physical alignment of the nozzle supplying the dots 306. For example, the dimension 401 between the centers of the dots 306 can be defined by the pitch of the inkjet nozzles.
Thus, the gap spacing is also determined by the physical alignment of the nozzles supplying the dots.

Contact mask 400 provides several advantages not previously realized. Since the accuracy of the spacing between dots 306 is determined by the physical alignment of the nozzles, a relatively low DPI inkjet printer can be used to define the plurality of gaps 321. For example, if the dot diameter is +/− 5 μm and about 100 μm, the distance 401 between the centers of the dots may have a length of 75 μm and each gap 321 may have a diameter of about 6 μm. Preferably, the size of each gap is such that the gap is aligned with the pinholes in layer 305 and thus the probability is as small as possible. For similar reasons, the gap 321 is preferably formed only in the opening between the layers 305.

Contact mask 400 is also “alignment free” in the sense that it can be printed on wafer 301 without critical alignment. The reason is the gap 32
1 does not have to be formed at a particular location between layers 305, i.e. gap 32
It is only necessary that 1 is formed between the layers 305. Further, in order to print the contact mask 400, the ink jet printer does not need to create a complicated pattern like the contact mask 200 of FIG. The contact mask 400 can be printed in one or more passes along a relatively straight path. In one aspect, the contact mask 400 is inkjet printed in one pass in one direction.

Continuing to FIG. 3C, a contact region 3 is removed through a portion of the layer 304 that is removed
In order to form 11, a contact mask 400 is used. In one aspect, contact region 311 is formed by etching layer 304 with an etchant that uses contact mask 400 as an etch mask and does not significantly etch layer 305. For example, layer 304 comprising silicon dioxide and layer 30 comprising polyimide.
5, the contact region 311 is exposed to an exposed portion of the layer 304 (ie, gap 32) by a buffered oxide etch (BOE) process using hydrofluoric acid as an etchant.
1 can be formed by wet etching. Layer 305 serves as an etch stop layer in such an etching process. Figure 3C shows the BOE
3B shows the sample of FIG. 3B after the process and subsequent removal of the contact mask 400. FIG. The contact mask 400 containing hot melt resin can be removed by a mask strip process using potassium hydroxide (KOH).

As shown in FIG. 3C, the contact mask 400 provided a plurality of contact regions 311 in the openings between the layers 305. The contact region 311 is a contact region 311
Since the size of the corresponding gap 321 used to define the is small, it is relatively small. Thus, a plurality of relatively small contact regions 311 can be obtained in which the metal contact fingers can form electrical connections with the corresponding diffusion regions. Contact area 3
The relatively small size of 11 (eg, 6 μm for the same size gap 321) allows the use of relatively small metal contact fingers, and thereby advantageously provides higher efficiency.

In FIG. 3D, metal contact fingers 312 and 313 are formed through the contact region 311. In one aspect, the metal contact fingers 312 and 313 include a stack of materials. The material includes a 1000 Å thick aluminum layer, the aluminum layer being formed on a 500 Å titanium-tungsten layer, the titanium-tungsten layer being formed on a 300 micron thick copper layer; The copper layer is formed on a tin layer having a thickness of 6 microns. Other metals and metal structures can be used without compromising the advantages of the present invention. In any given solar cell wafer according to aspects of the present invention, several metal contact fingers 312 and 313 are provided. In the example of FIG. 3D, the metal contact fingers 312 are formed in contact areas 311.
It is electrically connected to the P-type diffusion region 303 through the P-type metal contact finger. Similarly, the metal contact finger 313 is electrically connected to the N-type diffusion region 302 through the contact region 311 and is an N-type metal contact finger.
An external electrical circuit can be connected to the metal contact fingers, thereby receiving power from the solar cell.

The dots 306 shown in FIG. 4 can be printed in a single pass of the printhead on the wafer. Two or more passes over the wafer may be performed, for example covering a particular gap 321. In the example of FIG. 5, the first pass of the print head forms a contact mask 400 as shown in FIG. 4, and the second pass of the print head has a gap 321 (dot 3
Dots 306A are formed to be covered (under 06A).

An array of small contacts for novel solar cell manufacturing is disclosed. While particular embodiments of the present invention have been shown, it is to be understood that these embodiments are for purposes of illustration and are not intended to be limiting. Many additional aspects will become apparent to those of ordinary skill in the art upon reading this disclosure.

Claims (9)

Forming a first dielectric layer on a wafer to be processed into a solar cell;
Forming a plurality of second dielectric layers on the first dielectric layer;
A plurality of dots are inkjet printed in at least a plurality of openings between the plurality of second dielectric layers, and a plurality of gaps formed by intersections of the plurality of dots are formed in one pass in one direction by a print head. The gap size is at least (i) an alignment of a plurality of inkjet printer nozzles that supply the plurality of dots, (ii) a size of the plurality of dots, and (iii) which nozzle is used, It is determined by,
A method for manufacturing a solar cell , wherein a plurality of contact regions penetrating the first dielectric layer are formed using the plurality of dots as a mask .   The method of manufacturing a solar cell according to claim 1, wherein the plurality of second dielectric layers include polyimide screen-printed on the wafer. Removing the plurality of dots from the wafer;
A plurality of metal contact fingers are formed on the first dielectric layer, and a plurality of electrical connections are made with the plurality of diffusion regions provided below the first dielectric layer through the plurality of contact regions. The method for manufacturing a solar cell according to claim 1, further comprising: forming. A plurality of metal contact fingers formed to create a plurality of electrical connections with a plurality of corresponding N-type diffusion regions through at least some of the plurality of contact regions; A plurality of P-type metals formed to produce a plurality of electrical connections between a plurality of N-type metal contact fingers and a corresponding plurality of P-type diffusion regions through at least some of the plurality of contact regions Including contact fingers,
The plurality of P-type diffusion regions and the plurality of N-type diffusion regions are formed on a back surface of the wafer opposite to the front surface of the wafer facing the sun during normal operation. Solar cell manufacturing method.   The method for manufacturing a solar cell according to claim 4, wherein the plurality of N-type metal contact fingers are formed on the plurality of second dielectric layers, and the plurality of P-type metal contact fingers are not formed.   2. The method of manufacturing a solar cell according to claim 1, further comprising printing another dot that passes a print head over the wafer and covers one of the plurality of gaps in at least another pass. Forming a first dielectric layer on a solar cell wafer having a plurality of diffusion regions adjacent to each other;
Forming a plurality of second dielectric layers on the first dielectric layer on the boundary between the pair of adjacent diffusion regions;
A plurality of dots are printed in openings between at least two dielectric layers of the plurality of second dielectric layers, and the plurality of dots forms a contact mask that forms a plurality of gaps, and the plurality of gaps Each of which is defined by an intersection of a plurality of dots superimposed on the plurality of dots in a single pass in one direction by the printhead;
Etching a plurality of portions of the first dielectric layer exposed through the plurality of gaps to form a plurality of contact regions to expose the plurality of diffusion regions of the solar cell; The manufacturing method of a solar cell. Removing the plurality of dots from the wafer;
The method for manufacturing a solar cell according to claim 7, further comprising forming a plurality of metal contact fingers in the plurality of contact regions and electrically connecting to a corresponding one of the plurality of diffusion regions.   The method for manufacturing a solar cell according to claim 7, wherein the first dielectric layer includes silicon dioxide.

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