JP5765102B2 - Antenna structure of plasma processing equipment - Google Patents

Description

  The present invention relates to an antenna structure of a plasma processing apparatus that generates plasma in a vacuum chamber to generate a thin film on a surface to be processed or performs etching.

  Conventionally, plasma processing apparatuses (plasma CVD apparatuses) disclosed in Patent Documents 1 and 2 are known. These plasma processing apparatuses include a vacuum chamber having a processing chamber that can be depressurized in a vacuum state, and a plurality of connectors electrically connected to a high-frequency power source are disposed on the ceiling of the vacuum chamber. . An array antenna unit having a plurality of electrode rods is provided in the processing chamber, and the electrode rods of the array antenna unit are supported in a suspended manner in the processing chamber in a state of being connected to the plurality of connectors. .

  Then, the substrate transport carriage for holding the substrate to be processed is transported into the processing chamber whose pressure is reduced to a vacuum state, and the reaction gas is introduced into the vacuum chamber with the substrate facing the array antenna unit. While supplying, high-frequency power is supplied to the electrode rod. As a result, plasma is generated in a vacuum atmosphere, components of the reaction gas decomposed by the plasma adhere to the surface of the substrate, and a thin film such as an amorphous silicon film or a microcrystalline silicon film is generated on the substrate surface. It becomes.

JP 2007-262541 A JP 2003-109798 A

  In the conventional plasma processing apparatus, the power supply side electrode rod connected to the power supply side of the high frequency power source and the ground side electrode rod connected to the ground side are connected to each other by a connecting member so as to be energized. . At this time, one end of the connecting member must be attached to the tip of the power supply side electrode rod, and the other end must be attached to the tip of the ground side electrode rod. Particularly, in the plasma processing apparatus having a large number of electrode rods, The attaching work of the connecting member becomes complicated.

  An object of the present invention is to provide an antenna structure of a plasma processing apparatus that can improve the ease of attachment of a connecting member that connects a power supply side electrode bar and a ground side electrode bar so that energization is possible.

In order to solve the above problems, an antenna structure of a plasma processing apparatus of the present invention is an antenna structure of a plasma processing apparatus that generates plasma in a processing chamber provided in a vacuum chamber by supplying power from an AC power source. A power supply side electrode rod connected to the power supply side of the AC power source and supported by hanging down along the axis in the vertical direction in the processing chamber, and a power supply side electrode rod connected to the ground side of the AC power source and facing the power supply side electrode rod The main body is provided with a ground side electrode rod supported by the main body, a first entry portion into which the tip of the power supply side electrode rod can enter, and a second entry portion into which the tip of the ground side electrode rod can enter. With the tip of the electrode rod entering the first entry portion and the tip of the ground side electrode rod entered the second entry portion, a connecting member suspended near the tips of both electrode rods, A supply located inside and entering the first entry section A first contact portion that contacts the side electrode rod in an energizable manner, a second contact portion that is located inside the second entry portion and contacts the ground-side electrode rod that has entered the second entry portion in an energizable manner, and both A connecting member having a connecting portion for connecting the contact portion, and connecting the tip of the power supply side electrode rod into the first entry portion and the tip of the ground side electrode rod entering the second entry portion. When the member is suspended, the power supply side electrode rod and the first contact portion are pressed by the main body, and the ground side electrode rod and the second contact portion are pressed and contacted by the main body. The power supply side electrode bar and the ground side electrode bar are connected to each other through the connecting portion so as to be energized .

  In the antenna structure of the plasma processing apparatus of the present invention, the first contact portion and the second contact portion are arranged at the tips of the power supply side electrode rod that has entered the first entry portion and the ground side electrode rod that has entered the second entry portion. It is an elastic body that is biased to maintain a contact state.

  Further, the antenna structure of the plasma processing apparatus of the present invention is such that the first contact portion and the second contact portion are at the tips of the power supply side electrode rod that has entered the first entry portion and the ground side electrode rod that has entered the second entry portion. It is characterized by being configured as a spring to be compressed.

  In the antenna structure of the plasma processing apparatus of the present invention, the main body of the connecting member is provided with a first communication hole communicating with the first entry portion and a second communication hole communicating with the second entry portion. The connection part of the connection member is guided to the outside of the main body of the connection member through the first communication hole and the second communication hole.

  Further, in the antenna structure of the plasma processing apparatus of the present invention, the main body of the connecting member is constituted by a conductive member, and the first entry portion and the second entry portion are covered with the inner surfaces of both the entry portions so as to be a connection member. And a non-conductive covering member for maintaining the connecting member in a non-contact state.

  Further, the antenna structure of the plasma processing apparatus of the present invention includes a plurality of power supply side electrode bars and a plurality of ground side electrode bars, both electrode bars arranged in a straight line, and the connecting member includes a plurality of electrode bars. It has the 1st approach part and 2nd approach part corresponding to each, It is characterized by the above-mentioned.

  ADVANTAGE OF THE INVENTION According to this invention, the attachment ease of the connection member which connects an electric power feeding side electrode stick | rod and a ground side electrode stick | rod so that electricity supply is possible can be improved.

It is a perspective view which shows the front side of a vacuum chamber. It is a perspective view which shows the back side of a vacuum chamber. It is a figure which shows typically the cross section of the front side of a vacuum chamber. It is a perspective view of an array antenna unit. It is front sectional drawing of the vacuum chamber of the state by which the array antenna unit was hooked. It is a right view of the vacuum chamber in a state where the array antenna unit is hooked. 4A is a cross-sectional view taken along line VII (a) -VII (a) in FIG. 4, and FIG. 4B is a cross-sectional view taken along line VII (b) -VII (b) in FIG. It is a figure which shows the structure of a connection member. It is a figure which shows the state by which various components were provided in the connection member. It is a figure which shows a coating | coated member. It is a perspective view of a connection member. It is a figure which shows a ring member. It is a figure explaining the attachment process of a connection member.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The dimensions, materials, and other specific numerical values shown in the embodiments are merely examples for facilitating the understanding of the invention, and do not limit the present invention unless otherwise specified. In the present specification and drawings, elements having substantially the same function and configuration are denoted by the same reference numerals, and redundant description is omitted, and elements not directly related to the present invention are not illustrated. To do.

  The plasma processing apparatus of this embodiment can be used as a plasma CVD apparatus that generates a thin film on a processing target surface or a plasma etching apparatus that etches a processing target surface.

  First, the structure of the vacuum chamber of the plasma CVD apparatus according to this embodiment will be described with reference to FIGS. FIG. 1 is a perspective view showing the front side of the vacuum chamber, and FIG. 2 is a perspective view showing the back side of the vacuum chamber.

  As shown in FIGS. 1 and 2, the vacuum chamber 1 includes a housing 2. The housing 2 is arranged facing the ceiling 2a and the bottom 2b facing in the y direction in the figure, the right side 2c and the left side 2d facing in the x direction in the figure, and in the z direction in the figure. A front part 2e and a back part 2f. In the following description, the ceiling 2a side is defined as the upper or upper surface of the vacuum chamber 1, the right side 2c side is defined as the right or right side of the vacuum chamber 1, and the left side 2d side is defined as the left or left side of the vacuum chamber 1. .

  A front opening 3 and a rear opening 4 are formed in the front part 2e and the back part 2f, respectively. A front opening / closing door 5 and a rear opening / closing door 6 for opening and closing the front opening 3 and the rear opening 4 are respectively provided. Is provided. A right opening 7 is also formed in the right side surface 2c, and an open / close door 8 for opening and closing the right opening 7 is provided. Further, a left opening 9 is also formed on the left side surface 2d, and this left opening 9 can be connected to a transfer chamber (not shown). The left opening 9 is provided with a gate valve (not shown) that allows the vacuum chamber 1 and the transfer chamber to communicate with each other while maintaining a vacuum state or blocks the communication. Then, by closing the gate valve and closing the front opening / closing door 5, the rear opening / closing door 6 and the opening / closing door 8, a processing chamber 10 which is completely sealed from the outside is formed inside the housing 2. Become.

  The ceiling portion 2a is provided with three rows of connector groups 11a, 11b, and 11c. The connector groups 11a, 11b, and 11c are a plurality of connectors arranged in series along the x direction in the figure, and are provided with a predetermined interval maintained in the z direction in the figure.

  FIG. 3 is a diagram schematically showing a cross section of the front side of the vacuum chamber 1. As shown in this figure, the connector group 11 a includes a first ceiling-side connector 13 electrically connected to a supply side (non-grounded side) of a high-frequency power source 12 that supplies high-frequency power, and a ground side of the high-frequency power source 12. The second ceiling-side connectors 14 that are electrically connected are alternately provided while maintaining a predetermined interval. The connection portions of the first ceiling side connector 13 and the second ceiling side connector 14 are directed downward in the vertical direction (on the bottom surface portion 2b side), and electrode rods of an array antenna unit described later are directed upward from the lower side in the vertical direction. It is arranged so that it can be connected toward.

  Further, a gas supply source 15 is connected to the second ceiling side connector 14, and the material gas supplied from the gas supply source 15 is supplied from the electrode rod of the array antenna unit connected to the second ceiling side connector 14. It can be ejected into the processing chamber 10. Although the connector group 11a has been described here, the connector groups 11b and 11c have the same configuration as described above. Further, a vacuum pump 16 is connected to the ceiling portion 2a of the housing 2, and the vacuum pump 16 is driven in a state where the processing chamber 10 is sealed, whereby the inside of the vacuum chamber 1 can be decompressed to a vacuum state. Yes.

  Note that reference numeral 17 in the drawing functions as a guide when a transport carriage, which supports a substrate to be processed, is carried into the processing chamber 10 from the transport chamber or unloaded from the processing chamber 10 into the transport chamber. Guide rail. The guide rail 17 extends along the x direction in the figure from the right side surface 2c to the left side surface 2d on the bottom surface 2b of the housing 2.

  FIG. 4 is a perspective view of the array antenna unit 30. As shown in this figure, the array antenna unit 30 includes an antenna support member 31, and a plurality of inductively coupled electrodes 50 are supported on the antenna support member 31. The inductively coupled electrode 50 is an antenna element in which a first electrode bar 51 (power feeding side electrode bar) and a second electrode bar 52 (ground side electrode bar) are electrically connected by a connecting member 53 at the tip thereof. Yes, a plurality of antenna support members 31 are supported along the longitudinal direction. Specifically, the upper ends of the electrode rods 51 and 52 are supported by the antenna support member 31 in a state in which the electrode rods 51 and 52 are alternately arranged in series while maintaining a predetermined interval in a direction orthogonal to the axis. . Both electrode rods 51 and 52 are made of a conductive metal member, but the entire periphery except for the tip portion contacting the connection member 53 is coated with an insulating material.

  FIG. 5 is a front sectional view of the vacuum chamber 1 in a state where the array antenna unit 30 is hooked, and FIG. 6 is a right side view of the vacuum chamber 1 in a state where the array antenna unit 30 is hooked. . As shown in these drawings, the antenna support member 31 is hooked to the ceiling portion 2a of the vacuum chamber 1 by hooking means (not shown) such as a bolt. In a state where the array antenna unit 30 is hooked in the processing chamber 10 in this way, the first electrode rod 51 is connected to the first ceiling-side connector 13 provided on the ceiling portion 2a, and the second electrode rod 52 is The two electrode rods 51 and 52 are connected to the second ceiling-side connector 14, and are supported by the ceiling 2a in a suspended state with their axial centers aligned in the vertical direction. Hereinafter, the structure of the array antenna unit 30 will be described in detail.

  7A is a cross-sectional view taken along line VII (a) -VII (a) in FIG. 4, and FIG. 7B is a cross-sectional view taken along line VII (b) -VII (b) in FIG. As shown in these drawings, the antenna support member 31 is formed of a member having a U-shaped cross section, and its opening faces downward in the vertical direction. As is clear from FIG. 7B, the antenna support member 31 has an antenna support hole 32 formed at the center in the width direction. The antenna support hole 32 has a long hole shape formed along the longitudinal direction of the antenna support member 31, and the first electrode bar 51 and the second electrode bar 52 are alternately suspended in the antenna support hole 32. It is supported.

  More specifically, the first antenna-side connector 54 that can be connected to the first ceiling-side connector 13 provided on the ceiling 2 a of the vacuum chamber 1 is fixed to the upper end of the first electrode bar 51. A second antenna-side connector 55 that can be connected to the second ceiling-side connector 14 provided on the ceiling 2 a of the vacuum chamber 1 is fixed to the upper end of the second electrode rod 52.

  The first antenna-side connector 54 includes a cylindrical main body 54a, and is fixed to the bottom surface portion 54b of the main body 54a with the first electrode rod 51 penetrating therethrough. A flange portion 54c having a larger diameter than that of the main body 54a is provided on the opening side of the main body 54a. The flange portion 54 c maintains a dimensional relationship that has a larger diameter than the width of the antenna support hole 32 formed in the antenna support member 31. Therefore, when the first antenna-side connector 54 is inserted from above the antenna support hole 32, the main body 54a is inserted through the antenna support hole 32, and the flange portion 54c is brought into contact with the upper surface of the antenna support member 31 and is latched. As a result, the first electrode rod 51 is suspended and supported by the antenna support member 31.

  Although the first antenna side connector 54 has been described here, the configuration of the second antenna side connector 55 is the same as that of the first antenna side connector 54. That is, the second antenna-side connector 55 includes a main body 55a, a bottom surface portion 55b, and a flange portion 55c, and is fixed in a state where the second electrode rod 52 passes through the bottom surface portion 55b. The second electrode rod 52 is suspended and supported by the antenna support member 31 by the flange portion 55c being brought into contact with the upper surface of the antenna support member 31 and being hooked.

  As shown in FIG. 7A, each first electrode bar 51 includes an outer cylinder 56 made of a dielectric material such as ceramics or resin on the outer periphery thereof. On the other hand, each second electrode rod 52 has a cylindrical shape, and a gas supply path 52a extending along the axis is formed inside. Each second electrode rod 52 includes an ejection hole 52b that communicates perpendicularly to the gas supply path 52a. As described above, the second electrode rod 52 is connected to the second ceiling-side connector 14 when the array antenna unit 30 is hooked in the vacuum chamber 1, and the gas supply source 15 and the gas supply are connected to the second ceiling side connector 14. The road 52a communicates with each other. Accordingly, the material gas is supplied from the gas supply source 15 in a state where the array antenna unit 30 is hooked in the vacuum chamber 1 (processing chamber 10), so that the processing chamber 10 of the vacuum chamber 1 is supplied from the ejection holes 52b. The material gas will be spouted out.

  A cover member 33 having a U-shaped cross section that covers both antenna-side connectors 54 and 55 is fixed to the upper surface of the antenna support member 31. The cover member 33 is provided with a plurality of circular holes 33a that coincide with the main bodies 54a and 55a of the antenna-side connectors 54 and 55. As a result, the openings of the main bodies 54 a and 55 a of the antenna-side connectors 54 and 55, that is, the upper ends of the electrode bars 51 and 52 face upward through the holes 33 a of the cover member 33.

  FIG. 8 is a diagram illustrating the configuration of the connecting member 60. The connecting member 60 is for holding the connecting member 53 in a state in which the connecting member 53 is in contact with the tips of the electrode rods 51 and 52, and is a main body made of a rod-shaped member having a rectangular section made of stainless steel or the like. 61 is comprised. In the connecting member 60, a plurality of entry portions 62 (first entry portions or second entry portions) that open to the upper surface 61 a of the main body 61 are provided along the longitudinal direction of the main body 61 at equal intervals on a straight line. Yes.

  The entry portion 62 is configured by a circular concave portion that opens to the upper surface 61a of the main body 61, and includes an opening portion 62a that opens to the upper surface 61a and a deep portion 62b that has an inner diameter smaller than the opening portion 62a. . A stepped portion 62c is formed between the opening 62a and the deep portion 62b, and a surface located on the lower surface 61b side of the main body 61 among the surfaces defining the deep portion 62b is a bottom surface portion 62d. The lower surface 61 b of the main body 61 is provided with a communication hole 63 (a first communication hole, a second communication hole) that communicates with the bottom surface portion 62 d of the entry portion 62. It penetrates from the upper surface 61a side to the lower surface 61b side.

  FIG. 9 is a diagram illustrating a state in which various components are provided on the connecting member 60. As shown in this figure, the entrance portion 62 of the connecting member 60 is provided with a covering member 70, a ring member 71, and a connecting member 53. Below, each said component provided in the connection member 60 is demonstrated in detail.

  FIG. 10 is a view showing the covering member 70 provided in the entry portion 62 of the connecting member 60. The covering member 70 is constituted by a non-conductive main body 70a. The main body 70a has a cylindrical shape with one end opened and the other end closed by a bottom 70b, and an insertion hole 70c is provided in the bottom 70b. The diameter of the main body 70 a of the covering member 70 is slightly smaller than the inner diameter of the entry portion 62 of the connecting member 60, more specifically, the deep portion 62 b of the entry portion 62. As shown in FIG. 9, the covering member 70 is fitted in the entry portion 62 with the bottom portion 70b being in surface contact with the bottom surface portion 62d. At this time, the insertion hole 70c of the covering member 70 is connected to the connecting portion 70. It will be continuous with the communication hole 63 of the member 60.

  FIG. 11 is a perspective view of the connection member 53. The connection member 53 is a conductive member (aluminum in the present embodiment), and is formed by bending a single thin plate member as shown. Specifically, the connecting member 53 includes a pair of contact portions 53a (first contact portion and second contact portion) that are elastically deformed by compression by bending both ends of one thin plate member into a spring shape, and these And a connecting portion 53b for connecting the contact portions 53a at positions protruding in the elastic direction of the pair of contact portions 53a.

  As shown in FIG. 9, the connection member 53 has a pair of contact portions 53 a housed in the main body 70 a of the covering member 70. Further, the connecting portion 53 b is guided to the outside of the connecting member 60, that is, to the outside of the lower surface 61 b of the main body 61 through the insertion hole 70 c of the covering member 70 and the connecting hole 63 of the connecting member 60. At this time, since the contact part 53a of the connection member 53 is accommodated in the covering member 70, the contact part 53a and the main body 61 of the connecting member 60 are maintained in a non-contact state. Moreover, since the connection part 53b protrudes perpendicularly | vertically from the lower surface 61b of the connection member 60, this connection part 53b and the main body 61 of the connection member 60 are maintained in the non-contact state. Therefore, the connecting member 53 is maintained in a completely non-contact state with respect to the connecting member 60.

  FIG. 12 is a view showing the ring member 71. The ring member 71 is a non-conductive member constituted by a thin plate-shaped main body 71a. The inner diameter of the main body 71a is slightly larger than the diameters of the first electrode rod 51 and the second electrode rod 52 described above. A through hole 71b is formed. As shown in FIG. 9, the ring member 71 is configured to block the opening of the entry portion 62 while being placed on the stepped portion 62 c of the entry portion 62. It is responsible for preventing the entry of

  FIG. 13 is a diagram for explaining the attachment process of the connection member 53. The connecting member 53 is attached in a lump by suspending the connecting member 60 on the tip of each electrode rod 51, 52. When the connection member 60 is suspended, first, the array antenna unit 30 is hooked so that the electrode bars 51 and 52 hang down along the vertical direction. Then, as shown in FIG. 13A, the connecting member 60 in which the connecting member 53, the covering member 70, and the ring member 71 are unitized is positioned at the tip of each electrode rod 51, 52. Then, the connecting member 60 is moved vertically upward in a state where the tips of the electrode rods 51 and 52 face each entry portion 62.

  Then, each electrode rod 51 and 52 penetrates the through hole 71 b of the ring member 71 and enters the entry portion 62. At this time, each electrode rod 51, 52 compresses the contact portion 53a of the connection member 53 by its tip, and the entry into the entry portion 62 is stopped when each contact portion 53a is compressed to the maximum. In this way, by holding the connecting member 60 by the holding means (not shown) in a state where the connecting member 60 is suspended between the electrode bars 51 and 52, all the connecting members 53 are attached to the electrode bars 51 and 52. The connected state will be maintained. In addition, as a holding means for holding the connecting member 60 at the position shown in FIG. 13B, the antenna supporting member 31 and the connecting member 60 are sandwiched, and the antenna supporting member 31 and the connecting member 60 approach each other. A bolt may be fastened, or a biasing force may be applied from below to above so that the connecting member 60 does not fall off.

  As described above, according to the present embodiment, since all the connecting members 53 are attached together by holding the unitized connecting member 60 at the tips of the electrode rods 51 and 52, the connecting member The attachment work of 53 can be simplified and work efficiency can be improved. Further, since the connecting member 53 is pressed against the tips of the electrode rods 53 by the urging force, the electrode rods 51 and 52 can be reliably maintained in the connected state.

  In the above embodiment, the main body 61 of the connecting member 60 is formed of a conductive member. However, the main body 61 may be formed of a nonconductive member. In this case, the covering member 70 for insulating the connecting member 60 and the connecting member 53 can be eliminated. Moreover, in the said embodiment, although the entrance part 62 into which both the electrode bars 51 and 52 approach was made into the concave shape, it is good also as a hole shape which the both electrode bars 51 and 52 penetrate. In this case, for example, the contact portion 53a of the connection member 53 is formed in a coil shape through which both the electrode rods 51 and 52 are in contact, or a plate that is in contact with the peripheral surface of the both electrode rods 51 and 52. It may be formed in a spring shape. In any case, the shapes of the entry portion 62 and the connection member 53 are not limited to the above embodiment, and the design can be changed as appropriate. Therefore, in the said embodiment, although the connection member 53 was shape | molded by the sheet metal member of 1 sheet, you may comprise the contact part 53a and the connection part 53b by another member, for example.

  As mentioned above, although preferred embodiment of this invention was described referring an accompanying drawing, it cannot be overemphasized that this invention is not limited to this embodiment. It will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the claims, and these are naturally within the technical scope of the present invention. Is done.

  The present invention can be used in a plasma processing apparatus that generates plasma in a vacuum chamber to form a thin film on a surface to be processed or performs etching.

DESCRIPTION OF SYMBOLS 1 Vacuum chamber 10 Processing chamber 12 High frequency power supply 51 1st electrode rod 52 2nd electrode rod 53 Connection member 53a Contact part 53b Connection part 60 Connection member 61 Main body 62 Entrance part 63 Communication hole 70 Cover member

Claims (6)

An antenna structure of a plasma processing apparatus for generating plasma in a processing chamber provided in a vacuum chamber by supplying power from an AC power source,
A power supply side electrode rod connected to the power supply side of the AC power source and supported in a suspended manner along the vertical axis in the processing chamber;
A ground-side electrode rod connected to the ground side of the AC power source and supported in a suspended manner in the processing chamber opposite the power-feeding-side electrode rod;
The main body is provided with a first entry portion into which the tip of the power supply side electrode rod can enter and a second entry portion into which the tip of the ground side electrode rod can enter, and the tip of the power supply side electrode rod is connected to the first electrode. A connection member suspended near the tips of the two electrode rods in a state of entering the entry portion and having the tip of the ground-side electrode rod entered the second entry portion;
A first contact portion located inside the first entry portion and in contact with the power supply side electrode rod entering the first entry portion so as to be energized, and located within the second entry portion and the second entry portion A connection member having a second contact portion that contacts the ground-side electrode rod that has entered into the ground so that energization is possible, and a connection portion that connects the both contact portions;
Equipped with a,
When the connection member is suspended in a state where the tip of the power supply side electrode rod enters the first entry portion and the tip of the ground side electrode rod enters the second entry portion, The power supply side electrode rod and the first contact portion are in pressure contact, and the ground side electrode rod and the second contact portion are in pressure contact,
An antenna structure for a plasma processing apparatus, wherein the power supply side electrode bar and the ground side electrode bar are connected to each other through the first contact part and the second contact part so as to be energized by the connection part .   The first contact portion and the second contact portion maintain a contact state by urging the power supply side electrode rod that has entered the first entry portion and the tip of the ground side electrode rod that has entered the second entry portion. The antenna structure of the plasma processing apparatus according to claim 1, wherein the antenna structure is an elastic body. The first contact portion and the second contact portion are:
The spring according to claim 2, wherein the power supply side electrode rod that has entered the first entry portion and the ground side electrode rod that has entered the second entry portion are configured to be compressed into a spring shape. Antenna structure of plasma processing apparatus. In the main body of the connecting member,
A first communication hole communicating with the first entry portion;
A second communication hole communicating with the second entry portion,
The said connection part of the said connection member is guide | induced to the main body outer side of the said connection member via the said 1st communicating hole and the said 2nd communicating hole. The antenna structure of the plasma processing apparatus. The main body of the connecting member is constituted by a conductive member,
The first entry portion and the second entry portion are provided with non-conductive covering members that cover the inner surfaces of both the entry portions and maintain the connecting member and the connecting member in a non-contact state. The antenna structure of the plasma processing apparatus according to any one of claims 1 to 4. A plurality of the power supply side electrode rods and the ground side electrode rods are provided, respectively, and the both electrode rods are arranged in a straight line,
The antenna structure of the plasma processing apparatus according to claim 1, wherein the connecting member includes a first entry portion and a second entry portion corresponding to each of the plurality of electrode bars. .

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