JP5753148B2 - Method for culturing spheroids using cell culture carrier and cell culture carrier - Google Patents

Method for culturing spheroids using cell culture carrier and cell culture carrier Download PDF

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JP5753148B2
JP5753148B2 JP2012244030A JP2012244030A JP5753148B2 JP 5753148 B2 JP5753148 B2 JP 5753148B2 JP 2012244030 A JP2012244030 A JP 2012244030A JP 2012244030 A JP2012244030 A JP 2012244030A JP 5753148 B2 JP5753148 B2 JP 5753148B2
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松本 卓也
卓也 松本
奈緒子 小尾
奈緒子 小尾
英樹 村上
英樹 村上
正雄 河合
正雄 河合
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Nissha Printing Co Ltd
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本発明は、胚性幹細胞(ES細胞)等のスフェロイド(細胞塊)を培養する容器である細胞培養担体に関するものである。   The present invention relates to a cell culture carrier that is a container for culturing spheroids (cell mass) such as embryonic stem cells (ES cells).

ヒトを含む動物の組織細胞を三次元的に培養しスフェロイドを形成させる細胞培養担体として、従来、合成樹脂やガラス製のシャーレ、ウェルプレート等(以下従来型容器という)が使用されている。   Conventionally, synthetic resin, glass petri dishes, well plates, etc. (hereinafter referred to as conventional containers) have been used as cell culture carriers for three-dimensionally culturing animal cells including humans to form spheroids.

また、従来、下部材と上部材との2段構造で、下部材はセラミック製の多孔体を材料とし、細胞の培養部位である複数の凹部が配置された板状体であり、上部材は下部材の上面に載せられ、当該凹部に対応する位置に貫通穴を有する板状体である細胞培養担体(例えば、特許文献1参照)が提案されている。この細胞培養担体を以下改良型担体という。   Also, conventionally, the lower member and the upper member have a two-stage structure, and the lower member is a plate-like body made of a ceramic porous body, and a plurality of concave portions that are cell culture sites are arranged. A cell culture carrier (see, for example, Patent Document 1), which is a plate-like body placed on the upper surface of the lower member and having a through hole at a position corresponding to the recess, has been proposed. This cell culture carrier is hereinafter referred to as an improved carrier.

このような従来の細胞培養担体は以下のような問題点がある。
(1)従来型容器も改良型担体もスフェロイドは壁面に接着するので、スフェロイドの取出しに剥離処理が必要となる。改良型担体は2段構造になっていて、上部材を取外すことによりスフェロイド取出しを容易化する工夫はあるが、依然として剥離処理は必要である。
(2)改良型担体は下部材に多孔質材料を用いて、スフェロイドへの栄養と老廃物の出入りが出来るようになっている。その反面、多孔質材料は可視光不透明であり、顕微鏡による細胞培養担体内のスフェロイド成長の経過観察ができない。
(3)スフェロイド内を低酸素状態にすると、スフェロイドの長期保存に有効である。スフェロイド内を低酸素状態にするためには大きなスフェロイドが必要となるが、従来型容器や改良型担体で大きなスフェロイドまで培養するとスフェロイドは自重により球形が保てなくなる。
Such conventional cell culture carriers have the following problems.
(1) Since the spheroid adheres to the wall surface in both the conventional container and the improved carrier, a peeling process is required for taking out the spheroid. The improved carrier has a two-stage structure, and there is a device for facilitating spheroid removal by removing the upper member, but a peeling treatment is still necessary.
(2) The improved carrier uses a porous material for the lower member so that nutrients and waste products can enter and exit the spheroid. On the other hand, the porous material is opaque to visible light, and the progress of spheroid growth in the cell culture carrier cannot be observed with a microscope.
(3) When spheroids are hypoxic, they are effective for long-term storage of spheroids. Large spheroids are required to make the spheroids hypoxic. However, when spheroids are cultured in a conventional container or an improved carrier up to large spheroids, the spheroids cannot maintain a spherical shape due to their own weight.

特開2010−263868号公報JP 2010-263868 A

そこで本発明はスフェロイドの培養にあたり、スフェロイドが壁面に接着せず、スフェロイドへの代謝物の出入りが確保され、光学顕微鏡を使ってスフェロイドの観察が可能で、スフェロイドの球形保持を援助できる細胞培養担体を得ることを課題とする。また本発明はこのような細胞培養担体の製造方法を得ることを課題とする。   Therefore, the present invention is a cell culture carrier that, when spheroids are cultured, does not adhere to the wall surface, ensures that metabolites enter and exit the spheroids, can observe spheroids using an optical microscope, and can support spherical retention of spheroids It is a problem to obtain. Another object of the present invention is to obtain a method for producing such a cell culture carrier.

以下に課題を解決するための手段を述べる。理解を容易にするために、本発明の実施態様に対応する符号を付けて説明するが、本発明は当該実施態様に限定されるものではない。また、符号である数字は部品などを集合的に示す場合があり、後に説明する実施例において個別の部品などを示す場合に、当該数字のあとにアルファベットの添字を付けているものがある。   Means for solving the problems will be described below. For ease of understanding, description will be made with reference numerals corresponding to the embodiments of the present invention, but the present invention is not limited to the embodiments. A number as a symbol may indicate a part or the like collectively. When an individual part or the like is indicated in an embodiment described later, an alphabetic suffix may be added after the number.

本発明の一の態様にかかる細胞培養担体は、培養凹部を有する細胞培養担体において、
細胞培養担体(6)に複数の培養凹部(7)を設け、
前記培養凹部の底面から下方向に向かう個別流入路(21)、複数の前記個別流入路と導通する幹線流入路(22)、前記培養凹部の上面から横方向に向かう溢流路(24)を設け、前記複数の培養凹部は前記溢流路を介在して導通していて、
前記個別流入路はその断面の面積が19.5μm以上1970μm以下であり、
前記細胞培養担体は可視光透明であって、不透水の性質を有する。
The cell culture carrier according to one aspect of the present invention is a cell culture carrier having a culture recess,
The cell culture support (6) is provided with a plurality of culture recesses (7),
An individual inflow channel (21) directed downward from the bottom surface of the culture recess, a main channel inflow channel (22) communicating with the plurality of individual inflow channels, and an overflow channel (24) directed laterally from the upper surface of the culture recess. The plurality of culture recesses are conducted through the overflow channel,
The individual inflow channel has a cross-sectional area of 19.5 μm 2 or more and 1970 μm 2 or less,
The cell culture carrier is transparent to visible light and has an impermeable property.

本発明の好ましい実施態様にあって、前記培養凹部の上端面の形状が円であり、その直径(Dop)が50μm以上2000μm以下であってもよく、また、前記培養凹部の上端面の形状が円であり、その直径をDopとし、前記培養凹部についてその高さをHとしたとき、下式(1)を満たすものでもよい。
0.4Dop≦H≦0.6Dop 式(1)
In a preferred embodiment of the present invention, the shape of the upper end surface of the culture recess may be a circle, the diameter (Dop) thereof may be 50 μm or more and 2000 μm or less, and the shape of the upper end surface of the culture recess is It is a circle, and when the diameter is Dop and the height of the culture recess is H, the following equation (1) may be satisfied.
0.4Dop ≦ H ≦ 0.6Dop Equation (1)

本発明のその他の好ましい実施態様にあって、
前記細胞培養担体は、下層板の上に中層板を積層し、前記中層板の上に上層板を積層したものであって、
前記幹線流入路は前記下層板に形成され、
前記個別流入路は前記中層板に形成され、
前記培養凹部と前記溢流路は前記上層板に形成され、
前記下層板と前記上層板は原型の形状を転写して作成された合成樹脂板であり、
前記中層板は露光操作と現像操作によって所望の形状を作成したフォトレジスト膜であってもよい。
In another preferred embodiment of the present invention,
The cell culture carrier is obtained by laminating a middle layer plate on a lower layer plate, and laminating an upper layer plate on the middle layer plate,
The main line inflow passage is formed in the lower plate,
The individual inflow channel is formed in the middle layer plate,
The culture recess and the overflow channel are formed in the upper plate,
The lower layer plate and the upper layer plate are synthetic resin plates created by transferring the original shape,
The intermediate layer plate may be a photoresist film having a desired shape formed by an exposure operation and a development operation.

本発明の他の態様にかかる細胞培養装置は、本発明にかかる細胞培養担体とポンプからなり、
ポンプの送液出口である送液口と幹線流入路の入口である幹線流入路入口を接続し、前記溢流路の一部分を廃液口とし、
前記ポンプから培養液を前記培養凹部に送り、廃液口から廃棄する。
A cell culture device according to another aspect of the present invention comprises a cell culture carrier and a pump according to the present invention,
A liquid supply port that is a liquid supply outlet of the pump and a main line inflow channel inlet that is an inlet of the main line inflow channel are connected, and a part of the overflow channel is a waste liquid port,
The culture solution is sent from the pump to the culture recess and discarded from the waste solution port.

本発明のその他の態様にかかる細胞培養担体の製造方法は、
本発明にかかる細胞培養担体の製造方法であって、
下層板の上に中層板を積層し、前記中層板の上に上層板を積層して製造するものであって、
前記幹線流入路は前記下層板に形成され、
前記個別流入路は前記中層板に形成され、
前記培養凹部と前記溢流路は前記上層板に形成され、
前記下層板と前記上層板は原型の形状を転写して作成した合成樹脂板であり、
前記中層板はフォトレジストを膜状にしてフォトレジスト膜を形成し、前記フォトレジスト膜を露光して露光フォトレジスト膜を作成し、前記露光フォトレジスト膜を現像して所望の形状の前記中層板としたものである。
A method for producing a cell culture carrier according to another aspect of the present invention includes:
A method for producing a cell culture carrier according to the present invention, comprising:
The intermediate layer plate is laminated on the lower layer plate, and the upper layer plate is laminated on the intermediate layer plate,
The main line inflow passage is formed in the lower plate,
The individual inflow channel is formed in the middle layer plate,
The culture recess and the overflow channel are formed in the upper plate,
The lower layer plate and the upper layer plate are synthetic resin plates created by transferring the original shape,
The intermediate layer plate is formed into a photoresist film to form a photoresist film, the photoresist film is exposed to form an exposed photoresist film, and the exposed photoresist film is developed to form the intermediate layer plate having a desired shape. It is what.

以上説明した本発明、本発明の好ましい実施態様、これらに含まれる構成要素は可能な限り組み合わせて実施することができる。   The present invention described above, preferred embodiments of the present invention, and components included in these can be implemented in combination as much as possible.

本発明にかかる細胞培養担体は、その他の発明を特定する事項と共に、培養凹部、特定の個別流入路、特定の溢流路を有する可視光透明の細胞培養担体であるから、細胞培養期間中、個別流入路を通過して培養凹部に至り、溢流路から廃液される培養液を流すことができる。このような培養液流のもとでは、スフェロイドは培養凹部中で常に浮遊状態で存在し壁面に接着しない。よって細胞培養担体からスフェロイドの取出しが容易である。また、浮遊によりスフェロイドの球形保持が援助される。さらに培養凹部に培養液を常時流入と流出させることができ、しかも培養液流は一定方向に流れるのでスフェロイド代謝物の交換が容易である。   Since the cell culture carrier according to the present invention is a visible light transparent cell culture carrier having a culture recess, a specific individual inflow channel, and a specific overflow channel, along with other matters specifying the invention, The culture solution which passes through the individual inflow channel and reaches the culture recess and is drained from the overflow channel can be flowed. Under such a culture fluid flow, spheroids always exist in a floating state in the culture recess and do not adhere to the wall surface. Therefore, spheroids can be easily taken out from the cell culture carrier. Also, the floating helps the spheroids retain their spherical shape. Furthermore, since the culture solution can be always flowed into and out of the culture recess, and the culture solution flow flows in a certain direction, exchange of spheroid metabolites is easy.

本発明にかかる細胞培養装置は、本発明にかかる細胞培養担体と特定のポンプを含むので、培養液の送液がより一層容易化し、スフェロイド代謝物の交換がより一層容易となる利点を有する。   Since the cell culture device according to the present invention includes the cell culture carrier according to the present invention and a specific pump, there is an advantage that the feeding of the culture solution is further facilitated and the exchange of spheroid metabolites is further facilitated.

本発明にかかる細胞培養担体の製造方法は、その他の発明を特定する工程と共に、フォトレジストを成形、露光、現像して、個別流入路を含む中層板を製造する工程を含むので、微細な個別流路を形成する過程が容易かつ精度よく行えるという利点を有する。   The method for producing a cell culture carrier according to the present invention includes a step of producing a middle layer plate including individual inflow channels by molding, exposing and developing a photoresist together with the steps of specifying other inventions. There is an advantage that the process of forming the flow path can be easily and accurately performed.

図1は第一の細胞培養担体の透視図である。FIG. 1 is a perspective view of the first cell culture carrier. 図2は培養凹部列の断面図であり、図1中に切断面9で示す平面における断面図である。FIG. 2 is a cross-sectional view of the culture recess row, and is a cross-sectional view in a plane indicated by a cut surface 9 in FIG. 図3は第二の細胞培養担体の透視図である。FIG. 3 is a perspective view of the second cell culture carrier. 図4は細胞凹部列の断面図であり、図3中に切断面19で示す平面における断面図である。FIG. 4 is a cross-sectional view of the cell recess row, and is a cross-sectional view in a plane indicated by a cut surface 19 in FIG. 図5は第一の細胞培養担体の積層構成を示す断面図である。FIG. 5 is a cross-sectional view showing the laminated structure of the first cell culture carrier. 図6は中層板の加工工程を示した説明図である。FIG. 6 is an explanatory view showing a processing step of the intermediate layer plate. 図7は下層板の加工工程を示した説明図である。FIG. 7 is an explanatory view showing the processing steps of the lower layer plate.

以下、図面を参照して本発明の実施例にかかる細胞培養担体とその製造方法をさらに説明する。本明細書において参照する各図は、本発明の理解を容易にするため、一部の構成要素を誇張して表すなど模式的に表しているものがある。このため、構成要素間の寸法や比率などは実物と異なっている場合がある。また、本発明の実施例に記載した部材や部分の寸法、材質、形状、その相対位置などは、とくに特定的な記載のない限りは、この発明の範囲をそれらのみに限定する趣旨のものではなく、単なる説明例にすぎない。   Hereinafter, the cell culture carrier according to the embodiment of the present invention and the production method thereof will be further described with reference to the drawings. In the drawings referred to in this specification, in order to facilitate the understanding of the present invention, some of the components are schematically illustrated in an exaggerated manner. For this reason, the dimension, ratio, etc. between components may differ from a real thing. Further, the dimensions, materials, shapes, relative positions, etc. of the members and parts described in the embodiments of the present invention are not intended to limit the scope of the present invention to those unless otherwise specified. It is merely an illustrative example.

図1を参照して、第一の細胞培養担体6は形状が直方体であり、複数の第一の培養凹部7を有している。第一の細胞凹部7の形状は円柱形状であり、上述した直方体の上面に円柱形状の上面が開口している。3個の第一の培養凹部7が直列して培養凹部列8を構成している。   Referring to FIG. 1, the first cell culture carrier 6 has a rectangular parallelepiped shape and has a plurality of first culture recesses 7. The shape of the 1st cell recessed part 7 is a column shape, and the column-shaped upper surface is opening on the upper surface of the rectangular parallelepiped mentioned above. Three first culture recesses 7 form a culture recess array 8 in series.

培養凹部列8fは3個の第一の培養凹部7fl、7fm、7fnを含んでいる。同様に培養凹部列8gは3個の第一の培養凹部7gl、7gm、7gnを含んでいて、培養凹部列8hは、3個の第一の培養凹部7hl、7hm、7hnを含んでいる。   The culture recess row 8f includes three first culture recesses 7fl, 7fm, and 7fn. Similarly, the culture recess row 8g includes three first culture recess portions 7gl, 7gm, and 7gn, and the culture recess row 8h includes three first culture recess portions 7hl, 7hm, and 7hn.

各々の培養凹部7はその内底面から下方に向かう個別流入路21を有している。個別流入路21の下端は幹線流入路22と連絡している。幹線流入路22の一方端であって第一の細胞培養担体6の側壁開口部は、幹線流入路入口23である。   Each culture recess 7 has an individual inflow passage 21 that extends downward from the inner bottom surface thereof. The lower end of the individual inflow channel 21 communicates with the main inflow channel 22. A side wall opening of the first cell culture carrier 6 at one end of the main line inflow path 22 is a main line inflow path inlet 23.

第一の細胞培養担体6の上面に溝が刻まれ、当該溝が第一の培養凹部7の上端部で第一の培養凹部7の内側面と連絡している。かような溝が溢流路24である。   A groove is carved on the upper surface of the first cell culture carrier 6, and the groove communicates with the inner surface of the first culture recess 7 at the upper end of the first culture recess 7. Such a groove is the overflow channel 24.

図1と図2を参照して、本実施例においては単一の幹線流入路22に3個の個別流入路21が連絡し、3個の個別流入路21の上端は個々の第一の培養凹部7fl、7fm、7fnに通じている。第一の培養凹部7fnの上端部と第一の培養凹部7fmの上端部は水平方向に形成されている溝である溢流路24を介在して連絡している。第一の培養凹部7fmの上端部と第一の培養凹部7flの上端部は溢流路24を介在して連絡している。第一の培養凹部7flの上端部は溢流路24を介在して廃液口25と導通している。   With reference to FIG. 1 and FIG. 2, in this embodiment, three individual inflow channels 21 communicate with a single main inflow channel 22, and the upper ends of the three individual inflow channels 21 are the individual first cultures. It leads to the recesses 7fl, 7fm, and 7fn. The upper end of the first culture recess 7fn and the upper end of the first culture recess 7fm communicate with each other via an overflow channel 24 that is a groove formed in the horizontal direction. The upper end of the first culture recess 7fm and the upper end of the first culture recess 7fl communicate with each other via an overflow channel 24. The upper end of the first culture recess 7fl is electrically connected to the waste liquid port 25 through the overflow channel 24.

培養凹部列は、幹線流入路入口23と廃液口25を共通とする複数の培養凹部の単位である。単一の細胞培養担体中に含まれる培養凹部列の数は特に制限は無く、単一でも複数でもよい。培養凹部列の数を複数にすれば、個々の培養凹部で培養液の流れが均一化する利点がある。   The culture recess array is a unit of a plurality of culture recesses that share the main line inlet passage 23 and the waste liquid outlet 25. The number of culture recess rows included in a single cell culture carrier is not particularly limited, and may be single or plural. If the number of the culture recess rows is plural, there is an advantage that the flow of the culture solution becomes uniform in each culture recess.

通常、幹線流入路入口23にポンプ3の送液口を接続する。ポンプ3から培養液を送液する。ポンプ3は例えばシリンジポンプ、ペリスターポンプ等が好適に使用できる。   Usually, the liquid feeding port of the pump 3 is connected to the main line inflow passage inlet 23. The culture solution is sent from the pump 3. For example, a syringe pump or a peristaltic pump can be suitably used as the pump 3.

ポンプ3から送液される液体は、個別流入路21を通過して第一の培養凹部7に進入する。個別流入路21は第一の培養凹部7の底面に開口しているから、ポンプ3からの送液は第一の培養凹部7に底面から上向きに流れ込む。この上向きの流れが第一の培養凹部7中のスフェロイドを浮遊状態とする力となる。スフェロイドが浮遊状態で培養されるとスフェロイドが培養凹部7の底面や内側面に接着しない。また、スフェロイドを球形に維持する力が働き、自重によりスフェロイドの球形が崩れなくなる。   The liquid fed from the pump 3 passes through the individual inflow path 21 and enters the first culture recess 7. Since the individual inflow path 21 is open to the bottom surface of the first culture recess 7, the liquid feed from the pump 3 flows into the first culture recess 7 upward from the bottom surface. This upward flow becomes a force that causes the spheroid in the first culture recess 7 to float. When spheroids are cultured in a floating state, the spheroids do not adhere to the bottom surface or inner surface of the culture recess 7. Moreover, the force which maintains a spheroid in a spherical shape works, and the spherical shape of a spheroid does not collapse by its own weight.

スフェロイドを効率よく浮遊させるために個別流入路は底面の中心に開口していることが望ましい。後に詳述する第二の細胞培養担体にあっても個別流入路は半球形状である第二の培養凹部の底面先端部に開口していることが好ましい。   In order to float the spheroid efficiently, it is desirable that the individual inflow channel is opened at the center of the bottom surface. Even in the second cell culture carrier described in detail later, it is preferable that the individual inflow channel is opened at the bottom end of the second culture recess having a hemispherical shape.

第一の細胞培養担体6にあって第一の培養凹部7は円柱形状であるが、本発明にあって培養凹部の形状は円柱形状に限られない。培養凹部の形状は、例えば、半球形状、半楕円球形状、多角錐形状である。これらの中で、円柱形状、半球形状が好ましい。円柱形状、半球形状であれば、スフェロイドがより一層浮遊し易い。さらに半球形状であれば、培養液の流れが良くなる。   In the first cell culture carrier 6, the first culture recess 7 has a cylindrical shape, but in the present invention, the shape of the culture recess is not limited to a cylindrical shape. The shape of the culture recess is, for example, a hemispherical shape, a semi-elliptical sphere shape, or a polygonal pyramid shape. Among these, a cylindrical shape and a hemispherical shape are preferable. If it is a cylindrical shape or a hemispherical shape, spheroids are more likely to float. Furthermore, if it is hemispherical, the flow of the culture solution is improved.

図3は半球形状の第二の培養凹部を有する第二の細胞培養担体の透視図であり、図4は培養凹部列の断面図であり、図3中に切断面19で示す平面における断面図である。第二の細胞培養担体16と第一の細胞培養担体6は培養凹部の形状が異なるのみで、その他の構成は同一である。以下、第二の細胞培養担体16を簡単に説明する。   FIG. 3 is a perspective view of a second cell culture carrier having a hemispherical second culture recess, FIG. 4 is a cross-sectional view of the culture recess array, and a cross-sectional view in a plane indicated by a cut surface 19 in FIG. It is. The second cell culture carrier 16 and the first cell culture carrier 6 are the same except for the shape of the culture recess. Hereinafter, the second cell culture carrier 16 will be briefly described.

図3を参照して、第二の細胞培養担体16は形状が直方体であり、複数の第二の培養凹部17を有している。細胞凹部17の形状は半球形状であり、上述した直方体の上面に半球形状の上面が開口している。3個の第二の培養凹部17が直列して培養凹部列18を構成している。   Referring to FIG. 3, the second cell culture carrier 16 has a rectangular parallelepiped shape and has a plurality of second culture recesses 17. The shape of the cell recess 17 is a hemispherical shape, and the upper surface of the hemispherical shape is opened on the upper surface of the rectangular parallelepiped described above. Three second culture recesses 17 form a culture recess array 18 in series.

培養凹部列18fは3個の第二の培養凹部17fl、17fm、17fnを含んでいる。同様に培養凹部列18gは3個の第二の培養凹部17gl、17gm、17gnを含んでいて、培養凹部列18hは、3個の第二の培養凹部17hl、17hm、17hnを含んでいる。   The culture recess row 18f includes three second culture recesses 17fl, 17fm, and 17fn. Similarly, the culture recess row 18g includes three second culture recess portions 17gl, 17gm, and 17gn, and the culture recess row 18h includes three second culture recess portions 17hl, 17hm, and 17hn.

各々の第二の培養凹部17はその内底面から下方に向かう個別流入路21を有している。個別流入路21の下端は幹線流入路22と連絡している。幹線流入路22の一方端であって第二の細胞培養担体16の側壁開口部は、幹線流入路入口23である。   Each second culture recess 17 has an individual inflow passage 21 that extends downward from the inner bottom surface thereof. The lower end of the individual inflow channel 21 communicates with the main inflow channel 22. A side wall opening of the second cell culture carrier 16 at one end of the main line inflow path 22 is a main line inflow path inlet 23.

第二の細胞培養担体16の上面に溝が刻まれ、当該溝が培養凹部17の上端部で培養凹部17の内側面と連絡している。かような溝が溢流路24である。   A groove is carved on the upper surface of the second cell culture carrier 16, and the groove communicates with the inner surface of the culture recess 17 at the upper end of the culture recess 17. Such a groove is the overflow channel 24.

図3と図4を参照して、本実施例においては単一の幹線流入路22に3個の個別流入路21が連絡し、3個の個別流入路21の上端は個々の第二の培養凹部17fl、17fm、17fnに通じている。第二の培養凹部17fnの上端部と第二の培養凹部17fmの上端部は水平方向に形成されている溝である溢流路24を介在して連絡している。第二の培養凹部17fmの上端部と第二の培養凹部17flの上端部は溢流路24を介在して連絡している。第二の培養凹部17flの上端部は溢流路24を介在して廃液口25と導通している。   3 and 4, in this embodiment, three individual inflow channels 21 are connected to a single main inflow channel 22, and the upper ends of the three individual inflow channels 21 are the individual second cultures. It leads to the recesses 17fl, 17fm, and 17fn. The upper end of the second culture recess 17fn and the upper end of the second culture recess 17fm communicate with each other via an overflow channel 24 that is a groove formed in the horizontal direction. The upper end portion of the second culture recess portion 17fm and the upper end portion of the second culture recess portion 17fl are in communication with each other via an overflow channel 24. The upper end of the second culture recess 17fl is electrically connected to the waste liquid port 25 through the overflow channel 24.

通常、幹線流入路入口23にポンプ3の送液口を接続する。ポンプ3から送液される液体は、個別流入路21を通過して第二の培養凹部17に進入する。個別流入路21は第二の培養凹部17の底面に開口しているから、ポンプ3からの送液は第二の培養凹部17に底面から上向きに流れ込む。   Usually, the liquid feeding port of the pump 3 is connected to the main line inflow passage inlet 23. The liquid fed from the pump 3 passes through the individual inflow path 21 and enters the second culture recess 17. Since the individual inflow path 21 is opened at the bottom surface of the second culture recess 17, the liquid feed from the pump 3 flows into the second culture recess 17 upward from the bottom surface.

以下に、第一の細胞培養担体6と第二の細胞培養担体16の共通事項を説明する。   Below, the common matter of the 1st cell culture carrier 6 and the 2nd cell culture carrier 16 is demonstrated.

個別流入路21の断面の面積は19.5μm以上1970μm以下であることが好ましい。個別流入路を断面真円に形成した場合、上記断面積は直径5μm〜50μmの真円に相当する。この断面面積はスフェロイドを形成する細胞(特に未分化胚性幹細胞)の断面面積と同等であり、個別流入路の断面積をこの範囲にすれば、培養細胞が個別流入路を通過して幹線流入路に入り込むことがないからである。断面形状が真円であることが好ましいが、断面面積が上記範囲にある断面真円の円柱穴の加工は容易でない。このため、その断面形状が真円に近似する形状であればよく、また、断面の形状は楕円形、四角形、多角形等であってもよい。 The area of the cross section of the individual inflow passage 21 is preferably 19.5 μm 2 or more and 1970 μm 2 or less. When the individual inflow channel is formed in a perfect circle, the cross-sectional area corresponds to a true circle having a diameter of 5 μm to 50 μm. This cross-sectional area is equivalent to the cross-sectional area of cells that form spheroids (especially undifferentiated embryonic stem cells). If the cross-sectional area of the individual inflow channel is within this range, the cultured cells pass through the individual inflow channel and flow into the main line. It is because it does not enter the road. Although the cross-sectional shape is preferably a perfect circle, it is not easy to process a cylindrical hole with a perfect cross-section whose cross-sectional area is in the above range. Therefore, the cross-sectional shape may be a shape that approximates a perfect circle, and the cross-sectional shape may be an ellipse, a quadrangle, a polygon, or the like.

第一の細胞培養担体における第一の培養凹部7は円柱形状であり、上端面は円形である。第二の細胞培養担体における第二の培養凹部17は半球形状であり、上端面は円形である。円形状である培養凹部上端面の直径をDopとする。培養凹部7、17の高さをHとする。第一の培養凹部7にあって高さHは上端面と底面の距離である。第二の培養凹部17にあって高さHは上端面と下側に在る頂点との距離である。   The first culture recess 7 in the first cell culture carrier has a cylindrical shape, and the upper end surface is circular. The second culture recess 17 in the second cell culture carrier has a hemispherical shape, and the upper end surface is circular. The diameter of the upper end surface of the circular culture recess is defined as Dop. Let H be the height of the culture recesses 7 and 17. In the first culture recess 7, the height H is the distance between the upper end surface and the bottom surface. In the second culture recess 17, the height H is the distance between the upper end surface and the apex located on the lower side.

Dopの長さに特に制限はない。好ましいDopの長さは50μm以上2000μm以下であり、特に好ましくは50μm以上100μm以下である。この範囲は一般的なスフェロイドの直径と同等であり、単一の培養凹部中に単一のスフェロイドを培養するにふさわしい寸法だからである。   There is no particular limitation on the length of the Dop. The preferred Dop length is 50 μm or more and 2000 μm or less, and particularly preferably 50 μm or more and 100 μm or less. This range is equivalent to the diameter of a general spheroid and is a size suitable for culturing a single spheroid in a single culture recess.

DopとHの比率に特に制限はない。好ましいのは式(1)を満たす比率である。
0.4Dop≦H≦0.6Dop 式(1)
この比率範囲にあれば凹部である培養凹部の加工が容易だからである。
There is no particular limitation on the ratio of Dop and H. A ratio satisfying the formula (1) is preferable.
0.4Dop ≦ H ≦ 0.6Dop Equation (1)
This is because, if the ratio is within this range, the processing of the culture recess, which is a recess, is easy.

細胞培養担体6、16は可視光透明である。光学顕微鏡を用いる培養細胞の観察に資するためである。細胞培養担体6、16は、通常、PDMS(ポリジメチルシロキサン)、フォトレジスト等の合成樹脂で作られる。このような材料である合成樹脂は不透水の性質を有する。   The cell culture carriers 6 and 16 are transparent to visible light. This is to contribute to the observation of cultured cells using an optical microscope. The cell culture carriers 6 and 16 are usually made of a synthetic resin such as PDMS (polydimethylsiloxane) or a photoresist. The synthetic resin which is such a material has a water-impermeable property.

続いて細胞培養担体の一の好ましい製造方法を説明する。細胞培養担体は下層板51、中層板52と上層板53をこの順序に積み重ねて作られる。図5に下層板51と中層板52の境界面を破線で示している。同様に中層板52と上層板53の境界面を破線で示している。下層板51は上面に溝がある。中層板52の下面が当該溝を覆って幹線流入路22を成している。すなわち、幹線流入路22は下層板51に形成されている。   Subsequently, one preferable production method of the cell culture carrier will be described. The cell culture carrier is made by stacking the lower layer plate 51, the middle layer plate 52 and the upper layer plate 53 in this order. In FIG. 5, the boundary surface between the lower layer plate 51 and the middle layer plate 52 is indicated by a broken line. Similarly, the boundary surface between the middle layer plate 52 and the upper layer plate 53 is indicated by a broken line. The lower plate 51 has a groove on the upper surface. The lower surface of the middle layer plate 52 covers the groove and forms the main line inflow passage 22. That is, the main line inflow passage 22 is formed in the lower layer plate 51.

中層板52は貫通穴を有している。当該貫通穴は下層板51に在る幹線流入路22と導通している。また当該貫通穴は上層板に在る培養凹部7と導通している。当該貫通穴は個別流入路21である。すなわち、個別流入路21は中層板52に形成されている。   The middle layer plate 52 has a through hole. The through hole is electrically connected to the main line inflow path 22 in the lower layer plate 51. Further, the through hole is electrically connected to the culture recess 7 in the upper layer plate. The through hole is an individual inflow passage 21. That is, the individual inflow passage 21 is formed in the middle layer plate 52.

上層板53は貫通穴を有している。中層板52の上面が当該貫通穴の下端開放面を覆って培養凹部7を成している。すなわち、培養凹部7は上層板53に形成されている。また、溢流路24も上層板53に形成されている。   The upper layer plate 53 has a through hole. The upper surface of the middle layer plate 52 covers the bottom open surface of the through hole to form the culture recess 7. That is, the culture recess 7 is formed in the upper layer plate 53. An overflow channel 24 is also formed in the upper layer plate 53.

図6は中層板52の製造方法を示している。(1)に示すようにシリコンウェア等の台61上にフォトレジストの薄層62を形成する。薄層62は種々のコート法で作成すればよい。好ましいコート法はスピンコート法である。薄層62の表面の平滑性に優れるからである。(2)に示すようにフォトマスク63越しにフォトレジストの薄層62を露光し、部分的に硬化させる。(3)に示すように、現像を行う。現像はフォトレジストの薄層62の不必要部分を取り除く作業である。台61とフォトレジストの薄層62を分離して、(4)に示すように中層板52を得る。   FIG. 6 shows a method for manufacturing the middle layer plate 52. As shown in (1), a thin layer 62 of photoresist is formed on a base 61 such as siliconware. The thin layer 62 may be formed by various coating methods. A preferred coating method is a spin coating method. This is because the smoothness of the surface of the thin layer 62 is excellent. As shown in (2), a thin layer 62 of photoresist is exposed through a photomask 63 and partially cured. Develop as shown in (3). Development is the removal of unnecessary portions of the thin layer 62 of photoresist. The base 61 and the thin photoresist layer 62 are separated to obtain the middle layer plate 52 as shown in (4).

中層板52の厚さ、すなわちフォトレジストの薄層62の厚さは、20μm以上200μm以下の範囲が好ましい。この範囲にすれば、中層板52としての強度が得られると共に、均一厚さ、かつ表面が平滑な薄層成膜が可能だからである。   The thickness of the intermediate layer 52, that is, the thickness of the thin layer 62 of photoresist is preferably in the range of 20 μm to 200 μm. This is because within this range, the strength as the intermediate layer plate 52 can be obtained, and a thin layer can be formed with a uniform thickness and a smooth surface.

フォトエッチングにより中層板を製造すれば、直径5μm〜50μmの範囲の貫通穴を容易に作成することができる。   If the intermediate layer plate is manufactured by photoetching, a through hole having a diameter in the range of 5 μm to 50 μm can be easily formed.

図7はフォトレジスト型を転写して作成する下層板51の製造方法を示している。(1)に示すようにシリコンウェア等の台61の上にフォトレジストの薄層62を形成する。(2)に示すようにフォトマスク63越しにフォトレジストの薄層62を露光し、部分的に硬化させる。(3)に示すように現像を行い、フォトレジスト型64を作成する。   FIG. 7 shows a manufacturing method of the lower layer plate 51 formed by transferring a photoresist mold. As shown in (1), a thin layer 62 of photoresist is formed on a base 61 such as siliconware. As shown in (2), a thin layer 62 of photoresist is exposed through a photomask 63 and partially cured. Development is performed as shown in (3) to form a photoresist mold 64.

(4)に示すようにフォトレジスト型64に流動状態のPDMS65を流し込み、加熱硬化させる。これによりフォトレジスト型64の形状をPDMS65に転写する。PDMS65をフォトレジスト型64から分離して(5)に示すように下層板51を得る。   As shown in (4), PDMS 65 in a fluidized state is poured into the photoresist mold 64 and cured by heating. Thereby, the shape of the photoresist mold 64 is transferred to the PDMS 65. The PDMS 65 is separated from the photoresist mold 64 to obtain the lower layer plate 51 as shown in (5).

下層板51の厚さは特に制限はない。幹線流入路を形成する溝の深さは10μm〜50μm程度であり、当該溝を掘ることができる厚さであればよい。   The thickness of the lower layer plate 51 is not particularly limited. The depth of the groove forming the main line inflow channel is about 10 μm to 50 μm, and may be any thickness as long as the groove can be dug.

第一の細胞培養担体における上層板53は下層板51と同様にフォトレジスト型を作成し、これを転写して作成することができる。第二の細胞培養担体における上層板53は形状に曲面を含むので、金型を作成しこれを転写して作成すればよい。   The upper layer plate 53 in the first cell culture carrier can be formed by creating a photoresist mold in the same manner as the lower layer plate 51 and transferring it. Since the upper layer plate 53 in the second cell culture carrier includes a curved surface, it may be prepared by creating a mold and transferring it.

また第一の細胞培養担体の下層板、第二の細胞培養担体の下層板は共に金型を作成しこれを転写して作成してもよい。   Further, the lower layer plate of the first cell culture carrier and the lower layer plate of the second cell culture carrier may be prepared by preparing a mold and transferring it.

以上本発明にかかる実施の形態について図面を参照して詳述してきたが、具体的な構成例はこの実施の形態に限られるものではなく、本発明の要旨を逸脱しない範囲の設計変更などがあっても本発明に含まれる。   Although the embodiment according to the present invention has been described in detail with reference to the drawings, a specific configuration example is not limited to this embodiment, and design changes and the like within a scope not departing from the gist of the present invention are possible. Even if it exists, it is included in this invention.

3 ポンプ
6 第一の細胞培養担体
7 第一の培養凹部
8 培養凹部列
9 切断面
16 第二の細胞培養担体
17 第二の培養凹部
18 培養凹部列
19 切断面
21 個別流入路
22 幹線流入路
23 幹線流入路入口
24 溢流路
25 廃液口
51 下層板
52 中層板
53 上層板
61 台
62 薄層状のフォトレジスト
63 フォトマスク
64 フォトレジスト型
65 PDMS
H 培養凹部の高さ
Dop 円形状である培養凹部上端面の直径
3 pump 6 first cell culture carrier 7 first culture recess 8 culture recess array 9 cut surface 16 second cell culture support 17 second culture recess 18 culture recess array 19 cut surface 21 individual inflow path 22 trunk inflow path 23 Main line inlet passage 24 Overflow passage 25 Waste liquid port 51 Lower layer plate 52 Middle layer 53 Upper layer plate 61 unit 62 Thin layered photoresist 63 Photomask 64 Photoresist type 65 PDMS
H Height of the culture recess Dop Diameter of the top surface of the culture recess that is circular

Claims (2)

細胞培養担体を用いて行うスフェロイド(細胞塊)の培養方法において、
前記細胞培養担体は、
細胞培養担体に複数の培養凹部を設け、
前記培養凹部の底面から下方向に向かう個別流入路、複数の前記個別流入路と導通する幹線流入路、前記培養凹部の上面から横方向に向かう溢流路を設け、前記複数の培養凹部は前記溢流路を介在して導通していて、
前記個別流入路はその断面の面積が19.5μm以上1970μm以下であり、
前記細胞培養担体は可視光透明であって、不透水の性質を有するものであって、
スフェロイドを前記培養凹部に入れ、
スフェロイド培養期間中、培養液を一方向である前記幹線流入路、前記個別流入路と前記培養凹部を順に通過して前記溢流路に至る方向に流すことを特徴とする細胞培養担体を用いて行うスフェロイドの培養方法。
In the method for culturing spheroids (cell mass) performed using a cell culture carrier,
The cell culture carrier is
The cell culture carrier is provided with a plurality of culture recesses,
An individual inflow channel that extends downward from the bottom surface of the culture recess, a main channel inflow channel that communicates with the plurality of individual inflow channels, and an overflow channel that extends in a lateral direction from the top surface of the culture recess, Conducting through an overflow channel,
The individual inflow channel has a cross-sectional area of 19.5 μm 2 or more and 1970 μm 2 or less,
The cell culture carrier is transparent to visible light and has water-impermeable properties ,
Put the spheroid in the culture recess,
Using a cell culture carrier characterized in that, during a spheroid culture period, a culture solution is passed through the trunk inflow channel, the individual inflow channel, and the culture recess in one direction in order to flow to the overflow channel A spheroid culture method to be performed.
培養凹部を有する細胞培養担体において、
細胞培養担体に複数の培養凹部を設け、
前記培養凹部の底面から下方向に向かう個別流入路、複数の前記個別流入路と導通する幹線流入路、前記培養凹部の上面から横方向に向かう溢流路を設け、前記複数の培養凹部は前記溢流路を介在して導通していて、
前記個別流入路はその断面の面積が19.5μm以上1970μm以下であり、
前記細胞培養担体は可視光透明であって、不透水の性質を有するものであって、
前記培養凹部にスフェロイド(細胞塊)を入れたスフェロイド培養期間中、培養液を一方向である前記幹線流入路、前記個別流入路と前記培養凹部を順に通過して前記溢流路に至る方向に流すものである細胞培養担体。
In a cell culture carrier having a culture recess,
The cell culture carrier is provided with a plurality of culture recesses,
An individual inflow channel that extends downward from the bottom surface of the culture recess, a main channel inflow channel that communicates with the plurality of individual inflow channels, and an overflow channel that extends in a lateral direction from the top surface of the culture recess, Conducting through an overflow channel,
The individual inflow channel has a cross-sectional area of 19.5 μm 2 or more and 1970 μm 2 or less,
The cell culture carrier is transparent to visible light and has water-impermeable properties,
During the spheroid culture period in which the spheroid (cell mass) is put in the culture recess, the culture solution passes through the trunk inflow channel, the individual inflow channel, and the culture recess in order in one direction to reach the overflow channel. A cell culture carrier that flows .
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