JP5752210B2 - Substrate processing equipment - Google Patents

Description

  The present invention relates to a substrate processing apparatus for processing a substrate. Examples of substrates to be processed include semiconductor wafers, liquid crystal display substrates, plasma display substrates, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, and photomasks. Substrate etc. are included.

  In a manufacturing process of a semiconductor device or a liquid crystal display device, a substrate processing apparatus for processing a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display device is used. A single-wafer type substrate processing apparatus that processes substrates one by one includes, for example, a plurality of substrate processing units for processing substrates, and a plurality of fluid boxes each containing fluid equipment such as piping and valves. ing.

  The substrate processing unit is provided with a spin chuck that holds and rotates the substrate horizontally, and a processing liquid nozzle that supplies a processing liquid to the substrate held by the spin chuck. The substrate is processed by supplying the processing liquid from the processing liquid nozzle to the substrate while rotating the substrate by the spin chuck.

  The fluid box houses a plurality of fluid devices such as a pipe for supplying the processing liquid to the processing liquid nozzle and a valve interposed in the pipe. A pipe extending from the fluid box is connected to the processing liquid nozzle, and the processing liquid from the processing liquid supply source is supplied to the processing liquid nozzle via this pipe.

JP 2007-266554 A

  Some substrate processing apparatuses as described above are provided with a plurality of flow paths to one substrate processing unit. Each flow path is configured by a plurality of fluid devices such as a pipe for supplying the processing liquid to the processing liquid nozzle and a valve interposed in the pipe. The fluid equipment installed in each flow path includes open / close valves, flow control valves, flow meters, mixing valves for mixing processing liquids, etc. Is appropriately selected depending on the supply method. For example, a flow rate adjusting valve and a flow meter are installed in the flow path for precisely controlling the supply flow rate of the processing liquid to the substrate. A mixing valve is installed in a flow path for mixing a plurality of types of processing liquids in a pipe and supplying the mixed processing liquid to the substrate.

  In a conventional substrate processing apparatus, the configuration of a fluid device to be installed in each flow path is determined according to the specifications of the substrate processing apparatus such as a method of supplying a processing liquid to the substrate, and a plurality of pipes corresponding to one substrate processing unit and The fluid equipment was housed in one fluid box. For this reason, the number of fluid devices accommodated in the fluid box and the length of the piping may be different for each substrate processing apparatus, and the layout of the piping in the fluid box may be different for each substrate processing apparatus. In some cases, a layout in which the middle part of the piping is routed up and down in the fluid box may be employed, and piping in different flow paths may be close to each other in the fluid box.

  In addition, pipes with different flow paths may be close to each other in the fluid box, so pipes with different systems (pipes through which processing liquids with different properties such as temperature and type circulate) are close to each other in the fluid box. was there. However, for example, when pipes through which processing liquids having different temperatures circulate are close to each other, the processing liquids flowing through the pipes are affected by each other and the temperature may change. Therefore, there is a possibility that the processing liquid having a desired temperature cannot be supplied to the substrate. Moreover, when the piping through which the acidic processing liquid flows and the piping through which the alkaline processing liquid flows are close to each other, for example, the processing liquid that permeates the piping and moves to the outside may come into contact with each other.

  Furthermore, in the conventional substrate processing apparatus, the flow path length to the substrate processing section and the routing of the pipes in the fluid box may differ for each flow path, so that the processing liquid having the same property is fed into each flow path. Even so, there may be a difference in the processing quality of the substrate between the flow paths. Specifically, if the flow path length to the substrate processing unit is different, even if the processing liquid of the same temperature is sent to each flow path, the temperature drop of the processing liquid that occurs during the flow through the piping will flow. Since it is different for each path, a processing liquid having a different temperature for each path is supplied to the substrate. Therefore, even if the processing liquid having the same property is fed into each flow path, there may be a difference in the processing quality of the substrate.

  More specifically, for example, even if each substrate is processed using a processing liquid having the same properties in a substrate processing apparatus having the same specifications, if the flow path length to the substrate processing unit is different, the same processing quality May not be able to get. A user of a substrate processing apparatus normally expects that the same processing quality can be obtained by processing a substrate using a processing liquid of the same property in a substrate processing apparatus of the same specification, but in a conventional substrate processing apparatus, In some cases, the result is contrary to the user's expectation.

  The present invention has been made under such a background, and it is an object of the present invention to provide a substrate processing apparatus capable of suppressing or preventing variation in flow path length to the substrate processing unit.

In order to achieve the above object, the invention described in claim 1 includes: a plurality of substrate processing units that process a substrate with a processing liquid; and a plurality of processing liquid supply units that supply the processing liquid to the plurality of substrate processing units. The plurality of processing liquid supply units include a plurality of fluid boxes that correspond one-to-one with the plurality of substrate processing units, and the plurality of substrate processing units and the plurality of fluid boxes. Is a plurality of pairs, and each substrate processing unit processes a substrate with a processing liquid in a processing chamber partitioned by a partition wall, and is adjacent to a pair of fluid boxes. The supply unit includes a plurality of processing liquid supply modules housed in the fluid box for supplying a processing liquid to a pair of substrate processing units, and each processing liquid supply module includes a tray that is unified in a predetermined size, Treatment liquid attached to the tray And a substrate processing that is unified to a predetermined size, and the positions of one end and the other end of the processing liquid supply piping with respect to the tray are unified among the plurality of processing liquid supply modules. Device.

  According to the present invention, each processing liquid supply pipe has its one end position relative to the tray (the processing liquid inlet position) unified among the plurality of processing liquid supply modules, and the other end position relative to the tray (the processing liquid position). The position of the outlet of the processing liquid is unified among the plurality of processing liquid supply modules. That is, in the plurality of processing liquid supply modules, the connection positions of the pipe for supplying the processing liquid to the processing liquid supply module and the pipe for receiving the processing liquid from the processing liquid supply module are unified at predetermined positions. Yes. In this way, the length of the processing liquid supply pipe extending from one end to the other end is restricted by unifying the positions of one end and the other end of the processing liquid supply pipe with respect to the tray to a predetermined position and restricting the arrangement of the processing liquid supply pipe. The length can be made substantially equal among the plurality of processing liquid supply modules. Thereby, the property of the processing liquid supplied from the processing liquid supply module to the substrate processing unit can be made uniform.

  As in the second aspect of the present invention, the pair of substrate processing units and the fluid box may be arranged adjacent to each other in the horizontal direction. The plurality of substrate processing units and the plurality of fluid boxes may include a plurality of pairs of substrate processing units and fluid boxes arranged side by side.

  According to a third aspect of the present invention, the plurality of substrate processing units and the plurality of fluid boxes may include a plurality of pairs of substrate processing units and fluid boxes that are disposed horizontally apart.

The upper end of each fluid box is disposed at a height equal to or substantially equal to the upper end of the partition wall of the corresponding substrate processing unit, and the lower end of each fluid box is the corresponding substrate. You may arrange | position to the height equal to or substantially equal to the lower end of the partition of a process part.

  As in the fifth aspect of the present invention, in each of the processing liquid supply units, the plurality of processing liquid supply modules may be stacked in the fluid box.

  As in the sixth aspect of the present invention, the processing liquid supply pipe may be arranged along the tray.

  According to this invention, the pipes of the respective treatment liquid supply modules are arranged along the corresponding trays, and the arrangement of the pipes is unified in a planar arrangement. Therefore, it is possible to suppress or prevent variations in the piping length among the plurality of processing liquid supply modules, and it is possible to suppress or prevent variations in the flow path length leading to the substrate processing unit.

  As in the invention according to claim 7, the tray has one surface arranged along the processing liquid supply pipe and the other surface opposite to the one surface. Also good. The plurality of trays may be stacked in the fluid box so that the one surface and the other surface face each other. The treatment liquid supply pipe may be disposed between any two of the plurality of trays accommodated in the common fluid box.

  According to the present invention, the piping provided in each processing liquid supply module can be separated from the other piping by partitioning the piping provided in each processing liquid supply module and the other piping by the tray. Therefore, for example, even when two processing liquid supply modules through which processing liquids having different temperatures circulate are adjacent to each other, the pipes of these processing liquid supply modules are isolated by trays to suppress changes in the temperature of the processing liquid. Or it can be prevented. Even when the treatment liquid supply module through which the acidic treatment liquid circulates and the treatment liquid supply module through which the alkaline treatment liquid circulates, the piping of these treatment liquid supply modules is isolated by a tray, It can suppress or prevent that the process liquid and an alkaline process liquid contact.

  As in the invention described in claim 8, each processing liquid supply unit mixes the processing liquid supplied from two or more of the processing liquid supply modules among the plurality of processing liquid supply modules. A mixing valve for supplying the mixed processing liquid to the corresponding substrate processing unit may be further included.

  According to a ninth aspect of the present invention, the substrate processing apparatus may further include a drainage tank into which the processing liquid supplied to the substrate by the plurality of substrate processing units is guided. The drainage tank may be accommodated in the fluid box.

  According to a tenth aspect of the present invention, the substrate processing apparatus is disposed in a circulation pipe for supplying a processing liquid to the plurality of processing liquid supply units, and in the fluid box, and in the processing liquid supply pipe. A cleaning liquid pipe for supplying piping cleaning liquid to the processing liquid supply pipe, and a flow path for supplying the processing liquid from the circulation pipe or the pipe cleaning liquid from the cleaning liquid pipe to the processing liquid supply pipe And a switching means for switching between.

  According to this invention, the flow path is switched by the switching means, the processing liquid from the processing liquid pipe is supplied to the pipe provided in the processing liquid supply module, or the pipe cleaning liquid is supplied from the cleaning liquid pipe. it can. Accordingly, the processing liquid can be supplied to the substrate processing unit via the processing liquid supply module, or the inside of the pipe can be washed away with the pipe cleaning liquid from the cleaning liquid pipe to clean the pipe.

  Further, by providing switching means to enable switching of the flow path, for example, even when the processing liquid piping is connected to a plurality of processing liquid supply modules, only a part of the processing liquid supply modules can supply the processing liquid. And the supply of the processing liquid to other processing liquid supply modules can be continued. Then, the piping of the processing liquid supply module for which the supply of the processing liquid is stopped can be cleaned with the pipe cleaning liquid while the supply of the processing liquid to the other processing liquid supply module is continued.

According to an eleventh aspect of the present invention, the plurality of processing liquid supply modules may include at least a processing liquid supply module having a processing liquid supply function and a processing liquid supply module having a flow rate adjustment function. .
As in a twelfth aspect of the invention, the length of the processing liquid supply pipe extending from one end of the processing liquid supply pipe to the other end of the processing liquid supply pipe is approximately equal among the plurality of processing liquid supply modules. May be.

1 is a schematic plan view showing a layout of a substrate processing apparatus according to an embodiment of the present invention. It is a schematic diagram which shows schematic structure of a processing unit and a fluid box. It is a schematic diagram of the process liquid supply part for demonstrating a some process liquid supply module. It is a typical top view which shows an example of a structure of a process liquid supply module. It is a schematic diagram of the process liquid supply part which concerns on other embodiment of this invention. It is a typical top view which shows an example of a structure of the process liquid supply module which concerns on further another embodiment of this invention.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

  FIG. 1 is a schematic plan view showing a layout of a substrate processing apparatus 1 according to an embodiment of the present invention. The substrate processing apparatus 1 is a single wafer processing apparatus that processes substrates W such as semiconductor wafers one by one. The substrate processing apparatus 1 includes an indexer block 2 and a processing block 3 coupled to the indexer block 2.

  The indexer block 2 includes a carrier holding unit 4, an indexer robot IR, and an indexer robot moving mechanism 5 (hereinafter referred to as “IR moving mechanism 5”). The carrier holding unit 4 can hold a carrier C that can accommodate a plurality of substrates W. The carriers C are held by the carrier holding unit 4 in a state of being arranged along a predetermined carrier arrangement direction U. The IR moving mechanism 5 can horizontally move the indexer robot IR along the carrier arrangement direction U. The indexer robot IR can perform a loading operation for loading the substrate W into the carrier C held by the carrier holding unit 4 and a loading operation for unloading the substrate W from the carrier C. The carrier C may be a FOUP (Front Opening Unified Pod) that accommodates the substrate W in a sealed state, or may be in another form such as a SMIF (Standard Mechanical Interface) pod or OC (Open Cassette). May be.

  On the other hand, the processing block 3 includes a plurality of processing units 6 (substrate processing units) for processing the substrate W with the processing liquid and a plurality of fluid boxes 7 (module loading units) in which fluid devices such as pipes and valves are accommodated. And a center robot CR. In the present embodiment, for example, 12 processing units 6 and 12 fluid boxes 7 are provided. The twelve processing units 6 are arranged in three at four locations separated horizontally so as to surround the center robot CR in plan view. Although not shown, at each location, the three processing units 6 are arranged one above the other. The processing units 6 are adjacent to each other in the horizontal direction H (hereinafter simply referred to as “horizontal direction H”) orthogonal to the carrier arrangement direction U, and a predetermined interval is provided between the processing units 6 with respect to the carrier arrangement direction U. It has been.

  The processing units 6 and the fluid boxes 7 correspond one-to-one, and each fluid box 7 is adjacent to the corresponding processing unit 6 with respect to the horizontal direction H. That is, twelve fluid boxes 7 are arranged in three at four horizontally separated locations adjacent to the processing unit 6. Although not shown, at each location, the three fluid boxes 7 are arranged one above the other. Each processing unit 6 is supplied with a processing liquid from a corresponding fluid box 7.

  The center robot CR can access all the processing units 6 and can perform a loading operation for loading the substrate W into the processing unit 6 and a loading operation for unloading the substrate W from the processing unit 6. Further, the center robot CR can receive the substrate W from the indexer robot IR and can pass the substrate W to the indexer robot IR. Therefore, the center robot CR can receive an unprocessed substrate W from the indexer robot IR and carry the substrate W into any of the processing units 6. Further, the center robot CR can carry out the processed substrate W from the processing unit 6 and pass it to the indexer robot IR. Thereby, the unprocessed substrate W accommodated in the carrier C can be processed in the processing unit 6, and the processed substrate W processed in the processing unit 6 can be carried into the carrier C. The operations of the indexer robot IR and the center robot CR are controlled by the control unit 8.

  FIG. 2 is a schematic diagram showing a schematic configuration of the processing unit 6 and the fluid box 7.

  Each processing unit 6 supplies a processing liquid to the upper surface of the substrate W held by the spin chuck 11 that holds the substrate W horizontally and rotates the substrate W in the processing chamber 10 partitioned by the partition wall 9. The first upper surface nozzle 12 and the second upper surface nozzle 13 are provided, and a cup 14 is provided for receiving and capturing the processing liquid discharged from the substrate W.

  The spin chuck 11 includes a rotating shaft 15 extending in a vertical direction, a disk-shaped spin base 16 attached horizontally to the upper end of the rotating shaft 15, and a plurality of sandwiched members disposed on the peripheral edge of the upper surface of the spin base 16. A member 17 and a motor (not shown) connected to the rotating shaft 15 are provided. The spin chuck 11 can hold the substrate W in a horizontal posture above the spin base 16 by bringing each holding member 17 into contact with the peripheral end surface of the substrate W. The substrate W can be rotated around a vertical axis passing through the center of the substrate W by inputting the driving force of the motor to the rotary shaft 15 while the substrate W is sandwiched by the plurality of clamping members 17.

  Moreover, the rotating shaft 15 is a hollow shaft, and the lower processing liquid supply pipe 19 is inserted into the rotating shaft 15 in a non-contact state. The processing liquid is supplied from the fluid box 7 to the lower processing liquid supply pipe 19, and the processing liquid supplied to the lower processing liquid supply pipe 19 is at the upper end of the lower processing liquid supply pipe 19. Is discharged upward from the lower surface nozzle 20 provided on the substrate toward the center of the lower surface of the substrate W. When the processing liquid is discharged from the lower surface nozzle 20 while rotating the substrate W by the spin chuck 11, the discharged processing liquid is deposited on the center of the lower surface of the substrate W, and receives the centrifugal force generated by the rotation of the substrate W. It spreads instantly toward the periphery of W. Therefore, the processing liquid can be supplied to the entire lower surface of the substrate W by discharging the processing liquid from the lower surface nozzle 20 while rotating the substrate W by the spin chuck 11.

  The spin chuck 11 is not limited to such a configuration. For example, the lower surface (back surface) of the substrate W is vacuum-sucked to hold the substrate W in a horizontal posture, and in that state, the spin chuck 11 is vertical. A vacuum chucking type (vacuum chuck) that can rotate the held substrate W by rotating around the axis may be employed.

  The first upper surface nozzle 12 is disposed above the spin chuck 11 with the discharge port facing downward. The first upper surface nozzle 12 can discharge the processing liquid supplied from the fluid box 7 toward the center of the upper surface of the substrate W held by the spin chuck 11. When the processing liquid is discharged from the first upper surface nozzle 12 while rotating the substrate W by the spin chuck 11, the discharged processing liquid is deposited on the center of the upper surface of the substrate W, and receives the centrifugal force due to the rotation of the substrate W. And spreads instantaneously toward the periphery of the substrate W. Therefore, the processing liquid can be supplied to the entire upper surface of the substrate W by discharging the processing liquid from the first upper surface nozzle 12 while rotating the substrate W by the spin chuck 11.

  Similarly, the second upper surface nozzle 13 is disposed above the spin chuck 11 with the discharge port facing downward, and the processing liquid supplied from the fluid box 7 is supplied to the substrate W held by the spin chuck 11. It can discharge toward the center of the upper surface. The processing liquid can be supplied to the entire upper surface of the substrate W by discharging the processing liquid from the second upper surface nozzle 13 while rotating the substrate W by the spin chuck 11.

  As the first upper surface nozzle 12, a so-called fixed nozzle form in which the treatment liquid landing position on the substrate W is fixed may be employed, or the treatment liquid landing position on the substrate W may be the substrate. A so-called scan nozzle form that can be moved between the rotation center and the peripheral edge of W may be employed. Similarly, as the second upper surface nozzle 13, a so-called fixed nozzle form in which the liquid deposition position of the processing liquid on the substrate W is fixed may be adopted, or the liquid deposition of the processing liquid on the substrate W may be adopted. A so-called scan nozzle form in which the position can be moved between the rotation center and the peripheral edge of the substrate W may be employed.

  The cup 14 has a bottomed cylindrical shape with an open upper end and surrounds the spin base 16. The processing liquid supplied to the substrate W from the lower surface nozzle 20 and discharged around the substrate W is received by the cup 14. Similarly, the processing liquid supplied to the substrate W from the first and second upper surface nozzles 12 and 13 and discharged around the substrate W is received by the cup 14. Thereby, the processing liquid discharged from the substrate W held on the spin chuck 11 can be received and captured by the cup 14. A drainage pipe 21 for guiding the captured processing liquid to the fluid box 7 is connected to the bottom of the cup 14.

  When processing the substrate W in the processing unit 6, for example, while the substrate W is rotated by the spin chuck 11, the chemical liquid as the processing liquid is continuously discharged from the lower surface nozzle 20 and the first or second upper surface nozzles 12 and 13. . Accordingly, the chemical solution is supplied to the entire upper surface and the lower surface of the substrate W, and the chemical treatment is performed on the upper surface and the lower surface of the substrate W. Further, the chemical solution supplied to the substrate W and discharged around the substrate W is received and captured by the cup 14.

  After the treatment with the chemical solution is performed for a predetermined time, the rinsing liquid as the treatment liquid is continuously discharged from the lower surface nozzle 20 and the first or second upper surface nozzles 12 and 13, so that the upper surface and the lower surface of the rotating substrate W are Supply rinse solution to Thus, the rinsing liquid is supplied to the entire upper surface and the entire lower surface of the substrate W, and the chemical liquid adhering to the substrate W is washed away by the rinsing liquid (rinsing process). Further, the chemical liquid and the rinse liquid discharged from the substrate W are received and captured by the cup 14. After the rinsing process is performed for a predetermined time, the substrate W is rotated at a high speed by the spin chuck 11 to dry the substrate W (spin dry).

  On the other hand, each fluid box 7 accommodates a plurality of processing liquid supply modules 22, a mixing valve 23, and a drain tank 24. In this embodiment, the fluid box 7, the plurality of processing liquid supply modules 22, and the mixing valve 23 constitute one processing liquid supply unit 25. That is, the substrate processing apparatus 1 is provided with a plurality of processing liquid supply units 25 respectively corresponding to the plurality of processing units 6.

  The fluid box 7 is formed in a substantially rectangular parallelepiped shape, for example, and a plurality of arrangement spaces 26 (see FIG. 3) for arranging the plurality of processing liquid supply modules 22 are provided therein. The plurality of arrangement spaces 26 are spaces having a uniform size, and are stacked in the vertical direction inside the fluid box 7. Therefore, the plurality of processing liquid supply modules 22 are stacked in the vertical direction inside the fluid box 7. By arranging the plurality of processing liquid supply modules 22 in the vertical direction, the footprint (occupied area) of the fluid box 7 can be reduced. Thereby, the footprint of the substrate processing apparatus 1 can be reduced.

  The processing liquid supply module 22 is for supplying a processing liquid supplied from a processing liquid supply source (not shown) to any one of the nozzles 12, 13, and 20. Each processing liquid supply module 22 has, for example, any one of a processing liquid supply function, a processing liquid mixing function, a flow rate adjustment function, and a processing liquid circulation function. The processing liquid supply function is a function of supplying the processing liquid to any one of the nozzles 12, 13, and 20. The processing liquid mixing function is a function of mixing the processing liquid in a pipe and supplying the processing liquid to any one of the nozzles 12, 13, and 20. This is a function for supplying a mixed processing liquid. The flow rate adjusting function is a function of adjusting the flow rate and supplying a predetermined flow rate of processing liquid to any one of the nozzles 12, 13, and 20. This is a function of circulating the processing liquid by returning the processing liquid supplied from the processing liquid supply source to the processing liquid supply source while it is not being supplied. Each of the treatment liquid supply modules 22 is supplied with any one of a plurality of treatment liquids having different properties including treatment liquids having different temperatures, acidic treatment liquids, alkaline treatment liquids, and the like. Yes.

  Each processing liquid supply module 22 is unified to a predetermined size that can be arranged in the arrangement space 26. Each processing liquid supply module 22 includes a tray 27, a processing liquid supply pipe 28 (pipe) and a fluid device group 29 (apparatus) attached to the tray 27. The tray 27 has, for example, a rectangular shape in plan view (see FIG. 4), and the size thereof is unified among the plurality of processing liquid supply modules 22. The treatment liquid supply pipe 28 and the fluid device group 29 are arranged along one surface of the corresponding tray 27 and are unified in a planar arrangement.

  The processing liquid supply pipe 28 is made of, for example, a fluororesin such as PFA (perfluoroalkoxyethylene), and the fluid device group 29 is configured by valves or the like interposed in the processing liquid supply pipe 28. The devices constituting the fluid device group 29 include, for example, an on-off valve, a flow rate adjusting valve, a flow meter, a check valve, a three-way valve, a flow rate controller, a stirring device, a mixing valve for mixing treatment liquid, and the like. . The fluid device group 29 provided in each processing liquid supply module 22 has a different configuration for each function of the processing liquid supply module 22.

  The fluid box 7 is formed so that the tray 27 can be attached and removed in any arrangement space 26, and the plurality of trays 27 are respectively attached to the fluid box 7 in a horizontal posture. The plurality of trays 27 are stacked in the vertical direction in the fluid box 7. The treatment liquid supply pipe 28 and the fluid device group 29 are located above the corresponding tray 27 in the fluid box 7. The tray 27 is formed so that the interior of the fluid box 7 can be partitioned in the vertical direction. The processing liquid supply pipe 28 and the fluid device group 29 provided in each processing liquid supply module 22 are separated by the tray 27. Are separated from the treatment liquid supply pipe 28 and the fluid device group 29.

  In the fluid box 7, by separating the processing liquid supply pipe 28 and the fluid device group 29 provided in each processing liquid supply module 22 from the other processing liquid supply pipe 28 and the fluid equipment group 29, for example, two adjacent two Even when processing liquids having different temperatures are supplied to the processing liquid supply module 22, the processing liquids flowing through the two processing liquid supply pipes 28 respectively provided in the processing liquid supply modules 22 are affected by each other and the temperature thereof is increased. It is possible to suppress or prevent the change. Further, even when the acidic processing liquid and the alkaline processing liquid are respectively supplied to the two adjacent processing liquid supply modules 22, the acidic processing that has permeated the processing liquid supply pipe 28 and moved to the outside, for example, The contact between the liquid and the alkaline processing liquid can be suppressed or prevented.

  In addition, each processing liquid supply pipe 28 has a position at one end (position of the processing liquid inlet) with respect to the tray 27 that is uniform among the plurality of processing liquid supply modules 22, and a position at the other end (processing liquid) with respect to the tray 27. The position of the outlet) is unified among the plurality of processing liquid supply modules 22. That is, the plurality of processing liquid supply modules 22 are connected at predetermined positions to pipes that supply the processing liquid to the processing liquid supply module 22 and pipes that receive processing liquid supply from the processing liquid supply module 22. It is unified. In this way, the positions of the one end and the other end of the processing liquid supply pipe 28 with respect to the tray 27 are unified to a predetermined position to restrict the arrangement of the processing liquid supply pipe 28 and the processing liquid supply pipe 28 is connected to the corresponding tray 27. Accordingly, the length of the processing liquid supply pipe 28 extending from one end to the other end can be made substantially equal among the plurality of processing liquid supply modules 22. Thereby, the property of the processing liquid supplied from the processing liquid supply module 22 to the processing unit 6 can be made uniform.

  That is, for example, even if the processing liquid of the same temperature is sent to the processing liquid supply pipes 28 of the respective processing liquid supply modules 22, the length of the processing liquid supply pipe 28 is not uniform between the processing liquid supply modules 22. Since the temperature drop of the processing liquid generated in the process of flowing through the processing liquid supply pipe 28 is different for each processing liquid supply pipe 28, the processing liquid having a different temperature is supplied to the substrate W for each processing liquid supply module 22. Accordingly, when the length of the processing liquid supply pipe 28 is made uniform among the plurality of processing liquid supply modules 22, for example, the processing liquid whose properties change depending on the temperature is supplied from each processing liquid supply module 22 to the processing unit 6. Even so, it is possible to supply a processing liquid having a uniform property to the processing unit 6. Thereby, the uniformity of the processing quality of the substrate W can be improved.

  As shown in FIG. 2, in this embodiment, seven treatment liquid supply modules 22 are accommodated in the fluid box 7. The treatment liquid supply module 22 disposed at the top is supplied with pure water (deionized water), which is an example of a rinse liquid. The other six processing liquid supply modules 22 are supplied with processing liquids having different properties. In the following, the seven treatment liquid supply modules 22 are arranged in order from the top, the first treatment liquid supply module 22, the second treatment liquid supply module 22, the third treatment liquid supply module 22, the fourth treatment liquid supply module 22, and the second. The fifth treatment liquid supply module 22, the sixth treatment liquid supply module 22, and the seventh treatment liquid supply module 22 are referred to.

  The first to sixth processing liquid supply modules 22 are respectively connected to the mixing valve 23, and the first upper surface nozzle 12 and the lower surface nozzle are respectively connected via the first upper pipe 30 and the lower pipe 31 connected to the mixing valve 23. 20 is connected. The mixing valve 23 is formed by integrally forming a plurality of air valves 23a (open / close valves that are opened and closed by air pressure) and a plurality of flow paths. 1). By opening and closing the individual air valves 23 a provided in the mixing valve 23, the processing liquid supplied from the first to sixth processing liquid supply modules 22 is supplied to the first upper surface nozzle 12 and / or the lower surface nozzle 20. be able to.

  In addition, the seventh processing liquid supply module 22 is connected to the second upper surface nozzle 13 by the second upper pipe 32 without passing through the mixing valve 23. The processing liquid supplied to the seventh processing liquid supply module 22 is supplied to the second upper surface nozzle 13 via the second upper pipe 32. In this way, by connecting the seventh processing liquid supply module 22 to the second upper surface nozzle 13 without passing through the mixing valve 23, the processing liquid supplied to the seventh processing liquid supply module 22 is exchanged with other processing liquids. It can supply to the 2nd upper surface nozzle 13 without mixing.

  The mixing valve 23 can supply the processing liquid supplied from the first to sixth processing liquid supply modules 22 to the first upper surface nozzle 12 via the first upper pipe 30, and supply the first to sixth processing liquid supplies. The processing liquid supplied from two or more processing liquid supply modules 22 among the modules 22 can be mixed therein, and the mixed processing liquid can be supplied to the first upper surface nozzle 12. Similarly, the mixing valve 23 can supply the processing liquid supplied from the first to sixth processing liquid supply modules 22 to the lower surface nozzle 20 via the lower pipe 31, and the first to sixth processing liquid supply modules. The processing liquid supplied from two or more of the processing liquid supply modules 22 among 22 can be mixed therein, and the mixed processing liquid can be supplied to the lower surface nozzle 20.

  The processing liquid supplied to the substrate W held on the spin chuck 11 from the nozzles 12, 13, and 20 is discharged around the substrate W and captured by the cup 14. Then, the processing liquid captured by the cup 14 is guided to the drainage tank 24 by the drainage pipe 21 connected to the bottom of the cup 14.

  FIG. 3 is a schematic diagram of the processing liquid supply unit 25 for explaining the plurality of processing liquid supply modules 22.

  As described above, a plurality of processing liquid supply modules 22 are accommodated in the fluid box 7. These processing liquid supply modules 22 are selected according to the specifications of the substrate processing apparatus 1 from the processing liquid supply module group 33 configured by a plurality of types of processing liquid supply modules 22 having different functions. That is, in this embodiment, a plurality of processing liquid supply modules 22 corresponding to the specifications of the substrate processing apparatus 1 are selected from the processing liquid supply module group 33 prepared or designed in advance, and the plurality of selected processing liquid supply modules are selected. 22 is attached to the fluid box 7. Thereby, the process liquid supply part 25 according to the specification of the substrate processing apparatus 1 is configured.

  The processing liquid supply module group 33 includes, for example, a plurality of types of processing liquid supply modules 22 each having the above-described processing liquid supply function, processing liquid mixing function, flow rate adjustment function, and processing liquid circulation function. Each processing liquid supply module 22 constituting the supply module group 33 includes a tray 27, a processing liquid supply pipe 28, and a fluid device group 29. The treatment liquid supply modules 22 constituting the treatment liquid supply module group 33 are unified to a predetermined size that can be arranged in the arrangement space 26. Therefore, any processing space supply module 22 selected from the processing liquid supply module group 33 can be arranged in any arrangement space 26. As a result, a plurality of processing liquid supply modules 22 corresponding to the specifications of the substrate processing apparatus 1 can be selected from the processing liquid supply module group 33, and the selected processing liquid supply modules 22 can be attached to the fluid box 7. Even when the specification of the processing liquid supply unit 25 is changed, if the processing liquid supply module 22 attached to the fluid box 7 is removed from the fluid box 7 and another processing liquid supply module 22 is attached to the removed position. Since it is good, the specification of the process liquid supply part 25 can be changed easily.

  FIG. 4 is a schematic plan view showing an example of the configuration of the processing liquid supply module 22. The processing liquid supply module 22 shown in FIG. 4 is a processing liquid supply module 22 having a processing liquid circulation function.

  The treatment liquid supply module 22 having a treatment liquid circulation function includes, for example, a tray 27 and two treatment liquid supply pipes 28 (hereinafter, the upper treatment liquid supply pipe 28 in FIG. 4 is referred to as “first treatment liquid supply pipe 28”. The lower processing liquid supply pipe 28 is referred to as a “second processing liquid supply pipe 28”, and the first three-way valve 36 and the second two respectively interposed in the first and second processing liquid supply pipes 28. And a three-way valve 37 (switching means). Each processing liquid supply pipe 28 is attached to the tray 27 so that one end 28 a (left end in FIG. 4) and the other end 28 b (right end in FIG. 4) are located at the edge of the tray 27. A joint 38 for connecting the pipe is attached to one end 28 a and the other end 28 b of each processing liquid supply pipe 28. A mixing valve 23 is connected to one end 28 a of each processing liquid supply pipe 28 via a joint 38. In addition, the first and second processing liquid supply pipes 28 are connected to each other by connecting pipes 39 in the middle.

  A supply pipe 40 (treatment liquid pipe) for supplying the treatment liquid to the first treatment liquid supply pipe 28 is connected to the other end 28 b of the first treatment liquid supply pipe 28. In addition, a circulation pipe 41 is connected to one end 40a (the right end in FIG. 4) of the supply pipe 40. A treatment liquid from a treatment liquid supply source (not shown) is supplied to the first treatment liquid supply pipe 28 via a supply pipe 40 and a circulation pipe 41. The circulation pipe 41 is a pipe for supplying the processing liquid to the plurality of processing liquid supply units 25, and a plurality of processing liquid supply modules to which a common processing liquid provided in each of the processing liquid supply units 25 is supplied. The processing liquid is supplied to 22 through a circulation pipe 41.

  The first three-way valve 36 is connected to a first cleaning liquid pipe 42 (cleaning liquid pipe) that supplies a pipe cleaning liquid to the first processing liquid supply pipe 28. A first check valve 45 is interposed in the first cleaning liquid pipe 42, and the flow of liquid toward the one end 42 a (the right end in FIG. 4) of the first cleaning liquid pipe 42 by the first check valve 45. Is dammed up. Further, a joint 43 is provided at one end 42 a of the first cleaning liquid pipe 42, and the first cleaning liquid supply pipe 44 can be connected to the first cleaning liquid pipe 42 through the joint 43.

  A pipe cleaning liquid (in this embodiment, pure water) can be supplied to the first cleaning liquid pipe 42 by attaching the first cleaning liquid supply pipe 44 to the first cleaning liquid pipe 42. Then, by operating the first three-way valve 36, the first cleaning liquid pipe 42 and the one end 28 a of the first processing liquid supply pipe 28 are connected from the flow path connecting the one end 28 a and the other end 28 b of the first processing liquid supply pipe 28. By switching to the connecting flow path, pure water can be supplied to the first processing liquid supply pipe 28. Thereby, the inside of the 1st processing liquid supply piping 28 can be washed. The cleaning of the first processing liquid supply pipe 28 with pure water is performed, for example, when a fluid device such as a valve interposed in the first processing liquid supply pipe 28 fails. Then, after the first treatment liquid supply pipe 28 is cleaned for a predetermined time (for example, several hours) and the internal chemical liquid is removed, the failed fluid device is replaced.

  On the other hand, the other end 28 b of the second processing liquid supply pipe 28 is connected to a return pipe 46 that returns the processing liquid supplied to the processing liquid supply module 22. Further, the above-described circulation pipe 41 is connected to one end 46a (the right end in FIG. 4) of the return pipe 46. The return pipe 46 is connected to the circulation pipe 41 on the downstream side of the supply pipe 40. As will be described later, when the treatment liquid is circulated by the treatment liquid supply module 22, the treatment liquid supplied to the treatment liquid supply module 22 via the second treatment liquid supply pipe 28 and the return pipe 46 is supplied to the circulation pipe 41. Let me return.

  The second three-way valve 37 is connected to a second cleaning liquid pipe 47 (cleaning liquid pipe) that supplies a pipe cleaning liquid to the second processing liquid supply pipe 28. A second check valve 50 is interposed in the second cleaning liquid pipe 47, and the flow of liquid toward the one end 47 a (the right end in FIG. 4) of the second cleaning liquid pipe 47 by the second check valve 50. Is dammed up. Further, a joint 48 is provided at one end 47 a of the second cleaning liquid pipe 47, and the second cleaning liquid supply pipe 49 can be connected to the second cleaning liquid pipe 47 through the joint 48.

  By attaching the second cleaning liquid supply pipe 49 to the second cleaning liquid pipe 47, pure water as a pipe cleaning liquid can be supplied to the second cleaning liquid pipe 47. Then, the second three-way valve 37 is operated to connect the second cleaning liquid pipe 47 and the one end 28a of the second processing liquid supply pipe 28 from the flow path connecting the one end 28a and the other end 28b of the second processing liquid supply pipe 28. By switching to the connecting flow path, pure water can be supplied to the second processing liquid supply pipe 28. Thereby, the inside of the 2nd processing liquid supply piping 28 can be washed. The cleaning of the second processing liquid supply pipe 28 with pure water is performed, for example, when a fluid device such as a valve interposed in the second processing liquid supply pipe 28 fails. Then, after the second processing liquid supply pipe 28 is cleaned for a predetermined time (for example, several hours) and the internal chemical liquid is removed, the failed fluid device is replaced.

  When supplying the processing liquid from the processing liquid supply module 22 to the processing unit 6, the first three-way valve 36 is operated to process the processing liquid supplied from the supply pipe 40 to the first processing liquid supply pipe 28 in the first processing. The liquid supply pipe 28 is made to flow toward one end 28a. Further, the second three-way valve 37 is operated to stop the flow of the processing liquid between the one end 28 a and the other end 28 b of the second processing liquid supply pipe 28. That is, a flow path connecting the second cleaning liquid pipe 47 and the one end 28a of the second processing liquid supply pipe 28 is secured. Then, the mixing valve 23 is controlled by the control unit 8 (see FIG. 1), and the air valve 23a corresponding to the processing liquid supply module 22 is opened.

  When the first three-way valve 36, the second three-way valve 37, and the mixing valve 23 are operated in this manner, the processing liquid supplied from the supply pipe 40 to the first processing liquid supply pipe 28 is transferred to the first processing liquid supply pipe 28. It flows toward the one end 28 a and is supplied to the first upper surface nozzle 12 or the lower surface nozzle 20 provided in the processing unit 6 through the mixing valve 23. Further, the processing liquid is supplied from the first processing liquid supply pipe 28 to the second processing liquid supply pipe 28 via the connection pipe 39, and the first upper surface nozzle is supplied from the second processing liquid supply pipe 28 via the mixing valve 23. 12 or the lower surface nozzle 20. At this time, the second three-way valve 37 is operated so that the flow of the processing liquid between the one end 28a and the other end 28b of the second processing liquid supply pipe 28 is stopped. The processing liquid supplied to the supply pipe 28 and directed toward the other end 28 b is controlled in direction by the second three-way valve 37 and flows toward the second cleaning liquid pipe 47. Then, the flow of the processing liquid flowing into the second cleaning liquid piping 47 is blocked by the second check valve 50.

  Next, a case where the processing liquid supplied to the processing liquid supply module 22 is returned to circulate the processing liquid will be described.

  When returning the processing liquid supplied to the processing liquid supply module 22 and circulating the processing liquid, the control valve 8 controls the mixing valve 23 to close the air valve 23 a corresponding to the processing liquid supply module 22. . Then, the first three-way valve 36 is operated to cause the processing liquid supplied from the supply pipe 40 to the first processing liquid supply pipe 28 to flow toward the one end 28 a of the first processing liquid supply pipe 28. Further, the second three-way valve 37 is operated to secure a flow path connecting the one end 28a and the other end 28b of the second processing liquid supply pipe 28.

  When the first three-way valve 36, the second three-way valve 37, and the mixing valve 23 are operated in this manner, the processing valve supplied from the supply pipe 40 to the first processing liquid supply pipe 28 is closed. Therefore, most of the water is supplied to the second processing liquid supply pipe 28 via the connection pipe 39 without being supplied to the processing unit 6. Then, the processing liquid supplied to the second processing liquid supply pipe 28 flows toward the other end 28 b of the second processing liquid supply pipe 28, passes through the second three-way valve 37 and the return pipe 46, and the circulation pipe 41. Return to As a result, the processing liquid supplied to the processing liquid supply module 22 can be returned to circulate the processing liquid.

  Next, the case where the supply of the processing liquid to the processing liquid supply module 22 is stopped and the first and second processing liquid supply pipes 28 are cleaned with pure water as a pipe cleaning liquid will be described.

  When the supply of the processing liquid to the processing liquid supply module 22 is stopped and the first and second processing liquid supply pipes 28 are cleaned with pure water, the first three-way valve 36 is operated to operate the first cleaning liquid pipe 42. And a flow path connecting the one end 28a of the first treatment liquid supply pipe 28 is secured. Further, a first cleaning liquid supply pipe 44 is connected to the first cleaning liquid pipe 42 to supply pure water to the first cleaning liquid pipe 42. Similarly, the second three-way valve 37 is operated to secure a flow path connecting the second cleaning liquid pipe 47 and the one end 28 a of the second processing liquid supply pipe 28. Further, a second cleaning liquid supply pipe 49 is connected to the second cleaning liquid pipe 47 to supply pure water to the second cleaning liquid pipe 47. Then, the control valve 8 controls the mixing valve 23 to open the air valve 23 a corresponding to the processing liquid supply module 22.

  When the first three-way valve 36, the second three-way valve 37, and the mixing valve 23 are operated in this way and further pure water is supplied to the first and second cleaning liquid pipes 42, 47, the first cleaning liquid pipe 42 is supplied. The pure water flows through the first three-way valve 36 toward the one end 28 a of the first processing liquid supply pipe 28, and is supplied to the first upper surface nozzle 12 or the lower surface nozzle 20 through the mixing valve 23. Similarly, the pure water supplied to the second cleaning liquid pipe 47 flows through the second three-way valve 37 toward the one end 28a of the second processing liquid supply pipe 28 and passes through the mixing valve 23 to the first upper surface nozzle 12. Or it is supplied to the lower surface nozzle 20. As a result, the first and second processing liquid supply pipes 28 and the inside of the fluid devices interposed in these pipes 28 are washed with pure water.

  Thus, in the present embodiment, the supply of the processing liquid to the processing liquid supply module 22 can be stopped by operating the first and second three-way valves 36 and 37 to switch the flow path. Therefore, even when the circulation pipe 41 is connected to a plurality of processing liquid supply modules 22 as in the present embodiment, the supply of the processing liquid is stopped only for a part of the processing liquid supply modules 22, and other processing is performed. The supply of the processing liquid to the liquid supply module 22 can be continued. That is, since the processing liquid is supplied from the corresponding processing liquid supply unit 25 to each processing unit 6, supply of the processing liquid to only a part of the processing units 6 among the plurality of processing units 6 is stopped, The supply of the processing liquid to the processing unit 6 can be continued. Therefore, for example, even when some of the processing liquid supply modules 22 fail and supply of the processing liquid to some of the processing units 6 cannot be performed, only the processing of the substrate W in the processing unit 6 is stopped. Processing of the substrate W in the processing unit 6 can be continued. Then, while proceeding with the processing of the substrate W, the failed processing liquid supply module 22 can be washed with pure water to replace the failed fluid device. Thereby, it is possible to replace the failed fluid device while suppressing a decrease in the throughput of the substrate processing apparatus 1 (the number of processed substrates W per unit time).

  As described above, in the present embodiment, a plurality of arrangement spaces 26 for arranging the plurality of processing liquid supply modules 22 are provided inside the fluid box 7, and a plurality of arrangement spaces 26 arranged in the fluid box 7 are provided. The processing liquid supply module 22 is unified to a predetermined size that can be arranged in the arrangement space 26. Accordingly, a plurality of processing liquid supply modules 22 corresponding to the specifications of the substrate processing apparatus 1 are selected from the processing liquid supply module group 33 configured by a plurality of types of processing liquid supply modules 22 having different functions, and the selected processing liquid is selected. The supply module 22 can be attached to the fluid box 7. Thereby, the process liquid supply part 25 according to the specification of the substrate processing apparatus 1 can be easily formed. Further, in this way, it is not necessary to design the layout of piping as in the prior art after the specification of the substrate processing apparatus 1 is determined, and the apparatus 1 is completed after the specification of the substrate processing apparatus 1 is determined. Can be shortened. Furthermore, the processing liquid supply modules 22 can be compactly integrated, and the space for the processing liquid supply unit 25 can be saved. Furthermore, since the specifications of the processing liquid supply module 22 can be shared among the plurality of substrate processing apparatuses 1, it is not necessary to design the processing liquid supply module 22 for each apparatus 1. Therefore, the production efficiency of the substrate processing apparatus 1 can be improved.

  Although the embodiments of the present invention have been described above, the present invention is not limited to the contents of the above-described embodiments, and various modifications can be made within the scope of the claims. For example, in the above-described embodiment, the case where the plurality of arrangement spaces 26 for arranging the plurality of treatment liquid supply modules 22 is stacked in the vertical direction inside the fluid box 7 has been described. Absent. Specifically, for example, a plurality of arrangement spaces 26 may be arranged in the horizontal direction inside the fluid box 107 as in the treatment liquid supply unit 125 illustrated in FIG. 5. Further, as shown in FIG. 5, the plurality of processing liquid supply modules 22 may be arranged in the horizontal direction inside the fluid box 107 so that the respective trays 27 are in the vertical posture. When the plurality of arrangement spaces 26 are arranged side by side in the horizontal direction, the height of the fluid box 107 can be reduced as compared with the case where the plurality of arrangement spaces 26 are arranged in the vertical direction. Therefore, the height of the substrate processing apparatus 1 can be reduced.

  In the example of the configuration of the processing liquid supply module 22 described with reference to FIG. 4, the case where the first and second processing liquid supply pipes 28 are connected to the nozzles via the mixing valve 23 has been described. For example, as shown in FIG. 6, each processing liquid supply pipe 28 may be connected to the nozzle without passing through the mixing valve 23. In this case, as shown in FIG. 6, an air valve 51 is provided on the downstream side (left side in FIG. 6) from the connection position with the connection pipe 39 in each processing liquid supply pipe 28. May be controlled by the control unit 8 (see FIG. 1) to control the supply and stop of the treatment liquid to the nozzle.

  In addition, various design changes can be made within the scope of matters described in the claims.

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 6 Processing unit 7 Fluid box 22 Processing liquid supply module 25 Processing liquid supply part 26 Arrangement space 27 Tray 28 Processing liquid supply piping 29 Fluid equipment group 36 First three-way valve 37 Second three-way valve 40 Supply piping 42 First Cleaning liquid piping 47 Second cleaning liquid piping 125 Processing liquid supply unit 107 Fluid box W Substrate

Claims (12)

A substrate processing apparatus comprising: a plurality of substrate processing units that process a substrate with a processing liquid; and a plurality of processing liquid supply units that supply the processing liquid to the plurality of substrate processing units,
The plurality of processing liquid supply units include a plurality of fluid boxes that correspond one-to-one with the plurality of substrate processing units, and the plurality of substrate processing units and the plurality of fluid boxes form a plurality of pairs. And
Each substrate processing unit is for processing a substrate with a processing liquid in a processing chamber partitioned by a partition wall, and is adjacent to a pair of fluid boxes,
Each processing liquid supply unit includes a plurality of processing liquid supply modules housed in the fluid box for supplying a processing liquid to a pair of substrate processing units,
Each treatment liquid supply module includes a tray that is unified to a predetermined size, and a treatment liquid supply pipe that is attached to the tray, and is unified to a predetermined size.
The substrate processing apparatus, wherein positions of one end and the other end of the processing liquid supply pipe with respect to the tray are unified among the plurality of processing liquid supply modules. The pair of substrate processing units and the fluid box are arranged adjacent to each other in the horizontal direction,
The substrate processing apparatus according to claim 1, wherein the plurality of substrate processing units and the plurality of fluid boxes include a plurality of pairs of substrate processing units and fluid boxes arranged side by side.   The substrate processing apparatus according to claim 2, wherein the plurality of substrate processing units and the plurality of fluid boxes include a plurality of pairs of substrate processing units and fluid boxes that are disposed at positions that are horizontally separated from each other. The upper end of each fluid box is disposed at a height equal to or substantially equal to the upper end of the partition wall of the corresponding substrate processing unit, and the lower end of each fluid box is equal to or approximately equal to the lower end of the partition wall of the corresponding substrate processing unit. The substrate processing apparatus according to claim 1, which is disposed at a height.   5. The substrate processing apparatus according to claim 1, wherein in each processing liquid supply unit, the plurality of processing liquid supply modules are stacked in the fluid box.   The substrate processing apparatus according to claim 1, wherein the processing liquid supply pipe is disposed along the tray. The tray has one surface arranged along the processing liquid supply pipe, and the other surface opposite to the one surface,
The plurality of trays are stacked in the fluid box so that the one surface and the other surface face each other.
The substrate processing apparatus according to claim 6, wherein the processing liquid supply pipe is disposed between any two of the plurality of trays accommodated in the common fluid box.   Each of the processing liquid supply units mixes the processing liquid supplied from two or more of the processing liquid supply modules among the plurality of processing liquid supply modules therein, and the mixed processing liquid corresponds to the substrate. The substrate processing apparatus according to claim 1, further comprising a mixing valve that supplies the processing unit. The substrate processing apparatus further includes a drainage tank to which processing liquid supplied to the substrate by the plurality of substrate processing units is guided
The substrate processing apparatus according to claim 1, wherein the drainage tank is accommodated in the fluid box. A circulation pipe for supplying a treatment liquid to the plurality of treatment liquid supply units;
A cleaning liquid pipe that is disposed in the fluid box and supplies a pipe cleaning liquid for washing the processing liquid supply pipe to the processing liquid supply pipe;
The switching means for switching a flow path so that the processing liquid from the circulation pipe or the pipe cleaning liquid from the cleaning liquid pipe may be supplied to the processing liquid supply pipe. The substrate processing apparatus according to one item.   The substrate according to claim 1, wherein the plurality of processing liquid supply modules include at least a processing liquid supply module having a processing liquid supply function and a processing liquid supply module having a flow rate adjustment function. Processing equipment.   12. The length of the processing liquid supply pipe extending from one end of the processing liquid supply pipe to the other end of the processing liquid supply pipe is substantially equal among the plurality of processing liquid supply modules. 2. The substrate processing apparatus according to 1.

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