JP5703746B2 - Water supply system - Google Patents

Description

  The present invention relates to a water supply system for supplying make-up water to a boiler device.

  Conventionally, a steam generation system that heats makeup water to be replenished to a water supply tank by a heat pump is known (see Patent Document 1).

JP 2010-25431 A

  In the steam generation system described in Patent Document 1, when the load factor of the steam boiler becomes high and the level of makeup water stored in the feed water tank falls below a predetermined water level, supply of makeup water to the feed water tank is started. The replenishing water is heated with a heat pump. Further, in the steam generation system described in Patent Document 1, when the load factor of the steam boiler becomes low and the water level exceeds a predetermined water level, the supply of makeup water to the water supply tank is stopped and the heating by the heat pump is stopped. .

  In the steam generation system described above, the flow rate of makeup water supplied to the water supply tank is constant. For this reason, in the heat pump, when the heat exchange amount of the condenser decreases, the load factor of the heat pump decreases. When this load factor becomes a certain value or less, the COP (energy consumption efficiency) of the heat pump rapidly decreases.

  Therefore, this invention is providing the water supply system which can utilize the thermal energy of a heat pump effectively.

The present invention includes a water supply tank for storing make-up water, a make-up water line for supplying make-up water to the water supply tank, a water supply line for making up make-up water from the water supply tank toward the boiler device, and the make-up water line. Supply water circulation means for circulating makeup water to the feed water tank, a heat pump for recovering waste heat via the refrigerant, makeup water flowing through the makeup water line, and refrigerant circulating through the heat pump. In order to set the water level of the heat exchanger to be exchanged and the water level of the water supply tank as the target water level, the load factor of the heat pump between the first water level lower than the target water level and the second water level higher than the target water level Control means for controlling the flow rate of make-up water in the make-up water flow means so that is maintained between the allowable maximum load factor and the allowable minimum load factor ,
When the water level of the water supply tank decreases from the target water level, the control means controls the flow rate of makeup water in the makeup water circulation means so that the load factor of the heat pump increases, and the water supply The present invention relates to a water supply system that controls the flow rate of makeup water in the makeup water circulation means so that the load factor of the heat pump decreases when the water level of a tank increases from the target water level .
The present invention also provides a water supply tank for storing make-up water, a make-up water line for supplying make-up water to the water supply tank, a water supply line for making up make-up water from the water supply tank toward the boiler device, and the make-up water Supply water distribution means for distributing makeup water through the line toward the water supply tank, a heat pump for recovering waste heat through the refrigerant, makeup water flowing through the makeup water line, and a refrigerant circulating through the heat pump Between the first water level lower than the target water level and the second water level higher than the target water level so that the water level of the heat exchanger and the water level of the water supply tank are the target water level. Control means for controlling the flow rate of make-up water in the make-up water flow means so that the load factor is maintained between the allowable maximum load rate and the allowable minimum load rate, and the control means includes the When the water level of the water tank is higher than the target water level and lower than the third water level lower than the second water level, replenishment in the make-up water circulation means is made to circulate make-up water toward the water supply tank. While controlling the flow rate of water and starting the operation of the heat pump in a state where makeup water is flowing through the heat exchanger, and when the water level of the water supply tank is higher than the second water level, Control the flow rate of the makeup water in the makeup water circulation means so that the makeup water is not circulated toward the water supply tank after the operation of the heat pump is stopped while the makeup water is circulating in the heat exchanger. It relates to a water supply system.

The present invention also provides a water supply tank for storing make-up water, a make-up water line for supplying make-up water to the water supply tank, a water supply line for making up make-up water from the water supply tank toward the boiler device, and the make-up water A replenishment water distribution means for distributing replenishment water to the water supply tank via a line; and a heat pump for recovering waste heat via a refrigerant flowing inside, wherein the refrigerant and the replenishment flow through the heat pump. A heat pump that exchanges heat with makeup water that circulates in the water line, and a first water level that is lower than the target water level and a second water level that is higher than the target water level in order to set the water level of the water supply tank as the target water level. Control means for controlling the flow rate of makeup water in the makeup water circulation means so that the load factor of the heat pump is maintained between the allowable maximum load factor and the allowable minimum load factor. And when the water level of the water supply tank decreases from the target water level, the control means controls the flow rate of the makeup water in the makeup water circulation means so that the load factor of the heat pump increases. The present invention relates to a water supply system that controls the flow rate of makeup water in the makeup water circulation means so that the load factor of the heat pump decreases when the water level of the water supply tank increases from the target water level.

The present invention also provides a water supply tank for storing make-up water, a make-up water line for supplying make-up water to the water supply tank, a water supply line for making up make-up water from the water supply tank toward the boiler device, and the make-up water A replenishment water distribution means for distributing replenishment water to the water supply tank via a line; and a heat pump for recovering waste heat via a refrigerant flowing inside, wherein the refrigerant and the replenishment flow through the heat pump. A heat pump that exchanges heat with makeup water that circulates in the water line, and a first water level that is lower than the target water level and a second water level that is higher than the target water level in order to set the water level of the water supply tank as the target water level. Control means for controlling the flow rate of makeup water in the makeup water circulation means so that the load factor of the heat pump is maintained between the allowable maximum load factor and the allowable minimum load factor. And when the water level of the water supply tank is lower than a third water level that is higher than the target water level and lower than the second water level, the control means distributes make-up water toward the water supply tank. And controlling the flow rate of the makeup water in the makeup water circulation means, starting the operation of the heat pump with the makeup water flowing through the makeup water line, and the water level of the feed water tank When the water level exceeds 2, the supply of the makeup water is performed so that the makeup water is not circulated toward the water supply tank after the operation of the heat pump is stopped while the makeup water is circulating in the makeup water line. The present invention relates to a water supply system for controlling a circulation amount of makeup water in the means.

  Further, the control means of the water supply system is configured such that when the water level of the water supply tank is lower than the first water level, the water level of the water supply tank is lower than the target water level and higher than the first water level. It is preferable to control the flow rate of the makeup water in the makeup water circulation means so that the makeup water flows in the maximum circulation amount toward the water supply tank until the water level reaches 4.

  ADVANTAGE OF THE INVENTION According to this invention, the water supply system which can utilize the thermal energy of a heat pump effectively can be provided.

It is a schematic structure figure showing boiler system 100 of an embodiment. It is a time chart which shows the operation timing in case the control part 180 performs makeup water flow control. It is a flowchart which shows the process sequence in case the control part 180 controls the flow volume of the makeup water W1. It is a time chart which shows the operation timing in case the control part 180 performs makeup water temperature control. It is a flowchart which shows the process sequence in case the control part 180 controls the distribution | circulation and water temperature of makeup water W1.

  Hereinafter, an embodiment in which a water supply system of the present invention is applied to a boiler system will be described. FIG. 1 is a schematic configuration diagram illustrating a boiler system 100 according to an embodiment of the present invention. As shown in FIG. 1, the boiler system 100 of the present embodiment includes a water softening device 110, a deoxygenation device 120, a water supply tank 130, a steam boiler 140, a heat exchanger 150, and a heat pump 160. . Further, the boiler system 100 of the present embodiment includes a flow meter 170, a makeup water valve 171 as a makeup water circulation means, thermometers 172 and 173, a water level meter 174, and a control unit 180 as a control means. Prepare. Furthermore, the boiler system 100 of the present embodiment includes a makeup water line L110, a water supply line L120, and a refrigerant circulation line L130.

  The “line” is a general term for a line capable of fluid flow such as a flow path, a path, and a pipeline. Moreover, in this embodiment, the water which distribute | circulates the supplementary water line L110 and the water supply line L120 is named generically, and the "supplementary water W1" is called.

  The water softening device 110 is a device that removes the hardness of raw water supplied from a raw water tank (not shown) to generate softened water.

  The deoxygenation device 120 is a device that removes dissolved oxygen contained in the makeup water W <b> 1 (softening water) generated by the water softening device 110.

  The water supply tank 130 is a tank that stores makeup water W1. A makeup water line L <b> 110 is connected to the water supply tank 130. The makeup water W1 is replenished to the feed water tank 130 via the makeup water line L110. Further, the water supply tank 130 is connected to the steam boiler 140 via a water supply line L120. The makeup water W1 stored in the feed water tank 130 is supplied to the steam boiler 140 through a feed water line L120 by a feed water pump (not shown) provided in the steam boiler 140.

  A water level meter 174 is provided in the water supply tank 130. The water level meter 174 is a device that measures the water level of the makeup water W <b> 1 stored in the water supply tank 130. The water level gauge 174 is electrically connected to the control unit 180. The water level meter 174 transmits information (signal) related to the measured water level of the makeup water W <b> 1 to the control unit 180. As will be described later, the level of the makeup water W1 stored in the water supply tank 130 is classified into seven stages of HH, H, Hd, M, Ld, L, and LL.

  The makeup water line L110 is a line that supplies the makeup water W1 to the water supply tank 130. The makeup water line L110 is connected to the inflow side of the makeup water W1 in the feed water tank 130. A part of the makeup water line L110 constitutes a water flow path L1 inside a heat exchanger 150 (described later).

  A flow meter 170 is provided at the measurement point J1 of the makeup water line L110. The measurement point J1 is located between the deoxygenation device 120 and the makeup water valve 171. The flow meter 170 is a device that measures the flow rate of the makeup water W1 that flows through the makeup water line L110. The flow meter 170 is electrically connected to the control unit 180. The flow meter 170 transmits information (signal) related to the flow rate FL1 of the makeup water W1 measured at the measurement point J1 to the control unit 180.

  A makeup water valve 171 is provided in the makeup water line L110. The makeup water valve 171 is provided between the deoxygenation device 120 and the heat exchanger 150. The makeup water valve 171 is a valve that controls the flow rate of the makeup water W1 flowing through the makeup water line L110. The makeup water valve 171 is electrically connected to the control unit 180. The valve opening degree of the makeup water valve 171 is adjusted by a valve operation signal transmitted from the control unit 180. The valve opening of the makeup water valve 171 can be adjusted steplessly from an open state (valve opening 100%) to a closed state (valve opening 0%).

  A thermometer 172 is provided at the measurement point J2 of the makeup water line L110. The measurement point J2 is located between the makeup water valve 171 and the heat exchanger 150. The measurement point J2 is preferably located in the vicinity of the heat exchanger 150. The thermometer 172 is a device that measures the temperature TS1 (the inlet temperature of the heat exchanger 150) of the makeup water W1 before passing through the heat exchanger 150. The thermometer 172 is electrically connected to the control unit 180. The thermometer 172 transmits information (signal) related to the temperature TS1 of the makeup water W1 measured at the measurement point J2 to the control unit 180.

  A thermometer 173 is provided at the measurement point J3 of the makeup water line L110. The measurement point J3 is located between the heat exchanger 150 and the water supply tank 130. The measurement point J3 is preferably located in the vicinity of the heat exchanger 150. The thermometer 173 is a device that measures the temperature TS2 (heat exchanger 150 outlet temperature) of the makeup water W1 after passing through the heat exchanger 150. The thermometer 173 is electrically connected to the control unit 180. The thermometer 173 transmits information (signal) related to the temperature TS2 of the makeup water W1 measured at the measurement point J3 to the control unit 180.

  The steam boiler 140 is a boiler that generates steam by heating the replenishing water W1 replenished via the water supply line L120, and includes a once-through boiler. The steam generated by the steam boiler 140 is supplied to a steam use facility (not shown) using this steam as a power source or a heat source. Steam boiler 140 includes a feed water pump (not shown) connected to feed water line L120.

  The water supply line L120 is a line that supplies makeup water W1 from the water supply tank 130 toward the steam boiler 140.

  The heat exchanger 150 is a device that exchanges heat between the makeup water W1 that flows through the makeup water line L110 and the refrigerant W2 that flows through the refrigerant circulation line L130 (described later) connected to the heat pump 160. Inside the heat exchanger 150, a water flow path L1 constituting a part of the makeup water line L110 and a refrigerant flow path L2 connected to the refrigerant circulation line L130 are arranged close to each other so as not to be mixed with each other. Has been.

  During operation of the heat pump 160, the makeup water W <b> 1 flowing through the makeup water line L <b> 110 passes through the water flow path L <b> 1 of the heat exchanger 150, and the heat dissipation of the refrigerant W <b> 2 flowing through the refrigerant flow path L <b> 2 of the heat exchanger 150 It is warmed. The heated makeup water W1 is supplied to the water supply tank 130 via the makeup water line L110. On the other hand, when the refrigerant W2 flowing through the refrigerant circulation line L130 passes through the heat exchanger 150, it is cooled by releasing heat to the makeup water W1 flowing through the water flow path of the heat exchanger 150. The cooled refrigerant W2 is supplied to the condenser (described later) of the heat pump 160 via the refrigerant circulation line L130.

  The refrigerant circulation line L130 is a line that annularly connects the refrigerant flow path L2 of the heat exchanger 150 and a refrigerant flow path (not shown) that exchanges heat with the condenser of the heat pump 160.

  The heat pump 160 is a device that recovers heat (waste heat) generated by an external heat source (an air conditioner or various coolers such as a food machine not shown) via an internal refrigerant (not shown). The heat pump 160 includes a compressor, a condenser, an expansion valve, and an evaporator (all not shown). The compressor compresses the gaseous internal refrigerant and sends it to the condenser at a high temperature and high pressure. The condenser releases the heat of the internal refrigerant to the refrigerant W2, and cools (liquefies) the internal refrigerant. The refrigerant W2 becomes hot water due to heat dissipation from the internal refrigerant. The expansion valve reduces the temperature of the internal refrigerant by reducing the pressure of the internal refrigerant. The evaporator heats the internal refrigerant with the heat source water W3 to evaporate (vaporize) it. The heat source water W3 becomes cold water due to heat radiation to the internal refrigerant.

  A heat source water supply line L140 and a heat source water return line L150 are connected to the evaporator of the heat pump 160. The heat source water supply line L140 is a line through which the heat source water W3 from the heat source flows. The heat source water return line L150 is a line through which the heat source water W3 returning to the heat source flows.

  The heat source supplied to the evaporator of the heat pump 160 is not limited to a specific configuration as long as it is a water heat source type that uses heat source water W3. The heat source water W3 is water that becomes a heat source of the heat pump 160. The heat source water W3 is not only industrial water, well water, tap water, but also water from various devices as long as the water quality does not cause a decrease in life or efficiency due to corrosion, scale adhesion, etc. on the evaporator of the heat pump 160. Can be used. Moreover, the heat pump 160 may be of an air heat source type using a heat source as an air heat source, and is not limited to a specific method.

  The heat pump 160 is electrically connected to the control unit 180. The operation of the heat pump 160 is controlled by an HP operation signal transmitted from the control unit 180. The heat pump 160 starts operation when the HP operation signal is “ON”. Further, the heat pump 160 stops operation when the operation signal becomes “OFF”.

  The control unit 180 is a control device that controls the flow rate of the makeup water W <b> 1 supplied to the feed water tank 130 and the operation of the heat pump 160 in the boiler system 100. The control unit 180 includes a central processing unit that executes various arithmetic processes, a storage unit that stores information on the acquired water level, a makeup water flow rate control program, a makeup water temperature control program, and a timer unit that measures time. An input / output unit that communicates with each device connected to the control unit 180 (all not shown). The broken line shown in FIG. 1 shows the path | route of the electrical connection of the control part 180, each measuring device, and a control object apparatus.

  Since the control unit 180 sets the water level of the water supply tank 130 to a target water level M (described later), the load factor α of the heat pump 160 between the water level L and the water level H is an allowable maximum load factor αmax and an allowable minimum load factor αmin. The makeup water valve 171 is controlled so as to be maintained during Hereinafter, this control is appropriately referred to as “make-up water flow rate control”.

The load factor α of the heat pump 160 described above can be calculated by the following equation (1).
Load factor α (%) = Q1 / Q0 (1)
However, Q1: heat exchange amount of the heat exchanger 150, Q0: heating capacity of the heat pump 160.

The heat exchange amount Q1 of the heat exchanger 150 can be calculated by the following equation (2).
Q1 = ρCV (TS2−TS1) (2)
Where ρ: density of make-up water W1, C: specific heat of make-up water W1, V: flow rate of make-up water W1, TS1: inlet temperature of heat exchanger 150, TS2: outlet temperature of heat exchanger 150.

  Here, the density ρ and the specific heat C of the makeup water W1 are different physical property values depending on the temperature. The inlet temperature TS1 is measured by the thermometer 172, and the outlet temperature TS2 is measured by the thermometer 173. The flow rate V (FL1) is measured by the flow meter 170.

  Therefore, the control unit 180 can control the load factor α of the heat pump 160 by adjusting the opening degree of the makeup water valve 171 and changing the flow rate V of the makeup water W1 flowing to the heat exchanger 150. it can.

  The control unit 180 controls the flow of the makeup water W1 via the makeup water valve 171 and controls the water temperature of the makeup water W1 using the heat pump 160. Hereinafter, this control is referred to as “replenishment water temperature control” as appropriate.

  Next, makeup water flow control by the control unit 180 will be described. FIG. 2 is a time chart showing operation timing when the control unit 180 performs makeup water flow control.

  In this embodiment, as shown in FIG. 2, the water level of the makeup water W1 stored in the water supply tank 130 is divided into seven stages of HH, H, Hd, M, Ld, L, and LL in order from the highest water level. It is divided. The water level of the makeup water W <b> 1 in the water supply tank 130 is measured by a water level meter 174 and transmitted to the control unit 180.

  In FIG. 2, the water level M is the target water level of the makeup water W <b> 1 stored in the water supply tank 130. The water level L is a first water level lower than the target water level M. The water level H is a second water level higher than the target water level M. The water level Hd is a third water level that is higher than the target water level M and lower than the water level H. The water level Ld is a fourth water level that is lower than the water level M and higher than the water level L.

  The water level LL and the water level HH are both alert water levels. The water level LL is a water level lower than the water level L. The water level HH is higher than the water level H. The control unit 180 issues an alarm when the water level of the water supply tank 130 reaches the water level HH. Moreover, when the water level of the water supply tank 130 reaches the water level LL, the control unit 180 issues an alarm and causes the boiler system 100 to stop urgently.

  The control part 180 acquires the information regarding the water level W of the makeup water W1 from the water level meter 174 at a predetermined time interval, and stores it in the internal storage part. The control unit 180 updates the information about the water level W acquired last time every time the information about the water level W of the makeup water W1 is acquired. Moreover, the control part 180 determines whether the water level of the water supply tank 130 increased or decreased by comparing the water level W acquired last time with the water level W acquired this time.

  In the makeup water flow rate control, the control unit 180 sets the opening degree of the makeup water valve 171 between Dh% to Dl% between the water level L and the water level H so that the water level of the water supply tank 130 becomes the target water level M. Adjust by range. Dh% is a valve opening degree at which the load factor α of the heat pump 160 becomes the allowable maximum load factor αmax (100%).

  Dl% is a valve opening at which the load factor α of the heat pump 160 becomes an allowable minimum load factor αmin (for example, 55%). When the load factor α of the heat pump 160 is equal to or less than the allowable minimum load factor αmin, the COP of the heat pump 160 rapidly decreases. D% is a valve opening degree at which the load factor α of the heat pump 160 is approximately in the middle of the allowable maximum load factor αmax (100%) to the allowable minimum load factor αmin (55%).

  In the present embodiment, the maximum allowable load factor αmax (100%) and the minimum allowable load factor αmin (55%) will be described. However, these load factors are merely examples, and the present invention is not limited thereto.

  The control unit 180 transmits a valve operation signal with a valve opening degree Dl% to Dh% to the makeup water valve 171 while the water level of the water supply tank 130 is between the water level Hd and the water level Ld.

  In addition, when the water level of the water supply tank 130 decreases from the target water level M, the control unit 180 gives a valve operation signal larger than the current valve opening in the valve opening Dh% to Dl% to the makeup water valve 171. Send. As a result, the load factor α of the heat pump 160 increases and the water level of the water supply tank 130 approaches the target water level M.

  In addition, when the water level of the water supply tank 130 increases from the target water level M, the control unit 180 gives a valve operation signal smaller than the current valve opening in the valve opening Dh% to Dl% to the make-up water valve 171. Send. As a result, the load factor α of the heat pump 160 decreases and the water level of the water supply tank 130 approaches the target water level M.

  Thus, since the control unit 180 sets the water level of the water supply tank 130 to the target water level M, the load factor α of the heat pump 160 between the water level L and the water level H is within the allowable maximum load factor αmax (100%) to the allowable level. The opening degree of the makeup water valve 171 is adjusted in the range of Dh% to Dl% so that the range is maintained up to the minimum load factor αmin (55%).

  Further, when the load factor of the steam boiler 140 becomes high and the water level of the feed water tank 130 is lower than the water level L, the control unit 180 supplies the makeup water W1 to the water supply until the water level of the feed water tank 130 reaches the water level Ld. The valve opening degree of the makeup water valve 171 is set to 100% so that the maximum circulation amount flows toward the tank 130. Thus, when the water level of the water supply tank 130 decreases from the water level L, the load factor α of the heat pump 160 can be set to 100% by setting the valve opening of the makeup water valve 171 to 100%.

  When the opening degree of the makeup water valve 171 is set to 100%, the flow rate of the makeup water W1 supplied to the feed water tank 130 is increased, so that the temperature of the makeup water W1 is slightly lowered. However, by supplying the makeup water W1 to the feed water tank 130 with the valve opening degree of 100%, the water level of the makeup water W1 is reduced to the warning water level (water level LL), thereby reducing the possibility that the boiler system 100 is urgently stopped. be able to.

  On the other hand, when the load factor of the steam boiler 140 decreases and the water level of the feed water tank 130 exceeds the water level H, the control unit 180 sets the valve opening of the makeup water valve 171 to 0% until the water level becomes less than the water level Hd. To do. Thus, when the water level of the water supply tank 130 exceeds the water level H, the load factor α of the heat pump 160 can be set to 0% by setting the valve opening of the makeup water valve 171 to 0%.

  In the determination of each water level described above, it may be determined whether or not the measurement value measured by the water level meter 174 matches the set value of the water level (for example, the target water level M), An allowable range of about plus or minus several percent may be provided for the set value of the water level, and it may be determined whether or not the measured value falls within this allowable range.

  Next, a processing procedure in the case of controlling the flow rate of the makeup water W1 described above will be described according to the flowchart shown in FIG. The control of the flowchart shown in FIG. 3 is executed by the control unit 180 based on a makeup water flow control program stored in a storage unit (not shown). Further, the control of the flowchart shown in FIG. 3 is periodically executed at predetermined time intervals during operation of the boiler system 100.

  In step ST101, the control unit 180 acquires the water level W of the makeup water W1 stored in the water supply tank 130 from the water level meter 174.

  In step ST102, the control unit 180 determines whether or not the water level W is in the range of the water level L to the water level H. In this step ST102, when the control unit 180 determines that the water level W is in the range of the water level L to the water level H (YES), the process proceeds to step ST103. If control unit 180 determines that water level W is not in the range of water level L to water level H (NO), the process proceeds to step ST104.

In step ST103, as shown in FIG. 2, the control unit 180 transmits a valve operation signal having a valve opening degree Dh% to Dl% to the makeup water valve 171 in accordance with the water level W. For example, when the water level W is the target water level M, when the water level W decreases from the water level Hd, or when the water level W increases from the water level Ld, the control unit 180 operates the valve opening D% of the makeup water valve 171. Send a signal. Further, when the water level W increases from the target water level M, the control unit 180 transmits a valve operation signal of the valve opening degree D1% to the makeup water valve 171. Further, when the water level W decreases from the target water level M, the control unit 180 transmits a valve operation signal of the valve opening degree Dh% to the makeup water valve 171. In addition, in this embodiment, in order to make control of the valve opening degree by the control unit 180 easy to understand, the valve opening degrees Dh%, D%, and Dl% have been described. Not only this but according to the water level W, it is good also as a structure by which a valve opening degree is linearly controlled in the range of Dh%-Dl%. After executing the process of step ST103, the control unit 180 ends the process of this flowchart.

  On the other hand, in step ST <b> 104 shown in FIG. 3, the control unit 180 determines whether or not the water level W is lower than the water level L. In step ST104, when the control unit 180 determines that the water level W is lower than the water level L (YES), the process proceeds to step ST105. If control unit 180 determines that water level W is not lower than water level L (NO), the process proceeds to step ST106.

  In step ST105, the control unit 180 transmits a valve operation signal with a valve opening degree of 100% to the makeup water valve 171. After executing the process of step ST105, the control unit 180 ends the process of this flowchart.

  On the other hand, in step ST106, the control unit 180 determines whether or not the water level W is higher than the water level H (including the case of the water level H). In step ST106, when the control unit 180 determines that the water level W exceeds the water level H (YES), the process proceeds to step ST107. If control unit 180 determines that water level W does not exceed water level H (NO), the process proceeds to step ST108.

  In step ST107, the control unit 180 transmits a valve operation signal of 0% valve opening to the makeup water valve 171. After executing the process of step ST107, the control unit 180 ends the process of this flowchart.

  In step ST108, control unit 180 determines whether or not water level W has reached water level LL or water level HH (water level W is lower than water level LL or water level W is higher than water level HH). In step ST108, when the control unit 180 determines that the water level W has reached the water level LL or the water level HH (YES), the process proceeds to step ST109. Further, when the control unit 180 determines that the water level W has not reached the water level LL or the water level HH (NO), the process of this flowchart is terminated.

  In step ST109, the control unit 180 issues an alarm. At this time, when the water level W reaches the water level LL, the control unit 180 issues an alarm and causes the boiler system 100 to stop urgently (emergency stop process). After executing the process of step ST109, the control unit 180 ends the process of this flowchart.

  Next, the makeup water temperature control by the control unit 180 will be described. FIG. 4 is a time chart showing the operation timing when the control unit 180 performs the makeup water temperature control.

  In the present embodiment, the control unit 180 starts replenishment of the makeup water W1 to the water supply tank 130 when the water level of the water supply tank 130 decreases from the water level Hd. And the control part 180 starts the driving | operation of the heat pump 160, while the supplementary water W1 distribute | circulates to the supplementary water line L110. Thereby, the makeup water W <b> 1 supplied to the water supply tank 130 can be heated by the heat pump 160.

  When the water level of the water supply tank 130 is higher than the water level H, the opening degree of the makeup water valve 171 may be 0%. Therefore, when the water level of the water supply tank 130 exceeds the water level H, the control unit 180 stops the operation of the heat pump 160. Moreover, when the water level of the water supply tank 130 decreases from the water level L, the water level may reach the water level LL, and there is a possibility of an emergency stop. Therefore, when the water level of the water supply tank 130 decreases from the water level L, the control unit 180 stops the operation of the heat pump 160.

  In FIG. 4, the valve operation signal “ON” indicates a case where a valve operation signal having a valve opening degree Dh% to Dl% is transmitted to the makeup water valve 171. The valve operation signal “ON” may include a case where a valve operation signal with a valve opening degree of 100% is transmitted to the makeup water valve 171. The valve operation signal “OFF” indicates a case where a valve operation signal with a valve opening of 0% is transmitted to the makeup water valve 171.

  The control unit 180 turns the HP operation signal “ON” when the time T1 has elapsed since the valve operation signal was turned “ON”. The time T1 is the time required for the makeup water W1 to flow through the water flow path L1 of the heat exchanger 150 after the makeup water valve 171 is opened. For example, the time T1 is measured by actually supplying the makeup water W1 through the water flow path L1 of the heat exchanger 150, or performing a simulation based on the diameter and length of the pipe, the flow rate per unit time, and the like. It can be acquired by carrying out.

  As described above, when the time T1 elapses after the valve operation signal is turned “ON” first, the HP operation signal is turned “ON”, so that the makeup water W1 is flowing through the heat exchanger 150. The operation of the heat pump 160 can be started. In this case, the makeup water W <b> 1 flowing through the heat exchanger 150 is heated by the heat pump 160.

  On the other hand, when the water level of the water supply tank 130 increases from the water level H, the control unit 180 turns the HP operation signal “OFF”. As a result, the operation of the compressor or the like is stopped in the heat pump 160. Even if the operation signal is turned off, the heat pump 160 requires a certain time until the compressor is stopped. During this time, the operation of the heat pump 160 is substantially continued.

  For this reason, the control unit 180 turns the valve operation signal “OFF” when the time T2 has elapsed since the HP operation signal was turned “OFF”. Time T2 is the time required to stop the compressor. The time T2 can be acquired by measuring the time required to actually stop the compressor.

  As described above, when the time T2 elapses after the HP operation signal is turned “OFF” first, the valve operation signal is turned “OFF”, so that the makeup water W1 is flowing through the heat exchanger 150. The operation of the heat pump 160 can be stopped.

  As described above, the control unit 180 controls the flow of the makeup water W1 during operation of the boiler system 100, and at the same time controls the water temperature of the makeup water W1 by the heat pump 160 to supply the makeup water supplied to the feed water tank 130. Warm up W1 intermittently.

  Next, according to the flowchart shown in FIG. 5, the processing procedure in the case of controlling the flow of the makeup water W1 and the water temperature will be described. The control of the flowchart shown in FIG. 5 is executed by the control unit 180 based on a makeup water temperature control program stored in a storage unit (not shown). Further, the control of the flowchart shown in FIG. 5 is periodically executed at predetermined time intervals during operation of the boiler system 100.

  In step ST201, the control unit 180 acquires the water level W of the makeup water W1 in the water supply tank 130 from the water level meter 174.

  In step ST202, the control unit 180 determines whether or not the water level W is lower than the water level Hd. In step ST202, when the control unit 180 determines that the water level W is lower than the water level Hd (YES), the process proceeds to step ST203. If control unit 180 determines that water level W is not lower than water level Hd (NO), the process proceeds to step ST208.

In step ST203, the control unit 180 turns the valve operation signal “ON”.
In step ST204, control unit 180 activates the timer unit and starts measuring time.

  In step ST205, control unit 180 determines whether or not time T1 has elapsed. In step ST205, when the control unit 180 determines that the time T1 has elapsed (YES), the process proceeds to step ST206. If control unit 180 determines that time T1 has not elapsed (NO), the process proceeds to step ST205.

In step ST206, the control unit 180 turns the HP operation signal “ON”.
In step ST207, the control unit 180 resets the time measured by the timer unit, and ends the process of this flowchart.

  On the other hand, in step ST208, the control unit 180 determines whether or not the water level W exceeds the water level H. In this step ST208, when the control unit 180 determines that the water level W exceeds the water level H (YES), the process proceeds to step ST209. Further, when the control unit 180 determines that the water level W does not exceed the water level H (NO), the process of this flowchart is terminated.

In step ST209, the control unit 180 turns the HP operation signal “OFF”.
In step ST210, control unit 180 activates the timer unit and starts measuring time.

  In step ST211, the control unit 180 determines whether or not the time T2 has elapsed. In step ST211, when the control unit 180 determines that the time T2 has elapsed (YES), the process proceeds to step ST212. If control unit 180 determines that time T2 has not elapsed (NO), the process proceeds to step ST211.

  In step ST212, the control unit 180 turns the valve operation signal “OFF”. In continuing step ST207, the control part 180 resets the time measured by the timer part, and complete | finishes the process of this flowchart.

  According to the boiler system 100 of this embodiment mentioned above, there exist the following effects, for example.

  In the boiler system 100 of the present embodiment, since the water level of the water supply tank 130 is the target water level M, the load factor α of the heat pump 160 between the water level L and the water level H is the allowable maximum load factor αmax and the allowable minimum load factor αmin. The control part 180 which controls the make-up water valve | bulb 171 so that it may be kept between is provided.

  Therefore, in heat pump 160, even when the amount of heat exchange in the condenser is reduced, makeup water W1 replenished to water supply tank 130 is adjusted in the range of water level L to water level H by control unit 180, and the load factor of heat pump 160 α is maintained between the allowable maximum load factor αmax and the allowable minimum load factor αmin. For this reason, it can avoid as much as possible that the load factor (alpha) of the heat pump 160 becomes below fixed, and COP (energy consumption efficiency) of the heat pump 160 falls rapidly. Therefore, according to the boiler system 100 of the present embodiment, the heat energy of the heat pump 160 can be used effectively.

  Moreover, in the case of starting or stopping the operation of the heat pump according to the water level (two stages) of the water supply tank as in the steam generation system described in Patent Document 1, when the load factor of the steam boiler increases, the operation of the heat pump Start and stop will be repeated frequently. For this reason, it is difficult to increase the operating rate of the heat pump 160.

  However, in the boiler system 100 of the present embodiment, the operation is performed so that the load factor α of the heat pump 160 between the water level H and the water level L becomes the allowable maximum load factor αmax (100%) to the allowable minimum load factor αmin (55%). Is done. For this reason, even when the load factor of the steam boiler 140 is high, not only can the heat pump 160 be operated efficiently, but also the operating rate of the heat pump 160 can be increased. Furthermore, the temperature drop of the makeup water W1 stored in the water supply tank 130 can be suppressed as much as possible.

  Further, when the water level of the water supply tank 130 decreases from the target water level M, the control unit 180 increases the load factor α of the heat pump 160 and makes the water level of the water supply tank 130 the target water level M. In 171, a valve operation signal larger than the current valve opening in the range of the valve opening Dh% to Dl% is transmitted. On the other hand, when the water level of the water supply tank 130 increases from the target water level M, the control unit 180 decreases the load factor α of the heat pump 160 and makes the water level of the water supply tank 130 the target water level M. In 171, a valve operation signal smaller than the current valve opening in the range of the valve opening Dh% to Dl% is transmitted.

  According to this, even when the load factor of the steam boiler 140 changes, the control unit 180 adjusts the valve opening of the makeup water valve 171 in the range of Dh% to Dl%. The target water level M can be controlled.

Further, when the water level of the water supply tank 130 is lower than the water level Hd, the control unit 180 opens the makeup water valve 171 and then starts the operation of the heat pump 160 when the time T1 has elapsed.
Therefore, the operation of the heat pump 160 can be started in a state where the makeup water W <b> 1 is circulating in the heat exchanger 150.

Further, when the water level in the water supply tank 130 exceeds the water level H higher than the water level Hd, the control unit 180 stops the operation of the heat pump 160 and then closes the makeup water valve 171 when the time T2 has elapsed. And
Therefore, the operation of the heat pump 160 can be stopped in a state where the makeup water W1 is flowing through the heat exchanger 150.

  According to this, the heat pump 160 is not operated in a state where there is no supply of the makeup water W1 to the heat exchanger 150. For this reason, it is possible to more reliably prevent the heat pump 160 from abnormally stopping due to a sudden rise in the temperature of the refrigerant inside the refrigerant pipe. Therefore, in the boiler system 100 of this embodiment, when the makeup water W1 supplied to the steam boiler 140 is intermittently heated by the heat pump 160, the heat pump 160 can be operated more safely.

Further, in the boiler system 100 of the present embodiment, after the valve operation signal of the makeup water valve 171 is turned “ON” and the HP operation signal of the heat pump 160 is turned “OFF”, the timer unit measures the time T1 or T2. doing.
Therefore, the control for starting or stopping the operation of the heat pump 160 in a state where the makeup water W1 is flowing through the heat exchanger 150 can be easily performed.

  Further, when the load factor of the steam boiler 140 becomes high and the water level of the feed water tank 130 is lower than the water level L, the control unit 180 supplies the makeup water W1 to the water supply until the water level of the feed water tank 130 reaches the water level Ld. The valve opening degree of the makeup water valve 171 is controlled so as to flow toward the tank 130 at the maximum flow rate.

  According to this, the temperature of the makeup water W1 in the water supply tank 130 is slightly lowered. However, the possibility that the water level of the makeup water W1 is reduced to the warning water level (water level LL) and the boiler system 100 is brought to an emergency stop can be reduced.

  As mentioned above, although preferred embodiment of this invention was described, this invention can be implemented with a various form, without being limited to embodiment mentioned above.

  In this embodiment, after the valve operation signal of the makeup water valve 171 is turned “ON”, the HP operation signal of the heat pump 160 is turned “ON” when the time T1 has elapsed (see FIG. 5: steps ST203 to ST206). ). As another embodiment, for example, the HP operation signal of the heat pump 160 may be turned “ON” when the opening signal of the makeup water valve 171 is detected after the valve operation signal of the makeup water valve 171 is turned “ON”.

  Further, after the valve operation signal of the makeup water valve 171 is turned “ON”, the HP operation signal of the heat pump 160 is turned “ON” when the flow rate of the makeup water W1 measured by the flow meter 170 (see FIG. 1) reaches the specified flow rate. You may do.

  Further, in the present embodiment, after the HP operation signal of the heat pump 160 is “OFF”, the valve operation signal of the makeup water valve 171 is “OFF” when the time T2 has elapsed. As another embodiment, for example, the valve operation signal of the makeup water valve 171 may be “OFF” based on the temperature of the makeup water W <b> 1 in the heat exchanger 150.

  That is, after the HP operation signal of the heat pump 160 is “OFF”, the temperature TS2 of the makeup water W1 that has passed through the heat exchanger 150 is acquired by the thermometer 173, and the replenishment before passing through the heat exchanger 150 by the thermometer 172 The temperature TS1 of the water W1 is acquired. Then, when the condition of TS2 ≧ TS1 + t is satisfied, the valve operation signal of the makeup water valve 171 may be “OFF”.

  Moreover, although this embodiment demonstrated the example which adjusts the valve opening degree of the makeup water valve 171 in a stepless manner from an open state (valve opening degree 100%) to a closed state (valve opening degree 0%). Not limited to this, the valve opening may be adjusted stepwise. For example, the valve opening may be adjusted in five stages of 100%, Dh%, D%, Dl%, and 0%. Furthermore, these may be combined. For example, the valve opening may be adjusted steplessly in the range where the load factor of the heat pump 160 is 90% to 70%, and the valve opening may be adjusted stepwise in other ranges.

  In addition, the control of this embodiment and the control in other embodiment mentioned above can be combined suitably.

  For example, after turning on the valve operation signal of the make-up water valve 171, control to turn on the HP operation signal of the heat pump 160 when the flow rate of the make-up water W1 measured by the flow meter 170 reaches a specified flow rate; This may be combined with control for turning off the valve operation signal of the makeup water valve 171 when the time T2 has elapsed after turning off the HP operation signal of the heat pump 160.

  Further, after the valve operation signal of the makeup water valve 171 is turned “ON”, when the opening signal of the makeup water valve 171 is detected, the HP operation signal of the heat pump 160 is turned “ON” and the HP operation signal of the heat pump 160 is After “OFF”, a control may be combined with “OFF” the valve operation signal of the makeup water valve 171 based on the temperature of the makeup water W1 in the heat exchanger 150.

  In this embodiment, the example using the steam boiler 140 was demonstrated as a boiler apparatus. However, the present invention is not limited to this, and for example, a hot water boiler can be used.

  In the present embodiment, the configuration in which the makeup water W1 is heated by the refrigerant W2 that exchanges heat with the internal refrigerant (not shown) of the heat pump 160 has been described. However, the present invention is not limited to this, and the internal refrigerant of the heat pump 160 and the makeup water W1 may be directly heat-exchanged.

DESCRIPTION OF SYMBOLS 100 Boiler system 130 Water supply tank 140 Steam boiler 150 Heat exchanger 160 Heat pump 180 Control part (control means)
171 Supply water valve (Supply water flow control means)
L110 Makeup water line L120 Supply water line L130 Refrigerant circulation line W1 Makeup water W2 Refrigerant

Claims (5)

A water supply tank for storing makeup water;
A makeup water line for replenishing makeup water to the water tank;
A water supply line for supplying make-up water from the water supply tank toward the boiler device;
Makeup water distribution means for distributing makeup water to the water supply tank via the makeup water line;
A heat pump that recovers waste heat via a refrigerant;
A heat exchanger for exchanging heat between makeup water flowing through the makeup water line and refrigerant circulating through the heat pump;
In order to set the water level of the water supply tank as a target water level, the load factor of the heat pump is set to an allowable maximum load factor and an allowable value between a first water level lower than the target water level and a second water level higher than the target water level. Control means for controlling the flow rate of makeup water in the makeup water circulation means so as to be kept between the minimum load factor,
Equipped with a,
When the water level of the water supply tank decreases from the target water level, the control means controls the flow rate of makeup water in the makeup water circulation means so that the load factor of the heat pump increases, and the water supply A water supply system that controls a flow rate of makeup water in the makeup water circulation means so that a load factor of the heat pump decreases when the water level of the tank increases from the target water level . A water supply tank for storing makeup water;
A makeup water line for replenishing makeup water to the water tank;
A water supply line for supplying make-up water from the water supply tank toward the boiler device;
Makeup water distribution means for distributing makeup water to the water supply tank via the makeup water line;
A heat pump that recovers waste heat via a refrigerant;
A heat exchanger for exchanging heat between makeup water flowing through the makeup water line and refrigerant circulating through the heat pump;
In order to set the water level of the water supply tank as a target water level, the load factor of the heat pump is set to an allowable maximum load factor and an allowable value between a first water level lower than the target water level and a second water level higher than the target water level. Control means for controlling the flow rate of makeup water in the makeup water circulation means so as to be kept between the minimum load factor,
Equipped with a,
When the water level of the water supply tank is lower than a third water level that is higher than the target water level and lower than the second water level, the control means is configured to circulate makeup water toward the water supply tank. The flow rate of makeup water in the makeup water circulation means is controlled, the operation of the heat pump is started in a state where makeup water is circulated through the heat exchanger, and the water level of the water supply tank is the second water level. When the supply water exceeds the replenishment water in the replenishment water circulation means so that the replenishment water is not circulated toward the water supply tank after the operation of the heat pump is stopped while the replenishment water is flowing through the heat exchanger. A water supply system that controls the flow of water. A water supply tank for storing makeup water;
A makeup water line for replenishing makeup water to the water tank;
A water supply line for supplying make-up water from the water supply tank toward the boiler device;
Makeup water distribution means for distributing makeup water to the water supply tank via the makeup water line;
A heat pump that recovers waste heat through a refrigerant that circulates inside, a heat pump that exchanges heat between the refrigerant that circulates inside the heat pump and makeup water that circulates the makeup water line;
In order to set the water level of the water supply tank as a target water level, the load factor of the heat pump is set to an allowable maximum load factor and an allowable value between a first water level lower than the target water level and a second water level higher than the target water level. Control means for controlling the flow rate of makeup water in the makeup water circulation means so as to be kept between the minimum load factor,
Equipped with a,
When the water level of the water supply tank decreases from the target water level, the control means controls the flow rate of makeup water in the makeup water circulation means so that the load factor of the heat pump increases, and the water supply A water supply system that controls a flow rate of makeup water in the makeup water circulation means so that a load factor of the heat pump decreases when the water level of the tank increases from the target water level . A water supply tank for storing makeup water;
A makeup water line for replenishing makeup water to the water tank;
A water supply line for supplying make-up water from the water supply tank toward the boiler device;
Makeup water distribution means for distributing makeup water to the water supply tank via the makeup water line;
A heat pump that recovers waste heat through a refrigerant that circulates inside, a heat pump that exchanges heat between the refrigerant that circulates inside the heat pump and makeup water that circulates the makeup water line;
In order to set the water level of the water supply tank as a target water level, the load factor of the heat pump is set to an allowable maximum load factor and an allowable value between a first water level lower than the target water level and a second water level higher than the target water level. Control means for controlling the flow rate of makeup water in the makeup water circulation means so as to be kept between the minimum load factor,
Equipped with a,
When the water level of the water supply tank is lower than a third water level that is higher than the target water level and lower than the second water level, the control means is configured to circulate makeup water toward the water supply tank. The flow rate of makeup water in the makeup water circulation means is controlled, the operation of the heat pump is started in a state where makeup water is circulating in the makeup water line, and the water level of the water supply tank is the second water level. In the state where the makeup water is circulating in the makeup water line, the operation of the heat pump is stopped, and then the supplementary water in the makeup water circulation means is prevented from circulating the makeup water toward the water supply tank. A water supply system that controls the flow of water. When the water level of the water supply tank is lower than the first water level, the control means until the water level of the water supply tank reaches a fourth water level lower than the target water level and higher than the first water level. water supply system according to any one of claims 1-4 in which between, makeup water is to control the flow rate of makeup water in the makeup water flowing means so as to flow at a maximum flow amount toward the water tank.

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